JP2002199782A - Linear motor device, stage device and exposure device using the same, device manufactured using the same, linear motor driving method, stage device driving method, exposure method, and device manufacturing method. - Google Patents

Abstract

(57) [Problem] To provide a linear motor device capable of minimizing a residual of position control while suppressing excessive power consumption and heat generation. A linear motor of a stage device is provided.
Are arranged on the stator 110 side. Coil 111 and controller 26 control unit 2
Between 00 and 00, there are provided coil changeover switches 28U, 28V, 28W having a plurality of switches S01 to S39. The controller 26 includes a coil changeover switch unit 28
ON / OFF of switches S01-S39 by U, 28V, 28W
The off control is controlled according to the driving state of the wafer stage 30 (movable element 110) (for example, the elapsed time t of the driving control, the stage position X, the current value I, and the acceleration α).

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a linear motor device, a stage device using the same, an exposure device, a device manufactured using the same, a method for driving a linear motor, a method for driving a stage device, an exposure method, and More particularly, the present invention relates to a moving magnet type linear motor device having a plurality of coils arranged on a stator side, a stage device using the same, and the like.

[0002]

2. Description of the Related Art Conventionally, there has been proposed a linear motor (moving magnet type linear motor) in which a plurality of coils are arranged on a stator side and a plurality of magnets are arranged on a mover side. In such a moving magnet type linear motor, an inexpensive coil is disposed on the stator side that is long in the moving direction, and an expensive permanent magnet is disposed on the short mover side, so that the cost can be reduced as a whole, and current is supplied. There is no need to connect wiring for the mover to the mover side, and there is an advantage over a moving coil type linear motor.

[0003]

However, the conventional moving magnet type linear motor has a structure in which a current flows through all coils arranged on the stator side irrespective of the moving position of the mover. As a result, a current also flows through a coil that is not involved in the movement of the mover, and there is a problem that power is consumed extra.

Therefore, the applicant of the present application has previously proposed a linear motor device in which a current is selectively supplied to a coil of a stator which is involved in the movement of a mover (Japanese Patent Application No. 2002-214,197). Hei 11-290254). In this linear motor device, among the coils on the stator side, current is selectively supplied to the coil facing the mover, so that extra power is consumed,
Heat generation of the coil can be suppressed.

The linear motor device is useful for a stage device of an exposure apparatus for manufacturing a semiconductor element, a liquid crystal display element, and the like, which require high-precision temperature control, since the amount of heat generation is suppressed. Incidentally, the exposure apparatus includes a stationary exposure type projection exposure apparatus such as a stepper, and a scanning / exposure apparatus.
There is a scanning exposure type projection exposure apparatus such as a stepper.

[0006] Among these, in the scanning type projection exposure apparatus, it is necessary to move the wafer stage and the reticle stage at high speed while synchronizing at the time of exposure (at the time of scanning), and to improve the synchronization accuracy. This is to reduce the control error during the stage drive control and eliminate the alignment error while improving the throughput. Even in this case, it is necessary to minimize the amount of heat generated during drive control of the wafer stage and the reticle stage.

As described above, in a linear motor device used for a stage device of an exposure apparatus for manufacturing a semiconductor element and a liquid crystal display device, a high-speed movement of a stage, a reduction in heat generation, and a control during stage drive control. Reduction of the residual is required. The present invention has been made in view of such circumstances, and in a linear motor device used as a drive unit of a wafer stage, a reticle stage, or the like, the amount of heat generated while performing high-speed movement in accordance with the operation state of the movable element. It is an object of the present invention to provide a linear motor device capable of reducing a control residual as much as possible and a stage device using the same.

[0008]

In order to solve the above-mentioned problems, a linear motor device according to claim 1 includes a first member having a plurality of coils, a second member having a plurality of magnets,
Control means for selectively supplying current to the plurality of coils of the first member to move the second member relatively to the first member, wherein the control means comprises: The number of coils for supplying current is determined according to the driving state of the second member.

According to a second aspect of the present invention, in the linear motor device according to the first aspect, the driving state includes at least an acceleration / deceleration state in which the second member is accelerated / decelerated, and the second state. This is a constant speed state in which the member is moved at a constant speed. In the linear motor device according to a third aspect of the present invention, in the linear motor device according to the second aspect, the control means controls the electric current so that a heating value of a coil for obtaining a constant thrust is minimized in the acceleration / deceleration state. The number of coils to be supplied is determined, and in the constant speed state, the number of coils to supply the current is determined so that the control residual between the movement position of the second member and the target movement position is minimized. is there.

According to a fourth aspect of the present invention, in the linear motor device according to any one of the first to third aspects, the control means controls the driving state of the second member to be an elapsed time. And the number of coils to which the current is supplied is determined according to the elapsed time. In a linear motor device according to a fifth aspect of the present invention, in the linear motor device according to any one of the first to third aspects, the control means may control the electric current in accordance with a value of an electric current supplied to the coil. Determines the number of coils to be supplied.

According to a sixth aspect of the present invention, in the linear motor device according to any one of the first to third aspects, the control means obtains the position information of the second member. And the number of coils to which the current is supplied according to the position information.

According to a seventh aspect of the present invention, in the linear motor device according to any one of the first to third aspects, the control means obtains acceleration information of the second member. The number of coils to which the current is supplied is determined according to the acceleration information. According to an eighth aspect of the present invention, the linear motor device according to any one of the first to seventh aspects is used as a drive unit for an X stage and a Y stage of a stage unit.

According to a ninth aspect of the present invention, there is provided an exposure apparatus for forming a predetermined pattern on a substrate by using an optical system for exposure, comprising the stage device according to the eighth aspect. or,
In the device according to claim 10, the predetermined pattern is defined by claim 9.
Formed by using the exposure apparatus described in (1). or,
The method for driving a linear motor according to claim 11, further comprising a first member having a plurality of coils, and a second member having a plurality of magnets, wherein the second member is moved with respect to the first member. In relative movement, the number of coils for supplying current is determined according to the driving state of the second member.

According to a twelfth aspect of the present invention, there is provided a driving method of a stage device, wherein the linear motor as a driving means is driven by using the linear motor driving method of the eleventh aspect. In the exposure method according to a thirteenth aspect, when the stage device is driven in forming a predetermined pattern on a substrate placed on the stage device, the driving method of the stage device according to the twelfth aspect is used. Things.

[0015] A method of manufacturing a device according to claim 14 is as follows.
A predetermined pattern is formed by using the exposure method according to claim 13.

[0016]

DESCRIPTION OF THE PREFERRED EMBODIMENTS (First Embodiment) A first embodiment of the present invention will be described below with reference to FIGS.

