JP2003183869A - Electrolyte purification method - Google Patents
Electrolyte purification methodInfo
- Publication number
- JP2003183869A JP2003183869A JP2001379472A JP2001379472A JP2003183869A JP 2003183869 A JP2003183869 A JP 2003183869A JP 2001379472 A JP2001379472 A JP 2001379472A JP 2001379472 A JP2001379472 A JP 2001379472A JP 2003183869 A JP2003183869 A JP 2003183869A
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- Prior art keywords
- solution
- electrolytic
- clean
- concentration
- copper
- Prior art date
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Electrolytic Production Of Metals (AREA)
Abstract
(57)【要約】
【課 題】 大幅な設備改造を要さずに不純物除去量を
増大させうる電解液の浄液方法を提供する。
【解決手段】 銅電解精製を行う一般電解槽から電解液
を一部抜き取って脱導電解槽に送り、電解採取により液
中の銅を減量後、清浄給液として清浄電解槽に送り、電
解採取により液中の不純物を除去して清浄尾液として前
記一般電解槽に戻す電解液の浄液方法において、前記清
浄尾液のCu濃度を0.8 〜3.0g/Lの範囲に管理する。前記
清浄電解槽の少なくとも上流側の部分で電解採取されて
いる電解液を攪拌することが好ましい。
(57) [Abstract] [Problem] To provide a method for purifying an electrolytic solution that can increase the amount of impurities removed without requiring a significant equipment remodeling. SOLUTION: A part of the electrolytic solution is withdrawn from a general electrolytic cell for performing copper electrolytic refining, sent to a deconducting solution tank, the amount of copper in the solution is reduced by electrolytic sampling, and then sent to a clean electrolytic cell as a clean supply solution to perform electrolytic sampling. In the method for purifying an electrolytic solution which removes impurities in the solution and returns it to the general electrolytic cell as a clean tail solution, the Cu concentration of the clean tail solution is controlled in the range of 0.8 to 3.0 g / L. It is preferable to stir the electrolytic solution that has been subjected to electrowinning in at least the upstream portion of the clean electrolytic cell.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、銅の電解精製に用
いる電解液の浄液方法に関する。TECHNICAL FIELD The present invention relates to a method for purifying an electrolytic solution used for electrolytic refining of copper.
【0002】[0002]
【従来の技術】銅の電解精製工程では、転炉→精製炉等
の溶錬炉で産出した粗銅をアノードとし、種板槽で産出
した銅種板をカソードとして一般電解槽内の電解液中に
装入・通電し、粗銅から銅を溶出させて銅種板に電着さ
せることにより、Cu純度99.99%の製品電気銅を生産す
る。このとき、粗銅から余剰分のCuとともに不純物(A
s,Sb,Bi)が溶出する。これらの不純物が電解液中で一
定濃度以上になった場合には製品の外観の悪化(表面の
荒れ、粒・瘤の発生)や製品品質の悪化を招く。2. Description of the Related Art In a copper electrolytic refining process, crude copper produced in a smelting furnace such as a converter → refining furnace is used as an anode, and a copper seed plate produced in a seed plate tank is used as a cathode in an electrolytic solution in a general electrolytic cell. It is charged into and charged with electricity to elute copper from crude copper and electrodeposit it on a copper seed plate to produce product electric copper with a purity of 99.99%. At this time, impurities (A
s, Sb, Bi) elutes. If the concentration of these impurities exceeds a certain level in the electrolytic solution, the appearance of the product is deteriorated (roughness of the surface, generation of grains and bumps) and the product quality is deteriorated.
【0003】そこで、電解液を一般電解槽から一部抜き
取って脱銅電解槽へ送り、電解採取により液中の銅を減
量後、清浄電解槽へ送り、電解採取により不純物除去
(すなわち送られてきた電解液を浄化(浄液))した
後、一般電解槽に戻すことが行われる。前記電解採取で
は、不溶性陽極(通常はPbアノード)が用いられる。清
浄電解槽に送られる電解液を「清浄給液(あるいは脱銅
尾液)」、一般電解槽に戻される電解液を「清浄尾液
(あるいは尾液)」という。Therefore, a part of the electrolytic solution is extracted from the general electrolytic cell and sent to a decoppering electrolytic cell, the amount of copper in the solution is reduced by electrolytic sampling, and then sent to a clean electrolytic cell, and impurities are removed (that is, sent by electrolytic sampling). After purifying (purifying) the electrolytic solution, it is returned to the general electrolytic cell. An insoluble anode (usually a Pb anode) is used in the electrowinning. The electrolytic solution sent to the clean electrolytic cell is called "clean feed solution (or copper removal tail solution)", and the electrolytic solution returned to the general electrolytic cell is called "clean tail solution (or tail solution)".
