JP2003162045A - Lithographic printing original plate - Google Patents
Lithographic printing original plateInfo
- Publication number
- JP2003162045A JP2003162045A JP2001359270A JP2001359270A JP2003162045A JP 2003162045 A JP2003162045 A JP 2003162045A JP 2001359270 A JP2001359270 A JP 2001359270A JP 2001359270 A JP2001359270 A JP 2001359270A JP 2003162045 A JP2003162045 A JP 2003162045A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- group
- resin
- lithographic printing
- polyvinyl acetal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 92
- 229920005989 resin Polymers 0.000 claims abstract description 43
- 239000011347 resin Substances 0.000 claims abstract description 43
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 38
- 239000002253 acid Substances 0.000 claims abstract description 37
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000011354 acetal resin Substances 0.000 claims abstract description 34
- 229920006324 polyoxymethylene Polymers 0.000 claims abstract description 34
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 32
- 239000000126 substance Substances 0.000 claims abstract description 29
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000003513 alkali Substances 0.000 claims abstract description 21
- 239000002243 precursor Substances 0.000 claims description 16
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 8
- 150000007524 organic acids Chemical class 0.000 claims description 5
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 claims description 3
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 claims description 3
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 claims description 3
- 239000000243 solution Substances 0.000 abstract description 35
- 239000011248 coating agent Substances 0.000 abstract description 29
- 238000000576 coating method Methods 0.000 abstract description 29
- 238000011161 development Methods 0.000 abstract description 28
- 239000007788 liquid Substances 0.000 abstract description 18
- 239000007864 aqueous solution Substances 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 50
- 238000000034 method Methods 0.000 description 49
- 239000000049 pigment Substances 0.000 description 44
- 239000000975 dye Substances 0.000 description 34
- 150000001875 compounds Chemical class 0.000 description 29
- 239000000463 material Substances 0.000 description 29
- -1 quinonediazide compound Chemical class 0.000 description 29
- 229910052782 aluminium Inorganic materials 0.000 description 21
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 18
- 238000011282 treatment Methods 0.000 description 17
- 125000001424 substituent group Chemical group 0.000 description 16
- 238000012545 processing Methods 0.000 description 15
- 150000003839 salts Chemical class 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000004090 dissolution Methods 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- 239000000178 monomer Substances 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 9
- 239000003921 oil Substances 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- 125000004093 cyano group Chemical group *C#N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 7
- 239000011591 potassium Substances 0.000 description 7
- 229910052700 potassium Inorganic materials 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 6
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002736 nonionic surfactant Substances 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- 235000010724 Wisteria floribunda Nutrition 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000012954 diazonium Substances 0.000 description 4
- 150000001989 diazonium salts Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 4
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- HYGWQJQDFKYKDP-UHFFFAOYSA-N 2-methylidene-n-phenylbutanamide Chemical compound CCC(=C)C(=O)NC1=CC=CC=C1 HYGWQJQDFKYKDP-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001241 acetals Chemical class 0.000 description 3
- 125000005396 acrylic acid ester group Chemical group 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 239000000987 azo dye Substances 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 125000001246 bromo group Chemical group Br* 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 3
- 150000003384 small molecules Chemical class 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 3
- QQVDJLLNRSOCEL-UHFFFAOYSA-N (2-aminoethyl)phosphonic acid Chemical compound [NH3+]CCP(O)([O-])=O QQVDJLLNRSOCEL-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 2
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- NMPVEAUIHMEAQP-UHFFFAOYSA-N 2-Bromoacetaldehyde Chemical compound BrCC=O NMPVEAUIHMEAQP-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- 229920000084 Gum arabic Polymers 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- 241000978776 Senegalia senegal Species 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000000205 acacia gum Substances 0.000 description 2
- 235000010489 acacia gum Nutrition 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- VUEDNLCYHKSELL-UHFFFAOYSA-N arsonium Chemical class [AsH4+] VUEDNLCYHKSELL-UHFFFAOYSA-N 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 2
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- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- RINSWHLCRAFXEY-UHFFFAOYSA-N n-(4-sulfamoylphenyl)prop-2-enamide Chemical compound NS(=O)(=O)C1=CC=C(NC(=O)C=C)C=C1 RINSWHLCRAFXEY-UHFFFAOYSA-N 0.000 description 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
- OJBZOTFHZFZOIJ-UHFFFAOYSA-N n-acetyl-2-methylprop-2-enamide Chemical compound CC(=O)NC(=O)C(C)=C OJBZOTFHZFZOIJ-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- FYCBGURDLIKBDA-UHFFFAOYSA-N n-hexyl-2-methylprop-2-enamide Chemical compound CCCCCCNC(=O)C(C)=C FYCBGURDLIKBDA-UHFFFAOYSA-N 0.000 description 1
- NXURUGRQBBVNNM-UHFFFAOYSA-N n-nitro-2-phenylprop-2-enamide Chemical compound [O-][N+](=O)NC(=O)C(=C)C1=CC=CC=C1 NXURUGRQBBVNNM-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- CHDKQNHKDMEASZ-UHFFFAOYSA-N n-prop-2-enoylprop-2-enamide Chemical compound C=CC(=O)NC(=O)C=C CHDKQNHKDMEASZ-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- YOOYVODKUBZAPO-UHFFFAOYSA-N naphthalen-1-ylphosphonic acid Chemical compound C1=CC=C2C(P(O)(=O)O)=CC=CC2=C1 YOOYVODKUBZAPO-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- GIPDEPRRXIBGNF-KTKRTIGZSA-N oxolan-2-ylmethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC1CCCO1 GIPDEPRRXIBGNF-KTKRTIGZSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- AWUCVROLDVIAJX-GSVOUGTGSA-N sn-glycerol 3-phosphate Chemical compound OC[C@@H](O)COP(O)(O)=O AWUCVROLDVIAJX-GSVOUGTGSA-N 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 235000019337 sorbitan trioleate Nutrition 0.000 description 1
- 229960000391 sorbitan trioleate Drugs 0.000 description 1
- 239000001589 sorbitan tristearate Substances 0.000 description 1
- 235000011078 sorbitan tristearate Nutrition 0.000 description 1
- 229960004129 sorbitan tristearate Drugs 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical class C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 229940117957 triethanolamine hydrochloride Drugs 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 229960004418 trolamine Drugs 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/06—Backcoats; Back layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はオフセット印刷マス
ターとして使用できる画像記録・印刷原板材料に関する
ものであり、特にコンピュータで作成されて出力された
ディジタル画像信号を赤外線レーザ光で記録して直接製
版できるいわゆるダイレクト製版用の赤外線レーザ用ポ
ジ型感光性印刷原板材料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an image recording / printing master plate material that can be used as an offset printing master, and in particular, a digital image signal produced by a computer and output can be recorded by an infrared laser beam to directly make a plate. The present invention relates to a positive photosensitive printing original plate material for infrared laser for so-called direct plate making.
【0002】[0002]
【従来の技術】従来、コンピュータのディジタルデータ
から直接製版するシステムとしては、
電子写真法によるもの、Arレーザによる露光と後
加熱の組み合わせによる光重合系、感光性樹脂上に銀
塩感材を積層したもの、シルバーマスタータイプのも
の、放電破壊やレーザ光によりシリコーンゴム層を破
壊することによるもの等が知られている。2. Description of the Related Art Conventionally, as a system for directly making a plate from digital data of a computer, an electrophotographic method, a photopolymerization system by a combination of Ar laser exposure and post-heating, and a silver salt sensitive material laminated on a photosensitive resin are used. There are known ones, such as a silver master type, a discharge master, and a method in which a silicone rubber layer is destroyed by laser light.
【0003】しかしながら、の電子写真法を用いるも
のは、帯電、露光、現像等処理が煩雑であり、装置が複
雑で大がかりなものになる。の方法では後加熱工程を
要するほか、高感度な版材を要し、明室での取扱いが難
しくなる。、の方法では銀塩を使用するため処理が
煩雑になり、コストが高くなる欠点がある。またの方
法は比較的完成度の高い方法であるが、版面に残るシリ
コーン滓の除去に問題点を残している。一方、近年にお
けるレーザの発展は目ざましく、特に近赤外から赤外に
発光領域を持つ固体レーザ・半導体レーザは高出力かつ
小型の装置が容易に入手できるようになってきている。
コンピュータ等のディジタルデータから直接製版する際
の露光光源として、これらのレーザは非常に有用であ
る。However, in the method using the electrophotographic method, the processing such as charging, exposure and development is complicated, and the apparatus becomes complicated and large-scale. This method requires a post-heating step and also requires a highly sensitive plate material, which makes it difficult to handle in a bright room. The methods (1) and (2) have the drawback that the processing becomes complicated and the cost becomes high because a silver salt is used. Although the other method is a method with a relatively high degree of perfection, it has a problem in removing the silicone residue remaining on the plate surface. On the other hand, the development of lasers in recent years has been remarkable, and particularly for solid-state lasers / semiconductor lasers having an emission region from near infrared to infrared, high-output and small-sized devices have become easily available.
These lasers are very useful as an exposure light source when making a plate directly from digital data of a computer or the like.
【0004】従来公知のダイレクト製版用の赤外線レー
ザ用ポジ型平板印刷原板材料においては、アルカリ水溶
液可溶性高分子化合物として、ノボラック樹脂等のフェ
ノール性水酸基を有するアルカリ水溶液可溶性樹脂が用
いられている。このポジ型平版印刷用原板は、光熱変換
剤の露光領域における熱の作用でクレゾールノボラック
樹脂の会合状態が変化するので、露光部と非露光部との
熱に対する挙動差により、溶解性に識別性が生じ、それ
によって製版されるが、その溶解速度差が狭いために、
実際の製版作業においては、アルカリ活性の些細な変動
の影響を受けやすく安定性に欠けていた。そこで、アル
カリ溶解阻止剤(溶解インヒビター)によって現像ラチ
チュードを拡大させる技術の開発が活発に行なわれてお
り、WO1/09682A2(creo)公報には、溶解インヒビターと
して特定構造の(フェノールペンダント)アセタールポ
リマーを含有するレジスト材料が開示されており、WO99
/11458A(KPG)公報には、溶解インヒビターとして 特定
のペンダント基(含ヒドロキシル基,カルボン酸)を有
するポリマーを含有する組成物が提案されており、特開
平10-87733号(Konica)公報には、溶解インヒビターとし
てのオルトカルボン酸、アセタール、ケタールの内1つ
以上のグラフト側鎖を有するポリマーと、光酸発生剤を
含有する印刷原板が開示されており、EP1072404A(Lastr
a)公報には、部分的にエステル化されたヒドロキシアク
リルポリマーを含有する画像記録材料が開示されてい
る。しかし、上記印刷原板材料はいずれも識別性がまだ
不十分である。In a conventionally known positive type lithographic printing plate material for infrared laser for direct plate making, an alkali aqueous solution-soluble resin having a phenolic hydroxyl group such as novolac resin is used as an alkali aqueous solution-soluble polymer compound. This positive-type lithographic printing plate precursor changes the association state of the cresol novolac resin due to the action of heat in the exposed region of the photothermal conversion agent, and therefore the difference in the behavior between the exposed part and the non-exposed part due to the heat makes the solubility distinctive. Occurs, which causes plate making, but due to the narrow difference in dissolution rate,
In the actual plate-making work, it was susceptible to slight fluctuations in alkali activity and lacked stability. Therefore, the development of a technique for expanding the development latitude with an alkali dissolution inhibitor (dissolution inhibitor) is being actively carried out. A resist material containing is disclosed, and WO99
/ 11458A (KPG) has proposed a composition containing a polymer having a specific pendant group (hydroxyl group, carboxylic acid) as a dissolution inhibitor, and JP-A-10-87733 (Konica) discloses the composition. , A orthocarboxylic acid as a dissolution inhibitor, an acetal, a polymer having one or more graft side chains of ketal, and a printing original plate containing a photoacid generator are disclosed, EP1072404A (Lastr
The a) publication discloses an image recording material containing a partially esterified hydroxyacrylic polymer. However, the above-mentioned printing plate materials are still insufficient in distinguishability.
【0005】また、特開平7−285275号公報にお
いて、ノボラック樹脂等のフェノール性水酸基を有する
アルカリ水溶液可溶性樹脂に、光を吸収し熱を発生する
物質と、種々のオニウム塩、キノンジアジド化合物類等
を添加した画像記録材料を提案している。これらの画像
記録材料では、画像部ではオニウム塩、キノンジアジド
化合物類等が、アルカリ水溶液可溶性樹脂の溶解性を実
質的に低下させる溶解阻止剤として働き、非画像部では
熱により分解して溶解阻止剤としては働かず、画像形成
する。しかしながら、この画像記録材料では、オニウム
塩、キノンジアジド化合物類等が、可視領域に光吸収域
(350〜500nm)を有するため、取扱い場所は黄
色燈下に制限されるという不便がある。また、得られた
印刷版をさらに長期にわたって使用可能にするには、ク
リーナー液等の溶剤で洗浄した後再使用できるようにす
る必要があるが、ノボラック樹脂は耐溶剤性が低く、印
刷中にクリーナー液を使用すると耐刷性が低下するとい
う問題があった。Further, in Japanese Patent Laid-Open No. 7-285275, a substance which absorbs light and generates heat, various onium salts, quinonediazide compounds and the like are added to an alkali aqueous solution soluble resin having a phenolic hydroxyl group such as a novolac resin. The image recording material added is proposed. In these image-recording materials, onium salts, quinonediazide compounds, etc. in the image portion act as dissolution inhibitors that substantially reduce the solubility of the alkali aqueous solution-soluble resin, and in the non-image portion they are decomposed by heat to dissolve inhibitors. It does not work as an image forming. However, in this image recording material, onium salts, quinonediazide compounds, and the like have a light absorption region (350 to 500 nm) in the visible region, so that the handling place is inconveniently limited to yellow lights. Further, in order to make the obtained printing plate usable for a longer period of time, it is necessary to wash it with a solvent such as a cleaner liquid so that it can be reused. There is a problem in that printing durability is deteriorated when a cleaner liquid is used.
【0006】一方、特開平7−285275号公報にお
いては、オニウム塩、キノンジアジド化合物類等を添加
するとの前提の下で、アクリル樹脂やウレタン樹脂が使
用できることが記載されている。この公報によれば、ア
クリル樹脂やウレタン樹脂はフェノール性水酸基を有す
るアルカリ水溶液可溶性樹脂に対する溶解阻止性又は促
進性に関する記載はなく、溶解阻止を意図したものでは
ないが、刷版の耐久性を向上させることができることが
開示されている。On the other hand, Japanese Patent Laid-Open No. 7-285275 describes that an acrylic resin or a urethane resin can be used on the assumption that an onium salt, a quinonediazide compound or the like is added. According to this publication, acrylic resin and urethane resin have no description of dissolution inhibiting property or accelerating property with respect to an alkaline aqueous solution-soluble resin having a phenolic hydroxyl group, and are not intended to prevent dissolution, but improve durability of the printing plate. It is disclosed that this can be done.
【0007】又、ノボラックの硬膜反応による最表層の
不溶化も現像ラチチュード拡大の効果が認められ、エポ
キシ化合物を添加して硬化を促進することもUS6152036
公報に記載されている。更に特開平11-338131号公報に
は、赤外線吸収剤に、熱分解性の対カチオンを有するア
ニオン性金属錯体を用いることによって現像安定性の向
上が得られることが開示されている。Further, the insolubilization of the outermost surface layer due to the hardening reaction of novolak has the effect of expanding the development latitude, and it is also possible to add an epoxy compound to accelerate the curing.
It is described in the official gazette. Further, JP-A No. 11-338131 discloses that development stability can be improved by using an anionic metal complex having a thermally decomposable counter cation as an infrared absorber.
【0008】一方、特開平10-153863号公報には、特定
の金属錯体又は塩と親水性基を有する特定のバインダー
を併用することで現像性の安定性向上が得られることが
開示されている。また、特開2001-92126号公報には、作
用機構は不明であるが、溶解阻止剤として、周期律表の
IIIA族又は遷移金属の無機塩の有機化合物を用いること
が開示されている。しかし、これらの開示技術に示され
る溶解性の識別効果の増大は、バインダーと金属化合物
との相互作用による溶解阻止作用の発現によると考えら
れ、この相互作用のためか、他方において塗布液状態で
の安定性、塗布乾燥時の熱履歴が性能に与える影響によ
って、感光材料の現像安定性と現像ラチチュードの再現
性も低下していることも認められている。On the other hand, JP-A-10-153863 discloses that the stability of developability can be improved by using a specific metal complex or salt together with a specific binder having a hydrophilic group. . Further, in JP-A-2001-92126, the mechanism of action is unknown, but as a dissolution inhibitor,
The use of organic compounds of inorganic salts of Group IIIA or transition metals is disclosed. However, it is considered that the increase in the effect of distinguishing the solubility shown in these disclosed techniques is due to the appearance of the dissolution inhibiting effect due to the interaction between the binder and the metal compound. It is also recognized that the development stability of the light-sensitive material and the reproducibility of the development latitude are reduced due to the stability of the photosensitive material and the influence of the heat history during coating and drying on the performance.
【0009】上記のように、従来公知のダイレクト製版
用の赤外線レーザ用ポジ型平版印刷用原板は、画像部と
非画像部との識別性を高めようとすれば、耐溶剤性、可
視光安全性、耐用性、製造安定性など実用上必要な付随
特性が伴わない状況にあった。As described above, the conventionally known positive type lithographic printing plate for infrared laser for direct plate making is solvent resistant and visible light safe in order to enhance the distinguishability between the image part and the non-image part. It was in a situation where the practically necessary incidental characteristics such as durability, durability, and manufacturing stability were not involved.