In the first embodiment, the linear motors 100 and 200 are, as shown in FIG.
0 X stage 20X and two Y stages 20Y are used as driving means. In this embodiment,
Linear motors 100, 200, 200 and controller 2
6 constitute a linear motor device.
The stage device 20 includes linear motors 100, 20
A two-axis stage driven by 0 and 200 is formed.

The X stage 20X moves the X
Moving in the axial direction, the Y stage 20Y moves on the base portion 23 in the Y-axis direction. That is, X stage 20X, Y
By controlling the movement position of the stage 20Y, the position of the wafer stage 30 on the X stage 20X is controlled in two axes in the X-axis direction and the Y-axis direction. In this stage device 20, the stator (first member) 110 of the linear motor 100
Is fixed to the Y stages 20Y, 20Y, and the mover (second member) 120 is fixed to the X stage 20X.

The stators (first members) 210, 210 of the linear motors 200, 200 are fixed to mounting portions 216, 216 on the base 23, and the movable elements (second members) 2
Reference numerals 20 and 220 are fixed to Y stages 20Y and 20Y. An irradiation unit (not shown) is arranged above the wafer stage 30, and is applied to the wafer W on the wafer stage 30 in advance by exposure light irradiated from the irradiation unit via a mask (both not shown). The circuit pattern on the mask is transferred to the resist (not shown).

Each of the stators 110, 210, 210 has a flow path (not shown) formed therein, and is cooled by a temperature adjusting fluid flowing through the flow path. This fluid is
The stators 110, 210, and 210 are connected to a temperature controller (not shown) through discharge pipes, pipes (not shown), and the like to control the temperature.

X stage 20 in stage device 20
The moving positions of the X and Y stages 20Y are fixed to the base 23 so as to face the X-axis moving mirror and the Y-axis moving mirror (both not shown) fixed to the end of the wafer stage 30 and to face the mirrors. It is measured by the laser interferometers 22X and 22Y. The output from the laser interferometers 22X and 22Y is X
The data is sent to the controller (control means) 26 via the axial counter unit 25X and the Y-axis counter unit 25Y.

The controller 26 controls the laser interferometer 22
The movement position of the wafer stage 30 is recognized based on the outputs from X and 22Y, and the wafer stage 30 is moved to a desired position based on a command signal from an external input device (for example, a host computer) 40. (Acceleration / deceleration, constant speed, etc.)
The drive control of 200 and 200 is performed.

That is, as will be described in detail later, the controller 26 controls the stators 110, 21 according to the driving state (for example, the moving position) of the movers 120, 220, 220.
A plurality of coils 111...
.. Are supplied selectively (to the coils substantially facing the permanent magnets 123, 223 in the movers 120, 220, 220). Thereby, the movers 120, 220, 220
Move relative to the stators 110, 210, 210. In addition, the controller 26 switches the number of coils for supplying the current according to the driving state of the linear motors 100, 200, 200, as will be described in detail later.

In order to perform this control, in the present embodiment,
The controller 26 receives a command signal from the external input device 40 and an actual moving position of the wafer stage 30 based on the command signal.
A control signal for moving the wafer stage 30 (k =
A switch switching command determined by the initialization sequence, m = a switching command according to the position of the wafer stage 30, and n = a switching command according to the driving state of the wafer stage 30 are generated, and these control signals (k, m, n) are generated. ) Are sent to the coil changeover switches 28U, 28V, 28W.

Coil switch unit 28U, 28V, 2
The 8W switches on / off the switches (S01 to S39 in FIG. 2) of the coil switching switches 28U, 28V, 28W based on these control signals (k, m, n). On the other hand, the controller 26
In order to generate three-phase currents (Iu, Iv, Iw) having phases shifted from each other by 7U, 27V, and 27W, U
A command voltage, a V command voltage, and a W command voltage are supplied (FIG. 2).

This current power amplifier 27U, 27V, 2
The three-phase currents (Iu, Iv, Iw) from 7 W are supplied to the W-phase coil group 111 (W) via the switches S01 to S39.
, V-phase coil group 111 (V) ..., U-phase coil group 1
11 (U)... Respectively. Next, the operation principle of the linear motor will be described using the case of the linear motor 100 as an example.

FIG. 3 shows a total of 13 permanent magnets 123,
Indicate the mover 120 of the linear motor 100 on which... Are arranged. In the mover 120, 13 sets of permanent magnets 123, 12
.. Form six magnetic poles.
The number of magnetic poles of 20 is “6”. On the stator 110 side facing the mover 120, the controller 26 operates to control the number of coils 11 corresponding to the number of magnetic poles “6”.
Are energized.

In this embodiment, the number of coils for each phase to which a current is supplied (hereinafter referred to as the "number of energized coils")
Is set to "6" in a driving state where the motor constant is increased (acceleration / deceleration state), and is set to "4" in a driving state where the control residual is minimized (constant speed state).

Here, the relationship between the number of poles of the magnet (permanent magnet) and the number of exciting poles of the coil 111 (the number of energized coils) will be described. In FIG. 3A, the number of peaks of the magnetic field pattern formed by the permanent magnets is counted regardless of the magnitude of the peaks, and the number is set to N. Therefore, FIG.
In (a), N = 13. Then, assuming that the optimum number of excitation poles for the motor constant is K or L, K: the value obtained by subtracting 1 from N, the value obtained by dividing the value obtained by dividing 2 by 2 and the decimal point rounded down L: The value obtained by subtracting 1 from N Is defined as the value of the integer solution obtained by dividing by 2 and rounding up the decimal point. Further, the value of the number of excitation poles whose control residual is optimal is defined as (K-2). That is, in FIG. 3A, N =
13, the number of excitation poles at which the motor constant is optimal is 6 (=
K = L), and the number of excitation poles at which the control residual is optimal is 4 (= 6).
-2).

FIG. 3 (b) shows the mover 120 and the stator 11
A state in which the energizing coil is switched according to a relative position with respect to the 0-side coil 111 is shown. Here, for simplicity of description, coils 111U, 1 through which a U-phase current flows are used.
The description will focus on only 11U. In FIG. 3B, for the sake of convenience of explanation, (P1, P2
..), The stator 110 is illustrated as moving to the right relative to the mover 120, but in the actual stage device 20, the mover 120 advances to the left with respect to the stator 110.

The coils 111 and 11 marked with て い る in the figure
1 (U3 to U8) indicate coils energized when the number of energized coils is “4”, and ○ indicates coils energized additionally when the number of energized coils is “6”. In the illustrated example, the maximum current Iu flows clockwise at P1 (the magnitude and direction are indicated by arrows in the coil in the figure). afterwards,
As the stator 110 moves relative to the mover 120 (P1 → P2 → P3...), The magnitude of the clockwise current Iu decreases at P2, and at P3, the current Iu reverses and turns counterclockwise.
At 4, the maximum current flows counterclockwise.

