JP2002085978A - Photocatalytic member - Google Patents
Photocatalytic memberInfo
- Publication number
- JP2002085978A JP2002085978A JP2000279151A JP2000279151A JP2002085978A JP 2002085978 A JP2002085978 A JP 2002085978A JP 2000279151 A JP2000279151 A JP 2000279151A JP 2000279151 A JP2000279151 A JP 2000279151A JP 2002085978 A JP2002085978 A JP 2002085978A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photocatalyst
- reduction catalyst
- reduction
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title abstract description 21
- 238000006722 reduction reaction Methods 0.000 claims abstract description 101
- 230000009467 reduction Effects 0.000 claims abstract description 74
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 41
- 239000001301 oxygen Substances 0.000 claims abstract description 38
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 25
- 230000001443 photoexcitation Effects 0.000 claims abstract description 7
- 239000011941 photocatalyst Substances 0.000 claims description 78
- 239000003054 catalyst Substances 0.000 claims description 68
- 239000000758 substrate Substances 0.000 claims description 39
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 37
- 238000000576 coating method Methods 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 7
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 23
- 238000007254 oxidation reaction Methods 0.000 abstract description 14
- 238000010030 laminating Methods 0.000 abstract description 5
- 230000003197 catalytic effect Effects 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- -1 superoxide ions Chemical class 0.000 description 28
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 25
- 239000000126 substance Substances 0.000 description 23
- 239000010409 thin film Substances 0.000 description 16
- 230000000844 anti-bacterial effect Effects 0.000 description 15
- 229910001220 stainless steel Inorganic materials 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 12
- 239000010935 stainless steel Substances 0.000 description 12
- 239000004408 titanium dioxide Substances 0.000 description 11
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000007733 ion plating Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 238000005057 refrigeration Methods 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 6
- 238000007710 freezing Methods 0.000 description 5
- 230000008014 freezing Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 235000013305 food Nutrition 0.000 description 4
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 241000233866 Fungi Species 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 101100280298 Homo sapiens FAM162A gene Proteins 0.000 description 1
- 101000631695 Homo sapiens Succinate dehydrogenase assembly factor 3, mitochondrial Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 102100023788 Protein FAM162A Human genes 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- 102100028996 Succinate dehydrogenase assembly factor 3, mitochondrial Human genes 0.000 description 1
- 206010042496 Sunburn Diseases 0.000 description 1
- 229910009973 Ti2O3 Inorganic materials 0.000 description 1
- 229910009815 Ti3O5 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- GQUJEMVIKWQAEH-UHFFFAOYSA-N titanium(III) oxide Chemical compound O=[Ti]O[Ti]=O GQUJEMVIKWQAEH-UHFFFAOYSA-N 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光触媒層を備えた
光触媒部材に関し、特に微弱紫外光や可視光領域の光線
でも光触媒機能を発揮する光触媒部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocatalyst member provided with a photocatalyst layer, and more particularly, to a photocatalyst member capable of exhibiting a photocatalytic function even with weak ultraviolet light or light in the visible light region.
【0002】[0002]
【従来の技術】従来、光触媒として2酸化チタンなどの
チタン酸化物からなる光触媒層を基材の表面に施し、光
照射によって生じるスーパーオキサイドや水酸基ラジカ
ルを用いて抗菌機能や浄化機能などを有した数多くの光
触媒部材が知られている。2. Description of the Related Art Conventionally, a photocatalyst layer made of a titanium oxide such as titanium dioxide has been applied as a photocatalyst on the surface of a substrate, and has an antibacterial function and a purifying function using superoxide and hydroxyl radicals generated by light irradiation. Many photocatalyst members are known.
【0003】例えば、アナターゼ型2酸化チタンは38
0nm以下の波長の紫外光で光励起するものであって、
太陽光を浴びると太陽光に含まれる紫外線によってチタ
ン酸化物が光励起され、価電子帯では正孔(h+)が、
伝導帯では電子(e−)が生じ、正孔が大気に含まれる
水と酸化反応してヒドロキシラジカルが、電子が大気中
の酸素と還元反応してスーパーオキサイドイオンを生成
する。そして、このヒドロキシラジカルやスーパーオキ
サイドイオンにより抗菌機能や浄化機能等を発揮するこ
とが知られている。[0003] For example, anatase type titanium dioxide is 38
Which is photo-excited by ultraviolet light having a wavelength of 0 nm or less,
When exposed to sunlight, titanium oxide is photo-excited by ultraviolet rays contained in sunlight, and holes (h +) are generated in the valence band.
In the conduction band, electrons (e-) are generated, and the holes undergo an oxidation reaction with water contained in the atmosphere to generate hydroxyl radicals, and the electrons undergo a reduction reaction with oxygen in the atmosphere to generate superoxide ions. It is known that the hydroxy radical and superoxide ion exert an antibacterial function and a purifying function.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、これら
の酸化、還元反応は光粒子エネルギーが高い紫外線領域
の光線が豊富な太陽光であれば充分に行われるが、室内
照明では紫外線領域の光子量が、例えば蛍光灯の場合は
全体の光子量の約0.5%と極めて少なく、微弱紫外光
で励起される正孔数や電子数が少なく、従って、ヒドロ
キシラジカルやスーパーオキサイドイオンの生成が臭い
成分などの分子数に比べて圧倒的に少なくて、抗菌機能
や浄化機能などの光触媒機能を充分に発揮できなかっ
た。However, these oxidation and reduction reactions are sufficiently carried out in sunlight having abundant rays in the ultraviolet region where the photoparticle energy is high, but in indoor lighting, the amount of photons in the ultraviolet region is low. For example, in the case of a fluorescent lamp, the amount of photons is extremely small, about 0.5% of the total amount of photons, and the number of holes and electrons excited by weak ultraviolet light is small. Therefore, generation of hydroxyl radicals and superoxide ions is an odorous component. The photocatalytic functions such as the antibacterial function and the purifying function could not be sufficiently exhibited because the number was extremely small as compared with the number of molecules.
【0005】そこで、室内照明に豊富に含まれる可視光
領域の光線を用いることが考えられるが、可視光領域光
線の光粒子エネルギーが低くて励起した電子エネルギー
が小さくて、電子と大気中の酸素との還元反応が充分に
行われず、電子が余ってしまう。一方、正孔側では、正
孔が接することができる水分が豊富に有れば大半の正孔
が水と酸化反応してヒドロキシラジカルが発生し抗菌機
能や浄化機能等を発揮しうるが、大気中の通常の湿度状
態では正孔が接する水分が少なくてヒドロキシラジカル
の発生量が少ないうえ、余った電子が正孔とが再結合し
て水との酸化反応を阻害し、抗菌機能や浄化機能等を発
揮できず、結果的に室内での利用は困難であった。Therefore, it is conceivable to use light rays in the visible light range, which are abundantly contained in indoor lighting. However, the light particle energy of the light rays in the visible light range is low, and the excited electron energy is small. The reduction reaction is not performed sufficiently, and electrons remain. On the other hand, on the hole side, if there is abundant moisture that the holes can come in contact with, most of the holes will oxidize and react with water to generate hydroxyl radicals, which can exert antibacterial and purifying functions. In normal humidity conditions, the amount of water in contact with holes is small and the amount of hydroxyl radicals generated is small, and the surplus electrons recombine with holes to inhibit the oxidation reaction with water, and have antibacterial and purification functions. And so on, and as a result, indoor use was difficult.