【0010】[0010]
【発明が解決しようとする課題】本発明はこのような背
景から行なわれたものであり、従って、本発明の目的
は、フェノール性水酸基を有するアルカリ水溶液可溶性
樹脂と光熱変換剤とを含む印刷原板の画像形成性と製造
安定性や製版作業性とを改善して上記の問題を解決する
ことであり、具体的には、塗布液の安定性に優れ、取扱
い場所の制約がなく、かつ識別現像性、現像安定性及び
現像ラチチュードの良好な、耐刷性もよいダイレクト製
版用の赤外線レーザ用ポジ型感光性の平版印刷用原板を
提供することである。The present invention has been made from such a background, and therefore, an object of the present invention is to provide a printing original plate containing an alkali aqueous solution-soluble resin having a phenolic hydroxyl group and a photothermal conversion agent. Is to solve the above-mentioned problems by improving the image forming property and the production stability and plate making workability. Specifically, the stability of the coating liquid is excellent, there is no restriction on the handling place, and the distinctive development is performed. To provide a positive photosensitive lithographic printing plate precursor for an infrared laser for direct plate making, which has good printing property, development stability and development latitude, and good printing durability.
【0011】[0011]
【課題を解決するための手段】本発明者は、平版印刷用
原板の実用特性を損なう上記した問題点を解決すべく鋭
意検討を進めたところ、pKa5以下の酸基を有するポ
リビニルアセタール樹脂を原板の画像記録層中に含ませ
ることが上記欠陥の抑止に効果があることを見出した。
この発見に基づいて更に研究を進めて本発明に到達し
た。すなわち、本発明は、下記の通りの平版印刷用原板
を提供する。Means for Solving the Problems The inventors of the present invention have made earnest studies to solve the above-mentioned problems that impair the practical properties of the lithographic printing plate, and found that a polyvinyl acetal resin having an acid group of pKa of 5 or less was used as the plate. It was found that the inclusion in the image recording layer is effective in suppressing the above defects.
Based on this finding, further research was conducted to reach the present invention. That is, the present invention provides the following lithographic printing plate precursor.
【0012】1. 支持体上に、光を吸収し熱を発生す
る物質と、フェノール性水酸基を有するアルカリ水溶液
可溶性樹脂と、pKa5以下の酸基を有するポリビニル
アセタール樹脂とを含有する画像記録層を設けたことを
特徴とする平版印刷用原板。1. An image recording layer containing a substance that absorbs light and generates heat, an alkali aqueous solution-soluble resin having a phenolic hydroxyl group, and a polyvinyl acetal resin having an acid group of pKa of 5 or less is provided on a support. An original plate for lithographic printing.
【0013】2.前記ポリビニルアセタール樹脂が、1,
2-シクロへキサンジカルボン酸、テトラヒドロフタル
酸、フタル酸及びトリメトリット酸から選ばれた有機酸
とのエステル結合基を有するポリビニルアセタール樹脂
であることを特徴とする上記1に記載の平版印刷用原
板。2. The polyvinyl acetal resin is 1,
2. The lithographic printing plate precursor as described in 1 above, which is a polyvinyl acetal resin having an ester bond group with an organic acid selected from 2-cyclohexanedicarboxylic acid, tetrahydrophthalic acid, phthalic acid and trimetritic acid.
【0014】本発明の特徴は、光を吸収し熱を発生する
物質とフェノール性水酸基を有するアルカリ水溶液可溶
性樹脂とを含む画像記録層の中に、更に、pKa5以下
の酸基を有するポリビニルアセタール樹脂(以下、「酸
変性ポリビニルアセタール樹脂」という。)を含有させ
た点にある。本発明では、含有させた酸変性ポリビニル
アセタール樹脂が特異的に現像ラチチュードの向上に効
果がある。酸基を有しない無変性のポリビニルアセター
ル樹脂を用いたのでは、現像ラチチュード向上の効果は
得られない。これらのことから、酸変性ポリビニルアセ
タール樹脂を用いた場合は、その酸基により、アルカリ
溶出性を維持しつつ、基板の密着性が向上し、結果とし
て現像ラチチュードの向上が得られるものと考えられ
る。A feature of the present invention is that a polyvinyl acetal resin having an acid group of pKa5 or less is further contained in an image recording layer containing a substance which absorbs light and generates heat and an alkali aqueous solution-soluble resin having a phenolic hydroxyl group. (Hereinafter, referred to as “acid-modified polyvinyl acetal resin”). In the present invention, the acid-modified polyvinyl acetal resin contained is effective in specifically improving the development latitude. If an unmodified polyvinyl acetal resin having no acid group is used, the effect of improving the development latitude cannot be obtained. From these, when the acid-modified polyvinyl acetal resin is used, it is considered that the acid group improves the adhesion of the substrate while maintaining the alkali elution property, and as a result, the development latitude can be improved. .
【0015】本発明によれば、ノボラック樹脂で代表さ
れるフェノール性水酸基を有するアルカリ水溶液可溶性
樹脂と酸変性ポリビニルアセタール樹脂との相互作用に
より、画像部では、アルカリ水溶液可溶性樹脂の溶解性
が低下するので、識別性が向上し、かつ現像ラチチュー
ドが驚異的に良化する。したがって、オニウム塩やキノ
ンジアジド化合物類等の、可視領域に光吸収域(350
〜500nm)を有する化合物の添加を必須とせず、し
たがって白色灯下でも使用でき、取扱い場所は黄色燈下
に制限されるという不便がない。また、最表層部で架橋
硬膜を形成することにより、印刷版の耐溶剤性が大幅に
向上し、印刷版へのクリーナー液の使用やUVインキ等
の特殊溶剤を含むインキの使用も可能となり、前記した
先行技術が抱えたこれらの欠陥がいずれも解消される。According to the present invention, the solubility of the alkali aqueous solution-soluble resin in the image area is lowered due to the interaction between the alkali aqueous solution-soluble resin having a phenolic hydroxyl group represented by novolac resin and the acid-modified polyvinyl acetal resin. Therefore, the distinguishability is improved, and the development latitude is surprisingly improved. Therefore, in the visible region such as onium salts and quinonediazide compounds, the light absorption region (350
It is not necessary to add a compound having ˜500 nm), and therefore it can be used under a white light, and there is no inconvenience that the handling place is limited to a yellow light. In addition, by forming a crosslinked hard film at the outermost layer, the solvent resistance of the printing plate is greatly improved, and it is possible to use a cleaner liquid for the printing plate or use ink containing a special solvent such as UV ink. All of these defects of the above-mentioned prior art are eliminated.
【0016】なお、上記のとおり、特開平10-87733号公
報には、オルトカルボン酸等のグラフト側鎖を有するポ
リマーと光酸発生剤を含有する印刷用原板が開示されて
いるが、本発明では、用いる酸変性ポリビニルアセター
ル樹脂の有する酸基のpKaを5以下とすることによっ
て、光酸発生剤が存在しなくても、優れた識別効果を得
ることができて、光熱変換作用を利用した平版印刷用の
優れた性能の原板が得られる。As described above, Japanese Patent Application Laid-Open No. 10-87733 discloses a printing original plate containing a polymer having a graft side chain such as orthocarboxylic acid and a photoacid generator. Then, by setting the pKa of the acid group of the acid-modified polyvinyl acetal resin to be used to be 5 or less, an excellent discrimination effect can be obtained even without the presence of a photoacid generator, and the photothermal conversion effect was utilized. A master plate with excellent performance for lithographic printing is obtained.
【0017】[0017]
【発明の実施の形態】以下、本発明の実施の形態につい
て詳細に説明する。
〔酸変性ポリビニルアセタール樹脂〕本発明に用いられ
る酸変性ポリビニルアセタール樹脂は、pKa(解離定
数)が5以下の酸基を有するポリビニルアセタール樹脂
であって、一般に、ポリビニルアセタール樹脂にpKa
5以下の酸基を導入して変性することによって得られる
樹脂である。この酸変性ポリビニルアセタール樹脂は、
アルカリ水溶液に可溶かあるいは膨潤可能な樹脂であ
る。また、この酸変性ポリビニルアセタール樹脂におけ
る酸基の導入量は、一般に、樹脂1g当りの酸含量が0.
1〜6ミリ当量となる範囲が適当である。樹脂1g当りの
酸含量が0.1ミリ当量より少ないとアルカリ現像液での
現像性が不十分となり、6ミリ当量より多いと耐摩耗性
が劣化してくる。好ましい樹脂1g当りの酸含量は0.5
〜4ミリ当量である。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below. [Acid-modified polyvinyl acetal resin] The acid-modified polyvinyl acetal resin used in the present invention is a polyvinyl acetal resin having an acid group having a pKa (dissociation constant) of 5 or less, and generally, polyvinyl acetal resin has pKa
It is a resin obtained by introducing 5 or less acid groups for modification. This acid-modified polyvinyl acetal resin is
It is a resin that is soluble or swellable in an alkaline aqueous solution. The amount of acid groups introduced into the acid-modified polyvinyl acetal resin is generally such that the acid content per 1 g of the resin is 0.
A range of 1 to 6 meq is suitable. When the acid content per 1 g of the resin is less than 0.1 meq, the developability with an alkali developing solution becomes insufficient, and when it is more than 6 meq, abrasion resistance deteriorates. The preferred acid content per gram of resin is 0.5
~ 4 meq.
【0018】本発明に用いられる酸変性ポリビニルアセ
タール樹脂の具体例としては、特願昭60−109122号、60
−123863号、60−198742号の各公報に記載されているよ
うなポリビニルアセタール樹脂に有機ポリカルボン酸の
分子内酸無水物を反応させたもの、更にこれにヒドロキ
シル基、あるいはシアノ基を含有する成分を導入したも
のなどが挙げられる。特に好ましい酸変性ポリビニルア
セタール樹脂は下記一般式(I)で示されるものであ
る。
一般式(I)Specific examples of the acid-modified polyvinyl acetal resin used in the present invention include Japanese Patent Application Nos. 60-109122 and 60.
-123863, 60-198742 polyvinyl acetal resins as described in the reaction with an intramolecular acid anhydride of an organic polycarboxylic acid, further containing a hydroxyl group or a cyano group The thing which introduced the component etc. is mentioned. Particularly preferred acid-modified polyvinyl acetal resin is represented by the following general formula (I). General formula (I)
【0019】[0019]
【化1】 [Chemical 1]
【0020】式中、R10は置換基を有してもよいアルキ
ル基あるいは水素原子、R11は置換基を有していないア
ルキル基、R12はカルボン酸基を有する脂肪族あるいは
芳香族炭化水素基、R13は少なくとも1つのヒドロキシ
ル基あるいはニトリル基を有し、更に他の置換基を有し
ていてもよい脂肪族または芳香族炭化水素基を示し、
n1、n2およびn3、n4、n5は各反覆単位のモル%を示し、
それぞれ次の範囲である。
n1=5〜85、n2=0〜60、n3=0〜20、n4=3〜60、n5
=0〜60。In the formula, R 10 is an alkyl group which may have a substituent or a hydrogen atom, R 11 is an alkyl group which does not have a substituent, and R 12 is an aliphatic or aromatic carbon atom having a carboxylic acid group. A hydrogen group, R 13 is an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl group or nitrile group and may further have another substituent,
n 1 , n 2 and n 3 , n 4 , n 5 represent mol% of each recurring unit,
The ranges are as follows. n 1 = 5 to 85, n 2 = 0 to 60, n 3 = 0 to 20, n 4 = 3 to 60, n 5
= 0 to 60.
【0021】上記一般式(I)で示される樹脂はポリビ
ニルアルコールをアルデヒドによりアセタール化し、更
にその残存−OHと酸無水物とを反応させ、更に生じたカ
ルボン酸の一部をヒドロキシル基あるいはシアノ基を有
するハロゲン化合物と反応させることで得られる。主に
一般式(I)の樹脂は5つの成分よりなり、第一成分と
してはビニルアセタール成分、第二成分としてはビニル
アルコール成分、第三成分としては無置換のエステル成
分、第四成分としてはカルボキシル基を含有するエステ
ル成分、第五成分としてはヒドロキシル基あるいはシア
ノ基を含有するエステル成分であり、それぞれの成分に
おいて少なくとも一種以上の構造単位を有すことができ
る。The resin represented by the above general formula (I) is obtained by acetalizing polyvinyl alcohol with an aldehyde, further reacting the residual --OH with an acid anhydride, and further producing a part of the generated carboxylic acid by a hydroxyl group or a cyano group. It is obtained by reacting with a halogen compound having The resin of the general formula (I) is mainly composed of five components, a vinyl acetal component as the first component, a vinyl alcohol component as the second component, an unsubstituted ester component as the third component, and a fourth component as the fourth component. An ester component containing a carboxyl group, and a fifth component is an ester component containing a hydroxyl group or a cyano group, and each component may have at least one structural unit.
【0022】第一成分であるビニルアセタール成分は、
置換基を有してもよい脂肪族アルデヒドをビニルアルコ
ール成分と反応させたものであり、置換基としてはカル
ボキシル基、ヒドロキシル基、クロル基、ブロム基、3
級アミノ基、アルコキシル基、シアノ基、ニトロ基、ア
ミド基、エステル基、ウレタン基、ウレイド基などが挙
げられる。具体的にはホルムアルデヒド、アセトアルデ
ヒド、プロピオンアルデヒド、ブチルアルデヒド、ペン
チルアルデヒド、ヘキシルアルデヒド、グリオキシル
酸、N,N−ジメチルホルムアミドジ−n−ブチルアセタ
ール、ブロモアセトアルデヒド、クロルアセトアルデヒ
ド、3−ヒドロキシ−n−ブチルアルデヒド、3−メト
キシ−n−ブチルアルデヒド、3−(ジメチルアミノ)
−2,2−ジメチルプロピオンアルデヒド、シアノアセト
アルデヒドなどが挙げられるが、これらに限定されな
い。The vinyl acetal component as the first component is
An aliphatic aldehyde which may have a substituent is reacted with a vinyl alcohol component, and as the substituent, a carboxyl group, a hydroxyl group, a chloro group, a bromine group, 3
Examples thereof include a primary amino group, an alkoxyl group, a cyano group, a nitro group, an amide group, an ester group, a urethane group and a ureido group. Specifically, formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, pentyl aldehyde, hexyl aldehyde, glyoxylic acid, N, N-dimethylformamide di-n-butyl acetal, bromoacetaldehyde, chloracetaldehyde, 3-hydroxy-n-butyraldehyde. , 3-methoxy-n-butyraldehyde, 3- (dimethylamino)
Examples include, but are not limited to, -2,2-dimethylpropionaldehyde, cyanoacetaldehyde, and the like.
【0023】第三成分である無置換のエステル成分にお
いて、置換基R11は炭素数1〜10のアルキル置換基を示
し、特にメチル基、エチル基が現像性の点から好まし
い。In the unsubstituted ester component which is the third component, the substituent R 11 represents an alkyl substituent having 1 to 10 carbon atoms, and a methyl group and an ethyl group are particularly preferable from the viewpoint of developability.
【0024】第四成分であるカルボキシル基を含有する
エステル成分において、R12は炭素数1〜20の脂肪族カ
ルボン酸あるいは芳香族カルボン酸基であり、それらは
主に無水コハク酸、無水マレイン酸、無水フタル酸、無
水テトラヒドロフタル酸、無水トリメリット酸、無水1,
2-シクロへキサンジカルボン酸、無水cis−4−シクロ
ヘキセン1,2−ジカルボン酸等の酸無水物とポリビニル
アセタールの残存−OHを反応させて得たものであるが、
他の環状酸無水物を用いてもよい。これらの酸無水物の
中でも、1,2-シクロへキサンジカルボン酸、テトラヒド
ロフタル酸、フタル酸及びトリメトリット酸の無水物が
好ましい。更にR12はカルボキシ基以外の置換基を有し
ていてもよい。置換基としては、−OH、−C≡N、及
び下記一般式で示される基、In the ester component containing a carboxyl group which is the fourth component, R 12 is an aliphatic carboxylic acid or aromatic carboxylic acid group having 1 to 20 carbon atoms, and these are mainly succinic anhydride and maleic anhydride. , Phthalic anhydride, tetrahydrophthalic anhydride, trimellitic anhydride, 1,
2-cyclohexanedicarboxylic acid, anhydrous cis-4-cyclohexene 1,2-dicarboxylic acid is obtained by reacting an acid anhydride and the residual -OH of polyvinyl acetal,
Other cyclic acid anhydrides may be used. Among these acid anhydrides, anhydrides of 1,2-cyclohexanedicarboxylic acid, tetrahydrophthalic acid, phthalic acid and trimetritic acid are preferable. Further, R 12 may have a substituent other than the carboxy group. As the substituent, -OH, -C≡N, and a group represented by the following general formula,
【0025】[0025]
【化2】 [Chemical 2]
【0026】並びに−Cl、−Br、−NO2、−OR14などが挙
げられる。R14としては置換基を有してもよい炭素数1
〜20のアルキル基、アラルキル基あるいはアリール基な
どが挙げられ、置換基としては−OH、−C≡N、−Cl、
−Br、−NO2などが挙げられる。In addition, —Cl, —Br, —NO 2 , —OR 14 and the like can be mentioned. R 14 has 1 carbon atom which may have a substituent.
To 20 alkyl groups, aralkyl groups, aryl groups and the like, and the substituents are -OH, -C≡N, -Cl,
-Br, such as -NO 2, and the like.
【0027】第五成分であるヒドロキシル基あるいはシ
アノ基を含有するエステル成分において、R13は第4成
分のR12中のカルボン酸とヒドロキシル基あるいはシア
ノ基を含有するハロゲン化合物を反応させエステル化さ
せて得ることができる。R13の具定例としては下記一般
式で示される基などが挙げられるが、これらに限定され
ない。In the ester component containing a hydroxyl group or a cyano group as the fifth component, R 13 is esterified by reacting the carboxylic acid in R 12 of the fourth component with a halogen compound containing a hydroxyl group or a cyano group. Can be obtained. Specific examples of R 13 include, but are not limited to, groups represented by the following general formula.
