JP2003017267A - Organic electroluminescent display device and manufacturing method - Google Patents
Organic electroluminescent display device and manufacturing methodInfo
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- JP2003017267A JP2003017267A JP2001204607A JP2001204607A JP2003017267A JP 2003017267 A JP2003017267 A JP 2003017267A JP 2001204607 A JP2001204607 A JP 2001204607A JP 2001204607 A JP2001204607 A JP 2001204607A JP 2003017267 A JP2003017267 A JP 2003017267A
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- emitting layer
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Abstract
(57)【要約】
【課題】偏光を発光させ光の利用効率が改善された、か
つ生産性を向上して、より安価な有機ＥＬ素子およびそ
の製造方法を提供する。
【解決手段】基板上に電極と発光層と対向電極とを設け
た有機エレクトロルミネッセンス素子において、前記発
光層が少なくとも高分子材料と溶媒からなる発光層形成
用溶液を用いる塗工法または印刷法にて形成されてな
り、かつ、偏光度０．３以上の偏光性を有する。更に、
発光層が分子量１万以上の高分子材料からなること、及
び、基板上及び電極上に発光層をせん断をかけながら形
成することも含まれる。
[PROBLEMS] To provide a less expensive organic EL element which emits polarized light to improve the light use efficiency and improve productivity, and a method for manufacturing the same. In an organic electroluminescence element having an electrode, a light emitting layer, and a counter electrode provided on a substrate, the light emitting layer is formed by a coating method or a printing method using a light emitting layer forming solution comprising at least a polymer material and a solvent. It is formed and has a polarization property of a polarization degree of 0.3 or more. Furthermore,
This also includes that the light emitting layer is made of a polymer material having a molecular weight of 10,000 or more, and that the light emitting layer is formed on the substrate and the electrode while applying shear thereto.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は有機エレクトロルミ
ネセンス表示素子に関し、より詳細には、偏光を発する
有機エレクトロルミネセンス表示素子に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic electroluminescence display device, and more particularly to an organic electroluminescence display device that emits polarized light.
【０００２】[0002]
【従来の技術】有機エレクトロルミネセンス表示素子
（以下有機ＥＬ素子）は、陽極層、発光層、陰極層の積
層体であり、陽極、陰極からそれぞれ注入された正孔、
電子が発光層で再結合して蛍光を発する。2. Description of the Related Art An organic electroluminescence display element (hereinafter referred to as an organic EL element) is a laminate of an anode layer, a light emitting layer and a cathode layer, and has holes injected from the anode and the cathode, respectively.
The electrons recombine in the light emitting layer to emit fluorescence.
【０００３】一般に有機ＥＬ素子は、基板上に予め設け
られた陽極上に、単層または複数層の低分子の発光層、
次いで金属からなる陰極を真空成膜して作られる。近
年、発光層を構成する物質が高分子材料であるものも報
告されており、この場合、発光層の形成方法として、乾
式成膜法である真空成膜に代わり、湿式成膜法である塗
布法、印刷法を採用することができる。In general, an organic EL device has a single-layer or multiple-layer low-molecular light-emitting layer on an anode previously provided on a substrate.
Then, a cathode made of metal is formed by vacuum film formation. In recent years, it has been reported that the substance forming the light emitting layer is a polymer material. In this case, as a method for forming the light emitting layer, a wet film forming method is applied instead of the vacuum film forming method which is a dry film forming method. Method and printing method can be adopted.
【０００４】有機ＥＬ素子は面状発光か可能であるた
め、液晶表示素子のバックライトとしても使用できる。
従来、液晶表示素子のバックライトとして有機ＥＬ素子
を使用する場合には、有機ＥＬ素子が発光する自然光
（無偏光）を偏光板により偏光させる必要があった。し
かし、偏光板の透過率が入射光の５０％であるため、光
の利用効率が悪い。Since the organic EL element can emit light in a plane shape, it can be used as a backlight of a liquid crystal display element.
