JP2003183016A - Method for producing silica-coated molded product, and silica-coated molded product - Google Patents
Method for producing silica-coated molded product, and silica-coated molded productInfo
- Publication number
- JP2003183016A JP2003183016A JP2001385105A JP2001385105A JP2003183016A JP 2003183016 A JP2003183016 A JP 2003183016A JP 2001385105 A JP2001385105 A JP 2001385105A JP 2001385105 A JP2001385105 A JP 2001385105A JP 2003183016 A JP2003183016 A JP 2003183016A
- Authority
- JP
- Japan
- Prior art keywords
- silica
- polysilazane
- film
- absorbance
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 134
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 67
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229920001709 polysilazane Polymers 0.000 claims abstract description 57
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 29
- 239000007788 liquid Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000007787 solid Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 37
- 238000002835 absorbance Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 238000005299 abrasion Methods 0.000 claims description 10
- 238000004566 IR spectroscopy Methods 0.000 claims description 8
- 238000000465 moulding Methods 0.000 claims description 8
- 238000010998 test method Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 13
- 238000004140 cleaning Methods 0.000 abstract description 5
- 238000009428 plumbing Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 34
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- 239000002904 solvent Substances 0.000 description 21
- 208000012839 conversion disease Diseases 0.000 description 14
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 11
- 239000008096 xylene Substances 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005507 spraying Methods 0.000 description 8
- 238000000862 absorption spectrum Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000002966 varnish Substances 0.000 description 6
- 238000005102 attenuated total reflection Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- -1 polypropylene Polymers 0.000 description 5
- 239000000344 soap Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 230000003373 anti-fouling effect Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 229920000620 organic polymer Polymers 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011941 photocatalyst Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002407 reforming Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 101100325793 Arabidopsis thaliana BCA2 gene Proteins 0.000 description 1
- 108010040864 CERE Proteins 0.000 description 1
- 102100022210 COX assembly mitochondrial protein 2 homolog Human genes 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 102100033041 Carbonic anhydrase 13 Human genes 0.000 description 1
- 102100033779 Collagen alpha-4(IV) chain Human genes 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 101000900446 Homo sapiens COX assembly mitochondrial protein 2 homolog Proteins 0.000 description 1
- 101000867860 Homo sapiens Carbonic anhydrase 13 Proteins 0.000 description 1
- 101000710870 Homo sapiens Collagen alpha-4(IV) chain Proteins 0.000 description 1
- 101100257194 Homo sapiens SMIM8 gene Proteins 0.000 description 1
- 101000879758 Homo sapiens Sjoegren syndrome nuclear autoantigen 1 Proteins 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 101100135116 Oryza sativa subsp. japonica RR12 gene Proteins 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 102100037330 Sjoegren syndrome nuclear autoantigen 1 Human genes 0.000 description 1
- 102100024789 Small integral membrane protein 8 Human genes 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Chemical group 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010107 reaction injection moulding Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- BTURAGWYSMTVOW-UHFFFAOYSA-M sodium dodecanoate Chemical compound [Na+].CCCCCCCCCCCC([O-])=O BTURAGWYSMTVOW-UHFFFAOYSA-M 0.000 description 1
- 229940082004 sodium laurate Drugs 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、浴槽、洗い場(防
水パン)、洗面カウンター等の水周りの住宅設備機器・
機材用として好適に使用できるシリカ膜被覆成形体の製
造法と、その製造法により得られるシリカ膜被覆成形体
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to equipment for housing equipment around water such as bathtubs, washing areas (waterproof pans) and washbasins.
The present invention relates to a method for producing a silica film-coated molded article that can be suitably used for equipment and a silica film-coated molded article obtained by the production method.
【0002】[0002]
【従来の技術】樹脂成形体は軽量で量産に向くことか
ら、浴槽、浴槽エプロン、洗い場(防水パン)、浴室
壁、洗面ボウル、洗面カウンター、食器、壁材、床材等
の住宅設備機器・機材(又は建材)のほか、自動車部
品、電気・電子部品等の幅広い製品分野に広く使用され
ている。他方、樹脂成形体は汚れが付きやすく落ちにく
い難点(汚染性/難清掃性)や、耐熱性・耐摩耗性に劣
る等の難点もあるので、これらの性状を向上させるため
に、樹脂成形体表面に(シリカ膜等の)無機酸化物の皮
膜を形成させる方法も従来からいくつか知られている。2. Description of the Related Art Since resin molded products are lightweight and suitable for mass production, housing equipment such as bathtubs, bathtub aprons, washrooms (waterproof pans), bathroom walls, washbasins, washroom counters, dishes, wall materials, flooring materials, etc. In addition to equipment (or building materials), it is widely used in a wide range of product fields such as automobile parts and electric / electronic parts. On the other hand, resin moldings have the drawback that they are easily soiled and difficult to remove (contamination / difficulty cleaning) and that they are inferior in heat resistance and abrasion resistance. Therefore, in order to improve these properties, resin moldings There are several known methods for forming a film of an inorganic oxide (such as a silica film) on the surface.
【0003】住宅設備機器の関連では、水回りの樹脂成
形体、例えば、浴槽の表面にアナターゼ型酸化チタン等
の光触媒粒子含有層を形成させ、浴槽表面を親水化する
方法(特開平10−225393号公報)等が知られて
いる。In the field of housing equipment, a method for forming a layer containing photocatalyst particles such as anatase type titanium oxide on the surface of a resin molding around water, for example, the surface of a bath to make the surface of the bath hydrophilic (Japanese Patent Laid-Open No. 10-225393). No. gazette) is known.
【0004】また、電気・電子部品の関連では、樹脂表
面に無機ポリシラザンを塗布し、100〜200℃で熱
処理して硬化膜を形成させると(又は塗布物を電子線処
理して硬化膜を形成させると)、樹脂成形体の耐熱性・
耐摩耗性及び耐薬品性を向上させることが知られている
(特開平8−143689号公報/特許第313641
2号公報)。そのほか、ポリシラザンとグリシドールと
を加熱反応して得られるグリシドール付加ポリシラザン
含有のコーティング用組成物を基材上に塗布し、これを
50℃以上で焼成するか、50℃未満に保持すると、耐
熱性・耐摩耗性及び耐食性に優れたセラミック膜が得ら
れることも知られている(特開平6−122852号公
報)。Further, in the field of electric / electronic parts, when inorganic polysilazane is applied to the surface of resin and heat-treated at 100 to 200 ° C. to form a cured film (or the applied material is subjected to electron beam treatment to form a cured film). The heat resistance of the resin molding.
It is known to improve wear resistance and chemical resistance (Japanese Patent Laid-Open No. 8-143689 / Japanese Patent No. 313641).
No. 2). In addition, when a coating composition containing a glycidol-added polysilazane obtained by reacting polysilazane and glycidol with heating is applied onto a substrate and baked at 50 ° C. or higher, or kept at less than 50 ° C., heat resistance It is also known that a ceramic film having excellent wear resistance and corrosion resistance can be obtained (JP-A-6-122852).
【0005】[0005]
【発明が解決しようとする課題】しかし、前記した住宅
設備機器関連については、アナターゼ型酸化チタン等の
光触媒粒子含有層を形成させ親水化する方法では、表面
に形成された光触媒粒子含有層(膜)の耐久性等に難点
がある。現状では、浴槽をはじめとする住宅設備水回り
の樹脂成形体の多くは、親水処理されていない(すなわ
ち、無機酸化物の皮膜を有しない)樹脂成形体が使われ
ている。However, regarding the above-mentioned housing equipment, the method of forming a photocatalyst particle-containing layer of anatase type titanium oxide or the like to hydrophilize the photocatalyst particle-containing layer (membrane ) Has a difficulty in durability. At present, most of the resin moldings around the water of the housing facility such as a bathtub are resin moldings that are not subjected to hydrophilic treatment (that is, do not have a film of inorganic oxide).
