JP2002116539A - Original plate of planographic printing plate - Google Patents
Original plate of planographic printing plateInfo
- Publication number
- JP2002116539A JP2002116539A JP2000310808A JP2000310808A JP2002116539A JP 2002116539 A JP2002116539 A JP 2002116539A JP 2000310808 A JP2000310808 A JP 2000310808A JP 2000310808 A JP2000310808 A JP 2000310808A JP 2002116539 A JP2002116539 A JP 2002116539A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- acid
- group
- printing plate
- sensitivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims abstract description 68
- 150000001875 compounds Chemical class 0.000 claims abstract description 68
- -1 borate compound Chemical class 0.000 claims abstract description 59
- 150000003839 salts Chemical group 0.000 claims abstract description 25
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 18
- 125000003118 aryl group Chemical group 0.000 claims abstract description 15
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 15
- 150000001768 cations Chemical class 0.000 claims abstract description 6
- 239000002243 precursor Substances 0.000 claims description 33
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 230000035945 sensitivity Effects 0.000 abstract description 48
- 238000010438 heat treatment Methods 0.000 abstract description 13
- 230000008859 change Effects 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 49
- 238000000034 method Methods 0.000 description 45
- 239000000049 pigment Substances 0.000 description 42
- 239000000975 dye Substances 0.000 description 36
- 239000000463 material Substances 0.000 description 35
- 150000003254 radicals Chemical class 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical class O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 125000004432 carbon atom Chemical group C* 0.000 description 26
- 239000000243 solution Substances 0.000 description 26
- 239000000203 mixture Substances 0.000 description 23
- 229910052782 aluminium Inorganic materials 0.000 description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 19
- 239000002253 acid Substances 0.000 description 18
- 159000000000 sodium salts Chemical class 0.000 description 18
- 125000001424 substituent group Chemical group 0.000 description 18
- 238000011282 treatment Methods 0.000 description 18
- 238000011161 development Methods 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 17
- 239000011241 protective layer Substances 0.000 description 16
- 238000012545 processing Methods 0.000 description 15
- 238000003860 storage Methods 0.000 description 15
- 239000000654 additive Substances 0.000 description 14
- 239000011230 binding agent Substances 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 11
- 239000004094 surface-active agent Substances 0.000 description 11
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 239000011734 sodium Substances 0.000 description 10
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 9
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000004372 Polyvinyl alcohol Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 229920002451 polyvinyl alcohol Polymers 0.000 description 9
- 239000000600 sorbitol Substances 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 7
- 230000000996 additive effect Effects 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 150000001408 amides Chemical class 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 239000011591 potassium Substances 0.000 description 7
- 229910052700 potassium Inorganic materials 0.000 description 7
- 238000012719 thermal polymerization Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 6
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 6
- 235000010724 Wisteria floribunda Nutrition 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 4
- 239000000987 azo dye Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 150000001642 boronic acid derivatives Chemical class 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001733 carboxylic acid esters Chemical class 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 229920003169 water-soluble polymer Polymers 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- VAJVDSVGBWFCLW-UHFFFAOYSA-N 3-Phenyl-1-propanol Chemical compound OCCCC1=CC=CC=C1 VAJVDSVGBWFCLW-UHFFFAOYSA-N 0.000 description 2
- HTSABYAWKQAHBT-UHFFFAOYSA-N 3-methylcyclohexanol Chemical compound CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 2
- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 2
- 235000011960 Brassica ruvo Nutrition 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000002679 ablation Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- 150000001241 acetals Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 239000001000 anthraquinone dye Substances 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 125000005615 azonium group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- GKRVGTLVYRYCFR-UHFFFAOYSA-N butane-1,4-diol;2-methylidenebutanedioic acid Chemical compound OCCCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O GKRVGTLVYRYCFR-UHFFFAOYSA-N 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 229920001477 hydrophilic polymer Polymers 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 2
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 2
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 150000004010 onium ions Chemical class 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- GHTWQCXOBQMUHR-UHFFFAOYSA-M potassium;2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetate Chemical compound [K+].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC([O-])=O GHTWQCXOBQMUHR-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 229940045919 sodium polymetaphosphate Drugs 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- WVFDILODTFJAPA-UHFFFAOYSA-M sodium;1,4-dihexoxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CCCCCCOC(=O)CC(S([O-])(=O)=O)C(=O)OCCCCCC WVFDILODTFJAPA-UHFFFAOYSA-M 0.000 description 1
- AZXQLMRILCCVDW-UHFFFAOYSA-M sodium;5-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(C(C)C)=CC=CC2=C1S([O-])(=O)=O AZXQLMRILCCVDW-UHFFFAOYSA-M 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 229910052718 tin Chemical group 0.000 description 1
- AFNRRBXCCXDRPS-UHFFFAOYSA-N tin(ii) sulfide Chemical compound [Sn]=S AFNRRBXCCXDRPS-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical class OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は赤外線レーザで書き
込み可能な平版印刷版原版に関し、詳しくは、高感度で
あり、経時による感度の低下が抑制されたネガ型の記録
層を有する平版印刷版原版に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lithographic printing plate precursor which can be written with an infrared laser, and more particularly, to a lithographic printing plate precursor having a high sensitivity and having a negative recording layer in which a decrease in sensitivity with time is suppressed. About.
【0002】[0002]
【従来の技術】近年におけるレーザーの発展は目ざまし
く、特に、近赤外線から赤外線領域に発光領域を持つ個
体レーザーや半導体レーザーでは、高出力・小型化が進
んでいる。したがって、コンピュータ等のディジタルデ
ータから直接製版する際の露光光源として、これらのレ
ーザーは非常に有用である。前述の赤外線領域に発光領
域を持つ赤外線レーザーを露光光源として使用する、赤
外線レーザ用ネガ型平版印刷版材料は、赤外線吸収剤
と、光又は熱によりラジカルを発生する重合開始剤と、
重合性化合物とを含む感光層を有する平版印刷版材料で
ある。2. Description of the Related Art In recent years, the development of lasers has been remarkable. In particular, solid-state lasers and semiconductor lasers having a light-emitting region from the near infrared to the infrared have been increasing in output and miniaturization. Therefore, these lasers are very useful as an exposure light source when making a plate directly from digital data of a computer or the like. Using an infrared laser having an emission region in the infrared region as an exposure light source, a negative type lithographic printing plate material for an infrared laser, an infrared absorber, and a polymerization initiator that generates radicals by light or heat,
A lithographic printing plate material having a photosensitive layer containing a polymerizable compound.
【0003】このようなネガ型の画像記録材料として
は、例えば、赤外線吸収剤、酸発生剤、レゾール樹脂及
びノボラック樹脂より成る記録材料がUS5,340,
699号に記載されている。しかしながら、このような
ネガ型の画像記録材料は、画像形成のためにはレーザ露
光後に140〜200℃で50〜120秒程度加熱する
加熱処理が必要であり、このため、露光後の加熱処理に
大掛かりな装置とエネルギーとを必要としていた。As such a negative type image recording material, for example, a recording material comprising an infrared absorber, an acid generator, a resol resin and a novolak resin is disclosed in US Pat.
No. 699. However, such a negative type image recording material requires a heat treatment of heating at 140 to 200 ° C. for about 50 to 120 seconds after laser exposure in order to form an image. It required extensive equipment and energy.
【0004】また、特公平7−103171号には、特
定の構造を有するシアニン色素、ヨードニム塩及びエチ
レン性不飽和二重結合を有する付加重合可能な化合物よ
り成る、画像様露光後の加熱処理を必要としない記録材
料が記載されているが、この画像記録材料は、重合反応
時に空気中の酸素により重合阻害がおこり、感度が不充
分であるという問題があった。さらに、特開平8−10
8621号には、汎用の熱重合開始剤である有機化酸化
物やアゾビスニトリル系化合物と熱重合性樹脂を含む画
像記録媒体が記載されているが、画像記録感度はいずれ
も200J/cm2以上であり、感度向上のためには露
光時のプレヒート処理を要するなど、実用的に必要な高
感度化は達成できていないのが、現状である。一方、感
度を向上させるため、特開2000−98603号公報
に記載されているように、それ自体が高い光重合開始能
を有するボレート化合物を開始剤として用いた場合、白
灯下で長時間取り扱った場合や長期保存した場合など
に、所望されない硬化反応が進行し、露光に対する感度
が劣化する懸念があった。Japanese Patent Publication No. 7-103171 discloses a heat treatment after imagewise exposure comprising a cyanine dye having a specific structure, an iodonium salt and an addition-polymerizable compound having an ethylenically unsaturated double bond. Although a recording material which is not required is described, this image recording material has a problem that polymerization is inhibited by oxygen in the air at the time of polymerization reaction and sensitivity is insufficient. Further, JP-A-8-10
No. 8621 describes an image recording medium containing an organic oxide or an azobisnitrile compound which is a general-purpose thermal polymerization initiator and a thermopolymerizable resin, and all have an image recording sensitivity of 200 J / cm 2. As described above, at present, practically required high sensitivity has not been achieved, for example, a preheat treatment at the time of exposure is required to improve sensitivity. On the other hand, in order to improve sensitivity, as described in JP-A-2000-98603, when a borate compound having a high photopolymerization initiation ability itself is used as an initiator, it is handled for a long time under white light. However, there is a concern that an undesired curing reaction may proceed when the composition is stored or stored for a long period of time, and the sensitivity to exposure may be degraded.
【0005】[0005]
【発明が解決しようとする課題】従って、本発明の目的
は、赤外線を放射する固体レーザ及び半導体レーザを用
いて記録することにより、コンピューター等のデジタル
データから直接記録可能であり、画像様露光後の加熱処
理を必要とせず、高感度で、経時による感度変動が抑制
された、保存安定性に優れたネガ型の平版印刷版原版を
得ることにある。Accordingly, an object of the present invention is to record directly using digital data from a computer or the like by recording using a solid-state laser or a semiconductor laser that emits infrared light. It is an object of the present invention to provide a negative type lithographic printing plate precursor which does not require a heat treatment, has high sensitivity, suppresses fluctuations in sensitivity over time, and has excellent storage stability.
【0006】[0006]
【課題を解決するための手段】本発明者は、ネガ型画像
記録材料の構成成分に着目し、鋭意検討の結果、オニウ
ム塩構造を有する高感度な開始剤に安定なボレート添加
剤を併用することで、高感度化と保存安定性の向上とを
両立しうることを見出し、本発明を完成するに至った。
即ち、本発明の平版印刷版原版は、支持体上に、(A)
オニウム塩構造を有する重合開始剤、(B)光熱変換
剤、(C)重合性の不飽和基を有する化合物、及び、
(D)下記一般式(1)で表されるボレート化合物を含
有し、赤外線レーザーで記録可能な感光層を備えること
を特徴とする。この感光層には、膜性向上などの目的
で、さらに(E)バインダーを含有することが好まし
い。Means for Solving the Problems The present inventor paid attention to the components of the negative-type image recording material, and as a result of intensive studies, as a result, used a highly sensitive initiator having an onium salt structure together with a stable borate additive. Thus, they have found that both high sensitivity and improved storage stability can be achieved, and have completed the present invention.
That is, the lithographic printing plate precursor according to the present invention comprises (A)
A polymerization initiator having an onium salt structure, (B) a photothermal conversion agent, (C) a compound having a polymerizable unsaturated group, and
(D) A photosensitive layer containing a borate compound represented by the following general formula (1) and recordable by an infrared laser. The photosensitive layer preferably further contains (E) a binder for the purpose of improving the film properties.
【0007】〔一般式(1)〕 Ar4B- M+ 式中、M+は1価のカチオン、Arはそれぞれ独立に、
芳香族基を表す。[General formula (1)] Ar 4 B - M + wherein M + is a monovalent cation and Ar is each independently
Represents an aromatic group.
【0008】本発明の作用は明確ではないが、電子供与
性のボレート化合物を含有するため、熱ラジカル発生剤
であるオニウム塩の分解が促進され、ラジカル重合性化
合物の重合が速やかに進行して、感度が向上すると考え
られる。高感度化の別の機構としては、ボレート化合物
が重合開始剤であるオニウム塩の分解により生じること
が予想されるフェニルカチオンなどを還元し、重合反応
に寄与する有効ラジカルが増加することなども挙げられ
る。また、本発明の添加剤である(D)ボレート化合物
は、芳香族基を4つ有するため、トリアリールアルキル
ボレートやジアリールジアルキルボレート等のようにそ
れ自体が高い光重合開始能を有するボレート化合物を用
いた場合と異なり、感材を白色蛍光灯下で取り扱った場
合の非画像部の硬化反応の進行(カブリ)や感材を長期
間保存した場合の画像形成性の劣化を抑制することがで
きる。Although the function of the present invention is not clear, since it contains an electron-donating borate compound, the decomposition of the onium salt as a thermal radical generator is promoted, and the polymerization of the radical polymerizable compound proceeds rapidly. It is considered that the sensitivity is improved. Another mechanism for increasing the sensitivity is that the borate compound reduces phenyl cations and the like that are expected to be generated by the decomposition of the onium salt that is the polymerization initiator, and increases the effective radicals that contribute to the polymerization reaction. Can be Further, since the (D) borate compound as an additive of the present invention has four aromatic groups, a borate compound having a high photopolymerization initiation ability itself such as a triarylalkyl borate or a diaryldialkyl borate can be used. Unlike the case where the photosensitive material is used, it is possible to suppress the progress (fogging) of the curing reaction in the non-image area when the photosensitive material is handled under a white fluorescent lamp and the deterioration of the image forming property when the photosensitive material is stored for a long time. .
【0009】なお、本発明において「ヒートモード対
応」とは、ヒートモード露光による記録が可能であるこ
とを意味する。本発明におけるヒートモード露光の定義
について詳述する。Hans−Joachim Tim
pe,IS&Ts NIP 15:1999 Inte
rnational Conference on D
igital Printing Technolog
ies.P.209に記載されているように、感光体材
料において光吸収物質(例えば色素)を光励起させ、化
学的或いは物理的変化を経て、画像を形成するその光吸
収物質の光励起から化学的或いは物理的変化までのプロ
セスには大きく分けて二つのモードが存在することが知
られている。1つは光励起された光吸収物質が感光材料
中の他の反応物質と何らかの光化学的相互作用(例え
ば、エネルギー移動、電子移動)をすることで失活し、
その結果として活性化した反応物質が上述の画像形成に
必要な化学的或いは物理変化を引き起こすいわゆるフォ
トンモードであり、もう1つは光励起された光吸収物質
が熱を発生し失活し、その熱を利用して反応物質が上述
の画像形成に必要な化学的或いは物理変化を引き起こす
いわゆるヒートモードである。その他、物質が局所的に
集まった光のエネルギーにより爆発的に飛び散るアブレ
ーションや1分子が多数の光子を一度に吸収する多光子
吸収など特殊なモードもあるがここでは省略する。In the present invention, "corresponding to heat mode" means that recording by heat mode exposure is possible. The definition of the heat mode exposure in the present invention will be described in detail. Hans-Joachim Tim
pe, IS & Ts NIP 15: 1999 Inte
rational Conference on D
digital printing technology
ies. P. As described in 209, a photoabsorbing substance (for example, a dye) is photoexcited in a photoreceptor material, and undergoes a chemical or physical change to form a chemical or physical change from the photoexcitation of the photoabsorbing substance forming an image. It is known that there are roughly two modes in the above processes. One is that the photoexcited light absorbing substance is deactivated by some photochemical interaction (eg, energy transfer, electron transfer) with other reactants in the photosensitive material,
As a result, a so-called photon mode in which the activated reactant causes a chemical or physical change required for the above-described image formation, and the other is that the photoexcited light absorbing substance generates heat and deactivates, and the heat is lost. This is a so-called heat mode in which a reactant causes a chemical or physical change required for image formation using the above-described method. In addition, there are special modes such as ablation in which substances are explosively scattered by the energy of light locally collected and multiphoton absorption in which one molecule absorbs many photons at a time, but these modes are omitted here.
【0010】上述の各モードを利用した露光プロセスを
フォトンモード露光及びヒートモード露光と呼ぶ。フォ
トンモード露光とヒートモード露光の技術的な違いは目
的とする反応のエネルギー量に対し露光する数個の光子
のエネルギー量を加算して使用できるかどうかである。
例えばn個の光子を用いて、ある反応を起こすことを考
える。フォトンモード露光では光化学的相互作用を利用
しているため、量子のエネルギー及び運動量保存則の要
請により1光子のエネルギーを足し併せて使用すること
ができない。つまり、何らかの反応を起こすためには
「1光子のエネルギー量≧反応のエネルギー量」の関係
が必要である。一方、ヒートモード露光では光励起後に
熱を発生し、光エネルギーを熱に変換し利用するためエ
ネルギー量の足し併せが可能となる。そのため、「n個
の光子のエネルギー量≧反応のエネルギー量」の関係が
あれが十分となる。但し、このエネルギー量加算には熱
拡散による制約を受ける。即ち、今注目している露光部
分(反応点)から熱拡散により熱が逃げるまでに次の光
励起−失活過程が起こり熱が発生すれば、熱は確実に蓄
積加算し、その部分の温度上昇につながる。しかし、次
の熱の発生が遅い場合には熱が逃げて蓄積されない。つ
まり、ヒートモード露光では同じ全露光エネルギー量で
あっても高エネルギー量の光を短い時間照射した場合と
低エネルギー量の光を長い時間照射した場合とでは結果
が異なり、短時間の方が熱の蓄積に有利になる。[0010] The exposure processes utilizing the above-described modes are called photon mode exposure and heat mode exposure. The technical difference between photon mode exposure and heat mode exposure is whether or not the energy amount of several photons to be exposed can be added to the energy amount of the target reaction.
For example, consider a case where a certain reaction is caused by using n photons. In photon mode exposure, photochemical interaction is used, so that the energy of one photon cannot be added together due to the requirement of the law of conservation of quantum energy and momentum. That is, in order to cause a certain reaction, the relationship of “energy amount of one photon ≧ energy amount of reaction” is necessary. On the other hand, in heat mode exposure, heat is generated after light excitation, and light energy is converted into heat and used, so that the amount of energy can be added. Therefore, the relationship “energy amount of n photons ≧ energy amount of reaction” is sufficient. However, this energy addition is restricted by thermal diffusion. That is, if the next photoexcitation-deactivation process occurs and heat is generated before the heat escapes from the exposed portion (reaction point) of interest by thermal diffusion, the heat is reliably accumulated and added, and the temperature rises in that portion. Leads to. However, when the next heat is generated slowly, the heat escapes and is not accumulated. In other words, in the heat mode exposure, the result is different between the case of irradiating a high energy light for a short time and the case of irradiating a low energy light for a long time even at the same total exposure energy. It becomes advantageous for accumulation of.
