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JP2002185068A - Package for storing semiconductor elements - Google Patents

Package for storing semiconductor elements

Info

Publication number
JP2002185068A
JP2002185068A JP2000376031A JP2000376031A JP2002185068A JP 2002185068 A JP2002185068 A JP 2002185068A JP 2000376031 A JP2000376031 A JP 2000376031A JP 2000376031 A JP2000376031 A JP 2000376031A JP 2002185068 A JP2002185068 A JP 2002185068A
Authority
JP
Japan
Prior art keywords
frame
hole
center conductor
conductor
optical semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000376031A
Other languages
Japanese (ja)
Other versions
JP4658313B2 (en
Inventor
Yoshinobu Sawa
義信 澤
Daisuke Sakumoto
大輔 作本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000376031A priority Critical patent/JP4658313B2/en
Publication of JP2002185068A publication Critical patent/JP2002185068A/en
Application granted granted Critical
Publication of JP4658313B2 publication Critical patent/JP4658313B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H10W90/754

Landscapes

  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Abstract

(57)【要約】 【課題】 半導体素子に入出力する高周波信号の周波数
が高くなっても伝送路に発生する反射損失を小さくする
こと。 【解決手段】 上面に光半導体素子7と回路基板9が載
置用基台8を介して載置される載置部1aを有する基体
1、上面に載置部1aを囲繞して取着され側部に貫通孔
2aが形成された金属製の枠体2、筒状の外周導体3a
及びその略中心軸に設置させた中心導体3c並びにそれ
らの間に介在させて中心導体3cの両端が突出するよう
に設けた絶縁体3bから成ると共に貫通孔2aに嵌着さ
れて回路基板9と中心導体3cを接続する同軸コネクタ
3を具備し、同軸コネクタ3は、中心導体3cの枠体2
内側の先端が枠体2内面と略面一となっており、中心導
体3cと回路基板9とが板状の金属片10を介して電気
的に接続され、更に貫通孔2aは金属片10の端から枠
体2内面にかけて幅が大きくなっている。
(57) [Problem] To reduce reflection loss generated in a transmission line even when the frequency of a high-frequency signal input / output to / from a semiconductor element increases. SOLUTION: A base 1 having a mounting portion 1a on which an optical semiconductor element 7 and a circuit board 9 are mounted via a mounting base 8, is attached on the upper surface so as to surround the mounting portion 1a. Metal frame 2 having through hole 2a formed in side portion, cylindrical outer conductor 3a
And a center conductor 3c disposed substantially at the center axis thereof, and an insulator 3b interposed therebetween so that both ends of the center conductor 3c protrude. A coaxial connector 3 for connecting the center conductor 3c is provided.
The inner tip is substantially flush with the inner surface of the frame 2, the central conductor 3c and the circuit board 9 are electrically connected via a plate-shaped metal piece 10, and the through-hole 2a is formed in the metal piece 10. The width increases from the end to the inner surface of the frame 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、光通信やマイクロ
波通信,ミリ波通信等の高い周波数で作動する各種光半
導体素子を収納する半導体素子収納用パッケージに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device housing package for housing various optical semiconductor devices operating at a high frequency such as optical communication, microwave communication, and millimeter wave communication.

【0002】[0002]

【従来の技術】従来の光通信やマイクロ波通信またはミ
リ波通信等の高い周波数で作動する各種半導体素子を収
納する半導体素子収納用パッケージ(以下、半導体パッ
ケージという)のうち、光通信分野に用いられる光半導
体パッケージの断面図を図5に、同軸コネクタ周辺部の
拡大断面図を図6に示す。
2. Description of the Related Art Among conventional semiconductor element housing packages (hereinafter, referred to as semiconductor packages) for housing various semiconductor elements operating at a high frequency such as optical communication, microwave communication or millimeter wave communication, they are used in the optical communication field. FIG. 5 is a cross-sectional view of the optical semiconductor package to be obtained, and FIG. 6 is an enlarged cross-sectional view of the periphery of the coaxial connector.

【0003】これらの図に示すように、光半導体パッケ
ージは、一般に上面にLD(半導体レーザ),PD(フ
ォトダイオード)等の光半導体素子107が載置用基台
108を介して載置される載置部101aを有し、鉄
(Fe)−ニッケル(Ni)−コバルト(Co)合金や
銅(Cu)−タングステン(W)合金等の金属材料から
成る基体101を有する。また、載置部101aを囲繞
するようにして基体101の上面に銀ロウ等のロウ材を
介して接合されるとともに、一側面に光半導体素子10
7と外部電気回路(図示せず)とを電気的に接続する同
軸コネクタ103(ガラスビーズ端子ともいう)を嵌着
するための貫通孔102aが形成され、対向する側面に
光半導体素子107と光結合するための光伝送路である
貫通孔102bが形成された、Fe−Ni−Co合金等
の金属材料から成る枠体102を有する。
As shown in these drawings, an optical semiconductor package is generally provided with an optical semiconductor element 107 such as an LD (semiconductor laser) or a PD (photodiode) on a top surface via a mounting base 108. It has a mounting portion 101a and has a base 101 made of a metal material such as an iron (Fe) -nickel (Ni) -cobalt (Co) alloy or a copper (Cu) -tungsten (W) alloy. Further, it is joined to the upper surface of the base 101 via a brazing material such as silver brazing so as to surround the mounting portion 101a, and the optical semiconductor element 10
A through-hole 102a for fitting a coaxial connector 103 (also referred to as a glass bead terminal) for electrically connecting the optical semiconductor device 7 to an external electric circuit (not shown) is formed. There is a frame body 102 made of a metal material such as an Fe-Ni-Co alloy, in which a through-hole 102b as an optical transmission path for coupling is formed.

【0004】この枠体102の光伝送路である貫通孔1
02bの外側周辺部には、枠体102の熱膨張係数に近
似するFe−Ni−Co合金,Fe−Ni合金等の金属
材料から成り、戻り光防止用の光アイソレータ112と
光ファイバ113とが樹脂接着剤等で接着された金属外
周導体111と、非晶質ガラス等から成り集光レンズと
して機能するとともに光半導体パッケージの内部を塞ぐ
機能を有する透光性部材105とを固定する筒状の固定
部材104が銀ロウ等のロウ材で接合される。
[0004] The through hole 1 as an optical transmission path of the frame 102 is
02b, an optical isolator 112 for preventing return light and an optical fiber 113 are formed of a metal material such as an Fe-Ni-Co alloy or an Fe-Ni alloy which approximates the thermal expansion coefficient of the frame 102. A cylindrical member for fixing a metal outer conductor 111 bonded with a resin adhesive or the like, and a translucent member 105 made of amorphous glass or the like and functioning as a condenser lens and having a function of closing the inside of the optical semiconductor package. The fixing member 104 is joined with a brazing material such as silver brazing.

【0005】なお、この固定部材104と金属外周導体
111とは、各々の端面同士がYAGレーザ溶接等によ
り固定され、一方、固定部材104と透光性部材105
とは、固定部材104内周面に形成されたメッキ層に金
(Au)−錫(Sn)合金半田等の低融点ロウ材を介し
て取着することにより固定される。
The fixing member 104 and the metal outer conductor 111 have their respective end faces fixed by YAG laser welding or the like, while the fixing member 104 and the light transmitting member 105 are fixed.
Is fixed by attaching to a plating layer formed on the inner peripheral surface of the fixing member 104 via a low melting point brazing material such as gold (Au) -tin (Sn) alloy solder.

