JP2002088141A - Epoxy resin composition, prepreg and copper-clad laminate using the same - Google Patents
Epoxy resin composition, prepreg and copper-clad laminate using the sameInfo
- Publication number
- JP2002088141A JP2002088141A JP2000278008A JP2000278008A JP2002088141A JP 2002088141 A JP2002088141 A JP 2002088141A JP 2000278008 A JP2000278008 A JP 2000278008A JP 2000278008 A JP2000278008 A JP 2000278008A JP 2002088141 A JP2002088141 A JP 2002088141A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- coupling agent
- prepreg
- resin composition
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 87
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 87
- 239000000203 mixture Substances 0.000 title claims abstract description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000007822 coupling agent Substances 0.000 claims abstract description 38
- 239000005350 fused silica glass Substances 0.000 claims abstract description 27
- 239000002245 particle Substances 0.000 claims abstract description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 11
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 10
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000005011 phenolic resin Substances 0.000 claims abstract description 6
- 239000011342 resin composition Substances 0.000 claims abstract description 3
- 229920003986 novolac Polymers 0.000 claims description 27
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- 239000004593 Epoxy Substances 0.000 claims description 12
- 239000002966 varnish Substances 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 239000002002 slurry Substances 0.000 claims description 8
- 229920002545 silicone oil Polymers 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 4
- 229920001568 phenolic resin Polymers 0.000 claims description 4
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 claims description 3
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 claims description 3
- 239000003063 flame retardant Substances 0.000 abstract description 12
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 abstract description 9
- 238000004381 surface treatment Methods 0.000 abstract description 9
- 229910052736 halogen Inorganic materials 0.000 abstract description 6
- 150000002367 halogens Chemical class 0.000 abstract description 6
- 229910000679 solder Inorganic materials 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 13
- 238000010521 absorption reaction Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 239000000945 filler Substances 0.000 description 8
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000004744 fabric Substances 0.000 description 7
- 230000009477 glass transition Effects 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 7
- 239000011574 phosphorus Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 230000002776 aggregation Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- -1 phosphorus compound Chemical class 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- KHLRJDNGHBXOSV-UHFFFAOYSA-N 5-trimethoxysilylpentane-1,3-diamine Chemical compound CO[Si](OC)(OC)CCC(N)CCN KHLRJDNGHBXOSV-UHFFFAOYSA-N 0.000 description 1
- 101100407151 Arabidopsis thaliana PBL6 gene Proteins 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- HGAZJKGZTZTKCO-UHFFFAOYSA-N C12=CC=CC=C2OP(=O)=C2C1=CCCC2 Chemical compound C12=CC=CC=C2OP(=O)=C2C1=CCCC2 HGAZJKGZTZTKCO-UHFFFAOYSA-N 0.000 description 1
- 101001024616 Homo sapiens Neuroblastoma breakpoint family member 9 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 102100037013 Neuroblastoma breakpoint family member 9 Human genes 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ハロゲン系難燃剤
を使用せずとも優れた難燃性を有し、かつ優れた耐熱
性、寸法安定性を発現するエポキシ樹脂組成物、プリプ
レグ及びそれを用いた銅張積層板に関するものである。
特にICパッケージのリジッドインターポーザ用途に好
適な銅張積層板に関するものである。TECHNICAL FIELD The present invention relates to an epoxy resin composition, prepreg, which has excellent flame retardancy without using a halogen-based flame retardant, and exhibits excellent heat resistance and dimensional stability. It relates to the used copper-clad laminate.
In particular, the present invention relates to a copper-clad laminate suitable for use in a rigid interposer for an IC package.
【0002】[0002]
【従来の技術】半導体の分野では高密度実装技術の進歩
から従来の面実装からエリア実装に移行していくトレン
ドが進行し、BGAやCSPなど新しいパッケージが登
場、増加しつつある。そのため以前にもましてインター
ポーザ用リジッド基板が注目されるようになり、高耐
熱、低熱膨張基板の要求が高まってきた。一般に基板の
熱膨張係数を低減するためには、無機充填材、特に溶融
シリカを使うことは広く行われていることではあるが、
従来使用されてきた粗粒の溶融シリカでは、基板を構成
するガラス基材と銅箔の狭い間隙に粗い充填材が挟まっ
て形成される空間に水分が滞留し半田耐熱性が低下する
問題が起こることを本発明者らは確認した。一方、細粒
溶融シリカを使用した場合、上記の問題は解消される
が、シリカ凝集の問題が生じる。この凝集が発生した場
合も、外観不良が発生したり、凝集物が形成する空間に
水分が滞留し半田耐熱性が低下する問題が起こる。特開
平9−272155公報では微粒である0.3〜5μm
の球状シリカを用いる技術が開示されているが、インタ
ーポーザ用基材に最適な樹脂組成の記載はなく、凝集の
問題への言及もない。本発明者らによれば、たとえ球状
シリカであっても、凝集が発生すれば外観不良が発生し
たり、凝集物が形成する空間に水分が滞留し半田耐熱性
が低下する問題が起こる。一方、これら半導体に用いら
れる樹脂部材は難燃性が求められることが多い。従来こ
の難燃性を付与するため、エポキシ樹脂においては臭素
化エポキシなどのハロゲン系難燃剤を用いることが一般
的であった。しかし、ハロゲン含有化合物からダイオキ
シンが発生するおそれがあることから、昨今の環境問題
の深刻化とともに、ハロゲン系難燃剤を使用することが
回避されるようになり、広く産業界にハロゲンフリーの
難燃化システムが求められるようになった。このような
時代の要求によってリン系難燃剤が脚光を浴び、リン酸
エステルや赤リンが検討されたが、これらの従来のリン
系難燃剤は加水分解しやすく樹脂との反応に乏しいた
め、半田耐熱性が低下したり、ガラス転移温度が低下す
るという問題があった。2. Description of the Related Art In the field of semiconductors, the trend of shifting from conventional surface mounting to area mounting has progressed due to the progress of high-density mounting technology, and new packages such as BGA and CSP have appeared and are increasing. For this reason, rigid substrates for interposers have attracted more attention than ever before, and demands for substrates having high heat resistance and low thermal expansion have increased. In general, in order to reduce the coefficient of thermal expansion of a substrate, it is widely used to use an inorganic filler, particularly fused silica,
In the case of conventionally used coarse-grained fused silica, there is a problem that moisture stays in a space formed by sandwiching a coarse filler in a narrow gap between a glass base material and a copper foil constituting a substrate and solder heat resistance is reduced. The present inventors have confirmed this. On the other hand, when fine-grained fused silica is used, the above problem is solved, but a problem of silica aggregation occurs. Even when such agglomeration occurs, problems such as poor appearance or moisture retention in the space formed by the agglomerates and reduction in solder heat resistance occur. In Japanese Patent Application Laid-Open No. 9-272155, 0.3 to 5 μm
However, there is no description of an optimum resin composition for an interposer substrate and no mention of the problem of aggregation. According to the present inventors, even if spherical silica is used, if agglomeration occurs, appearance defects will occur, or moisture will remain in the space where the agglomerates are formed, and solder heat resistance will be reduced. On the other hand, resin members used for these semiconductors are often required to have flame retardancy. Conventionally, in order to impart this flame retardancy, it has been common to use a halogen-based flame retardant such as a brominated epoxy in an epoxy resin. However, since dioxins may be generated from halogen-containing compounds, the use of halogen-based flame retardants has been avoided with the worsening of environmental problems in recent years. There is a growing need for a system for conversion. Phosphorus-based flame retardants have been spotlighted in response to the demands of such times, and phosphate esters and red phosphorus have been studied.However, these conventional phosphorus-based flame retardants are easily hydrolyzed and have a poor reaction with resin, so solder There are problems that heat resistance is lowered and glass transition temperature is lowered.
