JP2002009142A - Substrate storing container - Google Patents
Substrate storing containerInfo
- Publication number
- JP2002009142A JP2002009142A JP2000184605A JP2000184605A JP2002009142A JP 2002009142 A JP2002009142 A JP 2002009142A JP 2000184605 A JP2000184605 A JP 2000184605A JP 2000184605 A JP2000184605 A JP 2000184605A JP 2002009142 A JP2002009142 A JP 2002009142A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- lid
- storage container
- retainer
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 214
- 238000003860 storage Methods 0.000 claims description 55
- 238000007667 floating Methods 0.000 claims description 4
- 238000005299 abrasion Methods 0.000 abstract description 5
- 238000012545 processing Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 229920002725 thermoplastic elastomer Polymers 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920002943 EPDM rubber Polymers 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000002482 conductive additive Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920006346 thermoplastic polyester elastomer Polymers 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】この発明は、内部に半導体ウ
エーハ(以下ウエーハと略称する)やマスクガラス、液
晶セルあるいは、記録媒体などの基板を収納し、基板の
輸送と、基板を加工・処理する加工装置に対する位置決
めや加工装置間の搬送及び又は貯蔵に使用される基板収
納容器に関し、より詳しくは、基板収納容器のリテーナ
による基板の保持構造に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention accommodates a substrate such as a semiconductor wafer (hereinafter abbreviated as "wafer"), a mask glass, a liquid crystal cell, or a recording medium, transports the substrate, and processes and processes the substrate. The present invention relates to a substrate storage container used for positioning with respect to a processing device and transporting and / or storing between processing devices, and more particularly to a structure for holding a substrate by a retainer of the substrate storage container.
【0002】[0002]
【従来の技術】半導体の製造に関わるウェーハやマスク
ガラス等の基板は、半導体デバイスの厳しい価格競争に
伴い、基板の歩留向上によるコストダウンを目的とし
て、基板の口径の大型化(例えば300mmないし40
0mm以上)が急ピッチで進められてきている。同時
に、半導体回路は、益々微細化が進められていて、DR
AMのデザインルール(加工最小線幅)も0.25μm
から0.18μmへと移行しつつあり、基板の加工が行
われる工場はもとより、基板の運搬時に使用される容器
に関しても益々高度にクリーンである状態が要求されて
きている。基板の加工装置は、外界とは隔離された局所
環境(ミニエンバイロメント)の中に設けられ、該局所
環境は、基板に電子回路配線を作成するための各種処理
を高収率で行うために高度にクリーン化する必要がある
(米国連邦規格(Federal standard
209E)のクリーン度が1以下、必要に応じて0.0
1レベル)。しかしながら、半導体生産工場全体をこう
した高度なクリーン環境に保つには、技術的な困難さと
共に、莫大な投資が必要であると予測されていた。2. Description of the Related Art Substrates such as wafers and mask glass involved in the manufacture of semiconductors have been increased in diameter (for example, 300 mm or less) for the purpose of cost reduction by improving the yield of the substrates due to severe price competition for semiconductor devices. 40
0 mm or more) at a rapid pace. At the same time, semiconductor circuits are being miniaturized more and more,
AM design rule (minimum processing line width) is 0.25μm
From 0.18 μm to a factory where processing of substrates is performed, as well as containers used for transporting the substrates, are required to be more and more clean. The substrate processing apparatus is provided in a local environment (mini-environment) that is isolated from the outside world. The local environment is used to perform various processes for producing electronic circuit wiring on the substrate with high yield. It needs to be highly clean (Federal standard)
209E) has a cleanness of 1 or less, and 0.0 if necessary.
1 level). However, maintaining the entire semiconductor production plant in such a highly clean environment, along with technical difficulties, was predicted to require enormous investment.
【0003】そこで、基板の加工に必要な局所だけを高
度にクリーンな環境とし、基板をこうしてできた幾つか
のクリーンな環境間を、密閉された基板収納容器に基板
を収納して搬送する方法が提案されている。さらに、収
納された基板を汚染させることなく自動搬送可能で、し
かも、加工装置に直接アクセス可能な基板収納容器の開
発が進められている。こうした局所環境を複数形成して
それらの中で、基板に微細加工を行い、歩留まり向上さ
せようと言う考えが近年主流になりつつある。[0003] Therefore, a method is adopted in which only a local area required for processing a substrate is set to a highly clean environment, and the substrate is conveyed between several clean environments thus formed by storing the substrate in a sealed substrate container. Has been proposed. Further, development of a substrate storage container that can be automatically transported without contaminating the stored substrate and that can directly access the processing apparatus has been promoted. In recent years, the idea of forming a plurality of such local environments and performing fine processing on the substrate to improve the yield among them has been becoming mainstream in recent years.
【0004】基板の搬送や保管、あるいは加工装置への
位置決めに使われる基板収納容器60は、例をあげる
と、図10の分解斜視図に示すように、複数枚の基板を
整列収納する容器本体61と、該容器本体61の開口部
62をシール可能に閉鎖する蓋体63とからなる。容器
本体61の相対する内壁には、基板を水平に支持するた
めの一対の基板支持部64が相対して組み付けられてお
り、容器本体61の底部には加工装置へ載置し位置決め
するための逆V字状の突起65a(以下Vグループと称
す)と基板収納容器を加工装置に固定するための貫通穴
65b(以下リテイニングフューチャーと称す)を有す
るボトムプレート65が取り付けられている。For example, as shown in an exploded perspective view of FIG. 10, a substrate storage container 60 used for transporting and storing substrates, or positioning the substrates in a processing apparatus, is a container body for aligning and storing a plurality of substrates. 61, and a lid 63 for sealingly closing the opening 62 of the container body 61. A pair of substrate support portions 64 for horizontally supporting the substrate are assembled on the opposing inner walls of the container body 61 to face each other, and the bottom of the container body 61 is used for mounting and positioning on a processing apparatus. A bottom plate 65 having an inverted V-shaped projection 65a (hereinafter, referred to as a V group) and a through hole 65b (hereinafter, referred to as a retaining feature) for fixing a substrate storage container to a processing apparatus is attached.
