JP2003029118A - Exposure lens and exposure lens device - Google Patents

Abstract

(57) [Summary] [Problem] To facilitate axis alignment at the time of mounting. A mounting case (60) for mounting an exposure lens (26) having reference surfaces (42) and (44) used as an orientation flat is provided, and the housing is provided with a lens mounting recess (64). Then, the contact pins 70 and 72 with the reference surface are erected in accordance with the lens mounting position, and fixed with the reference surface in contact with the contact pin. When the reference surface of the exposure lens correctly contacts the contact pin, the optical axis of the exposure lens and the center axis of the mounting recess completely match. Therefore, the alignment work is simple. Because the mounting recess can be much larger than the exposure lens,
The work of mounting the exposure lens in the mounting recess is also easy.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure lens and an exposure lens device using the exposure lens, which can be applied when a phosphor having a predetermined pattern is formed. Specifically, as the exposure lens, two reference planes are provided as orientation flats so as to be orthogonal to each other, so that the exposure lens can be correctly mounted. Further, when using this exposure lens, by providing contact pins that respectively contact the reference surface, the optical axis of the exposure lens and the central axis of the apparatus can be accurately aligned. is there.

[0002]

2. Description of the Related Art In a cathode ray tube such as a color cathode ray tube (color CRT) used as a monitor of a television receiver or a comparator, as shown in FIG. 12, R, G, B is formed on the inner surface 12a of the panel 12 of the cathode ray tube 10. Phosphor layer 14
(14R, 14G, 14B) are formed. For example, when an aperture grill (AG) having a stripe shape is used as the color selection mechanism 16, the stripe phosphor layers 14 extending in the vertical scanning direction are formed with a predetermined pitch.

In order to form the stripe-shaped phosphor layer 14 on the inner surface 12a of the panel, an exposure device 20 as shown in FIG. 13 may be used. In the case of FIG. 13, the aperture grill 16 itself attached to the panel inner surface 12a is also used as an exposure mask. Then, the light from the light source 24 for exposure (for example, ultraviolet UV) is exposed through the exposure lens 26 and the aperture grill 16 to the photosensitive material or the fluorescent material applied to the inner surface of the panel, as shown in FIG. Multiple phosphor layers (stripe layers) 14
R, 14G and 14B are formed.

Specifically, the phosphor layer 14 is formed through the processes shown in FIGS. 14 and 15. The following is the phosphor forming process including the carbon layer.
As shown in FIG. 4A, a resist layer 22a such as polyvinyl alcohol PVA is applied to the inner surface of the panel, and then, as shown in FIG.
As in FIG. 4B, the aperture grille 16 is used to expose the R phosphor layer forming region (exposure portion) 22b.
Similarly, in this example, while the light source 24 is shifted by a predetermined pitch, the formation region of each of the G and B phosphor layers is exposed (FIG. 14C). After that, the substrate is washed with water and then the non-exposed portion 22c is removed to leave only the exposed portion 22b (see FIG. 14).
D).

After that, a carbon layer is applied and dried, and then only PVA is washed with a chemical solution.
A stripe layer 14C like A is obtained. This is a carbon black layer (carbon layer). Next, after applying the R (or B) phosphor, the phosphor is exposed using the aperture grille 16 and then washed with water to remove the phosphor that is not exposed (FIG. 15).
B). By performing this process on G and B as well, the phosphor 14 as shown in FIG. 15C can be formed.

Here, in order that the electron beam passes through the aperture grille 16 and irradiates a predetermined phosphor layer 14, the light from the light source 24 also passes through the same optical path and reaches the resist layer. An exposure lens 26 as shown in FIG. 13 is used for changing the optical path between the aperture grill 16 and the aperture grill 16. The exposure treatment layer refers to a resist layer or a phosphor layer.

The exposure lens 26 is a combination of several to 7 to 8 lenses. Exposure lens 2
6 is a combination of a flat lens and an aspherical lens. Therefore, the exposure lens 26 is mounted and fixed to the lens mounting case 32 that constitutes the exposure lens device 30 as shown in FIG. When the lens is mounted and fixed, the optical axis of the exposure lens 26 is set to the mounting case 32.
It is necessary to mount and fix the exposure lens 26 so as to be completely aligned with the central axis of the.

