JP2002080785A - Electroconductive organic and inorganic hybrid film - Google Patents
Electroconductive organic and inorganic hybrid filmInfo
- Publication number
- JP2002080785A JP2002080785A JP2000274743A JP2000274743A JP2002080785A JP 2002080785 A JP2002080785 A JP 2002080785A JP 2000274743 A JP2000274743 A JP 2000274743A JP 2000274743 A JP2000274743 A JP 2000274743A JP 2002080785 A JP2002080785 A JP 2002080785A
- Authority
- JP
- Japan
- Prior art keywords
- organic
- inorganic hybrid
- conductive
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 10
- 229910052752 metalloid Inorganic materials 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 31
- 238000000576 coating method Methods 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 28
- -1 metalloid alkoxide Chemical class 0.000 claims description 28
- 239000011231 conductive filler Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000003980 solgel method Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 4
- 239000000945 filler Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 23
- 239000004205 dimethyl polysiloxane Substances 0.000 description 20
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 239000007788 liquid Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 150000004703 alkoxides Chemical class 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 229910044991 metal oxide Inorganic materials 0.000 description 11
- 150000004706 metal oxides Chemical class 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 125000005372 silanol group Chemical group 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 150000002738 metalloids Chemical class 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000012643 polycondensation polymerization Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- 101150000715 DA18 gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- MGQFVQQCNPBJKC-UHFFFAOYSA-N dibutoxy(diethyl)silane Chemical compound CCCCO[Si](CC)(CC)OCCCC MGQFVQQCNPBJKC-UHFFFAOYSA-N 0.000 description 1
- GQNWJCQWBFHQAO-UHFFFAOYSA-N dibutoxy(dimethyl)silane Chemical compound CCCCO[Si](C)(C)OCCCC GQNWJCQWBFHQAO-UHFFFAOYSA-N 0.000 description 1
- OSMIWEAIYFILPL-UHFFFAOYSA-N dibutoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCCCC)(OCCCC)C1=CC=CC=C1 OSMIWEAIYFILPL-UHFFFAOYSA-N 0.000 description 1
- BKGSSPASYNBWRR-UHFFFAOYSA-N dibutoxy(dipropyl)silane Chemical compound CCCCO[Si](CCC)(CCC)OCCCC BKGSSPASYNBWRR-UHFFFAOYSA-N 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- BZCJJERBERAQKQ-UHFFFAOYSA-N diethyl(dipropoxy)silane Chemical compound CCCO[Si](CC)(CC)OCCC BZCJJERBERAQKQ-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- ZIDTUTFKRRXWTK-UHFFFAOYSA-N dimethyl(dipropoxy)silane Chemical compound CCCO[Si](C)(C)OCCC ZIDTUTFKRRXWTK-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- SLAYMDSSGGBWQB-UHFFFAOYSA-N diphenyl(dipropoxy)silane Chemical compound C=1C=CC=CC=1[Si](OCCC)(OCCC)C1=CC=CC=C1 SLAYMDSSGGBWQB-UHFFFAOYSA-N 0.000 description 1
- AVBCBOQFOQZNFK-UHFFFAOYSA-N dipropoxy(dipropyl)silane Chemical compound CCCO[Si](CCC)(CCC)OCCC AVBCBOQFOQZNFK-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000003273 ketjen black Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000414 polyfuran Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Non-Insulated Conductors (AREA)
- Fixing For Electrophotography (AREA)
- Dry Development In Electrophotography (AREA)
- Electrostatic Charge, Transfer And Separation In Electrography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Conductive Materials (AREA)
- Cleaning In Electrography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は導電性を有した有機
・無機ハイブリッド皮膜に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive organic / inorganic hybrid film.
【0002】[0002]
【従来の技術】従来、金属酸化物に酸化チタン、金属微
粒子等の導電材料を分散させた導電性金属酸化物皮膜
(特開平8−272189)がゾルゲル法によって提供
されている。2. Description of the Related Art Conventionally, a conductive metal oxide film (JP-A-8-272189) in which a conductive material such as titanium oxide and metal fine particles is dispersed in a metal oxide has been provided by a sol-gel method.
【0003】[0003]
【発明が解決しようとする課題】ゾルゲル法によって導
電性膜を形成する場合、金属または半金属のアルコキシ
ド溶液に導電性フィラーを分散させたゾルを基材表面に
塗布い、加熱ゲル化させて皮膜を形成するが、加熱工程
において金属酸化物皮膜は収縮しやすく、膜にクラック
が生じやすいという問題があった。また金属酸化物皮膜
からなる導電性膜は、水との接触角の値が大きくなく、
よってトナー離型性が悪いという問題があった。When a conductive film is formed by a sol-gel method, a sol obtained by dispersing a conductive filler in an alkoxide solution of a metal or metalloid is applied to the surface of a substrate, and gelled by heating to form a film. However, there is a problem that the metal oxide film easily shrinks in the heating step, and the film is easily cracked. In addition, the conductive film made of a metal oxide film does not have a large contact angle with water,
Therefore, there is a problem that the toner releasability is poor.
【0004】[0004]
【課題を解決するための手段】本発明は上記課題を解決
するための手段として、ゾルゲル法によって形成される
金属および/または半金属のアルコキシドと有機ケイ素
化合物とからなる有機・無機ハイブリッド皮膜であっ
て、該皮膜には導電性フィラーが分散されている導電性
有機・無機ハイブリッド皮膜を提供するものである。According to the present invention, there is provided an organic-inorganic hybrid film comprising a metal and / or metalloid alkoxide and an organosilicon compound formed by a sol-gel method. The present invention provides a conductive organic / inorganic hybrid film in which a conductive filler is dispersed.
【0005】該導電性有機・無機ハイブリッド皮膜は基
材上に形成され、該基材は電子写真装置用導電性ロール
基材または導電性ベルト基材であることが望ましい。The conductive organic / inorganic hybrid coating is formed on a substrate, and the substrate is preferably a conductive roll substrate or a conductive belt substrate for an electrophotographic apparatus.
