JP2003012320A - Silica-based inorganic compound organosol - Google Patents
Silica-based inorganic compound organosolInfo
- Publication number
- JP2003012320A JP2003012320A JP2001197055A JP2001197055A JP2003012320A JP 2003012320 A JP2003012320 A JP 2003012320A JP 2001197055 A JP2001197055 A JP 2001197055A JP 2001197055 A JP2001197055 A JP 2001197055A JP 2003012320 A JP2003012320 A JP 2003012320A
- Authority
- JP
- Japan
- Prior art keywords
- silica
- inorganic compound
- organosol
- fine particles
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 140
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 63
- 150000002484 inorganic compounds Chemical class 0.000 title claims abstract description 58
- 229910010272 inorganic material Inorganic materials 0.000 title claims abstract description 58
- 239000002245 particle Substances 0.000 claims abstract description 57
- 239000010419 fine particle Substances 0.000 claims abstract description 55
- 150000005846 sugar alcohols Polymers 0.000 claims abstract description 31
- 239000003960 organic solvent Substances 0.000 claims abstract description 24
- 239000002131 composite material Substances 0.000 claims abstract description 12
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 10
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 9
- 239000006185 dispersion Substances 0.000 abstract description 21
- 239000011248 coating agent Substances 0.000 description 28
- 238000000576 coating method Methods 0.000 description 25
- 229910004298 SiO 2 Inorganic materials 0.000 description 24
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 22
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 239000000758 substrate Substances 0.000 description 15
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- -1 alkylene glycol Chemical compound 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000005977 Ethylene Substances 0.000 description 8
- 239000011259 mixed solution Substances 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical class CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 150000002596 lactones Chemical class 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000003957 anion exchange resin Substances 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001767 cationic compounds Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 150000002892 organic cations Chemical class 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical class O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910052751 metal Chemical class 0.000 description 1
- 239000002184 metal Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Silicon Compounds (AREA)
Abstract
(57)【要約】
【課題】 有機溶媒中で優れた分散安定性を示す。
【解決手段】 平均粒子径が2〜100nmの範囲にあ
り、多価アルコールで表面が修飾されたシリカ系無機化
合物微粒子が、有機溶媒に分散しているオルガノゾルで
あって、該シリカ系無機化合物微粒子のシリカ源の一部
または全部がアルカリ金属珪酸塩に由来するものであ
る。前記無機化合物微粒子はシリカ微粒子であることが
好ましく、また、シリカおよびシリカ以外の無機酸化物
の1種または2種以上とからなるシリカ系複合酸化物微
粒子であることが好ましい。(57) [Summary] [PROBLEMS] To exhibit excellent dispersion stability in an organic solvent. SOLUTION: The silica-based inorganic compound fine particles having an average particle diameter in the range of 2 to 100 nm, and the silica-based inorganic compound fine particles whose surface is modified with a polyhydric alcohol are dispersed in an organic solvent. Part or all of the silica source is derived from an alkali metal silicate. The inorganic compound fine particles are preferably silica fine particles, and are preferably silica-based composite oxide fine particles comprising one or more of silica and an inorganic oxide other than silica.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、塗料、ハードコー
ト剤、透明保護膜、ポリマー用フィラー等に利用可能な
シリカ系無機化合物微粒子が有機溶媒に分散した無機化
合物オルガノゾルに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inorganic compound organosol in which fine particles of a silica-based inorganic compound, which can be used for paints, hard coating agents, transparent protective films, polymer fillers, etc., are dispersed in an organic solvent.
【0002】[0002]
【従来の技術】一般に、シリカ、アルミナなどの無機酸
化物微粒子の有機溶媒分散液を得るには、これらの微粒
子の表面を疎水性にすることが必要であり、このため、
通常、微粒子の表面を改質(修飾)することが行われて
いる。このような無機化合物微粒子の表面修飾法とし
て、反応性モノマーまたはカップリング剤などと微粒子
表面のヒドロキシル基とを反応させる方法がある。この
ような方法として具体的には、粉末状の微粒子を有機溶
媒に分散させたのちに修飾剤を添加して微粒子表面を修
飾させる方法、または微粒子の水分散液の水を有機溶媒
と溶媒置換したのちに修飾剤を添加して微粒子表面を修
飾させる方法などが挙げられる。しかしながら、これら
の方法では、微粒子の凝集を完全に抑制できず、分散性
の良い有機溶媒ゾルを得ることが困難であった。また、
カップリング剤を用いた場合、処理した微粒子の有機溶
媒分散液に水を混合する際にカップリング剤が微粒子か
ら解離して脱離し、微粒子の安定性が低下するといった
問題があった。さらに、塗料、ハードコート剤などのフ
ィラーとしてこのような無機化合物微粒子を用いる場
合、被膜形成剤のマトリックスにこれらのゾルを配合す
ると、マトリックス中で微粒子が凝集しやすくなるなど
の問題があった。2. Description of the Related Art Generally, in order to obtain an organic solvent dispersion of inorganic oxide fine particles such as silica and alumina, it is necessary to make the surfaces of these fine particles hydrophobic.
Usually, the surface of fine particles is modified (modified). As a method of modifying the surface of such inorganic compound fine particles, there is a method of reacting a reactive monomer or a coupling agent with a hydroxyl group on the surface of the fine particles. As such a method, specifically, a method in which powdery fine particles are dispersed in an organic solvent and then a modifier is added to modify the surface of the fine particles, or water in an aqueous dispersion of fine particles is replaced with an organic solvent as a solvent Then, a method of adding a modifying agent to modify the surface of the fine particles may be used. However, these methods cannot completely suppress the aggregation of fine particles, and it is difficult to obtain an organic solvent sol having good dispersibility. Also,
When the coupling agent is used, there is a problem that the coupling agent is dissociated from the fine particles and desorbed when water is mixed into the organic solvent dispersion liquid of the treated fine particles, and the stability of the fine particles is lowered. Furthermore, when such inorganic compound fine particles are used as a filler for paints, hard coat agents, etc., when these sols are blended in the matrix of the film forming agent, there is a problem that the fine particles easily aggregate in the matrix.
【0003】特開平63−185439号公報には、平
均粒子径が0. 05〜5μmの範囲にあり、加水分解可
能な有機金属化合物を加水分解して得られるシリカなど
の無機酸化物微粒子の表面にグリコールを結合させたグ
リコール単分散体が開示されている。また、本願出願人
は、アルコキシシランの加水分解によって得られる平均
粒子径が0. 1μ程度のシリカ粒子が、例えばエチレン
グリコール等の多価アルコールに分散したシリカオルガ
ノゾルを開示している(特許第2718431号公
報)。しかしながら、これらの粒子は塗料中に配合され
た場合、粒子径が大きすぎ塗膜の強度が不充分であった
り、基材との密着性に劣ることが判明した。また、これ
らの粒子を分散させる有機溶媒の種類によっては安定性
が低下したり、さらに電解質等が共存すると不安定とな
り、用途に制約があった。In Japanese Patent Laid-Open No. 63-185439, the surface of inorganic oxide fine particles such as silica obtained by hydrolyzing a hydrolyzable organic metal compound having an average particle size of 0.05 to 5 μm is disclosed. A glycol monodisperse in which a glycol is bound to is disclosed. Further, the applicant of the present application discloses a silica organosol in which silica particles obtained by hydrolysis of alkoxysilane and having an average particle size of about 0.1 μ are dispersed in a polyhydric alcohol such as ethylene glycol (Patent No. 2718431). However, it has been found that when these particles are blended in a paint, the particle size is too large and the strength of the coating film is insufficient, or the adhesion to the substrate is poor. In addition, depending on the type of organic solvent in which these particles are dispersed, the stability is lowered, and the presence of an electrolyte or the like causes instability, which limits the use.
