JP2002110872A - Wiring board and wiring board module - Google Patents
Wiring board and wiring board moduleInfo
- Publication number
- JP2002110872A JP2002110872A JP2000294743A JP2000294743A JP2002110872A JP 2002110872 A JP2002110872 A JP 2002110872A JP 2000294743 A JP2000294743 A JP 2000294743A JP 2000294743 A JP2000294743 A JP 2000294743A JP 2002110872 A JP2002110872 A JP 2002110872A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- metal plate
- insulating substrate
- metal
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10W72/884—
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
(57)【要約】
【課題】絶縁基板に生じる引張り残留応力を低減し、使
用時の絶縁基板の割れを抑制し、金属板と絶縁基板の良
好な接合状態を維持し、半導体素子から放出される熱を
効率よく収納容器へ伝導できる配線基板および配線基板
モジュールを提供する。
【解決手段】セラミックスからなる絶縁基板32の一方
主面に、低抵抗金属を主体とする金属板35を金属板用
接合材37により接合してなるとともに、絶縁基板32
の他方主面に、端面が金属板用接合材37の端面よりも
内側となるようにメタライズ層39を形成した。
(57) Abstract: The present invention reduces tensile residual stress generated in an insulating substrate, suppresses cracking of the insulating substrate during use, maintains a good bonding state between a metal plate and the insulating substrate, and is released from a semiconductor element. Provided is a wiring board and a wiring board module that can efficiently conduct heat to a storage container. A metal plate mainly composed of a low-resistance metal is bonded to one main surface of an insulating substrate made of ceramics by a bonding material for a metal plate.
A metallized layer 39 was formed on the other main surface so that the end face was inside the end face of the joining material 37 for a metal plate.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体素子が収容
搭載される半導体素子収納用パッケージや、半導体素子
の他にコンデンサや抵抗体等の各種電子部品が搭載され
る混成集積回路装置等に好適な配線基板および配線基板
モジュールに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is suitable for a package for accommodating a semiconductor element in which a semiconductor element is accommodated and mounted, and a hybrid integrated circuit device in which various electronic components such as a capacitor and a resistor are mounted in addition to the semiconductor element. The present invention relates to a simple wiring board and a wiring board module.
【0002】[0002]
【従来技術】近年、ICやLSI等の半導体素子の高速
化、高集積化に伴い、該半導体素子を搭載する配線基板
には、従来より更にパターンの微細化が行われ、高密度
な配線パターンが形成され、また、近年の半導体素子の
大パワー化に伴い、それに付随する大パワーを電送する
パワー配線が形成されている。2. Description of the Related Art In recent years, as semiconductor devices such as ICs and LSIs have become faster and more highly integrated, wiring boards on which the semiconductor devices are mounted have been further miniaturized in pattern, and high-density wiring patterns have been developed. In addition, with the recent increase in power of semiconductor devices, power wirings for transmitting the accompanying large power are formed.
【0003】このような配線基板9は、図6(a)に示
すように、セラミックスからなる絶縁基板2の上面に、
低抵抗金属を主体とする金属板(パワー配線)3を金属
板用接合材5により接合し、絶縁基板2の下面にはメタ
ライズ層7を形成して構成されている。As shown in FIG. 6A, such a wiring board 9 is provided on the upper surface of an insulating substrate 2 made of ceramics.
A metal plate (power wiring) 3 mainly composed of a low resistance metal is joined by a joining material 5 for a metal plate, and a metallized layer 7 is formed on the lower surface of the insulating substrate 2.
【0004】金属板3上にはIGBT素子などのパワー
半導体素子8が接合搭載され、このような半導体素子8
が搭載された配線基板9を、アルミなどの高熱伝導材料
で形成された収納容器11に、熱伝導グリースや高熱伝
導接着剤、はんだなどからなる基板用接合材13を介し
て固定され、配線基板モジュールが形成されている。[0004] A power semiconductor element 8 such as an IGBT element is bonded and mounted on the metal plate 3.
Is fixed to a storage container 11 made of a high heat conductive material such as aluminum via a board bonding material 13 made of a heat conductive grease, a high heat conductive adhesive, solder, or the like. A module is formed.
【0005】このような配線基板モジュールでは、配線
基板9に搭載されたパワー半導体素子8が駆動時に発熱
するが、その熱は、金属板3、配線基板9の絶縁基板
2、熱伝導グリースまたは高熱伝導接着剤、はんだ等の
基板用接合材13を介して収納容器11へと伝導され、
収納容器11より大気中などに伝達される。In such a wiring board module, the power semiconductor element 8 mounted on the wiring board 9 generates heat when driven, but the heat is generated by the metal plate 3, the insulating substrate 2 of the wiring board 9, heat conductive grease or high heat. Conducted to the storage container 11 via the board bonding material 13 such as a conductive adhesive and solder,
It is transmitted from the storage container 11 to the atmosphere or the like.
【0006】その際、絶縁基板2の熱伝導率の大きさが
重要であるが、熱伝導グリースまたは高熱伝導接着剤、
はんだ等の基板用接合材13の厚みが放熱性に大きく影
響する。At this time, the magnitude of the thermal conductivity of the insulating substrate 2 is important, but the thermal conductive grease or the high thermal conductive adhesive,
The thickness of the board bonding material 13 such as solder greatly affects the heat dissipation.
