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JP2002319185A - Silver alloy for optical recording disk reflective film - Google Patents

Silver alloy for optical recording disk reflective film

Info

Publication number
JP2002319185A
JP2002319185A JP2001123997A JP2001123997A JP2002319185A JP 2002319185 A JP2002319185 A JP 2002319185A JP 2001123997 A JP2001123997 A JP 2001123997A JP 2001123997 A JP2001123997 A JP 2001123997A JP 2002319185 A JP2002319185 A JP 2002319185A
Authority
JP
Japan
Prior art keywords
silver alloy
film
reflective film
optical recording
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001123997A
Other languages
Japanese (ja)
Inventor
Juichi Shimizu
寿一 清水
Tsukasa Nakai
司 中居
Nobuaki Onaki
伸晃 小名木
Kazunori Ito
和典 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Ricoh Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd, Ricoh Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2001123997A priority Critical patent/JP2002319185A/en
Publication of JP2002319185A publication Critical patent/JP2002319185A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【課題】 高い熱伝導性を有すると同時に、高いデータ
の信頼性を確保することができ、高記録密度対応の光記
録ディスク用として好適な反射膜用銀合金を提供する。 【解決手段】 反射膜用銀合金は、Agを主成分とし、
Cr、Zr、La、Ce、Eu、Ca、Sr、Ba、R
u、Ni、Wから選ばれた少なくとも1種の第1の添加
元素を0.001〜0.1重量%含んでいる。この反射膜
用銀合金は、上記第1の添加元素に加え、Zn、Mg、
Au、Pdから選ばれた少なくとも1種の第2の添加元
素を0.1〜5重量%含むことができる。
PROBLEM TO BE SOLVED: To provide a silver alloy for a reflection film which has high thermal conductivity and can secure high data reliability and is suitable for an optical recording disk corresponding to a high recording density. . SOLUTION: The silver alloy for the reflection film has Ag as a main component,
Cr, Zr, La, Ce, Eu, Ca, Sr, Ba, R
It contains 0.001 to 0.1% by weight of at least one first additive element selected from u, Ni, and W. This silver alloy for a reflective film contains Zn, Mg,
At least one second additive element selected from Au and Pd can be contained in an amount of 0.1 to 5% by weight.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種光記録ディス
クの反射膜として用いられる銀合金に関する。
The present invention relates to a silver alloy used as a reflection film of various optical recording disks.

【0002】[0002]

【従来の技術】コンピュータ情報や映像情報あるいは音
楽情報を記録する媒体として、CD、CD−R、CD−
RW、DVD、DVD−RW、DVD−RAM、MO
D、MD等の各種光記録ディスク(以下、光ディスクと
云う)が用いられている。
2. Description of the Related Art As a medium for recording computer information, video information or music information, a CD, a CD-R, a CD-R,
RW, DVD, DVD-RW, DVD-RAM, MO
Various types of optical recording disks (hereinafter, referred to as optical disks) such as D and MD are used.

【0003】これらの光ディスクは、方式によってそれ
ぞれ構造は異なるものの、いずれもポリカーボネイトの
ような透明なプラスチック製円盤を基板とし、その上に
反射膜や保護膜等の各種機能を有する薄膜が層状に形成
されている。
[0003] These optical discs have different structures depending on the system, but all have a substrate made of a transparent plastic disk such as polycarbonate, on which thin films having various functions such as a reflective film and a protective film are formed in layers. Have been.

【0004】かかる光ディスクの反射膜は、記録の読み
書きに使用するレーザー光を反射する機能と共に、レー
ザー光に起因する熱を逃す等の機能を有するものであ
り、いずれの方式の光ディスクにも用いられている。こ
の反射膜の材質としては、主にAl、Au、Ag、又は
これらの合金が用いられている。
The reflective film of such an optical disc has a function of reflecting laser light used for reading and writing of recording and a function of releasing heat caused by the laser light, and is used for any type of optical disc. ing. As the material of the reflection film, Al, Au, Ag, or an alloy thereof is mainly used.