【0004】なお、上記有機金属化合物を加水分解する
方法では平均粒子径が0. 1μ以下、特に0. 04μm
以下の単分散性に優れた粒子を得ることは困難である。
また、上記アルコキシシランを加水分解する方法では、
アルキル基を有していたり、アルコキシ基が存在するこ
とがあるので修飾多価アルコール量が減少し、安定性に
優れた無機化合物オルガノゾルが得られにくい。In the method of hydrolyzing the above-mentioned organometallic compound, the average particle diameter is 0.1 μm or less, particularly 0.04 μm.
It is difficult to obtain the following particles having excellent monodispersity.
Further, in the method of hydrolyzing the alkoxysilane,
Since it may have an alkyl group or may have an alkoxy group, the amount of modified polyhydric alcohol decreases, and it is difficult to obtain an inorganic compound organosol having excellent stability.
【0005】[0005]
【発明が解決しようとする課題】本発明は、上記事情に
鑑みてなされたもので、有機溶媒中で優れた分散安定性
を有するシリカ系無機化合物オルガノゾルを提供するこ
とを目的する。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to provide a silica-based inorganic compound organosol having excellent dispersion stability in an organic solvent.
【0006】[0006]
【課題を解決するための手段】本発明は、平均粒子径が
2〜100nmの範囲にあり、多価アルコールで表面が
修飾されたシリカ系無機化合物微粒子が有機溶媒に分散
してなるオルガノゾルであって、該シリカ系無機化合物
微粒子のシリカ源の一部または全部がアルカリ金属珪酸
塩に由来するものであることを特徴とするものである。
前記無機化合物微粒子はシリカ微粒子であることが好ま
しい。前記無機化合物微粒子は、シリカおよびシリカ以
外の無機酸化物の1種または2種以上とからなるシリカ
系複合酸化物微粒子であることが好ましい。The present invention is an organosol having an average particle diameter in the range of 2 to 100 nm and having silica-based inorganic compound fine particles whose surface is modified with a polyhydric alcohol dispersed in an organic solvent. Then, part or all of the silica source of the silica-based inorganic compound fine particles is derived from an alkali metal silicate.
The inorganic compound fine particles are preferably silica fine particles. The inorganic compound fine particles are preferably silica-based composite oxide fine particles made of one kind or two or more kinds of silica and an inorganic oxide other than silica.
【0007】[0007]
【発明の実施の形態】以下、本発明の好適な実施形態を
説明する。
1.無機化合物オルガノゾル
本発明に係る無機化合物オルガノゾルは、平均粒子径が
2〜100nmの範囲にあり、多価アルコールで表面が
修飾された無機化合物微粒子が有機溶媒に分散してい
る。BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described below. 1. Inorganic Compound Organosol The inorganic compound organosol according to the present invention has an average particle size in the range of 2 to 100 nm, and the inorganic compound fine particles whose surface is modified with a polyhydric alcohol are dispersed in an organic solvent.
【0008】無機化合物微粒子
上記無機化合物微粒子は、平均粒子径が2〜100nm
の範囲にある。より好ましい範囲は2〜80nm、特
に、2〜40nmの範囲である。平均粒子径が2nm未
満の粒子は得ることが困難であり、得られたとしても粒
子径が小さすぎ、このため無機化合物微粒子を含む被膜
等を形成しても膜の強度や、基材との密着性が向上する
効果が得られにくい。また無機化合物微粒子を含むフィ
ルムや繊維を製造しても充分な滑り性が得られないこと
がある。平均粒子径が100nmを越えると、無機化合
物微粒子を含む塗膜等を形成しても膜の強度が低下した
り、基材との密着性が向上しない。また、粒子が大きす
ぎて安定な分散状態を維持できず沈降することがある。
また、粒子径が大きいために単位粒子重量当たりの修飾
多価アルコール量が少なくなり、安定性に優れた無機化
合物オルガノゾルが得られにくい。[0008] Inorganic compound fine particles of the inorganic compound fine particles have an average particle diameter of 2~100nm
Is in the range. A more preferable range is 2 to 80 nm, and particularly a range of 2 to 40 nm. It is difficult to obtain particles having an average particle diameter of less than 2 nm, and even if obtained, the particle diameter is too small. Therefore, even if a coating film or the like containing fine particles of an inorganic compound is formed, the strength of the film and that of the base material It is difficult to obtain the effect of improving the adhesiveness. Further, even if a film or fiber containing inorganic compound fine particles is manufactured, sufficient slipperiness may not be obtained. If the average particle size exceeds 100 nm, the strength of the film will not be reduced or the adhesion to the substrate will not be improved even if a coating film containing inorganic compound fine particles is formed. In addition, the particles may be too large to maintain a stable dispersed state and may settle.
Further, since the particle size is large, the amount of modified polyhydric alcohol per unit particle weight is small, and it is difficult to obtain an inorganic compound organosol having excellent stability.
【0009】本発明で用いられるシリカ系無機化合物微
粒子としては、シリカ単独粒子の他、シリカとシリカ以
外の無機酸化物の1種または2種以上とからなるシリカ
系複合酸化物微粒子が好ましい。シリカ以外の無機酸化
物としては、例えば周期表の1A族、2A族、2B族、
3A族、3B族、4A族、4B族、5A族、5B族、6
A族から選ばれる元素の酸化物を挙げることができ、具
体的には、Li2 O、Na2 O、K2 O、Rb2O、B
eO、MgO、CaO、ZnO、Y2 O3 、La
2 O3 、Al2 O3 、Ga2 O3 、B2 O3 、Ce2 O
3 、Sb2 O3 、P2 O5 、TiO2 、ZrO2、Sn
O2 、MoO3 、WO3 などが挙げられる。シリカ系複
合酸化物微粒子として具体的には、シリカ−アルミナ、
シリカ−ジルコニア、シリカ−チタニアなどが挙げられ
る。上記シリカ粒子またはシリカ系複合酸化物微粒子
は、球状の微粒子を得易く、かつ表面OH基が多いので
微粒子表面により多くの多価アルコールを結合させるこ
とができ、また結合した多価アルコールは容易に脱離
(分解)しないので好ましい。The silica-based inorganic compound particles used in the present invention are preferably silica-based composite oxide particles composed of silica alone particles or silica and one or more kinds of inorganic oxides other than silica. Examples of the inorganic oxides other than silica include 1A group, 2A group, 2B group of the periodic table,
3A group, 3B group, 4A group, 4B group, 5A group, 5B group, 6
Examples thereof include oxides of elements selected from Group A, and specific examples include Li 2 O, Na 2 O, K 2 O, Rb 2 O and B.
eO, MgO, CaO, ZnO, Y 2 O 3 , La
2 O 3 , Al 2 O 3 , Ga 2 O 3 , B 2 O 3 , Ce 2 O
3 , Sb 2 O 3 , P 2 O 5 , TiO 2 , ZrO 2 , Sn
O 2 , MoO 3 , WO 3 and the like can be mentioned. Specifically as the silica-based composite oxide fine particles, silica-alumina,
Examples thereof include silica-zirconia and silica-titania. The silica particles or the silica-based composite oxide fine particles can easily obtain spherical fine particles and have many surface OH groups, so that more polyhydric alcohol can be bonded to the surface of the fine particles, and the bonded polyhydric alcohol can be easily It is preferable because it is not desorbed (decomposed).
