JP2002160089A - Airtight terminal and method for producing the same - Google Patents
Airtight terminal and method for producing the sameInfo
- Publication number
- JP2002160089A JP2002160089A JP2000364783A JP2000364783A JP2002160089A JP 2002160089 A JP2002160089 A JP 2002160089A JP 2000364783 A JP2000364783 A JP 2000364783A JP 2000364783 A JP2000364783 A JP 2000364783A JP 2002160089 A JP2002160089 A JP 2002160089A
- Authority
- JP
- Japan
- Prior art keywords
- agbi
- alloy
- solder
- film
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000005476 soldering Methods 0.000 claims abstract description 12
- 230000005496 eutectics Effects 0.000 claims abstract description 7
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims abstract description 5
- 239000000956 alloy Substances 0.000 claims description 34
- 229910045601 alloy Inorganic materials 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 20
- 238000009713 electroplating Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910001152 Bi alloy Inorganic materials 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 abstract description 35
- 238000007747 plating Methods 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 14
- 239000010453 quartz Substances 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 238000010897 surface acoustic wave method Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 16
- 239000002184 metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 230000008018 melting Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 5
- 229910007116 SnPb Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000010587 phase diagram Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 229910007637 SnAg Inorganic materials 0.000 description 1
- 229910008433 SnCU Inorganic materials 0.000 description 1
- 238000003916 acid precipitation Methods 0.000 description 1
- 229910000905 alloy phase Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、水晶振動子等に用いる
気密端子に関し、Pbフリーを実現する際に、信頼性が
高く安価な気密端子およびその製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hermetic terminal used for a quartz oscillator or the like, and more particularly to a highly reliable and inexpensive hermetic terminal for realizing Pb-free and a method of manufacturing the same.
【0002】[0002]
【従来の技術】近年、電子部品は廃棄時に酸性雨等によ
り、基板や端子接続等に使用されているはんだ材中のP
bが溶け出し、土壌を汚染するという環境問題の懸念か
ら、いわゆるPbフリーはんだを使用した電子部品への
移行が進められている。ところで電子部品の素子である
水晶振動子やSAW共振子は気密性が保たれた気密端子
(ハーメチックシール)に封入され、重要な部品として多
用されている。この気密端子は密封されたパッケージの
中で水晶振動子又はSAW共振子とはんだ接続されてお
り、気密性は缶パッケージとステムを熱圧入することで
保たれている。2. Description of the Related Art In recent years, when electronic components are discarded due to acid rain or the like, P in solder materials used for connecting substrates and terminals has been reduced.
Due to concerns about environmental problems that b melts out and contaminates the soil, the shift to electronic components using so-called Pb-free solder is being promoted. By the way, the crystal unit and the SAW resonator, which are the elements of the electronic parts, are airtight terminals with airtightness.
(Hermetic seal), which is often used as an important part. The hermetic terminal is soldered to a crystal resonator or a SAW resonator in a sealed package, and hermeticity is maintained by heat-pressing the can package and the stem.
【0003】このような目的のため気密端子の接合部に
は、あらかじめはんだメッキ膜が施してあり、水晶振動
子との接合は、このはんだ材によって行われる。はんだ
メッキ膜の溶融は一般に電気炉などの中に入れて、炉内
に流す熱風等によって行われる。熱風の温度の下限は、
耐熱はんだが完全溶融する温度、上限は水晶振動子、S
AW共振子が変質しない温度に限られる。具体的には3
50℃〜500℃である。気密パッケージされた水晶振
動子、SAW共振子は基板上に配置され、一般的にはリ
フローはんだ付けが行われる。[0003] For such a purpose, a solder plating film is preliminarily applied to a joint portion of the hermetic terminal, and the joint with the crystal oscillator is performed by this solder material. The melting of the solder plating film is generally performed by placing it in an electric furnace or the like and flowing hot air into the furnace. The lower limit of hot air temperature is
Temperature at which heat-resistant solder is completely melted, upper limit is crystal oscillator, S
The temperature is limited to a temperature at which the AW resonator does not deteriorate. Specifically, 3
50 ° C to 500 ° C. The hermetically packaged quartz resonator and SAW resonator are arranged on a substrate, and generally are subjected to reflow soldering.