【0007】また、近年の半導体素子を搭載した半導体
装置等、各種電子装置の用途の拡大により、その使用環
境は従来よりも多彩でかつより厳しいものとなってお
り、特に自動車の電子制御化の発展に伴って車載環境で
用いられる場合には、使用環境が厳しい上に高い信頼性
が要求されている。Further, due to the recent expansion of applications of various electronic devices such as semiconductor devices mounted with semiconductor elements, the usage environment has become more diversified and severer than in the past. When used in an in-vehicle environment with development, the use environment is severe and high reliability is required.
【0008】上記車載環境で用いられる各種電子制御装
置では、高い信頼性を確保する上で重要となるのが、回
路設計及びユニット構造を含む放熱設計、及び構造的な
信頼性設計である。該電子制御装置に搭載された配線基
板に搭載されたパワー半導体素子自体の熱放散性の確保
には、該絶縁基板の熱伝導性の確保、パワー半導体素子
と該絶縁基板との良好な接合状態の確保、該絶縁基板と
収納容器との良好な接合性の確保が重要となる。[0008] In various electronic control devices used in the above-mentioned vehicle-mounted environment, what is important for ensuring high reliability is a heat dissipation design including a circuit design and a unit structure, and a structural reliability design. In order to ensure the heat dissipation of the power semiconductor element itself mounted on the wiring board mounted on the electronic control unit, it is necessary to ensure the thermal conductivity of the insulating substrate and to ensure a good bonding state between the power semiconductor element and the insulating substrate. It is important to ensure that the insulating substrate and the storage container have good bonding properties.
【0009】その中でも、高熱伝導、低抵抗金属から成
る金属板(パワー配線)が設けられた絶縁基板の割れに
よる金属板の剥離の防止が重要である。大電流が印加さ
れるパワー配線自体の発熱の低減は言うまでもなく重要
である。Above all, it is important to prevent peeling of the metal plate due to cracking of an insulating substrate provided with a metal plate (power wiring) made of a metal having high thermal conductivity and low resistance. It is needless to say that the heat generation of the power wiring itself to which a large current is applied is reduced.
【0010】そこで、前述のような高い熱放散性、パワ
ー配線の低発熱性の確保、絶縁基板の割れによるパワー
配線の剥離を防止するために、配線材料の改良、基板構
造の改良、配線基板モジュール構造の改良、各種接合部
の改善、改良などの対策が取られている。Therefore, in order to ensure high heat dissipation and low heat generation of the power wiring as described above, and to prevent peeling of the power wiring due to cracking of the insulating substrate, improvement of the wiring material, improvement of the substrate structure, and improvement of the wiring substrate Countermeasures such as improvement of module structure, improvement and improvement of various joints are taken.
【0011】[0011]
【発明が解決しようとする課題】配線基板に用いられる
大電流用のパワー配線の低抵抗配線材料は、基本的に銅
(Cu、融点約1085℃)等の低融点金属であり、高
温焼成して作製されるアルミナ質セラミック材料等から
なる電子回路基板では、前記低抵抗の配線材料は同時焼
成で形成できない。The low-resistance wiring material of the power wiring for a large current used for the wiring board is basically a low-melting-point metal such as copper (Cu, melting point of about 1085 ° C.). In an electronic circuit board made of an alumina ceramic material or the like, the low-resistance wiring material cannot be formed by simultaneous firing.
【0012】その為、絶縁基板としてアルミナ質セラミ
ック材料や窒化アルミ質セラミック材料、窒化珪素質セ
ラミック材料などの高温焼成が必要な材料を用いる場
合、低抵抗配線材料を用いたパワー配線を、絶縁基板の
焼成後に、該絶縁基板上に形成することとなる。Therefore, when a material requiring high-temperature sintering, such as an alumina ceramic material, an aluminum nitride ceramic material, or a silicon nitride ceramic material, is used as the insulating substrate, the power wiring using the low resistance wiring material is replaced with the insulating substrate. Is formed on the insulating substrate after firing.
【0013】パワー配線としては、銅、銅−タングステ
ンなどの金属板が用いられるが、このような低抵抗配線
材料は、一般的に熱膨張がセラミック材料からなる絶縁
基板よりも大きい。その為、パワー配線を絶縁基板にろ
う材で溶融接合すると、パワー配線と絶縁基板の熱膨張
差により、配線基板には引張りの残留応力が生じる。特
に、金属板用接合材の端面に位置する絶縁基板に、最も
大きな残留応力が生じる。パワー配線の接合で絶縁基板
に生じる応力分布を図6bに実線で記載した。As the power wiring, a metal plate such as copper or copper-tungsten is used. Such a low-resistance wiring material generally has a larger thermal expansion than an insulating substrate made of a ceramic material. Therefore, when the power wiring is melt-bonded to the insulating substrate with a brazing material, a tensile residual stress is generated in the wiring substrate due to a difference in thermal expansion between the power wiring and the insulating substrate. In particular, the largest residual stress occurs on the insulating substrate located at the end face of the joining material for a metal plate. The distribution of the stress generated on the insulating substrate by joining the power wiring is shown by a solid line in FIG. 6B.