【0005】また、これらの反射膜は、Al、Au、A
g、又はこれらの合金からなるターゲットを用い、通常
のスパッタリング法等により形成される。
[0005] These reflective films are made of Al, Au, A
It is formed by a normal sputtering method or the like using a target made of g or an alloy thereof.

【0006】[0006]

【発明が解決しようとする課題】近年、光ディスクの記
録密度が向上するに伴って、熱伝導性の高い反射膜の要
求が高まってきている。しかしながら、Alの反射膜に
ついては、熱伝導性が低い点から要求特性を満足できな
いことが明らかになっている。また、Auの反射膜は高
熱伝導性に関する要求特性を満足できる可能性を有する
が、価格が非常に高いことから、市販の光ディスクに用
いることは困難である。
In recent years, as the recording density of optical discs has increased, the demand for reflective films having high thermal conductivity has increased. However, it has been clarified that the required characteristics of the Al reflective film cannot be satisfied due to the low thermal conductivity. In addition, although the reflective film of Au has a possibility of satisfying the required characteristics relating to high thermal conductivity, it is difficult to use it on a commercially available optical disk because of its extremely high price.

【0007】一方、Agの反射膜については、熱伝導性
は満足するものの、データの書換えや高温高湿環境下で
の保管等による特性の劣化が大きく、データの信頼性を
確保し難いという問題点を有している。このため、デー
タの信頼性を確保しながら、同時に熱伝導性の要求特性
を完全に満足する反射膜は得られていない。
[0007] On the other hand, although the Ag reflective film satisfies the thermal conductivity, the characteristics are greatly deteriorated due to data rewriting and storage in a high-temperature and high-humidity environment, and it is difficult to secure the reliability of the data. Have a point. For this reason, a reflective film that completely satisfies the required characteristics of thermal conductivity while ensuring data reliability has not been obtained.

【0008】本発明は、かかる従来の事情に鑑み、高い
データの信頼性を確保しながら、同時に高い熱伝導性を
有し、高記録密度対応の光ディスク用として好適な反射
膜用銀合金を提供することを目的とする。
In view of the above circumstances, the present invention provides a silver alloy for a reflective film, which has high thermal conductivity at the same time while ensuring high data reliability, and is suitable for an optical disk corresponding to a high recording density. The purpose is to do.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するた
め、本発明が提供する光記録ディスクの反射膜用銀合金
は、Agを主成分とし、Cr、Zr、La、Ce、E
u、Ca、Sr、Ba、Ru、Ni、Wからなる群から
選ばれた少なくとも1種の添加元素を0.001〜0.1
重量%含み、残部が不可避不純物からなることを特徴と
する。
In order to achieve the above-mentioned object, a silver alloy for a reflective film of an optical recording disk provided by the present invention contains Ag as a main component, and contains Cr, Zr, La, Ce, and E.
at least one additive element selected from the group consisting of u, Ca, Sr, Ba, Ru, Ni, and W is 0.001 to 0.1.
% By weight, with the balance being unavoidable impurities.

【0010】また、上記本発明の光記録ディスク反射膜
用銀合金においては、前記添加元素に加え、更にZn、
Mg、Au、Pdからなる群から選ばれた少なくとも1
種の第2の添加元素を0.1〜5重量%含むことができ
る。
Further, in the silver alloy for an optical recording disk reflective film of the present invention, in addition to the above-mentioned additional elements, Zn,
At least one selected from the group consisting of Mg, Au, and Pd
The seed second additive element may comprise 0.1-5% by weight.

