JP2002117018A - Composite calculating method for thermal fluid analysis - Google Patents
Composite calculating method for thermal fluid analysisInfo
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- JP2002117018A JP2002117018A JP2000311694A JP2000311694A JP2002117018A JP 2002117018 A JP2002117018 A JP 2002117018A JP 2000311694 A JP2000311694 A JP 2000311694A JP 2000311694 A JP2000311694 A JP 2000311694A JP 2002117018 A JP2002117018 A JP 2002117018A
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Abstract
(57)【要約】
【課題】基板上の発熱LSIの冷却構造シミュレーショ
ンなどに用いる熱流体解析に係わり、必要とされる部分
は高精度で全体的には高速で計算する複合解析方法を提
供する。
【解決手段】高速計算に適した解析手法と高精度計算に
適した解析手法を用い、高精度計算により部分的な修正
係数データを作成し、それを用いて全体系を高速計算す
ることにより、熱流体シミュレーションによる熱設計時
間を短縮することができる。
The present invention relates to a thermo-fluid analysis used for a simulation of a cooling structure of a heat-generating LSI on a substrate, and provides a complex analysis method in which required parts are calculated with high accuracy and high speed as a whole. . By using an analysis method suitable for high-speed calculation and an analysis method suitable for high-precision calculation, partial correction coefficient data is created by high-precision calculation, and the whole system is calculated at high speed using the data. Thermal design time by thermal fluid simulation can be shortened.
Description
【0001】[0001]
【発明の属する技術分野】本発明は基板上にある発熱L
SIパッケージの冷却構造,半導体製造用熱処理装置な
どの熱流体シミュレーションに係わり、特に異なる種類
の解析手法を複合させて解析する複合伝熱解析手法の高
速高精度計算方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for generating heat L on a substrate.
The present invention relates to a thermal fluid simulation of a cooling structure of an SI package, a heat treatment apparatus for manufacturing a semiconductor, and the like, and more particularly to a high-speed and high-accuracy calculation method of a combined heat transfer analysis method for performing analysis by combining different types of analysis methods.
【0002】[0002]
【従来の技術】従来の複合伝熱解析方法として、例えば
「機械の研究」、第43巻、第1号、第8頁〜第14頁
(1991年1月発行)に「機械工学におけるスーパー
コンピュータの高度利用」の中の「2.3複合伝熱解
析」として記載のように、熱伝導,熱伝達,放射などの
現象をすべて扱うことができる1つの汎用プログラムを
開発し、複合計算に使われていた。また、第29回日本
伝熱シンポジウム講演論文集、第376頁〜第377頁
(1992年5月発行)に「大学間ネットワークを用い
た大規模伝熱解析システムの開発」として記載のように
1つの伝熱問題を多数の計算機に分散させて計算し、計
算結果を相互に離散的な数値データ転送して必要とする
位置のデータを補間法により求め複合計算する方法が行
われていた。2. Description of the Related Art As a conventional composite heat transfer analysis method, for example, "Research on Machinery", Vol. 43, No. 1, pp. 8-14 (issued in January 1991), "Supercomputer in Mechanical Engineering" As described in “2.3 Complex heat transfer analysis” in “Advanced use of heat”, a single general-purpose program that can handle all phenomena such as heat conduction, heat transfer, and radiation has been developed and used for complex calculations. Had been In addition, as described in the 29th Japan Heat Transfer Symposium Proceedings, pp. 376-377 (issued in May 1992) as "Development of large-scale heat transfer analysis system using inter-university network" One heat transfer problem is calculated by distributing the calculation results to a large number of computers, and the calculation results are mutually transferred as discrete numerical data to obtain data at a required position by an interpolation method to perform a composite calculation.