【0003】[0003]
【発明が解決しようとする課題】本発明はこのような問
題を解決するべくなされたもので、ハロゲンフリーで優
れた難燃性を有し、高耐熱、低熱膨張、低吸水性によっ
て優れた半田耐熱性を有するリジッドインターポーザに
好適なエポキシ樹脂組成物、及びそれを用いたプリプレ
グ、銅張積層板を提供するものである。DISCLOSURE OF THE INVENTION The present invention has been made to solve such a problem, and is a halogen-free solder having excellent flame retardancy, high heat resistance, low thermal expansion, and low water absorption. An object of the present invention is to provide an epoxy resin composition suitable for a rigid interposer having heat resistance, and a prepreg and a copper-clad laminate using the same.
【0004】[0004]
【課題を解決するための手段】本発明は、耐熱性に寄与
する多官能エポキシ樹脂及びフェノール樹脂系硬化剤、
難燃性や優れた耐加水分解性を有する特定構造のリン化
合物、及び低熱膨張性や低吸水性を実現し、凝集をおこ
さない特定の球状シリカを必須成分として含有するイン
ターポーザ用銅張積層板に好適なエポキシ樹脂組成物を
主たる技術骨子とするものであり、かかる組成、プロセ
スにより上記目的を達成するに至った。DISCLOSURE OF THE INVENTION The present invention provides a polyfunctional epoxy resin and a phenol resin-based curing agent which contribute to heat resistance,
A copper clad laminate for interposers containing a phosphorus compound of a specific structure having flame retardancy and excellent hydrolysis resistance, and a specific spherical silica that realizes low thermal expansion and low water absorption and does not cause aggregation as essential components The main technical gist is an epoxy resin composition suitable for the above, and the above-mentioned object has been achieved by such composition and process.
【0005】具体的には、(A)1分子中に3個以上の
エポキシ基を有するエポキシ樹脂、(B)1分子中に3
個以上のフェノール性水酸基を有するフェノール樹脂系
硬化剤、(C)9,10−ジヒドロ−9−オキサ−10
−ホスファフェナントレン−10−オキシド、及び
(D)カップリング剤で予め表面処理された平均粒径2
μm以下の球状溶融シリカ、を必須成分とすることを特
徴とするエポキシ樹脂組成物と、それらを繊維基材に含
浸、乾燥してなることを特徴とするプリプレグ、さらに
はプリプレグを得るにあたり、平均粒径2μm以下の球
状溶融シリカを特定のプロセスで表面処理して用いるこ
とを特徴とするプリプレグ。並びにこのプリプレグを用
いて加熱成形してなる銅張積層板である。Specifically, (A) an epoxy resin having three or more epoxy groups in one molecule, and (B) three or more epoxy groups in one molecule.
A phenolic resin-based curing agent having at least two phenolic hydroxyl groups, (C) 9,10-dihydro-9-oxa-10
Average particle size 2 previously surface-treated with phosphaphenanthrene-10-oxide and (D) a coupling agent
μm or less spherical fused silica, and an epoxy resin composition characterized by being an essential component, a prepreg characterized by impregnating them into a fiber base material, and dried, and further, in obtaining a prepreg, A prepreg characterized in that spherical fused silica having a particle size of 2 μm or less is surface-treated by a specific process and used. And a copper-clad laminate formed by heat-molding using the prepreg.
【0006】[0006]
【発明の実施の形態】本発明に用いる、(A)1分子中
に3個以上のエポキシ基を有するエポキシ樹脂として
は、オルソクレゾールノボラックエポキシ樹脂、フェノ
ールノボラックエポキシ樹脂、ビスフェノールAノボラ
ックエポキシ樹脂などのノボラック型エポキシ樹脂、ト
リスヒドロキシフェニルメタン型エポキシ樹脂および対
応する芳香族環がアルキル化されたエポキシ樹脂などの
誘導体、1,1,2,2−テトラキスヒドロキシフェニ
ルエタンのグリシジルエーテル化物、およびその2量
体、3量体などのテトラキスヒドロキシフェニルエタン
型エポキシ樹脂、などが例示される。エポキシ樹脂は、
後述する反応性リン化合物である、9,10−ジヒドロ
−9−オキサ−10−ホスファフェナントレン−10−
オキシドがエポキシ基と反応して樹脂中のエポキシ基が
減少することから、ガラス転移温度を高い状態に保つた
めには、3官能以上のエポキシ樹脂であることが必須で
ある。BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin (A) having three or more epoxy groups in one molecule used in the present invention includes orthocresol novolak epoxy resin, phenol novolak epoxy resin, bisphenol A novolak epoxy resin and the like. Derivatives such as novolak type epoxy resin, trishydroxyphenylmethane type epoxy resin and corresponding epoxy resin in which aromatic ring is alkylated, glycidyl etherified product of 1,1,2,2-tetrakishydroxyphenylethane, and dimer thereof Tetrakishydroxyphenylethane-type epoxy resin such as dimer, trimer and the like. Epoxy resin is
9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-, a reactive phosphorus compound described below.
Since the oxide reacts with the epoxy group to decrease the epoxy group in the resin, it is essential that the epoxy resin is a trifunctional or higher functional epoxy resin in order to keep the glass transition temperature high.
【0007】特に3官能以上のエポキシ樹脂の中でも、
ノボラック型エポキシ樹脂(A1)及び、トリスヒドロ
キシフェニルメタン型エポキシ樹脂とテトラキスヒドロ
キシフェニルエタン型エポキシ樹脂から選ばれる少なく
とも1種のエポキシ樹脂(A2)を組み合わせた場合、
トリスヒドロキシフェニルメタン型エポキシ樹脂又はテ
トラキスヒドロキシフェニルエタン型エポキシ樹脂(A
2)で架橋密度を高くしてガラス転移温度を高くでき、
一方ノボラック型エポキシ樹脂(A1)によって、前記
(A2)のエポキシ樹脂の欠点である吸水性の大きさや
架橋密度が過度に高くなることによる脆さ、密着性の低
下などを防ぐすることができる。特にノボラック型エポ
キシ樹脂(A1)の中でもオルソクレゾールノボラック
エポキシ樹脂が吸水性を低減できるので好ましい。[0007] Particularly, among epoxy resins having three or more functional groups,
When a novolak type epoxy resin (A1) and at least one type of epoxy resin (A2) selected from a trishydroxyphenylmethane type epoxy resin and a tetrakishydroxyphenylethane type epoxy resin are combined,
Trishydroxyphenylmethane type epoxy resin or tetrakishydroxyphenylethane type epoxy resin (A
In 2), the glass transition temperature can be increased by increasing the crosslink density,
On the other hand, the novolak type epoxy resin (A1) can prevent the disadvantages of the epoxy resin (A2), such as brittleness due to excessively high water absorption and excessively high crosslinking density, and decrease in adhesion. In particular, among the novolak-type epoxy resins (A1), ortho-cresol novolak epoxy resin is preferable because the water absorption can be reduced.