【0010】前記シリカ粒子としては、本願出願人の出
願による特開昭63−45114号公報、特開昭63−
45113号公報、特開昭63−64911号公報等に
記載されたシリカゾルが好適である。具体的には無機酸
化物微粒子からなるシード粒子を分散させた分散液に、
ケイ酸ナトリウムなどのアルカリ金属ケイ酸塩を脱塩し
て得られる珪酸液を添加することによって製造される。
シリカ系複合酸化物微粒子は、例えば本出願人が先に出
願した特開昭63−123807号公報、特開平5−1
32309号公報等の記載に基づき製造される。具体的
には、ケイ酸ナトリウムなどのアルカリ金属ケイ酸塩ま
たはこれを脱アルカリして得られる珪酸液と、アルカリ
可溶の無機化合物とをpH10以上のアルカリ水溶液中
に同時に加え、反応液のpHを制御せずに反応させるこ
とによって得ることができる。また、pH10以上のア
ルカリ水溶液にシリカ、アルミナなどの無機酸化物微粒
子からなるシード粒子を分散させた分散液に、上記のケ
イ酸塩または珪酸液とアルカリ可溶無機化合物を添加
し、粒子成長させることによって、得ることもできる。As the silica particles, Japanese Patent Application Laid-Open No. 63-45114 and Japanese Patent Application Laid-Open No. 63-45114 filed by the applicant of the present application.
The silica sol described in Japanese Patent No. 45113, Japanese Patent Laid-Open No. 63-64911, etc. is suitable. Specifically, in a dispersion liquid in which seed particles composed of inorganic oxide fine particles are dispersed,
It is produced by adding a silicic acid solution obtained by desalting an alkali metal silicate such as sodium silicate.
The silica-based complex oxide fine particles are, for example, Japanese Patent Application Laid-Open No. 63-123807 and Japanese Patent Application Laid-Open No. 5-1 (1993) filed by the present applicant.
It is manufactured based on the description in Japanese Patent No. 32309. Specifically, an alkali metal silicate such as sodium silicate or a silicic acid solution obtained by dealkalizing the alkali metal silicate and an alkali-soluble inorganic compound are simultaneously added to an alkaline aqueous solution having a pH of 10 or more to obtain the pH of the reaction solution. Can be obtained by reacting without controlling. Further, the above-mentioned silicate or silicic acid solution and an alkali-soluble inorganic compound are added to a dispersion in which seed particles composed of fine particles of an inorganic oxide such as silica or alumina are dispersed in an alkaline aqueous solution having a pH of 10 or more to grow the particles. It can also be obtained.
【0011】上記シリカ系複合酸化物微粒子中のシリカ
以外の無機酸化物の含有量は0. 01〜50重量%、特
に0. 1〜30重量%の範囲にあることが望ましい。該
含有量が0. 01重量%未満の場合は、表面に結合でき
る多価アルコールの量がシリカ単独粒子と変わらず、該
含有量が50重量%を越えると、得られるシリカ系複合
酸化物微粒子の分散安定性が低下する傾向にあり、表面
に結合できる多価アルコールの量がさらに増加し、分散
安定性が向上することもない。The content of the inorganic oxide other than silica in the silica-based composite oxide fine particles is preferably 0.01 to 50% by weight, and particularly preferably 0.1 to 30% by weight. When the content is less than 0.01% by weight, the amount of polyhydric alcohol capable of binding to the surface is the same as that of the silica single particles, and when the content exceeds 50% by weight, the silica-based composite oxide fine particles obtained are The dispersion stability of 1 tends to decrease, the amount of polyhydric alcohol that can be bonded to the surface further increases, and the dispersion stability does not improve.
【0012】前記シリカ粒子およびシリカ系複合酸化物
微粒子のシリカ源としては、前記したようにアルカリ金
属珪酸塩を用いる。アルカリ金属珪酸塩を用いて得られ
るシリカ粒子およびシリカ系複合酸化物微粒子は、その
平均粒子径を容易に2〜100nmの範囲とすることが
できる。また、アルカリ金属珪酸塩を用いてシード粒子
を粒子成長させる方法では、平均粒子径が100nmを
越える粒子を得るには極めて長時間を要する。一方、加
水分解可能な有機金属化合物を用いるゾルゲル法では容
易に粒子成長が起こり、平均粒子径が100nm以下の
粒子を得ることが困難である。また、ゾルゲル法では加
水分解が不充分でアルコキシ基が残存することがあり、
この場合OH基が減少するので多価アルコールの修飾量
が低減し、分散安定性が不充分になり易い。As the silica source of the silica particles and the silica-based composite oxide fine particles, the alkali metal silicate is used as described above. The silica particles and the silica-based composite oxide fine particles obtained by using the alkali metal silicate can easily have an average particle size in the range of 2 to 100 nm. Further, in the method of growing seed particles using an alkali metal silicate, it takes an extremely long time to obtain particles having an average particle size of more than 100 nm. On the other hand, in the sol-gel method using a hydrolyzable organometallic compound, particle growth easily occurs, and it is difficult to obtain particles having an average particle diameter of 100 nm or less. Further, in the sol-gel method, hydrolysis may be insufficient and alkoxy groups may remain,
In this case, since the OH group decreases, the modification amount of the polyhydric alcohol decreases, and the dispersion stability tends to be insufficient.
【0013】多価アルコール
前記無機化合物微粒子の表面は多価アルコールで修飾さ
れる。多価アルコールで処理すると、シランカップリン
グ剤等で処理した場合と比較して、結合が強く、水等を
混合しても容易に多価アルコールが分解、脱離すること
がなく、アルコール、多価アルコールの他、γ−ブチロ
ラクトンなどのラクトン類等の有機溶媒に安定な無機化
合物オルガノゾルを得ることができる。更に、このよう
な有機溶媒中に無機や有機のカチオン、アニオンまたは
塩類が共存していても安定な無機化合物オルガノゾルを
得ることができる。修飾に用いられる多価アルコールと
しては、エチレングリコール、(ポリ)エチレングリコ
ール、プロピレングリコール、(ポリ)プロピレングリ
コール、ネオペンチルグリコール、カテコール、レゾル
シノール、アルキレングリコール等の二官能性アルコー
ル、グルセリン、トリメチロールプロパン等の三官能性
アルコール、ポリビニルアルコール等が挙げられる。 Polyhydric alcohol The surface of the inorganic compound fine particles is modified with a polyhydric alcohol. When treated with a polyhydric alcohol, the bond is stronger than when treated with a silane coupling agent or the like, and the polyhydric alcohol is not easily decomposed or eliminated even when mixed with water or the like. It is possible to obtain an inorganic compound organosol which is stable to organic solvents such as lactones such as γ-butyrolactone as well as polyhydric alcohols. Furthermore, even if an inorganic or organic cation, anion or salt coexists in such an organic solvent, a stable inorganic compound organosol can be obtained. Examples of polyhydric alcohols used for modification include ethylene glycol, (poly) ethylene glycol, propylene glycol, (poly) propylene glycol, neopentyl glycol, catechol, resorcinol, alkylene glycol and other bifunctional alcohols, glycerin, trimethylolpropane. And trifunctional alcohols such as polyvinyl alcohol, and the like.
