JP2003012647A - Method for producing 2,3-diaminopyridine - Google Patents
Method for producing 2,3-diaminopyridineInfo
- Publication number
- JP2003012647A JP2003012647A JP2001268654A JP2001268654A JP2003012647A JP 2003012647 A JP2003012647 A JP 2003012647A JP 2001268654 A JP2001268654 A JP 2001268654A JP 2001268654 A JP2001268654 A JP 2001268654A JP 2003012647 A JP2003012647 A JP 2003012647A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- amino
- diaminopyridine
- reaction
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- ZZYXNRREDYWPLN-UHFFFAOYSA-N pyridine-2,3-diamine Chemical compound NC1=CC=CN=C1N ZZYXNRREDYWPLN-UHFFFAOYSA-N 0.000 title claims abstract description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium on carbon Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000003054 catalyst Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims description 32
- -1 3-protected aminopyridine Chemical class 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 20
- GZBKVUGZEAJYHH-UHFFFAOYSA-N 2-nitropyridin-3-amine Chemical compound NC1=CC=CN=C1[N+]([O-])=O GZBKVUGZEAJYHH-UHFFFAOYSA-N 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 10
- CUYKNJBYIJFRCU-UHFFFAOYSA-N 3-aminopyridine Chemical compound NC1=CC=CN=C1 CUYKNJBYIJFRCU-UHFFFAOYSA-N 0.000 claims description 8
- GAMYYCRTACQSBR-UHFFFAOYSA-N 4-azabenzimidazole Chemical group C1=CC=C2NC=NC2=N1 GAMYYCRTACQSBR-UHFFFAOYSA-N 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 230000000802 nitrating effect Effects 0.000 claims description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000003756 stirring Methods 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 125000006239 protecting group Chemical group 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 229940125898 compound 5 Drugs 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 5
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001782 cephems Chemical class 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003242 anti bacterial agent Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 229940125773 compound 10 Drugs 0.000 description 3
- 229940125782 compound 2 Drugs 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 3
- XMJHPCRAQCTCFT-UHFFFAOYSA-N methyl chloroformate Chemical compound COC(Cl)=O XMJHPCRAQCTCFT-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 description 2
- HLTDBMHJSBSAOM-UHFFFAOYSA-N 2-nitropyridine Chemical compound [O-][N+](=O)C1=CC=CC=N1 HLTDBMHJSBSAOM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000001589 carboacyl group Chemical group 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 2
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 125000004777 2-fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- STSCVKRWJPWALQ-UHFFFAOYSA-N TRIFLUOROACETIC ACID ETHYL ESTER Chemical compound CCOC(=O)C(F)(F)F STSCVKRWJPWALQ-UHFFFAOYSA-N 0.000 description 1
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000005098 aryl alkoxy carbonyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 1
- XGALXMZZDNGYGW-UHFFFAOYSA-N ethyl n-(2-nitropyridin-3-yl)carbamate Chemical compound CCOC(=O)NC1=CC=CN=C1[N+]([O-])=O XGALXMZZDNGYGW-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- IRXSLJNXXZKURP-UHFFFAOYSA-N fluorenylmethyloxycarbonyl chloride Chemical compound C1=CC=C2C(COC(=O)Cl)C3=CC=CC=C3C2=C1 IRXSLJNXXZKURP-UHFFFAOYSA-N 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 150000004682 monohydrates Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 125000000612 phthaloyl group Chemical group C(C=1C(C(=O)*)=CC=CC1)(=O)* 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Pyridine Compounds (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、セフェム系抗菌剤
やイミダゾピリジン等の合成中間体もしくは有機金属錯
体のリガンド等の医薬原料として有用な2,3−ジアミ
ノピリジンまたはその合成中間体の製造法に関する。TECHNICAL FIELD The present invention relates to a method for producing 2,3-diaminopyridine or a synthetic intermediate thereof, which is useful as a cephem antibacterial agent, a synthetic intermediate such as imidazopyridine, or a medicinal raw material for a ligand of an organometallic complex. Regarding
【0002】[0002]
【従来の技術】2,3−ジアミノピリジンは、例えばW
O00/32606号、参考例29等にセフェム系抗菌
剤の3位側鎖原料として記載されている。2,3−ジア
ミノピリジンの典型的な製法は、Org. Syn., Coll. Vo
l. V, 346 (1973)に2−アミノピリジンを出発原料に用
いて4工程で合成する方法が記載されている。しかし、
該製法では、反応試薬として臭素や鉄等の金属を使用す
るので環境や安全面で望ましくなく、収率も26%と低
いため、工業的製法として満足のいく方法ではない。J.
Chem. Soc. Perkin Trans. I, 2995(1982)には、3−
エトシキカルボニルアミノ−2−ニトロピリジンより得
られる3−アミノ−2−ニトロピリジンをNi/水素で
還元する2,3−ジアミノピリジンの製法が記載されて
いるが、発癌性が懸念されるニッケル金属を使用するの
で、工業的製法としてはあまり好ましくない。2. Description of the Prior Art 2,3-Diaminopyridine is, for example, W
O00 / 32606, Reference Example 29 and the like are described as a starting material for the 3rd side chain of the cephem antibacterial agent. A typical method for producing 2,3-diaminopyridine is Org. Syn., Coll. Vo.