【0014】次に、配線基板は、金属材料などからなる
収納容器にはんだや銀ろうなどの基板用接合材により実
装され、配線基板モジュールが形成されるが、この場合
にも、収納容器と配線基板の熱膨張率差に起因する残留
応力が生じる。収納容器への接合で絶縁基板に生じる応
力分布を図6bに破線で記載した。Next, the wiring board is mounted on a container made of a metal material or the like with a bonding material for the substrate such as solder or silver braze to form a wiring board module. Residual stress occurs due to the difference in the coefficient of thermal expansion of the substrate. The broken line in FIG. 6b shows the stress distribution generated on the insulating substrate by joining to the storage container.
【0015】この図6bから明らかなように、パワー配
線の接合で絶縁基板に生じる応力と、収納容器への接合
で絶縁基板に生じる応力が重畳し、金属板用接合材の端
面に位置する絶縁基板上に、最も大きな応力が生じてい
る。そして、使用環境において温度変化が生じると、温
度変化に起因する応力が配線基板モジュールに発生し、
上記した残留応力と相まって、絶縁基板の金属板用接合
材の端面部分に割れが生じ、パワー配線が剥離し、パワ
ー半導体素子からの熱の放散性が低下し、半導体素子の
温度上昇による誤動作などを招く虞があった。As is apparent from FIG. 6B, the stress generated in the insulating substrate when joining the power wiring and the stress generated in the insulating substrate when joining to the storage container are superimposed, and the insulation located at the end face of the joining material for the metal plate is overlapped. The largest stress occurs on the substrate. When a temperature change occurs in the use environment, a stress due to the temperature change occurs in the wiring board module,
In combination with the residual stress described above, cracks occur at the end face of the bonding material for the metal plate of the insulating substrate, the power wiring peels off, heat dissipation from the power semiconductor element is reduced, and a malfunction due to an increase in the temperature of the semiconductor element, etc. May be caused.
【0016】一方、パワー配線の厚みや収納容器の厚み
を低減させ曲げ剛性を低減することにより、パワー配線
(金属板)、収納容器、絶縁基板の三者間の熱膨張率差
に起因する絶縁基板の引張り応力を低減することができ
るが、例えば、パワー配線の厚みを低減することによ
り、抵抗値の増大、熱容量の低減、熱放散性の低減など
新たな課題が生じる。また、収納容器においては、構造
的な信頼性が低減するため好ましくない。On the other hand, by reducing the thickness of the power wiring and the thickness of the storage container to reduce the bending rigidity, the insulation caused by the difference in the coefficient of thermal expansion between the power wiring (metal plate), the storage container, and the insulating substrate is reduced. Although the tensile stress of the substrate can be reduced, for example, reducing the thickness of the power wiring causes new problems such as an increase in resistance, a reduction in heat capacity, and a reduction in heat dissipation. Further, the storage container is not preferable because structural reliability is reduced.
【0017】本発明は、絶縁基板に生じる引張り残留応
力を低減し、使用時の絶縁基板の割れを抑制し、金属板
と絶縁基板の良好な接合状態を維持し、半導体素子から
放出される熱を効率よく収納容器へ伝導できる配線基板
および配線基板モジュールを提供することを目的とす
る。The present invention reduces the tensile residual stress generated in the insulating substrate, suppresses the cracking of the insulating substrate during use, maintains a good joint between the metal plate and the insulating substrate, and reduces the heat released from the semiconductor element. To provide a wiring board and a wiring board module that can efficiently transmit the data to the storage container.
【0018】[0018]
【課題を解決するための手段】本発明の配線基板は、セ
ラミックスからなる絶縁基板の一方主面に、低抵抗金属
を主体とする金属板を金属板用接合材により接合してな
るとともに、前記絶縁基板の他方主面に、端面が前記金
属板用接合材の端面よりも内側となるようにメタライズ
層を形成してなるものである。A wiring board according to the present invention is formed by joining a metal plate mainly composed of a low-resistance metal to one main surface of an insulating substrate made of ceramics with a metal plate joining material. A metallized layer is formed on the other main surface of the insulating substrate such that the end surface is inside the end surface of the bonding material for a metal plate.
【0019】上記構成により、金属板用接合材の端面よ
りも内側に、メタライズ層の端面が存在することにな
り、金属板の接合により最も大きな残留応力が生じる金
属板用接合材の端面部分の絶縁基板には、収納容器への
接合による残留応力が発生せず、金属板、絶縁基板、収
納容器の三者間の熱膨張率差に起因した、金属板用接合
材の端面部分に位置する絶縁基板における残留応力を低
減でき、使用時における配線基板の割れを抑制し、金属
板の剥離を防止することができる。According to the above configuration, the end face of the metallized layer exists inside the end face of the joining material for a metal plate, and the end face portion of the joining material for a metal plate at which the largest residual stress occurs due to joining of the metal plates. The insulating substrate does not generate residual stress due to bonding to the storage container, and is located at an end surface portion of the metal plate bonding material due to a difference in thermal expansion coefficient between the three members of the metal plate, the insulating substrate, and the storage container. Residual stress in the insulating substrate can be reduced, cracking of the wiring substrate during use can be suppressed, and peeling of the metal plate can be prevented.