【0006】また、同軸コネクタ103は、Fe−Ni
−Co合金等の金属材料から成り貫通孔102a内周面
にAu−Sn合金半田等の低融点ロウ材によりロウ付け
される筒状の外周導体(ホルダー)103aと、この外
周導体103aの内部に充填されたホウケイ酸ガラス等
の絶縁体103bと、この外周導体103aの中心軸部
分に装着され光半導体パッケージ内外を導通させる中心
導体(金属端子)103cとから成る。
[0006] The coaxial connector 103 is made of Fe-Ni.
A cylindrical outer conductor (holder) 103a made of a metal material such as a Co alloy and brazed to the inner peripheral surface of the through hole 102a with a low melting point brazing material such as Au-Sn alloy solder; It is composed of a filled insulator 103b such as borosilicate glass and a center conductor (metal terminal) 103c mounted on the center axis of the outer conductor 103a and conducting inside and outside of the optical semiconductor package.

【0007】また、この同軸コネクタ103は、高周波
信号が伝送される中心導体103cと、その外周部、即
ち金属材料から成る外周導体103a、および貫通孔1
02a内周面とが、高周波信号を伝送するときにインピ
ーダンスの整合が可能である同軸構造を成している。
The coaxial connector 103 includes a central conductor 103c through which a high-frequency signal is transmitted, an outer peripheral portion thereof, that is, an outer peripheral conductor 103a made of a metal material, and a through hole 1c.
The inner peripheral surface 02a has a coaxial structure that allows impedance matching when transmitting a high-frequency signal.

【0008】なお、この同軸コネクタ103と光半導体
素子107との電気的接続は、中心導体103cの枠体
102内側の部位と、この中心導体103cと貫通孔1
02a内周面により発生するインピーダンスと同じにな
るように回路基板109上面に形成されたマイクロスト
リップ線路であるメタライズ金属層109aとを、錫
(Sn)−鉛(Pb)半田等の低融点ロウ材を介して接
合するとともに、このメタライズ金属層109aと光半
導体素子107とをボンディングワイヤ114により接
続することによって成される。
The electrical connection between the coaxial connector 103 and the optical semiconductor element 107 is made by connecting the central conductor 103c inside the frame 102, the central conductor 103c and the through hole 1c.
The metallized metal layer 109a, which is a microstrip line formed on the upper surface of the circuit board 109 so as to have the same impedance as the inner peripheral surface of the substrate 02a, is connected to a low melting point brazing material such as tin (Sn) -lead (Pb) solder. And the metallized metal layer 109a and the optical semiconductor element 107 are connected by bonding wires 114.

【0009】このような光半導体パッケージは、それに
光半導体素子107やインピーダンス整合用等の回路基
板109を搭載した載置用基台108を樹脂接着剤,ロ
ウ材等の接着剤を介して載置固定した後、中心導体10
3cの一端と回路基板109上面のメタライズ金属層1
09aとをSn−Pb半田等の低融点ロウ材により取着
するとともに、光半導体素子107とメタライズ金属層
109aとをボンディングワイヤ114で電気的に接続
し、その後、光アイソレータ112,光ファイバ113
が固定された金属外周導体111を固定部材104に溶
接し、枠体102上面に蓋体106をシーム溶接やロウ
付け等により取着することにより、製品としての光半導
体装置となる。
In such an optical semiconductor package, a mounting base 108 on which an optical semiconductor element 107 and a circuit board 109 for impedance matching and the like are mounted is mounted via an adhesive such as a resin adhesive or a brazing material. After fixing, the center conductor 10
3c and metallized metal layer 1 on the upper surface of circuit board 109
09a with a low melting point brazing material such as Sn-Pb solder, and the optical semiconductor element 107 and the metallized metal layer 109a are electrically connected with a bonding wire 114. Thereafter, the optical isolator 112 and the optical fiber 113 are connected.
Is fixed to the fixing member 104, and the lid 106 is attached to the upper surface of the frame 102 by seam welding, brazing, or the like, whereby an optical semiconductor device as a product is obtained.

【0010】このような光半導体装置は、例えば外部か
ら供給される高周波信号により光半導体素子107を光
励起させ、励起したレーザ光等の光を透光性部材105
を介して光ファイバ113に授受させ光ファイバ113
内を伝送させることにより、大容量の情報を高速に伝送
できる光電変換装置として機能し、光通信分野等に多く
用いられる。
In such an optical semiconductor device, for example, the optical semiconductor element 107 is optically excited by a high-frequency signal supplied from the outside, and the excited light such as laser light is transmitted through the light transmitting member 105.
To the optical fiber 113 via the optical fiber 113
By transmitting the signal inside, it functions as a photoelectric conversion device that can transmit a large amount of information at high speed, and is often used in the field of optical communication and the like.

【0011】[0011]

【発明が解決しようとする課題】しかしながら、上記従
来の光半導体パッケージにおいて、入出力される高周波
信号の周波数が高くなると、枠体102内側の中心導体
103cは同軸構造となっていないため、その部位に発
生するインピーダンスが非常に大きくなり、貫通孔10
2a内部の中心導体103cとメタライズ金属層109
aとの間で発生するインピーダンスのギャップが大きく
なる。また、中心導体103cおよびメタライズ金属層
109aを経由して伝送する高周波信号の伝搬モードの
変化により発生する反射損失が光半導体素子107の作
動性に対し無視できないほど大きくなる。
However, in the above-mentioned conventional optical semiconductor package, if the frequency of the input / output high-frequency signal becomes high, the central conductor 103c inside the frame 102 does not have a coaxial structure. Is very large, and the through-hole 10
The central conductor 103c and the metallized metal layer 109 inside 2a
The gap of the impedance generated between a and a becomes large. Further, the reflection loss caused by the change in the propagation mode of the high-frequency signal transmitted via the central conductor 103c and the metallized metal layer 109a becomes so large that the operability of the optical semiconductor element 107 cannot be ignored.

【0012】従って、本発明は上記問題点に鑑み完成さ
れたものであり、その目的は、高周波信号を伝送する伝
送線路に発生するインピーダンスのギャップを小さくし
てインピーダンスを整合するとともに、高周波信号の伝
搬モードの急激な変化により発生する反射損失を極めて
小さくすることにより、光半導体パッケージに高周波信
号を円滑に入出力し光半導体素子の作動性を良好なもの
とすることにある。
Accordingly, the present invention has been completed in view of the above problems, and an object of the present invention is to reduce the impedance gap generated in a transmission line for transmitting a high-frequency signal so as to match the impedance and to reduce the impedance of the high-frequency signal. It is an object of the present invention to improve the operability of an optical semiconductor element by smoothly inputting / outputting a high-frequency signal to / from an optical semiconductor package by extremely reducing reflection loss caused by a sudden change in a propagation mode.