I. V, 346 (1973) describes a method of synthesizing 2-aminopyridine as a starting material in four steps. But,
In the production method, a metal such as bromine or iron is used as a reaction reagent, which is not desirable in terms of environment and safety, and the yield is as low as 26%, which is not a satisfactory industrial production method. J.
Chem. Soc. Perkin Trans. I, 2995 (1982) includes 3-
A method for producing 2,3-diaminopyridine by reducing 3-amino-2-nitropyridine obtained from ethoxycarbonylamino-2-nitropyridine with Ni / hydrogen is described, but nickel metal which may cause carcinogenicity is described. Is used, it is not preferable as an industrial production method.
【0003】[0003]
【発明が解決しようとする課題】よって、工業的に実施
する上でより好ましい2,3−ジアミノピリジンの新規
製法の開発が要望されていた。Therefore, there has been a demand for the development of a novel process for producing 2,3-diaminopyridine, which is more preferable for industrial implementation.
【0004】[0004]
【課題を解決するための手段】本発明者らは鋭意検討し
た結果、3−アミノ−2−ニトロピリジンをPd−C触
媒存在下で還元すれば2,3−ジアミノピリジンが効率
よく得られることを見出し、以下に示す本発明を完成し
た。
(1)以下の反応スキームで示され、3−アミノ−2−
ニトロピリジン(IV)をPd−C触媒存在下、還元す
ることを特徴とする、2,3−ジアミノピリジン(V)
の製造方法。Means for Solving the Problems As a result of intensive studies by the present inventors, 2,3-diaminopyridine can be efficiently obtained by reducing 3-amino-2-nitropyridine in the presence of a Pd-C catalyst. Then, the present invention shown below was completed. (1) As shown in the following reaction scheme, 3-amino-2-
2,3-diaminopyridine (V), which is characterized by reducing nitropyridine (IV) in the presence of a Pd-C catalyst.
Manufacturing method.
【化3】
(2)以下の反応スキームで示され、3−アミノピリジ
ン(I)のアミノ基を保護して3−保護アミノピリジン
(II)(式中、R1はアミノ保護基)を得た後、ニト
ロ化剤を反応させて化合物(III)を得、これを脱保
護することを特徴とする、3−アミノ−2−ニトロピリ
ジン(IV)の製造方法。[Chemical 3] (2) As shown in the following reaction scheme, after protecting the amino group of 3-aminopyridine (I) to give 3-protected aminopyridine (II) (in the formula, R 1 is an amino protecting group), nitro A method for producing 3-amino-2-nitropyridine (IV), which comprises reacting an agent to obtain compound (III) and deprotecting it.
【化4】
(3)3−アミノ−2−ニトロピリジン(IV)が上記
(2)記載の製造方法により得られたものである、上記
(1)記載の製造方法。
(4)上記(1)〜(3)のいずれかに記載の工程を包
含することを特徴とする、置換されていてもよいイミダ
ゾ[4,5−b]ピリジニウム基を有する化合物の製造
方法。
(5)上記(1)〜(3)のいずれかに記載の工程を包
含することを特徴とする、3位に置換されていてもよい
イミダゾ[4,5−b]ピリジニウムメチル基を有する
セフェム化合物の製造方法。[Chemical 4] (3) The production method according to (1) above, wherein 3-amino-2-nitropyridine (IV) is obtained by the production method according to (2) above. (4) A method for producing a compound having an optionally substituted imidazo [4,5-b] pyridinium group, which comprises the step described in any of (1) to (3) above. (5) A cephem having an imidazo [4,5-b] pyridiniummethyl group optionally substituted at the 3-position, characterized by including the step described in any of (1) to (3) above. Method for producing compound.
【0005】前記2,3−ジアミノピリジン(V)は、
3−アミノ−2−ニトロピリジン(IV)を還元するこ
とにより得られる。還元条件としては、ハイドロサルフ
ァイトナトリウムによる還元やPd−C触媒存在下で水
素雰囲気下による還元等が例示されるが、目的物の単離
のしやすさの点からは後者による還元が好ましい。ま
た、還元反応の水素源としては、ギ酸アンモニウム、シ
クロヘキセン、ヒドラジン等を使用してもよい。Pd−
C触媒の使用量は、化合物(IV)に対して約0.01〜0.1
0mol当量、好ましくは約0.05mol当量である。反応溶媒
としては、アルコール(例:メタノール、 エタノール
等)、テトラヒドロフラン、1,2-ジクロロエタン、水、
酢酸エチル等が例示される。反応溶媒の量は、化合物
(IV)1gに対して通常、約15ml〜1000ml程度で
ある。反応温度は、通常、約10〜40℃、好ましくは約25
℃である。反応時間は、数十分〜数十時間である。2,
3−ジアミノピリジン(V)は、反応液の濃縮液を、例
えばエーテル類(例:ジイソプロピルエーテル、メチル
・t−ブチルエーテル)、酢酸エチル、トルエン、アセ
トニトリル、アセトン、またはメチルイソブチルケトン
等で希釈することにより、いずれの場合も好ましくは結
晶として単離することができる。The 2,3-diaminopyridine (V) is
Obtained by reducing 3-amino-2-nitropyridine (IV). Examples of the reducing conditions include reduction with sodium hydrosulfite and reduction under a hydrogen atmosphere in the presence of a Pd—C catalyst. However, the latter reduction is preferable from the viewpoint of easy isolation of the target product. Further, as a hydrogen source for the reduction reaction, ammonium formate, cyclohexene, hydrazine and the like may be used. Pd-
The amount of C catalyst used is about 0.01 to 0.1 with respect to compound (IV).