Therefore, as the exposure lens 26, one having a reference surface 28 used as an orientation flat as shown in FIG. 17 is used. The reference surface 28 is also used as a reference surface when the exposure lens 26 is attached to a polishing table when polishing it into a predetermined aspherical body. Further, as shown in FIG.
As shown in Fig. 1, there are approximately 9
A marking line 27 (2
7a, 27b, 27c) are engraved.

The exposure lens 26 is used by stacking a plurality of lenses. Exposure lens device 3 shown in FIG.
Reference numeral 0 indicates three exposure lenses 26a and 26 in the mounting housing 32.
The case where b and 26c are attached and used is shown. Therefore, as shown in FIG. 16, the mounting housing 32 is provided with a central hole 32a, and three mounting recesses 34, 36, 38 having different inner diameters are provided in the central axial direction.

The inner shape of each of the mounting recesses 34, 36, 38 is the same as the outer shape of the exposure lens 26, and the optical axis of the exposure lens 26 is the same as the mounting case 32.
In order to enable the mounting so as to be completely aligned with the central axis z, the marking lines similar to the marking line 27 are engraved on the peripheral surfaces of the mounting recesses 34, 36, 38. For example, in the mounting recess 34, as shown in FIG. 19, a marking line 35 (35) used as a reference line by holding a 90 ° angular interval on a step plane 34a which is also a lens mounting surface of the mounting recess 36.
a, 35b, 35c) are engraved. The other mounting recesses 36, 38 are also provided with the step planes 36a, 38a, respectively.
A similar marking line (not shown) is formed on.

[0011]

By the way, when the exposure lens 26 is mounted and fixed in the mounting recesses 34, 36, 38, the optical axis of the exposure lens 26 and the center of the mounting recesses 34, 36, 38 are set. The alignment with the axis z is performed by relying on the marking lines 27 and 35 described above. Since the axis alignment is visual, there is a limit in the accuracy of the axis alignment, and it is empirically recognized that it is difficult to adjust the accuracy to ± 0.1 mm or less because the visual level is limited. .

The mounting recess 3 after mounting the exposure lens
4, 36, 38 and exposure lenses 26a, 26b, 26c
The clearance w between the and (see FIG. 16) is extremely small. Generally, this clearance w is selected to be about 1 mm. Since only a slight clearance is left in the mounting recesses 34, 36, 38, the mounting work of the exposure lens 26 is troublesome. This is also because it is necessary to mount the exposure lens 26 so that the lens surface and the like are not damaged.

Although there is only a small gap between the mounting recesses 34, 36 and 38, an error of the maximum clearance w (1 mm) may occur at a minimum as shown in FIG. This means that even if the inner surface shape of the mounting recesses 34, 36, 38 is the same as the outer shape of the exposure lens 26, there is a possibility that it may be shifted by up to 1 mm in the x-axis or y-axis direction. In order to make this mounting error as small as possible, the position adjustment after mounting is performed several times. However, in the end, it is the actual situation that it is up to the intuition of a skilled person. Therefore, conventionally, it is difficult to optimize the mounting.

Therefore, the present invention solves such a conventional problem, and particularly, an exposure lens and an exposure lens device using the exposure lens which can easily and surely perform axis alignment after mounting. It is a proposal.

[0015]

In order to solve the above-mentioned problems, the exposure lens according to the present invention described in claim 1 is used for forming a phosphor layer in a predetermined pattern through a color selection mechanism. An exposure lens having first and second reference surfaces used as orientation flats, and the second reference surface is provided so as to be orthogonal to the first reference surface. Is characterized by.

Further, in the exposure lens device according to the third aspect of the present invention, there is provided a mounting housing for mounting the exposure lens having the first and second reference surfaces used as an orientation flat. The mounting case is provided with a plurality of mounting recesses for the exposure lens, and the first and second reference points are formed on the bottom surface of the mounting recess according to the mounting position of the exposure lens. The contact pins are planted so as to come into contact with the surfaces, and are fixed in a state where the reference surfaces are in contact with the contact pins.