【0004】リフローはんだ付作業時の部品ピーク温度
は、リフロー炉の加熱が主に温風加熱による加熱方式で
あるので、部品熱容量によってピーク温度が変わる。し
かもPbフリーリフローはんだは、通常のSnPbはん
だより融点が高いという理由で、220℃〜260℃に
なり、このリフローピーク温度でも気密端子内のはんだ
接合された水晶振動子、SAW共振子が脱落しないよう
に気密端子はんだメッキ膜は、通常のSnPbはんだよ
りも固相温度(金属材料の溶融が始まる下限温度)が高く
設定される。このはんだメッキ膜は、耐熱はんだと呼ば
れるはんだ材料が使用されている。さらに耐熱はんだは
一般的にはPb90アトミック%(以下at%と略する)
前後のSnPb材を使用して耐熱特性を実現している。The peak temperature of components during reflow soldering varies depending on the heat capacity of the components because the heating of the reflow furnace is mainly performed by hot air heating. In addition, the Pb-free reflow solder has a melting point higher than that of ordinary SnPb solder, and thus has a temperature of 220 ° C. to 260 ° C. Even at this reflow peak temperature, the crystal unit and the SAW resonator bonded to the solder in the hermetic terminal do not fall off. As described above, the solid-phase temperature (lower limit temperature at which the melting of the metal material starts) of the hermetic terminal solder plating film is set higher than that of ordinary SnPb solder. For this solder plating film, a solder material called heat-resistant solder is used. Furthermore, heat-resistant solder is generally Pb90 atomic% (hereinafter abbreviated as at%).
Heat resistance is realized by using the front and rear SnPb materials.
【0005】[0005]
【発明が解決しようとする課題】上記従来の技術を説明
したように、耐熱はんだメッキ膜の施された気密端子
は、Pb含有量が高く、Pbフリーを実現しようとする
時代の流れに反するという問題がある。Pbフリーで耐
熱性のある接合材としてはAuSnがあるが、Auの価
格は非常に高く、気密端子の製造に使用した場合には、
電子部品としての気密端子が非常に高価になってしまう
という問題がある。As described above, the hermetic terminal provided with the heat-resistant solder plating film has a high Pb content, which is against the trend of the era of realizing Pb-free. There's a problem. AuSn is a Pb-free and heat-resistant bonding material, but the price of Au is very high, and when used for the production of hermetic terminals,
There is a problem that the hermetic terminal as an electronic component becomes very expensive.
【0006】本発明の目的は、安価で信頼性の高い、P
bフリー耐熱はんだメッキの施された気密端子、および
その製造方法を提供することにある。It is an object of the present invention to provide an inexpensive and highly reliable P
An object of the present invention is to provide an airtight terminal on which b-free heat-resistant solder plating has been applied, and a method for manufacturing the same.
【0007】[0007]
【課題を解決するための手段】本発明は、耐熱特性を有
するPbフリーメッキ膜の採用検討を重ねた結果、Bi
含有量が30〜80at%のAgBiメッキ膜がPbフ
リー耐熱はんだに適していることを見出したことに基づ
いてなされたものである。According to the present invention, as a result of studying the adoption of a Pb-free plating film having heat resistance, Bi
This is based on the finding that an AgBi plating film having a content of 30 to 80 at% is suitable for a Pb-free heat-resistant solder.