It is 0 mol equivalent, preferably about 0.05 mol equivalent. As the reaction solvent, alcohol (eg, methanol, ethanol, etc.), tetrahydrofuran, 1,2-dichloroethane, water,
Ethyl acetate etc. are illustrated. The amount of the reaction solvent is usually about 15 ml to 1000 ml per 1 g of compound (IV). The reaction temperature is usually about 10-40 ° C, preferably about 25 ° C.
℃. The reaction time is several tens of minutes to several tens of hours. Two
3-diaminopyridine (V) is obtained by diluting the concentrated solution of the reaction solution with, for example, ethers (eg, diisopropyl ether, methyl t-butyl ether), ethyl acetate, toluene, acetonitrile, acetone, or methyl isobutyl ketone. Thus, in any case, it can be preferably isolated as crystals.
【0006】上記3−アミノ−2−ニトロピリジン(I
V)は、好ましくは以下の方法で得られる。
(第1工程)前記3−アミノピリジン(I)のアミノ基
を保護して前記3−保護アミノピリジン(II)(式
中、R1はアミノ保護基)を得る。当該反応は、アミノ
保護反応として周知の反応条件で行えばよい。アミノ保
護試薬としては、クロロ炭酸メチル、クロロ炭酸エチ
ル、クロロ炭酸9−フルオレニルメチル、トリフルオロ
酢酸エチル等が例示されるが、好ましくはクロロ炭酸メ
チルである。R1で示されるアミノ保護基としては、低
級アルコキシカルボニル(例:メトキシカルボニル)、
アラルキル(例:トリフェニルメチル)、アラルキルオ
キシカルボニル(例:ベンジルオキシカルボニル)、低
級アルカノイル(例:アセチル)、ハロゲン化低級アル
コキシカルボニル(例:トリクロロエトキシカルボニ
ル)、ハロゲン化低級アルカノイル(例:トリフルオロ
アセチル)、フタロイル、ウレア型保護基(例:フェノ
チアジニルカルボニル基)、リン酸型保護基(例:ジフ
ェニルホスホリル基 )、シリル型保護基(例:t−ブ
チルジフェニルシリル基)、イオウ型保護基(例:ベン
ゼンスルフェニル基)、イミン型保護基(サリチリデン
基)等が例示されるが、好ましくはメトキシカルボニル
である。反応溶媒としては、アセトン、水、アルコー
ル、 アセトニトリル、テトラヒドロフラン、ジメチル
ホルムアミド等が例示される。反応温度は、通常約10〜
40℃、好ましくは約25℃である。反応は要すれば塩基存
在下に行われ、該塩基としては、炭酸水素アルカリ金属
(例:炭酸水素ナトリウム)、炭酸アルカリ金属(例:
炭酸カリウム)等が例示される。The above 3-amino-2-nitropyridine (I
V) is preferably obtained by the following method. (Step 1) The amino group of the 3-aminopyridine (I) is protected to obtain the 3-protected aminopyridine (II) (in the formula, R 1 is an amino protecting group). The reaction may be performed under reaction conditions known as amino protection reaction. Examples of the amino protecting reagent include methyl chlorocarbonate, ethyl chlorocarbonate, 9-fluorenylmethyl chlorocarbonate, ethyl trifluoroacetate and the like, but methyl chlorocarbonate is preferable. Examples of the amino protecting group represented by R 1 include lower alkoxycarbonyl (eg, methoxycarbonyl),
Aralkyl (eg: triphenylmethyl), aralkyloxycarbonyl (eg: benzyloxycarbonyl), lower alkanoyl (eg: acetyl), halogenated lower alkoxycarbonyl (eg: trichloroethoxycarbonyl), halogenated lower alkanoyl (eg: trifluoro) Acetyl), phthaloyl, urea-type protecting groups (eg: phenothiazinylcarbonyl group), phosphoric acid-type protecting groups (eg: diphenylphosphoryl group), silyl-type protecting groups (eg: t-butyldiphenylsilyl group), sulfur-type protecting groups (Example: benzenesulfenyl group), imine type protecting group (salicylidene group) and the like are exemplified, but methoxycarbonyl is preferable. Examples of the reaction solvent include acetone, water, alcohol, acetonitrile, tetrahydrofuran, dimethylformamide and the like. The reaction temperature is usually about 10-
It is 40 ° C, preferably about 25 ° C. The reaction is carried out in the presence of a base, if necessary, and examples of the base include alkali metal hydrogen carbonate (eg sodium hydrogen carbonate) and alkali metal carbonate (eg:
Examples thereof include potassium carbonate).