【0011】無論、フォトンモード露光では後続反応種
の拡散の影響で似た様な現象が起こる場合もあるが基本
的には、このようなことは起こらない。即ち、感光材料
の特性として見た場合、フォトンモードでは露光パワー
密度(w/cm2)(=単位時間当たりのエネルギー密
度)に対し感光材料の固有感度(画像形成に必要な反応
のためのエネルギー量)は一定となるが、ヒートモード
では露光パワー密度に対し感光材料の固有感度が上昇す
ることになる。従って、実際に画像記録材料として実用
上、必要な生産性を維持できる程度の露光時間を固定す
ると、各モードを比較した場合、フォトンモード露光で
は通常は約0.1mJ/cm2程度の高感度化が達成で
きるもののどんな少ない露光量でも反応が起こるため、
未露光部での低露光カブリの問題が生じ易い。これに対
し、ヒートモード露光ではある一定以上の露光量でない
と反応が起こらず、また感光材料の熱安定性との関係か
ら通常は50mJ/cm2程度が必要となるが、低露光
カブリの問題が回避される。そして、事実上ヒートモー
ド露光では感光材料の版面での露光パワー密度が500
0w/cm2以上が必要であり、好ましくは10000
w/cm2以上が必要となる。但し、ここでは詳しく述
べなかったが5.0×105/cm2以上の高パワー密度
レーザーを利用するとアブレーションが起こり、光源を
汚す等の問題から好ましくない。Of course, in the photon mode exposure, a similar phenomenon may occur due to the influence of the diffusion of the subsequent reactive species, but basically, such a phenomenon does not occur. That is, in terms of the characteristics of the photosensitive material, in the photon mode, the intrinsic sensitivity of the photosensitive material (the energy required for the reaction required for image formation) is compared with the exposure power density (w / cm 2 ) (= energy density per unit time). Amount) is constant, but in the heat mode, the intrinsic sensitivity of the photosensitive material increases with respect to the exposure power density. Therefore, if the exposure time is fixed such that the productivity necessary for practical use as an image recording material can be maintained, the photon mode exposure usually has a high sensitivity of about 0.1 mJ / cm 2 when comparing the modes. Reaction can be achieved at any low exposure, although
The problem of low-exposure fog in unexposed areas is likely to occur. On the other hand, in the heat mode exposure, a reaction does not occur unless the exposure amount exceeds a certain value, and usually about 50 mJ / cm 2 is required in relation to the thermal stability of the photosensitive material. Is avoided. In fact, in heat mode exposure, the exposure power density on the plate surface of the photosensitive material is 500
0 w / cm 2 or more, preferably 10,000
w / cm 2 or more is required. However, although not described in detail here, when a high power density laser of 5.0 × 10 5 / cm 2 or more is used, ablation occurs, which is not preferable because of problems such as soiling the light source.
【0012】[0012]
【発明の実施の形態】以下本発明を詳細に説明する。 [(A)オニウム塩構造を有する重合開始剤(以下、適
宜、単にオニウム塩と称する)]本発明における重合開
始剤とは、熱エネルギーによりラジカルを発生し、重合
性の不飽和基を有する化合物の重合を開始、促進させる
化合物を指す。本発明に係る重合開始剤としては、公知
の熱重合開始剤や結合解離エネルギーの小さな結合を有
する化合物などを選択して使用することができるが、感
度の観点から、以下に述べるオニウム塩構造を有するも
のが好ましい。本発明において好適に用いられるオニウ
ム塩としては、公知のジアゾニウム塩、ヨードニウム
塩、スルホニウム塩、アンモニウム塩、ピリジニウム塩
等が挙げられ、なかでも、トリアリールスルホニウム、
又は、ジアリールヨードニウムのスルホン酸塩、カルボ
ン酸塩、BF4 -、PF6 -、ClO4 -などが好ましく、さ
らに好ましいものとして、本願出願人が先に提案した特
願2000−160323号明細書に記載の、カルボキ
シレートを対アニオンに有するスルホニウム塩、ヨード
ニウム塩等が挙げられる。本発明において、これらのオ
ニウム塩は酸発生剤ではなく、ラジカル重合開始剤とし
て機能する。本発明に用いうるオニウム塩としては、下
記一般式(III)〜(V)で表されるオニウム塩が挙げ
られる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. [(A) Polymerization initiator having an onium salt structure (hereinafter, simply referred to as onium salt)] The polymerization initiator in the present invention is a compound which generates a radical by thermal energy and has a polymerizable unsaturated group. Refers to a compound that initiates and promotes the polymerization of As the polymerization initiator according to the present invention, a known thermal polymerization initiator or a compound having a bond having a small bond dissociation energy can be selected and used.From the viewpoint of sensitivity, the onium salt structure described below is used. Are preferred. Examples of the onium salt suitably used in the present invention include known diazonium salts, iodonium salts, sulfonium salts, ammonium salts, pyridinium salts and the like, among which triarylsulfonium,
Alternatively, a diaryl iodonium sulfonate, a carboxylate, BF 4 − , PF 6 − , ClO 4 − or the like is preferable. The sulfonium salts and iodonium salts having a carboxylate as a counter anion described above can be used. In the present invention, these onium salts function not as an acid generator but as a radical polymerization initiator. Examples of the onium salt that can be used in the present invention include onium salts represented by the following general formulas (III) to (V).
【0013】[0013]
【化1】 Embedded image
【0014】式(III)中、Ar11とAr12は、それぞ
れ独立に、置換基を有していても良い炭素原子数20個
以下のアリール基を示す。このアリール基が置換基を有
する場合の好ましい置換基としては、ハロゲン原子、ニ
トロ基、炭素原子数12個以下のアルキル基、炭素原子
数12個以下のアルコキシ基、または炭素原子数12個
以下のアリールオキシ基が挙げられる。Z11-はハロゲ
ンイオン、過塩素酸イオン、テトラフルオロボレートイ
オン、ヘキサフルオロホスフェートイオン、およびスル
ホン酸イオンからなる群より選択される対イオンを表
し、好ましくは、過塩素酸イオン、ヘキサフルオロフォ
スフェートイオン、およびアリールスルホン酸イオンで
ある。式(IV)中、Ar21は、置換基を有していても良
い炭素原子数20個以下のアリール基を示す。好ましい
置換基としては、ハロゲン原子、ニトロ基、炭素原子数
12個以下のアルキル基、炭素原子数12個以下のアル
コキシ基、炭素原子数12個以下のアリールオキシ基、
炭素原子数12個以下のアルキルアミノ基、炭素原子数
12個以下のジアルキルアミノ基、炭素原子数12個以
下のアリールアミノ基または、炭素原子数12個以下の
ジアリールアミノ基が挙げられる。Z21 -はZ11-と同義
の対イオンを表す。式(V)中、R31、R32及びR
33は、それぞれ同じでも異なっていても良く、置換基を
有していても良い炭素原子数20個以下の炭化水素基を
示す。好ましい置換基としては、ハロゲン原子、ニトロ
基、炭素原子数12個以下のアルキル基、炭素原子数1
2個以下のアルコキシ基、または炭素原子数12個以下
のアリールオキシ基が挙げられる。Z31-はZ11-と同義
の対イオンを表す。In the formula (III), Ar 11 and Ar 12 each independently represent an aryl group having 20 or less carbon atoms which may have a substituent. When the aryl group has a substituent, preferred substituents include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or a 12 or less carbon atom. Aryloxy groups. Z 11- represents a counter ion selected from the group consisting of a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion, and is preferably a perchlorate ion or a hexafluorophosphate. And arylsulfonate ions. In the formula (IV), Ar 21 represents an aryl group having 20 or less carbon atoms which may have a substituent. Preferred substituents include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, an aryloxy group having 12 or less carbon atoms,
Examples include an alkylamino group having 12 or less carbon atoms, a dialkylamino group having 12 or less carbon atoms, an arylamino group having 12 or less carbon atoms, and a diarylamino group having 12 or less carbon atoms. Z 21 - represents a counter ion of the same meaning as Z 11-. In the formula (V), R 31 , R 32 and R
33 is the same or different, and represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferred substituents include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, and a 1-carbon atom.
Examples include an alkoxy group having 2 or less or an aryloxy group having 12 or less carbon atoms. Z 31- represents a counter ion having the same meaning as Z 11- .
【0015】本発明において、好適に用いることのでき
る一般式(III)で示されるオニウム塩([OI−1]
〜[OI−10])、一般式(IV)で示されるオニウム
塩([ON−1]〜[ON−5])、及び一般式(V)
で示されるオニウム塩([OS−1]〜[OS−6])
の具体例を以下に挙げる。In the present invention, an onium salt ([OI-1]) represented by the general formula (III) which can be suitably used:
To [OI-10]), onium salts represented by the general formula (IV) ([ON-1] to [ON-5]), and the general formula (V)
Onium salts represented by the formula ([OS-1] to [OS-6])
Specific examples are described below.
【0016】[0016]
【化2】 Embedded image
【0017】[0017]
【化3】 Embedded image
【0018】[0018]
【化4】 Embedded image
【0019】[0019]
【化5】 Embedded image
【0020】本発明において用いられるオニウム塩は、
極大吸収波長が400nm以下であることが好ましく、
さらに360nm以下であることが好ましい。このよう
に吸収波長を紫外線領域にすることにより、画像記録材
料の取り扱いを白灯下で実施することができる。The onium salt used in the present invention is
Preferably, the maximum absorption wavelength is 400 nm or less,
Further, the thickness is preferably 360 nm or less. By setting the absorption wavelength in the ultraviolet region, the image recording material can be handled under a white light.
【0021】これらのオニウム塩は、画像記録材料全固
形分に対し0.1〜40重量%、好ましくは0.5〜3
0重量%、特に好ましくは1〜20重量%の割合で画像
記録材料中に添加することができる。添加量が0.1重
量%未満であると感度が低くなり、また40重量%を越
えると印刷時非画像部に汚れが発生する。これらのオニ
ウム塩は、1種のみを用いても良いし、2種以上を併用
しても良い。また、これらのオニウム塩は他の成分と同
一の層に添加してもよいし、別の層を設けそこへ添加し
てもよい。These onium salts are used in an amount of 0.1 to 40% by weight, preferably 0.5 to 3% by weight, based on the total solid content of the image recording material.
0% by weight, particularly preferably 1 to 20% by weight, can be added to the image recording material. If the addition amount is less than 0.1% by weight, the sensitivity is lowered, and if it exceeds 40% by weight, the non-image area is stained during printing. One of these onium salts may be used alone, or two or more thereof may be used in combination. Further, these onium salts may be added to the same layer as other components, or another layer may be provided and added thereto.
【0022】[(D)一般式(1)で表されるボレート
化合物]本発明の平版印刷版原版の感光層における特徴
的な添加剤として、下記一般式(1)で表される芳香族
基を4つ有するボレート化合物が挙げられる。このよう
なボレート化合物を本明細書中において、適宜、テトラ
アリールボレートと称する。 〔一般式(1)〕 Ar4B- M+ 式中、4つのArはそれぞれ独立に、炭素原子数が6〜
18の芳香族基を表す。これらの芳香族基は1つあるい
は2つ以上の置換基を有していてもよく、好ましい置換
基の例としては、ハロゲン原子、炭素原子数1〜8の直
鎖状或いは分岐のアルキル基、アリール基、アルケニル
基、カルボニル基、カルボキシル基、アミド基、アセチ
ル基、エーテル基、チオエーテル基、エステル基、アミ
ノ基、またはこれらを2種以上組み合わせたものが挙げ
られる。これらの芳香族基のなかでも、安定性の観点か
らは、無置換の芳香族基、或いは、ハロゲン原子、ハロ
アルキル基を置換基として有するものが好ましく、さら
に好ましくは、一分子中にフッ素原子を4個以上有する
か、或いは、置換基として、4個以上のフッ化アルキル
基を有するボレート化合物が挙げられる。[(D) Borate compound represented by the general formula (1)] As a characteristic additive in the photosensitive layer of the lithographic printing plate precursor according to the invention, an aromatic group represented by the following general formula (1) And a borate compound having four. Such a borate compound is appropriately referred to as a tetraaryl borate in this specification. [Formula (1)] Ar 4 B - M + wherein, each independently four Ar,. 6 to carbon atoms
Represents 18 aromatic groups. These aromatic groups may have one or more substituents. Examples of preferred substituents include a halogen atom, a linear or branched alkyl group having 1 to 8 carbon atoms, Examples include an aryl group, an alkenyl group, a carbonyl group, a carboxyl group, an amide group, an acetyl group, an ether group, a thioether group, an ester group, an amino group, or a combination of two or more of these. Among these aromatic groups, from the viewpoint of stability, an unsubstituted aromatic group, or a group having a halogen atom or a haloalkyl group as a substituent is preferable, and more preferably, a fluorine atom is contained in one molecule. A borate compound having four or more or a substituent having four or more fluorinated alkyl groups is exemplified.
【0023】また、カチオンであるM+の好ましい例と
しては、アルカリ金属イオン、Li+、或いは、”Onium
ions”(A. Olha, Kennneth K. Laali, Qi Wang, G.K.
Surya Prakashら著、出版:A Wiley-Intorscience Pub
ilcation )に記載のアゾニウム塩(アンモニウム塩、
ジアゾニウム塩)、オキソニウム塩、ホスホニウム塩、
スルホニウム塩、ハロニウム塩、シリコニウム塩等、或
いは、ピリジニウム塩、ヨードニウム塩のカチオン部な
どを挙げることができ、感度の観点より、アゾニウム、
ピリジニウム、アルカリ金属イオンなどがより好まし
い。Preferred examples of the cation M + include an alkali metal ion, Li + , and “Onium
ions ”(A. Olha, Kennneth K. Laali, Qi Wang, GK
Published by A Wiley-Intorscience Pub, Surya Prakash et al.
ilcation) azonium salts (ammonium salts,
Diazonium salts), oxonium salts, phosphonium salts,
Sulfonium salts, halonium salts, siliconium salts and the like, or pyridinium salts and cation portions of iodonium salts and the like, from the viewpoint of sensitivity, azonium,
Pyridinium and alkali metal ions are more preferred.
【0024】以下に一般式(1)で表されるボレート化
合物の好ましい具体例〔(D−1)〜(D−28)〕を
示すが、本発明はこれらに限定されるものではない。Preferred specific examples of the borate compound represented by the general formula (1) [(D-1) to (D-28)] are shown below, but the present invention is not limited thereto.
【0025】[0025]
【化6】 Embedded image
【0026】[0026]
【化7】 Embedded image
【0027】[0027]
【化8】 Embedded image
【0028】これらのボレート化合物は、一種のみを添
加しても、二種以上を併用してもよい。添加量として
は、画像記録材料全固形分に対し0.1〜30重量%、
好ましくは0.5〜25重量%、特に好ましくは1〜2
0重量%の割合で添加することができる。添加量が0.
1重量%未満であると感度向上効果が不充分となり、ま
た30重量%を超えて添加すると安定性に懸念がある。These borate compounds may be used alone or in combination of two or more. The addition amount is 0.1 to 30% by weight based on the total solid content of the image recording material,
Preferably from 0.5 to 25% by weight, particularly preferably from 1 to 2% by weight.
0% by weight can be added. The amount added is 0.
If it is less than 1% by weight, the effect of improving sensitivity becomes insufficient, and if it exceeds 30% by weight, there is a concern about stability.
【0029】[(B)光熱変換剤]本発明において、感
光層に含まれる光熱変換剤としては、赤外線レーザの照
射により熱を発生する光熱変換機能を有する物質であれ
ば特に制限はなく、公知の所謂赤外線吸収剤を用いるこ
とができる。本発明において使用される光熱変換剤は、
波長760nmから1200nmに吸収極大を有する赤
外線吸収性染料又は顔料であることが好ましい。[(B) Photothermal Conversion Agent] In the present invention, the photothermal conversion agent contained in the photosensitive layer is not particularly limited as long as it has a photothermal conversion function of generating heat by irradiation with an infrared laser. So-called infrared absorbers can be used. The photothermal conversion agent used in the present invention is
An infrared absorbing dye or pigment having an absorption maximum at a wavelength of 760 nm to 1200 nm is preferable.
【0030】染料としては、市販の染料及び例えば「染
料便覧」(有機合成化学協会編集、昭和45年刊)等の
文献に記載されている公知のものが利用できる。具体的
には、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染
料、ナフトキノン染料、アントラキノン染料、フタロシ
アニン染料、カルボニウム染料、キノンイミン染料、メ
チン染料、シアニン染料、スクワリリウム色素、ピリリ
ウム塩、金属チオレート錯体等の染料が挙げられる。As the dye, commercially available dyes and known dyes described in literatures such as "Dye Handbook" (edited by the Society of Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinone imine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes Is mentioned.
【0031】好ましい染料としては、例えば、特開昭5
8−125246号、特開昭59−84356号、特開
昭59−202829号、特開昭60−78787号等
に記載されているシアニン染料、特開昭58−1736
96号、特開昭58−181690号、特開昭58−1
94595号等に記載されているメチン染料、特開昭5
8−112793号、特開昭58−224793号、特
開昭59−48187号、特開昭59−73996号、
特開昭60−52940号、特開昭60−63744号
等に記載されているナフトキノン染料、特開昭58−1
12792号等に記載されているスクワリリウム色素、
英国特許434,875号記載のシアニン染料等を挙げ
ることができる。Preferred dyes include, for example, those described in
Cyanine dyes described in JP-A-8-125246, JP-A-59-84356, JP-A-59-202829 and JP-A-60-78787;
No. 96, JP-A-58-181690, JP-A-58-1
No. 94595, etc., methine dyes described in
8-112793, JP-A-58-224793, JP-A-59-48187, JP-A-59-73996,
Naphthoquinone dyes described in JP-A-60-52940 and JP-A-60-63744;
Squarylium dyes described in No. 12792, etc.,
Cyanine dyes described in British Patent 434,875 and the like can be mentioned.
