JP2002009403A - Ceramic circuit board and semiconductor element module - Google Patents
Ceramic circuit board and semiconductor element moduleInfo
- Publication number
- JP2002009403A JP2002009403A JP2000181984A JP2000181984A JP2002009403A JP 2002009403 A JP2002009403 A JP 2002009403A JP 2000181984 A JP2000181984 A JP 2000181984A JP 2000181984 A JP2000181984 A JP 2000181984A JP 2002009403 A JP2002009403 A JP 2002009403A
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- metal circuit
- ceramic
- ceramic substrate
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10W90/754—
Landscapes
- Structure Of Printed Boards (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、セラミック基板に
金属回路板を接合したセラミック回路基板および半導体
素子モジュールに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic circuit board in which a metal circuit board is joined to a ceramic substrate, and a semiconductor device module.
【0002】[0002]
【従来の技術】近年、パワーモジュール用基板やスイッ
チングモジュール用基板等の回路基板として、セラミッ
ク基板上に活性金属ロウ材を介して銅等から成る金属回
路板を直接接合させたセラミック回路基板が用いられて
いる。2. Description of the Related Art In recent years, as a circuit board such as a power module board or a switching module board, a ceramic circuit board in which a metal circuit board made of copper or the like is directly bonded to a ceramic board via an active metal brazing material has been used. Have been.
【0003】かかるセラミック回路基板は、一般に酸化
アルミニウム質焼結体から成るセラミック基板の場合に
は、具体的には以下の方法によって製作される。Such a ceramic circuit board is generally manufactured by the following method in the case of a ceramic board generally made of an aluminum oxide sintered body.
【0004】まず、銀−銅合金にチタン、ジルコニウ
ム、ハフニウムおよびこれらの水素化物の少なくとも1
種を添加した活性金属粉末に有機溶剤、溶媒を添加混合
してロウ材ペーストを作製する。First, at least one of titanium, zirconium, hafnium and hydrides thereof is added to a silver-copper alloy.
An organic solvent and a solvent are added and mixed with the seeded active metal powder to prepare a brazing material paste.
【0005】次に、酸化アルミニウム、酸化珪素、酸化
マグネシウム、酸化カルシウム等の原料粉末に適当な有
機バインダー、可塑剤、溶剤等を添加混合して泥漿状と
成すとともにこれを従来周知のドクターブレード法やカ
レンダーロール法等のテープ成形技術を採用して複数の
セラミックグリーンシートを得た後、所定寸法に形成
し、次にセラミックグリーンシートを必要に応じて上下
に積層するとともに還元雰囲気中、約1600℃の温度
で焼成し、セラミックグリーンシートを焼結一体化させ
て酸化アルミニウム質焼結体から成るセラミック基板を
形成する。Next, a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide and calcium oxide is mixed with a suitable organic binder, a plasticizer, a solvent and the like to form a slurry, which is mixed with a conventionally known doctor blade method. After obtaining a plurality of ceramic green sheets by adopting a tape forming technique such as calendering or calender roll method, the ceramic green sheets are formed into a predetermined size, and then the ceramic green sheets are stacked up and down as needed, and about 1600 in a reducing atmosphere. The ceramic green sheet is fired at a temperature of ° C., and the ceramic green sheets are sintered and integrated to form a ceramic substrate made of an aluminum oxide sintered body.
【0006】次に、セラミック基板上にロウ材ペースト
を間にはさんで銅等から成る金属回路板を載置させる。Next, a metal circuit board made of copper or the like is placed on the ceramic substrate with a brazing material paste interposed therebetween.
【0007】そして、最後にセラミック基板と金属回路
板との間に配されているロウ材ペーストを非酸化性雰囲
気中、約900℃の温度に加熱してロウ材を溶融させ、
このロウ材でセラミック基板と金属回路板とを接合する
ことによって製作される。Finally, the brazing material paste disposed between the ceramic substrate and the metal circuit board is heated to a temperature of about 900 ° C. in a non-oxidizing atmosphere to melt the brazing material.
It is manufactured by joining a ceramic substrate and a metal circuit board with this brazing material.
