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JP2002117724A - Transparent conductive film and touch panel - Google Patents

Transparent conductive film and touch panel

Info

Publication number
JP2002117724A
JP2002117724A JP2000311422A JP2000311422A JP2002117724A JP 2002117724 A JP2002117724 A JP 2002117724A JP 2000311422 A JP2000311422 A JP 2000311422A JP 2000311422 A JP2000311422 A JP 2000311422A JP 2002117724 A JP2002117724 A JP 2002117724A
Authority
JP
Japan
Prior art keywords
transparent conductive
layer
conductive film
film
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000311422A
Other languages
Japanese (ja)
Other versions
JP4484347B2 (en
Inventor
Yuji Yoshida
裕司 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oike and Co Ltd
Original Assignee
Oike and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oike and Co Ltd filed Critical Oike and Co Ltd
Priority to JP2000311422A priority Critical patent/JP4484347B2/en
Publication of JP2002117724A publication Critical patent/JP2002117724A/en
Application granted granted Critical
Publication of JP4484347B2 publication Critical patent/JP4484347B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)
  • Position Input By Displaying (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive film and a touch panel, with high durability, high visibility on a display, and a specific anchor layer especially effective in abrasion resistance and prevention of the generation of sticking. SOLUTION: This transparent conductive film is manufactured by forming an SiOx layer serving as an anchor layer containing a siloxane bond, having center line average roughness whose Ra is 5-20 nm, formed with resin containing fine particles of an average particle size of 1-300 nm on at least one surface of a transparent base film, and forming a transparent conductive layer. This touch panel is manufactured by using the transparent conductive film.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、透明導電性フイルムに
関し、特にタッチパネル等に適用され、耐久性、ディス
プレイ上で視認性に優れ、特に耐擦傷性とステイッキン
グの発生防止に効果のある特定のアンカー層を設けた透
明導電性フイルムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive film, and more particularly to a specific film which is applied to a touch panel and the like, has excellent durability and visibility on a display, and is particularly effective for abrasion resistance and prevention of sticking. The present invention relates to a transparent conductive film provided with an anchor layer.

【0002】[0002]

【従来の技術】近年、透明導電性フイルムを使用した透
明タッチパネルが多用されている。透明タッチパネル
は、指やペンによって所定位置を押圧することで、コン
ピューター などに所定の情報等を入力するものであ
る。指やペンで入力を繰り返すと、次第に透明導電膜の
抵抗値が変化し正確に情報等が入力できない、また、指
やペンによって所定位置を押圧する際、透明導電性フイ
ルムの透明導電層と、対向する透明導電層とで、接触、
非接触が繰り返し行われることにより、歪み等が発生
し、これによりニュートンリングが発生したりし問題で
あったり、接触時に指やペンを離してもその接触が非接
触にならない即ちステイッキングが発生し使用に耐えな
いなどの課題を抱えていた。このため、フィラーを含有
する有機樹脂のコーティング層を形成し、その上に透明
導電層を形成することも提案されている。しかし、フィ
ラーを含有する有機樹脂のコーティング層を介して透明
導電膜を形成すると、ニュートンリングを防止する効果
等はあるが、コーテイング層と透明導電膜との密着性が
不十分であったり、有機樹脂のコーティング層の膜硬度
が弱い等の理由で、入力耐久性に劣り、特に表面粗さが
特定以上のもでは耐擦傷性や入力耐久性、耐溶剤性に劣
るなどの課題を有するものが殆どであった。
2. Description of the Related Art In recent years, a transparent touch panel using a transparent conductive film has been widely used. The transparent touch panel inputs predetermined information and the like to a computer or the like by pressing a predetermined position with a finger or a pen. When input is repeated with a finger or a pen, the resistance value of the transparent conductive film gradually changes and information or the like cannot be input accurately.Also, when pressing a predetermined position with a finger or a pen, a transparent conductive layer of a transparent conductive film, Contact with the opposing transparent conductive layer,
Repeated non-contact causes distortion and the like, which may cause a Newton ring or a problem, or even if a finger or pen is released at the time of contact, the contact does not become non-contact, that is, sticking occurs. There was a problem that it could not withstand use. Therefore, it has been proposed to form a coating layer of an organic resin containing a filler and form a transparent conductive layer thereon. However, when a transparent conductive film is formed via a coating layer of an organic resin containing a filler, there is an effect of preventing Newton's rings, etc., but the adhesion between the coating layer and the transparent conductive film is insufficient, Due to the low film hardness of the resin coating layer, etc., it has poor input durability, especially those with surface roughness exceeding a certain level have problems such as poor scratch resistance, input durability, and solvent resistance. Almost.

【0003】[0003]

【発明が解決しようとする課題】従って本発明は、入力
耐久性に優れ、ステイッキングの発生を防止しかつ耐擦
傷性に優れた、かつ気体不透過性に優れ耐久性にも優れ
た透明導電性フイルムを提供せんとするものである。
Accordingly, the present invention provides a transparent conductive material which is excellent in input durability, prevents sticking, is excellent in scratch resistance, is excellent in gas impermeability and is excellent in durability. No film is provided.