【0008】本発明において、エポキシ樹脂組成物中に
占める(A)成分の割合は10〜50重量%が好まし
い。10重量%未満では、結合剤成分が少なくなり、耐
熱性特にICパッケージのインターポーザとしての耐半
田クラック性が低下するようになる。50重量%を越え
ると、充填材の割合が低下し、熱膨張、吸水率が増加し
ICパッケージのインターポーザとしての耐半田クラッ
ク性が低下するので好ましくない。ここで、インターポ
ーザとしての耐半田クラック性とは、リジッドインター
ポーザを使用したBGAやCSP等において行われるJ
EDEC実装ランク条件に準じた耐半田クラック試験に
おいて、インターポーザに起因するか、または間接的に
インターポーザの特性が影響を与えて発生するクラッ
ク、または界面剥離に対する耐性を意味する。なお、エ
ポキシ樹脂として、(A)成分以外のエポキシ樹脂、例
えばビスフェノールA型のエポキシ樹脂をエポキシ樹脂
全体の30重量%以下配合してもよい。In the present invention, the proportion of the component (A) in the epoxy resin composition is preferably from 10 to 50% by weight. If the content is less than 10% by weight, the amount of the binder component is reduced, and the heat resistance, particularly the solder crack resistance as an interposer of the IC package, is reduced. If it exceeds 50% by weight, the proportion of the filler decreases, the thermal expansion and the water absorption increase, and the solder cracking resistance as an interposer of the IC package decreases, which is not preferable. Here, the solder crack resistance as an interposer refers to a JGA performed in a BGA or a CSP using a rigid interposer.
In a solder cracking resistance test according to the EDEC mounting rank condition, it means a resistance to a crack or an interface peeling caused by an interposer or indirectly affected by characteristics of the interposer. In addition, as the epoxy resin, an epoxy resin other than the component (A), for example, a bisphenol A type epoxy resin may be blended in an amount of 30% by weight or less of the entire epoxy resin.
【0009】次に、成分(B)1分子中に3個以上のフ
ェノール性水酸基を有するフェノール樹脂系硬化剤とし
ては、フェノールノボラック、ビスフェノールAノボラ
ック、フェノールアラルキル樹脂等が例示されるが、フ
ェノール性水酸基当量が比較的小さく、低官能のモノマ
ーを容易に除去できるフェノールノボラックが好まし
い。本発明では(B)成分は、エポキシ樹脂のエポキシ
基と、(B)成分のフェノール性水酸基およびその他の
活性水素の合計との当量比が0.8以上1.2以下とな
るよう添加することが好ましい。この範囲外ではガラス
転移温度の低下や吸水率の増加で特にICパッケージの
インターポーザとしての耐半田クラック性の低下やIC
の耐湿信頼性の低下が生じることがある。Next, examples of the phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule of the component (B) include phenol novolak, bisphenol A novolak, and phenol aralkyl resin. Phenol novolak, which has a relatively small hydroxyl equivalent and can easily remove low-functional monomers, is preferred. In the present invention, the component (B) is added so that the equivalent ratio of the epoxy group of the epoxy resin to the total of the phenolic hydroxyl group and other active hydrogen of the component (B) is 0.8 or more and 1.2 or less. Is preferred. Outside this range, a decrease in glass transition temperature and an increase in water absorption cause a decrease in solder cracking resistance as an interposer of an IC package,
In some cases, a decrease in the moisture resistance reliability may occur.
【0010】本発明の難燃成分である、成分(C)9,
10−ジヒドロ−9−オキサ−10−ホスファフェナン
トレン−10−オキシドは、リンに結合している水素が
エポキシ基と反応する反応性リン化合物であり、従来の
リン酸エステルや赤リンのように加水分解して吸水性を
高めたり、密着性を低下させたりすることがなく、極め
て優れたリン系難燃剤である。本発明の(C)成分添加
量は、エポキシ樹脂組成物全体に対して、0.5〜10
重量%が好ましい。0.5重量%未満では難燃効果が低
下するおそれがあり、10重量%を越えるとガラス転移
温度の低下や吸水率の増加で特にICパッケージのイン
ターポーザとしての耐半田耐熱性の低下やICの耐湿信
頼性の低下が生じることがある。The flame retardant component of the present invention, component (C) 9,
10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide is a reactive phosphorus compound in which hydrogen bonded to phosphorus reacts with an epoxy group, such as a conventional phosphoric acid ester or red phosphorus. It is an extremely excellent phosphorus-based flame retardant without hydrolyzing to increase water absorption or reducing adhesion. Component (C) of the present invention is added in an amount of 0.5 to 10 based on the entire epoxy resin composition.
% By weight is preferred. If it is less than 0.5% by weight, the flame-retardant effect may be reduced. If it exceeds 10% by weight, the glass transition temperature and the water absorption are increased, and especially the soldering heat resistance as an interposer of the IC package is reduced, and In some cases, the reliability of humidity resistance may be reduced.
【0011】本発明の成分(D)は、カップリング剤で
予め表面処理された平均粒径2μm以下の球状溶融シリ
カである。多量に充填材を添加し低熱膨張性と樹脂の流
動性を両立させるには球状溶融シリカが他の充填材に勝
っており最適である。平均粒径2μm以下の微細な球状
シリカは凝集しやすく、この凝集物が樹脂、ガラスクロ
ス、銅箔などの界面に空間を形成し半田耐熱性を悪化さ
せることがあるが、本発明の球状溶融シリカはカップリ
ング剤で予め表面処理されているため、そのような問題
が起こらない。The component (D) of the present invention is spherical fused silica having an average particle diameter of 2 μm or less which has been surface-treated with a coupling agent in advance. In order to achieve both low thermal expansion and resin fluidity by adding a large amount of filler, spherical fused silica is optimal because it is superior to other fillers. Fine spherical silica having an average particle size of 2 μm or less easily aggregates, and this aggregate may form a space at an interface between a resin, a glass cloth, a copper foil and the like and deteriorate solder heat resistance. Such a problem does not occur because silica has been previously surface-treated with a coupling agent.
【0012】本発明における表面処理方法は凝集物が発
生しない方法であれば特に限定するものではなく、従来
行われている湿式法、すなわち溶剤等にカップリング剤
を希釈して充填材を混合する方法、あるいはその後乾燥
する方法、さらには乾式法、すなわちミキサーで充填材
を撹拌しつつカップリング剤を噴霧する方法等が実施さ
れる。このなかで、エポキシ樹脂組成物を溶剤に溶解し
てワニスとし、繊維基材に塗布し乾燥してプリプレグを
得る工程において、ワニス調製時に、カップリング剤で
表面処理された球状溶融シリカとして、平均粒径2μm
以下の球状溶融シリカとカップリング剤と溶剤を混合し
加熱反応してなるスラリー状物を配合すると球状溶融シ
リカの表面処理が極めて効果的に行われる。The surface treatment method in the present invention is not particularly limited as long as it does not generate agglomerates. Conventionally, a wet method, that is, diluting a coupling agent in a solvent or the like and mixing a filler. A method, or a method of subsequent drying, and a dry method, that is, a method of spraying a coupling agent while stirring a filler with a mixer, and the like are performed. Among them, in the step of dissolving the epoxy resin composition in a solvent to form a varnish, applying it to a fiber base material and drying to obtain a prepreg, at the time of preparing the varnish, as spherical fused silica surface-treated with a coupling agent, Particle size 2μm
When the following spherical fused silica, a coupling agent, and a solvent are mixed and a slurry is prepared by heat reaction, the surface treatment of the spherical fused silica is extremely effectively performed.