【0003】[0003]
【発明が解決しようとする課題】上記の第1の従来技術
は複合伝熱解析したいすべての機能を1つの汎用プログ
ラムに含めるため、プログラム全体が非常に大きくなっ
てしまい、逆に個々の機能については計算機容量の関係
で適用範囲が小さくなってしまうという問題があった。
上記の第2の従来技術は分散させて計算する際に最も遅
い計算に計算速度が律速されてしまうという問題があっ
た。また、分散させた各計算データはすべて同じ構造の
データである必要があり、2次元構造データの解析と3
次元構造データの解析を複合計算することはできないと
いう問題があった。In the first prior art, all functions to be subjected to complex heat transfer analysis are included in one general-purpose program, so that the entire program becomes very large. Has a problem that the applicable range is reduced due to the computer capacity.
The second prior art has a problem that the calculation speed is limited by the slowest calculation when performing calculations in a distributed manner. Further, all of the distributed calculation data must have the same structure.
There was a problem that the analysis of the dimensional structure data could not be combined and calculated.
【0004】本発明の目的は、異なる種類の解析手法を
複合させて解析する場合に必要とされる部分は高精度で
全体的には高速で計算結果が求まるような解析方法を提
供することにある。また、データ構造が異なる解析手法
の複合計算が可能とするような解析方法を提供すること
にある。[0004] It is an object of the present invention to provide an analysis method in which calculation results can be obtained at high speed with high accuracy as a whole when analysis is performed by combining different types of analysis methods. is there. Another object of the present invention is to provide an analysis method that enables a composite calculation of analysis methods having different data structures.
【0005】[0005]
【課題を解決するための手段】上記の目的を達成するた
め、高速計算に適した解析手法と高精度詳細計算に適し
た解析手法を含む複数の解析手法をあらかじめ準備して
おき、問題が与えられた時に、全体系について高速計算
により温度場や速度場などの時間変化を計算する。次に
詳細に計算したい部分だけを高精度計算を行い、その結
果から全体系の高速計算に対する修正係数データを作成
する。その修正係数データを使いながら全体系の計算を
再度行うことを繰り返すことにより、全体系の解析結果
の中で必要とされる部分を高精度にし、全体系は高速で
計算する複合伝熱解析方法。In order to achieve the above object, a plurality of analysis methods including an analysis method suitable for high-speed calculation and an analysis method suitable for high-precision detailed calculation are prepared in advance, and a problem is solved. Then, the time change of the temperature field and the velocity field is calculated by the high-speed calculation for the whole system. Next, a high-precision calculation is performed only on a portion to be calculated in detail, and correction coefficient data for high-speed calculation of the entire system is created from the result. By repeating the calculation of the whole system again using the correction coefficient data, the required part in the analysis result of the whole system is made highly accurate, and the whole system is calculated at high speed. .
【0006】また、1つの解析手法により求めた解の離
散的な数値データから、多項式近似などの近似計算式に
より連続する解の計算式を導き、その計算式から他の解
析手法に必要な離散的な数値データを求めることによ
り、複数の解析手法間のデータ伝送をする複合伝熱解析
方法。[0006] From discrete numerical data of a solution obtained by one analysis method, a continuous solution expression is derived by an approximate calculation expression such as a polynomial approximation, and the discrete expression required for another analysis method is derived from the calculation expression. Heat transfer analysis method that transmits data between multiple analysis methods by obtaining typical numerical data.
【0007】[0007]
【発明の実施の形態】以下、本発明の第1の実施例を図
1から図6により説明する。図1は発熱LSIパッケージ
が多数搭載された配線基板の例を示す。コンピュータや
電話交換機などの電子装置の筐体ボックスの内部には、
配線基板1の上にフィンなしLSIパッケージ2,フィ
ン付LSIパッケージ3,コンデンサなど各種の電子部
品が実装され、この配線基板1を筐体ボックスの中に狭
い間隔で積層状に並べて収納されている。動作時に発熱
LSIパッケージの温度上昇による誤動作防止のため、
この配線基板1の横からファンで冷却風(矢印4)を流
し、LSIパッケージ2,3の温度が許容温度以下に保
つように冷却する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS. FIG. 1 shows an example of a wiring board on which a number of heating LSI packages are mounted. Inside the housing box of electronic devices such as computers and telephone exchanges,
Various electronic components such as a finless LSI package 2, a finned LSI package 3, and a capacitor are mounted on the wiring board 1, and the wiring boards 1 are housed in a housing box in a stacked manner at a narrow interval. . In order to prevent malfunction due to temperature rise of the heat-generating LSI package during operation,
Cooling air (arrow 4) flows from the side of the wiring board 1 with a fan to cool the LSI packages 2 and 3 so that the temperature of the LSI packages 2 and 3 is kept below the allowable temperature.