【0005】また、容器本体61と蓋体63との間に
は、シール用ガスケット66が挟持され、基板収納容器
60を密封状態に保つことに使われている。また、蓋体
63には、外部から操作可能な係止爪67が内包された
ラッチ機構68によって容器本体61の開口部62をシ
ール可能に閉鎖している。蓋体63の内面には、基板の
端面に当接するリテーナ75(図11の縦断面図参照)
が取り付けられており、該リテーナ75は、蓋体63内
面に取り付け可能な係止部を有する枠状のベース部材
と、基板のそれぞれと当接するようにベース部材の向き
合う側壁から延びる1又は複数列の弾性片76とを有す
るとともに、前記弾性片の先端には相対する基板に向か
って徐々に広がる傾斜面と、基板と当接する当接溝77
が形成されている。A sealing gasket 66 is interposed between the container body 61 and the lid 63, and is used to keep the substrate storage container 60 in a sealed state. Further, the opening 63 of the container body 61 is sealably closed on the lid 63 by a latch mechanism 68 in which a locking claw 67 operable from the outside is included. On the inner surface of the lid 63, a retainer 75 abutting on the end surface of the substrate (see a longitudinal sectional view of FIG. 11)
The retainer 75 includes a frame-shaped base member having a locking portion attachable to the inner surface of the lid 63, and one or more rows extending from a side wall of the base member facing each of the substrates so as to come into contact with each of the substrates. The elastic piece 76 has an inclined surface gradually expanding toward the opposing substrate, and a contact groove 77 for abutting the substrate at the tip of the elastic piece.
Are formed.
【0006】そして、局所環境内にある加工装置には、
外界から搬送されてくる上記のような基板収納容器60
を接続し、基板収納容器60から、内部に収納した基板
を加工装置内部にロードしたり、加工装置から基板収納
容器にアンロードしたりするための、アクセス部が設け
られている。該アクセス部には、基板収納容器を搭載
し、位置決めと加工装置への接続操作を行うロードポー
トと、基板収納容器60の蓋体63と対向する位置に配
置されて蓋体の開閉を行う蓋体開閉装置とが備えられて
いる。[0006] The processing equipment in the local environment includes:
The substrate storage container 60 as described above, which is conveyed from the outside world
And an access unit for loading a substrate stored therein from the substrate storage container 60 into the processing apparatus or unloading the substrate from the processing apparatus to the substrate storage container. The access unit is provided with a substrate storage container, a load port for positioning and connecting to a processing device, and a lid disposed at a position facing the lid 63 of the substrate storage container 60 to open and close the lid. A body opening / closing device is provided.
【0007】前記ロードポートの表面には、先端が球面
状をした複数本の位置決めピンと基板収納容器のボトム
プレート中央部の貫通孔に挿入されてリテイニングフュ
ーチャーを固定する固定部材が設けられている。複数の
位置決めピンは、基板収納容器の底部に配設されたVグ
ループと当接して基板収納容器を自動求心させて所定の
位置に精度良く位置決めして、固定部材を使って基板収
納容器を加工装置に固定する。その後、前記基板収納容
器の搭載部分である位置決めユニットを前進させて基板
収納容器を並行移動させ、蓋体開閉装置のカバー部材に
蓋体をシール可能に当接させる。On the surface of the load port, there are provided a plurality of positioning pins each having a spherical tip, and a fixing member which is inserted into a through hole at the center of the bottom plate of the substrate storage container to fix the retaining feature. . The plurality of positioning pins are brought into contact with a V group arranged at the bottom of the substrate storage container to automatically center the substrate storage container, accurately position the substrate storage container at a predetermined position, and process the substrate storage container using a fixing member. Secure to the device. Thereafter, the positioning unit, which is the mounting portion of the substrate storage container, is moved forward to move the substrate storage container in parallel, and the cover is brought into contact with the cover member of the cover opening / closing device in a sealable manner.
【0008】蓋体開閉装置は、通常前記ロードポートの
基板搭載面と垂直な壁部である接続面を有し、前記接続
面は外部環境に有る基板収納容器から基板を加工装置内
に移し替えるための開口部を有している。通常この開口
部はカバー部材にてシールされていて、内部の環境が外
界に浮遊するパーティクルの侵入により汚染されること
を防いでいる。カバー部材は、基板収納容器の蓋体を位
置決めして保持し、蓋体の内部に収納されたラッチ機構
の解錠と施錠を行う、ラッチ機構の操作装置を有してい
る。The lid opening / closing device usually has a connection surface which is a wall perpendicular to the substrate mounting surface of the load port, and the connection surface transfers a substrate from a substrate storage container in an external environment into the processing apparatus. Has an opening. Usually, this opening is sealed with a cover member to prevent the inside environment from being contaminated by intrusion of particles floating in the outside world. The cover member has a latch mechanism operating device that positions and holds the lid of the substrate storage container and unlocks and locks the latch mechanism housed inside the lid.
【0009】上記ミニエンバイロメントの環境におい
て、基板を処理・加工する場合には、先ず、位置決めさ
れた基板収納容器がロードポートの開口部のシールゾー
ンに設けられたカバー部材に当接するまで前進させ、蓋
体外周をシール可能に覆う。そして、前記カバー部材の
内面には、一対のレジストレーションピンと呼ばれる位
置決めピンと、ラッチ機構の操作装置に接続された一対
の回転可能な操作キーが配置されているとともに、蓋体
を真空吸着する吸着部が適宜設けられている。一方、図
10示すように、蓋体63には、ラッチキーを挿嵌する
キー溝69と、位置決めピンを係合する一対の円形の位
置決め凹部(図示せず、通常蓋体の中心点を通る斜線上
に中心点を対称に配置されている。)が形成されてい
る。When processing and processing a substrate in the environment of the mini-environment, first, the positioned substrate storage container is advanced until it comes into contact with a cover member provided in a seal zone at the opening of the load port. The outer periphery of the lid is sealably covered. On the inner surface of the cover member, a pair of positioning pins called registration pins, and a pair of rotatable operation keys connected to an operation device of a latch mechanism are arranged, and a suction unit for vacuum-sucking the lid. Are provided as appropriate. On the other hand, as shown in FIG. 10, the lid 63 has a key groove 69 into which a latch key is inserted, and a pair of circular positioning recesses (not shown, which are generally inclined through a center point of the lid). The center point is arranged symmetrically on the line.).