【0008】このように製作されたセラミック回路基板
は、ICやLSI等の半導体素子等の電子部品を半田な
どの接着剤を介して接合した後、アルミニウム等の放熱
部材に半田で接合実装されることにより、半導体素子の
動作時の発熱を良好に放熱させる半導体素子モジュール
(以下、半導体モジュールという)となる。[0008] The ceramic circuit board manufactured in this manner is bonded to an electronic component such as a semiconductor element such as an IC or an LSI via an adhesive such as solder and then mounted on a heat dissipation member such as aluminum by soldering. Thus, a semiconductor element module (hereinafter, referred to as a semiconductor module) that satisfactorily radiates heat generated during operation of the semiconductor element is obtained.
【0009】しかしながら、セラミック回路基板(熱膨
張係数が約3〜10ppm/℃)と放熱部材(熱膨張係
数が約18〜23ppm/℃)の熱膨張係数が大きく相
違することから、セラミック回路基板と放熱部材間の半
田にクラックが発生し、剥離が生じて信頼性が著しく劣
化する場合がある。However, the ceramic circuit board (having a coefficient of thermal expansion of about 3 to 10 ppm / ° C.) and the heat dissipating member (having a coefficient of thermal expansion of about 18 to 23 ppm / ° C.) are significantly different from each other. Cracks may occur in the solder between the heat dissipating members, and peeling may occur, which may significantly deteriorate the reliability.
【0010】このため、半田に変えてグリース状の伝熱
性組成物を介してセラミック回路基板と放熱部材とを接
合実装する構成が採用されている。For this reason, a configuration is adopted in which a ceramic circuit board and a heat radiating member are joined and mounted via a grease-like heat conductive composition instead of solder.
【0011】[0011]
【発明が解決しようとする課題】しかしながら、上記の
ような従来の半導体モジュールは、セラミック回路基板
上面の金属回路板の接合されていない部分で熱膨張係数
のバランスが異なっているため、電子部品が発熱すると
その温度上昇によってセラミック基板がそり、変形す
る。例えば、セラミック基板が変形して、周縁部が上側
に変形すると伝熱性組成物の端部がコ字状に凹み、次に
セラミック基板の変形が戻ると伝熱性組成物の端部も元
に戻り、上記の凹み部分が閉じて気泡(空気)が侵入す
ることとなる。However, in the conventional semiconductor module as described above, since the balance of the thermal expansion coefficient is different in the portion of the upper surface of the ceramic circuit board where the metal circuit board is not joined, the electronic component is not used. When heat is generated, the ceramic substrate warps and deforms due to the temperature rise. For example, when the ceramic substrate is deformed and the peripheral portion is deformed upward, the end of the heat conductive composition is concaved in a U-shape, and then when the deformation of the ceramic substrate returns, the end of the heat conductive composition also returns to the original state. Then, the above-mentioned concave portion is closed, and bubbles (air) enter.
【0012】その結果、セラミック回路基板と放熱部材
間の伝熱性組成物に気泡(空気)が侵入してしまい、電
子部品からの放熱経路が遮断され電子部品に熱破壊や特
性に劣化を招来して電子部品を安定に信頼性よく作動さ
せることができないという問題点を有していた。As a result, air bubbles (air) penetrate into the heat conductive composition between the ceramic circuit board and the heat radiating member, and the heat radiating path from the electronic component is cut off, resulting in thermal destruction of the electronic component and deterioration of characteristics. Therefore, there has been a problem that the electronic component cannot be operated stably and reliably.
【0013】従って、本発明は上記問題点に鑑み完成さ
れたもので、その目的はセラミック回路基板の反りによ
る変形を抑制し、半導体素子などの電子部品を安定して
作動させることができるセラミック回路基板および半導
体モジュールを提供することにある。Accordingly, the present invention has been completed in view of the above problems, and an object of the present invention is to suppress the deformation of a ceramic circuit board due to warping and to stably operate an electronic component such as a semiconductor element. It is to provide a substrate and a semiconductor module.
【0014】[0014]
【課題を解決するための手段】本発明は、セラミック基
板の上面に金属回路板を、下面に前記金属回路板と対応
するダミー金属回路板を取着して成り、該ダミー金属回
路板が伝熱性組成物を介して放熱部材に実装されるセラ
ミック回路基板であって、前記金属回路板の外周位置を
X、前記ダミー金属回路板の外周位置をY、前記セラミ
ック基板の厚みをZとしたとき、0<|X−Y|≦Z/
2であることを特徴とするものである。According to the present invention, a metal circuit board is mounted on an upper surface of a ceramic substrate, and a dummy metal circuit plate corresponding to the metal circuit plate is mounted on a lower surface. A ceramic circuit board mounted on a heat radiating member via a thermal composition, wherein the outer peripheral position of the metal circuit board is X, the outer peripheral position of the dummy metal circuit board is Y, and the thickness of the ceramic substrate is Z. , 0 <| X−Y | ≦ Z /
2.