【0006】本発明は以上のような課題を解決し、電子
と酸素との還元反応および正孔と水との酸化反応が制約
となっていることに着目して、電子による酸素の還元反
応と正孔による水の酸化反応を促進し、電子と正孔との
再結合を減らすとともに、還元反応に必要なエネルギー
電位を下げて、室内照明に豊富に含まれる可視光領域の
光線や微弱紫外光の利用を可能にすることにある。The present invention solves the above problems, and focuses on the fact that the reduction reaction between electrons and oxygen and the oxidation reaction between holes and water are restricted. It promotes the oxidation reaction of water by holes, reduces the recombination of electrons and holes, and lowers the energy potential required for the reduction reaction to reduce the amount of visible light and weak ultraviolet light abundantly contained in indoor lighting. To enable the use of
【0007】[0007]
【課題を解決するための手段】上記課題を解決するため
に本発明の光触媒部材は、光触媒層とこの光触媒層表面
に親水層を積層した導電性基材と、この導電性基材と電
気的に導通し上記光触媒層の光励起で生じた電子の酸素
との還元反応を促進する還元触媒部とを備えていること
を特徴としている。In order to solve the above-mentioned problems, a photocatalyst member according to the present invention comprises a photocatalyst layer, a conductive substrate having a hydrophilic layer laminated on the surface of the photocatalyst layer, and an electrically conductive substrate. And a reduction catalyst section for conducting a reduction reaction of electrons generated by the photoexcitation of the photocatalyst layer with oxygen to oxygen.
【0008】このように構成することで、光励起して生
じた正孔は親水層で捕捉された水と円滑に酸化反応して
ヒドロキシラジカルを生じ、電子の一部は還元触媒部側
に移動して還元触媒部側で酸素と還元反応し、また電子
の残部は光触媒層側でも酸素と還元反応するをもって、
電子と正孔との再結合が減少するとともに、還元触媒に
よって酸素還元に必要なエネルギー電位が低くなり、結
果的に室内照明に豊富に存在する可視光領域の550n
m近傍までの光粒子が保有しているエネルギーレベルで
励起した電子でも還元反応が可能になる。従って、還元
触媒部側においては電子と酸素との還元反応でスーパー
オキサイドイオンが生じ、光触媒層側においては正孔と
親水層に捕捉された水との酸化反応、および電子と酸素
との還元反応でヒドロキシラジカルやスーパーオキサイ
ドイオンが生じ、強い分解機能や抗菌機能や浄化機能等
を効率的に発揮することが可能になる。With this configuration, holes generated by photoexcitation smoothly oxidize with water trapped in the hydrophilic layer to generate hydroxyl radicals, and some of the electrons move to the side of the reduction catalyst. To reduce oxygen with oxygen on the reduction catalyst side, and the rest of the electrons also reduce with oxygen on the photocatalyst layer side.
The recombination between electrons and holes is reduced, and the energy potential required for oxygen reduction is reduced by the reduction catalyst. As a result, 550 n of the visible light region abundantly present in indoor lighting is obtained.
A reduction reaction is possible even with electrons excited at the energy level held by the photoparticles up to near m. Therefore, superoxide ions are generated by a reduction reaction between electrons and oxygen on the reduction catalyst section side, and an oxidation reaction between holes and water trapped in the hydrophilic layer and a reduction reaction between electrons and oxygen on the photocatalyst layer side. Then, hydroxyl radicals and superoxide ions are generated, and a strong decomposition function, an antibacterial function, a purifying function, and the like can be efficiently exhibited.
【0009】光触媒層の主成分として酸化、還元反応に
優れたチタン酸化物あるいはコストが安価なアルファ型
結晶構造のFe2O3を用いることが好ましい。As a main component of the photocatalyst layer, it is preferable to use titanium oxide excellent in oxidation and reduction reactions or Fe2O3 having an alpha-type crystal structure which is inexpensive.
【0010】親水層の主成分としてSiO2を用いれ
ば、単一酸化物でドライコーティングし易く、且つ安価
で好ましい。When SiO2 is used as the main component of the hydrophilic layer, dry coating with a single oxide is easy and inexpensive, which is preferable.
【0011】導電性基材が板状で、一方の表面に光触媒
層と親水層を積層し、他方の表面に還元触媒部を形成す
れば、両面で強い抗菌機能や浄化機能等を効率的に発揮
出来ると共に、光触媒層側に光が照射すれば、還元触媒
部側が影になって光が照射せずとも抗菌機能や分解、浄
化機能を発揮できて好ましい。If the conductive base material is plate-shaped, a photocatalyst layer and a hydrophilic layer are laminated on one surface, and a reduction catalyst portion is formed on the other surface, a strong antibacterial function and purification function can be efficiently performed on both surfaces. Irradiating the photocatalyst layer side with light is preferable because the reduction catalyst portion side can be shaded and exhibit an antibacterial function, decomposition and purification function without irradiating light.
【0012】導電性基材に、この基材を貫通する多数の
小孔部が設けると、この小孔部に光触媒層側から還元触
媒部に向かってダイオキシンやホルムアルデヒド、臭い
物質などを含んだ空気を通すことで、光触媒層側ではス
ーパーオキサイドイオンやヒドロキシラジカルによって
これらの物質が酸化され、還元触媒部側ではスーパーオ
キサイドイオンによってこれらの物質が酸化され、これ
ら二重の酸化反応によって極めて効率よく分解すること
ができ、好ましい。When a large number of small holes penetrating the base material are provided in the conductive base material, air containing dioxin, formaldehyde, odorous substance, etc. is formed in the small holes from the photocatalyst layer side toward the reduction catalyst portion. In the photocatalytic layer, these substances are oxidized by superoxide ions and hydroxyl radicals, and in the reduction catalyst section, these substances are oxidized by superoxide ions. Can be preferred.
【0013】光触媒層や親水層、還元触媒部をドライコ
ーティング法にて形成するのが好ましく、この様にして
形成すれば膜厚コントロールが行え、例えば光触媒層膜
厚を光触媒効果が最適に発揮できる約200〜500n
mに、親水層膜厚を光りの透過を阻害せず且つ親水効果
を発揮する1〜5nmに、還元触媒部膜厚を必要最小薄
さの1〜5nmに設定でき、しかもこれら光触媒層や親
水層や還元触媒部が分子レベルで密着し、耐久性に極め
て優れたものにできる。It is preferable that the photocatalyst layer, the hydrophilic layer, and the reduction catalyst portion are formed by a dry coating method. If formed in this manner, the film thickness can be controlled, and, for example, the photocatalytic layer can exhibit the photocatalytic effect optimally. About 200-500n
m, the thickness of the hydrophilic layer can be set to 1 to 5 nm which does not hinder the transmission of light and exhibits a hydrophilic effect, and the thickness of the reduction catalyst portion can be set to the minimum required thickness of 1 to 5 nm. The layer and the reduction catalyst portion adhere to each other at the molecular level, and can have extremely excellent durability.
【0014】[0014]
【発明の実施の形態】以下図面に基き本発明を説明する
と、図1は光触媒部材の製造方法の基本的な工程を示す
模式図、図2は製造工程に基く断面図であって、図2
(a)は白金を主成分とした還元触媒部としての還元触
媒層をステンレス板などの導電性板状基材裏面にコーテ
ィングした断面図、図2(b)は次いで光触媒層として
チタン酸化物薄膜を基材表面にコーティングした断面
図、図2(c)はチタン酸化物薄膜に更に親水層として
酸化ケイ素(SiO2)薄膜をコーティングした断面
図、図3は酸化電位を示すグラフ、図4は還元触媒物質
を基材にコーティングする装置の模式図、図5はチタン
酸化物と酸化ケイ素をコーティングし積層する装置の模
式図、図6は図5の装置の製造工程を示す模式図、図7
は光触媒部材をフィルターに応用しレンジフードに用い
た例を示す模式図、図8は光触媒部材をフィルターに応
用し冷蔵・冷凍設備に用いた例を示す模式図、図9はそ
のフィルターの要部の断面図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. FIG. 1 is a schematic view showing basic steps of a method for manufacturing a photocatalyst member, and FIG. 2 is a sectional view based on the manufacturing steps.
(A) is a cross-sectional view in which a reduction catalyst layer as a reduction catalyst portion mainly containing platinum is coated on the back surface of a conductive plate-like base material such as a stainless steel plate, and (b) is a titanium oxide thin film as a photocatalyst layer. 2 (c) is a cross-sectional view in which a titanium oxide thin film is further coated with a silicon oxide (SiO2) thin film as a hydrophilic layer, FIG. 3 is a graph showing oxidation potential, and FIG. 4 is reduction. FIG. 5 is a schematic view of an apparatus for coating a catalyst substance on a substrate, FIG. 5 is a schematic view of an apparatus for coating and laminating titanium oxide and silicon oxide, and FIG. 6 is a schematic view showing a manufacturing process of the apparatus of FIG.