【0028】[0028]
【化3】 [Chemical 3]
【0029】[0029]
【化4】 [Chemical 4]
【0030】[0030]
【化5】 [Chemical 5]
【0031】[0031]
【化6】 [Chemical 6]
【0032】[0032]
【化7】 [Chemical 7]
【0033】上記一般式(I)で示される酸変性ポリビ
ニルアセタール樹脂はにおいて、n1は5〜85モル%が好
ましく、特に25〜70モル%が好ましい。n1の値が小さく
なると膜強度が弱くなり、n1の値が大きくなると他の成
分が結果的に少なくなり悪影響を及ぼす。n4に関しては
3〜60モル%が好ましく、特に10〜55モル%が好まし
い。n4の値が大きくなるとアルカリ現像液での露光部分
の膨潤が大きくなり、n4の値が小さくなるとアルカリ現
像液で現像しにくく、脱膜現像となってしまう。n5に関
しては0より大きく60モル%以下が好ましく、特に0よ
り大きく40モル%以下が好ましい。n5の値が大きくなる
と他の成分が結果的に少なくなってしまい悪影響を及ぼ
す。In the acid-modified polyvinyl acetal resin represented by the general formula (I), n 1 is preferably 5 to 85 mol%, particularly preferably 25 to 70 mol%. As the value of n 1 becomes smaller, the film strength becomes weaker, and as the value of n 1 becomes larger, other components eventually decrease and adversely affect. With respect to n 4 , 3 to 60 mol% is preferable, and 10 to 55 mol% is particularly preferable. When the value of n 4 is large, the swelling of the exposed portion with the alkali developing solution is large, and when the value of n 4 is small, it is difficult to develop with the alkali developing solution and the film is removed. With respect to n 5, it is preferably more than 0 and 60 mol% or less, and particularly preferably more than 0 and 40 mol% or less. As the value of n 5 increases, other components eventually decrease and adversely affect.
【0034】上記酸変性ポリビニルアセタール樹脂の分
子量は、ゲルパーミネーションクロマトグラフィから測
定して約5000から40万が適当であり、好ましくは約5万
〜30万の範囲である。これらの酸変性ポリビニルアセタ
ール樹脂は、単独で用いても混合して用いてもよい。ま
た、本発明においては、これらの酸変性ポリビニルアセ
タール樹脂は、必要に応じて、当該樹脂に対して50重量
%以下の量で他の樹脂をも混入することができる。混入
される樹脂としては、例えばカルボキシル基を持たない
ポリウレタン樹脂、酸変性されてないポリビニルアセタ
ール樹脂、ポリアミド樹脂、エポキシ樹脂、アクリル樹
脂、メタクリル樹脂、ポリスチレン系樹脂、ノボラック
型フェノール系樹脂等を挙げることができる。また、本
発明においては、酸変性ポリビニルアセタール樹脂は、
一般に、印刷版材料全固形分に対し0.5〜20質量
%、好ましくは1.0〜10質量%の割合で用いられ
る。The molecular weight of the above acid-modified polyvinyl acetal resin is suitably about 5,000 to 400,000 as measured by gel permeation chromatography, preferably about 50,000 to 300,000. These acid-modified polyvinyl acetal resins may be used alone or in combination. Further, in the present invention, these acid-modified polyvinyl acetal resins may be mixed with other resins in an amount of 50% by weight or less based on the resin, if necessary. Examples of the resin to be mixed include a polyurethane resin having no carboxyl group, a polyvinyl acetal resin which is not acid-modified, a polyamide resin, an epoxy resin, an acrylic resin, a methacrylic resin, a polystyrene resin, a novolac phenolic resin, and the like. You can Further, in the present invention, the acid-modified polyvinyl acetal resin is
Generally, it is used in a proportion of 0.5 to 20% by mass, preferably 1.0 to 10% by mass, based on the total solid content of the printing plate material.
【0035】〔フェノール性水酸基を有するアルカリ水
溶液可溶性樹脂〕本発明に用いられるフェノール性水酸
基を有するアルカリ水溶液可溶性樹脂(以下、「フェノ
ール性水酸基を有する樹脂」という。)としては、例え
ばフェノールホルムアルデヒド樹脂、m−クレゾールホ
ルムアルデヒド樹脂、p−クレゾールホルムアルデヒド
樹脂、m−/p−混合クレゾールホルムアルデヒド樹
脂、フェノール/クレゾール(m−,p−,又はm−/
p−混合のいずれでもよい)混合ホルムアルデヒド樹脂
などのノボラック樹脂を挙げることができる。[Alkaline Aqueous Solution Soluble Resin Having Phenolic Hydroxyl Group] Examples of the alkaline aqueous solution soluble resin having a phenolic hydroxyl group (hereinafter, referred to as “resin having a phenolic hydroxyl group”) used in the present invention include, for example, phenol formaldehyde resin, m-cresol formaldehyde resin, p-cresol formaldehyde resin, m- / p-mixed cresol formaldehyde resin, phenol / cresol (m-, p-, or m- /
Novolak resins such as mixed formaldehyde resins may be mentioned.
【0036】これらのフェノール性水酸基を有する樹脂
は、重量平均分子量が500〜20000で数平均分子
量が200〜10000のものが好ましい。更に、米国
特許第4123279号明細書に記載されているよう
に、t−ブチルフェノールホルムアルデヒド樹脂、オク
チルフェノールホルムアルデヒド樹脂のような、炭素数
3〜8のアルキル基を置換基として有するフェノールと
ホルムアルデヒドとの縮合物を併用してもよい。かかる
フェノール性水酸基を有する樹脂は、1種類あるいは2
種類以上を組み合わせて使用してもよい。The resin having a phenolic hydroxyl group preferably has a weight average molecular weight of 500 to 20,000 and a number average molecular weight of 200 to 10,000. Further, as described in U.S. Pat. No. 4,123,279, a condensate of formaldehyde with a phenol having an alkyl group having 3 to 8 carbon atoms as a substituent, such as t-butylphenol formaldehyde resin and octylphenol formaldehyde resin. You may use together. The resin having such a phenolic hydroxyl group may be one type or two types.
You may use it in combination of 2 or more types.
【0037】本発明の一態様としては、上記フェノール
性水酸基を有する樹脂と、下記(a)から(c)のうち
少なくとも一つを共重合成分として10モル%以上含む
共重合体(以下、「特定の共重合体」という。)とを併
用してもよい。この特定の共重合体は、酸変性ポリビニ
ルアセタール樹脂と共存していると画像領域の溶解性を
促進することなく、非画像領域の溶解速度を高めて識別
現像効果を向上させる作用を有している。この作用はス
ルホン基とイミド基を併せ有する構造上の特徴によるも
のと推定され,他の一般的な溶剤可溶性のバインダーポ
リマーにはこのような好ましい効果は認められなかっ
た。As one aspect of the present invention, a copolymer containing the above-mentioned resin having a phenolic hydroxyl group and 10 mol% or more of at least one of the following (a) to (c) as a copolymerization component (hereinafter referred to as " A specific copolymer ")) may be used in combination. This specific copolymer, when coexisting with the acid-modified polyvinyl acetal resin, has the action of increasing the dissolution rate of the non-image area and improving the identification and development effect without promoting the solubility of the image area. There is. It is presumed that this action is due to the structural feature having both a sulfone group and an imide group, and such a favorable effect was not observed in other general solvent-soluble binder polymers.
【0038】(a)1分子中に、窒素原子上に少なくと
も一つの水素原子が結合したスルホンアミド基を有する
モノマー
(b)1分子中に、下記の式で表される活性イミノ基を
有するモノマー(A) Monomer having a sulfonamide group having at least one hydrogen atom bonded to a nitrogen atom in one molecule (b) Monomer having an active imino group represented by the following formula in one molecule
【0039】[0039]
【化8】 [Chemical 8]
【0040】(c)それぞれフェノール性水酸基を有す
るアクリルアミド、メタクリルアミド、アクリル酸エス
テル、メタクリル酸エステル、又はヒドロキシスチレン(C) Acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester, or hydroxystyrene each having a phenolic hydroxyl group.
【0041】本発明で用いる特定の共重合体は、上記
(a)から(c)のうち少なくとも一つを共重合成分と
して10モル%以上含んでいることが必要とされ、20
モル%以上含むものがより好ましい。10モル%より少
ないと、フェノール性水酸基を有する樹脂との相互作用
が不十分となり現像ラチチュードが低下する。また、上
記(a)から(c)以外の他の共重合成分を含んでいて
もよい。The specific copolymer used in the present invention is required to contain at least one of the above (a) to (c) as a copolymerization component in an amount of 10 mol% or more.
Those containing more than mol% are more preferable. If it is less than 10 mol%, the interaction with the resin having a phenolic hydroxyl group becomes insufficient and the development latitude decreases. Further, it may contain a copolymerization component other than the above (a) to (c).
【0042】(a)に該当するモノマーとは、1分子中
に、窒素原子上に少なくとも一つの水素原子が結合した
スルホンアミド基と、重合可能な不飽和結合をそれぞれ
一つ以上有する低分子化合物からなるモノマーである。
その中でも、アクリロイル基、アリル基、又はビニロキ
シ基と、置換あるいはモノ置換アミノスルホニル基又は
置換スルホニルイミノ基とを有する低分子化合物が好ま
しい。このような化合物としては、例えば、下記一般式
(II)〜(VI)で示される化合物が挙げられる。The monomer corresponding to (a) is a low molecular weight compound having in each molecule one or more sulfonamide groups having at least one hydrogen atom bonded to a nitrogen atom and one or more polymerizable unsaturated bonds. It is a monomer consisting of.
Among them, a low molecular weight compound having an acryloyl group, an allyl group, or a vinyloxy group and a substituted or mono-substituted aminosulfonyl group or a substituted sulfonylimino group is preferable. Examples of such compounds include compounds represented by the following general formulas (II) to (VI).
【0043】[0043]
【化9】 [Chemical 9]
【0044】式中、X1 、X2はそれぞれ−O−又は−
NR10−を示す。R4、R7はそれぞれ水素原子又は−C
H3を表す。R5、R6、R12、R15、R19はそれぞれ置
換基を有していてもよい炭素数1〜12のアルキレン
基、シクロアルキレン基、アリーレン基又はアラルキレ
ン基を表す。R5、R10、R16は水素原子、それぞれ置
換基を有していてもよい炭素数1〜12のアルキル基、
シクロアルキル基、アリール基又はアラルキル基を示
す。また、R9、R20は、それぞれ置換基を有していて
もよい炭素数1〜12のアルキル基、シクロアルキル
基、アリール基、アラルキル基を示す。R11、R13、R
17は水素原子又は−CH3を表す。R14、R18はそれぞ
れ単結合又は置換基を有していてもよい炭素数1〜12
のアルキレン基、シクロアルキレン基、アリーレン基又
はアラルキレン基を表す。Y1、Y2はそれぞれ単結合又
はCO−を表す。In the formula, X 1 and X 2 are each --O-- or-
NR 10 − is shown. R 4, R 7 each is a hydrogen atom or a -C
Represents H 3 . R 5 , R 6 , R 12 , R 15 , and R 19 each represent an alkylene group having 1 to 12 carbon atoms, which may have a substituent, a cycloalkylene group, an arylene group, or an aralkylene group. R 5 , R 10 and R 16 are each a hydrogen atom, an optionally substituted alkyl group having 1 to 12 carbon atoms,
A cycloalkyl group, an aryl group or an aralkyl group is shown. R 9 and R 20 each represent an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group, an aryl group or an aralkyl group which may have a substituent. R 11 , R 13 , R
17 represents a hydrogen atom or -CH 3. R 14 and R 18 are each a single bond or a carbon atom which may have a substituent.
Represents an alkylene group, a cycloalkylene group, an arylene group or an aralkylene group. Y 1, Y 2 each represents a single bond or CO-.
【0045】具体的には、m−アミノスルホニルフェニ
ルメタクリレート、N−(p−アミノスルホニルフェニ
ル)メタクリルアミド、N−(p−アミノスルホニルフ
ェニル)アクリルアミド等を好適に使用することができ
る。Specifically, m-aminosulfonylphenyl methacrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p-aminosulfonylphenyl) acrylamide and the like can be preferably used.
【0046】(b)に該当するモノマーとは、1分子中
に、上記式で表される活性イミノ基と、重合可能な不飽
和結合をそれぞれ一つ以上有する低分子化合物からなる
モノマーである。このような化合物としては、具体的に
は、N−(p−トルエンスルホニル)メタクリルイミ
ド、N−(p−トルエンスルホニル)アクリルイミド等
を好適に使用することができる。The monomer corresponding to (b) is a monomer composed of a low molecular weight compound having one or more active imino groups represented by the above formula and one or more polymerizable unsaturated bonds in one molecule. As such a compound, specifically, N- (p-toluenesulfonyl) methacrylimide, N- (p-toluenesulfonyl) acrylimide, or the like can be preferably used.
【0047】(c)に該当するモノマーとは、それぞれ
フェノール性水酸基を有するアクリルアミド、メタクリ
ルアミド、アクリル酸エステル、メタクリル酸エステ
ル、またはヒドロキシスチレンからなるモノマーであ
る。このような化合物としては、具体的には、N−(4
−ヒドロキシフェニル)アクリルアミド、N−(4−ヒ
ドロキシフェニル)メタクリルアミド、o−ヒドロキシ
フェニルアクリレート、m−ヒドロキシフェニルアクリ
レート、p−ヒドロキシフェニルアクリレート、o−ヒ
ドロキシフェニルメタクリレート、m−ヒドロキシフェ
ニルメタクリレート、p−ヒドロキシフェニルメタクリ
レート、o−ヒドロキシスチレン、m−ヒドロキシスチ
レン、p−ヒドロキシスチレン等を好適に使用すること
ができる。The monomer corresponding to (c) is a monomer composed of acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester, or hydroxystyrene each having a phenolic hydroxyl group. Specific examples of such a compound include N- (4
-Hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylamide, o-hydroxyphenyl acrylate, m-hydroxyphenyl acrylate, p-hydroxyphenyl acrylate, o-hydroxyphenyl methacrylate, m-hydroxyphenyl methacrylate, p-hydroxy Phenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene and the like can be preferably used.
【0048】他の共重合成分としては、例えば、下記
(1)〜(12)に挙げるモノマーを用いることができ
る。
(1)2−ヒドロキシエチルアクリレート又は2−ヒド
ロキシエチルメタクリレート等の脂肪族水酸基を有する
アクリル酸エステル類、及びメタクリル酸エステル類。
(2)アクリル酸メチル、アクリル酸エチル、アクリル
酸プロピル、アクリル酸ブチル、アクリル酸アミル、ア
クリル酸ヘキシル、アクリル酸オクチル、アクリル酸ベ
ンジル、アクリル酸−2−クロロエチル、グリシジルア
クリレート、N−ジメチルアミノエチルアクリレート等
のアルキルアクリレート。
(3)メタクリル酸メチル、メタクリル酸エチル、メタ
クリル酸プロピル、メタクリル酸ブチル、メタクリル酸
アミル、メタクリル酸ヘキシル、メタクリル酸シクロヘ
キシル、メタクリル酸ベンジル、メタクリル酸−2−ク
ロロエチル、グリシジルメタクリレート、N−ジメチル
アミノエチルメタクリレート等のアルキルメタクリレー
ト。As the other copolymerization component, for example, the following monomers (1) to (12) can be used. (1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate. (2) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl Alkyl acrylate such as acrylate. (3) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl. Alkyl methacrylate such as methacrylate.
【0049】(4)アクリルアミド、メタクリルアミ
ド、N−メチロールアクリルアミド、N−エチルアクリ
ルアミド、N−ヘキシルメタクリルアミド、N−シクロ
ヘキシルアクリルアミド、N−ヒドロキシエチルアクリ
ルアミド、N−フェニルアクリルアミド、N−ニトロフ
ェニルアクリルアミド、N−エチル−N−フェニルアク
リルアミド等のアクリルアミドもしくはメタクリルアミ
ド。
(5)エチルビニルエーテル、2−クロロエチルビニル
エーテル、ヒドロキシエチルビニルエーテル、プロピル
ビニルエーテル、ブチルビニルエーテル、オクチルビニ
ルエーテル、フェニルビニルエーテル等のビニルエーテ
ル類。(4) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N -Acrylamide or methacrylamide such as ethyl-N-phenylacrylamide. (5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether.
【0050】(6)ビニルアセテート、ビニルクロロア
セテート、ビニルブチレート、安息香酸ビニル等のビニ
ルエステル類。
(7)スチレン、α−メチルスチレン、メチルスチレ
ン、クロロメチルスチレン等のスチレン類。
(8)メチルビニルケトン、エチルビニルケトン、プロ
ピルビニルケトン、フェニルビニルケトン等のビニルケ
トン類。
(9)エチレン、プロピレン、イソブチレン、ブタジエ
ン、イソプレン等のオレフィン類。
(10)N−ビニルピロリドン、N−ビニルカルバゾー
ル、4−ビニルピリジン、アクリロニトリル、メタクリ
ロニトリル等。
(11)マレイミド、N−アクリロイルアクリルアミ
ド、N−アセチルメタクリルアミド、N−プロピオニル
メタクリルアミド、N−(p−クロロベンゾイル)メタ
クリルアミド等の不飽和イミド。
(12)アクリル酸、メタクリル酸、無水マレイン酸、
イタコン酸等の不飽和カルボン酸。(6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate. (7) Styrenes such as styrene, α-methylstyrene, methylstyrene and chloromethylstyrene. (8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone. (9) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene. (10) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile and the like. (11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, and N- (p-chlorobenzoyl) methacrylamide. (12) acrylic acid, methacrylic acid, maleic anhydride,
Unsaturated carboxylic acids such as itaconic acid.