【0014】有機溶媒
本発明の無機化合物オルガノゾルに用いられる有機溶媒
としては、従来公知の所望の有機溶媒を用いることがで
きる。具体的には、エタノール、プロパノール、ブタノ
ール等の1価アルコール、エチレングリコール、プロピ
レングリコール等の多価アルコール、エチレングリコー
ルモノエチルエーテル等のアルコールエーテル類、N−
メチルホルムアミド、N,N−ジメチルホルムアミド、
N−メチルアセトアミド等のアミド系溶媒、γ−ブチロ
ラクトン、N−メチル−2−ピロリドン等のラクトン類
などが挙げられる。これらの有機溶媒は1種または2種
以上混合して使用してもよい。本発明に係る無機化合物
オルガノゾルは、γ−ブチロラクトン等のラクトン類を
分散媒としても、また、溶媒中に無機、有機のカチオ
ン、アニオン、塩類等が存在していても安定性に優れて
いる点が特徴的である。従って、これらのオルガノゾル
には、有機酸、無機酸またはこれらの塩が含まれていて
もよい。有機酸、無機酸またはこれらの塩としては、塩
酸、硫酸、硝酸、リン酸、過塩素酸、酢酸、およびこれ
らのアンモニウム塩、金属塩などが挙げられる。当該無
機化合物オルガノゾル中の無機化合物微粒子の濃度は、
1〜50重量%、特に5〜30重量%であることが望ま
しい。該濃度が50重量を越えると、分散液の粘度が高
くなり、流動性が低下するので実用上、利便性に欠ける
傾向がある。[0014] The organic solvent used in inorganic compound organosol organic solvent present invention may be a conventionally known desired organic solvent. Specifically, monohydric alcohols such as ethanol, propanol and butanol, polyhydric alcohols such as ethylene glycol and propylene glycol, alcohol ethers such as ethylene glycol monoethyl ether, N-
Methylformamide, N, N-dimethylformamide,
Examples thereof include amide solvents such as N-methylacetamide, γ-butyrolactone and lactones such as N-methyl-2-pyrrolidone. These organic solvents may be used alone or in combination of two or more. The inorganic compound organosol according to the present invention is excellent in stability even when a lactone such as γ-butyrolactone is used as a dispersion medium, and also when an inorganic or organic cation, anion or salt is present in the solvent. Is characteristic. Therefore, these organosols may contain organic acids, inorganic acids or salts thereof. Examples of the organic acid, the inorganic acid and salts thereof include hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, perchloric acid, acetic acid, and ammonium salts and metal salts thereof. The concentration of the inorganic compound fine particles in the inorganic compound organosol is
It is preferably 1 to 50% by weight, particularly 5 to 30% by weight. When the concentration exceeds 50% by weight, the viscosity of the dispersion becomes high and the fluidity is lowered, so that there is a tendency for practical convenience to be lacking.
【0015】2.無機化合物オルガノゾルの製造方法
上記無機化合物オルガノゾルは、前記シリカ粒子または
シリカ系複合酸化物微粒子の表面に多価アルコールが結
合しており、これが有機溶媒に安定して分散可能であれ
ば、どのような製造方法をも採用することができる。例
えば、始めに前記シリカ粒子またはシリカ系複合酸化物
微粒子の水分散液を調製する。このときの分散液の濃度
は1〜50重量%、特に5〜30重量%の範囲とするこ
とが好ましい。濃度が1重量%未満では、濃度が低すぎ
て粒子と多価アルコールとの結合が効率的に起きにく
く、濃度が50重量%を越えると、濃度が高すぎるため
に均一な処理が困難になる。2. Method for producing inorganic compound organosol The inorganic compound organosol has a polyhydric alcohol bonded to the surface of the silica particles or silica-based composite oxide fine particles, and if this is stably dispersible in an organic solvent, what kind of A manufacturing method can also be adopted. For example, first, an aqueous dispersion of the silica particles or silica-based composite oxide fine particles is prepared. The concentration of the dispersion liquid at this time is preferably in the range of 1 to 50% by weight, particularly 5 to 30% by weight. If the concentration is less than 1% by weight, the concentration is too low to efficiently bond the particles with the polyhydric alcohol, and if the concentration exceeds 50% by weight, the concentration is too high and uniform treatment becomes difficult. .
【0016】この分散液に多価アルコールを添加し、必
要に応じて加熱熟成した後、加熱蒸留しながら多価アル
コールと粒子の表面OH基を反応させるとともに水を留
去する。多価アルコールの添加量は、無機化合物粒子の
平均粒子径によっても異なるが、無機化合物粒子100
重量部当たり、多価アルコール1〜200重量部、特に
10〜100重量部の範囲にあることが好ましい。多価
アルコールの添加量が1重量部未満の場合は、表面に結
合した多価アルコールの量が少なく得られる無機化合物
オルガノゾルの安定性が不充分となることがあり、特に
塩類が存在する場合はゲル化する虞がある。他方、多価
アルコールの添加量が200重量部を越えてもさらに表
面に結合した多価アルコールの量が増えることもなく、
かえって過剰で未反応の多価アルコールが残存し、塗料
化して製膜する際に多価アルコールが残留することがあ
る。Polyhydric alcohol is added to this dispersion and, if necessary, it is heat-aged, and then the polyhydric alcohol is reacted with the surface OH groups of the particles while heating and distilling, and water is distilled off. The amount of the polyhydric alcohol added varies depending on the average particle size of the inorganic compound particles, but the inorganic compound particles 100
It is preferably in the range of 1 to 200 parts by weight, especially 10 to 100 parts by weight, per part by weight. When the amount of the polyhydric alcohol added is less than 1 part by weight, the amount of the polyhydric alcohol bound to the surface is small, and the stability of the obtained inorganic compound organosol may be insufficient, particularly when salts are present. There is a risk of gelation. On the other hand, even when the amount of polyhydric alcohol added exceeds 200 parts by weight, the amount of polyhydric alcohol bound to the surface does not increase,
On the contrary, excess and unreacted polyhydric alcohol may remain, and the polyhydric alcohol may remain when it is formed into a paint and formed into a film.
【0017】前記加熱熟成または加熱蒸留する際の温度
は30〜200℃、特に50〜180℃の範囲が好まし
い。温度が30℃未満の場合は、長時間を要しても反応
が充分進まないことがあり、他方、温度が200℃を越
えても、さらに処理時間を短くできる等の効果は得られ
ない。当該処理時間は上記処理温度によっても異なる
が、通常0. 5〜24時間程度である。次いで、所望の
有機溶媒を添加し、水の残存量が0. 1〜20重量%程
度になる程度まで再び加熱蒸留を行って水分を留去し
て、本発明の無機化合物オルガノゾルを得る。このとき
の蒸留時間は概ね0. 5〜10時間である。上記水の残
存量を0. 1重量%未満にすることは困難であると共
に、得られる無機化合物オルガノゾルの安定性を損なう
ことがある。水の残存量が20重量%を越えると、塗料
として用いた場合に塗膜形成性や、基材によっては基材
との密着性が低下することがある。このような無機化合
物オルガノゾル中の無機化合物微粒子の濃度は、1〜5
0重量%、特に5〜30重量%の量で含まれていること
が望ましい。The temperature during the heat aging or heat distillation is preferably in the range of 30 to 200 ° C, particularly 50 to 180 ° C. If the temperature is lower than 30 ° C., the reaction may not proceed sufficiently even if it takes a long time. On the other hand, if the temperature exceeds 200 ° C., the effect of further shortening the treatment time cannot be obtained. The treatment time varies depending on the treatment temperature, but is usually about 0.5 to 24 hours. Then, a desired organic solvent is added, and the mixture is heated and distilled again until the residual amount of water becomes about 0.1 to 20% by weight to distill off water and obtain the inorganic compound organosol of the present invention. The distillation time at this time is about 0.5 to 10 hours. It is difficult to make the residual amount of water less than 0.1% by weight and the stability of the obtained inorganic compound organosol may be impaired. If the residual amount of water exceeds 20% by weight, the coating film-forming property and the adhesion with the base material may be reduced when used as a coating material. The concentration of the inorganic compound fine particles in the inorganic compound organosol is 1 to 5
It is preferably contained in an amount of 0% by weight, especially 5 to 30% by weight.
