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JP2003031957A - Manufacturing method of multilayer printed wiring board - Google Patents

Manufacturing method of multilayer printed wiring board

Info

Publication number
JP2003031957A
JP2003031957A JP2001218359A JP2001218359A JP2003031957A JP 2003031957 A JP2003031957 A JP 2003031957A JP 2001218359 A JP2001218359 A JP 2001218359A JP 2001218359 A JP2001218359 A JP 2001218359A JP 2003031957 A JP2003031957 A JP 2003031957A
Authority
JP
Japan
Prior art keywords
glass cloth
metal foil
printed wiring
wiring board
multilayer printed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001218359A
Other languages
Japanese (ja)
Inventor
Yukio Nakamura
幸雄 中村
Kosuke Takada
孝輔 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2001218359A priority Critical patent/JP2003031957A/en
Publication of JP2003031957A publication Critical patent/JP2003031957A/en
Pending legal-status Critical Current

Links

Landscapes

  • Moulding By Coating Moulds (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Laser Beam Processing (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of multilayer printed wiring boards using specific glass cloth for a metal foil-spread laminated sheet and a prepreg, and having laser machining properties. SOLUTION: In glass cloth, used in the manufacturing a metal foil-spread laminated sheet and prepreg, the area of clearance in the intersection of end and weft should be set to 4% or less of that of the area of the intersection.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電気・電子機器等
に使用される多層プリント配線板の製造方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board used in electric / electronic equipment and the like.

【0002】[0002]

【従来の技術】従来は、プリント配線板の製造に用いら
れる多層板の製造方法は、まず、例えば、ガラスクロス
等の基材にエポキシ樹脂組成物等の熱硬化性樹脂組成物
を含浸した後、加熱乾燥して半硬化させてプリプレグを
作製し、このプリプレグを所要枚数重ねるとともに、銅
箔等の金属箔をその片側又は両側に配して積層し、加熱
加圧して成形することによって金属箔張り積層板を形成
する。次に、その金属箔張り積層板の表面の金属箔をエ
ッチングして、表面に導体回路及びプリント配線板を製
造するとき用いるガイドマークを形成した内層用基板を
作製した後、必要に応じて粗面化処理を行い、さらに、
その導体回路等を形成した内層用基板に、上記と同様に
して作製したプリプレグをその片側又は両側に所要枚数
重ねるとともに、必要に応じて金属箔をその片側又は両
側に配して積層し、加熱加圧して成形することによって
製造を行う。
2. Description of the Related Art Conventionally, a method for producing a multilayer board used for producing a printed wiring board is as follows. First, for example, a substrate such as glass cloth is impregnated with a thermosetting resin composition such as an epoxy resin composition. , Heat-drying and semi-curing to produce a prepreg, and stacking the required number of prepregs, and arranging and stacking metal foil such as copper foil on one or both sides thereof, and heating and pressing to form the metal foil. Form a laminated laminate. Next, after etching the metal foil on the surface of the metal foil-clad laminate to produce an inner layer substrate having guide marks used for manufacturing a conductor circuit and a printed wiring board on the surface, a rough layer is formed as necessary. Surface treatment, and further
On the inner layer substrate on which the conductor circuits and the like are formed, the required number of prepregs produced in the same manner as above are stacked on one side or both sides thereof, and if necessary, a metal foil is arranged on one side or both sides and laminated, and heated. Manufacturing is carried out by pressurizing and molding.

【0003】また、この様に製造された多層板を用いて
プリント配線板を製造する方法としては、内層用基板に
形成したガイドマークを用い、このガイドマークを基準
にドリルマシン及びレーザーマシンにて多層板に穴あけ
をした後、この穴の壁面にスルホールメッキを施すと共
に、外層の金属箔にエッチングを施して外層の導体回路
を形成する方法がある。
Further, as a method of manufacturing a printed wiring board using the multilayer board manufactured in this way, a guide mark formed on the inner layer substrate is used, and a drill machine or a laser machine is used with this guide mark as a reference. After making a hole in the multilayer board, there is a method of forming a conductor circuit of the outer layer by performing through-hole plating on the wall surface of the hole and etching the metal foil of the outer layer.

【0004】これらの金属箔張り積層板やプリプレグの
作製に用いられるガラスクロスは、平織りで織られたク
ロスを用いることが一般的であり、その平織りの縦糸と
横糸は、同じ種類の単糸を用いて製造される。
As the glass cloth used in the production of these metal foil-clad laminates and prepregs, a cloth woven by plain weave is generally used, and the warp and weft of the plain weave are made of the same type of single yarn. Manufactured using.

【0005】この様な多層プリント配線板の分野でも、
近年の電子機器の高密度化等に伴い、軽薄短小化が要求
されている。多層プリント配線板の高密度化の手法とし
て、ビルドアップ配線板が挙げられるが、これは内層処
理をされた内層回路板上に絶縁樹脂を形成後に多層化
し、その上に配線パターンを形成する方法を用いる。こ
の方法には、直接樹脂層を形成し、その後内部と外部の
接続穴を開けるもの、樹脂と銅箔を連続的に張り合わせ
て積層しその後内部と外部の接続穴を開けるもの、絶縁
樹脂付き銅箔をラミネートするもの、光により硬化する
樹脂層を形成し露光後写真処理で連続穴をあけるものが
ある。
Even in the field of such multilayer printed wiring boards,
With the recent trend toward higher density of electronic devices, there has been a demand for lighter, thinner, shorter and smaller devices. As a method for increasing the density of a multilayer printed wiring board, a build-up wiring board can be mentioned. This is a method of forming an insulating resin on an inner layer circuit board which has been subjected to an inner layer treatment, and then forming a multilayer, and forming a wiring pattern thereon. To use. In this method, a resin layer is directly formed and then internal and external connection holes are opened, resin and copper foil are continuously laminated and laminated, and then internal and external connection holes are opened, and copper with insulating resin is used. Some are laminated with foil, and some are formed with a photo-curable resin layer and photographic processing after exposure to make continuous holes.