【0020】これにより、金属板の絶縁基板への接合状
態を良好に保つことができ、金属板上に実装されたパワ
ー半導体などからの熱を効果的に収納容器へ伝導し、放
熱することができ、適正な動作温度上限以上への昇温に
よるパワー半導体素子などの誤動作等の不具合が発生せ
ず、高い信頼性を維持できる。[0020] This makes it possible to maintain a good joining state of the metal plate to the insulating substrate, and to effectively conduct heat from the power semiconductor mounted on the metal plate to the housing and radiate the heat. As a result, malfunctions such as malfunctions of the power semiconductor element and the like due to the temperature rise above the appropriate operating temperature upper limit do not occur, and high reliability can be maintained.
【0021】尚、絶縁基板に、複数の金属板を金属板用
接合材によりそれぞれ接合する場合は、絶縁基板の他方
主面に、端面が複数の金属板群の接合領域よりも内側と
なるようにメタライズ層を形成しても、上記とほぼ同様
の作用効果が得られる。即ち、複数の金属板を包含する
領域に、この領域よりも狭い範囲で単一のメタライズ層
を形成する。In the case where a plurality of metal plates are joined to the insulating substrate by a joining material for a metal plate, the other principal surface of the insulating substrate has its end face inside the joining region of the plurality of metal plate groups. Even if a metallized layer is formed, substantially the same functions and effects as described above can be obtained. That is, a single metallized layer is formed in a region including a plurality of metal plates in a range narrower than this region.
【0022】また、本発明の配線基板モジュールは、セ
ラミックスからなる絶縁基板の一方主面に、低抵抗金属
を主体とする金属板を金属板用接合材により接合してな
る配線基板を、金属または合金からなる収納容器内に収
容するとともに、前記配線基板を基板用接合材により前
記収納容器に接合してなる配線基板モジュールであっ
て、前記基板用接合材の端面が前記金属板用接合材の端
面よりも内側に存在することを特徴とする。Further, the wiring board module of the present invention comprises a wiring board formed by joining a metal plate mainly composed of a low-resistance metal to one main surface of an insulating substrate made of ceramics with a joining material for a metal plate. A wiring board module which is housed in a storage container made of an alloy, and wherein the wiring board is bonded to the storage container by a bonding material for a substrate, wherein an end face of the bonding material for the substrate is formed of the bonding material for the metal plate. It is characterized by being present inside the end face.
【0023】このように、配線基板を基板用接合材によ
り直接収納容器に接合する場合には、基板用接合材の端
面が金属板用接合材の端面よりも内側に存在することに
より、上記と同様の効果が得られる。As described above, when the wiring board is directly joined to the storage container by the joining material for the substrate, since the end face of the joining material for the substrate exists inside the end face of the joining material for the metal plate, Similar effects can be obtained.
【0024】[0024]
【発明の実施の形態】本発明の配線基板を図1に基づき
説明する。図1は、本発明の配線基板を示すもので、符
号31は配線基板を示している。この配線基板31は、
セラミックスからなる絶縁基板32の一方主面に、低抵
抗金属を主体とする金属板35(パワー配線ということ
もある)を金属板用接合材37により接合してなるとと
もに、絶縁基板32の他方主面にメタライズ層39が形
成されて構成されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A wiring board according to the present invention will be described with reference to FIG. FIG. 1 shows a wiring board of the present invention, and reference numeral 31 denotes a wiring board. This wiring board 31
A metal plate 35 (also referred to as power wiring) mainly composed of a low-resistance metal is bonded to one main surface of an insulating substrate 32 made of ceramics by a metal plate bonding material 37, and the other main surface of the insulating substrate 32 is formed. A metallized layer 39 is formed on the surface.
【0025】そして、本発明の配線基板では、図1およ
び図2に示すように、メタライズ層39の端面が金属板
用接合材37の端面よりも内側に存在している。即ち、
配線基板31に設けられた金属板用接合材37の端面か
ら絶縁基板32の中心までの距離L1と、メタライズ層
39の端面から絶縁基板32の中心までの距離L2との
関係がL1>L2となっている。言い換えれば、図2に示
すように、金属板用接合材37、メタライズ層39はほ
ぼ長方形状であり、その面積は、メタライズ層39の方
が小さくされている。L2−L1は1mm以上であること
が望ましい。In the wiring board according to the present invention, as shown in FIGS. 1 and 2, the end face of the metallized layer 39 is located inside the end face of the bonding material 37 for a metal plate. That is,
The relationship between the distance L 1 from the end face of the bonding material 37 for metal plates provided on the wiring board 31 to the center of the insulating substrate 32 and the distance L 2 from the end face of the metallized layer 39 to the center of the insulating substrate 32 is L 1. > and has a L 2. In other words, as shown in FIG. 2, the metal plate bonding material 37 and the metallized layer 39 are substantially rectangular, and the area of the metallized layer 39 is smaller than that of the metallized layer 39. L 2 −L 1 is desirably 1 mm or more.
