JP2003161739A - Substrate for microchip, and microchip - Google Patents
Substrate for microchip, and microchipInfo
- Publication number
- JP2003161739A JP2003161739A JP2001363578A JP2001363578A JP2003161739A JP 2003161739 A JP2003161739 A JP 2003161739A JP 2001363578 A JP2001363578 A JP 2001363578A JP 2001363578 A JP2001363578 A JP 2001363578A JP 2003161739 A JP2003161739 A JP 2003161739A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- epoxy resin
- dna
- glass
- microchip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、DNAチップ用基
板及び、該基板を使用して構成されるDNAチップに関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a DNA chip substrate and a DNA chip constructed using the substrate.
【0002】[0002]
【従来の技術】遺伝子解析等に用いられるDNAチップ
の基板としては、従来はスライドガラスに代表されるガ
ラスが使われている。その理由は、ガラスは極めて高い
表面精度、特に平坦性を実現できることが上げられる。
即ち、DNAチップ上に並べたDNA断片と、調べたい
試料(DNA)に蛍光物質で標識を付けたものを含む溶
液をチップ上に流し、試料がチップ上のどのDNAとハ
イブリダイゼーションしたかを共焦点レーザースキャナ
ーで読みとり検出するが、この際に極めて微小な位置に
対して焦点を合わせる必要があり、表面上にわずかな凹
凸があっても当初設定した焦点とのずれを生じるため
に、これら表面に対する要求は極めて厳しく数ミクロン
以下にすることが求められる。2. Description of the Related Art As a substrate of a DNA chip used for gene analysis and the like, glass represented by a slide glass has been conventionally used. The reason is that glass can realize extremely high surface precision, especially flatness.
That is, a solution containing a DNA fragment arrayed on a DNA chip and a sample (DNA) to be examined labeled with a fluorescent substance is poured on the chip to determine which DNA on the chip has hybridized. It is read and detected by a focus laser scanner, but at this time it is necessary to focus on an extremely minute position, and even if there are slight irregularities on the surface, there will be a deviation from the focus that was initially set. Is extremely strict, and is required to be several microns or less.
【0003】しかしながら、通常の板ガラス製法ではこ
のような表面精度は得られないため、現在、相当数の工
数をかけて、光学用ガラスと同様のレベルに研磨加工す
ることによりこれらの精度、平坦さを実現している。さ
らに、ガラス表面へDNA断片を固定化する必要がある
が、そのままでは固定化できないため、表面処理をする
必要がある。しかしガラスは表面処理が困難であり、カ
ップリング処理等後工程が不可避となり、該製造工程を
煩雑にしている。さらにはガラス固有の落下等で割れや
すいといった信頼性の問題がある。DNAチップは上記
のような取り扱い上技術的困難がある上に、研磨ガラス
の価格に起因するコスト問題があり、安価でかつ簡便な
DNAチップ基板及びDNAチップが望まれていた。However, since such a surface precision cannot be obtained by the ordinary plate glass manufacturing method, at present, by applying a considerable number of man-hours and polishing to a level similar to that of optical glass, these precision and flatness are obtained. Has been realized. Furthermore, although it is necessary to immobilize the DNA fragment on the glass surface, it cannot be immobilized as it is, and therefore surface treatment is required. However, the surface treatment of glass is difficult, and post-processes such as coupling treatment are unavoidable, complicating the manufacturing process. Furthermore, there is a problem of reliability that the glass is liable to be broken due to falling or the like. In addition to the above technical difficulties in handling, the DNA chip has a cost problem due to the price of the polishing glass, and an inexpensive and simple DNA chip substrate and a DNA chip have been desired.
【0004】[0004]
【発明が解決しようとする課題】本発明は、DNAチッ
プ用基板として使われているガラスの欠点を補い、より
簡便にDNAチップを提供することが目的である。SUMMARY OF THE INVENTION It is an object of the present invention to provide a DNA chip more simply by compensating for the drawbacks of glass used as a DNA chip substrate.
【0005】[0005]
【課題を解決するための手段】本発明者は特定のエポキ
シ樹脂原料を用いて基板を作成した場合には、他のエポ
キシ樹脂原料を用いた場合に比べて基板にDNAが固定
化されるという現象に着目し、特定原料中の不純物とし
て含まれるα−グリコール基含有エポキシ樹脂が重要な
役割を果たしていることを突き止めた。本発明者はこの
知見をもとに鋭意検討した結果、本発明の完成に至っ
た。Means for Solving the Problems The present inventor says that when a substrate is prepared using a specific epoxy resin raw material, DNA is immobilized on the substrate as compared with the case where another epoxy resin raw material is used. Focusing on the phenomenon, it was found that the α-glycol group-containing epoxy resin contained as an impurity in the specific raw material plays an important role. The present inventor has completed the present invention as a result of extensive studies based on this finding.