【0015】本発明のセラミック回路基板によれば、上
面に金属回路板が取着されているセラミック基板の下面
に、金属回路板と対応するダミー金属回路板を取着した
ことから、セラミック基板と金属回路板との間およびセ
ラミック基板とダミー金属回路板との間に、熱膨張係数
の相違に起因する応力が生じず、半導体素子などの電子
部品動作時の発熱によるセラミック回路基板のそり等の
変形が発生せず、セラミック回路基板と放熱部材間の伝
熱性組成物に気泡の侵入がなくなり、放熱性が劣化せ
ず、信頼性の高い半導体モジュールを得ることが可能に
なる。According to the ceramic circuit board of the present invention, a dummy metal circuit board corresponding to the metal circuit board is attached to the lower surface of the ceramic board having the metal circuit board attached to the upper surface. There is no stress between the metal circuit board and the ceramic substrate and the dummy metal circuit board due to the difference in the coefficient of thermal expansion, and warpage of the ceramic circuit board due to heat generated during operation of electronic components such as semiconductor elements. Deformation does not occur, air bubbles do not enter the heat conductive composition between the ceramic circuit board and the heat radiating member, and the heat radiation does not deteriorate, so that a highly reliable semiconductor module can be obtained.
【0016】また本発明のセラミック回路基板によれ
ば、ダミー金属回路板の外周位置を金属回路板の外周位
置とを異ならせたことから、セラミック基板と金属回路
板との間に発生する応力によって生じるセラミック基板
のクラック発生位置と、セラミック基板とダミー金属回
路板との間に発生する応力によって生じるセラミック基
板のクラック発生位置が異なり、その結果、セラミック
基板の割れ等が有効に防止され、セラミック回路基板と
しての機械的強度の信頼性を高いものとなすことができ
る。According to the ceramic circuit board of the present invention, the outer peripheral position of the dummy metal circuit board is made different from the outer peripheral position of the metal circuit board. The position where the crack occurs on the ceramic substrate and the position where the crack occurs on the ceramic substrate due to the stress generated between the ceramic substrate and the dummy metal circuit board are different. As a result, cracking of the ceramic substrate is effectively prevented, and the ceramic circuit is effectively prevented. The reliability of mechanical strength as a substrate can be made high.
【0017】さらに、本発明の半導体モジュールによれ
ば、上記本発明のセラミック回路基板の前記金属回路板
に半導体素子を搭載するとともに、前記ダミー金属回路
板を前記伝熱性組成物を介して前記放熱部材に実装して
なる。Further, according to the semiconductor module of the present invention, a semiconductor element is mounted on the metal circuit board of the ceramic circuit board of the present invention, and the heat dissipation of the dummy metal circuit board is performed through the heat conductive composition. It is mounted on a member.
【0018】このような構成により、上記のように放熱
性が良好であり、また機械的強度の点でも信頼性の高い
ものとなり、半導体素子を長期にわたり安定して作動さ
せ得るものとなる。With such a configuration, the heat dissipation is good as described above, the reliability is high in terms of mechanical strength, and the semiconductor element can be stably operated for a long period of time.
【0019】[0019]
【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。Next, the present invention will be described in detail with reference to the accompanying drawings.
【0020】図1は、本発明のセラミック回路基板の一
実施形態を示し、1はセラミック基板、2は金属回路
板、3はダミー金属回路板、4は伝熱性組成物、5は放
熱部材、6は半導体素子である。FIG. 1 shows an embodiment of the ceramic circuit board of the present invention, wherein 1 is a ceramic board, 2 is a metal circuit board, 3 is a dummy metal circuit board, 4 is a heat conductive composition, 5 is a heat radiating member, 6 is a semiconductor element.
