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JP2003073340A - Isophthalic acid compound and method for producing the same - Google Patents

Isophthalic acid compound and method for producing the same

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Publication number
JP2003073340A
JP2003073340A JP2001261040A JP2001261040A JP2003073340A JP 2003073340 A JP2003073340 A JP 2003073340A JP 2001261040 A JP2001261040 A JP 2001261040A JP 2001261040 A JP2001261040 A JP 2001261040A JP 2003073340 A JP2003073340 A JP 2003073340A
Authority
JP
Japan
Prior art keywords
formula
acid
substituted
compound
isophthalic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001261040A
Other languages
Japanese (ja)
Other versions
JP4788858B2 (en
Inventor
Hideo Suzuki
秀雄 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
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Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2001261040A priority Critical patent/JP4788858B2/en
Publication of JP2003073340A publication Critical patent/JP2003073340A/en
Application granted granted Critical
Publication of JP4788858B2 publication Critical patent/JP4788858B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a monomer comprising a one to three (substituted) acryloyl groups-having isophthalic acid compound useful as a raw material for acrylic polymers. SOLUTION: This isophthalic acid compound is represented by the general formula [1] R<5> , R<6> and R<7> are each H or a (substituted) acryloyl of formula [2], provided that at least one of R<4> , R<6> and R<7> is the (substituted) acryloyl; X is a halogen atom; R<1> is H or a 1 to 4C alkyl; R<2> , R<3> and R<4> are each H or a 1 to 10C alkyl}, and the method for producing the isophthalic acid compound is characterized by reacting a bis(2-hydroxyethyl)5-hydroxyisophthalate (BH5HI) represented by the general formula [3] with a (substituted) acrylic acid compound represented by the general formula [4] in the presence of an acid catalyst or reacting the BH5HI with an acrylic halide compound represented by the general formula [5] in the presence of a base, a metal and a metal compound.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、(置換)アクリロ
イル基を有するイソフタル酸化合物及びその製造法に関
する。本発明の化合物は、EL(エレクトロルミネッセ
ンス)保護膜用樹脂、歯科医療用接着及び特殊塗料等材
料分野のラジカル重合及び紫外線硬化モノマーに関す
る。
TECHNICAL FIELD The present invention relates to an isophthalic acid compound having a (substituted) acryloyl group and a method for producing the same. The compound of the present invention relates to radical polymerization and ultraviolet curing monomers in the field of materials such as resins for EL (electroluminescence) protective films, adhesives for dentistry and special paints.

【0002】[0002]

【従来の技術】特開平5−214045号公報に於い
て、安息香酸、フタル酸、トリメリット酸及びピロメリ
ット酸等の既存の芳香族カルボン酸のアクリロイル化合
物の記載があるが、未だ十分な結果を得ていない。
2. Description of the Related Art Japanese Unexamined Patent Publication (Kokai) No. 5-214045 describes an acryloyl compound of an existing aromatic carboxylic acid such as benzoic acid, phthalic acid, trimellitic acid and pyromellitic acid. I haven't gotten it.

【0003】[0003]

【発明が解決しようとする課題】アクリル系ポリマーの
原料となる(置換)アクリロイル基を1〜3個保有する
モノマーの提供を目的とする。
An object of the present invention is to provide a monomer having 1 to 3 (substituted) acryloyl groups as a raw material for an acrylic polymer.

【0004】[0004]

【課題を解決するための手段】本発明者は、上記課題を
解決するため、鋭意研究を行った。本発明者らが先に出
願した特願2000−206499号に記載のビス(2
−ヒドロキシエチル)5−ヒドロキシイソフタレート
(BH5HIと略記する。)を原料とすることにより、
新規なアクリロイル化合物が得られることを見出し本発
明を完成させた。
[Means for Solving the Problems] The present inventor has conducted diligent research in order to solve the above problems. The screw (2) described in Japanese Patent Application No. 2000-206499 filed previously by the present inventors
-Hydroxyethyl) 5-hydroxyisophthalate (abbreviated as BH5HI) as a raw material,
The present invention has been completed by finding that a novel acryloyl compound can be obtained.