In the present invention, the exposure lens is provided with two reference surfaces which are orthogonal to each other. Strictly control the machining roughness and machining tolerance of the reference surface. A plurality of contact pins that come into contact with these reference surfaces are planted in the mounting housing, and the optical axis of the exposure lens is completely aligned with the central axis of the mounting recess at the position of contact with the contact pins. Is processed as. Therefore, the planting position accuracy of the contact pin is also strictly controlled.

The exposure lens is mounted so that the reference surface properly abuts on the abutment pin, and the exposure lens is pressed and fixed to the abutment pin side by the pressing means so that the position does not shift. The optical axis of the exposure lens and the central axis of the mounting concave portion are completely aligned with each other because the reference surface of the exposure lens is brought into proper contact with the contact pin. Therefore, the axis alignment work is easy. Since the mounting recess can be made sufficiently larger than the exposure lens, the work of mounting the exposure lens in the mounting recess is easy.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION Next, an embodiment of an exposure lens and an exposure lens device according to the present invention will be described in detail with reference to the drawings. FIG. 1 shows an embodiment of an exposure lens 26 according to the present invention. The subject exposure lenses are planar lenses and aspherical lenses. Although an aspherical lens is shown in FIG. 1, the aspherical surface is different from the actual one for the purpose of explanation.

As shown in FIG. 1, the exposure lens 26 is provided with first and second linear reference surfaces 42 and 44 which are orthogonal to each other. In the embodiment, the second reference plane 44 is formed on the right side of the first reference plane 42 parallel to the x-axis and parallel to the y-axis. here,
The x-axis corresponds to the horizontal scanning direction of the electron beam, and the y-axis corresponds to the vertical scanning direction.

Each of these reference planes 42 and 44 functions as an orientation flat. Reference plane 42, 44
Can be of any length, but is selected to be at least long enough to function as an orientation flat. In the embodiment, the length is about ⅔ of the lens diameter.

At the intersection 46 of the reference planes 42 and 44, the reference plane 4 is arranged from the optical axis p so that a part of the peripheral surface of the lens remains.
Distances up to 2,44 are selected. This is intersection 4
This is because if 6 is not left, the intersecting portion of the reference surfaces 42 and 44 will be a right angle, and the lens peripheral surface will be easily damaged when the lens is mounted or the lens is conveyed. The optical axis p is the same as the z axis along which the electron beam travels straight.

The processing accuracy of the reference surfaces 42 and 44 is selected as follows. First, the processed surface roughness of the reference surfaces 42 and 44 is
JIS / Rmax 25S or less, the processing tolerance (distance Wx, Wy) from the optical axis p to the reference surfaces 42, 44 is ± 0.1 mm or less, and the perpendicularity of the reference surfaces 42, 44 is ± 1 second. It is processed so that it is within (≈0.02 degrees).
As a result, the processed surface roughness becomes ± 25 μm or less, and a sufficient effect can be expected as a reference surface.

After forming the two reference surfaces 42 and 44 as described above, if the lens is an aspherical lens, FIG.
As described above, the lens surface 26u is polished so as to have a predetermined aspherical surface. An example of the polishing table 50 used for this polishing process is shown in FIG. As is apparent from the figure, the polishing table 50 is a flat metal plate, and when the exposure lens 26 is mounted on the center q provided on the surface 50a thereof, the polishing table 50 and the reference surfaces 42 and 44 contact each other. A plurality of abutment pins 52 and 54 are vertically fixed at the contacting positions (see FIG. 4). That is, two contact pins (metal rods such as SUS) 52, 52 having a predetermined diameter are located at positions apart from the center q by Wy in the y-axis direction and at equal intervals across the y-axis. The planting is fixed. Further, one contact pin 54 having a predetermined diameter is fixed to the center q at a position away from the center q by Wx in the x-axis direction and passing through the center q.

The abutting pins 52, 54 are machined so that the surface roughness of the abutting pins 52, 54 is, for example, JIS Rmax 5S or less, and therefore ± 5 μm or less.
The processing tolerance up to 54 is processed to be ± 0.02 mm or less. Then, the contact pins 52 and 54 are attached to the polishing table 5.
The squareness when fixed at 0 is set to ± 1 second or less.