【0006】本発明は、住宅設備の水回りに使われる機
器・機材に好適に使用される成形体で、汚れが付きにく
く(防汚染性)、あるいは付いた汚れは落としやすい
(易清掃性)シリカ膜被覆成形体の製造法、及びその製
造法によりつくられたシリカ膜被覆成形体を提供するも
のである。[0006] The present invention is a molded article suitable for use in equipment and equipment used around the water of residential equipment. It is difficult for dirt to adhere (anti-contamination) or dirt that adheres is easy to remove (easy cleaning). The present invention provides a method for producing a silica film-coated molded article, and a silica film-coated molded article produced by the method.
【0007】[0007]
【課題を解決するための手段】有機高分子である樹脂成
形体の表面は通常は撥水性であり、これを親水化するた
めには表面を親水性膜でコートする必要がある。しか
し、基材樹脂(有機高分子)と親水性膜形成材料(大抵
は無機材料)との組み合わせは、両者の有機/無機の違
いや物性の違いから密着性が悪くなることが多く、この
問題を解決することが重要となる。The surface of a resin molded body, which is an organic polymer, is usually water repellent, and it is necessary to coat the surface with a hydrophilic film in order to make it hydrophilic. However, the combination of a base resin (organic polymer) and a hydrophilic film-forming material (usually an inorganic material) often results in poor adhesion due to the difference in the organic / inorganic nature and physical properties of the two. It is important to solve
【0008】本発明者らは、基材樹脂を被覆する親水性
膜形成材料及び成膜条件を種々検討している過程で、樹
脂基材(樹脂基板)上にシランカップリング剤を下塗り
して固体膜を形成させた後、この上にポリシラザン含有
液の層を形成し、そののち加熱してシリカ転化反応させ
る(すなわち、2液2ベーク)か、あるいはポリシラザ
ンとシランカップリング剤との混合液を用いてシリカ転
化反応させる(すなわち、1液1ベーク)と、密着性が
高く、親水性・防汚染性があり、また、硬くて、耐摩耗
性もあるシリカ膜被覆樹脂成形体が安定して得られるこ
とが分かり、本発明を完成するに至った。The present inventors, in the process of variously studying the hydrophilic film forming material and the film forming conditions for coating the base resin, undercoat a silane coupling agent on the resin base material (resin substrate). After forming a solid film, a layer of a polysilazane-containing liquid is formed on the solid film and then heated to cause a silica conversion reaction (that is, 2 liquids and 2 baking), or a mixed liquid of polysilazane and a silane coupling agent. When a silica conversion reaction is performed using (1 liquid 1 bake), a silica film-coated resin molded product that has high adhesion, hydrophilicity and stain resistance, and is hard and wear-resistant is stable. The present invention has been completed and the present invention has been completed.
【0009】すなわち、本発明法は、基材(基板)上に
シランカップリング剤を下塗りして固体膜を形成させた
のち、この上にポリシラザン含有液(ワニス)の層を形
成し、シリカ転化反応処理することを特徴とするシリカ
膜被覆成形体の製造法(2液2ベーク)である。That is, according to the method of the present invention, after a silane coupling agent is undercoated on a substrate (substrate) to form a solid film, a layer of a polysilazane-containing solution (varnish) is formed on the solid film and silica conversion is performed. It is a method for producing a silica film-covered molded product (2 liquid, 2 bake), which is characterized by performing a reaction treatment.
【0010】予め、基材上にシランカップリング剤を下
塗りすることなく、ポリシラザン及びシランカップリン
グ剤の両方を含有する液(ワニス)を基材上に層状に形
成させ、シリカ転化反応処理してもよい(1液1ベー
ク)。A liquid (varnish) containing both a polysilazane and a silane coupling agent is formed in a layer on the base material in advance without undercoating the silane coupling agent on the base material and subjected to a silica conversion reaction treatment. Good (1 liquid 1 bake).
【0011】上記ポリシラザンとしては好ましくはペル
ヒドロポリシラザンを用いる。Perhydropolysilazane is preferably used as the polysilazane.
【0012】また、上記シリカ転化反応処理の温度及び
時間は、反応後の成形体表面を赤外線吸収スペクトル法
で分析するときの「SiHの吸光度」/「SiOの吸光
度」(2400cm-1における吸光度をベースラインと
する)の比が3.0以下となるように決めるとよい。不
足又は過剰な処理(加熱及び時間)を防止でき、省エネ
ルギーにもなる。The temperature and time for the above silica conversion reaction treatment are as follows: "SiH absorbance" / "SiO absorbance" (absorbance at 2400 cm -1 when the surface of the molded article after the reaction is analyzed by infrared absorption spectroscopy). It is advisable to determine that the ratio of (baseline) is 3.0 or less. Insufficient or excessive treatment (heating and time) can be prevented, and energy can be saved.
【0013】上記シリカ転化反応処理の温度は、反応を
促進するためには、好ましくは100〜200℃で加熱
し、更に好ましくは120〜170℃で加熱する。The temperature of the above silica conversion reaction treatment is preferably 100 to 200 ° C., more preferably 120 to 170 ° C., in order to accelerate the reaction.
【0014】本発明は、また、上記製造法で製造された
シリカ膜被覆成形体であって、その成形体表面は下記
(a)〜(f)のいずれか一又は二以上(好ましくは、
全項目)の特性を有するシリカ膜被覆成形体にも関す
る。
(a)水との接触角:50°以下
(b)表面を赤外線吸収スペクトル法で分析するとき、
「SiHの吸光度」/「SiOの吸光度」(2400c
m-1における吸光度をベースラインとする)の比:3.
0以下。この比は小さいほどシリカ転化が進んでいるこ
とを示す。
(c)耐摩耗性:1,000回以上
(d)密着性:テープ試験法で試験するとき「剥離な
し」
(e)表面硬度:鉛筆強度として3H以上
(f)耐熱水性:50h以上
なお、各々の試験方法は後述する。The present invention also provides a silica film-coated molded product manufactured by the above-mentioned manufacturing method, wherein the surface of the molded product is any one or more of the following (a) to (f) (preferably:
It also relates to a silica film-coated molded product having the characteristics of (all items). (A) Contact angle with water: 50 ° or less (b) When the surface is analyzed by infrared absorption spectroscopy,
"Absorbance of SiH" / "Absorbance of SiO" (2400c
Ratio of the absorbance at m −1 as a baseline): 3.
0 or less. The smaller this ratio is, the more the silica conversion is advanced. (C) Abrasion resistance: 1,000 times or more (d) Adhesion: "No peeling" when tested by the tape test method (e) Surface hardness: 3H or more as pencil strength (f) Hot water resistance: 50h or more Each test method will be described later.
【0015】上記シリカ被覆成形体は、住宅設備用機器
・機材(又は建材)等に好ましく適用できる。The silica-coated molded article can be preferably applied to equipment / equipment (or building material) for housing equipment.
【0016】本発明では、また、ポリシラザン含有液を
シリカ転化反応させて、シリカ膜(架橋ポリシラザンを
含む、シリカを主成分とする皮膜)を形成させる場合の
シリカ膜の評価方法も開示する。赤外線吸収スペクトル
法で測定した「SiHの吸光度」/「SiOの吸光度」
(2400cm-1における吸光度をベースラインとす
る)の比(Z)をシリカ転化度の指標として評価するの
である。The present invention also discloses a method of evaluating a silica film when a polysilazane-containing liquid is subjected to a silica conversion reaction to form a silica film (a film containing silica as a main component, which contains crosslinked polysilazane). "SiH absorbance" / "SiO absorbance" measured by infrared absorption spectroscopy
The ratio (Z) of (the absorbance at 2400 cm −1 is the baseline) is evaluated as an index of the degree of silica conversion.
【0017】赤外線吸収スペクトル法としては、一般的
なKBr法用いることもできるが、好ましくは、減衰全
反射(ATR)赤外線吸収スペクトル法である。基材表
面に形成されたシリカ膜を直接に分析できるからであ
る。As the infrared absorption spectrum method, a general KBr method can be used, but an attenuated total reflection (ATR) infrared absorption spectrum method is preferable. This is because the silica film formed on the surface of the base material can be directly analyzed.