【0008】この冷却構造の熱設計において流れ,熱伝
導,対流,放射伝熱などの熱流体現象を複合解析により
数値シミュレーションする。その熱流体シミュレーショ
ン方法について、図2に本発明の第1の実施例の計算フ
ロー図を示す。In the thermal design of the cooling structure, numerical simulations of thermal fluid phenomena such as flow, heat conduction, convection, and radiative heat transfer are performed by complex analysis. FIG. 2 shows a calculation flow chart of the first embodiment of the present invention for the thermal fluid simulation method.
【0009】ステップ1:計算条件を与える。これは図
1のような構造データや動作条件を与えるものである。Step 1: A calculation condition is given. This provides structural data and operating conditions as shown in FIG.
【0010】ステップ2:高速解析手法により全体系の
温度分布,速度分布,熱流束分布を高速で計算する。図
1のような空冷基板の場合には節点法がその高速解析手
法の代表であるが、メッシュ分割を粗くした有限体積法
や2次元計算の有限要素法でも良い。節点法での計算メ
ッシュ条件を図3に示す。節点法では、節点5とそれを
つなぐ要素6や冷却ファン7を用いて流れ温度計算を行
う。節点法は空気層の厚さ方向に放物線分布を仮定して
計算上は分布を計算しないため(2次元構造データ)、
全体の節点数が20から1000程度に小さくなり高速
計算が可能である。図1の例について、温度分布,速度
ベクトル分布の計算結果を図4,図5に示す。この例で
は、発熱量を一定としたため計算結果は定常解だけにな
るが、発熱量が時間変化するならば温度や速度の時間変
化も計算結果となる。計算結果はすべてデータファイル
に保存する。Step 2: The temperature distribution, velocity distribution, and heat flux distribution of the entire system are calculated at high speed by a high-speed analysis method. In the case of an air-cooled substrate as shown in FIG. 1, the nodal point method is a typical high-speed analysis method, but a finite volume method with coarse mesh division or a finite element method of two-dimensional calculation may be used. FIG. 3 shows calculation mesh conditions in the node method. In the nodal method, the flow temperature is calculated using the nodal point 5, the element 6 connecting the nodal point 5, and the cooling fan 7. The nodal method assumes a parabolic distribution in the thickness direction of the air layer and does not calculate the distribution (2D structural data).
The total number of nodes is reduced from 20 to about 1000, and high-speed calculation is possible. The calculation results of the temperature distribution and the velocity vector distribution for the example of FIG. 1 are shown in FIGS. In this example, since the calorific value is fixed, the calculation result is only a steady solution, but if the calorific value changes with time, the temporal change in temperature or speed also becomes the calculation result. All calculation results are saved in a data file.
【0011】ステップ3:ユーザがステップ2の結果を
見て部分的に精度良く計算したい領域を指定する。たと
えば、図3に示す破線8で囲まれた部分を精度良く計算
することを考える。Step 3: The user designates an area to be calculated with high accuracy in part by looking at the result of step 2. For example, consider a case where a portion surrounded by a broken line 8 shown in FIG. 3 is calculated with high accuracy.