【0006】また、多層プリント配線板の高密度化及び
多層プリント配線板の配線回路の細線化に伴い、IVH
(Interstitial Via Hole)およびSVH(Surface Via
Hole)等の層間接続用の穴径においても細径化が進ん
でいる。穴径の細径化を図るため、穴明けに使用される
ドリル径が細径化される。しかし、ドリル径の細径化に
は限界があり、細いドリルを使用した場合では穴位置精
度が悪く、ドリル寿命が短くなってしまう。そこで多層
プリント配線板においては、小径加工に優れたレーザー
穴明け機が多く使用されるようになってきた。
Further, as the density of the multilayer printed wiring board is increased and the wiring circuit of the multilayer printed wiring board is thinned, IVH
(Interstitial Via Hole) and SVH (Surface Via)
The hole diameter for interlayer connection such as (Hole) is also becoming smaller. The diameter of the drill used for drilling is reduced in order to reduce the diameter of the hole. However, there is a limit to the reduction of the drill diameter, and when a thin drill is used, the hole position accuracy is poor and the drill life is shortened. Therefore, in the multilayer printed wiring board, a laser drilling machine excellent in small-diameter processing has been widely used.

【0007】しかしながら、ビルドアップ配線板は細径
加工に優れているものの、ビルドアップ層にはガラス繊
維基材等の補強材が存在しないため、多層プリント配線
板としての強度が低下しクラックが発生することがあ
る。クラックの発生を防ぐため、ビルドアップ層に繊維
基材のプリプレグを使用して、ビルドアップ層の強度を
高くすることが望ましい。しかし、一般的にガラスクロ
スのような織布は、縦糸と横糸の交点とその間の隙間部
分とではレーザー加工時の加工性に違いがあり、加工穴
の形状にばらつきが生じ易いという深刻な問題があっ
た。
However, although the build-up wiring board is excellent in small-diameter processing, since the build-up layer does not have a reinforcing material such as a glass fiber base material, its strength as a multilayer printed wiring board is lowered and cracks occur. I have something to do. In order to prevent the occurrence of cracks, it is desirable to use a fiber-based prepreg for the buildup layer to increase the strength of the buildup layer. However, in general, woven cloth such as glass cloth has a difference in workability at the time of laser processing at the intersections of the warp threads and the weft threads and the gap portion between them, which is a serious problem that the shape of the processed holes tends to vary. was there.

【0008】[0008]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するためになされたもので、その目的とするとこ
ろは、プリプレグ外観・成形性を損なうことなく、レー
ザー加工性に優れた多層板を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a multi-layer excellent in laser processability without impairing the prepreg appearance and moldability. To provide a plate.

【0009】[0009]

【課題を解決するための手段】本発明の多層プリント配
線板の製造方法は、厚み20〜150μmの平織りのガ
ラスクロスに熱硬化性樹脂組成物を含浸した後、金属箔
と積層し、次いで加熱加圧して作製する金属箔張り積層
板の金属箔をエッチングして表面に導体回路を形成した
内層用基板と、厚み20〜150μmのガラスクロスに
熱硬化性樹脂組成物を含浸して作製するプリプレグとを
積層した後、加熱加圧して製造する多層板の製造方法に
おいて、ガラスクロスの縦糸と横糸との交点の隙間の面
積が、交点の面積の4%以下であることを特徴とする。
The method for producing a multilayer printed wiring board according to the present invention comprises the steps of impregnating a plain weave glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition, laminating it with a metal foil, and then heating it. A substrate for an inner layer on which a metal foil of a metal foil-clad laminate produced by pressing is etched to form a conductor circuit on the surface, and a prepreg produced by impregnating a glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition. In the method for producing a multi-layer board, which is manufactured by stacking and laminating, and heating and pressing, the area of the gap at the intersection of the warp and weft of the glass cloth is 4% or less of the area of the intersection.

【0010】さらに、本発明の多層プリント配線板の製
造方法は、金属箔張り積層板及びプリプレグに使用する
ガラスクロスは高開繊処理されており、通気度が10cm
3 /cm2 /sec以下であることを特徴とする。
Further, in the method for producing a multilayer printed wiring board according to the present invention, the glass cloth used for the metal foil-clad laminate and the prepreg is subjected to high fiber opening treatment, and the air permeability is 10 cm.
It is characterized in that it is 3 / cm 2 / sec or less.

【0011】さらに、本発明の多層プリント配線板の製
造方法は、ガラスクロスの縦糸と横糸の25mm当りの打
ち込み本数の比率(縦糸本数/横糸本数)が0.95〜
1.05であることを特徴とする。
Further, in the method for manufacturing a multilayer printed wiring board according to the present invention, the ratio of the number of warp yarns and the weft yarns of the glass cloth per 25 mm (the number of warp yarns / the number of weft yarns) is 0.95.
It is characterized by being 1.05.

【0012】さらに、本発明の多層プリント配線板の製
造方法は、小径穴加工がレーザー加工によることを特徴
とする。
Further, the method for manufacturing a multilayer printed wiring board according to the present invention is characterized in that the small-diameter hole processing is performed by laser processing.

