JP2003026417A - Method for producing silica sol and silica-based composite oxide sol - Google Patents
Method for producing silica sol and silica-based composite oxide solInfo
- Publication number
- JP2003026417A JP2003026417A JP2001213055A JP2001213055A JP2003026417A JP 2003026417 A JP2003026417 A JP 2003026417A JP 2001213055 A JP2001213055 A JP 2001213055A JP 2001213055 A JP2001213055 A JP 2001213055A JP 2003026417 A JP2003026417 A JP 2003026417A
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- Japan
- Prior art keywords
- silica
- sol
- aqueous solution
- electrolyte
- alkali silicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
(57)【要約】
【課題】 生産効率に優れ、粒子成長速度が速く、
粒子径が均一で安定なシリカゾルおよびシリカ系複合酸
化物ゾルを製造する。
【解決手段】 核粒子分散液または珪酸アルカリ水溶液
に、電解質の存在下、珪酸アルカリ水溶液を添加して核
粒子を成長させ、シリカゾルを製造する。また、核粒子
分散液または珪酸アルカリ水溶液に、電解質の存在下、
珪酸アルカリ水溶液と珪素以外の金属塩もしくは非金属
塩水溶液を添加して核粒子を成長させ、シリカ系複合酸
化物ゾルを製造する。前記電解質は強酸の塩からなるも
のであって、供給される珪酸アルカリ中のアルカリの当
量数(EA )と当該電解質の当量数(EE )の比(EA
/EE )が、0. 5〜8の範囲にあることが好ましい。
前記珪酸アルカリ水溶液の添加後は、40〜150℃の
温度範囲で10分間〜3時間、混合液を熟成する。ま
た、この混合液を脱イオンして、残存アニオン量をSi
O2 の0. 01重量%以下としてもよい。(57) [Summary] [Problem] To be excellent in production efficiency, fast in particle growth rate,
A silica sol and a silica-based composite oxide sol having a uniform and stable particle diameter are produced. SOLUTION: An alkali silicate aqueous solution is added to a core particle dispersion or an alkali silicate aqueous solution in the presence of an electrolyte to grow core particles, thereby producing a silica sol. In addition, in the presence of an electrolyte in a nuclear particle dispersion or an aqueous solution of an alkali silicate,
An aqueous solution of an alkali silicate and an aqueous solution of a metal salt or a non-metal salt other than silicon are added to grow core particles, thereby producing a silica-based composite oxide sol. The electrolyte comprises a salt of a strong acid, and the ratio (E A ) of the number of equivalents (E A ) of the alkali in the supplied alkali silicate to the number of equivalents (E E ) of the electrolyte.
/ E E ) is preferably in the range of 0.5 to 8.
After the addition of the alkali silicate aqueous solution, the mixture is aged in a temperature range of 40 to 150 ° C. for 10 minutes to 3 hours. The mixture was deionized to reduce the amount of residual anions to Si.
The content may be 0.01% by weight or less of O 2 .
Description
【0001】[0001]
【発明の属する技術分野】本発明は、核粒子の粒子成長
を利用したシリカゾルおよびシリカ系複合酸化物ゾルの
製造方法に関するものである。TECHNICAL FIELD The present invention relates to a method for producing a silica sol and a silica-based composite oxide sol by utilizing the particle growth of core particles.
【0002】[0002]
【従来の技術】シリカゾル、アルミナゾル、チタニアゾ
ル、シリカアルミナゾル、シリカジルコニアゾル等の無
機酸化物ゾルは、プラスチック混和剤、フィルムフィラ
ー、屈折率調整材、透明基材のコート材、各種バインダ
ー、研磨用粒子、インクジェット受容層用フィラー等、
種々の用途に用いられている。上記無機酸化物ゾルの製
造方法として、本願出願人は特開昭63−64911号
公報において、核粒子の分散液に酸性珪酸液(珪酸アル
カリを脱アルカリして得た珪酸)を添加して核粒子を粒
子成長させるに際して、核粒子が大きくなると酸性珪酸
液の添加速度を小さくすることにより粒径分布の均一な
ゾルが得られることを開示している。また、特開平5−
132309号公報では、同様に複合酸化物ゾルの製造
方法を開示している。しかしながら、従来のシリカゾル
の製造方法では、酸性珪酸液を供給して核粒子を成長さ
せる際、シリカの溶解度が低いために酸性珪酸液の供給
速度を早くすることができず、特に核粒子の粒子径が大
きくなるとこれに逆比例して核粒子の表面積が小さくな
るために酸性珪酸液のシリカ析出速度が遅くなる。一
方、酸性珪酸液の供給速度を速めると核粒子以外に微細
粒子が発生し、得られるゾルの粒子径が不均一になった
り、安定性が低下したり、場合によってはゲル化すると
いう問題があった。Inorganic oxide sols such as silica sol, alumina sol, titania sol, silica alumina sol, silica zirconia sol are plastic admixtures, film fillers, refractive index adjusting materials, transparent base material coating materials, various binders, and polishing particles. , Filler for inkjet receiving layer, etc.
It is used for various purposes. As a method for producing the above-mentioned inorganic oxide sol, the applicant of the present application has disclosed in Japanese Patent Laid-Open No. 63-64911 that an acidic silicic acid solution (silicic acid obtained by dealkalizing alkali silicate) is added to a dispersion of core particles to form a core. It is disclosed that, when growing particles, if the core particles become large, the sol having a uniform particle size distribution can be obtained by decreasing the addition rate of the acidic silicic acid solution. In addition, JP-A-5-
Japanese Laid-Open Patent Publication No. 132309 similarly discloses a method for producing a composite oxide sol. However, in the conventional method for producing a silica sol, when the acidic silicic acid solution is supplied to grow the core particles, it is not possible to increase the supply rate of the acidic silicic acid solution because the solubility of silica is low. As the diameter increases, the surface area of the core particles decreases in inverse proportion to this, and the silica deposition rate of the acidic silicic acid solution decreases. On the other hand, when the supply speed of the acidic silicic acid solution is increased, fine particles are generated in addition to the core particles, resulting in a problem that the particle diameter of the obtained sol becomes nonuniform, the stability decreases, and in some cases gelation occurs. there were.
【0003】また、酸性珪酸液はイオン交換樹脂などを
用いて珪酸アルカリを脱アルカリして得られるものであ
るが、このとき珪酸の濃度がSiO2 として5〜7重量
%を越えると不安定となり、珪酸液の製造上および使用
上の制約が課せられている。更に、前記イオン交換樹脂
は再生して使用するため、生産効率が低いといった問題
点も指摘されている。特開昭58−110417号公報
には、アルカリ金属の可溶性塩が40〜1000ppm
存在する活性な酸性シリカゾル(即ち、酸性珪酸液)を
用いることにより、所望の粒子径で均一な粒子径分布を
有するシリカ粒子からなるシリカゾルを製造する方法が
開示されている。しかしながら、この方法も前記したよ
うに活性な酸性シリカゾルを製造しなければならず、生
産効率は必ずしも満足すべきものとはならない。The acidic silicic acid solution is obtained by dealkalizing alkali silicate using an ion exchange resin or the like. At this time, if the concentration of silicic acid exceeds 5 to 7% by weight as SiO 2 , it becomes unstable. However, there are restrictions on the production and use of silicic acid solutions. Further, it has been pointed out that the above-mentioned ion exchange resin is regenerated and used, so that the production efficiency is low. JP-A-58-110417 discloses that a soluble salt of an alkali metal is 40 to 1000 ppm.
A method for producing a silica sol composed of silica particles having a desired particle size and a uniform particle size distribution by using an existing active acidic silica sol (that is, an acidic silicic acid solution) is disclosed. However, this method also has to produce an active acidic silica sol as described above, and the production efficiency is not always satisfactory.
【0004】[0004]
【発明が解決しようとする課題】本発明は、生産効率に
優れ、粒子成長速度が速く、粒子径が均一で安定なシリ
カゾルおよびシリカ系複合酸化物ゾルの製造方法を提供
することを目的とするものである。SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for producing a silica sol and a silica-based complex oxide sol which have excellent production efficiency, a high particle growth rate, a uniform particle size, and a stable particle size. It is a thing.