【0018】[0018]
【作用】有機高分子である基材の表面に下塗りされるシ
ランカップリング剤は、有機官能基を含んでいるので基
材に親和性を有し、「プライマ」(基材の有機成分とコ
ート材の無機成分との密着性を改善するもの)として作
用すると考えている。また、シランカップリング剤を下
塗りする代わりに、ポリシラザン及びシランカップリン
グ剤の両方を含む液(ワニス)を基材上に塗布した場合
も、そのシランカップリング剤は「プライマ」と同様の
作用をしていると考えられる。そのため、シランカップ
リング剤非含有のポリシラザン液を使用した場合に比べ
て、密着性(特に、耐熱水性で評価される密着性)に優
れている。[Function] The silane coupling agent, which is an undercoat on the surface of the base material that is an organic polymer, has an affinity for the base material because it contains an organic functional group. It is thought to act as a material (which improves the adhesion to the inorganic components of the material). Also, when a liquid (varnish) containing both polysilazane and a silane coupling agent is applied onto a substrate instead of undercoating the silane coupling agent, the silane coupling agent has the same action as the "primer". it seems to do. Therefore, as compared with the case of using a polysilazane solution containing no silane coupling agent, the adhesiveness (particularly, the adhesiveness evaluated by hot water resistance) is excellent.
【0019】基材表面に層状に塗布されたポリシラザン
は、硬化剤及び/又は触媒の存在下に酸化雰囲気中で加
熱されると、架橋反応が進行しつつ、ネットワーク中の
窒素原子に代わって酸素原子が取り込まれ、重量増加を
伴いながらシリカに転化していく(シリカ転化反応)。
このシリカ転化反応の際の収縮は、ゾルゲル法等のシリ
カ転化に比べて少なく、クラック等は発生しにくい。比
較的厚い膜を形成させやすい。When the polysilazane applied as a layer on the surface of the base material is heated in an oxidizing atmosphere in the presence of a curing agent and / or a catalyst, the crosslinking reaction proceeds and oxygen replaces the nitrogen atoms in the network. Atoms are taken in and converted to silica with an increase in weight (silica conversion reaction).
Shrinkage during the silica conversion reaction is smaller than that in the silica conversion such as the sol-gel method, and cracks are less likely to occur. It is easy to form a relatively thick film.
【0020】更に、本発明で製造された成形体の表面に
は、親水性の高いシリカ膜が密着して形成されているの
で、水との接触角はシリカ膜の無い成形体表面に比べて
小さく、当然に親水性が高い。すなわち、本発明のシリ
カ膜被覆成形体表面に脂汚れや石鹸カス(金属石鹸)等
は付着しにくく、付着したとしても水で容易に流し去る
ことができる。すなわち、防汚染性(易清掃性)が高
い。Furthermore, since the highly hydrophilic silica film is formed in close contact with the surface of the molded product produced by the present invention, the contact angle with water is higher than that of the surface of the molded product without the silica film. Small and naturally highly hydrophilic. That is, greasy dirt, soap residue (metal soap), etc. are unlikely to adhere to the surface of the silica film-coated molded article of the present invention, and even if they do, they can be easily washed off with water. That is, the stain resistance (easy cleaning) is high.
【0021】[0021]
【発明の実施の形態】本発明で用いられる基材(基板)
としては、ポリプロピレン、ポリエチレン、ポリカーボ
ネート、ポリイミド、ポリエチレンテレフタレート、ナ
イロン、アクリル、ポリ塩化ビニル、ポリスチレン、不
飽和ポリエステル、エポキシ、ポリウレタン、フェノー
ル系樹脂、ABS樹脂等の樹脂がある。ジシクロペンタ
ジエンを原料として反応射出成形で得られる樹脂(又は
成形体)でもよい。また、SMC、BMC等のプラスチ
ック成形材料を用い、成形型(多くは、金属製)を用い
てプレス成形された樹脂(又は成形体)でもよい。樹脂
のほかにも、木材等の有機高分子材も利用可能である。
これらの基材は、表面にポリシラザン含有液の層を形成
させたあとに、反応促進のため加熱する場合もありうる
ことを考慮すると、その加熱に耐えうるものが好まし
い。樹脂では、軟化点は好ましくは100℃以上(更に
好ましくは、130℃以上)のものである。BEST MODE FOR CARRYING OUT THE INVENTION Base material (substrate) used in the present invention
Examples of the resin include polypropylene, polyethylene, polycarbonate, polyimide, polyethylene terephthalate, nylon, acrylic, polyvinyl chloride, polystyrene, unsaturated polyester, epoxy, polyurethane, phenolic resin and ABS resin. It may be a resin (or molded body) obtained by reaction injection molding using dicyclopentadiene as a raw material. Further, a resin (or a molded body) which is press-molded using a molding die (mostly made of metal) using a plastic molding material such as SMC or BMC may be used. In addition to resins, organic polymer materials such as wood can also be used.
Considering that the base material may be heated to accelerate the reaction after the layer of the polysilazane-containing liquid is formed on the surface, a material capable of withstanding the heating is preferable. The softening point of the resin is preferably 100 ° C. or higher (more preferably 130 ° C. or higher).
【0022】本発明で用いるポリシラザン含有液は、ポ
リシラザンを含む液状物(ワニス)とする。ここで、ポ
リシラザンは、次の化1の繰返し単位を有するオリゴマ
ないしはポリマであり、環状ポリシラザンでも、鎖状ポ
リシラザン、環状及び鎖状構造の両構造をもつポリシラ
ザンでもよい。The polysilazane-containing liquid used in the present invention is a liquid substance (varnish) containing polysilazane. Here, the polysilazane is an oligomer or polymer having the repeating unit of the following chemical formula 1, and may be a cyclic polysilazane, a chain polysilazane, or a polysilazane having both a cyclic structure and a chain structure.
【0023】[0023]
【化1】 [Chemical 1]
【0024】なお、化1中、Rは、水素原子、アルキル
基、アルケニル基、シクロアルキル基、アリール基、ア
ルキルシリル基、アルキルアミノ基、アルコキシ基等を
表し、3つのRは同じでも異なってもよい。In the chemical formula 1, R represents a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group or the like, and three Rs are the same or different. Good.
【0025】ポリシラザンの好ましいものの一つは、前
記化1におけるRが全て水素原子で、分子内に鎖状部分
と環状部分をもち、分子量(数平均分子量)が100〜
50,000のペルヒドロポリシラザンである。One of the preferable polysilazanes is that R in the above chemical formula 1 is all hydrogen atoms, has a chain portion and a cyclic portion in the molecule, and has a molecular weight (number average molecular weight) of 100 to 100.
It is 50,000 perhydropolysilazane.
【0026】更に、上記ポリシラザンをトリアルキルア
ミンのような第3級アミン類、立体障害性置換基をもつ
第2級アミン類、又はフォスフィン等の塩基性溶媒中、
あるいは非塩基性の炭化水素類の溶媒中で、脱水素縮合
反応を行わせることにより得られる分子量200〜50
0,000のものも使用できる。Further, the above polysilazane is added to a tertiary amine such as a trialkylamine, a secondary amine having a sterically hindering substituent, or a basic solvent such as phosphine,
Alternatively, a molecular weight of 200 to 50 obtained by performing a dehydrogenative condensation reaction in a solvent of non-basic hydrocarbons
Those of 10,000 can also be used.
【0027】あるいは、無機ポリシラザンの改質反応に
より得られるもので、架橋結合−NH−又は−NH−N
H−を有し、N/Si比が0.8以上の分子量200〜
50,000のものも使用できる。組成式が(RSiH
NH)X[(RSiH)1.5N]Y(但し、Rは化1中に
おける意味と同じであり、Yは1−Xであり、0.4<
X<1である。)で表されるポリオルガノヒドロシラザ
ンも使用できる。Alternatively, it is obtained by a modification reaction of inorganic polysilazane, and has a cross-linking bond —NH— or —NH—N.
H-, N / Si ratio of 0.8 or more molecular weight 200 ~
Those of 50,000 can also be used. The composition formula is (RSiH
NH) X [(RSiH) 1.5 N] Y (where R is as defined in Chemical Formula 1, Y is 1-X, and 0.4 <
X <1. ) Polyorganohydrosilazane represented by
【0028】更には、酸素を含有させたポリシロキサザ
ンや金属アルコキシド等を反応させたポリメタロシラザ
ン、有機硼素化合物を反応させたポリボロシラザンも使
用できる。以上の各種ポリシラザンは、通常は、室温で
液体又は固体である。Further, polysiloxazane containing oxygen, polymetallosilazane obtained by reacting a metal alkoxide, or polyborosilazane obtained by reacting an organic boron compound can be used. The above-mentioned various polysilazanes are usually liquid or solid at room temperature.