【0026】このような配線基板は、図3に示すよう
に、金属板35上に、IGBT素子などのパワー半導体
素子41が接合搭載され、このような半導体素子41が
搭載された配線基板31が、アルミなどの高熱伝導材料
で形成されたヒートシンクを兼ねた収納容器43に、基
板用接合材45を介して接合されて、配線基板モジュー
ルが形成されている。In such a wiring board, as shown in FIG. 3, a power semiconductor element 41 such as an IGBT element is bonded and mounted on a metal plate 35, and a wiring board 31 on which such a semiconductor element 41 is mounted is formed. A wiring board module is formed by joining via a board joining material 45 to a storage container 43 also serving as a heat sink made of a high heat conductive material such as aluminum.
【0027】半導体素子41の下面からメタライズ層3
9までの距離をA、半導体素子41の端面からメタライ
ズ層39の端面までの距離をBとすると、熱放散性を向
上するという点から、A≦Bとすることが望ましい。こ
れは、熱の拡散は、半導体素子41から45度の角度で
拡散していくため、熱放散性を向上できるからである。From the lower surface of the semiconductor element 41, the metallized layer 3
Assuming that the distance up to 9 is A and the distance from the end face of the semiconductor element 41 to the end face of the metallization layer 39 is B, it is preferable that A ≦ B from the viewpoint of improving heat dissipation. This is because the heat is diffused at an angle of 45 degrees from the semiconductor element 41, so that the heat dissipation can be improved.
【0028】また、半導体素子41と金属板35、金属
板35と収納容器43がワイヤ45で接続されている。The semiconductor element 41 is connected to the metal plate 35, and the metal plate 35 and the storage container 43 are connected by wires 45.
【0029】絶縁基板32は、アルミナ、窒化アルミ、
窒化珪素、サイアロン(Si,Al,O,Nを含有)、
ムライト又は炭化珪素などを主成分とするセラミックか
ら構成されている。The insulating substrate 32 is made of alumina, aluminum nitride,
Silicon nitride, sialon (containing Si, Al, O, N),
It is made of a ceramic containing mullite or silicon carbide as a main component.
【0030】また、金属板35は、低抵抗、高熱伝導、
コストの観点から、厚さ0.035〜2.0mmの、例
えば、Cu板が用いられている。The metal plate 35 has low resistance, high thermal conductivity,
From the viewpoint of cost, for example, a Cu plate having a thickness of 0.035 to 2.0 mm is used.
【0031】金属板用接合材37、基板用接合材45と
しては、Ag−Cuろう、熱伝導グリース、高熱伝導接
着剤、はんだなどから構成されている。また、収納容器
43は、CuまたはCu−Wから構成されている。The joining material 37 for the metal plate and the joining material 45 for the substrate are made of Ag-Cu braze, heat conductive grease, high heat conductive adhesive, solder or the like. The storage container 43 is made of Cu or Cu-W.
【0032】また、図4に示すように、絶縁基板52に
メタライズ層を形成しない場合には、絶縁基板52が、
基板用接合材55により収納容器53に直接接合される
が、この場合には、基板用接合材55の端面が金属板用
接合材57の端面よりも内側に存在する必要がある。As shown in FIG. 4, when the metallized layer is not formed on the insulating substrate 52, the insulating substrate 52
Although it is directly joined to the storage container 53 by the board joining material 55, in this case, the end face of the board joining material 55 needs to be located inside the end face of the metal plate joining material 57.
【0033】さらに、図5に示すように、絶縁基板62
に、複数の金属板65を金属板用接合材67によりそれ
ぞれ接合する場合は、絶縁基板62の他方主面に、端面
が複数の金属板群の接合領域Xよりも内側となるように
メタライズ層69を形成しても、即ち、複数の金属板6
5を包含する領域Xに、この領域Xよりも狭い範囲で単
一のメタライズ層69を形成しても、上記とほぼ同様の
作用効果が得られる。Further, as shown in FIG.
In the case where the plurality of metal plates 65 are bonded by the metal plate bonding material 67, respectively, the metallized layer is formed on the other main surface of the insulating substrate 62 such that the end face is inside the bonding region X of the plurality of metal plate groups. 69, ie, a plurality of metal plates 6
Even if a single metallized layer 69 is formed in a region X including the region 5 in a range narrower than the region X, substantially the same operation and effect as described above can be obtained.
【0034】尚、本発明は前述の実施例に限定されるも
のではなく、本発明の要旨逸脱しない範囲であれば種々
の変更が可能である。It should be noted that the present invention is not limited to the above-described embodiment, and various changes can be made without departing from the gist of the present invention.
【0035】[0035]
【実施例】先ず、Al2O3、SiO2、MgO、CaO
等の原料粉末に適当な有機バインダー、可塑剤、溶剤を
添加混合して泥漿を調整し、該泥漿を周知のドクターブ
レード法、カレンダーロール法等のテープ成形技術によ
り厚さ約300μmのセラミックグリーンシートを成形
した。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, Al 2 O 3 , SiO 2 , MgO, CaO
A suitable organic binder, a plasticizer, and a solvent are added to and mixed with the raw material powder to prepare a slurry, and the slurry is formed into a ceramic green sheet having a thickness of about 300 μm by a tape forming technique such as a well-known doctor blade method or a calendar roll method. Was molded.