【0010】こうして位置決めピンによる基板収納容器
60の正面の位置決めがなされた後、蓋体63のキー溝
69に挿嵌された操作キーが回転して容器本体61と蓋
体63のラッチ機構が解除されて容器本体61の開口部
内周に設けられた係止凹部70から係止爪67が外れ、
蓋体63が取り外し可能な状態となる。次に、蓋体63
がカバー部材に保持されたまま、一緒に後退並びに下降
して容器本体61と分離され、容器本体61の開口部6
2が加工装置の内部と連通する。この時、容器本体61
の開口部62の周縁部は蓋体開閉装置壁部のシール領域
によってシールされているので、外環境に浮遊する汚染
物が内部に入り込むことはない。このようにして、蓋体
63が取り外され容器本体61の開口部62が加工装置
と連通したら、基板は基板収納容器60の内部から加工
装置にローディングされて取り込まれ、その後、各種の
処理加工される。After the positioning of the front surface of the substrate storage container 60 by the positioning pins is performed, the operation key inserted into the key groove 69 of the lid 63 rotates to release the latch mechanism between the container main body 61 and the lid 63. As a result, the locking claw 67 is disengaged from the locking concave portion 70 provided on the inner periphery of the opening of the container body 61,
The lid 63 is in a removable state. Next, the lid 63
While being held by the cover member, are retracted and lowered together to be separated from the container main body 61, and the opening 6 of the container main body 61 is opened.
2 communicates with the inside of the processing device. At this time, the container body 61
The peripheral edge of the opening 62 is sealed by the sealing area of the lid opening / closing device wall, so that contaminants floating in the external environment do not enter inside. In this way, when the lid 63 is removed and the opening 62 of the container main body 61 communicates with the processing device, the substrate is loaded from the inside of the substrate storage container 60 into the processing device, taken in, and then subjected to various types of processing. You.
【0011】[0011]
【発明が解決しようとする課題】このように、基板の加
工処理をミニエンバイロメントの環境下で行えるように
しているのであるが、従来の基板収納容器の場合、容器
本体の基板支持部に基板を収納し、蓋体で開口部を閉鎖
するときに、蓋体内面に取り付けられるリテーナの弾性
片が、基板の周端と当接しこれを押し込むようにして、
基板の前後方向の位置合わせを行い、基板が支持部と面
接触した状態で、支持部終端のストッパー部又はリアサ
ポートとの間で基板を挟持するだけなので、基板収納容
器を搬送するときに、基板が搬送中の振動等により基板
支持部上で擦られることとなり、摩耗粉等のパーティク
ルの発生が懸念されていた。As described above, the processing of the substrate can be performed in the environment of the mini-environment. However, in the case of the conventional substrate storage container, the substrate is supported on the substrate support portion of the container body. When the opening is closed with the lid, the elastic piece of the retainer attached to the inner surface of the lid abuts against the peripheral end of the substrate and pushes it in.
When the substrate is aligned in the front-rear direction and the substrate is merely held between the stopper and the rear support at the end of the support in a state where the substrate is in surface contact with the support, when transporting the substrate storage container, The substrate is rubbed on the substrate support portion by vibrations during the transfer, and there is a concern that particles such as abrasion powder may be generated.
【0012】本発明は上記した問題に鑑みなされたもの
で、SEMI規格で標準化された基板収納容器であっ
て、容器本体に基板を収納し開口部を蓋体で閉鎖し搬送
されるときに基板と支持部との間に摩耗を生じることが
なく、基板を汚染させることのない基板収納容器を提供
することを課題とする。The present invention has been made in view of the above problems, and is a substrate storage container standardized according to the SEMI standard. The substrate storage container stores a substrate in a container body, closes an opening portion with a lid, and transfers the substrate. It is an object of the present invention to provide a substrate storage container which does not cause wear between a substrate and a support portion and does not contaminate the substrate.
【0013】[0013]
【課題を解決するための手段】上述課題を解決するため
に、本発明は次のような手段を採用した。請求項1の基
板収納容器は、開口部を有し、相対向する内壁に1又は
複数枚の基板を水平に支持する基板支持部が設けられた
容器本体と、前記開口部をシール可能に閉鎖し、その内
面に基板の端面に当接するリテーナが取り付けられた蓋
体とを有する基板収納容器であって、前記蓋体で容器本
体の開口部を閉鎖したときに、前記リテーナの基板端面
と当接するそれぞれの当接溝の高さ方向の中心位置が、
容器本体の基板支持部上に位置するそれぞれの基板の高
さ方向の中心位置より上方に位置するように構成し、基
板を収納した際に基板の一部を基板支持部から浮かせて
保持するようにしたことを特徴としている。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention employs the following means. The substrate storage container according to claim 1, wherein the container main body has an opening, and a substrate supporting portion for horizontally supporting one or a plurality of substrates is provided on opposing inner walls, and the opening is sealably closed. And a lid having a retainer attached to an inner surface thereof, the retainer being in contact with an end face of the substrate, wherein when the opening of the container body is closed by the lid, the retainer contacts the end face of the substrate. The center position in the height direction of each contact groove that contacts
It is configured to be located above the center position in the height direction of each substrate located on the substrate supporting portion of the container body, and when the substrate is stored, a part of the substrate is floated from the substrate supporting portion and held. It is characterized by having.
【0014】請求項2の基板収納容器は、請求項1の発
明において、リテーナは、蓋体内面に取り付け可能な係
止部を有する枠状のベース部材と、基板のそれぞれと当
接するようにベース部材の向き合う側壁から延びる1又
は複数列の弾性片とを有するとともに、前記弾性片の先
端には相対する基板に向かって徐々に広がる傾斜面と、
基板と当接する当接溝が形成されていることを特徴とし
ている。According to a second aspect of the present invention, in the first aspect of the present invention, the retainer includes a frame-shaped base member having a locking portion attachable to the inner surface of the lid and a base so as to contact each of the substrates. Having one or a plurality of rows of elastic pieces extending from the side wall facing the member, and an inclined surface gradually expanding toward the opposing substrate at the tip of the elastic piece;
It is characterized in that a contact groove for contacting the substrate is formed.