【0029】また、本発明で使用するポリシラザンは、
基材との密着性の点では、ケイ素や窒素に結合している
活性水素原子数の割合の高いものが好ましい。ケイ素原
子と窒素原子との合計原子数100に対し、活性水素原
子数は好ましくは90以上、更に好ましくは100〜1
50(ペルヒドロポリシラザンは150)である。The polysilazane used in the present invention is
In terms of adhesion to the base material, a material having a high ratio of active hydrogen atoms bonded to silicon or nitrogen is preferable. The number of active hydrogen atoms is preferably 90 or more, and more preferably 100 to 1 with respect to the total number of silicon atoms and nitrogen atoms of 100.
50 (150 for perhydropolysilazane).
【0030】ポリシラザンには、必要に応じて、有機ア
ミンやカルボン酸無水物、イソシアネート、チオール、
カルボジイミド、金属アルコキシド、金属ハロゲン化物
等の硬化剤を添加することができる。低温でシリカ転化
させるため、ニッケル、白金、パラジウム、アルミニウ
ム、アミン類等の触媒を用いることもできる。また、必
要に応じて、金属粉末、セラミック粉末、消泡剤、界面
活性剤、紫外線吸収剤、レベリング剤、帯電防止剤、分
散剤、顔料、チキソトロピー性付与剤等を添加してもよ
い。The polysilazane may include organic amine, carboxylic acid anhydride, isocyanate, thiol,
A curing agent such as carbodiimide, metal alkoxide, metal halide or the like can be added. In order to convert silica at a low temperature, it is possible to use a catalyst such as nickel, platinum, palladium, aluminum and amines. Further, if necessary, metal powder, ceramic powder, defoaming agent, surfactant, ultraviolet absorber, leveling agent, antistatic agent, dispersant, pigment, thixotropic agent, etc. may be added.
【0031】本発明で用いるシランカップリング剤は、
一般式XSiQ3で表される化合物である。ここで、X
は有機基と反応し得る官能基であり、Qは加水分解可能
な官能基である。更に具体的には、Xがビニル基、メタ
クリロキシ基、エポキシ基、アミノ基、イソシアネート
基、メルカプト基、又はハロゲン等であり、Qがメトキ
シ基、エトキシ基のようなアルコキシ基、あるいはハロ
ゲン等である。これらのうちのいくつかは市販品を入手
できる。適宜、選択して用いる。The silane coupling agent used in the present invention is
It is a compound represented by the general formula XSiQ 3 . Where X
Is a functional group capable of reacting with an organic group, and Q is a hydrolyzable functional group. More specifically, X is a vinyl group, a methacryloxy group, an epoxy group, an amino group, an isocyanate group, a mercapto group, or a halogen, and Q is an alkoxy group such as a methoxy group or an ethoxy group, or a halogen. . Some of these are commercially available. Appropriately select and use.
【0032】シランカップリング剤の使用量は、その
「プライマ」作用を考慮して決めればよい。シランカッ
プリング剤/ポリシラザンの(最終の)比率で、好まし
くは10/90〜90/10(重量比)とする。The amount of the silane coupling agent used may be determined in consideration of its "primer" action. The (final) ratio of silane coupling agent / polysilazane is preferably 10/90 to 90/10 (weight ratio).
【0033】シランカップリング剤を「プライマ」とし
て下塗りに用いる場合、メタノール、エタノール、プロ
パノール、ブタノール等のアルコールで0.1〜50重
量%程度に希釈する。これを基材上に塗布し、70〜1
30℃程度の温度で、5〜20分間加熱して膜(下地
膜)を形成させる。When the silane coupling agent is used as the "primer" for the undercoat, it is diluted with an alcohol such as methanol, ethanol, propanol or butanol to about 0.1 to 50% by weight. This is applied on the base material and 70 to 1
A film (base film) is formed by heating at a temperature of about 30 ° C. for 5 to 20 minutes.
【0034】次に、硬化剤及び/又は触媒入りのポリシ
ラザン(ワニス)を溶媒で適当に希釈し、基材上にコー
トする。このとき、ポリシラザン層の厚みは、防汚染
性、耐摩耗性、耐熱水性を損なわない範囲とする。被覆
固体膜としての膜厚は、好ましくは0.5μm〜5.0
μm、更に好ましくは、1.0μm〜2.0μmであ
る。なお、膜厚が薄すぎると耐摩耗性が低下気味とな
り、厚すぎるとクラックが発生気味となる。Next, a polysilazane (varnish) containing a curing agent and / or a catalyst is appropriately diluted with a solvent and coated on a substrate. At this time, the thickness of the polysilazane layer is set within a range that does not impair stain resistance, abrasion resistance, and hot water resistance. The thickness of the coated solid film is preferably 0.5 μm to 5.0.
μm, and more preferably 1.0 μm to 2.0 μm. If the film thickness is too thin, the wear resistance tends to decrease, and if it is too thick, cracks tend to occur.
【0035】ポリシラザンの希釈溶媒としては、脂肪族
炭化水素系溶媒、ハロゲン化炭化水素系溶媒、脂環式炭
化水素系溶媒、芳香族炭化水素系溶媒、エーテル系溶媒
等があり、これを単独あるいは複数混合して用いる。Examples of the polysilazane diluting solvent include an aliphatic hydrocarbon solvent, a halogenated hydrocarbon solvent, an alicyclic hydrocarbon solvent, an aromatic hydrocarbon solvent and an ether solvent, which may be used alone or Use a mixture of two or more.
【0036】次に、酸化雰囲気(空気でも可)中に所定
時間加熱し、シリカ膜を形成させる。このときの加熱温
度や加熱時間は、前記したように、成形体表面を赤外線
吸収スペクトル法で分析するときの「SiHの吸光度」
/「SiOの吸光度」(2400cm-1における吸光度
をベースラインとする)の比が3.0以下となるように
決めることもでき、また、作業性及び基材樹脂の溶融点
(又は分解点)等も考慮して決めることができる。基材
がSMC(ポリエステル樹脂)の場合は、好ましくは1
00〜200℃、更に好ましくは120〜170℃であ
る。また、加熱時間は好ましくは30分〜2時間程度で
ある。この処理により、シリカ膜(架橋ポリシラザン膜
を含む、シリカを主成分とする膜)が形成する。なお、
被覆表面の親水性を高めるために、このあと更に、弱ア
ルカリ性水(pH9〜12)で処理したり、温水で処理
してもよい(但し、浴室用の浴槽、防水パン等は使用時
に湯水に晒されるので、敢えて、この処理をすることは
ない)。Next, a silica film is formed by heating in an oxidizing atmosphere (air may be used) for a predetermined time. The heating temperature and the heating time at this time are, as described above, the "absorbance of SiH" when the surface of the molded body is analyzed by the infrared absorption spectrum method.
The ratio of "/ absorbance of SiO" (based on the absorbance at 2400 cm -1 ) can be determined to be 3.0 or less, and workability and melting point (or decomposition point) of the base resin can be determined. Etc. can be taken into consideration when deciding. When the base material is SMC (polyester resin), preferably 1
The temperature is from 00 to 200 ° C, more preferably from 120 to 170 ° C. The heating time is preferably about 30 minutes to 2 hours. By this treatment, a silica film (a film containing silica as a main component, including a crosslinked polysilazane film) is formed. In addition,
In order to increase the hydrophilicity of the coated surface, it may be further treated with weak alkaline water (pH 9 to 12) or hot water (however, bath tubs for bathrooms, waterproof pans, etc. should be treated with hot water at the time of use). I'm not exposed to this, so I don't dare to do this).