Conventionally, when an organic EL element is used as a backlight of a liquid crystal display element, it has been necessary to polarize natural light (non-polarized light) emitted by the organic EL element by a polarizing plate. However, since the transmittance of the polarizing plate is 50% of the incident light, the light utilization efficiency is poor.
【０００５】そこで、例えば、特開平４−４０４１３号
公報には、一軸方向に配向した分子からなる発光層が開
示されている。有機ＥＬ素子の発光層を発光面に対して
一定方向に配向した場合、偏光の発光が得られ、偏光板
が不要となり、偏光板による約５０％の光の損失をなく
すことが可能となる。しかしながら、該発光層は水平展
開法やＬＢ法を用いて形成しており、素子の生産性が悪
いという問題があった。Therefore, for example, Japanese Patent Application Laid-Open No. 4-40413 discloses a light emitting layer composed of molecules uniaxially oriented. When the light emitting layer of the organic EL element is oriented in a certain direction with respect to the light emitting surface, polarized light emission is obtained, a polarizing plate becomes unnecessary, and it is possible to eliminate about 50% of light loss due to the polarizing plate. However, since the light emitting layer is formed by the horizontal expansion method or the LB method, there is a problem that the productivity of the device is poor.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、以上の事柄
を鑑みてなされたものであり、その目的は、偏光を発光
させ光の利用効率が改善された、かつ生産性を向上し
て、より安価な有機ＥＬ素子およびその製造方法を提供
することである。SUMMARY OF THE INVENTION The present invention has been made in view of the above matters, and an object of the present invention is to improve the utilization efficiency of light by emitting polarized light and improve the productivity. It is an object of the present invention to provide a cheaper organic EL element and a manufacturing method thereof.
【０００７】[0007]
【課題を解決するための手段】本発明は、上記の課題を
鑑みてなされたものであり、請求項１は、基板上に電極
と発光層と対向電極とを設けた有機エレクトロルミネッ
センス素子において、前記発光層が少なくとも高分子材
料と溶媒からなる発光層形成用溶液を用いる塗工法また
は印刷法にて形成されてなり、かつ、偏光度０．３以上
の偏光性を有する事を特徴とする有機エレクトロルミネ
センス表示素子である。請求項２は、請求項１に記載の
有機エレクトロルミネセンス表示素子において、前記発
光層が分子量１万以上の高分子材料からなることを特徴
とする有機エレクトロルミネセンス表示素子である。請
求項３は、基板上及び電極上に発光層をせん断をかけな
がら形成することを特徴とする請求項１から請求項３に
記載の有機エレクトロルミネセンス表示素子の製造方法
である。請求項４は、請求項３に記載の有機エレクトロ
ルミネセンス表示素子の製造方法において、発光層を形
成するのに必要な発光層形成用溶液が少なくとも前記高
分子材料と溶媒からなり、溶媒中に５０℃〜１６０℃の
沸点を有する溶媒を少なくとも1種類以上含むことを特
徴とする有機エレクトロルミネセンス表示素子の製造方
法である。The present invention has been made in view of the above problems, and a first aspect of the present invention is an organic electroluminescence device having an electrode, a light emitting layer, and a counter electrode provided on a substrate. An organic material characterized in that the light emitting layer is formed by a coating method or a printing method using a light emitting layer forming solution containing at least a polymer material and a solvent, and has a polarization property of a polarization degree of 0.3 or more. It is an electroluminescence display element. A second aspect of the present invention is the organic electroluminescent display element according to the first aspect, wherein the light emitting layer is made of a polymer material having a molecular weight of 10,000 or more. A third aspect of the present invention is the method for manufacturing an organic electroluminescent display element according to the first to third aspects, wherein the light emitting layer is formed on the substrate and the electrode while shearing. According to a fourth aspect of the present invention, in the method for manufacturing an organic electroluminescent display element according to the third aspect, a solution for forming a light emitting layer, which is necessary for forming a light emitting layer, comprises at least the polymer material and a solvent, and A method for producing an organic electroluminescence display device, which comprises at least one solvent having a boiling point of 50 ° C to 160 ° C.