【0015】すなわち、リテーナの基板と当接する弾性
片の先端にV字状の当接溝を形成し、前記当接溝の高さ
方向の中心位置が、支持部に収容された基板のそれぞれ
の高さ方向の中心位置よりも0.3mm〜3mm高く、
好ましくは0.5mm〜2mm高くなるようにした。That is, a V-shaped contact groove is formed at the end of the elastic piece that contacts the substrate of the retainer, and the center position of the contact groove in the height direction is set to each of the substrates accommodated in the support portion. 0.3 mm to 3 mm higher than the center position in the height direction,
Preferably, the height is increased by 0.5 mm to 2 mm.
【0016】このようにリテーナを支持部に収容された
基板の高さ方向の中心位置に対して、0.3mm〜3m
m高くなるように取り付けることで、蓋体を閉鎖すると
きに、基板はリテーナのV溝に持ち上げられて当接し、
基板収納容器の搬送時に、支持部上で基板が擦れて摩耗
粉が発生することを低減できるので、基板を汚染する恐
れも無くなる。In this manner, the retainer is positioned at 0.3 mm to 3 m with respect to the center position in the height direction of the substrate accommodated in the supporting portion.
m, the substrate is lifted and abutted on the V-groove of the retainer when the lid is closed,
Since the generation of abrasion powder due to the rubbing of the substrate on the support portion during the transfer of the substrate storage container can be reduced, there is no risk of contamination of the substrate.
【0017】さらに、請求項3の基板収納容器は、請求
項1の発明において、容器本体は、基板支持部の終端よ
り奥側に基板を保持するリアサポートを有し、前記リテ
ーナの基板と当接する部分とリアサポートとの間で基板
を挟持し、基板の一部を前記基板支持部から浮かせて保
持するようにしたことを特徴としている。Further, in the substrate storage container according to a third aspect of the present invention, in the first aspect of the invention, the container main body has a rear support for holding the substrate at a position deeper than a terminal end of the substrate supporting portion, and the container main body has a rear support. The substrate is sandwiched between the contacting portion and the rear support, and a part of the substrate is held floating above the substrate supporting portion.
【0018】[0018]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明する。図1は、基板収納容器の側面図、
図2は蓋体の背面図、図3は図1のA−A線による断面
図、図4は図3のB−B線による断面図で蓋体を外した
状態を示し、図4は図3のB−B線による断面図であ
る。基板収納容器10は、図1に示すように、前面に開
口部20aを有する略立方形をした容器本体20と、前
記開口部20aをシール可能に閉鎖する蓋体30と、容
器本体20と蓋体30を密封状態で閉鎖するためのガス
ケット40と、基板Wを保持するために、蓋体30内面
に取り付けられたリテーナ50とを有する。さらに、基
板収納容器10を搬送するための部品として、容器本体
20の天面に着脱自在に取り付けられるロボティックフ
ランジ21や、一対のサイドレール22と一対のマニュ
アルハンドル23並びに底部に設けられる一対のボトム
レール24及び容器本体20の下面に配置されたボトム
プレート25とが備えられている。なお、容器本体20
の背面には、収納する基板を外部から確認可能な透明部
材によって形成された窓部26を設けることが好まし
い。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side view of a substrate storage container,
FIG. 2 is a rear view of the lid, FIG. 3 is a cross-sectional view taken along line AA of FIG. 1, FIG. 4 is a cross-sectional view taken along line BB of FIG. It is sectional drawing by the BB line of No. 3. As shown in FIG. 1, the substrate storage container 10 has a substantially cubic container body 20 having an opening 20a on the front surface, a lid 30 for sealingly closing the opening 20a, a container body 20 and a lid. It has a gasket 40 for closing the body 30 in a sealed state, and a retainer 50 attached to the inner surface of the lid 30 for holding the substrate W. Further, as components for transporting the substrate storage container 10, a robotic flange 21 detachably attached to the top surface of the container body 20, a pair of side rails 22, a pair of manual handles 23, and a pair of A bottom rail 24 and a bottom plate 25 arranged on the lower surface of the container body 20 are provided. The container body 20
It is preferable to provide a window 26 made of a transparent member that allows the substrate to be housed to be checked from the outside on the back surface of the device.
【0019】容器本体20とロボティックフランジ21
とサイドレール22及びボトムプレート25などは、十
分な剛性と強度を有するポリカーボネートや、アクリル
樹脂、PEEK等の熱可塑性樹脂、又はこれらをベース
樹脂として用い、ベース樹脂と導電性樹脂とのアロイ化
技術や炭素繊維や金属繊維などの導電性添加物を添加し
て帯電防止性能が付与された熱可塑性樹脂などから成形
される。あるいは、熱可塑性樹脂に導電性ポリマーの皮
膜を塗布したり、コーティングしたりして導電性を付与
しても良い。Container body 20 and robotic flange 21
And the side rails 22 and the bottom plate 25 are made of a thermoplastic resin such as polycarbonate, acrylic resin, or PEEK having sufficient rigidity and strength, or an alloying technology of the base resin and the conductive resin using these as a base resin. It is molded from a thermoplastic resin to which antistatic performance is imparted by adding a conductive additive such as carbon fiber or metal fiber. Alternatively, a conductive polymer film may be applied to a thermoplastic resin or coated to impart conductivity.