【0006】即ち、本発明は、(1) 式1で示されるエ
ポキシ樹脂(a)、式2で示されるエポキシ樹脂(b)
及び硬化剤から少なくとも構成されるマイクロチップ用
基板、That is, the present invention provides (1) an epoxy resin (a) represented by the formula 1 and an epoxy resin (b) represented by the formula 2.
And a substrate for a microchip that is composed of at least a curing agent,
【0007】[0007]
【化3】 (m=0以上の整数)[Chemical 3] (M = 0 or more integer)
【0008】[0008]
【化4】
(n=0以上の整数、Rは炭素数1〜10の炭化水素残
基(アルコール性OH等の官能基を含んでいてもよ
い。))[Chemical 4] (N is an integer of 0 or more, R is a hydrocarbon residue having 1 to 10 carbon atoms (may include a functional group such as alcoholic OH)).
【0009】(2)エポキシ樹脂(b)の含有率がエポ
キシ樹脂(a)100グラム当量に対して、2〜20グ
ラム当量である(1)記載のマイクロチップ用基板、
(3)(1)又は(2)記載のマイクロチップ用基板を
用いたことを特徴とするマイクロチップである。(2) The microchip substrate according to (1), wherein the content of the epoxy resin (b) is 2 to 20 gram equivalents relative to 100 gram equivalents of the epoxy resin (a),
(3) A microchip using the microchip substrate according to (1) or (2).
【0010】[0010]
【発明の実施の形態】本発明でいうDNAチップとはマ
イクロアレイを含む広義の意味である。
(エポキシ樹脂(a))本発明で用いられるエポキシ樹
脂(a)は、ビスフェノールAにエピクロルヒドリンを
反応させて容易に得ることができる。重合度が上がるに
つれて(式中のmが大きくなるにつれて)、液状、半固
形、固形と形態が変化するが、使用上特に制限はない。
ただし、容易に入手できるという観点からmは0〜40
までの樹脂、特に好適には0〜20までの樹脂が一般的
に用いられる。また、2種以上の重合度が異なるエポキ
シ樹脂混合物を樹脂(a)として用いることもなんら差
し支えはない。市販のエポキシ樹脂(a)を用いる場合
には重合度が異なるエポキシ樹脂混合物となっており、
数平均分子量、重量平均分子量、平均重合度あるいはエ
ポキシ当量でその性状を示すことが通例である。BEST MODE FOR CARRYING OUT THE INVENTION The DNA chip as used in the present invention has a broad meaning including a microarray. (Epoxy Resin (a)) The epoxy resin (a) used in the present invention can be easily obtained by reacting bisphenol A with epichlorohydrin. As the degree of polymerization increases (as m in the formula increases), the form changes to liquid, semi-solid, and solid, but there is no particular limitation in use.
However, m is 0 to 40 from the viewpoint of easy availability.
Resins up to and particularly preferably resins from 0 to 20 are generally used. It is also possible to use two or more kinds of epoxy resin mixtures having different degrees of polymerization as the resin (a). When a commercially available epoxy resin (a) is used, the epoxy resin mixture has different degrees of polymerization,
It is customary to indicate the properties by the number average molecular weight, the weight average molecular weight, the average degree of polymerization or the epoxy equivalent.
【0011】(エポキシ樹脂(b))次に、本発明で用
いられる末端にそれぞれ水酸基及びエポキシ基を含有し
たエポキシ樹脂(b)の詳細な説明をする。本発明にお
いては、エポキシ樹脂(b)がDNA等の固定化に最も
重要な役割を担っている。形態学的な確認は未だとれて
いないが、分子構造からみて、エポキシ樹脂(b)はエ
ポキシ基を介して基板表面からグラフトし、その反対側
の自由空間にある末端OHを介して、ターゲットとする
DNA等と結合できるために優れたDNA固定化能力を
有すると推定をしている。(Epoxy Resin (b)) Next, the epoxy resin (b) containing a hydroxyl group and an epoxy group at each of the terminals used in the present invention will be described in detail. In the present invention, the epoxy resin (b) plays the most important role in immobilizing DNA and the like. Morphological confirmation has not yet been taken, but in view of the molecular structure, the epoxy resin (b) is grafted from the surface of the substrate via the epoxy group, and the epoxy resin (b) is linked to the target via the terminal OH in the free space on the opposite side. It is presumed that it has an excellent DNA-immobilizing ability because it can bind to the DNA etc.