【0012】ステップ4:高精度解析手法により、与え
られた部分だけ高精度に詳細に計算する。高精度解析の
例としては有限体積法であり、詳細な計算節点(3次元
構造データ)の数は10000以上になる。この際に、
与えられた部分の周囲の境界条件としてはステップ2の
全体系の高速解析結果を用いる。全体系の高速解析結果
のデータを高精度解析に送るデータ伝送において、まず
ステップ2の解析結果の座標に対する温度や速度につい
ての離散的な数値データから多項式近似などの近似計算
により連続的な計算式を求める。Step 4: A high accuracy analysis method is used to calculate only a given portion with high accuracy in detail. An example of the high-precision analysis is the finite volume method, and the number of detailed calculation nodes (three-dimensional structure data) is 10,000 or more. At this time,
As the boundary conditions around the given portion, the results of the high-speed analysis of the entire system in step 2 are used. In the data transmission that sends the data of the high-speed analysis result of the whole system to the high-precision analysis, first, a continuous calculation formula is obtained by approximation calculation such as polynomial approximation from discrete numerical data on temperature and speed with respect to the coordinates of the analysis result in step 2. Ask for.
【0013】図1の例の場合、解析モデルから、空気層
の厚さ方向には放物線分布式を与える。なお、1つの連
続的な計算式にする必要はなく領域を分けた多数の計算
式でよいが、座標や時間に対してなめらかに連続してい
る式となっていることが重要である。次にその計算式か
ら高精度解析に必要な計算節点上の温度や速度の数値デ
ータを求めて、高精度解析を行う。高精度解析の計算結
果を全体系の解析結果に重ねて図6に示す。当然、高精
度計算の結果はステップ2の高速計算だけの結果と異な
るものであり、両者の比較から高速計算結果を高精度計
算結果に換算するための修正係数データを作成する。In the case of the example shown in FIG. 1, a parabolic distribution formula is given in the thickness direction of the air layer from the analysis model. Note that it is not necessary to use one continuous calculation formula, and a large number of calculation formulas obtained by dividing the area may be used. However, it is important that the formula be a smoothly continuous formula with respect to coordinates and time. Next, high-precision analysis is performed by obtaining temperature and speed numerical data on calculation nodes required for high-precision analysis from the calculation formula. FIG. 6 shows the calculation results of the high precision analysis superimposed on the analysis results of the entire system. Naturally, the result of the high-precision calculation is different from the result of only the high-speed calculation in step 2, and correction coefficient data for converting the high-speed calculation result into the high-precision calculation result is created based on a comparison between the two.
【0014】ステップ5:ステップ4の修正係数データ
を用いて、高速解析手法により全体系の計算をやり直
し、データファイルに保存する。修正係数データの使用
方法として、高速解析の計算結果の温度や速度に修正係
数データの値を乗じたものが高精度の解になるとして、
高速解析にて修正係数データの値を乗じた温度,速度の
変数が質量,運動量,エネルギの保存則を満足する解を
求めるものである。また、全体系の計算をやり直す際
に、ステップ4の計算結果をみて、計算条件を少し修正
してもよい。たとえば、LSIパッケージにつける冷却
フィンの寸法を少し修正してもよい。Step 5: Using the correction coefficient data of step 4, the calculation of the whole system is redone by a high-speed analysis method, and is stored in a data file. As a method of using the correction coefficient data, assuming that the value of the correction coefficient data is multiplied by the temperature and speed of the calculation result of the high-speed analysis,
A solution in which the temperature and speed variables multiplied by the values of the correction coefficient data in the high-speed analysis satisfy the conservation laws of mass, momentum, and energy. When the calculation of the entire system is redone, the calculation result may be slightly corrected based on the calculation result of step 4. For example, the size of the cooling fin attached to the LSI package may be slightly modified.
【0015】ステップ6:このステップ3〜5を繰り返
し、最終解となったら結果を出力するものである。Step 6: Steps 3 to 5 are repeated, and a result is output when a final solution is obtained.