【0006】[0006]
【作用】導電性膜において、有機・無機ハイブリッド皮
膜を用いることで基材への皮膜の密着性を向上させ、か
つ加熱による収縮を小さくする。By using an organic / inorganic hybrid film in the conductive film, the adhesion of the film to the substrate is improved, and shrinkage due to heating is reduced.
【0007】[0007]
【発明の実施の形態】以下、本発明を詳細に説明する。
本発明の導電性有機・無機ハイブリッド皮膜とは、金属
および/または半金属のアルコキシドと有機ケイ素化合
物とからなる有機・無機ハイブリッド皮膜であって、該
有機・無機ハイブリッド皮膜に導電性フィラーが分散さ
れているものである。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The conductive organic / inorganic hybrid film of the present invention is an organic / inorganic hybrid film composed of a metal and / or semimetal alkoxide and an organosilicon compound, wherein a conductive filler is dispersed in the organic / inorganic hybrid film. Is what it is.
【0008】導電性有機・無機ハイブリッド皮膜を製造
する工程として、まず金属および/または半金属のアル
コキシドと有機ケイ素化合物とからなる有機・無機ハイ
ブリッドゾル液の調製を行う。As a step of producing a conductive organic / inorganic hybrid coating, first, an organic / inorganic hybrid sol solution comprising a metal and / or semimetal alkoxide and an organosilicon compound is prepared.
【0009】上記アルコキシドを形成する金属または半
金属の種類としては、アルミニウム、ケイ素、チタン、
バナジウム、マンガン、鉄、コバルト、亜鉛、ゲルマニ
ウム、イットリウム、ジルコニウム、ニオブ、カドミウ
ム、タンタル等のアルコキシドを形成し得る金属または
半金属が挙げられ、これらは単独または2種以上混合し
て用いてもよい。The metal or metalloid forming the alkoxide includes aluminum, silicon, titanium,
Metals or metalloids capable of forming an alkoxide such as vanadium, manganese, iron, cobalt, zinc, germanium, yttrium, zirconium, niobium, cadmium, and tantalum are mentioned, and these may be used alone or in combination of two or more. .
【0010】またアルコキシドの種類は特に限定される
ことなく、例えば、メトキシド、エトキシド、プロポキ
シド、イソプロポキシド、ブトキシド等が挙げられ、更
には、アルコキシ基の一部をβ−ジケトン、β−ケトエ
ステル、アルカノールアミン、アルキルアルカノールア
ミン等で置換したアルコキシド誘導体であってもよい。The type of alkoxide is not particularly limited, and includes, for example, methoxide, ethoxide, propoxide, isopropoxide, butoxide and the like. Further, part of the alkoxy group may be β-diketone, β-ketoester. Or an alkoxide derivative substituted with an alkanolamine, an alkylalkanolamine or the like.
【0011】上記有機ケイ素化合物としては、例えば、
ジアルキルジアルコキシシラン、末端シラノールポリジ
メチルシロキサン等を使用することが出来る。該ジアル
キルジアルコキシシランとしては、例えば、ジメチルジ
メトキシシラン、ジメチルジエトキシシラン、ジメチル
ジプロポキシシラン、ジメチルジブトキシシラン、ジエ
チルジメトキシシラン、ジエチルジエトキシシラン、ジ
エチルジプロポキシシラン、ジエチルジブトキシシラ
ン、ジプロピルジメトキシシラン、ジプロピルジエトキ
シシラン、ジプロピルジプロポキシシラン、ジプロピル
ジブトキシシラン、ジフェニルジメトキシシラン、ジフ
ェニルジエトキシシラン、ジフェニルジプロポキシシラ
ン、ジフェニルジブトキシシラン等が挙げられる。上記
末端シラノールポリジメチルシロキサンは、重量平均分
子量が400〜10000であることが好ましい。The above-mentioned organosilicon compound includes, for example,
Dialkyl dialkoxysilane, terminal silanol polydimethylsiloxane and the like can be used. Examples of the dialkyldialkoxysilane include, for example, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldipropoxysilane, dimethyldibutoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, diethyldipropoxysilane, diethyldibutoxysilane, dipropyl Examples include dimethoxysilane, dipropyldiethoxysilane, dipropyldipropoxysilane, dipropyldibutoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldipropoxysilane, diphenyldibutoxysilane, and the like. The terminal silanol polydimethylsiloxane preferably has a weight average molecular weight of 400 to 10,000.
【0012】また上記有機ケイ素化合物以外に、有機ケ
イ素化合物の水素をフッ素で置換したフッ素置換有機ケ
イ素化合物であってもよく、例えば、CF3 CH2 CH
2 −Si(OC2 H5 )3 等が挙げられる。In addition to the above-mentioned organosilicon compound, a fluorine-substituted organosilicon compound in which hydrogen of an organosilicon compound is substituted with fluorine may be used. For example, CF 3 CH 2 CH
2 -Si (OC 2 H 5) 3 and the like.
【0013】上記金属および/または半金属のアルコキ
シドの加水分解物と、上記有機ケイ素化合物等の有機成
分とを反応させ、有機・無機ハイブリッドゾル液が調製
される。該有機成分は、加水分解前のアルコキシドに対
して配合してもよいし、加水分解したアルコキシドに対
して配合してもよい。The hydrolyzate of the metal and / or metalloid alkoxide is reacted with an organic component such as the organosilicon compound to prepare an organic / inorganic hybrid sol solution. The organic component may be mixed with the alkoxide before hydrolysis or with the hydrolyzed alkoxide.
