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JP2002245850A - Conductive paste - Google Patents

Conductive paste

Info

Publication number
JP2002245850A
JP2002245850A JP2001036257A JP2001036257A JP2002245850A JP 2002245850 A JP2002245850 A JP 2002245850A JP 2001036257 A JP2001036257 A JP 2001036257A JP 2001036257 A JP2001036257 A JP 2001036257A JP 2002245850 A JP2002245850 A JP 2002245850A
Authority
JP
Japan
Prior art keywords
powder
conductive paste
conductive
epoxy resin
binder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001036257A
Other languages
Japanese (ja)
Inventor
Junichi Kikuchi
純一 菊池
秀次 ▲桑▼島
Hideji Kuwajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2001036257A priority Critical patent/JP2002245850A/en
Priority to US09/989,060 priority patent/US6515237B2/en
Priority to KR10-2001-0073252A priority patent/KR100476285B1/en
Priority to TW90129074A priority patent/TWI224129B/en
Priority to CNB011459069A priority patent/CN1299542C/en
Publication of JP2002245850A publication Critical patent/JP2002245850A/en
Pending legal-status Critical Current

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  • Conductive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a conductive paste having excellent soldering property. SOLUTION: The conductive paste contains conductive powder and binder, and for the solid portion of the conductive paste, the volume ratio of the conductive powder:the binder ranges between 45:55-79:21, and the weight ratio of the conductive powder:the binder ranges between 88:12-96.5:3.5, and a glass transition point (Tg) of the hardened conductive paste ranges between 40-80 deg.C.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品、回路配
線材料、電極材料、導電接合材料として使用され、直接
はんだ付けをすることが可能な導電ペーストに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste which is used as an electronic component, a circuit wiring material, an electrode material and a conductive bonding material, and which can be directly soldered.

【0002】[0002]

【従来の技術】従来の導電ペーストは電子材料、199
4年10月号の42〜46項に記載されているように、
金、銀、銅、カーボン等の導電性粉末を用い、それにバ
インダ、有機溶剤及び必要に応じて添加剤を加えてペー
スト状に混合して作製していたものを使用していた。特
に高導電性が要求される分野では、金粉又は銀粉が一般
的に用いられていた。
2. Description of the Related Art A conventional conductive paste is an electronic material, 199.
As described in the October, 4th issue, paragraphs 42-46,
Conventionally, a conductive powder such as gold, silver, copper, or carbon was used, and a binder, an organic solvent, and an additive as needed were added to the powder and mixed to form a paste. Particularly in a field where high conductivity is required, gold powder or silver powder has been generally used.

【0003】銀粉を含有する導電ペーストは、導電性が
良好なことから印刷配線板、電子部品等の電気回路や電
極の形成に使用されているが、これらは高温多湿の雰囲
気下で電解が印可されると、電気回路や電極にマイグレ
ーションと称する銀の電析が生じ電極間又は配線間が短
絡するという欠点が生じる。このマイグレーションを防
止するための方策はいくつか行われており、導体の表面
に防湿塗料を塗布するか又は導電ペーストに含窒素化合
物などの腐食抑制剤を添加するなどの方策が検討されて
いるが十分な効果の得られるものではなかった。
[0003] Conductive pastes containing silver powder are used for forming electric circuits and electrodes of printed wiring boards, electronic components, etc. because of their good conductivity, but they can be electrolyzed in a hot and humid atmosphere. In this case, silver deposition called migration occurs in an electric circuit or an electrode, resulting in a short circuit between the electrodes or the wiring. Some measures have been taken to prevent this migration, and measures such as applying a moisture-proof paint to the surface of the conductor or adding a corrosion inhibitor such as a nitrogen-containing compound to the conductive paste have been studied. It was not enough effect.

【0004】また、導通抵抗の良好な導体を得るには銀
粉の配合量を増加しなければならず銀粉が高価であるこ
とから導電ペーストも高価になるという欠点があった。
銀被覆銅粉を使用すればマイグレーションを改善でき、
これを用いれば安価な導電ペーストが得られることにな
る。しかし、銀被覆を均一にかつ厚く被覆するとマイグ
レーションの改善効果はない。しかも得られる導電ペー
ストの塗膜に、直接はんだ付けを適用することができな
いという欠点があった。また銀粉を使用した導電ペース
トにはんだ付けを行う場合、銀喰われが起こり、接合が
十分に行えないという欠点もあった。
[0004] Further, in order to obtain a conductor having good conduction resistance, the amount of silver powder must be increased, and the silver paste is expensive, so that the conductive paste becomes expensive.
Using silver-coated copper powder can improve migration,
By using this, an inexpensive conductive paste can be obtained. However, if the silver coating is uniformly and thickly coated, there is no effect of improving migration. In addition, there is a disadvantage that soldering cannot be directly applied to the obtained conductive paste coating film. In addition, when soldering is performed on a conductive paste using silver powder, there is a disadvantage that silver is eroded and bonding cannot be sufficiently performed.

【0005】一方、銅粉を使用した導電ペーストは、加
熱硬化後の銅の被酸化性が大きいため、空気中及びバイ
ンダ中に含まれる酸素と銅粉が反応し、その表面に酸化
膜を形成し、導電性を著しく低下させる。そのため、各
種添加剤を加えて、銅粉の酸化を防止し、導電性が安定
した銅ペーストが開示されているが、その導電性は銀ペ
ーストには及ばず、また保存安定性にも欠点があった。
しかも、得られた銅ペーストの塗膜に、従来の銅ペース
トでは、直接はんだ付けを適用することができないとい
う欠点もあった。
On the other hand, in a conductive paste using copper powder, since the copper is highly oxidizable after heat curing, oxygen contained in the air and in the binder reacts with the copper powder to form an oxide film on the surface thereof. And significantly lowers the conductivity. For this reason, various additives have been added to prevent copper powder from being oxidized, and a copper paste having a stable conductivity has been disclosed. However, the conductivity is not as high as that of the silver paste, and the storage stability has disadvantages. there were.
In addition, the conventional copper paste cannot directly apply soldering to the obtained copper paste coating film.

【0006】従来公知の導電ペーストは、前記のように
はんだ付けが直接適用することができないため、導電ペ
ーストの塗膜に活性化処理を施して無電解めっきするか
又は塗膜を陰極として電気銅めっきを施した後、銅面上
にはんだ付けをしていた。しかし、塗膜と銅めっきとの
層間の結合が確実でないと実用的ではない。従って、無
電解めっき又は電気めっきを施す必要のないはんだ付け
可能な導電ペーストが開発されれば、回路形成工程が大
幅に短縮されるので、そのメリットは大きい。
Conventionally known conductive pastes cannot be directly applied by soldering as described above. Therefore, a coating of the conductive paste is subjected to an activation treatment and subjected to electroless plating, or an electrolytic copper is used as a cathode as a coating. After plating, soldering was performed on the copper surface. However, it is not practical unless the bonding between the coating and the copper plating is ensured. Therefore, if a solderable conductive paste that does not need to be subjected to electroless plating or electroplating is developed, the circuit forming process is greatly shortened, and the merit thereof is great.