【0007】(第2工程)上記3−保護アミノピリジン
(II)にニトロ化剤を反応させて2位をニトロ化する
ことにより前記化合物(III)を得る。ニトロ化剤と
しては、硝酸(例:発煙硝酸、含水硝酸等)、亜硝酸カ
リウム、二酸化窒素/オゾン等が例示されるが、好まし
くは発煙硝酸である。反応溶媒としては、濃硫酸、酢
酸、ジメチルスルホキシド、ヘキサメチルホスホリック
トリアミド、ニトロメタン等が例示される。反応温度
は、通常約10〜60℃、好ましくは約40℃である。反応時
間は、数十分〜数十時間である。
(第3工程)上記化合物(III)の保護アミノ基部分
を脱保護することにより、3−アミノ−2−ニトロピリ
ジン(IV)を得る。脱保護反応は、加水分解等により
行われるが、好ましくは水酸化アルカリ金属(例:NaO
H、KOH等)や水酸化アルカリ土類金属(例:Ba(OH)
2等)等の塩基存在下で加水分解すればよい。反応温度
は、通常約10〜60℃、好ましくは約40℃である。反応時
間は、数十分〜数十時間である。(Step 2) The compound (III) is obtained by reacting the 3-protected aminopyridine (II) with a nitrating agent to nitrate the 2-position. Examples of the nitrating agent include nitric acid (eg fuming nitric acid, hydrous nitric acid, etc.), potassium nitrite, nitrogen dioxide / ozone, etc., but fuming nitric acid is preferred. Examples of the reaction solvent include concentrated sulfuric acid, acetic acid, dimethyl sulfoxide, hexamethylphosphoric triamide, nitromethane and the like. The reaction temperature is generally about 10-60 ° C, preferably about 40 ° C. The reaction time is several tens of minutes to several tens of hours. (Third step) 3-amino-2-nitropyridine (IV) is obtained by deprotecting the protected amino group portion of the compound (III). The deprotection reaction is carried out by hydrolysis or the like, but preferably an alkali metal hydroxide (eg NaO
H, KOH, etc.) and alkaline earth metal hydroxides (eg Ba (OH)
It may be hydrolyzed in the presence of a base such as 2 ). The reaction temperature is generally about 10-60 ° C, preferably about 40 ° C. The reaction time is several tens of minutes to several tens of hours.
【0008】本発明の製造方法によれば、前記2,3−
ジアミノピリジン(V)を、好ましくは3−アミノピリ
ジン(I)を出発原料として、従来法に比べて安全かつ
簡便に、しかも高収率で製造することができる。本製法
により得られる3−アミノ−2−ニトロピリジン(I
V)および2,3−ジアミノピリジン(V)は、例えば
下記化合物(VI)等に誘導できる。さらに化合物(V
I)を環化反応に付すことにより、下記化合物(VI
I)などの置換されていてもよいイミダゾ[4,5−b]
ピリジンに誘導できる。該置換基は、イミダゾ[4,5−
b]ピリジンの1位N原子上が好ましい。該置換されて
いてもよいイミダゾ[4,5−b]ピリジンは、さらに置
換されていてもよいイミダゾ[4,5−b]ピリジニウム
基を有する化合物の製造に利用できる。好ましくは、W
O00/32606号に示されるように3位に置換され
ていてもよいイミダゾ[4,5−b]ピリジニウム基を有
するセフェム化合物(例:下記化合物(IXI))やそ
の塩(例:塩酸塩、硫酸塩等)等の製造原料として使用
される。According to the manufacturing method of the present invention, the above-mentioned 2,3-
Diaminopyridine (V), preferably 3-aminopyridine (I), can be produced as a starting material in a safer and more convenient and higher yield than conventional methods. 3-amino-2-nitropyridine (I
V) and 2,3-diaminopyridine (V) can be derived into, for example, the following compound (VI). Furthermore, the compound (V
By subjecting (I) to a cyclization reaction, the following compound (VI
Optionally substituted imidazo [4,5-b] such as I)
Can be induced to pyridine. The substituent is imidazo [4,5-
b] On the 1st N atom of pyridine is preferred. The optionally substituted imidazo [4,5-b] pyridine can be used for producing a compound having an optionally substituted imidazo [4,5-b] pyridinium group. Preferably W
O00 / 32606, a cephem compound having an imidazo [4,5-b] pyridinium group which may be substituted at the 3-position (Example: Compound (IXI) below) or a salt thereof (Example: hydrochloride, It is used as a raw material for the production of sulfates, etc.).
【0009】[0009]
【化5】
上記式中、R4は水素または有機残基であり、好ましく
は置換されていてもよい低級アルキル(置換基:アミ
ノ、ヒドロキシ、低級アルキル(保護)アミノ(例:メ
チルアミノ、N-t-ブトキシカルボニル- N-メチルアミノ
等)等)、ヘテロ環等)である。特に好ましいR4は、
3−メチルアミノプロピル(−(CH2)3NHCH3)
やN-t-ブトキシカルボニル- N-メチルアミノプロピルで
ある。化合物(IV)または(V)の3−アミノ基に置
換基R4を導入するには、好ましくはR4に対応するアル
デヒド等を用いて縮合反応を行えばよい。化合物(I
V)から化合物(VI)を直接得るには、Pd−C/H
2等の還元剤を併用してニトロ基を還元すればよい。化
合物(VI)から化合物(VII)の反応は、試薬兼溶
媒として、オルトぎ酸エステルHC(OR)3(例:R
=Et、Me)を、好ましくは酸(例:パラトルエンス
ルホン酸等)存在下に反応させればよい。反応温度は6
0℃〜100℃、好ましくは100℃である。化合物
(VIII)において、R6は脱離基(例:ハロゲン、
ヒドロキシ、アセチルオキシ等)である。Acylはセフェ
ム系化合物の7位アシル基として使用されるものであれ
ば特に制限されないが、好ましくは以下に示されるアシ
ル基等である。[Chemical 5] In the above formula, R 4 is hydrogen or an organic residue, and preferably an optionally substituted lower alkyl (substituent: amino, hydroxy, lower alkyl (protected) amino (eg, methylamino, Nt-butoxycarbonyl- N-methylamino etc.) etc.), heterocycle etc.). Particularly preferred R 4 is
3-methylamino-propyl (- (CH 2) 3 NHCH 3)
And Nt-butoxycarbonyl-N-methylaminopropyl. In order to introduce the substituent R 4 into the 3-amino group of the compound (IV) or (V), it is preferable to carry out the condensation reaction using an aldehyde or the like corresponding to R 4 . Compound (I
To obtain the compound (VI) directly from V), Pd-C / H
The reducing agent such as 2 may be used together to reduce the nitro group. The reaction of compound (VI) to compound (VII) can be carried out by using orthoformate HC (OR) 3 (eg R
= Et, Me) is preferably reacted in the presence of an acid (eg, paratoluenesulfonic acid, etc.). Reaction temperature is 6
The temperature is 0 ° C to 100 ° C, preferably 100 ° C. In compound (VIII), R 6 is a leaving group (eg, halogen,
Hydroxy, acetyloxy, etc.). Acyl is not particularly limited as long as it is used as the 7-position acyl group of the cephem compound, but is preferably the acyl group shown below.