【0032】また、米国特許第5,156,938号記
載の近赤外吸収増感剤も好適に用いられ、また、米国特
許第3,881,924号記載の置換されたアリールベ
ンゾ(チオ)ピリリウム塩、特開昭57−142645
号(米国特許第4,327,169号)記載のトリメチ
ンチアピリリウム塩、特開昭58−181051号、同
58−220143号、同59−41363号、同59
−84248号、同59−84249号、同59−14
6063号、同59−146061号に記載されている
ピリリウム系化合物、特開昭59−216146号記載
のシアニン色素、米国特許第4,283,475号に記
載のペンタメチンチオピリリウム塩等や特公平5−13
514号、同5−19702号に開示されているピリリ
ウム化合物も好ましく用いられる。Further, a near-infrared absorption sensitizer described in US Pat. No. 5,156,938 is preferably used, and a substituted arylbenzo (thio) described in US Pat. No. 3,881,924 is also preferable. Pyrylium salt, JP-A-57-142645
No. (U.S. Pat. No. 4,327,169), trimethinethiapyrylium salts described in JP-A-58-181051, 58-220143, 59-41363, and 59.
Nos. -84248, 59-84249, 59-14
Nos. 6063 and 59-146061, pyranyl compounds, cyanine dyes described in JP-A-59-216146, pentamethinethiopyrylium salts described in U.S. Pat. No. 4,283,475, and the like. Fairness 5-13
Pyrylium compounds disclosed in JP-A-514 and JP-A-5-19702 are also preferably used.
【0033】また、染料として好ましい別の例として米
国特許第4,756,993号明細書中に式(I)、
(II)として記載されている近赤外吸収染料を挙げるこ
とができる。Further, as another preferred example of the dye, US Pat. No. 4,756,993 discloses a compound represented by the formula (I):
Near-infrared absorbing dyes described as (II) can be mentioned.
【0034】これらの染料のうち特に好ましいものとし
ては、シアニン色素、スクワリリウム色素、ピリリウム
塩、ニッケルチオレート錯体が挙げられる。さらに、シ
アニン色素が好ましく、特に下記一般式(I)で示され
るシアニン色素が最も好ましい。Among these dyes, particularly preferred are cyanine dyes, squarylium dyes, pyrylium salts, and nickel thiolate complexes. Further, a cyanine dye is preferable, and a cyanine dye represented by the following general formula (I) is most preferable.
【0035】[0035]
【化9】 Embedded image
【0036】一般式(I)中、X1は、ハロゲン原子、
−NPh2、またはX2−L1を示す。ここで、X2は酸素
原子または、硫黄原子を示し、L1は、炭素原子数1〜
12の炭化水素基を示す。R1およびR2は、それぞれ独
立に、炭素原子数1〜12の炭化水素基を示す。感光層
塗布液の保存安定性から、R1およびR2は、炭素原子数
2個以上の炭化水素基であることが好ましく、さらに、
R1とR2とは互いに結合し、5員環または6員環を形成
していることが特に好ましい。In the general formula (I), X 1 is a halogen atom,
-NPh 2, or an X 2 -L 1. Here, X 2 represents an oxygen atom or a sulfur atom, and L 1 has 1 to 1 carbon atoms.
And 12 hydrocarbon groups. R 1 and R 2 each independently represent a hydrocarbon group having 1 to 12 carbon atoms. From the storage stability of the photosensitive layer coating solution, R 1 and R 2 are preferably a hydrocarbon group having 2 or more carbon atoms.
It is particularly preferred that R 1 and R 2 are bonded to each other to form a 5- or 6-membered ring.
【0037】Ar1、Ar2は、それぞれ同じでも異なっ
ていても良く、置換基を有していても良い芳香族炭化水
素基を示す。好ましい芳香族炭化水素基としては、ベン
ゼン環およびナフタレン環が挙げられる。また、好まし
い置換基としては、炭素原子数12個以下の炭化水素
基、ハロゲン原子、炭素原子数12個以下のアルコキシ
基が挙げられる。Y1、Y2は、それぞれ同じでも異なっ
ていても良く、硫黄原子または炭素原子数12個以下の
ジアルキルメチレン基を示す。R3、R4は、それぞれ同
じでも異なっていても良く、置換基を有していても良い
炭素原子数20個以下の炭化水素基を示す。好ましい置
換基としては、炭素原子数12個以下のアルコキシ基、
カルボキシル基、スルホ基が挙げられる。R5、R6、R
7およびR8は、それぞれ同じでも異なっていても良く、
水素原子または炭素原子数12個以下の炭化水素基を示
す。原料の入手性から、好ましくは水素原子である。ま
た、Z1-は、対アニオンを示す。ただし、R1〜R8のい
ずれかにスルホ基が置換されている場合は、Z1-は必要
ない。好ましいZ1-は、感光層塗布液の保存安定性か
ら、ハロゲンイオン、過塩素酸イオン、テトラフルオロ
ボレートイオン、ヘキサフルオロホスフェートイオン、
およびスルホン酸イオンであり、特に好ましくは、過塩
素酸イオン、ヘキサフルオロフォスフェートイオン、お
よびアリールスルホン酸イオンである。Ar 1 and Ar 2 may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent. Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring. Preferred examples of the substituent include a hydrocarbon group having 12 or less carbon atoms, a halogen atom, and an alkoxy group having 12 or less carbon atoms. Y 1 and Y 2 may be the same or different and each represents a sulfur atom or a dialkylmethylene group having 12 or less carbon atoms. R 3 and R 4 may be the same or different, and represent a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferred substituents include alkoxy groups having 12 or less carbon atoms,
Examples include a carboxyl group and a sulfo group. R 5 , R 6 , R
7 and R 8 may be the same or different,
It represents a hydrogen atom or a hydrocarbon group having 12 or less carbon atoms. From the viewpoint of availability of raw materials, a hydrogen atom is preferable. Z 1- represents a counter anion. However, when any of R 1 to R 8 is substituted with a sulfo group, Z 1− is not necessary. Preferred Z 1− is, from the storage stability of the photosensitive layer coating solution, a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion,
And sulfonate ions, particularly preferably perchlorate ion, hexafluorophosphate ion and arylsulfonate ion.
【0038】本発明において、好適に用いることのでき
る一般式(I)で示されるシアニン色素の具体例として
は、特願平11−310623号明細書の段落番号[0
017]〜[0019]、特願2000−224031
号明細書の段落番号[0012]〜[0038]、特願
2000−211147号明細書の段落番号[001
2]〜[0023]に記載されたものを挙げることがで
きる。In the present invention, specific examples of the cyanine dye represented by the general formula (I) which can be suitably used include paragraph [0] of Japanese Patent Application No. 11-310623.
017] to [0019], Japanese Patent Application No. 2000-224031.
Nos. [0012] to [0038] in the specification, and paragraph [001] in the specification of Japanese Patent Application No. 2000-21147.
2] to [0023].
【0039】本発明において光熱変換剤として使用され
る顔料としては、市販の顔料及びカラーインデックス
(C.I.)便覧、「最新顔料便覧」(日本顔料技術協
会編、1977年刊)、「最新顔料応用技術」(CMC
出版、1986年刊)、「印刷インキ技術」CMC出
版、1984年刊)に記載されている顔料が挙げられ
る。Examples of the pigment used as a photothermal conversion agent in the present invention include commercially available pigments and Color Index (CI) Handbook, "Saishin Pigment Handbook" (edited by Japan Pigment Technical Association, published in 1977), "Saishin Pigment" Application Technology ”(CMC
Publishing, 1986) and "Printing Ink Technology", CMC Publishing, 1984).
【0040】顔料の種類としては、黒色顔料、黄色顔
料、オレンジ色顔料、褐色顔料、赤色顔料、紫色顔料、
青色顔料、緑色顔料、蛍光顔料、金属粉顔料、その他、
ポリマー結合色素が挙げられる。具体的には、不溶性ア
ゾ顔料、アゾレーキ顔料、縮合アゾ顔料、キレートアゾ
顔料、フタロシアニン系顔料、アントラキノン系顔料、
ペリレン及びペリノン系顔料、チオインジゴ系顔料、キ
ナクリドン系顔料、ジオキサジン系顔料、イソインドリ
ノン系顔料、キノフタロン系顔料、染付けレーキ顔料、
アジン顔料、ニトロソ顔料、ニトロ顔料、天然顔料、蛍
光顔料、無機顔料、カーボンブラック等が使用できる。
これらの顔料のうち好ましいものはカーボンブラックで
ある。The pigments include black pigment, yellow pigment, orange pigment, brown pigment, red pigment, purple pigment,
Blue pigment, green pigment, fluorescent pigment, metal powder pigment, etc.
Polymer-bound dyes. Specifically, insoluble azo pigments, azo lake pigments, condensation azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments,
Perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments, quinophthalone pigments, dyeing lake pigments,
Azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black and the like can be used.
Preferred among these pigments is carbon black.
【0041】これら顔料は表面処理をせずに用いてもよ
く、表面処理を施して用いてもよい。表面処理の方法に
は、樹脂やワックスを表面コートする方法、界面活性剤
を付着させる方法、反応性物質(例えば、シランカップ
リング剤、エポキシ化合物、ポリイソシアネート等)を
顔料表面に結合させる方法等が考えられる。上記の表面
処理方法は、「金属石鹸の性質と応用」(幸書房)、
「印刷インキ技術」(CMC出版、1984年刊)及び
「最新顔料応用技術」(CMC出版、1986年刊)に
記載されている。These pigments may be used without being subjected to a surface treatment, or may be used after being subjected to a surface treatment. Examples of the surface treatment include a method of surface coating a resin or wax, a method of attaching a surfactant, and a method of bonding a reactive substance (eg, a silane coupling agent, an epoxy compound, a polyisocyanate, etc.) to the pigment surface. Can be considered. The above surface treatment methods are described in "Properties and Applications of Metallic Soap" (Koshobo),
It is described in "Printing Ink Technology" (CMC Publishing, 1984) and "Latest Pigment Application Technology" (CMC Publishing, 1986).
【0042】顔料の粒径は0.01μm〜10μmの範
囲にあることが好ましく、0.05μm〜1μmの範囲
にあることがさらに好ましく、特に0.1μm〜1μm
の範囲にあることが好ましい。顔料の粒径が0.01μ
m未満のときは分散物の画像感光層塗布液中での安定性
の点で好ましくなく、また、10μmを越えると画像感
光層の均一性の点で好ましくない。The particle size of the pigment is preferably in the range of 0.01 μm to 10 μm, more preferably in the range of 0.05 μm to 1 μm, and particularly preferably in the range of 0.1 μm to 1 μm.
Is preferably within the range. Pigment particle size 0.01μ
When it is less than m, it is not preferable in terms of stability of the dispersion in the coating solution of the image-sensitive layer, and when it exceeds 10 μm, it is not preferable in terms of uniformity of the image-sensitive layer.
【0043】顔料を分散する方法としては、インク製造
やトナー製造等に用いられる公知の分散技術が使用でき
る。分散機としては、超音波分散器、サンドミル、アト
ライター、パールミル、スーパーミル、ボールミル、イ
ンペラー、デスパーザー、KDミル、コロイドミル、ダ
イナトロン、3本ロールミル、加圧ニーダー等が挙げら
れる。詳細は、「最新顔料応用技術」(CMC出版、1
986年刊)に記載されている。As a method for dispersing the pigment, a known dispersion technique used in the production of ink or toner can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. For details, refer to “Latest Pigment Application Technology” (CMC Publishing, 1
986).
【0044】これらの光熱変換剤は、他の成分と同一の
層に添加してもよいし、別の層を設けそこへ添加しても
よいが、ネガ型画像形成材料を作成した際に、感光層の
波長760nm〜1200nmの範囲における吸収極大
での光学濃度が、0.1〜3.0の間にあることが好ま
しい。この範囲をはずれた場合、感度が低くなる傾向が
ある。光学濃度は前記赤外線吸収剤の添加量と記録層の
厚みとにより決定されるため、所定の光学濃度は両者の
条件を制御することにより得られる。記録層の光学濃度
は常法により測定することができる。測定方法として
は、例えば、透明、或いは白色の支持体上に、乾燥後の
塗布量が平版印刷版として必要な範囲において適宜決定
された厚みの記録層を形成し、透過型の光学濃度計で測
定する方法、アルミニウム等の反射性の支持体上に記録
層を形成し、反射濃度を測定する方法等が挙げられる。These light-to-heat converting agents may be added to the same layer as other components, or may be added to another layer provided. However, when a negative type image forming material is prepared, The optical density of the photosensitive layer at the absorption maximum in the wavelength range of 760 nm to 1200 nm is preferably between 0.1 and 3.0. Outside of this range, sensitivity tends to decrease. Since the optical density is determined by the amount of the infrared absorbing agent added and the thickness of the recording layer, a predetermined optical density can be obtained by controlling both conditions. The optical density of the recording layer can be measured by a conventional method. As a measuring method, for example, on a transparent or white support, a coating layer after drying is formed on a recording layer having a thickness appropriately determined in a range required as a lithographic printing plate, and a transmission type optical densitometer is used. Examples include a method of measuring, a method of forming a recording layer on a reflective support such as aluminum, and measuring a reflection density.
【0045】[(C)重合性の不飽和基を有する化合
物]本発明に使用される重合性の不飽和基を有する化合
物は、少なくとも一個のエチレン性不飽和二重結合を有
する付加重合性化合物であり、好ましくは、末端エチレ
ン性不飽和結合を少なくとも1個、好ましくは2個以上
有する化合物から選ばれる。この様な化合物群は当該産
業分野において広く知られるものであり、本発明におい
てはこれらを特に限定無く用いることができる。これら
は、例えばモノマー、プレポリマー、すなわち2量体、
3量体およびオリゴマー、またはそれらの混合物ならび
にそれらの共重合体などの化学的形態をもつものを包含
する。モノマーおよびその共重合体の例としては、不飽
和カルボン酸(例えば、アクリル酸、メタクリル酸、イ
タコン酸、クロトン酸、イソクロトン酸、マレイン酸な
ど)や、そのエステル類、アミド類があげられ、好まし
くは、不飽和カルボン酸と脂肪族多価アルコール化合物
とのエステル、不飽和カルボン酸と脂肪族多価アミン化
合物とのアミド類が用いられる。また、ヒドロキシル基
や、アミノ基、メルカプト基等の求核性置換基を有する
不飽和カルボン酸エステル、アミド類と単官能もしくは
多官能イソシアネート類、エポキシ類との付加反応物、
単官能もしくは、多官能のカルボン酸との脱水縮合反応
物等も好適に使用される。[(C) Compound having a polymerizable unsaturated group] The compound having a polymerizable unsaturated group used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond. And is preferably selected from compounds having at least one, and preferably two or more, terminal ethylenically unsaturated bonds. Such compounds are widely known in the industrial field, and they can be used in the present invention without any particular limitation. These are, for example, monomers, prepolymers, ie dimers,
Includes those having chemical forms such as trimers and oligomers, or mixtures thereof, and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and esters and amides thereof, and are preferred. As the ester, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound and an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound are used. Further, an unsaturated carboxylic acid ester having a nucleophilic substituent such as a hydroxyl group, an amino group or a mercapto group, an addition reaction product of an amide with a monofunctional or polyfunctional isocyanate, an epoxy,
A dehydration condensation product with a monofunctional or polyfunctional carboxylic acid is also preferably used.
【0046】また、イソシアナト基や、エポキシ基、等
の親電子性置換基を有する、不飽和カルボン酸エステ
ル、アミド類と単官能もしくは多官能のアルコール類、
アミン類、チオール類との付加反応物、ハロゲン基や、
トシルオキシ基、等の脱離性置換基を有する、不飽和カ
ルボン酸エステル、アミド類と単官能もしくは多官能の
アルコール類、アミン類、チオール類との置換反応物も
好適である。また、別の例として、上記の不飽和カルボ
ン酸の代わりに、不飽和ホスホン酸、スチレン、ビニル
エーテル等に置き換えた化合物群を使用する事も可能で
ある。Further, unsaturated carboxylic acid esters and amides having an electrophilic substituent such as an isocyanato group or an epoxy group, and monofunctional or polyfunctional alcohols,
Amines, addition products with thiols, halogen groups,
Substitution products of unsaturated carboxylic acid esters and amides having a leaving substituent such as a tosyloxy group and the like with monofunctional or polyfunctional alcohols, amines and thiols are also suitable. As another example, it is also possible to use a group of compounds in which the above unsaturated carboxylic acid is replaced with unsaturated phosphonic acid, styrene, vinyl ether or the like.
【0047】脂肪族多価アルコール化合物と不飽和カル
ボン酸とのエステルのモノマーの具体例としては、アク
リル酸エステルとして、エチレングリコールジアクリレ
ート、トリエチレングリコールジアクリレート、1,3
−ブタンジオールジアクリレート、テトラメチレングリ
コールジアクリレート、プロピレングリコールジアクリ
レート、ネオペンチルグリコールジアクリレート、トリ
メチロールプロパントリアクリレート、トリメチロール
プロパントリ(アクリロイルオキシプロピル)エーテ
ル、トリメチロールエタントリアクリレート、ヘキサン
ジオールジアクリレート、1,4−シクロヘキサンジオ
ールジアクリレート、テトラエチレングリコールジアク
リレート、ペンタエリスリトールジアクリレート、ペン
タエリスリトールトリアクリレート、ペンタエリスリト
ールテトラアクリレー卜、ジペンタエリスリトールジア
クリレート、ジペンタエリスリトールヘキサアクリレー
ト、ソルビトールトリアクリレート、ソルビトールテト
ラアクリレート、ソルビト一ルペンタアクリレート、ソ
ルビトールヘキサアクリレート、トリ(アクリロイルオ
キシエチル)イソシアヌレート、ポリエステルアクリレ
ートオリゴマー等がある。Specific examples of the ester monomer of the aliphatic polyhydric alcohol compound and the unsaturated carboxylic acid include acrylates such as ethylene glycol diacrylate, triethylene glycol diacrylate, and 1,3.
-Butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol Tetraacrylate, SO Bito one Le pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.
【0048】メタクリル酸エステルとしては、テトラメ
チレングリコールジメタクリレート、トリエチレングリ
コールジメタクリレート、ネオペンチルグリコールジメ
タクリレート、トリメチロールプロパントリメタクリレ
ート、トリメチロールエタントリメタクリレート、エチ
レングリコールジメタクリレート、1,3−ブタンジオ
ールジメタクリレート、ヘキサンジオールジメタクリレ
ート、ペンタエリスリトールジメタクリレート、ペンタ
エリスリトールトリメタクリレート、ペンタエリスリト
ールテトラメタクリレート、ジペンタエリスリトールジ
メタクリレート、ジペンタエリスリトールヘキサメタク
リレート、ソルビトールトリメタクリレート、ソルビト
ールテトラメタクリレート、ビス〔p―(3−メタクリ
ルオキシ−2−ヒドロキシプロポキシ)フェニル〕ジメ
チルメタン、ビス−〔p−(メタクリルオキシエトキ
シ)フェニル〕ジメチルメタン等がある。Examples of the methacrylate include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol. Dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3- Methacryloxy-2-hi Rokishipuropokishi) phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.