【0018】[0018]
【発明の効果】本発明に係るシリカ系無機化合物オルガ
ノゾルは、無機化合物微粒子の有機溶媒中での分散安定
性に優れ、該微粒子が凝集することがない。また、オル
ガノゾル中に無機酸、有機酸またはこれらの塩などが共
存しても、無機化合物微粒子が凝集することがない。前
記無機化合物オルガノゾルを塗料、保護膜、ハードコー
ト剤などのフィラーとして塗料等に配合した場合、塗料
への分散性がよく、得られる塗膜は緻密であるとともに
基材との密着性に優れ、また粒子の凝集に基づくクラッ
クの発生や透明性の低下などがほとんど起こることがな
い。このため、該無機化合物オルガノゾルは、各種塗
料、保護膜、ハードコート剤などの他、各種樹脂の充填
剤として有用であり、たとえば磁気テープの充填剤、フ
ィルムのブロッキング防止剤などの用途にも好適であ
る。The silica-based inorganic compound organosol according to the present invention is excellent in dispersion stability of inorganic compound fine particles in an organic solvent, and the fine particles do not aggregate. Further, even if an inorganic acid, an organic acid, or a salt thereof coexists in the organosol, the inorganic compound fine particles do not aggregate. When the inorganic compound organosol is mixed in a coating material as a coating material, a protective film, a filler for a hard coating agent, etc., the dispersibility in the coating material is good, and the coating film obtained is dense and has excellent adhesion to a substrate, In addition, the occurrence of cracks and the deterioration of transparency due to the aggregation of particles hardly occur. Therefore, the inorganic compound organosol is useful as a filler for various resins in addition to various paints, protective films, hard coating agents, etc., and is also suitable for applications such as magnetic tape fillers and film antiblocking agents. Is.
【0019】[0019]
【実施例】以下に示す実施例により、本発明を更に具体
的に説明する。EXAMPLES The present invention will be described in more detail with reference to the following examples.
【0020】実施例1
[表面修飾ゾルの調製]シリカゾル(触媒化成工業
(株)製:SI−50、平均粒子径25nm、SiO2
濃度48重量%)を水でSiO2 濃度25重量%に希釈
し、これを陽イオン交換樹脂でイオン交換した後、陰イ
オン交換樹脂でイオン交換してSiO2 濃度20重量%
のシリカゾル(A)を調製した。シリカゾル(A)18
00gを容器にとり、これに多価アルコールとしてエチ
レングリコール180gを混合し、加熱蒸留して水78
0gを留去した。次いで、有機溶媒としてのγ−ブチロ
ラクトン660gを混合し、同様に加熱蒸留して水66
0gを留去して固形分濃度30重量%のエチレングリコ
ール変性シリカオルガノゾル(A)を調製した。シリカ
オルガノゾル(A)について、安定性、基材との密着性
および塗膜硬度を次のようにして評価し、その評価結果
をその性状と共に表1に示した。Example 1 [Preparation of surface modified sol] Silica sol (manufactured by Catalysts & Chemicals Industry Co., Ltd .: SI-50, average particle diameter 25 nm, SiO 2
(Concentration 48 wt%) was diluted with water to a SiO 2 concentration of 25 wt%, which was ion-exchanged with a cation exchange resin and then ion-exchanged with an anion exchange resin to give a SiO 2 concentration of 20 wt%.
Of silica sol (A) was prepared. Silica sol (A) 18
Take 00g in a container, and mix 180g of ethylene glycol as a polyhydric alcohol with this, and heat-distill to add water 78g.
0 g was distilled off. Next, 660 g of γ-butyrolactone as an organic solvent is mixed, and similarly heated and distilled to give water 66.
0 g was distilled off to prepare an ethylene glycol-modified silica organosol (A) having a solid content concentration of 30% by weight. The silica organosol (A) was evaluated for stability, adhesion to a substrate, and coating film hardness as follows, and the evaluation results are shown in Table 1 together with its properties.
【0021】[ゾルの安定性評価]
(1)オルガノゾル(A)100重量部に、硫酸水溶液
(濃度2重量%)、塩酸水溶液(濃度2重量%)をそれ
ぞれ10重量部混合したときのゾルの安定性(I)を評
価した。
(2)オルガノゾル(A)100重量部に、硫酸アンモ
ニウム水溶液(濃度5重量%)を10重量部混合し、1
0分間撹拌した後、70℃の恒温槽に静置し、固化する
までの時間を測定してゾルの安定性(II)を評価した。
(3)得られたオルガノゾル(A)100重量部に、塩
化ナトリウム水溶液(濃度5重量%)を10重量部混合
し、10分間撹拌した後、70℃の恒温槽に静置し、ゾ
ルの安定性(III)を評価した。
上記安定性の評価は、ゲル化あるいは沈殿の生成するま
での時間を測定することにより行い、次の基準で評価し
た。
○:1ヶ月以上変化無し
△:1週間以内に粘度が高くなりゲル化開始
×:添加後1日以内に粘度が高くなりゲル化開始[Evaluation of Stability of Sol] (1) 100 parts by weight of organosol (A) was mixed with 10 parts by weight of aqueous sulfuric acid solution (concentration 2% by weight) and aqueous hydrochloric acid solution (concentration 2% by weight). Stability (I) was evaluated. (2) Mix 100 parts by weight of the organosol (A) with 10 parts by weight of an ammonium sulfate aqueous solution (concentration: 5% by weight),
After stirring for 0 minutes, the mixture was allowed to stand in a constant temperature bath at 70 ° C. and the time until solidification was measured to evaluate the stability (II) of the sol. (3) To 100 parts by weight of the obtained organosol (A), 10 parts by weight of an aqueous sodium chloride solution (concentration: 5% by weight) was mixed, stirred for 10 minutes, and then allowed to stand in a constant temperature bath at 70 ° C. to stabilize the sol. The sex (III) was evaluated. The above-mentioned stability was evaluated by measuring the time until gelation or the formation of a precipitate, and evaluated according to the following criteria. ○: No change for one month or more △: Viscosity increased and gelation started within 1 week X: Viscosity increased and gelation started within 1 day after addition
【0022】[塗膜と基材との密着性および塗膜硬度の
評価]ブチラール樹脂(積水化学(株)製:エスレック
BM−2)をn−ブタノールで溶解し、樹脂濃度10重
量%の樹脂溶液を調製した。この樹脂溶液70gと、前
記シリカオルガノゾル(A)10gをn−ブタノール2
0gで希釈したオルガノゾルとを混合し、Bar No.10
のワイヤーバーを用いてポリカーボネート板に塗工後、
150℃で30分間硬化して塗膜を形成した。密着性は
セロテープ(登録商標)剥離テストにより評価し、塗膜
硬度は鉛筆硬度法にて評価した。[Evaluation of adhesion between coating film and substrate and coating film hardness] Butyral resin (Sekisui Chemical Co., Ltd .: S-REC BM-2) was dissolved in n-butanol to obtain a resin having a resin concentration of 10% by weight. A solution was prepared. 70 g of this resin solution and 10 g of the silica organosol (A) were added to n-butanol 2
Mix with organosol diluted with 0 g to obtain Bar No. 10
After coating on the polycarbonate plate using the wire bar of
It was cured at 150 ° C. for 30 minutes to form a coating film. The adhesiveness was evaluated by a cellotape (registered trademark) peeling test, and the coating film hardness was evaluated by a pencil hardness method.