【0014】このとき使用する溶媒としては、アルコキ
シドおよび有機成分を均一に分散、溶解出来る溶媒であ
れば特に限定されることなく、例えば、メタノール、エ
タノール等の各種アルコールの他、アセトン、トルエ
ン、キシレン等が一般的に使用される。なお、上記アル
コキシドの加水分解反応を促進させるために、塩酸、リ
ン酸、酢酸等の触媒を適宜使用してもよい。The solvent to be used at this time is not particularly limited as long as it is a solvent capable of uniformly dispersing and dissolving the alkoxide and the organic component. For example, in addition to various alcohols such as methanol and ethanol, acetone, toluene and xylene Etc. are commonly used. In order to accelerate the hydrolysis reaction of the alkoxide, a catalyst such as hydrochloric acid, phosphoric acid, and acetic acid may be appropriately used.
【0015】上記有機成分としてジアルキルアルコキシ
シランを使用する場合、無機成分であるアルコキシドと
の配合比は、有機成分/(有機成分+無機成分)のモル
比が0. 5〜0. 95となる範囲であるのが好ましい。
該モル比が0. 5未満では、得られる皮膜が剥離した
り、クラックが生じるおそれがあり、該モル比が0. 9
5を超えると、得られる皮膜の表面硬度が著しく低下す
るおそれがある。When dialkylalkoxysilane is used as the organic component, the mixing ratio with the alkoxide as the inorganic component is such that the molar ratio of organic component / (organic component + inorganic component) is 0.5 to 0.95. It is preferred that
If the molar ratio is less than 0.5, the resulting film may peel off or crack, and the molar ratio may be 0.9.
If it exceeds 5, the surface hardness of the resulting film may be significantly reduced.
【0016】また、上記有機成分として末端シラノール
ポリジメチルシロキサンを使用する場合、無機成分であ
るアルコキシドとの配合比は、有機成分/(有機成分+
無機成分)のモル比が0. 1〜0. 7となる範囲である
のが好ましい。該モル比が0. 1未満では、得られる皮
膜が固く脆くなり、弾性変形しなくなるおそれがあり、
該モル比が0. 7を超えると、有機成分と無機成分との
反応物がゲル化しない場合がある。When the silanol-terminated polydimethylsiloxane is used as the organic component, the mixing ratio with the alkoxide as the inorganic component is as follows: organic component / (organic component +
The molar ratio of the (inorganic component) is preferably in the range of 0.1 to 0.7. If the molar ratio is less than 0.1, the resulting film may be hard and brittle, and may not be elastically deformed.
If the molar ratio exceeds 0.7, the reaction product of the organic component and the inorganic component may not gel.
【0017】なお、この末端シラノールポリジメチルシ
ロキサンとアルコキシドとを反応させると、アルコキシ
ドのアルコキシ基が水酸基に置換され、その水酸基が末
端シラノールポリジメチルシロキサンの末端のシラノー
ル基と脱水・縮合反応を起こし、エラストマーが形成さ
れる。When this silanol-terminated polydimethylsiloxane is reacted with an alkoxide, the alkoxy group of the alkoxide is replaced by a hydroxyl group, and the hydroxyl group causes a dehydration / condensation reaction with the silanol group at the end of the silanol-polydimethylsiloxane. An elastomer is formed.
【0018】上記有機・無機ハイブリッドゾル液は、攪
拌等によってアルコキシドを十分加水分解するととも
に、一部脱水重合を行なう。The organic / inorganic hybrid sol liquid sufficiently hydrolyzes the alkoxide by stirring or the like, and partially performs dehydration polymerization.
【0019】以上のようにして得られる有機・無機ハイ
ブリッドゾル液には、更に導電性フィラーが添加、混合
され、該導電性フィラーが分散されているコーティング
液が調製される。The organic / inorganic hybrid sol obtained as described above is further mixed with a conductive filler and mixed to prepare a coating liquid in which the conductive filler is dispersed.
【0020】導電性フィラーとは、有機・無機ハイブリ
ッド皮膜に導電性を付与するために有機・無機ハイブリ
ッドゾル液に添加されるフィラーであって、例えば、黒
鉛、アセチレンブラック、ケッチェンブラック、ファー
ネスブラック、チャンネルブラック等のカーボンブラッ
ク、カーボン表面に存在する官能基に疎水性のオリゴマ
ー(スチレン、アクリル酸、メタクリル酸、メタクリル
酸メチル等のオリゴマー)をグラフトしたグラフトカー
ボン、導電性の酸化チタン、酸化亜鉛、酸化スズ、酸化
アンチモン等の導電性金属酸化物、導電性の硫酸バリウ
ム、ホウ酸アルミニウム、第4級アンモニウム塩等の導
電性金属塩、界面活性剤等のイオン導電剤等、ポリピロ
ール、ポリアニリン、ポリアセチレン、ポリパラフェニ
レン、ポリチオフェン、ポリフラン、ポリフェニレンビ
ニレン等の導電性高分子の粉状物が挙げられ、これら単
独または2種以上の混合物が導電性フィラーとして使用
される。該導電性フィラーの平均粒子径は、0. 01〜
10μmの範囲のものが好ましい。The conductive filler is a filler added to the organic / inorganic hybrid sol liquid to impart conductivity to the organic / inorganic hybrid film, and is, for example, graphite, acetylene black, Ketjen black, furnace black. , Carbon black such as channel black, graft carbon obtained by grafting a hydrophobic oligomer (oligomer such as styrene, acrylic acid, methacrylic acid, methyl methacrylate) to a functional group present on the carbon surface, conductive titanium oxide, zinc oxide , Tin oxide, conductive metal oxides such as antimony oxide, conductive barium sulfate, aluminum borate, conductive metal salts such as quaternary ammonium salts, ionic conductive agents such as surfactants, polypyrrole, polyaniline, Polyacetylene, polyparaphenylene, polythiof Emissions, polyfuran, powdery product of a conductive polymer polyphenylene vinylene and the like, mixtures of more of these alone or two or are used as the conductive filler. The average particle size of the conductive filler is 0.01 to
Those having a range of 10 μm are preferred.