【0049】イタコン酸エステルとしては、エチレング
リコールジイタコネート、プロピレングリコールジイタ
コネート、1,3−ブタンジオールジイタコネート、
1,4−ブタンジオールジイタコネート、テトラメチレ
ングリコールジイタコネート、ペンタエリスリトールジ
イタコネート、ソルビトールテトライタコネート等があ
る。Examples of itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate,
There are 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate, sorbitol tetritaconate and the like.
【0050】クロトン酸エステルとしては、エチレング
リコールジクロトネート、テトラメチレングリコールジ
クロトネート、ペンタエリスリトールジクロトネート、
ソルビトールテトラジクロトネート等がある。イソクロ
トン酸エステルとしては、エチレングリコールジイソク
ロトネート、ペンタエリスリトールジイソクロトネー
ト、ソルビトールテトライソクロトネート等がある。As the crotonic acid ester, ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate,
Sorbitol tetradicrotonate and the like. Examples of the isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate.
【0051】マレイン酸エステルとしては、エチレング
リコールジマレート、トリエチレングリコールジマレー
ト、ペンタエリスリトールジマレート、ソルビトールテ
トラマレート等がある。Examples of the maleic acid ester include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.
【0052】その他のエステルの例として、例えば、特
公昭46−27926、特公昭51−47334、特開
昭57−196231記載の脂肪族アルコール系エステ
ル類や、特開昭59−5240、特開昭59−524
1、特開平2−226149記載の芳香族系骨格を有す
るもの、特開平1−165613記載のアミノ基を含有
するもの等も好適に用いられる。さらに、前述のエステ
ルモノマーは混合物としても使用することができる。Examples of other esters include aliphatic alcohol esters described in JP-B-46-27926, JP-B-51-47334, JP-A-57-196231, JP-A-59-5240, and JP-A-59-5240. 59-524
1, those having an aromatic skeleton described in JP-A-2-226149 and those containing an amino group described in JP-A-1-165613 are also preferably used. Further, the above-mentioned ester monomers can be used as a mixture.
【0053】また、脂肪族多価アミン化合物と不飽和カ
ルボン酸とのアミドのモノマーの具体例としては、メチ
レンビス−アクリルアミド、メチレンビス−メタクリル
アミド、1,6−ヘキサメチレンビス−アクリルアミ
ド、1,6−ヘキサメチレンビス−メタクリルアミド、
ジエチレントリアミントリスアクリルアミド、キシリレ
ンビスアクリルアミド、キシリレンビスメタクリルアミ
ド等がある。その他の好ましいアミド系モノマーの例と
しては、特公昭54−21726記載のシクロへキシレ
ン構造を有すものをあげる事ができる。Specific examples of the amide monomer of the aliphatic polyamine compound and the unsaturated carboxylic acid include methylenebis-acrylamide, methylenebis-methacrylamide, 1,6-hexamethylenebis-acrylamide, 1,6- Hexamethylene bis-methacrylamide,
Examples include diethylenetriaminetrisacrylamide, xylylenebisacrylamide, xylylenebismethacrylamide, and the like. Examples of other preferred amide-based monomers include those having a cyclohexylene structure described in JP-B-54-21726.
【0054】また、イソシアネートと水酸基の付加反応
を用いて製造されるウレタン系付加重合性化合物も好適
であり、そのような具体例としては、例えば、特公昭4
8−41708号公報中に記載されている1分子に2個
以上のイソシアネート基を有するポリイソシアネート化
合物に、下記一般式(2)で示される水酸基を含有する
ビニルモノマーを付加させた1分子中に2個以上の重合
性ビニル基を含有するビニルウレタン化合物等が挙げら
れる。A urethane-based addition-polymerizable compound produced by an addition reaction between an isocyanate and a hydroxyl group is also suitable.
JP-A-8-41708 discloses a polyisocyanate compound having two or more isocyanate groups in one molecule and a hydroxyl-containing vinyl monomer represented by the following general formula (2) added to one molecule. Examples include vinyl urethane compounds containing two or more polymerizable vinyl groups.
【0055】[0055]
【化10】 Embedded image
【0056】一般式(2)中、RおよびR’はHあるい
はCH3を示す。また、特開昭51−37193号、特
公平2−32293号、特公平2−16765号に記載
されているようなウレタンアクリレート類や、特公昭5
8−49860号、特公昭56−17654号、特公昭
62−39417、特公昭62−39418号記載のエ
チレンオキサイド系骨格を有するウレタン化合物類も好
適である。In the general formula (2), R and R ′ represent H or CH 3 . Also, urethane acrylates described in JP-A-51-37193, JP-B-2-32293 and JP-B-2-16765, and
Urethane compounds having an ethylene oxide skeleton described in JP-A-8-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418 are also suitable.
【0057】さらに、特開昭63−277653,特開
昭63−260909号、特開平1−105238号に
記載される、分子内にアミノ構造やスルフィド構造を有
する付加重合性化合物類を用いることによっては、非常
に感光スピードに優れた感光性組成物を得ることができ
る。Further, by using addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277563, JP-A-63-260909 and JP-A-1-105238. Can obtain a photosensitive composition having a very high photosensitive speed.
【0058】その他の例としては、特開昭48−641
83号、特公昭49−43191号、特公昭52−30
490号、各公報に記載されているようなポリエステル
アクリレート類、エポキシ樹脂と(メタ)アクリル酸を
反応させたエポキシアクリレート類等の多官能のアクリ
レートやメタクリレートをあげることができる。また、
特公昭46−43946号、特公平1−40337号、
特公平1−40336号記載の特定の不飽和化合物や、
特開平2−25493号記載のビニルホスホン酸系化合
物等もあげることができる。また、ある場合には、特開
昭61−22048号記載のペルフルオロアルキル基を
含有する構造が好適に使用される。さらに日本接着協会
誌vol.20、No.7、300〜308ページ(1
984年)に光硬化性モノマーおよびオリゴマーとして
紹介されているものも使用することができる。Another example is described in JP-A-48-641.
No. 83, JP-B-49-43191, JP-B-52-30
No. 490, polyfunctional acrylates and methacrylates such as polyester acrylates and epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid as described in each publication. Also,
JP-B-46-43946, JP-B-1-40337,
Specific unsaturated compounds described in JP-B-1-40336,
Vinyl phosphonic acid compounds described in JP-A-2-25493 can also be mentioned. In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Further, the Journal of the Adhesion Society of Japan, vol. 20, no. 7, pages 300 to 308 (1
984) as photocurable monomers and oligomers.
【0059】これらの、付加重合性化合物について、ど
の様な構造を用いるか、単独で使用するか併用するか、
添加量はどうかといった、使用方法の詳細は、最終的な
感材の性能設計にあわせて、任意に設定できる。例えば
次のような観点から選択される。感光スピードの点では
1分子あたりの不飽和基含量が多い構造が好ましく、多
くの場合、2官能以上が好ましい。また、画像部すなわ
ち硬化膜の強度を高くするためには、3官能以上のもの
が良く、さらに、異なる官能数・異なる重合性基(例え
ばアクリル酸エステル、メタクリル酸エステル、スチレ
ン系化合物、ビニルエーテル系化合物)のものを併用す
ることで、感光性と、強度を両方を調節する方法も有効
である。大きな分子量の化合物や、疎水性の高い化合物
は感光スピードや、膜強度に優れる反面、現像スピード
や現像液中での析出といった点で好ましく無い場合があ
る。Regarding these addition polymerizable compounds, what kind of structure is used, whether they are used alone or in combination,
Details of the method of use, such as the amount of addition, can be arbitrarily set in accordance with the final performance design of the light-sensitive material. For example, it is selected from the following viewpoints. From the viewpoint of the photosensitive speed, a structure having a large unsaturated group content per molecule is preferable, and in many cases, a bifunctional or more functional structure is preferable. In order to increase the strength of the image area, that is, the cured film, those having three or more functional groups are preferable, and further, different functional numbers and different polymerizable groups (for example, acrylates, methacrylates, styrene compounds, vinyl ethers) It is also effective to adjust both the photosensitivity and the intensity by using the compound (1) in combination. A compound having a large molecular weight or a compound having a high hydrophobicity is excellent in photosensitive speed and film strength, but may not be preferable in terms of developing speed and precipitation in a developing solution.
【0060】また、感光性組成物中の他の成分(例えば
バインダーポリマー、開始剤、着色剤等)との相溶性、
分散性に対しても、付加重合化合物の選択・使用法は重
要な要因であり、例えば、低純度化合物の使用や、2種
以上の併用により相溶性を向上させうる事がある。ま
た、平版印刷版用原版とする場合、後述の支持体、オー
バーコート層等の密着性を向上せしめる目的で特定の構
造を選択することもあり得る。感光性組成物中の付加重
合性化合物の配合比に関しては、多い方が感度的に有利
であるが、多すぎる場合には、好ましくない相分離が生
じたり、感光性組成物の粘着性による製造工程上の問題
(例えば、感材成分の転写、粘着に由来する製造不良)
や、平版印刷版用原版とした場合、現像液からの析出が
生じる等の問題を生じうる。これらの観点から、好まし
い配合比は、多くの場合、組成物全成分に対して5〜8
0重量%、好ましくは25〜75重量%である。また、
これらは単独で用いても2種以上併用してもよい。その
ほか、付加重合性化合物の使用法は、酸素に対する重合
阻害の大小、解像度、かぶり性、屈折率変化、表面粘着
性等の観点から適切な構造、配合、添加量を任意に選択
でき、さらに場合によっては下塗り、上塗りといった層
構成・塗布方法も実施しうる。Further, compatibility with other components (eg, a binder polymer, an initiator, a colorant, etc.) in the photosensitive composition,
The selection and use of the addition polymerization compound is also an important factor for the dispersibility. For example, the use of a low-purity compound or the combination of two or more compounds may improve the compatibility. In the case of a lithographic printing plate precursor, a specific structure may be selected for the purpose of improving the adhesiveness of a support, an overcoat layer, and the like described below. Regarding the compounding ratio of the addition polymerizable compound in the photosensitive composition, the larger the proportion, the more advantageous in sensitivity. However, if the proportion is too large, undesired phase separation may occur or the production of the photosensitive composition due to the stickiness may occur. Process problems (for example, improper production due to transfer of photosensitive material components or adhesion)
In the case of a lithographic printing plate precursor, problems such as precipitation from a developer may occur. From these viewpoints, the preferred compounding ratio is often 5 to 8 based on all components of the composition.
0% by weight, preferably 25 to 75% by weight. Also,
These may be used alone or in combination of two or more. In addition, the method of using the addition polymerizable compound can be arbitrarily selected from the viewpoints of the degree of polymerization inhibition with respect to oxygen, resolution, fogging property, refractive index change, surface tackiness, etc. Depending on the case, a layer structure and a coating method such as undercoating and overcoating may be performed.
【0061】[(E)バインダー]本発明の平版印刷版
原版においては、膜性向上などの目的で、感光層にさら
にバインダーポリマーを添加することが好ましい。ここ
で用いるバインダーとしては、水不溶性且つアルカリ水
溶液可溶性の線状有機高分子重合体が好ましい。このよ
うな「線状有機高分子重合体」としては、公知の如何な
る重合体をも選択して使用することがっできるが、好ま
しくは水現像あるいは弱アルカリ水現像を可能とする水
あるいは弱アルカリ水可溶性または膨潤性である線状有
機高分子重合体が選択される。線状有機高分子重合体
は、組成物の皮膜形成剤としてだけでなく、水、弱アル
カリ水あるいは有機溶剤現像剤としての用途に応じて選
択使用される。例えば、水可溶性有機高分子重合体を用
いると水現像が可能になる。このような線状有機高分子
重合体としては、側鎖にカルボン酸基を有する付加重合
体、例えば特開昭59−44615号、特公昭54−3
4327号、特公昭58−12577号、特公昭54−
25957号、特開昭54−92723号、特開昭59
−53836号、特開昭59−71048号に記載され
ているもの、すなわち、メタクリル酸共重合体、アクリ
ル酸共重合体、イタコン酸共重合体、クロトン酸共重合
体、マレイン酸共重合体、部分エステル化マレイン酸共
重合体等がある。また同様に側鎖にカルボン酸基を有す
る酸性セルロース誘導体がある。この他に水酸基を有す
る付加重合体に環状酸無水物を付加させたものなどが有
用である。[(E) Binder] In the lithographic printing plate precursor according to the invention, it is preferable to further add a binder polymer to the photosensitive layer for the purpose of improving film properties. As the binder used here, a water-insoluble and aqueous alkaline solution-soluble linear organic high molecular polymer is preferable. As such a "linear organic high molecular polymer", any known polymer can be selected and used, but water or a weak alkali which enables water development or weak alkaline water development is preferable. A water-soluble or swellable linear organic high molecular polymer is selected. The linear organic high molecular polymer is selected and used not only as a film forming agent of the composition but also as a water, weakly alkaline water or organic solvent developing agent. For example, when a water-soluble organic high molecular polymer is used, water development becomes possible. Examples of such linear organic high-molecular polymers include addition polymers having a carboxylic acid group in a side chain, for example, JP-A-59-44615, JP-B-54-3.
4327, JP-B-58-12577, JP-B-54-
25957, JP-A-54-92723, JP-A-59-59723
-53836 and JP-A-59-71048, that is, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, There are partially esterified maleic acid copolymers and the like. Similarly, there is an acidic cellulose derivative having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group are useful.
【0062】特にこれらの中で〔ベンジル(メタ)アク
リレート/(メタ)アクリル酸/必要に応じてその他の
付加重合性ビニルモノマー〕共重合体および〔アリル
(メタ)アクリレート/(メタ)アクリル酸/必要に応
じてその他の付加重合性ビニルモノマー〕共重合体は、
膜強度、感度、現像性のバランスに優れており、好適で
ある。In particular, among these, [benzyl (meth) acrylate / (meth) acrylic acid / optionally other addition-polymerizable vinyl monomers] copolymer and [allyl (meth) acrylate / (meth) acrylic acid / Other addition-polymerizable vinyl monomers as needed) copolymer,
It is suitable because it has an excellent balance of film strength, sensitivity and developability.
【0063】また、特公平7−12004号、特公平7
−120041号、特公平7−120042号、特公平
8−12424号、特開昭63−287944号、特開
昭63−287947号、特開平1−271741号、
特願平10−116232号等に記載される、酸基を含
有するウレタン系バインダーポリマーは、非常に、強度
に優れるので、耐刷性・低露光適性の点で有利である。
また、特開平11−171907記載のアミド基を有す
るバインダーは優れた現像性と膜強度をあわせもち、好
適である。In addition, Japanese Patent Publication No. Hei 7-2004,
JP-A-120041, JP-B-7-120042, JP-B-8-12424, JP-A-63-287944, JP-A-63-287947, JP-A-1-271174,
The urethane-based binder polymer containing an acid group described in Japanese Patent Application No. 10-116232 is very excellent in strength, and is advantageous in terms of printing durability and low exposure suitability.
Further, a binder having an amide group described in JP-A-11-171907 is suitable because it has excellent developability and film strength.
【0064】さらにこの他に水溶性線状有機高分子とし
て、ポリビニルピロリドンやポリエチレンオキサイド等
が有用である。また硬化皮膜の強度を上げるためにアル
コール可溶性ナイロンや2,2−ビス−(4−ヒドロキ
シフェニル)―プロパンとエピクロロヒドリンのポリエ
ーテル等も有用である。これらの線状有機高分子重合体
は全組成物中に任意な量を混和させることができる。し
かし90重量%を超える場合には形成される画像強度等
の点で好ましい結果を与えない。好ましくは30〜85
重量%である。また光重合可能なエチレン性不飽和二重
結合を有する化合物と線状有機高分子重合体は、重量比
で1/9〜7/3の範囲とするのが好ましい。Further, as the water-soluble linear organic polymer, polyvinyl pyrrolidone, polyethylene oxide and the like are useful. In order to increase the strength of the cured film, alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful. These linear organic high molecular polymers can be incorporated in any amount into the entire composition. However, if it exceeds 90% by weight, no favorable result is obtained in view of the strength of the formed image and the like. Preferably 30 to 85
% By weight. The weight ratio of the photopolymerizable compound having an ethylenically unsaturated double bond and the linear organic high molecular weight polymer is preferably in the range of 1/9 to 7/3.
【0065】本発明のバインダーポリマーは実質的に水
に不溶でアルカリ水溶液に可溶なものが用いられる。こ
のため、現像液として、環境上好ましくない有機溶剤を
用いないかもしくは非常に少ない使用量に制限できる。
このようなバインダーポリマーの酸価(ポリマー1gあ
たりの酸含率を化学等量数で表したもの)と分子量は画
像強度と現像性の観点から適宜選択される。好ましい酸
価は、0.4〜3.0meq/gであり好ましい分子量
は3000から50万の範囲で、より好ましくは、酸価
が0.6〜2.0分子量が1万から30万の範囲であ
る。The binder polymer of the present invention is substantially insoluble in water and soluble in an aqueous alkali solution. For this reason, an organic solvent which is not environmentally unfavorable is not used or the amount used is extremely small as a developer.
The acid value (acid content per gram of polymer expressed by chemical equivalent number) and molecular weight of such a binder polymer are appropriately selected from the viewpoint of image strength and developability. The preferred acid value is 0.4 to 3.0 meq / g, and the preferred molecular weight is in the range of 3,000 to 500,000, more preferably the acid value is in the range of 0.6 to 2.0, and the molecular weight is in the range of 10,000 to 300,000. It is.