【0005】即ち、本発明化合物は、式[1]That is, the compound of the present invention has the formula [1]

【0006】[0006]

【化11】 [Chemical 11]

【0007】(式中、R5、R6及びR7はそれぞれ独立
に水素原子または式[2]
(In the formula, R 5 , R 6 and R 7 are each independently a hydrogen atom or a formula [2]

【0008】[0008]

【化12】 [Chemical 12]

【0009】(式中、R1は水素原子または炭素数1〜
4のアルキル基を表し、R2及びR3は、水素原子または
炭素数1〜10のアルキル基を表す。)で表される(置
換)アクリロイル基を表し、少なくとも一つ以上は(置
換)アクリロイル基を示す。)で表されるイソフタル酸
化合物及びその製造法に関する。
(In the formula, R 1 is a hydrogen atom or a carbon number of 1 to
4 represents an alkyl group, and R 2 and R 3 represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. ) Represents a (substituted) acryloyl group, and at least one or more represents a (substituted) acryloyl group. ) Related to an isophthalic acid compound and a method for producing the same.

【0010】又、本発明は、式[3]The present invention also provides the formula [3].

【0011】[0011]

【化13】 [Chemical 13]

【0012】で表されるビス(2−ヒドロキシエチル)
5−ヒドロキシイソフタレート(BH5HI)と式
[4]
Bis (2-hydroxyethyl) represented by
5-hydroxyisophthalate (BH5HI) and formula [4]

【0013】[0013]

【化14】 [Chemical 14]

【0014】(式中、R1、R2、R3及びR4は、前記と
同じ意味を表す。)で表される(置換)アクリル酸化合
物とを、酸触媒下反応させるか、また、前記式[3]で
表されるBH5HIと式[5]
(Wherein R 1 , R 2 , R 3 and R 4 have the same meanings as described above) and a (substituted) acrylic acid compound is reacted in the presence of an acid catalyst. BH5HI represented by the above formula [3] and the formula [5]

【0015】[0015]

【化15】 [Chemical 15]

【0016】(式中、R1、R2及びR3は、前記と同じ
意味を表し、Xは、ハロゲン原子を表す。)で表される
アクリル酸ハライド化合物を塩基、金属及び金属化合物
の存在下で反応させて、前記式[1]で表されるイソフ
タル酸化合物の製造法に関する。以下、本発明を詳細に
説明する。
In the formula, R 1 , R 2 and R 3 have the same meanings as described above, and X represents a halogen atom. The present invention relates to a method for producing an isophthalic acid compound represented by the above formula [1] by reacting below. Hereinafter, the present invention will be described in detail.

【0017】[0017]

【発明の実施の形態】本発明の前記式[1]で表される
イソフタル酸化合物の製造法は、下記の二つの反応スキ
ームで表される。
BEST MODE FOR CARRYING OUT THE INVENTION The method for producing an isophthalic acid compound represented by the above formula [1] of the present invention is represented by the following two reaction schemes.

【0018】[0018]

【化16】 [Chemical 16]

【0019】(式中、R1、R2、R3、R4、R5、R6
7及びXは、前記と同じ意味を表す。) 先ず(1)から説明する。原料の式[3]で表されるB
H5HIは、特願2000−206499号に記載の様
に、5−ヒドロキシイソフタル酸化合物とエチレングリ
コールを原料として、酸、金属又は金属化合物を触媒と
して効率良く製造することができる。
(Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 ,
R 7 and X have the same meanings as described above. ) First, (1) will be described. B represented by the formula [3] of the raw material
As described in Japanese Patent Application No. 2000-206499, H5HI can be efficiently produced using a 5-hydroxyisophthalic acid compound and ethylene glycol as raw materials and an acid, a metal or a metal compound as a catalyst.