【０００８】[0008]
【発明の実施の形態】以下、本発明の有機ＥＬ表示素子
の一例を詳細に説明する。先ず、透光性絶縁の基板上に
スパッタリング法等により透明導電膜を形成し、フォト
リソグラフィー法で透明導電膜をパターニングし、陽極
層を形成する。BEST MODE FOR CARRYING OUT THE INVENTION An example of the organic EL display device of the present invention will be described in detail below. First, a transparent conductive film is formed on a transparent insulating substrate by a sputtering method or the like, and the transparent conductive film is patterned by a photolithography method to form an anode layer.
【０００９】本発明における基板としては、石英基板、
ガラス基板、プラスチック基板等が使用できる。プラス
ティク基板を使用すれば、巻き取りによる有機ＥＬ表示
素子の製造が可能になり、より安価に有機ＥＬ表示素子
を提供でき、好ましい。プラスティク基板の材料として
は、ポリエチレンテレフタレート、ポリエチレンナフタ
レート、ポリプロピレン、シクロオレフィンポリマー、
ポリアミド、ポリエーテルサンフォン、ポリメチルメタ
クリレート、ポリカーボネートなどを用いることができ
る。また、セラミック蒸着フィルム、ポリ塩化ビニレ
ン、ポリ塩化ビニル、エチレン-酢酸ビニル共重合体鹸
化物などのバリア性フィルムを積層しても良い。さらに
は、カラーフィルター層を設けても良い。As the substrate in the present invention, a quartz substrate,
A glass substrate, a plastic substrate or the like can be used. The use of a plastic substrate is preferable because the organic EL display element can be manufactured by winding and the organic EL display element can be provided at a lower cost. Materials for the plastic substrate include polyethylene terephthalate, polyethylene naphthalate, polypropylene, cycloolefin polymer,
Polyamide, polyether sanfon, polymethylmethacrylate, polycarbonate, etc. can be used. Further, a barrier film such as a ceramic vapor deposition film, polyvinylene chloride, polyvinyl chloride, or a saponified ethylene-vinyl acetate copolymer may be laminated. Further, a color filter layer may be provided.
【００１０】本発明における陽極層の材料としては、Ｉ
ＴＯ（インジウムスズ複合酸化物）やインジウム亜鉛複
合酸化物、亜鉛アルミニウム複合酸化物等の透明電極材
料が使用できる。The material for the anode layer in the present invention is I
Transparent electrode materials such as TO (indium tin complex oxide), indium zinc complex oxide, and zinc aluminum complex oxide can be used.
【００１１】なお、抵抗を下げるために透明導電膜には
銅、クロム、アルミニウム、チタン等の金属もしくはこ
れらの積層物を補助電極として部分的に併設させること
ができる。また、陽極上に短絡防止用絶縁層を形成して
も良い。In order to reduce the resistance, a metal such as copper, chromium, aluminum, titanium, or a laminate thereof can be partially provided as an auxiliary electrode in the transparent conductive film. In addition, an insulating layer for short circuit prevention may be formed on the anode.
【００１２】本発明における発光層は、高分子発光材料
の単層であっても、正孔輸送層、高分子発光層、電子輸
送層などからなる多層膜で形成することができる。発光
層の材料は公知の高分子材料を使用することができる。
発光層を形成する高分子材料は、それぞれ単独で使用し
ても良く、混合して使用しても良い。The light emitting layer in the present invention may be a single layer of a polymer light emitting material, but may be formed of a multi-layer film including a hole transporting layer, a polymer light emitting layer, an electron transporting layer and the like. A known polymer material can be used as the material of the light emitting layer.
The polymer materials forming the light emitting layer may be used alone or in combination.
【００１３】正孔輸送層を設ける場合は、ポリアニリ
ン、ポリチオフェン、ポリビニルカルバゾール、ポリ
（３，４−エチレンジオキシチオフェン）とポリスチレ
ンスルホン酸との混合物を用いることができる。When the hole transport layer is provided, a mixture of polyaniline, polythiophene, polyvinylcarbazole, poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid can be used.
