JP2003172920A - ELECTRO-OPTICAL DEVICE, ITS MANUFACTURING METHOD, ELECTRONIC EQUIPMENT, AND PROJECTION DISPLAY - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce heat accumulation in an electrooptical device. <P>SOLUTION: The electrooptical device is provided with a counter substrate (20) having a surface in which light (L1) is made incident and sandwiching a liquid crystal layer between a TFT array substrate disposed opposite to the counter substrate and the counter substrate and a light shielding film (501) having a prescribed pattern in an image display area of the counter substrate and containing a portion having a light incident surface inclined to the surface so as to reflect at least part of the light to the outside of the image display area. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention belongs to the technical field of electro-optical devices such as liquid crystal devices, manufacturing methods thereof, electronic equipment, and projection display devices.

[0002]

BACKGROUND ART As a conventional electro-optical device, for example, pixel electrodes arranged in a matrix and thin film transistors (hereinafter, appropriately referred to as “TFT”) connected to each of the electrodes, the TFT. An electro-optical device capable of so-called active matrix driving by including scan lines connected in parallel with each other in the row (or column) direction and data lines provided in parallel with the column (or row) direction. It has been known. In such an electro-optical device, in addition to the pixel electrodes, TFTs, etc., a TFT array substrate on which these are formed, a counter substrate arranged to face the substrate, a liquid crystal sandwiched between the both substrates, and the like. By further including the electro-optic substance and the like, image display becomes possible.

In order to display this image, a predetermined voltage is applied to each pixel electrode through the TFT,
A potential difference is generated between the pixel electrode to which the voltage is applied and the counter electrode formed on the entire surface of the counter substrate, and the alignment state of the liquid crystal at that position is changed to allow transmission / non-transmission of light. It will be realized by controlling the transmission. That is, the display of the image is performed in units of pixels defined with reference to each of the pixel electrodes.

As described above, since an image is displayed in units of pixels, it is necessary that the above-described light transmission / non-transmission, especially light transmission is possible in the pixel portion. Basically, it is preferable that light is not allowed to pass between adjacent pixels. The reason is that if light is transmitted through such a portion, the contrast of an image is deteriorated.

In order to cope with such a problem, in the conventional electro-optical device, for example, a light-shielding film patterned in a lattice pattern is formed on the counter substrate so as to correspond to the pixel electrodes arranged in a matrix. Yes (that is, defining the non-open area), etc. were taken. The light-shielding film basically prevents the transmission of light between the pixels, and the above-mentioned problems do not occur. Further, according to such a light-shielding film, it is possible to prevent color mixture when a color filter is provided for each pixel. As a material of such a light shielding film, conventionally, for example, resin black in which metallic chromium (Cr), carbon (C) or titanium (Ti) is dispersed in a photoresist, a metallic material such as nickel (Ni), or the like is used. Has been addressed.

[0006]

However, the conventional light-shielding film has the following problems. That is, since the light shielding film is generally made of a material having a relatively low light reflectance as described above, heat is accumulated inside the electro-optical device. This occurs when light incident on the electro-optical device is converted into heat in the light shielding film. When such heat accumulation occurs, the properties of the liquid crystal or the like are changed, and the TFT, which is generally weak against heat, is adversely affected, for example, the threshold voltage rises. As a result, the electro-optical device as a whole suffers from inconveniences such as changes in display characteristics, image sticking, flicker, and reduced reliability. Incidentally, such a problem is particularly serious when the electro-optical device is used as a component of a liquid crystal projector, for example. This is because the light source used for the projector generally emits strong light.

Therefore, in order to deal with the heat accumulation as described above, it is conceivable that the light shielding film is made of aluminum having a high light reflectance. According to this, since the light-shielding film does not have a function of converting light into heat, it is possible to reduce the possibility that the liquid crystal, the TFT, and the like are adversely affected by heat accumulation.

However, if the light-shielding film is constructed in this way, a new problem arises. That is, the light reflected by the light-shielding film will result in damage to a polarizing plate or the like, which is an example of an optical element, which is usually formed on the surface of the counter substrate on which the light is incident. Here, the damage means damage caused by light being converted into heat by the polarizing plate or the like, that is, heat accumulation. That is, if a light-shielding film having a high reflectance is used, it is possible to prevent heat accumulation inside the electro-optical device to some extent, but new heat accumulation occurs outside the device. Of.

The present invention has been made in view of the above problems, and reduces damage due to incident light on an optical element arranged on the incident side while reducing heat accumulation due to incident light. An object of the present invention is to provide an electro-optical device, a manufacturing method thereof, and an electronic device capable of performing the same.

[0010]

In order to solve the above problems, an electro-optical device according to the present invention has a surface on which light is incident, and an electro-optical substance is provided between the substrate and the other substrate which faces the surface. It has one substrate sandwiched and a predetermined pattern in the image display region of the one substrate, and is inclined with respect to the surface so as to reflect at least a part of the light to the outside of the image display region. And a light shielding film including a portion having a light incident surface.

According to the electro-optical device of the present invention, light is incident on the surface of one of the substrates and passes through it,
To electro-optic materials. Electro-optical material such as liquid crystal changes its state by applying a voltage, for example, by electrodes formed on the upper side of each of a pair of substrates, and makes the light transmit or non-transmit. . The light that has passed therethrough passes through the other of the pair of substrates and is emitted. In addition to such an action, an image can be displayed by appropriately controlling the state of the electro-optical material according to the position of the electrode or the like.

Particularly, in the present invention, in addition to having a predetermined pattern in the image display area on one substrate,
A light shielding film including a portion having a light incident surface inclined with respect to the surface is provided so as to reflect at least a part of the light to the outside of the image display region. That is, the direction of the normal line to the light-incident surface of the light-shielding film is oriented toward the “outside” of one of the substrates (that is, the direction out of the “edge” of the substrate). From this, for example, in the case where a polarizing plate, a retardation plate, or other optical element (hereinafter, simply referred to as “polarizing plate”) is provided on the surface of one of the substrates, the polarizing plate, etc. Also, it is possible to realize a state in which the light that has entered through the surface of one of the substrates and reflected by the light incident surface of the light shielding film hardly reaches the polarizing plate or the like. Because the reflected light is
This is because it goes to the “outside” of one substrate, in other words, to the “outside” of the electro-optical device.

More specifically, examples of the light incident surface satisfying such requirements include, in addition to the convex shape described later, a concave shape and a quadrangle having a predetermined inclination with respect to the surface. Containing, or having a large surface roughness (that is, containing irregular irregular shapes, for example)
Etc. can be considered. In short, unless the surfaces of the polarizing plate and the light-incident surface of the light-shielding film are completely parallel to each other, at least a part of the light reflected by the light-incident surface of the light-shielding film is an image display. Since it can go out of the region, it is possible to obtain a corresponding action and effect depending on the specific shape of the light incident surface. The scope of the invention is
It is defined after including such an aspect.

Further, in the present invention, the progress of the light incident from the surface of one of the substrates in the electro-optical device is blocked by the light-shielding film, so that the light is electro-optical material or other electro-optical device. Rarely reaches inside.

From the above, according to the present invention, first, the re-incidence of light on the polarizing plate or the like hardly occurs, so that the possibility of the action of converting light into heat in the polarizing plate or the like is reduced. . As a result, the polarizing plate and the like are hardly damaged by heat. Further, according to the present invention,
Since light hardly enters the interior of the electro-optical device, it is possible to suffer from various inconveniences such as changes in display characteristics, burn-in, flicker, deterioration of reliability, etc., which are caused by heat accumulation inside the electro-optical device. Can be reduced.