【0016】このように、最初に全体系の高速計算を行
い必要な部分だけ高精度計算することは、従来の方法に
比較して飛躍的に計算時間を短縮できる。また、最初に
全体系の高速計算を行い必要な部分だけ高精度計算する
ことは、通常の設計手順と一致しているため、熱流体シ
ミュレーションを利用して設計しやすいという利点があ
る。また、1つの解析手法の離散的な数値データを連続
する計算式にして、他の解析手法の数値データを作成す
るため、解析手法の計算メッシュのサイズ,幾何学構
造,データ構造などによらずに一般的にデータ伝送でき
るため、どんな解析手法でも複合計算が可能になる。As described above, performing high-speed calculation of the entire system first and performing high-precision calculation only on a necessary portion can drastically reduce the calculation time as compared with the conventional method. In addition, performing high-speed calculation of the entire system first and performing high-precision calculation only on a necessary portion is consistent with a normal design procedure, and thus has an advantage that it is easy to design using a thermal fluid simulation. In addition, since discrete numerical data of one analysis method is converted into a continuous calculation formula and numerical data of another analysis method is created, regardless of the size, geometric structure, data structure, etc. of the calculation mesh of the analysis method. In general, data can be transmitted, so that any analysis method can perform complex calculations.
【0017】本発明の第2の実施例を図7から図10に
より説明する。図7は半導体製造用熱処理装置を示す。
天井面と床面にある多数のランプヒータ9,10の間に
半導体ウエハ11を挿入して熱処理するものである。周
囲は反射面12になっており、ウエハ11の周囲にリン
グ板13があり、汚染防止のため石英ガラス管14の中
に支持治具15にウエハ11を乗せて熱処理する。石英
ガラス管14の中にガスが矢印16のように流れる。こ
の場合、ウエハ表面には熱処理時間に応じて表面状態が
変化し(膜が生じるなど)、放射率などの熱物性値が変
化する。このような条件にてウエハに所定の熱処理をす
るための適正プロセス条件を熱流体シミュレーションに
よって計算する。図8に計算フロー図を示す。第1の実
施例と異なる部分だけ説明する。A second embodiment of the present invention will be described with reference to FIGS. FIG. 7 shows a heat treatment apparatus for manufacturing a semiconductor.
The semiconductor wafer 11 is inserted between a large number of lamp heaters 9 and 10 on the ceiling surface and the floor surface to perform heat treatment. The periphery is a reflection surface 12, and there is a ring plate 13 around the wafer 11. To prevent contamination, the wafer 11 is placed on a support jig 15 in a quartz glass tube 14 and heat-treated. Gas flows in the quartz glass tube 14 as indicated by an arrow 16. In this case, the surface state changes (such as formation of a film) on the wafer surface according to the heat treatment time, and the thermophysical property value such as the emissivity changes. Appropriate process conditions for performing a predetermined heat treatment on the wafer under such conditions are calculated by thermal fluid simulation. FIG. 8 shows a calculation flowchart. Only parts different from the first embodiment will be described.
【0018】ステップ2:熱流体解析プログラムによ
り、全体系の温度分布,放射熱流束分布等を計算する。
この場合に、熱処理によるウエハの表面状態の変化はな
いものと仮定する。図9にウエハの加熱20秒後の温度
分布の計算結果を示す。Step 2: The temperature distribution, the radiant heat flux distribution, etc. of the whole system are calculated by the thermo-fluid analysis program.
In this case, it is assumed that there is no change in the surface state of the wafer due to the heat treatment. FIG. 9 shows a calculation result of a temperature distribution after heating the wafer for 20 seconds.
【0019】ステップ3:通常、ウエハの熱処理温度や
熱処理時間と表面状態の変化との対応の基礎データは明
らかになっている。たとえば図10に波長3μmの赤外
光についてウエハ上の酸化膜厚と放射率との関係のデー
タを示す。ステップ2の温度変化データと、その基礎デ
ータを使いながら、各時刻ごとにウエハの表面物性値だ
けが変化した時のウエハの温度変化を計算する。ここで
はステップ2の計算と異なり、全体系の計算をせず、ウ
エハへの熱流束などはステップ2の解を用いウエハの温
度変化だけを計算する。この計算結果を用いてステップ
2の計算結果をステップ3の計算結果に換算するための
修正係数データを作成する。Step 3: Normally, basic data on the correspondence between the heat treatment temperature and the heat treatment time of the wafer and the change in the surface state has been clarified. For example, FIG. 10 shows data on the relationship between the oxide film thickness on the wafer and the emissivity for infrared light having a wavelength of 3 μm. Using the temperature change data of step 2 and its basic data, the temperature change of the wafer when only the surface property value of the wafer changes at each time is calculated. Here, unlike the calculation in step 2, the entire system is not calculated, and only the temperature change of the wafer is calculated for the heat flux to the wafer using the solution in step 2. Using this calculation result, correction coefficient data for converting the calculation result of step 2 into the calculation result of step 3 is created.
