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JP2002337164A - Method for producing optical film and liquid crystal display device - Google Patents

Method for producing optical film and liquid crystal display device

Info

Publication number
JP2002337164A
JP2002337164A JP2001142904A JP2001142904A JP2002337164A JP 2002337164 A JP2002337164 A JP 2002337164A JP 2001142904 A JP2001142904 A JP 2001142904A JP 2001142904 A JP2001142904 A JP 2001142904A JP 2002337164 A JP2002337164 A JP 2002337164A
Authority
JP
Japan
Prior art keywords
film
liquid crystal
light
optical film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001142904A
Other languages
Japanese (ja)
Other versions
JP4771348B2 (en
Inventor
Ichiro Amino
一郎 網野
Toshihiko Ariyoshi
俊彦 有吉
Seiji Umemoto
清司 梅本
Riyouji Kinoshita
亮児 木下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2001142904A priority Critical patent/JP4771348B2/en
Publication of JP2002337164A publication Critical patent/JP2002337164A/en
Application granted granted Critical
Publication of JP4771348B2 publication Critical patent/JP4771348B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Abstract

(57)【要約】 【課題】両端部分が鋭角に掘り込まれた微細構造の溝を
位置精度よく配置してなる光出射手段を有して、液晶表
示パネルの側面より入射させた光を効率よく視認方向に
光路変換して薄型軽量で明るく、見易い表示の液晶表示
装置を形成しうる薄さに優れる光学フィルムを効率よく
得られる製造方法の開発。 【解決手段】透明フィルム(11)に施与した放射線硬
化型樹脂の塗布層を、フィルム面に対する傾斜角が35
〜48度の光路変換斜面(a)を具備する凹部(A)の
複数からなる光出射手段を形成しうる凸部(21)を有
する電鋳金型(2)に密着させ、当該塗布層に電鋳金型
の表面形状を写した成形層(12)を形成して前記透明
フィルムの側より放射線を照射し、その成形層を硬化
(13)させて金型より分離する光学フィルムの製造方
法及びその光学フィルムを液晶セルの少なくとも片側に
配置してなる液晶表示装置。
(57) [Summary] [PROBLEMS] To provide a light emitting means in which grooves of a fine structure in which both ends are dug at an acute angle are arranged with high positional accuracy, and to efficiently emit light incident from the side surface of a liquid crystal display panel. Development of a manufacturing method capable of efficiently obtaining an optical film excellent in thinness capable of forming a thin, light, bright, and easily viewable liquid crystal display device by changing the optical path in the viewing direction well. A radiation-curable resin applied layer applied to a transparent film (11) has an inclination angle of 35 with respect to the film surface.
An electroforming mold (2) having a convex portion (21) capable of forming a light emitting means composed of a plurality of concave portions (A) having an optical path changing slope (a) of -48 degrees is brought into close contact with the coating layer. A method for producing an optical film, in which a molding layer (12) that reflects the surface shape of a casting mold is formed, radiation is irradiated from the side of the transparent film, and the molding layer is cured (13) and separated from the mold. A liquid crystal display device comprising an optical film disposed on at least one side of a liquid crystal cell.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の技術分野】本発明は、液晶表示パネルの側面よ
り入射させた光を効率よく視認方向に光路変換して薄型
軽量で明るく、見易い表示の液晶表示装置を形成しうる
光学フィルムの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an optical film capable of forming a thin, light, bright, and easy-to-view liquid crystal display device by efficiently converting the light incident from the side of a liquid crystal display panel into an optical path in a viewing direction. About.

【0002】[0002]

【発明の背景】従来、液晶表示パネルの視認側表面にサ
イドライト型導光板を配置してなるフロントライト式の
反射型液晶表示装置が知られていた(特開平11−25
0715号公報)。しかしながら導光板では機械加工に
より形成されるため微細加工を施しにくく、溝からなる
光出射手段を微小サイズにて所定位置に精度よく配置す
ることや溝の両端を鋭角に切り込むことが難しいことよ
り厚さを薄くすることが困難で液晶表示装置の薄型軽量
化を図りにくい問題点があった。
BACKGROUND OF THE INVENTION A reflection type liquid crystal display device of a front light type in which a side light type light guide plate is arranged on a viewing side surface of a liquid crystal display panel has been known (Japanese Patent Laid-Open No. 11-25 / 1999).
No. 0715). However, since the light guide plate is formed by machining, it is difficult to perform fine processing, and it is difficult to precisely arrange the light emitting means including the groove at a predetermined position in a small size and to cut both ends of the groove at an acute angle. However, there is a problem that it is difficult to reduce the thickness of the liquid crystal display device, and it is difficult to reduce the thickness and weight of the liquid crystal display device.

【0003】[0003]

【発明の技術的課題】本発明は、両端部分が鋭角に掘り
込まれた微細構造の溝を位置精度よく配置してなる光出
射手段を有して、液晶表示パネルの側面より入射させた
光を効率よく視認方向に光路変換して薄型軽量で明る
く、見易い表示の液晶表示装置を形成しうる薄さに優れ
る光学フィルムを効率よく得ることができる製造方法の
開発を課題とする。
SUMMARY OF THE INVENTION The present invention is directed to a light emitting device having light emitting means in which both ends are formed with a fine structure groove dug at an acute angle with a high degree of positional accuracy. It is an object of the present invention to develop a manufacturing method capable of efficiently obtaining an optical film having an excellent thinness that can form a thin, light, bright, and easy-to-view liquid crystal display device by efficiently converting the optical path in the viewing direction.

【0004】[0004]

【課題の解決手段】本発明は、透明フィルムに施与した
放射線硬化型樹脂の塗布層を、フィルム面に対する傾斜
角が35〜48度の光路変換斜面を具備する凹部の複数
からなる光出射手段を形成しうる凸部を有する電鋳金型
に密着させ、当該塗布層に電鋳金型の表面形状を写した
成形層を形成して前記透明フィルムの側より放射線を照
射し、その成形層を硬化させて金型より分離することを
特徴とする光学フィルムの製造方法、及びその光学フィ
ルムを液晶セルの少なくとも片側に配置してなることを
特徴とする液晶表示装置を提供するものである。
According to the present invention, there is provided a light emitting means comprising a plurality of concave portions having an optical path changing slope having an inclination angle of 35 to 48 degrees with respect to a film surface by applying a coating layer of a radiation-curable resin applied to a transparent film. Is adhered to an electroforming mold having a convex portion capable of forming a, forming a molding layer on the coating layer which reflects the surface shape of the electroforming mold, irradiating radiation from the transparent film side, and curing the molding layer. The present invention provides a method for producing an optical film, characterized in that the optical film is separated from a metal mold, and a liquid crystal display device, wherein the optical film is arranged on at least one side of a liquid crystal cell.

【0005】[0005]

【発明の効果】本発明によれば、電鋳金型を介し放射線
硬化型樹脂の塗布層を所定形状に成形して硬化処理する
ので、両端部分が鋭角に掘り込まれた微細構造の溝が位
置精度よく配置された光出射手段を有する光学フィルム
を効率よく得ることができ、それを用いて液晶表示パネ
ルの側面より入射させた光を効率よく視認方向に光路変
換して薄型軽量で明るく、見易い表示の液晶表示装置を
形成することができる。
According to the present invention, a coating layer of a radiation-curable resin is formed into a predetermined shape via an electroforming mold and subjected to a curing treatment. It is possible to efficiently obtain an optical film having light emitting means arranged with high accuracy, and to efficiently convert the light incident from the side surface of the liquid crystal display panel in the viewing direction to thin and light, bright and easy to see. A liquid crystal display device for display can be formed.

【0006】[0006]

【発明の実施形態】本発明による製造方法は、透明フィ
ルムに施与した放射線硬化型樹脂の塗布層を、フィルム
面に対する傾斜角が35〜48度の光路変換斜面を具備
する凹部の複数からなる光出射手段を形成しうる凸部を
有する電鋳金型に密着させ、当該塗布層に電鋳金型の表
面形状を写した成形層を形成して前記透明フィルムの側
より放射線を照射し、その成形層を硬化させて金型から
分離することにより光学フィルムを得るものである。そ
の製造工程を図1に例示した。図1ホの1が光学フィル
ムであり、11が透明フィルム、13が放射線硬化型樹
脂の成形硬化層である。なお図例は、電鋳金型の形成
(イ〜ハ)から、光学フィルムの形成(ニ、ホ)までを
示している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the production method according to the present invention, a coating layer of a radiation-curable resin applied to a transparent film is formed of a plurality of concave portions having an optical path changing slope having an inclination angle of 35 to 48 degrees with respect to the film surface. The light emitting means is brought into close contact with an electroforming mold having a convex portion, and a molding layer that reflects the surface shape of the electroforming mold is formed on the coating layer, and radiation is irradiated from the transparent film side to form the molding layer. The optical film is obtained by curing the layer and separating it from the mold. The manufacturing process is illustrated in FIG. 1 is an optical film, 11 is a transparent film, and 13 is a molded cured layer of a radiation-curable resin. In addition, the example of a figure has shown from formation of an electroforming metal mold (I-C) to formation of an optical film (D, E).