The light shielding film according to the present invention is preferably made of a material having a relatively high light reflectance. Specifically, for example, a material having a reflectance of about 50% or more is particularly preferable. In this case, since the amount of reflected light is larger than the amount of absorbed light, the effect of preventing heat accumulation in the polarizing plate or the like, which is related to the reflection of light toward the “outside” as described above, is further improved. In addition to being surely enjoyed, it is possible to effectively prevent the accumulation of heat inside the electro-optical device.

The light-shielding film may have a multi-layer structure. That is, the side on which the light incident surface is located is made of the above-mentioned material having a relatively large light reflectance, and the opposite side is made of, for example, a material having a relatively large light absorption rate. It is also possible to

Incidentally, according to the present invention, "at least a part of the light is reflected to the outside of the image display region,
When the "light incident surface inclined with respect to the surface" is expressed geometrically, for example, "the normal line defined by the central portion of the surface of one substrate is an axis line, and the vertex is located on the side where the electro-optical material exists. It is also possible to rephrase it as a "light incident surface on which a cone having a bottom surface on the side where the surface is present has a normal line that coincides with the ridge line or an extension line of the ridge line." here,
The “cone” specifically means a cone, a triangular pyramid, a quadrangular pyramid, and the like. More generally, no matter what shape the bottom surface has, the edge of the bottom surface and one vertex It is a three-dimensional shape defined by connecting and. Although it is considered that the content of the present invention is expressed by such an expression, in particular, when the cone has a shape symmetrical with respect to other axes such as a cone, the method of the inclined light incident surface is used. The line
It can be said to be a particularly preferable mode because the image is directed to the outside of the image display area in all directions.

In an aspect of the electro-optical device of the present invention, the light shielding film includes a portion having the inclined light incident surface in a region near the edge of the image display region.

According to this aspect, the light incident from the surface of one of the substrates can be more efficiently reflected to the outside of the image display area. This is because, among the above-mentioned lights, those that are incident on the region near the edge of the image display region can be converted into light by only slightly setting the inclination of the light-incident surface of the light-shielding film with respect to the surface of one of the substrates. This is because it is possible to relatively easily reflect the light to the outside of the image display area.

In another aspect of the electro-optical device of the present invention, the light shielding film contains aluminum.

According to this aspect, since the light-shielding film, especially the light incident surface thereof, contains aluminum whose light reflectance is about 80 to 90%, the light incident on the light incident surface is not affected. , Will almost certainly be reflected. Therefore, it is possible to more effectively enjoy the above-described action and effect, that is, the action and effect that heat is not accumulated inside the electro-optical device, and the action and effect that heat is not accumulated in the polarizing plate and the like.

In another aspect of the electro-optical device of the present invention, a plurality of pixel electrodes arranged in a matrix are provided on either the one substrate or the other substrate.
A plurality of thin film transistors connected to each of the plurality of pixel electrodes, and a wiring connected to the plurality of thin film transistors, wherein the light-shielding film is a grid pattern facing a position where the plurality of pixel electrodes are not formed. Have.

According to this aspect, first, by driving the pixel electrode through the wiring and the thin film transistor,
It is possible to change the state of the electro-optical material.
At this time, each of the plurality of pixel electrodes is formed by each of the plurality of thin film transistors provided so as to correspond to them.
Each of the pixel electrodes constitutes a so-called “pixel” because it can be controlled individually. In addition, in the substrate on which the pixel electrodes and the like are not formed, a counter electrode is formed in advance,
A voltage may be effectively applied to the electro-optical material.

Particularly, in this embodiment, the light shielding film is
It has a grid-like pattern facing the positions where the plurality of pixel electrodes are not formed. Therefore, in the present aspect, it is possible to effectively prevent the transmission of light between pixels, and thus it is possible to improve the contrast of an image, and in the case of providing a color filter,
It is also possible to prevent color mixing.

If the pixel electrode, the thin film transistor, the wiring and the like are formed on the other substrate, the one substrate corresponds to a so-called counter substrate, and the light-shielding film according to the present invention. Can be assumed to be a light-shielding film formed on the counter substrate.

On the other hand, the pixel electrodes and the like are formed
On one of the substrates, the light-shielding film according to the present invention can be assumed to be a so-called built-in light-shielding film formed together with these pixel electrodes and the like. At this time, the light-shielding film may be used also as the wiring (that is, there is one member having both the function of the light-shielding film and the function of the wiring). In this case, one substrate is a so-called T
It can be said that it corresponds to the FT array substrate.

In this case, for example, assuming that the electro-optical device according to the present invention is applied to a plurality of light valves provided in a liquid crystal projector capable of color display, the light emitted from the light source of the projector,
So-called normal light is usually incident on the "other substrate".
That is, it is the surface of the counter substrate. However, even in such a case, the above-described effects of the light-shielding film according to the present invention are not meaningless. In the above liquid crystal projector, focusing on one light valve of the plurality of light valves (that is, the electro-optical device), regular light is incident from the surface of the other substrate as described above. However, at the same time, the light passing through the other light valve, so-called “return light”, may be incident from the surface of one of the substrates.

In short, in the present invention, the light shielding film is
Not only when it is formed on a so-called counter substrate, but also when it is formed on a so-called TFT array substrate, it is possible to obtain a corresponding effect.

In this aspect, in particular, the wiring includes a scanning line, and the light-incident surface of the light-shielding film is viewed from the front surface side of the one substrate in a cross section perpendicular to the extending direction of the scanning line. Therefore, it is preferable to include a convex shape.

With this structure, it is possible to relatively easily manufacture the light-shielding film that exhibits the above-described effects. For example, a light-shielding film having such a simple form can be manufactured by a method similar to the well-known method for forming a microlens. Here, the method of forming the microlens means, for example, after performing patterning such that the resist applied on the substrate has a predetermined pattern (that is, in the present embodiment, a band-shaped pattern included in the scanning line). After performing wet etching on the region on the substrate excluding the patterned resist, an appropriate medium (that is, in the present embodiment, a comparison of the light reflectance of, for example, aluminum or the like is carried out in the recess formed by the etching. Large material) and the like are used to form a film.

The fact that the light-incident surface of the light-shielding film includes a convex shape means that the above-mentioned definition is made, that is, "at least a part of the light incident on the surface of one of the substrates goes out of the image display region. The light incident surface that does not correspond to the “light incident surface that is inclined with respect to the surface so as to reflect” may be included. However, according to the present invention, all the light incident surfaces of the light shielding film have such a definition. There is no problem because it does not require that it conform to. That is, if at least a part of the total light-incident surface of the light-shielding film satisfies the above-mentioned requirements, it is within the scope of the present invention.

Alternatively, in the aspect in which the light-shielding film includes a grid pattern, the wiring includes a data line, and the light-incident surface of the light-shielding film is within a cross section perpendicular to the extending direction of the data line. It is preferable to include a convex shape when viewed from the front surface side of the one substrate.

With this structure, it is possible to obtain the same effects as the above-described embodiment in which the wiring includes the scanning line.

Further, particularly in a mode in which the light shielding film includes a grid pattern and in a configuration in which the wiring includes a scanning line or a data line, the wiring includes a scanning line or a data line, and The light incident surface, in a cross section perpendicular to the extending direction of the scanning line, and in a cross section perpendicular to the extending direction of the data line, viewed from the front surface side of the one substrate,
Including convex shape.