【0004】[0004]

【課題を解決するための手段】すなわち、本発明は、透
明基材フイルム(A.)の少なくとも一面に、少なくと
も平均粒径1〜30nmの微粒子を含む樹脂で形成され
たRaが4〜20nmの中心線平均粗さを有するアンカ
ー層(B.)、SiOx層(S.)、透明導電層
(C.)を設けたことを特徴とする透明導電性フイルム
であり、またアンカー層(B.)がシロキサン結合を含
む層であり、厚さが0.02〜10μmである前記の透
明導電性フイルムであり、さらにSiOx層(S.)の
厚さが2〜25nmである前記の透明導電性フイルムあ
り、またこれらの透明導電性フイルムを使用したタッチ
パネルである。
That is, the present invention provides a transparent base film (A.) having at least one surface having a Ra of 4 to 20 nm formed of a resin containing fine particles having an average particle diameter of 1 to 30 nm. A transparent conductive film comprising an anchor layer (B.) having a center line average roughness, a SiOx layer (S.), and a transparent conductive layer (C.). Is a layer containing a siloxane bond, the transparent conductive film having a thickness of 0.02 to 10 μm, and the transparent conductive film having a SiOx layer (S.) having a thickness of 2 to 25 nm. And a touch panel using these transparent conductive films.

【0005】[0005]

【発明の実施態様】本発明に用いる基材フイルム
(A.)としては、特に制限はないが、加工適性や用途
的に考えれば、高い透明性を有するフイルムを使用する
ことが好ましく、例えば三酢酸セルロース、アセテート
等のセルロース系樹脂や、ポリエチレンテレフタレー
ト、ポリエチレンナフタレート等のポリエステル系樹脂
や、ポリメチルメタクレート等のアクリル系樹脂や、ポ
リカーボネート樹脂類、ポリスルフォン樹脂等の、樹脂
フイルムを使用することが好ましい。これらのフイルム
の厚さも特に限定されないが、12〜300μmのもの
が好適に使用される。
BEST MODE FOR CARRYING OUT THE INVENTION The base film (A.) used in the present invention is not particularly limited, but it is preferable to use a film having high transparency in view of workability and application. Use a resin film such as a cellulose resin such as cellulose acetate or acetate, a polyester resin such as polyethylene terephthalate or polyethylene naphthalate, an acrylic resin such as polymethyl methacrylate, a polycarbonate resin, or a polysulfone resin. Is preferred. The thickness of these films is not particularly limited, but those having a thickness of 12 to 300 μm are preferably used.

【0006】本発明に用いるアンカー層(B.)は、そ
の層構成の樹脂等が特に限定されるものではないが、好
ましくは形成後の層としては、透明導電性フイルムとの
密着性向上や透明性の向上に寄与し、かつ微粒子との親
和性にもすぐれたものであるものが好ましい。該アンカ
ー層(B.)を形成する樹脂等構成成分としては、主と
して熱硬化型樹脂、若しくは電離放射線硬化型樹脂があ
り、前記した機能を有するものであれば特に限定されな
いがメラミン系樹脂、アクリレート系アルコール変性多
官能化合物、トリメチロールプロパンアクリレート、ト
リプロピレングリコールジアクリレート、ペンタエリス
トールトリアクリレート、1,6−へキサンジオールア
クリレート、チタネート系化合物、アルコキシシラン加
水分解縮合系樹脂(シロキサン結合含有樹脂)が挙げら
れる。なかでもアルコキシシラン加水分解縮合系成分
(シロキサン結合含有樹脂)が好ましく使用できる。ア
ンカー層(B.)の厚みは、特に限定されないが、透明
性と耐久性とのバランスから、0.02〜10μmの範
囲である。電離放射線硬化型樹脂は、少なくとも電子線
あるいは紫外線照射により硬化される樹脂を含有する塗
料から形成される。具体的には、光重合性プレポリマ
ー、光重合性モノマー、光重合開始剤を含有し、さらに
必要に応じて増感剤、非反応性樹脂、レベリング剤等の
添加剤、溶剤を含有するものである。
[0006] The anchor layer (B.) used in the present invention is not particularly limited in the resin or the like of the layer constitution, but it is preferable that the layer after formation has improved adhesion to a transparent conductive film. Those which contribute to improvement in transparency and have excellent affinity for fine particles are preferable. Constituents such as a resin forming the anchor layer (B.) mainly include a thermosetting resin or an ionizing radiation-curable resin, and are not particularly limited as long as they have the above-mentioned functions, but are not particularly limited, and include melamine resins and acrylates. Alcohol-modified polyfunctional compound, trimethylolpropane acrylate, tripropylene glycol diacrylate, pentaerythritol triacrylate, 1,6-hexanediol acrylate, titanate compound, alkoxysilane hydrolytic condensation resin (siloxane bond-containing resin) Is mentioned. Among them, an alkoxysilane hydrolysis-condensation-based component (siloxane bond-containing resin) can be preferably used. The thickness of the anchor layer (B.) is not particularly limited, but is in the range of 0.02 to 10 μm from the balance between transparency and durability. The ionizing radiation-curable resin is formed from a paint containing at least a resin that is cured by irradiation with an electron beam or ultraviolet rays. Specifically, it contains a photopolymerizable prepolymer, a photopolymerizable monomer, and a photopolymerization initiator, and further contains, if necessary, additives such as a sensitizer, a non-reactive resin, and a leveling agent, and a solvent. It is.