【0013】カップリング剤で予め表面処理された平均
粒径2μm以下の球状溶融シリカにおけるカップリング
剤は、シランカップリング剤、シロキサン結合の繰り返
し単位を2個以上有し、かつアルコキシ基を有するシリ
コーンオイル型カップリング剤等のケイ素系カップリン
グ剤やチタネート系カップリング剤等が挙げられるが、
エポキシ樹脂と溶融球状シリカの表面の塗れ性向上の点
で、ケイ素系カップリング剤が好ましい。具体的にはエ
ポキシシランカップリング剤、アミノシランカップリン
グ剤、ウレイドシランカップリング剤、メルカプトシラ
ンカップリング剤、ジシラザン、シロキサン結合の繰り
返し単位を2個以上有し、かつアルコキシ基を有するシ
リコーンオイル型カップリング剤からなる群から少なく
とも1種選ばれるものなどが挙げられる。特にエポキシ
シランカップリング剤、アミノシランカップリング剤
と、シロキサン結合の繰り返し単位を2個以上有し、か
つアルコキシ基を有するシリコーンオイル型カップリン
グ剤を併用した場合、シリカ表面へカップリング剤が効
率よく定着する。これらの場合のカップリング剤の割合
は球状溶融シリカ100部(以下、すべて「部」は重量
部を表す)に対し0.1部以上10部以下が一般的であ
る。The coupling agent in spherical fused silica having an average particle diameter of 2 μm or less which has been surface-treated in advance with a coupling agent is a silane coupling agent or a silicone having two or more repeating units of siloxane bonds and having an alkoxy group. Examples include a silicon-based coupling agent such as an oil-type coupling agent and a titanate-based coupling agent.
From the viewpoint of improving the wettability of the surfaces of the epoxy resin and the fused spherical silica, silicon-based coupling agents are preferred. Specifically, a silicone oil-type cup having at least two repeating units of an epoxy silane coupling agent, an amino silane coupling agent, a ureido silane coupling agent, a mercapto silane coupling agent, a disilazane, and a siloxane bond, and having an alkoxy group. At least one member selected from the group consisting of ring agents is exemplified. Especially when an epoxy silane coupling agent, an amino silane coupling agent and a silicone oil type coupling agent having two or more repeating units of siloxane bond and having an alkoxy group are used in combination, the coupling agent is efficiently attached to the silica surface. Establish. In these cases, the ratio of the coupling agent is generally 0.1 part or more and 10 parts or less with respect to 100 parts of spherical fused silica (hereinafter, all "parts" represent parts by weight).
【0014】前述した球状溶融シリカとカップリング剤
と溶剤を混合し加熱反応してスラリーとする場合、加熱
温度は50℃から120℃の間が好ましい。この範囲の
温度で加熱反応させると、シリカ表面のシラノールとカ
ップリング剤の反応が選択的に起こる。この範囲より低
い温度では反応が遅くなり、この範囲より高いとカップ
リング剤相互の縮合反応や、揮発が生じ好ましくない。
球状溶融シリカ、カップリング剤、溶剤の混合比は任意
に設定できるが、通常重量比で球状溶融シリカ100部
に対し、カップリング剤が0.1部以上10部以下、溶
剤は10部以上200部以下である。この範囲外では表
面処理の効率が低下する場合がある。表面処理完了後の
スラリーを一旦濾過して乾燥する前に異なる溶剤に再分
散したり、デカンテーションで溶剤を減らすことも必要
に応じて実施できる。ただし、この方法を用いる場合、
再凝集を防ぐため表面処理済みの球状溶融シリカのスラ
リーは乾燥しないで他の成分と混合することが好まし
い。When the above-mentioned spherical fused silica, coupling agent and solvent are mixed and reacted by heating to form a slurry, the heating temperature is preferably between 50 ° C. and 120 ° C. When a heating reaction is performed at a temperature in this range, the reaction between the silanol on the silica surface and the coupling agent selectively occurs. If the temperature is lower than this range, the reaction becomes slow. If the temperature is higher than this range, a coupling reaction between the coupling agents and volatilization occur, which is not preferable.
The mixing ratio of the spherical fused silica, the coupling agent, and the solvent can be arbitrarily set, but the coupling agent is usually 0.1 to 10 parts and the solvent is 10 to 200 parts by weight based on 100 parts of the spherical fused silica. Part or less. Outside this range, the efficiency of the surface treatment may decrease. The slurry after the surface treatment is completed may be re-dispersed in a different solvent before being filtered and dried, or the solvent may be reduced by decantation as required. However, when using this method,
In order to prevent reaggregation, it is preferable that the surface-treated spherical fused silica slurry is mixed with other components without drying.
【0015】どのような方法であれ、表面処理にカップ
リング剤を用いる場合にカップリング剤とシリカのシラ
ノールの反応を促進するために、必要に応じて水や酸、
アルカリなどを用いることは本発明に含まれる。平均粒
径2μm以下の球状溶融シリカはエポキシ樹脂組成物中
50重量%以上を占めると熱膨張、吸水率が小さくなる
ので好ましい。ただし、90重量%を越えるとエポキシ
樹脂組成物中の無機充填材の割合が大きすぎて含浸等の
操作が困難となる。また必要に応じて特性を妨げない範
囲で他の充填材を使用してもよい。この場合、本発明の
カップリング剤で予め表面処理された平均粒径2μm以
下の球状溶融シリカ以外の球状シリカをはじめとして従
来公知の充填材を、半田耐熱性等の特性を悪化させない
程度において、任意に使用可能である。In any method, when a coupling agent is used for the surface treatment, water or an acid, if necessary, is used to promote the reaction between the coupling agent and the silanol of silica.
Use of an alkali or the like is included in the present invention. When the spherical fused silica having an average particle size of 2 μm or less accounts for 50% by weight or more of the epoxy resin composition, thermal expansion and water absorption are reduced, which is preferable. However, when the content exceeds 90% by weight, the proportion of the inorganic filler in the epoxy resin composition is too large, and operations such as impregnation become difficult. If necessary, other fillers may be used as long as the properties are not hindered. In this case, conventionally known fillers including spherical silica other than spherical fused silica having an average particle diameter of 2 μm or less which has been previously surface-treated with the coupling agent of the present invention, to the extent that properties such as solder heat resistance are not deteriorated, Can be used arbitrarily.
【0016】本発明のエポキシ樹脂組成物は必要に応じ
て、上記成分以外の添加剤を特性を損なわない範囲で添
加することができる。本発明のエポキシ樹脂組成物は溶
剤を用いてワニスとして、または無溶剤にて基材に塗布
しプリプレグを得ることができる。基材としてはガラス
織布、ガラス不織布、その他有機基材などを用いること
ができる。本発明のエポキシ樹脂組成物を繊維基材に含
浸、乾燥することによりプリプレグが得られ、このプリ
プレグの1枚又は複数枚を銅箔とともに加熱成形して銅
張積層板が得られる。これらのプリプレグ及び銅張積層
板も本発明に含まれるものである。The epoxy resin composition of the present invention can optionally contain additives other than the above components as long as the properties are not impaired. The epoxy resin composition of the present invention can be applied to a substrate as a varnish using a solvent or without a solvent to obtain a prepreg. As the substrate, a glass woven fabric, a glass nonwoven fabric, or another organic substrate can be used. A prepreg is obtained by impregnating and drying a fiber base material with the epoxy resin composition of the present invention, and one or more of the prepregs are heat-formed together with a copper foil to obtain a copper-clad laminate. These prepregs and copper-clad laminates are also included in the present invention.