According to such a structure, as compared with the case where the above-described convex shape is formed only for the scanning lines or only the data lines, the light-shielding film occupies the entire light incident surface.
The proportion of the incident “light incident surface inclined with respect to the surface so as to reflect at least a part of the light to the outside of the image display area” becomes larger. Therefore, the proportion of light that does not reach the polarizing plate or the like is increased, so that it is possible to more reliably enjoy the above-described effects.

In another aspect of the electro-optical device of the present invention, the inclination of the light incident surface is gradually reduced from the central portion to the peripheral portion of the one substrate.

According to such a configuration, for example, assuming that the light incident surface includes a convex shape, the light incident surface of the light shielding film located near the center of one of the substrates has a convex shape with a larger curvature. A shape that includes a shape and that is located closer to the periphery will include a convex shape with a smaller curvature. With such a configuration, it is possible to more effectively reduce the proportion of light that reaches the polarizing plate or the like. This is because the light incident on the central portion is reflected by the light incident surface including the convex shape having a large curvature, and as a result, the reflected light travels along an optical path that is almost parallel to the substrate surface.

In another aspect of the electro-optical device of the present invention, an optical element is further provided on the surface.

According to this aspect, for example, an optical element such as a polarizing plate and a retardation plate is provided on the surface of one of the substrates on which light is incident. Therefore, as is apparent from the above, It is possible to reduce the possibility that the optical element deteriorates due to heat.

According to the method of manufacturing an electro-optical device of the present invention, an electro-optical substance is sandwiched between one substrate having a surface on which light is incident and the other substrate arranged to face the one substrate. A method of manufacturing an electro-optical device comprising: a step of forming a concave curved surface portion on a surface of the one substrate opposite to the surface; and forming a material that reflects light on the concave curved surface portion. By doing so, a light-shielding film having a light incident surface inclined with respect to the surface is formed in the image display area of the one substrate so as to reflect at least a part of the light to the outside of the image display area. And a step of performing.

According to the method of manufacturing the electro-optical device of the present invention, the above-described electro-optical device of the present invention can be manufactured relatively easily.

According to the present invention, the concave curved surface portion on which the light-shielding film is to be formed is formed on the surface of the one substrate opposite to the surface thereof. Incident on the surface of the "tilted with respect to the surface so as to reflect at least part of the light outside the image display area"
It meets the requirements of this regulation in that it has a face. As the specific shape, as described above, a shape including a convex shape, a shape including a concave shape, or a shape having a larger surface roughness in general (that is, a shape including an irregular asperity shape), etc. Can think of.

The "material that reflects light" referred to in the present invention
As described above, it is preferable to use a material having a relatively large light reflectance, such as aluminum, as described above.

In one aspect of the method of manufacturing an electro-optical device of the present invention, the step of forming the concave curved surface portion is performed at the same time as a part of the step of forming a microlens on the one substrate.

According to this aspect, the concave curved surface portion is formed also for a part of the step of forming the microlens. That is, in this aspect, part of the step of forming the light-shielding film is performed also as part of the step of forming the microlens, so that the manufacturing cost can be reduced correspondingly. .

The electronic equipment of the present invention comprises the above-mentioned electro-optical device of the present invention (however, including its various aspects).

According to the electronic equipment of the present invention, since it comprises the above-mentioned electro-optical device of the present invention, the liquid crystal television, the mobile phone, the electronic notebook in which the display characteristics and the like do not change due to the accumulation of heat. Various electronic devices such as a word processor, a viewfinder type or a monitor direct-viewing type video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized.

The projection type display device of the present invention comprises a light valve comprising the above-mentioned electro-optical device of the present invention (including various aspects thereof), a light source for making projection light enter the light valve, and the light. An optical system that projects the projection light emitted from the bulb, and a mold that houses the light valve, the light source, and the optical system are provided.

According to the projection type display device of the present invention (also referred to as a so-called "liquid crystal projector"), since a light source which is relatively powerful is generally mounted as the light source, a light valve is provided. That is, it can be said that the heat accumulation in the above-described electro-optical device of the present invention is more likely to occur, so that the effects of the present invention can be more effectively enjoyed.

Further, according to the present invention, since the light valve, the light source, and the mold for housing the light valve are provided, it is possible to enjoy the following operational effects. That is, according to this mold, the light reflected to the "outside" of the electro-optical device by the action of the present invention is absorbed by the inner surface of the mold.
Therefore, in the electro-optical device according to the present invention in which so-called stray light is likely to be generated, a phenomenon such as generation of the stray light or unnecessary irregular reflection thereof does not occur, and stable image display can be performed. In this case, the inner surface of the mold, for example, painted black,
Needless to say, it is more preferable if the light absorption is more likely to occur.

Further, in the liquid crystal projector according to the present invention, a cooling fan for cooling the light valve is generally provided. According to the present invention, the amount of heat accumulated in the light valve is higher than that in the conventional case. Since it becomes smaller, the cooling fan is not required to have particularly excellent performance. Therefore, it is possible to provide a liquid crystal projector that consumes less power and is quieter than conventional ones.

The operation and other advantages of the present invention will be apparent from the embodiments described below.

[0054]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. The following embodiments apply the electro-optical device of the present invention to a liquid crystal device.

(Overall Configuration of Electro-Optical Device) First, the overall configuration of the electro-optical device according to the embodiment of the present invention will be described with reference to FIGS. 1 and 2. Note that FIG. 1 shows a TFT
FIG. 2 is a plan view of the array substrate together with the constituent elements formed thereon as viewed from the counter substrate 20, and FIG.
It is a -H 'sectional view.

1 and 2, in the electro-optical device according to this embodiment, the TFT array substrate 10 and the counter substrate 2 are used.
0 and 0 are arranged to face each other. A liquid crystal layer 50 is enclosed between the TFT array substrate 10 and the counter substrate 20,
The TFT array substrate 10 and the counter substrate 20 are adhered to each other by a sealing material 52 provided in a sealing region located around the image display region 10a.

The sealing material 52 is made of, for example, an ultraviolet curable resin, a thermosetting resin, or the like and is cured by ultraviolet rays, heating, or the like in order to bond the two substrates together. Also,
If the liquid crystal device according to the present embodiment is a liquid crystal device that is small and performs enlarged display, such as a projector, a glass for adjusting the distance between the substrates (the gap between the substrates) to a predetermined value is provided in the sealing material 52. Gap materials (spacers) such as fibers or glass beads are scattered. Alternatively, such a gap material may be included in the liquid crystal layer 50 if the liquid crystal device is a large-sized liquid crystal device, such as a liquid crystal display or a liquid crystal television, that displays at the same magnification.

Further, in parallel with the inside of the sealing material 52, a frame light-shielding film 53 as a frame for defining the periphery of the image display area 10a is provided on the counter substrate 20 side.
However, part or all of such a frame light-shielding film 53 is
It may be provided as a built-in light shielding film on the TFT array substrate 10 side.

In the area outside the sealing material 52, the data line drive circuit 101 and the external circuit connection terminal 102 for driving the data line 6a by supplying the image signal to the data line 6a at a predetermined timing are provided with the TFT array substrate. The scanning line driving circuit 104, which is provided along one side of the scanning line 3a, drives the scanning line 3a by supplying the scanning signal to the scanning line 3a at a predetermined timing. It is provided.

Needless to say, if the delay of the scanning signal supplied to the scanning line 3a does not matter, the scanning line driving circuit 104 may be provided on only one side. Further, the data line driving circuits 101 may be arranged on both sides along the side of the image display area 10a.