【0021】なお該導電性フィラーの添加量は、導電性
フィラーの種類、目的とする導電性有機・無機ハイブリ
ッド皮膜の導電性等によって異なるが、通常、有機・無
機ハイブリッドゾル液に対して、1〜10重量%の範囲
が好ましい。The amount of the conductive filler to be added depends on the type of the conductive filler, the conductivity of the target conductive organic-inorganic hybrid film, and the like. A range of from 10 to 10% by weight is preferred.
【0022】導電性フィラーが添加された有機・無機ハ
イブリッドゾル液は所望の攪拌装置で攪拌され、該導電
性フィラーが有機・無機ハイブリッドゾル液に均一に分
散され、コーティング液が調製される。The organic / inorganic hybrid sol to which the conductive filler has been added is stirred by a desired stirring device, and the conductive filler is uniformly dispersed in the organic / inorganic hybrid sol to prepare a coating solution.
【0023】調製されたコーティング液は、基材表面に
塗布される。基材としては例えば合成樹脂、ガラス、金
属、セラミックス等があり、本発明が特に有用に適用さ
れるのは、例えば、電子写真装置用導電性ロール基材ま
たは導電性ベルト基材である。導電性ロール基材とは、
帯電ロール、現像ロール、クリーニングロール、転写ロ
ール等に用いられるロール基材であり、また導電性ベル
ト基材とは、転写ベルト、転写定着ベルト等に用いられ
るベルト基材であって、その材料としては、例えば、ポ
リイミド樹脂(PI)、ポリカーボネート樹脂(P
C)、ポリブチレンテレフタレート(PBT)、ポリア
リレート(PAR)、ポリエチレンナフタレート(PE
N)、ポリエチレンテレフタレート(PET)等のポリ
エステル樹脂、ポリウレタン樹脂(PU)、ポリアミド
樹脂(PA)等の熱可塑性樹脂が挙げられ、それぞれ単
独でまたは混合して用いられ、あるいはポリマーアロイ
として用いられる。また導電性基材によっては、導電性
フィラーが分散されてる。The prepared coating liquid is applied to the surface of a substrate. Examples of the substrate include synthetic resin, glass, metal, and ceramics. The present invention is particularly usefully applied to, for example, a conductive roll substrate or a conductive belt substrate for an electrophotographic apparatus. With the conductive roll substrate,
It is a roll base material used for a charging roll, a developing roll, a cleaning roll, a transfer roll, and the like, and the conductive belt base material is a belt base material used for a transfer belt, a transfer fixing belt, and the like. Are, for example, polyimide resin (PI), polycarbonate resin (P
C), polybutylene terephthalate (PBT), polyarylate (PAR), polyethylene naphthalate (PE)
N), a thermoplastic resin such as a polyester resin such as polyethylene terephthalate (PET), a polyurethane resin (PU), and a polyamide resin (PA). These are used alone or in combination, or used as a polymer alloy. In some conductive base materials, conductive fillers are dispersed.
【0024】基材が樹脂材料からなる場合にあっては、
コーティング液を上記部材上に塗布する前に、予め該部
材表面の汚れを落しておき、紫外線照射処理またはNa
OH化学エッチングで処理してもよい。When the substrate is made of a resin material,
Before applying the coating liquid on the member, the surface of the member is cleaned in advance and subjected to ultraviolet irradiation treatment or Na
It may be processed by OH chemical etching.
【0025】上記基材表面にコーティング液を塗布する
方法としては、公知の方法を利用することが出来、例え
ば、ディップコート、スプレーコート、ロールコート、
フローコート等の方法を利用することが出来る。As a method of applying the coating liquid on the surface of the base material, known methods can be used, for example, dip coating, spray coating, roll coating,
A method such as flow coating can be used.
【0026】基材表面に塗布されたコーティング液は、
加熱処理され導電性有機・無機ハイブリッド皮膜が形成
される。The coating liquid applied to the substrate surface is
Heat treatment forms a conductive organic / inorganic hybrid film.
【0027】加熱処理の条件は、導電性有機・無機ハイ
ブリッド皮膜の種類や膜厚等の条件によって異なるが、
該皮膜にクラックが生じないように加熱時間および加熱
温度が設定され、通常、100〜400℃×0. 5〜1
時間である。The conditions for the heat treatment vary depending on the conditions such as the type and thickness of the conductive organic / inorganic hybrid film.
The heating time and the heating temperature are set so that cracks do not occur in the film, and are usually 100 to 400 ° C. × 0.5 to 1 ° C.
Time.
【0028】導電性有機・無機ハイブリッド皮膜は、有
機成分である有機ケイ素化合物を含んでいることで、例
えば、有機成分を含まない金属酸化物と比較して収縮率
が小く、よって加熱処理の際に発生するクラックは防止
される。Since the conductive organic / inorganic hybrid film contains an organic silicon compound as an organic component, for example, the shrinkage is smaller than that of a metal oxide containing no organic component. Cracks that occur at the time are prevented.
【0029】このようにして得られた導電性有機・無機
ハイブリッド皮膜は、有機成分として、とくに末端シラ
ノールポリジメチルシロキサンを使用した導電性有機・
無機ハイブリッド皮膜は、ポリジメチルシロキサンの主
骨格となっているフレキシブルなシロキサン結合のため
優れた可撓性および弾性を示し、上記基材に対して良好
な密着性を示す。The conductive organic / inorganic hybrid film thus obtained is a conductive organic / inorganic hybrid film using, as an organic component, a silanol polydimethylsiloxane having a terminal silanol.
The inorganic hybrid film exhibits excellent flexibility and elasticity due to the flexible siloxane bond serving as the main skeleton of polydimethylsiloxane, and exhibits good adhesion to the above-mentioned substrate.
【0030】また本発明の導電性有機・無機ハイブリッ
ド皮膜は水との接触角が100°以上であり、トナー離
型性に優れる。The conductive organic / inorganic hybrid film of the present invention has a contact angle with water of 100 ° or more, and is excellent in toner releasability.