【0066】[(F)その他の成分]本発明の感光性組
成物には、さらにその用途、製造方法等に適したその他
の成分を適宜添加することができる。以下、好ましい添
加剤に関し例示する。 (F−1)共増感剤 ある種の添加剤(以後、共増感剤という)を用いること
で、感度をさらに向上させる事ができる。これらの作用
機構は、明確ではないが、多くは次のような化学プロセ
スに基づくものと考えられる。即ち、熱重合開始剤によ
り開始される光反応、と、それに引き続く付加重合反応
の過程で生じる様々な中間活性種(ラジカル、カチオ
ン)と、共増感剤が反応し、新たな活性ラジカルを生成
するものと推定される。これらは、大きくは、(a)還
元されて活性ラジカルを生成しうるもの、(b)酸化さ
れて活性ラジカルを生成しうるもの、(c)活性の低い
ラジカルと反応し、より活性の高いラジカルに変換する
か、もしくは連鎖移動剤として作用するもの、に分類で
きるが、個々の化合物がこれらのどれに属するかに関し
ては、通説がない場合も多い。[(F) Other Components] In the photosensitive composition of the present invention, other components suitable for its use, production method and the like can be appropriately added. Hereinafter, preferred additives will be exemplified. (F-1) Co-sensitizer The sensitivity can be further improved by using a certain additive (hereinafter referred to as a co-sensitizer). Although their mechanism of action is not clear, most are thought to be based on the following chemical processes. That is, the co-sensitizer reacts with a photoreaction initiated by the thermal polymerization initiator and various intermediate active species (radicals, cations) generated in the course of the subsequent addition polymerization reaction to generate a new active radical. It is estimated that These are largely (a) those that can be reduced to form active radicals, (b) those that can be oxidized to form active radicals, and (c) those that react with less active radicals and are more active radicals. Or acting as a chain transfer agent, but there is often no myth as to which of these compounds each belongs to.
【0067】(a)還元されて活性ラジカルを生成する
化合物 炭素−ハロゲン結合を有する化合物:還元的に炭素−ハ
ロゲン結合が解裂し、活性ラジカルを発生すると考えら
れる。具体的には、例えば、トリハロメチル−s−トリ
アジン類や、トリハロメチルオキサジアゾール類等が好
適に使用できる。 窒素−窒素結合を有する化合物:還元的に窒素−窒素結
合が解裂し、活性ラジカルを発生すると考えられる。具
体的にはヘキサアリールビイミダゾール類等が好適に使
用される。 酸素一酸素結合を有する化合物:還元的に酸素−酸素結
合が解裂し、活性ラジカルを発生すると考えられる。具
体的には、例えば、有機過酸化物類等が好適に使用され
る。 オニウム化合物:還元的に炭素−ヘテロ結合や、酸素−
窒素結合が解裂し、活性ラジカルを発生すると考えられ
る。具体的には例えば、ジアリールヨードニウム塩類、
トリアリールスルホニウム塩類、N−アルコキシピリジ
ニウム(アジニウム)塩類等が好適に使用される。 フエロセン、鉄アレーン錯体類:還元的に活性ラジカル
を生成しうる。(A) Compound that generates an active radical upon being reduced Compound having a carbon-halogen bond: It is considered that the carbon-halogen bond is reductively cleaved to generate an active radical. Specifically, for example, trihalomethyl-s-triazines, trihalomethyloxadiazoles and the like can be suitably used. Compound having a nitrogen-nitrogen bond: It is considered that the nitrogen-nitrogen bond is reductively cleaved to generate an active radical. Specifically, hexaarylbiimidazoles and the like are preferably used. Compound having an oxygen-oxygen bond: It is considered that an oxygen-oxygen bond is reductively cleaved to generate an active radical. Specifically, for example, organic peroxides and the like are preferably used. Onium compound: a carbon-hetero bond or an oxygen-
It is thought that the nitrogen bond is cleaved to generate an active radical. Specifically, for example, diaryliodonium salts,
Triarylsulfonium salts, N-alkoxypyridinium (azinium) salts and the like are preferably used. Ferrocene, iron arene complexes: can generate active radicals reductively.
【0068】(b)酸化されて活性ラジカルを生成する
化合物 アルキルアート錯体:酸化的に炭素−ヘテロ結合が解裂
し、活性ラジカルを生成すると考えられる。具体的には
例えば、トリアリールアルキルボレート類が好適に使用
される。 アルキルアミン化合物:酸化により窒素に隣接した炭素
上のC−X結合が解裂し、活性ラジカルを生成するもの
と考えられる。Xとしては、水素原子、カルボキシル
基、トリメチルシリル基、ベンジル基等が好適である。
具体的には、例えば、エタノールアミン類、N−フェニ
ルグリシン類、N−トリメチルシリルメチルアニリン類
等があげられる。 含硫黄、含錫化合物:上述のアミン類の窒素原子を硫黄
原子、錫原子に置き換えたものが、同様の作用により活
性ラジカルを生成しうる。また、S−S結合を有する化
合物もS−S解裂による増感が知られる。(B) Compound which is oxidized to generate an active radical Alkyl ate complex: It is considered that a carbon-hetero bond is oxidatively cleaved to generate an active radical. Specifically, for example, triarylalkyl borates are preferably used. Alkylamine compound: It is considered that the CX bond on carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical. X is preferably a hydrogen atom, a carboxyl group, a trimethylsilyl group, a benzyl group, or the like.
Specific examples include ethanolamines, N-phenylglycines, N-trimethylsilylmethylanilines and the like. Sulfur- and tin-containing compounds: Compounds in which the nitrogen atom of the above-mentioned amines is replaced with a sulfur atom or a tin atom can generate an active radical by the same action. Compounds having an SS bond are also known to be sensitized by SS cleavage.
【0069】α−置換メチルカルボニル化合物:酸化に
より、カルボニル−α炭素間の結合解裂により、活性ラ
ジカルを生成しうる。また、カルボニルをオキシムエー
テルに変換したものも同様の作用を示す。具体的には、
2−アルキル−1−[4−(アルキルチオ)フェニル]
−2−モルフォリノプロノン−1類、並びに、これら
と、ヒドロキシアミン類とを反応したのち、N−OHを
エーテル化したオキシムエーテル類をあげる事ができ
る。 スルフィン酸塩類:還元的に活性ラジカルを生成しう
る。具体的は、アリールスルフィン駿ナトリウム等をあ
げる事ができる。Α-Substituted methylcarbonyl compound: An active radical can be generated by cleavage of a bond between carbonyl and α carbon by oxidation. In addition, those obtained by converting carbonyl to oxime ether also show the same action. In particular,
2-alkyl-1- [4- (alkylthio) phenyl]
-2-morpholinopronones-1 and oxime ethers obtained by reacting these with hydroxyamines and then etherifying N-OH. Sulfinates: Active radicals can be generated reductively. Specific examples include sodium arylsulfin sodium.
【0070】(c)ラジカルと反応し高活性ラジカルに
変換、もしくは連鎖移動剤として作用する化合物:例え
ば、分子内にSH、PH、SiH、GeHを有する化合
物群が用いられる。これらは、低活性のラジカル種に水
素供与して、ラジカルを生成するか、もしくは、酸化さ
れた後、脱プロトンする事によりラジカルを生成しう
る。具体的には、例えば、2−メルカプトベンズイミダ
ゾール類等があげられる。(C) Compounds which react with radicals to convert them into highly active radicals or act as chain transfer agents: For example, compounds having SH, PH, SiH, GeH in the molecule are used. These can generate a radical by donating hydrogen to a low-activity radical species, or can generate a radical by being oxidized and then deprotonated. Specific examples include 2-mercaptobenzimidazoles.
【0071】これらの共増感剤のより具体的な例は、例
えば、特開平9−236913号公報中に、感度向上を
目的とした添加剤として、多く記載されており、それら
を本発明においても適用することができる。More specific examples of these co-sensitizers are described in, for example, JP-A-9-236913 as additives for the purpose of improving sensitivity. Can also be applied.
【0072】(F−2)重合禁止剤 また、本発明においては以上の基本成分の他に感光性組
成物の製造中あるいは保存中において重合可能なエチレ
ン性不飽和二重結合を有する化合物の不要な熱重合を阻
止するために少量の熱重合防止剤を添加することが望ま
しい。適当な熱重合防止剤としてはハイドロキノン、p
−メトキシフェノール、ジ−t−ブチル−p−クレゾー
ル、ピロガロール、t―ブチルカテコール、ベンゾキノ
ン、4,4′−チオビス(3−メチル−6−t−ブチル
フェノール)、2,2′−メチレンビス(4−メチル−
6−t―ブチルフェノール)、N−ニトロソフェニルヒ
ドロキシアミン第一セリウム塩等が挙げられる。熱重合
防止剤の添加量は、全組成物の重量に対して約0.01
重量%〜約5重量%が好ましい。また必要に応じて、酸
素による重合阻害を防止するためにベヘン酸やベヘン酸
アミドのような高級脂肪酸誘導体等を添加して、平版印
刷版用原版とする場合、支持体等への塗布後の乾燥の過
程でその感光層の表面に偏在させてもよい。高級脂肪酸
誘導体の添加量は、全組成物の約0.5重量%〜約10
重量%が好ましい。(F-2) Polymerization Inhibitor In the present invention, in addition to the above basic components, there is no need for a compound having an ethylenically unsaturated double bond which can be polymerized during the production or storage of the photosensitive composition. It is desirable to add a small amount of a thermal polymerization inhibitor to prevent the thermal polymerization. Suitable thermal polymerization inhibitors include hydroquinone, p
-Methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4- Methyl-
6-t-butylphenol), cerium N-nitrosophenylhydroxyamine, and the like. The amount of the thermal polymerization inhibitor added is about 0.01 to the weight of the whole composition.
% By weight to about 5% by weight is preferred. In addition, if necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide is added to prevent polymerization inhibition by oxygen, and when used as a lithographic printing plate precursor, after application to a support or the like, During the drying process, it may be unevenly distributed on the surface of the photosensitive layer. The amount of the higher fatty acid derivative to be added ranges from about 0.5% by weight to about 10% by weight of the total composition.
% By weight is preferred.
【0073】(F−3)着色剤等 さらに、感光層の着色を目的として染料もしくは顔料を
添加してもよい。これにより、印刷版としての、製版後
の視認性や、画像濃度測定機適性といったいわゆる検版
性を向上させる事ができる。着色剤としては、多くの染
料は光重合系感光層の感度の低下を生じるので、着色剤
としては、特に顔料の使用が好ましい。具体例としては
例えばフタロシアニン系顔料、アゾ系顔料、カーボンブ
ラック、酸化チタンなどの顔料、エチルバイオレット、
クリスタルバイオレット、アゾ系染料、アントラキノン
系染料、シアニン系染料などの染料がある。染料および
顔料の添加量は全組成物の約0.5重量%〜約5重量%
が好ましい。(F-3) Colorant, etc. Further, a dye or pigment may be added for the purpose of coloring the photosensitive layer. As a result, it is possible to improve the so-called plate inspection, such as the visibility of the printing plate after plate making and the suitability for an image density measuring device. As a coloring agent, a pigment is particularly preferable because many dyes lower the sensitivity of the photopolymerizable photosensitive layer. Specific examples include phthalocyanine pigments, azo pigments, carbon black, pigments such as titanium oxide, ethyl violet,
There are dyes such as crystal violet, azo dyes, anthraquinone dyes and cyanine dyes. Dyes and pigments are added in an amount of about 0.5% to about 5% by weight of the total composition.
Is preferred.
【0074】(F−4)その他の添加剤 さらに、本発明に係る感光層には、硬化皮膜の物性を改
良するために無機充填剤や、その他可塑剤、感光層表面
のインク着肉性を向上させうる感脂化剤等の公知の添加
剤を加えてもよい。(F-4) Other Additives The photosensitive layer according to the present invention may further include an inorganic filler, other plasticizers, and an ink deposit on the surface of the photosensitive layer in order to improve the physical properties of the cured film. Known additives such as a sensitizer that can be improved may be added.
【0075】可塑剤としては例えばジオクチルフタレー
ト、ジドデシルフタレート、トリエチレングリコールジ
カプリレート、ジメチルグリコールフタレート、トリク
レジルホスフェート、ジオクチルアジペート、ジブチル
セバケート、トリアセチルグリセリン等があり、結合剤
を使用した場合、エチレン性不飽和二重結合を有する化
合物と結合剤との合計重量に対し10重量%以下添加す
ることができる。Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin and the like. A binder was used. In this case, it can be added in an amount of 10% by weight or less based on the total weight of the compound having an ethylenically unsaturated double bond and the binder.
【0076】また、後述する膜強度(耐刷性)向上を目
的とした、現像後の加熱・露光の効果を強化するため
の、UV開始剤や、熟架橋剤等の添加もできる。その
他、感光層と支持体との密着性向上や、未露光感光層の
現像除去性を高めるための添加剤、中間層を設ける事を
可能である。例えば、ジアゾニウム構造を有する化合物
や、ホスホン化合物、等、基板と比較的強い相互作用を
有する化合物の添加や下塗りにより、密着性が向上し、
耐刷性を高める事が可能であり、一方ポリアクリル酸
や、ポリスルホン酸のような親水性ポリマーの添加や下
塗りにより、非画像部の現像性が向上し、汚れ性の向上
が可能となる。Further, a UV initiator, a ripening crosslinking agent, and the like for enhancing the effect of heating and exposure after development for the purpose of improving the film strength (printing durability) described later can also be added. In addition, it is possible to provide an additive and an intermediate layer for improving the adhesion between the photosensitive layer and the support and for improving the development and removability of the unexposed photosensitive layer. For example, a compound having a diazonium structure or a phosphone compound, such as a compound having a relatively strong interaction with the substrate or an undercoat, the adhesion is improved,
The printing durability can be increased, while the addition or undercoating of a hydrophilic polymer such as polyacrylic acid or polysulfonic acid improves the developability of the non-image area and improves the stain resistance.
【0077】次に本発明の平版印刷版原版において任意
に設けられる他の層について説明する。 [保護層]本発明の平版印刷版原版は、通常、露光を大
気中で行うため、光重合性組成物の層の上に、さらに、
保護層を設ける事が好ましい。保護層は、感光層中で露
光により生じる画像形成反応を阻害する大気中に存在す
る酸素や塩基性物質等の低分子化合物の感光層への混入
を防止し、大気中での露光を可能とする。従って、この
様な保護層に望まれる特性は、酸素等の低分子化合物の
透過性が低いことであり、さらに、露光に用いる光の透
過性が良好で、感光層との密着性に優れ、かつ、露光後
の現像工程で容易に除去できる事が望ましい。Next, other layers optionally provided in the lithographic printing plate precursor according to the invention will be described. [Protective layer] The lithographic printing plate precursor according to the invention is usually subjected to exposure in the air.
It is preferable to provide a protective layer. The protective layer prevents low-molecular compounds such as oxygen and basic substances present in the atmosphere that inhibit the image forming reaction caused by exposure in the photosensitive layer from being mixed into the photosensitive layer, and enables exposure in the atmosphere. I do. Therefore, the desired properties of such a protective layer is that the permeability of low molecular compounds such as oxygen is low, and further, the transparency of light used for exposure is good, and the adhesion with the photosensitive layer is excellent. In addition, it is desirable that it can be easily removed in a developing step after exposure.
【0078】このような、保護層に関する工夫が従来よ
りなされており、米国特許第3、458、311号、特
開昭55−49729号に詳しく記載されている。保護
層に使用できる材料としては例えば、比較的、結晶性に
優れた水溶性高分子化合物を用いる事がよく、具体的に
は、ポリビニルアルコール、ポリビニルピロリドン、酸
性セルロース類、ゼラチン、アラビアゴム、ポリアクリ
ル酸などのような水溶性ポリマーが知られていが、これ
らのうち、ポリビニルアルコールを主成分として用いる
事が、酸素遮断性、現像除去性といった基本特性的にも
っとも良好な結果を与える。保護層に使用するポリビニ
ルアルコールは、必要な酸素遮断性と水溶性を有するた
めの、未置換ビニルアルコール単位を含有する限り、一
部がエステル、エーテル、およびアセタールで置換され
ていても良い。また、同様に一部が他の共重合成分を有
していても良い。Such a device for the protective layer has been conventionally devised, and is described in detail in US Pat. No. 3,458,311 and JP-A-55-49729. As a material that can be used for the protective layer, for example, it is preferable to use a water-soluble polymer compound having relatively excellent crystallinity. Although water-soluble polymers such as acrylic acid are known, use of polyvinyl alcohol as a main component gives the best results in terms of basic properties such as oxygen barrier properties and development removability. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether, or an acetal as long as it contains an unsubstituted vinyl alcohol unit for obtaining necessary oxygen barrier properties and water solubility. Similarly, a part thereof may have another copolymer component.
【0079】ポリビニルアルコールの具体例としては7
1〜100%加水分解され、分子量が300から240
0の範囲のものをあげる事ができる。具体的には、株式
会社クラレ製のPVA−105、PVA−110、PV
A−117、PVA−117H、PVA−120、PV
A−124、PVA−124H、PVA一CS、PVA
―CST、PVA一HC、PVA−203、PVA−2
04、PVA−205、PVA−210、PVA−21
7、PVA−220、PVA−224、PVA−217
EE、PVA−217E、PVA−220E、PVA−
224E、PVA−405、PVA−420、PVA−
613、L−8等があげられる。Specific examples of polyvinyl alcohol include 7
1-100% hydrolyzed, molecular weight 300-240
A range of 0 can be given. Specifically, Kuraray's PVA-105, PVA-110, PVA
A-117, PVA-117H, PVA-120, PV
A-124, PVA-124H, PVA-CS, PVA
-CST, PVA-HC, PVA-203, PVA-2
04, PVA-205, PVA-210, PVA-21
7, PVA-220, PVA-224, PVA-217
EE, PVA-217E, PVA-220E, PVA-
224E, PVA-405, PVA-420, PVA-
613 and L-8.
【0080】保護層の成分(PVAの選択、添加剤の使
用)、塗布量等は、酸素遮断性・現像除去性の他、カブ
リ性や密着性・耐傷性を考慮して選択される。一般には
使用するPVAの加水分解率が高い程(保護層中の未置
換ビニルアルコール単位含率が高い程)、膜厚が厚い程
酸素遮断性が高くなり、感度の点で有利である。しかし
ながら、極端に酸素遮断性を高めると、製造時・生保存
時に不要な重合反応が生じたり、また画像露光時に、不
要なカブリ、画線の太りが生じたりという問題を生じ
る。また、画像部との密着性や、耐傷性も版の取り扱い
上極めて重要である。即ち、水溶性ポリマーからなる親
水性の層を新油性の重合層に積層すると、接着力不足に
よる膜剥離が発生しやすく、剥離部分が酸素の重合阻害
により膜硬化不良などの欠陥を引き起こす。The components of the protective layer (selection of PVA, use of additives), coating amount, etc. are selected in consideration of fogging properties, adhesion and scratch resistance in addition to oxygen blocking properties and development removability. Generally, the higher the hydrolysis rate of the PVA used (the higher the content of unsubstituted vinyl alcohol units in the protective layer) and the thicker the film thickness, the higher the oxygen barrier property, which is advantageous in terms of sensitivity. However, when the oxygen-barrier property is extremely increased, there arises a problem that an unnecessary polymerization reaction occurs during production or raw storage, and unnecessary fogging and thickening of an image occur during image exposure. Further, the adhesion to the image area and the scratch resistance are also extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on a lipophilic polymer layer, film peeling due to insufficient adhesive force is likely to occur, and the peeled portion causes defects such as poor film curing due to inhibition of oxygen polymerization.