【0020】一方、一般式[4]で表されるアクリル酸
化合物は、R1が水素または炭素数1〜4のアルキル基
を表し、好ましくは水素原子または炭素数1〜2であ
る。また、R2、R3及びR4は炭素数1〜10であり、
好ましくは水素原子または炭素数1〜5である。
On the other hand, in the acrylic acid compound represented by the general formula [4], R 1 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, preferably a hydrogen atom or 1 to 2 carbon atoms. Further, R 2 , R 3 and R 4 have 1 to 10 carbon atoms,
Preferably, it is a hydrogen atom or has 1 to 5 carbon atoms.

【0021】具体的には、アクリル酸、メタアクリル
酸、チグリル酸、3,3−ジメチルアクリル酸、2−メ
チル−2−ペンテン酸、2−エチル−2−ヘキセン酸及
び2−オクテン酸等、及びそれらの炭素数1〜10のア
ルキルエステル化合物、具体的には、アクリル酸メチ
ル、アクリル酸エチル、メタアクリル酸メチル、メタア
クリル酸エチル、チグリル酸メチル、チグリル酸エチ
ル、3,3−ジメチルアクリル酸メチル、3,3−ジメ
チルアクリル酸エチル、2−メチル−2−ペンテン酸メ
チル、2−メチル−2−ペンテン酸エチル、2−エチル
−2−ヘキセン酸メチル、2−エチル−2−ヘキセン酸
エチル、2−オクテン酸メチル及び2−オクテン酸エチ
ル等が挙げられる。
Specifically, acrylic acid, methacrylic acid, tiglylic acid, 3,3-dimethylacrylic acid, 2-methyl-2-pentenoic acid, 2-ethyl-2-hexenoic acid, 2-octenoic acid and the like, And their alkyl ester compounds having 1 to 10 carbon atoms, specifically, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, methyl tiglylate, ethyl tiglylate, 3,3-dimethylacryl. Acid methyl, ethyl 3,3-dimethylacrylate, methyl 2-methyl-2-pentenoate, ethyl 2-methyl-2-pentenoate, methyl 2-ethyl-2-hexenoate, 2-ethyl-2-hexenoic acid Examples thereof include ethyl, methyl 2-octenoate and ethyl 2-octenoate.

【0022】本反応は、酸触媒が必要であり、酸触媒と
しては、硫酸、塩酸及び硝酸等の鉱酸が使用でき、特に
は、硫酸が好ましい。また、ベンゼンスルホン酸、p−
トルエンスルホン酸、メタンスルホン酸、エタンスルホ
ン酸及びトリフルオロ酢酸等の有機酸も使用でき、特に
はベンゼンスルホン酸、p−トルエンスルホン酸が好ま
しい。アクリル酸化合物の使用量は、理論量から大過剰
量を用いることができる。
This reaction requires an acid catalyst, and as the acid catalyst, mineral acids such as sulfuric acid, hydrochloric acid and nitric acid can be used, and sulfuric acid is particularly preferable. In addition, benzenesulfonic acid, p-
Organic acids such as toluenesulfonic acid, methanesulfonic acid, ethanesulfonic acid and trifluoroacetic acid can be used, and benzenesulfonic acid and p-toluenesulfonic acid are particularly preferable. The amount of the acrylic acid compound used may be a theoretical amount or a large excess amount.