【0007】本発明において、入力耐久性に優れ、ステ
イッキングの発生を防止しかつ耐擦傷性に優れた透明導
電性フイルムを得るために、Raが4〜20nmの中心
線平均粗さ(JIS B 0601による、以下同)を
有するアンカー層(B.)を形成することが必要であ
り、このRaは好ましくは5〜10nmであり、そのた
めに樹脂等構成成分に含有せしめる、平均粒径1〜30
nmの微粒子の粒径は、平均粒径1〜30nmであるこ
とが必要である。Raが4nmに満たないときはステイ
ッキングの発生を防止する効果が不充分であり、Raが
20nmをこえるときはステイッキングの発生を防止す
る効果があっても耐擦傷性や入力耐久性、耐溶剤性にお
いて劣るものとなる。
In the present invention, in order to obtain a transparent conductive film having excellent input durability, preventing occurrence of sticking, and having excellent scratch resistance, the center line average roughness of Ra of 4 to 20 nm (JIS B 0601). It is necessary to form an anchor layer (B.) having the following; the Ra is preferably 5 to 10 nm, and for this purpose, an average particle diameter of 1 to 30 to be contained in a component such as a resin.
It is necessary that the average particle diameter of the fine particles of nm is 1 to 30 nm. When Ra is less than 4 nm, the effect of preventing the occurrence of sticking is insufficient. When Ra is more than 20 nm, the effect of preventing the occurrence of sticking is obtained, even if the effect of preventing the occurrence of sticking is obtained. Inferior in

【0008】本発明で用いる微粒子としては、特に制限
はないがシリカや、シリコーン樹脂粒子、アクリル樹脂
粒子、スチレン樹脂粒子、ナイロン樹脂粒子等が挙げら
れるが、微粒子としては、ハンドリング性、透明導電膜
との密着性を考えると、金属アルコキシドの加水分解物
等から作製される、コロイド状に無機酸化物微粒子が分
散した、金属酸化物ゾルが好ましい。コロイド状に分散
した微粒子は、分散剤等を使用して安定化させると更に
好ましい。無機酸化物微粒子としては、酸化珪素、酸化
アンチモン、酸化錫、酸化インジウム、酸化亜鉛、アル
ミナ、チタニア、ジルコニア等が挙げられる。なかで
も、価格や色目を考えると酸化珪素を分散したコロイダ
ルシリカが好ましい。透明導電層の導電効果を高めたい
場合には、酸化錫、酸化アンチモン−酸化錫等が好適に
用いることが出来る。粒子の形状は、球状もしくは球状
に近いものが好ましいが特に限定されるものではない。
微粒子の添加量は、特に限定されないが、使用する微粒
子の比重等により影響をうけるが、通常、樹脂固形分の
0.5〜60重量%、好ましくは5〜50重量%の範囲
である。
The fine particles used in the present invention include, but are not particularly limited to, silica, silicone resin particles, acrylic resin particles, styrene resin particles, nylon resin particles, and the like. Considering the adhesiveness with the metal oxide sol, a metal oxide sol prepared from a hydrolyzate of a metal alkoxide or the like and in which inorganic oxide fine particles are dispersed in a colloidal form is preferable. More preferably, the colloidally dispersed fine particles are stabilized using a dispersant or the like. Examples of the inorganic oxide fine particles include silicon oxide, antimony oxide, tin oxide, indium oxide, zinc oxide, alumina, titania, and zirconia. Among them, colloidal silica in which silicon oxide is dispersed is preferable in consideration of price and color. In order to enhance the conductive effect of the transparent conductive layer, tin oxide, antimony oxide-tin oxide, or the like can be suitably used. The shape of the particles is preferably spherical or nearly spherical, but is not particularly limited.
The amount of the fine particles to be added is not particularly limited, but is affected by the specific gravity of the fine particles to be used, but is usually in the range of 0.5 to 60% by weight, preferably 5 to 50% by weight of the resin solids.

【0009】本発明における、SiOx層(S.)は透
明基材フイルム(A.)のアンカー層(B.)、透明導
電層(C.)を設ける側に設けてもよくまたその反対面
に設けてもよいものであるが、好ましくはアンカー層
(B.)と透明導電層(C.)の間に形成することであ
る。xとしては1.5〜2.0が好ましく、その厚さは
2〜50nmが好ましく更に好ましくは5〜15nmで
ある。2nmに満たないときは後記のSiOx層
(S.)の形成効果が僅かであり、50nmを超えると
きは透明導電層(C.)の透明性の向上等のための後熱
処理などの効果を得難いなどの問題が生じ、経済的にも
得策でない。このSiOx層(S.)の形成法は特に限
定されず電子ビーム蒸着法、加熱蒸着法、スパッタリン
グ法、等公知の方法が適宜選択採用される。このSiO
x層(S.)の形成によって、得られる透明導電性フイ
ルムの透明性が向上しかつ、ペン入力等に耐えられる、
さらに該SiOx層(S.)の水蒸気バリヤー性による
と考えられる透明導電層(C.)の劣化を抑制する等、
耐久性も向上する。本発明は、透明基材フイルム
(A.)の少なくとも一面に、少なくとも平均粒径1〜
30nmの微粒子を含む樹脂で形成されたRaが4〜2
0nmの中心線平均粗さを有するアンカー層(B.)、
SiOx層(S.)、透明導電層(C.)を設けたこと
を特徴とする透明導電性フイルムであるが、透明基材フ
イルム(A.)の一面にアンカー層(B.)、SiOx
層(S.)、透明導電層(C.)を順次設ける場合は、
透明基材フイルム(A.)の他の一面にハードコート層
を設けてもよく、さらに該ハードコート層上にシリコン
−フッ素系等の防汚層を設けてもよいし、透明基材フイ
ルム(A.)とアンカー層(B.)との間にハードコー
ト層や他の層を設けてもよい。
In the present invention, the SiOx layer (S.) may be provided on the side of the transparent base film (A.) on which the anchor layer (B.) and the transparent conductive layer (C.) are provided, or on the opposite surface. Although it may be provided, it is preferably formed between the anchor layer (B.) and the transparent conductive layer (C.). x is preferably 1.5 to 2.0, and the thickness thereof is preferably 2 to 50 nm, and more preferably 5 to 15 nm. When the thickness is less than 2 nm, the effect of forming the SiOx layer (S.) described later is small, and when it exceeds 50 nm, it is difficult to obtain the effects of post-heat treatment for improving the transparency of the transparent conductive layer (C.). This is not economically feasible. The method for forming the SiOx layer (S.) is not particularly limited, and a known method such as an electron beam evaporation method, a heating evaporation method, or a sputtering method is appropriately selected and adopted. This SiO
By forming the x layer (S.), the transparency of the obtained transparent conductive film is improved, and the film can withstand a pen input or the like.
Further, the deterioration of the transparent conductive layer (C.), which is considered to be due to the water vapor barrier property of the SiOx layer (S.), is suppressed.
Durability also improves. The present invention provides at least one surface of the transparent substrate film (A.)
Ra formed of resin containing fine particles of 30 nm is 4 to 2
An anchor layer (B.) having a center line average roughness of 0 nm,
The transparent conductive film is provided with a SiOx layer (S.) and a transparent conductive layer (C.). An anchor layer (B.) and SiOx are provided on one surface of the transparent base film (A.).
When the layer (S.) and the transparent conductive layer (C.) are sequentially provided,
A hard coat layer may be provided on the other surface of the transparent base film (A.), and an antifouling layer such as a silicon-fluorine type may be provided on the hard coat layer. A.) and another layer may be provided between the anchor layer (B.) and the hard coat layer.