Is a schematic diagram showing an example in which a photocatalyst member is applied to a filter and used in a range hood, FIG. 8 is a schematic diagram showing an example in which a photocatalyst member is applied to a filter and used in refrigeration / refrigeration equipment, and FIG. 9 is a main part of the filter. FIG.
【0015】図1及び図2に基いて本発明光触媒部材の
製造方法の基本的な製造工程を説明すると、Aはステン
レスなどの導電性板状基材1の一側表面に例えばPt等
を主成分とし電子の酸素との還元を促進する還元触媒部
としての還元触媒層2をコーティングする工程、Bは導
電性板状基材1の他方側表面に例えばTiO2からなる
光触媒層3をコーティングする工程、Cは更に例えばS
iO2からなる親水層4を積層する工程、Dはその後加
熱処理する工程である。Referring to FIGS. 1 and 2, the basic manufacturing process of the method for manufacturing a photocatalyst member according to the present invention will be described. A is mainly made of Pt or the like on one side surface of a conductive plate-like base material 1 such as stainless steel. A step of coating a reduction catalyst layer 2 as a reduction catalyst part which promotes reduction of electrons and oxygen as a component; a step B of coating a photocatalyst layer 3 made of, for example, TiO2 on the other surface of the conductive plate-like base material 1 , C is, for example, S
The step of laminating the hydrophilic layer 4 made of iO2, and the step D is a step of performing a heat treatment thereafter.
【0016】基材1は線径0.1mm〜0.5mmのス
テンレス製線材を編んで多数の小孔部5を形成した10
メッシュ〜100メッシュの網材あるいは厚さ0.1〜
1mmの板材を用いており、ドライコーティング方法に
て一方の面に白金を主成分とした還元触媒層2を形成し
ている。The base material 1 is formed by knitting a stainless steel wire having a wire diameter of 0.1 mm to 0.5 mm to form a large number of small holes 5.
Mesh ~ 100 mesh net or thickness 0.1 ~
A plate material of 1 mm is used, and a reduction catalyst layer 2 mainly composed of platinum is formed on one surface by a dry coating method.
【0017】また、基材1の他方の面には、ドライコー
ティング方法で例えば2酸化チタン(TiO2)からな
る光触媒層3と酸化ケイ素(SiO2)からなる極薄い
親水層4を積層形成している。On the other surface of the substrate 1, a photocatalytic layer 3 made of, for example, titanium dioxide (TiO2) and an extremely thin hydrophilic layer 4 made of silicon oxide (SiO2) are formed by a dry coating method. .
【0018】親水層4は、その表面が水との接触角に換
算して約10度以下の水濡れ性を呈することを言い、S
iO2であればその角度は約5度であって水濡れ性が良
く、水は水滴状に固まること無く万遍なく全面に薄く広
がることになる。The hydrophilic layer 4 has a surface having a water wettability of about 10 degrees or less in terms of a contact angle with water.
In the case of iO2, the angle is about 5 degrees, and the water wettability is good, and the water spreads evenly and thinly over the entire surface without being hardened in the form of water droplets.
【0019】而して、図3に示すように還元触媒層2表
面では、還元触媒層2を白金で形成した場合、電子(e
-)と酸素(O2)との還元電位は水素基準電位で表す
と0.491eVとなり、一方還元触媒層2を施さない
生地の場合では、その表面上での電子と酸素との還元電
位は−0.284eVである。When the reduction catalyst layer 2 is formed of platinum on the surface of the reduction catalyst layer 2 as shown in FIG.
The reduction potential of-) and oxygen (O2) is 0.491 eV in terms of a hydrogen reference potential, whereas in the case of a fabric without the reduction catalyst layer 2, the reduction potential of electrons and oxygen on the surface is- 0.284 eV.
【0020】一方、ルチル型TiO2における酸化電位
は3eVであって、白金を主成分とする還元触媒層2が
存在すると、これらの電位差が2.51eVとなり、光
触媒層3に可視光が照射されると、可視光領域の約55
0nmまでの波長でもって光励起された電子(e−)の
一部が還元触媒層2表面側に移動して、還元触媒層2表
面において電子(e-)が酸素(O2)と還元反応して
スーパーオキサイドイオンを生成し、また電子(e-)
の一部及び正孔(h+)は光触媒層3表面側に移動し
て、親水層4表面において電子(e-)が酸素(O2)
と還元反応してスーパーオキサイドイオンを、正孔(h
+)が親水層4に捕捉された水と酸化反応してヒドロキ
シラジカルを生成する。On the other hand, the oxidation potential of rutile-type TiO2 is 3 eV, and if a reduction catalyst layer 2 containing platinum as a main component is present, the potential difference between them becomes 2.51 eV and the photocatalyst layer 3 is irradiated with visible light. And about 55 in the visible light region
Part of the electrons (e−) that are photoexcited at a wavelength of up to 0 nm move to the surface of the reduction catalyst layer 2 and the electrons (e−) undergo a reduction reaction with oxygen (O2) on the surface of the reduction catalyst layer 2. Generates superoxide ions and produces electrons (e-)
And the holes (h +) move to the surface side of the photocatalyst layer 3, and electrons (e−) are converted to oxygen (O 2) on the surface of the hydrophilic layer 4.
Reacts with the superoxide ion to form a hole (h
+) Undergoes an oxidation reaction with water trapped in the hydrophilic layer 4 to generate a hydroxyl radical.
【0021】このように、室内照明に豊富に存在する可
視光領域、特に550nm近傍領域までの光線(光粒
子)で励起したエネルギーを有する電子の利用が可能に
なり、室内照明でもって光触媒層3側ではヒドロキシラ
ジカルによる酸化力とスーパーオキサイドイオンによる
酸化力が、還元触媒層2側ではスーパーオキサイドイオ
ンによる酸化力が働いて、強い抗菌機能や浄化機能等を
基材1の両面で効果的に発揮することが可能になる。As described above, it is possible to use electrons having energy excited by light rays (light particles) in a visible light region abundantly present in room lighting, particularly in a region near 550 nm. The oxidizing power due to the hydroxyl radical and the oxidizing power due to the superoxide ion act on the side, and the oxidizing power due to the superoxide ion acts on the reduction catalyst layer 2 side, so that a strong antibacterial function and a purifying function are effectively exerted on both surfaces of the substrate 1. It becomes possible to do.
【0022】勿論、蛍光灯に含まれる微弱紫外光で光励
起して生じた少ない電子や正孔でも、効率よく酸化、還
元反応することが可能になる。Of course, even with a small number of electrons and holes generated by photoexcitation with the weak ultraviolet light contained in the fluorescent lamp, the oxidation and reduction reactions can be efficiently performed.
【0023】基材1への還元触媒層2と光触媒層3と親
水層4は、図4、図5に示すドライコーティングする方
法にて実現することができる。The reduction catalyst layer 2, the photocatalyst layer 3 and the hydrophilic layer 4 on the substrate 1 can be realized by a dry coating method shown in FIGS.
【0024】基材1への還元触媒層2は、ドライコーテ
ィングする方法としてスパッタリング法を用いており、
図4に示すようにロール状に巻回したステンレス網材か
らなる基材1を、例えばアルゴンガスなどの不活性ガス
を封入した略真空状態のスパッタリングチャンバー6に
おいて、供給ドラム7から巻き取りドラム8へ連続的に
供給しながら触媒物質として白金をスパッタリングして
1〜20nmの白金薄膜から成る還元触媒層2を基材1
の一側表面に形成する。The reduction catalyst layer 2 on the base material 1 uses a sputtering method as a method for dry coating.
As shown in FIG. 4, a substrate 1 made of a stainless steel net material wound in a roll shape is wound from a supply drum 7 into a winding drum 8 in a substantially vacuum sputtering chamber 6 in which an inert gas such as argon gas is sealed. The catalyst is sputtered with platinum while being continuously supplied to the substrate 1 to form a reduction catalyst layer 2 composed of a platinum thin film having a thickness of 1 to 20 nm.