【0023】更に、酸触媒としてタングステン酸、モリ
ブデン酸或いはこれらのヘテロポリ酸が挙げられる。ヘ
テロポリ酸の具体例としては、H3PW1240、H4Si
1240、H4TiW1240、H5CoW1240、H5
eW1240、H621862、H7PW1133、 H4
iMo1240、H3PMo1240、H7PMo1139、H
62Mo1862、H4PMoW1140、H4PVMo11
40、H4SiMo124 0、H5PV2Mo1040、H3PM
6640、H0.5Cs2.5PW1240及びそれらの水和
物等が代表的なものとして挙げられる。また、これらを
炭素やシリカに担持させた触媒等が挙げられる。これら
のヘテロポリ酸の中では、H3PW134 0、H3PMo12
40及びそれらの水和物等が特に好ましい。
Further, examples of the acid catalyst include tungstic acid, molybdic acid and heteropolyacids thereof. Specific examples of the heteropolyacid include H 3 PW 12 O 40 and H 4 Si.
W 12 O 40 , H 4 TiW 12 O 40 , H 5 CoW 12 O 40 , H 5 F
eW 12 O 40 , H 6 P 2 W 18 O 62 , H 7 PW 11 O 33 , H 4 T
iMo 12 O 40, H 3 PMo 12 O 40, H 7 PMo 11 O 39, H
6 P 2 Mo 18 O 62 , H 4 PMoW 11 O 40 , H 4 PVMo 11 O
40, H 4 SiMo 12 O 4 0, H 5 PV 2 Mo 10 O 40, H 3 PM
Representative examples thereof include o 6 W 6 O 40 , H 0.5 Cs 2.5 PW 12 O 40, and their hydrates. Further, a catalyst in which these are supported on carbon or silica can be used. Among these heteropolyacids, H 3 PW 13 O 4 0 , H 3 PMo 12
O 40 and hydrates thereof are particularly preferable.

【0024】また更に、アンバーリストIR120等の
陽イオン交換樹脂、H−ZSM−5等のH型ゼオライト
等も使用することができる。
Further, a cation exchange resin such as Amberlyst IR120 and an H type zeolite such as H-ZSM-5 can be used.

【0025】特に、エステル交換法の場合の触媒として
は、前述の鉱酸類、ヘテロポリ酸類、有機酸、陽イオン
交換樹脂及びH型ゼオライトの他に、3ZnO−2B2
3、酢酸カドミウム、酢酸亜鉛及び酢酸カルシウムに
代表される周期律表第II族化合物の脂肪酸塩等が使用で
きる。これらの触媒の使用量は、BH5HIに対し0.
1〜100重量%が使用でき、経済的には、1〜20重
量%が好ましい。
In particular, as the catalyst for the transesterification method, in addition to the above-mentioned mineral acids, heteropolyacids, organic acids, cation exchange resins and H-type zeolite, 3ZnO-2B 2
Fatty acid salts of compounds of Group II of the periodic table represented by O 3 , cadmium acetate, zinc acetate and calcium acetate can be used. The amount of these catalysts used was 0.
1 to 100% by weight can be used, and 1 to 20% by weight is economically preferable.

【0026】本反応は、アクリル酸化合物を大過剰用い
ることもできるが、溶媒を用いて行うこともでき、通常
は、溶媒を使用することが好ましい。溶媒の種類として
は、1,2−ジクロロエタン(EDC)や1,1,1−
トリクロロエタン等のハロゲン化炭化水素類、ベンゼ
ン、トルエンやキシレン等の芳香族炭化水素類、1,2
−ジメトキシエタンやジエチレングリコールジメチルエ
ーテル等のエーテル類等が挙げられる。
This reaction can be carried out using a solvent, although the acrylic acid compound can be used in a large excess, and it is usually preferable to use a solvent. Examples of the solvent include 1,2-dichloroethane (EDC) and 1,1,1-
Halogenated hydrocarbons such as trichloroethane, aromatic hydrocarbons such as benzene, toluene and xylene, 1,2
And ethers such as dimethoxyethane and diethylene glycol dimethyl ether.

【0027】溶媒の使用量は、BH5HIに対し1〜2
0重量倍、より好ましくは1〜6重量倍である。反応温
度は、50〜200℃、より好ましくは70〜150℃
である。反応は常圧でも加圧でも行うことができる。反
応時間は、1〜50時間で行うことができ、通常2〜1
2時間で行うのが実用的である。
The amount of the solvent used is 1-2 with respect to BH5HI.
It is 0 times by weight, more preferably 1 to 6 times by weight. The reaction temperature is 50 to 200 ° C, more preferably 70 to 150 ° C.
Is. The reaction can be carried out at normal pressure or under pressure. The reaction time can be 1 to 50 hours, usually 2-1.
It is practical to do it in 2 hours.