【0013】[0013]

【発明の実施の形態】本発明に係る多層プリント配線板
は、厚み20〜150μmの平織りのガラスクロスに熱
硬化性樹脂組成物を含浸した後、金属箔と積層し、次い
で加熱加圧して作製する金属箔張り積層板の金属箔をエ
ッチングして表面に導体回路を形成した内層用基板と、
厚み20〜150μmのガラスクロスに熱硬化性樹脂組
成物を含浸して作製するプリプレグとを所定枚数積層し
た後、加熱加圧して得られる。
BEST MODE FOR CARRYING OUT THE INVENTION A multilayer printed wiring board according to the present invention is produced by impregnating a plain weave glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition, laminating it on a metal foil, and then heating and pressing. An inner layer substrate having a conductor circuit formed on the surface by etching the metal foil of the metal foil-clad laminate
It is obtained by laminating a predetermined number of prepregs prepared by impregnating a glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition and then heating and pressing.

【0014】本発明に用いられるガラスクロスは、金属
箔張り積層板及びプリプレグの作製に共に用いられる。
このガラスクロスは、20〜150μmの厚みを有す
る。ガラスクロスの厚みが20μm未満の場合はガラス
クロスの製造に使用する単糸が細くなって、ガラスクロ
スの製造が困難になる傾向がある。また、ガラスクロス
の厚みが150μmを超える厚みの場合、プリプレグ面
内および厚み方向における均一化が困難でありレーザー
加工性に劣る傾向がある。
The glass cloth used in the present invention is used both for producing a metal foil-clad laminate and a prepreg.
This glass cloth has a thickness of 20 to 150 μm. If the thickness of the glass cloth is less than 20 μm, the single yarn used for manufacturing the glass cloth tends to be thin, and it tends to be difficult to manufacture the glass cloth. Further, when the thickness of the glass cloth is more than 150 μm, it is difficult to make the prepreg in-plane and in the thickness direction uniform, and laser processability tends to be poor.

【0015】本発明に用いられるガラスクロスは、縦糸
と横糸との交点の隙間の面積が交点の面積の4%以下で
ある。ガラスクロスの構造中には、縦糸と横糸が重なる
部分と、縦糸又は横糸のみの部分と、縦糸も横糸も存在
しない部分とがあるが、本願の「交点の面積」とは縦糸
と横糸が重なる部分の面積をさす。金属箔張り積層板及
びプリプレグの作製に用いるガラスクロスの縦糸と横糸
との交点の隙間の面積が交点の面積が4%より大きい場
合、交点とその間の隙間部分とではレーザー加工時の加
工性に違いがあり、加工穴の形状(真円性、穴内壁粗
さ)にばらつきが生じ易い傾向がある。
In the glass cloth used in the present invention, the area of the gap between the warp yarns and the weft yarns is 4% or less of the area of the intersections. In the structure of the glass cloth, there are a portion where the warp yarn and the weft yarn overlap, a portion where only the warp yarn or the weft yarn exists, and a portion where neither the warp yarn nor the weft yarn exists. The "area of intersection" in the present application means that the warp yarn and the weft yarn overlap. The area of the part. When the area of the gap between the warp and weft of the glass cloth used for the production of the metal foil-clad laminate and the prepreg is greater than 4%, the intersection and the gap between the two may affect the workability during laser processing. There is a difference, and the shape of the machined hole (roundness, hole inner wall roughness) tends to vary.

【0016】本発明に用いるガラスクロスは高開繊処理
されており、ガラスクロスの隙間を、通気度を用いて表
すと、通気度が10cm3 /cm2 /sec以下であることが好
ましい。ガラスクロスの通気度が10cm3 /cm2 /secよ
り大きい場合には、隙間が多くプリプレグの加工形状に
ばらつきが生じる可能性がある。高開繊処理としては、
高度に開繊されれば通常の開繊に利用される処理でよ
く、例えば、水流による開繊、液体を媒体とした高周波
の振動による開繊、ロールによる加圧での加工等を施す
ことにより、糸の幅が広がりガラスクロス中の隙間が少
なくなるような処理が挙げられるが、好ましくは高圧水
を吹き付けることによる高開繊処理である。
The glass cloth used in the present invention has been subjected to a high fiber opening treatment, and when the gap of the glass cloth is expressed by air permeability, it is preferable that the air permeability is 10 cm 3 / cm 2 / sec or less. When the air permeability of the glass cloth is larger than 10 cm 3 / cm 2 / sec, there are many gaps, and the processed shape of the prepreg may vary. For high fiber opening processing,
If it is highly opened, it may be a treatment used for normal opening. For example, by opening with water flow, opening with high-frequency vibration using a liquid medium, processing by pressure with rolls, etc. A treatment that widens the width of the yarn and reduces the gap in the glass cloth can be mentioned, but a high fiber-spreading treatment by spraying high-pressure water is preferable.

【0017】本発明に用いるガラスクロスは、縦方向と
横方向の糸密度の比を特定の範囲、すなわち、0.95
〜1.05とすることが好ましい。この範囲とすること
により、縦方向と横方向のガラスクロスの体積分率が同
等となり、高開繊処理(偏平化)によってプリプレグ面
内および厚み方向において均一化が図られる。よって、
加工穴の形状(真円性、穴内壁粗さ)を改善する事がで
きる。
In the glass cloth used in the present invention, the ratio of the yarn density in the longitudinal direction to the yarn density in the transverse direction is within a specific range, that is, 0.95.
It is preferable to set to 1.05. By setting it in this range, the volume fractions of the glass cloth in the longitudinal direction become equal to those in the lateral direction, and by the high fiber-spreading process (flattening), the prepreg surface and the thickness direction are made uniform. Therefore,
The shape of the machined hole (roundness, hole inner wall roughness) can be improved.

