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JP2003053561A - Laser processing equipment - Google Patents

Laser processing equipment

Info

Publication number
JP2003053561A
JP2003053561A JP2001242879A JP2001242879A JP2003053561A JP 2003053561 A JP2003053561 A JP 2003053561A JP 2001242879 A JP2001242879 A JP 2001242879A JP 2001242879 A JP2001242879 A JP 2001242879A JP 2003053561 A JP2003053561 A JP 2003053561A
Authority
JP
Japan
Prior art keywords
laser
galvano scanner
acousto
conversion element
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001242879A
Other languages
Japanese (ja)
Inventor
Shinobu Sasaki
忍 佐々木
Hidefumi Saeki
英史 佐伯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001242879A priority Critical patent/JP2003053561A/en
Publication of JP2003053561A publication Critical patent/JP2003053561A/en
Pending legal-status Critical Current

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  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)

Abstract

(57)【要約】 (修正有) 【課題】 本発明は、レーザ加工装置において、加工時
間の短縮をはかり、部品点数・コストの削減と調整時間
の短縮が可能なレーザ加工装置を提供する。 【解決手段】 レーザ発振器1から出力されガルバノス
キャナ7へ導かれるレーザ光の光路外にビームダンパ4
を配置し、音響光学変換素子3を用いて前記ビームダン
パ4に、捨てパルスの制御を音響光学変換素子制御部1
2が行うので、ガルバノスキャナ7で狙っている部位は
動かず加工時間の短縮ができかつガルバノスキャナ7に
レーザ光が到達する前に捨てパルスが光路外に照射され
るので被加工物9に対し、捨てパルスを照射するための
ビーム光移動による誤照射で傷を生ずることが無く、安
定した加工ができる。
(57) [Summary] (With correction) PROBLEM TO BE SOLVED: To provide a laser processing apparatus capable of reducing a processing time in a laser processing apparatus, reducing the number of parts / cost and adjusting time. A beam damper is provided outside the optical path of laser light output from a laser oscillator and guided to a galvano scanner.
Are disposed on the beam damper 4 using the acousto-optic conversion element 3, and the control of the discard pulse is performed on the acousto-optic conversion element control unit 1.
2 does not move the target portion of the galvano scanner 7 and the processing time can be shortened, and a discarded pulse is irradiated outside the optical path before the laser beam reaches the galvano scanner 7. Stable processing can be performed without causing scratches due to erroneous irradiation due to beam light movement for irradiating a discarded pulse.

