JP2002288888A - Substrate transfer apparatus and substrate processing apparatus using the same - Google Patents
Substrate transfer apparatus and substrate processing apparatus using the sameInfo
- Publication number
- JP2002288888A JP2002288888A JP2001087080A JP2001087080A JP2002288888A JP 2002288888 A JP2002288888 A JP 2002288888A JP 2001087080 A JP2001087080 A JP 2001087080A JP 2001087080 A JP2001087080 A JP 2001087080A JP 2002288888 A JP2002288888 A JP 2002288888A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- slider member
- center
- substrate holder
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
(57)【要約】
【課題】 本発明は、加熱処理に起因するアーム位置
と基板ホルダ位置とのずれを防止し、2つ又はそれ以上
のロボットアームを用いて複数の基板を同時に装着可能
な基板搬送装置を提供することを目的とする。
【解決手段】 ディスク状基板が挿入される円形の開口
を有し、該開口の周辺に前記基板の外周端面を把持する
複数のバネ部材が取り付けられた板状の基板ホルダと、
2つの該基板ホルダをホルダ面が同一面となるように取
り付けるスライダ部材とからなる基板搬送装置であっ
て、前記スライダ部材に前記基板ホルダの下部が挿入可
能な溝を2つ所定の間隔を開けて形成し、各々の溝の内
部であって前記スライダ部材の中心側の端部に可動部材
を配置するとともに、該可動部材を前記スライダ部材の
端部側に付勢する弾性体を配置し、前記基板ホルダの側
端面を前記スライダ部材の端部側に押しつけて固定する
構成としたことを特徴とする。
(57) Abstract: The present invention prevents a displacement between an arm position and a substrate holder position due to a heat treatment, and enables simultaneous mounting of a plurality of substrates using two or more robot arms. It is an object to provide a substrate transfer device. A plate-shaped substrate holder having a circular opening into which a disk-shaped substrate is inserted, and a plurality of spring members holding an outer peripheral end surface of the substrate mounted around the opening;
A slider member for mounting the two substrate holders so that the holder surfaces are flush with each other, wherein two predetermined grooves are formed in the slider member so that the lower portion of the substrate holder can be inserted into the slider member. A movable member is arranged inside each groove and at the end on the center side of the slider member, and an elastic body for urging the movable member toward the end of the slider member is arranged. A side end surface of the substrate holder is pressed against and fixed to an end portion of the slider member.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光ディスクや磁気
ディスク等に用いられるドーナツ状のディスク基板を複
数個支持し搬送するための基板搬送装置及びそれを用い
た基板処理装置に係り、特に複数基板の同時装着を安定
して行うことができる基板搬送装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transport apparatus for supporting and transporting a plurality of donut-shaped disk substrates used for optical disks, magnetic disks, and the like, and a substrate processing apparatus using the same. The present invention relates to a substrate transfer device capable of stably performing simultaneous mounting of the substrates.
【0002】[0002]
【従来の技術】磁気ディスクは、一般に、中心に開口を
有するドーナツ状のアルミニウム製基板の両面に下地
膜、磁性薄膜、及び保護膜が形成された積層構造を有す
る。このような磁気ディスクの製造には、例えば、図3
に示したインライン型製造装置が用いられる。この装置
は、ロボットにより基板を補助室のカセットから取り出
し、基板搬送装置(キャリア)1に搭載するロード室1
01と、基板の加熱室102と、スパッタ室やプラズマ
CVD(PCVD)等の成膜室103と、処理済みの基
板をキャリアから取り外し補助室のカセットに戻すアン
ロード室104とから構成され、各室はゲートバルブ1
06を介して接続されている。なお、装置の4隅に位置
する真空室105は、キャリアの方向を90゜回転して
次の真空室にキャリア1を送るための方向転換室であ
り、ロード室101で基板を搭載したキャリア1は、各
室に敷設された搬送路上を移動する。2. Description of the Related Art Generally, a magnetic disk has a laminated structure in which a base film, a magnetic thin film, and a protective film are formed on both surfaces of a donut-shaped aluminum substrate having an opening at the center. To manufacture such a magnetic disk, for example, FIG.
Is used. In this apparatus, a substrate is taken out of a cassette in an auxiliary chamber by a robot, and is loaded into a substrate transfer device (carrier) 1.
01, a substrate heating chamber 102, a sputtering chamber or a film forming chamber 103 for plasma CVD (PCVD) or the like, and an unloading chamber 104 for removing the processed substrate from the carrier and returning the processed substrate to the cassette of the auxiliary chamber. Room is gate valve 1
06. The vacuum chambers 105 located at the four corners of the apparatus are direction change chambers for rotating the direction of the carrier by 90 ° and sending the carrier 1 to the next vacuum chamber. Moves on a transport path laid in each room.
【0003】図6に従来のキャリアを示し、基板の装着
手順を説明する。図6は、(a)キャリア構造を示す模
式的正面図、(b)基板ホルダの正面図、及び(c)A
−A’線の矢視図である。キャリア1は、図6に示すよ
うに、2枚の板状基板ホルダ20と、これらを保持する
スライダ部材10とからなり、スライダ部材が搬送路上
を移動して基板を搬送する。スライダ部材10の断面
は、図6(c)に示すように、くぼみ部10bが形成さ
れたコの字形状をなし、上部の肉厚部10aには基板ホ
ルダを嵌合するスリット状の溝がくぼみ部10bへ貫通
して形成されている。なお、高特性磁性薄膜の成膜は、
通常基板に所定のバイアスを印加しながら行われるた
め、スライダ部材の溝部と基板ホルダとの嵌合部には、
絶縁部材11が取り付けられ、基板ホルダはスライダ部
材から電気的に絶縁されている。FIG. 6 shows a conventional carrier, and a procedure for mounting a substrate will be described. 6A is a schematic front view showing a carrier structure, FIG. 6B is a front view of a substrate holder, and FIG.
It is an arrow view of the -A 'line. As shown in FIG. 6, the carrier 1 includes two plate-like substrate holders 20 and a slider member 10 for holding the plate-like substrate holders, and the slider member moves on a transport path to transport the substrate. As shown in FIG. 6 (c), the cross section of the slider member 10 has a U-shape with a concave portion 10b formed therein, and a slit-like groove for fitting the substrate holder is formed in the upper thick portion 10a. It is formed so as to penetrate into the concave portion 10b. The high-performance magnetic thin film is formed by
Normally, a predetermined bias is applied to the substrate, so that the fitting portion between the groove of the slider member and the substrate holder includes:
The insulating member 11 is attached, and the substrate holder is electrically insulated from the slider member.