【0020】ステップ4:作成した修正係数データを用
い、ステップ2と同様の熱流体解析プログラムにより全
体系の温度分布等を計算する。Step 4: Using the created correction coefficient data, the temperature distribution and the like of the entire system are calculated by the same thermal fluid analysis program as in step 2.
【0021】このような材料物性値の時間変化の計算機
能を有する熱流体解析プログラムは特殊な計算プログラ
ムであるが、この第2の実施例による複合計算により、
その計算機能のない通常の計算プログラムを使っても、
材料物性値の時間変化を含んだ高度な計算が可能にな
る。The thermo-fluid analysis program having the function of calculating the time change of the material property value is a special calculation program.
Even if you use a normal calculation program without the calculation function,
Advanced calculations including temporal changes in material properties can be performed.
【0022】[0022]
【発明の効果】本発明により、熱流体シミュレーション
による設計時間を短縮することができ、またどんな解析
手法でも複合計算が可能となる。また通常の計算プログ
ラムを用いてその計算プログラムにない機能の計算をす
ることができる。以上の結果、設計費用を安くすること
ができる効果がある。According to the present invention, the design time by the thermal fluid simulation can be shortened, and a composite calculation can be performed by any analysis method. In addition, it is possible to calculate a function not included in the calculation program by using a normal calculation program. As a result, there is an effect that the design cost can be reduced.
【図1】基板上の発熱LSI搭載を示す傾視図。FIG. 1 is a perspective view showing mounting of a heating LSI on a substrate.
【図2】本発明の第1の実施例を計算フロー図。FIG. 2 is a calculation flow chart according to the first embodiment of the present invention.
【図3】図1の高速計算の計算節点条件を示す図。FIG. 3 is a diagram showing calculation node conditions for the high-speed calculation in FIG. 1;
【図4】図1の高速計算の温度分布の計算結果を示す
図。FIG. 4 is a diagram showing a calculation result of a temperature distribution in the high-speed calculation in FIG. 1;
【図5】図1の高速計算の速度ベクトル分布の計算結果
を示す図。FIG. 5 is a diagram showing a calculation result of a speed vector distribution in the high-speed calculation of FIG. 1;
【図6】図1の高精度計算の計算結果を全体系の解析結
果に重ねた速度ベクトル分布の計算結果を示す図。FIG. 6 is a diagram showing a calculation result of a velocity vector distribution in which the calculation result of the high-precision calculation in FIG. 1 is superimposed on the analysis result of the entire system.
【図7】半導体熱処理装置を示す垂直断面図。FIG. 7 is a vertical sectional view showing a semiconductor heat treatment apparatus.
【図8】本発明の第2の実施例を示す計算フロー図。FIG. 8 is a calculation flowchart showing a second embodiment of the present invention.
【図9】図7の温度分布の計算結果を示す図。FIG. 9 is a diagram showing a calculation result of the temperature distribution in FIG. 7;
【図10】ウエハ上の酸化膜厚と放射率との関係のデー
タを示す特性図。FIG. 10 is a characteristic diagram showing data on a relationship between an oxide film thickness on a wafer and an emissivity.
1…配線基板、2…フィンなしLSIパッケージ、3…
フィン付LSI、4…冷却風、8…精度良く計算する領
域、9,10…ランプ、11…ウエハ。1. Wiring board, 2. Finless LSI package, 3.