【0051】本発明で用いる特定の共重合体は、重量平
均分子量が2000以上、数平均分子量が1000以上
のものが好ましい。さらに好ましくは、重量平均分子量
が5000〜300000、数平均分子量が2000〜
250000であり、分散度(重量平均分子量/数平均
分子量)が1.1〜10のものである。The specific copolymer used in the present invention preferably has a weight average molecular weight of 2000 or more and a number average molecular weight of 1000 or more. More preferably, the weight average molecular weight is 5,000 to 300,000 and the number average molecular weight is 2,000 to.
It is 250,000 and the dispersity (weight average molecular weight / number average molecular weight) is 1.1 to 10.
【0052】かかる特定の共重合体は、1種類あるいは
2種類以上を組み合わせて使用してもよい。The specific copolymer may be used alone or in combination of two or more kinds.
【0053】上記フェノール性水酸基を有する樹脂と上
記特定の共重合体との配合重量比は50:50から5:
95の範囲にあることが好ましく、40:60から1
0:90の範囲にあることがより好ましい。これより上
記フェノール性水酸基を有する樹脂の配合量が多くなる
と、海島構造が逆転し、耐溶剤性等を改善することが困
難となる。逆に、これより上記共重合体の配合量が多く
なると、上記フェノール性水酸基を有する樹脂による表
面層が薄くなり過ぎ、現像ラチチュードの向上が不十分
となる。The compounding weight ratio of the above-mentioned resin having a phenolic hydroxyl group to the above-mentioned specific copolymer is 50:50 to 5: 5.
Preferably in the range of 95, 40:60 to 1
More preferably, it is in the range of 0:90. When the compounding amount of the resin having a phenolic hydroxyl group is larger than this, the sea-island structure is reversed and it becomes difficult to improve the solvent resistance and the like. On the contrary, when the blending amount of the copolymer is larger than that, the surface layer of the resin having the phenolic hydroxyl group becomes too thin, and the development latitude is insufficiently improved.
【0054】これらフェノール性水酸基を有する樹脂と
特定の共重合体とからなるアルカリ可溶性の高分子化合
物は、それぞれ1種類あるいは2種類以上を組み合わせ
て使用してもよく、全印刷版材料固形分中、30〜99
重量%、好ましくは40〜95重量%、特に好ましくは
50〜90重量%の添加量で用いられる。アルカリ可溶
性の高分子化合物の添加量が30重量%未満であると記
録層の耐久性が悪化し、また、99重量%を越えると感
度、耐久性の両面で好ましくない。These alkali-soluble polymer compounds composed of a resin having a phenolic hydroxyl group and a specific copolymer may be used either individually or in combination of two or more, and they may be used in the total solid content of all printing plate materials. , 30-99
It is used in an amount of 50% by weight, preferably 40 to 95% by weight, particularly preferably 50 to 90% by weight. When the amount of the alkali-soluble polymer compound added is less than 30% by weight, the durability of the recording layer deteriorates, and when it exceeds 99% by weight, both the sensitivity and the durability are unfavorable.
【0055】〔光を吸収し熱を発生する物質〕本発明に
おいて、光を吸収し熱を発生する物質としては種々の顔
料もしくは染料を用いることができる。顔料としては、
市販の顔料及びカラーインデックス(C.I.)便覧、
「最新顔料便覧」(日本顔料技術協会編、1977年
刊)、「最新顔料応用技術」(CMC出版、1986年
刊)、「印刷インキ技術」CMC出版、1984年刊)
に記載されている顔料が利用できる。[Substance that Absorbs Light and Generates Heat] In the present invention, various pigments or dyes can be used as the substance that absorbs light and generates heat. As a pigment,
Commercial pigment and color index (CI) handbook,
"Latest Pigment Handbook" (edited by Japan Pigment Technology Association, 1977), "Latest Pigment Application Technology" (CMC Publishing, 1986), "Printing Ink Technology" CMC Publishing, 1984)
The pigments described in 1. can be used.
【0056】顔料の種類としては、黒色顔料、黄色顔
料、オレンジ色顔料、褐色顔料、赤色顔料、紫色顔料、
青色顔料、緑色顔料、蛍光顔料、金属粉顔料、その他、
ポリマー結合色素が挙げられる。具体的には、不溶性ア
ゾ顔料、アゾレーキ顔料、縮合アゾ顔料、キレートアゾ
顔料、フタロシアニン系顔料、アントラキノン系顔料、
ペリレン及びペリノン系顔料、チオインジゴ系顔料、キ
ナクリドン系顔料、ジオキサジン系顔料、イソインドリ
ノン系顔料、キノフタロン系顔料、染付けレーキ顔料、
アジン顔料、ニトロソ顔料、ニトロ顔料、天然顔料、蛍
光顔料、無機顔料、カーボンブラック等が使用できる。The types of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments,
Blue pigment, green pigment, fluorescent pigment, metal powder pigment, etc.
Polymer bound dyes may be mentioned. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments,
Perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments, quinophthalone pigments, dyed lake pigments,
Azine pigment, nitroso pigment, nitro pigment, natural pigment, fluorescent pigment, inorganic pigment, carbon black and the like can be used.
【0057】これら顔料は表面処理をせずに用いてもよ
く、表面処理をほどこして用いてもよい。表面処理の方
法としては、樹脂やワックスを表面コートする方法、界
面活性剤を付着させる方法、反応性物質(例えば、シラ
ンカップリング剤やエポキシ化合物、ポリイソシアネー
ト等)を顔料表面に結合させる方法等が考えられる。上
記の表面処理方法は、「金属石鹸の性質と応用」(幸書
房)、「印刷インキ技術」(CMC出版、1984年
刊)及び「最新顔料応用技術」(CMC出版、1986
年刊)に記載されている。These pigments may be used without surface treatment or may be subjected to surface treatment before use. The surface treatment method includes a method of surface-coating a resin or wax, a method of attaching a surfactant, a method of binding a reactive substance (for example, a silane coupling agent, an epoxy compound, polyisocyanate, etc.) to the pigment surface, etc. Can be considered. The above-mentioned surface treatment methods are "property and application of metal soap" (Koshobo), "printing ink technology" (CMC Publishing, 1984) and "latest pigment application technology" (CMC Publishing, 1986).
Annual publication).
【0058】顔料の粒径は0.01μm〜10μmの範
囲にあることが好ましく、0.05μm〜1μmの範囲
にあることがさらに好ましく、特に0.1μm〜1μm
の範囲にあることが好ましい。顔料の粒径が0.01μ
m未満のときは分散物の感光層塗布液中での安定性の点
で好ましくなく、また、10μmを越えると感光層の均
一性の点で好ましくない。顔料を分散する方法として
は、インク製造やトナー製造等に用いられる公知の分散
技術が使用できる。分散機としては、超音波分散器、サ
ンドミル、アトライター、パールミル、スーパーミル、
ボールミル、インペラー、デスパーザー、KDミル、コ
ロイドミル、ダイナトロン、3本ロールミル、加圧ニー
ダー等が挙げられる。詳細は、「最新顔料応用技術」
(CMC出版、1986年刊)に記載がある。The particle size of the pigment is preferably in the range of 0.01 μm to 10 μm, more preferably in the range of 0.05 μm to 1 μm, and particularly preferably 0.1 μm to 1 μm.
It is preferably in the range of. Particle size of pigment is 0.01μ
When it is less than m, it is not preferable from the viewpoint of stability of the dispersion in the coating liquid for the photosensitive layer, and when it exceeds 10 μm, it is not preferable from the viewpoint of uniformity of the photosensitive layer. As a method for dispersing the pigment, a known dispersion technique used in ink production, toner production or the like can be used. As the disperser, ultrasonic disperser, sand mill, attritor, pearl mill, super mill,
A ball mill, an impeller, a despather, a KD mill, a colloid mill, a dynatron, a three roll mill, a pressure kneader and the like can be mentioned. For details, see "Latest Pigment Application Technology."
(CMC Publishing, published in 1986).
【0059】染料としては、市販の染料及び文献(例え
ば「染料便覧」有機合成化学協会編集、昭和45年刊)
に記載されている公知のものが利用できる。具体的に
は、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染
料、アントラキノン染料、フタロシアニン染料、カルボ
ニウム染料、キノンイミン染料、メチン染料、シアニン
染料などの染料が挙げられる。本発明において、これら
の顔料、もしくは染料のうち赤外光、もしくは近赤外光
を吸収するものが、赤外光もしくは近赤外光を発光する
レーザでの利用に適する点で特に好ましい。As the dye, commercially available dyes and literatures (for example, "Dye Handbook" edited by the Society of Organic Synthetic Chemistry, published in 1970)
The publicly known ones described in 1) can be used. Specific examples include dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, and cyanine dyes. In the present invention, among these pigments or dyes, those that absorb infrared light or near infrared light are particularly preferable because they are suitable for use in a laser that emits infrared light or near infrared light.
【0060】そのような赤外光、もしくは近赤外光を吸
収する顔料としてはカーボンブラックが好適に用いられ
る。また、赤外光、もしくは近赤外光を吸収する染料と
しては例えば特開昭58−125246号、特開昭59
−84356号、特開昭59−202829号、特開昭
60−78787号等に記載されているシアニン染料、
特開昭58−173696号、特開昭58−18169
0号、特開昭58−194595号等に記載されている
メチン染料、特開昭58−112793号、特開昭58
−224793号、特開昭59−48187号、特開昭
59−73996号、特開昭60−52940号、特開
昭60−63744号等に記載されているナフトキノン
染料、 特開昭58−112792号等に記載されてい
るスクワリリウム色素、英国特許434,875号記載
のシアニン染料等を挙げることができる。Carbon black is preferably used as such a pigment that absorbs infrared light or near infrared light. Examples of dyes that absorb infrared light or near infrared light include JP-A-58-125246 and JP-A-59.
-84356, JP-A-59-202829, JP-A-60-78787 and the like,
JP-A-58-173696, JP-A-58-18169
No. 0, methine dyes described in JP-A-58-194595, JP-A-58-112793, and JP-A-58.
-224793, JP-A-59-48187, JP-A-59-73996, JP-A-60-52940, JP-A-60-63744 and the like, and JP-A-58-112792. Examples thereof include squarylium dyes and cyanine dyes described in British Patent 434,875.
【0061】また、染料として米国特許第5,156,
938号記載の近赤外吸収増感剤も好適に用いられ、ま
た、米国特許第3,881,924号記載の置換された
アリールベンゾ(チオ)ピリリウム塩、特開昭57−1
42645号(米国特許第4,327,169号)記載
のトリメチンチアピリリウム塩、特開昭58−1810
51号、同58−220143号、同59−41363
号、同59−84248号、同59−84249号、同
59−146063号、同59−146061号に記載
されているピリリウム系化合物、特開昭59−2161
46号記載のシアニン色素、米国特許第4,283,4
75号に記載のペンタメチンチオピリリウム塩等や特公
平5−13514号、同5−19702号公報に開示さ
れているピリリウム化合物、Epolight III−1
78、Epolight III−130、Epoligh
t III−125等は特に好ましく用いられる。Further, as dyes, US Pat. No. 5,156,
The near-infrared absorption sensitizer described in US Pat. No. 938 is also preferably used, and the substituted arylbenzo (thio) pyrylium salt described in US Pat. No. 3,881,924, JP-A-57-1.
No. 42645 (US Pat. No. 4,327,169), a trimethine thiapyrylium salt, JP-A-58-1810.
No. 51, No. 58-220143, No. 59-41363.
No. 59-84248, No. 59-84249, No. 59-146063, No. 59-146061, and the pyrylium compounds described in JP-A-59-2161.
Cyanine dye described in US Pat. No. 4,283,4
No. 75, pentamethine thiopyrylium salt, etc., and the pyrylium compounds disclosed in Japanese Examined Patent Publication Nos. 5-13514 and 5-19702, Epolight III-1.
78, Epolight III-130, Epolight
t III-125 and the like are particularly preferably used.
【0062】また、染料として特に好ましい別の例とし
て米国特許第4,756,993号明細書中に式
(I)、(II)として記載されている近赤外吸収染料を
挙げることができる。これらの顔料もしくは染料は、印
刷版材料全固形分に対し0.01〜50重量%、好まし
くは0.1〜10重量%、染料の場合特に好ましくは
0.5〜10重量%、顔料の場合特に好ましくは3.1
〜10重量%の割合で印刷版材料中に添加することがで
きる。顔料もしくは染料の添加量が0.01重量%未満
であると感度が低くなり、また50重量%を越えると感
光層の均一性が失われ、記録層の耐久性が悪くなる。こ
れらの染料もしくは顔料は他の成分と同一の層に添加し
てもよいし、別の層を設けそこへ添加してもよい。別の
層とする場合、後述する熱分解性でありかつ分解しない
状態では該結着剤の溶解性を実質的に低下させる物質を
含む層に隣接する層へ添加するのが望ましい。また、染
料もしくは顔料と結着樹脂は同一の層が好ましいが、別
の層でも構わない。Further, as another particularly preferable example of the dye, there can be mentioned near infrared absorbing dyes described as formulas (I) and (II) in US Pat. No. 4,756,993. These pigments or dyes are used in an amount of 0.01 to 50% by weight, preferably 0.1 to 10% by weight, and particularly preferably 0.5 to 10% by weight, in the case of pigments, based on the total solid content of the printing plate material. Particularly preferably 3.1
It can be added to the printing plate material in a proportion of from 10 to 10% by weight. If the amount of the pigment or dye added is less than 0.01% by weight, the sensitivity will be low, and if it exceeds 50% by weight, the uniformity of the photosensitive layer will be lost and the durability of the recording layer will be poor. These dyes or pigments may be added to the same layer as other components, or may be added to another layer provided separately. When it is formed as a separate layer, it is desirable to add it to a layer adjacent to a layer containing a substance which is to be described later and is a substance which substantially decomposes the solubility of the binder in the state of being thermally decomposable and not decomposed. The dye or pigment and the binder resin are preferably in the same layer, but may be in different layers.
【0063】〔その他の成分〕上記のポジ型画像記録層
を形成するにあたっては、上記のそれぞれの必須成分の
他、本発明の効果を損なわない限りにおいて、更に必要
に応じて、種々の添加剤を添加することができる。例え
ばオニウム塩、o−キノンジアジド化合物、芳香族スル
ホン化合物、芳香族スルホン酸エステル化合物等の熱分
解性であり、分解しない状態ではアルカリ水可溶性高分
子化合物の溶解性を実質的に低下させる物質を併用する
ことは、画像部の現像液への溶解阻止性の向上を図る点
では、好ましい。オニウム塩としてはジアゾニウム塩、
アンモニウム塩、ホスホニウム塩、ヨードニウム塩、ス
ルホニウム塩、セレノニウム塩、アルソニウム塩等を挙
げることができる。[Other Components] In forming the above-mentioned positive image recording layer, in addition to the above-mentioned essential components, various additives may be further added, if necessary, as long as the effects of the present invention are not impaired. Can be added. For example, an onium salt, an o-quinonediazide compound, an aromatic sulfone compound, an aromatic sulfonic acid ester compound, or the like, which is thermally decomposable, is used in combination with a substance that substantially reduces the solubility of the alkaline water-soluble polymer compound when not decomposed. Doing so is preferable from the viewpoint of improving the dissolution inhibiting property of the image area in the developing solution. As the onium salt, a diazonium salt,
Examples thereof include ammonium salt, phosphonium salt, iodonium salt, sulfonium salt, selenonium salt, arsonium salt and the like.
【0064】本発明において用いられるオニウム塩とし
て、好適なものとしては、例えば S. I. Schlesinger,
Photogr. Sci. Eng., 18, 387(1974) 、T. S. Bal et a
l, Polymer, 21, 423(1980) 、特開平5−158230
号公報に記載のジアゾニウム塩、米国特許第4,069,055
号、同4,069,056 号、特開平3-140140号の明細書に記載
のアンモニウム塩、D. C. Necker et al, Macromolecul
es, 17, 2468(1984)、C. S. Wen et al, Teh, Proc. Co
nf. Rad. Curing ASIA, p478 Tokyo, Oct (1988)、米国
特許第4,069,055 号、同4,069,056 号に記載のホスホニ
ウム塩、J. V.Crivello et al, Macromorecules, 10
(6), 1307 (1977)、Chem. & Eng. News, Nov. 28, p31
(1988)、欧州特許第104,143 号、米国特許第339,049
号、同第410,201 号、特開平2-150848号、特開平2-2965
14号に記載のヨードニウム塩、J. V.Crivello et al, P
olymer J. 17, 73 (1985)、J. V. Crivello et al. J.
Org.Chem., 43, 3055 (1978)、W. R. Watt et al, J. P
olymer Sci., Polymer Chem.Ed., 22, 1789 (1984) 、
J. V. Crivello et al, Polymer Bull., 14, 279 (198
5)、J. V. Crivello et al, Macromorecules, 14(5) ,
1141(1981)、J. V. Crivello et al, J. Polymer Sci.,
Polymer Chem. Ed., 17, 2877 (1979) 、欧州特許第37
0,693 号、同233,567 号、同297,443 号、同297,442
号、米国特許第4,933,377 号、同3,902,114 号、同410,
201 号、同339,049 号、同4,760,013 号、同4,734,444
号、同2,833,827 号、独国特許第2,904,626 号、同3,60
4,580 号、同3,604,581 号に記載のスルホニウム塩、J.