【0004】前記浄液工程においては、はじめに余剰溶
出したCuが電着し、Cu濃度がある程度低下してからAs,S
b,Biが電着し、回収除去される。通常の浄液方法では、
尾液のCu濃度を0.8g/L程度未満まで下げることにより全
不純物を9割程度除去できる。この方法では、被処理液
中濃度の高いものが良く採れることになる。この不純物
を下げた液を一般電解槽へ戻すことにより電解液中の不
純物濃度を一定値以下に保つことで、外観・品質とも問
題のない製品電気銅を生産できる。In the above-mentioned cleaning step, excess eluted Cu is first electrodeposited, and the Cu concentration is lowered to some extent before the As, S
b and Bi are electrodeposited and recovered and removed. In the normal purification method,
By reducing the Cu concentration in the tail fluid to less than about 0.8 g / L, about 90% of all impurities can be removed. According to this method, the one having a high concentration in the liquid to be treated is often taken. By returning the solution in which the impurities are reduced to the general electrolytic cell to keep the impurity concentration in the electrolytic solution at a certain value or less, it is possible to produce a product electrolytic copper having no problem in appearance and quality.
【0005】[0005]
【発明が解決しようとする課題】ところで、近年、Sb,
Biを比較的多く含む種類の銅鉱石が多く使用される傾向
にある。この種類の銅鉱石を原料として製造された粗銅
ではSb,Biの含有量が高めとなる。この粗銅を一般電解
槽のアノードとして用いた場合、電解液中へのSb,Biの
溶出量は増加する。そのため浄液工程での不純物除去量
を増加させないと一般電解槽内の電解液の不純物濃度が
上昇して製品電気銅の外観・品質が劣化する虞がある。By the way, in recent years, Sb,
Copper ores of the type containing a relatively large amount of Bi tend to be used. Crude copper produced from this type of copper ore has a higher Sb and Bi content. When this crude copper is used as the anode of a general electrolytic cell, the elution amount of Sb and Bi into the electrolytic solution increases. Therefore, unless the amount of impurities removed in the purifying step is increased, the impurity concentration of the electrolytic solution in the general electrolytic cell may increase, and the appearance and quality of the product electrolytic copper may deteriorate.
【0006】浄液工程での不純物除去量を増大させるに
は、清浄電解槽の容量を大きくすればよいのであるが、
そうするには大幅な設備改造が必要で、設備投資額が莫
大なものとなるため現実的でない。本発明は、前記従来
技術の問題を解決し、大幅な設備改造を要さずに不純物
とくにBi,Sbの除去量を増大させうる電解液の浄液方法
を提供することを目的とする。In order to increase the amount of impurities removed in the cleaning process, the capacity of the clean electrolytic cell should be increased.
To do so would require a major remodeling of the equipment, and the amount of equipment investment would be enormous, which is not realistic. It is an object of the present invention to solve the above-mentioned problems of the prior art and to provide a method for purifying an electrolytic solution that can increase the amount of impurities, particularly Bi and Sb, removed without requiring major equipment modification.