【0037】シランカップリング剤やポリシラザン含有
液のコート方法は、公知の方法、例えば、スプレーコー
ト、スピンコート、ディップコート、フローコート等に
より行うことができる。The silane coupling agent or the polysilazane-containing liquid can be coated by a known method such as spray coating, spin coating, dip coating or flow coating.
【0038】基材上にシランカップリング剤を下塗りす
る代わりに、ポリシラザン及びシランカップリング剤の
両方を含有する液(ワニス)を基材上に層状に形成さ
せ、加熱してシリカ転化反応させてもよい(1液1ベー
ク)。この場合は、ポリシラザンとシランカップリング
剤とを、その比率が10/90〜90/10(重量比)
となるように混ぜ、溶媒で0.1〜50重量%程度の濃
度に希釈した混合液を用いる。Instead of undercoating the substrate with the silane coupling agent, a liquid (varnish) containing both the polysilazane and the silane coupling agent is formed in a layer on the substrate and heated to cause a silica conversion reaction. Good (1 liquid 1 bake). In this case, the ratio of polysilazane and silane coupling agent is 10/90 to 90/10 (weight ratio).
The mixed liquid is used so that the mixed liquid is diluted to a concentration of about 0.1 to 50% by weight with a solvent.
【0039】この混合液を基材に塗布し、加熱する。こ
のときの温度及び時間は、前述した条件と同様である。This mixed solution is applied to a base material and heated. The temperature and time at this time are the same as the above-mentioned conditions.
【0040】なお、前記シランカップリング剤塗布後の
処理温度、その後のポリシラザン含有液塗布後の処理温
度、あるいは、シランカップリング剤とポリシラザンと
の混合液の塗布後の処理温度は、室温(0〜30℃)と
することもできる。また、30〜100℃のあいだの適
当な温度とすることもできる。シリカ転化反応では、そ
の処理温度が低いほどシリカ転化反応は時間(日数)を
要し、換言すれば、赤外線吸収スペクトル法で測定した
「SiHの吸光度」/「SiOの吸光度」の比(Z)が
3.0以下になるまでには時間(日数)を要するが、こ
のように100℃未満でもシリカ転化反応させうること
は、浴室リフォーム等の場合に特に有効となる。The treatment temperature after applying the silane coupling agent, the treatment temperature after applying the polysilazane-containing solution thereafter, or the treatment temperature after applying the mixed solution of the silane coupling agent and polysilazane is room temperature (0 -30 ° C). It is also possible to use a suitable temperature between 30 and 100 ° C. In the silica conversion reaction, the lower the treatment temperature is, the longer the time (days) is required for the silica conversion reaction. In other words, the ratio (Z) of “SiH absorbance” / “SiO absorbance” measured by infrared absorption spectroscopy. Is required to be 3.0 or less, but it is particularly effective in the case of bathroom reforming or the like that the silica conversion reaction can be performed at less than 100 ° C.
【0041】図1は、基材に5%ポリシラザンNP−1
00(キシレン溶媒)(クラリアントジャパン株式会社
製)をコートし、室温に放置(4h及び96h)したと
きの赤外線吸収スペクトルの変化を示すチャートであ
る。室温で放置する時間の経過とともに、SiHの吸光
度は減少し、SiOの吸光度は増加し、したがって、
「SiHの吸光度」/「SiOの吸光度」の比(Z)は
減少しながらシリカ転化が進んでいくことが、このチャ
ートから分かる。FIG. 1 shows that 5% polysilazane NP-1 was used as the base material.
It is a chart which shows the change of the infrared absorption spectrum when 00 (xylene solvent) (made by Clariant Japan Co., Ltd.) is coated and left at room temperature (4 h and 96 h). With the passage of time at room temperature, the absorbance of SiH decreases and the absorbance of SiO increases, so
It can be seen from this chart that the silica conversion proceeds while the ratio (Z) of "absorbance of SiH" / "absorbance of SiO" decreases.
【0042】かくして、親水性シリカ膜で被覆された成
形体が得られる。シリカ膜被覆成形体の用途としては、
浴槽、浴槽エプロン、洗い場床(防水パン)、浴室壁、
洗面ボウル、洗面カウンター、キッチンカウンター、キ
ッチンキャビネット構成部材、食器、壁材、床材等の住
宅設備機器・機材(又は建材)がある。その他、自動車
部品等にも応用できる。Thus, a molded article coated with the hydrophilic silica film is obtained. The use of the silica film-coated molded article is as follows:
Bathtub, bathtub apron, wash floor (waterproof pan), bathroom wall,
There are household equipment and equipment (or building materials) such as wash bowls, wash counters, kitchen counters, kitchen cabinet components, tableware, wall materials and floor materials. In addition, it can be applied to automobile parts.
【0043】用途が、浴槽、浴槽エプロン、洗い場床
(防水パン)、浴室壁等の浴室やキッチンカウンター、
洗面台などの水回りの住宅設備機器・機材等の防汚染機
能付与を主たる目的である場合には、塗膜表面を高度に
親水性とすることで、石鹸カス・油汚れなどの除去性を
大幅に向上させる。Applications include bathtubs, bathtub aprons, wash floors (waterproof pans), bathroom walls such as bathroom walls, kitchen counters,
When the main purpose is to add antifouling functions to household equipment and equipment around water such as washbasins, by making the surface of the coating film highly hydrophilic, it is possible to remove soap residue, oil stains, etc. Greatly improve.
【0044】[0044]
【実施例】以下、実施例により本発明を更に具体的に説
明する。なお、基材(成形板)は不飽和ポリエステル樹
脂を用いたSMC成形板を用い、各々の評価方法は次の
通り。また、文中、%は特に示さない限り重量%を意味
する。
<水との接触角>協和界面科学(株)製の接触角計「G
A−X150型」を使用した。なお、接触角の小さいほ
ど、プラスチック成形品表面の親水性が高いことを示
す。The present invention will be described in more detail with reference to the following examples. The base material (molded plate) is an SMC molded plate using an unsaturated polyester resin, and each evaluation method is as follows. In the text,% means% by weight unless otherwise specified. <Contact angle with water> Kyowa Interface Science Co., Ltd. contact angle meter "G
A-X150 type "was used. The smaller the contact angle, the higher the hydrophilicity of the surface of the plastic molded product.
【0045】<耐摩耗性>市販の浴槽用ネット付きスポ
ンジ(ウレタン)を用い、乾いた状態で49Nの荷重を
掛けて摩耗し、摩耗後の膜の剥離の有無をみた。50、
100、200、300、400、500、1000
(回)、以降500回ごとに目視確認し、10,000
回まで行った。<Abrasion resistance> Using a commercially available sponge (urethane) with a net for a bath, a dry load was applied with a load of 49 N, and the film was abraded, and the presence or absence of peeling of the film after abrasion was checked. Fifty,
100, 200, 300, 400, 500, 1000
(Times), after every 500 times, visually check 10,000 times
Went up to times.
【0046】<密着性> テープ試験法(JIS−K−5400)で評価した。 ○:剥離なし △:0〜10 ×:10以上<Adhesion> The tape test method (JIS-K-5400) evaluated. ◯: No peeling Δ: 0 to 10 ×: 10 or more
【0047】<表面硬度>鉛筆硬度(JIS−K−54
00)で評価した。
<ハードコート性(HC性)>ハードコート性(HC
性)はスチールウールを用い、10kPaの圧力で10
0往復擦り、擦った後の擦過傷の本数で評価した
○:0〜2本 △:3〜10本 ×:10本以上<Surface hardness> Pencil hardness (JIS-K-54
It evaluated by 00). <Hard coat property (HC property)> Hard coat property (HC property
Property) uses steel wool at a pressure of 10 kPa for 10
0 reciprocating rubbing, evaluated by the number of scratches after rubbing ○: 0 to 2 △: 3 to 10 ×: 10 or more
【0048】<防汚染性>ラウリン酸ナトリウムを温水
に溶かし塩化カルシウムを添加すると、石鹸カスに似た
脂肪酸カルシウム(スカム)が生成する。このスカムの
浮いたカップに試験片を10回出し入れし、試験片表面
にそのスカムを強制的に付着させ、その後、シャワーで
洗い流したときの汚れや光沢を目視した。
○:(汚れは)殆ど無し △:少し残っている ×:大
部分残っている<Anti-fouling property> When sodium laurate is dissolved in warm water and calcium chloride is added, fatty acid calcium (scum) similar to soap dregs is produced. The test piece was put into and taken out of the cup in which the scum was floated 10 times, the scum was forcibly adhered to the surface of the test piece, and then the stain and gloss when washed off with a shower were visually observed. ◯: Almost no (dirt) Δ: A little left ×: Most left
【0049】<耐熱水性>試験片を80℃の蒸留水に全
浸漬し、4時間毎に取り出し、取り出したのち濡れたペ
ーパータオルで約20Nの力で20回こすって外観と接
触角をみた(接触角が50°未満を合格として試験を継
続)。外観が劣化する時間、又は水との接触角が50°
以上となった時間を耐熱水性として評価した。<Hot water resistance> The test piece was completely immersed in distilled water at 80 ° C., taken out every 4 hours, and taken out and rubbed with a wet paper towel 20 times with a force of about 20 N to check the appearance and the contact angle (contact). The test is continued if the angle is less than 50 ° as passing. Time to deteriorate appearance or contact angle with water is 50 °
The above time was evaluated as hot water resistance.