Description

【発明の詳細な説明】 【0001】 【発明の属する技術分野】本発明は、レーザ光、特にパ
ルス状のレーザ光を被加工物に照射して加工を行うレー
ザ加工装置に関する。 【0002】 【従来の技術】近年、樹脂からなるプリント基板の穴あ
け加工にレーザ加工装置を用いることが多くなってきて
いる。 【0003】このレーザ加工装置では、レーザ発振器か
ら出力されたパルス状のレーザ光をガルバノスキャナで
反射して被加工物となるプリント基板の所望の穴あけ個
所に照射し、穴あけ加工を行う構成になっていた。 【0004】そして、この種のレーザ加工装置は、パル
ス状のレーザ光が所定の強度にならない状態、例えば、
ある程度の休止期間の後で照射される初めのレーザ光の
強度等の制御がうまく行かないときには、定常状態のレ
ーザ光が出力できるようになるまでプリント基板に照射
しないように構成していた。 【0005】その一例として特開平11−285872
号に示すように、ガルバノスキャナでプリント基板とは
別に配置したダミーターゲットにレーザ光を向ける(以
下では『捨てパルス』という)ように制御していた。 【0006】 【発明が解決しようとする課題】しかし、このような従
来の構成では、ダミーターゲットに捨てパルスを照射す
るために必要なガルバノスキャナの移動時間が発生し
た。また、被加工物近傍までレーザ光を導きダミーター
ゲットにレーザ光を照射するため、被加工物上への誤照
射を生じ、加工品質を落としてしまう恐れがあった。さ
らに、ダミーターゲットの製作・取付け・誤照射を防止
するための取付け位置調整等の部品コストと調整時間が
発生した。 【0007】本発明は上記問題に鑑み、被加工物に最適
なレーザ光を照射でき、かつ加工時間の短縮をはかり、
ダミーターゲットおよびダミーターゲット調整時間を削
減したレーザ加工装置を提供するものである。 【0008】 【課題を解決するための手段】上記課題を解決するため
に本発明は、レーザ発振器と、このレーザ発振器を制御
する制御部と、前記レーザ発振器から出力されるレーザ
光を被加工物の所望の部位へ導くガルバノスキャナを有
し、レーザ発振器から出力されガルバノスキャナへ導か
れるレーザ光の光路中に音響光学変換素子を配置し、前
記光路外にビームダンパを配置し、前記音響光学変換素
子を用いて前記ビームダンパにレーザ光を照射する制御
を制御部が行うレーザ加工装置である。 【0009】 【発明の実施の形態】以下、添付図面を参照して本発明
の実施形態について説明する。 【0010】図1は、本実施の形態におけるレーザ加工
装置の概要を示す構成図である。 【0011】図において、レーザ発振器1でパルス状の
レーザ光2aを出力するようにしている。 【0012】このレーザ光2aは音響光学変換素子3に
入射する構成にしている。 【0013】音響光学変換素子3は音響光学変換素子制
御部12により、加工に使用しないレーザ光または、捨
てパルス2b(以下レーザ光2bという。)及び加工に
使用するレーザ光2cに分けられ、レーザ光2bはビー
ムダンパ4に照射される。 【0014】レーザ光2cは反射鏡5aにより方向変換
される。 【0015】方向変換されたレーザ光2dは、マスク6
に入射するように構成している。 【0016】このマスク6では、入射したレーザ光2d
の径を所望の径に絞ってレーザ光2eを出力するように
している。 【0017】このレーザ光2eは反射鏡5bによって方
向変換され、方向変換されたレーザ光2fをガルバノス
キャナ7に入射するように構成している。 【0018】このガルバノスキャナ7では被加工物とな
るプリント基板9の平面方向で穴加工位置にレーザ光2
gが照射されるようにガルバノスキャナ制御部13によ
り内部のX方向調整ミラーとY方向調整ミラーで位置調
整する。 【0019】そして、レーザ光2gをfθレンズ8に入
射してプリント基板9に対して垂直なレーザ光2hに変
換して出力するように構成している。 【0020】また、プリント基板9はXYテーブル10
に載置していて、エアーで吸引してずれないようにし、
XY方向(プリント基板9の平面方向)にXYテーブル
駆動部10aで位置調整できるようにしている。 【0021】そして、レーザ発振器1はレーザ発振器制
御部11でレーザ発振を制御し、音響光学変換素子3は
音響光学変換素子制御部12でレーザ光2aの照射方向
を制御し、ガルバノスキャナ7はガルバノスキャナ制御
部13で制御し、XYテーブル駆動部10aをXYテー
ブル制御部14で駆動制御し、これらのレーザ発振器制
御部11、音響光学変換素子制御部12、ガルバノスキ
ャナ制御部13、XYテーブル制御部14はメイン制御
部15に接続する構成とする。 【0022】このメイン制御部15は入力部16と認識
部(記憶手段)17に接続し、入力部16からレーザ加
工条件を入力または図示しない表示部に表示されたメニ
ューから選択してメイン制御部14での処理に用いるよ
うにしている。 【0023】メイン制御部15では認識部(記憶手段)
17に記憶したレーザ加工装置の稼動プログラムや制御
パラメータを入力部16から入力された情報とあわせて
レーザ発振器制御部11、音響光学変換素子制御部1
2、ガルバノスキャナ制御部13、XYテーブル制御部
14を制御するようにしている。 【0024】 【発明の効果】上記構成により、レーザ発振器から出力
されガルバノスキャナへ導かれるレーザ光の光路中に音
響光学変換素子を配置し、前記光路外にビームダンパを
配置し、前記音響光学変換素子を用いて前記ビームダン
パに捨てパルスを照射するレーザ光の制御を前記音響光
学変換素子制御部が行うので、ガルバノスキャナで狙っ
ている加工部位は動かず加工時間の短縮ができかつガル
バノスキャナにレーザ光が到達する前に捨てパルスが光
路外に照射されるので被加工物に対し、捨てパルスを照
射するためのビーム光移動による誤照射で傷を生ずるこ
とが無く、安定した加工ができる。 【0025】また、前記光路外のビームダンパに捨てパ
ルスを照射することによりダミーターゲットが不要にな
り、部品コストと位置調整に要する調整時間の削減がで
きる。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser processing apparatus for performing processing by irradiating a workpiece with laser light, particularly pulsed laser light. In recent years, a laser processing apparatus is frequently used for drilling a printed circuit board made of resin. In this laser processing apparatus, a pulsed laser beam output from a laser oscillator is reflected by a galvano scanner to irradiate a desired hole on a printed circuit board to be processed, thereby performing a hole processing. It was. In this type of laser processing apparatus, a pulsed laser beam does not have a predetermined intensity, for example,
When the control of the intensity of the first laser beam irradiated after a certain pause period is not successful, the printed circuit board is not irradiated until a steady-state laser beam can be output. As an example, JP-A-11-285872.
As shown in Fig. 2, the galvano scanner was controlled so that the laser beam was directed to a dummy target arranged separately from the printed circuit board (hereinafter referred to as "discard pulse"). However, in such a conventional configuration, a galvano scanner moving time required for irradiating a dummy target with a discarded pulse occurs. Moreover, since the laser beam is guided to the vicinity of the workpiece and the dummy target is irradiated with the laser beam, there is a possibility that the workpiece is erroneously irradiated and the processing quality is deteriorated. In addition, parts cost and adjustment time such as mounting position adjustment to prevent dummy target production, mounting and mis-irradiation occurred. In view of the above problems, the present invention can irradiate the workpiece with the optimum laser beam and reduce the processing time.
It is an object of the present invention to provide a laser processing apparatus with reduced dummy target and dummy target adjustment time. In order to solve the above problems, the present invention provides a laser oscillator, a control unit for controlling the laser oscillator, and a laser beam output from the laser oscillator as a workpiece. A galvano scanner that leads to a desired part of the laser, an acousto-optic conversion element is disposed in the optical path of the laser light output from the laser oscillator and guided to the galvano scanner, a beam damper is disposed outside the optical path, and the acousto-optic conversion element This is a laser processing apparatus in which a control unit performs control to irradiate the beam damper with laser light using a laser. DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a block diagram showing an outline of a laser processing apparatus according to the present embodiment. In the figure, a laser oscillator 1 outputs a pulsed laser beam 2a. The laser beam 2a is configured to be incident on the acousto-optic conversion element 3. The acousto-optic conversion element 3 is divided by the acousto-optic conversion element controller 12 into laser light not used for processing, or a discarded pulse 2b (hereinafter referred to as laser light 2b) and laser light 2c used for processing. The light 2b is applied to the beam damper 4. The direction of the laser beam 2c is changed by the reflecting mirror 5a. The direction-converted laser beam 2d is applied to the mask 6
It is comprised so that it may inject into. In this mask 6, the incident laser beam 2d
The laser beam 2e is output with the diameter of the laser beam being reduced to a desired diameter. The direction of the laser beam 2e is changed by the reflecting mirror 5b, and the direction-converted laser beam 2f is made incident on the galvano scanner 7. In this galvano scanner 7, a laser beam 2 is provided at a hole machining position in the plane direction of the printed circuit board 9 to be processed.
The position is adjusted by the galvano scanner control unit 13 using the internal X direction adjustment mirror and the Y direction adjustment mirror so that g is irradiated. The laser beam 2g is incident on the fθ lens 8, converted into a laser beam 2h perpendicular to the printed circuit board 9, and output. The printed circuit board 9 is an XY table 10.
To prevent it from slipping by sucking with air,
The position can be adjusted by the XY table driving unit 10a in the XY direction (the plane direction of the printed circuit board 9). The laser oscillator 1 controls the laser oscillation by the laser oscillator control unit 11, the acousto-optic conversion element 3 controls the irradiation direction of the laser light 2a by the acousto-optic conversion element control unit 12, and the galvano scanner 7 Control is performed by the scanner control unit 13, and the XY table drive unit 10a is driven and controlled by the XY table control unit 14. These laser oscillator control unit 11, acousto-optic conversion element control unit 12, galvano scanner control unit 13, and XY table control unit. 14 is configured to be connected to the main control unit 15. The main control unit 15 is connected to an input unit 16 and a recognition unit (storage means) 17, and laser processing conditions are input from the input unit 16 or selected from a menu displayed on a display unit (not shown). 14 is used for the processing in No.14. The main control unit 15 has a recognition unit (storage means).
The laser oscillator control unit 11 and the acousto-optic conversion element control unit 1 are combined with the information input from the input unit 16 together with the operation program and control parameters of the laser processing apparatus stored in 17.
2. The galvano scanner control unit 13 and the XY table control unit 14 are controlled. According to the above configuration, an acousto-optic conversion element is disposed in the optical path of the laser beam output from the laser oscillator and guided to the galvano scanner, and a beam damper is disposed outside the optical path. Since the acousto-optic conversion element control unit controls the laser beam that irradiates the beam damper with a pulse using the galvano scanner, the machining site targeted by the galvano scanner does not move, and the machining time can be shortened. Since the discard pulse is irradiated to the outside of the optical path before arriving at the workpiece, the workpiece is not damaged by erroneous irradiation due to the beam light movement for irradiating the discard pulse, and stable processing can be performed. Further, by discarding the beam damper outside the optical path and irradiating it with a pulse, a dummy target becomes unnecessary, and the parts cost and adjustment time required for position adjustment can be reduced.