【0013】[0013]

【課題を解決するための手段】本発明の半導体素子収納
用パッケージは、上面に半導体素子および回路基板が載
置用基台を介して載置される載置部を有する基体と、前
記上面に前記載置部を囲繞するように取着されるととも
に側部に貫通孔が形成された金属製の枠体と、筒状の外
周導体および該外周導体の略中心軸に設置させた中心導
体ならびにそれらの間に介在させて前記中心導体の両端
が突出するように設けた絶縁体から成るとともに前記貫
通孔に嵌着されて前記回路基板および前記中心導体を電
気的に接続する同軸コネクタとを具備した半導体素子収
納用パッケージにおいて、前記同軸コネクタは、前記中
心導体の前記枠体内側の先端が前記枠体の内面と略面一
となるように設けられ、かつ前記中心導体と前記回路基
板とが板状の金属片を介して電気的に接続されており、
さらに前記貫通孔は前記金属片の端に相当する位置から
前記枠体の内面にかけて幅が大きくなっていることを特
徴とする。
According to the present invention, there is provided a semiconductor device housing package, comprising: a base having a mounting portion on which a semiconductor element and a circuit board are mounted via a mounting base; A metal frame attached to surround the mounting portion and having a through hole formed in a side portion thereof, a cylindrical outer conductor, and a center conductor disposed on a substantially central axis of the outer conductor, and A coaxial connector that is interposed therebetween and is made of an insulator provided so that both ends of the center conductor protrude, and is fitted into the through hole to electrically connect the circuit board and the center conductor. In the package for accommodating a semiconductor element described above, the coaxial connector is provided such that a tip of the center conductor inside the frame is substantially flush with an inner surface of the frame, and the center conductor and the circuit board are arranged in a line. Sheet metal It is electrically connected via,
Further, the width of the through hole is increased from a position corresponding to an end of the metal piece to an inner surface of the frame.

【0014】本発明は、このような構成により、光半導
体パッケージに入出力する高周波信号の周波数が高くな
っても、同軸コネクタの中心導体,金属片,回路基板上
面のメタライズ金属層を経由する伝送路におけるインピ
ーダンスの急激な変化を抑えることによりインピーダン
スを整合できる。また、この伝送路における高周波信号
の伝搬モードの変化を緩やかにすることができる。その
結果、高周波信号を伝送するときに伝送路において発生
する反射損失を極めて小さくでき、光半導体素子と外部
電気回路との高周波信号の入出力を円滑に行うことがで
きる。
According to the present invention, the transmission through the center conductor of the coaxial connector, the metal piece, and the metallized metal layer on the upper surface of the circuit board even if the frequency of the high-frequency signal input / output to / from the optical semiconductor package is increased. The impedance can be matched by suppressing a sudden change in the impedance on the road. In addition, the change in the propagation mode of the high-frequency signal in this transmission path can be moderated. As a result, the reflection loss occurring in the transmission line when transmitting the high-frequency signal can be extremely reduced, and the input and output of the high-frequency signal between the optical semiconductor element and the external electric circuit can be performed smoothly.

【0015】[0015]

【発明の実施の形態】本発明の半導体パッケージの一種
である光半導体パッケージについて、以下に詳細に説明
する。図1は、本発明の光半導体パッケージの一実施形
態を示す断面図、図2は図1の貫通孔や同軸コネクタお
よびその周辺部の要部拡大断面図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An optical semiconductor package, which is a kind of the semiconductor package of the present invention, will be described in detail below. FIG. 1 is a cross-sectional view showing one embodiment of the optical semiconductor package of the present invention, and FIG. 2 is an enlarged cross-sectional view of a principal part of the through-hole and the coaxial connector of FIG.

【0016】これらの図において、1は容器本体の底面
を構成する基体、2は容器本体の側壁用の枠体、3は高
周波信号の入出力端子である同軸コネクタ、4は透光性
部材5や金属外周導体11を設置固定するための筒状の
固定部材、5は透光性部材、6は蓋体、7はLD,PD
等の光半導体素子である。これら基体1、枠体2、同軸
コネクタ3、固定部材4、透光性部材5および蓋体6と
で、内部に光半導体素子7を収納するための容器が基本
的に構成される。
In these figures, 1 is a base constituting the bottom of the container body, 2 is a frame for the side wall of the container body, 3 is a coaxial connector which is an input / output terminal for high-frequency signals, and 4 is a translucent member 5. And a cylindrical fixing member for mounting and fixing the metal outer conductor 11, 5 is a translucent member, 6 is a lid, 7 is LD, PD
And the like. The base 1, the frame 2, the coaxial connector 3, the fixing member 4, the translucent member 5, and the lid 6 basically constitute a container for housing the optical semiconductor element 7 therein.

【0017】また、従来技術と同様に、固定部材4の外
部側の端面には、光アイソレータ12と光ファイバ13
とが樹脂接着剤等で接着された金属外周導体11が、Y
AGレーザ溶接等により固定される。
As in the prior art, an optical isolator 12 and an optical fiber 13 are provided on the outer end face of the fixing member 4.
Is bonded to the metal outer conductor 11 with a resin adhesive or the like.
It is fixed by AG laser welding or the like.

【0018】本発明の基体1は、光半導体素子7を支持
するための支持部材ならびに光半導体素子7から発せら
れる熱を放散するための放熱板として機能し、その上面
の略中央部に光半導体素子7が載置用基台8を介して載
置される載置部1aを有している。この載置部1aに、
載置用基台8がSn−Pb半田等の低融点ロウ材を介し
て接着固定されるとともに、この低融点ロウ材を介して
光半導体素子7から発せられた熱が伝えられ、外部に効
率良く放散され、光半導体素子7の作動性を良好なもの
とする。
The substrate 1 of the present invention functions as a support member for supporting the optical semiconductor element 7 and a heat radiating plate for dissipating heat generated from the optical semiconductor element 7. The device 7 has a mounting portion 1 a on which the device 7 is mounted via a mounting base 8. In this mounting portion 1a,
The mounting base 8 is adhered and fixed via a low melting point brazing material such as Sn-Pb solder, and the heat generated from the optical semiconductor element 7 is transmitted through the low melting point brazing material, thereby improving the efficiency to the outside. It is well diffused, and the operability of the optical semiconductor element 7 is improved.

【0019】この基体1は、Fe−Ni−Co合金やC
u−W合金等の金属材料から成り、そのインゴットに圧
延加工や打ち抜き加工等の従来周知の金属加工法を施す
ことによって所定の形状に製作される。また、その表面
に耐蝕性に優れかつロウ材との濡れ性に優れる金属、具
体的には厚さ0.5〜9μmのNi層と厚さ0.5〜9
μmのAu層を順次メッキ法により被着させておくと、
基体1が酸化腐食するのを有効に防止することができる
とともに、基体1上面に載置用基台8を介して光半導体
素子7を強固に被着固定させることができる。従って、
所定の形状に製作された基体1の表面に0.5〜9μm
のNi層や0.5〜9μmのAu層等の金属層をメッキ
法により被着させておくことが好ましい。
The substrate 1 is made of an Fe—Ni—Co alloy or C
It is made of a metal material such as a u-W alloy, and is manufactured into a predetermined shape by subjecting the ingot to a conventionally known metal working method such as rolling or punching. In addition, a metal having excellent corrosion resistance and excellent wettability with a brazing material on its surface, specifically, a Ni layer having a thickness of 0.5 to 9 μm and a thickness of 0.5 to 9
If a μm Au layer is sequentially deposited by plating,
The substrate 1 can be effectively prevented from being oxidized and corroded, and the optical semiconductor element 7 can be firmly adhered and fixed on the upper surface of the substrate 1 via the mounting base 8. Therefore,
0.5 to 9 μm on the surface of the substrate 1 manufactured in a predetermined shape
It is preferable to apply a metal layer such as a Ni layer or a 0.5 to 9 μm Au layer by a plating method.