【0004】一方、基板ホルダ20は、図6(b)に示
すように、その下部が2段階に幅狭となる形状をしてお
り、中間部20bが絶縁部材11と嵌合し、先端部20
cはくぼみ部10bに突出して、不図示のバイアス用端
子と接触できる構造となっている。また、基板ホルダ2
0の上部には、基板30が挿入される円形の開口20a
が形成され、基板を支持するためのL字型インコネル製
バネ部材21,22,23が3個、ネジ24により固定
されている。バネ部材の先端部には、V字状の溝が形成
され、この溝が支持爪として働き基板外周端面を把持す
る。溝の開き角度は成膜を妨害しないように、例えば1
60゜程度の広い角度とされている。なお、3つのバネ
部材のうち、下部に取り付けられるバネ部材(可動バネ
部材)23は、基板装着及び脱着時に、開閉機構(不図
示)により下方に押し下げられる。On the other hand, as shown in FIG. 6B, the substrate holder 20 has a shape in which the lower portion is narrowed in two stages, and the intermediate portion 20b is fitted with the insulating member 11, and 20
c has a structure that protrudes into the concave portion 10b and can contact a bias terminal (not shown). Also, the substrate holder 2
0, a circular opening 20a into which the substrate 30 is inserted.
Are formed, and three L-shaped Inconel spring members 21, 22, and 23 for supporting the substrate are fixed by screws 24. A V-shaped groove is formed at the tip of the spring member, and this groove acts as a support claw to grip the outer peripheral end surface of the substrate. The opening angle of the groove is, for example, 1 so as not to disturb the film formation.
The angle is as wide as about 60 °. Of the three spring members, a spring member (movable spring member) 23 attached to the lower portion is pushed down by an opening / closing mechanism (not shown) when the substrate is mounted and detached.
【0005】アンロード室104において基板が取り外
されたキャリア1は、ロード室101に搬送され、未処
理基板が2枚装着される。キャリア1は、位置決めピン
等によりロボットアームの進入方向と第1の基板ホルダ
中心とが一致する位置で停止する。この間、補助室10
1a内のロボットは、アームが2枚の基板の内周端面上
部を載置した状態で待機している。キャリアの位置決め
がされると、可動バネ部材23が押し下げられるととも
に、ロボットアームが前進する。アームに保持された基
板が支持爪の位置にきたところで前進を停止し、続いて
所定高さ上昇して基板外周端面を上部の2つのバネ部材
の支持爪21,22に当接させる。ここで、可動バネ部
材23を戻して、3つの支持爪で基板を把持させる。こ
の後、ロボットアームは後方に退避し、再びキャリア1
を第2の基板ホルダ中心がアーム位置に来るまで移動さ
せ、同様に2枚目の基板をホルダに装着する。なお、ア
ンロード室での基板の脱着は、逆の操作が行われる。[0005] The carrier 1 from which the substrate has been removed in the unloading chamber 104 is transferred to the loading chamber 101, and two unprocessed substrates are mounted thereon. The carrier 1 stops at a position where the direction of entry of the robot arm and the center of the first substrate holder coincide with each other by a positioning pin or the like. During this time, the auxiliary room 10
The robot in 1a is on standby with the arm resting on the upper part of the inner peripheral end faces of the two substrates. When the carrier is positioned, the movable spring member 23 is pushed down and the robot arm moves forward. When the substrate held by the arm reaches the position of the support claw, it stops moving forward, then rises by a predetermined height to bring the outer peripheral end surfaces of the substrate into contact with the support claws 21 and 22 of the upper two spring members. Here, the movable spring member 23 is returned, and the substrate is gripped by the three support claws. After this, the robot arm retreats backward, and again carrier 1
Is moved until the center of the second substrate holder comes to the arm position, and the second substrate is similarly mounted on the holder. The reverse operation is performed for attaching and detaching the substrate in the unloading chamber.
【0006】このようにして、2枚の基板を搭載したキ
ャリアは、各室のキャリアとともに同時に移動して次の
処理室に送られる。未処理の基板を搭載したキャリア
は、まず加熱室102に移動し、2枚の基板は両側から
カーボンヒータ等により、例えば220℃程度に加熱さ
れる。続いて、成膜室103に順次送られ、下地膜、磁
性薄膜、保護膜が2枚同時に両面に形成され、その後ア
ンロード室104でキャリアから処理済み基板が取り外
される。このようにして積層構造の磁気ディスクが連続
して作製される。なお、成膜室等処理室の数は、作製し
ようとする磁気ディスクの膜構成及び各処理のタクトタ
イムに応じて定められる。[0006] In this manner, the carrier on which the two substrates are mounted moves simultaneously with the carrier in each chamber and is sent to the next processing chamber. The carrier on which the unprocessed substrate is mounted first moves to the heating chamber 102, and the two substrates are heated from both sides to, for example, about 220 ° C. by a carbon heater or the like. Subsequently, the substrates are sequentially sent to the film forming chamber 103, and two underlayers, magnetic thin films, and protective films are simultaneously formed on both sides, and then the processed substrate is removed from the carrier in the unloading chamber 104. In this way, magnetic disks having a laminated structure are continuously manufactured. The number of processing chambers such as a film forming chamber is determined according to a film configuration of a magnetic disk to be manufactured and a tact time of each processing.
【0007】[0007]
【発明が解決しようとする課題】以上の製造装置によ
り、高特性磁気ディスクを安定して生産することが可能
となった。その一方、より生産性の高い製造装置が強く
望まれており、そのためには、キャリアの搬送時間やキ
ャリアへの基板の装着時間をさらに短縮する必要があっ
た。そこで、本発明者は、キャリアの搬送時間を短縮す
るための検討として、例えば、特開平10−15993
4号公報に開示した磁気結合を利用した搬送機構を用
い、かつキャリアの材質にAl系金属材料を用いて軽量
化することにより、600mm/sec以上の高速移動
を可能とした。この搬送機構は、図4に示すように、ス
ライダ部材10の底面に垂直方向に着磁された磁石14
を着磁方向を交互に逆にして取り付けるとともに、複数
のらせん状磁石が外周面に取り付けられた回転ローラ4
0を搬送路に沿って配置したものであり、ローラ40を
回転することによりキャリアを浮上させた状態で移動さ
せる機構である。With the above-described manufacturing apparatus, it has become possible to stably produce a high-performance magnetic disk. On the other hand, a manufacturing apparatus having higher productivity has been strongly desired, and for that purpose, it has been necessary to further shorten the carrier transport time and the substrate mounting time on the carrier. Accordingly, the present inventor has studied, for example, Japanese Patent Application Laid-Open No. H10-15993 as a study for shortening the carrier transport time.
By using the transfer mechanism utilizing magnetic coupling disclosed in Japanese Patent Publication No. 4 and reducing the weight by using an Al-based metal material for the carrier, high-speed movement of 600 mm / sec or more was made possible. As shown in FIG. 4, the transport mechanism includes a magnet 14 vertically magnetized on the bottom surface of the slider member 10.
A rotating roller 4 having a plurality of spiral magnets mounted on the outer peripheral surface while alternately mounting the
0 is arranged along the transport path, and is a mechanism for moving the carrier in a floating state by rotating the roller 40.