【0007】はんだは金属と接合し易いが、バインダと
は接合しない。はんだ付けを行う場合、理想的には導電
粉のみの塗膜を形成し、それにはんだ付けを行えばよい
が、導電粉のみでは信頼性及び塗膜形成の作業性の点で
問題が生じる。そのためバインダを使用し、導電ペース
トにして用いている。しかし信頼性及び塗膜形成の作業
性を重視するため、バインダの比率を高くすると、金属
である導電粉をバインダが覆ってしまい、はんだと導電
粉が接触する面積が無くなってしまうため、はんだが付
かなくなり、また導電性も低下する。
[0007] Solder is easy to bond with metal, but not with binder. In the case of soldering, ideally, a coating film of only the conductive powder may be formed and soldering may be performed thereon. However, using only the conductive powder causes problems in reliability and workability in forming the coating film. Therefore, a binder is used and a conductive paste is used. However, in order to emphasize the reliability and the workability of forming the coating film, if the ratio of the binder is increased, the binder covers the conductive powder which is a metal, and the area where the solder and the conductive powder come into contact with each other is lost. No longer adhere, and the conductivity also decreases.

【0008】また、上記とは逆にはんだ付け性を重視し
導電粉の比率を高くすると、導電ペーストの粘度が極端
に高くなり、導電ペーストの作製が困難になり導電ペー
ストを塗布する作業性も悪くなる。また、導電粉同士を
結着させるバインダが少ないため塗膜の強度も低下す
る。そのため、導電ペーストを用いてはんだ接合を行う
場合、はんだ付け性、導電性、作業性、強度のバランス
がとれている導電ペーストが必要である。
On the contrary, when the soldering property is emphasized and the ratio of the conductive powder is increased, the viscosity of the conductive paste becomes extremely high, making the preparation of the conductive paste difficult, and the workability of applying the conductive paste is also increased. become worse. Also, the strength of the coating film is reduced because the amount of binder for binding the conductive powders is small. Therefore, when soldering is performed using a conductive paste, a conductive paste that balances solderability, conductivity, workability, and strength is required.

【0009】[0009]

【発明が解決しようとする課題】請求項1記載の発明
は、はんだ付け性に優れる導電ペーストを提供するもの
である。請求項2、3、4及び5記載の発明は、はんだ
付け性の向上効果に優れる導電ペーストを提供するもの
である。
SUMMARY OF THE INVENTION The first aspect of the present invention provides a conductive paste having excellent solderability. The second, third, fourth, and fifth aspects of the present invention provide a conductive paste having an excellent effect of improving solderability.

【0010】[0010]

【課題を解決するための手段】本発明は、導電粉及びバ
インダを含み、導電粉とバインダの配合割合が、導電ペ
ーストの固形分に対して体積比で、導電粉:バインダが
45:55〜79:21及び重量比で、導電粉:バイン
ダが88:12〜96.5:3.5であり、かつ導電ペ
ースト硬化物のガラス転移点(Tg)が40〜180℃
である導電ペーストに関する。また、本発明は、バイン
ダが、エポキシ樹脂組成物とその硬化剤を主成分とし、
エポキシ樹脂のエポキシ当量が160〜330g/eq
である導電ペーストに関する。
The present invention comprises a conductive powder and a binder, and the compounding ratio of the conductive powder and the binder is 45:55 to 45:55 by volume ratio to the solid content of the conductive paste. The conductive powder: binder is 88:12 to 96.5: 3.5 at a weight ratio of 79:21 and the glass transition point (Tg) of the cured conductive paste is 40 to 180 ° C.
A conductive paste. Further, the present invention, the binder is mainly composed of an epoxy resin composition and its curing agent,
The epoxy equivalent of the epoxy resin is 160 to 330 g / eq.
A conductive paste.

【0011】また、本発明は、エポキシ樹脂組成物が、
常温で液状のエポキシ樹脂及び可撓性付与剤を含み、か
つエポキシ樹脂と可撓性付与剤の配合割合が、重量比で
エポキシ樹脂:可撓性付与剤が40:60〜90:10
である導電ペーストに関する。また、本発明は、導電粉
が、銅粉又は銅合金粉の一部を露出して表面が大略銀で
被覆され、かつ形状が略球状である導電ペーストに関す
る。さらに、本発明は、導電粉が、比表面積が0.1〜
1.0m2/g、アスペクト比が1〜1.5及び長径の
平均粒径が1〜20μmの銅粉又は銅合金粉であり、か
つ銅粉又は銅合金粉の露出面積が10〜60%の略球状
導電粉である導電ペーストに関する。
Further, the present invention provides an epoxy resin composition comprising:
It contains a liquid epoxy resin at room temperature and a flexibility-imparting agent, and the mixing ratio of the epoxy resin and the flexibility-imparting agent is 40:60 to 90:10 by weight ratio.
A conductive paste. The present invention also relates to a conductive paste in which the conductive powder exposes a part of the copper powder or the copper alloy powder, and has a surface substantially covered with silver, and a substantially spherical shape. Furthermore, in the present invention, the conductive powder has a specific surface area of 0.1 to
It is a copper powder or a copper alloy powder having an average particle diameter of 1 to 20 μm having an aspect ratio of 1 to 1.5 and a major axis of 1.0 m 2 / g, and the exposed area of the copper powder or the copper alloy powder is 10 to 60%. And a conductive paste which is a substantially spherical conductive powder.

【0012】[0012]

【発明の実施の形態】本発明において、導電ペーストの
塗膜に直接はんだ付けするためには、導電粉とバインダ
の配合割合が、導電ペーストの固形分に対して体積比
で、導電粉:バインダが45:55〜79:21の範
囲、好ましくは50:50〜72:28の範囲とされ、
また、重量比は、導電ペーストの固形分に対して導電
粉:バインダが88:12〜96.5:3.5の範囲、
好ましくは90:10〜95:5の範囲とされ、導電粉
が上記の範囲を下回るとはんだ付け性が低下し、上記の
範囲を上回ると導電ペーストの粘度が極端に高くなるた
め導電ペーストの作製が困難になると共に、導電ペース
トを塗布する作業性が悪くなる。
BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, in order to directly solder a conductive paste to a coating film, the mixing ratio of the conductive powder and the binder is determined by volume ratio with respect to the solid content of the conductive paste. Is in the range of 45:55 to 79:21, preferably in the range of 50:50 to 72:28,
The weight ratio is in the range of 88:12 to 96.5: 3.5 with the conductive powder: binder relative to the solid content of the conductive paste.
The ratio is preferably in the range of 90:10 to 95: 5. When the conductive powder falls below the above range, the solderability decreases. When the conductive powder exceeds the above range, the viscosity of the conductive paste becomes extremely high. And the workability of applying the conductive paste is deteriorated.