【0023】実施例2
実施例1において、エチレングリコールを72g、γ−
ブチロラクトンを768g用いた以外は実施例1と同様
にして、固形分濃度30重量%のエチレングリコール変
性シリカオルガノゾル(B)を調製した。得られたシリ
カオルガノゾル(B)について、安定性、基材との密着
性および塗膜硬度を評価した。Example 2 In Example 1, 72 g of ethylene glycol and γ-
An ethylene glycol-modified silica organosol (B) having a solid content concentration of 30% by weight was prepared in the same manner as in Example 1 except that 768 g of butyrolactone was used. The obtained silica organosol (B) was evaluated for stability, adhesion to a substrate and coating film hardness.
【0024】実施例3
実施例1で調製した陰イオン交換樹脂でイオン交換した
SiO2 濃度20重量%のシリカゾル(A)1800g
にγ−ブチロラクトンを660gを混合し、加熱蒸留し
て水1440gを留去し、ついでエチレングリコール1
80gを混合した後95℃で1時間加熱熟成し、固形分
濃度30重量%のエチレングリコール変性シリカオルガ
ノゾル(C)を調製した。得られたシリカオルガノゾル
(C)について、安定性、基材との密着性および塗膜硬
度を評価した。Example 3 1800 g of silica sol (A) ion-exchanged with the anion exchange resin prepared in Example 1 and having a SiO 2 concentration of 20% by weight
Γ-butyrolactone was mixed with 660 g, and the mixture was heated and distilled to remove 1440 g of water, followed by ethylene glycol 1
After mixing 80 g, the mixture was heat-aged at 95 ° C. for 1 hour to prepare an ethylene glycol-modified silica organosol (C) having a solid content concentration of 30% by weight. The obtained silica organosol (C) was evaluated for stability, adhesion to a substrate and coating film hardness.
【0025】実施例4
無機化合物粒子としてシリカ・アルミナ水分散ゾル(触
媒化成工業(株)製:カタロイドSN、平均粒子径12
nm、SiO2 ・Al2 O3 濃度20重量%、Al2 O
3 /SiO2 重量比=0. 003)を用いた以外は実施
例1と同様にして、固形分濃度30重量%のエチレング
リコール変性シリカ・アルミナオルガノゾル(D)を調
製した。得られたシリカ・アルミナオルガノゾル(D)
について、安定性、基材との密着性および塗膜硬度を評
価した。Example 4 As an inorganic compound particle, silica / alumina aqueous dispersion sol (manufactured by Catalysts & Chemicals Industry Co., Ltd .: Cataloid SN, average particle size 12)
nm, SiO 2 · Al 2 O 3 concentration 20% by weight, Al 2 O
An ethylene glycol-modified silica / alumina organosol (D) having a solid concentration of 30% by weight was prepared in the same manner as in Example 1 except that the 3 / SiO 2 weight ratio = 0.003) was used. Obtained silica-alumina organosol (D)
The stability, the adhesion to the substrate and the coating film hardness were evaluated.
【0026】実施例5
無機化合物粒子としてシリカ・チタニア水分散ゾル(触
媒化成工業(株)製:TiO2 /SiO2 重量比=0.
1、平均粒径10nm、SiO2 ・TiO2 濃度20重
量%)を用いた以外は、実施例1と同様にして、固形分
濃度30重量%のエチレングリコール変性シリカ・チタ
ニアオルガノゾル(E)を調製した。得られたシリカ・
アルミナオルガノゾル(E)について、安定性、基材と
の密着性および塗膜硬度を評価した。Example 5 Silica / titania water dispersion sol as inorganic compound particles (manufactured by Catalysts & Chemicals Industry Co., Ltd .: TiO 2 / SiO 2 weight ratio = 0.
1, an average particle diameter of 10 nm, and a SiO 2 TiO 2 concentration of 20% by weight) were used to prepare an ethylene glycol-modified silica-titania organosol (E) having a solid concentration of 30% by weight in the same manner as in Example 1. Prepared. Obtained silica
The alumina organosol (E) was evaluated for stability, adhesion with a substrate and coating film hardness.
【0027】実施例6
実施例1において、γ−ブチロラクトン660gの代わ
りにn−ブタノールを660g用いた以外は実施例1と
同様にして、固形分濃度30重量%のエチレングリコー
ル変性シリカオルガノゾル(F)を調製した。得られた
シリカオルガノゾル(F)について、安定性、基材との
密着性および塗膜硬度を評価した。Example 6 In the same manner as in Example 1 except that 660 g of n-butanol was used in place of 660 g of γ-butyrolactone, an ethylene glycol-modified silica organosol (F having a solid content concentration of 30% by weight) was prepared. ) Was prepared. The obtained silica organosol (F) was evaluated for stability, adhesion to a substrate and coating film hardness.
【0028】比較例1
エタノール31440g、濃度28重量%のアンモニア
水5680gおよび純水41520gの混合溶液を35
℃に保持し、この混合溶液を撹拌しながら、テトラエト
キシシラン1440gを加えた。添加終了後、さらに2
時間撹拌を続けた後、この混合溶液に濃度28重量%の
アンモニア水4000gを加えてpHを12. 5に調整
し、ついで濃縮して、水−エタノール混合溶液中にシリ
カ粒子が分散した濃度20重量%のシリカ粒子分散液を
調製した。シリカ粒子の平均粒子径は110nmであっ
た。次に、実施例1においてシリカゾル1800gの代
わりに、上記濃度20重量%のシリカ粒子分散液180
0gを用いた以外は実施例1と同様にして、固形分濃度
30重量%のエチレングリコール変性シリカオルガノゾ
ル(G)を調製した。得られたシリカオルガノゾル
(G)について、実施例1と同様にして、安定性、基材
との密着性および塗膜硬度を評価した。Comparative Example 1 A mixed solution of 31440 g of ethanol, 5680 g of ammonia water having a concentration of 28% by weight, and 41520 g of pure water was used as 35 parts.
1440 g of tetraethoxysilane was added to the mixed solution while maintaining the temperature at ℃. 2 more after addition
After continuing stirring for an hour, 4000 g of ammonia water having a concentration of 28% by weight was added to this mixed solution to adjust the pH to 12.5, and then the mixture was concentrated to a concentration of silica particles dispersed in a water-ethanol mixed solution at a concentration of 20. A wt% silica particle dispersion was prepared. The average particle size of the silica particles was 110 nm. Next, in place of 1800 g of silica sol in Example 1, 180 wt.
An ethylene glycol-modified silica organosol (G) having a solid content concentration of 30% by weight was prepared in the same manner as in Example 1 except that 0 g was used. With respect to the obtained silica organosol (G), stability, adhesion to a substrate and coating film hardness were evaluated in the same manner as in Example 1.