【0021】セラミック基板1は四角形状をなし、その
上下両面に金属回路板2およびダミー金属回路板3がそ
れぞれロウ付けされている。The ceramic substrate 1 has a square shape, and a metal circuit board 2 and a dummy metal circuit board 3 are brazed on both upper and lower surfaces thereof.
【0022】セラミック基板1は金属回路板2、ダミー
金属回路板3を支持する支持部材として作用し、酸化ア
ルミニウム(Al2O3)質焼結体、ムライト(3Al2
O3・2SiO2)質焼結体、炭化珪素(SiC)質焼結
体、窒化アルミニウム(AlN)質焼結体、窒化珪素
(Si3N4)質焼結体等の電気絶縁材料で形成されてい
る。The ceramic substrate 1 acts as a support member for supporting the metal circuit board 2 and the dummy metal circuit board 3, and is made of an aluminum oxide (Al 2 O 3 ) sintered body, mullite (3Al 2
O 3 · 2SiO 2 ) sintered body, silicon carbide (SiC) based sintered body, aluminum nitride (AlN) based sintered body, silicon nitride (Si 3 N 4 ) based sintered body, etc. Have been.
【0023】セラミック基板1は、たとえば、酸化アル
ミニウム質焼結体で形成されている場合、酸化アルミニ
ウム、酸化珪素、酸化マグネシウム、酸化カルシウム等
の原料粉末に適当な有機バインダー、可塑剤、溶剤を添
加混合して泥漿状となすとともに、その泥漿物を従来周
知のドクターブレード法やカレンダーロール法を採用す
ることによってセラミックグリーンシート(セラミック
生シート)を形成し、しかる後、このセラミックグリー
ンシートに適当な打ち抜き加工を施すとともにこれを複
数枚積層し、約1600℃の高温で焼成することによっ
て製作される。When the ceramic substrate 1 is formed of, for example, an aluminum oxide sintered body, an appropriate organic binder, a plasticizer, and a solvent are added to a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. The slurry is mixed to form a slurry, and the slurry is formed into a ceramic green sheet (green ceramic sheet) by employing a conventionally known doctor blade method or calender roll method. It is manufactured by performing a punching process, laminating a plurality of these, and firing at a high temperature of about 1600 ° C.
【0024】セラミック基板1はその上下面に金属回路
板2やダミー金属回路板3がロウ材を介して取着されて
いる。The ceramic substrate 1 has a metal circuit board 2 and a dummy metal circuit board 3 attached to the upper and lower surfaces thereof through brazing material.
【0025】また、セラミック基板1はその厚みを0.
2〜1.0mmとすることが好ましい。0.2mm未満
では、セラミック基板1と金属回路板2やダミー金属回
路板3を接合した時に発生する応力により、セラミック
基板1に割れ等が発生しやすくなる。1.0mmを超え
ると、半導体素子6から発生する熱を良好に放熱部材5
に伝達することが困難となる。The ceramic substrate 1 has a thickness of 0.1 mm.
It is preferable to set it to 2 to 1.0 mm. If the thickness is less than 0.2 mm, cracks or the like are likely to occur in the ceramic substrate 1 due to stress generated when the ceramic substrate 1 is bonded to the metal circuit board 2 or the dummy metal circuit board 3. If it exceeds 1.0 mm, the heat generated from the semiconductor element 6 can be satisfactorily dissipated to the heat radiating member 5.
It is difficult to communicate to.
【0026】金属回路板2およびダミー金属回路板3は
銅やアルミニウム等の金属材料から成り、また、セラミ
ック基板1の上下面に金属回路板2およびダミー金属回
路板3は以下のようにして接合される。The metal circuit board 2 and the dummy metal circuit board 3 are made of a metal material such as copper or aluminum. The metal circuit board 2 and the dummy metal circuit board 3 are joined to the upper and lower surfaces of the ceramic substrate 1 as follows. Is done.