【0017】[0017]
【実施例】実施例1 平均粒径0.5μmの球状溶融シリカ60部をヘンシェ
ルミキサーに投入、攪拌しながらγ−グリシドキシプロ
ピルトリメトキシシラン0.5部及びシリコーンオイル
型カップリング剤A(日本ユニカー製MAC2101)
0.1部を少しずつ添加した。添加終了後5分攪拌し取
り出した。オルソクレゾールノボラックエポキシ樹脂
(大日本インキ化学製エピクロンN−665)25部、
フェノールノボラック(軟化点105℃)9.5部、
9,10−ジヒドロ−9−オキサ−10−ホスファフェ
ナントレン−10−オキシド(三光化学製HCA)5
部、およびエポキシ樹脂と硬化剤量の合計100部に対
し2−フェニル−4−メチルイミダゾールを0.03部
をメチルエチルケトンとメチルセロソルブの混合溶剤に
溶解した後、この溶液に先にカップリング剤で表面処理
した平均粒径0.5μmの球状溶融シリカをいかり型撹
拌羽根で撹拌しながら少しずつ添加した。全成分を混合
したところで高速攪拌機を用いて10分撹拌した。作製
したワニスを用いてガラスクロス(厚さ180μm、日
東紡績製)に含浸し、150℃の加熱炉で6分乾燥して
ワニス固形分(プリプレグ中、ガラスクロスを除く成
分)が約50重量%のプリプレグを得た。このプリプレ
グを所定枚数重ね、両面に厚み12μmの銅箔を重ね
て、圧力40kgf/cm2 、温度190℃で120分
加熱加圧成形を行い両面銅張積層板を得た。Example 1 60 parts of spherical fused silica having an average particle diameter of 0.5 μm was charged into a Henschel mixer, and while stirring, 0.5 parts of γ-glycidoxypropyltrimethoxysilane and a silicone oil type coupling agent A ( Nippon Unicar MAC2101)
0.1 part was added little by little. After completion of the addition, the mixture was stirred for 5 minutes and taken out. Orthocresol novolak epoxy resin (Epiclon N-665 manufactured by Dainippon Ink and Chemicals) 25 parts,
9.5 parts of phenol novolak (softening point 105 ° C),
9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HCA manufactured by Sanko Chemical) 5
Part, and 0.03 part of 2-phenyl-4-methylimidazole with respect to 100 parts of the total amount of the epoxy resin and the curing agent were dissolved in a mixed solvent of methyl ethyl ketone and methyl cellosolve. The surface-treated spherical fused silica having an average particle size of 0.5 μm was added little by little while stirring with an Ikari type stirring blade. When all the components were mixed, the mixture was stirred for 10 minutes using a high-speed stirrer. A glass cloth (thickness: 180 μm, manufactured by Nitto Boseki) is impregnated with the prepared varnish, dried in a heating furnace at 150 ° C. for 6 minutes, and a varnish solid content (a component in the prepreg, excluding the glass cloth) is about 50% by weight. Prepreg was obtained. A predetermined number of the prepregs were stacked, copper foils having a thickness of 12 μm were stacked on both sides, and heated and pressed at a pressure of 40 kgf / cm 2 and a temperature of 190 ° C. for 120 minutes to obtain a double-sided copper-clad laminate.
【0018】実施例2 予め溶剤としてメタノールを30部程度入れた3Lセパ
ラブルフラスコにγ−グリシドキシプロピルトリメトキ
シシラン1部、平均粒径1.5μmの球状溶融シリカ7
0部を入れ、室温で3時間攪拌しその後加圧ろ過により
溶剤を除去した。得られた固形分をバットに広げ防爆型
乾燥機で2時間乾燥した後、ボールミルで3時間処理し
て凝集物を砕いた。次にフェノールノボラックエポキシ
樹脂(大日本インキ化学製エピクロンN−775)1
2.5部、ビスフェノールAノボラックエポキシ樹脂
(軟化点70℃、エポキシ当量201)5部、フェノー
ルノボラック(軟化点105℃)8.5部、9,10−
ジヒドロ−9−オキサ−10−ホスファフェナントレン
−10−オキシド(三光化学製HCA)3.5部および
エポキシ樹脂と硬化剤量の合計100部に対し2−フェ
ニル−4−メチルイミダゾールを0.03部をメチルエ
チルケトンとメチルセロソルブの混合溶剤に溶解した
後、先にカップリング剤で表面処理した平均粒径1.5
μmの球状溶融シリカをいかり型撹拌羽根で撹拌しなが
ら少しずつ添加した。全成分を混合したところで高速攪
拌機を用いて10分撹拌しワニスを調製した。作製した
ワニスを用いてガラスクロス(厚さ180μm、日東紡
績製)に含浸し、150℃の加熱炉で6分乾燥してワニ
ス固形分(プリプレグ中、ガラスクロスを除く成分)が
約50重量%のプリプレグを得た。このプリプレグを所
定枚数重ね、両面に厚み12μmの銅箔を重ねて、圧力
40kgf/cm2 、温度190℃で120分加熱加圧
成形を行い両面銅張積層板を得た。EXAMPLE 2 1 part of γ-glycidoxypropyltrimethoxysilane was placed in a 3 L separable flask previously containing about 30 parts of methanol as a solvent, and spherical fused silica having an average particle size of 1.5 μm was prepared.
0 parts were added, the mixture was stirred at room temperature for 3 hours, and then the solvent was removed by pressure filtration. The obtained solid content was spread on a vat and dried for 2 hours with an explosion-proof drier, and then treated with a ball mill for 3 hours to break up aggregates. Next, a phenol novolak epoxy resin (Epiclon N-775 manufactured by Dainippon Ink and Chemicals) 1
2.5 parts, bisphenol A novolak epoxy resin (softening point 70 ° C, epoxy equivalent 201) 5 parts, phenol novolak (softening point 105 ° C) 8.5 parts, 9,10-
0.03 of 2-phenyl-4-methylimidazole was added to 3.5 parts of dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HCA manufactured by Sanko Chemical Co., Ltd.) and 100 parts of epoxy resin and curing agent in total. Was dissolved in a mixed solvent of methyl ethyl ketone and methyl cellosolve, and then subjected to a surface treatment with a coupling agent to give an average particle size of 1.5.
μm spherical fused silica was added little by little while stirring with an irrigating stirring blade. When all the components were mixed, the mixture was stirred for 10 minutes using a high-speed stirrer to prepare a varnish. A glass cloth (thickness: 180 μm, manufactured by Nitto Boseki) is impregnated with the prepared varnish, dried in a heating furnace at 150 ° C. for 6 minutes, and a varnish solid content (a component in the prepreg, excluding the glass cloth) is about 50% by weight. Prepreg was obtained. A predetermined number of the prepregs were stacked, copper foils having a thickness of 12 μm were stacked on both sides, and heated and pressed at a pressure of 40 kgf / cm 2 and a temperature of 190 ° C. for 120 minutes to obtain a double-sided copper-clad laminate.