【0010】本発明でいうハードコート層とは鉛筆硬度
がH以上のものであり、ハードコート層形成としては、
特に限定されないが、樹脂熱硬化型樹脂、若しくは電離
放射線硬化型樹脂が挙げられ、メラミン系樹脂、アクリ
レート系アルコール変性多官能化合物、トリメチロール
プロパンアクリレート、トリプロピレングリコールジア
クリレート、ペンタエリストールトリアクリレート、
1,6−へキサンジオールアクリレート、チタネート系
化合物、アルコキシシラン加水分解縮合系樹脂(シロキ
サン結合含有樹脂)が例示できる。例えば電離放射線塗
料を用いたハードコート層の形成方法としては、通常の
塗工方法、例えば、バー、ブレード、スピン、グラビ
ア、スプレー等のコーティングで行うことができる。
The hard coat layer referred to in the present invention has a pencil hardness of H or more.
Although not particularly limited, a resin thermosetting resin, or an ionizing radiation-curable resin may be mentioned, and a melamine-based resin, an acrylate-based alcohol-modified polyfunctional compound, trimethylolpropane acrylate, tripropylene glycol diacrylate, pentaerythritol triacrylate,
Examples thereof include 1,6-hexanediol acrylate, titanate compounds, and alkoxysilane hydrolysis-condensation resins (siloxane bond-containing resins). For example, as a method for forming a hard coat layer using an ionizing radiation coating, a normal coating method, for example, bar, blade, spin, gravure, spray or the like can be used.

【0011】本発明における透明導電層(C.)として
は、金属アルコキシド等の加水分解物をコーティングす
ることによって形成される無機酸化物を主成分とするコ
ーティング層や、若しくは、CVD、EB蒸着、イオン
プレーティグ、スパッタリング、等によって形成される
ものであり、インジウム−錫系(ITO)、ZnO2
系、CdO系、SnO2系等が適宜選択使用されるもの
である。なかでも、インジウム−錫系(ITO)が好ま
しく、インジウム−錫系(ITO)における錫の含有量
が5〜15モル%であるものが特に好ましく、このイン
ジウム−錫系(ITO)においては、非結晶性のもので
もよく、結晶性のものでもよく勿論非結晶性−結晶性の
中間性(混合タイプ)のものでもよい。かくして、得ら
れた透明導電性フイルムは種々透明導電性を要求する分
野、装置に使用されるが、なかでもタッチパネルの透明
電極として好適に使用できる。
As the transparent conductive layer (C.) in the present invention, a coating layer mainly composed of an inorganic oxide formed by coating a hydrolyzate such as a metal alkoxide, or a CVD, EB evaporation, It is formed by ion plating, sputtering, or the like, and is made of indium-tin (ITO), ZnO2
System, CdO system, SnO2 system and the like are appropriately selected and used. Among them, indium-tin (ITO) is preferable, and those having a tin content of 5 to 15 mol% in the indium-tin (ITO) are particularly preferable. It may be a crystalline one, a crystalline one, or of course, an amorphous-crystalline intermediate (mixed type). The transparent conductive film thus obtained is used in various fields and devices requiring transparent conductivity, but can be suitably used as a transparent electrode of a touch panel.