【0007】[0007]
【課題を解決するための手段】本発明は、銅電解精製を
行う一般電解槽から電解液を一部抜き取って脱銅電解槽
に送り、電解採取により液中の銅を減量後、清浄給液と
して清浄電解槽に送り、電解採取により液中の不純物を
除去して清浄尾液として前記一般電解槽に戻す電解液の
浄液方法において、前記清浄尾液のCu濃度を0.8 〜3.0g
/Lとすることを特徴とする電解液の浄液方法である。本
発明では、前記清浄電解槽の少なくとも上流側の部分で
電解採取されている電解液を攪拌することが好ましい。
また、本発明では、前記除去される不純物がAs,Sb,Bi
を含み、うちAsを他よりも多く除去する場合は前記清浄
尾液のCu濃度を0.8g/L未満とし、Sb,Biを他よりも多く
除去する場合は前記清浄尾液のCu濃度を0.8 〜3.0g/Lと
することが好ましい。According to the present invention, a part of an electrolytic solution is extracted from a general electrolytic cell for electrolytically refining copper and sent to a decoppered electrolytic cell, and the amount of copper in the solution is reduced by electrolytic extraction. As a clean tail solution to remove impurities in the solution by electrolytic collection and return to the general electrolytic cell as a clean tail solution, the Cu concentration of the clean tail solution is 0.8 to 3.0 g.
/ L is a method for purifying an electrolytic solution. In the present invention, it is preferable to stir the electrolytic solution electrolytically collected in at least the upstream side portion of the clean electrolytic cell.
In the present invention, the impurities to be removed are As, Sb, Bi.
In the case of removing more As than the other, the Cu concentration of the clean tail solution is set to less than 0.8 g / L, and in the case of removing more Sb and Bi than others, the Cu concentration of the clean tail solution is 0.8 g / L. It is preferably set to ~ 3.0 g / L.
【0008】[0008]
【発明の実施の形態】電解液の浄液工程では、理論電解
電位が貴のものほど先に電解採取される。理論電解電位
はCu>Bi>Sb>Asであるから、まずCuが析出し、次いで
Bi,Sb,Asの順に析出する。Biは単体、Sb,AsはCuとの
金属間化合物(Cu3Sb ,Cu3As )の形態で析出する。し
かしながら、それらの詳細な量的関係については知られ
ていなかった。そこで、本発明者らは、種々の電解採取
条件について尾液の成分組成を分析調査し、その結果、
尾液のAs,Sb,Bi濃度とCu濃度との間に図1に示すよう
な関係があることが判明した。なお、給液の不純物濃度
は、As:8g/L,Sb:0.45g/L,Bi:0.15g/Lである。BEST MODE FOR CARRYING OUT THE INVENTION In the electrolytic solution purification step, the electrolytic solution having a higher theoretical electrolytic potential is electrolyzed earlier. The theoretical electrolysis potential is Cu>Bi>Sb> As, so first Cu is deposited, then
Bi, Sb, As are deposited in this order. Bi is a simple substance, and Sb and As are precipitated in the form of intermetallic compounds (Cu 3 Sb, Cu 3 As) with Cu. However, their detailed quantitative relationship was unknown. Therefore, the present inventors analyzed and investigated the component composition of tail fluid under various electrolytic extraction conditions, and as a result,
It was found that there is a relationship as shown in Fig. 1 between the As, Sb, Bi and Cu concentrations in the tail fluid. The impurity concentration of the supply liquid is As: 8 g / L, Sb: 0.45 g / L, Bi: 0.15 g / L.
【0009】図1の関係によれば、尾液のCu濃度が0.5g
/Lとなるような条件で電解採取を行った場合、尾液不純
物濃度はAs:1.0g/L,Sb:0.01g/L,Bi:0.01g/Lとな
る(なお、Bi分析下限値が 0.01g/Lである。)から、不
純物除去率(=1−尾液不純物濃度/給液不純物濃度)
は、As:87.5%,Sb:97.8%,Bi:93.3%である。ここ
で、給液流量は 140m3/day であり、不純物除去量(=
給液流量×給液不純物濃度×不純物除去率)は、As:98
0kg/day 、Sb:61.6kg/day、Bi:19.6kg/dayである。不
純物除去率は清浄電解槽の設備能力によってほぼ決まる
ので、不純物除去量(除去量=電解採取量)を増やすた
めには、給液不純物濃度を上げるか又は給液流量を増や
す必要がある。しかし給液不純物濃度は、一般電解槽側
の上限規制があって上げることはできない。また、給液
流量を増やすと、例えば図2に示すような給液流量と尾
液Cu濃度との関係から、尾液Cu濃度が0.8g/L以上になる
ため、尾液Cu濃度の管理値を0.8g/L未満とする限り、給
液流量を増やすこともできない。According to the relationship shown in FIG. 1, the tail solution has a Cu concentration of 0.5 g.