V. Crivello et al, Macromorecules,10(6), 1307 (19
77)、J. V. Crivello et al, J. Polymer Sci., Polyme
r Chem.Ed., 17, 1047 (1979) に記載のセレノニウム
塩、C. S. Wen et al, Teh,Proc.Conf. Rad. Curing AS
IA, p478 Tokyo, Oct (1988)に記載のアルソニウム塩等
が挙げられる。オニウム塩のなかでも、ジアゾニウム塩
が特に好ましい。また、特に好適なジアゾニウム塩とし
ては特開平5−158230号公報記載のものが挙げら
れる。Suitable onium salts used in the present invention include, for example, SI Schlesinger,
Photogr. Sci. Eng., 18, 387 (1974), TS Bal et a
l, Polymer, 21, 423 (1980), JP-A-5-158230
Diazonium salt described in U.S. Pat. No. 4,069,055
No. 4,069,056, ammonium salts described in JP-A-3-140140, DC Necker et al, Macromolecul
es, 17, 2468 (1984), CS Wen et al, Teh, Proc. Co
nf.Rad. Curing ASIA, p478 Tokyo, Oct (1988), U.S. Pat.
(6), 1307 (1977), Chem. & Eng. News, Nov. 28, p31.
(1988), European Patent 104,143, U.S. Patent 339,049.
No. 410,201, JP-A No. 2-150848, and JP-A No. 2-2965.
Iodonium salt described in No. 14, JVCrivello et al, P
olymer J. 17, 73 (1985), JV Crivello et al. J.
Org. Chem., 43, 3055 (1978), WR Watt et al, J. P.
olymer Sci., Polymer Chem. Ed., 22, 1789 (1984),
JV Crivello et al, Polymer Bull., 14, 279 (198
5), JV Crivello et al, Macromorecules, 14 (5),
1141 (1981), JV Crivello et al, J. Polymer Sci.,
Polymer Chem. Ed., 17, 2877 (1979), European Patent 37
0,693, 233,567, 297,443, 297,442
U.S. Pat.Nos. 4,933,377, 3,902,114, 410,
No. 201, No. 339,049, No. 4,760,013, No. 4,734,444
No. 2,833,827, German Patent Nos. 2,904,626, 3,60
Sulfonium salts described in 4,580 and 3,604,581, J.
V. Crivello et al, Macromorecules, 10 (6), 1307 (19
77), JV Crivello et al, J. Polymer Sci., Polyme
r Chem. Ed., 17, 1047 (1979), selenonium salt, CS Wen et al, Teh, Proc.Conf. Rad. Curing AS
Examples include arsonium salts described in IA, p478 Tokyo, Oct (1988). Among the onium salts, the diazonium salt is particularly preferable. Further, particularly preferable diazonium salts include those described in JP-A-5-158230.
【0065】オニウム塩の対イオンとしては、四フッ化
ホウ酸、六フッ化リン酸、トリイソプロピルナフタレン
スルホン酸、5−ニトロ−o−トルエンスルホン酸、5
−スルホサリチル酸、2,5−ジメチルベンゼンスルホ
ン酸、2,4,6−トリメチルベンゼンスルホン酸、2
−ニトロベンゼンスルホン酸、3−クロロベンゼンスル
ホン酸、3−ブロモベンゼンスルホン酸、2−フルオロ
カプリルナフタレンスルホン酸、ドデシルベンゼンスル
ホン酸、1−ナフトール−5−スルホン酸、2−メトキ
シ−4−ヒドロキシ−5−ベンゾイル−ベンゼンスルホ
ン酸、及びパラトルエンスルホン酸等を挙げることがで
きる。これらの中でも特に六フッ化リン酸、トリイソプ
ロピルナフタレンスルホン酸や2,5−ジメチルベンゼ
ンスルホン酸のごときアルキル芳香族スルホン酸が好適
である。As counter ions of the onium salt, tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5
-Sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2
-Nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5- Examples thereof include benzoyl-benzenesulfonic acid and paratoluenesulfonic acid. Among these, alkylaromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid and 2,5-dimethylbenzenesulfonic acid are particularly preferable.
【0066】好適なキノンジアジド類としてはo−キノ
ンジアジド化合物を挙げることができる。本発明に用い
られるo−キノンジアジド化合物は、少なくとも1個の
o−キノンジアジド基を有する化合物で、熱分解により
アルカリ可溶性を増すものであり、種々の構造の化合物
を用いることができる。つまり、o−キノンジアジドは
熱分解により結着剤の溶解抑制能を失うことと、o−キ
ノンジアジド自身がアルカリ可溶性の物質に変化するこ
との両方の効果により感材系の溶解性を助ける。本発明
に用いられるo−キノンジアジド化合物としては、例え
ば、J.コーサー著「ライト−センシティブ・システム
ズ」(John Wiley & Sons. Inc.)第339〜352頁に
記載の化合物が使用できるが、特に種々の芳香族ポリヒ
ドロキシ化合物あるいは芳香族アミノ化合物と反応させ
たo−キノンジアジドのスルホン酸エステル又はスルホ
ン酸アミドが好適である。また、特公昭43−28403 号公
報に記載されているようなベンゾキノン(1,2)−ジ
アジドスルホン酸クロライド又はナフトキノン−(1,
2)−ジアジド−5−スルホン酸クロライドとピロガロ
ール−アセトン樹脂とのエステル、米国特許第3,046,12
0 号及び同第3,188,210 号に記載されているベンゾキノ
ン−(1,2)−ジアジドスルホン酸クロライド又はナ
フトキノン−(1,2)−ジアジド−5−スルホン酸ク
ロライドとフェノール−ホルムアルデヒド樹脂とのエス
テルも好適に使用される。Suitable quinonediazides include o-quinonediazide compounds. The o-quinonediazide compound used in the present invention is a compound having at least one o-quinonediazide group, which increases alkali solubility by thermal decomposition, and compounds having various structures can be used. That is, o-quinonediazide assists the solubility of the light-sensitive material system by both the effect of losing the ability to suppress the dissolution of the binder by thermal decomposition and the effect of changing o-quinonediazide itself into an alkali-soluble substance. Examples of the o-quinonediazide compound used in the present invention include those described in J. The compounds described on pages 339 to 352 of "Light-Sensitive Systems" (John Wiley & Sons. Inc.) by Coser can be used, but in particular, they have been reacted with various aromatic polyhydroxy compounds or aromatic amino compounds. -Sulfonic acid esters or sulfonic acid amides of quinonediazide are preferred. Further, benzoquinone (1,2) -diazide sulfonic acid chloride or naphthoquinone- (1,3) as described in JP-B-43-28403.
2) -Diazido-5-sulfonic acid chloride ester with pyrogallol-acetone resin, US Pat. No. 3,046,12
0 and benzoquinone- (1,2) -diazide sulfonic acid chlorides or naphthoquinone- (1,2) -diazide-5-sulfonic acid chlorides and esters of phenol-formaldehyde resins described in No. 3,188,210 It is preferably used.
【0067】さらにナフトキノン−(1,2)−ジアジ
ド−4−スルホン酸クロライドとフェノールホルムアル
デヒド樹脂あるいはクレゾール−ホルムアルデヒド樹脂
とのエステル、ナフトキノン−(1,2)−ジアジド−
4−スルホン酸クロライドとピロガロール−アセトン樹
脂とのエステルも同様に好適に使用される。その他の有
用なo−キノンジアジド化合物としては、数多くの特許
に報告され知られている。例えば特開昭47−5303号、特
開昭48−63802 号、特開昭48−63803 号、特開昭48−96
575 号、特開昭49−38701 号、特開昭48−13354 号、特
公昭41−11222号、特公昭45−9610号、特公昭49−17481
号、米国特許第2,797,213 号、同第3,454,400 号、同
第3,544,323 号、同第3,573,917 号、同第3,674,495
号、同第3,785,825 号、英国特許第1,227,602 号、同第
1,251,345 号、同第1,267,005 号、同第1,329,888 号、
同第1,330,932 号、ドイツ特許第854,890 号などの各明
細書中に記載されているものを挙げることができる。Further, an ester of naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and a phenol formaldehyde resin or a cresol-formaldehyde resin, naphthoquinone- (1,2) -diazide-
Esters of 4-sulfonic acid chloride and pyrogallol-acetone resin are likewise preferably used. Other useful o-quinonediazide compounds are reported and known in numerous patents. For example, JP-A-47-5303, JP-A-48-63802, JP-A-48-63803, and JP-A-48-96.
575, JP-A-49-38701, JP-A-48-13354, JP-B-41-11222, JP-B-45-9610, JP-B-49-17481
U.S. Pat.Nos. 2,797,213, 3,454,400, 3,544,323, 3,573,917, 3,674,495.
No. 3,785,825, British Patent No. 1,227,602, No.
1,251,345, 1,267,005, 1,329,888,
Mention may be made, for example, of those described in the respective specifications such as 1,330,932 and German Patent No. 854,890.
【0068】o−キノンジアジド化合物の添加量は好ま
しくは印刷版材料全固形分に対し、1〜50質量%、更
に好ましくは5〜30質量%、特に好ましくは10〜3
0質量%の範囲である。これらの化合物は単一で使用で
きるが、数種の混合物として使用してもよい。The amount of the o-quinonediazide compound added is preferably 1 to 50% by mass, more preferably 5 to 30% by mass, and particularly preferably 10 to 3% by mass based on the total solid content of the printing plate material.
It is in the range of 0 mass%. These compounds can be used alone, but may be used as a mixture of several kinds.
【0069】また、感度を更に向上させる目的で、環状
酸無水物類、フェノール類、有機酸類を併用することも
できる。環状酸無水物としては米国特許第4,115,128 号
明細書に記載されている無水フタル酸、テトラヒドロ無
水フタル酸、ヘキサヒドロ無水フタル酸、3,6−エン
ドオキシ−テトラヒドロ無水フタル酸、テトラクロル無
水フタル酸、無水マレイン酸、クロル無水マレイン酸、
α−フェニル無水マレイン酸、無水コハク酸、無水ピロ
メリット酸などが使用できる。フェノール類としては、
ビスフェノールA、p−ニトロフェノール、p−エトキ
シフェノール、2,4,4′−トリヒドロキシベンゾフ
ェノン、2,3,4−トリヒドロキシベンゾフェノン、
4−ヒドロキシベンゾフェノン、4,4′,4″−トリ
ヒドロキシトリフェニルメタン、4,4′,3″,4″
−テトラヒドロキシ−3,5,3′,5′−テトラメチ
ルトリフェニルメタンなどが挙げられる。更に、有機酸
類としては、特開昭60−88942 号、特開平2−96755 号
公報などに記載されている、スルホン酸類、スルフィン
酸類、アルキル硫酸類、ホスホン酸類、リン酸エステル
類及びカルボン酸類などがあり、具体的には、p−トル
エンスルホン酸、ドデシルベンゼンスルホン酸、p−ト
ルエンスルフィン酸、エチル硫酸、フェニルホスホン
酸、フェニルホスフィン酸、リン酸フェニル、リン酸ジ
フェニル、安息香酸、イソフタル酸、アジピン酸、p−
トルイル酸、3,4−ジメトキシ安息香酸、フタル酸、
テレフタル酸、4−シクロヘキセン−1,2−ジカルボ
ン酸、エルカ酸、ラウリン酸、n−ウンデカン酸、アス
コルビン酸などが挙げられる。上記の環状酸無水物、フ
ェノール類及び有機酸類の印刷版材料中に占める割合
は、0.05〜20質量%が好ましく、より好ましくは
0.1〜15質量%、特に好ましくは0.1〜10質量
%である。Further, cyclic acid anhydrides, phenols and organic acids may be used in combination for the purpose of further improving the sensitivity. Examples of the cyclic acid anhydride include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endooxy-tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, and anhydride described in U.S. Pat. No. 4,115,128. Maleic acid, chloromaleic anhydride,
α-Phenyl maleic anhydride, succinic anhydride, pyromellitic dianhydride, etc. can be used. As phenols,
Bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone,
4-hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "
-Tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane and the like. Further, as organic acids, sulfonic acids, sulfinic acids, alkylsulfates, phosphonic acids, phosphoric acid esters, carboxylic acids and the like described in JP-A-60-88942 and JP-A-2-96755 are mentioned. Specifically, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfate, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, Adipic acid, p-
Toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid,
Examples thereof include terephthalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid and ascorbic acid. The proportion of the above cyclic acid anhydride, phenols and organic acids in the printing plate material is preferably 0.05 to 20% by mass, more preferably 0.1 to 15% by mass, and particularly preferably 0.1 to 0.1% by mass. It is 10% by mass.
【0070】また、本発明に係る記録層塗布液中には、
現像条件に対する処理の安定性を広げるため、特開昭6
2−251740号公報や特開平3−208514号公
報に記載されているような非イオン界面活性剤、特開昭
59−121044号公報、特開平4−13149号公
報に記載されているような両性界面活性剤、EP950
517公報に記載されているようなシロキサン系化合
物、特開平11−288093号公報に記載されている
ようなフッ素含有のモノマー共重合体を添加することが
できる。In the recording layer coating liquid according to the present invention,
To extend the stability of processing under developing conditions, Japanese Patent Laid-Open No.
Nonionic surfactants as described in JP-A-2-251740 and JP-A-3-208514, and amphoteric as described in JP-A-59-121044 and JP-A-4-13149. Surfactant, EP950
A siloxane-based compound as described in Japanese Patent Application Laid-Open No. 517/517 and a fluorine-containing monomer copolymer as described in Japanese Patent Application Laid-Open No. 11-288093 can be added.
【0071】非イオン界面活性剤の具体例としては、ソ
ルビタントリステアレート、ソルビタンモノパルミテー
ト、ソルビタントリオレート、ステアリン酸モノグリセ
リド、ポリオキシエチレンノニルフェニルエーテル等が
挙げられる。両性活性剤の具体例としては、アルキルジ
(アミノエチル)グリシン、アルキルポリアミノエチル
グリシン塩酸塩、2−アルキル−N−カルボキシエチル
−N−ヒドロキシエチルイミダゾリニウムベタインやN
−テトラデシル−N,N−ベタイン型(例えば、商品名
「アモーゲンK」:第一工業(株)製)等が挙げられ
る。シロキサン系化合物としては、ジメチルシロキサン
とポリアルキレンオキシドのブロック共重合体が好まし
く、具体例として、(株)チッソ社製、DBE−224,
DBE−621,DBE−712,DBP−732,D
BP−534、独Tego社製、Tego Glide
100等のポリアルキレンオキシド変性シリコーンを挙
げることが出来る。上記非イオン界面活性剤及び両性界
面活性剤の印刷版材料中に占める割合は、0.05〜1
5質量%が好ましく、より好ましくは0.1〜5質量%
である。Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride and polyoxyethylene nonylphenyl ether. Specific examples of the amphoteric activator include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N.
-Tetradecyl-N, N-betaine type (for example, trade name "Amogen K": manufactured by Dai-ichi Kogyo Co., Ltd.) and the like. As the siloxane-based compound, a block copolymer of dimethylsiloxane and polyalkylene oxide is preferable, and specific examples include DBE-224, manufactured by Chisso Corporation.
DBE-621, DBE-712, DBP-732, D
BP-534, Tego Glide, manufactured by Tego, Germany
Examples thereof include polyalkylene oxide-modified silicones such as 100. The ratio of the nonionic surfactant and the amphoteric surfactant in the printing plate material is 0.05 to 1
5 mass% is preferable, and 0.1-5 mass% is more preferable.
Is.
【0072】本発明における画像記録層中には、露光に
よる加熱後直ちに可視像を得るための焼き出し剤や、画
像着色剤としての染料や顔料を加えることができる。焼
き出し剤としては、露光による加熱によって酸を放出す
る化合物(光酸放出剤)と塩を形成し得る有機染料の組
合せを代表として挙げることができる。具体的には、特
開昭50−36209号、同53−8128号の各公報
に記載されているo−ナフトキノンジアジド−4−スル
ホン酸ハロゲニドと塩形成性有機染料の組合せや、特開
昭53−36223号、同54−74728号、同60
−3626号、同61−143748号、同61−15
1644号及び同63−58440号の各公報に記載さ
れているトリハロメチル化合物と塩形成性有機染料の組
合せを挙げることができる。かかるトリハロメチル化合
物としては、オキサゾール系化合物とトリアジン系化合
物とがあり、どちらも経時安定性に優れ、明瞭な焼き出
し画像を与える。In the image-recording layer according to the invention, a printing-out agent for obtaining a visible image immediately after heating by exposure or a dye or pigment as an image colorant can be added. A typical example of the print-out agent is a combination of a compound that releases an acid when heated by exposure (photo-acid releasing agent) and an organic dye capable of forming a salt. Specifically, a combination of an o-naphthoquinonediazide-4-sulfonic acid halogenide and a salt-forming organic dye described in JP-A-50-36209 and JP-A-53-8128, and JP-A-53 / 1983. -36223, 54-74728, 60
-3626, 61-143748, 61-15
Examples thereof include combinations of trihalomethyl compounds and salt-forming organic dyes described in JP-A Nos. 1644 and 63-58440. Such trihalomethyl compounds include oxazole-based compounds and triazine-based compounds, both of which have excellent stability over time and give a clear printout image.
【0073】画像の着色剤としては、前述の塩形成性有
機染料以外に他の染料を用いることができる。塩形成性
有機染料を含めて、好適な染料として油溶性染料と塩基
性染料をあげることができる。具体的にはオイルイエロ
ー#101、オイルイエロー#103、オイルピンク#
312、オイルグリーンBG、オイルブルーBOS、オ
イルブルー#603、オイルブラックBY、オイルブラ
ックBS、オイルブラックT−505(以上オリエント
化学工業(株)製)、ビクトリアピュアブルー、クリス
タルバイオレット(CI42555)、メチルバイオレ
ット(CI42535)、エチルバイオレット、ローダ
ミンB(CI145170B)、マラカイトグリーン
(CI42000)、メチレンブルー(CI5201
5)などを挙げることができる。また、特開昭62−2
93247号公報に記載されている染料は特に好まし
い。これらの染料は、印刷版材料全固形分に対し、0.