【0008】しかし、キャリアを高速に移動させるに
は、急加速、急減速させる必要があり、停止時等の衝撃
により基板ホルダ20がスライダ部材10からずれてし
まい、ロード室やアンロード室で基板の装着・脱着に支
障をきたす場合が起こった。そこで、基板ホルダの保持
機構を改善し、図4に示すように、スライダ部材10の
溝内部に配置される2つの絶縁部材のうち、外側の絶縁
部材11aを可動とし、これをバネ強度の大きなインコ
ネル製板バネ12でスライダ部材の中心方向に押さえつ
け、ネジ13で固定する構造のキャリアを考案した。こ
のような構成とすることにより、基板ホルダのずれはな
くなって高速な基板搬送が可能となり、搬送時間の短縮
化を達成することができた。However, in order to move the carrier at a high speed, it is necessary to accelerate and decelerate rapidly, and the substrate holder 20 is displaced from the slider member 10 by an impact at the time of stopping or the like. In some cases, the attachment / detachment of the device was hindered. Therefore, the holding mechanism of the substrate holder has been improved, and as shown in FIG. 4, the outer insulating member 11a among the two insulating members arranged inside the groove of the slider member 10 is made movable, and this is set to a large spring strength. A carrier having a structure in which the slider is pressed down toward the center of the slider member by an Inconel leaf spring 12 and fixed by screws 13 is provided. With such a configuration, the substrate holder is not displaced, and high-speed substrate transfer is enabled, so that the transfer time can be reduced.
【0009】一方、キャリアへの基板の装着・脱着工程
を短縮化するために、図5に示すように、ロボットアー
ムを二股とし、2つのアーム44でカセット45から同
時に2つの基板30を取り出し、基板ホルダに装着する
方法を検討した。しかしながら、実際に2股アームのロ
ボットを用い、図4に示したキャリアに基板を装着して
磁気ディスクの連続生産を行ったところ、基板外周面に
支持爪の傷がついて不良品となったり、あるいは基板が
落下する事故が起こり時には製造装置を停止しなければ
ならないという事態が起こった。On the other hand, in order to shorten the process of attaching and detaching the substrate to and from the carrier, as shown in FIG. The method of mounting on the substrate holder was studied. However, when a magnetic disk was continuously produced by mounting a substrate on the carrier shown in FIG. 4 using a robot having a two-armed arm, the support claws were scratched on the outer peripheral surface of the substrate, resulting in a defective product. Alternatively, there has been a situation in which a manufacturing apparatus must be stopped when an accident occurs in which a substrate is dropped.
【0010】この原因を解明すべく種々の検討を行い、
従来のロボットアームではほとんど起こらず、特に、2
股アームを用いた場合に起こり易くなった現象であるこ
とから、ロボットアーム位置と基板ホルダ中心位置の位
置決め精度と上記現象との関係を調べたところ、アーム
中心軸と基板ホルダ開口中心との間に0.5mm程度の
微少なずれがあっても、基板の傷や落下等の問題が起こ
ることが分かった。これは、ずれがあると、アームを所
定高さ上昇させる際に上部支持爪の一方に強い力が加わ
ってしまって傷が付き、また爪と基板外との当接点は滑
ることがないため、可動爪23を上昇させた際に基板は
3つの爪で均等に支持されず、極端な場合は2点支持と
なって基板が落下するものと考えられる。Various investigations have been conducted to clarify the cause,
It rarely happens with conventional robot arms, especially
Since this phenomenon is more likely to occur when a crotch arm is used, the relationship between the positioning accuracy of the robot arm position and the substrate holder center position and the above-mentioned phenomenon was examined. It has been found that even if there is a slight deviation of about 0.5 mm, problems such as scratches and dropping of the substrate occur. This is because if there is a shift, a strong force will be applied to one of the upper support claws when raising the arm to a predetermined height, and it will be damaged, and the contact point between the claw and the outside of the board will not slip, When the movable claw 23 is raised, the substrate is not evenly supported by the three claws. In an extreme case, it is considered that the substrate is supported at two points and the substrate drops.
【0011】そこで、アーム中心軸間距離と基板中心間
距離とのずれの原因を種々調査する中で、基板加熱に伴
うスライダ部材及び基板ホルダの熱膨張に着目し、連続
運転時の温度測定を行ったところ、例えば基板を220
℃に加熱する場合、図4において、基板ホルダのA点は
280℃、絶縁部材(B)は150℃、キャリア中心部
(C)は100℃、くぼみ部(D)は93℃程度となる
ことが分かった。そこで、各部材の熱膨張係数から、キ
ャリア中心から基板ホルダ中心までの距離を計算したと
ころ、3.5インチ基板の場合で、基板ホルダ中心とキ
ャリア中心との距離は、室温の場合と比べて約0.4m
m伸びることが分かった。即ち、ロボットアームと基板
ホルダ中心とは、熱処理により0.4mm程度のずれが
起こり得ることが分かり、熱膨張が基板の傷及び落下の
原因となることが分かった。Therefore, while investigating various causes of the deviation between the arm center axis distance and the substrate center distance, the temperature measurement during continuous operation was performed by focusing on the thermal expansion of the slider member and the substrate holder accompanying the substrate heating. As a result, for example, the substrate was 220
4, the point A of the substrate holder is 280 ° C., the insulating member (B) is 150 ° C., the center of the carrier (C) is 100 ° C., and the hollow (D) is about 93 ° C. in FIG. I understood. Then, when the distance from the carrier center to the substrate holder center was calculated from the coefficient of thermal expansion of each member, the distance between the substrate holder center and the carrier center was 3.5 in the case of a 3.5-inch substrate, compared with that at room temperature. About 0.4m
m. That is, it was found that a deviation of about 0.4 mm could occur between the robot arm and the center of the substrate holder due to the heat treatment, and it was found that thermal expansion caused damage and dropping of the substrate.
【0012】本発明は、かかる知見を基にさらに検討を
加えて完成したものである。なお、キャリアの熱膨張に
起因する基板の傷や落下の問題を防止するために、熱膨
張を考慮してその分広くロボットアームの間隔を設定し
ておくことも考えられるが、キャリア温度が一定になる
まで基板を装着せずに空運転する必要があり、また、プ
ロセス条件が変わるごとにアームの微妙な調整をしなけ
ればないという煩雑な工程が必要となるという問題があ
る。The present invention has been completed by further study based on such findings. In order to prevent the substrate from being damaged or dropped due to the thermal expansion of the carrier, it is conceivable to set the distance between the robot arms to be wider by taking into account the thermal expansion. It is necessary to perform idle operation without mounting a substrate until the process is completed, and there is a problem in that a complicated process of requiring fine adjustment of the arm every time process conditions are changed is required.