【0028】次に、反応スキーム(2)の製造法につい
て述べる。一般式[5]で表されるアクリル酸ハライド
化合物は、そのR1、R2及びR3は前記と同じであり、
具体的には、アクリル酸、メタアクリル酸、チグリル
酸、3,3−ジメチルアクリル酸、2−メチル−2−ペ
ンテン酸、2−エチル−2−ヘキセン酸及び2−オクテ
ン酸等のハライドである。ハロゲンの種類としては、沸
素、塩素、臭素及び沃素であり、経済的には塩素であ
る。特には、アクリル酸クロライドやメタアクリル酸ク
ロライドが使用される。その使用量は、BH5HIの理
論量に対し1〜2モル倍、より好ましくは1〜1.5モ
ル倍である。
Next, the production method of reaction scheme (2) will be described. The acrylic acid halide compound represented by the general formula [5] has the same R 1 , R 2 and R 3 as described above,
Specifically, it is a halide such as acrylic acid, methacrylic acid, tiglylic acid, 3,3-dimethylacrylic acid, 2-methyl-2-pentenoic acid, 2-ethyl-2-hexenoic acid and 2-octenoic acid. . The types of halogen are fluorine, chlorine, bromine and iodine, and economically chlorine. Particularly, acrylic acid chloride and methacrylic acid chloride are used. The amount used is 1 to 2 times, and more preferably 1 to 1.5 times the theoretical amount of BH5HI.

【0029】本反応は、塩基が必要であり、その例とし
ては、アルカリ金属やアルカリ土金属の炭酸塩や水酸化
物等の無機塩基、脂肪族や芳香族の有機塩基及びアルカ
リ金属やアルカリ土金属の脂肪酸塩等が使用できる。そ
の具体例としては、炭酸ナトリウム、炭酸カリウム、炭
酸マグネシウム、炭酸カルシウム、炭酸水素ナトリウ
ム、炭酸水素カリウム、水酸化ナトリウム、水酸化カリ
ウム、水酸化マグネシウム、水酸化カルシウム、トリメ
チルアミン、トリエチルアミン、トリプロピルアミン、
ピリジン、ピコリン、アニリン、酢酸ナトリウム及び蓚
酸ナトリウム等が一例として挙げられる。特には、炭酸
ナトリウムやトリエチルアミンが好ましい。その使用量
は、BH5HIの理論量に対し1〜2モル倍、より好ま
しくは1〜1.5モル倍であり、アクリル酸ハライド化
合物と等量が好ましい。又、金属又は金属水素化錯体を
用いることもできる。
This reaction requires a base, examples of which include inorganic bases such as carbonates and hydroxides of alkali metals and alkaline earth metals, organic bases such as aliphatic and aromatic bases and alkali metals and alkaline earths. Metal fatty acid salts and the like can be used. Specific examples thereof include sodium carbonate, potassium carbonate, magnesium carbonate, calcium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium hydroxide, potassium hydroxide, magnesium hydroxide, calcium hydroxide, trimethylamine, triethylamine, tripropylamine,
Examples include pyridine, picoline, aniline, sodium acetate, sodium oxalate and the like. Particularly, sodium carbonate and triethylamine are preferable. The amount used is 1 to 2 mole times, more preferably 1 to 1.5 mole times, relative to the theoretical amount of BH5HI, and the same amount as the acrylic acid halide compound is preferable. It is also possible to use a metal or metal hydride complex.

【0030】金属としては、周期律表第1族のアルカリ
金属及び第2族のアルカリ土金属が適応でき、具体的に
は、リチウム、ナトリウム、カリウム、マグネシウム及
びカルシウム等である。更に金属化合物としては、水素
化リチウム、水素化ナトリウム、水素化カリウム、水素
化アルミニウムリチウム、水素化アルミニウムナトリウ
ム、水素化アルミニウムカリウム、水素化ホウ素リチウ
ム、水素化ホウ素ナトリウム、水素化ホウ素カリウム等
の金属水素化錯体、水酸化ナトリウム、水酸化カリウム
等の金属水酸化物、炭酸ナトリウム、炭酸カリウム等の
金属炭酸塩等が挙げられる。特には、ナトリウムや水素
化ナトリウムが好ましい。その使用量は前記と同様であ
る。
As the metal, an alkali metal of Group 1 and an alkaline earth metal of Group 2 of the Periodic Table can be applied, and specific examples thereof include lithium, sodium, potassium, magnesium and calcium. Further, as the metal compound, a metal such as lithium hydride, sodium hydride, potassium hydride, lithium aluminum hydride, sodium aluminum hydride, potassium aluminum hydride, lithium borohydride, sodium borohydride, potassium borohydride, etc. Examples thereof include hydrogenated complexes, metal hydroxides such as sodium hydroxide and potassium hydroxide, metal carbonates such as sodium carbonate and potassium carbonate. Particularly, sodium and sodium hydride are preferable. The amount used is the same as above.