【0050】<赤外線吸収スペクトル>減衰全反射(A
TR)赤外線吸収スペクトル法で測定した。<Infrared absorption spectrum> Attenuated total reflection (A
TR) Measured by infrared absorption spectroscopy.
【0051】実施例1(シランカップリング剤による前
処理+ポリシラザン塗布;2液2ベーク)
予め脱脂処理した基材に、5%のシランカップリング剤
A−1100(イソプロピルアルコール溶液)(日本ユ
ニカー株式会社製)をスプレーコートで塗布し、100
℃の乾燥炉内で10分乾燥させた。次いで、5%のポリ
シラザンNL−110(キシレン溶媒)(クラリアント
ジャパン株式会社製)をスプレーコートで塗布し、14
0℃の乾燥炉内で60分乾燥(架橋)させた。その後、
0.02%の水酸化ナトリウム水溶液で処理した。形成
した膜の性状(表1)については、水との接触角は25
°で、耐摩耗性、密着性、鉛筆硬度、防汚染性及び乾燥
性は良好であり、耐熱水性は100時間まで膜の剥離は
無かった。Example 1 (pretreatment with silane coupling agent + coating with polysilazane; 2 liquid / 2 bake) 5% silane coupling agent A-1100 (isopropyl alcohol solution) (Nihon Unicar Co., Ltd.) (Made by the company) is applied with a spray coat, and 100
It was dried in a drying oven at 0 ° C for 10 minutes. Next, 5% of polysilazane NL-110 (xylene solvent) (manufactured by Clariant Japan Co., Ltd.) was applied by spray coating, and 14
It was dried (crosslinked) for 60 minutes in a drying oven at 0 ° C. afterwards,
It was treated with a 0.02% aqueous sodium hydroxide solution. Regarding the properties of the formed film (Table 1), the contact angle with water is 25.
At o, the abrasion resistance, the adhesion, the pencil hardness, the stainproofing property and the drying property were good, and the hot water resistance did not peel the film up to 100 hours.
【0052】実施例2(ポリシラザン+シランカップリ
ング剤の混合液の塗布;1液1ベーク)
5%のポリシラザンNL−110(キシレン溶媒)(ク
ラリアントジャパン株式会社製)と2%のシランカップ
リング剤A−1100との混合液(キシレン溶媒)をコ
ート材とした。これを予め脱脂処理した基材にスプレー
コートで塗布し、140℃の乾燥炉内で60分乾燥(架
橋)させた。その後、0.02%の水酸化ナトリウム水
溶液で処理した。形成した膜の性状(表1)について
は、水との接触角は35°で、耐摩耗性、密着性、鉛筆
硬度、防汚染性及び乾燥性は良好であり、耐熱水性は1
00時間まで膜の剥離はなかった。Example 2 (Application of mixed solution of polysilazane + silane coupling agent; 1 liquid 1 bake) 5% polysilazane NL-110 (xylene solvent) (Clariant Japan KK) and 2% silane coupling agent A mixed solution (xylene solvent) with A-1100 was used as a coating material. This was spray-coated on a substrate that had been degreased in advance, and dried (crosslinked) for 60 minutes in a drying oven at 140 ° C. Then, it was treated with a 0.02% aqueous sodium hydroxide solution. Regarding the properties of the formed film (Table 1), the contact angle with water is 35 °, abrasion resistance, adhesion, pencil hardness, stain resistance and dryness are good, and hot water resistance is 1
There was no peeling of the film until 00 hours.
【0053】比較例1(ポリシラザン塗布;1液1ベー
ク)
予め脱脂処理した基材に、5%のポリシラザンNL−1
10(キシレン溶媒)(クラリアントジャパン株式会社
製)をスプレーコートで塗布後、140℃の乾燥炉内で
60分乾燥(架橋)させた。その後、0.02%の水酸
化ナトリウム水溶液で処理した。形成した膜の性状(表
1)については、水との接触角は25°で、耐摩耗性、
密着性、鉛筆硬度、防汚染性及び乾燥性は良好であっ
た。耐熱水性(80℃の蒸留水に全浸漬)試験では、膜
の剥離なしは20時間までで、実施例1及び実施例2よ
りも劣った。Comparative Example 1 (Coating with polysilazane; 1 liquid, 1 bake) 5% polysilazane NL-1 was applied to a substrate that had been degreased in advance.
10 (xylene solvent) (manufactured by Clariant Japan Co., Ltd.) was applied by spray coating, and then dried (crosslinked) in a drying oven at 140 ° C. for 60 minutes. Then, it was treated with a 0.02% aqueous sodium hydroxide solution. Regarding the properties of the formed film (Table 1), the contact angle with water is 25 °, wear resistance,
Adhesion, pencil hardness, stain resistance and dryness were good. In the hot water resistance test (total immersion in distilled water at 80 ° C.), no peeling of the film was observed for up to 20 hours, which was inferior to Examples 1 and 2.
【0054】比較例2
比較として、基材のみ(シリカ膜なし)の性状も表1に
示した。Comparative Example 2 For comparison, the properties of the substrate alone (without silica film) are also shown in Table 1.
【0055】[0055]
【表1】項目 実施例1 実施例2 比較例1 比較例2 水との接触角 25 35 25 75 耐摩耗性 >1万回 >1万回 >1万回 − 密着性 ○ ○ ○ − 鉛筆硬度 3〜4H 3〜4H 3〜4H 2H 防汚染性 ○ ○ ○ ×耐熱水性 100h 100h 20h − [Table 1] Item Example 1 Example 2 Comparative Example 1 Comparative Example 2 Contact angle with water 25 35 25 75 Abrasion resistance> 10,000 times> 10,000 times> 10,000 times-Adhesion ○ ○ ○ -Pencil hardness 3-4H 3-4H 3-4H 2H Contamination resistance ○ ○ ○ × Hot water resistance 100h 100h 20h-
【0056】実験例1〜9
5%のポリシラザンNL−110(キシレン溶媒)又は
ポリシラザンNP−110(キシレン溶媒)(いずれ
も、クラリアントジャパン株式会社製)を用い、これを
予め脱脂処理した基材にスプレーコートで塗布し、種々
の温度条件及び時間(日数)で処理し、各種のシリカ膜
被覆成形体(膜厚1.0〜2.0μm)を調製した。こ
の表面を減衰全反射(ATR)赤外線吸収スペクトル法
で測定したときの「SiHの吸光度」/「SiOの吸光
度」の比(Z)と、防汚染性、密着性及びハードコート
性との関連を調べた。Experimental Examples 1 to 95 Using 5% of polysilazane NL-110 (xylene solvent) or polysilazane NP-110 (xylene solvent) (both manufactured by Clariant Japan Co., Ltd.), this was degreased as a base material. It was applied by spray coating and treated under various temperature conditions and times (days) to prepare various silica film-coated molded products (film thickness 1.0 to 2.0 μm). The relationship between the ratio (Z) of “absorbance of SiH” / “absorbance of SiO” when measured by an attenuated total reflection (ATR) infrared absorption spectrum method on this surface, and antifouling property, adhesion and hard coat property Examined.