【0031】以下、実施例より本発明を更に具体的に説
明するが、本発明の範囲はこれらの実施例に限定される
ものではない。 〔実施例1〕無機成分としてテトライソプロポキシチタ
ンを使用し、有機成分として末端シラノールポリジメチ
ルシロキサン(重量平均分子量6000)を使用した。
エタノールを溶媒とし末端シラノールポリジメチルシロ
キサン:テトライソプロポキシチタン:アセト酢酸エチ
ル:水を0. 25:1:2:2の配合比(モル比)にて
混合して0. 5時間充分攪拌することによって、該テト
ライソプロポキシチタンの十分な加水分解と、一部該末
端ポリジメチルシロキサンとの縮合重合を行ない、有機
・無機ハイブリッドゾル液を調製した。さらに該有機・
無機ハイブリッドゾル液に、導電性フィラーとして平均
粒子径16nmのカーボンを該ゾル液に対して1. 5重
量%添加し、混合攪拌してコーティング液を調整した。
該混合攪拌は、導電性フィラーが添加された有機・無機
ハイブリッドゾル液を遊星運動攪拌装置で10分間攪拌
した。上記コーティング液が塗布される基材は、アルミ
シャフトであり、該アルミシャフトの表面の汚れを十分
落し、フローコートマシーンにセットし、該基材上に上
記コーティング液を塗布した。その後空気雰囲気下、2
00℃で0. 5時間、350℃で0. 1時間加熱処理し
て、該基材表面上に導電性有機・無機ハイブリッド皮膜
を形成した。Hereinafter, the present invention will be described more specifically with reference to examples. However, the scope of the present invention is not limited to these examples. [Example 1] Tetraisopropoxytitanium was used as an inorganic component, and silanol-terminated polydimethylsiloxane (weight average molecular weight 6,000) was used as an organic component.
Using ethanol as a solvent, silanol-terminated polydimethylsiloxane: tetraisopropoxytitanium: ethyl acetoacetate: water is mixed at a mixing ratio of 0.25: 1: 2: 2 (molar ratio) and sufficiently stirred for 0.5 hours. Thus, sufficient hydrolysis of the tetraisopropoxytitanium and partial condensation polymerization with the terminal polydimethylsiloxane were carried out to prepare an organic / inorganic hybrid sol solution. In addition, the organic
1.5 wt% of carbon having an average particle diameter of 16 nm as a conductive filler was added to the inorganic hybrid sol solution, and the mixture was stirred to prepare a coating solution.
In the mixing and stirring, the organic / inorganic hybrid sol to which the conductive filler was added was stirred for 10 minutes by a planetary stirrer. The base material to which the coating liquid was applied was an aluminum shaft. The surface of the aluminum shaft was sufficiently cleaned, and the surface was set on a flow coat machine, and the coating liquid was applied on the base material. Then, under air atmosphere, 2
Heat treatment was performed at 00 ° C. for 0.5 hour and at 350 ° C. for 0.1 hour to form a conductive organic / inorganic hybrid film on the surface of the substrate.
【0032】実施例1により得られた導電性有機・無機
ハイブリッド皮膜の膜厚は23. 0μm、水との接触角
は111. 7°、体積抵抗率は7. 99logΩ・cm
であった。The thickness of the conductive organic / inorganic hybrid film obtained in Example 1 was 23.0 μm, the contact angle with water was 111.7 °, and the volume resistivity was 7.99 log Ω · cm.
Met.
【0033】〔実施例2〕無機成分としてテトライソプ
ロポキシチタンを使用し、有機成分として末端シラノー
ルポリジメチルシロキサン(重量平均分子量6000)
を使用した。エタノールを溶媒とし末端シラノールポリ
ジメチルシロキサン:テトライソプロポキシチタン:ア
セト酢酸エチル:水を0. 25:1:2:2の配合比
(モル比)にて混合して0. 5時間充分攪拌することに
よって、該テトライソプロポキシチタンの十分な加水分
解と、一部該末端ポリジメチルシロキサンとの縮合重合
を行ない、有機・無機ハイブリッドゾル液を調製した。
さらに該有機・無機ハイブリッドゾル液に、導電性フィ
ラーとして平均粒子径16nmのカーボンを該ゾル液に
対して3. 0重量%添加し、混合攪拌してコーティング
液を調整した。該混合攪拌は、導電性フィラーが添加さ
れた有機・無機ハイブリッドゾル液を遊星運動攪拌装置
で10分間攪拌した。上記コーティング液が塗布される
基材は、アルミシャフトであり、該アルミシャフトの表
面の汚れを十分落し、フローコートマシーンにセット
し、該基材上に上記コーティング液を塗布した。その後
空気雰囲気下、200℃で0. 5時間、350℃で0.
1時間加熱処理して、該基材表面上に導電性有機・無機
ハイブリッド皮膜を形成した。Example 2 Tetraisopropoxytitanium was used as an inorganic component, and silanol-terminated polydimethylsiloxane was used as an organic component (weight average molecular weight: 6,000).
It was used. Using ethanol as a solvent, silanol-terminated polydimethylsiloxane: tetraisopropoxytitanium: ethyl acetoacetate: water is mixed at a mixing ratio of 0.25: 1: 2: 2 (molar ratio) and sufficiently stirred for 0.5 hours. Thus, sufficient hydrolysis of the tetraisopropoxytitanium and partial condensation polymerization with the terminal polydimethylsiloxane were carried out to prepare an organic / inorganic hybrid sol solution.
Further, 3.0 wt% of carbon having an average particle diameter of 16 nm as a conductive filler was added to the organic / inorganic hybrid sol solution, and the mixture was stirred to prepare a coating solution. In the mixing and stirring, the organic / inorganic hybrid sol to which the conductive filler was added was stirred for 10 minutes by a planetary stirrer. The base material to which the coating liquid was applied was an aluminum shaft. The surface of the aluminum shaft was sufficiently cleaned, and the surface was set on a flow coat machine, and the coating liquid was applied on the base material. Then, in an air atmosphere, at 200 ° C. for 0.5 hour and at 350 ° C.