01〜10質量%、好ましくは0.1〜3質量%の割合
で印刷版材料中に添加することができる。更に本発明の
印刷版材料中には必要に応じ、塗膜の柔軟性等を付与す
るために可塑剤が加えられる。例えば、ブチルフタリ
ル、ポリエチレングリコール、クエン酸トリブチル、フ
タル酸ジエチル、フタル酸ジブチル、フタル酸ジヘキシ
ル、フタル酸ジオクチル、リン酸トリクレジル、リン酸
トリブチル、リン酸トリオクチル、オレイン酸テトラヒ
ドロフルフリル、アクリル酸又はメタクリル酸のオリゴ
マー及びポリマー等が用いられる。As the image colorant, other dyes can be used in addition to the above-mentioned salt-forming organic dyes. Suitable dyes, including salt-forming organic dyes, include oil-soluble dyes and basic dyes. Specifically, Oil Yellow # 101, Oil Yellow # 103, Oil Pink #
312, Oil Green BG, Oil Blue BOS, Oil Blue # 603, Oil Black BY, Oil Black BS, Oil Black T-505 (all manufactured by Orient Chemical Industry Co., Ltd.), Victoria Pure Blue, Crystal Violet (CI42555), Methyl. Violet (CI42535), ethyl violet, Rhodamine B (CI145170B), malachite green (CI42000), methylene blue (CI5201).
5) etc. can be mentioned. In addition, JP-A-62-2
The dyes described in Japanese Patent No. 93247 are particularly preferable. These dyes are added in an amount of 0.
It can be added to the printing plate material in a proportion of 01 to 10% by mass, preferably 0.1 to 3% by mass. Further, a plasticizer is added to the printing plate material of the present invention, if necessary, in order to impart flexibility to the coating film. For example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, acrylic acid or methacrylic acid. Oligomers and polymers are used.
【0074】本発明の平版印刷用原板の画像記録層は、
通常上記各成分を溶媒に溶かして画像記録層塗布液を調
製し、該記録層塗布液を適当な支持体上に塗布すること
により製造することができる。ここで使用する溶媒とし
ては、エチレンジクロライド、シクロヘキサノン、メチ
ルエチルケトン、メタノール、エタノール、プロパノー
ル、エチレングリコールモノメチルエーテル、1−メト
キシ−2−プロパノール、2−メトキシエチルアセテー
ト、1−メトキシ−2−プロピルアセテート、ジメトキ
シエタン、乳酸メチル、乳酸エチル、N,N−ジメチル
アセトアミド、N,N−ジメチルホルムアミド、テトラ
メチルウレア、N−メチルピロリドン、ジメチルスルホ
キシド、スルホラン、γ−ブチロラクトン、トルエン等
を挙げることができるが、これに限定されるものではな
い。これらの溶媒は単独あるいは混合して使用される。
塗布溶剤の選択にあたっては、画像記録層が上部記録
層、下部記録層の2層構造を有するものについては、隣
接して設けられる場合に互いの層の界面における相溶を
防止するため、上部記録層の塗布溶媒は、下部記録層を
実質的に溶解しないものを選択することが好ましい。溶
媒中の上記成分(添加剤を含む全固形分)の濃度は、好
ましくは1〜50重量%である。The image recording layer of the lithographic printing plate precursor of the invention is
Usually, it can be produced by dissolving each of the above components in a solvent to prepare a coating liquid for the image recording layer, and coating the coating liquid for the recording layer on a suitable support. As the solvent used here, ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, 2-methoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxy. Examples include ethane, methyl lactate, ethyl lactate, N, N-dimethylacetamide, N, N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, γ-butyrolactone, and toluene. It is not limited to. These solvents may be used alone or as a mixture.
When selecting the coating solvent, when the image recording layer has a two-layer structure of an upper recording layer and a lower recording layer, the upper recording layer is formed in order to prevent mutual compatibility at the interface between the layers when they are provided adjacent to each other. The coating solvent for the layer is preferably selected so that it does not substantially dissolve the lower recording layer. The concentration of the above components (total solids including additives) in the solvent is preferably 1 to 50% by weight.
【0075】塗布する方法としては、種々の方法を用い
ることができるが、例えば、バーコーター塗布、回転塗
布、スプレー塗布、カーテン塗布、ディップ塗布、エア
ーナイフ塗布、ブレード塗布、ロール塗布等を挙げるこ
とができる。塗布量が少なくなるにつれて、見かけの感
度は大になるが、感光膜の皮膜特性は低下する。本発明
における感光性層中には、塗布性を良化するための界面
活性剤、例えば特開昭62−170950号公報に記載
されているようなフッ素系界面活性剤を添加することが
できる。好ましい添加量は、記録層全固形分中0.01
〜1重量%、さらに好ましくは0.05〜0.5重量%
である。Various methods can be used for coating, and examples thereof include bar coater coating, spin coating, spray coating, curtain coating, dip coating, air knife coating, blade coating, and roll coating. You can As the coating amount decreases, the apparent sensitivity increases, but the film characteristics of the photosensitive film deteriorate. In the photosensitive layer according to the present invention, a surfactant for improving the coatability, for example, a fluorine-based surfactant as described in JP-A-62-170950 can be added. The preferable addition amount is 0.01 in the total solid content of the recording layer.
~ 1 wt%, more preferably 0.05-0.5 wt%
Is.
【0076】〔支持体〕本発明に使用される支持体とし
ては、必要な強度と耐久性を備えた寸度的に安定な板状
物が挙げられ、例えば、紙、プラスチック(例えば、ポ
リエチレン、ポリプロピレン、ポリスチレン等)がラミ
ネートされた紙、金属板(例えば、アルミニウム、亜
鉛、銅等)、プラスチックフィルム(例えば、二酢酸セ
ルロース、三酢酸セルロース、プロピオン酸セルロー
ス、酪酸セルロース、酢酸酪酸セルロース、硝酸セルロ
ース、ポリエチレンテレフタレート、ポリエチレン、ポ
リスチレン、ポリプロピレン、ポリカーボネート、ポリ
ビニルアセタール等)、上記のごとき金属がラミネー
ト、もしくは蒸着された紙、もしくはプラスチックフィ
ルム等が含まれる。[Support] The support used in the present invention includes a dimensionally stable plate-like material having necessary strength and durability, and examples thereof include paper and plastics (eg polyethylene, Polypropylene, polystyrene, etc.) laminated paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate) , Polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal and the like), paper laminated with the above metal or vapor-deposited, or a plastic film.
【0077】本発明に用いる支持体としては、ポリエス
テルフィルム又はアルミニウム板が好ましく、その中で
も寸法安定性がよく、比較的安価であるアルミニウム板
は特に好ましい。好適なアルミニウム板は、純アルミニ
ウム板及びアルミニウムを主成分とし、微量の異元素を
含む合金板であり、更にアルミニウムがラミネートもし
くは蒸着されたプラスチックフィルムでもよい。アルミ
ニウム合金に含まれる異元素には、ケイ素、鉄、マンガ
ン、銅、マグネシウム、クロム、亜鉛、ビスマス、ニッ
ケル、チタンなどがある。合金中の異元素の含有量は高
々10質量%以下である。本発明において特に好適なア
ルミニウムは、純アルミニウムであるが、完全に純粋な
アルミニウムは精錬技術上製造が困難であるので、僅か
に異元素を含有するものでもよい。このように本発明に
適用されるアルミニウム板は、その組成が特定されるも
のではなく、従来より公知公用の素材のアルミニウム板
を適宜に利用することができる。本発明で用いられるア
ルミニウム板の厚みはおよそ0.1mm〜0.6mm程
度、好ましくは0.15mm〜0.4mm、特に好まし
くは0.2mm〜0.3mmである。As the support used in the present invention, a polyester film or an aluminum plate is preferable, and among them, an aluminum plate which has good dimensional stability and is relatively inexpensive is particularly preferable. The preferred aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a slight amount of a foreign element, and may be a plastic film in which aluminum is laminated or vapor-deposited. The foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium. The content of foreign elements in the alloy is at most 10% by mass. Aluminum which is particularly preferred in the present invention is pure aluminum, but completely pure aluminum is difficult to produce in terms of refining technology, and thus may contain a slightly different element. As described above, the composition of the aluminum plate applied to the present invention is not specified, and conventionally known and publicly known aluminum plates can be appropriately used. The thickness of the aluminum plate used in the present invention is about 0.1 mm to 0.6 mm, preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm.
【0078】アルミニウム板を粗面化するに先立ち、所
望により、表面の圧延油を除去するための例えば界面活
性剤、有機溶剤又はアルカリ性水溶液などによる脱脂処
理が行われる。アルミニウム板の表面の粗面化処理は、
種々の方法により行われるが、例えば、機械的に粗面化
する方法、電気化学的に表面を溶解粗面化する方法及び
化学的に表面を選択溶解させる方法により行われる。機
械的方法としては、ボール研磨法、ブラシ研磨法、ブラ
スト研磨法、バフ研磨法などの公知の方法を用いること
ができる。また、電気化学的な粗面化法としては塩酸又
は硝酸電解液中で交流又は直流により行う方法がある。
また、特開昭54−63902号公報に開示されている
ように両者を組み合わせた方法も利用することができ
る。この様に粗面化されたアルミニウム板は、必要に応
じてアルカリエッチング処理及び中和処理された後、所
望により表面の保水性や耐摩耗性を高めるために陽極酸
化処理が施される。アルミニウム板の陽極酸化処理に用
いられる電解質としては、多孔質酸化皮膜を形成する種
々の電解質の使用が可能で、一般的には硫酸、リン酸、
蓚酸、クロム酸あるいはそれらの混酸が用いられる。そ
れらの電解質の濃度は電解質の種類によって適宜決めら
れる。Prior to roughening the aluminum plate, if desired, a degreasing treatment for removing the rolling oil on the surface is carried out, for example, with a surfactant, an organic solvent or an alkaline aqueous solution. Roughening treatment of the surface of the aluminum plate,
Various methods are used, for example, a method of mechanically roughening the surface, a method of electrochemically dissolving and roughening the surface, and a method of chemically selectively dissolving the surface. As the mechanical method, known methods such as a ball polishing method, a brush polishing method, a blast polishing method and a buff polishing method can be used. Further, as an electrochemical graining method, there is a method of performing alternating current or direct current in a hydrochloric acid or nitric acid electrolytic solution.
Further, as disclosed in Japanese Patent Laid-Open No. 54-63902, a method in which both are combined can be used. The thus roughened aluminum plate is subjected to an alkali etching treatment and a neutralization treatment, if necessary, and then subjected to anodizing treatment if desired to enhance the water retention and abrasion resistance of the surface. As the electrolyte used for the anodizing treatment of the aluminum plate, various electrolytes that form a porous oxide film can be used, and generally, sulfuric acid, phosphoric acid,
Oxalic acid, chromic acid, or a mixed acid thereof is used. The concentration of these electrolytes is appropriately determined depending on the type of electrolyte.
【0079】陽極酸化の処理条件は、用いる電解質によ
り種々変わるので一概に特定し得ないが、一般的には電
解質の濃度が1〜80質量%溶液、液温は5〜70℃、
電流密度5〜60A/dm2、電圧1〜100V、電解
時間10秒〜5分の範囲であれば適当である。陽極酸化
皮膜の量は1.0g/m2より少ないと耐刷性が不十分
であったり、平版印刷版の非画像部に傷が付き易くなっ
て、印刷時に傷の部分にインキが付着するいわゆる「傷
汚れ」が生じ易くなる。陽極酸化処理を施された後、ア
ルミニウム表面は必要により親水化処理が施される。本
発明に使用される親水化処理としては、米国特許第2,
714,066号、同第3,181,461号、第3,
280,734号及び第3,902,734号に開示さ
れているようなアルカリ金属シリケート(例えばケイ酸
ナトリウム水溶液)法がある。この方法においては、支
持体がケイ酸ナトリウム水溶液で浸漬処理されるか又は
電解処理される。他に特公昭36−22063号公報に
開示されているフッ化ジルコン酸カリウム及び米国特許
第3,276,868号、同第4,153,461号、
同第4,689,272号に開示されているようなポリ
ビニルホスホン酸で処理する方法などが用いられる。The treatment conditions for anodic oxidation cannot be unconditionally specified because they vary depending on the electrolyte used, but generally, the concentration of the electrolyte is 1 to 80% by mass solution, the liquid temperature is 5 to 70 ° C.
A current density of 5 to 60 A / dm @ 2, a voltage of 1 to 100 V, and an electrolysis time of 10 seconds to 5 minutes are suitable. If the amount of the anodic oxide film is less than 1.0 g / m2, the printing durability is insufficient, or the non-image area of the lithographic printing plate is easily scratched, and the ink adheres to the scratched portion during printing. "Scratch stains" easily occur. After being subjected to anodizing treatment, the aluminum surface is optionally subjected to hydrophilic treatment. Examples of the hydrophilic treatment used in the present invention include US Pat.
No. 714,066, No. 3,181,461, No. 3,
There are alkali metal silicate (eg sodium silicate aqueous solution) processes such as those disclosed in 280,734 and 3,902,734. In this method, the support is immersed in an aqueous solution of sodium silicate or electrolyzed. In addition, potassium fluorozirconate disclosed in JP-B-36-22063 and U.S. Pat. Nos. 3,276,868 and 4,153,461,
For example, the method of treating with polyvinylphosphonic acid as disclosed in the above-mentioned No. 4,689,272 is used.
【0080】本発明の平版印刷用原板においては、支持
体上にポジ型の画像記録層を単層又は2層以上積層して
設けたものであるが、必要に応じて支持体と画像記録層
(重層構成の場合、下部記録層)との間に下塗層を設け
ることができる。下塗層成分としては種々の有機化合物
が用いられ、例えば、カルボキシメチルセルロース、デ
キストリン、アラビアガム、アルカリ可溶性の酸基を有
するポリアクリレート、ポリウレタンあるいはポリビニ
ルブチラール、2−アミノエチルホスホン酸などのアミ
ノ基を有するホスホン酸類、置換基を有してもよいフェ
ニルホスホン酸、ナフチルホスホン酸、アルキルホスホ
ン酸、グリセロホスホン酸、メチレンジホスホン酸及び
エチレンジホスホン酸などの有機ホスホン酸、置換基を
有してもよいフェニルリン酸、ナフチルリン酸、アルキ
ルリン酸及びグリセロリン酸などの有機リン酸、置換基
を有してもよいフェニルホスフィン酸、ナフチルホスフ
ィン酸、アルキルホスフィン酸及びグリセロホスフィン
酸などの有機ホスフィン酸、グリシンやβ−アラニンな
どのアミノ酸類、及びトリエタノールアミンの塩酸塩な
どのヒドロキシ基を有するアミンの塩酸塩等から選ばれ
るが、2種以上混合して用いてもよい。とりわけ、画像
記録層に含有させることができる「特定の共重合体」と
して上記した一般式(III)〜一般式(VII)で代表され
るスルホン基とイミド基を併せ有する共重合体が好まし
い。この下塗り層は、それ自体には、実質的に画像部/
非画像部の識別機能は有してないが、識別性にも好まし
い。また、このような下塗り層を二層以上設けてもよ
い。In the lithographic printing plate precursor of the present invention, a positive type image recording layer is provided on the support in a single layer or two or more layers. If necessary, the support and the image recording layer are provided. An undercoat layer may be provided between (the lower recording layer in the case of a multilayer structure). Various organic compounds are used as the undercoat layer component, for example, carboxymethylcellulose, dextrin, gum arabic, polyacrylate having an alkali-soluble acid group, polyurethane or polyvinyl butyral, and an amino group such as 2-aminoethylphosphonic acid. Having phosphonic acid, phenylphosphonic acid which may have a substituent, naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, methylenediphosphonic acid, and organic phosphonic acid such as ethylenediphosphonic acid, which may have a substituent Organic phosphoric acid such as phenylphosphoric acid, naphthylphosphoric acid, alkylphosphoric acid and glycerophosphoric acid, optionally substituted phenylphosphinic acid, naphthylphosphinic acid, organic phosphinic acid such as alkylphosphinic acid and glycerophosphinic acid, glycic acid Amino acids such as and β- -alanine, and hydrochlorides of amines having a hydroxy group such as triethanolamine hydrochloride, may be used as a mixture of two or more. Above all, a copolymer having both a sulfone group and an imide group represented by the general formulas (III) to (VII) described above as the "specific copolymer" that can be contained in the image recording layer is preferable. This subbing layer is, by itself, substantially in the image area /
Although it does not have a discrimination function for the non-image portion, it is also preferable for discrimination. Two or more such undercoat layers may be provided.