【0027】例えば、銀−銅合金粉末等から成る銀ロウ
粉末や、アルミニウム−シリコン合金粉末等から成るア
ルミニウムロウ粉末に、チタン、ジルコニウム、ハフニ
ウム等の活性金属やその水素化物の少なくとも1種から
成る活性金属粉末を2〜5重量%添加した活性金属ロウ
材に、適当な有機溶剤、溶媒を添加混合して得た活性金
属ロウ材ペーストを、セラミック基板1上下面に従来周
知のスクリーン印刷技術を用いて金属回路板2、ダミー
金属回路板3に対応した所定パターンに印刷する。For example, silver braze powder composed of silver-copper alloy powder, aluminum braze powder composed of aluminum-silicon alloy powder, and the like, and at least one active metal such as titanium, zirconium, hafnium or a hydride thereof. An active metal brazing material paste obtained by adding and mixing an appropriate organic solvent and a solvent to an active metal brazing material to which 2 to 5% by weight of an active metal powder is added is applied to the upper and lower surfaces of the ceramic substrate 1 by a conventionally known screen printing technique. Printing is performed in a predetermined pattern corresponding to the metal circuit board 2 and the dummy metal circuit board 3 by using the same.
【0028】その後、金属回路板2、ダミー金属回路板
3をパターン上に載置し、これを真空中、中性雰囲気
中、または還元雰囲気中で、所定温度(銀ロウ材の場合
は約900℃、アルミニウムロウ材の場合は約600
℃)で加熱処理し、活性金属ロウ材を溶融させてセラミ
ック基板1の上下面と金属回路板2、ダミー金属回路板
3とを接合させる。これにより、セラミック基板1の上
下面と金属回路板2とダミー金属回路板3が取着される
こととなる。Thereafter, the metal circuit board 2 and the dummy metal circuit board 3 are placed on the pattern, and are placed in a vacuum, a neutral atmosphere, or a reducing atmosphere at a predetermined temperature (about 900 in the case of silver brazing material). ℃, about 600 in case of aluminum brazing material
C.), the active metal brazing material is melted, and the upper and lower surfaces of the ceramic substrate 1 are joined to the metal circuit board 2 and the dummy metal circuit board 3. As a result, the upper and lower surfaces of the ceramic substrate 1, the metal circuit board 2, and the dummy metal circuit board 3 are attached.
【0029】銅やアルミニウム等から成る金属回路板2
やダミー金属回路板3は、銅やアルミニウム等のインゴ
ット(塊)に圧延加工法や打ち抜き加工法等の従来周知
の金属加工法を施すことによって、例えば、厚さが0.
5mmで、パターン形状に対応する所定パターン形状に
製作される。金属回路板2やダミー金属回路板3の厚さ
は、0.1〜1.0mmが好ましい。0.1mm未満で
は、電気抵抗が大きくなるため半導体素子からの高電流
信号を伝播しにくくなる。1.0mm以上では、セラミ
ック基板1と金属回路板2やダミー金属回路板3とを接
合した時に発生する応力により、セラミック基板1に割
れ等が発生しやすくなる。Metal circuit board 2 made of copper, aluminum, etc.
The dummy metal circuit board 3 has a thickness of, for example, 0.1 mm by subjecting an ingot such as copper or aluminum to a conventionally known metal processing method such as a rolling method or a punching method.
It is manufactured in a predetermined pattern shape corresponding to the pattern shape at 5 mm. The thickness of the metal circuit board 2 or the dummy metal circuit board 3 is preferably 0.1 to 1.0 mm. If the thickness is less than 0.1 mm, the electric resistance increases, so that it becomes difficult to transmit a high current signal from the semiconductor element. When the thickness is 1.0 mm or more, cracks or the like are likely to occur in the ceramic substrate 1 due to stress generated when the ceramic substrate 1 is bonded to the metal circuit board 2 or the dummy metal circuit board 3.
【0030】金属回路板2とダミー金属回路板3の厚み
と材質は、活性金属ロウ付け時や半導体素子6搭載のた
めの半田リフロー時の加熱による反りを抑制するため同
じ厚み、同じ材質にすることが好ましい。The thickness and the material of the metal circuit board 2 and the dummy metal circuit board 3 are the same thickness and the same material in order to suppress warpage due to heating at the time of active metal brazing or solder reflow for mounting the semiconductor element 6. Is preferred.
【0031】金属回路板2の所定位置には、半導体素子
6が半田接合されており、半導体素子6の電極部と金属
回路板2の電極部とはアルミニウム等のボンディングワ
イヤで電気的に接続されている。A semiconductor element 6 is soldered to a predetermined position of the metal circuit board 2, and an electrode of the semiconductor element 6 and an electrode of the metal circuit board 2 are electrically connected by a bonding wire such as aluminum. ing.