【0008】本発明によると、AgBi合金膜の膜厚に
特に制限はないが、5〜20μm程度が好ましい。その
理由はAgBi合金以下になると気密端子のリードと素
子である水晶振動子を接合するはんだ量が少なくなって
しまい、AgBi合金接合強度が、低下してしまうから
である。他方AgBi合金膜厚が20μm以上になる
と、はんだ流性の効果は損なわないものの、膜厚の製作
が困難となり、経済性が低下してしまい実施不能の公算
大となる。本発明では、AgBi合金膜を、気密端子の
はんだ付け接続部に成膜させる時に、熱風を吹きつけて
成膜させるが、吹着付けの際の水晶振動子等の電子部品
の耐熱温度としては、500℃以下が望ましい。500
℃以下とする理由は、通常の電子部品耐熱温度が、50
0℃以下だからである。一方吹着付けの際のAgBi合
金膜の固相温度が、図2の固液相線S3が組成領域S2
の30〜80at%にある下限温度から350℃となる
ので、はんだ付け接続部に成膜させる時に、熱風を吹き
つけて成膜させる温度下限は、350℃である。また本
発明では、AgBi合金膜の成膜をさせる手段として
は、電解メッキ、無電解メッキ、スパッタリング、蒸着
などを適宜選択して差し支えなく、さらに、条件によっ
ては、AgBi合金箔にして、気密端子のリ−ド線と、
ボンディングパッドの間に挟み込み溶融して接合しても
よい。しかし、この水晶振動子用気密端子のように異形
である場合、スパッタリング、蒸着法で金属部分だけに
選択的に均一に成膜させることは、現在の技術では難し
いので、電解メッキがより望ましい。AgBi合金膜の
下には、密着性向上を考慮して、Cu、Cr、Ni、T
i等の下地層を適宜設定すると良い。According to the present invention, the thickness of the AgBi alloy film is not particularly limited, but is preferably about 5 to 20 μm. The reason for this is that when the content is less than the AgBi alloy, the amount of solder for joining the lead of the hermetic terminal and the crystal unit as the element decreases, and the bonding strength of the AgBi alloy decreases. On the other hand, when the thickness of the AgBi alloy is 20 μm or more, the effect of the solder flowability is not impaired, but the production of the film thickness becomes difficult, the economic efficiency is reduced, and it is almost impossible to implement. In the present invention, when the AgBi alloy film is formed on the soldering connection part of the hermetic terminal, the film is formed by blowing hot air, but the heat resistance temperature of the electronic component such as a quartz oscillator at the time of spraying is as follows. 500 ° C. or less is desirable. 500
° C or lower because the normal electronic component heat resistance temperature is 50 ° C.
This is because it is 0 ° C. or less. Meanwhile solidus temperature of AgBi alloy film when the吹着with the solid-liquid phase line S 3 is composition region S 2 in FIG. 2
From the lower limit temperature of 30 to 80 at% to 350 ° C., the lower temperature limit for forming a film by blowing hot air when forming a film on the soldering connection portion is 350 ° C. In the present invention, as a means for forming the AgBi alloy film, electrolytic plating, electroless plating, sputtering, vapor deposition, or the like may be appropriately selected. Further, depending on the conditions, an AgBi alloy foil may be used to form an airtight terminal. And the lead wire of
The bonding may be performed by sandwiching and bonding between the bonding pads. However, in the case of an irregular shape such as the hermetic terminal for a crystal unit, it is difficult to form a uniform film selectively only on a metal portion by a sputtering or vapor deposition method with current technology, and therefore, electrolytic plating is more preferable. Under the AgBi alloy film, Cu, Cr, Ni, T
It is preferable to appropriately set a base layer such as i.
【0009】[0009]
【発明の実施の態様】図2はAgBi2元系合金の状態
図である。合金の組成は共晶組成(Bi95.3at%)
点、S0から外れた、Bi量組成領域S2が30〜80
at%のAgBi合金あるいは、この組成のAgBiを
主成分としたAgBi+α(α:残部)合金を、気密端子
メッキはんだとして使うことで、262℃の耐熱安定性
を確保し得るものである。FIG. 2 is a phase diagram of an AgBi binary alloy. Alloy composition is eutectic composition (Bi 95.3at%)
Point, out of the S 0, Bi amount a composition region S 2 is 30 to 80
By using an at% AgBi alloy or an AgBi + α (α: balance) alloy containing AgBi as a main component as an airtight terminal plating solder, the heat resistance at 262 ° C. can be secured.
【0010】[0010]
【実施例】図1に基づいて実施例の気密端子の説明を行
う。図1(a)は、水晶振動子を搭載するための気密端子の
リード導入端子部の1例である。金属外環1の内側に、電
気的にショートせず、さらに気密性を保つために2本の
外部導入リード2が、あらかじめ気密封止のために、ガ
ラス3でモールドされている。このリード導入端子部の
金属外環1と外部導入リード2の金属部分に、はんだめ
っきが施されている。図1(b)は、この外部導入リード
2と水晶振動子4の電極が、外部導入リード2上にめっ
きされたはんだ膜を溶融して接合した状態の実施例であ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS An airtight terminal according to an embodiment will be described with reference to FIG. FIG. 1A shows an example of a lead-in terminal portion of a hermetic terminal for mounting a crystal resonator. Inside the metal outer ring 1, two external introduction leads 2 are molded in advance with glass 3 for hermetic sealing so as not to be electrically short-circuited and to maintain hermeticity. The metal portions of the metal outer ring 1 and the external lead 2 of the lead introducing terminal portion are plated with solder. FIG. 1B shows an embodiment in which the external lead 2 and the electrode of the crystal unit 4 are joined by melting a solder film plated on the external lead 2.