【0011】[0011]

【発明の実施の形態】本発明者らは、従来の純Agから
なる光ディスクの反射膜がデータの信頼性において劣る
原因を種々検討した結果、結晶粒の粗大化ないしは膜の
腐食に主な原因があることを確認し、その対策として各
種元素の添加による合金化が有効であることを見出し
た。
DETAILED DESCRIPTION OF THE INVENTION The present inventors have studied various reasons why a conventional reflective film of an optical disk made of pure Ag is inferior in data reliability. As a result, the main cause is that crystal grains are coarsened or the film is corroded. It was confirmed that alloying by adding various elements was effective as a countermeasure.

【0012】即ち、本発明の光ディスクの反射膜用銀合
金においては、主成分であるAgに対し、Cr、Zr、
La、Ce、Eu、Ca、Sr、Ba、Ru、Ni、W
から選ばれた少なくとも1種の添加元素を0.001〜
0.1重量%含んでいる。これらの添加元素は、銀合金
の耐熱性を向上させることによって反射膜中の結晶粒の
粗大化を抑える働きをし、同時に結晶粒の微細化により
高い反射率を安定的に得られるようになる。また、これ
らの添加元素を含むことによりターゲットの結晶粒径も
微細化され、スパッタリングレートが均一化されるとい
った効果も得られる。
That is, in the silver alloy for a reflective film of the optical disk of the present invention, Cr, Zr,
La, Ce, Eu, Ca, Sr, Ba, Ru, Ni, W
At least one additive element selected from
It contains 0.1% by weight. These additional elements serve to suppress the coarsening of the crystal grains in the reflective film by improving the heat resistance of the silver alloy, and at the same time, to stably obtain a high reflectance by making the crystal grains finer. . In addition, by including these additional elements, the crystal grain size of the target is also reduced, and an effect of making the sputtering rate uniform can be obtained.

【0013】これらの元素の添加量を合計で0.001
〜0.1重量%としたのは、0.001重量%未満では濃
度が低すぎて十分な添加効果が得られず、逆に0.1重
量%を超えると合金の耐食性が低下し、書換等によるデ
ィスクの特性劣化が発生するからである。これらの添加
元素は2種以上を組合わせて添加した場合にも所望の特
性を達成することは可能であるが、一般的にはいずれか
1種を単独で添加する方が得られる添加効果は大きくな
る。
The total amount of these elements added is 0.001.
If the content is less than 0.001% by weight, the concentration is too low to obtain a sufficient effect of addition, and if it exceeds 0.1% by weight, the corrosion resistance of the alloy is reduced, and This is because the characteristics of the disk are degraded due to the above factors. Desirable characteristics can be achieved even when two or more of these additional elements are added in combination. However, in general, it is more effective to add one of these elements alone. growing.

【0014】また、本発明の光ディスクの反射膜用銀合
金における第2の形態として、上記の第1の添加元素に
加えて、Zn、Mg、Au、Pdからなる群から選ばれ
た少なくとも1種の第2の添加元素を0.1〜5重量%
含むことができる。これら第2の添加元素は、耐食性を
向上させる効果を有するものであり、特にZnSを含む
保護膜を備える光ディスクの場合に有効である。
In a second embodiment of the silver alloy for a reflective film of the optical disk of the present invention, in addition to the first additive element, at least one selected from the group consisting of Zn, Mg, Au and Pd is provided. 0.1 to 5% by weight of the second additive element
Can be included. These second additive elements have an effect of improving corrosion resistance, and are particularly effective in the case of an optical disc having a protective film containing ZnS.

【0015】これら第2の添加元素の添加量を0.1〜
5重量%としたのは、0.1重量%未満では濃度が低す
ぎて耐食性向上の効果が十分でなく、逆に5重量%を超
えると合金の熱伝導性が低下し、光ディスクの高記録密
度化に対応できなくなるからである。
The amount of the second additive element is 0.1 to 0.1.
If the content is less than 0.1% by weight, the concentration is too low and the effect of improving the corrosion resistance is not sufficient. On the other hand, if it exceeds 5% by weight, the thermal conductivity of the alloy decreases, and the high recording capacity of the optical disc is increased. This is because it becomes impossible to cope with the density increase.