On the remaining side of the TFT array substrate 10, the scanning line driving circuit 1 provided on both sides of the image display area 10a.
A plurality of wirings 105 are provided to connect between 04. In addition, at least one location of the corner portion of the counter substrate 20 is provided with a conductive material 106 for electrically connecting the TFT array substrate 10 and the counter substrate 20. Then, as shown in FIG. 2, the counter substrate 20 having substantially the same contour as the sealing material 52 shown in FIG. 1 is fixed to the TFT array substrate 10 by the sealing material 52.

In FIG. 2, on the TFT array substrate 10, an alignment film is formed on the pixel electrodes 9a after the pixel switching TFTs and wirings such as scanning lines and data lines are formed. On the other hand, on the counter substrate 20, the counter electrode 2
1, an alignment film is formed on the uppermost layer. The liquid crystal layer 50 is made of, for example, liquid crystal in which one kind or several kinds of nematic liquid crystals are mixed, and a predetermined alignment state is established between the pair of alignment films.

On the TFT array substrate 10, in addition to the data line driving circuit 101, the scanning line driving circuit 104, etc., a sampling circuit for applying an image signal to a plurality of data lines 6a at a predetermined timing, a plurality of sampling circuits are provided. Data line 6
In a, a precharge circuit for supplying a precharge signal of a predetermined voltage level prior to each image signal, an inspection circuit for inspecting the quality, defects, etc. of the electro-optical device during manufacturing or shipping are formed. Good.

Next, in the electro-optical device having the above-mentioned overall structure, the structure and action of the light-shielding film provided on the counter substrate will be described as first to sixth embodiments with reference to FIGS. explain.

(First Embodiment) First, the structure and operation of the light-shielding film according to the first embodiment will be described with reference to FIGS. Here, FIG. 3 shows the code CR in FIG.
FIG. 2 is an enlarged cross-sectional view showing an enlargement of a portion inside a circle marked with 1,
FIG. 4 is a perspective view showing only the light shielding film in order to clearly understand the configuration of the light shielding film according to the first embodiment.

First, in the enlarged view of the counter substrate 20 side in FIG. 3, the counter substrate 20, the light shielding film 501 formed on the substrate 20 (lower side in the drawing), the light shielding film 501, and the substrate 20 are shown. The transparent counter electrode 21 and the alignment film 22 formed on the counter electrode 21 are provided. Although not shown in FIG. 2, in addition to the above in FIG. 3, on the surface side of the counter electrode 20 (upper side in the figure),
Silicon gel film 9 for adhering members (that is, counter substrate 20 and dustproof glass 902) located on both sides thereof.
01, dust-proof glass 902, non-reflective coating 903, and polarizing plate 701 corresponding to an example of the “optical element” in the present invention.
Are provided in sequence.

Of these, the polarizing plate 701 has a polarization action suitable for entering the liquid crystal layer 50 located in the lower part of FIG.
It is applied to the incident light L1. The polarizing plate 701 usually has a light transmittance of 80 to 90%, but conversely, 10 to 20% absorbs light, and when this is converted into heat, The board 701 will be damaged.

As shown in FIGS. 3 and 4, the light shielding film 501 is formed in the image display area 10a so as to have a grid pattern when seen in a plan view. This corresponds to a plurality of pixel electrodes, which will be described later, arranged in a matrix. That is, the light shielding film 501
Are formed so as to face the positions where the plurality of pixel electrodes are not formed, and thereby define a non-opening region. In this non-opening area, as shown in FIG. 4, a scanning line 3a extending in the left-right direction in the figure and a data line 6a extending in the up-down direction in the figure are provided on the TFT array substrate 10 side. It is provided. The scanning lines 3a and the data lines 6a will be described later.

The light-shielding film 501 is made of, for example, aluminum or other material having a relatively high light reflectance.

Here, in particular, as shown in FIGS. 3 and 4, the light shielding film 501 in the first embodiment is formed so that its cross section has a shape similar to that of a kamaboko. In other words, one surface of the light shielding film 501 is formed so as to include a convex shape. Here, the one surface corresponds to the light incident surface, as is clear from the arrangement relationship of FIG. Further, as can be seen from FIG. 4, this convex shape can be seen in the cross section perpendicular to the extending direction of the scanning line 3a, and at the same time, in the cross section perpendicular to the extending direction of the data line 6a. But you can see it.

According to such a light shielding film 501, as shown in FIG. 3, the incident light L1 incident from the surface side of the counter substrate 20 is reflected by the light incident surface including the convex shape as described above. Will be. For this reason, first, the light L1R related to this reflection hardly reaches the polarizing plate 701 as shown in FIG. The reason is clear from the figure, but the reflected light L1R
However, it follows a path different from that of the incident light L1 and goes to the outside of the image display area 10a or the “outside” of the counter substrate 20 or the “outside” of the electro-optical device. Therefore, in the first embodiment, re-incidence of light hardly occurs on the polarizing plate 701.
The likelihood of a light-to-heat conversion effect at is reduced. As a result, the polarizing plate 701 is hardly damaged by heat.

Incidentally, from the point shown in FIG. 3, the reflected light L1R as described above is totally reflected, for example, at the interface between the dustproof glass 902 and the non-reflective coating 903, and the light is confined in the electro-optical device. Although there is some concern about such cases, such concerns are almost unnecessary in the first embodiment. Because
This is because there is no interface in the silicon gel 901, the dustproof glass 902, the non-reflection coating 903, and the polarizing plate 701 that has a large change in the refractive index.

Further, in the first embodiment, the light shielding film 501
Since it was made of aluminum or the like having a light reflectance of about 80 to 90%, it is possible to more reliably enjoy the above-described action related to the reflection of light toward the “outside”, and the counter substrate 20. Most of the light that has entered from the surface of the is blocked by the light shielding film 501, so that it hardly reaches the inside of the electro-optical device such as the liquid crystal layer 50. Therefore, in the electro-optical device according to the first embodiment, it is possible to reduce the possibility of suffering various inconveniences associated with heat accumulation, such as changes in display characteristics, image sticking, flicker, deterioration of reliability, and the like. .

The above-mentioned light-shielding film 501 may include the above-mentioned frame light-shielding film 53. That is, even if the frame light-shielding film 53 has the above-described configuration, it is naturally included in the scope of the present invention.

Further, in the above description, in the light-shielding film 501 having the grid pattern, both the cross section perpendicular to the direction in which the scanning line 3a extends and the cross section perpendicular to the direction in which the data line 6a extends. However, the present invention is not limited to such a form. For example, a configuration in which only one of the above-mentioned two cross sections includes a convex shape is naturally within the scope of the present invention.

Further, the light shielding film 501 may be in a form including a portion having the inclined light incident surface in a region near the edge of the image display region 10a. By doing so, it is possible to more efficiently realize the reflection of incident light. Of the incident light, the image display area 10a
The light-shielding film 50 that is incident on the region near the edge of
This is because it is possible to relatively easily reflect the incident light to the outside of the image display area 10a by merely setting the inclination of the light incident surface in 1 with respect to the surface of the counter substrate 20.

(Second Embodiment) The structure and action of the light shielding film according to the second embodiment will be described below with reference to FIG. Here, FIG. 5 is a diagram having the same meaning as in FIG. 3, but is different in that it is an enlarged cross-sectional view showing a circled portion designated by reference numeral CR2 instead of reference numeral CR1 in FIG. In addition, the configuration of the light shielding film is slightly different from that of FIG.