【００１４】発光層としては、ポリアリールビニレン系
やポリフルオレン系などの高分子蛍光体があげられる。
また、クマリン系、ペリレン系、ピラン系、アンスロン
系、ポリフィレン系、キナクリドン系、Ｎ,Ｎ'−ジアル
キル置換キナクリドン系、ナフタルイミド系、Ｎ,Ｎ'−
ジアリール置換ピロロピロール系などの蛍光性色素をポ
リスチレン、ポリメチルメタクリレート、ポリビニルカ
ルバゾールなどの高分子材料中に溶解させたものを用い
ることもできる。Examples of the light emitting layer include polymeric fluorescent substances such as polyarylvinylene type and polyfluorene type.
Further, coumarin-based, perylene-based, pyran-based, anthuron-based, porphyrene-based, quinacridone-based, N, N'-dialkyl-substituted quinacridone-based, naphthalimide-based, N, N'-
A diaryl-substituted pyrrolopyrrole-based fluorescent dye dissolved in a polymer material such as polystyrene, polymethylmethacrylate, or polyvinylcarbazole can also be used.
【００１５】上述の高分子材料は、トルエン、キシレ
ン、アセトン、メチルエチルケトン、メチルイソブチル
ケトン、シクロヘキサン、アニソール、メタノール、エ
タノール、イソプロピルアルコール、酢酸エチル、酢酸
ブチルなど有機溶剤や水などの単独または混合溶液に溶
解または分散液としてインク化することができる。この
時、乾燥速度を上げる為に、溶媒中に５０℃〜１６０℃
の沸点を有する溶媒を少なくとも1種類以上含んでいる
ことが好ましい。インク化する際には、界面活性剤、粘
度調整剤、酸化防止剤などを添加しても良い。The above-mentioned polymer materials can be used alone or as a mixed solution of an organic solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexane, anisole, methanol, ethanol, isopropyl alcohol, ethyl acetate and butyl, or water. It can be made into an ink as a solution or a dispersion. At this time, in order to increase the drying rate, the solvent is 50 ℃ ~ 160 ℃
It is preferable to include at least one solvent having a boiling point of at least one. When forming an ink, a surfactant, a viscosity modifier, an antioxidant, etc. may be added.
【００１６】発光層は、マイクログラビア法、ダイコー
ト法、スロットコート法、カーテンコート法、グラビア
法、フレキソ法、オフセット法、凸版法、凹版オフセッ
ト法、スクリーン法などのコーティング方法または印刷
方法により形成することができる。発光層の膜厚は、単
層または積層により形成する場合においても１μｍ以下
であり、好ましくは５０ｎｍ〜１５０ｎｍである。The light emitting layer is formed by a coating method or a printing method such as a microgravure method, a die coating method, a slot coating method, a curtain coating method, a gravure method, a flexographic method, an offset method, a relief printing method, an intaglio offset method and a screen method. be able to. The thickness of the light emitting layer is 1 μm or less even when it is formed by a single layer or a laminated layer, and preferably 50 nm to 150 nm.
【００１７】上記の塗工方法や印刷方法では、基材と塗
布ヘッドの間で高速せん断場を発生させることが可能で
ある。上述した発光層を形成する高分子は剛直な主鎖を
有する為、高速せん断場では、基材の搬送方向に平行に
主鎖が配向し、偏光性を有するＥＬ発光が得られた。In the above-mentioned coating method and printing method, it is possible to generate a high-speed shear field between the base material and the coating head. Since the polymer forming the above-mentioned light emitting layer has a rigid main chain, in a high-speed shearing field, the main chain was oriented parallel to the transport direction of the substrate, and EL light emission having polarization was obtained.