【0007】図例の如く光学フィルム1は、所定の凸部
21を有する電鋳金型2を介してフィルム面に対する傾
斜角θ1が35〜48度の光路変換斜面aを具備する凹
部Aの複数からなる光出射手段を成形することにより形
成される。その電鋳金型は、例えば図1イ、ロの如くド
ライエッチングにて所定の凹部A’を形成した絶縁性フ
ィルム3に電鋳法を施す方式などにより形成することが
できる。
As shown in the figure, an optical film 1 is formed by a plurality of concave portions A having an optical path changing slope a having an inclination angle θ1 of 35 to 48 degrees with respect to the film surface via an electroforming mold 2 having a predetermined convex portion 21. It is formed by molding light emitting means. The electroforming mold can be formed by, for example, a method of performing an electroforming method on the insulating film 3 having the predetermined concave portion A ′ formed by dry etching as shown in FIGS.

【0008】ドライエッチング法にて凹部を形成するこ
とにより機械加工に比べて遙かに高精度な微細加工を施
すことができ、両端部が鋭角に掘り込まれた溝(凹部)
を位置精度よく分布配置することができる。微細加工精
度の点より好ましいドライエッチングは、レーザー光に
よる方式である。そのレーザーとしては、例えばエキシ
マレーザーやYAGレーザー、COレーザーやフェム
ト秒レーザーなどの適宜なものを1種又は2種以上用い
うる。就中、波長400nm以下の紫外領域の発振波長を
有するレーザーが好ましい。
[0008] By forming the concave portion by dry etching, fine processing can be performed with much higher precision than mechanical processing, and a groove (recess) having both ends dug at an acute angle.
Can be distributed and arranged with high positional accuracy. Dry etching, which is preferable from the viewpoint of fine processing accuracy, is a method using laser light. As the laser, for example, one or more appropriate lasers such as an excimer laser, a YAG laser, a CO 2 laser, and a femtosecond laser can be used. Particularly, a laser having an oscillation wavelength in the ultraviolet region of 400 nm or less is preferable.

【0009】一方、エッチング加工の対象である絶縁性
フィルムとしては、電気的に絶縁性を有する適宜な材質
からなるものを用いることができ特に限定がない。ちな
みにその例としてはポリエステル系樹脂やエポキシ系樹
脂、ウレタン系樹脂やポリスチレン系樹脂、ポリエチレ
ン系樹脂やポリアミド系樹脂、ポリイミド系樹脂やAB
S樹脂、ポリカーボネート系樹脂やシリコーン系樹脂な
どからなるフィルムがあげられる。就中、耐熱性や耐薬
品性、レーザ加工性の点よりポリイミド系樹脂からなる
絶縁性フィルムが好ましく用いうる。またフィルム厚
は、任意であるがエッチング加工時(図1イ)や電鋳金
型形成時のハンドリング性、強度や光出射手段に対応し
た凹部の形成性などの点より500μm以下、就中10
〜200μmが好ましい。
On the other hand, as the insulating film to be etched, a film made of a suitable electrically insulating material can be used, and there is no particular limitation. By the way, examples are polyester resin, epoxy resin, urethane resin, polystyrene resin, polyethylene resin, polyamide resin, polyimide resin, AB
Examples include films made of S resin, polycarbonate resin, silicone resin, and the like. In particular, an insulating film made of a polyimide resin can be preferably used from the viewpoint of heat resistance, chemical resistance, and laser workability. The thickness of the film is optional, but is preferably 500 μm or less, and more preferably 10 μm or less, in view of the handleability during etching (FIG. 1A) and the formation of an electroforming mold, strength, and the ability to form a concave portion corresponding to the light emitting means.
〜200 μm is preferred.

【0010】所定の凹部、すなわち図1イの例の如く光
学フィルムに設けることを目的とする、フィルム面に対
する傾斜角が35〜48度の光路変換斜面を具備する凹
部の複数からなる光出射手段に対応した凹部A’を有す
る絶縁性フィルム3の形成は、例えば絶縁性フィルムに
所定形状のマスクを介しレーザー光によるアブレーショ
ン加工を施して絶縁性フィルムの所定部分をエッチング
除去する方式などにより行うことができる。その場合に
目的とする複数の凹部からなる光出射手段に対応したサ
イズの開口の複数を所定の分布状態で配置したマスクを
用いることにより、目的とする凹部を有する絶縁性フィ
ルムを効率よく形成することができる。
Light emitting means comprising a plurality of predetermined concave portions, that is, concave portions having an optical path changing slope having an inclination angle of 35 to 48 degrees with respect to the film surface for the purpose of being provided on the optical film as shown in the example of FIG. The insulating film 3 having the concave portion A ′ corresponding to the above is formed by, for example, a method of performing an ablation process with a laser beam on the insulating film through a mask of a predetermined shape and etching and removing a predetermined portion of the insulating film. Can be. In this case, an insulating film having the target concave portions is efficiently formed by using a mask in which a plurality of openings having a size corresponding to the light emitting means including the target plural concave portions are arranged in a predetermined distribution state. be able to.

【0011】図1ロの例の如く電鋳金型2の形成は、所
定の凹部を設けた絶縁性フィルム3に電鋳法を適用する
ことにより行われる。これにより図1ハの例の如く絶縁
性フィルム3に設けた凹部A’に高精度に対応した凸部
21を有する金型2を形成することができる。前記の電
鋳法には絶縁性フィルムの凹部を設けた側に金属を充填
して絶縁性フィルムの当該凹部を設けた側の面形状を写
したレプリカを有する金属層からなる電鋳金型を形成す
る従来に準じた方法を適用することができる。従って金
属層の形成に際しては絶縁性フィルムの凹部を設けた側
に導電膜が設けられるが、その導電膜の形成についても
従来に準じた方法を適用することができる。
As shown in FIG. 1B, the electroforming mold 2 is formed by applying an electroforming method to the insulating film 3 having a predetermined concave portion. Thereby, the mold 2 having the convex portions 21 corresponding to the concave portions A 'provided in the insulating film 3 with high precision can be formed as in the example of FIG. In the above-described electroforming method, a metal is filled on a side provided with the concave portion of the insulating film to form an electroformed mold including a metal layer having a replica of a surface shape of the side provided with the concave portion of the insulating film. A method according to the related art can be applied. Therefore, when forming the metal layer, a conductive film is provided on the side of the insulating film on which the concave portion is provided, and a method according to the related art can be applied to the formation of the conductive film.

【0012】電鋳金型を形成する金属の種類については
特に限定はなく、一般には例えば金や銀、銅や鉄、ニッ
ケルやコバルト、あるいはそれらの合金類などが用いら
れ、窒化物やリン等を添加したものなどであってもよ
い。用いる金属種は、1種でもよし、2種以上であって
もよく、また異種金属を積層してなる電鋳金型を形成す
ることもできる。電鋳金型として形成する金属層の厚さ
は適宜に決定してよい。絶縁性フィルムと分離する際の
破損防止や光学フィルム形成時のハンドリング性などの
点より凸部を有しない部分の厚さが0.02〜3mm程度
の金属層からなる金属箔ないし金属板による金型とした
ものが好ましい。
There is no particular limitation on the type of metal forming the electroforming mold. Generally, for example, gold, silver, copper, iron, nickel, cobalt, or alloys thereof are used. It may be added. The kind of metal used may be one kind or two or more kinds, and an electroforming mold formed by laminating different kinds of metals can also be formed. The thickness of the metal layer formed as the electroformed mold may be determined as appropriate. In order to prevent breakage at the time of separation from the insulating film and handleability at the time of forming the optical film, the thickness of the portion having no convex portion is about 0.02 to 3 mm. A mold is preferred.

【0013】図1ニ、ホの例の如く光学フィルムの形成
は、透明フィルム11に放射線硬化型樹脂を塗布し、そ
の施与した塗布層を電鋳金型2の凸部21を形成した面
に密着させて当該塗布層に電鋳金型の凸部形成側の表面
形状を写し、それにより当該表面形状を写した成形層1
2を形成して透明フィルム11の側より放射線を照射
し、その成形層を硬化させてそれによる成形硬化層13
を必要に応じ透明フィルム11と共に電鋳金型2から分
離することにより行われる。これにより電鋳金型の凸部
形成側の表面形状に高精度に対応した凹部と表面形状を
有する、従ってフィルム面に対する傾斜角が35〜48
度の光路変換斜面を具備する凹部の複数からなる光出射
手段を有する光学フィルムを得ることができる。
As shown in FIG. 1D and FIG. 1E, the optical film is formed by applying a radiation-curable resin to the transparent film 11 and applying the applied layer to the surface of the electroformed mold 2 on which the convex portions 21 are formed. The molding layer 1 in which the surface shape on the side of the convex portion of the electroforming mold is copied onto the coating layer by being brought into close contact with the coating layer, and thereby the surface shape is copied.
2 is formed and irradiated with radiation from the side of the transparent film 11 to cure the molded layer, thereby forming a cured layer 13
Is separated from the electroforming mold 2 together with the transparent film 11 as necessary. Thus, the electroforming mold has a concave portion and a surface shape corresponding to the surface shape on the convex portion forming side with high precision, and accordingly, the inclination angle with respect to the film surface is 35 to 48.
It is possible to obtain an optical film having a light emitting means composed of a plurality of concave portions having an optical path changing slope.