【0005】[0005]
【課題を解決するための手段】本発明に係るシリカゾル
またはシリカ系複合酸化物ゾルの製造方法は、下記I液
に電解質の存在下、II液を添加して核粒子を成長させる
ことを特徴とするものである。
I液:核粒子分散液または珪酸アルカリ水溶液
II液:珪酸アルカリ水溶液または珪酸アルカリ水溶液と
珪素以外の金属塩もしくは非金属塩水溶液
前記電解質は強酸の塩からなるものであって、供給され
る珪酸アルカリ中のアルカリの当量数(EA )と当該電
解質の当量数(EE )の比(EA /EE )が、0. 5〜
8の範囲にあることが好ましい。前記II液を添加した
後、40〜150℃の温度範囲で10分間〜3時間、混
合液を熟成することが好ましい。前記混合液を脱イオン
して、残存アニオン量をSiO2 の0. 01重量%以下
とすることが好ましい。前記いずれか記載の方法で得ら
れたシリカゾルまたはシリカ系複合酸化物ゾルを、前記
核粒子分散液として用いることが好ましい。前記いずれ
か記載の方法で得られたシリカゾルまたはシリカ系複合
酸化物ゾルを有機溶媒で置換することが好ましい。A method for producing a silica sol or a silica-based composite oxide sol according to the present invention is characterized in that solution II is added to solution I described below in the presence of an electrolyte to grow core particles. To do. Solution I: Nuclear particle dispersion or aqueous solution of alkali silicate Solution II: Aqueous solution of alkaline silicate or aqueous solution of alkaline silicate and aqueous solution of metal salt or non-metal salt other than silicon The electrolyte comprises a salt of a strong acid and is supplied by an alkali silicate solution. number of equivalents of alkali in (E a) and the number of equivalents of said electrolyte (E E) of the ratio (E a / E E) is 0. 5
It is preferably in the range of 8. After adding the liquid II, it is preferable to age the mixed liquid for 10 minutes to 3 hours in the temperature range of 40 to 150 ° C. It is preferable to deionize the mixed solution so that the amount of residual anions is 0.01% by weight or less of SiO 2 . It is preferable to use the silica sol or the silica-based composite oxide sol obtained by any one of the methods described above as the core particle dispersion liquid. It is preferable to replace the silica sol or the silica-based composite oxide sol obtained by the method described above with an organic solvent.
【0006】[0006]
【発明の実施の形態】以下、本発明に係るシリカゾルお
よびシリカ系複合酸化物ゾルの製造方法について具体的
に説明する。BEST MODE FOR CARRYING OUT THE INVENTION The method for producing a silica sol and a silica-based composite oxide sol according to the present invention will be specifically described below.
【0007】〔I液〕核粒子分散液としては、従来公知
のシリカゾル、アルミナゾル等、金属酸化物の微粒子分
散ゾルを用いることができる。また、珪酸アルカリ、ア
ルミン酸ソーダなどを希釈あるいは中和して核粒子分散
液を調製することもできる。このようなシリカゾルとし
ては、本願出願人の出願による特開昭63−64911
号公報に記載の方法で得られるシリカゾル、あるいはこ
のときシード粒子として用いられる比較的小さな粒子径
を有するシリカ粒子の分散液は好適に用いることができ
る。核粒子の粒子径は、最終的に得ようとするゾルの粒
子径によっても異なり特に制限はないが、100nm以
下、さらには50nm以下であることが好ましい。核粒
子の粒子径が100nmを越えると、通常、核粒子自体
を得る為に要する時間が長くなり、製造時間を短縮でき
るという効果が得られない。なお、粒子径の下限は、核
粒子として機能すれば特に制限はないが珪酸のオリゴマ
ー以上、特に10量体以上であることが好ましい。[Liquid I] As the core particle dispersion liquid, a conventionally known silica sol, alumina sol, or other fine particle dispersion sol of metal oxide can be used. Further, the core particle dispersion liquid can be prepared by diluting or neutralizing alkali silicate, sodium aluminate, and the like. Such silica sol is disclosed in Japanese Patent Application Laid-Open No. 63-64911 filed by the applicant of the present application.
The silica sol obtained by the method described in JP-A No. 2003-242242, or a dispersion liquid of silica particles having a relatively small particle size used as seed particles at this time can be preferably used. The particle size of the core particles depends on the particle size of the sol to be finally obtained and is not particularly limited, but is preferably 100 nm or less, and more preferably 50 nm or less. When the particle size of the core particles exceeds 100 nm, the time required to obtain the core particles themselves generally becomes long, and the effect of shortening the manufacturing time cannot be obtained. The lower limit of the particle size is not particularly limited as long as it functions as a core particle, but it is preferably an oligomer of silicic acid or more, and particularly a decamer or more.
【0008】核粒子分散液の濃度は、核粒子の粒子径に
よっても異なるが酸化物として0.005〜10重量
%、さらには0. 01〜5重量%の範囲にあることが好
ましい。核粒子分散液の濃度が0. 005重量%未満の
場合は、核粒子が少なすぎて、珪酸アルカリ水溶液の供
給速度を遅くする必要があり、供給速度を低下させない
場合は新たな微粒子が発生し、これが核粒子として作用
するため得られるゾルの粒子径分布がブロードになるこ
とがある。核粒子分散液の濃度が10重量%を越える
と、濃度が高すぎて珪酸アルカリ水溶液を供給する際に
核粒子同士が凝集することがあり、この場合も粒子径分
布がブロードになるとともに互いに付着した粒子が生成
する傾向がある。The concentration of the core particle dispersion varies depending on the particle size of the core particles, but is preferably in the range of 0.005 to 10% by weight, more preferably 0.01 to 5% by weight as an oxide. When the concentration of the core particle dispersion liquid is less than 0.005% by weight, the core particles are too small and it is necessary to slow down the supply rate of the alkaline silicate aqueous solution. , The particle size distribution of the obtained sol may become broad because it acts as a core particle. If the concentration of the core particle dispersion exceeds 10% by weight, the core particles may coagulate when the alkaline silicate aqueous solution is supplied because the concentration is too high. In this case as well, the particle size distribution becomes broad and the particles adhere to each other. The particles tend to form.
【0009】核粒子分散液のpHは8〜12、特に9.
5〜11. 5の範囲にあることが望ましい。pHが8未
満の場合は、核粒子表面の反応性が低いため、供給する
珪酸アルカリが表面に析出する速度が遅く、このため未
反応の珪酸アルカリが増加したり、新たな微粒子が発生
し、これが核粒子として作用するため得られるゾルの粒
子径分布がブロードになったり、凝集粒子が得られるこ
とがある。pHが12を越えると、シリカの溶解度が高
くなるためシリカの析出が遅くなり、このため粒子成長
が遅くなる傾向がある。上記核粒子分散液のpH調整は
アルカリ添加によって行い、NaOH、KOHなどのア
ルカリ金属水酸化物や、アンモニア水、第4級アンモニ
ウムハイドロオキサイド、アミン化合物等を用いること
ができる。なお、上記核粒子分散液の調製時の分散液の
温度には特に制限はなく、通常10〜30℃の範囲であ
る。The pH of the core particle dispersion is 8-12, especially 9.
It is desirable to be in the range of 5 to 11.5. When the pH is less than 8, the reactivity of the surface of the core particles is low, and the rate at which the supplied alkali silicate deposits on the surface is slow, and therefore unreacted alkali silicate increases or new fine particles are generated. Since this acts as a core particle, the particle size distribution of the obtained sol may become broad or agglomerated particles may be obtained. If the pH exceeds 12, the solubility of silica will be high and the precipitation of silica will be delayed, which tends to delay the particle growth. The pH of the nuclear particle dispersion liquid is adjusted by adding an alkali, and an alkali metal hydroxide such as NaOH or KOH, ammonia water, a quaternary ammonium hydroxide or an amine compound can be used. The temperature of the dispersion liquid at the time of preparing the core particle dispersion liquid is not particularly limited and is usually in the range of 10 to 30 ° C.