【0081】これに対し、これら2層間の接着性を改す
べく種々の提案がなされている。たとえば米国特許第2
92、501号、米国特許第44、563号には、主に
ポリビニルアルコールからなる親水性ポリマー中に、ア
クリル系エマルジヨンまたは水不溶性ビニルピロリドン
−ビニルアセテート共重合体などを20〜60重量%混
合し、重合層の上に積層することにより、十分な接着性
が得られることが記載されている。本発明における保護
層に対しては、これらの公知の技術をいずれも適用する
事ができる。このような保護層の塗布方法については、
例えば米国特許第3,458,311号、特開昭55−
49729号に詳しく記載されている。On the other hand, various proposals have been made to improve the adhesiveness between these two layers. For example, US Patent No. 2
No. 92,501 and U.S. Pat. No. 44,563, an acrylic emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer or the like is mixed at 20 to 60% by weight in a hydrophilic polymer mainly composed of polyvinyl alcohol. It is described that sufficient adhesiveness can be obtained by laminating on a polymer layer. Any of these known techniques can be applied to the protective layer in the present invention. Regarding the method of applying such a protective layer,
For example, U.S. Pat. No. 3,458,311;
No. 49729.
【0082】さらに、保護層に他の機能を付与する事も
できる。例えば、露光に使う波長の光の透過性に優れ、
かつ画像形成寄与しない波長の光を効率良く吸収しう
る、着色剤(水溶性染料等)の添加により、感度低下を
起こすことなく、セーフライト適性をさらに高める事が
できる。Further, other functions can be imparted to the protective layer. For example, it has excellent light transmittance of the wavelength used for exposure,
Addition of a coloring agent (such as a water-soluble dye) that can efficiently absorb light having a wavelength that does not contribute to image formation can further enhance the suitability for safelight without lowering the sensitivity.
【0083】[支持体]本発明の平版印刷版原版に使用
される支持体としては、寸度的に安定な板状物であれば
特に制限はなく、例えば、紙、プラスチック(例えば、
ポリエチレン、ポリプロピレン、ポリスチレン等)がラ
ミネートされた紙、金属板(例えば、アルミニウム、亜
鉛、銅等)、プラスチックフィルム(例えば、二酢酸セ
ルロース、三酢酸セルロース、プロピオン酸セルロー
ス、酪酸セルロース、酢酸酪酸セルロース、硝酸セルロ
ース、ポリエチレンテレフタレート、ポリエチレン、ポ
リスチレン、ポリプロピレン、ポリカーボネート、ポリ
ビニルアセタール等)等が挙げられる。これらは、樹脂
フィルムや金属板などの単一成分のシートであっても、
2以上の材料の積層体であってもよく、例えば、上記の
ごとき金属がラミネート、若しくは蒸着された紙やプラ
スチックフィルム、異種のプラスチックフィルム同志の
積層シート等が含まれる。[Support] The support used in the lithographic printing plate precursor according to the invention is not particularly limited as long as it is a dimensionally stable plate-like material.
Paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate) laminated with polyethylene, polypropylene, polystyrene, etc. Cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.). These are single component sheets such as resin films and metal plates,
The laminate may be a laminate of two or more materials, for example, such as the above-described metal-laminated or vapor-deposited paper or plastic film, or a laminated sheet of different types of plastic films.
【0084】前記支持体としては、ポリエステルフィル
ム又はアルミニウム板が好ましく、その中でも寸法安定
性がよく、比較的安価であるアルミニウム板は特に好ま
しい。好適なアルミニウム板は、純アルミニウム板及び
アルミニウムを主成分とし、微量の異元素を含む合金板
であり、更にアルミニウムがラミネート若しくは蒸着さ
れたプラスチックフィルムでもよい。アルミニウム合金
に含まれる異元素には、ケイ素、鉄、マンガン、銅、マ
グネシウム、クロム、亜鉛、ビスマス、ニッケル、チタ
ン等がある。合金中の異元素の含有量は高々10重量%
以下である。本発明において特に好適なアルミニウム
は、純アルミニウムであるが、完全に純粋なアルミニウ
ムは精錬技術上製造が困難であるので、僅かに異元素を
含有するものでもよい。このように本発明に適用される
アルミニウム板は、その組成が特定されるものではな
く、従来より公知公用の素材のアルミニウム板を適宜に
利用することができる。前記アルミニウム板の厚みは、
およそ0.1〜0.6mm程度、好ましくは0.15〜
0.4mm、特に好ましくは0.2〜0.3mmであ
る。As the support, a polyester film or an aluminum plate is preferable, and among them, an aluminum plate which has good dimensional stability and is relatively inexpensive is particularly preferable. Suitable aluminum plates are a pure aluminum plate and an alloy plate containing aluminum as a main component and a trace amount of a different element, and may be a plastic film on which aluminum is laminated or vapor-deposited. The foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, titanium and the like. The content of foreign elements in the alloy is at most 10% by weight
It is as follows. Particularly preferred aluminum in the present invention is pure aluminum. However, completely pure aluminum is difficult to produce due to refining technology, and therefore may contain a slightly different element. As described above, the composition of the aluminum plate applied to the present invention is not specified, and an aluminum plate of a conventionally known and used material can be appropriately used. The thickness of the aluminum plate,
About 0.1 to 0.6 mm, preferably 0.15 to
It is 0.4 mm, particularly preferably 0.2 to 0.3 mm.
【0085】アルミニウム板を粗面化するに先立ち、所
望により、表面の圧延油を除去するための例えば界面活
性剤、有機溶剤又はアルカリ水溶液等による脱脂処理が
行われる。アルミニウム板の表面の粗面化処理は、種々
の方法により行われるが、例えば、機械的に粗面化する
方法、電気化学的に表面を溶解粗面化する方法及び化学
的に表面を選択溶解させる方法により行われる。機械的
方法としては、ボール研磨法、ブラシ研磨法、ブラスト
研磨法、バフ研磨法等の公知の方法を用いることができ
る。また、電気化学的な粗面化法としては塩酸又は硝酸
電解液中で交流又は直流により行う方法がある。また、
特開昭54−63902号公報に開示されているように
両者を組み合わせた方法も利用することができる。この
様に粗面化されたアルミニウム板は、所望により、アル
カリエッチング処理、中和処理を経て、表面の保水性や
耐摩耗性を高めるために陽極酸化処理を施すことができ
る。アルミニウム板の陽極酸化処理に用いられる電解質
としては、多孔質酸化皮膜を形成する種々の電解質の使
用が可能で、一般的には硫酸、リン酸、蓚酸、クロム酸
或いはそれらの混酸が用いられる。それらの電解質の濃
度は電解質の種類によって適宜決められる。Prior to roughening the aluminum plate, if necessary, a degreasing treatment with a surfactant, an organic solvent or an aqueous alkali solution or the like is performed to remove the rolling oil on the surface. The surface roughening treatment of the aluminum plate is performed by various methods. For example, a method of mechanically roughening the surface, a method of electrochemically dissolving the surface, and a method of selectively dissolving the surface chemically. It is performed by the method of causing. Known mechanical methods such as a ball polishing method, a brush polishing method, a blast polishing method, and a buff polishing method can be used as the mechanical method. In addition, as an electrochemical surface roughening method, there is a method of performing an alternating or direct current in a hydrochloric acid or nitric acid electrolyte. Also,
As disclosed in JP-A-54-63902, a method in which both are combined can also be used. The aluminum plate thus roughened can be subjected to an anodic oxidation treatment through alkali etching treatment and neutralization treatment, if desired, in order to increase the water retention and abrasion resistance of the surface. As the electrolyte used for the anodic oxidation treatment of the aluminum plate, various electrolytes that form a porous oxide film can be used, and generally, sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid thereof is used. The concentration of these electrolytes is appropriately determined depending on the type of the electrolyte.
【0086】陽極酸化の処理条件は、用いる電解質によ
り種々変わるので一概に特定し得ないが、一般的には電
解質の濃度が1〜80重量%溶液、液温は5〜70℃、
電流密度5〜60A/dm2 、電圧1〜100V、電解
時間10秒〜5分の範囲であれば適当である。陽極酸化
皮膜の量は1.0g/m2 以上が好適であるが、より好
ましくは2.0〜6.0g/m2 の範囲である。陽極酸
化被膜が1.0g/m2 未満であると耐刷性が不十分で
あったり、平版印刷版の非画像部に傷が付き易くなっ
て、印刷時に傷の部分にインキが付着するいわゆる「傷
汚れ」が生じ易くなる。尚、このような陽極酸化処理は
平板印刷版の支持体の印刷に用いる面に施されるが、電
気力線の裏回りにより、裏面にも0.01〜3g/m2
の陽極酸化被膜が形成されるのが一般的である。The anodizing treatment conditions vary depending on the electrolyte to be used and cannot be specified unconditionally.
Current density 5 to 60 A / dm 2, voltage 1 to 100 V, which is an electrolyzing time of 10 seconds to 5 minutes. The amount of the anodized film is suitably 1.0 g / m 2 or more, but more preferably in the range of 2.0 to 6.0 g / m 2. When the anodic oxide coating is less than 1.0 g / m 2 , the printing durability is insufficient, and the non-image area of the lithographic printing plate is easily damaged, and the ink adheres to the damaged area during printing. "Scratch dirt" is likely to occur. Although such anodizing treatment is performed on a surface used for printing of the support of lithographic printing plates, the back around the electric lines of force, 0.01 to 3 g / m 2 on the back surface
Is generally formed.
【0087】支持体表面の親水化処理は、上記陽極酸化
処理の後に施されるものであり、従来より知られている
処理法が用いられる。このような親水化処理としては、
米国特許第2,714,066号、同第3,181,4
61号、第3,280,734号及び第3,902,7
34号公報に開示されているようなアルカリ金属珪酸塩
(例えば、珪酸ナトリウム水溶液)法がある。この方法
においては、支持体が珪酸ナトリウム水溶液で浸漬処理
されるか、又は電解処理される。他に特公昭36−22
063号公報に開示されているフッ化ジルコン酸カリウ
ム及び米国特許第3,276,868号、同第4,15
3,461号、同第4,689,272号公報に開示さ
れているようなポリビニルホスホン酸で処理する方法等
が用いられる。The hydrophilizing treatment of the support surface is performed after the above-described anodic oxidation treatment, and a conventionally known treatment method is used. As such a hydrophilic treatment,
U.S. Pat. Nos. 2,714,066 and 3,181,4
No. 61, No. 3,280,734 and No. 3,902,7
No. 34 discloses an alkali metal silicate (for example, an aqueous solution of sodium silicate). In this method, the support is immersed in an aqueous solution of sodium silicate or electrolytically treated. In addition, Japanese Patent Publication No. 36-22
No. 063, and potassium fluoride zirconate disclosed in U.S. Pat. Nos. 3,276,868 and 4,15.
For example, a method of treating with polyvinyl phosphonic acid as disclosed in Japanese Patent Nos. 3,461 and 4,689,272 is used.
【0088】支持体の裏面には、必要に応じてバックコ
ートが設けられる。かかるバックコートとしては、特開
平5−45885号公報記載の有機高分子化合物および
特開平6−35174号公報記載の有機または無機金属
化合物を加水分解および重縮合させて得られる金属酸化
物からなる被覆層が好ましく用いられる。これらの被覆
層のうち、Si(OCH3 )4 、Si(OC
2 H5 )4 、Si(OC3 H7 )4 、Si(OC
4 H9 )4 などの珪素のアルコキシ化合物が安価で入手
し易く、それから与られる金属酸化物の被覆層が耐現像
性に優れており特に好ましい。A back coat is provided on the back surface of the support, if necessary. Examples of such a back coat include a coating comprising a metal oxide obtained by hydrolyzing and polycondensing an organic polymer compound described in JP-A-5-45885 and an organic or inorganic metal compound described in JP-A-6-35174. Layers are preferably used. Among these coating layers, Si (OCH 3 ) 4 and Si (OC
2 H 5) 4, Si ( OC 3 H 7) 4, Si (OC
Alkoxy compounds of silicon such as 4 H 9 ) 4 are inexpensive and readily available, and a coating layer of a metal oxide provided therefrom is particularly preferred because of its excellent development resistance.
【0089】[露光]以上のようにして、本発明の平版
印刷版原版を作成することができる。この平版印刷版原
版は、波長760nmから1200nmの赤外線を放射
する固体レーザ及び半導体レーザにより画像露光され
る。画像形成のための走査露光は公知の装置を用いて行
うことができる。露光装置としては、インナードラム方
式、アウタードラム方式、フラットヘッド方式などの装
置を選択して用いることができる。本発明の平版印刷版
原版では、高感度の特定重合開始剤と重合禁止剤との組
合せにより、低エネルギーの露光による所望されない未
露光部の重合反応が抑制されているので、例えば、低消
光比露光プロセスなどにも好適であり、そのようなプロ
セスに適用した場合、その効果が著しい。[Exposure] As described above, the planographic printing plate precursor of the invention can be prepared. This lithographic printing plate precursor is image-exposed by a solid-state laser and a semiconductor laser that emit infrared light having a wavelength of 760 nm to 1200 nm. Scanning exposure for image formation can be performed using a known device. As the exposure apparatus, an apparatus such as an inner drum system, an outer drum system, and a flat head system can be selected and used. In the lithographic printing plate precursor according to the present invention, the polymerization reaction of undesired unexposed portions due to low-energy exposure is suppressed by a combination of a high-sensitivity specific polymerization initiator and a polymerization inhibitor. It is also suitable for an exposure process and the like, and when applied to such a process, the effect is remarkable.
【0090】本発明においては、レーザ照射後すぐに現
像処理を行っても良いが、レーザ露光工程と現像工程の
間に加熱処理を行うことが好ましい。加熱処理の条件
は、80℃〜150℃の範囲内で10秒〜5分間行うこ
とが好ましい。この加熱処理により、レーザ照射時、記
録に必要なレーザエネルギーを減少させることができ
る。In the present invention, the developing treatment may be performed immediately after the laser irradiation, but it is preferable to perform the heating treatment between the laser exposure step and the developing step. The heat treatment is preferably performed in a range of 80 ° C. to 150 ° C. for 10 seconds to 5 minutes. By this heat treatment, the laser energy required for recording at the time of laser irradiation can be reduced.
【0091】[現像]本発明の平版印刷版原版は、通
常、赤外線レーザにより画像露光したのち、好ましく
は、水又はアルカリ性水溶液にて現像される。本発明に
おいては、レーザー照射後直ちに現像処理を行ってもよ
いが、レーザー照射工程と現像工程との間に加熱処理工
程を設けることもできる。加熱処理条件は、80℃〜1
50℃の範囲で、10秒〜5分間行うことが好ましい。
この加熱処理により、レーザー照射時、記録に必要なレ
ーザーエネルギーを減少させることができる。現像液と
しては、アルカリ性水溶液が好ましく、好ましいpH領
域としては、pH10.5〜12.5の範囲が挙げら
れ、pHll.0〜12.5の範囲のアルカリ性水溶液
により現像処理することがさらに好ましい。アルカリ性
水溶液としてpH10.5未満のものを用いると非画像
部に汚れが生じやすくなる傾向があり、pH12.5を
超える水溶液により現像処理すると画像部の強度が低下
するおそれがある。[Development] The lithographic printing plate precursor according to the invention is usually subjected to image exposure with an infrared laser, and then preferably developed with water or an aqueous alkaline solution. In the present invention, the development treatment may be performed immediately after the laser irradiation, but a heat treatment step may be provided between the laser irradiation step and the development step. The heat treatment condition is 80 ° C.-1
It is preferable to carry out for 10 seconds to 5 minutes at a temperature of 50 ° C.
By this heat treatment, the laser energy required for recording at the time of laser irradiation can be reduced. As the developer, an alkaline aqueous solution is preferable, and a preferable pH range includes a range of pH 10.5 to 12.5. It is more preferable to carry out development processing with an alkaline aqueous solution in the range of 0 to 12.5. If an alkaline aqueous solution having a pH of less than 10.5 is used, the non-image area tends to be stained, and if an aqueous solution having a pH of more than 12.5 is developed, the strength of the image area may be reduced.
【0092】現像液として、アルカリ性水溶液を用いる
場合、本発明の画像記録材料の現像液及び補充液として
は、従来公知のアルカリ水溶液が使用できる。例えば、
ケイ酸ナトリウム、同カリウム、第3リン酸ナトリウ
ム、同カリウム、同アンモニウム、第2リン酸ナトリウ
ム、同カリウム、同アンモニウム、炭酸ナトリウム、同
カリウム、同アンモニウム、炭酸水素ナトリウム、同カ
リウム、同アンモニウム、ほう酸ナトリウム、同カリウ
ム、同アンモニウム、水酸化ナトリウム、同アンモニウ
ム、同カリウム及び同リチウム等の無機アルカリ塩が挙
げられる。また、モノメチルアミン、ジメチルアミン、
トリメチルアミン、モノエチルアミン、ジエチルアミ
ン、トリエチルアミン、モノイソプロピルアミン、ジイ
ソプロピルアミン、トリイソプロピルアミン、n−ブチ
ルアミン、モノエタノールアミン、ジエタノールアミ
ン、トリエタノールアミン、モノイソプロパノールアミ
ン、ジイソプロパノールアミン、エチレンイミン、エチ
レンジアミン、ピリジン等の有機アルカリ剤も用いられ
る。これらのアルカリ剤は単独又は2種以上を組み合わ
せて用いられる。When an alkaline aqueous solution is used as the developer, a conventionally known alkaline aqueous solution can be used as the developer and replenisher for the image recording material of the present invention. For example,
Sodium silicate, potassium, tribasic sodium, potassium, ammonium, dibasic sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, ammonium, Inorganic alkali salts such as sodium borate, potassium, ammonium, sodium hydroxide, ammonium, potassium and lithium. Also, monomethylamine, dimethylamine,
Trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, etc. Organic alkaline agents are also used. These alkali agents are used alone or in combination of two or more.