【0032】放熱部材5は銅やアルミニウム等の高熱伝
導性材料、具体的には熱伝導率100W/m・K(W・
m-1・K-1)以上の材料から成るものが好ましく、伝熱
性組成物4を介してダミー金属回路板3と接合実装され
る。The heat dissipating member 5 is made of a high heat conductive material such as copper or aluminum, and more specifically, has a heat conductivity of 100 W / m · K (W ·
m −1 · K −1 ) or more, and is preferably bonded and mounted to the dummy metal circuit board 3 via the heat conductive composition 4.
【0033】銅やアルミニウム等から成る放熱部材5
は、銅やアルミニウム等のインゴット(塊)に圧延加工
法や打ち抜き加工法等の従来周知の金属加工法を施すこ
とによって、例えば、厚さが3mm程度の四角形状に製
作される。Heat dissipating member 5 made of copper, aluminum, etc.
Is manufactured in a rectangular shape having a thickness of, for example, about 3 mm by subjecting an ingot such as copper or aluminum to a conventionally known metal working method such as a rolling method or a punching method.
【0034】伝熱性組成物4はグリース状のものであ
り、例えば、シリコーンオイルにアルミニウム、銅、亜
鉛、窒化アルミニウム等の伝熱性材料の粉体等を適量添
加混合することによって作製され、従来周知のスクリー
ン印刷法やディスペンス塗布法等により、放熱部材5上
面に所定パターン、所定厚みに被着される。その厚み
は、50〜300μmが好ましい。50μm未満では、
伝熱性組成物4が均一に分布し難くなる。300μm以
上では、伝熱性組成物4の厚みが厚くなりすぎるため
に、伝熱性が低下する。The heat conductive composition 4 is in the form of a grease. For example, the heat conductive composition 4 is prepared by adding an appropriate amount of a powder of a heat conductive material such as aluminum, copper, zinc, aluminum nitride or the like to silicone oil and mixing. Is applied in a predetermined pattern and a predetermined thickness on the upper surface of the heat radiating member 5 by a screen printing method, a dispensing method or the like. The thickness is preferably from 50 to 300 μm. If it is less than 50 μm,
It becomes difficult to distribute the heat conductive composition 4 uniformly. When the thickness is 300 μm or more, the heat transfer composition 4 is too thick, so that the heat transfer property is reduced.
【0035】ダミー金属回路板3はその形状がほぼ金属
回路板2の形状に対応しており、上面に金属回路板2が
取着されているセラミック基板1の下面に金属回路板2
と対応するダミー金属回路板3を上下で対称的な位置
(対応する位置)に取着したことから、金属回路板2に
搭載された半導体素子6が動作発熱しても、セラミック
基板1と金属回路板3とダミー金属回路板3との間の熱
膨張係数の相違に起因する反りの発生が抑制され、伝熱
組成物4に気泡(空気)の侵入がなく良好に放熱部品5
に伝熱し、信頼性の高い半導体モジュールを得ることが
できる。The shape of the dummy metal circuit board 3 substantially corresponds to the shape of the metal circuit board 2, and the metal circuit board 2 is mounted on the lower surface of the ceramic substrate 1 on which the metal circuit board 2 is mounted.
Since the dummy metal circuit board 3 corresponding to the metal circuit board 2 is attached to a vertically symmetrical position (corresponding position), even if the semiconductor element 6 mounted on the metal circuit board 2 operates and generates heat, the ceramic substrate 1 and the metal The occurrence of warpage due to the difference in the coefficient of thermal expansion between the circuit board 3 and the dummy metal circuit board 3 is suppressed, and the heat transfer composition 4 is free of air bubbles (air) and satisfactorily radiated.
And a highly reliable semiconductor module can be obtained.