Formed on one side surface.
【0025】この例では、白金を蒸発させる電界印加条
件を一定にして、基材1スピードを変えることにより、
還元触媒層2の厚さの設定を可能にしている。In this example, by changing the speed of the substrate 1 while keeping the electric field application condition for evaporating the platinum constant,
The thickness of the reduction catalyst layer 2 can be set.
【0026】基材1への光触媒層3と親水層4をドライ
コーティングする方法は、図5に示すようにイオンプレ
ーティング法にて同一のイオンプレーティングチャンバ
ー9にて形成することができる。The method of dry coating the photocatalyst layer 3 and the hydrophilic layer 4 on the substrate 1 can be formed in the same ion plating chamber 9 by an ion plating method as shown in FIG.
【0027】そして、この例では、還元触媒層2をコー
ティングしたロール状基材1をイオンプレーティングチ
ャンバー9に供給する際の速度や電子銃15への電界印
加条件を変えることにより、光触媒層3と親水層4の厚
さ設定を可能にしている。In this example, the photocatalytic layer 3 is changed by changing the speed at which the roll-shaped substrate 1 coated with the reduction catalyst layer 2 is supplied to the ion plating chamber 9 and the conditions for applying an electric field to the electron gun 15. And the thickness of the hydrophilic layer 4 can be set.
【0028】即ち、ロール状に巻回した基材1をセッテ
ィングチャンバー11内のローラー12、13にセッテ
ィングし、これを正転、逆転してイオンプレーティング
チャンバー9内のドラム14表面に基材1を位置させな
がら電子銃15を作動させ、るつぼ16内に充填した例
えば光触媒物質として例えば2酸化チタンを蒸発させて
2酸化チタン薄膜からなる光触媒層3を、次いで、るつ
ぼ16に充填した酸化ケイ素を蒸発させて親水層4を形
成している。That is, the base material 1 wound into a roll is set on rollers 12 and 13 in a setting chamber 11, and is rotated forward and reverse to form the base material 1 on the surface of a drum 14 in an ion plating chamber 9. The electron gun 15 is actuated while the is positioned, and the photocatalyst layer 3 composed of a titanium dioxide thin film is evaporated by evaporating, for example, titanium dioxide as a photocatalytic substance filled in the crucible 16, and then the silicon oxide filled in the crucible 16 is removed. The hydrophilic layer 4 is formed by evaporation.
【0029】工程を説明すると、まず図6(a)に示す
ように、セッティングチャンバー11の蓋17を開け、
ロール状に巻回した基材1をローラー12にセッティン
グして、その先端をローラー13に取付ける。First, as shown in FIG. 6A, the lid 17 of the setting chamber 11 is opened.
The base material 1 wound in a roll is set on a roller 12, and the tip is attached to the roller 13.
【0030】次いで蓋17を閉じ、両チャンバー9、1
1内をアルゴンガスなどの不活性ガス、窒素ガス条件な
どを調整した略真空状態にしてから、図6(b)に示す
ように、基材1をローラー13に巻き取るが、この巻き
取りの際に電子銃15を作動させて、るつぼ16に充填
した2酸化チタンを蒸発させながら、同時に基材1表面
近傍に酸素供給源10より酸素ガスを供給、これにより
確実にTiO2を主成分とする厚さ100〜500nm
の光触媒層3を基材1表面に形成させる。Next, the lid 17 is closed and both chambers 9 and 1 are closed.
After the interior of the substrate 1 is set to a substantially vacuum state in which an inert gas such as an argon gas or the like and a nitrogen gas condition are adjusted, the substrate 1 is wound around a roller 13 as shown in FIG. At this time, the electron gun 15 is operated to evaporate the titanium dioxide filled in the crucible 16 and at the same time supply oxygen gas from the oxygen supply source 10 to the vicinity of the surface of the substrate 1, thereby ensuring that TiO 2 is mainly contained. 100-500nm thickness
Is formed on the surface of the substrate 1.
【0031】そして、表面に光触媒層3がコーティング
された基材1が図6(c)に示すようにローラー13に
巻き取られてしまうと、今度は基材1をローラー12に
巻き取る。Then, when the substrate 1 having the surface coated with the photocatalyst layer 3 is wound up by the roller 13 as shown in FIG. 6C, the substrate 1 is wound up by the roller 12.
【0032】基材1をローラー12に巻き取る際には、
図6(d)に示すように、電子銃15を作動させて、る
つぼ16に充填した酸化ケイ素を蒸発させながら、同時
に基材1表面近傍に酸素供給源10より酸素ガスを供
給、これにより確実にSiO2を主成分とする厚さ1〜
20nmの親水層4を光触媒層3表面に積層させる。When winding the substrate 1 around the roller 12,
As shown in FIG. 6D, the electron gun 15 is operated to evaporate the silicon oxide filled in the crucible 16 and at the same time supply oxygen gas from the oxygen supply source 10 to the vicinity of the surface of the substrate 1, thereby ensuring reliable operation. With a thickness of 1 to 2 mainly composed of SiO2
A 20 nm hydrophilic layer 4 is laminated on the surface of the photocatalyst layer 3.
【0033】尚、光触媒層3や親水層4の膜厚を厚くす
るには、巻き取りスピードを遅く、あるいは電子銃15
への電界印加出力を大きくし、薄くするには巻き取りス
ピードを速く、あるいは電界印加出力を小さくすれば良
い。In order to increase the thickness of the photocatalyst layer 3 and the hydrophilic layer 4, the winding speed must be reduced or the electron gun
In order to increase and reduce the electric field applied output, the winding speed may be increased or the electric field applied output may be reduced.
【0034】また、光触媒層3と親水層4を積層して、
例えば400〜500℃の雰囲気で2時間程度加熱、ア
ニーリングし、その後急冷して酸素欠陥を有したTiO
x(Xは2に近い2より小さい数)を主成分とするアナ
ターゼ型2酸化チタンよりなる光触媒層3を形成する
と、1個の酸素原子が脱離するごとに2個の電子が結晶
内に残し、残った2個の電子が結晶中のTi4+をTi
3+に還元し、このTi3+が強く分極して可視光吸収
メカニズムを形成することができ、効果的である。Further, the photocatalyst layer 3 and the hydrophilic layer 4 are laminated,
For example, TiO having oxygen defects is heated and annealed for about 2 hours in an atmosphere of 400 to 500 ° C., and then rapidly cooled.
When a photocatalytic layer 3 composed of anatase-type titanium dioxide whose main component is x (X is a number smaller than 2 close to 2), two electrons are introduced into the crystal every time one oxygen atom is desorbed. And the remaining two electrons convert Ti4 + in the crystal to Ti4 +
This is effective because it can be reduced to 3+ and this Ti3 + is strongly polarized to form a visible light absorption mechanism.
【0035】この場合、セッティングチャンバー11内
に加熱処理用のヒーターを設けて、加熱処理装置と兼ね
ると、製造効率が高まって好ましい。In this case, it is preferable to provide a heater for heat treatment in the setting chamber 11 so as to serve also as a heat treatment device because the production efficiency is increased.
【0036】尚、18は基材1が通過するスリットを、
基材1を挟み込んだ状態でシャットし、イオンプレーテ
ィングチャンバー9とセッティングチャンバー11とを
遮断するシャッター部材であり、基材1をセットする際
にイオンプレーティングチャンバー9内の真空度を維持
するものである。Reference numeral 18 denotes a slit through which the substrate 1 passes,
A shutter member that shuts the substrate 1 in a sandwiched state and shuts off the ion plating chamber 9 and the setting chamber 11, and maintains a vacuum degree in the ion plating chamber 9 when the substrate 1 is set. It is.
【0037】更に、光触媒物質としてアルファ型Fe2
O3を使用する場合には、同様にるつぼ16にFe2O
3を充填、酸素を供給しながらドライコーティング方法
でFe2O3薄膜を成膜形成し、その後約560〜77
0℃で約1〜3時間加熱、アニーリング後冷却すること
でFe2O3薄膜をアルファ型結晶構造化し、光触媒層
3を形成すれば良い。Further, alpha-type Fe2 is used as a photocatalytic substance.