【0093】さらに、自動現像機を用いて現像する場合
には、現像液と同じものまたは、現像液よりもアルカリ
強度の高い水溶液(補充液)を現像液に加えることによ
って、長時間現像タンク中の現像液を交換することな
く、多量の平版印刷版原版を処理できることが知られて
いる。本発明においてもこの補充方式が好ましく適用さ
れる。Further, when developing using an automatic developing machine, the same solution as the developing solution or an aqueous solution (replenishing solution) having a higher alkali strength than the developing solution is added to the developing solution so that the developing tank can be maintained for a long time. It is known that a large amount of a lithographic printing plate precursor can be processed without replacing the developer. This replenishment method is also preferably applied in the present invention.
【0094】現像液及び補充液には現像性の促進や抑
制、現像カスの分散及び印刷版画像部の親インキ性を高
める目的で必要に応じて種々の界面活性剤や有機溶剤等
を添加できる。現像液中には界面活性剤を1〜20重量
%加えることが好ましく、より好ましくは、3〜10重
量%の範囲である。界面活性剤の添加量が1重量%未満
であると現像性向上効果が充分に得られず、20重量%
を超えて添加すると画像の耐摩耗性など強度が低下する
などの弊害が出やすくなる。好ましい界面活性剤として
は、アニオン系、カチオン系、ノニオン系及び両性界面
活性剤が挙げられる。具体的には、例えば、ラウリルア
ルコールサルフェートのナトリウム塩、ラウリルアルコ
ールサルフェートのアンモニウム塩、オクチルアルコー
ルサルフェートのナトリウム塩、例えば、イソプロピル
ナフタレンスルホン酸のナトリウム塩、イソブチルナフ
タレンスルホン酸のナトリウム塩、ポリオキシエチレン
グリコールモノナフチルエチル硫酸エステルのナトリウ
ム塩、ドデンルベンゼンスルホン酸のナトリウム塩、メ
タニトロベンゼンスルホン酸のナトリウム塩などのよう
なアルキルアリールスルホン酸塩、第2ナトリウムアル
キルサルフェートなどの炭素数8〜22の高級アルコー
ル硫酸エステル類、セチルアルコールリン酸エステルの
ナトリウム塩などの様な脂肪族アルコールリン酸エステ
ル塩類、たとえばC17H33CON(CH3)CH2CH2
SO3Naなどのようなアルキルアミドのスルホン酸塩
類、例えば、ナトリウムスルホコハク酸ジオクチルエス
テル、ナトリウムスルホコハク酸ジヘキシルエステルな
どの二塩基性脂肪族エステルのスルホン酸塩類、例え
ば、ラウリルトリメチルアンモニウムクロリド、ラウリ
ルトリメチルアンモニウムメトサルフェートなどのアン
モニウム塩類、例えば、ステアラミドエチルジエチルア
ミン酢酸塩などのアミン塩、例えば、グリセロールの脂
肪酸モノエステル、ペンタエリスリトールの脂肪酸モノ
エステルなどの多価アルコール類、例えば、ポリエチレ
ングリコールモノナフチルエチル、ポリエチレングリコ
ールモノ(ノエルフェノール)エチルなどのポリエチレ
ングリコールエチル類などが含まれる。Various surfactants and organic solvents can be added to the developing solution and the replenishing solution, if necessary, for the purpose of accelerating or suppressing the developing property, dispersing the developing residue and improving the ink affinity of the printing plate image area. . The surfactant is preferably added to the developer in an amount of 1 to 20% by weight, more preferably 3 to 10% by weight. If the amount of the surfactant is less than 1% by weight, the effect of improving the developability cannot be sufficiently obtained,
If added in excess of the above, adverse effects such as a decrease in strength such as abrasion resistance of the image are likely to occur. Preferred surfactants include anionic, cationic, nonionic and amphoteric surfactants. Specifically, for example, sodium salt of lauryl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, for example, sodium salt of isopropyl naphthalene sulfonic acid, sodium salt of isobutyl naphthalene sulfonic acid, polyoxyethylene glycol Alkyl aryl sulfonates such as sodium salt of mononaphthylethyl sulfate, sodium salt of dodenylbenzenesulfonic acid, sodium salt of metanitrobenzenesulfonic acid, and higher alcohols having 8 to 22 carbon atoms such as secondary sodium alkyl sulfate esters sulfate, fatty alcohol phosphoric acid ester salts such as such as sodium salt of cetyl alcohol phosphate esters, for example C 17 H 33 CON (C 3) CH 2 CH 2
Sulfonates of alkylamides such as SO 3 Na and the like, for example, sulfonates of dibasic aliphatic esters such as dioctyl sodium sulfosuccinate and dihexyl sodium sulfosuccinate, for example, lauryl trimethyl ammonium chloride, lauryl trimethyl ammonium Ammonium salts such as methosulfate, for example, amine salts such as stearamidoethyl diethylamine acetate, for example, polyhydric alcohols such as fatty acid monoester of glycerol, and fatty acid monoester of pentaerythritol, for example, polyethylene glycol mononaphthylethyl, polyethylene And polyethylene glycol ethyls such as glycol mono (noelphenol) ethyl.
【0095】好ましい有機溶剤としては、水に対する溶
解度が約10重量%以下のものが挙げられ、さらに好ま
しくは水に対する溶解度が5重量%以下のものから選ば
れる。たとえば1−フェニルエタノール、2−フェニル
エタノール、3−フェニルプロパノール、1,4−フェ
ニルブタノール、2,2−フェニルブタノール、1,2
−フェノキシエタノール、2−ベンジルオキシエタノー
ル、o−メトキシベンジルアルコール、m―メトキシベ
ンジルアルコール、p―メトキシベンジルアルコール、
ベンジルアルコール、シクロヘキサノール、2−メチル
シクロヘキサノール、4−メチルシクロヘキサノール及
び3−メチルシクロヘキサノール等を挙げることができ
る。有機溶媒の含有量は、使用時の現像液の総重量に対
して1〜5重量%が好適である。その使用量は界面活性
剤の使用量と密接な関係があり、有機溶媒の量が増すに
つれ、界面活性剤の量は増加させることが好ましい。こ
れは界面活性剤の量が少ない状態で、有機溶媒の量を多
く用いると有機溶媒が溶解せず、従って良好な現像性の
確保が期待できなくなるからである。Preferred organic solvents include those having a solubility in water of about 10% by weight or less, and more preferably those having a solubility in water of 5% by weight or less. For example, 1-phenylethanol, 2-phenylethanol, 3-phenylpropanol, 1,4-phenylbutanol, 2,2-phenylbutanol, 1,2
-Phenoxyethanol, 2-benzyloxyethanol, o-methoxybenzyl alcohol, m-methoxybenzyl alcohol, p-methoxybenzyl alcohol,
Examples thereof include benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 4-methylcyclohexanol, and 3-methylcyclohexanol. The content of the organic solvent is preferably from 1 to 5% by weight based on the total weight of the developer at the time of use. The amount used is closely related to the amount used of the surfactant, and it is preferable to increase the amount of the surfactant as the amount of the organic solvent increases. This is because if the amount of the organic solvent is large when the amount of the surfactant is small, the organic solvent does not dissolve, so that good development property cannot be expected.
【0096】さらに、現像液及び補充液には必要に応じ
て、消泡剤、硬水軟化剤のような添加剤を含有させるこ
ともできる。硬水軟化剤としては、例えば、Na2P2O
7、Na5P3O3、Na3P3O9、Na2O4P(NaO
3P)ΡO3Na2、カルゴン(ポリメタリン酸ナトリウ
ム)などのポリリン酸塩、例えば、エチレンジアミンテ
トラ酢酸、そのカリウム塩、そのナトリウム塩;ジエチ
レントリアミンペンタ酢酸、そのカリウム塩、ナトリウ
ム塩;トリエチレンテトラミンヘキサ酢酸、そのカリウ
ム塩、そのナトリウム塩;ヒドロキシエチルエチレンジ
アミントリ酢酸、そのカリウム塩、そのナトリウム塩;
ニトリロトリ酢酸、そのカリウム塩、そのナトリウム
塩;1,2−ジアミノシクロヘキサンテトラ酢酸、その
カリウム塩、そのナトリウム塩、1,3−ジアミノ−2
−プロパノールテトラ酢酸、そのカリウム塩、そのナト
リウム塩などのようなアミノポリカルボン酸類の他、2
−ホスホノブタントリカルボン酸−1,2,4、そのカ
リウム塩、そのナトリウム塩;2−ホスホノブタノント
リカルボン酸−2,3,4、そのカリウム塩、そのナト
リウム塩;1−ホスホノエタントリカルボン酸−1,
2,2、そのカリウム塩、そのナトリウム塩;1−ヒド
ロキシエタン−1,1−ジホスホン酸、そのカリウム
塩、そのナトリウム塩;アミノトリ(メチレンホスホン
酸)、そのカリウム塩、そのナトリウム塩などのような
有機ホスホン酸類を挙げることができる。このような硬
水軟化剤の最適量は、使用される硬水の硬度およびその
使用量に応じて変化するが、一般的には、使用時の現像
液中に0.01〜5重量%、より好ましくは0.01〜
0.5重量%の範囲で含有させうる。更に、自動現像機
を用いて、該平版印刷版を現像する場合には、処理量に
応じて現像液が疲労してくるので、補充液または新鮮な
現像液を用いて処理能力を回復させてもよい。この場
合、米国特許第4,882,246号に記載されている
方法で補充することが好ましい。Further, the developer and the replenisher may contain additives such as an antifoaming agent and a water softener, if necessary. Examples of the water softener include Na 2 P 2 O
7, Na 5 P 3 O 3 , Na 3 P 3 O 9, Na 2 O 4 P (NaO
3 P) ΡO 3 Na 2, polyphosphates such as Calgon (sodium polymetaphosphate), for example, ethylenediaminetetraacetic acid, potassium salt thereof, sodium salt thereof; diethylenetriaminepentaacetic acid, its potassium salt, sodium salt, triethylenetetraminehexaacetic acid , Its potassium salt, its sodium salt; hydroxyethylethylenediaminetriacetic acid, its potassium salt, its sodium salt;
Nitrilotriacetic acid, its potassium salt, its sodium salt; 1,2-diaminocyclohexanetetraacetic acid, its potassium salt, its sodium salt, 1,3-diamino-2
Aminopolycarboxylic acids such as propanoltetraacetic acid, its potassium salt, its sodium salt and the like;
-Phosphonobutanetricarboxylic acid-1,2,4, its potassium salt, its sodium salt; 2-phosphonobutanone tricarboxylic acid-2,3,4, its potassium salt, its sodium salt; 1-phosphonoethanetricarboxylic acid -1,
2,2, its potassium salt, its sodium salt; 1-hydroxyethane-1,1-diphosphonic acid, its potassium salt, its sodium salt; such as aminotri (methylenephosphonic acid), its potassium salt, its sodium salt, etc. Organic phosphonic acids can be mentioned. The optimum amount of such a water softener varies depending on the hardness of the hard water used and the amount thereof used. Is 0.01 ~
It may be contained in the range of 0.5% by weight. Further, when developing the lithographic printing plate using an automatic developing machine, the developer becomes fatigued according to the processing amount, so that the processing ability is restored by using a replenisher or a fresh developer. Is also good. In this case, it is preferable to replenish by the method described in U.S. Pat. No. 4,882,246.
【0097】このような界面活性剤、有機溶剤及び還元
剤等を含有する現像液としては、例えば、特開昭51−
77401号に記載されている、ベンジルアルコール、
アニオン性界面活性剤、アルカリ剤及び水からなる現像
液組成物、特開昭53−44202号に記載されてい
る、ベンジルアルコール、アニオン性界面活性剤、及び
水溶性亜硫酸塩を含む水性溶液からなる現像液組成物、
特開昭55−155355号に記載されている、水に対
する溶解度が常温において10重量%以下である有機溶
剤、アルカリ剤、及び水を含有する現像液組成物等が挙
げられ、本発明においても好適に使用される。Examples of such a developer containing a surfactant, an organic solvent and a reducing agent include, for example, those described in
Benzyl alcohol described in No. 77401,
A developer composition comprising an anionic surfactant, an alkaline agent and water, comprising an aqueous solution containing benzyl alcohol, an anionic surfactant, and a water-soluble sulfite described in JP-A-53-44202. Developer composition,
Examples thereof include a developer composition containing an organic solvent, an alkali agent, and water having a solubility in water of 10% by weight or less at room temperature described in JP-A-55-155355, which is also suitable for the present invention. Used for
【0098】以上記述した現像液及び補充液を用いて現
像処理された印刷版は、水洗水、界面活性剤等を含有す
るリンス液、アラビアガムや澱粉誘導体を含む不感脂化
液で後処理される。本発明の画像記録材料を印刷版原版
として使用する場合の後処理としては、これらの処理を
種々組み合わせて用いることができる。The printing plate developed using the above-described developing solution and replenishing solution is post-treated with washing water, a rinsing solution containing a surfactant and the like, and a desensitizing solution containing gum arabic and a starch derivative. You. As the post-processing when the image recording material of the present invention is used as a printing plate precursor, these processings can be used in various combinations.
【0099】近年、製版・印刷業界では製版作業の合理
化及び標準化のため、印刷用版材用の自動現像機が広く
用いられている。この自動現像機は、一般に現像部と後
処理部からなり、印刷用版材を搬送する装置と各処理液
槽とスプレー装置とからなり、露光済みの印刷版を水平
に搬送しながら、ポンプで汲み上げた各処理液をスプレ
ーノズルから吹き付けて現像処理するものである。ま
た、最近は処理液が満たされた処理液槽中に液中ガイド
ロール等によって印刷版原版を浸漬搬送させて処理する
方法も知られている。このような自動処理においては、
各処理液に処理量や稼働時間等に応じて補充液を補充し
ながら処理することができる。また、電気伝導度をセン
サーにて感知し、自動的に補充することもできる。ま
た、実質的に未使用の処理液で処理するいわゆる使い捨
て処理方式も適用できる。In recent years, in the plate making / printing industry, automatic developing machines for printing plate materials have been widely used in order to rationalize and standardize plate making operations. The automatic developing machine generally includes a developing section and a post-processing section, and includes a device for transporting a printing plate material, each processing solution tank, and a spray device. The developing process is performed by spraying each pumped processing liquid from a spray nozzle. Recently, a method is also known in which a printing plate precursor is immersed and conveyed in a processing liquid tank filled with a processing liquid using a submerged guide roll or the like for processing. In such automatic processing,
Processing can be performed while replenishing each processing solution with a replenisher according to the processing amount, operating time, and the like. In addition, the electric conductivity can be detected by a sensor and replenished automatically. Further, a so-called disposable processing method in which processing is performed with a substantially unused processing liquid can also be applied.
【0100】以上のようにして得られた平版印刷版は所
望により不感脂化ガムを塗布したのち、印刷工程に供す
ることができるが、より一層の高耐刷力の平版印刷版と
したい場合にはバーニング処理が施される。平版印刷版
をバーニングする場合には、バーニング前に特公昭61
−2518号、同55−28062号、特開昭62−3
1859号、同61−159655号の各公報に記載さ
れているような整面液で処理することが好ましい。The lithographic printing plate obtained as described above can be subjected to a printing step after applying a desensitized gum if desired. Is subjected to a burning process. When burning a lithographic printing plate, before burning,
No. 2518, No. 55-28062, JP-A-62-3
It is preferable to treat with a surface-regulating liquid as described in JP-A Nos. 1859 and 61-159655.
【0101】その方法としては、該整面液を浸み込ませ
たスポンジや脱脂綿にて、平版印刷版上に塗布するか、
整面液を満たしたバット中に印刷版を浸漬して塗布する
方法や、自動コーターによる塗布等が適用される。ま
た、塗布した後でスキージ又はスキージローラーで、そ
の塗布量を均一にすることは、より好ましい結果を与え
る。整面液の塗布量は一般に0.03〜0.8g/m2
(乾燥重量)が適当である。As a method for this, a sponge or absorbent cotton impregnated with the surface conditioning liquid is applied onto a lithographic printing plate,
A method in which a printing plate is immersed in a vat filled with a surface conditioning liquid to apply the printing plate, an application using an automatic coater, or the like is applied. Further, making the amount of the coating uniform with a squeegee or a squeegee roller after the coating gives more preferable results. The application amount of the surface conditioning liquid is generally 0.03 to 0.8 g / m 2.
(Dry weight) is appropriate.
【0102】整面液が塗布された平版印刷版は必要であ
れば乾燥された後、バーニングプロセッサー(例えば、
富士写真フイルム(株)より販売されているバーニング
プロセッサー:BP−1300)等で高温に加熱され
る。この場合の加熱温度及び時間は、画像を形成してい
る成分の種類にもよるが、180〜300℃の範囲で1
〜20分の範囲が好ましい。The lithographic printing plate to which the surface conditioning liquid has been applied is dried if necessary, and then burned (for example,
It is heated to a high temperature by a burning processor: BP-1300 sold by Fuji Photo Film Co., Ltd. The heating temperature and time in this case depend on the type of the component forming the image, but may be 1 to 180 ° C. to 300 ° C.
A range of up to 20 minutes is preferred.
【0103】バーニング処理された平版印刷版は、必要
に応じて適宜、水洗、ガム引き等の従来行なわれている
処理を施こすことができるが、水溶性高分子化合物等を
含有する整面液が使用された場合にはガム引きなどのい
わゆる不感脂化処理を省略することができる。The burned lithographic printing plate can be subjected to conventional treatments such as washing with water and gumming if necessary. When is used, so-called desensitizing treatment such as gumming can be omitted.
【0104】このような処理によって得られた平版印刷
版はオフセット印刷機等にかけられ、多数枚の印刷に用
いられる。The lithographic printing plate obtained by such a process is applied to an offset printing machine or the like and used for printing a large number of sheets.
【0105】[0105]
【実施例】以下、本発明の実施例を説明するが、本発明
はこれらの実施例に何ら限定されるものではない。EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples.
【0106】(実施例1〜17) [基板の作製]厚み0.3mmのアルミニウム版(材質
1050)をトリクロロエチレンで洗浄して脱脂した
後、ナイロンブラシと400メッシュのパミス−水懸濁
液を用いこの表面を砂目立て表面のエッチングを行い、
水洗後、更に20%硝酸に20秒間浸漬し、水洗した。
この時の砂目立て表面のエッチング量は約3g/m2で
あった。次にこの板を7%硫酸を電解液として電流密度
15A/dm2で3g/m2の直流電極酸化被膜を設けた
後、水洗し、乾燥して基板(A)を作成した。基板
(A)を珪酸ナトリウム2重量%水溶液で25℃で15
秒処理し、水洗して基板(B)を作成した。(Examples 1 to 17) [Preparation of substrate] An aluminum plate (material 1050) having a thickness of 0.3 mm was washed with trichlorethylene and degreased, and then a nylon brush and a 400-mesh pumice-water suspension were used. This surface is grained and etched.