【0019】実施例3 予め溶剤としてメタノールを40部程度入れた3Lセパ
ラブルフラスコに、γ−(2−アミノエチル)アミノプロ
ピルトリメトキシシラン0.5部及びシリコーンオイル
型カップリング剤A(日本ユニカー製MAC2101)
0.1部、平均粒径0.5μmの球状溶融シリカ80部
を入れ、90℃、1時間攪拌しスラリーを得た。次にテ
トラキスヒドロキシフェニルエタン型エポキシ樹脂(油
化シェルエポキシ製エピコートE1031S)12.5
部、フェノールノボラック(軟化点105℃)5.5
部、9,10−ジヒドロ−9−オキサ−10−ホスファ
フェナントレン−10−オキシド(三光化学製HCA)
1.5部およびエポキシ樹脂と硬化剤量の合計100部
に対し2−フェニル−4−メチルイミダゾールを0.0
3部をメチルエチルケトンとメチルセロソルブの混合溶
剤に溶解した後、先に準備した球状シリカを含むスラリ
ーをいかり型撹拌羽根で撹拌しながら少しずつ添加し
た。全成分を混合したところで高速攪拌機を用いて10
分撹拌しワニスを調製した。作製したワニスを用いてガ
ラスクロス(厚さ180μm、日東紡績製)に含浸し、
150℃の加熱炉で6分乾燥してワニス固形分(プリプ
レグ中、ガラスクロスを除く成分)が約50重量%のプ
リプレグを得た。このプリプレグを所定枚数重ね、両面
に厚み12μmの銅箔を重ねて、圧力40kgf/cm
2 、温度190℃で120分加熱加圧成形を行い両面銅
張積層板を得た。Example 3 0.5 parts of γ- (2-aminoethyl) aminopropyltrimethoxysilane and a silicone oil type coupling agent A (Nihon Unicar, Inc.) were placed in a 3 L separable flask previously containing about 40 parts of methanol as a solvent. MAC2101)
0.1 part and 80 parts of spherical fused silica having an average particle size of 0.5 μm were added and stirred at 90 ° C. for 1 hour to obtain a slurry. Next, tetrakishydroxyphenylethane type epoxy resin (Epicoat E1031S made by Yuka Shell Epoxy) 12.5
Part, phenol novolak (softening point 105 ° C) 5.5
Part, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HCA manufactured by Sanko Chemical)
0.0 parts of 2-phenyl-4-methylimidazole was added to 1.5 parts and 100 parts of the total amount of the epoxy resin and the curing agent.
After dissolving 3 parts in a mixed solvent of methyl ethyl ketone and methyl cellosolve, the slurry containing the previously prepared spherical silica was added little by little while stirring with an irrigating stirring blade. When all the components have been mixed, 10
The mixture was stirred for a minute to prepare a varnish. Impregnating a glass cloth (thickness: 180 μm, manufactured by Nitto Boseki) using the prepared varnish,
Drying was performed in a heating furnace at 150 ° C. for 6 minutes to obtain a prepreg having a varnish solid content (a component other than glass cloth in the prepreg) of about 50% by weight. A predetermined number of the prepregs are stacked, and a copper foil having a thickness of 12 μm is stacked on both sides, and the pressure is 40 kgf / cm.
2. Heat and pressure molding was performed at 190 ° C. for 120 minutes to obtain a double-sided copper-clad laminate.
【0020】実施例4〜14及び比較例1〜6 表1及び表2に示す配合にて、実施例1、2または3と
同様の方法で両面銅張積層板を得た。ただし、シリカの
表面処理方法は実施例1と同様のものはA、実施例2と
同様のものはB、実施例3と同様のものはCで表した。
評価方法は下記の通りである。評価結果を表1及び表2
の下欄に示す。Examples 4 to 14 and Comparative Examples 1 to 6 Double-sided copper-clad laminates were obtained in the same manner as in Examples 1, 2 or 3 using the formulations shown in Tables 1 and 2. However, the surface treatment method of silica was represented by A for the same as Example 1, B for the same as Example 2, and C for the same as Example 3.
The evaluation method is as follows. Tables 1 and 2 show the evaluation results.
Shown in the lower column.
【0021】得られた両面銅張積層板の評価方法を〜
に、BGAの評価方法を、に示す。 ガラス転移温度 厚さ0.6mmの両面銅張積層板を全面エッチングし、
得られた積層板から10mm×60mmのテストピース
を切り出し、動的粘弾性測定装置を用いて3℃/分で昇
温し、tanδのピーク位置をガラス転移温度とした。 線膨張係数 厚さ1.2mmの両面銅張積層板を全面エッチングし、
得られた積層板から2mm×2mmのテストピースを切
り出し、TMAを用いてZ方向の線膨張係数を5℃/分
で測定した。 難燃性 厚さ0.6mmの両面銅張積層板を全面エッチングし、
得られた積層板からUL−94規格、垂直法により測定
した。 半田耐熱性 厚さ0.4mmの両面銅張積層板を作製し、JIS C
6481に準じた方法でテストピースを8枚作製し、プ
レッシャークッカー125℃、8時間吸湿処理を行った
後、260℃の半田槽に120秒浸漬して外観異常が現
れた数を調べた。The evaluation method of the obtained double-sided copper-clad laminate is as follows.
The BGA evaluation method is shown in FIG. Glass transition temperature Double-sided copper-clad laminate with a thickness of 0.6 mm is entirely etched,
A test piece of 10 mm × 60 mm was cut out from the obtained laminate, and the temperature was raised at 3 ° C./min using a dynamic viscoelasticity measuring apparatus, and the peak position of tan δ was taken as the glass transition temperature. Coefficient of linear expansion The whole surface of the double-sided copper-clad laminate with a thickness of 1.2 mm is etched,
A test piece of 2 mm × 2 mm was cut out from the obtained laminate, and the linear expansion coefficient in the Z direction was measured at 5 ° C./min using TMA. Flame retardant Double-sided copper-clad laminate with a thickness of 0.6mm is etched over the entire surface,
It measured from the obtained laminated board by UL-94 standard and a vertical method. Solder heat resistance A double-sided copper-clad laminate with a thickness of 0.4 mm was manufactured and JIS C
Eight test pieces were prepared according to the method according to 6481, subjected to a moisture absorption treatment at 125 ° C. for 8 hours in a pressure cooker, and then immersed in a solder bath at 260 ° C. for 120 seconds to determine the number of appearance abnormalities.
【0022】パッケージ反り量 実施例で作製した厚さ0.4mmの両面銅張積層板をB
GA用に回路加工した。この回路基板(リジッドインタ
ーポーザ)と封止材料に住友ベークライト製EME−7
720を用いて、金型温度180℃、注入圧力75kg
/cm2 、硬化時間2分で225pBGA(パッケージ
サイズは24×24mm、厚さ1.17mm、シリコン
チップはサイズ9×9mm、厚さ0.35mm、チップ
と回路基板のボンディングパッドとを25μm径の金線
でボンディングしている。)を成形し、175℃、8時
間で後硬化した。室温に冷却後、パッケージのゲート部
から対角線方向に、パッケージ上面の高さの変位を表面
粗さ計により測定し、ゲート部を基準とした最大の変位
値を反り量とした。単位はμm。 BGA耐半田クラック性 と同様の方法で得たパッケージ8個を、85℃、相対
湿度60%の環境下で240時間放置した後、JEDE
Cの方法に準じてIRリフロー処理を行った。処理後の
内部の剥離、及びクラックの有無を超音波探傷機で観察
し、不良パッケージの個数を数えた。不良パッケージの
個数がn個であるとき、n/8と表示する。Package Warpage A double-sided copper-clad laminate having a thickness of 0.4 mm produced in
Circuit processed for GA. This circuit board (rigid interposer) and the sealing material are EME-7 manufactured by Sumitomo Bakelite.