【0016】尚、本発明は反射膜を構成するAg合金の
組成を規定したものであり、反射膜の形成に用いられる
スパッタリングターゲットの組成についても同様に規定
することができる。
In the present invention, the composition of the Ag alloy constituting the reflection film is specified, and the composition of the sputtering target used for forming the reflection film can be similarly specified.

【0017】また、本発明の反射膜は、光ディスク用の
他にも、耐食性が要求され且つ高反射率が必要な反射鏡
の反射膜、照明器具用の反射膜、標識用の反射膜、リフ
レクター用の反射膜等の用途、あるいは放熱性も重要と
なる液晶ディスプレイ(LCD)やプラズマディスプレ
イ(PDP)、エレクトロミネッセンス(EL)ディス
プレイ等の反射膜のような用途、更には電気抵抗率が小
さいことが必要な各種配線材料等の用途にも適用が可能
である。
The reflection film of the present invention is not only for an optical disk, but also for a reflection mirror which is required to have corrosion resistance and high reflectance, a reflection film for a lighting fixture, a reflection film for a sign, and a reflector. Applications such as reflective films for LCDs, or reflective films such as liquid crystal displays (LCD), plasma displays (PDP), and electroluminescence (EL) displays, for which heat dissipation is important. The present invention can also be applied to various wiring materials that need to be small.

【0018】[0018]

【実施例】原料として99.9〜99.999%の純度を
有するAg、Cr、Zr、La、Ce、Eu、Ca、S
r、Ba、Ru、Ni、W、Zn、Mg、Au、Pdの
塊又は粉末を用い、真空溶解炉を用いた溶解鋳造法ない
しはホットプレスを用いた粉末冶金法により、各試料の
ターゲットを作製した。得られた各試料におけるターゲ
ットの組成を下記表1に示す。
EXAMPLES Ag, Cr, Zr, La, Ce, Eu, Ca, S having a purity of 99.9-99.999% as raw materials.
Using lump or powder of r, Ba, Ru, Ni, W, Zn, Mg, Au, and Pd, a target of each sample is prepared by a melting casting method using a vacuum melting furnace or a powder metallurgy method using a hot press. did. Table 1 below shows the composition of the target in each of the obtained samples.

【0019】[0019]

【表1】 [Table 1]

【0020】これらの各ターゲットを用いて、マグネト
ロンスパッタリング法により、厚み3000Åの特性評
価用の薄膜をガラス基板上に形成した。尚、形成した薄
膜の組成が、使用したターゲット組成とほぼ同等である
ことは化学分析により確認した。
Using each of these targets, a thin film for evaluation of characteristics having a thickness of 3000 mm was formed on a glass substrate by magnetron sputtering. It was confirmed by chemical analysis that the composition of the formed thin film was almost the same as the target composition used.

【0021】得られた薄膜を用いて、反射率、熱伝導
率、結晶粒安定性を評価した。即ち、熱伝導率について
は、薄膜の熱伝導率を直接測定することが難しかったた
め、直流4端子法により測定した電気抵抗からWide
mann−Franz則を用いて計算することにより求
め、その結果を下記表2に示した。また、反射率の測定
は分光光度計により、波長400、650、780nm
で行ない、その結果を表3に示した。
The reflectance, thermal conductivity, and crystal grain stability were evaluated using the obtained thin film. That is, regarding the thermal conductivity, it was difficult to directly measure the thermal conductivity of the thin film.
It was determined by calculation using the mann-Franz rule, and the results are shown in Table 2 below. The reflectance was measured using a spectrophotometer at wavelengths of 400, 650, and 780 nm.
, And the results are shown in Table 3.