The coils 111, 1 on the stator 110 side are actually
11 are supplied with current Iu, the mover 120 moves to the left by a coil width (for example, 12 mm) with respect to the stator 110 each time it changes from P1 to P2, from P2 to P3, and so on. . When the operation of one cycle from P1 to P6 is completed (the mover 1 with respect to the stator 110).
20, the relative movement width of which is 72 mm), and the switches S01 to S
The on / off state of 39 changes, and the coils U4 to U9 are energized. Similarly, the energizing coil is switched every time one cycle of movement (movement width 72 mm).

FIG. 4 is a graph showing a driving state (moving distance, speed profile) of the mover 120 and a profile of a current value I (for example, Iu) supplied to the coils 111, 111. FIG. 4 shows a case where the mover 120 linearly moves only in the X-axis direction for the sake of simplicity.

In the illustrated example, the mover 120 is accelerated from the stopped state (t1) to a constant speed v1 (t1 to t5). After that, it is moved at a constant speed v1 for a certain period (t5 to t7), and then decelerated and stopped (t7 to t7).
Ten). When the stator 110 is driven as in the illustrated example, the coils to which current is supplied are supplied to the stator 110.
(The number of exciting poles = the number of energized coils) is "6" in the acceleration region, "4" in the constant speed region, and "6" in the deceleration region.

As described above, the number of coils energized in the acceleration / deceleration region (controlled in the acceleration / deceleration state) is set to "6", and the number of coils energized in the constant speed region (controlled in the constant speed state) is set to "4". This is for the following reason. That is, in the linear motor 100 in which the number of magnetic poles of the mover 120 is “6”, as shown in FIG. 5, the number of exciting poles (= the number of energized coils) that minimizes the temperature rise (■) is “6”. . Therefore, the linear motor 100
In order to minimize the amount of heat generated when obtaining a constant propulsion force, it is preferable to set the number of exciting poles (the number of energizing coils) to “6”. In the drawing, the symbol ● indicates the relationship between the number of excitation poles and the motor constant.

However, when the number of excitation poles is "6", there may be a coil (ineffective coil) which does not effectively contribute to the thrust. This invalid coil is provided by the permanent magnets 123, 1 on the mover 120 side.
23 move over the coils 111, 111,
The generation of the back electromotive force, and furthermore, the magnetic field pattern at both ends of the stator 110 becomes gentle (see FIG. 3A).
Due to that.

In particular, the back electromotive voltage described above
1, 111..., A voltage difference is generated in a parallel circuit (FIG. 2) of coils for each of the U, V, and W phases. When this voltage difference occurs, the currents flowing through the parallel circuits act in a direction to make them equal, causing a current imbalance. When an invalid coil is generated in this way, it is considered that the control residual becomes larger than when no invalid coil is present (the number of excitation poles is “4” or less). This can be confirmed by a simulation (x in FIG. 5).

For this reason, the stage device 20 of the present embodiment
.. Until the wafer stage 30 (movable element 120) reaches the constant speed v1, the number of current-carrying coils is determined so that heat generation in the coils 111, 111...
After that, the number of energizing coils is determined so that the wafer stage 30 and the reticle stage (not shown) move with high accuracy in a fixed relationship (to reduce the control residual).

Next, the wafer stage 30 (movable element 12)
0), the coils to be actually energized, the number of energized coils, and the current value I are determined, and the wafer stage 30
Regarding the control procedure for driving the (movable element 120), FIG.
This will be described with reference to FIG. FIG. 6 is a flowchart showing the “stage position control program” executed by the controller 26.

By executing this stage position control program, each of the switches S01 to S39 of each coil group (V phase, U phase, W phase) sets the driving state of the mover 120 (in this embodiment, the elapsed time). The movable element 120 is controlled to be turned on / off in accordance with the time t), and the movable element 120 is controlled so as to reduce the amount of heat generated during the period in which the movable element 120 is to be accelerated or decelerated (acceleration regions t1 to t5 and deceleration regions t7 to t10 in FIG. During the period of moving at a constant speed (constant speed region t5 to t7), the drive control of the linear motor 100 is performed so that the control residual to the target moving position is reduced.

When the stage position control program is started, in step S1, the driving state of the mover 120 and the elapsed time t are determined based on a command signal from the external input device 40.
(Time table) is determined (time control). In this step S1, the calculation of the coil number switching time is further performed. In the example of FIG. 4, t1, t5, t7, t1
It is 0.

In the subsequent steps after step S2, the mover 120 is driven in accordance with the actual elapsed time t. First, in step S2, a software timer for driving the mover 120 according to the time table is started (timer start), and in step S3, the time from the start of control (t1 in FIG. 4) based on the clock of the timer. The elapsed time t is calculated (calculation of the actual driving time).

In the next step S4, the elapsed time t
It is determined whether any of the following conditional expressions (a), (b), and (c) is satisfied in the current loop. t> t1 (a) t> t5 (b) t> t7 (c) If the determination result of step S4 is "No", the process skips the subsequent step S6 and proceeds to step S6.

On the other hand, when it is determined that any one of the conditional expressions (a) to (c) is satisfied in the current loop, a command to increase / decrease the number of energized coils is issued according to the satisfied conditional expression (step). S5).

In the example shown in FIG. 4, when the conditional expression (a) is satisfied in the current loop, the number of energized coils is added to the reference value (here, the initial value is "4") by 2 to "6" ( For example, the number of coils (marked with ○) at both ends of the four coils marked with ◎ in FIG. 3 is increased). Further, when the conditional expression (b) is satisfied in the current loop, the number of energized coils is reduced by two to return to the reference value (here, the initial value is “4”) and is set to “4”. For example, the number of coils marked with a circle in FIG. 3 is reduced. Further, when the conditional expression (c) is satisfied, the number of energized coils is set to "6" in addition to the reference value (here, the initial value is "4"). Signals indicating the contents of these commands are output.

In step S6, based on the elapsed time t, a target movement position Xm to be moved at the next instant is set based on a predetermined movement distance profile (FIG. 4). In the next step S7, various control amounts (for example, acceleration) for moving the stator 110 with the determined number of coils ("6" or "4") are servo-calculated.