【0020】また、この載置用基台8はシリコン(S
i)やCu−W合金等の熱伝導性の高い金属材料から成
り、光半導体素子7から基体1へ熱を伝えるための媒体
として機能するとともに、その高さを適宜設定すること
により透光性部材5と光半導体素子7との光軸が合うよ
うに調節する機能を有する。また、その上面には、高周
波信号の伝送線路としてのメタライズ金属層9aが形成
された、アルミナ(Al 23)セラミックス等のセラミ
ックスから成るインピーダンス整合等用の回路基板9が
接合される。
The mounting base 8 is made of silicon (S
i) or a metal material with high thermal conductivity such as Cu-W alloy
For transmitting heat from the optical semiconductor element 7 to the base 1
As well as setting its height as appropriate
As a result, the optical axes of the light transmitting member 5 and the optical semiconductor element 7 are aligned.
It has the function of adjusting In addition, on the upper surface,
Metallized metal layer 9a is formed as transmission line for wave signal
Alumina (Al TwoOThree) Ceramics and other ceramics
Circuit board 9 for impedance matching etc.
Joined.

【0021】また、このメタライズ金属層9aは、モリ
ブデン(Mo),マンガン(Mn),タングステン
(W)等の粉末に有機溶剤、溶媒を添加混合して得た金
属ペーストを、回路基板9となるセラミックグリーンシ
ートに予め従来周知のスクリーン印刷法により所定パタ
ーンに印刷塗布し焼結することにより形成される。
The metallized metal layer 9a is a circuit board 9 made of a metal paste obtained by adding an organic solvent and a solvent to a powder of molybdenum (Mo), manganese (Mn), tungsten (W) or the like. It is formed by printing and applying a predetermined pattern on a ceramic green sheet in advance by a conventionally known screen printing method, followed by sintering.

【0022】さらに、このメタライズ金属層9aは、中
心導体3cと貫通孔2a内部に発生するインピーダンス
と同じになるように形成されたマイクロストリップ線路
であり、光半導体素子7とボンディングワイヤ14によ
り電気的に接続される。また、従来の中心導体103c
(図5)の枠体102内側に突出した部位に発生する電
界に対し、メタライズ金属層9aに発生する電界の大き
さに近くなるような金属片10を用いて枠体2内側の中
心導体3cとメタライズ金属層9aとを電気的に接続す
る。その結果、中心導体3cと金属片10との接続部、
金属片10とメタライズ金属層9aとの接続部で発生す
る電界の変化を緩やかにし急激なインピーダンスの変化
を抑えることにより、高周波信号が伝送する伝送路の反
射損失を小さくする。
Further, the metallized metal layer 9a is a microstrip line formed so as to have the same impedance as that generated inside the center conductor 3c and the through hole 2a, and is electrically connected by the optical semiconductor element 7 and the bonding wire 14. Connected to. Also, the conventional center conductor 103c
The central conductor 3c inside the frame 2 is formed by using a metal piece 10 that is close to the magnitude of the electric field generated in the metallized metal layer 9a with respect to the electric field generated in a portion protruding inside the frame 102 (FIG. 5). And metallized metal layer 9a are electrically connected. As a result, a connection portion between the center conductor 3c and the metal piece 10,
The change in the electric field generated at the connection between the metal piece 10 and the metallized metal layer 9a is moderated to suppress a rapid change in impedance, thereby reducing the reflection loss of the transmission line for transmitting the high-frequency signal.

【0023】この金属片10は、側面からみた断面形状
が略長方形状またはメタライズ金属層9aに向かって先
細り状とされたテーパ状を有しており、その厚さは10
〜100μmの範囲であれば良く、10μm未満の場合
製造が困難となり、100μmを超える場合高周波信号
の反射損失が非常に大きくなる。
The metal piece 10 has a substantially rectangular cross section as viewed from the side or a tapered shape tapering toward the metallized metal layer 9a.
If it is less than 10 μm, manufacturing becomes difficult, and if it exceeds 100 μm, the reflection loss of a high-frequency signal becomes very large.

【0024】また、金属片10は、その平面形状が略長
方形状またはメタライズ金属層9aに向かって先細り状
とされたテーパ状を有しており、その最も狭い部位の幅
が、中心導体3c,メタライズ金属層9aにSn−Pb
半田等の低融点ロウ材で強固に接合できる程度の幅であ
れば良く、一方、最も広い部位の幅が、中心導体3cの
直径以下であれば良く、最も広い部位の幅が中心導体3
cの直径を超える場合、高周波信号の反射損失が非常に
大きくなる。
The metal piece 10 has a substantially rectangular planar shape or a tapered shape tapered toward the metallized metal layer 9a, and the width of the narrowest portion is set to the center conductor 3c, Sn-Pb is applied to the metallized metal layer 9a.
It is sufficient that the width is such that it can be firmly joined with a low melting point brazing material such as solder. On the other hand, it is sufficient that the width of the widest part is equal to or less than the diameter of the center conductor 3c.
When the diameter exceeds c, the reflection loss of the high-frequency signal becomes very large.

【0025】また、金属片10は、その主面とメタライ
ズ金属層9aの表面の延長面との成す角の角度θ1が0
〜90°の範囲であれば良く、その範囲を外れる場合高
周波信号の反射損失が非常に大きくなる。より好ましく
は、θ1は0〜30°がよく、さらには10°以下がよ
く、0°に近い方がよい。
The metal piece 10 has an angle θ1 of 0 between the main surface and the extension of the surface of the metallized metal layer 9a.
If the angle is out of the range, the reflection loss of the high-frequency signal becomes very large. More preferably, θ1 is preferably 0 to 30 °, more preferably 10 ° or less, and more preferably 0 °.

【0026】また、金属片10は、中心導体3cとメタ
ライズ金属層9aとを電気的に接続する際に、それらの
熱歪みを有効に防止するために熱膨張係数の近似するF
e−Ni−Co合金やFe−Ni合金等の金属材料を用
いるのが好ましい。
When electrically connecting the central conductor 3c and the metallized metal layer 9a, the metal piece 10 has an F coefficient having an approximate coefficient of thermal expansion in order to effectively prevent thermal distortion thereof.
It is preferable to use a metal material such as an e-Ni-Co alloy or an Fe-Ni alloy.

【0027】また、枠体2には、その一側面に光半導体
素子7と外部電気回路とを電気的に接続するとともに光
半導体パッケージ内部を気密に塞ぐ機能を有する同軸コ
ネクタ3を嵌着するための貫通孔2aを形成し、対向す
る側面には光半導体素子7と光結合するための光伝送路
の機能を有する貫通孔2bを形成する。
A coaxial connector 3 having a function of electrically connecting the optical semiconductor element 7 to an external electric circuit and hermetically closing the inside of the optical semiconductor package is fitted to one side surface of the frame 2. Is formed, and a through hole 2b having a function of an optical transmission path for optically coupling with the optical semiconductor element 7 is formed on the opposing side surface.