When electrowinning is performed under the condition that / L, the tail solution impurity concentration becomes As: 1.0 g / L, Sb: 0.01 g / L, Bi: 0.01 g / L (the lower limit of Bi analysis is 0.01g / L), the impurity removal rate (= 1-tail solution impurity concentration / feed solution impurity concentration)
Are As: 87.5%, Sb: 97.8%, Bi: 93.3%. Here, the liquid supply flow rate is 140 m 3 / day, and the amount of impurities removed (=
Liquid supply flow rate × liquid supply impurity concentration × impurity removal rate) is As: 98
0kg / day, Sb: 61.6kg / day, Bi: 19.6kg / day. Since the impurity removal rate is substantially determined by the facility capacity of the clean electrolytic cell, in order to increase the amount of removed impurities (removed amount = electrolytic extraction amount), it is necessary to increase the concentration of the supplied liquid impurities or the flow rate of the supplied liquid. However, the concentration of impurities in the liquid supply cannot be increased due to the upper limit regulation on the side of the general electrolytic cell. In addition, when the feed fluid flow rate is increased, the tail fluid Cu concentration becomes 0.8 g / L or more from the relationship between the feed fluid flow rate and the tail fluid Cu concentration as shown in FIG. As long as it is less than 0.8 g / L, the liquid supply flow rate cannot be increased.
【0010】これに対し、本発明では尾液のCu濃度を0.
8 〜3.0g/Lの範囲に管理するものとした。図3は、図1
及び図2から導出した尾液Cu濃度と不純物除去量との関
係を示すグラフである。図3において縦軸の不純物除去
量は、尾液Cu濃度=0.7g/Lでの従来値に対する比を 100
倍した相対値で示した。図3に示すように、尾液Cu濃度
を0.8 〜3.0g/L、好ましくは1.2 〜2.5g/L、に管理する
ことにより、給液流量を増加させてSb,Biの除去量(電
解採取量)を増加させることができる。よって、設備の
大幅な改造を行わずとも、粗銅アノードのSb,Bi濃度上
昇に適応することができる。例えば粗銅アノードのBi濃
度が78ppm から87ppm へ上昇しても製品電気銅の外観の
悪化(例:表面の荒れ、 粒・瘤の発生)や品質の悪化
(例:LME規格(As≦5ppm ,Sb≦4ppm ,Bi≦2.0p
pm)外れ)を生じないレベルまで電解液中の不純物を除
去することができるようになる。なお、Asの除去量は従
来の7割程度に減るが、液中As濃度が一定値以下である
ので製品電気銅の外観・品質に問題を生じるほどの影響
はない。On the other hand, in the present invention, the Cu concentration in the tail fluid is set to 0.
It was controlled within the range of 8 to 3.0 g / L. FIG. 3 shows FIG.
3 is a graph showing the relationship between the tail solution Cu concentration derived from FIG. 2 and the amount of removed impurities. In Fig. 3, the amount of impurities removed on the vertical axis is 100 compared to the conventional value when the Cu concentration in tail fluid = 0.7 g / L.
It is shown by the relative value multiplied. As shown in FIG. 3, by controlling the tail solution Cu concentration to 0.8 to 3.0 g / L, preferably 1.2 to 2.5 g / L, the feed solution flow rate was increased to remove Sb and Bi (electrolytic extraction). Amount) can be increased. Therefore, it is possible to adapt to the increase in the Sb and Bi concentrations of the crude copper anode without remodeling the equipment. For example, even if the Bi concentration of the crude copper anode rises from 78ppm to 87ppm, the appearance of the product electrolytic copper deteriorates (eg, surface roughness, generation of grains and bumps) and quality (eg, LME standard (As ≦ 5ppm, Sb). ≦ 4ppm, Bi ≦ 2.0p
It becomes possible to remove impurities in the electrolytic solution to a level that does not cause pm) detachment. The amount of As removed is reduced to about 70% of the conventional amount, but since the concentration of As in the liquid is below a certain value, it does not affect the appearance and quality of the product electrolytic copper.