【0010】本発明では、前記核粒子分散液の代わり
に、珪酸ナトリウム、珪酸カリウムなどの珪酸アルカリ
水溶液を用いてもよい。即ち、このような核粒子非分散
液に後述する珪酸アルカリ水溶液(または珪酸アルカリ
水溶液と珪素以外の金属塩もしくは非金属塩水溶液)を
添加することによっても、シリカゾルまたはシリカ系複
合酸化物ゾルを得ることができる。これは、該水溶液の
添加初期に珪酸アルカリ水溶液中に微細粒子が生成し、
以後これが核粒子として働くためである。In the present invention, an aqueous solution of alkali silicate such as sodium silicate or potassium silicate may be used instead of the core particle dispersion liquid. That is, a silica sol or a silica-based complex oxide sol can also be obtained by adding an alkaline silicate aqueous solution (or an alkaline silicate aqueous solution and an aqueous solution of a metal salt or non-metal salt other than silicon) described below to such a non-dispersed core particle. be able to. This is because fine particles are generated in the alkaline silicate aqueous solution at the initial stage of adding the aqueous solution,
This is because this acts as a nuclear particle thereafter.
【0011】〔II液〕本発明では、前記核粒子分散液
(または前記核粒子非分散液、以下同じ)に、電解質水
溶液と、珪酸アルカリ水溶液(シリカ系複合酸化物ゾル
を製造する場合には、珪酸アルカリ水溶液および珪素以
外の金属塩または非金属塩水溶液。以下同じ。)とを添
加して核粒子の粒子成長を行う。電解質水溶液はあらか
じめ核粒子分散液に一部または全部を添加しておくこと
もできるが、珪酸アルカリ水溶液と共に連続的にあるい
は断続的に添加することが好ましい。[Liquid II] In the present invention, an aqueous solution of an electrolyte and an aqueous solution of an alkali silicate (in the case of producing a silica-based complex oxide sol, are added to the nuclear particle dispersion (or the non-nuclear particle dispersion, the same applies hereinafter). , An aqueous solution of alkali silicate and an aqueous solution of a metal salt other than silicon or a non-metal salt (the same applies hereinafter)) to grow core particles. The electrolyte aqueous solution may be partially or wholly added to the core particle dispersion in advance, but it is preferably added continuously or intermittently together with the alkali silicate aqueous solution.
【0012】珪酸アルカリとしては、LiOH、NaO
H、KOH、RbOH、CsOH、NH4 OH、四級ア
ンモニウムハイドライドなどの珪酸アルカリ塩が挙げら
れる。中でも、珪酸ナトリウム(水硝子)、珪酸カリウ
ム等は好適に用いることができる。また、テトラエチル
オルソシリケート(TEOS)などの加水分解性有機化
合物を過剰のNaOHなどを用いて加水分解して得られ
る珪酸アルカリ水溶液なども好適である。Examples of alkali silicates are LiOH and NaO.
Examples thereof include silicic acid alkali salts such as H, KOH, RbOH, CsOH, NH 4 OH, and quaternary ammonium hydride. Among them, sodium silicate (water glass), potassium silicate and the like can be preferably used. Further, an alkali silicate aqueous solution obtained by hydrolyzing a hydrolyzable organic compound such as tetraethyl orthosilicate (TEOS) with an excess of NaOH or the like is also suitable.
【0013】前記珪素以外の金属塩または非金属塩とし
ては、Al、B、Ti、Zr、Sn、Ce、P、Sb、
Mo、Zn、W等から選ばれる元素のオキソ酸のアルカ
リ金属塩、アルカリ土類金属塩、アンモニウム塩、第四
級アンモニウム塩を挙げることができ、具体的には、ア
ルミン酸ナトリウム、四硼酸ナトリウム、炭酸ジルコニ
ウムアンモニウム、アンチモン酸カリウム、錫酸カリウ
ム、アルミノ珪酸ナトリウム、モリブデン酸ナトリウ
ム、硝酸セリウムアンモニウム、リン酸ナトリウムなど
が好適である。シリカ系複合酸化物ゾルの製造におい
て、珪酸アルカリ水溶液と珪素以外の金属塩または非金
属塩の水溶液の供給量は、シリカをSiO2 で表しシリ
カ以外の酸化物をMOX で表したときのモル比(MOX
/SiO2 )が0. 05〜5、特に0. 1〜2の範囲に
あることが望ましい。モル比が0. 05未満では、シリ
カ以外の成分を導入する効果が得られず、モル比が5を
越えると、シリカの粒子成長が妨げられるとともに、未
反応のシリカやシリカ以外の成分が増加して粒子が凝集
することがある。モル比(MOX /SiO2 )が前記範
囲にあれば、粒子径分布が均一で安定性に優れたシリカ
系複合酸化物ゾルを得ることができる。Examples of the metal salt or non-metal salt other than silicon include Al, B, Ti, Zr, Sn, Ce, P, Sb,
Examples thereof include alkali metal salts, alkaline earth metal salts, ammonium salts, and quaternary ammonium salts of oxo acids of elements selected from Mo, Zn, W, and the like, specifically, sodium aluminate, sodium tetraborate. Preferred are ammonium zirconium carbonate, potassium antimonate, potassium stannate, sodium aluminosilicate, sodium molybdate, cerium ammonium nitrate, sodium phosphate, and the like. In the production of the silica-based complex oxide sol, the amount of the alkali silicate aqueous solution and the aqueous solution of the metal salt or non-metal salt other than silicon supplied is the mol when silica is represented by SiO 2 and the oxide other than silica is represented by MO X. Ratio (MO X
/ SiO 2 ) is preferably in the range of 0.05 to 5, particularly 0.1 to 2. If the molar ratio is less than 0.05, the effect of introducing a component other than silica cannot be obtained, and if the molar ratio exceeds 5, silica particle growth is hindered and unreacted silica and components other than silica increase. Then, the particles may aggregate. When the molar ratio (MO X / SiO 2 ) is within the above range, a silica-based composite oxide sol having a uniform particle size distribution and excellent stability can be obtained.
【0014】珪酸アルカリ水溶液を添加する際の分散液
の温度は40〜150℃、さらには60〜100℃の範
囲にあることが望ましい。温度が40℃未満では、珪酸
の反応速度が遅く、未反応の珪酸が多くなったり、所望
の大きさの粒子が得られないことがある。分散液の温度
が150℃を越えると、操作圧力が高くなり過ぎて装置
費用が高くなると共に生産能力が低下し経済性が低下す
る問題がある。また、反応速度、粒子成長速度を速める
効果も実用的には小さい。The temperature of the dispersion when adding the alkali silicate aqueous solution is preferably in the range of 40 to 150 ° C, more preferably 60 to 100 ° C. When the temperature is lower than 40 ° C., the reaction rate of silicic acid is slow, the amount of unreacted silicic acid may increase, and particles having a desired size may not be obtained. When the temperature of the dispersion liquid exceeds 150 ° C., there is a problem that the operating pressure becomes too high, the cost of the apparatus becomes high, the production capacity is lowered, and the economical efficiency is lowered. Further, the effect of increasing the reaction rate and the particle growth rate is small in practice.
【0015】珪酸アルカリ水溶液の添加量は得ようとす
るゾルの粒子径によって適宜選択することができる。ま
た、珪酸アルカリ水溶液の添加速度は分散液の温度によ
っても異なるが、分散液中の核粒子の合計外部表面積に
比例させて増減することができ、新たな微細粒子が生成
しない範囲で添加速度を速めることができる。本発明で
は「添加速度」を、核粒子単位表面積(m2 )における
SiO2 の1時間当たりの供給重量(g)で表す。ここ
で、「核粒子の表面積」とは核粒子を球と見なし平均粒
子径を用いて計算される球体の外部表面積とする。本発
明においてシリカの供給速度は、SiO2 として0. 0
05〜0. 5g/核粒子単位表面積(m2 )・時間、特
に、0. 01〜0. 3g/核粒子単位表面積(m2 )・
時間、の範囲にあることが好ましい。なお、シリカ系複
合酸化物ゾルの製造において、珪酸アルカリ水溶液およ
び珪素以外の金属塩または非金属塩水溶液を添加する際
には、「SiO2 」を「SiO2 +MOX 」と読み替え
るものとする。また、本発明方法では珪酸アルカリ水溶
液の添加は断続的であっても良いことから、供給速度と
は平均供給速度をいうものとする。前記添加速度が0.