【0028】また、同軸コネクタ3は、Fe−Ni−C
o合金等の金属材料から成り、貫通孔2a内周面にAu
−Sn合金半田等の低融点ロウ材によりロウ付けされる
筒状の外周導体3aと、この外周導体3a内部に充填さ
れたホウケイ酸ガラス等から成る絶縁体3bと、外周導
体3aの略中心軸に設置されるように絶縁体3bに挿入
固定され光半導体パッケージ内外を導通する中心導体3
cとから成る。なお、この同軸コネクタ3は、金属材料
から成る外周導体3aと貫通孔2a内周面および中心導
体3cとが、高周波信号が伝送するときのインピーダン
スを整合することができる同軸構造と成っている。従っ
て、光半導体パッケージに入出力される高周波信号の周
波数が高くなっても中心導体3においてはインピーダン
スの整合が困難になる部位が出現することはない。
The coaxial connector 3 is made of Fe-Ni-C
o made of a metal material such as an alloy.
A cylindrical outer conductor 3a brazed with a low melting point brazing material such as Sn alloy solder, an insulator 3b made of borosilicate glass or the like filled in the outer conductor 3a, and a substantially central axis of the outer conductor 3a; Center conductor 3 inserted and fixed in insulator 3b so as to be installed in
c. The coaxial connector 3 has a coaxial structure in which the outer conductor 3a made of a metal material, the inner peripheral surface of the through hole 2a, and the center conductor 3c can match the impedance when transmitting a high-frequency signal. Therefore, even if the frequency of the high-frequency signal input / output to / from the optical semiconductor package is increased, there is no portion in the center conductor 3 where impedance matching becomes difficult.

【0029】なお、同軸コネクタ3は、枠体2内側の中
心導体3cの先端が枠体2内面と略面一となるよう貫通
孔2aに嵌着される。この中心導体3cの先端が枠体2
内面よりも貫通孔2aの内側にある場合には、貫通孔2
a内周面の形状によりその内部に発生するインピーダン
スを整合させることが困難となる。その結果、光半導体
パッケージの高周波信号の伝送路における反射損失を小
さくできず、円滑な高周波信号の入出力を行うことが困
難となる。
The coaxial connector 3 is fitted into the through hole 2a such that the tip of the center conductor 3c inside the frame 2 is substantially flush with the inner surface of the frame 2. The tip of the center conductor 3c is the frame 2
If it is located inside the through hole 2a from the inner surface, the through hole 2a
a It becomes difficult to match the impedance generated inside due to the shape of the inner peripheral surface. As a result, the reflection loss in the transmission path of the high-frequency signal of the optical semiconductor package cannot be reduced, and it is difficult to smoothly input and output the high-frequency signal.

【0030】また、枠体2内側の中心導体3cの先端が
枠体2内面より突出する場合には、同軸構造である貫通
孔2a内部の中心導体3cと、同軸構造と成らない枠体
2内面より突出する中心導体3cとの間にインピーダン
スのギャップが発生し、インピーダンスの整合が困難と
なる。その結果、高周波信号の伝送路における反射損失
が大きくなり、外部電気回路と光半導体素子7との高周
波信号の入出力が円滑に行われない。
When the tip of the center conductor 3c inside the frame 2 protrudes from the inner surface of the frame 2, the center conductor 3c inside the through hole 2a having the coaxial structure and the inner surface of the frame 2 not having the coaxial structure are formed. A gap in impedance is generated between the center conductor 3c and the protruding center conductor 3c, which makes impedance matching difficult. As a result, the reflection loss in the transmission path of the high-frequency signal increases, and the input and output of the high-frequency signal between the external electric circuit and the optical semiconductor element 7 are not performed smoothly.

【0031】また、貫通孔2aは、図2に示すように金
属片10の中心導体3c側の端に相当する位置から枠体
2の内面にかけてその幅(貫通孔2aの断面が円形の場
合直径である)が大きく成っている。同図のように、貫
通孔2aの断面が円形であってその幅が枠体2の内面に
向かって漸次大きくなる場合、貫通孔2a内部の金属片
10の端に相当する位置から枠体2内面すなわち中心導
体3c先端までの距離をd、同軸コネクタ3の中心軸か
ら基体1または蓋体6までの近い方の距離をr1、金属
片10が接続されていない枠体2内側の中心導体3cの
部位を取り囲む貫通孔2aの部位の半径をr2、中心導
体3cの軸方向と貫通孔2aの内周面のうち直径が漸次
大きくなっている箇所(傾斜面)とのなす角度をθ2と
した場合、0°<θ2≦tan 1{(r1−r2)/
d}とすることが好ましい。
The width of the through hole 2a extends from the position corresponding to the end of the metal piece 10 on the side of the center conductor 3c to the inner surface of the frame 2 as shown in FIG. Is large). As shown in the figure, when the cross section of the through hole 2a is circular and the width gradually increases toward the inner surface of the frame 2, the frame 2 is moved from a position corresponding to the end of the metal piece 10 inside the through hole 2a. D is the distance from the inner surface, that is, the tip of the center conductor 3c, r1 is the shorter distance from the center axis of the coaxial connector 3 to the base 1 or the lid 6, and the center conductor 3c inside the frame 2 to which the metal piece 10 is not connected. The radius of the portion of the through hole 2a surrounding the portion is r2, and the angle between the axial direction of the central conductor 3c and the portion (inclined surface) of the inner peripheral surface of the through hole 2a whose diameter is gradually increased is θ2. In this case, 0 ° <θ2 ≦ tan 1 1 (r1−r2) /
Preferably, d}.

【0032】このような構成により、貫通孔2a内部の
金属片10が接続されていない中心導体3cの部位と、
金属片10が接続されている中心導体3cの部位と、枠
体2内面より突出した金属片10の部位とにそれぞれ発
生するインピーダンスの変化を緩やかにすることにより
インピーダンスを整合することができる。その結果、高
周波信号の伝送路の反射損失を低減することができ、光
半導体素子7に対する高周波信号の入出力を効率よく円
滑に行うことができる。
With such a configuration, the portion of the center conductor 3c to which the metal piece 10 inside the through hole 2a is not connected,
Impedance can be matched by reducing the change in impedance that occurs at the portion of the central conductor 3c to which the metal piece 10 is connected and the portion of the metal piece 10 that protrudes from the inner surface of the frame 2. As a result, the reflection loss of the transmission path for the high-frequency signal can be reduced, and the input and output of the high-frequency signal to and from the optical semiconductor element 7 can be performed efficiently and smoothly.