【0011】ところで、尾液Cu濃度管理値を従来の0.8g
/L未満から本発明の0.8 〜3.0g/Lに上げると、通常用い
られている直列カスケード結合型の清浄電解槽では、と
くにその上流側で高さ(深さ)方向に電解液のCu濃度偏
析が生じやすくなり、例えば10g/L以上濃度差が発生す
ることがある。そうなると尾液Cu濃度のばらつきが発生
するうえ、電解採取銅の電析状態が悪化(カソードに粒
・瘤が生成・肥大化)してショートが発生し電解採取効
率が低下する不具合を生じる。かかる不具合をなくすた
めに、清浄電解槽においては少なくとも上流側の部分す
なわちCu濃度が高い(例えば5g/L以上の)清浄電解槽
部で電解採取されている電解液を攪拌することが好まし
い。この攪拌を行う手段としては、ポンプによる液循
環、エアバブリング等が好ましく用いうる。これによ
り、上流側の清浄電解槽で電解液の深さ方向のCu濃度分
布を均一(濃度差1g/L以下)にすることができ、尾液
Cu濃度の管理精度を十分高位に確保できるとともに、電
解採取銅の電析状態を良好に維持することができる。By the way, the tail water Cu concentration control value is 0.8 g compared with the conventional value.
When increasing from less than / L to 0.8 to 3.0 g / L of the present invention, the Cu concentration of the electrolytic solution is increased in the height (depth) direction, especially in the upstream side, in the normally used series cascade coupling type clean electrolytic cell. Segregation is likely to occur, and for example, a concentration difference of 10 g / L or more may occur. If this happens, the concentration of Cu in the tail fluid will vary, and the electrodeposition state of electrowinning copper will deteriorate (particles or bumps will be formed on the cathode and enlarge), resulting in a short circuit, which will reduce electrowinning efficiency. In order to eliminate such a problem, it is preferable to stir the electrolytic solution electrolyzed at least in the upstream portion of the clean electrolytic bath, that is, in the clean electrolytic bath portion having a high Cu concentration (for example, 5 g / L or more). As means for performing this stirring, liquid circulation by a pump, air bubbling and the like can be preferably used. As a result, the Cu concentration distribution in the depth direction of the electrolytic solution can be made uniform (concentration difference of 1 g / L or less) in the upstream clean electrolytic cell.
The Cu concentration control accuracy can be secured at a sufficiently high level, and the electrodeposition state of electrowinning copper can be maintained in a good condition.
【0012】[0012]
【実施例】カソード電着総面積38m2 の規模の電解槽を
6槽直列にカスケード結合してなる清浄電解槽を用いて
電解採取により給液の不純物を除去する浄液工程に本発
明を適用した。この浄液工程では、従来、給液送給元
(=尾液戻し先)の一般電解槽で用いられている粗銅ア
ノードの不純物品位が、As≦1350ppm ,Sb≦220ppm,Bi
≦78ppm の場合に適合して尾液Cu濃度が0.8g/L未満とな
るように操業していた。この条件では給液流量(=尾液
流量)の上限は140 m3/day であり、不純物除去量は、
As:980kg/day ,Sb:61.6kg/day,Bi:19.6kg/dayであ
った。[Example] The present invention is applied to a purification process for removing impurities in a feed liquid by electrolytic extraction using a clean electrolytic bath in which six electrolytic baths each having a total area of cathode electrodeposition of 38 m 2 are cascade-connected in series. did. In this purification process, the impurity grade of the crude copper anode used in the general electrolytic cell of the liquid supply source (the tail liquid return destination) is As ≤ 1350ppm, Sb ≤ 220ppm, Bi
It was operated so that the Cu concentration in tail fluid would be less than 0.8 g / L in conformity with ≤78 ppm. Under this condition, the upper limit of the supply flow rate (= tail flow rate) is 140 m 3 / day, and the amount of impurities removed is
As: 980kg / day, Sb: 61.6kg / day, Bi: 19.6kg / day.