【0020】また、容器本体20の開口部20aの内周
には、蓋体30を係止するための係止凹部が複数個設け
られていて、開口部20aの外周部は、全周に渡ってフ
ランジ部20bが形成されている。さらに、容器本体2
0の相対向する内壁には、図3に示すような、容器本体
20の両側壁のそれぞれと一体に複数枚の基板Wを一定
間隔で隔離させてこれを水平に収納するための基板支持
部27が棚状に形成されている。また、前記基板支持部
27の奥側には、挿入される基板のストッパーとなるリ
アポート28が容器本体20と一体又は別部品として設
けられている。なお、リアサポート28の基板との当接
面には、V字状又はU字状の傾斜面が設けられているこ
とが好ましい。A plurality of locking recesses for locking the lid 30 are provided on the inner periphery of the opening 20a of the container body 20, and the outer periphery of the opening 20a extends over the entire circumference. Thus, a flange portion 20b is formed. Further, the container body 2
The substrate support portion for separating a plurality of substrates W at a predetermined interval integrally with each of the both side walls of the container body 20 and horizontally storing them as shown in FIG. 27 is formed in a shelf shape. A rear port 28 serving as a stopper for a substrate to be inserted is provided integrally or as a separate component with the container main body 20 at the back side of the substrate support portion 27. It is preferable that a V-shaped or U-shaped inclined surface is provided on a contact surface of the rear support 28 with the substrate.
【0021】本実施形態の基板収納容器に使用されるリ
テーナ50は、図2に示すように、矩形をした枠状のベ
ース部材52とベース部材の左右の側壁から基板と対向
する方向に斜めに延びる複数対の弾性片53とからな
る。弾性片53は、幅方向が櫛状に分岐され左右対称に
整列された板バネ構造をしている。ベース部材52の外
表面には、切り欠き又は、突片等とからなる係止部54
が形成され、これらと係合するように蓋体30の裏面に
設けられた突片又は、切り欠き等からなる係止部(図示
せず)と嵌合し、着脱自在に取り付けられる。As shown in FIG. 2, the retainer 50 used in the substrate storage container of the present embodiment has a rectangular frame-like base member 52 and diagonally obliquely from the left and right side walls of the base member in a direction facing the substrate. It comprises a plurality of pairs of elastic pieces 53 extending. The elastic piece 53 has a leaf spring structure in which the width direction branches in a comb shape and is arranged symmetrically. On the outer surface of the base member 52, a locking portion 54 composed of a notch or a projection is provided.
Is formed, and is fitted to a locking portion (not shown) formed of a protruding piece or a notch or the like provided on the back surface of the lid 30 so as to engage with them, and is detachably attached.
【0022】前記リテーナ50の弾性片53は、ベース
部材52の左右の側壁から基板に向かって斜めに延伸す
るように形成されている。弾性片53の先端は当接溝5
5となるV字状の凹部が形成されていて、基板収納容器
10の搬送時に基板Wが動いて汚染されたり、破損しな
いように基板Wを適切な撓み力で保持している。前記弾
性片53の当接溝55は基板Wを誘導する傾斜面を有
し、凹部の断面がV字またはU字状に形成されている。
この傾斜面は、基板との当接位置が寸法バラツキや基板
の撓み等で変位する場合であっても、基板と当接可能と
なるような誘導部として形成される。これにより、容器
本体20の基板支持部27に載置された基板Wは、最初
に傾斜面と接触し基板Wが押し込まれるにつれて徐々に
当接溝55の中心位置に導かれて保持される。本実施形
態では、弾性片の先端部が自由端となる片持ち梁構造を
している場合を示したが、何らこれに限定されるもので
はなく、弾性片が両持ち梁構造であっても良いことはい
うまでもない。こうしたリテーナ50は、ポリエーテル
エーテルケトン樹脂やポリカーボネート樹脂、ポリブチ
レンテレフタレート樹脂、ポリエーテルイミド(PE
I)、各種熱可塑性エラストマー(TPO、TPEE
等)の合成樹脂から形成される。The elastic pieces 53 of the retainer 50 are formed so as to extend obliquely from the left and right side walls of the base member 52 toward the substrate. The tip of the elastic piece 53 is the contact groove 5
A V-shaped concave portion 5 is formed, and holds the substrate W with an appropriate bending force so that the substrate W does not move and is contaminated or damaged when the substrate storage container 10 is transported. The contact groove 55 of the elastic piece 53 has an inclined surface for guiding the substrate W, and the cross section of the concave portion is formed in a V or U shape.
The inclined surface is formed as a guiding portion that can be brought into contact with the substrate even when the position of contact with the substrate is displaced due to dimensional variation, bending of the substrate, or the like. As a result, the substrate W placed on the substrate support portion 27 of the container body 20 first comes into contact with the inclined surface, and is gradually guided to and held at the center position of the contact groove 55 as the substrate W is pushed in. In the present embodiment, the case where the tip of the elastic piece has a cantilever structure in which the free end is a free end is shown, but the present invention is not limited to this, and the elastic piece may have a doubly supported structure. It goes without saying that it is good. Such a retainer 50 is made of a polyetheretherketone resin, a polycarbonate resin, a polybutyleneterephthalate resin, a polyetherimide (PE
I), various thermoplastic elastomers (TPO, TPEE
Etc.) synthetic resin.
【0023】図4は、本実施形態の基板収納容器10の
容器本体20の開口部20aを通して基板Wを収納し、
そこに蓋体30を取り付けようとする状態を表している
ものであり、この状態では、基板Wは容器本体20の基
板支持部27に水平に載置されている。また、容器本体
20の開口部20aから見て奥側の部分には、基板Wの
収納方向のストッパーとなるリアサポート28が形成さ
れている。なお、リアサポート28は、図3に示すよう
に、容器本体20と一体に形成しても良いし、図8,9
に示すように別部品として形成して、リテーナ50と対
向するように開口部20aの奥側に設置しても良い。こ
うしたリアサポート28はリテーナ50と同様に、ポリ
エステル系やポリオレフィン系等の各種の熱可塑性エラ
ストマーや、ポリエチレン、ポリプロピレン等の熱可塑
性樹脂から形成される。好ましくは、リテーナ50より
も弾性変形が小さくなるような形状及び材質から構成す
るのが望ましい。また、リアサポート28の基板Wへの
当接面は、垂直面状や傾斜面状に形成できるが、断面が
V字やU字状をしていることが好ましい。FIG. 4 shows a state in which the substrate W is stored through the opening 20a of the container body 20 of the substrate storage container 10 of the present embodiment.