005g/核粒子単位表面積(m2 )・時間未満では、
通常の珪酸液を供給してビルドアップ(粒子成長)する
方法と大きな違いが無く、速度を速める効果が得られな
い。また、前記添加速度が0. 5g/核粒子単位表面積
(m2 )・時間を越えると、新たな微細粒子が生成し、
粒子径分布が広く、不均一になることがあり、場合によ
っては粒子が凝集することがある。The addition amount of the aqueous alkali silicate solution can be appropriately selected depending on the particle size of the sol to be obtained. The addition rate of the aqueous alkali silicate solution also varies depending on the temperature of the dispersion, but it can be increased or decreased in proportion to the total external surface area of the core particles in the dispersion, and the addition rate can be adjusted within the range where new fine particles are not formed. You can speed it up. In the present invention, the "addition rate" is expressed by the weight (g) of the SiO 2 supplied per unit time (m 2 ) of the core particles per hour. Here, the "surface area of the core particle" is the external surface area of the sphere calculated by using the average particle diameter by regarding the core particle as a sphere. In the present invention, the supply rate of silica is 0.02 as SiO 2.
05-0.5 g / nuclear particle unit surface area (m 2 ) · time, particularly 0.01 to 0.3 g / nuclear particle unit surface area (m 2 ) ·
It is preferably in the range of time. In addition, in the production of the silica-based composite oxide sol, when adding an aqueous solution of alkali silicate and an aqueous solution of a metal salt or a non-metal salt other than silicon, “SiO 2 ” is read as “SiO 2 + MO X ”. Further, in the method of the present invention, the addition of the alkali silicate aqueous solution may be intermittent, so the feed rate means the average feed rate. The addition rate is 0.
Below 005 g / nuclear particle unit surface area (m 2 ) · hour,
There is no big difference from the method of supplying buildup (particle growth) by supplying an ordinary silicic acid solution, and the effect of increasing the speed cannot be obtained. Moreover, when the addition rate exceeds 0.5 g / nuclear particle unit surface area (m 2 ) · time, new fine particles are generated,
The particle size distribution may be wide, non-uniform, and in some cases particles may aggregate.
【0016】〔電解質〕本発明に用いる電解質として
は、従来公知の酸と塩基とからなり水に可溶の塩を用い
ることができる。特に、強酸の塩からなる電解質は、珪
酸アルカリのアルカリを受容することができ、このとき
核粒子の粒子成長に用いられる珪酸を生成するので好ま
しい。このような強酸の塩からなる水可溶性の電解質と
しては、硫酸、硝酸、塩酸などの強酸のナトリウム塩、
カリウム塩、リチウム塩、ルビジウム塩、セシウム塩、
アンモニウム塩、カルシウム塩、マグネシウム塩などが
挙げられる。また、カリウム明礬、アンモニウム明礬等
の硫酸の複塩である明礬も好適である。[Electrolyte] As the electrolyte used in the present invention, a water-soluble salt composed of a conventionally known acid and base can be used. In particular, an electrolyte composed of a salt of a strong acid is preferable because it can accept an alkali of silicic acid alkali, and at this time, generate silicic acid used for grain growth of core particles. Examples of the water-soluble electrolyte composed of such a strong acid salt include sodium salts of strong acids such as sulfuric acid, nitric acid and hydrochloric acid,
Potassium salt, lithium salt, rubidium salt, cesium salt,
Examples thereof include ammonium salt, calcium salt, magnesium salt and the like. Further, alum which is a double salt of sulfuric acid such as potassium alum and ammonium alum is also suitable.
【0017】上記電解質の量は、供給される珪酸アルカ
リ中のアルカリの当量数(EA )と電解質の当量数(E
E )の比(EA /EE )が、0. 5〜8、特に0. 5〜
5の範囲にあることが好ましい。なお、シリカ系複合酸
化物ゾルの製造において、珪酸アルカリ水溶液および珪
素以外の金属塩または非金属塩水溶液を添加する際に
は、前記「珪酸アルカリ中のアルカリの当量数
(EA )」を「珪酸アルカリ中のアルカリと珪素以外の
金属塩もしくは非金属塩中のアルカリ、アルカリ土類金
属の合計等量数(EA )」と読み替えるものとする。電
解質の比(EA /EE )が0. 5未満の場合は、分散液
中の電解質塩濃度が高すぎて、粒子が凝集することがあ
る。電解質の比(EA /EE )が8を越えると、電解質
の量が少ないため粒子の成長速度が充分早くならず、従
来の酸性珪酸液を供給して核粒子の粒子成長を行うのと
変わるところがなく、また、前記した電解質が珪酸アル
カリのアルカリを受容して核粒子の粒子成長に用いられ
る珪酸の生成が少なくなり、所望の粒子径の粒子を得る
ことができないことがある。また、電解質はEA /EE
が上記範囲にあるとともに、分散液中の電解質の濃度が
0. 05〜2重量%の範囲にあることが好ましい。この
ような電解質は、その一部または全部を核粒子分散液に
添加して用いてもよく、珪酸アルカリ水溶液とともに連
続的にあるいは断続的に添加してもよい。このときの電
解質の量も、珪酸アルカリの量と前記した当量数の比の
関係にあることが好ましい。The amount of the above-mentioned electrolyte is the equivalent number (E A ) of the alkali in the supplied alkali silicate and the equivalent number (E A ) of the electrolyte.
The ratio of E) (E A / E E ) is 0.5 to 8, particularly 0.5 5
It is preferably in the range of 5. In the production of the silica-based composite oxide sol, when adding a metal salt or a nonmetal salt solution other than alkali silicate aqueous solution and silicon, wherein the "number of equivalents of alkali in the alkali silicate (E A)" " It should be read as "the total equivalent number (E A ) of the alkali in the alkali silicate and the alkali or alkaline earth metal in the metal salt other than silicon or the non-metal salt". When the electrolyte ratio (E A / E E ) is less than 0.5, the concentration of the electrolyte salt in the dispersion is too high, and the particles may aggregate. When the electrolyte ratio (E A / E E ) exceeds 8, the amount of electrolyte is small and the particle growth rate does not increase sufficiently. Therefore, conventional acidic silicic acid solution is supplied to grow core particles. There is no change, and the above-mentioned electrolyte receives the alkali of silicic acid alkali, and the production of silicic acid used for the grain growth of the core particles is reduced, so that particles having a desired grain size may not be obtained. Also, the electrolyte is E A / E E
Is in the above range, and the concentration of the electrolyte in the dispersion is preferably in the range of 0.05 to 2% by weight. A part or all of such an electrolyte may be added to the nuclear particle dispersion for use, or may be added continuously or intermittently together with the aqueous alkali silicate solution. The amount of the electrolyte at this time is also preferably in the relation of the ratio of the amount of alkali silicate to the above-mentioned number of equivalents.
【0018】また、上記分散液には必要に応じて、水を
添加したりあるいは濃縮して分散液中のSiO2 (また
は、SiO2 +MOX )の濃度が0. 5〜10重量%、
さらには1〜7重量%の範囲となるように調節すること
が好ましい。SiO2 (または、SiO2 +MOX )濃
度が0. 5重量%未満の場合は、濃度が低すぎて生産効
率が低く、また使用に際して濃縮を必要とすることがあ
る。他方、SiO2 (または、SiO2 +MOX )濃度
が10重量%を越えると、シリカ粒子の凝集が起きる傾
向があり、均一な粒子径のシリカ粒子が単分散したゾル
が得られないことがある。珪酸アルカリ水溶液を供給し
て核粒子を成長させる間は、必要に応じてアルカリまた
は酸を添加しながら分散液のpHを8〜13、好ましく
は10〜12の範囲に維持することが望ましい。添加す
るアルカリとしては、水酸化ナトリウム、水酸化カリウ
ム、水酸化リチウム、アンモニア水、あるいはトリエチ
ルアミン、トリエタノールアミンなどのアミン類を用い
ることができ、酸としては塩酸、硝酸、硫酸、あるいは
酢酸などの有機酸を用いることができる。If necessary, water may be added to or concentrated in the above dispersion liquid so that the concentration of SiO 2 (or SiO 2 + MO x ) in the dispersion liquid is 0.5 to 10% by weight.
Further, it is preferable to adjust the content to be in the range of 1 to 7% by weight. When the SiO 2 (or SiO 2 + MO X ) concentration is less than 0.5% by weight, the concentration is too low and the production efficiency is low, and concentration may be required before use. On the other hand, when the SiO 2 (or SiO 2 + MO X ) concentration exceeds 10% by weight, the silica particles tend to aggregate, and a sol in which silica particles having a uniform particle size are monodispersed may not be obtained. . While the alkaline silicate aqueous solution is supplied to grow the core particles, it is desirable to maintain the pH of the dispersion liquid in the range of 8 to 13, preferably 10 to 12, while adding an alkali or an acid as needed. As the alkali to be added, sodium hydroxide, potassium hydroxide, lithium hydroxide, aqueous ammonia, or amines such as triethylamine and triethanolamine can be used. Examples of the acid include hydrochloric acid, nitric acid, sulfuric acid, acetic acid, and the like. Organic acids can be used.