【0057】No.1:予め脱脂処理した基材に5%の
ポリシラザンNP−110(キシレン溶媒)をスプレー
コートで塗布し、その後30℃、50%RH(相対湿
度)の環境で1時間放置した。
No.2:塗布後の放置時間(日数)を4日間放置した
ほかは、上記No.1と同じ。
No.3:塗布後の放置時間(日数)を10日間放置し
たほかは、上記No.1と同じ。
No.4:塗布後の加熱温度を120℃、加熱時間(放
置時間)を10分間としたほかは、上記No.1と同
じ。No. 1: 5% of polysilazane NP-110 (xylene solvent) was applied by spray coating to a base material that had been degreased in advance, and then left for 1 hour in an environment of 30 ° C. and 50% RH (relative humidity). No. 2: In addition to the above-mentioned No. 2 except that the time (days) after application was left for 4 days. Same as 1. No. 3: Other than leaving for 10 days after application for 10 days. Same as 1. No. 4: No. 4 except that the heating temperature after coating was 120 ° C. and the heating time (leaving time) was 10 minutes. Same as 1.
【0058】No.5:予め脱脂処理した基材に5%の
ポリシラザンNL−110(キシレン溶媒)をスプレー
コートで塗布し、その後30℃、50%RHの環境で2
4時間放置した。
No.6:塗布後に、(30℃、50%RHの環境で2
4時間放置する代わりに)加熱温度を140℃で、60
分間加熱した。他は、上記No.5と同じ。
No.7:塗布後に温度140℃で60分間加熱したあ
とに、更に30℃、50%RHの環境で7日間放置し
た。その他は、上記No.5と同じ。No. 5: 5% of polysilazane NL-110 (xylene solvent) was applied by spray coating to the base material that had been degreased in advance, and then 2 in an environment of 30 ° C. and 50% RH.
It was left for 4 hours. No. 6: After application (2 at 30 ° C, 50% RH environment
Instead of leaving for 4 hours) heating temperature at 140 ° C, 60
Heated for minutes. Others are the above No. Same as 5. No. 7: After coating, the coating was heated at a temperature of 140 ° C. for 60 minutes and then left standing in an environment of 30 ° C. and 50% RH for 7 days. Others are the above No. Same as 5.
【0059】No.8:予め脱脂処理した基材に5%の
ポリシラザンNP−110(キシレン溶媒)をスプレー
コートで塗布し、その後30℃、50%RHの環境で1
0分間放置した。
No.9:予め脱脂処理した基材に5%ポリシラザンN
L−110(キシレン溶媒)をスプレーコートで塗布
し、その後30℃、50%RHの環境で10分間放置し
た。No. 8: 5% polysilazane NP-110 (xylene solvent) was applied by spray coating to the base material that had been degreased in advance, and then 1 at 30 ° C. and 50% RH.
It was left for 0 minutes. No. 9: 5% polysilazane N on the base material which was previously degreased
L-110 (xylene solvent) was applied by spray coating and then left in an environment of 30 ° C. and 50% RH for 10 minutes.
【0060】[0060]
【表2】 項目 実験例1 実験例2 実験例3 実験例4 比(Z) 0.85 0.15 0.09 0.14 防汚染性 ○ ○ ○ ○ 密着性 × ○ ○ ○ HC性 × △ ○ ○ [Table 2] Item Experimental example 1 Experimental example 2 Experimental example 3 Experimental example 4 Ratio (Z) 0.85 0.15 0.09 0.14 Contamination resistance ○ ○ ○ ○ Adhesion × ○ ○ ○ HC property × △ ○ ○
【0061】[0061]
【表3】 項目 実験例5 実験例6 実験例7 実験例8 実験例9 比(Z) 2.8 0.42 0.04 3.5 4.0 防汚染性 ○ ○ ○ × × 密着性 △ ○ ○ × ×HC性 × ○ ○ × × [Table 3] Item Experimental example 5 Experimental example 6 Experimental example 7 Experimental example 8 Experimental example 9 Ratio (Z) 2.8 0.42 0.04 3.5 4.0 Antifouling property ○ ○ ○ × × Adhesion △ ○ ○ × × HC property × ○ ○ × ×
【0062】この実験結果は、ポリシラザンの種類にも
よるが、比(Z)は3.0以下が好ましく、0.7以下
が更に好ましいことを示している。The results of this experiment show that the ratio (Z) is preferably 3.0 or less, more preferably 0.7 or less, depending on the type of polysilazane.
【0063】[0063]
【発明の効果】本発明によれば、住宅設備の水回りに使
われる樹脂成形体をはじめとする成形体で、汚れが付き
にくく(防汚染性)、あるいは汚れを落としやすい(易
清掃性)シリカ膜被覆成形体を容易に製造できる。ま
た、シリカ転化反応等の処理温度を室温(0〜30℃)
とすることもでき、また、30〜100℃のあいだの適
当な温度とすることもできる。この場合、処理温度が低
いほどシリカ転化反応に時間(日数)を要するが、浴室
リフォーム等の場合には有効な方法となる。EFFECTS OF THE INVENTION According to the present invention, a molded product such as a resin molded product used around the water of a residential facility is less likely to be soiled (anti-staining property) or is easily removed (easy cleaning property). A silica film-covered molded product can be easily manufactured. In addition, the processing temperature for the silica conversion reaction is room temperature (0 to 30 ° C).
It is also possible to use a suitable temperature between 30 and 100 ° C. In this case, the lower the treatment temperature is, the longer the time (days) is required for the silica conversion reaction, but this is an effective method in the case of bathroom reforming and the like.
【0064】本発明のシリカ膜被覆成形体は、親水性の
シリカ膜で被覆されているので、水との接触角を50°
以下にすることができる。そのため、脂汚れ・石鹸カス
等の汚れが付着しても水で洗い流すだけで容易に除去で
き、防汚染性に優れる。また、表面に水が付着してもそ
の親水性のゆえに液滴が広がり、表面が早く乾きやす
い。シリカ膜の密着性、耐熱水性、耐摩耗性、ハードコ
ート性等も優れる。Since the silica film-coated molded product of the present invention is coated with the hydrophilic silica film, the contact angle with water is 50 °.
It can be: Therefore, even if dirt such as greasy dirt or soap residue is attached, it can be easily removed by simply rinsing it with water, and it has excellent stain resistance. Further, even if water adheres to the surface, the droplets spread due to its hydrophilic property, and the surface easily dries quickly. The silica film has excellent adhesion, hot water resistance, abrasion resistance, and hard coat properties.
【0065】本発明で開示したシリカ膜評価方法によれ
ば、最適なシリカ転化度をもつ膜の作製条件を容易に設
定することができ、過剰な処理(加熱及び時間)を省く
ことができる。基材の種類も多くの材料から選べる。According to the silica film evaluation method disclosed in the present invention, it is possible to easily set the conditions for producing a film having an optimum degree of silica conversion, and to omit excessive treatment (heating and time). The type of base material can be selected from many materials.
【図1】基材にポリシラザンをコートし、室温に放置
(4h及び96h)したときの赤外線吸収スペクトルの
チャートである。FIG. 1 is a chart of an infrared absorption spectrum when a substrate is coated with polysilazane and left at room temperature (4 h and 96 h).