【0014】前記において光学フィルムの好ましい製造
方法は、変形性の電鋳金型を円柱状ないし円筒状の円形
回転体の外周に捲着し、その回転体を介し電鋳金型を回
転させながらその回転下の電鋳金型に、長尺の透明フィ
ルムに設けた放射線硬化型樹脂の塗布層を順次圧着して
電鋳金型の表面形状を写した成形層を連続的に形成しつ
つ、その成形層に放射線を照射して光学フィルムを連続
的に製造する方法である。
In the above, a preferred method of manufacturing an optical film is to wind a deformable electroforming mold around the outer periphery of a cylindrical or cylindrical circular rotating body, and rotate the electroforming mold while rotating the electroforming mold through the rotating body. On the lower electroforming mold, the coating layer of the radiation-curable resin provided on the long transparent film is successively pressed to form a molding layer that reflects the surface shape of the electroforming mold, while continuously forming the molding layer. This is a method of continuously producing an optical film by irradiating radiation.

【0015】上記のように本発明方法は、図2の例の如
くフィルム面に対する傾斜角が35〜48度の光路変換
斜面を具備する凹部Aの複数からなる光出射手段を有す
る光学フィルム1を得るものである。またその光学フィ
ルムは、側面に光源を有する液晶セルの前記光源による
側面方向からの入射光ないしその伝送光を光路変換斜面
を介し反射させて裏面側(光出射手段を有しない側)
に、従って液晶表示パネルの視認方向に光路変換して出
射させ、その出射光を液晶表示パネル等の照明光(表示
光)として利用できるようにすることを目的とする。従
って光学フィルムは通例、液晶セルの平面に沿う方向に
その光出射手段の形成面が外側となるように配置され
る。
As described above, according to the method of the present invention, as shown in the example of FIG. 2, the optical film 1 having the light emitting means comprising a plurality of concave portions A having an optical path changing slope having an inclination angle of 35 to 48 degrees with respect to the film surface is provided. What you get. In addition, the optical film reflects incident light from the side surface of the liquid crystal cell having a light source on the side surface or transmitted light from the side direction of the liquid crystal through an optical path changing slope, and the back surface side (the side having no light emitting means).
Accordingly, it is an object of the present invention to change the optical path in the viewing direction of the liquid crystal display panel and emit the light, and to use the emitted light as illumination light (display light) for the liquid crystal display panel or the like. Therefore, the optical film is generally arranged so that the surface on which the light emitting means is formed is on the outside in the direction along the plane of the liquid crystal cell.

【0016】上記において光学フィルムを形成すること
のある透明フィルムは、光源等を介して入射させる光の
波長域に応じそれに透明性を示す適宜な材料の1種又は
2種以上を用いて形成することができる。ちなみに可視
光域では例えばアクリル系樹脂やポリカーボネート系樹
脂、セルロース系樹脂やノルボルネン系樹脂等で代表さ
れる透明樹脂、熱や紫外線、電子線等の放射線で重合処
理しうる硬化型樹脂などがあげられる。
In the above, the transparent film which may form an optical film is formed by using one or more kinds of appropriate materials exhibiting transparency according to the wavelength range of light incident through a light source or the like. be able to. Incidentally, in the visible light region, for example, acrylic resins, polycarbonate resins, transparent resins represented by cellulose resins, norbornene resins, and the like, and curable resins that can be polymerized by heat, ultraviolet rays, radiation such as electron beams, and the like. .

【0017】光路変換斜面への入射効率を高めて明るく
てその均一性に優れる表示の液晶表示装置を得る点より
透明フィルムの好ましい屈折率は、液晶セル、特にその
セル基板と同等以上、就中1.49以上、特に1.52
以上である。またフロントライト方式とする場合の表面
反射を抑制する点よりは1.6以下、就中1.56以
下、特に1.54以下の屈折率であることが好ましい。
なお斯かる屈折率は、可視光域の場合、D線に基づくこ
とが一般的であるが入射光の波長域に特異性等のある場
合には前記に限定されずその波長域に応じることもでき
る(以下同じ)。
The preferred refractive index of the transparent film is equal to or higher than that of the liquid crystal cell, especially the cell substrate, in order to increase the efficiency of incidence on the light path changing slope to obtain a liquid crystal display device which is bright and has excellent uniformity. 1.49 or more, especially 1.52
That is all. From the viewpoint of suppressing surface reflection in the case of a front light system, the refractive index is preferably 1.6 or less, more preferably 1.56 or less, and particularly preferably 1.54 or less.
Note that such a refractive index is generally based on the D-line in the visible light range, but is not limited to the above when the wavelength range of the incident light has specificity, and may be in accordance with the wavelength range. Yes (same below).

【0018】輝度ムラや色ムラを抑制して表示ムラの少
ない液晶表示装置を得る点より好ましい透明フィルム
は、複屈折を示さないか複屈折の小さいもの就中、面内
の平均位相差が30nm以下のものである。位相差の小さ
い透明フィルムとすることにより光学フィルム等を介し
た直線偏光が入射した場合にその偏光状態を良好に維持
できて表示品位の低下防止に有利である。
From the viewpoint of obtaining a liquid crystal display device with less display unevenness by suppressing unevenness in brightness and color, a transparent film which does not exhibit birefringence or has small birefringence, particularly, an in-plane average retardation of 30 nm. These are: When a transparent film having a small phase difference is used, when linearly polarized light enters through an optical film or the like, the polarization state can be favorably maintained, which is advantageous for preventing a deterioration in display quality.

【0019】表示ムラ防止の点より透明フィルムにおけ
る面内の好ましい平均位相差は、20nm以下、就中15
nm以下、特に10nm以下であり、その位相差の場所毎の
バラツキが可及的に小さいものがより好ましい。さらに
透明フィルムに発生する内部応力を抑制してその内部応
力による位相差の発生を防止する点よりは光弾性係数の
小さい材料からなる透明フィルムが好ましい。加えて透
明フィルムの厚さ方向の平均位相差も50nm以下、就中
30nm以下、特に20nm以下であることが表示ムラ防止
等の点より好ましい。
From the viewpoint of preventing display unevenness, the average in-plane retardation of the transparent film is preferably 20 nm or less, more preferably 15 nm or less.
It is more preferably 10 nm or less, particularly 10 nm or less, and the variation of the phase difference at each location is as small as possible. Further, a transparent film made of a material having a small photoelastic coefficient is preferable from the viewpoint of suppressing the internal stress generated in the transparent film and preventing the occurrence of a phase difference due to the internal stress. In addition, the average retardation in the thickness direction of the transparent film is preferably 50 nm or less, more preferably 30 nm or less, and particularly preferably 20 nm or less from the viewpoint of preventing display unevenness and the like.

【0020】斯かる低位相差の透明フィルムの形成は、
例えば既成のフィルムを焼鈍処理する方式等にて内部の
光学歪みを除去する方式などの適宜な方式にて行いう
る。好ましい形成方式は、キャスティング方式にて位相
差の小さい透明フィルムを形成する方式である。透明フ
ィルムにおける前記の位相差は、可視域の光、特に波長
550nmの光に基づくものであることが好ましい。なお
上記した面内の平均位相差は、(nx−ny)×dにて定
義され、厚さ方向の平均位相差は、{(nx+ny)/2
−nz}×dにて定義される。ただしnxは、フィルム面
内において最大の屈折率を示す方向の平均屈折率、ny
は、フィルム面内においてnx方向に直交する方向の平
均屈折率、nzは、フィルムの厚さ方向の平均屈折率、
dはフィルムの平均厚さを意味する。
The formation of such a low retardation transparent film is as follows:
For example, it can be performed by an appropriate method such as a method of removing internal optical distortion by a method of annealing an existing film or the like. A preferred forming method is a method of forming a transparent film having a small retardation by a casting method. The above-mentioned retardation in the transparent film is preferably based on light in the visible region, particularly light having a wavelength of 550 nm. The above-mentioned average retardation in the plane is defined by (nx−ny) × d, and the average retardation in the thickness direction is {(nx + ny) / 2.
−nz} d. Where nx is the average refractive index in the direction showing the maximum refractive index in the film plane, ny
Is the average refractive index in the direction orthogonal to the nx direction in the film plane, nz is the average refractive index in the thickness direction of the film,
d means the average thickness of the film.