【化6】
式中、R7は水素、低級アルキル(例:メチル、エチル
等)、ハロゲン化低級アルキル(例:フルオロメチル、
2−フルオロエチル等)等であるが、特に好ましくはエ
チルである。[Chemical 6] In the formula, R 7 is hydrogen, lower alkyl (eg, methyl, ethyl, etc.), halogenated lower alkyl (eg, fluoromethyl,
2-fluoroethyl etc.) and the like, and particularly preferably ethyl.
【0010】以下に参考例および実施例を示す。実施例
1Reference examples and examples will be shown below. Example 1
【化7】
(1)化合物2 3−メトキシカルボニルアミノピリジ
ン
3-アミノピリジン 72g(760mmol)をアセトン(360ml)に溶
解させ、炭酸水素ナトリウム77g(912mmol)を加える。こ
の溶液にクロロ炭酸メチル71ml(912mmol)を約10分かけ
て滴下(激しい発泡を伴う)。室温下約1時間攪拌し、
水435mlに希釈する。減圧下反応液を濃縮してアセトン
を留去した後、氷水浴にて冷却下約90分攪拌し、析出し
た結晶を濾取。冷水洗浄後、乾燥し化合物2を得た。収
量107g,収率92%。
(2)化合物3 3−メトキシカルボニルアミノ−2−
ニトロピリジン
油浴にて45℃過熱下、化合物2 91g(600mmol)を濃硫酸2
00mlに溶解させ、発煙硝酸(d=1.52)30mlを約2hかけて滴
下。内温を45℃付近に保つ。滴下終了後、この温度に
て、約3h攪拌する。室温まで冷却後、砕氷を加えた水16
00mlに反応液を希釈させると黄色固体3が析出。グラス
フィルタにて瀘取し冷水洗浄後、約1時間通気乾燥し化
合物3を得た。収量94.5g, 収率80%。
(3)化合物4 3−アミノ−2−ニトロピリジン
化合物3 12g(60.9mmol)を2.5N-水酸化ナトリウム125ml
に溶解(赤色透明溶液になる)。室温で2日間攪拌す
る。攪拌に従い溶液の色は橙、黄と変化し析出物が増
加。反応終了後析出物4を濾取。少量の水で洗浄し、加
熱乾燥器にて減圧下約40℃で2時間乾燥して化合物4を得
た。収量8.1g, 収率96%。
(4)化合物5 2,3−ジアミノピリジン
化合物4 300mg(2.16mmol)にメタノール(9ml)を加え懸濁
液の状態で10%Pd-C触媒(M型wet) 49mg (0.022mmol)を加
え常圧水素雰囲気下室温にて攪拌。 1時間後反応液を濾
過、濾液を約1mlまで濃縮。濃縮液をジイソプロピルエ
ーテル5mlに希釈することにより、化合物5の結晶を得
た。収量177mg, 収率75%。
(5)化合物5 2,3−ジアミノピリジン
上記(4)において、晶析溶媒としてジイソプロピルエ
ーテルの代わりに、メチル・t−ブチルエーテル、酢酸
エチル、トルエン、アセトニトリル、アセトン、または
メチルイソブチルケトンを使用することにより、いずれ
の場合も化合物5を結晶として収率よく得た。[Chemical 7] (1) Compound 2 3-methoxycarbonylaminopyridine 3-aminopyridine 72 g (760 mmol) is dissolved in acetone (360 ml), and sodium hydrogencarbonate 77 g (912 mmol) is added. 71 ml (912 mmol) of methyl chlorocarbonate was added dropwise to this solution over about 10 minutes (with vigorous foaming). Stir at room temperature for about 1 hour,
Dilute to 435 ml water. The reaction mixture was concentrated under reduced pressure to remove acetone, and the mixture was stirred in an ice-water bath for about 90 minutes under cooling, and the precipitated crystals were collected by filtration. After washing with cold water, it was dried to obtain compound 2. Yield 107g, 92% yield. (2) Compound 3 3-methoxycarbonylamino-2-
Compound 2 91 g (600 mmol) was added to concentrated sulfuric acid 2 under concentrated heating in a nitropyridine oil bath at 45 ° C.