In step S8, a current I flowing through the coils 111, 111... Is set based on the drive current profile (FIG. 4) set in advance based on the elapsed time t. A current command is determined (Step S9). In the next step S10, the stator 1
Ten current positions Xj (stage current position information) are fetched, and this value Xj is compared with the excitation switching map shown in FIG. 7 (step S11). Based on this comparison,
Switches SW01 to 39 to be turned on corresponding to the current position Xj
Is determined for each phase, and a command signal indicating this is output (step S12). In FIG. 7, "1" indicates switch-on, and "0" indicates switch-off.

In the next step S13, gain switching for correcting a change in the control gain of the controller when the number of energized coils is changed is performed. In step S14, a command to increase / decrease the determined number of energized coils is made. Based on the drive current command, the switch switching command, and the controller gain, a process of actually moving the mover 120 (drive body moving process) is performed.

Then, in step S15, the mover 120
(E.g., when the elapsed time t exceeds t10), and while the determination result is "No", the process returns to step S3 to repeat the process. When the result turns to “Yes”, this program ends. In the above-described embodiment, an energization map (FIG. 7) of the number of coils “4” to which the current is supplied is prepared, and the elapsed time t is determined by the predetermined conditional expressions (a) to (c).
Is satisfied, the number of coils is switched from "4" to "6" or vice versa based on the command to increase / decrease the number of current-carrying coils. Maps may be prepared, and these maps (FIGS. 7 and 8) may be appropriately switched when the conditional expressions (a) to (c) are satisfied.

(Second Embodiment) Next, a second embodiment of the present invention will be described.
The embodiment will be described with reference to FIGS. 9 and 10. FIG. Also in the second embodiment, the number of current-carrying coils is determined so that heat generation in the coils 111, 111... Is minimized until the stator 110 reaches a constant speed v1. In order to move the stage 30 and the reticle stage (not shown) in a certain relationship with high accuracy (to reduce the control residual), the number of energizing coils is determined.

In the second embodiment, the switches S01 to S39 of each coil group (V phase, U phase, W phase) are turned on according to the driving state of the mover 120 (current value I). The period during which the mover 120 is to be accelerated /
In the periods t12 to t13 and the periods t16 to t17), the amount of heat generation is reduced, and in the period in which the mover 120 is moved at a constant speed (the period t13 to t16), the control residual to the target movement position is reduced. The drive control of the linear motor 100 is performed. The stage device (movable element) controlled in the second embodiment has the same configuration as in the first embodiment, and a detailed description thereof will be omitted.

When the stage position control program according to the second embodiment is started, the number of coils for determining the timing for switching the number of energized coils is determined in step S21 based on a command signal from the external input device 40. The switching drive current value (I1, I2 in FIG. 9) is calculated. When the current value I is larger than "I1" (acceleration), the number of energized coils is set to "6". When the current value I is a value between "I1" and "I2" (constant speed), the number of energized coils is set. Is “4”, the current value I
Is smaller than "I2" (deceleration), the number of energized coils is set to "6".

As described above, the coil number switching current value (I1, I
After 2) is obtained, the mover 1 according to the actually supplied drive current value I is then processed in step S22 and subsequent steps.
20 are performed. First, in step S22, a software timer is started (timer start), and in step S23, the time lapse t from the start of control (t11 in FIG. 9).
Is calculated (calculation of actual driving time).

In step S24, a moving distance profile set in advance based on the elapsed time t (see FIG. 4)
, A target movement position Xm to be moved at the next moment is set, and in step S25, servo calculation of various control amounts (for example, acceleration) is performed. In the next step S26, based on the elapsed time t, the coils 111, 111
Are actually set based on the drive current profile (FIG. 9), and a drive current command based on the target value I is determined in step S27.

In step S28, it is determined whether or not the determined current value I satisfies one of the following conditional expressions (d) and (e) in the current loop. I1 <I <I2 ... (d) I> I1 or I <I2 ... (e) If the determination result of step S28 is "No", the process skips the subsequent step S29 and proceeds to step S30.

On the other hand, when it is determined that any of the above conditional expressions is satisfied in the current loop, in step S29,
A command to increase / decrease the number of energized coils is issued according to the conditional expression. For example, when it is determined that the conditional expression (e) is satisfied in the current loop (t12 and t16 in FIG. 9), step S
At 29, the number of energized coils is set to "6" by adding 2 to the reference value (initial value "4"). When conditional expression (d) is satisfied in the current loop (t13 and t20 in FIG. 9), the number of energized coils is reduced by two to return to the reference value (here, the initial value is "4"), and "4" And This content is output as a command to increase / decrease the number of energized coils.

In the next step S30, the current position Xj of the wafer stage 30 (stator 110) is fetched, and this value Xj is compared with the excitation switching map shown in FIG. 7 (step S31), and in the next step S32 The switches SW01 to SW39 to be turned on are determined based on the comparison result.
In the next step S33, gain switching is performed. In step S34, a driving body moving process is performed based on the driving current command, the command to increase / decrease the number of energized coils, the switch switching command, and the controller gain.

Then, in step S35, the mover 120
It is determined whether or not the movement should be terminated. When the result of the determination turns to “Yes”, the present program is terminated. In the above-described embodiment, two energization maps (FIGS. 7 and 8) are prepared similarly to the first embodiment.
When the conditional expressions (d) and (e) are satisfied, these maps (FIGS. 7 and 8) may be appropriately switched.

(Third Embodiment) Next, a third embodiment of the present invention will be described.
The embodiment will be described with reference to FIGS. In the third embodiment, heat generation in the coils 111, 111... Is minimized until the stator 110 reaches the constant speed v1 (t31 to t32 corresponding to the target positions X0 to X1 in FIG. 11). The number of current-carrying coils is determined at a constant speed v1
(T32 to t33 corresponding to the target positions X1 to X2)
Denotes a wafer stage 30 and a reticle stage (not shown)
The number of energized coils is determined in order to accurately move (a) and (b) in a certain relationship (to reduce the control residual). During the period from the constant speed v1 to the stop (t33 to t34 corresponding to the target positions X2 to X3), the coils 111 and
The number of energizing coils is determined so that heat generation at 111... Is minimized.

As described above, in the third embodiment, the number of energized coils is determined (switched) according to the current position Xj of the wafer stage 30 (stator 110). In the third embodiment, the drive control of the wafer stage 30 (movable element) of the stage device 20 shown in FIG. 1 is performed. When this stage position control program is started,
In step S41, a coil number switching position (X0, X1, X2, X3) is calculated based on a command signal from the external input device 40. When the current position Xj is larger than “X0” (acceleration), the number of energized coils is set to “6” and the current position Xj is increased.
When j is a value between “X1” and “X2” (constant speed), the number of energized coils becomes “4”, and when the current position Xj is larger than “X2” (deceleration), the number of energized coils becomes “6”. , Respectively.