【0012】エポキシ樹脂(b)の製法は、例えばビス
フェノールA型エポキシ樹脂の片側末端について、メタ
ノール等の第1級アルコールを付加させることにより得
られる。重合度にはとくには制限が無く使用できるが、
容易に入手できるという観点からnは0〜40までの該
樹脂、特に好適には0〜20までの該樹脂が一般的に用
いられる。また、炭化水素残基の炭素数を10以下に限
定したのは合成の容易さだけでなく、炭素数が10より
大きいとエポキシ樹脂(a)との相溶性が悪くなったり
立体障害が大きくなったりし、ターゲットとするDNA
等の固定化工程に支障が生じるためである。また、α−
グリコール基のように末端以外にもOH基が存在しても
構わない。また、2種以上の重合度が異なり、あるいは
炭化水素残基が異なる、末端にそれぞれ水酸基及びエポ
キシ基を含有したエポキシ樹脂混合物をエポキシ樹脂
(b)として用いることもなんら差し支えない。The epoxy resin (b) can be produced, for example, by adding a primary alcohol such as methanol to one end of the bisphenol A type epoxy resin. Although there is no particular limitation on the degree of polymerization, it can be used,
From the viewpoint of easy availability, n is generally 0 to 40, particularly preferably 0 to 20. The number of carbon atoms in the hydrocarbon residue is limited to 10 or less not only for ease of synthesis, but when the number of carbon atoms is greater than 10, the compatibility with the epoxy resin (a) becomes poor and steric hindrance becomes large. Or target DNA
This is because the immobilization process such as the above will be hindered. Also, α-
An OH group may be present in addition to the terminal, such as a glycol group. It is also possible to use, as the epoxy resin (b), an epoxy resin mixture having two or more kinds of different polymerization degrees or different hydrocarbon residues, each containing a hydroxyl group and an epoxy group at the terminal.
【0013】本発明においては、DNAやRNA固定化
の観点からは基板表面からグラフトしたOH基を多くす
るためにエポキシ樹脂(b)の濃度は多い方が望ましい
が、DNAチップ基板としての寸法安定性、平坦性、剛
性の観点からは濃度は少ない方が好ましい。即ち、エポ
キシ樹脂(b)の含有率がエポキシ樹脂(a)100グ
ラム当量に対して、2〜20グラム当量である場合が好
適であり、更に好適には5〜15グラム当量である。2
グラム当量未満では固定化が不充分になる傾向があり、
逆に20グラム当量超過では基板の寸法安定性、剛性が
不充分となる傾向がある。In the present invention, from the viewpoint of immobilizing DNA or RNA, it is desirable that the concentration of the epoxy resin (b) is high in order to increase the number of OH groups grafted from the surface of the substrate, but dimensional stability as a DNA chip substrate. From the viewpoints of properties, flatness, and rigidity, it is preferable that the concentration is low. That is, the content of the epoxy resin (b) is preferably 2 to 20 gram equivalents, and more preferably 5 to 15 gram equivalents, relative to 100 gram equivalents of the epoxy resin (a). Two
If it is less than gram equivalent, immobilization tends to be insufficient,
On the other hand, if it exceeds 20 gram equivalents, the dimensional stability and rigidity of the substrate tend to be insufficient.
【0014】(硬化剤)硬化剤は通常のエポキシ樹脂に
用いられるアミン系、酸無水物系、ポリアミド系等をも
ちいることができる。特にポットライフが長く毒性の小
さい酸無水物系の硬化剤が好適に用いられる。酸無水物
硬化剤の例をあげるとすれば、無水フタル酸、ヘキサヒ
ドロ無水フタル酸、ヘキサメチルナジック酸、無水ピロ
メット酸及びドデセニル無水コハク酸がある。このと
き、第三アミン、イミダゾール類のような硬化促進剤を
併用することもできる。(Curing Agent) As the curing agent, amine-based, acid-anhydride-based, polyamide-based, etc., which are commonly used for epoxy resins, can be used. In particular, an acid anhydride type curing agent having a long pot life and low toxicity is preferably used. Examples of acid anhydride hardeners include phthalic anhydride, hexahydrophthalic anhydride, hexamethylnadic acid, pyromet acid anhydride and dodecenyl succinic anhydride. At this time, a curing accelerator such as a tertiary amine or imidazole may be used together.