【0036】また、ダミー金属回路板3はその外周位置
が金属回路板2の外周位置よりも、セラミック基板1の
厚みZの1/2より外側または内側であった場合、半導
体素子6が動作発熱し、セラミック基板1と金属回路板
2とダミー金属回路板3の熱膨張係数の相違による反り
の発生を抑制することができなってしまう。また、ダミ
ー金属回路板3と金属回路板2とが同一位置(|X−Y
|=0)になるようにこれらを加工して設置することは
作製上困難である。従って、ダミー金属回路板3と金属
回路板2の外周位置は50μm以上の差を確保すること
が好ましい。従って、セラミック基板1の厚みZ、金属
回路板2の外周位置X,ダミー金属回路板3の外周位置
Yとしたとき、0<|X−Y|≦Z/2の範囲に特定さ
れる。When the outer peripheral position of the dummy metal circuit board 3 is located outside or inside the half of the thickness Z of the ceramic substrate 1 with respect to the outer peripheral position of the metal circuit board 2, the semiconductor element 6 operates to generate heat. However, the occurrence of warpage due to the difference in thermal expansion coefficient between the ceramic substrate 1, the metal circuit board 2, and the dummy metal circuit board 3 cannot be suppressed. In addition, the dummy metal circuit board 3 and the metal circuit board 2 are located at the same position (| X-Y
It is difficult to fabricate and install them so that | = 0). Therefore, it is preferable to secure a difference of 50 μm or more between the outer peripheral positions of the dummy metal circuit board 3 and the metal circuit board 2. Therefore, assuming that the thickness Z of the ceramic substrate 1, the outer peripheral position X of the metal circuit board 2, and the outer peripheral position Y of the dummy metal circuit board 3, the range is 0 <| XY− ≦ Z / 2.
【0037】なお、X,Yは水平方向における相対的な
位置とする、例えばX,Yのいずれかを基準位置として
他方をその基準位置に対する水平方向での位置(距離)
とするか、または、別個の基準位置(図示せず)からの
水平方向におけるそれぞれの位置(距離)としてもよ
い。X and Y are relative positions in the horizontal direction. For example, one of X and Y is a reference position and the other is a position (distance) in the horizontal direction with respect to the reference position.
Or each position (distance) in the horizontal direction from a separate reference position (not shown).
【0038】また、金属回路板2およびダミー金属回路
板3は銅から成る場合、金属回路板2およびダミー金属
回路板3を無酸素銅で形成しておくと、無酸素銅はロウ
付けの際に活性金属ロウ材が銅中に存在する酸素により
酸化されることなく濡れ性が良好となり、セラミック基
板1への接合が強固となる。従って、金属回路板2およ
びダミー金属回路板3はこれを無酸素銅で形成しておく
ことが好ましい。When the metal circuit board 2 and the dummy metal circuit board 3 are made of copper, if the metal circuit board 2 and the dummy metal circuit board 3 are formed of oxygen-free copper, the oxygen-free copper is In addition, the wettability of the active metal brazing material is improved without being oxidized by oxygen present in the copper, and the bonding to the ceramic substrate 1 is strengthened. Therefore, it is preferable that the metal circuit board 2 and the dummy metal circuit board 3 are formed of oxygen-free copper.
【0039】なお、本発明は上述の実施形態に限定され
るものではなく、本発明の趣旨を逸脱しない範囲であれ
ば種々の変更は可能である。例えば、上述の実施形態で
はセラミック基板1に活性金属ロウ材を介して直接金属
回路板2およびダミー金属回路板3をロウ付けしてセラ
ミック回路基板となしたが、これをセラミック基板1の
表面に予めタングステン又はモリブデン等のメタライズ
金属層を被着させておき、メタライズ金属層に金属回路
板2およびダミー金属回路板3をロウ材を介して取着さ
せてセラミック回路基板を形成してもよい。The present invention is not limited to the above-described embodiment, and various changes can be made without departing from the gist of the present invention. For example, in the above-described embodiment, the metal circuit board 2 and the dummy metal circuit board 3 are brazed directly to the ceramic substrate 1 via the active metal brazing material to form a ceramic circuit board. A ceramic circuit board may be formed by previously attaching a metallized metal layer such as tungsten or molybdenum, and attaching the metal circuit board 2 and the dummy metal circuit board 3 to the metallized metal layer via a brazing material.