【００１８】偏光度（Ｖ）は、定義より、下記式：
Ｖ＝[Ｉ（０°）−Ｉ（９０°）]/[Ｉ（０°）＋Ｉ（９
０°）]
である。式中、Ｉ（０°）はせん断方向に平行な偏光の
ＥＬ強度、Ｉ（９０°）はせん断方向に垂直な偏光のＥ
Ｌ強度である。偏光度は０．３以上、好ましくは０．５
以上でないと、従来の技術であるバックライトと偏向板
の組み合わせと比較して、実際上利点がない。The degree of polarization (V) is defined by the following formula: V = [I (0 °) -I (90 °)] / [I (0 °) + I (9
0 °)]. Where I (0 °) is the EL intensity of polarized light parallel to the shear direction, and I (90 °) is the E of polarized light perpendicular to the shear direction.
L intensity. The degree of polarization is 0.3 or more, preferably 0.5
Otherwise, there is practically no advantage as compared with the conventional combination of the backlight and the deflection plate.
【００１９】この時、高分子材料の分子量が１万以上、
好ましくは１０万以上、さらに好ましくは１００万以上
では、配向性が向上することが見出された。At this time, the molecular weight of the polymer material is 10,000 or more,
It has been found that the orientation is improved when it is preferably 100,000 or more, more preferably 1 million or more.
【００２０】また、配向状態を固定化する為に、乾燥速
度は早い方が望ましい。そこで、前述の発光層形成用イ
ンクが、溶媒中に５０℃〜１６０℃の沸点を有する溶媒
を少なくとも1種類以上含んでいることが好ましい。Further, in order to fix the orientation state, it is desirable that the drying rate is fast. Therefore, it is preferable that the above-described ink for forming a light emitting layer contains at least one solvent having a boiling point of 50 ° C. to 160 ° C. in the solvent.
【００２１】また、塗工工程または印刷工程は、発光特
性の低下を防ぐ為に窒素ガスやアルゴンなどの不活性ガ
ス下で行うのが好ましい。また、黄色灯、赤色灯、暗室
などの遮光下で行うことがいっそう好ましい。Further, it is preferable that the coating step or the printing step is carried out under an inert gas such as nitrogen gas or argon in order to prevent deterioration of light emitting characteristics. Further, it is more preferable to carry out the light shielding from a yellow light, a red light, a dark room and the like.
【００２２】陰極層の材料としては電子注入効率の高い
物質を用いる。具体的にはＭｇ，Ａｌ, Ｙｂ等の金属単
体を用いたり、発光媒体と接する界面にＬｉや酸化Ｌ
ｉ，ＬｉＦ等の化合物を１ｎｍ程度挟んで、安定性・導
電性の高いＡｌやＣｕを積層して用いる。As the material of the cathode layer, a substance having a high electron injection efficiency is used. Specifically, a simple metal such as Mg, Al, or Yb is used, or Li or L oxide is added to the interface in contact with the light emitting medium.
Compounds such as i and LiF are sandwiched by about 1 nm, and Al and Cu having high stability and conductivity are laminated and used.
【００２３】または電子注入効率と安定性を両立させる
ため、低仕事関数なＬｉ，Ｍｇ，Ｃａ，Ｓｒ，Ｌａ，Ｃ
ｅ，Ｅｒ，Ｅｕ，Ｓｃ，Ｙ，Ｙｂ等の金属１種以上と、
安定なＡｇ，Ａｌ，Ｃｕ等の金属元素との合金系が用い
られる。具体的にはＭｇＡｇ，ＡｌＬｉ，ＣｕＬｉ等の
合金が使用できる。Alternatively, in order to achieve both electron injection efficiency and stability, low work function Li, Mg, Ca, Sr, La, C
one or more metals such as e, Er, Eu, Sc, Y, Yb,
A stable alloy system with a metal element such as Ag, Al, or Cu is used. Specifically, alloys such as MgAg, AlLi, and CuLi can be used.