【0018】本発明に用いるガラスクロスは、ガラスク
ロスの縦糸と横糸が共にJIS規格R3413に限定さ
れる単糸であること好ましい。この単糸を用いて厚み2
0〜150μmの平織りのガラスクロスを製造すると、
ガラスクロスに含浸する熱硬化性樹脂組成物の量を、成
形するのに適度な範囲とすることができる。
The glass cloth used in the present invention is preferably a single thread in which both the warp and the weft of the glass cloth are limited to JIS R3413. Thickness 2 using this single yarn
If you manufacture a plain weave glass cloth of 0-150 μm,
The amount of the thermosetting resin composition with which the glass cloth is impregnated can be set within an appropriate range for molding.

【0019】本発明に用いられる熱硬化性樹脂組成物
は、金属箔張り積層板の製造に用いる熱硬化性樹脂組成
物及びプリプレグの製造に用いる熱硬化性樹脂組成物と
して使用される。この様な熱硬化性樹脂組成物として
は、以下の例には限定されないが、例えば、エポキシ樹
脂系、フェノール樹脂系、ポリイミド樹脂系、不飽和ポ
リエステル樹脂系、ポリフェニレンエーテル樹脂系等を
単独で、変性物として、混合物として、熱硬化性樹脂全
般を用いることができる。なお、金属箔張り積層板の製
造に用いる熱硬化性樹脂組成物及びプリプレグの製造に
用いる熱硬化性樹脂組成物の種類は、同じでもよく異な
っていてもよい。
The thermosetting resin composition used in the present invention is used as a thermosetting resin composition used for producing a metal foil-clad laminate and a thermosetting resin composition used for producing a prepreg. Such a thermosetting resin composition is not limited to the following examples, for example, epoxy resin type, phenol resin type, polyimide resin type, unsaturated polyester resin type, polyphenylene ether resin type, etc. alone, As a modified product, a thermosetting resin in general can be used as a mixture. The types of the thermosetting resin composition used for producing the metal foil-clad laminate and the thermosetting resin composition used for producing the prepreg may be the same or different.

【0020】熱硬化性樹脂組成物は、熱硬化性樹脂を必
須成分として含有し、必要に応じてその熱硬化性樹脂の
硬化剤、硬化促進剤、無機充填材及び溶剤等を含有する
ことができる。
The thermosetting resin composition contains a thermosetting resin as an essential component and, if necessary, a curing agent for the thermosetting resin, a curing accelerator, an inorganic filler and a solvent. it can.

【0021】なお、エポキシ樹脂等のように自己硬化性
の低い熱硬化性樹脂を用いる場合は、その樹脂を硬化す
るための硬化剤等も含有することが必要である。本発明
の熱硬化性樹脂組成物としてエポキシ樹脂系を用いる場
合、電気特性及び接着性のバランスが良好であり好まし
い。
When a thermosetting resin having a low self-hardening property such as an epoxy resin is used, it is necessary to contain a curing agent for hardening the resin. When an epoxy resin system is used as the thermosetting resin composition of the present invention, a good balance between electrical characteristics and adhesiveness is obtained, which is preferable.

【0022】エポキシ樹脂系の樹脂組成物に含有される
エポキシ樹脂としては、以下の例には限定されないが、
例えば、ビスフェノールA型エポキシ樹脂、ビスフェノ
ールF型エポキシ樹脂、ビスフェノールS型エポキシ樹
脂、フェノールノボラック型エポキシ樹脂、ビスフェノ
ールAノボラック型エポキシ樹脂、ビスフェノールFノ
ボラック型エポキシ樹脂、クレゾールノボラック型エポ
キシ樹脂、ジアミノジフェニルメタン型エポキシ樹脂及
びこれらのエポキシ樹脂構造体における水素原子の一部
をハロゲン化することにより難燃化したエポキシ樹脂等
が挙げられる。
The epoxy resin contained in the epoxy resin type resin composition is not limited to the following examples,
For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, bisphenol A novolac type epoxy resin, bisphenol F novolac type epoxy resin, cresol novolac type epoxy resin, diaminodiphenylmethane type epoxy resin. Examples include resins and epoxy resins flame-retarded by halogenating a part of hydrogen atoms in these epoxy resin structures.

【0023】エポキシ樹脂系の樹脂組成物に含有される
硬化剤としては、以下の例には限定されないが、例え
ば、ジシアンジアミド及び脂肪族ポリアミド等のアミド
系硬化剤や、アンモニア、トリエチルアミン及びジエチ
ルアミン等のアミン系硬化剤や、フェノールノボラック
樹脂、クレゾールノボラック樹脂及びp−キシレン−ノ
ボラック樹脂等のフェノール系硬化剤や、酸無水物類が
挙げられる。
The curing agent contained in the epoxy resin type resin composition is not limited to the following examples, but for example, amide type curing agents such as dicyandiamide and aliphatic polyamide, ammonia, triethylamine and diethylamine. Examples thereof include amine curing agents, phenolic curing agents such as phenol novolac resins, cresol novolac resins and p-xylene-novolac resins, and acid anhydrides.

【0024】熱硬化性樹脂組成物に含有される無機充填
材としては、以下の例には限定されないが、例えば、シ
リカ、炭酸カルシウム、水酸化アルミニウム及びタルク
等の無機質粉末充填材や、ガラス繊維、パルプ繊維、合
成繊維及びセラミック繊維等の繊維質充填材が挙げられ
る。
The inorganic filler contained in the thermosetting resin composition is not limited to the following examples, but examples thereof include inorganic powder fillers such as silica, calcium carbonate, aluminum hydroxide and talc, and glass fibers. Fibrous fillers such as pulp fibers, synthetic fibers and ceramic fibers.