【0021】透明フィルムは通例、単層物として形成さ
れるが、同種又は異種の材料からなる積層体などとして
形成されていてもよい。透明フィルムの厚さは、適宜に
決定できて特に限定はないが、薄型軽量化等の点よりは
5〜500μm、就中10〜300μm、特に20〜10
0μmが好ましい。斯かる厚さとすることで打ち抜き処
理等によるサイズ加工も容易に行うことができる。
The transparent film is usually formed as a single layer, but may be formed as a laminate made of the same or different materials. The thickness of the transparent film can be appropriately determined and is not particularly limited, but is preferably 5 to 500 μm, more preferably 10 to 300 μm, particularly 20 to 10 from the viewpoint of thinning and weight reduction.
0 μm is preferred. With such a thickness, sizing by punching or the like can be easily performed.

【0022】光学フィルムに設ける光出射手段は、図1
ホの例の如くフィルム面に対する傾斜角θ1が35〜4
8度の光路変換斜面aを具備する凹部Aの複数にて形成
される。ちなみに図例では光路変換斜面aと当該傾斜角
θ2が大きい立面bを具備する断面略三角形の凹部から
なる。なお凹部は、光学フィルム内に凹んでいること
(溝)を意味する。
The light emitting means provided on the optical film is shown in FIG.
As in the example of E, the inclination angle θ1 with respect to the film surface is 35 to 4
It is formed by a plurality of concave portions A having an optical path changing slope a of 8 degrees. By the way, in the illustrated example, it is formed of a concave portion having a substantially triangular cross section and having an optical path conversion slope a and an elevation b having a large slope angle θ2. The concave means that the optical film is concave (groove).

【0023】前記により液晶セルの側面等に配置した光
源による側面方向からの入射光ないしその伝送光を光路
変換斜面aを介し光学フィルムの光出射手段を有しない
裏面側に光路変換して、液晶セル等に対し法線方向の指
向性に優れる光を光源光の利用効率よく透明フィルム付
設側から出射させることができる。光路変換斜面の当該
傾斜角が35度未満では液晶表示パネルより出射する表
示光の角度が30度を越えることとなり視認に不利とな
る。一方、光路変換斜面の当該傾斜角が48度を超える
と全反射されずに斜面から光洩れが生じやすくなり光利
用効率が低下する。
As described above, the incident light or the transmitted light from the side direction of the light source disposed on the side surface of the liquid crystal cell or the like is transmitted through the optical path changing slope a to the rear surface side of the optical film having no light emitting means, and the liquid crystal is converted. Light having excellent directivity in the normal direction to the cell or the like can be emitted from the side where the transparent film is provided with good use of light from the light source. If the inclination angle of the optical path conversion slope is less than 35 degrees, the angle of display light emitted from the liquid crystal display panel exceeds 30 degrees, which is disadvantageous for visual recognition. On the other hand, if the angle of inclination of the optical path changing slope exceeds 48 degrees, light is likely to leak from the slope without being totally reflected and the light use efficiency is reduced.

【0024】前記において光路変換斜面による反射方式
に代えて、表面を粗面化した光出射手段による散乱反射
方式とした場合には垂直な方向に反射しにくく液晶表示
パネルから正面方向より大きく傾いた方向に出射されて
液晶表示が暗く、コントラストに乏しくなる。光路変換
斜面を介し効率よく全反射させて透明フィルム付設側の
裏面よりフィルム面の法線方向に指向性よく出射させ、
液晶セルを効率よく照明して明るくて見やすい液晶表示
を達成する点より光路変換斜面の好ましい当該傾斜角θ
1は38〜45度、就中40〜43度である。
In the above case, when the reflection method using the light path changing slope is used instead of the reflection method using the light emitting means having a roughened surface, the light is hardly reflected in the vertical direction and is inclined more greatly than the front direction from the liquid crystal display panel. The light is emitted in the direction, and the liquid crystal display becomes dark and the contrast becomes poor. Efficient total reflection through the light path conversion slope and emits light with good directivity in the normal direction of the film surface from the back surface on the side where the transparent film is attached,
The preferable inclination angle θ of the optical path conversion slope from the viewpoint of efficiently illuminating the liquid crystal cell and achieving a bright and easy-to-view liquid crystal display.
1 is 38-45 degrees, especially 40-43 degrees.

【0025】光出射手段は、一辺から他辺にわたり連続
したストライプ状の凹部としても形成しうるが、好まし
くは図2の例の如く不連続に断続する凹部の複数からな
るものとして形成したものである。凹部は、その光路変
換斜面に基づいて図例の如く平行に分布していてもよい
し、不規則に分布していてもよい。さらに仮想中心に対
してピット状(同心円状)に配置された分布状態にあっ
てもよい。また凹部は、その光路変換斜面に対する横断
面に基づいて例えば略三角形〜略五角形等の適宜な形態
を有するものであってよい。一般にはサイズの小型化に
よる視覚性の低減や製造効率などの点より図例の如く断
面略三角形の凹部とされる。なお前記略三角形等の
「略」は、辺の角度変化や辺の交点からなる角の円化等
の変形を許容することを意味する。
The light emitting means may be formed as a stripe-shaped recess continuous from one side to the other side, but is preferably formed as a plurality of discontinuously interrupted recesses as shown in the example of FIG. is there. The concave portions may be distributed in parallel based on the optical path changing slope as shown in the figure, or may be irregularly distributed. Furthermore, the distribution state may be a pit-like (concentric) arrangement with respect to the virtual center. Further, the concave portion may have an appropriate form such as a substantially triangular shape to a substantially pentagonal shape based on a cross section with respect to the optical path conversion slope. In general, the recess is formed to have a substantially triangular cross section as shown in the figure from the viewpoint of reduction in visibility due to size reduction and production efficiency. Note that "substantially" such as the above-mentioned triangular shape means that a change such as a change in the angle of a side or a circularization of an angle formed by the intersection of the sides is permitted.

【0026】複数の凹部の配置状態は、その形態などに
応じて適宜に決定することができる。上記したように光
路変換斜面aは、照明モードにおいて光源による側面方
向からの入射光を光学フィルムの裏面方向に反射して光
路変換するものであることより、斯かる光路変換斜面を
具備する凹部を全光線透過率が75〜92%でヘイズが
4〜20%となるように透明フィルムの片面に分布させ
ることが、光源を介した側面方向からの光を光路変換し
て液晶セルを効率よく照明する面光源を得て明るくてコ
ントラストに優れる液晶表示を達成する点より好まし
い。斯かる全光線透過率とヘイズの特性は、凹部のサイ
ズや分布密度等の制御にて達成でき、例えば光学フィル
ムにおける光出射手段の形成面に占める光出射手段の投
影面積に基づく占有面積を1/100〜1/8、就中1
/50〜1/10、特に1/30〜1/15とすること
により達成することができる。
The arrangement state of the plurality of concave portions can be appropriately determined according to the form or the like. As described above, the light path conversion slope a is configured to reflect the incident light from the side direction by the light source in the illumination mode toward the back side of the optical film to change the light path, so that the concave portion having the light path conversion slope is provided. By distributing the light on one side of the transparent film so that the total light transmittance is 75 to 92% and the haze is 4 to 20%, it is possible to efficiently illuminate the liquid crystal cell by changing the light path from the side direction through the light source. This is more preferable in that a bright surface light source is obtained to achieve a bright and excellent contrast liquid crystal display. Such characteristics of the total light transmittance and the haze can be achieved by controlling the size and distribution density of the concave portion. For example, the occupied area based on the projected area of the light emitting means on the surface of the optical film on which the light emitting means is formed is reduced by one. / 100-1 / 8, especially 1
/ 50 to 1/10, especially 1/30 to 1/15.

【0027】より具体的には光路変換斜面のサイズが大
きいと観察者にその斜面の存在が認識されやすくなって
表示品位を大きく低下させやすくなり、液晶セルに対す
る照明の均一性も低下しやすくなることなども考慮し
て、光路変換斜面の長さを凹部の深さの5倍以上、就中
8以上、特に10以上の凹部とすることが好ましい。ま
た光路変換斜面の長さは500μm以下、就中200μm
以下、特に10〜150μm、凹部の深さ及び幅は2μm
〜100μm、就中5〜80μm、特に10〜50μmと
することが好ましい。なお前記の長さは、光路変換斜面
の長辺方向の長さ、すなわち凹部の溝の連続方向に基づ
き、深さは透明フィルムの光出射手段形成面を基準とす
る。また幅は、光路変換斜面の長辺方向と深さ方向とに
直交する方向の長さに基づく。
More specifically, if the size of the optical path conversion slope is large, the existence of the slope is easily recognized by the observer, and the display quality is greatly reduced, and the uniformity of illumination with respect to the liquid crystal cell is also likely to be reduced. In consideration of the above, it is preferable that the length of the optical path conversion slope is 5 times or more, more preferably 8 or more, especially 10 or more, of the depth of the recess. In addition, the length of the optical path conversion slope is 500 μm or less, particularly 200 μm.
Hereinafter, particularly, 10 to 150 μm, the depth and width of the concave portion are 2 μm.
It is preferably from 100 to 100 μm, more preferably from 5 to 80 μm, particularly preferably from 10 to 50 μm. The length is based on the length in the long side direction of the optical path conversion slope, that is, the continuous direction of the grooves of the concave portions, and the depth is based on the light emitting means forming surface of the transparent film. The width is based on the length in a direction orthogonal to the long side direction and the depth direction of the optical path conversion slope.