【0013】また、本発明において、導電ペースト硬化
物のガラス転移点(以下Tgとする)は、40〜180
℃、好ましくは40〜140℃の範囲とされ、40〜1
80℃の範囲から外れると、導電ペーストの塗膜に直接
はんだ付けすることが不可能となる。
In the present invention, the glass transition point (hereinafter referred to as Tg) of the cured conductive paste is 40 to 180.
° C, preferably in the range of 40-140 ° C,
When the temperature is out of the range of 80 ° C., it becomes impossible to directly solder the coating film of the conductive paste.

【0014】導電ペースト硬化物のTgを40〜180
℃の範囲にするには、バインダとしてエポキシ樹脂組成
物及びその硬化剤を主成分とし、エポキシ樹脂のエポキ
シ当量が160〜330g/eqの範囲のものを用いる
ことが好ましく、160〜250g/eqの範囲のもの
を用いることがさらに好ましい。
The Tg of the cured conductive paste is 40 to 180.
In order to control the temperature in the range of ° C, it is preferable to use an epoxy resin composition and a curing agent thereof as a main component as a binder and an epoxy resin having an epoxy equivalent in the range of 160 to 330 g / eq. It is more preferable to use those in the range.

【0015】上記のエポキシ樹脂組成物としては、エポ
キシ樹脂の他に可撓性付与剤を含むものを用いることが
好ましい。エポキシ樹脂と可撓性付与剤の配合割合は、
重量比でエポキシ樹脂:可撓性付与剤が40:60〜9
0:10の範囲であるものが好ましく、50:50〜8
0:20の範囲であるものがさらに好ましい。
As the above-mentioned epoxy resin composition, it is preferable to use one containing a flexibility-imparting agent in addition to the epoxy resin. The mixing ratio of the epoxy resin and the flexibility imparting agent is
Epoxy resin: flexibility imparting agent in a weight ratio of 40:60 to 9
A range of 0:10 is preferred, and 50:50 to 8
Those having a ratio of 0:20 are more preferred.

【0016】本発明におけるエポキシ樹脂は常温で液状
のものが好ましい。常温で結晶化するものは液状物と混
合することで結晶化を回避できる。本発明における常温
で液状のエポキシ樹脂とは、例えば常温で固形のもので
も常温で液状のエポキシ樹脂と混合することで常温で安
定して液状となるものも含む。なお本発明において常温
とは温度が約25℃を示すものを意味する。
The epoxy resin in the present invention is preferably liquid at room temperature. Those that crystallize at room temperature can avoid crystallization by mixing with a liquid. The epoxy resin that is liquid at room temperature in the present invention includes, for example, a resin that is solid at room temperature and becomes liquid at room temperature by mixing with an epoxy resin that is liquid at room temperature. In the present invention, the normal temperature means a temperature of about 25 ° C.

【0017】本発明に用いられるエポキシ樹脂は公知の
ものが用いられ、分子量中にエポキシ基を2個以上含有
する化合物、例えばビスフェノールA、ビスフェノール
AD、ビスフェノールF、ノボラック、クレゾールノボ
ラック類とエピクロルヒドリンとの反応により得られる
ポリグリシジルエーテル、ジヒドロキシナフタレンジグ
リシジルエーテル、ブタンジオールジグリシジルエーテ
ル、ネオペンチルグリコールジグリシジルエーテル等の
脂肪族エポキシ樹脂やジグリシジルヒダントイン等の複
素環式エポキシ、ビニルシクロヘキセンジオキサイド、
ジシクロペンタンジエンジオキサイド、アリサイクリッ
クジエポキシアジペイトのような脂環式エポキシ樹脂が
挙げられる。
As the epoxy resin used in the present invention, a known epoxy resin is used. Compounds containing two or more epoxy groups in the molecular weight, for example, bisphenol A, bisphenol AD, bisphenol F, novolak, cresol novolaks and epichlorohydrin are used. Polyglycidyl ether obtained by the reaction, dihydroxynaphthalenediglycidyl ether, butanediol diglycidyl ether, heterocyclic epoxy such as diglycidyl hydantoin and aliphatic epoxy resin such as neopentyl glycol diglycidyl ether, vinyl cyclohexene dioxide,
Alicyclic epoxy resins such as dicyclopentanedienedoxide and alicyclic diepoxy adipate are exemplified.

【0018】可撓性付与剤も公知のものが用いられ、分
子量中にエポキシ基を1個だけ有する化合物、例えばn
ーブチルグリシジルエーテル、バーサティック酸グリシ
ジルエステル、スチレンオキサイド、エチルヘキシルグ
リシジルエーテル、フェニルグリシジルエーテル、クレ
ジルグリシジルエーテル、ブチルフェニルグリシジルエ
ーテル等のような通常のエポキシ樹脂が挙げられる。こ
れらのエポキシ樹脂及び可撓性付与剤は、単独又は2種
以上を混合して用いることができる。
As the flexibility-imparting agent, known ones are used, and compounds having only one epoxy group in the molecular weight, for example, n
Ordinary epoxy resins such as -butyl glycidyl ether, glycidyl versatate, styrene oxide, ethylhexyl glycidyl ether, phenyl glycidyl ether, cresyl glycidyl ether, butylphenyl glycidyl ether and the like can be mentioned. These epoxy resins and flexibility-imparting agents can be used alone or in combination of two or more.

【0019】バインダに添加される硬化剤としては、例
えばメンセンジアミン、イソフオロンジアミン、メタフ
ェニレンジアミン、ジアミノジフェニルメタン、ジアミ
ノジフェニルスルホン、メチレンジアニリン等のアミン
類、無水フタル酸、無水トリメリット酸、無水ピロメリッ
ト酸、無水コハク酸、テトラヒドロ無水フタル酸等の酸無
水物、イミダゾール、ジシアンジアミド等の化合物系硬
化剤、ポリアミド樹脂、フェノール樹脂、尿素樹脂等の樹
脂系硬化剤が用いられるが、必要に応じて、潜在性アミ
ン硬化剤等の硬化剤と併用して用いてもよく、また3級
アミン、イミダゾール類、トリフェニルホスフィン、テ
トラフェニルホスフェニルボレート等といった一般にエ
ポキシ樹脂とフェノール系硬化剤との硬化促進剤として
知られている化合物を添加してもよい。
Examples of the curing agent added to the binder include amines such as mensendiamine, isophoronediamine, metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, phthalic anhydride, trimellitic anhydride, and the like. Acid anhydrides such as pyromellitic anhydride, succinic anhydride, and tetrahydrophthalic anhydride, compound-based curing agents such as imidazole and dicyandiamide, and resin-based curing agents such as polyamide resins, phenol resins, and urea resins are used. Accordingly, it may be used in combination with a curing agent such as a latent amine curing agent, and generally, a tertiary amine, imidazoles, triphenyl phosphine, tetraphenyl phosphenyl borate, etc. are generally used in combination with an epoxy resin and a phenolic curing agent. Known as a curing accelerator The compound may be added.