【0025】熱硬化性樹脂組成物に含有される溶剤とし
ては、以下の例には限定されないが、例えば、N,N−
ジメチルホルムアミド等のアミド類、エチレングリコー
ルモノメチルエーテル等のエーテル類、アセトン及びメ
チルエチルケトン等のケトン類、メタノール及びエタノ
ール等のアルコール類、並びにベンゼン及びトルエン等
の芳香族炭化水素類等が挙げられる。
Although the solvent contained in the thermosetting resin composition is not limited to the following examples, for example, N, N-
Examples thereof include amides such as dimethylformamide, ethers such as ethylene glycol monomethyl ether, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol and ethanol, and aromatic hydrocarbons such as benzene and toluene.

【0026】熱硬化性樹脂組成物をガラスクロスに含浸
する方法は、特に限定するものではなく、一般の方法が
適用可能である。なお、熱硬化性樹脂組成物をガラスク
ロスに含浸した後、必要に応じて加熱乾燥していてもよ
い。
The method of impregnating the glass cloth with the thermosetting resin composition is not particularly limited, and a general method can be applied. After impregnating the glass cloth with the thermosetting resin composition, it may be dried by heating if necessary.

【0027】本発明に用いられる金属箔としては、以下
の例には限定されないが、例えば、銅、アルミニウム、
真鍮及びニッケル等を、単独、合金又は複合の金属箔と
して用いることができ、金属箔の変わりに金属箔が積層
成形された片面金属張積層板及び両面金属張積層板を用
いることもできる。なお、この金属箔は、金属箔張り積
層板の作製のみに用いることを限定するものではなく、
内層用基板とプリプレグとを積層したその積層物の片側
又は両側に積層して用いてもよい。この金属箔の厚みと
しては、金属箔張り積層板の作製に用いる場合0.00
3〜0.070mmが一般的であり、内層用基板とプリプ
レグとを積層したその積層物の片側又は両側に積層する
場合は、0.003〜0.035mmが一般的である。
The metal foil used in the present invention is not limited to the following examples. For example, copper, aluminum,
Brass, nickel, and the like can be used alone, as an alloy or a composite metal foil, and a single-sided metal-clad laminate and a double-sided metal-clad laminate in which metal foils are laminated and molded can be used instead of the metal foil. The metal foil is not limited to being used only for producing a metal foil-clad laminate,
The inner layer substrate and the prepreg may be laminated on one side or both sides of the laminated body. The thickness of this metal foil is 0.00 when it is used for producing a metal foil-clad laminate.
The thickness is generally 3 to 0.070 mm, and when it is laminated on one side or both sides of the laminate obtained by laminating the inner layer substrate and the prepreg, the thickness is generally 0.003 to 0.035 mm.

【0028】金属箔張り積層板を製造するときの加熱加
圧する条件、及び内層用基板とプリプレグとを積層した
後の加熱加圧する条件としては、熱硬化性樹脂組成物が
硬化する条件で適宜調整して加熱加圧すればよいが、加
圧の圧力が高いと導体回路の寸法収縮のばらつきが大き
くなる場合があるため、成形性を満足する範囲内で、で
きるだけ低圧で加圧することが好ましい。なお、加熱加
圧を4.0×10Pa以下の減圧雰囲気下で行うと、成
形性が良好となり好ましい。
The conditions for heating and pressurizing the metal foil-clad laminate and the conditions for heating and pressurizing after laminating the inner layer substrate and the prepreg are appropriately adjusted depending on the conditions under which the thermosetting resin composition is cured. It is sufficient to heat and pressurize, but if the pressurizing pressure is high, the dimensional shrinkage of the conductor circuit may vary greatly. Therefore, it is preferable to pressurize as low as possible within the range that satisfies the formability. Note that it is preferable to heat and pressurize under a reduced pressure atmosphere of 4.0 × 10 4 Pa or less because the moldability becomes good.

【0029】金属箔張り積層板表面の金属箔をエッチン
グする方法としては特に限定するものではなく、金属箔
及びそのエッチングに用いるエッチングレジストにより
一般の方法が適用可能である。
The method for etching the metal foil on the surface of the metal foil-clad laminate is not particularly limited, and a general method can be applied depending on the metal foil and the etching resist used for the etching.

【0030】本発明では、プリント配線板の小径穴の加
工がレーザーにより行われることが好ましい。本願発明
の多層板を、レーザーを用いて加工することにより、加
工性の優れた多層板とすることができる。
In the present invention, it is preferable that the small-diameter holes in the printed wiring board are processed by a laser. By processing the multilayer board of the present invention using a laser, it is possible to obtain a multilayer board having excellent processability.

【0031】[0031]

【実施例】以下の実施例1、2及び比較例1、2に示す
通り、多層板を作成し、プリプレグの外観、多層板につ
いての成形性及びレーザー加工性について顕微鏡を用い
て目視により調べた。
EXAMPLES As shown in Examples 1 and 2 and Comparative Examples 1 and 2 below, a multilayer board was prepared, and the appearance of the prepreg, the moldability of the multilayer board, and the laser processability were visually examined using a microscope. .

【0032】プリプレグ外観の評価基準は、ピンホール
がない状態を「良好」とし、ピンホールが発生した場合
は「ピンホール有り」とした。成形性の評価基準は、プ
リプレグ成形後、表面やガラス布にボイドがない場合を
「良好」とした。レーザー加工性の評価基準は、加工穴
壁面の粗さが小さく真円性に優れる場合を◎とし、加工
穴壁面の粗さが小さく真円性は問題のないレベルの場合
は○とし、加工穴壁面の粗さが大きく真円性のバラツキ
が大きい場合は、△とした。
The evaluation criteria for the appearance of the prepreg were "good" when there were no pinholes, and "presence of pinholes" when pinholes occurred. The evaluation standard of the moldability was “good” when there was no void on the surface or the glass cloth after the prepreg molding. The evaluation criteria for laser processability are ◎ when the roughness of the machined hole wall surface is small and excellent in circularity, and ○ when the roughness of the machined hole wall surface is small and there is no problem in circularity. When the roughness of the wall surface is large and the variation of the circularity is large, it is marked with Δ.