【0011】図1(c)は、この水晶振動子4とはんだ接
合されたリード導入端子部を真空雰囲気中でケース5
を、リード導入端子部の金属外環1と冷間圧入してあ
る。金属外環1と金属ケース5との気密性は、比較的柔
らかく、延性のある金属外環1のまわりに施されたはん
だ膜の金属特性を利用して、この気密端子の気密性を保
っている。FIG. 1 (c) shows a case where the lead introducing terminal portion soldered to the quartz oscillator 4 is placed in a case 5 in a vacuum atmosphere.
Is cold-pressed into the metal outer ring 1 of the lead introducing terminal portion. The airtightness between the metal outer ring 1 and the metal case 5 is maintained by using the metal properties of the solder film applied around the relatively soft and ductile metal outer ring 1 to maintain the airtightness of the airtight terminal. I have.
【0012】本発明では、金属外環1と外部導入リード
2に施されたはんだめっき膜としてリフローはんだ耐熱
性のある電解AgBiめっきが使用されている。図1
(d)は、水晶振動子4と外部導入リード2とのはんだ接
合を説明するための側面図である。水晶振動子4上にパ
ターニングされた配線板の電極6上にはんだめっきされ
た外部導入リード2が冶具等で固定されている。この状
態で外部導入リード2と電極6の接合部に熱風等を吹き
付け、リード2上のAgBi+α(α:残部)合金はんだ
膜7を溶融し、リード2と電極6をはんだ接合する。In the present invention, electrolytic AgBi plating having reflow soldering heat resistance is used as a solder plating film applied to the metal outer ring 1 and the external lead 2. FIG.
(d) is a side view for explaining the solder bonding between the crystal unit 4 and the external lead 2. The external lead 2 solder-plated on the electrode 6 of the wiring board patterned on the crystal oscillator 4 is fixed by a jig or the like. In this state, hot air or the like is blown to the joint between the external lead 2 and the electrode 6 to melt the AgBi + α (α: remaining) alloy solder film 7 on the lead 2 and solder the lead 2 to the electrode 6.
【0013】前述のとおり、図2はAgBi2元系合金
の状態図である。この図を使ってAgBi合金膜の耐熱
特性についての説明を行う。AgBi合金膜は、典型的
な共晶合金である。固相温度S1は262℃であり、2
62℃までは溶融することは、ありえない。気密パッケ
ージされた水晶振動子、SAW共振子は基板上に配置さ
れ、一般的にはリフローはんだ付けが行われる。リフロ
ーはんだ時の部品ピーク温度は220〜260℃にな
り、このリフローピーク温度でも気密端子内のはんだ接
合された水晶振動子、SAW共振子が脱落しないように
気密端子はんだメッキ膜は使用温度範囲が220〜26
0℃になり、この範囲に耐える耐熱特性が要求される。
本提案のAgBi材は上記のように固相温度S2が26
2℃であり、リフロー温度に対して耐熱性のあることが
わかる。As described above, FIG. 2 is a phase diagram of an AgBi binary alloy. The heat resistance of the AgBi alloy film will be described with reference to FIG. AgBi alloy films are typical eutectic alloys. The solid state temperature S 1 is 262 ° C. and 2
Melting up to 62 ° C. is not possible. The hermetically packaged quartz resonator and SAW resonator are arranged on a substrate, and generally are subjected to reflow soldering. The component peak temperature during reflow soldering is 220 to 260 ° C. Even at this reflow peak temperature, the operating temperature range of the airtight terminal solder plating film is set so that the soldered crystal unit and SAW resonator in the airtight terminal do not fall off. 220-26
The temperature is 0 ° C., and heat resistance that can withstand this range is required.
The AgBi material of the present proposal has a solid state temperature S 2 of 26 as described above.
It is 2 ° C., which indicates that it has heat resistance to the reflow temperature.