【0033】また、θ2がθ2>tan 1{(r1−
r2)/d}の場合、貫通孔2aの幅が貫通孔2a内部
の金属片10の端に相当する位置から枠体2内面に向か
って漸次大きく成るものの、貫通孔2aと基体1とが交
差するか貫通孔2aと蓋体6とが交差するため、インピ
ーダンスの整合が困難となる。従って、高周波信号の反
射損失を低減できず円滑な高周波信号の伝送が困難とな
る。
Also, when θ2 is θ2> tan 1 1 (r1-
In the case of r2) / d}, although the width of the through hole 2a gradually increases from the position corresponding to the end of the metal piece 10 inside the through hole 2a toward the inner surface of the frame 2, the through hole 2a and the base 1 intersect. Otherwise, since the through hole 2a and the lid 6 intersect, it becomes difficult to match the impedance. Therefore, the reflection loss of the high-frequency signal cannot be reduced, and it is difficult to smoothly transmit the high-frequency signal.

【0034】具体的には、θ2を30〜70°とするの
がよく、その場合高周波信号の反射損失が有効に低減さ
れる。
Specifically, it is preferable to set θ2 to 30 to 70 °, in which case the reflection loss of the high-frequency signal is effectively reduced.

【0035】なお、図3に、本発明の実施の形態の一例
として、貫通孔2aの幅が貫通孔2a内部の金属片10
の端に相当する位置から枠体2内面に向かって段階的に
大きくなる構成を示す。同図のように、貫通孔2aに金
属片10の端に相当する位置から枠体2内面にかけて幅
が略均一な切欠部2cを設ける。この切欠部2cの幅
は、金属片10が接続されていない中心導体3cの部位
と、中心導体3cと金属片10を接続した部位とを取り
囲む貫通孔2aおよび枠体2内面より突出した金属片1
0にそれぞれ発生するインピーダンスを整合するように
設定することができる。その結果、光半導体パッケージ
に入出力される高周波信号の周波数が高くなっても高周
波信号の伝送路のインピーダンスの不整合による反射損
失を小さくできることから、円滑な高周波信号の伝送が
行なえる。
FIG. 3 shows an example of the embodiment of the present invention in which the width of the through-hole 2a is smaller than that of the metal piece 10 inside the through-hole 2a.
A configuration is shown in which the size gradually increases from the position corresponding to the end toward the inner surface of the frame 2. As shown in the figure, a notch 2c having a substantially uniform width is provided in the through hole 2a from the position corresponding to the end of the metal piece 10 to the inner surface of the frame 2. The width of the notch 2c is determined by the through hole 2a surrounding the portion of the central conductor 3c to which the metal piece 10 is not connected and the portion connecting the central conductor 3c to the metal piece 10 and the metal piece protruding from the inner surface of the frame 2. 1
It can be set so that the impedances respectively generated to zero are matched. As a result, even if the frequency of the high-frequency signal input / output to / from the optical semiconductor package increases, the reflection loss due to the impedance mismatch of the transmission path of the high-frequency signal can be reduced, so that the high-frequency signal can be transmitted smoothly.

【0036】さらに、図4に示すように、貫通孔2a内
部の金属片10の端に相当する位置から枠体2a内面に
かけて、貫通孔2aの幅が漸次拡がる部位と幅が一定と
なる部位を設けることによっても、金属片10が接続さ
れていない中心導体3cの部位と、中心導体3cに金属
片10が接続されている部位とを取り囲む貫通孔2aお
よび枠体2内面より突出した金属片10にそれぞれ発生
するインピーダンスを整合することができる。
Further, as shown in FIG. 4, from the position corresponding to the end of the metal piece 10 inside the through-hole 2a to the inner surface of the frame 2a, a portion where the width of the through-hole 2a gradually increases and a portion where the width becomes constant are shown. Also, the metal piece 10 protruding from the inner surface of the frame 2 and the through hole 2a surrounding the portion of the center conductor 3c to which the metal piece 10 is not connected and the portion where the metal piece 10 is connected to the center conductor 3c can be provided. Can be matched.

【0037】また、枠体2は基体1との接合における熱
歪みを小さくし接合を強固なものとするとともに、光半
導体パッケージの外部に対する電磁遮蔽(シールド)を
行うために、基体1の熱膨張係数に近似するFe−Ni
−Co合金やFe−Ni合金等の金属材料を用いるのが
よい。
In addition, the frame 2 reduces the thermal strain at the time of bonding with the base 1 to strengthen the bonding, and also performs thermal expansion (shielding) of the base 1 to provide electromagnetic shielding (shielding) to the outside of the optical semiconductor package. Fe-Ni approximating coefficient
It is preferable to use a metal material such as a -Co alloy or an Fe-Ni alloy.

【0038】また、枠体2は、基体1と同様にその材料
のインゴットに圧延加工や打ち抜き加工等の従来周知の
金属加工法を施すことにより所定の形状に製作され、そ
の表面に耐蝕性に優れかつロウ材との濡れ性に優れる金
属、具体的には厚さ0.5〜9μmのNi層と厚さ0.
5〜9μmのAu層を順次メッキ法により被着させてお
くと、枠体2が酸化腐食するのを有効に防止できるとと
もに、貫通孔2a,2bにそれぞれ同軸コネクタ3、透
光性部材5を強固に嵌着接合できる。従って、所定の形
状に製作された枠体2の表面に0.5〜9μmのNi層
や0.5〜9μmのAu層等の金属層をメッキ法により
被着させておくことが好ましい。
The frame 2 is formed into a predetermined shape by subjecting an ingot of the same material to a conventionally known metal working method such as rolling or punching as in the case of the base 1, and the surface thereof has corrosion resistance. A metal having excellent wettability with a brazing material, specifically, a Ni layer having a thickness of 0.5 to 9 μm and a thickness of 0.1 μm.
When a 5 to 9 μm Au layer is sequentially applied by plating, the oxidative corrosion of the frame 2 can be effectively prevented, and the coaxial connector 3 and the translucent member 5 are respectively provided in the through holes 2a and 2b. It can be firmly fitted and joined. Therefore, it is preferable that a metal layer such as a 0.5 to 9 μm Ni layer or a 0.5 to 9 μm Au layer is applied to the surface of the frame 2 manufactured in a predetermined shape by plating.

【0039】また、貫通孔2bの外側周辺部には、枠体
2の熱膨張係数に近似するFe−Ni−Co合金,Fe
−Ni合金等の金属材料から成り、戻り光防止用の光ア
イソレータ12と光信号の光伝送路として機能する光フ
ァイバ13とが樹脂接着剤で接着された金属外周導体1
1、および非晶質ガラス等から成り集光レンズとして機
能し光半導体パッケージ内部を塞ぐ機能を有する透光性
部材5を固定する筒状の固定部材4が銀ロウ等のロウ材
で接合される。
The outer peripheral portion of the through hole 2b is provided with an Fe—Ni—Co alloy, Fe
A metal outer conductor 1 made of a metal material such as a Ni alloy and having an optical isolator 12 for preventing return light and an optical fiber 13 functioning as an optical transmission path of an optical signal bonded with a resin adhesive;
1, and a cylindrical fixing member 4 for fixing a translucent member 5 which is made of amorphous glass and functions as a condenser lens and has a function of closing the inside of the optical semiconductor package, is joined with a brazing material such as silver brazing. .