【0028】なお凹部を形成する面であって所定傾斜角
の光路変換斜面aを満足しない面、例えば図1ホにおけ
る光路変換斜面aに対向する立面b等は、セル側面方向
からの入射光を裏面より出射することに寄与するもので
はなく、表示品位や光伝送ないし光出射に可及的に影響
しないことが好ましい。ちなみにフィルム面に対する立
面の傾斜角θ2が小さいとフィルム面に対する投影面積
が大きくなり、光学フィルムを視認側に配置するフロン
トライト方式による外光モードではその立面による表面
反射光が観察方向に戻って表示品位を阻害しやすくな
る。
The surface on which the concave portion is formed and which does not satisfy the light path changing slope a having a predetermined inclination angle, for example, the upright surface b facing the light path changing slope a in FIG. Does not contribute to the emission of light from the back surface, and preferably does not affect display quality, light transmission or light emission as much as possible. By the way, if the inclination angle θ2 of the vertical surface with respect to the film surface is small, the projected area with respect to the film surface becomes large, and in the external light mode by the front light method in which the optical film is arranged on the viewing side, the surface reflected light by the vertical surface returns to the observation direction. Display quality is easily impaired.

【0029】従って立面等の当該傾斜角θ2は大きいほ
ど有利であり、それによりフィルム面に対する投影面積
を小さくできて全光線透過率の低下等を抑制でき、また
光路変換斜面と立面による頂角も小さくできて表面反射
光を低減できその反射光をフィルム面方向に傾けること
ができて液晶表示への影響を抑制することができる。斯
かる点より立面等の好ましい傾斜角θ2は60度以上、
就中70度以上、特に75〜90度である。
Therefore, it is more advantageous that the inclination angle θ2 of the upright surface or the like is larger, so that the projection area with respect to the film surface can be reduced and the decrease in the total light transmittance can be suppressed. The angle can be made smaller, the surface reflected light can be reduced, and the reflected light can be tilted in the film surface direction, so that the influence on the liquid crystal display can be suppressed. From such a point, a preferable inclination angle θ2 of the elevation surface or the like is 60 degrees or more,
Especially 70 degrees or more, especially 75 to 90 degrees.

【0030】凹部Aを形成する斜面は、直線面や屈折面
や湾曲面等の適宜な面形態に形成されていてよい。また
凹部の断面形状は、その傾斜角等がシートの全面で一定
な形状であってもよいし、吸収ロスや先の光路変換によ
る伝送光の減衰に対処して光学フィルム上での発光の均
一化を図ることを目的に光が入射する側の側面から遠離
るほど凹部を大きくしてもよい。また一定ピッチの凹部
とすることもできるし、光が入射する側の側面から遠離
るほど徐々にピッチを狭くして凹部の分布密度を多くし
たものとすることもできる。さらにランダムピッチにて
光学フィルム上での発光の均一化を図ることもでき、ラ
ンダムピッチは画素との干渉によるモアレの防止の点よ
りも有利である。よって光出射手段は、ピッチに加えて
形状等も異なる凹部の組合せからなっていてもよい。
The inclined surface forming the concave portion A may be formed in an appropriate surface form such as a linear surface, a refraction surface, and a curved surface. Further, the cross-sectional shape of the concave portion may be such that the inclination angle or the like is constant over the entire surface of the sheet, or the uniformity of light emission on the optical film may be taken into account by absorbing loss or attenuation of transmitted light due to optical path conversion. The concave portion may be made larger as the distance from the side surface on which light is incident is increased for the purpose of realizing the structure. Further, the concave portions may have a constant pitch, or the pitch may be gradually narrowed as the distance from the side surface on which light is incident increases, so that the distribution density of the concave portions may be increased. Furthermore, the light emission on the optical film can be made uniform at a random pitch, and the random pitch is more advantageous than the prevention of moiré due to interference with pixels. Therefore, the light emitting means may be composed of a combination of concave portions having different shapes and the like in addition to the pitch.

【0031】凹部における光路変換斜面は、液晶セルの
側面方向より入射させる光の方向に対面していることが
出射効率の向上の点より好ましい。従って線状光源を用
いる場合の光路変換斜面は、一定の方向を向いているこ
とが好ましい。また発光ダイオード等の点状光源を用い
る場合の光路変換斜面は、その点状光源の発光中心の方
向を向いていることが好ましい。
It is preferable that the light path changing slope in the concave portion faces the direction of light to be incident from the side of the liquid crystal cell, from the viewpoint of improving the emission efficiency. Therefore, when the linear light source is used, the optical path conversion slope is preferably oriented in a certain direction. In addition, when a point light source such as a light emitting diode is used, it is preferable that the optical path conversion slope faces the direction of the light emission center of the point light source.

【0032】凹部の断続端の形状等については特に限定
はないが、その部分への入射光の低減化等による影響の
抑制の点より鋭角に掘り込まれたものであることが好ま
しく、従って上記の立面に準じて60〜90度の角度に
あることが好ましい。また光学フィルムは、光出射手段
を形成する凹部部分を除きその表裏面が可及的に平滑な
平坦面であること、就中±2度以下の角度変化、特に0
度の平坦面であることが好ましい。またその角度変化が
長さ5mmあたり1度以内であることが好ましい。斯かる
平坦面とすることによりフィルム面の大部分を角度変化
が2度以下の平滑面とすることでき、液晶セルの内部を
伝送する光を効率よく利用できて画像を乱さない均一な
光出射を達成することができる。
The shape of the intermittent end of the concave portion is not particularly limited. However, it is preferable that the concave portion is dug at an acute angle from the viewpoint of suppressing the effect of reducing the incident light on the portion. Is preferably at an angle of 60 to 90 degrees in accordance with the vertical plane. Also, the optical film has flat and smooth surfaces on its front and back surfaces except for the concave portion forming the light emitting means, and particularly, an angle change of ± 2 degrees or less, particularly 0 °.
It is preferably a flat surface. It is preferable that the angle change is within 1 degree per 5 mm in length. By making such a flat surface, most of the film surface can be made a smooth surface with an angle change of 2 degrees or less, and the light transmitted inside the liquid crystal cell can be used efficiently and uniform light emission without disturbing the image. Can be achieved.

【0033】上記したように凹部Aのピット状配置は、
点状光源を液晶表示パネルの側面等に配置し、その点状
光源による側面方向からの放射状の入射光ないしその伝
送光を光路変換斜面aを介し光路変換して光学フィルム
を可及的に均一に発光させ、液晶セル等に対し法線方向
の指向性に優れる光を光源光の利用効率よく光学フィル
ムから出射させることを目的とする。従ってそのピット
状配置は、点状光源の配置が容易となるように光学フィ
ルムの端面又はその外側に仮想中心が形成されるように
行うことが好ましい。仮想中心は、同じ又は異なる光学
フィルム端面に対して一箇所又は二箇所以上形成するこ
とができる。
As described above, the pit-shaped arrangement of the concave portions A is as follows.
A point light source is arranged on the side of a liquid crystal display panel or the like, and the incident light or the transmission light from the side direction by the point light source is converted into an optical path through an optical path changing slope a to make the optical film as uniform as possible. It is an object of the present invention to cause light having excellent directivity in a normal direction to a liquid crystal cell or the like to be emitted from an optical film with efficient use of light from a light source. Therefore, the pit-like arrangement is preferably performed so that a virtual center is formed on the end face of the optical film or outside thereof so that the point light source can be easily arranged. The virtual center can be formed at one position or at two or more positions with respect to the same or different optical film end faces.

【0034】上記の如く本発明の製造方法によれば透明
フィルムとは別体の光出射手段を形成する放射線硬化型
樹脂の成形硬化層からなる光学フィルムが得られる。そ
の場合、光学フィルムは、放射性による硬化処理を利用
するなどして透明フィルムと当該成形硬化層とが固着一
体化したものとして得ることもできるし、透明フィルム
とは分離された状態の当該成形硬化層からなるものとし
て得ることもできる。透明フィルムと当該成形硬化層の
分離は、例えば透明フィルムを剥離剤で表面処理する方
式などの適宜な方式にて達成することができる。
As described above, according to the production method of the present invention, an optical film comprising a molded cured layer of a radiation-curable resin forming a light emitting means separate from the transparent film can be obtained. In this case, the optical film can be obtained as a transparent film and the molded cured layer fixedly integrated by utilizing a radiation-induced curing treatment, or the molded cured layer separated from the transparent film can be obtained. It can also be obtained as a layer. Separation of the transparent film and the cured molding layer can be achieved by an appropriate method such as a method of treating the transparent film with a release agent.