If such a processing precision is selected, FIG.
As shown in FIG. 6 and FIG. 6, respectively, the exposure lens 26 is fixedly mounted or attached to the polishing table 50 so that the reference surfaces 42 and 44 of the exposure lens 26 properly contact the contact pins 52 and 54. Then, the center of the polishing table 50 completely coincides with the optical axis q of the exposure lens 26. By the way, when the processing accuracy is as above, the reproducibility of pasting is ± 0.01m.
It was confirmed to be within m. The exposure lens 26 can be attached and fixed to the polishing table 50 with an accuracy 10 times or more higher than the visual level. A polishing process is performed so that the lens surface 26u becomes a predetermined aspherical surface with the exposure lens 26 mounted and fixed.

In order to make the lens surface 26u have a predetermined curvature, the lens surface 26u may be molded by a mold in addition to the polishing process.
In this case, the upper and lower surfaces of the exposure lens 26 are lens spherical surfaces (female surface and male surface). In this case, either lens surface is processed so that this lens surface becomes a flat surface this time. Grind. Even in such a case, a polishing table as shown in FIG. 5 can be used as a mounting table for the exposure lens.

FIG. 7 shows an exposure lens device 2 according to the present invention.
0 embodiment is shown. The exposure lens device 20 has a mounting housing 60 for mounting and fixing the exposure lens 26. In this embodiment, as the mounting case 60, the configuration of an exposure lens device that exposes by stacking three exposure lenses in the same manner as described in the conventional example is illustrated.

A through hole 62 having a predetermined diameter centered on the central axis z is bored in the mounting case 60, and two mounting recesses 64 and 66 are sequentially provided with the inner diameters thereof being changed. A mounting flat portion 68 is provided on the uppermost surface. Each of the mounting recesses 64 and 66 has a shape that fits the outer shape of the exposure lens to be mounted, but the mounting recesses 64 and 66 have a sufficient margin even when the exposure lens 26 is mounted as shown in FIG. Recesses 64 and 66 are formed. Since the mounting recesses have the same configuration, only the mounting recess 64 will be described.

FIG. 8 shows an embodiment of the mounting recess 64, in which the exposure lens 26 is placed on the central axis z of the recess bottom surface 64a.
When mounted so that the optical axis p of (26a) coincides,
A plurality of contact pins 70 and 72 are vertically fixed at positions where the reference surfaces 42 and 44 of the exposure lens 26a come into contact with each other.

Therefore, two contact pins (metal rods) 70, 70 having a predetermined diameter are located at positions apart from the central axis z by Wy in the y-axis direction and at equal intervals with the y-axis interposed.
Is fixed in place. In addition, Wx in the x-axis direction from the central axis z
A single contact pin 72 having a predetermined diameter is fixed at a position separated by a distance and passing through the central axis z.

The abutting pins 70, 72 are machined so that the surface roughness of the abutting pins 70, 72 is, for example, JIS Rmax 5S or less, and therefore ± 5 μm or less.
The processing tolerance up to 72 is processed to be ± 0.02 mm or less. Further, the perpendicularity when the contact pins 70 and 72 are fixed to the bottom surface 64a of the recess by standing is set to be ± 1 second or less.

When the processing precision is selected as shown in FIG.
When the exposure lens 26 is mounted in the mounting recess 64 so that the reference surfaces 42, 44 of the exposure lens 26a correctly contact the contact pins 70, 72 as shown in FIG.
The center of 4 perfectly coincides with the optical axis p of the exposure lens 26. By the way, it was confirmed that the mounting reproducibility was within ± 0.01 mm when the processing accuracy was as described above.

Then, in order to fix the exposure lens 26a in the mounting recess 64, pressing means 74, 76 as shown are provided. The pressing means 74, 76 are on the x-axis and y
One of the pressing means 74 is provided on the shaft.
The first reference surface 42 is pressed by the pair of contact pins 7
0, 70 is kept in contact with the contact pin 7 and the second reference surface 44 is pressed by the other pressing means 76.
The state of being in contact with 2 is retained.