【0015】(充填材、溶剤他)必要に応じて水酸化ア
ルミニウム、シリカ、タルク、ウォラストナイト、水酸
化マグネシウム、クレーなどの無機充填材や基材との定
着性を向上させる目的でカップリング剤あるいはカーボ
ンブラックのような顔料を組成物中に添加することも可
能である。(Filler, solvent, etc.) Coupling, if necessary, for the purpose of improving the fixability with an inorganic filler such as aluminum hydroxide, silica, talc, wollastonite, magnesium hydroxide, clay, etc. or a substrate. It is also possible to add agents or pigments such as carbon black to the composition.
【0016】本発明ではワニスを調製する際にエポキシ
樹脂(a)、エポキシ樹脂(b)及び硬化剤々の形態で
利用されるが、しばしば溶剤が用いられる。溶剤は組成
物の一部あるいは全てに対して良好な溶解性を示すこと
が必要であるが、悪影響を及ばさない範囲で貧溶媒を用
いることもできる。かかる溶剤の例を挙げると、アセト
ン、メチルエチルケトン、メチルイソブチルケトン、シ
クロヘキサノン等のケトン系溶剤、トルエン、キシレ
ン、メシチレン等の芳香族炭化水素系溶剤、メチルセル
ソルブ、エチルセルソルブ、ブチルセルソルブ、イソブ
チルセルソルブ、ジエチレングリコールモノメチルエー
テル、トリエチレングリコールモノメチルエーテル、プ
ロピレングリコールモノメチルエーテル、ジプロピレン
グリコールモノメチルエーテル、プロピレングリコール
モノプロピルエーテル、ジプロピレングリコールモノプ
ロピルエーテル、エチレングリコールモノイソプロピル
エーテル、ジエチレングリコールモノイソプロピルエー
テル、ジエチレングリコールモノプチルエーテル等の各
種グリコールエーテル系溶剤、メチルセルソルブアセテ
ート、エチルセルソルブアセテート、ブチルセルソルブ
アセテート、酢酸エチル等のエステル系溶剤、エチレン
グリコールジメチルエーテル、ジエチレングリコールジ
メチルエーテル、ジエチレングリコールジエチルエーテ
ル、ジエチルグリコールジブチルエーテル等のジアルキ
ルグリコールエーテル系溶剤、N、N−ジメチルアセト
アミド、N、N−ジメチルホルムアミド、N−メチル−
2−ピロリドン等のアミド系溶剤、メタノール、エタノ
ールなどのアルコール系溶剤があり、これらは何種類か
を併用して用いることもできる。In the present invention, a varnish is used in the form of an epoxy resin (a), an epoxy resin (b) and a curing agent, but a solvent is often used. The solvent must have good solubility in a part or the whole of the composition, but a poor solvent can be used as long as it does not adversely affect the composition. Examples of such solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, ketone solvents such as cyclohexanone, toluene, xylene, aromatic hydrocarbon solvents such as mesitylene, methyl cellosolve, ethyl cellosolve, butyl cellosolve, isobutyl. Cellsolve, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, diethylene glycol monoisopropyl ether, diethylene glycol mono Various glycol ether solvents such as butyl ether, methyl ether Ester solvent such as sorbacetate, ethyl cell solvate acetate, butyl cell solvate acetate, ethyl acetate, dialkyl glycol ether type solvent such as ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethyl glycol dibutyl ether, N, N-dimethylacetamide , N, N-dimethylformamide, N-methyl-
There are amide-based solvents such as 2-pyrrolidone and alcohol-based solvents such as methanol and ethanol, and these may be used in combination of several kinds.
【0017】(基材及び製造工程)本発明の基材は特に
制限があるわけではなく、ガラス織布、ガラス不織布、
又は紙、ガラス以外を成分とする布等が用いられる。D
NAチップ基板の寸法安定性及び剛性の観点から、ガラ
ス織布、ガラス不織布が好適に用いられる。上記基材に
ワニスを塗布含浸させ、乾燥炉中で20〜200℃の範
囲内で乾燥させることにより、DNAチップ基板用プリ
プレグを得ることができる。ここで、エポキシ樹脂
(a)、エポキシ樹脂(b)、硬化剤あるいは基材の組
成がそれぞれ異なるプリプレグを複数枚重ね合わせて、
該条件で加熱加圧して得られる積層板もDNAチップ基
板として用いられることが可能である。(Substrate and Manufacturing Process) The substrate of the present invention is not particularly limited, and may be glass woven fabric, glass non-woven fabric,
Alternatively, a cloth or the like having a component other than paper and glass is used. D
From the viewpoint of dimensional stability and rigidity of the NA chip substrate, glass woven cloth and glass nonwoven cloth are preferably used. A prepreg for a DNA chip substrate can be obtained by coating and impregnating the above-mentioned base material with a varnish and drying in a drying oven within a range of 20 to 200 ° C. Here, a plurality of prepregs each having a different composition of the epoxy resin (a), the epoxy resin (b), the curing agent or the base material are overlapped,
A laminated board obtained by heating and pressurizing under the above conditions can also be used as a DNA chip substrate.