【0019】〔熟成・脱イオン〕上記珪酸アルカリ水溶
液を添加した後、必要に応じてこれを熟成する。熟成温
度は40〜150℃、好ましくは60〜100℃の範
囲、熟成時間は熟成温度によっても異なるが10分間〜
3時間程度である。このような熟成を行うことによって
粒子径がより均一で、安定性に優れたシリカゾルおよび
シリカ系複合酸化物ゾルを得ることができる。[Aging / Deionization] After the above alkaline silicate aqueous solution is added, it is aged if necessary. The aging temperature is in the range of 40 to 150 ° C., preferably 60 to 100 ° C., and the aging time is 10 minutes depending on the aging temperature.
It takes about 3 hours. By performing such aging, it is possible to obtain a silica sol having a more uniform particle size and excellent stability, and a silica-based composite oxide sol.
【0020】次いで、分散液の温度を概ね40℃以下に
冷却した後、分散液中のイオンを除去することが望まし
い。分散液中のイオンを除去する方法としては従来公知
の方法を採用することができ、例えば、限外濾過膜法、
イオン交換樹脂法、イオン交換膜法などの方法が挙げら
れる。脱イオンは、残存するアニオン量がSiO2 の
0. 01重量%以下、好ましくは0. 005重量%以下
とすることが好ましい。残存イオン量が0. 01重量%
以下であれば、後述する濃度によっても異なるが、充分
な安定性を備えたシリカゾルを得ることができ、多くの
用途において不純物等としての悪影響も見られない。得
られたシリカゾルは、必要に応じて濃縮する。濃縮方法
としては通常、限外濾過膜法、蒸留法あるいはこれらの
組合せからなる方法などが採用され、濃縮後のシリカゾ
ルの濃度はSiO2 (またはSiO2 +MOX )に換算
して概ね10〜50重量%の範囲である。当該シリカゾ
ルは、使用に際して適宜希釈して、あるいはさらに濃縮
して用いられる。Next, after cooling the temperature of the dispersion liquid to about 40 ° C. or lower, it is desirable to remove the ions in the dispersion liquid. As a method for removing ions in the dispersion liquid, a conventionally known method can be adopted, for example, an ultrafiltration membrane method,
Examples thereof include an ion exchange resin method and an ion exchange membrane method. For deionization, the amount of remaining anions is preferably 0.01% by weight or less, and more preferably 0.005% by weight or less of SiO 2 . Residual ion amount is 0.01% by weight
If the amount is below, a silica sol having sufficient stability can be obtained, although it varies depending on the concentration described below, and no adverse effects such as impurities are observed in many applications. The obtained silica sol is concentrated if necessary. As a concentration method, an ultrafiltration membrane method, a distillation method or a method consisting of a combination thereof is usually adopted, and the concentration of the silica sol after concentration is approximately 10 to 50 in terms of SiO 2 (or SiO 2 + MO X ). It is in the range of% by weight. The silica sol is used by appropriately diluting it before use or further concentrating it.
【0021】〔オルガノゾル〕上記水分散シリカゾルま
たは水分散シリカ系複合酸化物ゾルの分散媒を、有機溶
媒で置換することによってオルガノゾルを製造すること
ができる。置換方法としては従来公知の方法を採用する
ことができ、有機溶媒の沸点が概ね水より高い場合に
は、有機溶媒を加えて蒸留することによって得ることが
できる。また、有機溶媒の沸点が低い場合には本願出願
人の出願による特開昭59−8614号公報に開示した
限外濾過膜法などによって得ることができる。得られる
オルガノゾルの濃度はSiO2 (またはSiO2 +MO
X )に換算して10〜50重量%の範囲である。また、
このオルガノゾルは、使用に際して適宜希釈して、ある
いはさらに濃縮して用いることができる。[Organosol] An organosol can be produced by substituting an organic solvent for the dispersion medium of the above water-dispersed silica sol or water-dispersed silica-based composite oxide sol. As a substitution method, a conventionally known method can be adopted, and when the boiling point of the organic solvent is generally higher than that of water, it can be obtained by adding an organic solvent and distilling. When the boiling point of the organic solvent is low, it can be obtained by the ultrafiltration membrane method disclosed in Japanese Patent Application Laid-Open No. 59-8614 filed by the applicant of the present application. The concentration of the obtained organosol is SiO 2 (or SiO 2 + MO
It is in the range of 10 to 50% by weight in terms of X ). Also,
This organosol can be appropriately diluted or further concentrated before use.
【0022】[0022]
【発明の効果】本発明方法では、電解質の存在下で珪酸
塩、珪素以外の金属塩または非金属塩を添加して核粒子
を粒子成長させることにより、珪酸塩、珪素以外の金属
または非金属塩金属塩の供給速度を早くしても新たな微
細粒子が生成することなく核粒子が粒子成長し、極めて
安定な単分散シリカゾルおよびシリカ系複合酸化物ゾル
が得られる。According to the method of the present invention, silicate, a metal salt other than silicon or a non-metal salt is added in the presence of an electrolyte to grow core particles, whereby a metal or non-metal other than silicate or silicon is added. Even if the supply rate of the salt metal salt is increased, core particles grow without generating new fine particles, and extremely stable monodisperse silica sol and silica-based composite oxide sol can be obtained.
【0023】[0023]
【実施例】以下に、本発明の実施例を述べる。EXAMPLES Examples of the present invention will be described below.
【0024】〔実施例1〕核粒子分散液(A)の調製
シリカゾル(触媒化成工業(株)製:カタロイドSI−
50、粒子径25nm、SiO2 濃度48重量%)9.
6gと水877. 9gを混合し、これに濃度5重量%の
NaOH水溶液32. 5gを添加して、分散液のpHを
10. 5とし、ついで、分散液の温度を95℃に昇温
し、30分間95℃に維持して核粒子分散液(A)を調
製した。核粒子分散液(A)の性状を表1に示す。核粒子の成長
ついで、温度を95℃に維持した核粒子分散液(A)
に、水硝子(洞海化学(株)製:JIS3号水硝子、S
iO2 濃度24重量%)605. 8gと水4240. 9
gとを混合して得た珪酸アルカリ水溶液と、電解質とし
て硫酸アンモニウム(三菱化学(株)製)77. 5gと
水4481. 3gとを混合して得た電解質水溶液を19
時間で添加した。このときの添加速度は0. 017Si
O2 g/核粒子単位表面積(m2 )・時間、アルカリと
電解質の当量比EA /EE は1. 33であった。つい
で、1時間熟成を行った後、限外濾過膜により成長核粒
子分散液のpHが10になるまで洗浄を行った。つい
で、濃縮してSiO2 濃度20重量%のシリカゾル
(A)を得た。この核粒子成長条件を表2に示すと共
に、得られたシリカゾル(A)の平均粒子径および粒子
径の標準偏差、粘度および熱安定性を測定し、結果を表
3に示す。なお、熱安定性は70℃の恒温槽でシリカゾ
ルのゲル化までの時間を観察し、以下の評価基準により
評価した。
○:1週間以上ゲル化することなく安定なゾル
×:1週間以内に粘度が高くなるか、ゲル化したゾルオルガノゾル(A)の調製
上記シリカゾル(A)の一部に、イソプロピルアルコー
ルを加えて蒸留し、SiO2 濃度20重量%のオルガノ
ゾル(AIPA )を得た。また、別に一部を取り、限外濾
過膜を用いメチルアルコールに置換してオルガノゾル
(AMOH )を得た。何れのゾルも安定なオルガノゾルで
あった。[Example 1] Preparation of core particle dispersion liquid (A) Silica sol (manufactured by Catalysts & Chemicals Industry: Cataloid SI-
50, particle diameter 25 nm, SiO 2 concentration 48% by weight) 9.
6 g of water and 877.9 g of water were mixed, and 32.5 g of a 5% by weight aqueous solution of NaOH was added to adjust the pH of the dispersion to 10.5, and then the temperature of the dispersion was raised to 95 ° C. The core particle dispersion liquid (A) was prepared by maintaining the temperature at 95 ° C. for 30 minutes. Table 1 shows the properties of the nuclear particle dispersion liquid (A). Growth of nuclear particles Next, nuclear particle dispersion liquid (A) in which the temperature was maintained at 95 ° C.