【0035】前記の成形硬化層を形成する放射線硬化型
樹脂には、例えばアクリル系やウレタン系などの放射線
の照射、就中、紫外線又は/及び電子線の照射にて硬化
処理できる適宜な樹脂の1種又は2種以上を用いること
ができ、その種類について特に限定はない。就中、光透
過率に優れる成形硬化層を形成できる放射線硬化型樹脂
が好ましい。また当該固着一体化の場合、成形硬化層と
透明フィルムの屈折率差が大きいと界面反射等にて光の
出射効率が大きく低下する場合があり、それを防止する
点より透明フィルムとの屈折率差が可及的に小さい、就
中0.10以内、特に0.05以内の成形硬化層を形成
できる放射線硬化型樹脂が好ましい。またその場合、透
明フィルムよりも付加する成形硬化層の屈折率を高くす
ることが出射効率の点より好ましい。なお透明フィルム
上に形成する放射線硬化型樹脂の塗布層の厚さは、電鋳
金型における凸部の高さの1〜5倍、就中1.1〜3
倍、特に1.2〜2倍が好ましいが、これに限定されな
い。
The radiation-curable resin forming the molded cured layer may be, for example, an appropriate resin which can be cured by irradiation with radiation such as acrylic or urethane, especially ultraviolet or / and electron beam. One or more kinds can be used, and the kind is not particularly limited. Above all, a radiation-curable resin capable of forming a molded cured layer having excellent light transmittance is preferable. Further, in the case of the fixing and integration, if the refractive index difference between the molded cured layer and the transparent film is large, the light emission efficiency may be greatly reduced due to interface reflection or the like. A radiation-curable resin capable of forming a molded cured layer having a difference as small as possible, particularly within 0.10, particularly within 0.05, is preferred. Further, in that case, it is preferable to increase the refractive index of the formed cured layer to be added, as compared with the transparent film, from the viewpoint of emission efficiency. In addition, the thickness of the coating layer of the radiation-curable resin formed on the transparent film is 1 to 5 times the height of the convex portion in the electroforming mold, preferably 1.1 to 3 times.
The factor is preferably 1.2 times to 2 times, but is not limited thereto.

【0036】本発明による光学フィルムは、その光出射
手段(光路変換斜面)を介して光源による側面方向から
の入射光ないしその伝送光を視認に有利な垂直性に優れ
る方向(法線方向)に光路変換して光の利用効率よく出
射し、また外光に対しても良好な透過性を示すものとす
ることができて、例えば明るくて見やすい薄型軽量の反
射型や透過型の外光・照明両用式の液晶表示装置などの
種々の装置を形成することができる。
The optical film according to the present invention is capable of observing incident light from the side of the light source or transmitted light from the side direction of the light source through the light emitting means (optical path changing slope) in a direction (normal direction) excellent in verticality advantageous for visual recognition. The light path can be converted to emit light with high utilization efficiency, and it can exhibit good transparency to external light. For example, bright and easy-to-view thin and lightweight reflective or transmissive external light / illumination Various devices such as a dual-purpose liquid crystal display device can be formed.

【0037】液晶表示装置の形成は、例えば光学フィル
ムをその光出射手段を有する側が外側となるように液晶
セルの少なくとも片側に配置する方式などにより行うこ
とができる。その場合、照明機構は、液晶セルの1又は
2以上の側面、特に光学フィルムを配置した側のセル基
板の1又は2以上の側面に1個又は2個以上の光源を配
置することにより形成することができる。また光学フィ
ルムは、接着層を介し液晶セル等に接着することが明る
い表示を達成する点より好ましい。
The liquid crystal display device can be formed, for example, by a method in which an optical film is arranged on at least one side of a liquid crystal cell such that the side having the light emitting means is on the outside. In that case, the illumination mechanism is formed by arranging one or more light sources on one or more side surfaces of the liquid crystal cell, particularly on one or more side surfaces of the cell substrate on which the optical film is arranged. be able to. The optical film is preferably bonded to a liquid crystal cell or the like via an adhesive layer from the viewpoint of achieving a bright display.

【0038】前記の照明機構の形成に際しピット状配置
の光出射手段を有する光学フィルムの場合には、点状光
源による放射状入射光を効率よく利用して明るい表示を
達成する点よりピット状配置の光出射手段の仮想中心を
含む垂直線上における液晶セルの側面に点状光源を配置
することが好ましい。仮想中心に対応した点状光源の斯
かる配置に際しては、光出射手段の仮想中心が光学フィ
ルムの端面にあるかその外側にあるかに応じてセル基板
の点状光源を配置する側を突出させる方式などの適宜な
対応策を採ることができる。
In the case of an optical film having light emitting means arranged in pits when forming the above-mentioned illumination mechanism, the pits are arranged so that bright display is achieved by efficiently utilizing radial incident light from a point light source. It is preferable to arrange a point light source on the side of the liquid crystal cell on a vertical line including the virtual center of the light emitting means. In such an arrangement of the point light source corresponding to the virtual center, the side on which the point light source is arranged of the cell substrate is protruded depending on whether the virtual center of the light emitting means is at the end face of the optical film or outside thereof. Appropriate countermeasures such as the method can be adopted.

【0039】液晶セルの側面に配置する光源としては適
宜なものを用いることができ、例えば前記した発光ダイ
オード等の点状光源のほか、(冷,熱)陰極管等の線状
光源、点状光源を線状や面状等に配列したアレイ体、あ
るいは点状光源と線状導光板を組合せて点状光源からの
入射光を線状導光板を介し線状光源に変換するようにし
たものなどが好ましく用いうる。
As the light source disposed on the side surface of the liquid crystal cell, any suitable light source can be used. For example, in addition to the above-mentioned point light sources such as light emitting diodes, linear light sources such as (cold and hot) cathode tubes, and point light sources An array in which light sources are arranged linearly or in a plane, or a combination of a point light source and a linear light guide plate to convert incident light from the point light source into a linear light source through the linear light guide plate And the like can be preferably used.

【0040】また光源は、光学フィルムの光路変換斜面
が対面することとなるセル側面に配置することが出射効
率の点より好ましい。上記したピット状配置の場合も含
めて光路変換斜面が光源に対して可及的に垂直に対面す
るように配置することにより光源を介した側面からの入
射光を効率よく面光源に変換して高効率に発光させるこ
とができる。なおピット状配置の場合には光学フィルム
における光出射手段の仮想中心に対応した1個所又は2
個所以上に点状光源を配置することもできる。
The light source is preferably arranged on the side of the cell where the optical path changing slope of the optical film faces, from the viewpoint of emission efficiency. By arranging the optical path conversion slope so as to face the light source as perpendicularly as possible, including the case of the above-mentioned pit-shaped arrangement, efficiently convert the incident light from the side surface through the light source into a surface light source. Light can be emitted with high efficiency. In the case of the pit-shaped arrangement, one or two positions corresponding to the virtual center of the light emitting means in the optical film.
A point light source can be arranged at more than one location.

【0041】光源は、その点灯による照明モードでの視
認を可能とするものであり、外光・照明両用式の液晶表
示装置の場合に外光による外光モードにて視認するとき
には点灯の必要がないので、その点灯・消灯を切り替え
うるものとされる。その切り替え方式には任意な方式を
採ることができ、従来方式のいずれも採ることができ
る。なお光源は、発光色を切り替えうる異色発光式のも
のであってもよく、また異種の光源を介して異色発光さ
せうるものとすることもできる。
The light source enables visual recognition in an illumination mode by turning on the light source. In the case of a liquid crystal display device for both external light and illumination, it is necessary to turn on the light source when viewing in the external light mode using external light. Since there is no such switch, it can be switched between ON and OFF. An arbitrary method can be adopted as the switching method, and any of the conventional methods can be adopted. Note that the light source may be of a different color emission type capable of switching emission colors, or may be of a type capable of emitting different colors through different types of light sources.

【0042】なお光源に対しては必要に応じ発散光を液
晶セルの側面に導くためにそれを包囲するリフレクタな
どの適宜な補助手段を配置した組合せ体とすることもで
きる。リフレクタとしては高反射率の金属薄膜を付設し
た樹脂シートや白色シートや金属箔などの適宜な反射シ
ートを用いうる。リフレクタは、その端部をセル基板等
の端部に接着する方式などにて光源の包囲を兼ねる固定
手段として利用することもできる。
It is to be noted that the light source may be a combination in which appropriate auxiliary means such as a reflector surrounding the liquid crystal cell are arranged in order to guide the divergent light to the side surface of the liquid crystal cell, if necessary. As the reflector, an appropriate reflection sheet such as a resin sheet, a white sheet, or a metal foil provided with a high-reflectance metal thin film can be used. The reflector can also be used as a fixing means that also serves as a surrounding of the light source by, for example, bonding the end to an end of a cell substrate or the like.