【0036】その後、W、Mo等の高融点金属を主成分
とする粉末に、アルミナ粒子を適量添加し、適当な有機
バインダー、可塑剤、溶剤を添加混合して得た金属ペー
ストを、前記セラミックグリーンシートの半導体素子、
メタライズ層が形成される位置にスクリーン印刷した。Thereafter, a metal paste obtained by adding an appropriate amount of alumina particles to a powder mainly composed of a high melting point metal such as W or Mo, and adding and mixing an appropriate organic binder, a plasticizer and a solvent is mixed with the ceramic paste. Green sheet semiconductor elements,
Screen printing was performed at the position where the metallized layer was formed.
【0037】その際、図1におけるL2−L1の値が、−
1.0mm、−2.5mm、−4.0mm、比較例とし
て2.5mm、1.0mm、0mmを満足するように、
金属ペーストをセラミックグリーンシートに印刷した。At this time, the value of L 2 −L 1 in FIG.
1.0 mm, -2.5 mm, -4.0 mm, and as a comparative example, 2.5 mm, 1.0 mm, and 0 mm.
The metal paste was printed on a ceramic green sheet.
【0038】その後、パターンを印刷塗布した前記グリ
ーンシートを所望の条件を満足するように積層し、これ
を水素(H2)と窒素(N2)の混合ガスから成る還元性
雰囲気中、約1600℃の温度で焼成して、長さ25m
m、幅15mm、厚さ約1mmの4層から成る絶縁基板
を作製した。Thereafter, the green sheets on which the pattern is printed and applied are laminated so as to satisfy the desired conditions, and are laminated in a reducing atmosphere comprising a mixed gas of hydrogen (H 2 ) and nitrogen (N 2 ) for about 1600. Firing at a temperature of ℃, length 25m
An insulating substrate composed of four layers of m, 15 mm in width and about 1 mm in thickness was produced.
【0039】次に、該絶縁基板の表裏面に設けられたパ
ワー配線(金属板)実装用のメタライズパターンと収納
容器実装用のメタライズパターン上に、Niメッキ、A
uメッキを施した。Next, Ni plating and A plating were performed on the metallized pattern for mounting the power wiring (metal plate) and the metallized pattern for mounting the storage container provided on the front and back surfaces of the insulating substrate.
u plating was applied.
【0040】その後、該絶縁基板上に低抵抗金属からな
る金属板を用いて、大電流を許容し放熱性を確保する為
のパワー配線を設けた。低抵抗金属からなる金属板とし
て、低抵抗、高熱伝導、コストの観点から、厚さ1.0
mmの銅(Cu)板を用いた。該銅板を長さ20mm、
幅15mmに切断加工し、前記作製した絶縁基板のAu
メッキ上に銀ろうからなる金属板用接合材を用いて接合
し、パワー配線を設け、図1に示すような配線基板を作
製した。Thereafter, using a metal plate made of a low-resistance metal on the insulating substrate, a power wiring for allowing a large current and securing heat radiation was provided. As a metal plate made of a low-resistance metal, from the viewpoint of low resistance, high heat conduction, and cost, a thickness of 1.0
mm copper (Cu) plate was used. The copper plate is 20 mm long,
After cutting to a width of 15 mm, the Au
Bonding was performed on the plating by using a bonding material for a metal plate made of silver brazing, and power wiring was provided to produce a wiring board as shown in FIG.
【0041】その後、銅からなる長さ35mm、幅25
mm、厚み2mmの箱型の収納容器に、前記パワー配線
を設けた絶縁基板を該収納容器の底部にはんだからなる
基板用接合材を用いて接合し、図3に示すような配線基
板モジュールを作製した。Thereafter, a length 35 mm and a width 25 made of copper were used.
An insulating substrate provided with the power wiring is joined to a box-shaped container having a thickness of 2 mm and a thickness of 2 mm to the bottom of the container using a bonding material for a substrate made of solder, and a wiring board module as shown in FIG. Produced.
【0042】かくして、得られた配線基板モジュールに
対して、実際の使用状況を想定し、大気の雰囲気にて−
65℃と150℃の各温度に制御した2つの高温槽に、
配線基板モジュールを60分/60分の保持を1サイク
ルとして、最高500サイクルまで繰り返した。The obtained wiring board module is assumed to be in actual use, and
In two high temperature tanks controlled at each temperature of 65 ° C and 150 ° C,
The cycle of holding the wiring board module for 60 minutes / 60 minutes was defined as one cycle, and the cycle was repeated up to 500 cycles.
【0043】そして、各100サイクル毎にパワー配線
接合部端部付近の絶縁基板のき裂発生有無を実体顕微鏡
により外観観察し、その結果を表1に記載した。The appearance of cracks in the insulating substrate near the end of the power wiring junction was observed by a stereoscopic microscope every 100 cycles, and the results are shown in Table 1.