【0081】上記有機下塗層は次のような方法で設ける
ことができる。即ち、水又はメタノール、エタノール、
メチルエチルケトンなどの有機溶剤もしくはそれらの混
合溶剤に上記の有機化合物を溶解させた溶液をアルミニ
ウム板上に塗布、乾燥して設ける方法と、水又はメタノ
ール、エタノール、メチルエチルケトンなどの有機溶剤
もしくはそれらの混合溶剤に上記の有機化合物を溶解さ
せた溶液に、アルミニウム板を浸漬して上記化合物を吸
着させ、その後水などによって洗浄、乾燥して有機下塗
層を設ける方法である。前者の方法では、上記の有機化
合物の0.005〜10質量%の濃度の溶液を種々の方
法で塗布できる。また後者の方法では、溶液の濃度は
0.01〜20質量%、好ましくは0.05〜5質量%
であり、浸漬温度は20〜90℃、好ましくは25〜5
0℃であり、浸漬時間は0.1秒〜20分、好ましくは
2秒〜1分である。これに用いる溶液は、アンモニア、
トリエチルアミン、水酸化カリウムなどの塩基性物質
や、塩酸、リン酸などの酸性物質によりpH1〜12の
範囲に調整することもできる。また、画像記録材料の調
子再現性改良のために黄色染料を添加することもでき
る。有機下塗層の被覆量は、2〜200mg/m2が適
当であり、好ましくは5〜100mg/m2である。上
記の被覆量が2mg/m2よりも少ないと十分な耐刷性
能が得られない。また、200mg/m2より大きくて
も同様である。The above organic undercoat layer can be provided by the following method. That is, water or methanol, ethanol,
A method in which the above organic compound is dissolved in an organic solvent such as methyl ethyl ketone or a mixed solvent thereof is applied onto an aluminum plate and dried, and an organic solvent such as water or methanol, ethanol, methyl ethyl ketone or a mixed solvent thereof is applied. Is a method in which an aluminum plate is immersed in a solution in which the above organic compound is dissolved to adsorb the above compound, followed by washing with water or the like and drying to provide an organic undercoat layer. In the former method, a solution having a concentration of 0.005 to 10 mass% of the above organic compound can be applied by various methods. In the latter method, the concentration of the solution is 0.01 to 20% by mass, preferably 0.05 to 5% by mass.
And the immersion temperature is 20 to 90 ° C., preferably 25 to 5
The temperature is 0 ° C., and the immersion time is 0.1 second to 20 minutes, preferably 2 seconds to 1 minute. The solution used for this is ammonia,
The pH can be adjusted within the range of 1 to 12 by using a basic substance such as triethylamine and potassium hydroxide, or an acidic substance such as hydrochloric acid and phosphoric acid. Further, a yellow dye may be added to improve the tone reproducibility of the image recording material. The coating amount of the organic undercoat layer is appropriately 2 to 200 mg / m 2, and preferably 5 to 100 mg / m 2. If the coating amount is less than 2 mg / m2, sufficient printing durability cannot be obtained. The same applies when the amount is larger than 200 mg / m 2.
【0082】[バックコート層]支持体の裏面には、必
要に応じてバックコートが設けられる。かかるバックコ
ートとしては特開平5−45885号公報に記載の有機
高分子化合物及び特開平6−35174号公報に記載の
有機又は無機金属化合物を加水分解及び重縮合させて得
られる金属酸化物からなる被覆層が好ましく用いられ
る。これらの被覆層のうち、Si(OCH3)4、Si(O
C2H5)4、Si(OC3H7)4、Si(OC4H9) 4等のケイ
素のアルコキシ化合物が安価で入手し易く、それから得
られる金属酸化物の被覆層が親水性に優れており特に好
ましい。[Backcoat layer] The backside of the support must have
A back coat is provided if necessary. Such a backco
The organic material described in JP-A-5-45885
Polymer compounds and those described in JP-A-6-35174
Obtained by hydrolysis and polycondensation of organic or inorganic metal compounds
A coating layer made of a metal oxide is preferably used.
It Of these coating layers, Si (OCH3)Four, Si (O
C2HFive)Four, Si (OC3H7)Four, Si (OCFourH9) FourKay of etc.
Elementary alkoxy compounds are cheap and easily available,
The coating layer of the metal oxide to be used has excellent hydrophilicity and is particularly preferable.
Good
【0083】[製版・印刷]上記のようにして作成された
平版印刷用原板は、通常、像露光、現像処理などの一連
の製版工程によって印刷版となり、印刷が行なわれる。
この平版印刷用原板への画像記録は熱の作用を利用して
行なわれる。例えば、熱記録ヘッド等により直接画像様
に感熱記録を施したり、波長760〜1200nmの赤
外線を放射する固体レーザー又は半導体レーザー、キセ
ノン放電灯などの高照度フラッシュ光や赤外線ランプ露
光などの光熱変換型の露光も用いることができる。[Plate Making / Printing] The lithographic printing plate precursor prepared as described above is usually used as a printing plate by a series of plate making steps such as image exposure and development, and printing is performed.
Image recording on the lithographic printing plate precursor is carried out by utilizing the action of heat. For example, a thermal recording head or the like is used to directly perform image-wise thermal recording, or a solid-state laser or semiconductor laser that emits infrared rays having a wavelength of 760 to 1200 nm, a high-intensity flash light such as a xenon discharge lamp, or a photothermal conversion type such as infrared lamp exposure. Exposure can also be used.
【0084】画像の書き込みは、面露光方式、走査方式
のいずれでもよい。前者の場合は、赤外線照射方式や、
キセノン放電灯の高照度の短時間光を原板上に照射して
光・熱変換によって熱を発生させる方式である。赤外線
灯などの面露光光源を使用する場合には、その照度によ
っても好ましい露光量は変化するが、通常は、印刷用画
像で変調する前の面露光強度が0.1〜10J/cm2 の範
囲であることが好ましく、0.1〜1J/cm2 の範囲であ
ることがより好ましい。支持体が透明である場合は、支
持体の裏側から支持体を通して露光することもできる。
その露光時間は、0.01〜1msec、好ましくは
0.01〜0.1msecの照射で上記の露光強度が得
られるように露光照度を選択するのが好ましい。照射時
間が長い場合には、熱エネルギーの生成速度と生成した
熱エネルギーの拡散速度の競争関係から露光強度を増加
させる必要が生じる。The image writing may be either a surface exposure method or a scanning method. In the case of the former, the infrared irradiation method,
This is a method in which high-intensity short-time light from a xenon discharge lamp is applied to the original plate to generate heat by light-heat conversion. When a surface exposure light source such as an infrared lamp is used, the preferable exposure amount changes depending on the illuminance, but normally, the surface exposure intensity before modulation with a printing image is 0.1 to 10 J / cm 2 . The range is preferable, and the range of 0.1 to 1 J / cm 2 is more preferable. When the support is transparent, it can also be exposed through the support from the back side of the support.
The exposure time is preferably 0.01 to 1 msec, preferably 0.01 to 0.1 msec, and the exposure illuminance is selected so that the above-mentioned exposure intensity can be obtained. When the irradiation time is long, it is necessary to increase the exposure intensity due to the competitive relationship between the generation rate of thermal energy and the diffusion rate of generated thermal energy.
【0085】後者の場合には、赤外線成分を多く含むレ
ーザー光源を使用して、レーザービームを画像で変調し
て原板上を走査する方式が行われる。レーザー光源の例
として、半導体レーザー、ヘリウムネオンレーザー、ヘ
リウムカドミウムレーザー、YAGレーザーを挙げるこ
とができる。レーザー出力が0.1〜300Wのレーザ
ーで照射をすることができる。また、パルスレーザーを
用いる場合には、ピーク出力が1000W、好ましくは
2000Wのレーザーを照射するのが好ましい。この場
合の露光量は、印刷用画像で変調する前の面露光強度が
0.1〜10J/cm2 の範囲であることが好ましく、0.
3〜1J/cm2 の範囲であることがより好ましい。支持体
が透明である場合は、支持体の裏側から支持体を通して
露光することもできる。像露光に用いられる活性光線の
光源としては、近赤外から赤外領域に発光波長を持つ光
源が好ましく、固体レーザ、半導体レーザが好ましい。
発光波長としては、760〜1080nmが好ましい。In the latter case, a method is used in which a laser light source containing a large amount of infrared rays is used to modulate a laser beam with an image and scan the original plate. Examples of the laser light source include a semiconductor laser, a helium neon laser, a helium cadmium laser, and a YAG laser. Irradiation can be performed with a laser having a laser output of 0.1 to 300 W. When a pulsed laser is used, it is preferable to irradiate a laser having a peak output of 1000 W, preferably 2000 W. The exposure amount in this case is preferably such that the surface exposure intensity before modulation with a printing image is in the range of 0.1 to 10 J / cm 2 , and
More preferably, it is in the range of 3 to 1 J / cm 2 . When the support is transparent, it can also be exposed through the support from the back side of the support. As a light source of actinic rays used for image exposure, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are preferable.
The emission wavelength is preferably 760 to 1080 nm.
【0086】本発明の赤外線レーザ用ポジ型の平版印刷
用原板の現像液及び補充液としては、従来よりPS版な
どの汎用平版印刷用原板用のアルカリ性水溶液を使用す
ればよい。本発明の平版印刷用原板に適用可能な公知の
アルカリ水溶液に用いられるアルカリ化合物としては、
例えば、ケイ酸ナトリウム、同カリウム、第3リン酸ナ
トリウム、同カリウム、同アンモニウム、第2リン酸ナ
トリウム、同カリウム、同アンモニウム、炭酸ナトリウ
ム、同カリウム、同アンモニウム、炭酸水素ナトリウ
ム、同カリウム、同アンモニウム、ほう酸ナトリウム、
同カリウム、同アンモニウム、水酸化ナトリウム、同ア
ンモニウム、同カリウム及び同リチウムなどの無機アル
カリ塩が挙げられる。また、モノメチルアミン、ジメチ
ルアミン、トリメチルアミン、モノエチルアミン、ジエ
チルアミン、トリエチルアミン、モノイソプロピルアミ
ン、ジイソプロピルアミン、トリイソプロピルアミン、
n−ブチルアミン、モノエタノールアミン、ジエタノー
ルアミン、トリエタノールアミン、モノイソプロパノー
ルアミン、ジイソプロパノールアミン、エチレンイミ
ン、エチレンジアミン、ピリジンなどの有機アルカリ剤
も用いられる。これらのアルカリ剤は単独もしくは2種
以上を組み合わせて用いられる。これらのアルカリ剤の
中で特に好ましい現像液は、ケイ酸ナトリウム、ケイ酸
カリウム等のケイ酸塩水溶液である。その理由はケイ酸
塩の成分である酸化珪素SiO2とアルカリ金属酸化物
M2Oの比率と濃度によって現像性の調節が可能となる
ためであり、例えば、特開昭54−62004号公報、
特公昭57−7427号に記載されているようなアルカ
リ金属ケイ酸塩が有効に用いられる。As a developer and a replenisher for the positive type lithographic printing plate precursor for infrared laser of the present invention, an alkaline aqueous solution for a general lithographic printing plate precursor such as a PS plate may be used conventionally. Examples of the alkaline compound used in a known alkaline aqueous solution applicable to the lithographic printing plate precursor of the present invention include:
For example, sodium silicate, potassium, sodium triphosphate, potassium, ammonium, dibasic sodium, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, Ammonium, sodium borate,
Examples thereof include inorganic alkali salts such as potassium, ammonium, sodium hydroxide, ammonium, potassium and lithium. In addition, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine,
Organic alkaline agents such as n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine and pyridine are also used. These alkaline agents may be used alone or in combination of two or more. Among these alkaline agents, a particularly preferable developer is an aqueous silicate solution such as sodium silicate or potassium silicate. The reason is that the developability can be controlled by the ratio and concentration of silicon oxide SiO 2 which is a component of silicate and alkali metal oxide M 2 O. For example, JP-A-54-62004,
An alkali metal silicate as described in JP-B-57-7427 is effectively used.
【0087】更に、自動現像機を用いて現像する場合に
は、現像液よりもアルカリ強度の高い水溶液(補充液)
を現像液に加えることによって、長時間現像タンク中の
現像液を交換することなく、多量の平版印刷版を処理で
きることが知られている。本発明においてもこの補充方
式が好ましく適用される。現像液及び補充液には、現像
性の促進や抑制、現像カスの分散及び印刷版画像部の親
インキ性を高める目的で、必要に応じて種々の界面活性
剤や有機溶剤を添加できる。好ましい界面活性剤として
は、アニオン系、カチオン系、ノニオン系及び両性界面
活性剤が挙げられる。更に現像液及び補充液には必要に
応じて、ハイドロキノン、レゾルシン、亜硫酸や亜硫酸
水素酸などの無機酸のナトリウム塩やカリウム塩等の還
元剤、更に有機カルボン酸、消泡剤、硬水軟化剤を加え
ることもできる。Further, when developing using an automatic processor, an aqueous solution (replenisher) having a higher alkali strength than the developer.
It is known that a large amount of lithographic printing plate can be processed without changing the developing solution in the developing tank for a long time by adding the above-mentioned to the developing solution. Also in the present invention, this replenishment system is preferably applied. Various surfactants and organic solvents can be added to the developing solution and the replenishing solution, if necessary, for the purpose of accelerating or suppressing the developing property, dispersing the development residue and improving the ink affinity of the printing plate image area. Preferred surfactants include anionic, cationic, nonionic and amphoteric surfactants. Further, in the developing solution and the replenishing solution, a reducing agent such as hydroquinone, resorcin, sodium salt or potassium salt of an inorganic acid such as sulfurous acid or bisulfite, an organic carboxylic acid, an antifoaming agent, and a water softener may be added. It can also be added.
【0088】上記現像液及び補充液を用いて現像処理さ
れた印刷版は水洗水、界面活性剤等を含有するリンス
液、アラビアガムや澱粉誘導体を含む不感脂化液で後処
理される。本発明に係る画像記録材料を印刷版として使
用する場合の後処理としては、これらの処理を種々組み
合わせて用いることができる。The printing plate developed using the above-mentioned developing solution and replenishing solution is post-treated with washing water, a rinsing solution containing a surfactant and the like, and a desensitizing solution containing gum arabic and a starch derivative. As the post-treatment when the image recording material according to the present invention is used as a printing plate, various combinations of these treatments can be used.
【0089】近年、製版・印刷業界では製版作業の合理
化及び標準化のため、印刷版用の自動現像機が広く用い
られている。この自動現像機は、一般に現像部と後処理
部からなり、印刷版を搬送する装置と各処理液槽及びス
プレー装置からなり、露光済みの印刷版を水平に搬送し
ながら、ポンプで汲み上げた各処理液をスプレーノズル
から吹き付けて現像処理するものである。また、最近は
処理液が満たされた処理液槽中に液中ガイドロールなど
によって印刷版を浸漬搬送させて処理する方法も知られ
ている。このような自動処理においては、各処理液に処
理量や稼働時間等に応じて補充液を補充しながら処理す
ることができる。また、実質的に未使用の処理液で処理
するいわゆる使い捨て処理方式も適用できる。In recent years, in the plate making / printing industry, automatic developing machines for printing plates have been widely used in order to rationalize and standardize the plate making work. This automatic developing machine is generally composed of a developing section and a post-processing section, and is composed of a device for conveying a printing plate, each processing liquid tank and a spraying device, which conveys an exposed printing plate horizontally while pumping it up with each pump. The processing liquid is sprayed from a spray nozzle for development processing. Further, recently, a method has also been known in which a printing plate is dipped and conveyed by a submerged guide roll or the like in a processing liquid tank filled with the processing liquid for processing. In such automatic processing, it is possible to perform processing while supplementing each processing solution with a replenishing solution according to the processing amount, operating time, and the like. Further, a so-called disposable processing method of processing with a substantially unused processing liquid can be applied.
【0090】本発明の平版印刷用原板においては、画像
露光し、現像し、水洗及び/又はリンス及び/又はガム
引きして得られた平版印刷版に不必要な画像部(例えば
原画フィルムのフィルムエッジ跡など)がある場合に
は、その不必要な画像部の消去が行なわれる。このよう
な消去は、例えば特公平2−13293号公報に記載さ
れているような消去液を不必要画像部に塗布し、そのま
ま所定の時間放置したのちに水洗することにより行なう
方法が好ましいが、特開平59−174842号公報に
記載されているようなオプティカルファイバーで導かれ
た活性光線を不必要画像部に照射したのち現像する方法
も利用できる。In the lithographic printing plate precursor of the present invention, an unnecessary image portion (for example, a film of an original film) is obtained on the lithographic printing plate obtained by imagewise exposing, developing, washing with water and / or rinsing and / or gumming. If there is an edge mark), the unnecessary image portion is erased. Such erasing is preferably performed, for example, by applying an erasing liquid as described in Japanese Patent Publication No. 2-13293 to the unnecessary image portion, leaving it as it is for a predetermined time, and then rinsing with water. It is also possible to use a method described in Japanese Patent Laid-Open No. 59-174842, in which an actinic ray guided by an optical fiber is applied to an unnecessary image portion and then developed.
【0091】以上のようにして得られた平版印刷版は所
望により不感脂化ガムを塗布したのち、印刷工程に供す
ることができるが、より一層の高耐刷力の平版印刷版と
したい場合にはバーニング処理が施される。平版印刷版
をバーニングする場合には、バーニング前に特公昭61
−2518号、同55−28062号、特開昭62−3
1859号、同61−159655号の各公報に記載さ
れているような整面液で処理することが好ましい。その
方法としては、該整面液を浸み込ませたスポンジや脱脂
綿にて、平版印刷版上に塗布するか、整面液を満たした
バット中に印刷版を浸漬して塗布する方法や、自動コー
ターによる塗布などが適用される。また、塗布した後で
スキージ、あるいは、スキージローラーで、その塗布量
を均一にすることは、より好ましい結果を与える。The lithographic printing plate obtained as described above can be subjected to a printing step after applying a desensitizing gum if desired, but when a lithographic printing plate having higher printing durability is desired, Is subjected to a burning process. When burning a lithographic printing plate, before printing
No. 2518, No. 55-28062, JP-A-62-3
It is preferable to treat with a surface-adjusting solution as described in JP-A-1859 and JP-A-61-159655. As the method, with a sponge or absorbent cotton soaked with the surface-adjusting solution, it is applied on the lithographic printing plate, or by immersing the printing plate in a vat filled with the surface-adjusting solution, Application by an automatic coater is applied. Further, making the coating amount uniform with a squeegee or a squeegee roller after coating gives more preferable results.