【0043】液晶表示装置は一般に、液晶シャッタとし
て機能する液晶セルとそれに付随の駆動装置、フロント
ライト又はバックライト及び必要に応じての反射層や補
償用位相差板等の構成部品を適宜に組立てることなどに
より形成される。本発明においては上記した光学フィル
ムと光源を用いて照明機構を形成する点を除いて特に限
定はなく、従来のフロントライト型やバックライト型の
ものに準じて形成することができる。従って用いる液晶
セルについては特に限定はなく、セル基板間に封止材を
介し液晶を封入し、その液晶等による光制御を介して表
示光を得るようにした適宜な反射型や透過型のものを用
いることができる。
In general, a liquid crystal display device appropriately assembles components such as a liquid crystal cell functioning as a liquid crystal shutter, a driving device associated therewith, a front light or a backlight, and a reflection layer and a compensating retardation plate as necessary. It is formed by things. In the present invention, there is no particular limitation except that an illumination mechanism is formed by using the above-described optical film and light source, and it can be formed according to a conventional front light type or backlight type. Therefore, the liquid crystal cell to be used is not particularly limited, and an appropriate reflection type or transmission type in which liquid crystal is sealed between cell substrates via a sealing material and display light is obtained through light control by the liquid crystal or the like. Can be used.

【0044】ちなみに前記した液晶セルの具体例として
は、TN型液晶セルやSTN型液晶セル、IPS型液晶
セルやHAN型液晶セル、OCB型液晶セルやVA型液
晶セルの如きツイスト系や非ツイスト系、ゲストホスト
系や強誘電性液晶系の液晶セル、あるいは内部拡散式等
の光拡散型の液晶セルなどがあげられる。また液晶の駆
動方式も例えばアクティブマトリクス方式やパッシブマ
トリクス方式などの適宜なものであってよい。
Incidentally, specific examples of the above-mentioned liquid crystal cell include twisted and non-twisted types such as TN type liquid crystal cell, STN type liquid crystal cell, IPS type liquid crystal cell, HAN type liquid crystal cell, OCB type liquid crystal cell and VA type liquid crystal cell. System, a guest host system or a ferroelectric liquid crystal system, or a light diffusion type liquid crystal cell such as an internal diffusion system. The liquid crystal driving method may be an appropriate one such as an active matrix method or a passive matrix method.

【0045】フロントライト式で反射型の液晶表示装置
では反射層の配置が必須であるが、その配置位置につい
ては液晶セルの内側に電極を兼ねるものとして設けるこ
ともできるし、液晶セルの外側に設けることもできる。
反射層についは例えばアルミニウムや銀、金や銅やクロ
ム等の高反射率金属の粉末をバインダ樹脂中に含有する
塗工層や蒸着方式等による金属薄膜の付設層、その塗工
層や付設層を基材で支持した反射シート、金属箔や透明
導電膜、誘電体多層膜などの従来に準じた適宜な反射層
として形成することができる。透過型の液晶表示装置で
外光・照明両用式のものとする場合に光学フィルムの外
側に配置する反射層についても前記に準じて適宜なもの
とすることができる。
In a front-light type reflection type liquid crystal display device, the arrangement of a reflective layer is indispensable. The position of the reflective layer may be provided inside the liquid crystal cell so as to also serve as an electrode, or may be provided outside the liquid crystal cell. It can also be provided.
For the reflective layer, for example, a coating layer containing a powder of a high-reflectance metal such as aluminum, silver, gold, copper, or chromium in a binder resin, an attached layer of a metal thin film formed by a vapor deposition method, or the like; Sheet, a metal foil, a transparent conductive film, a dielectric multilayer film or the like, which is supported by a base material, and can be formed as an appropriate reflective layer according to the related art. When a transmissive liquid crystal display device is used for both external light and illumination, a reflective layer disposed outside the optical film can be appropriately formed according to the above.

【0046】一方、透過型の液晶表示装置は、液晶セル
の視認背面側に光学フィルムをバックライトを構成する
ものとして配置することにより形成しうる。その場合、
光出射手段の背面側(外側)に反射層を設けることによ
り光路変換斜面等から洩れる光を反射させて液晶セルの
方向に戻すことでセル照明に利用でき輝度の向上を図る
ことができる。このときその反射層を拡散反射面とする
ことで反射光を拡散させて正面方向に向けることがで
き、視認により有効な方向に向けることができる。また
前記の反射層を設けることで透過型で、かつ外光・照明
両用式の液晶表示装置として利用することもできる。
On the other hand, a transmission type liquid crystal display device can be formed by arranging an optical film as a component of a backlight on the viewing back side of a liquid crystal cell. In that case,
By providing a reflective layer on the back side (outside) of the light emitting means, light leaking from an optical path changing slope or the like is reflected and returned to the direction of the liquid crystal cell, so that it can be used for cell illumination and luminance can be improved. At this time, by using the reflection layer as a diffuse reflection surface, the reflected light can be diffused and directed in the front direction, and can be directed in a more effective direction by visual recognition. Further, by providing the above-mentioned reflective layer, it can be used as a transmissive liquid crystal display device of both external light and illumination type.

【0047】[0047]

【実施例】実施例1 厚さ25μmのポリイミドフィルムに所定のマスクを介
し波長248nmのエキシマレーザー光を照射してアブレ
ーション加工によりドライエッチングを施し、横断面が
三角形の凹部からなる溝の複数を所定の分布状態で有す
る絶縁性フィルムを形成した(図1イ)。その溝は、長
さ約100μm、幅約10μm、深さ約8μmで、フィル
ム面に対する傾斜角が約42度の斜面と、それに対面す
る傾斜角が約70度の立面を有するものからなる。次い
で前記絶縁性フィルムの溝付き面に電鋳法によりニッケ
ルを充填して厚さが約500μmの金属層を形成した
後、それより絶縁性フィルムを剥離して所定の凸部形成
面を有する電鋳金型を得た(図1ロ、ハ)。
EXAMPLE 1 A 25 μm-thick polyimide film was irradiated with an excimer laser beam having a wavelength of 248 nm through a predetermined mask and dry-etched by ablation processing to form a plurality of grooves each having a triangular concave section. Was formed (FIG. 1A). The groove has a length of about 100 μm, a width of about 10 μm, and a depth of about 8 μm, and has a slope having an inclination angle of about 42 degrees with respect to the film surface and an upright surface having an inclination angle of about 70 degrees facing the slope. Next, nickel is filled into the grooved surface of the insulating film by an electroforming method to form a metal layer having a thickness of about 500 μm, and then the insulating film is separated therefrom to form a metal layer having a predetermined convex portion forming surface. A casting mold was obtained (FIG. 1, b).

【0048】次に厚さ60μmの透明なPC(ポリカー
ボネート)フィルムの片面にアクリル系紫外線硬化型樹
脂を75μmの厚さで塗布し、その塗布層に対し円柱状
回転体の外周に前記の電鋳金型を捲着してなる金型ロー
ルを回転下に圧着して金型の凸部形成面の形状を連続的
に転写して成形層を形成しつつ気泡を押し出した後、P
Cフィルム側より紫外線を照射して成形層を硬化させ、
そのPCフィルムをそれに固着した成形硬化層と共に金
型ロールから剥離して光出射手段を有する光学フィルム
を得た(図1ニ、ホ)。前記の光出射手段は、フィルム
面に対する傾斜角が約42度の光路変換斜面と、それに
対面する傾斜角が約70度の立面を有する長さ約100
μm、幅約10μm、深さ約8μmの凹部の複数からな
り、これは絶縁性フィルムに設けた凹部と高精度に対応
するものであった。また溝の両端部は、鋭角に掘り込ま
れたものであった。
Next, an acrylic UV curable resin was applied to one side of a transparent PC (polycarbonate) film having a thickness of 60 μm to a thickness of 75 μm, and the electroformed metal was applied to the outer periphery of the columnar rotating body with respect to the applied layer. The mold roll formed by winding the mold is pressed under rotation to continuously transfer the shape of the convex portion forming surface of the mold to form a molding layer and to extrude air bubbles.
The molded layer is cured by irradiating ultraviolet rays from the C film side,
The PC film was peeled off from the mold roll together with the cured molding layer fixed thereto to obtain an optical film having a light emitting means (Figs. 1D and 1E). The light emitting means has an optical path changing slope having an inclination angle of about 42 degrees with respect to the film surface, and an upright surface having an inclination angle of about 70 degrees with respect to the film surface.
It was composed of a plurality of recesses having a thickness of about 10 μm, a width of about 10 μm and a depth of about 8 μm. Both ends of the groove were dug at an acute angle.

【0049】比較例 機械加工によりストライプ状の溝からなる光出射手段を
形成した導光板を用いた。
Comparative Example A light guide plate having light emitting means formed of stripe-shaped grooves formed by machining was used.

【0050】評価試験 実施例による光学フィルム、又は比較例による導光板を
組み込んだ液晶表示装置を形成した。その結果、比較例
ではモアレの発生が確認された。しかし実施例では光出
射手段が微小サイズの凹部を粗密配置したものよりなる
ことよりモアレは発生しなかった。また実施例の光学フ
ィルムは、比較例の導光板に比べて薄型軽量性に遙かに
優れており、また光出射手段を形成する凹部の形状と配
置位置の精度も比較例の導光板に比べて遙かに優れてお
り液晶表示装置における解像力が高かった。
Evaluation Test A liquid crystal display device incorporating the optical film according to the example or the light guide plate according to the comparative example was formed. As a result, occurrence of moire was confirmed in the comparative example. However, in the embodiment, moire did not occur because the light emitting means was formed by arranging minute-sized recesses densely and densely. Further, the optical film of the example is much thinner and lighter than the light guide plate of the comparative example, and the accuracy of the shape and arrangement position of the concave portion forming the light emitting means is also compared with the light guide plate of the comparative example. And the resolution in the liquid crystal display device was high.