【0020】これらの硬化剤の含有量は、導電ペースト
硬化物のTgの点でエポキシ樹脂100重量部に対して
0.1〜25重量部の範囲であることが好ましく、1〜
20重量部の範囲であることがさらに好ましい。
The content of these curing agents is preferably in the range of 0.1 to 25 parts by weight with respect to 100 parts by weight of the epoxy resin in terms of Tg of the cured conductive paste.
More preferably, it is in the range of 20 parts by weight.

【0021】本発明に用いられるバインダには、上記の
材料以外に必要に応じてチキソ剤、カップリング剤、消
泡剤、粉末表面処理剤、沈降防止剤等及び溶剤を添加し
て均一に混合して得られる。必要に応じて添加されるチ
キソ剤、カップリング剤、消泡剤、粉末表面処理剤、沈
降防止剤等は公知のものでよく、その含有量は、導電ペ
ーストに対して0.01〜1重量%の範囲であることが
好ましく、0.03〜0.5重量%の範囲であることが
さらに好ましい。
To the binder used in the present invention, in addition to the above-mentioned materials, if necessary, a thixotropic agent, a coupling agent, an antifoaming agent, a powder surface treating agent, an anti-settling agent, and a solvent are added and uniformly mixed. Is obtained. The thixotropic agent, coupling agent, defoaming agent, powder surface treating agent, anti-settling agent and the like added as necessary may be known ones, and the content thereof is 0.01 to 1 weight with respect to the conductive paste. %, More preferably 0.03 to 0.5% by weight.

【0022】必要に応じて添加される溶剤についても公
知のものでよく、その含有量は、導電ペーストに対して
0.01〜15重量%の範囲であることが好ましく、1
〜10重量%の範囲であることがさらに好ましい。
The solvent to be added as required may be a known solvent, and its content is preferably in the range of 0.01 to 15% by weight with respect to the conductive paste.
More preferably, it is in the range of 10 to 10% by weight.

【0023】導電粉は、銅粉又は銅合金粉の一部を露出
して表面が大略銀で被覆された銀被覆銅粉又は銀被覆銅
合金粉を用いることが好ましく、特に銀被覆銅合金粉を
用いれば酸化防止の点で好ましい。もし、銅粉又は銅合
金粉の一部を露出させないで全面に銀を被覆したものを
用いるとはんだ付け性が悪くなり本発明の目的を達成す
ることができなくなる傾向があると共にマイグレーショ
ン性が悪化する傾向がある。
As the conductive powder, it is preferable to use a silver-coated copper powder or a silver-coated copper alloy powder whose surface is substantially covered with silver by exposing a part of the copper powder or the copper alloy powder. Is preferred from the viewpoint of preventing oxidation. If the entire surface is coated with silver without exposing a part of the copper powder or the copper alloy powder, the solderability is deteriorated and the object of the present invention tends to be unable to be achieved, and the migration property is deteriorated. Tend to.

【0024】銅粉又は銅合金粉は、アトマイズ法で作製
された粉体を用いることが好ましく、その粒径は小さい
ほど好ましく、例えば平均粒径が1〜20μmの範囲の
粉体が好ましく、1〜10μmの範囲の粉体がさらに好
ましい。銅合金粉の露出面積は、はんだ付け性、露出部
の酸化、導電性等の点から10〜60%の範囲が好まし
く、10〜50%の範囲がより好ましく、10〜30%
の範囲がさらに好ましい。
As the copper powder or copper alloy powder, powder produced by an atomizing method is preferably used, and the smaller the particle size is, the more preferable it is. For example, a powder having an average particle size in the range of 1 to 20 μm is preferable. Powders in the range from 10 to 10 μm are more preferred. The exposed area of the copper alloy powder is preferably in the range of 10 to 60%, more preferably in the range of 10 to 50%, and more preferably 10 to 30%, from the viewpoint of solderability, oxidation of the exposed portion, conductivity and the like.
Is more preferable.

【0025】銅粉又は銅合金粉の表面に銀を被覆するに
は、置換めっき、電気めっき、無電解めっき等の方法が
あり、銅粉又は銅合金粉と銀の付着力が高いこと及びラ
ンニングコストが安価であることから、置換めっきで被
覆することが好ましい。銅粉又は銅合金粉の表面への銀
の被覆量は、耐マイグレーション性、コスト、導電性向
上等の点から銅粉又は銅合金粉に対して5〜25重量%
の範囲が好ましく、10〜23重量%の範囲がさらに好
ましい。
There are methods such as displacement plating, electroplating, and electroless plating for coating the surface of the copper powder or copper alloy powder with silver. Since the cost is low, it is preferable to cover with displacement plating. The amount of silver coating on the surface of the copper powder or copper alloy powder is 5 to 25% by weight based on the copper powder or copper alloy powder from the viewpoints of migration resistance, cost, and improvement in conductivity.
Is more preferable, and the range of 10 to 23% by weight is more preferable.

【0026】導電粉は接触点が少ないと抵抗が高くなり
易い。導電粒子同士の接触面積を大きくして高導電性を
得るには、導電粉に衝撃を与えて粒子の形状を扁平状に
変形することが好ましいが、扁平状導電粉を使用した導
電ペーストは略球状導電粉を使用した導電ペーストより
粘度が高くなる。粘度を下げるためには多量の溶剤を含
ませればよいが、多量の溶剤を含ませると、硬化後の塗
膜の膜厚が溶剤の体積分だけ減少してしまう。また塗膜
表面を平面にかつ凹凸がないようするためには研磨すれ
ばよいが、研磨すると膜厚が薄くなるので好ましくな
い。このため作業性及び導電ペーストの導電性という点
から略球状導電粉を使用した導電ペーストを用いること
が好ましい。
When the conductive powder has few contact points, the resistance tends to increase. In order to increase the contact area between the conductive particles and obtain high conductivity, it is preferable to apply a shock to the conductive powder to deform the shape of the particles into a flat shape, but the conductive paste using the flat conductive powder is substantially Viscosity is higher than conductive paste using spherical conductive powder. To reduce the viscosity, a large amount of a solvent may be contained. However, if a large amount of the solvent is contained, the thickness of the cured coating film is reduced by the volume of the solvent. In order to make the surface of the coating film flat and free from irregularities, polishing may be performed, but polishing is not preferred because the film thickness is reduced. Therefore, it is preferable to use a conductive paste using substantially spherical conductive powder from the viewpoint of workability and conductivity of the conductive paste.