After washing with water, it was further immersed in 20% nitric acid for 20 seconds and washed with water.
At this time, the etching amount of the grained surface was about 3 g / m 2 . Next, this plate was provided with a DC electrode oxide film of 3 g / m 2 at a current density of 15 A / dm 2 using 7% sulfuric acid as an electrolyte, washed with water and dried to prepare a substrate (A). The substrate (A) is treated with a 2% by weight aqueous solution of sodium silicate at 25 ° C. for 15 minutes.
Secondly, the substrate was washed with water to prepare a substrate (B).
【0107】[中間層の形成]次に下記の手順によりS
G法の液状組成物(ゾル液)を調整した。 <ゾル液組成> ・メタノール 130g ・水 20g ・85重量%リン酸 16g ・テトラエトキシシラン 50g ・3−メタクリロキシプロピルトリメトキシシラン 60g 上記の各化合物を混合し、撹拌した。約5分で発熱が認
められた。60分間反応させた後、内容物を別の容器へ
移し、メタノール3000gを加えることにより、ゾル
液を得た。このゾル液をメタノール/エチレングリコー
ル=9/1(重量比)で希釈して、上述の様に作製され
た基板[A]上に、基板上のSiの量が3mg/m2と
なるように塗布し、100℃にて1分間乾燥させ、基板
[C]を得た。[Formation of Intermediate Layer] Next, S
A liquid composition (sol solution) of Method G was prepared. <Sol solution composition>-130 g of methanol-20 g of water-16 g of 85 wt% phosphoric acid-50 g of tetraethoxysilane-60 g of 3-methacryloxypropyltrimethoxysilane The above compounds were mixed and stirred. An exotherm was observed in about 5 minutes. After reacting for 60 minutes, the content was transferred to another container, and 3000 g of methanol was added to obtain a sol solution. This sol solution was diluted with methanol / ethylene glycol = 9/1 (weight ratio) so that the amount of Si on the substrate [A] prepared as described above was 3 mg / m 2. It was applied and dried at 100 ° C. for 1 minute to obtain a substrate [C].
【0108】[感光層の形成]上述の様に作成された基
板[A]乃至基板[C]のいずれかを支持体とし、その
表面に下記組成の感光層塗布液を塗布し、115℃で1
分乾燥し、1.4g/m2の感光層を形成し、実施例1
〜17の平版印刷版原版を得た。使用する基板、(A)
オニウム塩構造を有する重合開始剤(重合開始剤と表示
する)、(B)光熱変換剤、(C)重合性の不飽和基を
有する化合物(付加重合性化合物と表示する)、(D)
ボレート化合物(添加剤と表示する)及び、(E)バイ
ンダーは下記表1に示す通りである。[Formation of Photosensitive Layer] One of the substrates [A] to [C] prepared as described above was used as a support, and a photosensitive layer coating solution having the following composition was applied to the surface thereof. 1
After drying for a minute, a photosensitive layer of 1.4 g / m 2 was formed.
~ 17 planographic printing plate precursors were obtained. Substrate used, (A)
A polymerization initiator having an onium salt structure (denoted as a polymerization initiator), (B) a photothermal conversion agent, (C) a compound having a polymerizable unsaturated group (denoted as an addition polymerizable compound), (D)
The borate compound (denoted as an additive) and the binder (E) are as shown in Table 1 below.
【0109】 (感光層塗布液) ・付加重合性化合物(表1記載の化合物) 1.5g ・バインダー(表1記載の化合物) 2.0g ・光熱変換剤(表1記載の化合物) 0.1g ・重合開始剤(表1記載の化合物) 0.2g ・ボレート化合物(表1記載の化合物) 0.1g ・2,6−ジ−t−ブチル−4−フェノール 0.01g ・フッ素系ノニオン界面活性剤(メガファックF−177P、 大日本インキ化学工業(株)製) 0.02g ・ビクトリアピュアブルーBOHの対アニオンを1−ナフタレン スルホン酸アニオンにした染料 0.04g ・メチルエチルケトン 10g ・メタノール 7g ・2−メトキシ−1−プロパノール 10g(Coating solution for photosensitive layer)-Addition polymerizable compound (compound described in Table 1) 1.5 g-Binder (compound described in Table 1) 2.0 g-Photothermal conversion agent (compound described in Table 1) 0.1 g・ Polymerization initiator (compounds listed in Table 1) 0.2 g ・ Borate compound (compounds listed in Table 1) 0.1 g ・ 2,6-di-t-butyl-4-phenol 0.01 g ・ Fluorine nonionic surface activity Agent (MegaFac F-177P, manufactured by Dainippon Ink and Chemicals, Inc.) 0.02 g ・ Dye in which the counter anion of Victoria Pure Blue BOH is changed to 1-naphthalene sulfonic acid anion 0.04 g ・ Methyl ethyl ketone 10 g ・ Methanol 7 g ・ 2 -Methoxy-1-propanol 10 g
【0110】[0110]
【化11】 Embedded image
【0111】[0111]
【化12】 Embedded image
【0112】[0112]
【化13】 Embedded image
【0113】[0113]
【表1】 [Table 1]
【0114】(表1中の付加重合性化合物) (M−1) ペンタエリスリトールテトラアクリレート (M−2) グリセリンジメタクリレートヘキサメチレンジイソシア
ネートウレタンプレポリマー(Addition polymerizable compounds in Table 1) (M-1) pentaerythritol tetraacrylate (M-2) glycerin dimethacrylate hexamethylene diisocyanate urethane prepolymer
【0115】(表1中のバインダー) (B−1) アリルメタクリレート/メタクリル酸/N−イソプロピ
ルアミド共重合体(共重合モル比:67/13/20) 酸価(NaOH滴定により実測)1.15meq/g 重合平均分子量13万 (B−2) アリルメタクリレート/メタクリル酸共重合体 (共重合モル比:83/17) 酸価(NaOH滴定により実測)1.55meq/g 重合平均分子量12.5万 (B−3)下記ジイソシアネートとジオールの縮合物で
あるポリウレタン樹脂 (a)4,4’−ジフェニルメタンジイソシアネート (b)ヘキサメチレンジイソシアネート (c)ポリプロピレングルコール(重量平均分子量:10
00) (d)2,2−ビス(ヒドロキシメチル)プロピオン酸
((a)/(b)/(c)/(d) 共重合モル比:40/10/1
5/35) 酸価(NaOH滴定により実測)1.05meq/g 重合平均分子量4.5万(Binder in Table 1) (B-1) Allyl methacrylate / methacrylic acid / N-isopropylamide copolymer (copolymerization molar ratio: 67/13/20) Acid value (actually measured by NaOH titration) 15meq / g Polymerization average molecular weight 130,000 (B-2) Allyl methacrylate / methacrylic acid copolymer (copolymerization molar ratio: 83/17) Acid value (actually measured by NaOH titration) 1.55meq / g Polymerization average molecular weight 12.5 (B-3) Polyurethane resin which is a condensate of the following diisocyanate and diol (a) 4,4'-diphenylmethane diisocyanate (b) hexamethylene diisocyanate (c) polypropylene glycol (weight average molecular weight: 10
00) (d) 2,2-bis (hydroxymethyl) propionic acid ((a) / (b) / (c) / (d) copolymer molar ratio: 40/10/1)
5/35) Acid value (actually measured by NaOH titration) 1.05 meq / g Polymerization average molecular weight 45,000
【0116】(比較例1〜4)比較のため、基板[A]
乃至基板[C]上に前記一般式(1)で表される以外の
ボレート化合物H−1、H−2を添加したか、或いは、
ボレート化合物をまったく添加しなかった他は表1に示
す組成の感光層塗布液を用いて感光層を形成し、平版印
刷版原版を得た(比較例1〜4)。(Comparative Examples 1-4) For comparison, the substrate [A]
Or borate compounds H-1 and H-2 other than those represented by the general formula (1) are added to the substrate [C], or
Except that no borate compound was added, a photosensitive layer was formed using a photosensitive layer coating solution having the composition shown in Table 1 to obtain a lithographic printing plate precursor (Comparative Examples 1 to 4).
【0117】[0117]
【化14】 Embedded image
【0118】[露光、現像]得られた平版印刷版原版を
出力500mW、波長830nm、ビーム径17μm
(l/e2)の半導体レーザを用いて主走査速度5m/秒
にて露光した後、富士フィルム(株)社製DN3C現像
液、またはDP−4現像液及びリンス液FR−3(1:
7)を仕込んだ自動現像機(富士写真フィルム(株)
製:PSプロセッサー900VR)を用いて現像し、以
下の評価を行った。なお、現像処理に際していずれの現
像液を用いたかは前記表1に併記した。[Exposure and Development] The obtained lithographic printing plate precursor was output at a power of 500 mW, a wavelength of 830 nm, and a beam diameter of 17 μm.
After exposure at a main scanning speed of 5 m / sec using a semiconductor laser of (l / e 2 ), a DN3C developer manufactured by Fuji Film Co., Ltd., or a DP-4 developer and a rinse FR-3 (1:
7) Automatic developing machine (Fuji Photo Film Co., Ltd.)
(Manufactured by PS Processor 900VR) and the following evaluation was performed. Table 1 also shows which developing solution was used in the developing process.
【0119】[平版印刷版原版の評価] [1.感度の評価]得られた平版印刷版原版を、調製直
後に、波長830〜850nm程度の赤外線を発する半
導体レーザーで露光した。露光後、富士写真フイルム
(株)製現像液DN−3C(1:2の比率で水で希
釈)、或いは富士写真フイルム(株)製現像液DP−4
(1:8の比率で水で希釈)で現像し、水洗した。これ
らの際得られた画像の線幅とレーザー出力、光学系での
ロス及び走査速度を基に、記録に必要なエネルギー量を
算出した。数値が小さいほど高感度であることを表す。
これらの評価結果を表1に併記する。[Evaluation of lithographic printing plate precursor] [1. Evaluation of Sensitivity] Immediately after the preparation, the obtained lithographic printing plate precursor was exposed to a semiconductor laser emitting infrared light having a wavelength of about 830 to 850 nm. After the exposure, a developer DN-3C manufactured by Fuji Photo Film Co., Ltd. (diluted with water at a ratio of 1: 2) or a developer DP-4 manufactured by Fuji Photo Film Co., Ltd.
(Diluted with water at a ratio of 1: 8) and washed with water. The amount of energy required for recording was calculated based on the line width and laser output of the images obtained at these times, the loss in the optical system, and the scanning speed. The smaller the value, the higher the sensitivity.
These evaluation results are also shown in Table 1.
【0120】[2.感度変動の評価]得られた平版印刷
版原版を、60℃(10%RH)の雰囲気下に3日間保
存した後に、前記感度の評価と同じ条件で、露光、現像
を行ない、同様にして、記録に必要なエネルギー量を算
出した。この高温条件下に保存した後の感度と、調製直
後に測定した感度との差を経時感度変動の値とした。数
値が小さいほど保存安定性に優れることを表す。これら
の評価結果を表1に併記する。[2. Evaluation of Sensitivity Fluctuation] After the obtained lithographic printing plate precursor was stored in an atmosphere of 60 ° C. (10% RH) for 3 days, exposure and development were performed under the same conditions as in the evaluation of sensitivity, and The amount of energy required for recording was calculated. The difference between the sensitivity after storage under the high temperature condition and the sensitivity measured immediately after preparation was defined as the value of the time-dependent sensitivity variation. The smaller the value, the better the storage stability. These evaluation results are also shown in Table 1.
【0121】表1の結果より、本発明の平版印刷版用原
版は、高感度で、且つ、感度変動が抑制されており、保
存安定性に優れることがわかる。一方、公知のボレート
化合物添加しなかった比較例1、3の平版印刷版原版
は、添加剤以外はすべて同じ条件で得られた実施例1、
5のそれぞれと互いに比較して感度及び保存安定性のい
ずれにも劣っていることがわかった。また、ボレート化
合物として、芳香族基を3つのみ有するトリアリールボ
レートを添加した比較例2、4はいずれも感度変動が著
しく、保存安定性に劣ることがわかった。From the results shown in Table 1, it can be seen that the lithographic printing plate precursor according to the present invention has high sensitivity, reduced sensitivity fluctuation, and excellent storage stability. On the other hand, the lithographic printing plate precursors of Comparative Examples 1 and 3 to which the known borate compound was not added were the same as those of Examples 1 and 2 obtained under the same conditions except for the additives.
5 was inferior in both sensitivity and storage stability as compared with each other. Further, it was found that Comparative Examples 2 and 4, in which a triaryl borate having only three aromatic groups was added as the borate compound, had remarkable fluctuations in sensitivity and were inferior in storage stability.
【0122】(実施例18〜34、比較例5〜8)前記
実施例1〜17、比較例1〜4で得られた平版印刷版原
版の感光層上にポリビニルアルコール(ケン化度:98
モル%、重合度:550)の3重量%水溶液を乾燥後の
塗布量が2g/m2となるように塗布し、100℃で1
分間乾燥して感光層上に保護層を設け、実施例17〜3
4の平版印刷版原版を得た。得られた平版印刷版原版を
上記実施例1〜17と同様の条件で、露光、現像して平
版印刷版を製版し、同様に感度及び経時感度変動を評価
した。結果を上記表1に併記する。(Examples 18 to 34, Comparative Examples 5 to 8) Polyvinyl alcohol (degree of saponification: 98) was formed on the photosensitive layer of the lithographic printing plate precursor obtained in Examples 1 to 17 and Comparative Examples 1 to 4.
Mol%, polymerization degree: 550) in an amount of 2 g / m 2 after drying.
After drying for 5 minutes, a protective layer was provided on the photosensitive layer.
Thus, a lithographic printing plate precursor No. 4 was obtained. The obtained lithographic printing plate precursor was exposed and developed under the same conditions as in Examples 1 to 17 described above to produce a lithographic printing plate, and the sensitivity and the change in sensitivity over time were evaluated in the same manner. The results are shown in Table 1 above.
【0123】表1の結果より、感光層の上に保護層を設
けた場合においても、保護層を有しない実施例1〜17
及び比較例1〜4と同様の傾向が見られ、本発明の平版
印刷版原版は感度に優れ、保存による感度変動が少な
く、保存安定性に優れていたが、ボレート化合物の添加
剤を併用しなかった比較例はいずれも感度、保存安定性
に問題があった。また、トリアリールボレートを添加し
た比較例6、8はいずれも現像不良により、画像形成さ
れなかった。これは、長時間60℃で放置したために、
トリアリールボレート化合物が少量分解し、保護層が存
在するために酸素により失活せず、重合反応が進行した
ためと推定される。From the results shown in Table 1, it can be seen from Examples 1 to 17 that no protective layer was provided even when a protective layer was provided on the photosensitive layer.
The same tendency as that of Comparative Examples 1 to 4 was observed, and the lithographic printing plate precursor of the present invention was excellent in sensitivity, little in sensitivity fluctuation upon storage, and excellent in storage stability, but was used in combination with a borate compound additive. All of the comparative examples which did not have a problem in sensitivity and storage stability. In Comparative Examples 6 and 8 to which triaryl borate was added, images were not formed due to poor development. This is because it was left at 60 ° C for a long time,
It is presumed that the triarylborate compound was decomposed in a small amount and was not deactivated by oxygen due to the presence of the protective layer, and the polymerization reaction proceeded.
【0124】[0124]
【発明の効果】本発明のネガ型平版印刷版原版は、赤外
線レーザにより書き込みが可能であり、記録時の感度に
優れ、且つ、経時による感度の低下が抑制され、保存安
定性に優れるという効果を奏する。The negative type lithographic printing plate precursor according to the present invention is writable by an infrared laser, has excellent sensitivity at the time of recording, suppresses a decrease in sensitivity over time, and has excellent storage stability. Play.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G03F 7/027 G03F 7/027 (72)発明者 曽呂利 忠弘 静岡県榛原郡吉田町川尻4000番地 富士写 真フイルム株式会社内 Fターム(参考) 2H025 AA01 AB03 AC08 AD01 BC31 BC34 CA39 CA48 CC01 CC11 2H096 AA06 BA05 EA04 EA23 2H114 AA04 AA14 AA22 AA24 BA01 BA10 DA21 DA25 DA28 DA47 EA01 EA02 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G03F 7/027 G03F 7/027 (72) Inventor Tadahiro Soro 4,000 Kawajiri, Yoshida-cho, Harihara-gun, Shizuoka Prefecture Fuji Photo film F-term (reference) 2H025 AA01 AB03 AC08 AD01 BC31 BC34 CA39 CA48 CC01 CC11 2H096 AA06 BA05 EA04 EA23 2H114 AA04 AA14 AA22 AA24 BA01 BA10 DA21 DA25 DA28 DA47 EA01 EA02
Claims (1)
する重合開始剤、(B)光熱変換剤、(C)重合性の不
飽和基を有する化合物、及び、(D)下記一般式(1)
で表されるボレート化合物を含有し、赤外線レーザーで
記録可能な感光層を備えることを特徴とするヒートモー
ド対応ネガ型平版印刷版原版。 〔一般式(1)〕 Ar4B- M+ 式中、M+は1価のカチオン、Arはそれぞれ独立に、
芳香族基を表す。1. A support comprising, on a support, (A) a polymerization initiator having an onium salt structure, (B) a photothermal conversion agent, (C) a compound having a polymerizable unsaturated group, and (D) a compound having the following general formula: (1)
A heat-mode-compatible negative-working lithographic printing plate precursor comprising a photosensitive layer containing a borate compound represented by formula (1) and recordable with an infrared laser. [General formula (1)] Ar 4 B - M + wherein M + is a monovalent cation, and Ar is each independently
Represents an aromatic group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000310808A JP4202589B2 (en) | 2000-10-11 | 2000-10-11 | Planographic printing plate precursor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000310808A JP4202589B2 (en) | 2000-10-11 | 2000-10-11 | Planographic printing plate precursor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002116539A true JP2002116539A (en) | 2002-04-19 |
| JP4202589B2 JP4202589B2 (en) | 2008-12-24 |
Family
ID=18790689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000310808A Expired - Lifetime JP4202589B2 (en) | 2000-10-11 | 2000-10-11 | Planographic printing plate precursor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4202589B2 (en) |
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