【0031】本反応は、溶媒を使用することが好まし
い。溶媒の種類としては、テトラヒドロフラン(TH
F)、ジオキサン、1,2−ジメトキシエタンやジエチ
レングリコールジメチルエーテル等のエーテル等が挙げ
られる。溶媒の使用量は、BH5HIに対し1〜20重
量倍、より好ましくは1〜6重量倍である。反応温度
は、−20〜100℃、特には0〜50℃が好ましい。
In this reaction, it is preferable to use a solvent. Tetrahydrofuran (TH
F), dioxane, ethers such as 1,2-dimethoxyethane and diethylene glycol dimethyl ether, and the like. The amount of the solvent used is 1 to 20 times by weight, and more preferably 1 to 6 times by weight, that of BH5HI. The reaction temperature is preferably -20 to 100 ° C, particularly preferably 0 to 50 ° C.

【0032】反応後は、水を添加し、残余酸クロライド
を加水分解してから、溶媒を留去し、難水溶性溶媒(エ
ーテル系やエステル系)で抽出した後、蒸留又はカラム
クロマトグラフィーで精製し、目的物を得ることができ
る。以上の本発明の反応及び精製は、回分式でも連続式
でも可能である。以下に、本反応によって得られる生成
物を挙げる。
After the reaction, water is added to hydrolyze the residual acid chloride, the solvent is distilled off, and the mixture is extracted with a poorly water-soluble solvent (ether system or ester system) and then distilled or column chromatographed. The product can be purified to obtain the desired product. The above-mentioned reaction and purification of the present invention can be performed in a batch system or a continuous system. The products obtained by this reaction are listed below.

【0033】[0033]

【化17】 [Chemical 17]

【0034】(式中、R1、R2及びR3は、前記と同じ
意味を表す。)
(In the formula, R 1 , R 2 and R 3 have the same meanings as described above.)

【0035】[0035]

【実施例】以下に実施例を挙げ、本発明を具体的に説明
するが、本発明はこれらに限定されるものではない。 実施例1
EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto. Example 1

【0036】[0036]

【化18】 [Chemical 18]

【0037】100ml四口反応フラスコにBH5HI
1.35g(5mmol)とN,N−ジメチルアセトア
ミド(DMAc)17gを仕込み、5℃に冷却した。こ
の撹拌下に、水素化ナトリウム(純度60%)0.72
g(18mmol)を添加し1.5時間攪拌した。更
に、5℃でメタアクリロイルクロライド3.14g(3
0mmol)を滴下した。5℃で1時間撹拌を続けた
後、更に25℃で6時間反応させた。反応液に氷を添加
してから濃縮しDMAcを留去した。残渣に酢酸エチル
/水を加えて抽出し、濾過により不溶固形物を除去後、
濾液の有機層を濃縮乾燥すると油状物3.44gが得ら
れた。この油状物をn−ヘプタン/酢酸エチル=19/
1〜3/1でシリカゲルカラムクロマトグラフィーによ
り精製すると、1,3−ビス(2−メタアクリロイルオ
キシエトキシカルボニル)−5−メタアクリロイルオキ
シベンゼン(BMMBと略記する。)0.59g(収率
24.9%)が得られた。
BH5HI was added to a 100 ml four-neck reaction flask.
1.35 g (5 mmol) and 17 g of N, N-dimethylacetamide (DMAc) were charged and cooled to 5 ° C. Under this stirring, sodium hydride (purity 60%) 0.72
g (18 mmol) was added and stirred for 1.5 hours. Further, at 5 ° C., 3.14 g of methacryloyl chloride (3
0 mmol) was added dropwise. After continuing stirring at 5 ° C for 1 hour, the mixture was further reacted at 25 ° C for 6 hours. Ice was added to the reaction solution and then concentrated to remove DMAc. Ethyl acetate / water was added to the residue for extraction, and the insoluble solid matter was removed by filtration.
When the organic layer of the filtrate was concentrated and dried, 3.44 g of an oily matter was obtained. This oily matter was added to n-heptane / ethyl acetate = 19 /
When purified by silica gel column chromatography at 1-3 / 1, 0.59 g of 1,3-bis (2-methacryloyloxyethoxycarbonyl) -5-methacryloyloxybenzene (abbreviated as BMMB) (yield 24. 9%) was obtained.