After the coil number switching stage position is obtained in this way, the mover 120 is actually driven in accordance with the stage position X in the processing after step S42. First, in step S42, a software timer is started (timer start), and in step S43, the elapsed time t from the start of control (t31 in FIG. 11) is calculated (calculation of actual driving time).

In step S44, based on the elapsed time t, a target movement position Xm to be moved at the next moment is set according to a predetermined movement distance profile (FIG. 11). In the next step S45, various control amounts are set. Servo calculation (for example, acceleration) is performed.

In step S46, based on the elapsed time t, a current value I flowing through the coils 111, 111... Is set based on a preset drive current profile (see FIG. 4). A drive current command based on the command is determined (step S47). In step S48, the current position information (X
j) is captured.

In the next step S49, the current position X
It is determined whether j satisfies any of the following conditional expressions (f), (g), and (h) in the current loop. Xj> X0 (f) Xj> X1 (g) Xj> X2 (h) When the result of the determination in step S49 is "No", the process skips the subsequent step S50 and proceeds to step S51.

On the other hand, when it is determined that any of the above conditional expressions is satisfied in the current loop, in step S50,
An instruction to increase / decrease the number of energized coils is issued according to the satisfied conditional expression. In the example shown in FIG. 11, when the conditional expression (f) is satisfied, the number of energized coils is set to a reference value (for example,
“4”) plus 2 plus “6”. When conditional expression (g) is satisfied, the number of energized coils is reduced by two to “4”. Further, when the conditional expression (h) is satisfied, the number of energized coils is again increased by 2 to “6”.

In the next step S51, the current position Xj is compared with the excitation switching map, and in step S52, the switches SW01 to SW39 to be turned on are determined based on the comparison result (switch switching command). In the next step S53, gain switching is performed, and in step S54, a driving body moving process is performed based on a driving current command, a command to increase / decrease the number of energized coils, a switch switching command, and a controller gain.

In step S55, it is determined whether or not the movement of the mover 120 should be terminated. When the result of the determination turns to "Yes", the present program is terminated.
In the above embodiment, as in the first embodiment, two energization maps (FIGS. 7 and 8) are prepared, and the conditional expressions (f), (g), and (h) are satisfied. These maps (FIGS. 7 and 8) may be appropriately switched at the time of being satisfied.

(Fourth Embodiment) Next, a fourth embodiment of the present invention will be described.
The embodiment will be described with reference to FIG. In the fourth embodiment, each coil group (V phase, U phase, W phase)
Each of the switches S01 to S39 of the (phase) is on / off controlled in accordance with the driving state (acceleration α) of the mover 120, and when the acceleration α is equal to or less than the first predetermined value α1, the heat generation amount is reduced. When the acceleration α is equal to or more than the first predetermined value α1 and equal to or less than the second predetermined value α2, the operation control of the linear motor 100 is performed so that the control residual to the target movement position is reduced. Further, when the acceleration α is equal to or more than the second predetermined value α2, the number of coils is determined so that the heat generation amount is reduced again. Note that the control of the fourth embodiment is also performed by the stage device 2.
0 is performed.

When the stage position control program according to the fourth embodiment is started, in step S61, the coil number switching acceleration is calculated based on a command signal from the external input device 40 (first predetermined value). α1, a second predetermined value α2).
When the acceleration α is larger than the “first predetermined value α1” (acceleration), the number of coils to which the current is supplied is set to “6”, and the acceleration α is changed from “first predetermined value α1” to “second predetermined value α2”. "
When the value is in between (constant speed), the number of coils is set to “4”, and when the acceleration α is smaller than “the second predetermined value α2” (deceleration), the number of coils is set to “6”.

After the number-of-coils switching acceleration is obtained in this manner, the mover 120 is actually driven in accordance with the acceleration α in the processing after step S22. First,
In step S62, a software timer is started (timer start), and in step S63, the elapsed time t from the start of control is calculated (calculation of actual driving time).

In step S64, the target movement position Xm is set, and in the next step S65, various control amounts (acceleration α) are servo-calculated. In the next step S66,
It is determined whether the acceleration α obtained by the servo calculation satisfies any of the following conditional expressions (j) and (k) in the current loop. α1 <α <α2 (j) α> α1 or α <α2 (k) If the determination result in step S66 is “No”, the process skips the subsequent step S67 and proceeds to step S68.

On the other hand, when it is determined that any of the above conditional expressions is satisfied in the current loop, in step S67,
An instruction to increase / decrease the number of energized coils is issued according to the satisfied conditional expression. For example, when it is determined that the conditional expression (j) is satisfied in the current loop, the number of energized coils is set to “6” in step S67. When conditional expression (k) is satisfied in the current loop, the number of energized coils is set to “4”.

In step S68, based on the elapsed time t, the target value I of the current flowing through the coils 111, 111.
Are actually set based on the drive current profile (see FIG. 4), and a drive current command based on the target value I is determined (step S69). In the next step S70, the current position Xj of the wafer stage 30 is fetched, and FIG.
(Step S71).
In the next step S72, the switches SW01 to SW39 to be turned on are determined based on the comparison result.

In the next step S73, gain switching is performed. In step S74, a driving body moving process is performed based on a driving current command, a command to increase / decrease the number of energized coils, a switch switching command, and a controller gain. Then, in step S75, it is determined whether or not the movement of the mover 120 should be terminated. When the result of the determination turns to "Yes", the present program is terminated.

In the above-described embodiment, as in the first embodiment, two energization maps (FIGS. 7 and 8) are prepared to satisfy the conditional expressions (j) and (k). At this point, these maps (FIGS. 7 and 8) may be appropriately switched. In the first to fourth embodiments, the case where the number of magnetic poles of the mover 120 is “6” has been described, but the number of magnetic poles of the mover 120 is not limited to this. For example, when a mover 320 of the type shown in FIG. 14 is used, the number of magnetic field peaks is determined based on the relationship between the number of poles of the magnet (permanent magnet) and the number of excitation poles of the coil 111 (number of energized coils). N becomes 12. Therefore, the number of energizing coils (the number of exciting poles) K and L at which the motor constant is optimal
Is K = 5, L = 6, and the number of energized coils at which the control residual becomes optimal is 3 (= 5-2) (FIG. 15). Therefore,
The energizing coil may be switched between “5” and “3” or “6” and “3” according to the driving state of the wafer stage 30 (movable element). At this time, the coil switches S01-
If S39 is set so that the number of energized coils is switched by turning on or off the coils adjacent to the coils at both ends of the energized coils in a state where the control residual becomes optimal, "5" What is necessary is just to switch between "3" and "3". On the other hand, when the number of energized coils is switched between "6" and "3", it is preferable to prepare an energization switching map as described above and switch between these maps.