When O3 is used, the crucible 16 is similarly filled with Fe2O.
3, a Fe2O3 thin film is formed by a dry coating method while supplying oxygen, and then about 560-77.
The photocatalyst layer 3 may be formed by heating the film at 0 ° C. for about 1 to 3 hours, annealing, and then cooling to form the Fe 2 O 3 thin film into an alpha-type crystal structure.
【0038】尚、アルファ型Fe2O3におけるバンド
ギャップは2.2eVで還元側電位は約0.1eVであ
って、電子と酸素との還元電位の−0.284eVより
下位レベルで電子による酸素の還元が充分行われない
が、白金を主成分とする還元触媒薄膜2が存在するとア
ルファ型Fe2O3の還元側電位が電子と酸素との還元
電位より上位レベルとなって、電子による酸素の還元反
応が円滑に行えるようになり、蛍光灯などの照明器具の
約700nmまでの可視光や微弱な紫外光でも、光励起
された電子(e−)の一部が還元触媒薄膜2表面側に移
動して、還元触媒薄膜2表面において電子(e-)と酸
素(O2)が還元反応してスーパーオキサイドイオンを
生成し、また電子(e-)の一部及び正孔(h+)は光
触媒層3に積層された親水層4表面側に移動して、親水
層4表面においてスーパーオキサイドイオンとヒドロキ
シラジカルを生成する。The band gap of alpha-type Fe2O3 is 2.2 eV and the reduction potential is about 0.1 eV. The reduction of oxygen by electrons is lower than the reduction potential of -0.284 eV between electrons and oxygen. Although not sufficiently performed, when the reduction catalyst thin film 2 containing platinum as a main component is present, the reduction-side potential of the alpha-type Fe2O3 becomes higher than the reduction potential of electrons and oxygen, and the reduction reaction of oxygen by electrons is performed smoothly. Even with visible light up to about 700 nm or weak ultraviolet light of a lighting device such as a fluorescent lamp, a part of the photo-excited electrons (e-) move to the surface of the reduction catalyst thin film 2 to reduce the reduction catalyst. On the surface of the thin film 2, electrons (e-) and oxygen (O2) undergo a reduction reaction to generate superoxide ions, and a part of the electrons (e-) and holes (h +) are laminated on the photocatalytic layer 3. Navigate to the water layer 4 surface, to produce a superoxide ion and the hydroxyl radical in the hydrophilic layer 4 surface.
【0039】図7に、基材1として厚さ0.5mmのス
テンレス製板材をパンチング加工して多数の小孔部5を
形成し、これに前面側に光触媒層3と親水層4を積層
し、背面側に還元触媒層2を形成した光触媒部材をフィ
ルター19としてレンジフード20に取付けた例であっ
て、フィルター19の背面側には室内空気を外気に排気
するファン21を備えるとともに、フィルター19前面
側にはガスレンジ22などを照らす蛍光灯などの通常の
照明器具23がレンジフード20に取付けられている。In FIG. 7, a stainless steel plate having a thickness of 0.5 mm is punched as a substrate 1 to form a large number of small holes 5, on which a photocatalytic layer 3 and a hydrophilic layer 4 are laminated on the front side. This is an example in which a photocatalyst member having a reduction catalyst layer 2 formed on the back side is attached to a range hood 20 as a filter 19, and a filter 21 is provided on the back side of the filter 19 to exhaust indoor air to the outside air. On the front side, a normal lighting fixture 23 such as a fluorescent lamp for illuminating the gas range 22 or the like is attached to the range hood 20.
【0040】而して、照明器具23の点灯に伴い生じる
可視光や微弱紫外光で光触媒層3から励起した正孔と電
子のうち、表面の光触媒層3側では大気中の水分や調理
に際して発生する水蒸気が親水層4で捕捉され、これら
の水が正孔によって酸化反応してヒドロキシラジカル
が、また電子の一部と大気中の酸素とが還元反応してス
ーパーオキサイドイオンが生成され、背面の還元触媒層
2側では電子の一部と大気中の酸素とが還元反応してス
ーパーオキサイドイオンが生成され、排気が小孔部5を
通過する間に表面の親水層4側および背面の還元触媒層
2に触れて排気中の臭い物質や煙、油分などが酸化さ
れ、分解される。Thus, of the holes and electrons excited from the photocatalyst layer 3 by the visible light or the weak ultraviolet light generated when the lighting apparatus 23 is turned on, the surface of the photocatalyst layer 3 on the surface side generates moisture in the atmosphere or during cooking. The generated water vapor is captured by the hydrophilic layer 4, and the water oxidizes and reacts with the holes to generate hydroxyl radicals, and a reduction reaction between a part of the electrons and oxygen in the atmosphere to generate superoxide ions. On the reduction catalyst layer 2 side, a part of the electrons and oxygen in the atmosphere undergo a reduction reaction to generate superoxide ions, and while the exhaust gas passes through the small holes 5, the reduction catalyst on the front side hydrophilic layer 4 side and the back side Odor substances, smoke, oil and the like in the exhaust gas are oxidized and decomposed by touching the layer 2.
【0041】尚、フィルター19をレンジフード20に
対し着脱自在に取付ければ、フィルター19が目詰まり
を起こした際、フィルター19を取り外して水洗できて
好ましい。It is preferable that the filter 19 be detachably attached to the range hood 20 so that when the filter 19 is clogged, the filter 19 can be removed and washed with water.
【0042】図8は、フィルター状の光触媒部材を、生
鮮食料品24を移送する保冷車や冷凍倉庫、冷蔵庫など
の冷凍・冷蔵設備25内の消臭装置として用いた例であ
る。FIG. 8 shows an example in which a filter-like photocatalyst member is used as a deodorizing device in a freezing / refrigerating facility 25 such as a refrigerator car, a refrigerator, or a refrigerator for transferring fresh food products 24.
【0043】この例では、基材1として厚さ0.5mm
のステンレス製板材にパンチング加工あるいはエッチン
グ加工で多数の小孔部5を開設し、この基材1の表面側
に光触媒層3と親水層4を、裏面側に還元触媒層2を成
膜し、その周縁部をステンレス板部材26でかしめて補
強した吸気フィルター19aと、基材1の表面側にのみ
光触媒層3と親水層4を成膜し、その周縁部には、還元
触媒層2を表面側に成膜したステンレス板部材27を基
材1に対し導電状にかしめて補強した排気フィルター1
9bを用いている。In this example, the substrate 1 has a thickness of 0.5 mm
A large number of small holes 5 are formed in a stainless steel plate material by punching or etching, a photocatalyst layer 3 and a hydrophilic layer 4 are formed on the front side of the substrate 1, and a reduction catalyst layer 2 is formed on the back side. An intake filter 19a whose periphery is reinforced by a stainless steel plate member 26 and a photocatalyst layer 3 and a hydrophilic layer 4 are formed only on the surface side of the substrate 1, and a reduction catalyst layer 2 is formed on the periphery thereof. Exhaust filter 1 in which stainless steel plate member 27 formed on the side is caulked conductively to substrate 1 and reinforced.
9b is used.
【0044】そして、冷凍・冷蔵設備25空間内の空気
を循環させるダクト28内に設置したファン21を設置
し、このダクト28の入口には吸気フィルター19a
を、出口には排気フィルター19bを、親水層4側が室
内表面に向くように設けている。Then, a fan 21 installed in a duct 28 for circulating the air in the freezing / refrigeration equipment 25 space is installed.
The outlet is provided with an exhaust filter 19b such that the hydrophilic layer 4 side faces the indoor surface.
【0045】また、冷凍・冷蔵設備25の天井には設備
25内を照らす蛍光灯、白熱灯などの照明器具23が設
けられており、フィルター19a、19bの表面にも照
明器具23が発する可視光が照射するようにしている。A lighting device 23 such as a fluorescent lamp or an incandescent lamp for illuminating the inside of the device 25 is provided on the ceiling of the freezing / refrigerating device 25, and visible light emitted by the lighting device 23 is also provided on the surfaces of the filters 19a and 19b. Is to be irradiated.