【0013】かかる状況に鑑み、本発明は、加熱処理に
起因するアーム位置と基板ホルダ位置とのずれを抑え、
2つ又はそれ以上のロボットアームを用いて複数の基板
を同時に装着可能な基板搬送装置を提供することを目的
とする。さらに本発明は、高スループットの生産を安定
して行える基板処理装置を提供することを目的とする。In view of such a situation, the present invention suppresses the displacement between the arm position and the substrate holder position due to the heat treatment,
It is an object of the present invention to provide a substrate transfer device capable of simultaneously mounting a plurality of substrates by using two or more robot arms. Still another object of the present invention is to provide a substrate processing apparatus capable of stably performing high-throughput production.
【0014】[0014]
【課題を解決するための手段】本発明の基板搬送装置
は、ディスク状基板が挿入される円形の開口を有し、該
開口の周辺に前記基板の外周端面を把持する複数のバネ
部材が取り付けられた板状の基板ホルダと、2つの該基
板ホルダをホルダ面が同一面となるように取り付けるス
ライダ部材と、からなる基板搬送装置であって、前記ス
ライダ部材に前記基板ホルダの下部が挿入可能な溝を2
つ所定の間隔を開けて形成し、各々の溝の内部であって
前記スライダ部材の中心側の端部に可動部材を配置する
とともに、該可動部材を前記スライダ部材の端部側に付
勢する弾性体を配置し、前記基板ホルダの側端面を前記
スライダ部材の端部側に押しつけて固定する構成とした
ことを特徴とするAccording to the present invention, there is provided a substrate transfer apparatus having a circular opening into which a disk-shaped substrate is inserted, and a plurality of spring members for gripping an outer peripheral end surface of the substrate are mounted around the opening. And a slider member for attaching the two substrate holders so that the holder surfaces are flush with each other, wherein a lower portion of the substrate holder can be inserted into the slider member. 2 grooves
The slider is formed at predetermined intervals, and a movable member is disposed at the center end of the slider member inside each groove and urges the movable member toward the end of the slider member. An elastic body is arranged, and a side end surface of the substrate holder is pressed against an end of the slider member to be fixed.
【0015】このように、2つの基板ホルダをスライダ
部材の中心側から外側に押しつけるように可動部材及び
弾性体を配置する構成としたため、スライダ部材及び基
板ホルダ等が熱処理により加熱されて膨張しても、スラ
イダ部材の熱膨張による展延方向と基板ホルダーの熱膨
張による展延方向が逆向きとなり、2つの基板ホルダ中
心間距離は室温の場合と実質的に同一に保つことが可能
となる。即ち、室温状態にあるロボットのアーム中心軸
間距離とのずれを無視できる程度に抑えることができる
ため、複数の基板の同時装着が可能となる。この結果、
基板に傷がつくことがなくなり歩留まりが向上するとと
もに、基板落下事故に伴う装置の停止及びその復旧のた
めに生産性が低下するという問題を解消することができ
る。従って、安定した生産が確保され、かつスループッ
トの高い製造装置を実現することができる。また、熱処
理温度にかかわらず、確実に基板ホルダに基板を装着す
ることができることから、種々のディスク生産に対応す
ることができる。As described above, since the movable member and the elastic member are arranged so as to press the two substrate holders outward from the center side of the slider member, the slider member and the substrate holder are expanded by being heated by the heat treatment. Also, the direction of extension of the slider member due to thermal expansion is opposite to the direction of extension of the substrate holder due to thermal expansion, so that the center-to-center distance between the two substrate holders can be kept substantially the same as at room temperature. That is, since the deviation from the center distance between the arm axes of the robot at room temperature can be suppressed to a negligible level, a plurality of substrates can be simultaneously mounted. As a result,
The problem that the substrate is not damaged and the yield is improved, and the problem that the productivity is reduced due to the stoppage of the apparatus and the restoration of the apparatus due to the substrate falling accident can be solved. Therefore, stable production can be ensured, and a high-throughput manufacturing apparatus can be realized. Further, since the substrate can be reliably mounted on the substrate holder regardless of the heat treatment temperature, it is possible to cope with various types of disk production.
【0016】本発明の基板搬送装置は、スライダ部材に
3つ以上の基板ホルダを保持させてもよく、例えば3つ
基板ホルダを保持させる場合は、前記スライダ部材の前
記2つの溝の外側に第3の溝を形成し、該第3の溝内の
前記スライダ部材の中心側に第3の可動部材及び第3の
弾性体を配置すればよい。また、基板ホルダの取付操作
が複雑となるが、前記スライダ部材において、前記2つ
の溝の間に第3の溝を形成し、該第3の溝内端部の両方
に可動部材及び弾性体を配置するようにしてもよい。In the substrate transfer apparatus of the present invention, the slider member may hold three or more substrate holders. For example, when holding three substrate holders, the slider member may be provided outside the two grooves of the slider member. Third groove may be formed, and a third movable member and a third elastic body may be arranged in the third groove on the center side of the slider member. Also, although the mounting operation of the substrate holder becomes complicated, a third groove is formed between the two grooves in the slider member, and a movable member and an elastic body are provided on both inner ends of the third groove. It may be arranged.
【0017】前記バネ部材は、板状バネ部材をL字状に
折り曲げ、折り曲げられた先端部分にV字状の溝が形成
されたものであり、該L字型バネ部材の取り付け方向を
L字が回転対称となるようにするのが好ましい。このよ
うにバネ部材を取り付けることにより、基板が回転する
方向に力が加わるため、構造的な基板中心と基板ホルダ
中心とのずれを吸収することができるとともに、熱膨張
があった場合に、より増長されるずれの影響を解消する
ことができる。The spring member is formed by bending a plate-shaped spring member into an L-shape, and forming a V-shaped groove at the bent end portion. The mounting direction of the L-shaped spring member is changed to an L-shape. Are preferably rotationally symmetric. By attaching the spring member in this manner, a force is applied in the direction in which the substrate rotates, so that the structural difference between the substrate center and the substrate holder center can be absorbed, and when thermal expansion occurs, The influence of the increased displacement can be eliminated.
【0018】本発明の基板処理装置は、上記本発明の基
板搬送装置に複数の未処理基板を装着し、これを処理室
に移動させて処理を所定の行い、処理後基板を取り外し
て、再び未処理基板を装着する工程を繰り返し行う基板
処理装置であって、前記基板搬送装置への基板の装着
を、複数のアームを有するロボットにより複数の基板に
ついて同時に行う構成とし、室温において2つのアーム
中心軸間距離を前記基板ホルダの中心間距離に一致させ
たことを特徴とする。In the substrate processing apparatus of the present invention, a plurality of unprocessed substrates are mounted on the substrate transfer apparatus of the present invention, and are moved to a processing chamber to perform predetermined processing. A substrate processing apparatus for repeatedly performing a process of mounting an unprocessed substrate, wherein the mounting of the substrate to the substrate transfer device is performed simultaneously on a plurality of substrates by a robot having a plurality of arms. The distance between the axes may be made equal to the distance between the centers of the substrate holders.