【0038】MASS(FAB+,m/e(%)):475([M+H]+,15),431
(25),389(63),345(94),124(100),113(100).1 H-NMR(CDCl3,δppm):1.82(s,6H),1.95(s,3H),4.38
(dd,J1=3.21Hz,J2=4.74Hz,4H), 4.49 (dd,J1=3.21Hz,J2
=4.74Hz,4H),5.48(t,J=1.53Hz,2H),5.71(d,J=1.53Hz,1
H), 6.03(s,2H),6.28(s,1H),7.89(dd,J1=1.53Hz,J2=3.3
6Hz,2H), 8.45(t,J=1.52Hz,1H).13 C-NMR(CDCl3,δppm):17.78(2),17.81,61.98(2),62.9
3(2),125.96(2),127.16(2),127.68,127.93,131.39(2),1
34.84,135.45(2),150.66,164.24,164.99,166.87.
MASS (FAB + , m / e (%)): 475 ([M + H] + , 15), 431
(25), 389 (63), 345 (94), 124 (100), 113 (100). 1 H-NMR (CDCl 3 , δppm): 1.82 (s, 6H), 1.95 (s, 3H), 4.38
(dd, J 1 = 3.21Hz, J 2 = 4.74Hz, 4H), 4.49 (dd, J 1 = 3.21Hz, J 2
= 4.74Hz, 4H), 5.48 (t, J = 1.53Hz, 2H), 5.71 (d, J = 1.53Hz, 1
H), 6.03 (s, 2H), 6.28 (s, 1H), 7.89 (dd, J 1 = 1.53Hz, J 2 = 3.3
6Hz, 2H), 8.45 (t, J = 1.52Hz, 1H). 13 C-NMR (CDCl 3 , δppm): 17.78 (2), 17.81,61.98 (2), 62.9
3 (2), 125.96 (2), 127.16 (2), 127.68,127.93,131.39 (2), 1
34.84,135.45 (2), 150.66,164.24,164.99,166.87.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C07B 61/00 300 C07B 61/00 300 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) // C07B 61/00 300 C07B 61/00 300