【0012】[0012]

【実施例】以下、実施例により本発明を更に詳しく説明
する *実施例1 厚さ175μmのポリエチレンテレフタレートフイルム
一面上に6官能アクリレートモノマー50部、2官能ウ
レタンアクリレート31部、光開始剤3部、トルエン1
00部からなる塗料をハードコート樹脂バインダー部分
の硬化後の厚みが3μmになるようにメイヤーバーにて
塗布し、溶剤乾燥後、高圧水銀灯にて紫外線を300m
J/cm2照射し硬化させてハードコート層を形成した
(該ハードコート層の鉛筆硬度は2Hであった)。ポリ
エチレンテレフタレートフイルムの該ハードコート層を
設けた面の反対面上に、アルコキシシランの加水分解物
(実施例1と同じシロキサン結合含有樹脂成分含量)、
シクロヘキサノン、メチルイソブチルケトン、平均粒径
12nmのオルガノシリカゾルメチルイソブチルケトン
分散液(実施例1と同じシロキサン結合含有樹脂成分含
量)の混合液(固形分比、シロキサン結合含有樹脂成
分:オルガノシリカゾル成分=5.2:4.8重量比)
を、キスコートで塗布し乾燥厚さ0.02μmのアンカ
ー層を形成した。該アンカー層のRaは7.57nm
(Rzは56.3nm、測定レンジ500μm)であっ
た。このアンカーコート層上に、SiO2の10nmス
パッタリングによる薄膜を形成し、このSiO2薄膜上
に、透明導電層としてITO膜を、インジウム:錫=9
0:10(金属、モル比)のターゲットを使用し、真空
室内を10−3Paとし、ArとO2の混合ガスを導入
しながら5×10−1PaとしてDCスパッタリングで
厚さ30nmに形成し、150℃で24時間熱処理し、
透明導電性フイルムを得た。この透明導電性フイルムの
ITO膜の抵抗値は470Ω/□であり全光線透過率は
85.3%であった。得られた透明導電性フイルムを1
0cm×15cmの大きさに裁断し、2枚をITO膜が
向き合うようにして、端部を固定し、ガラス板上に固定
し、一方のポリエチレンテレフタレートフイルムのハー
ドコート層側からポリアセタール樹脂性棒の円形端部
(1cm2面積)で1Kg/cm2の加圧で圧しながら1
0cm/秒の速さでドローイングした。このドローイン
グによるITO膜同士のくっつき(ステイッキング)が
見られず、ITO膜の見かけの変化も見られず、入力耐
久性、耐溶剤性においても問題はなかった。
EXAMPLES The present invention will be described in more detail with reference to the following Examples. * Example 1 50 parts of a hexafunctional acrylate monomer, 31 parts of a bifunctional urethane acrylate, 3 parts of a photoinitiator, on one side of a polyethylene terephthalate film having a thickness of 175 μm. Toluene 1
A coating consisting of 00 parts was applied with a Mayer bar so that the thickness of the hard coat resin binder after curing was 3 μm, and after drying the solvent, ultraviolet rays were applied for 300 m with a high pressure mercury lamp.
It was irradiated with J / cm 2 and cured to form a hard coat layer (the pencil hardness of the hard coat layer was 2H). On the surface of the polyethylene terephthalate film opposite to the surface on which the hard coat layer is provided, a hydrolyzate of alkoxysilane (the same siloxane bond-containing resin component content as in Example 1),
Mixed solution of cyclohexanone, methyl isobutyl ketone, and an organosilica sol having an average particle diameter of 12 nm (the same siloxane bond-containing resin component content as in Example 1) (solid content ratio, siloxane bond-containing resin component: organosilica sol component = 5) .2: 4.8 weight ratio)
Was applied by a kiss coat to form an anchor layer having a dry thickness of 0.02 μm. Ra of the anchor layer is 7.57 nm.
(Rz: 56.3 nm, measurement range: 500 μm). This anchor coat layer, to form a thin film by 10nm sputtering of SiO 2, to the SiO 2 thin film, an ITO film as the transparent conductive layer, an indium: tin = 9
A target of 0:10 (metal, molar ratio) was used, the vacuum chamber was set to 10-3 Pa, and a mixed gas of Ar and O2 was introduced to 5 × 10-1 Pa to form a 30 nm thick film by DC sputtering. Heat treatment at ℃ for 24 hours,
A transparent conductive film was obtained. The resistance value of the ITO film of this transparent conductive film was 470 Ω / □, and the total light transmittance was 85.3%. Put the obtained transparent conductive film in 1
The sheet was cut into a size of 0 cm × 15 cm, two pieces of the film were opposed to each other with the ITO film facing each other, the ends were fixed, and the piece was fixed on a glass plate. While pressing with a pressure of 1 kg / cm 2 at the circular end (1 cm 2 area),
Drawing was performed at a speed of 0 cm / sec. No sticking (sticking) between the ITO films due to the drawing was observed, no apparent change in the ITO film was observed, and there was no problem in input durability and solvent resistance.

【0013】*実施例2 アンカー層のRaが7.12nm(Rzは66.3n
m、測定レンジ500μm)である以外は実施例1と同
様にして透明導電性フイルムを得た。得られた透明導電
性フイルムを10cm×15cmの大きさに裁断し、2
枚をITO膜が向き合うようにして、端部を固定し、ガ
ラス板上に固定し、一方のポリエチレンテレフタレート
フイルムのハードコート層側からポリアセタール樹脂性
棒の円形端部(1cm2面積)で1Kg/cm2の加圧で
圧しながら10cm/秒の速さでドローイングした。こ
のドローイングによるITO膜同士のくっつき(ステイ
ッキング)が見られず、ITO膜の見かけの変化も見ら
れず、入力耐久性、耐溶剤性においても問題はなかっ
た。
* Example 2 Ra of the anchor layer is 7.12 nm (Rz is 66.3 n)
m, measurement range 500 μm) to obtain a transparent conductive film in the same manner as in Example 1. The obtained transparent conductive film is cut into a size of 10 cm × 15 cm,
The sheets were fixed with the ITO film facing each other and the ends were fixed on a glass plate. From the hard coat layer side of one of the polyethylene terephthalate films, the circular end (1 cm 2 area) of the polyacetal resin rod was 1 kg / kg. Drawing was performed at a speed of 10 cm / sec while pressing with a pressure of cm 2 . No sticking (sticking) between the ITO films due to this drawing was observed, no apparent change in the ITO film was observed, and there was no problem in input durability and solvent resistance.