【0027】本発明における略球状導電粉としては、比
表面積が0.1〜1.0m2/g、アスペクト比が1〜
1.5及び長径の平均粒径が1〜20μmの範囲の導電
粉を用いることが好ましく、比表面積が0.1〜0.6
2/g、アスペクト比が1〜1.3及び長径の平均粒
径が1〜10μmの導電粉を用いればはんだ付け性の向
上効果に優れるのでさらに好ましい。なお、上記でいう
比表面積はBET法により、平均粒径はレーザー散乱型
粒度分布測定装置により測定することができる。本発明
においては、前記装置としてマスターサイザー(マルバ
ン社製)を用いて測定した。
The substantially spherical conductive powder in the present invention has a specific surface area of 0.1 to 1.0 m 2 / g and an aspect ratio of 1 to 1.
It is preferable to use a conductive powder having an average particle diameter of 1.5 and a major axis of 1 to 20 μm, and a specific surface area of 0.1 to 0.6.
It is more preferable to use conductive powder having m 2 / g, an aspect ratio of 1 to 1.3, and a long diameter having an average particle diameter of 1 to 10 μm because the effect of improving solderability is excellent. The specific surface area can be measured by a BET method, and the average particle diameter can be measured by a laser scattering type particle size distribution analyzer. In the present invention, the measurement was performed using a master sizer (manufactured by Malvern) as the device.

【0028】本発明におけるアスペクト比とは、導電粉
の粒子の長径と短径の比率(長径/短径)をいう。本発
明においては、粘度の低い硬化性樹脂中に導電粉の粒子
をよく混合し、静置して粒子を沈降させると共にそのま
ま樹脂を硬化させ、得られた硬化物を垂直方向に切断
し、その切断面に現れる粒子の形状を電子顕微鏡で拡大
して観察し、少なくとも100の粒子について一つ一つ
の粒子の長径/短径を求め、それらの平均値をもってア
スペクト比とする。
The aspect ratio in the present invention refers to the ratio of the major axis to the minor axis (major axis / minor axis) of the conductive powder particles. In the present invention, the particles of the conductive powder are mixed well in a curable resin having a low viscosity, and the resin is cured as it is by allowing the particles to settle by standing, and the resulting cured product is cut in the vertical direction. The shape of the particles appearing on the cut surface is observed under magnification with an electron microscope, and the major axis / minor axis of each particle is obtained for at least 100 particles, and the average value thereof is defined as the aspect ratio.

【0029】ここで、短径とは、前記切断面に現れる粒
子について、その粒子の外側に接する二つの平行線の組
み合わせ粒子を挟むように選択し、それらの組み合わせ
のうち最短間隔になる二つの平行線の距離である。一
方、長径とは、前記短径を決する平行線に直角方向の二
つの平行線であって、粒子の外側に接する二つの平行線
の組み合わせのうち、最長間隔になる二つの平行線の距
離である。これらの四つの線で形成される長方形は、粒
子がちょうどその中に納まる大きさとなる。なお、本発
明において行った具体的方法については後述する。
Here, the minor axis is selected so that a particle appearing on the cut surface is sandwiched by a combination of two parallel lines that are in contact with the outside of the particle. This is the distance between the parallel lines. On the other hand, the major axis is the two parallel lines perpendicular to the parallel line that determines the minor axis, and is the distance between the two parallel lines that are the longest among the combinations of the two parallel lines that contact the outside of the particle. is there. The rectangle formed by these four lines is sized to fit the particle exactly inside it. The specific method used in the present invention will be described later.

【0030】本発明の導電ペーストは、上記のバイン
ダ、導電粉及び必要に応じて添加されるチキソ剤、カッ
プリング剤、消泡剤、粉末表面処理剤、沈降防止剤等と
共に、らいかい機、ニーダー、三本ロール等で均一に混
合、分散して得ることができる。
The conductive paste of the present invention is used together with the binder, the conductive powder and, if necessary, a thixotropic agent, a coupling agent, a defoaming agent, a powder surface treating agent, an anti-settling agent, etc. It can be obtained by uniformly mixing and dispersing with a kneader, three rolls or the like.

【0031】[0031]

【実施例】以下、本発明を実施例により説明する。 実施例1 エポキシ樹脂(三井化学(株)製、商品名140C エ
ポキシ当量195〜215g/eq)60重量部、脂肪
族ジグリシジルエーテル(旭電化工業(株)製、商品名
ED−503)40重量部、2−フェニル−4−メチル
−イミダゾール(四国化成(株)製、商品名キュアゾー
ル2P4MHZ)3重量部及びジシアンジアミド3重量
部を均一に混合してバインダとした。
The present invention will be described below with reference to examples. Example 1 60 parts by weight of epoxy resin (trade name: 140C, epoxy equivalent: 195 to 215 g / eq, manufactured by Mitsui Chemicals, Inc.), 40 weight parts of aliphatic diglycidyl ether (trade name: ED-503, manufactured by Asahi Denka Kogyo KK) 3 parts by weight of 2-phenyl-4-methyl-imidazole (manufactured by Shikoku Chemicals Co., Ltd., trade name: Curesol 2P4MHZ) and 3 parts by weight of dicyandiamide were uniformly mixed to form a binder.

【0032】次に、アトマイズ法で作製した平均粒径が
5.1μmの球状銅粉(日本アトマイズ加工(株)製、
商品名SFR−Cu)を希塩酸及び純水で洗浄した後、
水1リットルあたりAgCN 80g及びNaCN75g
を含むめっき溶液で球状銅粉に対して銀の量が18重量
%になるように置換めっきを行い、水洗,乾燥して銀めっ
き銅粉を得た。
Next, spherical copper powder having an average particle size of 5.1 μm produced by an atomizing method (manufactured by Nippon Atomize Processing Co., Ltd.
After washing (trade name: SFR-Cu) with dilute hydrochloric acid and pure water,
80 g of AgCN and 75 g of NaCN per liter of water
Was subjected to displacement plating so that the amount of silver was 18% by weight with respect to the spherical copper powder, washed with water and dried to obtain silver-plated copper powder.

【0033】この後、2リットルのボールミル容器内に
上記で得た銀めっき銅粉750g及び直径が5mmのジ
ルコニアボール3kgを投入し、40分間回転させて、比
表面積が0.16m2/g、アスペクト比が平均1.3
及び長径の平均粒径が5.5μmの略球状銀めっき銅粉
を得た。得られた略球状銀めっき銅粉の粒子を5個取り
出し、走査型オージェ電子分光分析装置で定量分析して
銅の露出面積について調べたところ10〜50%の範囲
で平均が20%であった。
Thereafter, 750 g of the silver-plated copper powder obtained above and 3 kg of zirconia balls having a diameter of 5 mm were put into a 2 liter ball mill container, and rotated for 40 minutes to give a specific surface area of 0.16 m 2 / g. 1.3 average aspect ratio
In addition, a substantially spherical silver-plated copper powder having an average major diameter of 5.5 μm was obtained. Five particles of the obtained substantially spherical silver-plated copper powder were taken out and quantitatively analyzed by a scanning Auger electron spectrometer to examine the exposed area of copper. The average was 20% in the range of 10 to 50%. .