In the above-described first to fourth embodiments, an example in which the wafer stage 30 (movable element 120) is controlled in the X-axis direction has been described for the sake of simplicity. In the actual stage device 20, the stage control is performed in each of the X-axis direction and the Y-axis direction. or,
The stage apparatus 20 according to the first to fourth embodiments is used as a moving means of the wafer W in an exposure apparatus for transferring a pattern formed on a mask (not shown) onto the wafer W, but its use is limited. Not done.

(Fifth Embodiment) Next, a fifth embodiment of the present invention will be described.
The embodiment will be described with reference to FIG. In the fifth embodiment, a stage device that is substantially the same as the stage device 20 of the above-described first to fourth embodiments is replaced with a reticle (mask) stage 750 and a stage device 800 of an exposure apparatus 700. .

The exposure apparatus 700 is a so-called step-and-scan exposure type scanning exposure apparatus. As shown in FIG. 16, the exposure apparatus 700 moves an illumination system 710, a stage movable unit 751 for holding a reticle (photomask) R, a projection optical system PL, and a wafer W on an X-axis in an XY plane. A stage device 800 for driving in a two-dimensional direction of the direction-Y-axis direction, and a main control device 720 for controlling these are provided.

The illumination system 710 irradiates exposure light emitted from the light source unit to a rectangular (or arc-shaped) illumination area IAR on the reticle R with uniform illuminance. In the reticle stage 750, the stage movable portion 751 is moved on a reticle base (not shown) at a predetermined scanning speed along a guide rail (not shown).
A reticle R is fixed on the upper surface of the stage movable section 751, for example, by vacuum suction. Also, the stage movable part 7
An exposure light passage hole (not shown) is formed below the reticle R of 51.

The moving position of the stage movable portion 751 is
The stage control system 719 is detected by the reflecting mirror 715 and the reticle laser interferometer 716, and the main controller 720 based on the detected moving position of the stage movable portion 751 is used.
The stage movable section 751 is driven in accordance with the instruction from. The projection optical system PL is a reduction optical system, and is disposed below the reticle stage 750, and the direction of its optical axis AX (coincident with the optical axis IX of the illumination optical system) is defined as the Z-axis direction.
Here, a refraction optical system including a plurality of lens elements arranged at predetermined intervals along the optical axis AX axis direction so as to have a telecentric optical arrangement is used. Therefore, the illumination area I of the reticle R is
When the AR is illuminated, a reduced image (partially inverted image) of the circuit pattern in the illumination area IAR of the reticle R is formed in the exposure area IA conjugate to the illumination area IAR on the wafer W.

The stage device 800 drives the table 818 in a two-dimensional direction in the XY plane by using a plane motor 870 using a coil as an armature as a driving means. That is, the stage device 800 includes the base unit 8
21, a table 818 that floats above the upper surface of the base portion 821 through a clearance of about several μm,
A flat motor 870 for moving the table 818 is provided. Here, the table 818 stores the values at the time of the exposure processing.
The wafer W is fixed on the upper surface by, for example, vacuum suction.

A movable mirror 827 is fixed to the table 818, and a laser beam is emitted from the wafer interferometer 831 to detect the moving position of the table 818 in the XY plane. . Information on the movement position obtained at this time is sent to main controller 720 via stage control system 719. Then, the stage control system 719
In accordance with an instruction from main controller 720 based on this information, planar motor 870 is operated, and table 818 is set to X
-Move to a desired position in the Y plane.

The table 818 is supported at three different points by a support mechanism (not shown) on the upper surface of a mover (not shown) constituting the flat motor 870. Not only drive in the direction, but also tilt with respect to the XY plane, Z-axis direction (upward)
Can be driven. The flat motor 870 has a known configuration.
Other descriptions of are omitted.

The stage device 800 may be substantially the same as the stage device described in the first to fourth embodiments. In this case, since each stage for the reticle stage and the wafer is provided with the linear motor of the present invention, it is possible to further improve the synchronization accuracy between the wafer stage and the reticle stage at the time of exposure while suppressing the amount of heat generated from the linear motor. Can be.

In the figure, reference numeral 821 is a base portion,
A fluid for preventing a temperature rise due to heat generated from the inside thereof includes a supply pipe 792, a discharge pipe 793, and a temperature control device 779.
It is circulated by the action of. In exposure apparatus 700 including reticle stage 750 having such a configuration, exposure processing is generally performed in the following procedure.

First, reticle R and wafer W are loaded, and then reticle alignment, baseline measurement, alignment measurement, and the like are performed. After the completion of the alignment measurement, an exposure operation of a step-and-scan method is performed. In the exposure operation, main controller 720 issues a command to stage control system 719 based on position information of reticle R by reticle interferometer 716 and position information of wafer W by wafer interferometer 831, and controls linear motor 100 of reticle stage 750. , 100 and the plane motor 870, the reticle R and the wafer W are moved synchronously, thereby performing a desired scanning exposure.

The reticle interferometer 716 has first to fourth
The output from the reticle interferometer 716 is used for controlling the on / off switching of each of the switches S01 to S39 via the controller 26 shown in FIG. Used. When the transfer of the reticle pattern to one shot area is completed in this way, the table 818 is stepped by one shot area, and scanning exposure is performed for the next shot area. The stepping and the scanning exposure are sequentially repeated, and the required number of shot patterns are transferred onto the wafer W.

Here, in reticle stage 750, stators 11 of linear motors 100 and 100 are used.
Each of the coils 111, 111,.
The phase currents are supplied as appropriate and their movement positions are controlled.
Note that the manufacture of a semiconductor device using the reticle stage 750 and the stage device 800 having substantially the same configuration as the stage device 20 of the present embodiment is generally performed according to the procedures shown in FIGS.

That is, for a semiconductor device, a step of designing the function and performance of the device, a step of manufacturing a reticle based on this design step, a step of manufacturing a wafer from a silicon material, and a reticle by the exposure apparatus of the above-described embodiment. Is manufactured through a step of transferring the pattern to a wafer, a step of assembling a device (including a dicing step, a bonding step, and a package step), an inspection step, and the like.

Hereinafter, the device manufacturing method will be described in more detail. FIG. 17 shows a flowchart of an example of manufacturing a device (a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin-film magnetic head, a micromachine, or the like). As shown in this figure, first, in step 1001 (design step), a function / performance design of a device (for example, a circuit design of a semiconductor device) is performed, and a pattern design for realizing the function is performed.
Subsequently, in step 1002 (mask manufacturing step), a mask (reticle) on which the designed circuit pattern is formed is manufactured. On the other hand, in step 1003 (wafer manufacturing step), a wafer is manufactured using a material such as silicon.