Dissolve in 00 ml and add 30 ml of fuming nitric acid (d = 1.52) dropwise over about 2 hours. Keep the internal temperature near 45 ° C. After the completion of dropping, stir at this temperature for about 3 hours. After cooling to room temperature, water with crushed ice added 16
When the reaction solution was diluted to 00 ml, yellow solid 3 was precipitated. It was filtered with a glass filter, washed with cold water, and dried by aeration for about 1 hour to obtain Compound 3. Yield 94.5g, 80% yield. (3) Compound 4 3-amino-2-nitropyridine Compound 3 12 g (60.9 mmol) of 2.5 N-sodium hydroxide 125 ml
Dissolve in (becomes a red transparent solution). Stir at room temperature for 2 days. The color of the solution changed to orange and yellow with stirring, and the number of precipitates increased. After the reaction was completed, the precipitate 4 was collected by filtration. It was washed with a small amount of water and dried in a heating dryer under reduced pressure at about 40 ° C. for 2 hours to obtain compound 4. Yield 8.1g, 96% yield. (4) Compound 5 2,3-Diaminopyridine Compound 4 To 300 mg (2.16 mmol) of methanol was added methanol (9 ml), and 10% Pd-C catalyst (M type wet) 49 mg (0.022 mmol) was added in a suspension state. Stir at room temperature in a hydrogen atmosphere. After 1 hour, the reaction solution was filtered and the filtrate was concentrated to about 1 ml. The concentrated liquid was diluted with 5 ml of diisopropyl ether to obtain crystals of compound 5. Yield 177 mg, 75% yield. (5) Compound 5 2,3-Diaminopyridine In the above (4), methyl tert-butyl ether, ethyl acetate, toluene, acetonitrile, acetone, or methyl isobutyl ketone is used as the crystallization solvent instead of diisopropyl ether. Thus, in any case, Compound 5 was obtained as crystals in good yield.
【0011】参考例1 化合物6の合成Reference Example 1 Synthesis of compound 6
【化8】
化合物4 278mg(2mmol)をメタノール(18ml)に溶解させ
る。この溶液にN-t-ブトキシカルボニル- N-メチルアミ
ノプロピオンアルデヒド450mg(2.4mmol)、酢酸(2ml)、1
0%Pd-C触媒130mgを加え常圧水素雰囲気下室温にて約4時
間攪拌する。高速液体クロマトグラフィーにより化合物
6(Me=メチル,Boc= t-ブトキシカルボニル)の生成
を確認した(生成率73%)。なお化合物6は、WO00
/32606号の参考例29に記載の通り、セフェム系
化合物の3位側鎖の合成原料であり、化合物5からも10
%Pd-C触媒等を使用して合成できる。[Chemical 8] Compound 278 mg (2 mmol) is dissolved in methanol (18 ml). To this solution was added Nt-butoxycarbonyl-N-methylaminopropionaldehyde 450 mg (2.4 mmol), acetic acid (2 ml), 1
130 mg of 0% Pd-C catalyst is added, and the mixture is stirred at room temperature under a hydrogen atmosphere at atmospheric pressure for about 4 hours. The formation of compound 6 (Me = methyl, Boc = t-butoxycarbonyl) was confirmed by high performance liquid chromatography (production rate 73%). Compound 6 is WO00
As described in Reference Example 29 of / 32606, it is a raw material for synthesizing the 3-position side chain of a cephem compound, and is also compound 5 to 10
It can be synthesized using a% Pd-C catalyst or the like.
【0012】参考例2Reference example 2
【化9】
(1)化合物9 3-アミノメチルフ゜ロヒ゜オンアルテ゛ヒト゛シ゛エチルアセタール
3-クロロフ゜ロヒ゜オンアルテ゛ヒト゛シ゛エチルアセタール(8)30g(0.18mol)を4
0%メチルアミン水溶液309ml(3.6mol)に加える。当初は二層状
であるが、油浴にて50度加熱下攪拌させると徐々に溶解
し均一溶液となる。8時間攪拌後室温に冷却し、減圧下メ
チルアミン水溶液を留去して淡黄色油状の化合物9を得る。
収量34.2g,収率96%
(2)化合物10 3-ホ゛ックアミノフ゜ロヒ゜オンアルテ゛ヒト゛シ゛エチルアセター
ル
化合物9 32g(162mmol)に水(160ml)を加え、その溶液に
炭酸水素ナトリウム17g(162mmol)を加えて完全に溶解さ
せる。二炭酸-シ゛-t-フ゛チル 33.5ml(146mmol)のアセトン溶液(3
2ml)を室温にて滴下し、4時間攪拌する。室温で一晩放
置した後酢酸エチル150mlに希釈し二層分離する。水層を酢
酸エチル150mlで逆抽出した後、有機層を合併して水150ml
で洗浄し、減圧下濃縮して黄色油状の化合物10を得
る。収量 38g 収率100%
(3)化合物7 ホ゛ックアミノアルテ゛ヒト゛
化合物10 38g(146mmol)に水(200ml)、酢酸(100m
l)を加えると二層状の溶液になる。室温にて一時間攪
拌し、その後油浴にて40度加熱下、1.5時間攪拌する。
攪拌に従い均一溶液となる。室温に冷却後、氷浴下8N
水酸化ナトリウム水溶液175mlを加え、pHを5~6に調整す
る。酢酸エチル150mlにて2回抽出を行った後、有機層を減
圧濃縮して、化合物7と酢酸の混合物を得る(NMRによる
7の純度72%)。収量 37g (化合物7 27g含)、収率(換
算)98%.[Chemical 9] (1) Compound 9 3-Aminomethylpropione aldehyde diethyl acetal 3-chloropropione aldehyde diethyl acetal (8) 30 g (0.18 mol) 4
Add to 309 ml (3.6 mol) of 0% aqueous methylamine solution. Initially, it has a two-layered structure, but when heated and stirred in an oil bath at 50 degrees, it gradually dissolves and becomes a uniform solution. After stirring for 8 hours, the mixture was cooled to room temperature and the aqueous methylamine solution was distilled off under reduced pressure to obtain a pale yellow oily compound 9.