【0014】*実施例3 アンカー層のRaが4.12nm(Rzは46.3n
m、測定レンジ500μm)である以外は実施例1と同
様にして透明導電性フイルムを得た。得られた透明導電
性フイルムを10cm×15cmの大きさに裁断し、2
枚をITO膜が向き合うようにして、端部を固定し、ガ
ラス板上に固定し、一方のポリエチレンテレフタレート
フイルムのハードコート層側からポリアセタール樹脂性
棒の円形端部(1cm2面積)で1Kg/cm2の加圧で
圧しながら10cm/秒の速さでドローイングした。こ
のドローイングによるITO膜同士のくっつき(ステイ
ッキング)は極めて僅かには見られたが、ITO膜の見
かけの変化も見られず、入力耐久性、耐溶剤性において
も問題はなかった。
Example 3 Ra of the anchor layer is 4.12 nm (Rz is 46.3 n)
m, measurement range 500 μm) to obtain a transparent conductive film in the same manner as in Example 1. The obtained transparent conductive film is cut into a size of 10 cm × 15 cm,
The sheets were fixed with the ITO film facing each other and the ends were fixed on a glass plate. From the hard coat layer side of one of the polyethylene terephthalate films, the circular end (1 cm 2 area) of the polyacetal resin rod was 1 kg / kg. Drawing was performed at a speed of 10 cm / sec while pressing with a pressure of cm 2 . Although sticking between the ITO films due to the drawing was extremely slight, no apparent change was observed in the ITO film, and there was no problem in input durability and solvent resistance.

【0015】*実施例4 厚さ175μmのポリエチレンテレフタレートフイルム
一面上に6官能アクリレートモノマー50部、2官能ウ
レタンアクリレート31部、光開始剤3部、トルエン1
00部からなる塗料をハードコート樹脂バインダー部分
の硬化後の厚みが3μmになるようにメイヤーバーにて
塗布し、溶剤乾燥後、高圧水銀灯にて紫外線を300m
J/cm2照射し硬化させてハードコート層を形成した
(該ハードコート層の鉛筆硬度は2Hであった)。ポリ
エチレンテレフタレートフイルムの該ハードコート層を
設けた面の反対面上に、アルコキシシランの加水分解物
(シロキサン結合含有樹脂成分28.5重量%)、シク
ロヘキサノン、メチルイソブチルケトン、平均粒径12
nmのオルガノシリカゾルメチルイソブチルケトン分散
液(オルガノシリカゾル成分30重量%)の混合液(固
形分比、シロキサン結合含有樹脂成分:オルガノシリカ
ゾル成分=4:1重量比)を、キスコートで塗布し乾燥
厚さ0.03μmのアンカー層を形成した。該アンカー
層のRaは9.62nm(Rz(JIS B 0601
による、以下同)は84.1nm、測定レンジ500μ
m)であった。このアンカーコート層上に、SiO2
10nmスパッタリングによる薄膜を形成し、このSi
2薄膜上に、透明導電層としてITO膜を、インジウ
ム:錫=90:10(酸化物、モル比)のターゲットを
使用し、真空室内を10−3Paとし、ArとO2の混
合ガスを導入しながら5×10−1PaとしてDCスパ
ッタリングで厚さ30nmに形成し透明導電性フイルム
を得た。この透明導電性フイルムのITO膜の抵抗値は
257Ω/□であり全光線透過率は84.9%であっ
た。得られた透明導電性フイルムを10cm×15cm
の大きさに裁断し、2枚をITO膜が向き合うようにし
て、端部を固定し、ガラス板上に固定し、一方のポリエ
チレンテレフタレートフイルムのハードコート層側から
ポリアセタール樹脂性棒の円形端部(1cm2面積)で
1Kg/cm2の加圧で圧しながら10cm/秒の速さ
でドローイングした。このドローイングによるITO膜
同士のくっつき(ステイッキング)が見られず、ITO
膜の見かけの変化も見られず、入力耐久性、耐溶剤性に
おいても問題はなかった。
* Example 4 On one side of a polyethylene terephthalate film having a thickness of 175 μm, 50 parts of a 6-functional acrylate monomer, 31 parts of a bifunctional urethane acrylate, 3 parts of a photoinitiator, and 1 part of toluene
A coating consisting of 00 parts was applied with a Mayer bar so that the thickness of the hard coat resin binder after curing was 3 μm, and after drying the solvent, ultraviolet rays were applied for 300 m with a high pressure mercury lamp.
It was irradiated with J / cm 2 and cured to form a hard coat layer (the pencil hardness of the hard coat layer was 2H). On a surface of the polyethylene terephthalate film opposite to the surface on which the hard coat layer is provided, a hydrolyzate of alkoxysilane (28.5% by weight of a siloxane bond-containing resin component), cyclohexanone, methyl isobutyl ketone, and an average particle diameter of 12
A mixture liquid (solid content ratio, siloxane bond-containing resin component: organosilica sol component = 4: 1 weight ratio) of an organosilica sol methyl isobutyl ketone dispersion liquid (30 wt% of an organosilica sol component) having a thickness of 4 nm is applied by a kiss coat and dried. An anchor layer of 0.03 μm was formed. Ra of the anchor layer is 9.62 nm (Rz (JIS B 0601).
84.1 nm, measurement range 500 μm.
m). On this anchor coat layer, a thin film of SiO 2 was formed by sputtering to a thickness of 10 nm.
On the O 2 thin film, an ITO film as a transparent conductive layer, a target of indium: tin = 90: 10 (oxide, molar ratio) is used, the vacuum chamber is set to 10-3 Pa, and a mixed gas of Ar and O 2 is introduced. Then, the film was formed to a thickness of 30 nm by DC sputtering at 5 × 10 -1 Pa to obtain a transparent conductive film. The resistance value of the ITO film of this transparent conductive film was 257 Ω / □, and the total light transmittance was 84.9%. The obtained transparent conductive film is 10 cm × 15 cm.
The two pieces are cut so that the ITO film faces each other, the ends are fixed, and they are fixed on a glass plate. The circular end of the polyacetal resin rod from the hard coat layer side of one of the polyethylene terephthalate films Drawing was performed at a speed of 10 cm / sec while applying a pressure of 1 kg / cm 2 (1 cm 2 area). No sticking (sticking) between the ITO films due to this drawing was observed.
No apparent change in the film was observed, and there was no problem in input durability and solvent resistance.