The pressing means 74 and 76 are both springs such as a coil spring 80 and a pressing member 82 as shown in FIGS. 7 and 8.
The coil spring 80 has one end fixed to the fixing pin 84 and the other end to which the pressing member 82 is attached. The pressing member 82 is a square member, and the surface in contact with the outer peripheral surface of the exposure lens 26a has the same curvature as the exposure lens 26a. As a result, the pressing force of the coil spring 80 is correctly transmitted on the x-axis and the y-axis as shown in FIG. 9, and the exposure lens 26a can be correctly set at the desired position.

In order to make the pressing force of the pressing means 74, 76 properly on the shaft, grooves 86, 88 are formed on the bottom surface 64a of the recess as shown in FIG. 10, and the insides of the grooves 86, 88 are pressed. It is also possible to configure 74 and 76 to move back and forth. In that case, it is preferable that the pressing members 74 and 76 themselves be provided with a concave groove and the coil spring 80 is arranged in the concave groove. The same configuration as shown in FIG. 8 and subsequent figures is also applied to the upper mounting recess 66. Although the uppermost mounting plane portion 68 is not formed with a step portion,
The structure is the same as that of the mounting recesses 64 and 66, and therefore the description thereof is omitted.

Further, when the diameters of the exposure lenses 26 are different from each other and the diameter of the exposure lens mounted on the upper stage is gradually increased, the pressing state of the contact pin is stabilized. In order to secure the property, the diameter of the contact pin to be planted may be gradually increased. Mounting recesses 64, 6
6 and the mounting flat surface portion 68 respectively, the exposure lens 26
When a, 26b, and 26c are mounted and fixed, as shown in FIG. 11, the depths of the mounting recesses 64 and 66 that are not in contact with each other are selected in consideration of mutual refractive indexes. Be present.

Now, the plurality of exposure lenses 26 are mounted in the exposure lens device 20 thus constructed in the state as shown in FIG. 11. In this case, the mounting recesses 64 and 66 are mounted.
Since the size of is larger than the exposure lens 26 to be mounted, the mounting in the mounting recesses 64 and 66 can be performed relatively easily. There is no fear that the surface of the exposure lens will be damaged due to the sufficient mounting space.

When the exposure lens 26 is mounted, the reference surfaces 42, 44 provided on the exposure lens 26 are orthogonal to the corresponding contact pins 70, 72 by the action of the pair of pressing means 74, 76 provided on the exposure lens 26. The contact is made while maintaining the state, and the state is maintained. In this abutting state, the central axis z is completely aligned with the optical axis of the exposure lens 26, and therefore, the axis aligning work (positioning work of the exposure lens 26 is performed only by pressing the pressing means 74 and 76 against the exposure lens 26. ) Is completed and the axis alignment work time can be greatly reduced. Therefore, even an unskilled worker can perform the exposure work. Since the axis alignment accuracy can be set to ± 0.01 mm or less as described above, it is possible to mount the lens with higher accuracy.

Since the alignment accuracy is improved, the reproducibility regarding the mounting of the exposure lens 26 is guaranteed. As a result, the reliability of the test exposure process for determining the quality of mounting is increased, and the number of test exposure processes can be reduced. Since the mounting position of the exposure lens is specified as a secondary effect, distortion of the aspherical surface of the exposure lens can be specified easily, and the cost of manufacturing the exposure lens itself can be significantly reduced. . Further, by using such an exposure lens device, even if a plurality of exposure lens devices are prepared, mutual mechanical variations are reduced. Can be significantly shortened.

In the above-described embodiment, the reference planes 42, 4
Although the number of contact pins abutting with No. 4 is different, the same number can be used as a matter of course, and the axis alignment can be performed with higher accuracy. The number of lenses used as an exposure lens, the combination of a flat lens and an aspherical lens at that time, and the like can be selected according to the purpose of exposure.

[0042]

As described above, according to the present invention, the exposure lens is provided with two reference surfaces which are orthogonal to each other. Further, in the present invention, a plurality of contact pins that contact these reference surfaces are provided in the mounting recess at positions corresponding to the exposure lens having two reference surfaces. According to this, by strictly controlling the processing roughness and the processing tolerance of the reference surface and the contact pin, the optical axis of the exposure lens can be mounted only by bringing the reference surface of the exposure lens into contact with the contact pin. The central axis of the concave portion can be accurately aligned.