【0044】[0044]
【表1】 [Table 1]
【0045】表1から明らかなように、本発明の範囲外
の配線基板モジュールNo.1〜6では、金属板用接合
材の端面から絶縁基板の中心までの距離L1と、メタラ
イズ層の端面から絶縁基板の中心までの距離L2の差L2
−L1が0以上で、かつ大きい程、該絶縁基板へ収納容
器から伝達される応力が大きくなるため、温度サイクル
の早い段階で、該絶縁基板にき裂が生じていることがわ
かる。As is clear from Table 1, the wiring board module Nos. In 1-6, the distance L 1 from the end face of the metal plate for bonding material to the center of the insulating substrate, the difference between the distance L 2 from the end surface of the metallized layer to the center of the insulating substrate L 2
In -L 1 is 0 or more, and larger, because the stress transmitted from the container to the insulating substrate is increased, early in the temperature cycle, it can be seen that the crack in the insulating substrate has occurred.
【0046】一方、本発明の配線基板モジュールNo.
7〜12では、500サイクルまで絶縁基板の表面上に
き裂の発生は認められず、良好なパワー配線と絶縁基板
の接合状態を維持できた。On the other hand, the wiring board module No.
In Nos. 7 to 12, no crack was observed on the surface of the insulating substrate up to 500 cycles, and a good bonding state between the power wiring and the insulating substrate could be maintained.
【0047】[0047]
【発明の効果】以上詳述した通り、本発明によれば、金
属板用接合材の端面よりも内側に、メタライズ層の端面
が存在することになり、金属板の接合により最も大きな
残留応力が生じる金属板用接合材の端面部分の絶縁基板
には、収納容器への接合による残留応力が発生せず、金
属板、絶縁基板、収納容器の三者間の熱膨張率差に起因
した、金属板用接合材の端面部分に位置する絶縁基板に
おける残留応力を低減でき、使用時における配線基板の
割れを抑制し、金属板の剥離を防止することができる。As described above in detail, according to the present invention, the end face of the metallized layer exists inside the end face of the joining material for a metal plate, and the largest residual stress is generated by the joining of the metal plate. The residual stress caused by joining to the storage container does not occur on the insulating substrate at the end surface of the joining material for the metal plate, and the metal due to the difference in the coefficient of thermal expansion between the three members of the metal plate, the insulating substrate and the storage container. It is possible to reduce the residual stress in the insulating substrate located at the end face portion of the bonding material for a board, to suppress cracking of the wiring board during use, and to prevent peeling of the metal plate.
【0048】これにより、金属板の絶縁基板への接合状
態を良好に保つことができ、金属板上に実装されたパワ
ー半導体などからの熱を効果的に収納容器へ伝導し、放
熱することができ、適正な動作温度上限以上への昇温に
よるパワー半導体素子などの誤動作等の不具合が発生せ
ず、高い信頼性を維持できる。As a result, it is possible to maintain a good bonding state of the metal plate to the insulating substrate, and to effectively conduct heat from the power semiconductor mounted on the metal plate to the housing and radiate the heat. As a result, malfunctions such as malfunctions of the power semiconductor element and the like due to the temperature rise above the appropriate operating temperature upper limit do not occur, and high reliability can be maintained.
【図1】本発明の配線基板を示す概略断面図である。FIG. 1 is a schematic sectional view showing a wiring board of the present invention.
【図2】図1の平面図である。FIG. 2 is a plan view of FIG.
【図3】本発明の配線基板モジュールを示す概略断面図
である。FIG. 3 is a schematic sectional view showing a wiring board module of the present invention.
【図4】メタライズ層を形成せず、絶縁基板を基板用接
合材により収納容器に直接接合した本発明の他の配線基
板モジュールを示す概略断面図である。FIG. 4 is a schematic cross-sectional view showing another wiring board module of the present invention in which an insulating substrate is directly bonded to a storage container with a bonding material for a substrate without forming a metallized layer.
【図5】複数の金属板を絶縁基板に接合した本発明の他
の配線基板モジュールを示すもので、(a)は概略断面
図、(b)は平面図である。5A and 5B show another wiring board module of the present invention in which a plurality of metal plates are joined to an insulating substrate, wherein FIG. 5A is a schematic sectional view and FIG. 5B is a plan view.
【図6】従来の配線基板モジュールを示す概略断面図で
ある。FIG. 6 is a schematic sectional view showing a conventional wiring board module.
31・・・配線基板 32、52、62・・・絶縁基板 35、65・・・金属板 37、57、67・・・金属板用接合材 39、69・・・メタライズ層 43、53・・・収納容器 45、55・・・基板用接合材 X・・・接合領域 31 ... wiring board 32, 52, 62 ... insulating board 35, 65 ... metal plate 37, 57, 67 ... metal plate bonding material 39, 69 ... metallization layer 43, 53 ...・ Storage containers 45, 55: bonding material for substrate X: bonding region
Claims (6)
に、低抵抗金属を主体とする金属板を金属板用接合材に
より接合してなるとともに、前記絶縁基板の他方主面
に、端面が前記金属板用接合材の端面よりも内側となる
ようにメタライズ層を形成してなることを特徴とする配
線基板。1. A metal plate mainly composed of a low-resistance metal is joined to one main surface of an insulating substrate made of ceramics by a joining material for a metal plate, and an end surface is formed on the other main surface of the insulating substrate. A wiring board, wherein a metallized layer is formed so as to be inside an end face of a joining material for a metal plate.