【0040】[0040]
【発明の効果】本発明のセラミック回路基板によれば、
金属回路板の外周位置をX、ダミー金属回路板の外周位
置をY、セラミック基板の厚みをZとしたとき、0<|
X−Y|≦Z/2としたことから、セラミック基板と金
属回路板とダミー金属回路板との間の熱膨張係数の相違
による反り変形が発生することなく、放熱部材との間の
伝熱組成物に気泡(空気)の侵入がなくなり、その結
果、半導体素子から発生する熱を良好に放熱部材に伝達
し、放熱性劣化がなく半導体素子などの電子部品を安定
に作動させることができる。According to the ceramic circuit board of the present invention,
When the outer peripheral position of the metal circuit board is X, the outer peripheral position of the dummy metal circuit board is Y, and the thickness of the ceramic substrate is Z, 0 <|
Since X−Y | ≦ Z / 2, heat transfer between the ceramic substrate, the metal circuit board, and the dummy metal circuit board due to a difference in thermal expansion coefficient between the heat dissipation member and the heat dissipation member does not occur. Air bubbles (air) do not enter the composition, and as a result, heat generated from the semiconductor element can be transmitted to the heat radiating member satisfactorily, and the electronic component such as the semiconductor element can be operated stably without heat radiation deterioration.
【0041】また、本発明の半導体モジュールによれ
ば、このセラミック回路基板の金属回路板に半導体素子
を搭載するとともに、ダミー金属回路板に伝熱性組成物
を介して放熱部材に実装したことにより、上記のように
放熱性の劣化がなく半導体素子などの電子部品を長期に
わたり安定に作動させることができる。According to the semiconductor module of the present invention, the semiconductor element is mounted on the metal circuit board of the ceramic circuit board, and is mounted on the heat dissipating member via the heat conductive composition on the dummy metal circuit board. As described above, the electronic components such as the semiconductor elements can be operated stably for a long time without deterioration of the heat radiation.
【図1】本発明のセラミック回路基板を用いた半導体モ
ジュールの一実施形態を示す断面図である。FIG. 1 is a cross-sectional view showing one embodiment of a semiconductor module using a ceramic circuit board of the present invention.
1:セラミック基板 2:金属回路板 3:ダミー金属回路板 4:伝熱性組成物 5:放熱部材 6:半導体素子 1: Ceramic substrate 2: Metal circuit board 3: Dummy metal circuit board 4: Heat conductive composition 5: Heat dissipation member 6: Semiconductor element
Claims (2)
面に前記金属回路板と対応するダミー金属回路板を取着
して成り、該ダミー金属回路板が伝熱性組成物を介して
放熱部材に実装されるセラミック回路基板であって、前
記金属回路板の外周位置をX、前記ダミー金属回路板の
外周位置をY、前記セラミック基板の厚みをZとしたと
き、0<|X−Y|≦Z/2であることを特徴とするセ
ラミック回路基板。A metal circuit board is mounted on an upper surface of a ceramic substrate, and a dummy metal circuit board corresponding to the metal circuit board is mounted on a lower surface, and the dummy metal circuit board is provided with a heat dissipating member via a heat conductive composition. Wherein the outer peripheral position of the metal circuit board is X, the outer peripheral position of the dummy metal circuit board is Y, and the thickness of the ceramic substrate is Z, 0 <| X−Y | ≦ Z / 2. A ceramic circuit board.
金属回路板に半導体素子を搭載するとともに、前記ダミ
ー金属回路板を前記伝熱性組成物を介して前記放熱部材
に実装して成る半導体素子モジュール。2. A semiconductor element comprising: a semiconductor element mounted on the metal circuit board of the ceramic circuit board according to claim 1; and a dummy metal circuit board mounted on the heat radiating member via the heat conductive composition. module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000181984A JP2002009403A (en) | 2000-06-16 | 2000-06-16 | Ceramic circuit board and semiconductor element module |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000181984A JP2002009403A (en) | 2000-06-16 | 2000-06-16 | Ceramic circuit board and semiconductor element module |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002009403A true JP2002009403A (en) | 2002-01-11 |
Family
ID=18682833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000181984A Pending JP2002009403A (en) | 2000-06-16 | 2000-06-16 | Ceramic circuit board and semiconductor element module |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002009403A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008058099A (en) * | 2006-08-30 | 2008-03-13 | New Industry Research Organization | Sensor device |
| JP2008187107A (en) * | 2007-01-31 | 2008-08-14 | Shin Kobe Electric Mach Co Ltd | Wiring board |
-
2000
- 2000-06-16 JP JP2000181984A patent/JP2002009403A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008058099A (en) * | 2006-08-30 | 2008-03-13 | New Industry Research Organization | Sensor device |
| JP2008187107A (en) * | 2007-01-31 | 2008-08-14 | Shin Kobe Electric Mach Co Ltd | Wiring board |
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