Heat treatment was performed for one hour to form a conductive organic / inorganic hybrid film on the surface of the substrate.
【0034】実施例2により得られた導電性有機・無機
ハイブリッド皮膜の膜厚は24. 0μm、水との接触角
は111. 7°、体積抵抗率は5. 70logΩ・cm
であった。The conductive organic / inorganic hybrid film obtained in Example 2 had a thickness of 24.0 μm, a contact angle with water of 111.7 °, and a volume resistivity of 5.70 log Ω · cm.
Met.
【0035】〔比較例1〕無機成分としてテトライソプ
ロポキシチタンを使用し、有機成分として末端シラノー
ルポリジメチルシロキサン(重量平均分子量6000)
を使用した。エタノールを溶媒とし末端シラノールポリ
ジメチルシロキサン:テトライソプロポキシチタン:ア
セト酢酸エチル:水を0. 25:1:2:2の配合比
(モル比)にて混合して0. 5時間充分攪拌することに
よって、該テトライソプロポキシチタンの十分な加水分
解と、一部該末端ポリジメチルシロキサンとの縮合重合
を行ない、有機・無機ハイブリッドゾル液を調製した。
上記コーティング液が塗布される基材は、アルミシャフ
トであり、該アルミシャフトの表面の汚れを十分落し、
フローコートマシーンにセットし、該基材上に上記有機
・無機ハイブリッドゾル液を塗布した。その後空気雰囲
気下、200℃で0. 5時間、350℃で0. 1時間加
熱処理して、該基材表面上に有機・無機ハイブリッド皮
膜を形成した。Comparative Example 1 Tetraisopropoxytitanium was used as an inorganic component, and silanol-terminated polydimethylsiloxane was used as an organic component (weight average molecular weight: 6,000).
It was used. Using ethanol as a solvent, silanol-terminated polydimethylsiloxane: tetraisopropoxytitanium: ethyl acetoacetate: water is mixed at a mixing ratio of 0.25: 1: 2: 2 (molar ratio) and sufficiently stirred for 0.5 hours. Thus, sufficient hydrolysis of the tetraisopropoxytitanium and partial condensation polymerization with the terminal polydimethylsiloxane were carried out to prepare an organic / inorganic hybrid sol solution.
The substrate to which the coating liquid is applied is an aluminum shaft, and sufficiently removes dirt on the surface of the aluminum shaft,
The substrate was set on a flow coat machine, and the organic / inorganic hybrid sol solution was applied onto the substrate. Thereafter, heat treatment was performed in an air atmosphere at 200 ° C. for 0.5 hour and at 350 ° C. for 0.1 hour to form an organic-inorganic hybrid film on the substrate surface.
【0036】比較例1により得られた有機・無機ハイブ
リッド皮膜の膜厚は38. 0μm、水との接触角は10
8.1°、体積抵抗率は8.36logΩ・cmであっ
た。The thickness of the organic-inorganic hybrid film obtained in Comparative Example 1 was 38.0 μm, and the contact angle with water was 10
The volume resistivity was 8.1 ° and the volume resistivity was 8.36 log Ω · cm.
【0037】〔実施例3〕Ti、Si、末端シラノール
ポリジメチルシロキサン(重量平均分子量1500)を
主成分とする導電性有機・無機ハイブリッド皮膜を製造
する。エタノールを溶媒とし末端シラノールポリジメチ
ルシロキサン:テトライソプロポキシチタン:アセト酢
酸エチル:水:テトラエトキシシランを0. 375:
1:2:2:0. 125の配合比(モル比)にて混合し
て0. 5時間充分攪拌し、有機・無機ハイブリッドゾル
液を調製した。さらに該有機・無機ハイブリッドゾル液
に、導電性フィラーとして平均粒子径16nmのカーボ
ンを該ゾル液に対して3. 0重量%添加し、混合攪拌し
てコーティング液を調整した。該混合攪拌は、導電性フ
ィラーが添加された有機・無機ハイブリッドゾル液を遊
星運動攪拌装置で10分間攪拌した。上記コーティング
液が塗布される基材は、アルミシャフトであり、該アル
ミシャフトの表面の汚れを十分落し、フローコートマシ
ーンにセットし、該基材上に上記コーティング液をを塗
布した。その後空気雰囲気下、120℃で0. 5時間加
熱処理して、該基材表面上に導電性有機・無機ハイブリ
ッド皮膜を形成した。Example 3 A conductive organic / inorganic hybrid film containing Ti, Si and terminal silanol polydimethylsiloxane (weight average molecular weight: 1500) as main components is manufactured. Using ethanol as a solvent, terminal silanol polydimethylsiloxane: tetraisopropoxytitanium: ethyl acetoacetate: water: tetraethoxysilane 0.375:
The mixture was mixed at a mixing ratio (molar ratio) of 1: 2: 2: 0.125 and sufficiently stirred for 0.5 hour to prepare an organic / inorganic hybrid sol solution. Further, 3.0 wt% of carbon having an average particle diameter of 16 nm as a conductive filler was added to the organic / inorganic hybrid sol solution, and the mixture was stirred to prepare a coating solution. In the mixing and stirring, the organic / inorganic hybrid sol to which the conductive filler was added was stirred for 10 minutes by a planetary stirrer. The base material to which the coating liquid was applied was an aluminum shaft. The surface of the aluminum shaft was sufficiently cleaned, and the coating liquid was set on a flow coat machine, and the coating liquid was applied to the base material. Thereafter, a heat treatment was performed at 120 ° C. for 0.5 hours in an air atmosphere to form a conductive organic / inorganic hybrid film on the surface of the substrate.