に、低抵抗金属を主体とする複数の金属板を金属板用接
合材によりそれぞれ接合してなるとともに、前記絶縁基
板の他方主面に、端面が前記複数の金属板群の接合領域
よりも内側となるようにメタライズ層を形成してなるこ
とを特徴とする配線基板。2. A plurality of metal plates mainly composed of a low-resistance metal are bonded to one main surface of an insulating substrate made of ceramics by a bonding material for a metal plate, and the other main surface of the insulating substrate is A wiring board, wherein a metallized layer is formed such that an end face is inside a joint region of the plurality of metal plate groups.
ることを特徴とする請求項1または2記載の配線基板。3. The wiring board according to claim 1, wherein a semiconductor element is bonded to a surface of the metal plate.
求項1乃至3のうちいずれかに記載の配線基板が収容さ
れるとともに、該配線基板のメタライズ層が基板用接合
材により前記収納容器に接合されていることを特徴とす
る配線基板モジュール。4. A storage container made of a metal or an alloy, wherein the wiring substrate according to any one of claims 1 to 3 is stored, and a metallized layer of the wiring substrate is formed of a bonding material for the substrate. A wiring board module, wherein the wiring board module is joined to the wiring board module.
に、低抵抗金属を主体とする金属板を金属板用接合材に
より接合してなる配線基板を、金属または合金からなる
収納容器内に収容するとともに、前記配線基板を基板用
接合材により前記収納容器に接合してなる配線基板モジ
ュールであって、前記基板用接合材の端面が前記金属板
用接合材の端面よりも内側に存在することを特徴とする
配線基板モジュール。5. A wiring board formed by joining a metal plate mainly composed of a low-resistance metal to one main surface of an insulating substrate made of ceramics with a joining material for a metal plate in a storage container made of metal or alloy. And a wiring board module in which the wiring board is bonded to the storage container with a bonding material for a substrate, wherein an end surface of the bonding material for the substrate is present inside an end surface of the bonding material for the metal plate. A wiring board module characterized by the above-mentioned.
に、低抵抗金属を主体とする複数の金属板を金属板用接
合材によりそれぞれ接合してなる配線基板を、金属また
は合金からなる収納容器内に収容するとともに、前記絶
縁基板の他方主面を基板用接合材により前記収納容器に
接合してなる配線基板モジュールであって、前記基板用
接合材の端面が、前記複数の金属板群の接合領域よりも
内側に存在することを特徴とする配線基板モジュール。6. A storage container made of a metal or an alloy, wherein a wiring board formed by joining a plurality of metal plates mainly composed of a low-resistance metal to one main surface of an insulating substrate made of ceramics by a joining material for a metal plate. A wiring board module in which the other main surface of the insulating substrate is bonded to the storage container by a bonding material for a substrate, wherein an end surface of the bonding material for the substrate is formed of the plurality of metal plate groups. A wiring board module, wherein the wiring board module exists inside a bonding region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000294743A JP2002110872A (en) | 2000-09-27 | 2000-09-27 | Wiring board and wiring board module |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000294743A JP2002110872A (en) | 2000-09-27 | 2000-09-27 | Wiring board and wiring board module |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002110872A true JP2002110872A (en) | 2002-04-12 |
Family
ID=18777282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000294743A Pending JP2002110872A (en) | 2000-09-27 | 2000-09-27 | Wiring board and wiring board module |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002110872A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102956569A (en) * | 2011-08-26 | 2013-03-06 | 三菱电机株式会社 | Semiconductor device and method of manufacture thereof |
| WO2013103066A1 (en) | 2012-01-07 | 2013-07-11 | 京セラ株式会社 | Circuit board, and electronic device using same |
| US8674492B2 (en) | 2012-04-11 | 2014-03-18 | Mitsubishi Electric Corporation | Power module |
| WO2014045711A1 (en) * | 2012-09-19 | 2014-03-27 | 富士電機株式会社 | Semiconductor module |
| JPWO2015104834A1 (en) * | 2014-01-10 | 2017-03-23 | 三菱電機株式会社 | Power semiconductor device |
-
2000
- 2000-09-27 JP JP2000294743A patent/JP2002110872A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102956569A (en) * | 2011-08-26 | 2013-03-06 | 三菱电机株式会社 | Semiconductor device and method of manufacture thereof |
| US11088045B2 (en) | 2011-08-26 | 2021-08-10 | Mitsubishi Electric Corporation | Semiconductor device having a cooling body with a groove |
| WO2013103066A1 (en) | 2012-01-07 | 2013-07-11 | 京セラ株式会社 | Circuit board, and electronic device using same |
| US8674492B2 (en) | 2012-04-11 | 2014-03-18 | Mitsubishi Electric Corporation | Power module |
| WO2014045711A1 (en) * | 2012-09-19 | 2014-03-27 | 富士電機株式会社 | Semiconductor module |
| JPWO2015104834A1 (en) * | 2014-01-10 | 2017-03-23 | 三菱電機株式会社 | Power semiconductor device |
| US9627302B2 (en) | 2014-01-10 | 2017-04-18 | Mitsubishi Electric Corporation | Power semiconductor device |
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