【0046】而して、照明器具23が点灯している時に
ファン21を作動させると、照明器具23の点灯に伴い
生じる可視光や微弱紫外光により、ダクト28入口側の
吸気フィルター19aにおいては、その表面の光触媒層
3側では冷凍・冷蔵設備25内の水分が親水層4で捕捉
され、これらの水が正孔によって酸化反応してヒドロキ
シラジカルが、また電子の一部と大気中の酸素とが還元
反応してスーパーオキサイドイオンが生成され、背面の
還元触媒層2側では電子の一部と大気中の酸素とが還元
反応してスーパーオキサイドイオンが生成され、空気が
小孔部5を通過する間に表面の親水層4側および背面の
還元触媒層2に触れて空気中の臭い物質や黴菌などが酸
化され、分解、抗菌される。When the fan 21 is operated while the lighting device 23 is turned on, the visible light or the weak ultraviolet light generated by the lighting of the lighting device 23 causes the intake filter 19a on the inlet side of the duct 28 to emit light. On the photocatalyst layer 3 side of the surface, water in the freezing / refrigeration equipment 25 is captured by the hydrophilic layer 4, and the water is oxidized by holes to form hydroxyl radicals, and some of the electrons and oxygen in the atmosphere. Is reduced to generate superoxide ions. On the back side of the reduction catalyst layer 2, some of the electrons and oxygen in the air undergo a reduction reaction to generate superoxide ions, and the air passes through the small holes 5. In the meantime, by touching the hydrophilic layer 4 on the front surface and the reduction catalyst layer 2 on the back surface, odorous substances and fungi in the air are oxidized, decomposed and antibacterial.
【0047】また、吸気フィルター19a裏面の還元触
媒層2側では電子の一部と大気中の酸素とが還元反応し
てスーパーオキサイドイオンが生成され、小孔部5を通
過した空気は、その中に含まれる臭い物質や黴菌などが
スーパーオキサイドイオンで酸化され、分解、抗菌され
る。On the reduction catalyst layer 2 side on the back surface of the intake filter 19a, a part of electrons and oxygen in the atmosphere undergo a reduction reaction to generate superoxide ions, and the air passing through the small holes 5 is The odorous substances and fungi contained in the water are oxidized, decomposed and antibacterial by superoxide ions.
【0048】一方、ダクト28出口側の排気フィルター
19bでは、その表面側の光触媒層3で生じたヒドロキ
シラジカルとスーパーオキサイドイオンによってのみ、
排気される空気に含まれた、吸気フィルター19aで分
解しきれずに残った臭い物質や黴菌などが酸化され、分
解、抗菌される。On the other hand, in the exhaust filter 19b on the outlet side of the duct 28, only the hydroxyl radical and superoxide ion generated in the photocatalyst layer 3 on the surface side cause
Odorous substances, fungi, and the like remaining in the exhausted air and not completely decomposed by the intake filter 19a are oxidized, decomposed, and antibacterial.
【0049】勿論、光励起によって生じた電子の一部
は、ステンレス板部材27の還元触媒層2に移動して、
その表面で酸素を還元し、スーパーオキサイドを生じる
が、光触媒層3から離れているのでホールと結合するこ
とが抑えられる。Of course, some of the electrons generated by the light excitation move to the reduction catalyst layer 2 of the stainless steel plate member 27,
Although oxygen is reduced on the surface to generate superoxide, since it is away from the photocatalyst layer 3, it is suppressed from being bonded to holes.
【0050】このように、ダクト28の出口側に取り付
けられる排気フィルター19bの裏面側に還元触媒層2
を設けず、周縁部のステンレス板部材27に還元触媒層
2を設けたのは、還元触媒層2側から光触媒層3や親水
層4側に向けて空気が流れる場合は、光励起に伴い還元
触媒層2で生じたスーパーオキサイドイオンが、その一
部は空気中の臭気物質などと酸化反応して消滅するが、
残存するスーパーオキサイドイオンが空気流と共にその
まま小孔部5を通過して親水層4表面のホールと結合し
てしまい、親水層4側でのヒドロキシラジカルの生成が
損なわれて酸化力が低下、分解などの機能が半減するた
めである。As described above, the reduction catalyst layer 2 is provided on the back side of the exhaust filter 19b attached to the outlet side of the duct 28.
The reduction catalyst layer 2 is provided on the stainless steel plate member 27 at the peripheral portion without air. When air flows from the reduction catalyst layer 2 side to the photocatalyst layer 3 or the hydrophilic layer 4 side, the reduction catalyst is accompanied by photoexcitation. Some of the superoxide ions generated in layer 2 disappear by oxidation reaction with odorous substances in the air.
The remaining superoxide ions pass through the small holes 5 as they are together with the air flow and are combined with the holes on the surface of the hydrophilic layer 4, so that the generation of hydroxy radicals on the hydrophilic layer 4 side is impaired, the oxidizing power decreases, and decomposition occurs. This is because the functions such as are halved.
【0051】即ち、親水層4側から還元触媒層2側に向
けて空気が通過する場合は、光触媒層4側で生じたヒド
ロキシラジカルやスーパーオキサイドイオンが消滅しき
れずに還元触媒層2側に移動しても、還元触媒層2側で
の電子はヒドロキシラジカルやスーパーオキサイドイオ
ンと結合せず、酸素を還元してスーパーオキサイドイオ
ンを更に生じ、分解しきれなかった空気中の臭気物質な
どと酸化反応し、これらを酸化分解するので効果的であ
るが、逆の流れでは還元触媒層2側で生じたスーパーオ
キサイドイオンが残存すると、親水層4側のホールと結
合するので効果が半減する。That is, when air passes from the hydrophilic layer 4 side to the reduction catalyst layer 2 side, the hydroxyl radicals and superoxide ions generated on the photocatalyst layer 4 side move to the reduction catalyst layer 2 side without completely disappearing. However, the electrons on the side of the reduction catalyst layer 2 do not combine with the hydroxyl radicals and superoxide ions, but reduce oxygen to further generate superoxide ions, and oxidize with odorous substances in the air that could not be completely decomposed. However, these are effective because they are oxidatively decomposed. However, in the reverse flow, if the superoxide ions generated on the side of the reduction catalyst layer 2 remain, they are combined with the holes on the side of the hydrophilic layer 4 so that the effect is reduced by half.
【0052】従って、ダクト28の吸気側には吸気フィ
ルター19aを、排気側には排気フィルター19bを取
付ければよく、この様にすれば分解、浄化、抗菌能力は
倍増する。Therefore, the intake filter 19a may be attached to the intake side of the duct 28, and the exhaust filter 19b may be attached to the exhaust side. In this case, the disassembly, purification, and antibacterial abilities are doubled.
【0053】尚、このように紫外線ランプを用いずとも
内部を照らす蛍光灯や白熱灯で殺菌・消臭され、しかも
紫外線ランプのように生鮮食料品が変色したりせず、例
えば冷凍・冷蔵倉庫や保冷車内で作業する人に対する紫
外線照射による日焼け障害などが防止でき、その効果は
多大である。It should be noted that the food is sterilized and deodorized by a fluorescent lamp or an incandescent lamp which illuminates the interior without using an ultraviolet lamp, and the fresh food does not discolor like the ultraviolet lamp. In addition, it is possible to prevent a sunburn or the like caused by ultraviolet irradiation for a person working in a cold storage vehicle, and the effect is enormous.
【0054】本発明は上述の実施例に限定されること無
く種々の変形が可能であり、基材素材として黄銅、銅、
鉄などの金属などを用いても良く、基材の厚さ、太さな
ども任意である。The present invention can be variously modified without being limited to the above-described embodiment.
A metal such as iron may be used, and the thickness and thickness of the base material are also arbitrary.
【0055】光触媒層を形成する物質として、ZnO、
SnO2、SrTiO3、WO3、Bi2O3やTi
O、Ti2O3、Ti3O5、TiOx(1.99<X<
2)などのチタン酸化物などを用いても良く、更には、
光触媒層にCr、Vなどの遷移金属イオンを微量注入
し、光触媒反応の効率を高めても良い。As a material for forming the photocatalyst layer, ZnO,
SnO2, SrTiO3, WO3, Bi2O3 and Ti
O, Ti2O3, Ti3O5, TiOx (1.99 <X <
Titanium oxide such as 2) may be used.