【００２４】陰極層の形成方法は、材料に応じて、抵抗
加熱蒸着法、電子ビーム蒸着法、反応性蒸着法、イオン
プレーティング法、スパッタリング法を用いることがで
きる。陰極の厚さは、１０ｎｍ〜１μｍ程度が望まし
い。As a method for forming the cathode layer, a resistance heating vapor deposition method, an electron beam vapor deposition method, a reactive vapor deposition method, an ion plating method, or a sputtering method can be used depending on the material. The thickness of the cathode is preferably about 10 nm to 1 μm.
【００２５】[0025]
【実施例】以下、本発明の実施例を説明するが、本発明
はこれに限定されるものではない。EXAMPLES Examples of the present invention will be described below, but the present invention is not limited thereto.
【００２６】＜実施例１＞以下、図１を用いて説明す
る。ポリエチレンテレフタレートからなる透光性基板１
上にスパッタリング法で陽極層としてＩＴＯ膜２を形成
した。次に、フォトリソグラフィー法およびウェットエ
ッチング法によってＩＴＯ膜２を所定のパターンにパタ
ーンニングし、陽極層２を形成した。次に、陽極層表面
をＵＶオゾン装置で洗浄した。次に、発光層３として、
ポリ（３，４）エチレンジオキシチオフェンとポリスチ
レンスルフォネートとの混合物層、ポリ（２−メトキ
シ，５−（２’−エチル−ヘキシロキシ）−１，４−フ
ェニレンビニレン層を順に、マイクログラビア法によ
り、それぞれ３０ｎｍ、１００ｎｍの膜厚で形成した。
この時、基材の搬送速度は２０ｍ／ｍｉｎ、マイクログ
ラビアロールの回転速度は２０ｍ／ｍｉｎとした。次
に、陰極層４としてCa層、Al層を順に、真空蒸着法によ
り、それぞれ２０ｎｍ、２００ｎｍの膜厚で形成した。<First Embodiment> A description will be given below with reference to FIG. Transparent substrate 1 made of polyethylene terephthalate
An ITO film 2 was formed as an anode layer on the top by a sputtering method. Next, the ITO film 2 was patterned into a predetermined pattern by photolithography and wet etching to form the anode layer 2. Next, the surface of the anode layer was washed with a UV ozone device. Next, as the light emitting layer 3,
A mixture layer of poly (3,4) ethylenedioxythiophene and polystyrene sulfonate and a poly (2-methoxy, 5- (2′-ethyl-hexyloxy) -1,4-phenylenevinylene layer were sequentially formed by a microgravure method. To have a film thickness of 30 nm and a film thickness of 100 nm, respectively.
At this time, the substrate conveying speed was 20 m / min, and the microgravure roll rotating speed was 20 m / min. Next, as the cathode layer 4, a Ca layer and an Al layer were sequentially formed by vacuum vapor deposition to have a film thickness of 20 nm and 200 nm, respectively.
【００２７】得られた有機ＥＬ表示素子に５Ｖの電圧を
印加したところ、輝度７００ｃｄ／ｍ2の発光が得られ
た。さらに上記ＥＬ発光の偏光度（Ｖ）を求めたとこ
ろ、Ｖ＝０．６であり、偏光フィルムの偏光度０．７〜
０．９と比較して遜色ない偏光性が確認された。When a voltage of 5 V was applied to the obtained organic EL display device, light emission with a brightness of 700 cd / m 2 was obtained. Further, when the polarization degree (V) of the EL light emission was obtained, V = 0.6, and the polarization degree of the polarizing film was 0.7 to
Polarization comparable to that of 0.9 was confirmed.