【0014】通常のSnPbはんだ材料は、固相温度S
1と液相温度S2が離れるとはんだ作業性が悪くなるの
で、固相温度と液相温度とが一致する共晶組成あたりで
使用される。本実施例のAgBi合金膜の場合、共晶組
成点S0はBi95.3at%であり、耐熱特性はある
が、このようなBi量の高い組成では、合金自体が非常
に脆くなるため、AgBi合金がはんだ材として使用さ
れることは無かったのである。An ordinary SnPb solder material has a solidus temperature S
Since 1 and liquidus temperature S 2 soldering workability is deteriorated leaves are used in eutectic per composition solid phase temperature and the liquidus temperature are matched. In the case of the AgBi alloy film of the present embodiment, the eutectic composition point S 0 is Bi 95.3 at%, and has heat resistance properties. However, with such a composition having a high Bi content, the alloy itself becomes very brittle, so that AgBi is used. The alloy was never used as a solder material.
【0015】本発明に用いるAgBi合金膜の組成は共
晶組成(Bi95.3at%)から外れた、Bi量組成領
域S2が30〜80at%のAgBi合金あるいは、こ
の組成のAgBiを主成分としたAg−Bi−α(α:
残部)合金である。AgBi合金はBi量の組成領域が
80at%以上になっても固相温度S1は262℃と耐
熱特性は保証されるが、Bi量が多くなることでAgB
i合金は非常に脆くなり、引っ張り強度が急激に劣化す
るため水晶振動子と気密端子の接合強度が弱く、信頼性
に欠ける。また、Bi量の組成領域が30at%以下に
なっても、やはり固相温度S1は262℃と耐熱温度は
保証されるが、液相温度S2が500℃以上になってし
まい、電子部品としての耐熱温度保証が得られない。な
ぜなら、一般的に水晶振動子等の電子部品の耐熱温度は
500℃以下である。500℃以下のはんだ作業でBi
量30at%以下のAgBi合金を使用すると、AgB
i合金に溶け残りが生じ、やはり水晶振動子と気密端子
の接合強度が急激に悪くなる。また、このBi量(30
〜80at%)組成領域S2では、固液相線S3の傾き
が比較的緩やかであるため、組成が少々ずれても特性上
のばらつきは小さいがBi量が80at%以上、あるい
は30at%以下では、図2からわかるように、液相の
固液相線S4の温度勾配の傾きが大きくなり液相温度が
組成変動に敏感になってしまうため、組成調整を厳しく
制御しなければならないという問題も生じる。The composition of the AgBi alloy film used in the present invention deviates from the eutectic composition (Bi 95.3 at%), and the Bi content region S 2 is 30 to 80 at% AgBi alloy or AgBi of this composition as a main component. Ag-Bi-α (α:
(Remainder) alloy. AgBi alloy is the composition region of the Bi amount solidus temperature S 1 is 262 ° C. and heat resistance even if the above 80at% is ensured, AgB by Bi content is increased
The i-alloy becomes very brittle and the tensile strength is rapidly deteriorated, so that the bonding strength between the crystal unit and the hermetic terminal is weak and lacks reliability. Further, even if the Bi content of the composition area falls below 30 at%, but also solidus temperature S 1 is 262 ° C. and heat-resistant temperature is ensured, the liquidus temperature S 2 becomes too above 500 ° C., the electronic component Cannot guarantee the heat resistant temperature. This is because generally, the heat-resistant temperature of an electronic component such as a crystal oscillator is 500 ° C. or less. Bi at 500 ℃ or less soldering work
When an AgBi alloy having an amount of 30 at% or less is used,
Residual melting occurs in the i-alloy, and the bonding strength between the crystal unit and the hermetic terminal also rapidly deteriorates. In addition, this Bi amount (30
In to 80 at%) composition region S 2, since the inclination of the solid-liquid phase line S 3 is relatively gentle, variations in characteristics deviate composition slightly is small amount Bi is 80at% or more, or less 30 at% so as can be seen from Figure 2, that since the inclination increases and the liquid phase temperature of the temperature gradient of the solid-liquid phase line S 4 of the liquid phase becomes sensitive to compositional variations, it must be controlled strictly composition adjustment Problems arise.