【0019】[0019]
【発明の実施の形態】以下に、本発明の実施の形態を図
に基づいて説明する。本発明の基板搬送装置(キャリ
ア)の一構成例を図1に示す。図1(a)及び(b)は
キャリアの構造を示す模式的正面図及び側面図である 図1に示すように、キャリア1は、2つの基板ホルダ2
0と、これを保持し搬送路上を移動するスライダ部材1
0とから構成される。スライダ部材及び基板ホルダに
は、通常軽量のAl(A5052)等が用いられる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an example of a configuration of the substrate transfer device (carrier) of the present invention. 1A and 1B are a schematic front view and a side view showing the structure of a carrier. As shown in FIG. 1, the carrier 1 has two substrate holders 2.
0, a slider member 1 that holds it and moves on the transport path
0. Usually, lightweight Al (A5052) or the like is used for the slider member and the substrate holder.
【0020】基板ホルダ20は、図6(b)に示したよ
うに、中央部に基板が挿入される円形の開口20aを有
し、下部側ではその幅が2段階に縮小する形状となって
いる。開口20aの周囲に3カ所にインコネル製のL字
型バネ部材21,22,23が取り付けられ、このう
ち、バネ部材(可動バネ部材)23は下方に押し下げら
れる構成となっている。バネ部材の先端部には、基板の
外周端面を把持するためのV字型の溝が形成され、開口
20a内に突出している。ここで、L字型バネ部材の取
り付け方向は、図6(b)とは異なり、回転対称的に取
り付けられている。また、2つのバネ部材21,22の
支持爪は、基板ホルダ開口中心を通る鉛直線に対し対称
な位置に配置され、可動バネ部材23の支持爪は、この
鉛直線上に配置される。このように配置することによ
り、基板をキャリアに装着する際に、何らかの原因で基
板ホルダの開口中心と装着される基板の中心とが若干ず
れた場合でも、基板が回転する方向に力が加わるため、
より均等に3本の支持爪で基板を保持することができ、
また熱膨張があった場合に増長されるずれを解消するこ
とができる。基板ホルダの中間部20bは、スライダ部
材内部に取り付けられたアルミナ等の絶縁部材11によ
りその側端面が保持される。また、先端部20cは、基
板バイアス印加用接点との接触部となる。As shown in FIG. 6B, the substrate holder 20 has a circular opening 20a at the center where the substrate is inserted, and the width thereof is reduced in two steps at the lower side. I have. L-shaped spring members 21, 22, 23 made of Inconel are attached at three places around the opening 20a, and the spring member (movable spring member) 23 is configured to be pushed downward. A V-shaped groove for gripping the outer peripheral end surface of the substrate is formed at the tip of the spring member, and protrudes into the opening 20a. Here, the mounting direction of the L-shaped spring member is different from that in FIG. The support claws of the two spring members 21 and 22 are arranged at positions symmetrical with respect to a vertical line passing through the center of the opening of the substrate holder, and the support claws of the movable spring member 23 are arranged on this vertical line. By arranging in this way, when the substrate is mounted on the carrier, even if the center of the opening of the substrate holder and the center of the mounted substrate are slightly shifted for some reason, a force is applied in the direction in which the substrate rotates. ,
The substrate can be more evenly held by the three support claws,
Further, it is possible to eliminate a shift that is increased when thermal expansion occurs. The intermediate portion 20b of the substrate holder has its side end face held by an insulating member 11 such as alumina mounted inside the slider member. Further, the tip portion 20c is a contact portion with a contact for applying a substrate bias.
【0021】スライダ部材10は、図1(b)に示すよ
うに、中央部にくぼみ10bが形成されたコの字型の断
面形状を有し、上部の肉厚部10aには、基板ホルダの
中間部20bを保持するためのスリット状の溝がくぼみ
部10bに貫通して形成されている。スリット状溝内の
両端には1対の絶縁部材11が配置され、スライダ部材
の端部側の絶縁部材11aは溝内に固定され、スライダ
部材の中央側の絶縁部材11bは左右に移動可能に配置
されている。さらに、可動絶縁部材11bをスライダ部
材の端部側に付勢するように板バネ12が取り付けられ
ている。このように、スライダ部材の溝内に基板ホルダ
20を差し込み、ネジ13を締め付けることにより、基
板ホルダはキャリア外側に押しつけられ強固に固定され
る。As shown in FIG. 1 (b), the slider member 10 has a U-shaped cross section in which a recess 10b is formed in the center, and the upper thick portion 10a has a substrate holder. A slit-like groove for holding the intermediate portion 20b is formed so as to penetrate the concave portion 10b. A pair of insulating members 11 are arranged at both ends in the slit-shaped groove, an insulating member 11a at the end of the slider member is fixed in the groove, and an insulating member 11b at the center of the slider member is movable left and right. Are located. Further, a leaf spring 12 is attached so as to bias the movable insulating member 11b toward the end of the slider member. Thus, by inserting the substrate holder 20 into the groove of the slider member and tightening the screw 13, the substrate holder is pressed to the outside of the carrier and is firmly fixed.
【0022】また、スライダ部材の底部には、上述した
ように、多数の磁石14が着磁方向を交互に逆にして取
り付けられ、スライダ部材は、搬送路に沿って配置され
る回転磁石40との相互作用により移動する。なお、搬
送路からスライダの離脱を防止するためのガイドローラ
41や、倒れを防止するためのローラ42が所定の間隔
を開けて搬送路に取り付けられている。As described above, a large number of magnets 14 are attached to the bottom of the slider member with the magnetization directions alternately reversed, and the slider member is connected to the rotating magnet 40 arranged along the transport path. Move by the interaction of. Note that a guide roller 41 for preventing the slider from coming off from the transport path and a roller 42 for preventing the slider from falling down are attached to the transport path at a predetermined interval.
【0023】次に、キャリア1に基板を装着する手順を
説明する。図5は、処理済みの基板がアンロード室10
4で取り外され、空のキャリア1がロード室101に搬
送されてきた状態を示している。キャリアは加熱室や成
膜室における熱的処理により、高温の状態にある。空の
キャリアが搬送されてくると、搬送路に取り付けられた
シリンダ駆動の位置決めピンがスライダ部材中心部に形
成された溝に嵌りこみ、キャリア中心とロボットの2つ
のアーム44の中心とが一致した位置で停止する。Next, a procedure for mounting a substrate on the carrier 1 will be described. FIG. 5 shows that the processed substrate is in the unload chamber 10.
4 shows a state where the empty carrier 1 has been removed and transferred to the load chamber 101. The carrier is in a high temperature state by thermal treatment in a heating chamber or a film formation chamber. When an empty carrier is conveyed, a cylinder driving positioning pin attached to the conveyance path is fitted into a groove formed in the center of the slider member, and the center of the carrier coincides with the center of the two arms 44 of the robot. Stop at the position.