【図面の簡単な説明】 【図1】本発明の実施の形態におけるレーザ加工装置の
構成図 【符号の説明】 1 レーザ発振器 2a レーザ光 2b レーザ光(加工に使用しないレーザ光および捨
てパルス) 2c レーザ光 2d レーザ光 2e レーザ光 2f レーザ光 2g レーザ光 2h レーザ光 3 音響光学変換素子 4 ビームダンパ 5a 反射鏡 5b 反射鏡 6 マスク 7 ガルバノスキャナ 8 fθレンズ 9 被加工物 10 XYテーブル 10a XYテーブル駆動部 11 レーザ発振器制御部 12 音響光学変換素子制御部 13 ガルバノスキャナ制御部 14 XYテーブル制御部 15 メイン制御部 16 入力部 17 認識部(記憶手段)
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram of a laser processing apparatus according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1 Laser oscillator 2a Laser light 2b Laser light (laser light not used for processing and discarded pulse) 2c Laser beam 2d Laser beam 2e Laser beam 2f Laser beam 2g Laser beam 2h Laser beam 3 Acousto-optic conversion element 4 Beam damper 5a Reflector 5b Reflector 6 Mask 7 Galvano scanner 8 fθ lens 9 Work piece 10 XY table 10a XY table drive unit DESCRIPTION OF SYMBOLS 11 Laser oscillator control part 12 Acousto-optic conversion element control part 13 Galvano scanner control part 14 XY table control part 15 Main control part 16 Input part 17 Recognition part (memory | storage means)