【００２８】＜実施例２＞発光層をダイコート法により
形成する以外は、実施例と同様の方法で有機ＥＬ表示素
子を作製した。基材の搬送速度は２０ｍ／ｍｉｎであ
り、基材とダイヘッド間の間隔は１０μｍであった。得
られた有機ＥＬ表示素子に５Ｖの電圧を印加したとこ
ろ、輝度７００ｃｄ／ｍ2の発光が得られた。さらに上
記ＥＬ発光の偏光度Ｖ＝０．７であり、偏光フィルムの
偏光度０．７〜０．９と比較して遜色ない偏光性が確認
された。Example 2 An organic EL display device was produced in the same manner as in the example except that the light emitting layer was formed by the die coating method. The transport speed of the substrate was 20 m / min, and the distance between the substrate and the die head was 10 μm. When a voltage of 5 V was applied to the obtained organic EL display element, light emission with a brightness of 700 cd / m 2 was obtained. Further, the polarization degree V of the EL light emission was 0.7, and it was confirmed that the polarization degree was comparable to that of the polarization film of 0.7 to 0.9.
【００２９】[0029]
【発明の効果】本発明によれば、偏光光を発光させ光の
利用効率が改善された、かつ生産性を向上して、より安
価な有機ＥＬ素子を製造することが可能となった。According to the present invention, it has become possible to manufacture a cheaper organic EL device by emitting polarized light to improve the utilization efficiency of light and improve productivity.
【００３０】[0030]
【図１】本発明の有機ＥＬ表示素子の製造方法の一例を
示す説明図である。FIG. 1 is an explanatory view showing an example of a method for manufacturing an organic EL display element of the present invention.
１ 透光性基板 ２ 陽極層 ３ 発光層 ４ 陰極層 1 Translucent substrate 2 Anode layer 3 light emitting layer 4 cathode layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 湊 孝夫 東京都台東区台東１丁目５番１号 凸版印 刷株式会社内 Ｆターム(参考） 3K007 AB01 AB18 CA06 CB01 DA01 DB03 EB00 FA01 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Takao Minato 1-5-1 Taito, Taito-ku, Tokyo Toppan stamp Imprint Co., Ltd. F-term (reference) 3K007 AB01 AB18 CA06 CB01 DA01 DB03 EB00 FA01
Claims (4)
た有機エレクトロルミネッセンス素子において、前記発
光層が少なくとも高分子材料と溶媒からなる発光層形成
用溶液を用いる塗工法または印刷法にて形成されてな
り、かつ、偏光度０．３以上の偏光性を有する事を特徴
とする有機エレクトロルミネセンス表示素子。1. An organic electroluminescence device having an electrode, a light emitting layer and a counter electrode provided on a substrate, wherein the light emitting layer is applied by a coating method or a printing method using a light emitting layer forming solution comprising at least a polymer material and a solvent. An organic electroluminescence display element, which is formed by the following method and has a polarization property of a degree of polarization of 0.3 or more.
ンス表示素子において、前記発光層が分子量１万以上の
高分子材料からなることを特徴とする有機エレクトロル
ミネセンス表示素子。2. The organic electroluminescence display element according to claim 1, wherein the light emitting layer is made of a polymer material having a molecular weight of 10,000 or more.
ながら形成することを特徴とする請求項１から請求項３
に記載の有機エレクトロルミネセンス表示素子の製造方
法。3. The light emitting layer is formed on the substrate and the electrode while shearing the light emitting layer.
A method for manufacturing the organic electroluminescence display device according to 1.
ンス表示素子の製造方法において、発光層を形成するの
に必要な発光層形成用溶液が少なくとも前記高分子材料
と溶媒からなり、溶媒中に５０℃〜１６０℃の沸点を有
する溶媒を少なくとも１種類以上含むことを特徴とする
有機エレクトロルミネセンス表示素子の製造方法。4. The method for manufacturing an organic electroluminescence display device according to claim 3, wherein the light emitting layer forming solution required for forming the light emitting layer comprises at least the polymer material and a solvent, A method for producing an organic electroluminescence display device, which comprises at least one solvent having a boiling point of 50 ° C to 160 ° C.
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| JP2001204607A JP5250922B2 (en) | 2001-07-05 | 2001-07-05 | Method for manufacturing organic electroluminescence display element |
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| WO2011096509A1 (en) * | 2010-02-05 | 2011-08-11 | 住友化学株式会社 | Organic electroluminescent element, method for producing same, and device for producing same |
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