【0024】この時点で、不図示の開閉機構により、可
動バネ部材23を押し下げ、同時に、基板を保持した2
つのアーム44を前進させ、基板を基板ホルダ内に挿入
した後上昇させ、基板外周端面をバネ部材21,22の
支持爪に接触させて停止する。なお、ロボットの2つの
アーム中心軸間距離Lは、室温でのホルダの開口中心間
距離と同一となるように設定されているが、本実施形態
のキャリアは加熱されても基板ホルダ中心間距離はほと
んど変化しない構成としてあるため、基板外周端面は2
つのバネ部材支持爪21,22と均等に接触する。続い
て、可動バネ部材23を戻すと、2つの基板はそれぞれ
3つのバネ部材支持爪21、22、23の均等な力によ
り、ホルダの開口中心部で確実に保持されることにな
り、基板外周面に傷が付いたり、基板が落下することは
ない。At this point, the movable spring member 23 is pushed down by an opening / closing mechanism (not shown), and at the same time, the substrate is held.
The two arms 44 are advanced, the substrate is inserted into the substrate holder and then raised, and the outer peripheral end surface of the substrate is brought into contact with the support claws of the spring members 21 and 22 and stopped. The distance L between the center axes of the two arms of the robot is set so as to be the same as the distance between the center of the opening of the holder at room temperature. Is hardly changed.
The two spring member support claws 21 and 22 are evenly contacted. Subsequently, when the movable spring member 23 is returned, the two substrates are securely held at the center of the opening of the holder by the uniform force of the three spring member supporting claws 21, 22, 23, respectively, so that the outer periphery of the substrate The surface is not scratched and the substrate does not fall.
【0025】以上述べてきたように、図1に示した構造
のキャリアを用いることにより、キャリアが高温に加熱
された状態にあるにもかかわらずホルダ中心間距離がほ
とんど変化せず、2つのアームで2つのホルダ開口部2
0aの中心に基板を挿入することができ、その結果、確
実な装着操作が可能となる。この理由を計算をまじえて
以下に説明する。キャリアが加熱されると、各構成部分
はその温度に応じて膨張し、任意の2点間距離は変化す
ることになるが、図1に示したように、スライダ部材の
溝内部に配置される板バネをスライダ部材の中心側に配
置し、かつスライダ部材の端部側に基板ホルダを付勢す
る構成としたため、各部材の熱膨張が基板ホルダの開口
中心間距離の変化を相殺する方向に作用し、実質的な基
板ホルダ中心間距離の変化は無視できる程度となる。As described above, by using the carrier having the structure shown in FIG. 1, the center distance between the holders hardly changes even though the carrier is heated to a high temperature. With two holder openings 2
The board can be inserted into the center of Oa, and as a result, a reliable mounting operation can be performed. The reason will be described below, including calculation. When the carrier is heated, each component expands according to its temperature, and the distance between any two points changes, but as shown in FIG. 1, it is arranged inside the groove of the slider member. Since the leaf spring is arranged on the center side of the slider member and the substrate holder is biased toward the end side of the slider member, the thermal expansion of each member offsets the change in the distance between the opening centers of the substrate holder. In effect, a substantial change in the distance between the substrate holder centers is negligible.
【0026】これを図4に示したキャリア及び本実施形
態のキャリアについて、加熱による基板ホルダ中心とキ
ャリア中心との距離Lの変化量を計算した結果を以下に
示す。図2(a)及び(b)は、それぞれ図1及び図4
におけるA−A線の矢視図である。図2において、L1
は室温における基板ホルダ中間部20bの中心から端部
までの距離、L2はスライダ部材の中心から固定絶縁部
材端部までの距離を示し、L3は絶縁部材長さである。The results of calculating the change in the distance L between the center of the substrate holder and the center of the carrier due to heating for the carrier shown in FIG. 4 and the carrier of the present embodiment are shown below. FIGS. 2A and 2B correspond to FIGS. 1 and 4 respectively.
FIG. 2 is a view taken along the line AA in FIG. In FIG. 2, L 1
The distance to the end from the center of the substrate holder intermediate portion 20b at room temperature, L 2 represents the distance from the center of the slider member to the fixed insulating member end, L 3 is an insulating member length.
【0027】加熱処理によりキャリア各部の温度は、次
のようになる。 基板ホルダ中間部20bの温度TA:280℃、 絶縁部材温度TB:150℃ 、 スライダ部材肉厚部10aの中央部温度TC:100℃ スライダ部材くぼみ部10bの温度TD:93℃ ここで、Al及びアルミナの熱膨張係数をそれぞれ2.
3x10−5(/℃)、5x10−6(/℃)として、
キャリアが以上の温度に加熱された状態での基板ホルダ
中心とキャリア中心との距離Lを計算すると次のように
なる。The temperature of each part of the carrier by the heat treatment is as follows. The temperature TA of the substrate holder intermediate portion 20b is 280 ° C., the insulating member temperature TB is 150 ° C., the central temperature TC of the slider member thick portion 10a is 100 ° C. The temperature TD of the slider member concave portion 10b is 93 ° C. Here, Al and The coefficient of thermal expansion of the alumina was 2.
3 × 10 −5 (/ ° C.) and 5 × 10 −6 (/ ° C.)
The distance L between the center of the substrate holder and the center of the carrier in a state where the carrier is heated to the above temperature is calculated as follows.
【0028】図2(b)に示した従来のキャリアの場
合、各部材の膨張量は、 dL1=L1x2.3x10−5x(TA−20)=0.
26mm dL2=L2x2.3x10−5x(TC−20)=
0.12mm dL3=L3x5x10−6x(TB−20)=8.4
5x10−3mmとなる。ここで、固定絶縁部材はスラ
イダ部材の中心側に配置されているため、スライダ部
材、基板ホルダー及び絶縁部材の膨張がいずれもスライ
ダ部材中心と基板ホルダ中心間距離Lを増加させる方向
に寄与し、増加量dLは dL=dL1+dL2+dL3=0.39mmとなる。In the case of the conventional carrier shown in FIG. 2B, the expansion amount of each member is dL 1 = L 1 × 2.3 × 10 −5 x (TA−20) = 0.
26 mm dL 2 = L 2 x2.3 × 10 −5 x (TC−20) =
0.12mm dL 3 = L 3 x5x10 -6 x (TB-20) = 8.4
It becomes 5 × 10 −3 mm. Here, since the fixed insulating member is disposed on the center side of the slider member, the expansion of the slider member, the substrate holder, and the insulating member all contribute to increasing the distance L between the slider member center and the substrate holder center, The increase amount dL is dL = dL 1 + dL 2 + dL 3 = 0.39 mm.
【0029】一方、図2(a)に示した本実施形態のキ
ャリアの場合、各部材の膨張量は、 dL1=L1x2.3x10−5x(TA−20)=0.