【0013】しかし、ある時期から粗銅アノードの不純
物品位が、As≦1250ppm ,Sb≦240ppm,Bi≦87ppm に変
更されることになり、それに応じて浄液工程のBi,Sb除
去能力を10%程度以上増強する必要が生じた。そうしな
いと一般電解槽で生産される製品電気銅の表面に粒や瘤
が多発し、また、製品電気銅のBi品位がLME規格上限
の2.0ppmを超えてしまうことが実験的に確かめられてい
る。However, from a certain time, the impurity grade of the crude copper anode was changed to As≤1250ppm, Sb≤240ppm, Bi≤87ppm, and accordingly, the Bi, Sb removal capacity of the purification step was about 10%. It became necessary to increase the above. Otherwise, it has been experimentally confirmed that grains and bumps frequently occur on the surface of the product electrolytic copper produced in the general electrolytic cell, and that the Bi quality of the product electrolytic copper exceeds the LME standard upper limit of 2.0 ppm. There is.
【0014】そこで、本発明に従い、尾液Cu濃度の管理
値を2.0g/Lに変更した。その結果、清浄電解槽の増強改
造を伴わずに給液流量を 180m3 程度に増やすことがで
き(図2参照)、Bi除去能力を20%以上増強することが
できた(図3参照)。これにより、一般電解槽での液中
Bi,Sb濃度の上昇を抑えることができた。なお、本発明
実施当初は、清浄電解槽のうちの上流側の槽で深さ方向
のCu濃度偏析(最大濃度差10g/L程度)が認められ、電
流効率が従来に比べてやや低下気味であったので、本発
明の好適形態に従い、上流側の第1〜5槽内部にエアレ
ーション配管を設置してエアバブリングすることにより
同槽内の電解液を攪拌するようにしたところ、前記偏析
は濃度差1g/L未満へとほとんど解消し、電流効率は60
〜70%の高位に安定的に推移している。Therefore, according to the present invention, the control value of the tail fluid Cu concentration was changed to 2.0 g / L. As a result, it was possible to increase the liquid supply flow rate to about 180 m 3 (see Fig. 2) and to increase the Bi removal capacity by 20% or more (see Fig. 3) without the need to reinforce the clean electrolytic cell. As a result, in the liquid in a general electrolytic cell
It was possible to suppress the increase in Bi and Sb concentrations. In the beginning of the present invention, segregation of Cu concentration in the depth direction (maximum concentration difference of about 10 g / L) was observed in the upstream electrolytic bath, and the current efficiency was slightly lower than that of the conventional one. Therefore, according to the preferred embodiment of the present invention, when the aeration pipes were installed inside the first to fifth tanks on the upstream side and air bubbling was performed to stir the electrolytic solution in the same tank, the segregation was concentrated. Most of the difference is less than 1g / L, current efficiency is 60
It has remained stable at a high level of ~ 70%.
【0015】[0015]
【発明の効果】本発明によれば、浄液設備の大幅改造を
伴わずに給液中のSb, Biの電解採取量(除去量)を増大
させることが可能になるという優れた効果を奏する。EFFECTS OF THE INVENTION According to the present invention, it is possible to increase the electrolytic extraction amount (removal amount) of Sb and Bi in the liquid supply without significantly modifying the purification equipment. .
【図1】尾液のAs,Sb,Bi濃度とCu濃度との関係を示す
グラフである。FIG. 1 is a graph showing the relationship between As, Sb, Bi concentrations and Cu concentrations in tail fluid.
【図2】給液流量と尾液Cu濃度との関係を示すグラフで
ある。FIG. 2 is a graph showing the relationship between the supply liquid flow rate and the tail liquid Cu concentration.