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H079 AA04 AA12 BA01 BA03 CA24 KA18 KA20 2K002 AA04 AB04 BA12 HA10 4E068 AF00 CA02 CA17 CD08 CE03 DA11 5F072 HH03 JJ05 MM08 MM11 SS06 YY06    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H079 AA04 AA12 BA01 BA03 CA24                       KA18 KA20                 2K002 AA04 AB04 BA12 HA10                 4E068 AF00 CA02 CA17 CD08 CE03                       DA11                 5F072 HH03 JJ05 MM08 MM11 SS06                       YY06

Claims (1)

【特許請求の範囲】 【請求項1】 レーザ発振器と、このレーザ発振器を制
御する制御部と、前記レーザ発振器から出力されるレー
ザ光を被加工物の所望の部位へ導くガルバノスキャナを
有し、レーザ発振器から出力されガルバノスキャナへ導
かれるレーザ光の光路中に音響光学変換素子を配置し、
前記光路外にビームダンパを配置し、前記音響光学変換
素子を用いて前記ビームダンパにレーザ光を照射する制
御を制御部が行うレーザ加工装置。
1. A laser oscillator, a control unit for controlling the laser oscillator, and a galvano scanner for guiding laser light output from the laser oscillator to a desired part of a workpiece, An acousto-optic conversion element is placed in the optical path of the laser beam output from the laser oscillator and guided to the galvano scanner,
A laser processing apparatus in which a control unit performs control to dispose a beam damper outside the optical path and irradiate the beam damper with laser light using the acousto-optic conversion element.
JP2001242879A 2001-08-09 2001-08-09 Laser processing equipment Pending JP2003053561A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001242879A JP2003053561A (en) 2001-08-09 2001-08-09 Laser processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001242879A JP2003053561A (en) 2001-08-09 2001-08-09 Laser processing equipment