This shows a state in which the lid 30 is to be attached thereto. In this state, the substrate W is placed horizontally on the substrate support 27 of the container body 20. In addition, a rear support 28 serving as a stopper in the direction in which the substrate W is stored is formed in a portion on the back side when viewed from the opening 20a of the container body 20. The rear support 28 may be formed integrally with the container body 20 as shown in FIG.
May be formed as a separate component, and may be installed on the back side of the opening 20a so as to face the retainer 50. Like the retainer 50, the rear support 28 is formed of various thermoplastic elastomers such as polyester and polyolefin, and thermoplastic resins such as polyethylene and polypropylene. Preferably, it is desirable that the retainer 50 be made of a shape and a material that have a smaller elastic deformation than the retainer 50. Further, the contact surface of the rear support 28 with the substrate W can be formed in a vertical plane or an inclined plane, but preferably has a V-shaped or U-shaped cross section.
【0024】図5は、蓋体30で容器本体20の開口部
20aを閉鎖した状態を表しており、このとき収納され
ている基板Wは、リテーナ50のV字状の当接溝55の
傾斜に沿って先端部が徐々に持ち上げられていき、蓋体
30が容器本対20に係止されたときには、基板Wは一
端がリテーナ50の当接溝55によって上方に持ち上げ
られて支持され、他端がリアサポート28によって保持
されるので、基板Wは基板支持部27から浮きあがり基
板支持部27と面接触しないように支持されるようにな
る。この状態をより解りやすく説明するために、基板W
とリテーナ50の当接溝55と基板支持部27とを模式
的に拡大したのが図6,図7である。これらは、リテー
ナ50の当接溝55が基板Wの一端を基板支持部27か
ら持ち上げて保持している状態を示している。FIG. 5 shows a state in which the opening 20 a of the container body 20 is closed by the lid 30, and the substrate W stored at this time is inclined by the V-shaped contact groove 55 of the retainer 50. When the cover 30 is locked to the main container pair 20, the substrate W is lifted and supported at one end by the contact groove 55 of the retainer 50. Since the end is held by the rear support 28, the substrate W rises from the substrate support 27 and is supported so as not to make surface contact with the substrate support 27. In order to explain this state more clearly, the substrate W
6 and 7 are schematic enlarged views of the contact groove 55 of the retainer 50 and the substrate support 27. These figures show a state in which the contact groove 55 of the retainer 50 lifts one end of the substrate W from the substrate support 27 and holds it.
【0025】リテーナ50の当接溝55の高さ方向の中
心線(中心位置)Obのそれぞれは、図6に示すよう
に、容器本体20の基板支持部27に搭載されリテーナ
50と相対するそれぞれの基板Wの支持部上での高さ方
向の中心線(中心位置)Oaに対して、h=0.3mm
〜3mm上方に位置するように取り付けられている。好
ましくは0.5mm〜2mmに設定される。このよう
に、リテーナ50の当接溝55の高さ方向の中心位置
を、容器本体20の基板支持部27上の基板Wの中心位
置よりも上方に位置させているので、蓋体30を容器本
体20に取り付け基板収納容器10を搬送するときに、
リテーナ50の当接溝55の傾斜面が基板Wを徐々に持
ち上げて当接溝55の中心部で保持するようになるの
で、基板収納容器10の搬送時に基板Wの裏面の一部分
が基板支持部から浮き上がり、接触面積を減らしている
ので、基板と基板支持部27の擦れがほとんど無く、摩
耗粉の発生を著しく低減でき、基板の汚染を防止でき
る。As shown in FIG. 6, each center line (center position) Ob in the height direction of the contact groove 55 of the retainer 50 is mounted on the substrate supporting portion 27 of the container body 20 and opposed to the retainer 50. H = 0.3 mm with respect to the center line (center position) Oa in the height direction on the supporting portion of the substrate W
It is mounted so as to be located 33 mm above. Preferably, it is set to 0.5 mm to 2 mm. As described above, since the center position in the height direction of the contact groove 55 of the retainer 50 is positioned higher than the center position of the substrate W on the substrate support portion 27 of the container body 20, the lid 30 is When transporting the mounting substrate storage container 10 to the main body 20,
Since the inclined surface of the contact groove 55 of the retainer 50 gradually lifts the substrate W and holds it at the center of the contact groove 55, a part of the back surface of the substrate W is transferred to the substrate supporting portion when the substrate container 10 is transported. , And the contact area is reduced, so that there is almost no friction between the substrate and the substrate support portion 27, the generation of abrasion powder can be significantly reduced, and the contamination of the substrate can be prevented.
【0026】図8と図9は、本発明に係る基板収納容器
の他の実施形態を示している。なお、図8は基板収納容
器10′の横断面図、図9は容器本体20′の正面図で
ある。ここでは、基板Wの基板支持部27′を別部材と
して形成し、容器本体20に取り付け、さらに容器本体
20に1対のリアサポート28′を、蓋体30内面に取
り付けられるリテーナ50と相対向するように取り付け
たものである。この場合も、前記実施形態と同様にリテ
ーナ50によって、基板Wを基板支持部27′から持ち
上げてリアサポート28′との間で挟持することができ
るので、同様の効果が得られる。FIGS. 8 and 9 show another embodiment of the substrate storage container according to the present invention. FIG. 8 is a cross-sectional view of the substrate storage container 10 ', and FIG. 9 is a front view of the container main body 20'. Here, the substrate supporting portion 27 ′ of the substrate W is formed as a separate member, attached to the container body 20, and a pair of rear supports 28 ′ are attached to the container body 20 so as to face the retainer 50 attached to the inner surface of the lid 30. It is attached so that it does. Also in this case, the same effect can be obtained because the substrate W can be lifted from the substrate support portion 27 'and held between the rear support 28' by the retainer 50 as in the above-described embodiment.