【0040】この固定部材4の内周部には、集光レンズ
として機能するとともに光半導体パッケージ内部を塞ぐ
非晶質ガラス等から成る透光性部材5が、その接合部の
表面に形成されたメタライズ層を介して、200〜40
0℃の融点を有するAu−Sn合金半田等の低融点ロウ
材で接合される。
A translucent member 5 made of amorphous glass or the like, which functions as a condenser lens and closes the inside of the optical semiconductor package, is formed on the inner peripheral portion of the fixing member 4 on the surface of the joint. 200-40 through the metallization layer
It is joined with a low melting point brazing material such as an Au-Sn alloy solder having a melting point of 0 ° C.

【0041】この透光性部材5は、熱膨張係数が4×1
6〜12×10 6/℃(室温〜400℃)のサファ
イア(単結晶アルミナ)や非晶質ガラス等から成り、球
状,半球状,凸レンズ状、ロッドレンズ状等とされ、外
部のレーザ光等の光を光ファイバ13により伝送させて
光半導体素子7に入力させる、または光半導体素子7で
出力したレーザ光等の光を光ファイバ13に入力させる
ための集光用部材として用いられる。透光性部材5が、
例えば結晶軸の存在しない非晶質ガラスの場合、酸化珪
素(SiO2),酸化鉛(PbO)を主成分とする鉛
系、またはホウ酸やケイ砂を主成分とするホウケイ酸系
のものを用いる。
The translucent member 5 has a thermal expansion coefficient of 4 × 1.
0 - 6 ~12 × 10 - 6 / ℃ consists of sapphire (single crystal alumina) or an amorphous glass of (room temperature to 400 ° C.), spherical, hemispherical, convex lens, is a rod lens shape or the like, outside of Used as a condensing member for transmitting light such as laser light through the optical fiber 13 and inputting it to the optical semiconductor element 7 or inputting light such as laser light output from the optical semiconductor element 7 to the optical fiber 13. . The translucent member 5 is
For example, in the case of an amorphous glass having no crystal axis, a lead-based material containing silicon oxide (SiO 2 ) or lead oxide (PbO) as a main component, or a borosilicate-based material containing boric acid or silica sand as a main component is used. Used.

【0042】また、この透光性部材5は、その熱膨張係
数が枠体2のそれと異なっていても固定部材4が熱膨張
差による応力を吸収し緩和するので、結晶軸が応力のた
めにある方向に揃うことによって光の屈折率の変化を起
こすようなことは発生しにくい。従って、このような透
光性部材5を用いることにより光半導体素子7と光ファ
イバ13との間の光の結合効率を高くできる。
Further, even if the transmissive member 5 has a different coefficient of thermal expansion from that of the frame 2, the fixing member 4 absorbs and relaxes the stress due to the difference in thermal expansion, so that the crystal axis is reduced due to the stress. It is unlikely that the alignment in a certain direction causes a change in the refractive index of light. Therefore, by using such a translucent member 5, the light coupling efficiency between the optical semiconductor element 7 and the optical fiber 13 can be increased.

【0043】また、蓋体6は、Fe−Ni−Co合金等
の金属材料やアルミナセラミックス等のセラミックスか
ら成るとともに、枠体2上面にAu−Sn合金半田等の
低融点ロウ材を介して接合されたり、YAGレーザ溶接
等の溶接法により接合される。これによって、基体1と
枠体2と蓋体6とから成る光半導体パッケージとしての
容器の内部に光半導体素子7を収納し封止することによ
って、製品としての光半導体装置となる。
The lid 6 is made of a metal material such as an Fe-Ni-Co alloy or a ceramic such as alumina ceramics, and is joined to the upper surface of the frame 2 via a low melting point brazing material such as an Au-Sn alloy solder. Or joined by a welding method such as YAG laser welding. As a result, the optical semiconductor element 7 is housed and sealed in a container as an optical semiconductor package including the base 1, the frame 2, and the lid 6, thereby obtaining an optical semiconductor device as a product.

【0044】かくして、本発明は、図4に示す従来の同
軸コネクタ103を用いた半導体パッケージと比べ、貫
通孔2a内部の中心導体3cと、枠体2内面より突出し
た金属片10および回路基板9上面のメタライズ金属層
9aとの間に発生するインピーダンスのギャップを小さ
くできる。また、貫通孔2a内部の金属片10を接続し
ていない中心導体3cの部位と、中心導体3cの金属片
10を接続している部位および枠体2内部に突出した金
属片10とを経由して入出力する高周波信号の伝搬モー
ドの変化を緩やかにすることができる。
Thus, the present invention is different from the conventional semiconductor package using the coaxial connector 103 shown in FIG. 4 in that the center conductor 3c inside the through hole 2a, the metal piece 10 protruding from the inner surface of the frame 2 and the circuit board 9 are provided. The gap of impedance generated between the upper surface and the metallized metal layer 9a can be reduced. In addition, a portion of the central conductor 3c to which the metal piece 10 is not connected in the through hole 2a, a portion of the central conductor 3c to which the metal piece 10 is connected, and the metal piece 10 protruding into the frame 2 are passed. Thus, the change in the propagation mode of the input / output high-frequency signal can be moderated.

【0045】即ち、貫通孔2a内部の金属片10を接続
していない中心導体3cの部位は同軸構造によるTEM
モードであり、中心導体3cの金属片10を接続してい
る部位はTEMモードとTEモードが混在し枠体2の内
側に向かって徐々にTEモードとなるようにされ、金属
片10はTEモードであり、金属片10とメタライズ金
属層9aとの接合部はTEMモードとTEモードが混在
しており、メタライズ金属層9aはTEMモードであ
る。このように、中心導体3cの金属片10を接続して
いる部位において、伝搬モードが枠体2の内側に向かっ
て徐々にTEモードに整合されていることから、伝搬モ
ードの急激な変化が抑えられるため高周波信号の伝送損
失が小さくなる。
That is, the portion of the central conductor 3c to which the metal piece 10 inside the through hole 2a is not connected is a TEM having a coaxial structure.
The TEM mode and the TE mode are mixed at the portion of the center conductor 3c where the metal piece 10 is connected, and the TE piece is gradually set to the inside of the frame 2 so that the metal piece 10 is in the TE mode. In the joint between the metal piece 10 and the metallized metal layer 9a, the TEM mode and the TE mode are mixed, and the metallized metal layer 9a is in the TEM mode. As described above, since the propagation mode is gradually matched to the TE mode toward the inside of the frame 2 at the portion where the metal piece 10 of the center conductor 3c is connected, a rapid change in the propagation mode is suppressed. Therefore, the transmission loss of the high frequency signal is reduced.

【0046】かくして、本発明、半導体素子に入出力す
る高周波信号の周波数が高くなっても高周波信号の伝送
路のインピーダンスの不整合、および急激な伝搬モード
の変化により発生する高周波信号の反射損失を非常に小
さくできる。
Thus, according to the present invention, even if the frequency of a high-frequency signal input / output to / from a semiconductor device increases, the impedance of the transmission path of the high-frequency signal becomes unmatched, and the reflection loss of the high-frequency signal caused by a sudden change in the propagation mode is reduced. Can be very small.

【0047】本発明において、高周波信号の周波数は1
〜100GHz程度のGHz帯域であり、特に10GH
z以上の周波数において従来インピーダンスおよび伝搬
モードの変化が急激であったものを緩やかにすることが
できる。
In the present invention, the frequency of the high-frequency signal is 1
GHz band of about 100 GHz, especially 10 GHz
At a frequency equal to or higher than z, the impedance and the propagation mode in which the change has been sharp can be reduced.