Publications (1)

Publication Number Publication Date
JP2003053561A true JP2003053561A (en) 2003-02-26

Family

ID=19073081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001242879A Pending JP2003053561A (en) 2001-08-09 2001-08-09 Laser processing equipment

Country Status (1)

Country Link
JP (1) JP2003053561A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004358507A (en) * 2003-06-04 2004-12-24 Matsushita Electric Ind Co Ltd Laser processing apparatus and laser processing method
US7245412B2 (en) 2001-02-16 2007-07-17 Electro Scientific Industries, Inc. On-the-fly laser beam path error correction for specimen target location processing
JP2008036697A (en) * 2006-08-09 2008-02-21 Sumitomo Heavy Ind Ltd Laser beam machining method and apparatus
US7425471B2 (en) 2004-06-18 2008-09-16 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis with cross-axis offset
US7435927B2 (en) 2004-06-18 2008-10-14 Electron Scientific Industries, Inc. Semiconductor link processing using multiple laterally spaced laser beam spots with on-axis offset
US7629234B2 (en) 2004-06-18 2009-12-08 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots with joint velocity profiling
US7633034B2 (en) 2004-06-18 2009-12-15 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
US7687740B2 (en) 2004-06-18 2010-03-30 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots delivering multiple blows
JP2010207914A (en) * 2010-06-14 2010-09-24 Sumitomo Heavy Ind Ltd Laser beam machining controller and laser beam machining control method
US8148211B2 (en) 2004-06-18 2012-04-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously
US8383982B2 (en) 2004-06-18 2013-02-26 Electro Scientific Industries, Inc. Methods and systems for semiconductor structure processing using multiple laser beam spots
US8497450B2 (en) 2001-02-16 2013-07-30 Electro Scientific Industries, Inc. On-the fly laser beam path dithering for enhancing throughput

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7245412B2 (en) 2001-02-16 2007-07-17 Electro Scientific Industries, Inc. On-the-fly laser beam path error correction for specimen target location processing
US8497450B2 (en) 2001-02-16 2013-07-30 Electro Scientific Industries, Inc. On-the fly laser beam path dithering for enhancing throughput
US8238007B2 (en) 2001-02-16 2012-08-07 Electro Scientific Industries, Inc. On-the-fly laser beam path error correction for specimen target location processing
JP2004358507A (en) * 2003-06-04 2004-12-24 Matsushita Electric Ind Co Ltd Laser processing apparatus and laser processing method
US7633034B2 (en) 2004-06-18 2009-12-15 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
US7629234B2 (en) 2004-06-18 2009-12-08 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots with joint velocity profiling
US7435927B2 (en) 2004-06-18 2008-10-14 Electron Scientific Industries, Inc. Semiconductor link processing using multiple laterally spaced laser beam spots with on-axis offset
US7687740B2 (en) 2004-06-18 2010-03-30 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots delivering multiple blows
US7923306B2 (en) 2004-06-18 2011-04-12 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots
US8148211B2 (en) 2004-06-18 2012-04-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously
US7425471B2 (en) 2004-06-18 2008-09-16 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis with cross-axis offset
US8383982B2 (en) 2004-06-18 2013-02-26 Electro Scientific Industries, Inc. Methods and systems for semiconductor structure processing using multiple laser beam spots
JP2008036697A (en) * 2006-08-09 2008-02-21 Sumitomo Heavy Ind Ltd Laser beam machining method and apparatus
JP2010207914A (en) * 2010-06-14 2010-09-24 Sumitomo Heavy Ind Ltd Laser beam machining controller and laser beam machining control method

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