26mm dL2=L2x2.3x10−5x(TD−20)=
0.33mm dL3=L3x5x10−6x(TB−20)=8.4
5x10−3mm となる。固定絶縁部材がスライダ部材の端部側に配置さ
れ、可動絶縁部材は中央部側に配置されているため、基
板ホルダ及び絶縁部材の熱膨張により、基板ホルダの中
心はスライダ部材の中心部側に移動することになる。即
ち、スライダ部材の熱膨張がLを増加させるように作用
するのに対し、基板ホルダ及び絶縁部材の熱膨張はLを
減少させるように作用する。従って、スライダ部材中心
と基板ホルダ中心間距離Lの増加量dLは、dL=dL
2−(dL1+dL3)=0.06mmとなり、従来の
キャリアの場合(0.39mm)と比べてほとんど変化
しないことが分かる。On the other hand, in the case of the carrier of this embodiment shown in FIG. 2A, the expansion amount of each member is dL 1 = L 1 × 2.3 × 10 −5 x (TA−20) = 0.
26mm dL 2 = L 2 x2.3x10 -5 x (TD-20) =
0.33mm dL 3 = L 3 x5x10 -6 x (TB-20) = 8.4
5 × 10 −3 mm. Since the fixed insulating member is disposed on the end side of the slider member and the movable insulating member is disposed on the center side, the center of the substrate holder is located at the center of the slider member due to thermal expansion of the substrate holder and the insulating member. Will move. That is, while the thermal expansion of the slider member acts to increase L, the thermal expansion of the substrate holder and the insulating member acts to decrease L. Therefore, the increase dL of the distance L between the center of the slider member and the center of the substrate holder is dL = dL.
2− (dL 1 + dL 3 ) = 0.06 mm, indicating that there is almost no change compared to the case of the conventional carrier (0.39 mm).
【0030】このように、本実施形態のキャリアは、従
来のキャリアとは異なり、加熱されても基板ホルダの中
心間距離はほぼ一定に保たれるため、基板の傷、落下事
故等を回避することができる。即ち、室温時の基板受け
渡し位置で設計することができることになり、プロセス
ごとに設計する必要はなくなる。As described above, unlike the conventional carrier, the carrier of the present embodiment keeps the distance between the centers of the substrate holders substantially constant even when heated, thereby avoiding damage to the substrate and accidents such as dropping. be able to. That is, it is possible to design at the substrate transfer position at room temperature, and it is not necessary to design for each process.
【0031】以上の実施形態では、2つの基板ホルダを
保持するキャリアについて述べてきたが、3個以上の基
板ホルダを保持するキャリアも拡張することができる。
即ち、例えば、偶数個の基板ホルダを取り付ける場合
は、上記可動絶縁部材と板バネを中心側とし、キャリア
中心で対称となるように配置するればよい。また奇数個
の場合は、偶数個の基板ホルダの外側に可動絶縁部材と
板バネをキャリア中心側に配置する構成とすればよい。
また、両端側の基板ホルダ以外の基板ホルダを2組の可
動絶縁部材と板バネで両側から固定する構成としてもよ
い。さらに、基板ホルダ自体に複数の開口及びバネ部材
を設けて、1つの基板ホルダに複数の基板を把持させる
構成としてもよい。なお、本発明の基板ホルダは、図1
に示したように下部が幅狭となる形状に限らず、どのよ
うの形状のものであってもよく、例えば、単に四角形状
のものでもよい。In the above embodiment, the carrier holding two substrate holders has been described. However, the carrier holding three or more substrate holders can be extended.
That is, for example, when an even number of substrate holders are mounted, the movable insulating member and the leaf spring may be arranged so as to be symmetrical about the carrier center with the movable insulating member and the leaf spring being on the center side. In the case of an odd number, the movable insulating member and the leaf spring may be arranged on the carrier center side outside the even number of substrate holders.
Further, a configuration may be adopted in which substrate holders other than the substrate holders at both ends are fixed from both sides by two sets of movable insulating members and leaf springs. Further, a plurality of openings and spring members may be provided in the substrate holder itself so that one substrate holder holds a plurality of substrates. The substrate holder of the present invention is shown in FIG.
The shape is not limited to the shape in which the lower part is narrow as shown in (1), but may be any shape, for example, a simple square shape.
【0032】なお、本発明において、基板側端面を絶縁
部材に嵌合させる構成としたが、基板バイアスを印加す
る必要がない場合は、あえて絶縁部材を用いる必要はな
く、金属等を用いてもよい。また、板バネの代わりに、
コイルバネや処理条件によってはゴム等の弾性体を用い
ることもできる。さらに、基板ホルダやスライダ部材を
Al以外の他の材料を用いても良いことは言うまでもな
い。また、本発明は、以上述べてきたように、複数の基
板を同時に装着する場合に好適に適用できるものである
が、基板を1枚ずる装着する場合であっても、キャリア
の停止位置の位置決めをキャリアの中心位置で行うこと
により、キャリアが加熱されてもアーム位置と基板ホル
ダの開口中心位置とのずれが抑えられ、従来のキャリア
に比べてより安定した装着を行うことができる。In the present invention, the end face of the substrate is fitted to the insulating member. However, when it is not necessary to apply a substrate bias, it is not necessary to use an insulating member. Good. Also, instead of a leaf spring,
An elastic body such as rubber can be used depending on the coil spring and processing conditions. Further, it goes without saying that the substrate holder and the slider member may be made of a material other than Al. Further, as described above, the present invention can be suitably applied to a case where a plurality of substrates are mounted at the same time. Is performed at the center position of the carrier, the deviation between the arm position and the center position of the opening of the substrate holder is suppressed even if the carrier is heated, and more stable mounting can be performed as compared with the conventional carrier.
【0033】[0033]
【発明の効果】以上の説明で明らかなように、本発明に
よれば、ほぼ従来の部品だけで基板加熱時の熱膨張によ
る影響をなくすことができるため、さまざまなプロセス
条件でも、複数基板の安定した同時装着が行えることに
なる。即ち、さまざまなプロセスに対応できる、高生産
性、高信頼性の基板搬送装置を実現することが可能とな
る。この結果、高スループットのディスク生産装置を実
現することが可能となる。As is apparent from the above description, according to the present invention, it is possible to eliminate the influence of thermal expansion during substrate heating with almost only conventional components. Stable simultaneous mounting can be performed. That is, it is possible to realize a high-productivity and high-reliability substrate transfer device that can cope with various processes. As a result, a high-throughput disk production apparatus can be realized.
【図1】本発明の基板搬送装置の一例を示す概略図であ
る。FIG. 1 is a schematic view showing an example of a substrate transfer device according to the present invention.
【図2】基板搬送装置各部の具体的形状例を示す概略図
である。FIG. 2 is a schematic diagram showing a specific example of the shape of each part of the substrate transfer device.