【0033】(実施例1)JIS規格R3413に規定
されるD900 1/0の単糸を縦糸及び横糸に用い
て、縦糸の糸密度25mm当たり53本、横糸の糸密度2
5mm当たり53本となるように織って、平織りのガラス
クロスを得た。
(Embodiment 1) D900 1/0 single yarn specified in JIS standard R3413 is used for warp and weft, and the warp yarn has a yarn density of 53 per 25 mm and a weft yarn density of 2
A plain weave glass cloth was obtained by weaving so as to have 53 pieces per 5 mm.

【0034】ガラスクロスの縦方向と横方向との糸密度
の比(縦方向の糸密度/横方向の糸密度)を計算する
と、1.00であった。またガラスクロスの厚みをJI
S規格R3420に従い測定したところ40μm、通気
度は10cm3 /cm2 /secであった。 ガラスクロスの重
量をIPC規格EG−140に従い測定したところ47.
9g/mであった。ガラスクロスの交点すきま面積比率
を、表面から顕微鏡で観察し面積に換算した結果は1〜
3%であった。
The ratio of the yarn densities in the longitudinal direction and the transverse direction of the glass cloth (the yarn density in the longitudinal direction / the yarn density in the transverse direction) was 1.00. In addition, the thickness of the glass cloth is JI
When measured according to S standard R3420, it was 40 μm, and the air permeability was 10 cm 3 / cm 2 / sec. When the weight of the glass cloth was measured according to IPC standard EG-140, 47.
It was 9 g / m 2 . The ratio of the clearance area of the intersection of the glass cloths was observed from the surface with a microscope and converted into the area.
It was 3%.

【0035】熱硬化性樹脂組成物として、下記のエポキ
シ樹脂2種類、硬化剤、硬化促進剤及び溶剤2種類より
なるエポキシ樹脂系樹脂組成物を使用した。
As the thermosetting resin composition, an epoxy resin resin composition comprising the following two kinds of epoxy resins, a curing agent, a curing accelerator and two kinds of solvents was used.

【0036】エポキシ樹脂1:テトラブロモビスフェノ
ールA型エポキシ樹脂[東都化成社製、商品名YDB−
500]を固形分として87.5重量部 エポキシ樹脂2:クレゾールノボラック型エポキシ樹脂
[東都化成社製、商品名YDCN−220]、固形分と
して12.5重量部 硬化剤:ジシアンジアミド 2.8重量部 硬化促進剤:2−エチル−4−メチルイミダゾール
0.18重量部 溶剤1:N,N−ジメチルホルムアミド 25重量部 溶剤2:メチルエチルケトン 100重量部 この樹脂組成物を、上記ガラスクロスに、乾燥後の熱硬
化性樹脂組成物の量が、熱硬化性樹脂組成物及びガラス
クロスの合計100重量部に対し、62重量部となるよ
うに調整して含浸した後、最高温度165℃で乾燥して
プリプレグを作製した。
Epoxy resin 1: Tetrabromobisphenol A type epoxy resin [manufactured by Tohto Kasei Co., trade name YDB-
500] as a solid content 87.5 parts by weight Epoxy resin 2: Cresol novolac type epoxy resin [Toto Kasei Co., Ltd., trade name YDCN-220], 12.5 parts by weight as a solid content Curing agent: dicyandiamide 2.8 parts by weight Curing accelerator: 2-ethyl-4-methylimidazole
0.18 parts by weight Solvent 1: N, N-Dimethylformamide 25 parts by weight Solvent 2: Methyl ethyl ketone 100 parts by weight This resin composition is applied to the above-mentioned glass cloth, and the amount of the thermosetting resin composition after drying is thermosetting. The prepreg was prepared by impregnating the resin composition and glass cloth with 100 parts by weight so that the total amount was 62 parts by weight, followed by impregnation and drying at a maximum temperature of 165 ° C.

【0037】次いで得られた所定枚数のプリプレグの両
側に、厚み12μmの銅箔を配して積層した後、この積
層物を金属プレートで挟み、最高温度180℃、圧力
3.0MPaで90分加熱加圧して成形して両面銅張り積
層板を作成した。
Then, a 12 μm thick copper foil was placed on both sides of the predetermined number of prepregs obtained and laminated, and the laminate was sandwiched between metal plates and heated at a maximum temperature of 180 ° C. and a pressure of 3.0 MPa for 90 minutes. Pressurized and molded to prepare a double-sided copper-clad laminate.

【0038】次いで得られた両面銅張り積層板に表面処
理を施し、両側にプリプレグを配して積層した後、この
積層物を金属プレートで挟み、最高温度180℃、圧力
2.5MPaで80分加熱加圧して成形して多層板を作成
した。
Then, the obtained double-sided copper-clad laminate was subjected to a surface treatment, prepregs were arranged on both sides to laminate, and the laminate was sandwiched between metal plates, and the maximum temperature was 180 ° C. and the pressure was 2.5 MPa for 80 minutes. A multi-layer board was prepared by heating and pressurizing.

【0039】(実施例2)JIS規格R3413に規定
されるDE300 1/0の単糸を縦糸及び横糸に用い
て、縦糸の糸密度25mm当たり60本、横糸の糸密度2
5mm当たり62本となるように織ってガラスクロスを得
たこと以外は、実施例1と同様にして両面銅張り積層板
及びプリプレグを作製して多層板を得た。
(Embodiment 2) DE300 1/0 single yarn specified in JIS standard R3413 is used as warp and weft, and the warp yarn has a yarn density of 60 per 25 mm and a weft yarn density of 2
A double-sided copper-clad laminate and a prepreg were produced in the same manner as in Example 1 except that the glass cloth was obtained by weaving so as to have 62 pieces per 5 mm to obtain a multilayer board.