【0048】なお、本発明は上記実施の形態に限定され
ず、本発明の要旨を逸脱しない範囲内において種々の変
更を行うことは何等支障ない。
The present invention is not limited to the above-described embodiment, and various changes may be made without departing from the scope of the present invention.

【0049】[0049]

【発明の効果】本発明は、同軸コネクタは、中心導体の
枠体内側の先端が枠体の内面と略面一となるように設け
られ、かつ中心導体と回路基板とが板状の金属片を介し
て電気的に接続されており、さらに貫通孔は金属片の端
から枠体の内面にかけて幅が大きくなっていることによ
り、高周波信号の伝送路に発生するインピーダンスのギ
ャップを小さくできるとともに、高周波信号の伝搬モー
ドの変化を緩やかにすることができる。その結果、半導
体素子に入出力する高周波信号の周波数が高くなっても
高周波信号の伝送路に発生する反射損失を極めて小さく
でき、半導体素子と外部電気回路との高周波信号の入出
力を円滑に行うことができる。
According to the present invention, a coaxial connector is provided in which a tip of a center conductor inside a frame is provided so as to be substantially flush with an inner surface of the frame, and the center conductor and the circuit board are plate-shaped metal pieces. In addition, the through hole has a larger width from the end of the metal piece to the inner surface of the frame, so that the impedance gap generated in the transmission path of the high-frequency signal can be reduced, The change in the propagation mode of the high-frequency signal can be moderated. As a result, even if the frequency of the high-frequency signal input / output to / from the semiconductor element increases, the reflection loss generated in the transmission path of the high-frequency signal can be extremely reduced, and the input / output of the high-frequency signal between the semiconductor element and the external electric circuit can be performed smoothly. be able to.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体素子収納用パッケージについて
実施の形態の一例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for housing a semiconductor element of the present invention.

【図2】図1の同軸コネクタおよびその周辺部の要部拡
大断面図である。
FIG. 2 is an enlarged sectional view of a main part of the coaxial connector of FIG. 1 and a peripheral portion thereof.

【図3】図1の同軸コネクタおよびその周辺部について
実施の形態の一例を示す要部拡大断面図である。
FIG. 3 is an enlarged sectional view of a main part showing an example of an embodiment of the coaxial connector of FIG. 1 and its peripheral part.

【図4】図1の同軸コネクタおよびその周辺部について
実施の形態の他の例を示す要部拡大断面図である。
FIG. 4 is an enlarged sectional view of a main part showing another example of the embodiment of the coaxial connector of FIG. 1 and its peripheral part.

【図5】従来の光半導体パッケージの断面図である。FIG. 5 is a cross-sectional view of a conventional optical semiconductor package.

【図6】従来の光半導体パッケージの同軸コネクタおよ
びその周辺部の拡大断面図である。
FIG. 6 is an enlarged sectional view of a conventional coaxial connector of an optical semiconductor package and a peripheral portion thereof.

【符号の説明】[Explanation of symbols]

1:基体 1a:載置部 2:枠体 2a,2b:貫通孔 3:同軸コネクタ 3a:外周導体 3b:絶縁体 3c:中心導体 7:光半導体素子 8:載置用基台 9:回路基板 10:金属片 1: Base 1a: Mounting section 2: Frame 2a, 2b: Through hole 3: Coaxial connector 3a: Outer conductor 3b: Insulator 3c: Central conductor 7: Optical semiconductor element 8: Mounting base 9: Circuit board 10: Metal piece

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】上面に半導体素子および回路基板が載置用
基台を介して載置される載置部を有する基体と、前記上
面に前記載置部を囲繞するように取着されるとともに側
部に貫通孔が形成された金属製の枠体と、筒状の外周導
体および該外周導体の略中心軸に設置させた中心導体な
らびにそれらの間に介在させて前記中心導体の両端が突
出するように設けた絶縁体から成るとともに前記貫通孔
に嵌着されて前記回路基板および前記中心導体を電気的
に接続する同軸コネクタとを具備した半導体素子収納用
パッケージにおいて、前記同軸コネクタは、前記中心導
体の前記枠体内側の先端が前記枠体の内面と略面一とな
るように設けられ、かつ前記中心導体と前記回路基板と
が板状の金属片を介して電気的に接続されており、さら
に前記貫通孔は前記金属片の端に相当する位置から前記
枠体の内面にかけて幅が大きくなっていることを特徴と
する半導体素子収納用パッケージ。
A base having a mounting portion on which a semiconductor element and a circuit board are mounted via a mounting base; and a base attached to the upper surface so as to surround the mounting portion. A metal frame having a through hole formed in a side portion, a cylindrical outer conductor, a center conductor disposed on a substantially central axis of the outer conductor, and both ends of the center conductor interposed therebetween are protruded. And a coaxial connector fitted with the through-hole and electrically connecting the circuit board and the central conductor. An end of the center conductor inside the frame is provided so as to be substantially flush with an inner surface of the frame, and the center conductor and the circuit board are electrically connected via a plate-shaped metal piece. And the through hole is in front Package for housing semiconductor chip, characterized in that the width from the position corresponding to the end of the metal strip toward the inner surface of the frame is large.
JP2000376031A 2000-12-11 2000-12-11 Package for storing semiconductor elements Expired - Fee Related JP4658313B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000376031A JP4658313B2 (en) 2000-12-11 2000-12-11 Package for storing semiconductor elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000376031A JP4658313B2 (en) 2000-12-11 2000-12-11 Package for storing semiconductor elements

Publications (2)

Publication Number Publication Date
JP2002185068A true JP2002185068A (en) 2002-06-28
JP4658313B2 JP4658313B2 (en) 2011-03-23

Family

ID=18844951

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4658313B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7189009B2 (en) 2003-05-15 2007-03-13 Infineon Technologies, Ag Micro-optical module with housing and method for producing the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03259584A (en) * 1990-03-09 1991-11-19 Toshiba Corp Semiconductor laser apparatus
JPH0536451A (en) * 1991-07-29 1993-02-12 Mitsubishi Electric Corp Coaxial connector for microwave integrated circuit
JPH09293599A (en) * 1996-04-30 1997-11-11 Hitachi Ltd Plasma treating method and device
JPH11127003A (en) * 1997-10-23 1999-05-11 Alps Electric Co Ltd High frequency electronic device
JPH11186427A (en) * 1997-12-25 1999-07-09 Kyocera Corp Package for storing semiconductor elements

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03259584A (en) * 1990-03-09 1991-11-19 Toshiba Corp Semiconductor laser apparatus
JPH0536451A (en) * 1991-07-29 1993-02-12 Mitsubishi Electric Corp Coaxial connector for microwave integrated circuit
JPH09293599A (en) * 1996-04-30 1997-11-11 Hitachi Ltd Plasma treating method and device
JPH11127003A (en) * 1997-10-23 1999-05-11 Alps Electric Co Ltd High frequency electronic device
JPH11186427A (en) * 1997-12-25 1999-07-09 Kyocera Corp Package for storing semiconductor elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7189009B2 (en) 2003-05-15 2007-03-13 Infineon Technologies, Ag Micro-optical module with housing and method for producing the same

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