In the second embodiment, as shown in FIG. 5, the convex curvature of the light incident surface of the light shielding film 502 is
The size of the counter substrate 20 gradually decreases from the center to the periphery. That is, the light-incident surface of the light-shielding film 502A located near the center of the counter substrate 20 includes a convex shape with a larger curvature, and is located nearer the periphery.
The light incident surfaces of B and 502C sequentially include convex shapes having a smaller curvature.

With this structure, the following operational effects are achieved. That is, as shown in FIG. 5, the reflected light LAR based on the incident light LA incident on the center side of the counter substrate 20 is incident light LB incident on the more peripheral side.
The optical path is more parallel to the surface of the counter substrate 20 than the reflected light LBR based on. It is clear that this is effective in preventing the reflected light LAR of the incident light LA that is incident closer to the center from reaching the polarizing plate 701. Therefore, according to the second embodiment, it is possible to more reliably prevent the polarizing plate 701 from being damaged by heat accumulation, as compared with the first embodiment.

(Third Embodiment) The structure and operation of the light shielding film according to the third embodiment will be described below with reference to FIG. Here, FIG. 6 is a diagram having the same effect as FIG. 3, but shows an aspect different from FIG. 3 in that a microlens 601 is formed.

The third embodiment is characterized in that, as shown in FIG. 6, the light shielding film 503 is formed in the same layer as the concave microlens 601. Note that FIG.
In addition to the microlens 601, the lens 6
01, a cover glass 611 is provided. The cover glass 611 and the microlens 601 or the counter substrate 20 are adhered to each other with an adhesive layer 612 containing an appropriate adhesive or the like. However, the adhesive layer 612
Does not need to be applied to the entire surface of the counter substrate 20 as shown in FIG. 6, and may be applied only to the peripheral portion in some cases.

According to the mode in which the microlens 601 is provided, the incident light can be condensed on a predetermined region on the pixel electrode 9a, so that the utilization efficiency of the incident light can be improved. Becomes

In particular, in such a configuration, as will be described later in the method of manufacturing the light-shielding film, part of the step of forming the light-shielding film 503 is performed at the same time as part of the step of forming the microlens 601. Therefore, the manufacturing cost can be reduced accordingly.

It should be noted that, in FIG. 6, the surface of the light shielding film 503 located on the side opposite to the light incident surface does not protrude from the surface of the counter substrate 20 unlike the one shown in FIG. Are not essential differences, and both are within the scope of the present invention.

(Fourth Embodiment) The structure and operation of the light shielding film according to the fourth embodiment will be described below with reference to FIG. Here, FIG. 7 is a diagram having the same effect as FIG. 3, but shows a mode in which the configuration of the light shielding film is slightly different from that in FIG.

In the fourth embodiment, as shown in FIG. 7, the light incident surface of the light shielding film 504 is assumed to include a concave shape. Even in such a form, as shown in FIG. 7, when the incident light L4 is reflected by the light incident surface of the light shielding film 504, the reflected light L4R hardly reaches the polarizing plate 701. Recognize. That is, it is apparent that the same operational effects as those of the above-described respective embodiments can be obtained.

(Fifth Embodiment) The structure and operation of the light shielding film according to the fifth embodiment will be described below with reference to FIG. Here, FIG. 8 is a diagram having the same purpose as FIG. 3, but shows a mode in which the configuration of the light shielding film is slightly different from that in FIG.

In the fifth embodiment, as shown in FIG. 8, the light-shielding film 505 has a cross section of a substantially parallelogram shape, and the light incident surface is inclined with respect to the surface of the counter substrate 20. It is said to have a surface. Even in such a form, as shown in FIG. 8, when the incident light L5 is reflected by the light incident surface of the light shielding film 505, the reflected light L5R hardly reaches the polarizing plate 701. That is, it is apparent that the same operational effects as those of the above-described respective embodiments can be obtained.

By the way, FIG. 8 shows the code CR in FIG.
Since it is an enlarged cross-sectional view of the part denoted by 1, the counter substrate 20
It is shown including the central part of the. From this, as shown in FIG. 8, the inclination of the light-incident surface of the light-shielding film 505 is set in the opposite direction with the central portion as a boundary. With such a configuration, it is clear that the above-described operational effects can be enjoyed more reliably.

As described above, as the mode of the light-shielding film according to the present invention, although not shown, various other than the above can be considered. However, what is common to the light-shielding films 501 to 505 in each of the above-described embodiments, or the light-shielding films having various forms (not shown) described above, is that at least one of the lights incident on the surface of the counter substrate 20 is common. This means that the part has a light incident surface inclined with respect to the surface so that the part is reflected to the outside of the image display area 10a. For example, in FIG. 3, a straight line Ax penetrating the central portion of the counter substrate 20 (this is also the normal line of the surface of the substrate 20) and the light incident surface forming a part of the light shielding film 501 are measured. An inclination as shown in the figure exists between the line C and the line C. In short, there is an inclination between the surface and the light incident surface that reflects the incident light L1 to the outside of the image display area 10a. It should be noted that such a thing is similarly established for FIGS.

Incidentally, the above-mentioned "light incident surface inclined with respect to the surface of the counter substrate 20 so as to reflect at least a part of the light to the outside of the image display area 10a". Is expressed geometrically, "in a cone having a normal defined by the central portion of the surface of the counter substrate 20 as an axis and having a vertex on the side where the liquid crystal layer 50 is present and a bottom surface on the side where the surface is present, It is also possible to put it in another way as "a light incident surface having a normal line that coincides with the ridgeline or an extension of the ridgeline." Here, the “cone” specifically refers to a cone, a triangular pyramid, a quadrangular pyramid, and the like, and more generally, regardless of the shape of the bottom surface, It is a three-dimensional shape defined by connecting one vertex. Even with such an expression, it is considered that the above contents are expressed, but especially when the cone has a shape symmetrical with respect to other axes such as a cone, the normal line of the inclined light incident surface is This is a particularly preferable mode because it is omnidirectionally directed to the outside of the image display area 10a. The symbols Ax, P and C in FIG. 3 indicate the axis line, the apex and the ridge line of the cone or the extension line of the ridge line, respectively.

(Circuit Configuration and Operation of Electro-Optical Device and Detailed Configuration in Pixel Section) The circuit configuration and operation of the electro-optical device having the above configuration and the detailed configuration in the pixel section will be described below with reference to FIGS. This will be described with reference to FIG. Here, FIG. 9 is an equivalent circuit of various elements, wirings, and the like in a plurality of pixels that are formed in a matrix and form an image display area of the electro-optical device. FIG. 10 is a plan view of a plurality of pixel groups adjacent to each other on a TFT array substrate on which data lines, scanning lines, pixel electrodes, etc. are formed. Figure 11
FIG. 11 is a sectional view taken along the line AA ′ of FIG. 10. In FIG. 11, the scale of each layer / member is made different so that each layer / member has a size recognizable in the drawing.

In FIG. 9, a pixel electrode 9a and a pixel electrode 9a for switching control are provided for each of a plurality of pixels formed in a matrix forming the image display area 10a of the electro-optical device according to the present embodiment. TFT
And the data line 6a to which the image signal is supplied is electrically connected to the source of the TFT 30. Image signals S1, S2 to be written to the data line 6a,
, Sn may be supplied line-sequentially in this order,
The data lines 6a adjacent to each other may be supplied for each group.

The scanning line 3a is electrically connected to the gate of the TFT 30, and the scanning signals G1, G2, ..., Gm are pulse-wise applied in this order to the scanning line 3a in a pulsed manner at a predetermined timing. Is configured to. The pixel electrode 9a is electrically connected to the drain of the TFT 30, and by closing the switch of the TFT 30, which is a switching element, for a certain period, the image signals S1, S2, ..., Sn supplied from the data line 6a are transmitted. Write at a predetermined timing.