【0022】[0022]

【表2】 [Table 2]

【0023】[0023]

【表3】 [Table 3]

【0024】また、結晶粒の粗大化の起こり難さを表わ
す指標として、高真空中にて150℃で48時間の熱処
理を施した前後の結晶粒径の変化を調査した。熱処理前
後の結晶粒径として、X線回折ピークの半値幅から求め
た計算値を下記表4に、及び原子間力顕微鏡により測定
した表面粗さ(中心線表面粗さRa)によって評価した
結果を下記表5に示した。尚、表5の場合、表面粗さが
大きいほど、結晶粒径が大きいと考えられる。
Further, as an index indicating the difficulty of crystal grain coarsening, the change in crystal grain size before and after heat treatment at 150 ° C. for 48 hours in a high vacuum was examined. Table 4 below shows the results obtained by evaluating the crystal grain size before and after the heat treatment from the half-width of the X-ray diffraction peak and the results of evaluation by the surface roughness (center line surface roughness Ra) measured by an atomic force microscope. The results are shown in Table 5 below. In the case of Table 5, it is considered that the larger the surface roughness, the larger the crystal grain size.

【0025】[0025]

【表4】 [Table 4]

【0026】[0026]

【表5】 [Table 5]

【0027】以上の結果から、本発明の銀合金を用いる
ことにより、反射率と熱伝導率が高く、しかも熱を受け
ても結晶粒の粗大化が起こり難い、優れた特性の反射膜
を得られることが分かる。
From the above results, by using the silver alloy of the present invention, it is possible to obtain a reflective film having a high reflectivity and a high thermal conductivity, and hardly causing the crystal grains to become coarse even when subjected to heat. It is understood that it can be done.

【0028】次に、本発明の反射膜を光ディスクに用い
た場合のディスク特性を評価した。即ち、基板1として
厚さ1.2mm、直径120mm、溝(トラック)ピッ
チ1.6μm、溝深さ50nmのCD用基板と、基板2
として厚さ0.6mm、直径120mm、溝ピッチ0.8
μm、溝深さ35nmのDVD用基板の、2種類のポリ
カーボネイト製基板を用いた。
Next, disk characteristics when the reflective film of the present invention was used for an optical disk were evaluated. That is, as the substrate 1, a CD substrate having a thickness of 1.2 mm, a diameter of 120 mm, a groove (track) pitch of 1.6 μm, and a groove depth of 50 nm;
Thickness 0.6mm, diameter 120mm, groove pitch 0.8
Two types of polycarbonate substrates, a DVD substrate having a thickness of 35 μm and a groove depth of 35 nm, were used.

【0029】CD用評価ディスクは、上記基板1上にス
パッタリングにより下部保護膜、記録膜、上部保護膜、
拡散防止膜、反射膜を順次形成した後、紫外線硬化樹脂
のオーバーコート層を5μmの厚みに形成することによ
り得た。また、DVD用評価ディスクは、上記基板2上
に同様に、下部保護膜、記録膜、上部保護膜、拡散防止
膜、反射膜、及び厚み4μmのオーバーコート層を順次
形成した後、その上に厚さ0.6mm、直径120mm
のポリカーボネイト基板を紫外線硬化樹脂で貼り合わせ
ることによって作製した。上記の各膜の材料と共に、膜
形成に用いたスパッタリング条件を下記表6に、作製し
た各ディスク試料の構成を下記表7に、及び各膜の厚み
を下記表8に示した。
The evaluation disk for CD is formed by sputtering a lower protective film, a recording film, an upper protective film,
After sequentially forming a diffusion prevention film and a reflection film, an overcoat layer of an ultraviolet curable resin was formed to a thickness of 5 μm. Similarly, on the DVD evaluation disk, a lower protective film, a recording film, an upper protective film, a diffusion prevention film, a reflective film, and an overcoat layer having a thickness of 4 μm are sequentially formed on the substrate 2 and then formed thereon. 0.6mm thick, 120mm diameter
Was produced by laminating a polycarbonate substrate of the above with an ultraviolet curing resin. Table 6 below shows the sputtering conditions used for film formation together with the materials of the above-mentioned respective films, Table 7 below showing the structure of each disk sample produced, and Table 8 below showing the thickness of each film.