【0029】比較例2
無機化合物粒子として、実施例1と同様にしてSiO2
濃度20重量%のシリカゾル(A)を調製した。このシ
リカゾル(A)1800gを容器にとり、ついで有機溶
媒γ−ブチロラクトン840gを混合し、加熱蒸留して
水840gを留去してシリカオルガノゾル(H)を調製
した。得られたシリカオルガノゾル(H)について、安
定性、基材との密着性および塗膜硬度を評価した。Comparative Example 2 As inorganic compound particles, SiO 2 was used in the same manner as in Example 1.
A silica sol (A) having a concentration of 20% by weight was prepared. 1800 g of this silica sol (A) was placed in a container, then 840 g of an organic solvent γ-butyrolactone was mixed, and the mixture was heated and distilled to remove 840 g of water to prepare a silica organosol (H). The obtained silica organosol (H) was evaluated for stability, adhesion with a substrate and coating film hardness.
【0030】比較例3
無機化合物粒子として、実施例1と同様にしてSiO2
濃度20重量%のシリカゾル(A)を調製した。これを
限外濾過装置で水をメタノールに溶媒置換し、固形分濃
度30重量%のメタノール分散ゾルを得た。このゾル3
00gとエタノール2700gを混合した後、この混合
液にγ−グリシドキシプロピルトリメトキシシラン8.
4gを添加し1時間撹拌して、シリカ・アルミナ粒子の
表面がγ−グリシドキシプロピルトリメトキシシランで
修飾されたゾル(I)を調製した。得られたシリカ・ア
ルミナオルガノゾル(I)について、安定性、基材との
密着性および塗膜硬度を評価した。Comparative Example 3 As inorganic compound particles, SiO 2 was used in the same manner as in Example 1.
A silica sol (A) having a concentration of 20% by weight was prepared. The solvent was replaced with methanol for water using an ultrafiltration device to obtain a methanol-dispersed sol having a solid content concentration of 30% by weight. This sol 3
After mixing 00g and 2700g of ethanol, γ-glycidoxypropyltrimethoxysilane 8.
4 g was added and stirred for 1 hour to prepare a sol (I) in which the surface of silica-alumina particles was modified with γ-glycidoxypropyltrimethoxysilane. The obtained silica-alumina organosol (I) was evaluated for stability, adhesion to a substrate and coating film hardness.
【0031】比較例4
無機化合物粒子としてシリカ・アルミナ水分散ゾル(触
媒化成工業(株)製:カタロイドSN、平均粒子径12
nm、SiO2 ・Al2 O3 濃度20重量%、Al2 O
3 /SiO2 重量比=0. 003)1800gを容器に
とり、ついでγ−ブチロラクトン840gを混合し、加
熱蒸留して水840gを留去してシリカオルガノゾル
(J)を調製した。得られたシリカオルガノゾル(J)
について、安定性、基材との密着性および塗膜硬度を評
価した。Comparative Example 4 As an inorganic compound particle, silica / alumina aqueous dispersion sol (manufactured by Catalysts & Chemicals Industry Co., Ltd .: Cataloid SN, average particle size 12)
nm, SiO 2 · Al 2 O 3 concentration 20% by weight, Al 2 O
1800 g of 3 / SiO 2 weight ratio = 0.003) was placed in a container, and then 840 g of γ-butyrolactone was mixed and heated to distill 840 g of water to prepare a silica organosol (J). Obtained silica organosol (J)
The stability, the adhesion to the substrate and the coating film hardness were evaluated.
【0032】比較例5
エタノール39300g、濃度28重量%のアンモニア
水7100gおよび純水51900gの混合溶液を35
℃に保持し、この混合溶液を撹拌しながら、メチルトリ
メトキシシラン740gとテトラエトキシシラン900
gを加えた。添加終了後、さらに2時間撹拌を続けた
後、この混合溶液に濃度28重量%のアンモニア水50
00gを加えてpHを12. 5に調整し、ついで濃縮し
て、水−エタノール混合溶液中にシリカ粒子が分散した
濃度20重量%のシリカ粒子分散液を調製した。シリカ
粒子の平均粒子径は80nmであった。次に、実施例1
においてシリカゾル1800gの代わりに、上記濃度2
0重量%のシリカ粒子分散液1800gを用いた以外は
実施例1と同様にして、固形分濃度30重量%のエチレ
ングリコール変性シリカオルガノゾル(K)を調製し
た。得られたシリカオルガノゾル(K)について、実施
例1と同様にして、安定性、基材との密着性および塗膜
硬度を評価した。Comparative Example 5 A mixed solution of 39300 g of ethanol, 7100 g of ammonia water having a concentration of 28% by weight, and 51900 g of pure water was used.
The mixture solution was kept at ℃, and while stirring this mixed solution, 740 g of methyltrimethoxysilane and 900 parts of tetraethoxysilane.
g was added. After the addition was completed, the mixture was further stirred for 2 hours, and the mixed solution was added with 50% ammonia water of 50% by weight.
The pH was adjusted to 12.5 by adding 00 g and then concentrated to prepare a silica particle dispersion liquid having a concentration of 20% by weight in which silica particles were dispersed in a water-ethanol mixed solution. The average particle size of the silica particles was 80 nm. Next, Example 1
Instead of 1800 g of silica sol, the above concentration 2
An ethylene glycol-modified silica organosol (K) having a solid content concentration of 30 wt% was prepared in the same manner as in Example 1 except that 1800 g of 0 wt% silica particle dispersion was used. With respect to the obtained silica organosol (K), stability, adhesion to a substrate and coating film hardness were evaluated in the same manner as in Example 1.