【0016】*比較例1 厚さ175μmのポリエチレンテレフタレートフイルム
一面上に6官能アクリレートモノマー50部、2官能ウ
レタンアクリレート31部、光開始剤3部、トルエン1
00部からなる塗料をハードコート樹脂バインダー部分
の硬化後の厚みが3μmになるようにメイヤーバーにて
塗布し、溶剤乾燥後、高圧水銀灯にて紫外線を300m
J/cm2照射し硬化させてハードコート層を形成した
(該ハードコート層の鉛筆硬度は2Hであった)。ポリ
エチレンテレフタレートフイルムの該ハードコート層を
設けた面の反対面上に、アルコキシシランの加水分解物
(シロキサン結合含有樹脂成分)を1Kg、シクロヘキ
サノンを1Kg、メチルイソブチルケトンを5Kgの混
合液(シロキサン結合含有樹脂成分4.0%、オルガノ
シリカゾル0%)を、キスコートで塗布し乾燥厚さ25
nmのアンカー層を形成した。該アンカー層のRaは
2.90nm(Rzは23.0nm、測定レンジ500
μm)であった。このアンカーコート層上に、透明導電
層としてITO膜を、インジウム:錫=90:10(酸
化物、モル比)のターゲットを使用し、真空室内を10
−3Paとし、ArとO2の混合ガスを導入しながら5
×10−1PaとしてDCスパッタリングで厚さ30n
mに形成し透明導電性フイルムを得た。この透明導電性
フイルムのITO膜の抵抗値は275Ω/□であり全光
線透過率は84.2%であった。得られた透明導電性フ
イルムを10cm×15cmの大きさに裁断し、2枚を
ITO膜が向き合うようにして、端部を固定し、ガラス
板上に固定し、一方のポリエチレンテレフタレートフイ
ルムのハードコート層側からポリアセタール樹脂性棒の
円形端部(1cm2面積)で1Kg/cm2の加圧で圧し
ながら10cm/秒の速さでドローイングした。このド
ローイングによるITO膜同士のくっつき(ステイッキ
ング)が見られ非接触の状態に戻らず、ITO膜の一部
が損傷するのが見られた。
Comparative Example 1 On one side of a polyethylene terephthalate film having a thickness of 175 μm, 50 parts of a hexafunctional acrylate monomer, 31 parts of a bifunctional urethane acrylate, 3 parts of a photoinitiator, and 1 part of toluene
A coating consisting of 00 parts was applied with a Mayer bar so that the thickness of the hard coat resin binder after curing was 3 μm, and after drying the solvent, ultraviolet rays were applied for 300 m with a high pressure mercury lamp.
It was irradiated with J / cm 2 and cured to form a hard coat layer (the pencil hardness of the hard coat layer was 2H). On a surface of the polyethylene terephthalate film opposite to the surface on which the hard coat layer is provided, a mixed solution of 1 kg of a hydrolyzate of an alkoxysilane (a resin component containing a siloxane bond), 1 kg of cyclohexanone, and 5 kg of methyl isobutyl ketone (containing a siloxane bond). (Resin component 4.0%, organosilica sol 0%) is applied by a kiss coat to a dry thickness of 25%.
A nm anchor layer was formed. Ra of the anchor layer is 2.90 nm (Rz is 23.0 nm, measurement range 500
μm). On this anchor coat layer, an ITO film was used as a transparent conductive layer, and a target of indium: tin = 90: 10 (oxide, molar ratio) was used.
-3 Pa and 5 while introducing a mixed gas of Ar and O2.
× 10-1Pa and 30n thickness by DC sputtering
m to obtain a transparent conductive film. The resistance value of the ITO film of this transparent conductive film was 275 Ω / □, and the total light transmittance was 84.2%. The obtained transparent conductive film is cut into a size of 10 cm × 15 cm, and two films are opposed to each other with the ITO film facing each other, the ends are fixed, and the film is fixed on a glass plate, and a hard coat of one polyethylene terephthalate film is formed. Drawing was performed at a speed of 10 cm / sec while pressing with a pressure of 1 kg / cm 2 at the circular end (1 cm 2 area) of the polyacetal resin rod from the layer side. Due to this drawing, sticking (sticking) between the ITO films was observed, and the film did not return to a non-contact state, and a part of the ITO film was found to be damaged.