Finned LSI, 4 ... cooling air, 8 ... area for accurate calculation, 9, 10 ... lamp, 11 ... wafer.
Claims (1)
とにより、固体の温度分布や流体の温度分布と流速分布
を電子計算機により数値解析する複合解析方法におい
て、最初に高速計算に適した解析手法により全体系の解
析を行い、次に高精度計算に適した解析手法により部分
領域の解析を行い、その部分領域の解析結果から前記全
体系の解析結果に対する修正係数データを作成し、その
修正係数データを使用しながら全体系の解析を再度行う
ことを特徴とした熱流体解析の複合計算方法。1. A combined analysis method for numerically analyzing the temperature distribution of a solid, the temperature distribution of a fluid, and the flow velocity distribution by a computer by using a plurality of different analysis methods in combination. The analysis of the whole system is performed by the following, then the analysis of the partial region is performed by an analysis method suitable for high-precision calculation, and correction coefficient data for the analysis result of the whole system is created from the analysis result of the partial region, and the correction coefficient A combined calculation method of thermo-fluid analysis characterized by re-analyzing the whole system while using data.
Priority Applications (1)
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|---|---|---|---|
| JP2000311694A JP2002117018A (en) | 2000-10-05 | 2000-10-05 | Composite calculating method for thermal fluid analysis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000311694A JP2002117018A (en) | 2000-10-05 | 2000-10-05 | Composite calculating method for thermal fluid analysis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002117018A true JP2002117018A (en) | 2002-04-19 |
Family
ID=18791413
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000311694A Pending JP2002117018A (en) | 2000-10-05 | 2000-10-05 | Composite calculating method for thermal fluid analysis |
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| JP (1) | JP2002117018A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011067644A1 (en) | 2009-12-04 | 2011-06-09 | Toyota Jidosha Kabushiki Kaisha | Numerical analysis method of a vehicle drive |
| US8315843B2 (en) | 2008-01-14 | 2012-11-20 | Fujitsu Limited | Multi-objective optimal design support device, method and program storage medium |
| US8676548B2 (en) | 2008-12-17 | 2014-03-18 | Fujitsu Limited | Support apparatus using objective function |
| JP2014174825A (en) * | 2013-03-11 | 2014-09-22 | Denso Corp | Program, and computer-readable recording medium storing the program |
| WO2016157335A1 (en) * | 2015-03-27 | 2016-10-06 | 株式会社日立製作所 | Resin flow analysis method for electronic component, heat transmission analysis method, heat stress analysis metho, and apparatus therefor |
-
2000
- 2000-10-05 JP JP2000311694A patent/JP2002117018A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8315843B2 (en) | 2008-01-14 | 2012-11-20 | Fujitsu Limited | Multi-objective optimal design support device, method and program storage medium |
| US8676548B2 (en) | 2008-12-17 | 2014-03-18 | Fujitsu Limited | Support apparatus using objective function |
| WO2011067644A1 (en) | 2009-12-04 | 2011-06-09 | Toyota Jidosha Kabushiki Kaisha | Numerical analysis method of a vehicle drive |
| DE112010004655T5 (en) | 2009-12-04 | 2012-10-31 | Toyota Jidosha K.K. | NUMERICAL ANALYSIS METHOD OF A VEHICLE DRIVE UNIT |
| US8688315B2 (en) | 2009-12-04 | 2014-04-01 | Toyota Jidosha Kabushiki Kaisha | Numerical analysis method of a vehicle drive |
| DE112010004655B4 (en) * | 2009-12-04 | 2016-09-01 | Toyota Jidosha Kabushiki Kaisha | Numerical analysis method of a vehicle drive unit |
| JP2014174825A (en) * | 2013-03-11 | 2014-09-22 | Denso Corp | Program, and computer-readable recording medium storing the program |
| WO2016157335A1 (en) * | 2015-03-27 | 2016-10-06 | 株式会社日立製作所 | Resin flow analysis method for electronic component, heat transmission analysis method, heat stress analysis metho, and apparatus therefor |
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