【0016】他の実施例としては、AgBiはんだ層の
下には密着性向上のためCuの他に、例えば、Cr、T
i、Ni等の下地層があっても良い。またAgBi表面
に酸化防止等の保護のための保護膜があっても良い。一
般にはんだ材として使われているSnをベースとしたS
nPb、SnCu、SnAg等の材料は材料中に圧縮応
力がかかると応力緩和のためにウィスカーと呼ばれる特
殊な再結晶過程が起こり、電気的ショート等のトラブル
の原因となるが、本提案のAgBi合金はSnを使用し
ていないため、このような問題が生じることもない。As another embodiment, besides Cu for improving adhesion, for example, Cr, T
There may be an underlayer of i, Ni or the like. Further, a protective film for protection such as oxidation prevention may be provided on the AgBi surface. S based on Sn commonly used as solder material
For materials such as nPb, SnCu, and SnAg, when a compressive stress is applied to the material, a special recrystallization process called a whisker occurs due to stress relaxation, which causes troubles such as an electrical short. Does not use Sn, such a problem does not occur.
【0017】Agの材料費はSnベースの材料費よりも
若干高くなるが、AuSnほどは高くならず、AgBi
合金材料費が気密端子原価に占めるコストの割合は、そ
れほど高くならず安価に作製可能である。本発明のAg
Bi膜厚は、特に制限されないが5μm以下になるとA
gBi溶融量が少なすぎるため、接合強度が落ちる。2
0μm以上になっても成膜時間がかかりムダが多くなる
だけなので、5〜20μm厚くらいが好ましい。AgB
iはメッキ、スパッタリング、蒸着等によって成膜され
ても良いし、あるいは箔にして気密端子のリード線とボ
ンディングパッドの間に挟み込み溶融して接合してもよ
い。Although the material cost of Ag is slightly higher than that of Sn-based materials, it is not as high as that of AuSn.
The ratio of the cost of the alloy material to the cost of the hermetic terminal is not so high, and the cost can be reduced. Ag of the present invention
The thickness of the Bi film is not particularly limited.
Since the amount of melted gBi is too small, the bonding strength decreases. 2
Even when the thickness is 0 μm or more, the film formation time is increased and waste is increased, so that the thickness is preferably about 5 to 20 μm. AgB
i may be formed by plating, sputtering, vapor deposition, or the like, or may be made into a foil, sandwiched between a lead wire of an airtight terminal and a bonding pad, and fused to be joined.
【0018】次に本発明について水晶振動子の接合強度
とBi組成依存性の関係について、実験データを用いて
説明する。なお実験に用いた気密端子リード線径は、φ
0.3mmであり、このリード線上にCu2μm下地層
/AgBi(Bi:at%)10μmをメッキ成膜し
た。それに対しボンディングパッドはAuメッキされた
0.3×0.2mm2の大きさの水晶振動子を用い、4
50℃温度でAgBiを接合し、接合強度を調べた。図
3はBi量組成領域S22(xat%)を変えていったと
きの接合強度依存性の実験グラフである。接合強度規格
700g/mm2以上に対し、共晶組成からはずれたB
i30〜80at%で規格を満足する密着強度が得られ
ることがわかる。Biが30%(S20)以下のときに
は、AgBi状態図から明らかなように、液相温度が5
50℃以上であるため450℃接合温度では、AgBi
合金が全溶融しないため密着強度が下がり、他方Bi8
0あt%以上(S90)では、Bi量が多くなりAgBi
合金自体が脆くなるため、密着強度が、やはり下がって
しまったと考えられる。なお、図3のBi組成−密着強
度特性線図は、各Bi量に対し50個ずつ測定した密着
力の分散を考慮したグラフになっている。Next, the relationship between the bonding strength of the crystal unit and the Bi composition dependency of the present invention will be described using experimental data. The diameter of the hermetic terminal lead wire used in the experiment was φ
0.3 mm, and a Cu 2 μm underlayer
/ AgBi (Bi: at%) 10 μm was formed by plating. On the other hand, the bonding pad is made of an Au-plated quartz oscillator having a size of 0.3 × 0.2 mm 2 ,
AgBi was joined at a temperature of 50 ° C., and the joining strength was examined. FIG. 3 is an experimental graph of the bond strength dependence when the Bi amount composition region S 22 (xat%) is changed. For the bonding strength standard of 700 g / mm 2 or more, B deviated from the eutectic composition
It can be seen that the adhesion strength satisfying the standard can be obtained when i is 30 to 80 at%. When Bi is 30% (S 20 ) or less, as is clear from the AgBi phase diagram, the liquidus temperature is 5%.