【0017】[0017]

【発明の効果】本願発明の透明導電性フイルムは、タッ
チパネル等に使用した時、耐擦傷性に優れ、入力耐久性
に優れ、ステイッキングの発生を防止し得る(ITO膜
同士のくっつきのない)透明導電性フイルムであった。
The transparent conductive film of the present invention, when used in a touch panel or the like, has excellent scratch resistance, excellent input durability, and can prevent the occurrence of sticking (without sticking between ITO films). It was a conductive film.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 101:00 C08L 101:00 Fターム(参考) 4F006 AA02 AA35 AA36 AB39 AB54 BA01 CA08 DA04 4F100 AA20C AA33 AK01B AK25 AK42 AK52B AR00A AR00D BA04 BA05 BA10A BA10D BA25B BA25C CA23B DD07B DE01B EH66C GB41 JG01D JK14 JK15B JN01A JN01D YY00B YY00C 5B087 AA04 CC14 CC36 5G307 FA02 FB01 FC01 FC02 FC10──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // C08L 101: 00 C08L 101: 00 F term (Reference) 4F006 AA02 AA35 AA36 AB39 AB54 BA01 CA08 DA04 4F100 AA20C AA33 AK01B AK25 AK42 AK52B AR00A AR00D BA04 BA05 BA10A BA10D BA25B BA25C CA23B DD07B DE01B EH66C GB41 JG01D JK14 JK15B JN01A JN01D YY00B YY00C 5B087 AA04 CC14 CC36 5G307 FC02 FB01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 透明基材フイルム(A.)の少なくとも
一面に、少なくとも平均粒径1〜30nmの微粒子を含
む樹脂で形成されたRaが4〜20nmの中心線平均粗
さを有するアンカー層(B.)、SiOx層(S.)、
透明導電層(C.)を設けたことを特徴とする透明導電
性フイルム。
1. An anchor layer having a center line average roughness of Ra of 4 to 20 nm formed of a resin containing fine particles having an average particle diameter of at least 1 to 30 nm on at least one surface of a transparent base film (A.). B.), SiOx layer (S.),
A transparent conductive film provided with a transparent conductive layer (C.).
【請求項2】 アンカー層(B.)がシロキサン結合を
含む層であり、厚さが0.02〜10μmである請求項
1記載の透明導電性フイルム。
2. The transparent conductive film according to claim 1, wherein the anchor layer (B.) is a layer containing a siloxane bond, and has a thickness of 0.02 to 10 μm.
【請求項3】 SiOx層(S.)の厚さが2〜25n
mである請求項1記載の透明導電性フイルム。
3. The thickness of the SiOx layer (S.) is 2 to 25 n.
2. The transparent conductive film according to claim 1, wherein m is m.
【請求項4】 請求項1から請求項3記載の透明導電性
フイルムを使用したタッチパネル。
4. A touch panel using the transparent conductive film according to claim 1.
JP2000311422A 2000-10-12 2000-10-12 Transparent conductive film and touch panel Expired - Lifetime JP4484347B2 (en)

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WO2003012799A1 (en) * 2001-07-31 2003-02-13 Toyo Boseki Kabushiki Kaisha Transparent conductive film and production method therefor, transparent conductive sheet, and touch panel
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WO2003012799A1 (en) * 2001-07-31 2003-02-13 Toyo Boseki Kabushiki Kaisha Transparent conductive film and production method therefor, transparent conductive sheet, and touch panel
JP2005294084A (en) * 2004-04-01 2005-10-20 Oike Ind Co Ltd Transparent conductive film
JP2005343120A (en) * 2004-06-07 2005-12-15 Teijin Ltd Transparent electrically conductive film for display
US8003200B2 (en) 2004-10-06 2011-08-23 Nitto Denko Corporation Transparent electrically-conductive film
US7781048B2 (en) 2005-10-20 2010-08-24 Nitto Denko Corporation Transparent conductive multilayer body
US8173246B2 (en) 2006-08-03 2012-05-08 Nitto Denko Corporation Transparent conductive laminate and touch panel equipped with it
US8048512B2 (en) 2006-08-03 2011-11-01 Nitto Denko Corporation Transparent conductive laminate and touch panel equipped with it
WO2008015840A1 (en) 2006-08-03 2008-02-07 Nitto Denko Corporation Transparent conductive laminate and touch panel equipped with it
JP2010214826A (en) * 2009-03-18 2010-09-30 Mitsubishi Plastics Inc Polyester release film
WO2010114056A1 (en) 2009-03-31 2010-10-07 帝人株式会社 Transparent conductive laminate and transparent touch panel
EP2415597A4 (en) * 2009-03-31 2014-12-31 Teijin Ltd TRANSPARENT LEADING LAMINATE AND TRANSPARENT TOUCH SCREEN
US10042481B2 (en) 2009-03-31 2018-08-07 Teijin Limited Transparent electroconductive laminate and transparent touch panel
CN105723473A (en) * 2013-11-14 2016-06-29 旭硝子株式会社 Transparent conductive laminate and touch panel
CN107422904A (en) * 2017-05-16 2017-12-01 张家港康得新光电材料有限公司 Touch-screen and electronic equipment

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