【0018】上記のような工程で得られたプリプレグは
100℃〜200℃の温度範囲内で、0〜30MPaの
圧力範囲内、好適には10MPa以下、更に好適には5
MPa以下で加圧することによりDNAチップ基板用を
製造することができる。特に寸法安定性が要求される用
途では、低圧で成形する方法以外に、冷却速度を小さく
したり、成形後無圧での再加熱をしたりして歪をとる方
法が一般的に採用できる。The prepreg obtained in the above steps has a temperature range of 100 ° C. to 200 ° C., a pressure range of 0 to 30 MPa, preferably 10 MPa or less, and more preferably 5 MPa.
A product for a DNA chip substrate can be manufactured by applying a pressure of MPa or less. Particularly in applications where dimensional stability is required, in addition to the method of molding at low pressure, a method of taking strain by reducing the cooling rate or reheating without molding after molding can be generally adopted.
【0019】[0019]
【実施例】以下、本発明を実施例によって更に詳細に説
明するが、本発明は、これら実施例に限定されるもので
はない。まず、本発明における評価方法について以下に
示す。
[実施例1]まず、ワニスを作るに当たって、その組成
は重量で下記の通りである。
◎ワニスの組成
(1)エポキシ樹脂(a) 100重量部
(数平均分子量Mn900 → 平均重合度n=2.
0)
(2)式3のように末端にそれぞれ水酸基及びエポキシ
基を含有した
エポキシ樹脂 7重量部The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples. First, the evaluation method in the present invention is shown below. [Example 1] First, in making a varnish, its composition by weight is as follows. Composition of varnish (1) Epoxy resin (a) 100 parts by weight (number average molecular weight Mn900 → average degree of polymerization n = 2.
0) (2) 7 parts by weight of an epoxy resin containing a hydroxyl group and an epoxy group at each end as shown in Formula 3
【0020】[0020]
【化5】 [Chemical 5]
【0021】
(3)硬化剤:ヘキサヒドロ無水フタル酸 50重量部
(4)溶 剤:アセトン 50重量部
上記(1)から(4)の成分を混合して、均一なワニス
を作製した。次に該ワニスを厚さ0.18mmのガラス
織布(質量 205g/m2)に樹脂含有量が42〜45
重量%になるように含浸乾燥してガラス織布プリプレグ
を得た。ガラス織布プリプレグを6枚重ねあわせて、成
形温度150℃、圧力:3MPaにて90分圧縮成形を
し、L770×W270×t1mmの長方形状基板を得
た。この基板よりスライドガラス状成形品(寸法L76
mm×W26mm×t1mm)を100枚採取できる。(3) Hardener: Hexahydrophthalic anhydride 50 parts by weight (4) Solvent: Acetone 50 parts by weight The components (1) to (4) were mixed to prepare a uniform varnish. Next, the varnish was applied to a glass woven fabric having a thickness of 0.18 mm (mass: 205 g / m2) with a resin content of 42 to 45.
The glass woven fabric prepreg was obtained by impregnating and drying the prepreg so that the amount of the prepreg was glass. Six glass woven prepregs were superposed and compression-molded at a molding temperature of 150 ° C. and a pressure of 3 MPa for 90 minutes to obtain a rectangular substrate of L770 × W270 × t1 mm. From this substrate, slide glass molding (dimension L76
100 mm × W26 mm × t1 mm) can be collected.
【0022】[実施例2]実施例1のワニスに、ワニス
中の樹脂成分100重量部に対してシリカ(瀧森製、ク
リスタルライトVX−3)30重量部、水酸化アルミニ
ウム(昭和軽金属製ハイジライトH−42)70重量部
を添加し、無機充填材含有ワニスを作製した。無機充填
材含有ワニスをガラス不織布(日本バイリーン製、EP
−4075)に樹脂、硬化剤及び無機充填材の含有量が
90重量部になるように含浸乾燥してガラス不織布プリ
プレグを得た。次にガラス不織布プリプレグを中間層に
して、実施例1で用いたプリプレグを表面層(上下と
も)に配置し成形温度150℃、圧力:3MPaにて9
0分圧縮成形をし、L770×W270×t1mmの長
方形状基板を得た。Example 2 In the varnish of Example 1, 30 parts by weight of silica (manufactured by Takimori, Crystallite VX-3), 100 parts by weight of the resin component in the varnish, aluminum hydroxide (Showa Light Metal Heidi Co., Ltd.) were used. 70 parts by weight of Light H-42) was added to prepare a varnish containing an inorganic filler. Inorganic filler-containing varnish made of non-woven glass (made by Nippon Vilene, EP
-4075) was impregnated and dried so that the contents of the resin, the curing agent and the inorganic filler were 90 parts by weight to obtain a glass nonwoven fabric prepreg. Next, the glass non-woven fabric prepreg was used as an intermediate layer, the prepreg used in Example 1 was placed on the surface layer (both upper and lower sides), and the molding temperature was 150 ° C. and the pressure was 3 MPa.