【0038】実施例3により得られた導電性有機・無機
ハイブリッド皮膜の膜厚は15. 0μm、水との接触角
は103. 8°、体積抵抗率は3.49logΩ・cm
であった。実施例3の導電性有機・無機ハイブリッド皮
膜は実施例1および2と比較して加熱工程の温度を低く
することが出来、したがって、クラックの発生をより確
実に防ぐことが出来る。また本実施例3の皮膜は、耐熱
性の低い基材上に着膜が可能である。The thickness of the conductive organic-inorganic hybrid film obtained in Example 3 was 15.0 μm, the contact angle with water was 103.8 °, and the volume resistivity was 3.49 log Ω · cm.
Met. The conductive organic / inorganic hybrid film of Example 3 can lower the temperature of the heating step as compared with Examples 1 and 2, and therefore can more reliably prevent the occurrence of cracks. Further, the film of Example 3 can be formed on a substrate having low heat resistance.
【0039】〔比較例2〕Ti、Si、末端シラノール
ポリジメチルシロキサン(重量平均分子量1500)を
主成分とする有機・無機ハイブリッド皮膜を製造する。
エタノールを溶媒とし末端シラノールポリジメチルシロ
キサン:テトライソプロポキシチタン:アセト酢酸エチ
ル:水:ケイ素を0. 375:1:2:2:0. 125
の配合比(モル比)にて混合して0. 5時間充分攪拌
し、有機・無機ハイブリッドゾル液を調製した。上記コ
ーティング液が塗布される基材は、アルミシャフトであ
り、該アルミシャフトの表面の汚れを十分落し、フロー
コートマシーンにセットし、該基材上に上記有機・無機
ハイブリッドゾル液を塗布した。その後空気雰囲気下、
120℃で0. 5時間加熱処理して、該基材表面上に有
機・無機ハイブリッド皮膜を形成した。Comparative Example 2 An organic / inorganic hybrid film containing Ti, Si and terminal silanol polydimethylsiloxane (weight average molecular weight: 1500) as main components is manufactured.
Using ethanol as a solvent, terminal silanol polydimethylsiloxane: tetraisopropoxytitanium: ethyl acetoacetate: water: silicon 0.375: 1: 2: 2: 0.125
And the mixture was sufficiently stirred for 0.5 hours to prepare an organic / inorganic hybrid sol solution. The substrate to which the coating solution was applied was an aluminum shaft. The surface of the aluminum shaft was sufficiently cleaned, and the aluminum-shaft was set on a flow coat machine, and the organic-inorganic hybrid sol solution was applied onto the substrate. Then under air atmosphere,
Heat treatment was performed at 120 ° C. for 0.5 hour to form an organic-inorganic hybrid film on the surface of the substrate.
【0040】比較例2により得られた有機・無機ハイブ
リッド皮膜の膜厚は25. 0μm、水との接触角は10
3. 7°、体積抵抗率は8.81logΩ・cmであっ
た。The thickness of the organic-inorganic hybrid film obtained in Comparative Example 2 was 25.0 μm, and the contact angle with water was 10
3.7 °, the volume resistivity was 8.81 log Ω · cm.
【0041】〔比較例3〕導電性有機・無機ハイブリッ
ド皮膜の水との接触角と比較するために、金属酸化物皮
膜からなる導電性膜を調製した。テトライソプロポキシ
チタンとエタノールとをモル比1:4で混合した混合溶
液Aと、水とエタノールと塩酸とをモル比1:4:0.
08で混合した混合溶液Bとを調製し、スターラー攪拌
を行いながら、混合溶液Aに混合溶液Bをゆっくりと滴
下し、上記テトライソプロポキシチタンを加水分解し、
Tiゾル液とした。このゾル液を更に0.5時間攪拌
し、該テトライソプロポキシチタンを十分に加水分解す
るとともに、一部脱水重合せしめた。加水分解後のゾル
液にさらに、導電性フィラーとして平均粒子径16nm
のカーボンを該ゾル液に対して1. 5重量%添加し、混
合攪拌してコーティング液を調整した。該混合攪拌は、
導電性フィラーが添加された有機・無機ハイブリッドゾ
ル液を遊星運動攪拌装置で10分間攪拌した。上記コー
ティング液が塗布される基材は、アルミシャフトであ
り、該アルミシャフトの表面の汚れを十分落し、フロー
コートマシーンにセットし、該基材上に上記コーティン
グ液を塗布した。その後空気雰囲気下、120℃で0.
5時間、350℃で0. 1時間加熱処理して、該基材表
面上に導電性金属酸化物皮膜を形成した。Comparative Example 3 A conductive film composed of a metal oxide film was prepared in order to compare the contact angle of the conductive organic / inorganic hybrid film with water. A mixed solution A in which tetraisopropoxytitanium and ethanol are mixed at a molar ratio of 1: 4, and water, ethanol and hydrochloric acid at a molar ratio of 1: 4: 0.
08, and a mixed solution B was slowly added dropwise to the mixed solution A while stirring with a stirrer to hydrolyze the tetraisopropoxy titanium,
A Ti sol solution was used. The sol was further stirred for 0.5 hour to sufficiently hydrolyze the tetraisopropoxytitanium and partially polymerize it by dehydration. The sol solution after hydrolysis is further provided with an average particle diameter of 16 nm as a conductive filler.
Was added to the sol solution at 1.5% by weight and mixed and stirred to prepare a coating solution. The mixing and stirring
The organic / inorganic hybrid sol solution to which the conductive filler was added was stirred for 10 minutes by a planetary stirrer. The base material to which the coating liquid was applied was an aluminum shaft. The surface of the aluminum shaft was sufficiently cleaned, and the surface was set on a flow coat machine, and the coating liquid was applied on the base material. Then, at 120 ° C under air atmosphere.
Heat treatment was performed for 5 hours at 350 ° C. for 0.1 hour to form a conductive metal oxide film on the substrate surface.
【0042】比較例3により得られた導電性金属酸化物
皮膜の膜厚は5. 0μm、水との接触角は76°であっ
た。The thickness of the conductive metal oxide film obtained in Comparative Example 3 was 5.0 μm, and the contact angle with water was 76 °.