Using 720, mold temperature 180 ° C, injection pressure 75kg
/ Cm 2 , 225 pBGA with a curing time of 2 minutes (package size: 24 × 24 mm, thickness: 1.17 mm, silicon chip size: 9 × 9 mm, thickness: 0.35 mm, chip and bonding pad of circuit board having diameter of 25 μm) (Bonded with a gold wire.) And post-cured at 175 ° C. for 8 hours. After cooling to room temperature, the displacement of the height of the package upper surface was measured diagonally from the gate portion of the package by a surface roughness meter, and the maximum displacement value based on the gate portion was defined as the amount of warpage. The unit is μm. Eight packages obtained by the same method as in the BGA solder crack resistance were left in an environment of 85 ° C. and a relative humidity of 60% for 240 hours.
IR reflow treatment was performed according to the method of C. After the treatment, the presence of peeling and cracks in the inside was observed with an ultrasonic flaw detector, and the number of defective packages was counted. When the number of defective packages is n, it is displayed as n / 8.
【0023】本発明のエポキシ樹脂組成物を用いて得ら
れた銅張積層板は、ハロゲン化合物を使用していないに
もかかわらず優れた難燃性を有し、積層板単体及びIC
パッケージでの評価において優れた半田耐熱性を示し、
加えて成形後の反りも極めて小さい。The copper-clad laminate obtained by using the epoxy resin composition of the present invention has excellent flame retardancy even though it does not use a halogen compound.
Shows excellent solder heat resistance in package evaluation,
In addition, the warpage after molding is extremely small.
【0024】[0024]
【表1】 [Table 1]
【0025】[0025]
【表2】 [Table 2]
【0026】表の注 1)シリカの表面処理方法:実施例1と同様のものは
A、実施例2と同様のものはB、実施例3と同様のもの
はCで表した。 2)シリコーンオイル型カップリング剤A:日本ユニカ
ー製MAC21013)シリコーンオイル型カップリン
グ剤B:日本ユニカー製MAC2301 4)オルソクレゾールノボラックエポキシ樹脂:大日本
インキ化学製エピクロN−665 5)フェノールノボラックエポキシ樹脂:大日本インキ
化学製エピクロンN−775 6)テトラキスヒドロキシフェニルエタン型エポキシ樹
脂:油化シェルエポキシ製エピコートE1031S 7)トリスヒドロキシフェニルメタン型エポキシ樹脂:
油化シェルエポキシ製エピコートE1032 8)ビスフェノールAノボラックエポキシ樹脂:軟化点
70℃、エポキシ当量201 9)ビスフェノールA型エポキシ樹脂:エポキシ当量2
50 10)フェノールノボラック:軟化点105℃、水酸基
当量104 11)ビスフェノールAノボラック:軟化点115℃、
水酸基当量129 12)フェノールアラルキル樹脂:三井化学製XL−2
25 13)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド(三光化学製HC
A) 14)2−フェニル−4−メチルイミダゾール:配合量
はエポキシ樹脂と硬化剤の合計量100部に対する量Notes to Table 1) Surface treatment method of silica: A was the same as in Example 1, B was the same as Example 2, and C was the same as Example 3. 2) Silicone oil type coupling agent A: MAC21013 manufactured by Nippon Unicar) Silicone oil type coupling agent B: MAC2301 manufactured by Nippon Unicar 4) Orthocresol novolak epoxy resin: Epichrom N-665 manufactured by Dainippon Ink and Chemicals 5) Phenol novolak epoxy resin : Epicron N-775 manufactured by Dainippon Ink & Chemicals, Inc. 6) Tetrakishydroxyphenylethane type epoxy resin: Epicoat E1031S manufactured by Yuka Shell Epoxy 7) Trishydroxyphenylmethane type epoxy resin:
Eicoat E1032 made by Yuka Shell Epoxy 8) Bisphenol A novolak epoxy resin: softening point 70 ° C, epoxy equivalent 201 9) Bisphenol A type epoxy resin: epoxy equivalent 2
50 10) Phenol novolak: softening point 105 ° C., hydroxyl equivalent 104 10 11) Bisphenol A novolak: softening point 115 ° C.
Hydroxyl equivalent 129 12) Phenol aralkyl resin: XL-2 manufactured by Mitsui Chemicals
25 13) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HC manufactured by Sanko Chemical Co., Ltd.)
A) 14) 2-Phenyl-4-methylimidazole: The amount is based on 100 parts of the total amount of the epoxy resin and the curing agent.
【0027】[0027]
【発明の効果】本発明のエポキシ樹脂組成物は、ハロゲ
ン系難燃剤を使用せずとも優れた難燃性を有し、高耐
熱、低熱膨張の特性を有している。従って、本発明のエ
ポキシ樹脂組成物から得られた銅張積層板は半田耐熱性
に優れ、反りの小さいICパッケージのリジッドインタ
ーポーザを提供でき、関連産業に大きく寄与することが
できる。The epoxy resin composition of the present invention has excellent flame retardancy without using a halogen-based flame retardant, and has high heat resistance and low thermal expansion characteristics. Therefore, the copper-clad laminate obtained from the epoxy resin composition of the present invention has excellent solder heat resistance and can provide a rigid interposer for an IC package with a small warpage, which can greatly contribute to related industries.
フロントページの続き Fターム(参考) 4F072 AA01 AA04 AA05 AA06 AA07 AB09 AB27 AD27 AE01 AE07 AE10 AF06 AF21 AG03 AG14 AG16 AG19 AH02 AH21 AJ04 AK14 AL12 AL13 4J002 CC03X CC06X CD04W CD06W DJ016 EW027 FB096 FD016 FD137 FD14X GQ00 4J036 AA02 AF03 AF06 AF07 DC40 FA05 FA12 FB07 FB08 JA08 JA11 Continued on the front page F-term (reference) 4F072 AA01 AA04 AA05 AA06 AA07 AB09 AB27 AD27 AE01 AE07 AE10 AF06 AF21 AG03 AG14 AG16 AG19 AH02 AH21 AJ04 AK14 AL12 AL13 4J002 CC03X CC06X CD04W CD06W DJ016 EW027AF03 AF00 DC40 FA05 FA12 FB07 FB08 JA08 JA11
Claims (14)
を有するエポキシ樹脂、(B)1分子中に3個以上のフ
ェノール性水酸基を有するフェノール樹脂系硬化剤、
(C)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド、及び(D)カップ
リング剤で予め表面処理された平均粒径2μm以下の球
状溶融シリカを必須成分とすることを特徴とするエポキ
シ樹脂組成物。(A) an epoxy resin having three or more epoxy groups in one molecule; (B) a phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule;
Essential components are (C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and (D) spherical fused silica having an average particle diameter of 2 μm or less which has been previously surface-treated with a coupling agent. An epoxy resin composition, characterized in that:
プリング剤、アミノシランカップリング剤、ウレイドシ
ランカップリング剤、メルカプトシランカップリング
剤、ジシラザン、シロキサン結合の繰り返し単位を2個
以上有し、かつアルコキシ基を有するシリコーンオイル
型カップリング剤からなる群から選ばれる少なくとも1
種のカップリング剤である請求項1記載のエポキシ樹脂
組成物。2. The coupling agent has two or more repeating units of an epoxy silane coupling agent, an amino silane coupling agent, a ureido silane coupling agent, a mercapto silane coupling agent, a disilazane, a siloxane bond, and an alkoxy group. At least one selected from the group consisting of silicone oil type coupling agents having
The epoxy resin composition according to claim 1, which is a kind of coupling agent.
メタン型エポキシ樹脂、テトラキスヒドロキシフェニル
エタン型エポキシ樹脂、ノボラック型エポキシ樹脂から
なる群から選ばれる少なくとも1種のエポキシ樹脂であ
る請求項1記載のエポキシ樹脂組成物。3. The epoxy according to claim 1, wherein the component (A) is at least one epoxy resin selected from the group consisting of a trishydroxyphenylmethane type epoxy resin, a tetrakishydroxyphenylethane type epoxy resin, and a novolak type epoxy resin. Resin composition.