【0040】なお、このガラスクロスの縦方向と横方向
の糸密度の比(縦方向の糸密度/横方向の糸密度)を計
算すると1.03となる。このガラスクロスを実施例1
と同様にして測定したところ、通気度は1.7cm3 /cm
2 /sec、厚み71μm、重量82.4g/mであった。ま
た、交点すきま面積比率は1〜3%であった。
The ratio of the yarn density of the glass cloth in the longitudinal direction and the yarn density in the transverse direction (the yarn density in the longitudinal direction / the yarn density in the transverse direction) is 1.03. This glass cloth was used in Example 1.
When measured in the same manner as above, the air permeability is 1.7 cm 3 / cm
It was 2 / sec, the thickness was 71 μm, and the weight was 82.4 g / m 2 . The intersection clearance area ratio was 1 to 3%.

【0041】(比較例1)縦糸の糸密度を25mm当たり
60本、横糸の糸密度を25mm当たり47本となるよう
に織ってガラスクロスを得たこと以外は、実施例1と同
様にして両面銅張り積層板及びプリプレグを作製して多
層板を得た。
Comparative Example 1 Both sides were prepared in the same manner as in Example 1 except that a glass cloth was obtained by weaving so that the yarn density of the warp yarn was 60 per 25 mm and the yarn density of the weft yarn was 47 per 25 mm. A copper-clad laminate and a prepreg were produced to obtain a multilayer board.

【0042】なお、このガラスクロスの縦方向と横方向
の糸密度の比(縦方向の糸密度/横方向の糸密度)を計
算すると1.28となる。このガラスクロスを実施例1
と同様にして測定したところ、通気度は120cm3 /cm
2 /sec、厚み53μm、重量47.5g/mであった。ま
た、交点すきま面積比率は15〜20%であった。
The ratio of the yarn density in the longitudinal direction and the yarn density in the transverse direction of this glass cloth (the yarn density in the longitudinal direction / the yarn density in the transverse direction) is 1.28. This glass cloth was used in Example 1.
When measured in the same manner as above, the air permeability is 120 cm 3 / cm
It was 2 / sec, the thickness was 53 μm, and the weight was 47.5 g / m 2 . The intersection clearance area ratio was 15 to 20%.

【0043】(比較例2)縦糸の糸密度を25mm当たり
60本、横糸の糸密度を25mm当たり62本となるよう
に織ってガラスクロスを得たこと以外は実施例1と同様
にして両面銅張り積層板及びプリプレグを作製して多層
板を得た。
(Comparative Example 2) Double-sided copper was obtained in the same manner as in Example 1 except that a glass cloth was obtained by weaving so that the yarn density of warp yarn was 60 per 25 mm and the yarn density of weft yarn was 62 per 25 mm. A laminated board and a prepreg were produced to obtain a multilayer board.

【0044】なお、このガラスクロスの縦方向と横方向
の糸密度の比(縦方向の糸密度/横方向の糸密度)を計
算すると1.03となる。また、このガラスクロスを実
施例1と同様にして測定したところ、通気度は60cm3
/cm2 /sec、厚み84μm、重量82.6g/mであっ
た。また、交点すきま面積比率は10〜15%であっ
た。
The ratio of the yarn density in the machine direction to the yarn density in the machine direction (yarn density in the machine direction / yarn density in the cross direction) is 1.03. Moreover, when this glass cloth was measured in the same manner as in Example 1, the air permeability was 60 cm 3.
/ cm 2 / sec, thickness 84 μm, and weight 82.6 g / m 2 . The intersection clearance area ratio was 10 to 15%.

【0045】[0045]

【表1】 結果は表1に示す通り、実施例1〜2は、比較例1〜2
と比べてレーザー加工性が著しく良好となることが確認
された。
[Table 1] The results are shown in Table 1, and Examples 1 and 2 are Comparative Examples 1 and 2.
It was confirmed that the laser processability was remarkably improved as compared with.

【0046】[0046]

【発明の効果】本発明に係る多層板の製造方法による
と、ガラスクロス金属箔張り積層板やプリプレグに適用
した場合に、プリプレグ外観・成形性を損なうこと無
く、レーザー加工性が優れた多層板を得ることができ
る。
According to the method for producing a multilayer board of the present invention, when applied to a glass cloth metal foil-clad laminate or prepreg, the multilayer board has excellent laser processability without impairing the appearance and formability of the prepreg. Can be obtained.

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 1/03 610 H05K 1/03 610T 3/00 3/00 N // B23K 101:42 B23K 101:42 B29K 101:10 B29K 101:10 105:08 105:08 B29L 9:00 B29L 9:00 31:34 31:34 Fターム(参考) 4E068 AF01 DA11 4F204 AA39 AD16 AG03 AH36 FA01 FB01 FB12 FG02 FN11 FN15 5E346 AA06 AA12 AA15 AA22 AA32 AA51 CC04 CC09 CC32 DD02 DD12 DD32 EE06 EE07 EE09 EE13 FF01 GG15 GG22 GG28 HH11 HH31 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 1/03 610 H05K 1/03 610T 3/00 3/00 N // B23K 101: 42 B23K 101: 42 B29K 101: 10 B29K 101: 10 105: 08 105: 08 B29L 9:00 B29L 9:00 31:34 31:34 F-term (reference) 4E068 AF01 DA11 4F204 AA39 AD16 AG03 AH36 FA01 FB01 FB12 FG02 FN11 FN15 5E346 AA06 AA12 AA15 AA22 AA32 AA51 CC04 CC09 CC32 DD02 DD12 DD32 EE06 EE07 EE09 EE13 FF01 GG15 GG22 GG28 HH11 HH31