【0030】[0030]

【表6】 [Table 6]

【0031】[0031]

【表7】 [Table 7]

【0032】[0032]

【表8】 [Table 8]

【0033】以上の様にして得た各ディスクの評価とし
て、キャリア対ノイズ比(CNR)、ジッター、変調度
を測定した。CD用評価ディスクの場合は、波長780
nmのレーザー光をNA0.55のレンズを通して1μ
mのスポット径に絞り込んで照射することにより測定し
た。線速は2.0、5.0、10.0m/secの3水準
とした。また、DVD用評価ディスクの場合は、波長6
33nmのレーザー光をNA0.6のレンズを通して0.
5μmのスポット径に絞り込んで照射することにより測
定した。線速は7.0、15.0m/secの2水準とし
た。
As evaluation of each disk obtained as described above, a carrier-to-noise ratio (CNR), a jitter and a modulation were measured. In the case of a CD evaluation disc, the wavelength is 780.
laser light of 1 nm through a lens of NA 0.55
The measurement was performed by irradiating with a spot diameter of m. The linear velocities were set at three levels of 2.0, 5.0 and 10.0 m / sec. In the case of a DVD evaluation disc, a wavelength of 6
A laser beam of 33 nm is passed through a lens having an NA of 0.6 to produce a laser beam of 0.3 nm.
The measurement was performed by irradiating with a spot diameter of 5 μm. The linear velocity was set at two levels of 7.0 and 15.0 m / sec.

【0034】いずれの場合も、各線速でレーザーパワー
(Pe:消去用パワー、Pw:書き込み用パワー)をP
e/Pw=0.5に固定し、Pwを8〜16mWと変化
させた場合に、CNRが大きく且つジッターが小さくな
る条件を選択して測定を行った。読み取りのレーザーパ
ワーは0.9mWを用いた。尚、製膜後の記録膜は非晶
質であったが、10mWのDC光によりディスク全面を
結晶化させた状態で試験に供している。
In each case, the laser power (Pe: erase power, Pw: write power) is P
When e / Pw was fixed at 0.5 and Pw was changed to 8 to 16 mW, the measurement was performed under the condition that the CNR was large and the jitter was small. The reading laser power was 0.9 mW. Although the recording film after film formation was amorphous, it was used for the test with the entire surface of the disk crystallized by 10 mW DC light.

【0035】更に、ディスクの信頼性を確認する目的
で、80℃85%RHの高温高湿槽に500時間保管し
た後、ディスク特性の測定を上記と同様に行った。高温
高湿保管の前及び後におけるディスク特性、即ちCN
R、ジッター、変調度の測定結果を下記表9に示した。
Further, for the purpose of confirming the reliability of the disk, the disk was stored in a high-temperature and high-humidity bath at 80 ° C. and 85% RH for 500 hours, and the disk characteristics were measured in the same manner as described above. Disk characteristics before and after storage at high temperature and high humidity, namely CN
Table 9 below shows the measurement results of R, jitter, and modulation factor.

【0036】[0036]

【表9】 [Table 9]

【0037】表9から明らかなように、本発明の銀合金
を用いた反射膜は、良好な初期特性を有するばかりでな
く、高温高湿保管後にもCNR、ジッター、変調度が殆
ど劣化せず、信頼性の高いディスクを得られることが分
かる。一方、比較例である試料33〜37のディスク
は、良好な初期特性が得られないか、若しくは高温高湿
での保管後にCRN、ジッター及び変調度のいずれかが
大きく劣化するため、十分な信頼性を確保できないこと
が分かる。
As is clear from Table 9, the reflection film using the silver alloy of the present invention has not only good initial characteristics but also little deterioration in CNR, jitter and modulation even after storage at high temperature and high humidity. It can be seen that a highly reliable disk can be obtained. On the other hand, the discs of Samples 33 to 37, which are comparative examples, do not have good initial characteristics, or one of CRN, jitter, and modulation is significantly deteriorated after storage at high temperature and high humidity. It turns out that the nature cannot be secured.