After compression molding for 0 minutes, a rectangular substrate of L770 × W270 × t1 mm was obtained.
【0023】[実施例3]実施例1と同様の製法でL7
70×W270×t1mmの長方形状基板を得た。ただ
し、実施例1のワニスの代わりに下記の成分を用いてワ
ニスを調製した。
◎ワニスの組成
(1)エポキシ樹脂(a) 100重量部
(平均分子量Mn1600 → 平均重合度n=4.
4)
(2)式4のように末端にそれぞれ水酸基及びエポキシ
基を含有した
エポキシ樹脂 12重量部[Embodiment 3] L7 is manufactured in the same manner as in Embodiment 1.
A rectangular substrate of 70 × W270 × t1 mm was obtained. However, a varnish was prepared by using the following components instead of the varnish of Example 1. Composition of varnish (1) Epoxy resin (a) 100 parts by weight (average molecular weight Mn1600 → average degree of polymerization n = 4.
4) (2) 12 parts by weight of an epoxy resin containing a hydroxyl group and an epoxy group at each end as shown in Formula 4
【0024】[0024]
【化6】 [Chemical 6]
【0025】
(3)硬化剤:ヘキサメチルナジック酸 70重量部
(4)顔 料:カーボンブラック 3重量部
(5)溶 剤:メチルエチルケトン 50重量部
[比較例1]式(3)のように末端にそれぞれ水酸基及
びエポキシ基を含有したエポキシ樹脂を無添加にして、
実施例1と同様の製法で、ワニスを調製し、該ワニスを
用いてガラス織布プリプレグを得た。 該ガラス織布プ
リプレグを6枚重ねあわせて、成形温度150℃、圧
力:3MPaにて90分圧縮成形をし、L770×W2
70×t1mmの長方形状基板を得た。(3) Curing agent: Hexamethyl nadic acid 70 parts by weight (4) Facial agent: Carbon black 3 parts by weight (5) Solvent: Methyl ethyl ketone 50 parts by weight [Comparative Example 1] Terminal as shown by formula (3) To each without addition of an epoxy resin containing a hydroxyl group and an epoxy group,
A varnish was prepared by the same production method as in Example 1, and a glass woven fabric prepreg was obtained using the varnish. Six pieces of the glass woven prepregs were superposed, and compression molded at a molding temperature of 150 ° C. and a pressure of 3 MPa for 90 minutes to obtain L770 × W2.
A 70 × t1 mm rectangular substrate was obtained.
【0026】[比較例2]白色ガラス(寸法:L76m
m×W26mm×t1mm)を用いて以下の評価方法で
記述するスポットDNA基板固定化及び信頼性の評価を
実施した。次に、本発明における評価方法について以下
に示す。[Comparative Example 2] White glass (Dimension: L76m)
m × W26 mm × t1 mm) was used to carry out spot DNA substrate immobilization and reliability evaluation described by the following evaluation method. Next, the evaluation method in the present invention is shown below.
【0027】(2)平坦性:スライドグラス状成形品の
10倍強のサイズであるL770×W270×t1mm
の長方形状基板の反りを測定し、表中にその値を記載
し、また50ミクロン以内であれば○、50ミクロンを
超えた場合には×とした。ただし、比較例2のスライド
ガラスの場合には、L76mm×W26mm×t1mm
の反りを測定し、5ミクロンであることを確認した。(2) Flatness: L770 × W270 × t1 mm which is a size slightly more than 10 times as large as a slide glass molded product.
The warpage of the rectangular substrate was measured, and the value was described in the table. If it was within 50 microns, it was marked with ◯, and if it exceeded 50 microns, it was marked with x. However, in the case of the slide glass of Comparative Example 2, L76 mm x W26 mm x t1 mm
The warp was measured and confirmed to be 5 microns.