【0027】なお、いずれの場合でも、蓋体30の側面
全周にはシール用のガスケット40が取り付けられてい
る。ガスケット40は、各種の熱可塑性エラストマーや
フッ素ゴム、EPDM、EPM、NBR、IRなどから
形成される。ガスケット40の原材料は、シール性能か
ら形状、硬度にあわせて適宜選択し、また、加熱時のガ
ス発生量が少ないフッ素ゴムを主材料としたものがもっ
とも望ましい。また、蓋体30には、従来例で示したと
同様のラッチ機構が内蔵されているが、これに限らず蓋
体30あるいは容器本体20の外表面部に設けられる係
止フック部材と、容器本体と蓋体に設けられる係止部材
とを用いて係止させる構造であっても良い。In any case, a sealing gasket 40 is attached to the entire side surface of the lid 30. The gasket 40 is formed of various thermoplastic elastomers, fluorine rubber, EPDM, EPM, NBR, IR, and the like. The raw material of the gasket 40 is appropriately selected according to the shape and hardness in view of the sealing performance, and most preferably, the main material is a fluororubber which generates a small amount of gas upon heating. In addition, the lid 30 has a built-in latch mechanism similar to that shown in the conventional example, but is not limited to this, and a locking hook member provided on the outer surface of the lid 30 or the container body 20 may be used. It may be a structure that is locked by using a locking member provided on the lid.
【0028】[0028]
【発明の効果】以上説明したように、本発明の基板収納
容器によれば、蓋体に取り付けられたリテーナの基板と
の当接するV溝の中心高さが、容器本体の基板支持部上
の基板よりも上方になるように取り付け高さが設定され
ているので、基板と当接するときに基板の一端を持ち上
げながら奥側に押し込んで保持するので、基板収納容器
を搬送したり保管したりするときに基板と基板支持部面
との擦れがほとんどなく、摩耗粉の発生が防止できるの
で、基板を汚染させることがない。また、基板収納容器
の搬送時でもリテーナとリアサポートによって基板の一
部を基板支持部から浮かせて支持しているので、面接触
させて支持する場合に比べて基板の擦れによる汚染を現
象させることができる。As described above, according to the substrate storage container of the present invention, the center height of the V-groove in contact with the substrate of the retainer attached to the lid is set on the substrate supporting portion of the container body. The mounting height is set so that it is higher than the board, so when lifting the board, one end of the board is pushed inward while holding it, so that it can be transported or stored in the board storage container. Occasionally, there is almost no friction between the substrate and the substrate support portion surface, and the generation of abrasion powder can be prevented, so that the substrate is not contaminated. In addition, even when the substrate storage container is transported, a part of the substrate is supported by being lifted from the substrate support portion by the retainer and the rear support, so that contamination due to rubbing of the substrate is reduced as compared with a case where the substrate is supported by surface contact. Can be.
【図1】本発明に係る基板収納容器の実施の形態の分解
側面図である。FIG. 1 is an exploded side view of an embodiment of a substrate storage container according to the present invention.
【図2】リテーナを取り付けた蓋体の実施の形態の背面
図である。FIG. 2 is a rear view of the embodiment of the lid to which the retainer is attached.
【図3】図1に示す基板収納容器のA−A線よるに断面
図である。FIG. 3 is a cross-sectional view of the substrate storage container shown in FIG. 1, taken along line AA.
【図4】図3に示す基板収納容器の蓋体取り外し状態の
B−B線による断面図である。FIG. 4 is a cross-sectional view taken along line BB of the substrate storage container shown in FIG. 3 in a state where a lid is removed.
【図5】図3に示す基板収納容器の蓋体取り付け状態の
B−B線による断面図である。5 is a cross-sectional view of the substrate storage container shown in FIG. 3 along a line BB in a state where a lid is attached.
【図6】リテーナと容器本体の基板支持部との位置関係
を示す縦断面図である。FIG. 6 is a longitudinal sectional view showing a positional relationship between a retainer and a substrate support of a container body.
【図7】リテーナで基板を支持する状態を示す縦断面図
である。FIG. 7 is a longitudinal sectional view showing a state in which a substrate is supported by a retainer.
【図8】本発明に係る基板収納容器の他の実施の形態を
示す横断面図である。FIG. 8 is a cross-sectional view showing another embodiment of the substrate storage container according to the present invention.
【図9】本発明に係る基板収納容器の他の実施の形態の
開口部方向から見た正面図である。FIG. 9 is a front view of another embodiment of the substrate storage container according to the present invention, as viewed from an opening direction.
【図10】従来例の基板収納容器の分解斜視図である。FIG. 10 is an exploded perspective view of a conventional substrate storage container.
【図11】従来例の基板収納容器の縦断面図である。FIG. 11 is a longitudinal sectional view of a conventional substrate storage container.
10 基板収納容器 20 容器本体 20a 開口部 21 ロボティックフランジ 22 サイドレール 24 ボトムレール 25 ボトムプレート 26 窓部 27 基板支持部 28 リアサポート部材 30 蓋体 40 ガスケット 50 リテーナ 52 ベース部材 53 弾性片 54 係止部 55 当接溝(V溝) W 基板 Oa 基板の中心線 Ob 当接溝の中心線 h OaとObの高さの差 DESCRIPTION OF SYMBOLS 10 Substrate storage container 20 Container main body 20a Opening 21 Robotic flange 22 Side rail 24 Bottom rail 25 Bottom plate 26 Window 27 Substrate support 28 Rear support member 30 Cover 40 Gasket 50 Retainer 52 Base member 53 Elastic piece 54 Lock Part 55 Contact groove (V groove) W Substrate Oa Center line of substrate Ob Center line of contact groove h Difference in height between Oa and Ob
Claims (3)
複数枚の基板を水平に支持する基板支持部が設けられた
容器本体と、前記開口部をシール可能に閉鎖し、その内
面に基板の端面に当接するリテーナが取り付けられた蓋
体とを有する基板収納容器であって、 前記蓋体で容器本体の開口部を閉鎖したときに、前記リ
テーナの基板端面と当接するそれぞれの当接溝の高さ方
向の中心位置が、容器本体の基板支持部上に位置するそ
れぞれの基板の高さ方向の中心位置より上方に位置する
ように構成し、基板を収納した際に基板の一部を基板支
持部から浮かせて保持するようにしたことを特徴とする
基板収納容器。1. A container body having an opening and provided with a substrate supporting portion for horizontally supporting one or a plurality of substrates on opposing inner walls, and the opening is closed so as to be sealable, and an inner surface thereof. A lid having a retainer attached to the end face of the substrate, the lid being configured to close the opening of the container body with the lid, the lid being in contact with the end face of the substrate. The center position in the height direction of the contact groove is configured to be located higher than the center position in the height direction of each substrate positioned on the substrate support portion of the container main body. A substrate storage container characterized in that a part is floated and held from a substrate support part.