At a bonding temperature of 450 ° C., AgBi
Since the alloy does not completely melt, the adhesion strength decreases, while Bi8
At 0 at% or more (S 90 ), the Bi amount increases and AgBi
It is considered that the adhesion strength was also lowered because the alloy itself became brittle. In addition, the Bi composition-adhesion strength characteristic diagram of FIG. 3 is a graph that considers the dispersion of the adhesion measured 50 by 50 for each Bi amount.
【0019】[0019]
【発明の効果】以上、作用および実施例にて説明したよ
うに本発明によれば、リフローはんだ耐熱性を有する安
価で信頼性の高いPbフリーはんだを使った気密端子が
生産できる。As described above, according to the present invention, an airtight terminal using Pb-free solder having low heat resistance and high reliability can be produced.
【0020】[0020]
【図1】 本発明の実施例を説明するの気密端子の斜視
図である。FIG. 1 is a perspective view of an airtight terminal for explaining an embodiment of the present invention.
【図2】 本発明の実施例のAgBi合金膜を説明する
ためのAgBi合金状態図である。FIG. 2 is an AgBi alloy phase diagram for explaining an AgBi alloy film according to an example of the present invention.
【図3】 本発明の実施例のAgBi合金膜についての
Bi組成−密着強度特性線図である。FIG. 3 is a Bi composition-adhesion strength characteristic diagram for an AgBi alloy film of an example of the present invention.
1 金属外環 2 外部導出リード 3 ガラス 4 素子(水晶振動子) 5 金属ケース 6 電極 7 AgBiめっき膜 DESCRIPTION OF SYMBOLS 1 Metal outer ring 2 External lead 3 Glass 4 Element (quartz oscillator) 5 Metal case 6 Electrode 7 AgBi plating film
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H03H 9/02 H03H 9/02 E Fターム(参考) 5J108 BB02 CC04 CC06 EE02 EE07 EE19 FF15 GG04 GG15 GG17 GG20 KK03 KK04 MM06 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H03H 9/02 H03H 9/02 EF term (Reference) 5J108 BB02 CC04 CC06 EE02 EE07 EE19 FF15 GG04 GG15 GG17 GG20 KK03 KK04 MM06
Claims (4)
をはんだ接続する気密端子のはんだ付け接続部にBi組
成比が30〜80at%である非共晶Ag−Bi合金、
およびこの組成比のAg−Biが主成分であるAg−B
i−α(残部)合金が成膜されていることを特徴とする気
密端子。A non-eutectic Ag-Bi alloy having a Bi composition ratio of 30 to 80 at% at a soldered connection portion of an airtight terminal for soldering an element of an electronic component to a lead wire led out.
And Ag-B whose main component is Ag-Bi of this composition ratio.
An airtight terminal, wherein an i-α (remainder) alloy is formed.
u、Cr、Ti、Ni等の下地層が成膜されていること
を特徴とする気密端子。2. The method according to claim 1, wherein C is formed under the AgBi alloy film.
An airtight terminal, wherein an underlayer of u, Cr, Ti, Ni or the like is formed.
ッキによって成膜することを特徴とする気密端子、およ
びその製造方法。3. The hermetic terminal according to claim 1, wherein the AgBi alloy film is formed by electrolytic plating.