Water glass (manufactured by Dokai Chemical Industry Co., Ltd .: JIS No. 3 water glass, S
iO 2 concentration 24% by weight) 605.8 g and water 4240.9
19 g of an aqueous solution of alkali silicate obtained by mixing g and 77.5 g of ammonium sulfate (manufactured by Mitsubishi Chemical Corporation) as an electrolyte and 4481.3 g of water.
Added in time. The addition rate at this time is 0.017Si
O 2 g / nuclear particle unit surface area (m 2 ) · hour, the equivalent ratio of alkali to electrolyte E A / E E was 1.33. Then, after aging for 1 hour, washing was performed with an ultrafiltration membrane until the pH of the growth nucleus particle dispersion became 10. Then, it was concentrated to obtain a silica sol (A) having a SiO 2 concentration of 20% by weight. The core particle growth conditions are shown in Table 2, the average particle diameter of the obtained silica sol (A), the standard deviation of the particle diameter, the viscosity and the thermal stability were measured, and the results are shown in Table 3. The thermal stability was evaluated according to the following evaluation criteria by observing the time until gelation of the silica sol in a constant temperature bath at 70 ° C. ◯: stable sol without gelation for 1 week or more x: viscosity increased within 1 week or gelled sol organosol (A) preparation Isopropyl alcohol was added to a part of the silica sol (A). Distillation gave an organosol (A IPA ) having a SiO 2 concentration of 20% by weight. An aliquot was taken and replaced with methyl alcohol using an ultrafiltration membrane to obtain an organosol ( AMOH ). All the sols were stable organosols.
【0025】〔実施例2〕実施例1において、珪酸アル
カリ水溶液と電解質水溶液とを25時間で添加した以外
は実施例1と同様にしてSiO2 濃度20重量%のシリ
カゾル(B)を得た。このときの添加速度は0. 013
SiO2 g/核粒子単位表面積(m2 )・時間であっ
た。上記シリカゾル(B)から、実施例1と同様にして
オルガノゾル(BIPA )、オルガノゾル(BMOH )を得
た。何れも安定なオルガノゾルであった。Example 2 A silica sol (B) having a SiO 2 concentration of 20% by weight was obtained in the same manner as in Example 1 except that the alkaline silicate aqueous solution and the electrolytic aqueous solution were added in 25 hours. The addition rate at this time is 0.013
SiO 2 g / nuclear particle unit surface area (m 2 ) · hour. From the silica sol (B), an organosol (B IPA ) and an organosol (B MOH ) were obtained in the same manner as in Example 1. All were stable organosols.
【0026】〔実施例3〕実施例1において、珪酸アル
カリ水溶液と電解質水溶液とを8時間で添加した以外は
実施例1と同様にしてSiO2 濃度20重量%のシリカ
ゾル(C)を得た。このときの添加速度は0. 041S
iO2 g/核粒子単位表面積(m2 )・時間であった。
上記シリカゾル(C)から、実施例1と同様にしてオル
ガノゾル(CIPA )、オルガノゾル(CMOH )を得た。
何れも安定なオルガノゾルであった。Example 3 A silica sol (C) having a SiO 2 concentration of 20% by weight was obtained in the same manner as in Example 1 except that the alkali silicate aqueous solution and the electrolyte aqueous solution were added in 8 hours. The addition rate at this time is 0.041S
It was iO 2 g / unit particle surface area (m 2 ) · hour.
From the silica sol (C), an organosol (C IPA ) and an organosol (C MOH ) were obtained in the same manner as in Example 1.
All were stable organosols.
【0027】〔実施例4〕核粒子分散液(D)の調製
実施例1で得たシリカゾル(A)(粒子径100nm、
SiO2 濃度20重量%)23gと水858. 5gを混
合し、これに濃度5重量%のNaOH水溶液18. 5g
を添加し、分散液のpHを10. 5とし、ついで、分散
液の温度を150℃に昇温し、30分間150℃に維持
して核粒子分散液(D)を調製した。核粒子の成長
ついで、温度を150℃に維持した核粒子分散液(A)
に、水硝子(洞海化学(株)製:JIS3号水硝子、S
iO2 濃度24重量%)605. 8gと水4240. 9
gとを混合して得た珪酸アルカリ水溶液と、電解質とし
て硫酸アンモニウム(三菱化学(株)製)77. 5gと
水4481. 3gとを混合して得た電解質水溶液を24
時間で添加した。このときの添加速度は0. 48SiO
2 g/核粒子単位表面積(m2 )・時間、アルカリと電
解質の当量比EA /EE は1. 33であった。ついで、
150℃で1時間熟成を行った後、限外濾過膜により成
長核粒子分散液のpHが10になるまで洗浄を行った。
ついで、濃縮してSiO2 濃度20重量%のシリカゾル
(D)を得た。オルガノゾル(D)の調製
上記シリカゾル(D)から、実施例1と同様にしてオル
ガノゾル(DIPA )、オルガノゾル(DMOH )を得た。
何れも安定なオルガノゾルであった。Example 4 Preparation of Nuclear Particle Dispersion Liquid (D) The silica sol (A) obtained in Example 1 (particle size 100 nm,
SiO 2 concentration 20% by weight) 23 g and water 858.5 g are mixed, and 5% by weight concentration of NaOH aqueous solution 18.5 g is mixed with this.
Was added to adjust the pH of the dispersion to 10.5, and then the temperature of the dispersion was raised to 150 ° C. and maintained at 150 ° C. for 30 minutes to prepare a nuclear particle dispersion (D). Growth of nuclear particles Next, nuclear particle dispersion liquid (A) maintained at a temperature of 150 ° C
Water glass (manufactured by Dokai Chemical Industry Co., Ltd .: JIS No. 3 water glass, S
iO 2 concentration 24% by weight) 605.8 g and water 4240.9
24 g of an aqueous solution of alkali silicate obtained by mixing g and 24 g of an aqueous solution of ammonium sulfate (manufactured by Mitsubishi Chemical Corporation) 77.5 g and water 4481.3 g as an electrolyte.
Added in time. The addition rate at this time is 0.48SiO
2 g / nuclear particle unit surface area (m 2 ) · hour, the equivalent ratio E A / E E of alkali to electrolyte was 1.33. Then,
After aging at 150 ° C. for 1 hour, it was washed with an ultrafiltration membrane until the pH of the growth nucleus particle dispersion became 10.
Then, it was concentrated to obtain a silica sol (D) having a SiO 2 concentration of 20% by weight. Preparation of organosol (D) From the silica sol (D), organosol (D IPA ) and organosol (D MOH ) were obtained in the same manner as in Example 1.
All were stable organosols.
【0028】〔実施例5〕核粒子の成長
実施例1と同様にして核粒子分散液(A)を調製し、温
度を95℃に維持した核粒子分散液(A)に、水硝子
(洞海化学(株)製:JIS3号水硝子、SiO 2 濃度
24重量%)88. 32gと水271. 6gとを混合し
て得た珪酸アルカリ水溶液と、アルミン酸ナトリウム水
溶液(Al2 O3 濃度22重量%、Na2O濃度17重
量%)27. 2gと水514. 4gとを混合して得たア
ルミン酸ナトリウム水溶液と、電解質として硫酸アンモ
ニウム(三菱化学(株)製)11.4gと水286. 8
gとを混合して得た電解質水溶液を11時間で添加し
た。このときの添加速度は、0. 006(SiO2 +A
l2 O3 )g/核粒子単位表面積(m2 )・時間、アル
カリ(珪酸アルカリとアルミン酸ナトリウムのアルカリ
との和)と電解質の当量比EA /EE は2.18であっ
た。ついで、1時間熟成を行った後、限外濾過膜により
成長核粒子分散液のpHが10になるまで洗浄を行っ
た。ついで、濃縮して(SiO2 +Al2 O3 )濃度が
20重量%のシリカゾル(E)を得た。オルガノゾル(E)の調製
上記シリカゾル(E)から、実施例1と同様にしてオル
ガノゾル(EIPA )、オルガノゾル(EMOH )を得た。
何れも安定なオルガノゾルであった。[Embodiment 5]Nuclear particle growth
A nuclear particle dispersion liquid (A) was prepared in the same manner as in Example 1, and the temperature was adjusted.