Next, in step 1004 (wafer processing step), steps 1001 to 1003
Using the mask (reticle) and the wafer prepared in the above, an actual circuit or the like is formed on the wafer by lithography technology or the like as described later. Next, step 1005
In (Tevaise assembly step), step 1004
Is assembled using the wafer processed in the step (1). Step 1005 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation) as necessary.

Finally, in step 1006 (inspection step), inspections such as an operation confirmation test and a durability test of the device manufactured in step 1005 are performed. After these steps, the device is completed and shipped. FIG. 18 shows a detailed flow example of step 1004 in the case of a semiconductor device. In FIG. 18, in step 1011 (oxidation step), the surface of the wafer is oxidized. Step 1012
In the (CVD step), an oxide insulating film is formed on the wafer surface. In step 1013 (electrode forming step), electrodes are formed on the wafer by vapor deposition. In step 1014 (ion implantation step), ions are implanted into the wafer.

The above steps 1011 to 101
Each of the components 4 constitutes a pre-processing step in each stage of the wafer processing, and is selected and executed according to a necessary process in each stage. In each stage of the wafer process, when the above-mentioned pre-processing step is completed, the post-processing step is executed as follows. In this post-processing step, first, in step 1015 (resist forming step), a photosensitive agent is applied to the wafer. Subsequently, in step 1016 (exposure step), the circuit pattern of the mask is transferred to the wafer by using the above-described exposure apparatus. Next, in step 1017 (development step), the exposed wafer is developed, and in step 1018 (etching step)
In, the exposed member other than the portion where the resist remains is removed by etching. Then, in step 1019 (resist removing step), unnecessary resist after etching is removed.

By repeating these pre-processing and post-processing steps, multiple circuit patterns are formed on the wafer. Note that the linear motors 100, 20 of the present invention
Reference numeral 0 denotes a scanning type exposure apparatus (for example, US Pat. No. 5,473,410) other than the exposure apparatus shown in the embodiment, which synchronously moves the mask and the substrate to expose the pattern of the mask.
) Can also be applied as driving means.

Further, in the apparatus to which the linear motor of the present invention is applied, the pattern of the mask is exposed while the mask and the substrate are stationary, and the substrate is sequentially moved step by step.
The present invention can also be applied to an AND-repeat type exposure apparatus. The apparatus to which the linear motor of the present invention is applied can also be applied to a proxy midi exposure apparatus that exposes a mask pattern by bringing a mask and a substrate into close contact without using a projection optical system.

The exposure apparatus to which the linear motor of the present invention is applied is not limited to an exposure apparatus for manufacturing a semiconductor. For example, an exposure apparatus for a liquid crystal for exposing a liquid crystal display element pattern on a square glass plate is used. The present invention can be widely applied to an apparatus and an exposure apparatus for manufacturing a thin-film magnetic head. The light source of the exposure apparatus according to the fifth embodiment includes g-line (436 nm), i-line (365 nm), KrF excimer laser (248 nm), and ArF excimer laser (193).
nm) and F2 laser (157 nm), as well as charged particle beams such as X-rays and electron beams. For example, when an electron beam is used, a thermionic emission type lanthanum hexafluoride (LaB6) or tantalum (Ta) can be used as an electron gun. Further, when an electron beam is used, a structure using a mask may be used, or a pattern may be formed directly on a substrate without using a mask.

In this case, when far ultraviolet rays such as an excimer laser are used as the projection optical system, a material that transmits far ultraviolet rays such as quartz or fluorite is used as a glass material, and when a F2 laser or X-ray is used, a reflection is used. An optical system of a refraction system or a refraction system (a reticle of a reflection type is used). When an electron beam is used, an electron optical system including an electron lens and a deflector may be used as the optical system. In addition,
It goes without saying that the optical path through which the electron beam passes is in a vacuum state.

The magnification of the projection optical system of the exposure apparatus to which the linear motor of the present invention is applied as a driving means may be not only a reduction system but also an equal magnification and an enlargement system. When the linear motor of the present invention is used for a wafer stage or a reticle stage, either an air floating type using an air bearing or a magnetic floating type using Lorentz force or reactance force may be used.

The stage to which the linear motor of the present invention is applied is not limited to a type that moves along a guide, but may be a guideless type that does not require a guide. The reaction force generated by the movement of the wafer stage is mechanically released to the floor side (ground) using a frame member by using the invention proposed in Japanese Patent Application Laid-Open No. 8-166475. It may be.

Regarding the reaction force generated by the movement of the reticle stage, utilizing the invention proposed in Japanese Patent Application Laid-Open No. 8-330224, a frame member is used to mechanically move the floor side (ground). You may make it escape to.
The above-described exposure apparatus to which the linear motor of the present invention is applied applies various subsystems including the components described in the claims so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. And manufactured by assembling.

In order to ensure these various precisions, before and after this assembly, adjustments to achieve optical precision for various optical systems, adjustments to achieve mechanical precision for various mechanical systems, various The electrical system is adjusted to achieve electrical accuracy. Also, the process of assembling the exposure apparatus from the various subsystems includes mechanical connections, wiring connections of electric circuits, and piping connections of the atmospheric pressure circuits between the various subsystems.

It goes without saying that there is an assembling process for each subsystem before the assembling process from these various subsystems to the exposure apparatus. Further, when the process of assembling the various subsystems into the exposure apparatus is completed, comprehensive adjustment is performed, and various precisions of the entire exposure apparatus are secured. It is desirable that the exposure apparatus be manufactured in a clean room in which the temperature, the degree of cleanliness, and the like are controlled.

[0103]

According to the linear motor device of the first to seventh aspects described above, the plurality of coils of the linear motor device have a number of coils for supplying current according to the driving state of the second member. Since it is determined, it is possible to minimize the control residual during stage drive control while minimizing the amount of heat generation and increasing the motor constant according to the driving state.

According to the stage device of the present invention, since the linear motor device according to any one of the first to seventh aspects is used as a driving means of the stage portion, the linear motor device generates heat by controlling according to the driving state. The control residual to the target position can be minimized while minimizing the amount and increasing the motor constant. According to the exposure apparatus of the ninth aspect,
In forming a predetermined pattern on a substrate by using the exposure optical system, the stage device according to claim 8 is used, so that the motor constant of the linear motor device is increased, so that the entire exposure device is highly functional. Is achieved.

Further, in the device according to the tenth aspect, a predetermined pattern is formed by using the exposure apparatus according to the ninth aspect, so that the device can be manufactured efficiently. According to the driving method of the linear motor of the eleventh aspect, the number of coils for supplying current to the plurality of coils is switched according to the driving state of the second member. Can be reduced.