An image signal S of a predetermined level written in liquid crystal as an example of an electro-optical material via the pixel electrode 9a.
, S2, ..., Sn are held for a certain period between the counter electrode and the counter electrode formed on the counter substrate. The liquid crystal modulates light by changing the orientation and order of the molecular assembly depending on the applied voltage level, and enables gradation display. In the normally white mode, the transmittance for incident light is reduced according to the voltage applied in each pixel unit, and in the normally black mode, the incident light is incident according to the voltage applied in each pixel unit. The transmittance for light is increased, and light having a contrast corresponding to an image signal is emitted from the electro-optical device as a whole.

In order to prevent the held image signal from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9a and the counter electrode 21. A capacitance line 300 including a fixed potential side capacitance electrode of the storage capacitance 70 and fixed at a constant potential is provided in parallel with the scanning line 3a.

In the following, the data line 6a and the scanning line 3 will be described.
10A and 10B show a practical configuration of an electro-optical device that realizes the above-described circuit operation by the a, the TFT 30, and the like.
And FIG. 11 will be described.

First, the electro-optical device according to this embodiment is
As shown in FIG. 11 which is a sectional view of FIG.
The array substrate 10 and the transparent counter substrate 20 arranged to face the array substrate 10 are provided. The TFT array substrate 10 is made of, for example, a quartz substrate, a glass substrate, or a silicon substrate, and the counter substrate 20 is made of, for example, a glass substrate or a quartz substrate.

As shown in FIG. 11, the TFT array substrate 1
A pixel electrode 9a is provided at 0, and an alignment film 16 that has been subjected to a predetermined alignment process such as a rubbing process is provided above the pixel electrode 9a. The pixel electrode 9a is, for example, ITO.
(Indium Tin Oxide) film or other transparent conductive film. The alignment film 16 is made of an organic film such as a polyimide film.

On the other hand, the counter substrate 20 is provided with a counter electrode 21 over the entire surface thereof, and on the lower side thereof, an alignment film 22 subjected to a predetermined alignment treatment such as rubbing treatment is provided. There is. The counter electrode 21 is made of a transparent conductive film such as an ITO film. The alignment film 22 is made of a transparent organic film such as a polyimide film.

Here, particularly in the present embodiment, the light shielding film 501 having the above-mentioned lattice-shaped pattern is formed on the counter substrate 20. As described above, the light shielding film 501 is a light inclined with respect to the surface of the counter substrate 20 so that at least a part of the light incident on the surface is reflected to the outside of the image display region 10a. It is characterized by having an incident surface (however, in FIG. 11, it is not clear from the relationship of the cross-sectional position, etc.).

On the other hand, in FIG. 10, on the transparent TFT array substrate of the electro-optical device, a plurality of transparent pixel electrodes 9a (outlined by a dotted line portion 9a ') are provided in a matrix. A data line 6a and a scanning line 3a are provided along the vertical and horizontal boundaries of the pixel electrode 9a.

The scanning line 3a is arranged so as to face a channel region 1a 'of the semiconductor layer 1a, which is shown by a hatched region in the figure, and the scanning line 3a functions as a gate electrode. That is, pixel switching TFTs 30 are provided at the intersections of the scanning lines 3a and the data lines 6a, in which the main line portions of the scanning lines 3a are opposed to each other as gate electrodes in the channel region 1a '.

As shown in FIG. 11, the TFT 30 is an LD
It has a D (Lightly Doped Drain) structure, and as a constituent element thereof, a channel is formed by an electric field from the scanning line 3a that functions as a gate electrode as described above, for example, a polysilicon film. Semiconductor layer 1
a channel region 1a ', an insulating film 2 including a gate insulating film for insulating the scanning line 3a and the semiconductor layer 1a, and the semiconductor layer 1a.
The low concentration source region 1b and the low concentration drain region 1c, and the high concentration source region 1d and the high concentration drain region 1e are provided.

The TFT 30 preferably has an LDD structure as shown in FIG.
b and the lightly doped drain region 1c may have an offset structure in which no impurity is implanted, and the impurity is implanted at a high concentration by using the gate electrode formed of a part of the scanning line 3a as a mask to self-align with the highly concentrated source region and It may be a self-aligned TFT that forms the concentration drain region. Further, in the present embodiment, the gate electrode of the pixel switching TFT 30 has a single gate structure in which only one gate electrode is arranged between the high-concentration source region 1d and the high-concentration drain region 1e, but two or more gates are provided between them. The electrodes may be arranged. As described above, if the TFT is configured with dual gates or triple gates or more, it is possible to prevent the leak current at the junction between the channel and the source and drain regions, and reduce the off-time current. Further, the semiconductor layer 1a forming the TFT 30 may be a non-single crystal layer or a single crystal layer. A known method such as a bonding method can be used for forming the single crystal layer. By forming the semiconductor layer 1a as a single crystal layer, it is possible to particularly improve the performance of peripheral circuits.

On the other hand, as shown in FIGS. 10 and 11, the storage capacitor 70 includes a relay layer 71 as a pixel potential side capacitance electrode connected to the high concentration drain region 1e of the TFT 30 and the pixel electrode 9a, and a fixed potential side. Capacitance line 3 as a capacity electrode
00 are formed so as to face each other with the dielectric film 75 interposed therebetween. With this storage capacitor 70, the potential holding characteristic of the pixel electrode 9a can be remarkably improved.

The relay layer 71 is made of, for example, a conductive polysilicon film and functions as a pixel potential side capacitance electrode. However, the relay layer 71 may be composed of a single-layer film or a multi-layer film containing a metal or an alloy, like the capacitance line 300 described in detail later. The relay layer 71 has a function as a pixel potential side capacitance electrode, and also via the contact holes 83 and 85,
It has a function of relay-connecting the pixel electrode 9a and the high-concentration drain region 1e of the TFT 30.

The capacitance line 300 is made of a conductive film containing metal or alloy, for example, and functions as a fixed potential side capacitance electrode.
When seen in a plan view, the capacitance line 300 is formed so as to overlap the formation region of the scanning line 3a, as shown in FIG.
More specifically, the capacitance line 300 includes a main line portion extending along the scanning line 3a, and projecting portions projecting upward along the data line 6a from respective points intersecting the data line 6a in the figure.
A portion corresponding to the contact hole 85 is provided with a slightly constricted portion. Of these, the protrusion contributes to the increase of the formation region of the storage capacitor 70 by utilizing the region above the scanning line 3a and the region below the data line 6a.

Such a capacitance line 300 is preferably made of a conductive light-shielding film containing a refractory metal, functions as a fixed potential side capacitance electrode of the storage capacitor 70, and shields the TFT 30 from the incident light on the upper side of the TFT 30. It also has a function as a light-shielding layer.

As shown in FIG. 11, the dielectric film 75 has a relatively thin HTO (High
Temperature Oxide) film, LTO (Low Temperature Ox)
ide) film or the like, or a silicon nitride film or the like. From the viewpoint of increasing the storage capacitance 70, the thinner the dielectric film 75 is, the better as long as the reliability of the film is sufficiently obtained.

In addition to the above, in FIGS. 10 and 11, a lower light-shielding film 11a is provided below the TFT 30. The lower light-shielding film 11a is patterned in a lattice pattern, and thereby defines the opening area of each pixel. The opening area is also defined by the data line 6a extending in the vertical direction in FIG. 10 and the capacitance line 300 extending in the horizontal direction in FIG. 10 intersecting each other.