部に350〜500℃の熱風を吹き付け、AgBi合金
を溶かし接合することを特徴とする気密端子、およびそ
の製造方法。4. The hermetic terminal according to claim 1, wherein hot air of 350 to 500 ° C. is blown onto the soldered connection portion of the hermetic terminal to melt and join the AgBi alloy, and a method of manufacturing the hermetic terminal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000364783A JP2002160089A (en) | 2000-11-30 | 2000-11-30 | Airtight terminal and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000364783A JP2002160089A (en) | 2000-11-30 | 2000-11-30 | Airtight terminal and method for producing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002160089A true JP2002160089A (en) | 2002-06-04 |
Family
ID=18835663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000364783A Withdrawn JP2002160089A (en) | 2000-11-30 | 2000-11-30 | Airtight terminal and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002160089A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112011102028T5 (en) | 2010-06-16 | 2013-04-18 | Sumitomo Metal Mining Co. Ltd. | Bi-Al-Zn-based Pb-free solder alloy |
| DE112011102163T5 (en) | 2010-06-28 | 2013-05-16 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy |
| DE112011104328T5 (en) | 2010-12-08 | 2013-10-02 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy containing predominantly Zn |
| DE112011105017T5 (en) | 2011-03-08 | 2013-12-19 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder paste |
| WO2015041018A1 (en) | 2013-09-20 | 2015-03-26 | 住友金属鉱山株式会社 | Bi GROUP SOLDER ALLOY, METHOD FOR BONDING ELECTRONIC PART USING SAME, AND ELECTRONIC PART MOUNTING SUBSTRATE |
| WO2015087588A1 (en) | 2013-12-10 | 2015-06-18 | 住友金属鉱山株式会社 | Au-sn-ag series solder alloy, electronic component sealed using same au-sn-ag series solder alloy, and electronic component-equipped device |
| US9796054B2 (en) | 2014-09-30 | 2017-10-24 | Sumitomo Metal Mining Co., Ltd. | Au—Sn—Ag-based solder alloy, electronic device sealed or joined using the same, and electronic apparatus equipped with the electronic device |
| US10589387B2 (en) | 2014-11-11 | 2020-03-17 | Sumitomo Metal Mining Co., Ltd. | Au—Sn—Ag-based solder alloy and solder material, electronic component sealed with the same Au—Sn—Ag based solder alloy or solder material, and electronic component mounting device |
-
2000
- 2000-11-30 JP JP2000364783A patent/JP2002160089A/en not_active Withdrawn
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112011102028B4 (en) * | 2010-06-16 | 2017-02-09 | Sumitomo Metal Mining Co., Ltd. | Bi-Al-Zn-based Pb-free solder alloy |
| US9211614B2 (en) | 2010-06-16 | 2015-12-15 | Sumitomo Metal Mining Co., Ltd. | Bi—Al—Zn—based Pb-free solder alloy |
| DE112011102028T5 (en) | 2010-06-16 | 2013-04-18 | Sumitomo Metal Mining Co. Ltd. | Bi-Al-Zn-based Pb-free solder alloy |
| DE112011102163B4 (en) * | 2010-06-28 | 2015-09-24 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy |
| DE112011102163T5 (en) | 2010-06-28 | 2013-05-16 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy |
| US9199339B2 (en) | 2010-06-28 | 2015-12-01 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy |
| DE112011104328B4 (en) * | 2010-12-08 | 2015-09-24 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy containing predominantly Zn |
| US8845828B2 (en) | 2010-12-08 | 2014-09-30 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy mainly containing Zn |
| DE112011104328T5 (en) | 2010-12-08 | 2013-10-02 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder alloy containing predominantly Zn |
| DE112011105017T5 (en) | 2011-03-08 | 2013-12-19 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder paste |
| US9227273B2 (en) | 2011-03-08 | 2016-01-05 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder paste |
| DE112011105017B4 (en) * | 2011-03-08 | 2016-07-07 | Sumitomo Metal Mining Co., Ltd. | Pb-free solder paste |
| WO2015041018A1 (en) | 2013-09-20 | 2015-03-26 | 住友金属鉱山株式会社 | Bi GROUP SOLDER ALLOY, METHOD FOR BONDING ELECTRONIC PART USING SAME, AND ELECTRONIC PART MOUNTING SUBSTRATE |
| WO2015087588A1 (en) | 2013-12-10 | 2015-06-18 | 住友金属鉱山株式会社 | Au-sn-ag series solder alloy, electronic component sealed using same au-sn-ag series solder alloy, and electronic component-equipped device |
| US9796054B2 (en) | 2014-09-30 | 2017-10-24 | Sumitomo Metal Mining Co., Ltd. | Au—Sn—Ag-based solder alloy, electronic device sealed or joined using the same, and electronic apparatus equipped with the electronic device |
| US10589387B2 (en) | 2014-11-11 | 2020-03-17 | Sumitomo Metal Mining Co., Ltd. | Au—Sn—Ag-based solder alloy and solder material, electronic component sealed with the same Au—Sn—Ag based solder alloy or solder material, and electronic component mounting device |
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