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 式[1] 【化1】 (式中、R5、R6及びR7は水素原子または式[2] 【化2】 (式中、R1は水素原子または炭素数1〜4のアルキル
基を表し、R2及びR3は、水素原子または炭素数1〜1
0のアルキル基を表す。)で表される(置換)アクリロ
イル基を表し、少なくとも一つ以上は(置換)アクリロ
イル基を示す。)で表されるイソフタル酸化合物。
1. A formula [1] (In the formula, R 5 , R 6 and R 7 are hydrogen atoms or a compound of the formula [2] (In the formula, R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 and R 3 represent a hydrogen atom or 1 to 1 carbon atoms.
Represents an alkyl group of 0. ) Represents a (substituted) acryloyl group, and at least one or more represents a (substituted) acryloyl group. ) An isophthalic acid compound represented by.
【請求項2】 式[3] 【化3】 で表されるビス(2−ヒドロキシエチル)5−ヒドロキ
シイソフタレートと式[4] 【化4】 (式中、R1 は水素原子または炭素数1〜4のアルキル
基を表し、R2 、R3 及びR4 は、水素原子または炭素
数1〜10のアルキル基を表す。)で表される(置換)
アクリル酸化合物とを、酸触媒下反応させることを特徴
とする式[1] 【化5】 (式中、R5、R6及びR7は水素原子または式[2] 【化6】 (式中、R1 、R2及びR3は、前記と同じ意味を表
す。)で表される(置換)アクリロイル基を表し、少な
くとも一つ以上は(置換)アクリロイル基を示す。)で
表されるイソフタル酸化合物の製造法。
2. A formula [3] Bis (2-hydroxyethyl) 5-hydroxyisophthalate represented by the formula [4] (In the formula, R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 , R 3 and R 4 represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms.). (Replacement)
A compound represented by the formula [1], which is characterized by reacting an acrylic acid compound with an acid catalyst. (In the formula, R 5 , R 6 and R 7 are hydrogen atoms or a compound of the formula [2] (In the formula, R 1 , R 2 and R 3 have the same meanings as described above.) Represents a (substituted) acryloyl group, and at least one or more represents a (substituted) acryloyl group. ) The manufacturing method of the isophthalic acid compound represented by.
【請求項3】 酸触媒が、p−トルエンスルホン酸、ベ
ンゼンスルホン酸または硫酸である請求項2記載のイソ
フタル酸化合物の製造法。
3. The method for producing an isophthalic acid compound according to claim 2, wherein the acid catalyst is p-toluenesulfonic acid, benzenesulfonic acid or sulfuric acid.
【請求項4】 式[3] 【化7】 で表されるビス(2−ヒドロキシエチル)5−ヒドロキ
シイソフタレートと式[5] 【化8】 (式中、R1は水素原子または炭素数1〜4のアルキル
基を表し、R2及びR3は、水素原子または炭素数1〜1
0のアルキル基を表し、Xは、ハロゲン原子を表す。)
で表されるアクリル酸ハライド化合物を塩基、金属及び
金属化合物の存在下で反応させることを特徴とする式
[1] 【化9】 (式中、R5、R6及びR7は水素原子または式[2] 【化10】 (式中、R1、R2及びR3は、前記と同じ意味を表
す。)で表される(置換)アクリロイル基を表し、少な
くとも一つ以上は(置換)アクリロイル基を示す。)で
表されるイソフタル酸化合物の製造法。
4. The formula [3]: Bis (2-hydroxyethyl) 5-hydroxyisophthalate represented by the formula [5] (In the formula, R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 and R 3 represent a hydrogen atom or 1 to 1 carbon atoms.
0 represents an alkyl group, and X represents a halogen atom. )
An acrylic acid halide compound represented by the formula [1] is characterized by reacting in the presence of a base, a metal and a metal compound. (In the formula, R 5 , R 6 and R 7 are hydrogen atoms or a compound represented by the formula [2] (In the formula, R 1 , R 2 and R 3 have the same meanings as described above.) Represents a (substituted) acryloyl group, and at least one or more represents a (substituted) acryloyl group. ) The manufacturing method of the isophthalic acid compound represented by.
【請求項5】 塩基が、アルキルアミンであり、金属化
合物が金属水素化錯体または金属炭酸塩である請求項4
記載のイソフタル酸化合物の製造法。
5. The base is an alkylamine and the metal compound is a metal hydride complex or a metal carbonate.
A method for producing the described isophthalic acid compound.
JP2001261040A 2001-08-30 2001-08-30 Isophthalic acid compound and process for producing the same Expired - Fee Related JP4788858B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021165372A (en) * 2020-04-03 2021-10-14 住友化学株式会社 Method for producing compound, resin, resist composition and resist pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021165372A (en) * 2020-04-03 2021-10-14 住友化学株式会社 Method for producing compound, resin, resist composition and resist pattern
JP7744143B2 (en) 2020-04-03 2025-09-25 住友化学株式会社 Compound, resin, resist composition, and method for producing resist pattern

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