As for the lower light-shielding film 11a, the potential fluctuations of the TFT are similar to those of the capacitance line 300 described above.
In order to avoid adversely affecting 30, it is preferable to extend from the image display area to its periphery and connect it to a constant potential source.

Under the TFT 30, the base insulating film 12 is formed.
Is provided. The base insulating film 12 is the lower light-shielding film 11
In addition to the function of insulating the TFT 30 from a through the interlayer insulation, it is formed on the entire surface of the TFT array substrate 10 to change the characteristics of the TFT 30 for pixel switching due to surface roughness of the TFT array substrate 10 and stains remaining after cleaning. It has a function to prevent

A high concentration source region 1d is formed on the scanning line 3a.
A first interlayer insulating film 41 is formed in which a contact hole 81 leading to and a contact hole 83 leading to the high-concentration drain region 1e are opened.

On the first interlayer insulating film 41, the relay layer 71,
The relay layer 72 and the capacitor line 300 are formed, and the second interlayer insulation in which the contact hole 81 leading to the high-concentration source region 1d relay layer 72 and the contact hole 85 leading to the relay layer 71 are respectively formed thereon. The film 42 is formed.

In the present embodiment, the first interlayer insulating film 4
For 1, by firing at about 1000 ℃,
The ions implanted into the polysilicon film forming the semiconductor layer 1a and the scanning line 3a may be activated. On the other hand, the second interlayer insulating film 42 may be subjected to no such firing to reduce the stress generated near the interface of the capacitance line 300.

The data line 6a is formed on the second interlayer insulating film 42.
Are formed, and the third interlayer insulating film 43 in which a contact hole 85 leading to the relay layer 71 is formed is formed thereon.
Are formed.

The surface of the third interlayer insulating film 43 is CMP (Ch
The liquid crystal layer 50 is flattened by an emical mechanical polishing process or the like, and reduces misalignment of the liquid crystal layer 50 due to a step due to various wirings and elements existing therebelow.

However, instead of or in addition to performing the flattening process on the third interlayer insulating film 43 as described above, the TFT array substrate 10, the base insulating film 12, the first interlayer insulating film 41 and the second interlayer insulating film are formed. A flattening process may be performed by forming a groove in at least one of the films 42 and burying the wiring such as the data line 6a and the TFT 30.

Here, in the electro-optical device of the present embodiment having the above-mentioned structure, the capacitance line 30 having the light-shielding function or having the light-shielding function is described above.
0, the data line 6a, or the lower light-shielding film 11a, T
The FT array substrate 10 may have a light incident surface inclined with respect to the surface of the FT array substrate 10 so that at least a part of the light incident on the surface is reflected to the outside of the image display region 10a. According to such a configuration, assuming that the electro-optical device according to the present embodiment is applied as one light valve in a multi-plate liquid crystal projector capable of color display, light passing through another light valve, The so-called "return light" is the TF of the one light valve.
Since the light is incident on the T array substrate 10, it is possible to prevent the accumulation of heat due to the return light in the one light valve.

(Method of Manufacturing Light-Shielding Film) A method of manufacturing the light-shielding film 503 (see FIG. 6) according to the third embodiment described above will be described below with reference to FIG. Figure 1
2A to 2C are process cross-sectional views sequentially showing the manufacturing process of the light shielding film 503 according to the third embodiment. In addition, FIG.
Note that in relation to FIG. 6, the top and bottom are just the opposite.

First, as shown in step (1) of FIG.
A mask layer 990 is formed on the counter substrate 20. Next, as shown in step (2) of FIG. 12, the mask layer 990 is patterned by photolithography to form openings 991a and 991b having a predetermined planar arrangement.
To form. At this time, the opening 991a is formed corresponding to the region where the light shielding film 503 is to be formed after the next step, and the opening diameter is made smaller than that of the opening 991b. After the next process,
The concave microlens 601 is formed corresponding to a region where the microlens 601 is to be formed, and the opening diameter is equal to that of the opening 99.
It is made larger than that of 1a. In addition, the opening diameters of these openings 991a and 991b are as shown in FIG.
As shown in the step (2) of No. 2, it is desirable that the diameter is smaller than the diameter of the concave curved surface portion for the light shielding film 503 to be actually formed or for the concave microlens 601.

Next, as shown in step (3) of FIG.
The surface of the counter substrate 20 is isotropically etched from the openings 991a and 991b of the mask layer 990 to form concave curved surface portions 992a and 992b. This etching process is performed by wet etching using an etching solution mainly containing hydrofluoric acid, for example. At this time, due to the general characteristics of wet etching, even if the etching process is performed at a time, the opening 991 having a small opening diameter is formed.
In the case of a, the concave curved surface portion 992a has a small depth and a small etching amount (hereinafter, referred to as “grooving amount” for convenience) with respect to the interface between the mask layer 990 and the counter substrate 20.
And the opening 991b having a large opening diameter.
Then, the concave curved surface portion 992b having a large depth and a large amount of hollowing is formed. That is, in this embodiment, the concave curved surface portion 99 where the microlens is to be formed.
2b, and the concave curved surface portion 9 on which the light shielding film is to be formed.
The step of forming 92a will be performed at the same time.

After the etching process as described above is completed, the mask layer 990 is then formed as shown in step (4) of FIG.
Are removed by an etching process. And then, as shown in FIG.
As shown in the step (5) of No. 2, a material having a light-shielding property, specifically, a material having a high light reflectance, such as aluminum, is formed only on the opening 992a.
For such film formation, for example, a mask layer is formed only on the concave curved surface portion 992b by a method similar to that for the above-described mask layer 990, that is, a photolithography method, and the concave curved surface portion 992a is formed. It may be carried out by utilizing a form in which the opening of the mask layer is formed. Through this step, the light shielding film 503 is formed.

Next, as shown in step (6) of FIG.
A thermosetting adhesive 612 is formed on the surface of the microlens 601.
Is applied and a cover glass 611 made of neocerum or the like is pressed to cure. The cover glass 611 may be polished so as to have a predetermined thickness. Finally, the counter electrode 21 and the alignment film 22 are formed in this order by sputtering, coating, etc., and the counter substrate 20 having the microlenses 601 and the light shielding film 503 as shown in FIG. 6 is completed. Although the polarizing plate 701 and the like are not shown in FIG.
Regarding 1 and the like, after the completion of the electro-optical device as a whole, it is usually attached to the electro-optical device in an externally attached form.

As described above, according to this embodiment, part of the process of forming the light shielding film 503 is performed by the microlens 601.
Since it can be performed simultaneously with the step of forming, it is possible to reduce the manufacturing cost by a corresponding amount.

(Embodiment of Electronic Equipment) Next, regarding the embodiment of the projection type color display device which is an example of the electronic equipment using the electro-optical device described in detail above as a light valve, its overall structure, particularly optical The configuration will be described. FIG. 13 is a schematic sectional view of the projection type color display device.

In FIG. 13, a liquid crystal projector 1100 which is an example of the projection type color display device in this embodiment.
Prepares three liquid crystal modules including a liquid crystal device in which the driving circuit is mounted on the TFT array substrate.
It is configured as a projector used as the light valves 100R, 100G, and 100B for the. In the liquid crystal projector 1100, when the projection light is emitted from the lamp unit 1102 of a white light source such as a metal halide lamp, the three mirrors 1106 and the two dichroic mirrors 1108 cause the light components R, G and R corresponding to the three primary colors of RGB to be generated. It is divided into B and is led to the light valves 100R, 100G and 100B corresponding to the respective colors.
At this time, in particular, the B light is guided through a relay lens system 1121 including an entrance lens 1122, a relay lens 1123, and an exit lens 1124 in order to prevent light loss due to a long optical path. Then, the light valves 100R, 100
The light components corresponding to the three primary colors respectively modulated by G and 100B are combined again by the dichroic prism 1112 and then projected as a color image on the screen 1120 via the projection lens 1114.