【0034】上記で得たバインダ35g及び略球状銀め
っき銅粉465gに溶剤としてエチルカルビトール11
gを加えて、撹拌らいかい機及び三本ロールで均一に混
合、分散して導電ペーストを得た。
Ethyl carbitol 11 was added as a solvent to 35 g of the binder obtained above and 465 g of the substantially spherical silver-plated copper powder.
g was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste.

【0035】得られた導電ペーストを170℃で90分
間加熱処理して導電ペースト硬化物を得、次いで該導電
ペースト硬化物のTgをセイコー電子工業製のTMA1
20で荷重3g及び昇温スピード5℃/分の条件で測定
した結果、68℃であった。
The obtained conductive paste was heat-treated at 170 ° C. for 90 minutes to obtain a cured conductive paste, and the Tg of the cured conductive paste was converted to TMA1 manufactured by Seiko Denshi Kogyo.
As a result of measurement under the conditions of a load of 3 g and a heating rate of 5 ° C./min at 20, the result was 68 ° C.

【0036】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが63:37、重量比で93:7及
びエポキシ樹脂と可撓性付与剤の割合は、重量比でエポ
キシ樹脂:可撓性付与剤が60:40であった。
The ratio of the conductive powder to the binder was 63:37 by volume, and 93: 7 by weight, and the ratio of the epoxy resin to the flexibility-imparting agent was by weight: The flexibility-imparting agent was 60:40.

【0037】次に、上記で得た導電ペーストを、厚さが
1.0mmの紙フェノール銅張積層板(日立化成工業
(株)製、商品名MCL−437F)の銅箔をエッチン
グにより除去した面に、図1に示すように塗布し、17
0℃で90分間加熱処理して導電体2を得た。なお図1
において1は紙フェノール銅張積層板である。
Next, the copper foil of a 1.0 mm thick paper phenol copper-clad laminate (trade name: MCL-437F, manufactured by Hitachi Chemical Co., Ltd.) was removed from the conductive paste obtained above by etching. On the surface as shown in FIG.
Heat treatment was performed at 0 ° C. for 90 minutes to obtain a conductor 2. FIG. 1
1 is a paper phenol copper-clad laminate.

【0038】得られた導電体2の表面を#3000の耐
水研磨紙で研磨して導電体2の表面を平滑及び鏡面に
し、次いでこの平滑及び鏡面とした面にはんだフラック
スを塗布した後はんだ槽に浸積した。この後はんだ槽か
ら引き上げ、室温に放置して冷却した後、導電体2の表
面のはんだ付けされた部分についてテープ試験(粘着テ
ープを貼り付けた後引き剥がす試験)を行った。その結
果、テープにはんだが付着しておらず、導電体2の表面
にはんだ付けされていることが確認できた。
The surface of the obtained conductor 2 is polished with a water-resistant abrasive paper of # 3000 to make the surface of the conductor 2 smooth and mirror-finished, and then a solder flux is applied to the smooth and mirror-finished surface, and then a solder bath is formed. Immersion. Thereafter, the conductor was lifted from the solder bath, left to cool to room temperature, and cooled, and then a tape test (a test in which an adhesive tape was applied and then peeled off) was performed on the soldered portion of the surface of the conductor 2. As a result, it was confirmed that the solder did not adhere to the tape and was soldered to the surface of the conductor 2.

【0039】なお、本実施例におけるアスペクト比の具
体的測定法を以下に示す。低粘度のエポキシ樹脂(ビュ
ーラー社製)の主剤(No.10−8130)8gと硬
化剤(No.10−8132)2gを混合し、ここへ導
電粉2gを混合してよく分散させ、そのまま30℃で真
空脱泡した後、10時間30℃の条件下に静置して粒子
を沈降させ硬化させた。その後、得られた硬化物を垂直方
向に切断し、切断面を電子顕微鏡で1000倍に拡大し
て切断面に現れた150個の粒子について長径/短径を
求め、それらの平均値をもって、アスペクト比とした。
The specific method of measuring the aspect ratio in this embodiment will be described below. 8 g of a base material (No. 10-8130) of a low-viscosity epoxy resin (manufactured by Buehler Co.) and 2 g of a curing agent (No. 10-8132) are mixed, and 2 g of conductive powder is mixed and dispersed well, and the mixture is left as it is. After degassing in vacuo at a temperature of 10 ° C., the particles were allowed to stand at 30 ° C. for 10 hours to settle and harden the particles. Thereafter, the obtained cured product was cut in the vertical direction, the cut surface was magnified 1000 times with an electron microscope, and the long diameter / short diameter of 150 particles that appeared on the cut surface was obtained. Ratio.

【0040】実施例2 実施例1で用いたエポキシ樹脂50重量部、実施例1で
用いた脂肪族ジグリシジルエーテル50重量部、実施例
1で用いた2−フェニル−4−メチル−イミダゾール2
重量部 及びジシアンジアミド3重量部を均一に混合し
てバインダとした。
Example 2 50 parts by weight of the epoxy resin used in Example 1, 50 parts by weight of the aliphatic diglycidyl ether used in Example 1, and 2-phenyl-4-methyl-imidazole 2 used in Example 1
Parts by weight and 3 parts by weight of dicyandiamide were uniformly mixed to prepare a binder.

【0041】次に、上記で得たバインダ25gに実施例
1で得た略球状銀めっき銅粉475g及び溶剤としてエ
チルカルビトール11gを加えて、撹拌らいかい機及び
三本ロールで均一に混合、分散して導電ペーストを得
た。
Next, 475 g of the roughly spherical silver-plated copper powder obtained in Example 1 and 11 g of ethyl carbitol as a solvent were added to 25 g of the binder obtained above, and the mixture was uniformly mixed with a stirrer and a triple roll. The conductive paste was obtained by dispersion.

【0042】得られた導電ペーストを170℃で90分
間加熱処理して導電ペースト硬化物を得、次いで該導電
ペースト硬化物のTgを実施例1と同様の方法で測定し
た結果、59℃であった。
The obtained conductive paste was heat-treated at 170 ° C. for 90 minutes to obtain a cured conductive paste, and the Tg of the cured conductive paste was measured in the same manner as in Example 1. Was.