To the core particle dispersion (A) whose temperature was maintained at 95 ° C.
(Doikai Chemical Co., Ltd .: JIS No. 3 water glass, SiO 2concentration
24 wt%) 88.32 g and 271.6 g of water are mixed.
Alkaline silicate aqueous solution obtained with
Solution (Al2O3Concentration 22% by weight, Na2O concentration 17-fold
%) 27.2 g and 514.4 g of water
Aqueous sodium luminate solution and ammonium sulfate as electrolyte
Nitrogen (manufactured by Mitsubishi Chemical Corporation) 11.4 g and water 286.8
and the aqueous electrolyte solution obtained by mixing
It was The addition rate at this time was 0.006 (SiO 22+ A
l2O3) G / nuclear particle unit surface area (m2) ・ Time, Al
Potassium (alkali silicate and sodium aluminate alkali
And the equivalent ratio E of the electrolyte and EA/ EEIs 2.18
It was Then, after aging for 1 hour, using an ultrafiltration membrane
Wash until the pH of the growth nucleus particle dispersion becomes 10.
It was Then, concentrate (SiO 22+ Al2O3) Concentration
20 wt% silica sol (E) was obtained.Preparation of organosol (E)
From the silica sol (E), the same procedure as in Example 1 was conducted.
Ganosol (EIPA), Organosol (EMOH) Got.
All were stable organosols.
【0029】〔実施例6〕核粒子の成長
水硝子(洞海化学(株)製:JIS3号水硝子、SiO
2 濃度24重量%)0. 5gと水899. 5gとを混合
して得た珪酸アルカリ水溶液を95℃に昇温し、これ
に、水硝子(洞海化学(株)製:JIS3号水硝子、S
iO2 濃度24重量%)605. 8gと水4240. 9
gとを混合して得た珪酸アルカリ水溶液と、電解質とし
て硫酸アンモニウム(三菱化学(株)製)77. 5gと
水4481. 3gとを混合して得た電解質水溶液を19
時間で添加した。本実施例では、電解質水溶液等の添加
開始後30分経過した時点で、一旦その添加を30分間
停止し、核粒子の自己発生と粒子径の均一化を行った。
得られた核粒子の平均粒子径は3nmであった。このと
きの添加速度は、0. 036SiO2 g/核粒子単位表
面積(m2 )・時間、アルカリと電解質の等量比EA /
EE は1. 33であった。ついで、1時間熟成を行った
後、限外濾過膜により成長核粒子分散液のpHが10に
なるまで洗浄を行った。ついで、濃縮してSiO2 濃度
20重量%のシリカゾル(F)を得た。オルガノゾル(F)の調製
上記シリカゾル(F)から、実施例1と同様にしてオル
ガノゾル(FIPA )、オルガノゾル(FMOH )を得た。
何れも安定なオルガノゾルであった。[Example 6] Growth of nuclear particles Water glass (manufactured by Dokai Chemical Industry Co., Ltd .: JIS No. 3 water glass, SiO)
(2 concentration 24% by weight) 0.5 g of water and 899.5 g of water were mixed to obtain an alkali silicate aqueous solution, and the temperature was raised to 95 ° C., and water glass (manufactured by Dokai Kagaku Co., Ltd .: JIS No. 3 water glass) , S
iO 2 concentration 24% by weight) 605.8 g and water 4240.9
19 g of an aqueous solution of alkali silicate obtained by mixing g and 77.5 g of ammonium sulfate (manufactured by Mitsubishi Chemical Corporation) as an electrolyte and 4481.3 g of water.
Added in time. In this example, 30 minutes after the start of the addition of the aqueous electrolyte solution or the like, the addition was temporarily stopped for 30 minutes to self-generate core particles and make the particle diameter uniform.
The average particle size of the obtained core particles was 3 nm. At this time, the addition rate was 0.036 SiO 2 g / nuclear particle unit surface area (m 2 ) · hour, the equivalence ratio E A of alkali and electrolyte /
E E was 1.33. Then, after aging for 1 hour, washing was performed with an ultrafiltration membrane until the pH of the growth nucleus particle dispersion became 10. Then, it was concentrated to obtain a silica sol (F) having a SiO 2 concentration of 20% by weight. Preparation of Organosol (F) From the above silica sol (F), organosol (F IPA ) and organosol (F MOH ) were obtained in the same manner as in Example 1.
All were stable organosols.
【0030】〔実施例7〕実施例1と同様にして核粒子
分散液(A)を調製し、ついで、電解質として硫酸アン
モニウム77. 5gの代わりに硫酸ナトリウム83. 3
gを用いた以外は実施例1と同様にしてSiO2 濃度2
0重量%のシリカゾル(G)を得た。上記シリカゾル
(G)から、実施例1と同様にしてオルガノゾル(G
IPA )、オルガノゾル(GMOH )を得た。何れも安定な
オルガノゾルであった。Example 7 A nuclear particle dispersion (A) was prepared in the same manner as in Example 1, and then 77.3 g of ammonium sulfate was used as an electrolyte instead of 73.3 g of sodium sulfate.
A SiO 2 concentration of 2 was obtained in the same manner as in Example 1 except that g was used.
0 wt% silica sol (G) was obtained. From the silica sol (G), the organosol (G
IPA ) and organosol (G MOH ) were obtained. All were stable organosols.
【0031】〔実施例8〕実施例1と同様にして核粒子
分散液(A)を調製し、ついで、電解質として硫酸アン
モニウム38. 8gと水4519gとを用いた以外は実
施例1と同様にしてSiO2 濃度20重量%のシリカゾ
ル(H)を得た。上記シリカゾル(H)から、実施例1
と同様にしてオルガノゾル(HIPA )、オルガノゾル
(HMOH )を得た。何れも安定なオルガノゾルであっ
た。[Example 8] A nuclear particle dispersion (A) was prepared in the same manner as in Example 1, and then, as in Example 1, except that 38.8 g of ammonium sulfate and 4519 g of water were used as electrolytes. A silica sol (H) having a SiO 2 concentration of 20% by weight was obtained. Example 1 from the above silica sol (H)
In the same manner as described above, organosol (H IPA ) and organosol (H MOH ) were obtained. All were stable organosols.
【0032】〔比較例1〕実施例1において、電解質と
しての硫酸アンモニウム(三菱化学(株)製)77. 5
gの代わりに水77. 5gを用い(即ち、電解質を用い
ることなく)、珪酸アルカリ水溶液と水を19時間で添
加した以外は実施例1と同様にしてシリカゾル(I)を
得た。上記シリカゾル(I)から、実施例1と同様にし
てオルガノゾル(IIPA )、オルガノゾル(IMOH )を
得た。何れも安定なオルガノゾルであった。[Comparative Example 1] In Example 1, ammonium sulfate (produced by Mitsubishi Chemical Corporation) 77.5 as an electrolyte was used.
Silica sol (I) was obtained in the same manner as in Example 1 except that 77.5 g of water was used instead of g (that is, without using an electrolyte), and an aqueous alkali silicate solution and water were added over 19 hours. From the above silica sol (I), organosols (I IPA) in the same manner as in Example 1 to obtain an organosol (I MOH). All were stable organosols.
【0033】〔比較例2〕核粒子の成長
実施例1と同様にして調製した核粒子分散液(A)の温
度を95℃に維持し、これに水硝子(JIS3号水硝
子、SiO2 濃度5重量%)を脱アルカリして得た酸性
珪酸液(pH2. 2、SiO2 濃度5重量%)2900
gを95時間で添加した。このときの添加速度は0. 0
03SiO2 g/核粒子単位表面積(m2)・時間であ
った。ついで、1時間熟成を行った後、限外濾過膜によ
り成長核粒子分散液のpHが10になるまで洗浄を行っ
た。ついで、濃縮してSiO2 濃度20重量%のシリカ
ゾル(J)を得た。オルガノゾル(J)の調製
上記シリカゾル(J)から、実施例1と同様にしてオル
ガノゾル(JIPA )、オルガノゾル(JMOH )を得た。
何れも安定なオルガノゾルであった。Comparative Example 2 Growth of Nuclear Particles The temperature of the nuclear particle dispersion liquid (A) prepared in the same manner as in Example 1 was maintained at 95 ° C., and water glass (JIS No. 3 water glass, SiO 2 concentration) was added thereto. Acidified silicic acid solution (pH 2.2, SiO 2 concentration 5% by weight) obtained by dealkalizing 5% by weight) 2900
g was added in 95 hours. The addition rate at this time is 0.0
03 SiO 2 g / nuclear particle unit surface area (m 2 ) · hour. Then, after aging for 1 hour, washing was performed with an ultrafiltration membrane until the pH of the growth nucleus particle dispersion became 10. Then, it was concentrated to obtain a silica sol (J) having a SiO 2 concentration of 20% by weight. Preparation of organosol (J) From the above silica sol (J), organosol (J IPA ) and organosol (J MOH ) were obtained in the same manner as in Example 1.