【0028】(2)DNA固定化効率:スライドガラス
状成形品を基板として、以下のようなプロトコールに従
って、評価を実施した。
(アミノ化オリゴDNAの調製)5´−TAGAAGC
ATTTGCGGTGGACGATG−3´の配列より
なるオリゴDNAの5´末端にアミノ基を導入したオリ
ゴDNA(以後アミノ化オリゴDNAと称す)を合成し
た。(2) DNA immobilization efficiency: The slide glass-like molded article was used as a substrate and evaluated according to the following protocol. (Preparation of aminated oligo DNA) 5'-TAGAAGC
Oligo DNA (hereinafter referred to as aminated oligo DNA) was synthesized in which an amino group was introduced at the 5'end of oligo DNA having the sequence ATTTGCGGTGGACGATG-3 '.
【0029】(ローダミン標識オリゴDNAの調製)上
記、アミノ化DNAの塩基配列と対になる、5´−CA
TCGTCCACCGCAAATGCTTCTA−3´
の配列よりなるオリゴDNAの5´末端にローダミンを
標識したオリゴDNA(以後ローダミン標識オリゴDN
Aと称す)を合成した。(Preparation of Rhodamine-Labeled Oligo DNA) 5'-CA paired with the base sequence of the aminated DNA described above.
TCGTCCACCCGCAAATGCTTCTA-3 '
The oligo DNA having the 5'end of the oligo DNA having the sequence
(Referred to as A) was synthesized.
【0030】(固定化)アミノ化オリゴDNAをAld
ehyde Spotting Solution(G
ENPAK社製)に0.5mg/mlの濃度で溶解し、
DNAスポット溶液を調製した。DNAチップ用スポッ
ター(ニチリョー社製)により、各々の基板上にDNA
スポット溶液をスポットし、37℃30分、80℃60
分加熱を行い、ブロッキング溶液として、エタノール1
3.3mlとPBS(−)45mlに0.5gのNaB
H4を溶解させ調製し、基板をこのブロッキング溶液中
に5分間浸漬したのち、純水で洗浄し、さらに沸騰水中
で3分間処理した後、氷冷したエタノール中に1分間浸
漬し、風乾した。(Fixed) aminated oligo DNA was added to Ald
Eyde Spotting Solution (G
Dissolved in ENPAK) at a concentration of 0.5 mg / ml,
A DNA spot solution was prepared. Use a DNA chip spotter (manufactured by Nichiryo Corporation) to display DNA on each substrate.
Spot solution, spot at 37 ℃ for 30 minutes, 80 ℃ for 60 minutes
Heat for minutes and use ethanol 1 as a blocking solution.
0.5 g NaB in 3.3 ml and PBS (-) 45 ml
H4 was dissolved and prepared, and the substrate was immersed in this blocking solution for 5 minutes, washed with pure water, further treated in boiling water for 3 minutes, immersed in ice-cooled ethanol for 1 minute, and air-dried.
【0031】ローダミン標識オリゴDNAを、0.2%
SDSを含む5×SSC溶液中に溶解したローダミン標
識オリゴDNA溶液を調製し、3分間煮沸処理後、氷冷
した後、この溶液をアミノ化オリゴDNAを固定した基
板上に80μl滴下しカバーガラスで覆い、保湿下60
℃で18時間インキュベートし、カバーガラスをとり
0.5%SDSを含む2×SSC、0.5×SSC、純
水の順で洗浄し、風乾し、DNA固定化量の比較に供し
た。0.2% of rhodamine-labeled oligo DNA
A rhodamine-labeled oligo DNA solution dissolved in 5 × SSC solution containing SDS was prepared, boiled for 3 minutes, cooled with ice, and 80 μl of this solution was dropped onto a substrate on which aminated oligo DNA was immobilized, and the solution was covered with a cover glass. Cover, moisturize 60
After incubating at 18 ° C. for 18 hours, the cover glass was removed, washed with 2 × SSC containing 0.5% SDS, 0.5 × SSC, and pure water in this order, air-dried, and provided for comparison of the amount of immobilized DNA.
【0032】DNA固定化量の比較は、蛍光顕微鏡(オ
リンパス社製)によりローダミンの蛍光像を、各々のス
ポットに焦点合わせながら、露光時間等を全て共通とし
蛍光像の写真を撮影し、さらに共通な条件で現像を行
い、写真をイメージスキャナーにより画像データとして
読み込み、コンピュータ上画像処理により蛍光強度を数
値化し、アミノ化オリゴDNAの固定化量として、比較
した。実施例1での各スポットの平均の数値を100と
し、各基板の固定化量の比較を行なった。The amount of DNA immobilized was compared by taking a fluorescence image of rhodamine with a fluorescence microscope (manufactured by Olympus Co., Ltd.), focusing on each spot, setting a common exposure time, and taking a photograph of the fluorescence image. The image was developed under various conditions, the photograph was read as image data by an image scanner, the fluorescence intensity was quantified by image processing on a computer, and the amount of immobilized aminated oligo DNA was compared. The average value of each spot in Example 1 was set to 100, and the immobilization amount of each substrate was compared.