【図3】尾液Cu濃度と不純物除去量との関係を示すグラ
フである。FIG. 3 is a graph showing the relationship between the tail solution Cu concentration and the amount of impurities removed.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中村 登 岡山県玉野市日比6−1−1 三井金属鉱 業株式会社日比精煉所内 (72)発明者 荒木 康繁 岡山県玉野市日比6−1−1 三井金属鉱 業株式会社日比精煉所内 Fターム(参考) 4K058 AA11 BA21 BB03 FC05 FC22 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Noboru Nakamura 6-1-1 Hibi, Tamano City, Okayama Prefecture Mitsui Metal Ore Business Hibiki refinery (72) Inventor Yasushige Araki 6-1-1 Hibi, Tamano City, Okayama Prefecture Mitsui Metal Ore Business Hibiki refinery F term (reference) 4K058 AA11 BA21 BB03 FC05 FC22
Claims (3)
を一部抜き取って脱銅電解槽に送り、電解採取により液
中の銅を減量後、清浄給液として清浄電解槽に送り、電
解採取により液中の不純物を除去して清浄尾液として前
記一般電解槽に戻す電解液の浄液方法において、前記清
浄尾液のCu濃度を0.8 〜3.0g/Lとすることを特徴とする
電解液の浄液方法。1. An electrolytic solution is partially withdrawn from a general electrolytic cell for electrolytically refining copper and sent to a decoppered electrolytic cell. After electrolytic copper extraction, the amount of copper in the electrolytic solution is reduced, and the electrolytic solution is sent to a clean electrolytic cell as a clean feed solution for electrolysis. In the method of purifying the electrolytic solution by removing impurities in the solution by collecting and returning it to the general electrolytic cell as a clean tail solution, the electrolytic solution is characterized in that the Cu concentration of the clean tail solution is 0.8 to 3.0 g / L. Liquid purification method.
分で電解採取されている電解液を攪拌することを特徴と
する請求項1記載の電解液の浄液方法。2. The method for purifying an electrolytic solution according to claim 1, wherein the electrolytic solution electrolyzed is stirred in at least an upstream side portion of the clean electrolytic cell.
み、うちAsを他よりも多く除去する場合は前記清浄尾液
のCu濃度を0.8g/L未満とし、Sb、Biを他よりも多く除去
する場合は前記清浄尾液のCu濃度を0.8 〜3.0g/lとする
ことを特徴とする請求項1または2に記載の電解液の浄
液方法。3. The impurities to be removed include As, Sb, and Bi, and when As is removed more than others, the Cu concentration of the clean tail solution is set to less than 0.8 g / L and Sb and Bi are removed. The method for purifying an electrolytic solution according to claim 1 or 2, wherein the Cu concentration of the clean tail solution is 0.8 to 3.0 g / l in the case of removing more than that.
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| JP2001379472A JP3875548B2 (en) | 2001-12-13 | 2001-12-13 | Electrolyte purification method |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013177657A (en) * | 2012-02-28 | 2013-09-09 | Pan Pacific Copper Co Ltd | Liquid receiving device of electrode plate, electrolytic solution of liquid receptor, and discharging method of solid |
| JP2014145104A (en) * | 2013-01-29 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | Method for removing group 15 elements in electrolytic refining of copper |
| CN107841769A (en) * | 2017-11-17 | 2018-03-27 | 金川集团股份有限公司 | Selectively except the method for antimony, bismuth in a kind of decopper(ing) liquid from induction |
| JP2021161533A (en) * | 2020-03-31 | 2021-10-11 | パンパシフィック・カッパー株式会社 | Method for producing crude nickel sulfate |
-
2001
- 2001-12-13 JP JP2001379472A patent/JP3875548B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013177657A (en) * | 2012-02-28 | 2013-09-09 | Pan Pacific Copper Co Ltd | Liquid receiving device of electrode plate, electrolytic solution of liquid receptor, and discharging method of solid |
| JP2014145104A (en) * | 2013-01-29 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | Method for removing group 15 elements in electrolytic refining of copper |
| CN107841769A (en) * | 2017-11-17 | 2018-03-27 | 金川集团股份有限公司 | Selectively except the method for antimony, bismuth in a kind of decopper(ing) liquid from induction |
| CN107841769B (en) * | 2017-11-17 | 2019-11-08 | 金川集团股份有限公司 | A method for selectively removing antimony and bismuth from induced decopper liquid |
| JP2021161533A (en) * | 2020-03-31 | 2021-10-11 | パンパシフィック・カッパー株式会社 | Method for producing crude nickel sulfate |
| JP7547711B2 (en) | 2020-03-31 | 2024-09-10 | 日比製煉株式会社 | Method for producing crude nickel sulfate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3875548B2 (en) | 2007-01-31 |
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