All were stable organosols.
【0034】[0034]
【表1】 I 液 電 解 質 核粒子 平均粒径 pH 種類 当量比 (nm) (*1) E A /E E 実施例1 有 25 10.5 硫安 1.33 実施例2 有 25 10.5 硫安 1.33 実施例3 有 25 10.5 硫安 1.33 実施例4 有 100 10.5 硫安 1.33 実施例5 有 25 10.5 硫安 2.18 実施例6 無 3 9.8 硫安 1.33 実施例7 有 25 10.5 硫ナ 1.33 実施例8 有 25 10.5 硫安 0.67 比較例1 有 25 10.5 − − 比較例2 有 25 10.5 − − (*1) 硫安:硫酸アンモニウム、 硫ナ:硫酸ナトリウムTABLE 1 I liquid electrolytic electrolyte core particles having an average particle diameter pH type equivalent ratio (nm) (* 1) E A / E E Example 1 Yes 25 10.5 Ammonium sulfate 1.33 Example 2 Yes 25 10.5 Ammonium sulfate 1.33 Example 3 Yes 25 10.5 Ammonium sulphate 1.33 Example 4 Yes 100 10.5 Ammonium sulphate 1.33 Example 5 Yes 25 10.5 Ammonium sulphate 2.18 Example 6 No 3 9.8 Ammonium sulphate 1.33 Example 7 Yes 25 10.5 Na sulphate 1.33 Example 8 Yes 25 10.5 Ammonium sulphate 0.67 Comparative Example 1 Yes 25 10.5 − − Comparative Example 2 Yes 25 10.5 − − (* 1) Ammonium sulfate: ammonium sulfate, sulfur sulfate: sodium sulfate
【0035】[0035]
【表2】 II 液(*2) 添 加 条 件 熟 成 珪酸 他の MO X 添加速度 濃度 pH 温度 時間 アルカリ 金属塩 /SiO 2 (g/m2・hr) (wt%) (℃) (hr) 実施例1 W − 0 0.017 1.5 11.5 95 1 実施例2 W − 0 0.013 1.5 11.5 95 1 実施例3 W − 0 0.041 1.5 11.5 95 1 実施例4 W − 0 0.480 1.5 11.5 150 1 実施例5 W NaAl 0.33 0.006 1.5 11.7 95 1 実施例6 W − 0 0.036 1.5 11.5 95 1 実施例7 W − 0 0.017 1.5 11.7 95 1 実施例8 W − 0 0.017 1.5 11.6 95 1 比較例1 W − 0 0.017 1.5 12.0 95 1 比較例2 A − 0 0.003 3.9 10.1 95 1 (*2) W:水硝子、A:酸性珪酸液、NaAl:アルミン酸ナトリウム[Table 2] Liquid II (* 2) added condition Aged silicic acid and other MO X addition rate Concentration pH Temperature Time Alkali metal salt / SiO 2 (g / m 2 · hr) (wt%) (℃) (hr ) Example 1 W-0 0.017 1.5 11.5 95 1 Example 2 W-0 0.013 1.5 11.5 95 1 Example 3 W-0 0.041 1.5 11.5 95 1 Example 4 W-0 0.480 1.5 11.5 150 1 Example 5 W NaAl 0.33 0.006 1.5 11.7 95 1 Example 6 W-0 0.036 1.5 11.5 95 1 Example 7 W-0 0.017 1.5 11.7 95 1 Example 8 W-0 0.017 1.5 11.6 95 1 Comparative Example 1 W-0 0.017 1.5 12.0 95 1 Comparative Example 2 A-0 0.003 3.9 10.1 95 1 (* 2) W: water glass, A: acidic silicic acid solution, NaAl: sodium aluminate
【0036】[0036]
【表3】 [Table 3]
フロントページの続き (72)発明者 榎本 直幸 福岡県北九州市若松区北湊町13−2 触媒 化成工業株式会社若松工場内 Fターム(参考) 4G072 AA28 CC01 CC02 EE01 EE07 GG01 GG02 HH02 HH18 HH24 JJ13 JJ30 MM01 PP01 PP02 RR12 4G073 BA57 BD06 CE01 FB28 FD14Continued front page (72) Inventor Naoyuki Enomoto 13-2 Kitaminato-cho, Wakamatsu-ku, Kitakyushu, Fukuoka Kasei Industry Co., Ltd. Wakamatsu factory F term (reference) 4G072 AA28 CC01 CC02 EE01 EE07 GG01 GG02 HH02 HH18 HH24 JJ13 JJ30 MM01 PP01 PP02 RR12 4G073 BA57 BD06 CE01 FB28 FD14
Claims (6)
して核粒子を成長させることを特徴とするシリカゾルま
たはシリカ系複合酸化物ゾルの製造方法。I液:核粒子
分散液または珪酸アルカリ水溶液II液:珪酸アルカリ水
溶液または珪酸アルカリ水溶液と珪素以外の金属塩もし
くは非金属塩水溶液1. A method for producing a silica sol or a silica-based complex oxide sol, which comprises adding a solution II to the following solution I in the presence of an electrolyte to grow core particles. Solution I: Nuclear particle dispersion or alkaline silicate aqueous solution II: Alkali silicate aqueous solution or alkaline silicate aqueous solution and metal salt or non-metal salt aqueous solution other than silicon
って、供給される珪酸アルカリ中のアルカリの当量数
(EA )と当該電解質の当量数(EE )の比(EA /E
E )が、0. 5〜8の範囲にある請求項1記載のシリカ
ゾルまたはシリカ系複合酸化物ゾルの製造方法。2. The electrolyte comprises a salt of a strong acid, and the ratio (E A / E) of the equivalent number (E A ) of alkali in the supplied alkali silicate and the equivalent number (E E ) of the electrolyte.
The method for producing a silica sol or a silica-based composite oxide sol according to claim 1, wherein E ) is in the range of 0.5 to 8.
の温度範囲で10分間〜3時間、混合液を熟成する請求
項1または請求項2記載のシリカゾルまたはシリカ系複
合酸化物ゾルの製造方法。3. After adding the liquid II, 40 to 150 ° C.
The method for producing a silica sol or a silica-based complex oxide sol according to claim 1 or 2, wherein the mixed solution is aged in the temperature range of 10 minutes to 3 hours.
ン量をSiO2 の0. 01重量%以下とする請求項1〜
請求項3のいずれか記載のシリカゾルまたはシリカ系複
合酸化物ゾルの製造方法。4. The mixture is deionized so that the amount of residual anions is 0.01% by weight or less of SiO 2 .
The method for producing the silica sol or the silica-based composite oxide sol according to claim 3.
法で得られたシリカゾルまたはシリカ系複合酸化物ゾル
を、前記核粒子分散液として用いる請求項1〜請求項4
のいずれか記載のシリカゾルまたはシリカ系複合酸化物
ゾルの製造方法。5. A silica sol or a silica-based complex oxide sol obtained by the method according to any one of claims 1 to 4 is used as the core particle dispersion liquid.
8. A method for producing the silica sol or the silica-based composite oxide sol according to any one of 1.
法で得られたシリカゾルまたはシリカ系複合酸化物ゾル
を有機溶媒で置換するオルガノゾルの製造方法。6. A method for producing an organosol, wherein the silica sol or the silica-based complex oxide sol obtained by the method according to claim 1 is replaced with an organic solvent.
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| JP2006021938A (en) * | 2004-07-06 | 2006-01-26 | Catalysts & Chem Ind Co Ltd | Method for producing silica-based fine particles, coating film-forming coating material, and coated substrate |
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| JP2008169102A (en) * | 2006-10-12 | 2008-07-24 | Catalysts & Chem Ind Co Ltd | Konpira sugar-like sol and process for producing the same |
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