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08J 7/04 CER C08J 7/04 CERE CEZ CEZ C09D 1/00 C09D 1/00 183/16 183/16 // C08L 101:00 C08L 101:00 Fターム(参考) 4D075 AE15 BB26Y BB26Z BB93Z BB95Z CA02 CA13 CA18 CA33 CA37 CA38 CA44 DA06 DB21 DB35 DB36 DB37 DB38 DB43 DB46 DB47 DB48 DB49 DB50 DB53 DB61 DC02 DC13 DC18 DC38 EA07 EA41 EB42 EB43 EC45 4F006 AA11 AA31 AB39 AB67 BA01 BA10 DA05 EA05 4F100 AA20C AB11B AR00B AT00A BA03 BA07 BA10A BA10C GB08 JK09 JK12 JL06 JL11B YY00C 4G072 AA25 BB09 GG03 HH28 MM01 RR12 4J038 AA011 DL172 HA441 JC32 JC34 JC35 JC36 KA03 NA04 NA05 NA06 NA11 NA12 NA14 PA11 PA18 PA19 PB02 PB05 PB06 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C08J 7/04 CER C08J 7/04 CERE CEZ CEZ C09D 1/00 C09D 1/00 183/16 183/16 / / C08L 101: 00 C08L 101: 00 F term (reference) 4D075 AE15 BB26Y BB26Z BB93Z BB95Z CA02 CA13 CA18 CA33 CA37 CA38 CA44 DA06 DB21 DB35 DB36 DB37 DB38 DB43 DB46 DB47 DB48 DB49 DB50 DB53 DB61 DC02 DC13 DC18 DC45 EA07 EB42 EB42 EB07 4F006 AA11 AA31 AB39 AB67 BA01 BA10 DA05 EA05 4F100 AA20C AB11B AR00B AT00A BA03 BA07 BA10A BA10C GB08 JK09 JK12 JL06 JL11B YY00C 4G072 AA25 BB09 GG03 HH28 MM01 RR12 4J038 AA011 DL172 HA441 JC32 JC34 JC35 JC36 KA03 NA04 NA05 NA06 NA11 NA12 NA14 PA11 PA18 PA19 PB02 PB05 PB06
Claims (10)
て固体膜を形成させたのち、この上にポリシラザン含有
液の層を形成し、シリカ転化反応させる、シリカ膜被覆
成形体の製造法。1. A method for producing a silica film-covered molded product, comprising forming a solid film by undercoating a silane coupling agent on a substrate, forming a layer of a polysilazane-containing liquid on the solid film, and subjecting the layer to a silica conversion reaction. .
ンを用いる、請求項1の製造法。2. The production method according to claim 1, wherein perhydropolysilazane is used as polysilazane.
の成形体表面を赤外線吸収スペクトル法で分析するとき
の「SiHの吸光度」/「SiOの吸光度」の比が3.
0以下となるように決める、請求項1又は2の製造法。3. The temperature and time of the silica conversion reaction are such that the ratio of "absorbance of SiH" / "absorbance of SiO" when the surface of the molded article after the reaction is analyzed by infrared absorption spectroscopy is 3.
The manufacturing method according to claim 1 or 2, wherein the manufacturing method is determined to be 0 or less.
である、請求項1〜3のいずれかの製造法。4. The temperature of the silica conversion reaction is 100 to 200 ° C.
The method according to any one of claims 1 to 3, wherein
ング剤含有液の層を形成させ、シリカ転化反応させる、
シリカ膜被覆成形体の製造法。5. A layer of a liquid containing polysilazane and a silane coupling agent is formed on a substrate, and a silica conversion reaction is performed.
A method for producing a silica film-coated molded product.
ンを用いる、請求項5の製造法。6. The method according to claim 5, wherein perhydropolysilazane is used as polysilazane.
の成形体表面を赤外線吸収スペクトル法で分析するとき
の「SiHの吸光度」/「SiOの吸光度」の比が3.
0以下となるように決める、請求項5又は6の製造法。7. The temperature and time of the silica conversion reaction are such that the ratio of "absorbance of SiH" / "absorbance of SiO" when the surface of the molded article after the reaction is analyzed by infrared absorption spectroscopy is 3.
The manufacturing method according to claim 5 or 6, which is determined so as to be 0 or less.
0℃である、請求項5〜7のいずれかの製造法。8. The reaction temperature of the silica conversion reaction is 100 to 20.
The method according to any one of claims 5 to 7, which is 0 ° C.
れたシリカ膜被覆成形体であって、その表面は下記
(a)〜(f)のいずれか一又は二以上の特性を有する
シリカ膜被覆成形体。 (a)水との接触角:50°以下 (b)表面を赤外線吸収スペクトル法で分析するとき、
「SiHの吸光度」/「SiOの吸光度」(2400c
m-1における吸光度をベースラインとする)の比:3.
0以下 (c)耐摩耗性:1,000回以上 (d)密着性:テープ試験法で試験するとき「剥離な
し」 (e)表面硬度:鉛筆強度として3H以上 (f)耐熱水性:50h以上9. A silica film-coated molded article produced by the method according to any one of claims 1 to 8, the surface of which has one or more of the following characteristics (a) to (f). A silica film-coated molded article having the same. (A) Contact angle with water: 50 ° or less (b) When the surface is analyzed by infrared absorption spectroscopy,
"Absorbance of SiH" / "Absorbance of SiO" (2400c
Ratio of the absorbance at m −1 as a baseline): 3.
0 or less (c) Abrasion resistance: 1,000 times or more (d) Adhesion: "No peeling" when tested by the tape test method (e) Surface hardness: 3H or more as pencil strength (f) Hot water resistance: 50h or more
住宅設備機器・機材用のシリカ膜被覆成形体。10. A silica-coated molded article according to claim 9, wherein:
Silica film coated molding for housing equipment and equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001385105A JP2003183016A (en) | 2001-12-18 | 2001-12-18 | Method for producing silica-coated molded product, and silica-coated molded product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001385105A JP2003183016A (en) | 2001-12-18 | 2001-12-18 | Method for producing silica-coated molded product, and silica-coated molded product |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003183016A true JP2003183016A (en) | 2003-07-03 |
Family
ID=27594652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001385105A Pending JP2003183016A (en) | 2001-12-18 | 2001-12-18 | Method for producing silica-coated molded product, and silica-coated molded product |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003183016A (en) |
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|---|---|---|---|---|
| JP2005113129A (en) * | 2003-10-08 | 2005-04-28 | Northrop Grumman Corp | Wipe solvent composition and process without environmental disruption |
| JP2005247678A (en) * | 2004-02-03 | 2005-09-15 | Seiko Epson Corp | Method for forming silicon oxide film and silicon oxide film |
| WO2007004254A1 (en) * | 2005-06-30 | 2007-01-11 | Hiromasa Murase | Water-repellent coating film obtained from methylsilazane compound and process for producing coating film |
| JPWO2007018144A1 (en) * | 2005-08-10 | 2009-02-19 | 株式会社シンク・ラボラトリー | Doctor blade |
| JP2010221086A (en) * | 2009-03-19 | 2010-10-07 | Mec Kk | Method for forming laminate |
| JP2011194765A (en) * | 2010-03-23 | 2011-10-06 | Konica Minolta Holdings Inc | Gas barrier film, method of manufacturing organic device and organic device |
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2001
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005113129A (en) * | 2003-10-08 | 2005-04-28 | Northrop Grumman Corp | Wipe solvent composition and process without environmental disruption |
| JP2005247678A (en) * | 2004-02-03 | 2005-09-15 | Seiko Epson Corp | Method for forming silicon oxide film and silicon oxide film |
| WO2007004254A1 (en) * | 2005-06-30 | 2007-01-11 | Hiromasa Murase | Water-repellent coating film obtained from methylsilazane compound and process for producing coating film |
| JPWO2007018144A1 (en) * | 2005-08-10 | 2009-02-19 | 株式会社シンク・ラボラトリー | Doctor blade |
| JP2010221086A (en) * | 2009-03-19 | 2010-10-07 | Mec Kk | Method for forming laminate |
| US8147631B2 (en) | 2009-03-19 | 2012-04-03 | Mec Company Ltd. | Method for forming a laminate |
| JP2011194765A (en) * | 2010-03-23 | 2011-10-06 | Konica Minolta Holdings Inc | Gas barrier film, method of manufacturing organic device and organic device |
| JP2022172789A (en) * | 2021-05-07 | 2022-11-17 | 信越化学工業株式会社 | Room temperature-curable hard coat composition |
| JP7514794B2 (en) | 2021-05-07 | 2024-07-11 | 信越化学工業株式会社 | Room temperature curing hard coat composition |
| JP7229502B1 (en) | 2023-01-19 | 2023-02-28 | 株式会社アイセル | Primers, coatings and structures |
| JP2024102587A (en) * | 2023-01-19 | 2024-07-31 | 株式会社アイセル | Base coats, paints and structures |
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