A small amount of transition metal ions such as Cr and V may be injected into the photocatalyst layer to increase the efficiency of the photocatalytic reaction.
【0056】また、光触媒物質として2酸化チタンを用
いる場合は400〜500℃で加熱処理してアナターゼ
型結晶構造にしたり、600〜700℃で加熱処理して
ルチル型結晶構造にするのが好ましく、ドライコーティ
ング法以外にゾル・ゲル法で光触媒層を形成しても良
い。When titanium dioxide is used as the photocatalytic substance, it is preferable to heat-treat it at 400 to 500 ° C. to form an anatase crystal structure, or to heat it at 600 to 700 ° C. to form a rutile crystal structure. The photocatalyst layer may be formed by a sol-gel method other than the dry coating method.
【0057】又、更に酸素欠陥を有する2酸化チタンを
主成分とする光触媒層を形成する方法として、2酸化チ
タン薄膜を成膜して400〜700℃程度に数時間加熱
後、外気に放置急冷することにより形成することもでき
る。Further, as a method of forming a photocatalyst layer containing titanium dioxide having oxygen vacancies as a main component, a titanium dioxide thin film is formed, heated to about 400 to 700 ° C. for several hours, and then quenched in the open air. It can also be formed by performing.
【0058】これらの光触媒層の厚さは100nm程度
から1000nm程度であれば充分機能を発揮できる。If the thickness of the photocatalyst layer is about 100 nm to about 1000 nm, the function can be sufficiently exhibited.
【0059】また、親水層を形成する物質としてSiO
2のほかAl2O3などを用いても良く、その厚さは1
〜20nm程度有れば充分機能を発揮できる。As a material for forming the hydrophilic layer, SiO 2 is used.
Al 2 O 3 etc. may be used in addition to 2, the thickness is 1
If it is about 20 nm, the function can be sufficiently exhibited.
【0060】還元触媒層を形成する物質として白金、パ
ラジウムやそれらを主成分とした合金を用いても良い。As a material for forming the reduction catalyst layer, platinum, palladium or an alloy containing these as a main component may be used.
【0061】これら光触媒層、親水層、還元触媒層をド
ライコーティングする方法として、イオンプレーティン
グ法、スパッタリング方法、電子ビーム法、ホロカソー
ド法などの方法を採用しても良い。As a method of dry-coating the photocatalyst layer, the hydrophilic layer and the reduction catalyst layer, a method such as an ion plating method, a sputtering method, an electron beam method, and a hollow cathode method may be employed.
【0062】還元触媒層はドライコーティング方法以外
に、白金めっき方法、クラッド方法などで基材に成膜す
ることもできる。The reduction catalyst layer can be formed on a substrate by a platinum plating method, a cladding method, or the like, in addition to the dry coating method.
【0063】還元触媒層の厚さは1〜20nm程度が好
ましく、1nm以下であれば還元触媒としての機能の発
揮がうまく行えず、20nm以上であれば高価な物質を
用いる関係上コストが高くなりすぎてメリットが無い。The thickness of the reduction catalyst layer is preferably about 1 to 20 nm, and if it is 1 nm or less, the function as a reduction catalyst cannot be exhibited well, and if it is 20 nm or more, the cost increases due to the use of expensive substances. There is no merit.
【0064】尚、基材の両面に還元触媒物質をコーティ
ングした後、その片面に光触媒層と親水層を積層形成し
ても良く、更に、基材に先に光触媒層と親水層を積層形
成した後、その裏面側に還元触媒物質をコーティングし
ても良い。After the reduction catalyst substance is coated on both sides of the substrate, a photocatalyst layer and a hydrophilic layer may be formed on one side thereof, and the photocatalyst layer and the hydrophilic layer may be formed on the substrate first. Thereafter, the back surface may be coated with a reduction catalyst material.
【0065】勿論、図5に示すドライコーティング装置
で持って、白金やパナジウムなどの触媒物質をコーティ
ングし、次いで酸化チタン薄膜や、チタン薄膜を積層し
ても良い。Of course, it is also possible to use a dry coating apparatus shown in FIG. 5 to coat with a catalytic substance such as platinum or panadium, and then laminate a titanium oxide thin film or a titanium thin film.
【0066】勿論、本発明光触媒部材は、屋外の太陽光
下、あるいは紫外線ランプ照射条件下で用いれば光触媒
効果は倍増するのは説明するまでも無い。Of course, it is needless to say that the photocatalytic effect of the present invention is doubled when it is used under outdoor sunlight or under the condition of irradiation with an ultraviolet lamp.
【0067】更に、本発明光触媒部材は、紫外線が透過
し難い鑑賞用水槽や湖沼の浄化用、焼却炉の排気中に含
まれるダイオキシン等の有害物質の除去、家庭用ファン
ヒーターの臭い除去フィルター、空調機の抗菌浄化フィ
ルターなど多くの商品に利用できる。Further, the photocatalyst member of the present invention is used for purifying an aquarium or a lake which is hard to transmit ultraviolet rays, removing harmful substances such as dioxin contained in exhaust gas of an incinerator, a filter for removing odor of a household fan heater, It can be used for many products such as antibacterial purification filters for air conditioners.
【0068】[0068]
【発明の効果】本発明の光触媒部材は以上のように、導
電性板状基材表面の一方の表面に、光触媒層を形成する
と共に、他方の表面に上記光触媒層の光励起により生じ
た電子の還元作用を促進する触媒層を形成したので、触
媒層側において電子の還元反応、特に酸素への還元反応
が促進され、電子と正孔との再結合が減少するととも
に、触媒によって還元に必要なエネルギー電位が低くな
り、結果的に室内照明に豊富に存在する可視光領域の5
50nm近傍までの光粒子が保有しているエネルギーレ
ベルで励起した電子でも還元反応が可能になるうえ、触
媒層側においては電子と酸素の還元反応でスーパーオキ
サイドイオンが生じ、光触媒層側においては酸化・還元
反応でヒドロキシラジカルやスーパーオキサイドイオン
が生じ、両面相俟って強い分解機能や抗菌機能や浄化機
能等を効率的に発揮することが可能になる。As described above, the photocatalyst member of the present invention forms a photocatalyst layer on one of the surfaces of the conductive plate-like base material, and forms the photocatalyst layer formed on the other surface by photoexcitation of the photocatalyst layer. Since the catalyst layer that promotes the reduction action is formed, the reduction reaction of electrons, particularly the reduction reaction to oxygen, is promoted on the catalyst layer side, and the recombination of electrons and holes is reduced. The energy potential is low, and as a result, the visible light region 5
A reduction reaction is possible even with electrons excited at the energy level held by the photoparticles up to about 50 nm. In addition, superoxide ions are generated by a reduction reaction between electrons and oxygen on the catalyst layer side, and oxidation is performed on the photocatalyst layer side. Hydroxyl radicals and superoxide ions are generated by the reduction reaction, and together with both surfaces, it is possible to efficiently exert a strong decomposing function, an antibacterial function, a purifying function, and the like.
【図1】 本発明光触媒部材の製造方法の工程を示す模
式図である。FIG. 1 is a schematic view showing steps of a method for producing a photocatalyst member of the present invention.
【図2】 製造工程に基く断面図であって、(a)は白
金を主成分とした還元触媒部としての還元触媒層をステ
ンレス板などの導電性板状基材裏面にコーティングした
断面図、(b)は次いで光触媒層としてチタン酸化物薄
膜を基材表面にコーティングした断面図、(c)はチタ
ン酸化物薄膜に更に親水層として酸化ケイ素(SiO
2)薄膜をコーティングした断面図である。FIG. 2 is a cross-sectional view based on a manufacturing process, in which (a) is a cross-sectional view in which a reduction catalyst layer serving as a reduction catalyst portion containing platinum as a main component is coated on the back surface of a conductive plate-like base material such as a stainless steel plate; (B) is a cross-sectional view in which a titanium oxide thin film is coated on the substrate surface as a photocatalyst layer, and (c) is a silicon oxide (SiO 2) as a hydrophilic layer on the titanium oxide thin film.