【0033】(3)信頼性:スライドガラス状成形品
(L76mm×W26mm×t1mm)を高さ50c
m,100cm,150cm,200cmからそれぞれ
自由落下させて基板が破壊しなかった最も高い高さを表
中に記載した。(3) Reliability: A slide glass molded product (L76 mm × W26 mm × t1 mm) has a height of 50 c.
The highest heights at which the substrate did not break by free fall from m, 100 cm, 150 cm, and 200 cm are shown in the table.
【0034】[0034]
【表1】 [Table 1]
【0035】[0035]
【発明の効果】以上のように本発明の基板は、平坦性に
優れ、しかも何ら特別な処理をすることなく、ターゲッ
トとするDNAを基板に固定化、検出することが可能で
あり、ガラスに比べて信頼性に優れているので、DNA
チップ基板に有用である。INDUSTRIAL APPLICABILITY As described above, the substrate of the present invention has excellent flatness, and it is possible to immobilize and detect target DNA on the substrate without any special treatment, and DNA is more reliable than
It is useful for chip substrates.
Claims (3)
2で示されるエポキシ樹脂(b)及び硬化剤から少なく
とも構成されるマイクロチップ用基板。 【化1】 (m=0以上の整数) 【化2】 (n=0以上の整数、Rは炭素数1〜10の炭化水素残
基(アルコール性OH等の官能基を含んでいてもよ
い。))1. A microchip substrate comprising at least an epoxy resin (a) represented by formula 1, an epoxy resin (b) represented by formula 2, and a curing agent. [Chemical 1] (M = 0 or more integer) (N is an integer of 0 or more, R is a hydrocarbon residue having 1 to 10 carbon atoms (may include a functional group such as alcoholic OH)).
樹脂(a)100グラム当量に対して、2〜20グラム
当量である請求項1記載のマイクロチップ用基板。2. The microchip substrate according to claim 1, wherein the content of the epoxy resin (b) is 2 to 20 gram equivalents relative to 100 gram equivalents of the epoxy resin (a).
ップ用基板を用いたことを特徴とするマイクロチップ。3. A microchip using the substrate for microchip according to claim 1 or 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001363578A JP3824523B2 (en) | 2001-11-29 | 2001-11-29 | Microchip substrate and microchip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001363578A JP3824523B2 (en) | 2001-11-29 | 2001-11-29 | Microchip substrate and microchip |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003161739A true JP2003161739A (en) | 2003-06-06 |
| JP3824523B2 JP3824523B2 (en) | 2006-09-20 |
Family
ID=19173899
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001363578A Expired - Fee Related JP3824523B2 (en) | 2001-11-29 | 2001-11-29 | Microchip substrate and microchip |
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| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006001627A1 (en) * | 2004-06-24 | 2006-01-05 | Lg Chem. Ltd. | Pna chip using plastic substrate coated with epoxy group-containing polymer, method of manufacturing the pna chip, and method of detecting single nucleotide polymorphism using the pna chip |
| WO2006088290A1 (en) * | 2005-02-16 | 2006-08-24 | LG Life Sciences, Ltd | Pna chip for determining genotypes of mycobacterial species using plastic substrate coated with epoxy group-containing polymer and method of determining genotypes of mycobacterial species using the pna chip |
-
2001
- 2001-11-29 JP JP2001363578A patent/JP3824523B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006001627A1 (en) * | 2004-06-24 | 2006-01-05 | Lg Chem. Ltd. | Pna chip using plastic substrate coated with epoxy group-containing polymer, method of manufacturing the pna chip, and method of detecting single nucleotide polymorphism using the pna chip |
| KR100766752B1 (en) * | 2004-06-24 | 2007-10-17 | 주식회사 엘지생명과학 | PNA chip using a polymer substrate coated with a polymer having an epoxy group |
| WO2006088290A1 (en) * | 2005-02-16 | 2006-08-24 | LG Life Sciences, Ltd | Pna chip for determining genotypes of mycobacterial species using plastic substrate coated with epoxy group-containing polymer and method of determining genotypes of mycobacterial species using the pna chip |
| US7417138B2 (en) | 2005-02-16 | 2008-08-26 | Lg Life Sciences, Ltd. | PNA chip for determining genotypes of mycobacterial species using plastic substrate coated with epoxy group-containing polymer and method of determining genotypes of mycobacterial species using the PNA chip |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3824523B2 (en) | 2006-09-20 |
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