キシ樹脂(A1)、及びトリスヒドロキシフェニルメタ
ン型エポキシ樹脂とテトラキスヒドロキシフェニルエタ
ン型エポキシ樹脂からなる群から少なくとも1種選ばれ
るエポキシ樹脂(A2)が必須であることを特徴とする
請求項1記載のエポキシ樹脂組成物。4. In the component (A), a novolak type epoxy resin (A1) and an epoxy resin (A2) selected from at least one selected from the group consisting of a trishydroxyphenylmethane type epoxy resin and a tetrakishydroxyphenylethane type epoxy resin. The epoxy resin composition according to claim 1, which is essential.
る請求項1乃至4のいずれかに記載のエポキシ樹脂組成
物。5. The epoxy resin composition according to claim 1, wherein the component (B) is phenol novolak.
状溶融シリカ、カップリング剤及び溶剤を混合し加熱反
応してなるスラリー状物にて配合されてなる請求項1乃
至5のいずれかに記載のエポキシ樹脂組成物。6. The composition according to claim 1, wherein the component (D) is mixed in a slurry obtained by mixing spherical fused silica having an average particle diameter of 2 μm or less, a coupling agent and a solvent, and performing a heat reaction. An epoxy resin composition according to any one of the above.
キシ樹脂組成物を繊維基材に含浸、乾燥してなることを
特徴とするプリプレグ。7. A prepreg obtained by impregnating a fiber base material with the epoxy resin composition according to claim 1 and drying it.
てなることを特徴とする銅張積層板。8. A copper-clad laminate obtained by heating and molding the prepreg according to claim 7.
を有するエポキシ樹脂、(B)1分子中に3個以上のフ
ェノール性水酸基を有するフェノール樹脂系硬化剤、
(C)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド、及び(D)平均粒
径2μm以下の球状溶融シリカ、カップリング剤及び溶
剤を混合し加熱反応してなるスラリー、を必須成分とす
る樹脂ワニスを基材に塗布、乾燥してなることを特徴と
するプリプレグ。9. (A) an epoxy resin having three or more epoxy groups in one molecule, (B) a phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule,
(C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, (D) spherical fused silica having an average particle diameter of 2 μm or less, a coupling agent and a solvent are mixed and reacted by heating. A prepreg, characterized in that a resin varnish containing a slurry as an essential component is applied to a substrate and dried.
プリング剤、アミノシランカップリング剤、ウレイドシ
ランカップリング剤、メルカプトシランカップリング
剤、ジシラザン、シロキサン結合の繰り返し単位を2個
以上有し、かつアルコキシ基を有するシリコーンオイル
型カップリング剤からなる群から少なくとも1種選ばれ
ることを特徴とする請求項8記載のプリプレグ。10. The coupling agent has two or more repeating units of an epoxy silane coupling agent, an amino silane coupling agent, a ureido silane coupling agent, a mercapto silane coupling agent, a disilazane, and a siloxane bond, and has an alkoxy group. The prepreg according to claim 8, wherein the prepreg is selected from at least one member selected from the group consisting of silicone oil type coupling agents.
ルメタン型エポキシ樹脂、テトラキスヒドロキシフェニ
ルエタン型エポキシ樹脂、ノボラック型エポキシ樹脂か
らなる群から選ばれる少なくとも1種のエポキシ樹脂で
ある請求項8又は9記載のプリプレグ。11. The composition according to claim 8, wherein the component (A) is at least one epoxy resin selected from the group consisting of a trishydroxyphenylmethane type epoxy resin, a tetrakishydroxyphenylethane type epoxy resin, and a novolak type epoxy resin. Prepreg.
ポキシ樹脂(A1)及び、トリスヒドロキシフェニルメ
タン型エポキシ樹脂とテトラキスヒドロキシフェニルエ
タン型エポキシ樹脂からなる群から少なくとも1種選ば
れるエポキシ樹脂(A2)が必須であることを特徴とす
る請求項8又は9記載のプリプレグ。12. The component (A) comprises a novolak epoxy resin (A1) and an epoxy resin (A2) selected from at least one selected from the group consisting of a trishydroxyphenylmethane epoxy resin and a tetrakishydroxyphenylethane epoxy resin. The prepreg according to claim 8, wherein the prepreg is essential.
ある請求項8乃至11記載のプリプレグ。13. The prepreg according to claim 8, wherein the component (B) is phenol novolak.
加熱成形してなることを特徴とする銅張積層板。14. A copper-clad laminate obtained by heating and molding the prepreg according to claim 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000278008A JP4729778B2 (en) | 2000-09-13 | 2000-09-13 | Epoxy resin composition, prepreg, and copper-clad laminate using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000278008A JP4729778B2 (en) | 2000-09-13 | 2000-09-13 | Epoxy resin composition, prepreg, and copper-clad laminate using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002088141A true JP2002088141A (en) | 2002-03-27 |
| JP4729778B2 JP4729778B2 (en) | 2011-07-20 |
Family
ID=18763237
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000278008A Expired - Fee Related JP4729778B2 (en) | 2000-09-13 | 2000-09-13 | Epoxy resin composition, prepreg, and copper-clad laminate using the same |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002088140A (en) * | 2000-09-13 | 2002-03-27 | Sumitomo Bakelite Co Ltd | Epoxy resin composition, prepreg and copper-clad laminate using the same |
| JP2002114837A (en) * | 2000-10-05 | 2002-04-16 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for interposer, prepreg and copper-clad laminate using the same |
| JP2006036916A (en) * | 2004-07-27 | 2006-02-09 | Admatechs Co Ltd | Slurry composition, varnish composition, and insulating film and prepreg using the same |
| JP2006249415A (en) * | 2005-02-09 | 2006-09-21 | Toray Ind Inc | Adhesive composition for semiconductor device, adhesive sheet for semiconductor device using the same, substrate for semiconductor connection, and semiconductor device |
| JP2010150407A (en) * | 2008-12-25 | 2010-07-08 | Ajinomoto Co Inc | Method for producing resin composition varnish |
| CN111269461A (en) * | 2020-03-09 | 2020-06-12 | 贵州民族大学 | Phosphaphenanthrene silane grafted and modified graphene and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2002088140A (en) * | 2000-09-13 | 2002-03-27 | Sumitomo Bakelite Co Ltd | Epoxy resin composition, prepreg and copper-clad laminate using the same |
| JP2002114837A (en) * | 2000-10-05 | 2002-04-16 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for interposer, prepreg and copper-clad laminate using the same |
| JP2006036916A (en) * | 2004-07-27 | 2006-02-09 | Admatechs Co Ltd | Slurry composition, varnish composition, and insulating film and prepreg using the same |
| JP2006249415A (en) * | 2005-02-09 | 2006-09-21 | Toray Ind Inc | Adhesive composition for semiconductor device, adhesive sheet for semiconductor device using the same, substrate for semiconductor connection, and semiconductor device |
| JP2010150407A (en) * | 2008-12-25 | 2010-07-08 | Ajinomoto Co Inc | Method for producing resin composition varnish |
| CN111269461A (en) * | 2020-03-09 | 2020-06-12 | 贵州民族大学 | Phosphaphenanthrene silane grafted and modified graphene and preparation method thereof |
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| Publication number | Publication date |
|---|---|
| JP4729778B2 (en) | 2011-07-20 |
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