【0043】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが71:29、重量比で95:5及
びエポキシ樹脂と可撓性付与剤の割合は、重量比でエポ
キシ樹脂:可撓性付与剤が50:50であった。
The ratio of the conductive powder to the binder was 71:29 by volume, and 95: 5 by weight, and the ratio of epoxy resin to the flexibility-imparting agent was epoxy resin: weight by weight. The flexibility-imparting agent was 50:50.

【0044】次に、実施例1と同様の工程を経て導電体
を作製し、実施例1と同様のテープ試験を行った結果、テ
ープにはんだが付着しておらず、導電体にはんだ付けさ
れていることが確認できた。
Next, a conductor was produced through the same steps as in Example 1, and a tape test was performed in the same manner as in Example 1. As a result, no solder was attached to the tape, and the tape was soldered to the conductor. Was confirmed.

【0045】比較例1 実施例1で得たバインダ15gに実施例1で得た略球状
銀めっき銅粉485g及び溶剤としてエチルカルビトー
ル11gを加えて、撹拌らいかい機及び三本ロールで均
一に混合、分散したが、粘度が高く塗布するには困難な
導電ペーストであった。このため導電体を作製してのテ
ープ試験は行わなかった。
Comparative Example 1 485 g of the roughly spherical silver-plated copper powder obtained in Example 1 and 11 g of ethyl carbitol as a solvent were added to 15 g of the binder obtained in Example 1, and the mixture was uniformly mixed with a stirrer and a three-roll mill. Although mixed and dispersed, it was a conductive paste having a high viscosity and was difficult to apply. For this reason, the tape test for producing the conductor was not performed.

【0046】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが81:19、重量比で97:3及
びエポキシ樹脂と可撓性付与剤の割合は、重量比でエポ
キシ樹脂:可撓性付与剤が60:40であった。
The ratio of the conductive powder to the binder was 81:19 by volume, and 97: 3 by weight, and the ratio of the epoxy resin and the flexibility-imparting agent was by weight: The flexibility-imparting agent was 60:40.

【0047】比較例2 実施例1で得たバインダ75gに実施例1で得た略球状
銀めっき銅粉425g及び溶剤としてエチルカルビトー
ル11gを加えて、撹拌らいかい機及び三本ロールで均
一に混合、分散して導電ペーストを得た。
Comparative Example 2 To 75 g of the binder obtained in Example 1 was added 425 g of the substantially spherical silver-plated copper powder obtained in Example 1 and 11 g of ethyl carbitol as a solvent, and the mixture was uniformly mixed with a stirring mill and a three-roll mill. After mixing and dispersion, a conductive paste was obtained.

【0048】得られた導電ペーストを170℃で90分
間加熱処理して導電ペースト硬化物を得、次いで該導電
ペースト硬化物のTgを実施例1と同様の方法で測定し
た結果、68℃であった。
The obtained conductive paste was heat-treated at 170 ° C. for 90 minutes to obtain a cured conductive paste, and the Tg of the cured conductive paste was measured in the same manner as in Example 1. Was.

【0049】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが42:58、重量比で85:15
及びエポキシ樹脂と可撓性付与剤の割合は、重量比でエ
ポキシ樹脂:可撓性付与剤が60:40であった。
The ratio of the conductive powder to the binder was 42:58 by volume and 85:15 by weight.
The ratio between the epoxy resin and the flexibility-imparting agent was 60:40 in weight ratio of epoxy resin: flexibility-imparting agent.

【0050】次に、実施例1と同様の工程を経て導電体
を作製し、実施例1と同様のテープ試験を行った結果、テ
ープにはんだが付着して、導電体にはんだ付けできなか
った。
Next, a conductor was manufactured through the same steps as in Example 1, and a tape test was performed in the same manner as in Example 1. As a result, solder was adhered to the tape and could not be soldered to the conductor. .

【0051】比較例3 実施例1で用いたエポキシ樹脂100重量部、フェノー
ル樹脂(鐘紡(株)製、商品名ベルパールS−895)
16重量部 、実施例1で用いた2−フェニル−4−メ
チル−イミダゾール6重量部及びジシアンジアミド4重
量部を均一に混合してバインダとした。
Comparative Example 3 100 parts by weight of the epoxy resin used in Example 1 and a phenol resin (manufactured by Kanebo Co., Ltd., trade name: Bellpearl S-895)
16 parts by weight, 6 parts by weight of 2-phenyl-4-methyl-imidazole and 4 parts by weight of dicyandiamide used in Example 1 were uniformly mixed to prepare a binder.

【0052】次に、上記で得たバインダ35gに実施例
1で得た略球状銀めっき銅粉465g及び溶剤としてエ
チルカルビトール11gを加えて、撹拌らいかい機及び
三本ロールで均一に混合、分散して導電ペーストを得
た。
Next, 465 g of the substantially spherical silver-plated copper powder obtained in Example 1 and 11 g of ethyl carbitol as a solvent were added to 35 g of the binder obtained above, and the mixture was uniformly mixed with a stirrer and a three-roll mill. The conductive paste was obtained by dispersion.

【0053】得られた導電ペーストを170℃で90分
間加熱処理して導電ペースト硬化物を得、次いで該導電
ペースト硬化物のTgを実施例1と同様の方法で測定し
た結果、186℃であった。
The obtained conductive paste was heated at 170 ° C. for 90 minutes to obtain a cured conductive paste, and the Tg of the cured conductive paste was measured in the same manner as in Example 1. As a result, the Tg was 186 ° C. Was.

【0054】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが62:38、重量比で93:7及
びエポキシ樹脂と可撓性付与剤の割合は、重量比でエポ
キシ樹脂:可撓性付与剤が100:0であった
The ratio of the conductive powder to the binder was 62:38 by volume, and 93: 7 by weight, and the ratio of the epoxy resin to the flexibility-imparting agent was by weight: The flexibility-imparting agent was 100: 0

【0055】次に、実施例1と同様の工程を経て導電体
を作製し、実施例1と同様のテープ試験を行った結果、テ
ープにはんだが付着して、導電体にはんだ付けできなか
った。
Next, a conductor was produced through the same steps as in Example 1, and a tape test was conducted in the same manner as in Example 1. As a result, the solder adhered to the tape and could not be soldered to the conductor. .

【0056】比較例4 実施例1で用いたエポキシ樹脂35重量部、実施例1で
用いた脂肪族ジグリシジルエーテル65重量部、実施例
1で用いた2−フェニル−4−メチル−イミダゾール2
重量部及びジシアンジアミド2重量部を均一に混合して
バインダとした。
Comparative Example 4 35 parts by weight of the epoxy resin used in Example 1, 65 parts by weight of the aliphatic diglycidyl ether used in Example 1, and 2-phenyl-4-methyl-imidazole 2 used in Example 1
Parts by weight and 2 parts by weight of dicyandiamide were uniformly mixed to prepare a binder.