な係止部を有するベース部材と、基板のそれぞれと当接
するようにベース部材の向き合う側壁から延びる1又は
複数列の弾性片とを有するとともに、前記弾性片の先端
には相対する基板に向かって徐々に広がる傾斜面と、基
板と当接する当接溝が形成されていることを特徴とする
請求項1記載の基板収納容器。2. The retainer has a base member having a locking portion attachable to the inner surface of the lid, and one or a plurality of rows of elastic pieces extending from a side wall facing the base member so as to contact each of the substrates. 2. The substrate storage container according to claim 1, wherein an inclined surface that gradually widens toward the opposing substrate and a contact groove that contacts the substrate are formed at a tip end of the elastic piece.
奥側に基板を保持するリアサポートを有し、前記リテー
ナの基板と当接する部分とリアサポートとの間で基板を
挟持し、基板の一部を前記基板支持部から浮かせて保持
するようにしたことを特徴とする請求項1記載の基板収
納容器。3. The container body has a rear support for holding the substrate at a position deeper than the end of the substrate support, and holds the substrate between a portion of the retainer that contacts the substrate and the rear support. 2. The substrate storage container according to claim 1, wherein a part of the substrate is held floating from the substrate supporting portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000184605A JP4372313B2 (en) | 2000-06-20 | 2000-06-20 | Substrate storage container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000184605A JP4372313B2 (en) | 2000-06-20 | 2000-06-20 | Substrate storage container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002009142A true JP2002009142A (en) | 2002-01-11 |
| JP4372313B2 JP4372313B2 (en) | 2009-11-25 |
Family
ID=18685022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000184605A Expired - Lifetime JP4372313B2 (en) | 2000-06-20 | 2000-06-20 | Substrate storage container |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4372313B2 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2005191021A (en) * | 2003-12-02 | 2005-07-14 | Miraial Kk | Thin plate support container |
| US7017750B2 (en) | 2002-12-02 | 2006-03-28 | Miraial Co., Ltd. | Thin plate storage container |
| JP2006120791A (en) * | 2004-10-20 | 2006-05-11 | Shin Etsu Polymer Co Ltd | Substrate storage container |
| US7316315B2 (en) | 2002-12-02 | 2008-01-08 | Miraial Co., Ltd. | Thin plate storage container and lid having at least one thin plate supporting member |
| DE112009004765T5 (en) | 2009-05-13 | 2012-10-11 | Miraial Co., Ltd. | Container for semiconductor wafers |
| US8365919B2 (en) | 2005-12-29 | 2013-02-05 | Shin-Etsu Polymer Co., Ltd. | Substrate storage container |
| WO2016006412A1 (en) * | 2014-07-10 | 2016-01-14 | ミライアル株式会社 | Substrate housing container and retainer |
| JP2017037945A (en) * | 2015-08-07 | 2017-02-16 | シンフォニアテクノロジー株式会社 | Storage container lid and storage container |
| KR20170136500A (en) * | 2015-04-10 | 2017-12-11 | 신에츠 폴리머 가부시키가이샤 | Substrate storage container |
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| DE102008027295B4 (en) * | 2008-06-06 | 2010-05-06 | Dlb Draht Und Litzen Gmbh | Method for producing a stranded wire and strand of a plurality of individual wires |
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| US7017750B2 (en) | 2002-12-02 | 2006-03-28 | Miraial Co., Ltd. | Thin plate storage container |
| US7216766B2 (en) | 2002-12-02 | 2007-05-15 | Miraial Co., Ltd. | Thin plate storage container with handled supporting member |
| US7316315B2 (en) | 2002-12-02 | 2008-01-08 | Miraial Co., Ltd. | Thin plate storage container and lid having at least one thin plate supporting member |
| JP2005191021A (en) * | 2003-12-02 | 2005-07-14 | Miraial Kk | Thin plate support container |
| JP2006120791A (en) * | 2004-10-20 | 2006-05-11 | Shin Etsu Polymer Co Ltd | Substrate storage container |
| US8365919B2 (en) | 2005-12-29 | 2013-02-05 | Shin-Etsu Polymer Co., Ltd. | Substrate storage container |
| US8453842B2 (en) | 2009-05-13 | 2013-06-04 | Miraial Co., Ltd. | Semiconductor wafer container |
| JP5186596B2 (en) * | 2009-05-13 | 2013-04-17 | ミライアル株式会社 | Semiconductor wafer storage container |
| DE112009004765T5 (en) | 2009-05-13 | 2012-10-11 | Miraial Co., Ltd. | Container for semiconductor wafers |
| DE112009004765B4 (en) * | 2009-05-13 | 2018-12-13 | Miraial Co., Ltd. | Container for semiconductor wafers |
| WO2016006412A1 (en) * | 2014-07-10 | 2016-01-14 | ミライアル株式会社 | Substrate housing container and retainer |
| JP2016018961A (en) * | 2014-07-10 | 2016-02-01 | ミライアル株式会社 | Substrate housing container and retainer |
| KR20170136500A (en) * | 2015-04-10 | 2017-12-11 | 신에츠 폴리머 가부시키가이샤 | Substrate storage container |
| KR102374961B1 (en) | 2015-04-10 | 2022-03-15 | 신에츠 폴리머 가부시키가이샤 | Substrate storage container |
| JP2017037945A (en) * | 2015-08-07 | 2017-02-16 | シンフォニアテクノロジー株式会社 | Storage container lid and storage container |
| WO2018131363A1 (en) * | 2017-01-12 | 2018-07-19 | 信越ポリマー株式会社 | Substrate storage container |
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