【0092】整面液の塗布量は一般に0.03〜0.8
g/m2(乾燥重量)が適当である。整面液が塗布され
た平版印刷版は必要であれば乾燥された後、バーニング
プロセッサー(たとえば富士写真フイルム(株)より販
売されているバーニングプロセッサー:「BP−130
0」)などで高温に加熱される。この場合の加熱温度及
び時間は、画像を形成している成分の種類にもよるが、
180〜300℃の範囲で1〜20分の範囲が好まし
い。The coating amount of the surface conditioning solution is generally 0.03 to 0.8.
g / m 2 (dry weight) is suitable. The planographic printing plate coated with the surface-adjusting solution is dried if necessary, and then a burning processor (for example, a burning processor sold by Fuji Photo Film Co., Ltd .: “BP-130”).
0 ") and so on. The heating temperature and time in this case depend on the types of components forming the image,
The range of 180 to 300 ° C. and the range of 1 to 20 minutes are preferable.
【0093】バーニング処理された平版印刷版は、必要
に応じて適宜、水洗、ガム引きなどの従来より行なわれ
ている処理を施こすことができるが水溶性高分子化合物
等を含有する整面液が使用された場合にはガム引きなど
のいわゆる不感脂化処理を省略することができる。この
様な処理によって得られた平版印刷版はオフセット印刷
機等にかけられ、多数枚の印刷に用いられる。The lithographic printing plate which has been subjected to the burning treatment can be subjected to conventional treatments such as washing with water and gumming, if necessary, but a surface-adjusting solution containing a water-soluble polymer compound or the like. When is used, so-called desensitizing treatment such as gumming can be omitted. The planographic printing plate obtained by such treatment is applied to an offset printing machine or the like and used for printing a large number of sheets.
【0094】[0094]
【実施例】以下実施例に基いて本発明の原板及びその印
刷方法を具体的に説明するが、本発明はこの実施例に限
定されるものではない。EXAMPLES The original plate and the method for printing the same according to the present invention will be specifically described based on the following examples, but the present invention is not limited to these examples.
【0095】実施例1〜7、比較例1〜5
[基板の作製]厚み0.3mmのアルミニウム板(材質1
050)をトリクロロエチレンで洗浄して脱脂した後、
ナイロンブラシと400メッシュのパミス−水懸濁液を
用いこの表面を砂目立てし、水でよく洗浄した。この板
を45℃の25%水酸化ナトリウム水溶液に9秒間浸漬
してエッチングを行い、水洗後、さらに20%硝酸に2
0秒間浸漬し、水洗した。この時の砂目立て表面のエッ
チング量は約3g/m 2であった。次にこの板を7%硫
酸を電解液として電流密度15A/dm2で3g/m2の
直流陽極酸化被膜を設けた後、水洗し、乾燥し、さら
に、珪酸ナトリウム2.5重量%水溶液で30℃で10
秒処理し、下記下塗り液を塗布し、塗膜を80℃で15
秒間乾燥し基板を得た。乾燥後の塗膜の被覆量は15m
g/m2であった。Examples 1 to 7 and Comparative Examples 1 to 5
[Production of substrate] Aluminum plate having a thickness of 0.3 mm (material 1
050) is degreased by washing with trichlorethylene,
Nylon brush and 400 mesh pumice-water suspension
Using this surface, the surface was grained and washed thoroughly with water. This board
Soak in 45% 25% aqueous sodium hydroxide for 9 seconds
Etching is performed, and after washing with water, it is further washed with 20% nitric acid.
It was immersed for 0 seconds and washed with water. The edge of the grained surface at this time
The amount of ching is about 3g / m 2Met. Next, this plate is
Current density of 15A / dm with acid as electrolyte2At 3 g / m2of
After providing a DC anodized film, wash with water, dry and
And 10% at 30 ° C with a 2.5% by weight aqueous solution of sodium silicate.
Second treatment, apply the undercoat solution below, and coat the coating at 80 ° C for 15
It was dried for 2 seconds to obtain a substrate. The coating amount of the coating film after drying is 15 m
g / m2Met.
【0096】 (下塗り液) ・下記化合物 0.3g ・メタノール 100 g ・水 1 g[0096] (Undercoat) ・ The following compound 0.3g ・ Methanol 100 g ・ Water 1 g
【0097】[0097]
【化10】 [Chemical 10]
【0098】[画像記録層Aの塗設]上記の基板に下記
の記録層用塗布液1を塗布量1.60g/m2になるよ
う塗布したのち、TABAI社製、PERFECT O
VEN PH200にてWind Controlを7
に設定して150度で50秒間乾燥し、平版印刷用原板
を得た。得られた作成直後の平版印刷用原板を包装形態
に梱包し一週間室温放置した後、評価を実施した。[Coating of Image Recording Layer A] Coating liquid 1 for recording layer described below was coated on the above substrate so that the coating amount was 1.60 g / m 2, and then PERFECT O manufactured by TABAI.
Wind Control 7 at VEN PH200
And was dried at 150 degrees for 50 seconds to obtain a lithographic printing plate. The obtained lithographic printing plate precursor immediately after preparation was packed in a packing form, left at room temperature for one week, and then evaluated.
【0099】 〔記録層用塗布液1〕 ・メチルエチルケトン 20.204g ・m,p−クレゾールノボラック(m/p比=6/4、重量平均分子量、700 0、住友ディレズ社製) 2.139g ・無水テトラヒドロフタル酸 0.100g ・シアニン染料A(下記構造) 0.042g ・フッ素系界面活性剤(メガファックF176、大日本インキ工業(株)製) 0.035g ・フッ素系界面活性剤(メガファックMCF312(30%)、大日本インキ工 業(株)製) 0.070g ・3−メトキシ−4−ジアゾジフェニルアミンヘキサフルオロホスフェート 0.030g ・エチルバイオレットの対イオンを6−ヒドロキシナフタレンスルホン酸に変え たもの 0.036g ・下記化合物1〜7及び比較化合物a〜d各々 0.100g[0099] [Coating liquid 1 for recording layer] ・ Methyl ethyl ketone 20.204 g M, p-cresol novolak (m / p ratio = 6/4, weight average molecular weight, 700 0, made by Sumitomo Direzu) 2.139g ・ Tetrahydrophthalic anhydride 0.100 g ・ Cyanine dye A (the following structure) 0.042 g ・ Fluorosurfactant (MegaFac F176, manufactured by Dainippon Ink and Chemicals, Inc.) 0.035g ・ Fluorosurfactant (MegaFac MCF312 (30%), Dainippon Ink and Chemicals) Industry Co., Ltd.) 0.070g ・ 3-Methoxy-4-diazodiphenylamine hexafluorophosphate 0.030g ・ Change the counter ion of ethyl violet to 6-hydroxynaphthalene sulfonic acid 0.036g -0.100 g of each of the following compounds 1 to 7 and comparative compounds a to d
【0100】[0100]
【化11】 [Chemical 11]
【0101】[0101]
【化12】 [Chemical 12]
【0102】[平版印刷用原板の性能評価]上記のよう
にして作成した実施例1〜7、 及び比較例a〜dと無添加
試料(比較例5)の各平版印刷用原板について、下記の基
準により性能評価を行った。評価結果を表1に示す。[Evaluation of Performance of Lithographic Printing Master Plate] The lithographic printing master plates of Examples 1 to 7 and Comparative Examples a to d and the additive-free sample (Comparative Example 5) prepared as described above are as follows. The performance was evaluated according to the standard. The evaluation results are shown in Table 1.
【0103】〔感度及び現像ラチチュード〕得られた平
版印刷用原板を、Creo製Trendsetter#3244MT (波長83
0nm),主走査速度 回転数150rpmにて出力3〜12Wの各1
W刻みでベタ露光を行ない、下記現像液(電導度83 mS/c
m)で現像し、富士写真フイルム(株)リンス液FP−2W
(1:7)を仕込んだ自動現像機(富士写真フイルム
(株)製:「PSプロセッサー900H」)を用いて現
像し、クリア(透明化)の得られる露光量を感度とした。[Sensitivity and Development Latitude] The obtained lithographic printing plate precursor was used as a Trendsetter # 3244MT (wavelength 83) manufactured by Creo.
0 nm), main scanning speed: output at 150 rpm, each output from 3 to 12 W
Solid exposure is performed in W increments, and the following developer (conductivity 83 mS / c
m) developed, Fuji Photo Film Co., Ltd. rinse solution FP-2W
Development was performed using an automatic processor ("PS Processor 900H" manufactured by Fuji Photo Film Co., Ltd.) charged with (1: 7), and the exposure amount at which clear (transparency) was obtained was defined as the sensitivity.
【0104】 (現像液) ・純水 870.0 g ・ソルビトール(59.5%) 122.4 g ・KOH(48%) 61.9 g ・パイオニンD1107(竹本油脂製ノニオン系界面活性剤) 0.5 g[0104] (Developer) ・ Pure water 870.0 g ・ Sorbitol (59.5%) 122.4 g ・ KOH (48%) 61.9 g ・ Pionine D1107 (Nonionic surfactant made by Takemoto Yushi) 0.5 g
【0105】また、上記セッターを用いて9W、主走査速
度 回転数150rpmにて露光した後、現像液(83ms/cm)に加
え二酸化炭素の吹き込みにより75mS/cm, 70mS/cm,65mS/
cmの4水準を使用し、それぞれの現像液にて得られた175
lpiの50%網点面積率をGRETAG社製D19C型反射濃度計に
て濃度測定した値からユール・ニールセン式によって求
め、その現像液間の変動率を観測した。その変動幅の差
が小さいほど現像ラチチュードが良好であり、Δ5%以内
の変動幅 以下であれば実用可能なレベルである。更
に、175lpiの網点1%の版上再現性を目視にて10段階評
価(0なし⇔10すべて有)で差を記録した。After exposure with 9 W at a main scanning speed of 150 rpm using the above setter, 75 mS / cm, 70 mS / cm, 65 mS / cm by blowing carbon dioxide in addition to the developing solution (83 ms / cm).
175 obtained with each developer using 4 levels of cm
The 50% halftone dot area ratio of lpi was determined by the Yule-Nielsen equation from the value measured with a D19C reflection densitometer manufactured by GRETAG, and the variation rate between the developing solutions was observed. The smaller the difference between the fluctuation widths, the better the development latitude, and if the fluctuation width is within Δ5% or less, it is at a practical level. Further, the reproducibility on the plate of 1% halftone dot of 175 lpi was visually evaluated on a 10-point scale (0 none ↔ all 10) to record the difference.
【0106】〔耐刷性〕上記現像液(75mS/cm)を用い
て現像した平版印刷版を用いて、ハイデルベルク社製の
ハイデルKOR−D機で上質紙に印刷した。5000枚
印刷毎にクリーナー液(富士写真フイルム(株)製、プ
レートクリーナーCL2)で版面を拭きながら印刷し
た。それぞれの最終印刷枚数を表1に示す。ここで、最
終印刷枚数とは、平版印刷版の感光層が膜減りを起こし
部分的にインキがつかなくなる、いわゆる版飛びを起こ
すまでの枚数である。[Printing durability] Using a lithographic printing plate developed with the above developing solution (75 mS / cm), high quality paper was printed on a Heidel KOR-D machine manufactured by Heidelberg. Printing was performed while wiping the plate surface with a cleaner solution (plate cleaner CL2, manufactured by Fuji Photo Film Co., Ltd.) every time 5000 sheets were printed. Table 1 shows the final number of printed sheets. Here, the final number of prints is the number of prints until the photosensitive layer of the lithographic printing plate is thinned and ink is not partially attached, that is, so-called plate fly.
【0107】[0107]
【表1】 [Table 1]
【0108】表1から、酸変性ポリビニルアセタール樹
脂を含有する本発明に係る平版印刷用原板は、比較例1
〜5との対比において、現像ラチチュード及び耐刷性に
優れていることがわかる。とくに無添加、及び無変性ポ
リビニルアセタール樹脂の添加比較例では、現像ラチチ
ュード並びに耐刷性ともに不十分であることが判る。From Table 1, the lithographic printing plate precursor according to the present invention containing the acid-modified polyvinyl acetal resin is shown in Comparative Example 1.
In comparison with ~ 5, it is found that the development latitude and printing durability are excellent. In particular, in the comparative examples in which no additive is added and an unmodified polyvinyl acetal resin is added, it is found that both the development latitude and the printing durability are insufficient.
【0109】[0109]
【発明の効果】エポキシ基と酸基とを有するポリビニル
アセタール樹脂を含有する本発明の赤外線レーザ用感光
性画像形成材料は、アルカリ水溶液可溶性高分子化合物
を用いた記録層の画像形成性の低さが改善され、取扱い
場所に制限がなく、かつ現像液の濃度に対する感度の安
定性、即ち現像ラチチュードが良好で、耐刷性に優れた
ダイレクト製版用画像形成材料に感度よく、好適に使用
し得るという効果を奏する。INDUSTRIAL APPLICABILITY The photosensitive image forming material for infrared laser of the present invention containing a polyvinyl acetal resin having an epoxy group and an acid group has a low image forming property of a recording layer using an alkali aqueous solution soluble polymer compound. Is improved, the handling place is not limited, and the stability of sensitivity with respect to the concentration of the developing solution, that is, the development latitude is good, the printing plate is excellent in sensitivity and is suitable for image forming materials for direct plate making, and can be suitably used. Has the effect.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H025 AA04 AA12 AB03 AC01 AC08 AD01 CB07 CB14 CB28 CB41 CB43 CB45 CC11 FA17 2H096 AA06 BA06 EA02 EA04 GA08 2H114 AA04 AA23 BA02 BA10 DA41 DA51 EA01 EA03 EA08 FA17 GA01 ─────────────────────────────────────────────────── ─── Continued front page F term (reference) 2H025 AA04 AA12 AB03 AC01 AC08 AD01 CB07 CB14 CB28 CB41 CB43 CB45 CC11 FA17 2H096 AA06 BA06 EA02 EA04 GA08 2H114 AA04 AA23 BA02 BA10 DA41 DA51 EA01 EA03 EA08 FA17 GA01
Claims (2)
質と、フェノール性水酸基を有するアルカリ水溶液可溶
性樹脂と、pKa5以下の酸基を有するポリビニルアセ
タール樹脂とを含有する画像記録層を設けたことを特徴
とする平版印刷用原板。1. An image recording layer containing, on a support, a substance which absorbs light to generate heat, an alkali aqueous solution-soluble resin having a phenolic hydroxyl group, and a polyvinyl acetal resin having an acid group of pKa5 or less. An original plate for lithographic printing characterized by being provided.
シクロへキサンジカルボン酸、テトラヒドロフタル酸、
フタル酸及びトリメトリット酸から選ばれた有機酸との
エステル結合基を有するポリビニルアセタール樹脂であ
ることを特徴とする請求項1に記載の平版印刷用原板。2. The polyvinyl acetal resin is 1,2-
Cyclohexanedicarboxylic acid, tetrahydrophthalic acid,
2. The lithographic printing plate precursor according to claim 1, which is a polyvinyl acetal resin having an ester bond group with an organic acid selected from phthalic acid and trimetritic acid.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359270A JP2003162045A (en) | 2001-11-26 | 2001-11-26 | Lithographic printing original plate |
| US10/302,879 US6818378B2 (en) | 2001-11-26 | 2002-11-25 | Lithographic printing plate precursor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359270A JP2003162045A (en) | 2001-11-26 | 2001-11-26 | Lithographic printing original plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003162045A true JP2003162045A (en) | 2003-06-06 |
Family
ID=19170310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001359270A Pending JP2003162045A (en) | 2001-11-26 | 2001-11-26 | Lithographic printing original plate |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6818378B2 (en) |
| JP (1) | JP2003162045A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100685582B1 (en) * | 2004-07-30 | 2007-02-22 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing the Same |
| ES2395993T3 (en) | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor of lithographic printing plate |
| JP5715975B2 (en) * | 2012-02-29 | 2015-05-13 | 富士フイルム株式会社 | Planographic printing plate precursor and method for producing lithographic printing plate |
| US20130255515A1 (en) * | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| ES2642967T3 (en) | 2013-01-01 | 2017-11-20 | Agfa Graphics Nv | Copolymers (ethylene, vinyl acetal) and lithographic printing plate precursors that include such copolymers |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| ES2617557T3 (en) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolymers (ethylene, vinyl acetal) and their use in lithographic printing plate precursors |
| EP2955198B8 (en) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| CA3017801A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Nv | Method for processing a lithographic printing plate |
| JP2020064082A (en) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | Positive type lithographic printing plate precursor and method for producing lithographic printing plate |
| JP6977467B2 (en) * | 2017-10-13 | 2021-12-08 | 富士フイルムビジネスイノベーション株式会社 | Manufacturing method of 3D model and 3D model |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6555617B1 (en) * | 1999-07-29 | 2003-04-29 | Mitsubishi Chemical Corporation | Composition of cyclic anhydride modified polyvinyl acetal and curable resin and laminated products |
| EP1072404B1 (en) | 1999-07-30 | 2003-05-21 | Lastra S.P.A. | Composition sensitive to IR radiation and to heat and lithographic plate coated with this composition |
| US6255033B1 (en) * | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| US6458511B1 (en) | 2000-06-07 | 2002-10-01 | Kodak Polychrome Graphics Llc | Thermally imageable positive-working lithographic printing plate precursor and method for imaging |
-
2001
- 2001-11-26 JP JP2001359270A patent/JP2003162045A/en active Pending
-
2002
- 2002-11-25 US US10/302,879 patent/US6818378B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20030186163A1 (en) | 2003-10-02 |
| US6818378B2 (en) | 2004-11-16 |
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