According to the present invention, the alignment of the exposure lens is completed simply by bringing the reference surface of the exposure lens into contact with the abutment pin. Since the mounting recess can be made sufficiently larger than the exposure lens, there are practical benefits such as the work of mounting the exposure lens in the mounting recess is simple.

Further, according to the present invention, since the reproducibility regarding the mounting of the exposure lens is guaranteed, the reliability of the test exposure process for determining the quality of the mounting is increased, and the number of test exposure processes is increased accordingly. Can be reduced.
Since the mounting position of the exposure lens is specified as a secondary effect, distortion of the aspherical surface of the exposure lens can be specified easily, and the cost of manufacturing the exposure lens itself can be significantly reduced. It has characteristics.

Further, by using such an exposure lens device, even if a plurality of the exposure lens devices are prepared, the mechanical variation between them is reduced, so that the alignment adjustment when the exposure lens is replaced is made. The time can be greatly reduced compared to the past. Therefore, the present invention is extremely suitable when applied to an exposure lens used for making phosphors for various cathode ray tubes and an exposure lens device using the same.

[Brief description of drawings]

FIG. 1 is a plan view showing an embodiment of an exposure lens according to the present invention.

FIG. 2 is a side view thereof.

FIG. 3 is a plan view of a polishing table of an exposure lens.

FIG. 4 is a side view thereof.

FIG. 5 is a plan view when an exposure lens is placed on a polishing table.

FIG. 6 is a side view thereof.

FIG. 7 is a sectional view showing an embodiment of an exposure lens device according to the present invention.

FIG. 8 is a partial plan view thereof.

FIG. 9 is a plan view showing a state where an exposure lens is mounted.

FIG. 10 is a partial plan view of a state of use showing another embodiment of the exposure lens device.

11 is a partial cross-sectional view of FIG.

FIG. 12 is a sectional view showing a relationship between a panel and a phosphor layer.

FIG. 13 is a conceptual diagram of an exposure processing apparatus.

FIG. 14 is an explanatory diagram of exposure processing (No. 1).

FIG. 15 is an explanatory diagram of exposure processing (No. 2).

FIG. 16 is a partial cross-sectional view of a conventional exposure lens device.

FIG. 17 is a plan view of an exposure lens used therein.

FIG. 18 is a side view thereof.

FIG. 19 is a plan view of the exposure lens device when the exposure lens is attached.

FIG. 20 is an explanatory diagram of a clearance.

[Explanation of symbols]

10 ... CRT, 12 ... Panel, 14 ... Phosphor layer, 16 ... Aperture grille, 26 ... Exposure lens, 24 ... Light source, 20 ... Exposure device, 4
2, 44 ... Reference plane, 60 ... Housing, 64, 66 ...
..Mounting recesses, 68 ... Mounting flat surfaces, 70, 72
... Abutting pins, 74,76 ... Pressing means

Claims (6)

[Claims] 1. An exposure lens used when a phosphor layer is formed in a predetermined pattern through a color selection mechanism, the exposure lens having first and second reference planes used as orientation flats. An exposure lens, wherein the second reference plane is provided so as to be orthogonal to the first reference plane. 2. An exposure lens device used when forming a phosphor in a predetermined pattern through a color selection mechanism, the exposure lens device having first and second reference planes used as orientation flats. A mounting housing for mounting the lens is provided, and the mounting housing is provided with a plurality of mounting recesses for the exposure lens, and is a bottom surface of the mounting recess for mounting positions of the exposure lens. A contact pin is planted so as to contact the first and second reference surfaces in accordance with the above, and the reference surface is fixed in contact with these contact pins. apparatus. 3. A contact pin for the first reference surface is 1
2. The exposure lens device according to claim 1, wherein when it is a book, two abutment pins abut on the second reference surface. 4. The pressing means for pressing the mounted exposure lens to the contact pin side is provided on the bottom surface side facing the contact pin. Exposure lens device. 5. The exposure lens apparatus according to claim 3, wherein each of the pressing means is provided corresponding to a reference surface. 6. The exposure lens apparatus according to claim 3, wherein the pressing means is a coil spring.