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 厚み20〜150μmの平織りのガラス
クロスに熱硬化性樹脂組成物を含浸した後、金属箔と積
層し、次いで加熱加圧して作製する金属箔張り積層板の
金属箔をエッチングして表面に導体回路を形成した内層
用基板と、厚み20〜150μmのガラスクロスに熱硬
化性樹脂組成物を含浸して作製するプリプレグとを積層
した後、加熱加圧して製造する多層プリント配線板の製
造方法において、金属箔張り積層板及びプリプレグの作
製に用いるガラスクロスは縦糸と横糸との交点の隙間の
面積が、交点の面積の4%以下であることを特徴とする
多層プリント配線板の製造方法。
1. A flat-woven glass cloth having a thickness of 20 to 150 μm is impregnated with a thermosetting resin composition, laminated with a metal foil, and then heated and pressed to etch a metal foil of a metal foil-clad laminate. A multilayer printed wiring board produced by laminating an inner layer substrate having a conductor circuit formed on its surface and a prepreg made by impregnating a glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition, and then applying heat and pressure. In the method for producing a metal foil-clad laminate and a glass cloth used for producing a prepreg, an area of a gap between intersections of warp yarns and weft yarns is 4% or less of an area of intersections. Production method.
【請求項2】 前記したガラスクロスは高開繊処理され
ており、通気度が10cm3 /cm2 /sec以下であることを
特徴とする請求項1記載の多層プリント配線板の製造方
法。
2. The method for manufacturing a multilayer printed wiring board according to claim 1, wherein the glass cloth is subjected to a high fiber opening treatment and has an air permeability of 10 cm 3 / cm 2 / sec or less.
【請求項3】 前記したガラスクロスは縦糸と横糸の2
5mm当りの打ち込み本数の比率(縦糸本数/横糸本数)
が0.95〜1.05であることを特徴とする請求項1
又は請求項2記載の多層プリント配線板の製造方法。
3. The glass cloth is composed of warp threads and weft threads.
Ratio of the number of driving threads per 5 mm (number of warp threads / number of weft threads)
Is 0.95 to 1.05.
Or the manufacturing method of the multilayer printed wiring board according to claim 2.
【請求項4】 小径穴加工がレーザー加工であることを
特徴とする請求項1、請求項2又は請求項3記載の多層
プリント配線板の製造方法。
4. The method for producing a multilayer printed wiring board according to claim 1, wherein the small diameter hole processing is laser processing.
JP2001218359A 2001-07-18 2001-07-18 Manufacturing method of multilayer printed wiring board Pending JP2003031957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281663A (en) * 2004-03-04 2005-10-13 Hitachi Chem Co Ltd Prepreg and metal foil-clad laminate and printed circuit board using the same
JP2006297613A (en) * 2005-04-15 2006-11-02 Hitachi Chem Co Ltd Method for producing metal foil-clad laminate and multilayer printed wiring board
US7871694B2 (en) 2004-03-04 2011-01-18 Hitachi Chemical Company, Ltd. Prepreg, metal-clad laminate and printed circuit board using same
JP2016028420A (en) * 2014-07-08 2016-02-25 パナソニックIpマネジメント株式会社 Method for manufacturing wiring board

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JPH0484490A (en) * 1990-07-27 1992-03-17 Sumitomo Bakelite Co Ltd Manufacture of printed wiring board
JPH05318482A (en) * 1992-05-19 1993-12-03 Sumitomo Bakelite Co Ltd Manufacture of laminate
JPH0878854A (en) * 1994-07-08 1996-03-22 Risho Kogyo Co Ltd Substrate for multilayer printed wiring board
JPH08204061A (en) * 1995-01-25 1996-08-09 Mitsubishi Gas Chem Co Inc Plastic semiconductor package
JP2000022302A (en) * 1998-06-30 2000-01-21 Matsushita Electric Works Ltd Laminate for laser punching and method thereof
JP2001073249A (en) * 1999-08-31 2001-03-21 Unitika Glass Fiber Co Ltd Glass cloth for printed circuit board

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0484490A (en) * 1990-07-27 1992-03-17 Sumitomo Bakelite Co Ltd Manufacture of printed wiring board
JPH05318482A (en) * 1992-05-19 1993-12-03 Sumitomo Bakelite Co Ltd Manufacture of laminate
JPH0878854A (en) * 1994-07-08 1996-03-22 Risho Kogyo Co Ltd Substrate for multilayer printed wiring board
JPH08204061A (en) * 1995-01-25 1996-08-09 Mitsubishi Gas Chem Co Inc Plastic semiconductor package
JP2000022302A (en) * 1998-06-30 2000-01-21 Matsushita Electric Works Ltd Laminate for laser punching and method thereof
JP2001073249A (en) * 1999-08-31 2001-03-21 Unitika Glass Fiber Co Ltd Glass cloth for printed circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281663A (en) * 2004-03-04 2005-10-13 Hitachi Chem Co Ltd Prepreg and metal foil-clad laminate and printed circuit board using the same
US7871694B2 (en) 2004-03-04 2011-01-18 Hitachi Chemical Company, Ltd. Prepreg, metal-clad laminate and printed circuit board using same
JP2006297613A (en) * 2005-04-15 2006-11-02 Hitachi Chem Co Ltd Method for producing metal foil-clad laminate and multilayer printed wiring board
JP2016028420A (en) * 2014-07-08 2016-02-25 パナソニックIpマネジメント株式会社 Method for manufacturing wiring board

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