2) It is sectional drawing which coated the thin film.
【図3】 エネルギー電位を示すグラフである。FIG. 3 is a graph showing an energy potential.
【図4】 還元触媒物質を基材にコーティングする装置
の模式図である。FIG. 4 is a schematic view of an apparatus for coating a substrate with a reduction catalyst substance.
【図5】 光触媒物質と親水性物質を積層する装置の模
式図である。FIG. 5 is a schematic view of an apparatus for laminating a photocatalytic substance and a hydrophilic substance.
【図6】 図5の装置の製造工程を示す模式図である。FIG. 6 is a schematic view showing a manufacturing process of the device of FIG.
【図7】 光触媒部材をフィルターに応用しレンジフー
ドに用いた例を示す模式図である。FIG. 7 is a schematic view showing an example in which a photocatalyst member is applied to a filter and used in a range hood.
【図8】 光触媒部材をフィルターに応用し冷蔵・冷凍
設備に用いた例を示す模式図である。FIG. 8 is a schematic diagram showing an example in which a photocatalyst member is applied to a filter and used in refrigeration / refrigeration equipment.
【図9】 同設備で用いているフィルターの要部の拡大
断面図である。FIG. 9 is an enlarged sectional view of a main part of a filter used in the facility.
A:触媒物質を基材にコーティングする工程 B:光触媒物質を基材にコーティングする工程 C:親水性物質を積層する工程 D:加熱処理する工程 1:基材 2:還元触媒層 3:光触媒層 4:親水層 5:小孔部 6:スパッタリングチャンバー 7:供給ドラム 8:巻き取りドラム 9:イオンプレーティングチャンバー 10:酸素供給源 11:セッティングチャンバー 12:ローラー 13:ローラー 14:ドラム 15:電子銃 16:るつぼ 17:蓋 18:シャッター部材 19:フィルター 20:レンジフード 21:ファン 22:ガスレンジ 23:照明器具 24:生鮮食料品 25:冷蔵・冷凍設備 26:ステンレス板部材 27:ステンレス板部材 28:ダクト A: Step of coating catalytic substance on substrate B: Step of coating photocatalytic substance on substrate C: Step of laminating hydrophilic substance D: Step of heat treatment 1: Substrate 2: Reduction catalyst layer 3: Photocatalyst layer 4: Hydrophilic layer 5: Small hole 6: Sputtering chamber 7: Supply drum 8: Winding drum 9: Ion plating chamber 10: Oxygen supply source 11: Setting chamber 12: Roller 13: Roller 14: Drum 15: Electron gun 16: Crucible 17: Lid 18: Shutter member 19: Filter 20: Range hood 21: Fan 22: Gas range 23: Lighting equipment 24: Fresh food 25: Refrigeration / freezing equipment 26: Stainless steel plate member 27: Stainless steel plate member 28 :duct
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F100 AA20B AA21A AA23A AA25 AB02 AB04 AB17 AB24 BA02 DC11 DC16 EH46 EH462 JB05B JC00 JL08A 4G069 AA11 BA04A BA04B BA48A BB04A BB04B BC66A BC66B CA07 CA08 DA05 EC22X EC22Y ED02 EE06 FA03 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4F100 AA20B AA21A AA23A AA25 AB02 AB04 AB17 AB24 BA02 DC11 DC16 EH46 EH462 JB05B JC00 JL08A 4G069 AA11 BA04A BA04B BA48A BB04A BB04B BC66A BC66 EC02 FA05
Claims (8)
積層した導電性基材と、この導電性基材と電気的に導通
し上記光触媒層の光励起で生じた電子の酸素との還元反
応を促進する還元触媒部とを備えていることを特徴とす
る光触媒部材。1. A photocatalyst layer, a conductive substrate having a hydrophilic layer laminated on the surface of the photocatalyst layer, and a reduction reaction of oxygen generated by photoexcitation of the photocatalyst layer by being electrically connected to the conductive substrate. A photocatalyst member comprising: a reduction catalyst section for promoting the reaction.
あることを特徴とする請求項1記載の光触媒部材。2. The photocatalyst member according to claim 1, wherein a main component of the photocatalyst layer is titanium oxide.
構造のFe2O3であることを特徴とする請求項1記載
の光触媒部材。3. The photocatalyst member according to claim 1, wherein a main component of the photocatalyst layer is Fe2O3 having an alpha-type crystal structure.
とを特徴とする請求項1乃至3いずれか記載の光触媒部
材。4. The photocatalyst member according to claim 1, wherein a main component of the hydrophilic layer is SiO2.
上記光触媒層と親水層を積層し、他方の表面に上記還元
触媒部を形成したことを特徴とする請求項1記載の光触
媒部材。5. The method according to claim 1, wherein the conductive substrate has a plate shape, the photocatalyst layer and the hydrophilic layer are laminated on one surface, and the reduction catalyst portion is formed on the other surface. Photocatalyst member.
多数の小孔部が設けられていることを特徴とする請求項
5記載の光触媒部材。6. The photocatalyst member according to claim 5, wherein the conductive base material is provided with a large number of small holes penetrating the base material.
ング法にて形成したことを特徴とする請求項5乃至6い
ずれか記載の光触媒部材。7. The photocatalyst member according to claim 5, wherein the photocatalyst layer and the hydrophilic layer are formed by a dry coating method.
にて層状に形成したことを特徴とする請求項7記載の光
触媒部材。8. The photocatalyst member according to claim 7, wherein said reduction catalyst portion is formed in a layer by a dry coating method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000279151A JP2002085978A (en) | 2000-09-14 | 2000-09-14 | Photocatalytic member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000279151A JP2002085978A (en) | 2000-09-14 | 2000-09-14 | Photocatalytic member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002085978A true JP2002085978A (en) | 2002-03-26 |
Family
ID=18764202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000279151A Pending JP2002085978A (en) | 2000-09-14 | 2000-09-14 | Photocatalytic member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002085978A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004067886A (en) * | 2002-08-07 | 2004-03-04 | Blest:Kk | Building of petrochemical plant |
| US7063820B2 (en) * | 2003-06-16 | 2006-06-20 | University Of Florida Research Foundation, Inc. | Photoelectrochemical air disinfection |
| WO2019176911A1 (en) * | 2018-03-16 | 2019-09-19 | 日本製鉄株式会社 | Method for producing metal material, method for producing separator for fuel cells, and stainless steel material |
| ES2864155A1 (en) * | 2020-04-09 | 2021-10-13 | Orta Jordi Oltra | Debugging equipment (Machine-translation by Google Translate, not legally binding) |
-
2000
- 2000-09-14 JP JP2000279151A patent/JP2002085978A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004067886A (en) * | 2002-08-07 | 2004-03-04 | Blest:Kk | Building of petrochemical plant |
| US7063820B2 (en) * | 2003-06-16 | 2006-06-20 | University Of Florida Research Foundation, Inc. | Photoelectrochemical air disinfection |
| US7371351B2 (en) | 2003-06-16 | 2008-05-13 | University Of Florida Research Foundation, Inc. | Photoelectrochemical air disinfection |
| US7635450B2 (en) | 2003-06-16 | 2009-12-22 | University Of Florida Research Foundation, Inc. | Photoelectrochemical air disinfection |
| WO2019176911A1 (en) * | 2018-03-16 | 2019-09-19 | 日本製鉄株式会社 | Method for producing metal material, method for producing separator for fuel cells, and stainless steel material |
| JPWO2019176911A1 (en) * | 2018-03-16 | 2020-12-03 | 日本製鉄株式会社 | Manufacturing method of metal material, manufacturing method of separator for fuel cell, and stainless steel material |
| ES2864155A1 (en) * | 2020-04-09 | 2021-10-13 | Orta Jordi Oltra | Debugging equipment (Machine-translation by Google Translate, not legally binding) |
| WO2021204573A1 (en) * | 2020-04-09 | 2021-10-14 | Pedro Monagas Asensio | Fluid treatment unit |
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