【0033】[0033]
【表1】
無機微粒子 アル 溶 濃 平均 安 定 性 密 鉛筆
種類 MO/SiO 2 コール 媒 度 粒径 I II III 着 硬度 実施例
(重量) 重量部 (wt%) (nm) 性
1 SiO2 0 50 γ 30 25 ○ ○ ○ ○ 3H
2 SiO2 0 20 γ 30 25 ○ ○ ○ ○ 2H
3 SiO2 0 50 γ 30 25 ○ ○ ○ ○ 3H
4 Al2O3/ 0.003 50 γ 30 12 ○ ○ ○ ○ 3H
SiO2
5 TiO2/ 0.1 50 γ 30 10 ○ ○ ○ ○ 4H
SiO2
6 SiO2 0 50 n 30 25 ○ ○ ○ ○ 3H比較例
1 SiO2 0 50 γ 30 110 ○ ○ ○ × B
2 SiO2 0 0 γ 30 25 △ △ △ × H
3 SiO2 0 0 γ 30 25 × × × ○ 2H
4 Al2O3/ 0.003 0 γg 30 12 △ △ △ × H
SiO2
5 SiO2 0 50 γ 30 80 △ △ △ △ B
上記「溶媒」欄中、γ:γ−ブチロラクトン、n:n−
ブタノール、γg :γ−グリシドキシプロピルトリメト
キシシランを夫々示す。TABLE 1 Inorganic fine Al soluble conc average STABILITY tight pencil type MO / SiO 2 call medium degree particle size I II II I wear hardness Example (weight) parts by weight (wt%) (nm) of 1 SiO 2 0 50 γ 30 25 ○ ○ ○ ○ 3H 2 SiO 2 0 20 γ 30 25 ○ ○ ○ ○ 2H 3 SiO 2 0 50 γ 30 25 ○ ○ ○ ○ 3H 4 Al 2 O 3 / 0.003 50 γ 30 12 ○ ○ ○ ○ 3H SiO 2 5 TiO 2 / 0.1 50 γ 30 10 ○ ○ ○ ○ 4H SiO 2 6 SiO 2 0 50 n 30 25 ○ ○ ○ ○ 3H Comparative Example 1 SiO 2 0 50 γ 30 110 ○ ○ ○ × B 2 SiO 2 0 0 γ 30 25 △ △ △ × H 3 SiO 2 0 0 γ 30 25 × × × ○ 2H 4 Al 2 O 3 / 0.003 0 γg 30 12 △ △ △ × H SiO 2 5 SiO 2 0 50 γ 30 80 △ △ △ △ B In the above "solvent" column, γ: γ-butyrolactone, n: n-
Butanol and γg: γ-glycidoxypropyltrimethoxysilane are shown, respectively.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4G072 AA28 BB05 CC02 DD05 DD06 DD07 EE06 EE07 GG01 GG02 HH18 HH23 TT01 UU07 UU30 4J002 AA001 DJ006 DJ016 FB086 GH01 4J037 AA08 AA09 AA10 AA11 AA18 AA22 AA25 CB04 CB07 CB13 CB17 DD05 EE02 EE28 EE43 ─────────────────────────────────────────────────── ─── Continued front page F term (reference) 4G072 AA28 BB05 CC02 DD05 DD06 DD07 EE06 EE07 GG01 GG02 HH18 HH23 TT01 UU07 UU30 4J002 AA001 DJ006 DJ016 FB086 GH01 4J037 AA08 AA09 AA10 AA11 AA18 AA22 AA25 CB04 CB07 CB13 CB17 DD05 EE02 EE28 EE43
Claims (3)
り、多価アルコールで表面が修飾されたシリカ系無機化
合物微粒子が有機溶媒に分散してなるオルガノゾルであ
って、該シリカ系無機化合物微粒子のシリカ源の一部ま
たは全部がアルカリ金属珪酸塩に由来するものであるこ
とを特徴とする無機化合物オルガノゾル。1. An organosol in which silica-based inorganic compound particles having an average particle diameter in the range of 2 to 100 nm and whose surface is modified with a polyhydric alcohol are dispersed in an organic solvent. Inorganic compound organosol, wherein a part or all of the silica source is derived from an alkali metal silicate.
ある請求項1記載の無機化合物オルガノゾル。2. The inorganic compound organosol according to claim 1, wherein the inorganic compound particles are silica particles.
シリカ以外の無機酸化物の1種または2種以上とからな
るシリカ系複合酸化物微粒子である請求項1記載の無機
化合物オルガノゾル。3. The inorganic compound organosol according to claim 1, wherein the fine particles of the inorganic compound are fine particles of a silica-based composite oxide composed of silica and one or more kinds of inorganic oxides other than silica.
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|---|---|---|---|
| JP2001197055A JP2003012320A (en) | 2001-06-28 | 2001-06-28 | Silica-based inorganic compound organosol |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001197055A JP2003012320A (en) | 2001-06-28 | 2001-06-28 | Silica-based inorganic compound organosol |
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| Publication Number | Publication Date |
|---|---|
| JP2003012320A true JP2003012320A (en) | 2003-01-15 |
Family
ID=19034739
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007063477A (en) * | 2005-09-01 | 2007-03-15 | Asahi Glass Co Ltd | Inorganic coating composition, hydrophilic coating film and agricultural film |
| JP2008308362A (en) * | 2007-06-14 | 2008-12-25 | Sumitomo Osaka Cement Co Ltd | Transparent inorganic oxide dispersion liquid, transparent composite material, and their producing methods |
| JP2010202715A (en) * | 2009-02-27 | 2010-09-16 | San Nopco Ltd | Fine particle slurry |
| WO2011059081A1 (en) * | 2009-11-16 | 2011-05-19 | 日揮触媒化成株式会社 | Process for production of silica-alumina sol, silica-alumina sol, coating agent for formation of transparent coating film which comprises the sol, and substrate having transparent coating film attached thereto |
| JP2011236094A (en) * | 2010-05-12 | 2011-11-24 | Jgc Catalysts & Chemicals Ltd | High concentration silica sol |
| JP2014218675A (en) * | 2008-06-16 | 2014-11-20 | スリーエム イノベイティブプロパティズカンパニー | Toughened curable composition |
| WO2015186596A1 (en) * | 2014-06-03 | 2015-12-10 | アーゼット・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles |
| JP2022113631A (en) * | 2021-01-25 | 2022-08-04 | 富士シリシア化学株式会社 | Silica composite, resin composition, and resin film or resin sheet |
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| JP2718431B2 (en) * | 1990-06-18 | 1998-02-25 | 触媒化成工業株式会社 | Silica organosol and method for producing the same |
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| JP2007063477A (en) * | 2005-09-01 | 2007-03-15 | Asahi Glass Co Ltd | Inorganic coating composition, hydrophilic coating film and agricultural film |
| JP2008308362A (en) * | 2007-06-14 | 2008-12-25 | Sumitomo Osaka Cement Co Ltd | Transparent inorganic oxide dispersion liquid, transparent composite material, and their producing methods |
| JP2014218675A (en) * | 2008-06-16 | 2014-11-20 | スリーエム イノベイティブプロパティズカンパニー | Toughened curable composition |
| JP2016199767A (en) * | 2008-06-16 | 2016-12-01 | スリーエム イノベイティブ プロパティズ カンパニー | Toughened curable compositions |
| JP2010202715A (en) * | 2009-02-27 | 2010-09-16 | San Nopco Ltd | Fine particle slurry |
| JP5839993B2 (en) * | 2009-11-16 | 2016-01-06 | 日揮触媒化成株式会社 | Method for producing silica / alumina sol, silica / alumina sol, transparent film-forming coating material containing the sol, and substrate with transparent film |
| WO2011059081A1 (en) * | 2009-11-16 | 2011-05-19 | 日揮触媒化成株式会社 | Process for production of silica-alumina sol, silica-alumina sol, coating agent for formation of transparent coating film which comprises the sol, and substrate having transparent coating film attached thereto |
| JP2011236094A (en) * | 2010-05-12 | 2011-11-24 | Jgc Catalysts & Chemicals Ltd | High concentration silica sol |
| WO2015186596A1 (en) * | 2014-06-03 | 2015-12-10 | アーゼット・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles |
| JPWO2015186596A1 (en) * | 2014-06-03 | 2017-05-25 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles |
| US10106428B2 (en) | 2014-06-03 | 2018-10-23 | Az Electronic Materials (Luxembourg) S.A.R.L. | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles |
| JP2022113631A (en) * | 2021-01-25 | 2022-08-04 | 富士シリシア化学株式会社 | Silica composite, resin composition, and resin film or resin sheet |
| CN116802150A (en) * | 2021-01-25 | 2023-09-22 | 富士硅化学株式会社 | Silica composite, resin composition, and resin film or resin sheet |
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| EP4282822A4 (en) * | 2021-01-25 | 2024-05-22 | Fuji Silysia Chemical Ltd. | SILICA COMPOSITE, RESIN COMPOSITION AND RESIN FILM OR RESIN SHEET |
| US12195607B2 (en) * | 2021-01-25 | 2025-01-14 | Fuji Silysia Chemical Ltd | Silica composite, resin composition, and resin film or resin sheet |
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