Further, in this projection type color display device, since strong light is emitted from the lamp unit 1102, the light valves 100R, 100G and 100B.
In order to prevent heat accumulation, the cooling fan 11
41 is attached. The various configurations as described above are generally housed in the mold 1151.

Particularly in the present embodiment having such a configuration, the light valves 100R, 100G and 10 are used.
Since the electro-optical device described above is applied to 0B, the following operational effects can be obtained.
That is, the light valves 100R, 100G and 10
In 0B, heat is hardly accumulated due to the action of the light shielding film 501 and the like, so that it is not necessary to request the cooling fan 1141 to have a particularly excellent capability as compared with the conventional case. Therefore, it is possible to provide a projection-type color display device that consumes less power and is quieter than conventional ones.

On the other hand, according to the mold 1151, the light reflected by the light incident surface including the convex shape in the light shielding film and reaching the outside of the light valves 100R, 100G and 100B is absorbed by the inner surface of the mold 1151. Will be done. Therefore, according to the present embodiment, a stable image display can be performed without the occurrence of so-called stray light or unnecessary diffused reflection thereof. In this case, it is more preferable to form the inner surface of the mold 1151 in a form in which light absorption is more likely to occur, for example, by painting the inner surface in black.

The present invention is not limited to the above-described embodiments, but can be appropriately modified within the scope of the gist or the concept of the invention which can be read from the claims and the entire specification, and accompanying such modifications. The electro-optical device, the manufacturing method thereof, the electronic device, and the projection display device are also included in the technical scope of the present invention.

[Brief description of drawings]

FIG. 1 illustrates a T in an electro-optical device according to an embodiment of the invention.
It is the top view which looked at an FT array substrate from the counter substrate side with each component formed on it.

FIG. 2 is a sectional view taken along line HH ′ of FIG.

FIG. 3 is a cross-sectional view showing, in an enlarged manner, a portion inside a circle denoted by reference numeral CR1 shown in FIG. 2 according to the first embodiment of the present invention, and showing a configuration of a light-shielding film including a convex shape in its cross-section. It is a thing.

FIG. 4 is a perspective view of the configuration of the light shielding film shown in FIG.

FIG. 5 is a cross-sectional view showing, in an enlarged manner, a portion inside a circle denoted by reference numeral CR2 shown in FIG. 2 according to the second embodiment of the present invention, the cross-section including a convex shape, It shows a configuration of a light shielding film in which the curvature of the convex shape gradually decreases toward the peripheral portion.

FIG. 6 is a diagram having the same effect as in FIG. 3, showing a different aspect from the diagram in that a microlens is formed.

FIG. 7 is a diagram having the same effect as FIG. 3, and shows a different aspect from the diagram in that it is a light-shielding film including a concave shape in its cross section.

FIG. 8 is a view having the same effect as FIG. 3, and shows a different aspect in that it is a light-shielding film including a substantially parallelogram in its cross section.

FIG. 9 is a circuit diagram showing an equivalent circuit of various elements, wirings, etc. provided in a plurality of pixels in a matrix forming an image display area in the electro-optical device according to the embodiment of the present invention.

FIG. 10 is a plan view of a plurality of pixel groups adjacent to each other on a TFT array substrate on which data lines, scanning lines, pixel electrodes and the like are formed in the electro-optical device according to the embodiment of the invention.

11 is a cross-sectional view taken along the line AA ′ of FIG.

12A to 12C are process cross-sectional views sequentially showing a process of manufacturing a light-shielding film according to a third embodiment of the present invention.

FIG. 13 is a schematic cross-sectional view showing a color liquid crystal projector which is an example of a projection type color display device which is an embodiment of an electronic apparatus of the invention.

[Explanation of symbols]

3a ... Scanning line 6a ... Data line 9a ... Pixel electrode 10 ... Substrate 20 ... Counter substrate 21 ... Counter electrode 50 ... Liquid crystal layer 53 ... Frame light shielding film 501, 502A, 502B, 502C, 503, 50
4, 505 ... Shading film 601 ... Micro lens 701 ... Polarizing plate (plate for changing light properties) L1, L2, L3, L4, L5 ... Incident light L1R, LAR, LBR, L3R, L4R, L5R ... Reflected light

Claims (13)

[Claims] 1. Having a surface on which light is incident,
One substrate in which an electro-optical material is sandwiched between the other substrate and a substrate arranged opposite to each other, and a predetermined pattern in an image display area of the one substrate, and at least a part of the light is displayed in the image display. An electro-optical device comprising: a light-shielding film including a portion having a light incident surface inclined with respect to the surface so as to be reflected to the outside of the region. 2. The electro-optical device according to claim 1, wherein the light shielding film includes a portion having the inclined light incident surface in a region near an edge of the image display region. 3. The electro-optical device according to claim 1, wherein the light shielding film contains aluminum. 4. A plurality of pixel electrodes arranged in a matrix and a plurality of pixel electrodes connected to each of the plurality of pixel electrodes on either one of the one substrate or the other substrate. The thin film transistor and a wiring connected to the plurality of thin film transistors are provided, and the light shielding film has a lattice-shaped pattern facing each other at a position where the plurality of pixel electrodes are not formed. The electro-optical device according to any one of claims. 5. The wiring includes a scanning line, and the light-incident surface of the light-shielding film is convex in a cross section perpendicular to the extending direction of the scanning line when viewed from the front surface side of the one substrate. The electro-optical device according to claim 4, wherein the electro-optical device includes a shape. 6. The wiring includes a data line, and a light-incident surface of the light-shielding film is convex in a cross section perpendicular to the extending direction of the data line when viewed from the front surface side of the one substrate. The electro-optical device according to claim 4, wherein the electro-optical device includes a shape. 7. The wiring includes a scan line or a data line,
The light-incident surface of the light-shielding film is viewed from the front surface side of the one substrate in a cross section perpendicular to the extending direction of the scanning line and in a cross section perpendicular to the extending direction of the data line. 7. The electro-optical device according to claim 4, further comprising a convex shape. 8. The electro-optical device according to claim 1, wherein an inclination of the light incident surface is gradually reduced from a central portion of the one substrate to a peripheral portion thereof. apparatus. 9. The electro-optical device according to claim 1, further comprising an optical element on the surface. 10. A method of manufacturing an electro-optical device, comprising an electro-optical substance sandwiched between one substrate having a surface on which light is incident and the other substrate opposed to the one substrate. Then, the step of forming a concave curved surface portion on the surface opposite to the surface of the one substrate, and by forming a material that reflects light on the concave curved surface portion, In the image display area,
And a step of forming a light shielding film having a light incident surface inclined with respect to the surface so as to reflect at least a part of the light to the outside of the image display area. Method. 11. The electro-optical device according to claim 10, wherein the step of forming the concave curved surface portion is performed at the same time as a part of the step of forming a microlens on the one substrate. Production method. 12. An electronic apparatus comprising the electro-optical device according to claim 1. Description: 13. A light valve comprising the electro-optical device according to claim 1, a light source which makes projection light incident on the light valve, and the projection light which is emitted from the light valve. A projection type display device, comprising: an optical system for controlling the light valve; and a mold that houses the light valve, the light source, and the optical system.