【0043】〔比較例4〕比較例3と同様にしてケイ素
を無機成分とする導電性金属酸化物皮膜を調製した。Comparative Example 4 In the same manner as in Comparative Example 3, a conductive metal oxide film containing silicon as an inorganic component was prepared.
【0044】比較例4により得られた導電性金属酸化物
皮膜の膜厚は5. 0μm、水との接触角は66°であっ
た。The thickness of the conductive metal oxide film obtained in Comparative Example 4 was 5.0 μm, and the contact angle with water was 66 °.
【0045】実施例1、2および3の導電性有機・無機
ハイブリッド皮膜は、加熱による収縮が少なく柔軟であ
るため、クラックの発生を防止することが出来る。また
該導電性有機・無機ハイブリッド皮膜は水との接触角は
100°以上であり、比較例3および4との比較から明
らかなように、トナー離型性に優れている。The conductive organic-inorganic hybrid coatings of Examples 1, 2 and 3 are flexible with little shrinkage due to heating, so that cracks can be prevented from occurring. Further, the conductive organic / inorganic hybrid film has a contact angle with water of 100 ° or more, and is excellent in toner releasability as is clear from comparison with Comparative Examples 3 and 4.
【0046】なお本実施例の導電性有機・無機ハイブリ
ッド皮膜は、導電性フィラーは該皮膜中に均一に分散さ
れ、体積抵抗率が均一な導電性膜である。The conductive organic / inorganic hybrid film of this embodiment is a conductive film in which the conductive filler is uniformly dispersed in the film and the volume resistivity is uniform.
【0047】[0047]
【発明の効果】本発明は、ゾルゲル法によって可撓性、
基材との密着性、トナー離型性に優れた導電性皮膜、す
なわち導電性有機・無機ハイブリッドハイブリッド皮膜
を提供することが出来る。According to the present invention, the sol-gel method provides flexibility,
It is possible to provide a conductive film excellent in adhesion to a substrate and toner release properties, that is, a conductive organic / inorganic hybrid hybrid film.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G03G 15/02 101 G03G 15/02 101 4D075 15/08 501 15/08 501D 4J002 15/16 103 15/16 103 4J038 15/20 102 15/20 102 5G301 21/10 H01B 1/14 5G307 H01B 1/14 1/18 1/18 5/14 Z // H01B 5/14 G03G 21/00 312 (72)発明者 信藤 卓也 三重県鈴鹿市伊船町1900番地 鈴鹿富士ゼ ロックス株式会社内 Fターム(参考) 2H003 BB11 CC05 2H032 AA05 BA09 BA18 BA23 2H033 BA07 BA12 BA17 BA19 BB26 2H034 BC03 2H077 AD06 AD07 FA25 4D075 CA03 CA13 CA22 DA06 DA10 DA15 DA20 DB07 DB13 DB14 DB48 DB50 DB53 DC19 DC21 DC24 EA12 EB16 EB43 EC08 EC13 4J002 BM002 CE002 CM012 CP031 CP051 CQ031 DA026 DA036 DE106 DE126 DE136 DG046 DK006 FA082 FA086 FB266 FD112 FD116 GH00 4J038 AA011 CK022 CR072 DL031 DM021 HA026 HA216 HA441 KA12 KA15 MA02 NA20 PC02 PC03 PC08 5G301 DA18 DA19 DA23 DA28 DA32 DA42 5G307 GA01 GC02 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G03G 15/02 101 G03G 15/02 101 4D075 15/08 501 15/08 501D 4J002 15/16 103 103/16 103 4J038 15/20 102 15/20 102 5G301 21/10 H01B 1/14 5G307 H01B 1/14 1/18 1/18 5/14 Z // H01B 5/14 G03G 21/00 312 (72) Inventor Shinto Takuya 1900, Ifuna-cho, Suzuka-shi, Mie F-term (reference) in Suzuka Fuji Xerox Co., Ltd. DB13 DB14 DB48 DB50 DB53 DC19 DC21 DC24 EA12 EB16 EB43 EC08 EC13 4J002 BM002 CE002 CM012 CP031 CP051 CQ031 DA026 DA036 DE106 DE126 DE136 DG046 DK006 FA082 FA086 FB266 FD112 FD116 GH00 4J038 AA011 CK022 CR072 DL031 DM021 HA026 HA216 HA441 KA12 KA15 MA02 NA20 PC02 PC03 PC08 5G301 DA18 DA19 DA23 DA28 DA32 DA42 5G307 GA01 GC
Claims (3)
/または半金属のアルコキシドと有機ケイ素化合物とか
らなる有機・無機ハイブリッド皮膜であって、該皮膜に
は導電性フィラーが分散されていることを特徴とする導
電性有機・無機ハイブリッド皮膜1. An organic / inorganic hybrid film comprising a metal and / or metalloid alkoxide and an organosilicon compound formed by a sol-gel method, wherein a conductive filler is dispersed in the film. Organic / inorganic hybrid coating
材上に形成される請求項1に記載の導電性有機・無機ハ
イブリッド皮膜2. The conductive organic / inorganic hybrid coating according to claim 1, wherein said conductive organic / inorganic hybrid coating is formed on a substrate.
または導電性ベルト基材である請求項2に記載の導電性
有機・無機ハイブリッド皮膜3. The conductive organic / inorganic hybrid film according to claim 2, wherein said substrate is a conductive roll substrate or a conductive belt substrate for an electrophotographic apparatus.
Priority Applications (1)
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|---|---|---|---|
| JP2000274743A JP2002080785A (en) | 2000-09-11 | 2000-09-11 | Electroconductive organic and inorganic hybrid film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000274743A JP2002080785A (en) | 2000-09-11 | 2000-09-11 | Electroconductive organic and inorganic hybrid film |
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| Publication Number | Publication Date |
|---|---|
| JP2002080785A true JP2002080785A (en) | 2002-03-19 |
Family
ID=18760459
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| Country | Link |
|---|---|
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| Date | Code | Title | Description |
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| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20071204 |