According to the driving method of the stage device of the twelfth aspect, the linear motor is driven by using the driving method of the linear motor according to the eleventh aspect. The overall function of the stage device is enhanced. Further, according to the exposure method of the thirteenth aspect, in the exposure method for forming a predetermined pattern on a substrate mounted on the stage device, when driving the stage device, the stage device according to the twelfth aspect is preferably used. Since the driving method is used, the exposure apparatus to be driven is enhanced in function as a whole because the motor constant of the linear motor is increased and the control residual is reduced.

According to the device manufacturing method of the present invention, a device having a predetermined pattern is manufactured by using the exposure method of the present invention. Since the motor constant of the linear motor is increased and the control residual is reduced, an efficient device can be manufactured.

[Brief description of the drawings]

FIG. 1 shows a stage device 20 according to a first embodiment of the present invention.
FIG.

FIG. 2 shows a current power amplifier 27U of the stage device 20;
It is a circuit diagram showing W and coils 111U-W connected thereto.

FIG. 3 is a diagram showing a relationship between a magnetic field pattern of a mover 120 of the linear motor 100 and an energization pattern of a coil 111 of a stator 110.

FIG. 4 is a graph showing a relationship between a motor constant of the linear motor 100 of the stage device 20 and the number of excited coils 111, 111.

FIG. 5 is a graph showing a relationship among a moving distance, a moving speed, and a driving current of the mover 120 according to the first embodiment.

FIG. 6 is a flowchart illustrating a stage position control program according to the first embodiment.

FIG. 7 is a diagram showing an excitation switching map (four excitations) used in the first embodiment.

FIG. 8 is a diagram showing another excitation switching map (six excitation) used in the first embodiment.

FIG. 9 is a graph illustrating a relationship among a moving distance, a moving speed, and a driving current of a mover 120 according to the second embodiment.

FIG. 10 is a flowchart illustrating a stage position control program according to the second embodiment.

FIG. 11 is a graph showing a relationship among a moving distance, a moving speed, and a driving current of a mover 120 according to the third embodiment.

FIG. 12 is a flowchart illustrating a stage position control program according to a third embodiment.

FIG. 13 is a flowchart illustrating a stage position control program according to a fourth embodiment.

FIG. 14 is a diagram showing a relationship between a magnet arrangement and a magnetic field pattern of a mover 320 according to a modification.

FIG. 15 shows motor constants of a linear motor according to a modification,
It is a graph which shows the relationship with the excitation number of a coil.

FIG. 16 shows a linear motor 10 mounted on a reticle stage 750.
FIG. 11 is a diagram illustrating the overall configuration of an exposure apparatus 700 in which 0 is used.

FIG. 17 is a diagram illustrating a semiconductor device manufacturing process using the exposure apparatus according to the present invention.

FIG. 18 is a diagram showing a more specific manufacturing process of a semiconductor device using the exposure apparatus according to the present invention.

[Explanation of symbols]

 Reference Signs List 20 stage device 26 controller 27U, 27V, 27W current power amplifier 100, 200 linear motor 110, 210 stator (first member) 111 coil 120, 220 mover (second member) 700 exposure device 800 stage device

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Takayuki Hashimoto 3-2-2-3 Marunouchi, Chiyoda-ku, Tokyo Nikon Corporation (72) Inventor Masaya Nagasawa 3-2-2-3 Marunouchi, Chiyoda-ku, Tokyo Inside Nikon Corporation (72) Inventor Hiroshi Meguro 3-2-3 Marunouchi, Chiyoda-ku, Tokyo F-term in Nikon Corporation (reference) 5F031 CA02 CA05 HA13 HA38 HA53 JA02 JA06 JA14 JA17 JA27 JA32 KA06 LA03 LA04 LA08 MA27 5F046 CC01 CC02 CC03 CC13 CC18 5H540 AA01 BA03 BB01 BB07 BB08 BB09 EE05 FA02 FA12 FB01 FC07 FC10 5H641 BB06 BB11 BB16 BB18 BB19 GG02 GG03 GG26 HH02 HH03

Claims (7)

[Claims] A first member having a plurality of coils; a second member having a plurality of magnets; and selectively supplying a current to the plurality of coils of the first member to form a second member. Control means for moving the member relative to the first member, wherein the control means determines the number of coils for supplying current according to the driving state of the second member. Characteristic linear motor device. 2. The linear motor device according to claim 1, wherein the driving state is at least an acceleration / deceleration state in which the second member is accelerated / decelerated, and a constant speed in which the second member is moved at a constant speed. A linear motor device characterized by being in a state. 3. The linear motor device according to claim 2, wherein the control unit determines the number of coils that supply the current such that the amount of heat generated by the coil for obtaining a constant thrust is minimized in the acceleration / deceleration state. And determining the number of coils for supplying the current so that the control residual between the moving position of the second member and the target moving position is minimized in the constant speed state. . 4. The linear motor device according to claim 1, wherein the control unit determines a driving state of the second member in advance according to an elapsed time, and A linear motor device, wherein the number of coils to which the current is supplied is determined according to an elapsed time. 5. The linear motor device according to claim 1, wherein the control unit controls a value of a current supplied to the coil according to a value of the current supplied to the coil. A linear motor device characterized in that the number is determined. 6. The linear motor device according to claim 1, wherein the control unit obtains position information of the second member, and obtains the current based on the position information. A linear motor device, wherein the number of coils to be supplied is determined. 7. The method according to claim 1, wherein:
In the above-described linear motor device, the control unit may obtain acceleration information of the second member.
In both cases, the coil to which the current is supplied according to the acceleration information is
Linear motor device characterized by determining the number of files
Place. 8. The linear motor device according to claim 1, wherein the linear motor device comprises an X stage, a Y stage and a Y stage.
A stage device used as a stage driving means. 9. An exposure apparatus which forms a predetermined pattern on a substrate using an exposure optical system, an exposure apparatus characterized by comprising a stage apparatus according to claim 8. 10. A device on which a predetermined pattern is formed, wherein the device is manufactured by using the exposure apparatus according to claim 9 . 11. A first member having a plurality of coils,
A second member having a plurality of magnets, wherein the second member is relatively moved with respect to the first member. And determining the number of coils for supplying current. 12. A method of driving a stage device having a linear motor as a driving means, wherein the linear motor is driven using the method of driving a linear motor according to claim 11 . 13. An exposure method for forming a predetermined pattern on a substrate placed on the stage device, when driving the stage device, characterized by using the method of driving the stage device according to claim 12 Exposure method. 14. A method for manufacturing a device on which a predetermined pattern is formed, wherein the exposure method according to claim 13 is used.