【0057】次に、上記で得たバインダ35gに実施例
1で得た略球状銀めっき銅粉465g及び溶剤としてエ
チルカルビトール11gを加えて、撹拌らいかい機及び
三本ロールで均一に混合、分散して導電ペーストを得
た。
Next, 465 g of the substantially spherical silver-plated copper powder obtained in Example 1 and 11 g of ethyl carbitol as a solvent were added to 35 g of the binder obtained above, and the mixture was uniformly mixed with a stirrer and a three-roll mill. The conductive paste was obtained by dispersion.

【0058】得られた導電ペーストを170℃で90分
間加熱処理して導電ペースト硬化物を得、次いで該導電
ペースト硬化物のTgを実施例1と同様の方法で測定し
た結果、37℃であった。
The obtained conductive paste was heat-treated at 170 ° C. for 90 minutes to obtain a cured conductive paste, and the Tg of the cured conductive paste was measured in the same manner as in Example 1. Was.

【0059】なお、導電粉とバインダの割合は、体積比
で導電粉:バインダが61:39、重量比で93:7及
びエポキシ樹脂と可撓性付与剤の割合は、重量比でエポ
キシ樹脂:可撓性付与剤が35:65であった
The ratio of the conductive powder to the binder was 61:39 by volume, and 93: 7 by weight, and the ratio of epoxy resin to the flexibility-imparting agent was by weight: The flexibility imparting agent was 35:65

【0060】次に、実施例1と同様の工程を経て導電体
を作製し、次いで導電体の表面を#3000の耐水研磨
紙で研磨したところ、導電ペースト硬化物の硬度が低い
ため、導電体の表面を平滑及び鏡面にする段階でくずれ
てしまい、テープ試験を行うことができなかった。
Next, a conductor was produced through the same steps as in Example 1. Then, the surface of the conductor was polished with # 3000 water-resistant abrasive paper. The surface was distorted at the stage of making the surface smooth and mirror-finished, and the tape test could not be performed.

【0061】[0061]

【発明の効果】請求項1記載の導電ペーストは、はんだ
付け性に優れる請求項2、3、4及び5記載の導電ペー
ストは、はんだ付け性の向上効果に優れる。
The conductive paste according to claim 1 is excellent in solderability, and the conductive paste according to claims 2, 3, 4 and 5 is excellent in the effect of improving solderability.

【図面の簡単な説明】[Brief description of the drawings]

【図1】紙フェノール銅張積層板上に形成した導電体の
平面図である。
FIG. 1 is a plan view of a conductor formed on a paper phenol copper-clad laminate.

【符号の説明】[Explanation of symbols]

1 紙フェノール銅張積層板 2 導電体 1 Paper phenol copper clad laminate 2 Conductor

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】導電粉及びバインダを含み、導電粉とバイ
ンダの配合割合が、導電ペーストの固形分に対して体積
比で、導電粉:バインダが45:55〜79:21及び
重量比で、導電粉:バインダが88:12〜96.5:
3.5であり、かつ導電ペースト硬化物のガラス転移点
(Tg)が40〜180℃である導電ペースト。
1. A conductive powder and a binder, wherein the mixing ratio of the conductive powder and the binder is 45:55 to 79:21 in a volume ratio with respect to the solid content of the conductive paste, and the weight ratio is: Conductive powder: Binder 88: 12-96.5:
A conductive paste having a glass transition point (Tg) of 40 to 180 ° C. which is 3.5 and a cured conductive paste.
【請求項2】バインダが、エポキシ樹脂組成物とその硬
化剤を主成分とし、エポキシ樹脂のエポキシ当量が16
0〜330g/eqである請求項1記載の導電ペース
ト。
2. A binder comprising an epoxy resin composition and a curing agent thereof as a main component and an epoxy resin having an epoxy equivalent of 16
The conductive paste according to claim 1, wherein the amount is 0 to 330 g / eq.
【請求項3】エポキシ樹脂組成物が、常温で液状のエポ
キシ樹脂及び可撓性付与剤を含み、かつエポキシ樹脂と
可撓性付与剤の配合割合が、重量比でエポキシ樹脂:可
撓性付与剤が40:60〜90:10である請求項1又
は2記載の導電ペースト。
3. The epoxy resin composition contains an epoxy resin which is liquid at room temperature and a flexibility-imparting agent, and the mixing ratio of the epoxy resin and the flexibility-imparting agent is epoxy resin: flexibility-imparting by weight ratio. The conductive paste according to claim 1 or 2, wherein the agent is 40:60 to 90:10.
【請求項4】導電粉が、銅粉又は銅合金粉の一部を露出
して表面が大略銀で被覆され、かつ形状が略球状である
請求項1、2又は3記載の導電ペースト。
4. The conductive paste according to claim 1, wherein the conductive powder exposes a part of the copper powder or the copper alloy powder and has a surface substantially covered with silver, and has a substantially spherical shape.
【請求項5】導電粉が、比表面積が0.1〜1.0m2
/g、アスペクト比が1〜1.5及び長径の平均粒径が
1〜20μmの銅粉又は銅合金粉であり、かつ銅粉又は
銅合金粉の露出面積が10〜60%の略球状導電粉であ
る請求項1、2、3又は4載の導電ペースト。
5. The conductive powder has a specific surface area of 0.1 to 1.0 m 2.
/ G, a copper powder or a copper alloy powder having an aspect ratio of 1 to 1.5 and a long diameter of 1 to 20 μm, and an exposed area of the copper powder or the copper alloy powder of approximately 60% to 60%. 5. The conductive paste according to claim 1, 2, 3 or 4, which is a powder.
JP2001036257A 2000-11-24 2001-02-14 Conductive paste Pending JP2002245850A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001036257A JP2002245850A (en) 2001-02-14 2001-02-14 Conductive paste
US09/989,060 US6515237B2 (en) 2000-11-24 2001-11-21 Through-hole wiring board
KR10-2001-0073252A KR100476285B1 (en) 2000-11-24 2001-11-23 Through-Hole Wiring Board
TW90129074A TWI224129B (en) 2000-11-24 2001-11-23 Through-hole wiring board
CNB011459069A CN1299542C (en) 2000-11-24 2001-11-23 Through-hole wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001036257A JP2002245850A (en) 2001-02-14 2001-02-14 Conductive paste

Publications (1)

Publication Number Publication Date
JP2002245850A true JP2002245850A (en) 2002-08-30

Family

ID=18899554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001036257A Pending JP2002245850A (en) 2000-11-24 2001-02-14 Conductive paste

Country Status (1)

Country Link
JP (1) JP2002245850A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015124252A (en) * 2013-12-25 2015-07-06 株式会社ノリタケカンパニーリミテド Heat-curing conductive paste

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015124252A (en) * 2013-12-25 2015-07-06 株式会社ノリタケカンパニーリミテド Heat-curing conductive paste

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