Yield 34.2 g, 96% yield (2) Compound 10 3-Bock aminopropione aldehyde diethyl acetal compound 9 To 32 g (162 mmol) of water was added water (160 ml), and 17 g (162 mmol) of sodium hydrogen carbonate was added to the solution to completely Dissolve. Dicarbonic acid-di-t-butyl 33.5 ml (146 mmol) in acetone (3
2 ml) is added dropwise at room temperature, and the mixture is stirred for 4 hours. After standing overnight at room temperature, it is diluted with 150 ml of ethyl acetate and the two layers are separated. The water layer was back-extracted with 150 ml of ethyl acetate, and then the organic layers were combined to form 150 ml of water.
Wash with and concentrate under reduced pressure to give compound 10 as a yellow oil. Yield 38 g Yield 100% (3) Compound 7 Bock Amino Aldehytate Compound 10 38 g (146 mmol) in water (200 ml), acetic acid (100 m
Addition of l) results in a bilayer solution. Stir at room temperature for 1 hour, then stir in an oil bath at 40 degrees for 1.5 hours.
A homogeneous solution is formed by stirring. After cooling to room temperature, in an ice bath 8N
Add 175 ml of sodium hydroxide aqueous solution to adjust the pH to 5-6. After extracting twice with 150 ml of ethyl acetate, the organic layer is concentrated under reduced pressure to give a mixture of compound 7 and acetic acid (purity of 7 by NMR: 72%). Yield 37g (including 27g of compound 7), yield (converted) 98%.
【0013】参考例3Reference Example 3
【化10】
化合物6 33g(118mmol)にオルトぎ酸トリエチル26g(177
mmol)を加え、懸濁液にする。p-トルエンスルホン酸・
一水和物0.22g(1.2mmol)を加え、油浴にて100℃に加熱
し攪拌する。4時間加熱後TLCにて原料消失を確認し、
室温に冷却、減圧下オルトぎ酸トリエチルと、副生する
エタノールを留去して、WO00/32606の参考例
8に記載の化合物11のスラリーを得る。反応はほぼ定
量的に進行。[Chemical 10] Compound 6 33 g (118 mmol) and triethyl orthoformate 26 g (177
(mmol) to make a suspension. p-toluenesulfonic acid
Add 0.22 g (1.2 mmol) of monohydrate, heat to 100 ° C. in an oil bath and stir. After heating for 4 hours, confirm the disappearance of raw materials by TLC,
After cooling to room temperature, triethyl orthoformate and by-produced ethanol are distilled off under reduced pressure to obtain a slurry of compound 11 described in Reference Example 8 of WO00 / 32606. The reaction proceeds almost quantitatively.
【発明の効果】本発明は、2,3−ジアミノピリジンお
よびその合成中間体である3−アミノ−2−ニトロピリ
ジンの工業的に有利な製法を提供する。本製法を利用す
ることにより、例えばセフェム系抗菌剤を工業的に効率
よく生産することができる。Industrial Applicability The present invention provides an industrially advantageous process for producing 2,3-diaminopyridine and its synthetic intermediate, 3-amino-2-nitropyridine. By using this production method, for example, a cephem antibacterial agent can be industrially efficiently produced.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 隅野 幸仁 兵庫県尼崎市杭瀬寺島2丁目1番3号 塩 野義製薬株式会社内 Fターム(参考) 4C055 AA01 BA02 BA51 BA52 BB15 BB17 CA02 CA52 CB17 DA01 FA01 FA15 4C065 AA04 BB01 CC01 DD03 EE02 HH01 JJ01 KK09 LL01 PP01 QQ02 4G069 AA03 AA08 BA08A BA08B BC72A BC72B CB02 DA05 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Yukinori Sumino Salt, 2-3-1, Kiserejima, Amagasaki City, Hyogo Prefecture Nogi Pharmaceutical Co., Ltd. F-term (reference) 4C055 AA01 BA02 BA51 BA52 BB15 BB17 CA02 CA52 CB17 DA01 FA01 FA15 4C065 AA04 BB01 CC01 DD03 EE02 HH01 JJ01 KK09 LL01 PP01 QQ02 4G069 AA03 AA08 BA08A BA08B BC72A BC72B CB02 DA05
Claims (5)
−2−ニトロピリジン(IV)をPd−C触媒存在下、
還元することを特徴とする、2,3−ジアミノピリジン
(V)の製造方法。 【化1】 1. A method shown in the following reaction scheme, wherein 3-amino-2-nitropyridine (IV) is added in the presence of a Pd-C catalyst.