【図3】本発明の基板搬送装置が適用されるインライン
型磁気ディスク製造装置の模式的平面図である。FIG. 3 is a schematic plan view of an in-line type magnetic disk manufacturing apparatus to which the substrate transfer device of the present invention is applied.
【図4】図6の従来構造を改良した基板搬送装置を示す
概略図である。FIG. 4 is a schematic view showing a substrate transfer device in which the conventional structure of FIG. 6 is improved.
【図5】複数枚基板の同時装着を行うロード室を示す概
略平面図である。FIG. 5 is a schematic plan view showing a load chamber for simultaneously mounting a plurality of substrates.
【図6】従来の基板搬送装置を示す概略図である。FIG. 6 is a schematic view showing a conventional substrate transfer device.
1 基板搬送装置(キャリア)、 10 スライダ部材、 11 絶縁部材、 12 弾性体(板バネ)、 13 ネジ、 14 磁石、 20 基板ホルダ、 21,22,23 バネ部材(支持爪)、 40 回転磁石、 101 ロード室、 101a、104a 補助室、 102 加熱室、 103 成膜室、 104 アンロード室、 105 キャリア方向転換室、 106 ゲートバルブ。 Reference Signs List 1 substrate transfer device (carrier), 10 slider member, 11 insulating member, 12 elastic body (leaf spring), 13 screw, 14 magnet, 20 substrate holder, 21, 22, 23 spring member (supporting claw), 40 rotating magnet, 101 load chamber, 101a, 104a auxiliary chamber, 102 heating chamber, 103 film formation chamber, 104 unload chamber, 105 carrier redirection chamber, 106 gate valve.
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 16/44 C23C 16/44 F 16/458 16/458 G11B 5/85 G11B 5/85 Z 5/851 5/851 // H01L 21/68 H01L 21/68 A (72)発明者 宮下 誠希 東京都府中市四谷5丁目8番1号 アネル バ株式会社内 Fターム(参考) 4K029 AA02 AA24 BB02 BC06 BD11 CA05 JA01 JA06 KA02 4K030 CA02 CA17 GA02 GA12 HA01 KA45 LA20 5D112 AA24 FA04 FA10 FB25 5D121 AA02 JJ01 JJ03 JJ04 JJ09 5F031 CA01 FA02 FA09 GA10 GA13 GA14 GA15 GA50 MA28 Of the front page Continued (51) Int.Cl. 7 identification mark FI theme Court Bu (Reference) C23C 16/44 C23C 16/44 F 16/458 16/458 G11B 5/85 G11B 5/85 Z 5/851 5/851 // H01L 21/68 H01L 21/68 A (72) Inventor Seiki Miyashita 5-8-1, Yotsuya, Fuchu-shi, Tokyo Anelva Corporation F-term (reference) 4K029 AA02 AA24 BB02 BC06 BD11 CA05 JA01 JA06 KA02 4K030 CA02 CA17 GA02 GA12 HA01 KA45 LA20 5D112 AA24 FA04 FA10 FB25 5D121 AA02 JJ01 JJ03 JJ04 JJ09 5F031 CA01 FA02 FA09 GA10 GA13 GA14 GA15 GA50 MA28
Claims (4)
を有し、該開口の周辺に前記基板の外周端面を把持する
複数のバネ部材が取り付けられた板状の基板ホルダと、
2つの該基板ホルダをホルダ面が同一面となるように取
り付けるスライダ部材と、からなる基板搬送装置であっ
て、前記スライダ部材に前記基板ホルダの下部が挿入可
能な溝を2つ所定の間隔を開けて形成し、各々の溝の内
部であって前記スライダ部材の中心側の端部に可動部材
を配置するとともに、該可動部材を前記スライダ部材の
端部側に付勢する弾性体を配置し、前記基板ホルダの側
端面を前記スライダ部材の端部側に押しつけて固定する
構成としたことを特徴とする基板搬送装置。1. A plate-shaped substrate holder having a circular opening into which a disk-shaped substrate is inserted, and a plurality of spring members for holding an outer peripheral end surface of the substrate mounted around the opening;
A slider member for mounting the two substrate holders so that the holder surfaces are flush with each other, wherein the slider member is provided with two grooves into which the lower part of the substrate holder can be inserted at a predetermined interval. A movable member is arranged at the center end of the slider member inside each groove and an elastic body for urging the movable member toward the end of the slider member is arranged. A side end surface of the substrate holder is pressed against and fixed to an end portion of the slider member.
に第3の溝を形成し、該第3の溝内の前記スライダ部材
の中心側に第3の可動部材及び第3の弾性体を配置した
ことを特徴とする請求項1に記載の基板搬送装置。2. A third groove is formed outside the two grooves of the slider member, and a third movable member and a third elastic body are provided in the third groove on the center side of the slider member. The substrate transfer device according to claim 1, wherein the substrate transfer device is arranged.
に折り曲げ、折り曲げられた先端部分にV字状の溝が形
成されたものであり、該L字型バネ部材をL字が回転対
称となる方向に取り付けたことを特徴とする請求項1又
は2に記載の基板搬送装置。3. The spring member according to claim 1, wherein the plate-shaped spring member is bent into an L-shape, and a V-shaped groove is formed at the bent end portion. The substrate transfer device according to claim 1, wherein the substrate transfer device is mounted in a rotationally symmetric direction.
た基板搬送装置に複数の未処理基板を装着し、これを処
理室に移動させて処理を所定の行い、処理後基板を取り
外して、再び未処理基板を装着する工程を繰り返し行う
基板処理装置であって、前記基板搬送装置への基板の装
着を、複数のアームを有するロボットにより複数の基板
について同時に行う構成とし、室温において2つのアー
ム中心軸間距離を前記基板ホルダの中心間距離に一致さ
せたことを特徴とする。4. A plurality of unprocessed substrates are mounted on the substrate transfer device according to any one of claims 1 to 3, which are moved to a processing chamber to perform predetermined processing, and the processed substrates are processed. A substrate processing apparatus that removes and repeats a process of mounting an unprocessed substrate again, wherein the mounting of the substrate to the substrate transfer device is performed simultaneously on a plurality of substrates by a robot having a plurality of arms, and at room temperature. The distance between the center axes of the two arms is made equal to the distance between the centers of the substrate holders.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001087080A JP4222589B2 (en) | 2001-03-26 | 2001-03-26 | Substrate transport apparatus and substrate processing apparatus using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001087080A JP4222589B2 (en) | 2001-03-26 | 2001-03-26 | Substrate transport apparatus and substrate processing apparatus using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002288888A true JP2002288888A (en) | 2002-10-04 |
| JP4222589B2 JP4222589B2 (en) | 2009-02-12 |
Family
ID=18942372
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001087080A Expired - Fee Related JP4222589B2 (en) | 2001-03-26 | 2001-03-26 | Substrate transport apparatus and substrate processing apparatus using the same |
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| JP (1) | JP4222589B2 (en) |
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