【図面の簡単な説明】[Brief description of the drawings]

【図1】製造工程の説明図FIG. 1 is an explanatory view of a manufacturing process.

【図2】光学フィルムの斜視説明図FIG. 2 is an explanatory perspective view of an optical film.

【符号の説明】[Explanation of symbols]

1:光学フィルム 11:透明フィルム 12:成形層 13:成形硬化層 A:凹部 a:光路変換斜面 2:電鋳金型 3:絶縁性フィルム 1: Optical film 11: Transparent film 12: Molded layer 13: Molded hardened layer A: Concave a: Optical path conversion slope 2: Electroforming mold 3: Insulating film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 梅本 清司 大阪府茨木市下穂積1丁目1番2号日東電 工株式会社内 (72)発明者 木下 亮児 大阪府茨木市下穂積1丁目1番2号日東電 工株式会社内 Fターム(参考) 2H091 FA14Z FA23X FA42X FA45X FB04 FC19 FC23 FD06 LA11 4F204 AA44 AD05 AD08 AH73 EA03 EB01 EB12 EK01 EK18  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Seiji Umemoto 1-1-1, Shimohozumi, Ibaraki-shi, Osaka Nitto Denko Corporation (72) Inventor Ryoji Kinoshita 1-2-1, Shimohozumi, Ibaraki-shi, Osaka No. Nitto Denko Corporation F-term (reference) 2H091 FA14Z FA23X FA42X FA45X FB04 FC19 FC23 FD06 LA11 4F204 AA44 AD05 AD08 AH73 EA03 EB01 EB12 EK01 EK18

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 透明フィルムに施与した放射線硬化型樹
脂の塗布層を、フィルム面に対する傾斜角が35〜48
度の光路変換斜面を具備する凹部の複数からなる光出射
手段を形成しうる凸部を有する電鋳金型に密着させ、当
該塗布層に電鋳金型の表面形状を写した成形層を形成し
て前記透明フィルムの側より放射線を照射し、その成形
層を硬化させて金型より分離することを特徴とする光学
フィルムの製造方法。
1. The method according to claim 1, wherein the coating layer of the radiation-curable resin applied to the transparent film has an inclination angle of 35 to 48 with respect to the film surface.
A light emitting means consisting of a plurality of concave portions having an optical path conversion slope with a convex portion capable of forming a convex portion capable of forming the light emitting means, and forming a molding layer on the coating layer which reflects the surface shape of the electroformed mold. A method for producing an optical film, comprising irradiating radiation from the side of the transparent film, curing the molded layer and separating the molded layer from a mold.
【請求項2】 請求項1において、電鋳金型がドライエ
ッチングにて所定の凹部を形成した絶縁性フィルムに電
鋳法を施して形成したものである光学フィルムの製造方
法。
2. The method for manufacturing an optical film according to claim 1, wherein the electroforming mold is formed by performing an electroforming method on an insulating film having predetermined recesses formed by dry etching.
【請求項3】 請求項2において、ドライエッチングを
レーザー光にて行う光学フィルムの製造方法。
3. The method according to claim 2, wherein the dry etching is performed by laser light.
【請求項4】 請求項3において、レーザーが紫外域の
発振波長を有するものである光学フィルムの製造方法。
4. The method for producing an optical film according to claim 3, wherein the laser has an oscillation wavelength in an ultraviolet region.
【請求項5】 請求項1〜4において、電鋳金型を円形
回転体の外周に捲着し、その回転体を介した回転下の電
鋳金型に放射線硬化型樹脂の塗布層を順次圧着して電鋳
金型の表面形状を写した成形層を形成しつつ、その成形
層に放射線を照射する光学フィルムの連続製造方法。
5. An electroformed mold according to claim 1, wherein the electroformed mold is wound around an outer periphery of a circular rotating body, and a coating layer of a radiation-curable resin is sequentially pressure-bonded to the rotating electroformed mold through the rotating body. A method for continuously producing an optical film, in which a molding layer that reflects the surface shape of an electroformed mold is formed while irradiating the molding layer with radiation.
【請求項6】 請求項1〜5において、成形層の硬化を
紫外線又は電子線の少なくとも一方を用いて行う光学フ
ィルムの製造方法。
6. The method for producing an optical film according to claim 1, wherein the molding layer is cured using at least one of ultraviolet rays and electron beams.
【請求項7】 請求項1〜6において、光出射手段を形
成する凹部が光路変換斜面とそれに対面してフィルム面
に対する傾斜角が60〜90度の立面による横断面略三
角形のものからなり、その光路変換斜面の長辺方向の長
さが500μm以下で凹部の深さの5倍以上であり、か
つ凹部の深さが100μm以下で、光路変換斜面の長辺
方向と深さ方向とに直交する方向の幅が100μm以下
である光学フィルムの製造方法。
7. The method according to claim 1, wherein the concave portion forming the light emitting means has a substantially triangular cross-section formed by an optical path changing slope and an upright face having an angle of inclination of 60 to 90 degrees with respect to the film surface. The length of the optical path changing slope in the long side direction is 500 μm or less, 5 times or more the depth of the concave portion, and the depth of the concave portion is 100 μm or less, in the long side direction and the depth direction of the optical path converting slope. A method for manufacturing an optical film having a width in a direction perpendicular to the optical film of 100 μm or less.
【請求項8】 請求項1〜7において、透明フィルムと
成形層の硬化層とが固着一体化してなる、又は透明フィ
ルムと分離された成形層の硬化層からなる光学フィルム
の製造方法。
8. The method for producing an optical film according to claim 1, wherein the transparent film and the cured layer of the molding layer are fixedly integrated, or the cured film of the molding layer is separated from the transparent film.
【請求項9】 請求項1〜8に記載の製造方法による光
学フィルムを液晶セルの少なくとも片側に配置してなる
ことを特徴とする液晶表示装置。
9. A liquid crystal display device comprising an optical film produced by the method according to claim 1 and arranged on at least one side of a liquid crystal cell.
JP2001142904A 2001-05-14 2001-05-14 Manufacturing method of optical path conversion film and liquid crystal display device Expired - Fee Related JP4771348B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003080524A (en) * 2001-09-12 2003-03-19 Nitto Denko Corp Optical film manufacturing method and liquid crystal display device
JP2007038490A (en) * 2005-08-02 2007-02-15 Hitachi Cable Ltd Molded product and method for producing the same
JP2008131062A (en) * 2006-11-16 2008-06-05 Nippon Dempa Kogyo Co Ltd Method for manufacturing piezoelectric vibrating piece, piezoelectric vibrating piece and piezoelectric device
JP2010201641A (en) * 2009-02-27 2010-09-16 Mitsubishi Rayon Co Ltd Transparent film having fine uneven surface structure and method for manufacturing the same

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JP2002144353A (en) * 2000-11-14 2002-05-21 Dainippon Printing Co Ltd Coating method and coating apparatus for resin for forming lens sheet
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JP2002225049A (en) * 2000-11-29 2002-08-14 Dainippon Printing Co Ltd Sheet manufacturing method and manufacturing apparatus
JP2002321243A (en) * 2001-04-25 2002-11-05 Canon Inc Method for manufacturing element having fine shape on surface, and element manufactured by the method

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JP2000238052A (en) * 1999-02-25 2000-09-05 Mitsubishi Rayon Co Ltd Manufacturing method of lens sheet
JP2000210618A (en) * 2000-01-01 2000-08-02 Dainippon Printing Co Ltd Manufacturing method of light diffusion sheet
JP2002205312A (en) * 2000-11-10 2002-07-23 Dainippon Printing Co Ltd Method and apparatus for manufacturing lens sheet
JP2002144353A (en) * 2000-11-14 2002-05-21 Dainippon Printing Co Ltd Coating method and coating apparatus for resin for forming lens sheet
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003080524A (en) * 2001-09-12 2003-03-19 Nitto Denko Corp Optical film manufacturing method and liquid crystal display device
JP2007038490A (en) * 2005-08-02 2007-02-15 Hitachi Cable Ltd Molded product and method for producing the same
US8568547B2 (en) 2005-08-02 2013-10-29 Hitachi Cable, Ltd. Molded product and manufacturing method thereof
JP2008131062A (en) * 2006-11-16 2008-06-05 Nippon Dempa Kogyo Co Ltd Method for manufacturing piezoelectric vibrating piece, piezoelectric vibrating piece and piezoelectric device
JP2010201641A (en) * 2009-02-27 2010-09-16 Mitsubishi Rayon Co Ltd Transparent film having fine uneven surface structure and method for manufacturing the same

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