【0038】以上の結果から、本発明のAg合金は光デ
ィスクの反射膜として、特に今後求められる次世代の光
ディスク用として好適であることが分かる。尚、上記実
施例ではスパッタリング法により反射膜を製膜したが、
種々の真空蒸着法、イオンプレーティング法、各種CV
D法、及びめっき法などの各種成膜技術によっても作成
することができる。
From the above results, it can be seen that the Ag alloy of the present invention is suitable as a reflective film for an optical disk, particularly for a next-generation optical disk that will be required in the future. In the above embodiment, the reflection film was formed by the sputtering method.
Various vacuum deposition methods, ion plating methods, various CVs
It can also be formed by various film forming techniques such as the D method and the plating method.

【0039】[0039]

【発明の効果】本発明によれば、高い熱伝導性を有する
と同時に、高いデータの信頼性を確保することができ、
高記録密度対応の光記録ディスク用として好適な反射膜
用銀合金を提供することができる。
According to the present invention, high thermal conductivity and high data reliability can be secured at the same time.
It is possible to provide a silver alloy for a reflection film suitable for an optical recording disk compatible with a high recording density.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中居 司 東京都青梅市末広町1丁目6番1号 住友 金属鉱山株式会社電子事業本部内 (72)発明者 小名木 伸晃 神奈川県横浜市都筑区新栄町16番1号 株 式会社リコー中央研究所内 (72)発明者 伊藤 和典 神奈川県横浜市都筑区新栄町16番1号 株 式会社リコー中央研究所内 Fターム(参考) 5D029 MA13 MA14  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tsukasa Nakai 1-6-1, Suehirocho, Ome-shi, Tokyo Sumitomo Metal Mining Co., Ltd. Electronics Business Unit (72) Inventor Nobuaki Onagi Shinagawa-cho, Tsuzuki-ku, Yokohama-shi, Kanagawa No. 16-1 Ricoh Central Research Laboratory Co., Ltd. (72) Inventor Kazunori Ito 16-1 Shineicho, Tsuzuki-ku, Yokohama-shi, Kanagawa Prefecture Ricoh Central Research Laboratory F-term (reference) 5D029 MA13 MA14

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 Agを主成分とし、Cr、Zr、La、
Ce、Eu、Ca、Sr、Ba、Ru、Ni、Wからな
る群から選ばれた少なくとも1種の添加元素を0.00
1〜0.1重量%含み、残部が不可避不純物からなるこ
とを特徴とする光記録ディスク反射膜用銀合金。
1. The method according to claim 1, wherein Ag is a main component, and Cr, Zr, La,
At least one additive element selected from the group consisting of Ce, Eu, Ca, Sr, Ba, Ru, Ni, and W is added to 0.00.
A silver alloy for an optical recording disk reflective film, comprising 1 to 0.1% by weight, with the balance being unavoidable impurities.
【請求項2】 前記添加元素に加え、Zn、Mg、A
u、Pdからなる群から選ばれた少なくとも1種の第2
の添加元素を0.1〜5重量%含むことを特徴とする、
請求項1に記載の光記録ディスク反射膜用銀合金。
2. In addition to the additive element, Zn, Mg, A
at least one second selected from the group consisting of u and Pd
Characterized in that it contains 0.1 to 5% by weight of an additional element of
The silver alloy for an optical recording disk reflection film according to claim 1.
JP2001123997A 2001-04-23 2001-04-23 Silver alloy for optical recording disk reflective film Pending JP2002319185A (en)

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