A method for producing 2,3-diaminopyridine (V), which comprises reducing. [Chemical 1]
ピリジン(I)のアミノ基を保護して3−保護アミノピ
リジン(II)(式中、R1はアミノ保護基)を得た
後、ニトロ化剤を反応させて化合物(III)を得、こ
れを脱保護することを特徴とする、3−アミノ−2−ニ
トロピリジン(IV)の製造方法。 【化2】 2. After the amino group of 3-aminopyridine (I) is protected by the following reaction scheme to give 3-protected aminopyridine (II) (wherein R 1 is an amino-protecting group): A method for producing 3-amino-2-nitropyridine (IV), which comprises reacting a nitrating agent to obtain compound (III) and deprotecting it. [Chemical 2]
が請求項2記載の製造方法により得られたものである、
請求項1記載の製造方法。3. 3-Amino-2-nitropyridine (IV)
Is obtained by the manufacturing method according to claim 2,
The manufacturing method according to claim 1.
含することを特徴とする、置換されていてもよいイミダ
ゾ[4,5−b]ピリジニウム基を有する化合物の製造
方法。4. A method for producing a compound having an optionally substituted imidazo [4,5-b] pyridinium group, which comprises the step according to any one of claims 1 to 3.
含することを特徴とする、3位に置換されていてもよい
イミダゾ[4,5−b]ピリジニウムメチル基を有する
セフェム化合物の製造方法。5. A cephem compound having an optionally substituted imidazo [4,5-b] pyridiniummethyl group at the 3-position, which comprises the step according to any one of claims 1 to 3. Manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001268654A JP2003012647A (en) | 2000-10-04 | 2001-09-05 | Method for producing 2,3-diaminopyridine |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-304710 | 2000-10-04 | ||
| JP2000304710 | 2000-10-04 | ||
| JP2001125954 | 2001-04-24 | ||
| JP2001-125954 | 2001-04-24 | ||
| JP2001268654A JP2003012647A (en) | 2000-10-04 | 2001-09-05 | Method for producing 2,3-diaminopyridine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003012647A true JP2003012647A (en) | 2003-01-15 |
Family
ID=27344859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001268654A Pending JP2003012647A (en) | 2000-10-04 | 2001-09-05 | Method for producing 2,3-diaminopyridine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003012647A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003068745A1 (en) * | 2002-02-14 | 2003-08-21 | Shionogi & Co., Ltd. | Process for production of 2,3-diaminopyridine derivatives |
| JP2007051128A (en) * | 2005-07-22 | 2007-03-01 | Ube Ind Ltd | Method for producing aniline having aralkyloxy or heteroaralkyloxy group |
| DE102009022830A1 (en) | 2008-10-24 | 2010-04-29 | Jubilant Organosys Ltd. | Preparing 2,3-diaminopyridine compounds, useful e.g. as intermediates to produce pharmaceutical compounds, comprises aminating 3-amino-2-halopyridine compounds with aqueous ammonia in the presence of catalyst, heating and extracting |
| CN103664762A (en) * | 2013-12-06 | 2014-03-26 | 常熟市联创化学有限公司 | Method for preparing 2,3-diamino pyridine |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05339236A (en) * | 1992-06-05 | 1993-12-21 | Nippon Synthetic Chem Ind Co Ltd:The | Method for producing 2,3-diaminopyridines |
| WO1998042680A1 (en) * | 1997-03-25 | 1998-10-01 | Kowa Company, Ltd. | Novel anilide compounds and drugs containing the same |
| WO2000032606A1 (en) * | 1998-11-27 | 2000-06-08 | Shionogi & Co., Ltd. | IMIDAZO[4,5-b]PYRIDINIUMMETHYL-CONTAINING CEPHEM COMPOUNDS HAVING BROAD ANTIBACTERIAL SPECTRUM |
-
2001
- 2001-09-05 JP JP2001268654A patent/JP2003012647A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05339236A (en) * | 1992-06-05 | 1993-12-21 | Nippon Synthetic Chem Ind Co Ltd:The | Method for producing 2,3-diaminopyridines |
| WO1998042680A1 (en) * | 1997-03-25 | 1998-10-01 | Kowa Company, Ltd. | Novel anilide compounds and drugs containing the same |
| WO2000032606A1 (en) * | 1998-11-27 | 2000-06-08 | Shionogi & Co., Ltd. | IMIDAZO[4,5-b]PYRIDINIUMMETHYL-CONTAINING CEPHEM COMPOUNDS HAVING BROAD ANTIBACTERIAL SPECTRUM |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003068745A1 (en) * | 2002-02-14 | 2003-08-21 | Shionogi & Co., Ltd. | Process for production of 2,3-diaminopyridine derivatives |
| JP2007051128A (en) * | 2005-07-22 | 2007-03-01 | Ube Ind Ltd | Method for producing aniline having aralkyloxy or heteroaralkyloxy group |
| DE102009022830A1 (en) | 2008-10-24 | 2010-04-29 | Jubilant Organosys Ltd. | Preparing 2,3-diaminopyridine compounds, useful e.g. as intermediates to produce pharmaceutical compounds, comprises aminating 3-amino-2-halopyridine compounds with aqueous ammonia in the presence of catalyst, heating and extracting |
| CN103664762A (en) * | 2013-12-06 | 2014-03-26 | 常熟市联创化学有限公司 | Method for preparing 2,3-diamino pyridine |
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