JP2002074651A - Method for manufacturing glass substrate for information recording medium, glass substrate for information recording medium, method for manufacturing information recording medium and information recording medium - Google Patents
Method for manufacturing glass substrate for information recording medium, glass substrate for information recording medium, method for manufacturing information recording medium and information recording mediumInfo
- Publication number
- JP2002074651A JP2002074651A JP2000253991A JP2000253991A JP2002074651A JP 2002074651 A JP2002074651 A JP 2002074651A JP 2000253991 A JP2000253991 A JP 2000253991A JP 2000253991 A JP2000253991 A JP 2000253991A JP 2002074651 A JP2002074651 A JP 2002074651A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- recording medium
- information recording
- manufacturing
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 154
- 239000000758 substrate Substances 0.000 title claims abstract description 120
- 238000000034 method Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 39
- 239000002245 particle Substances 0.000 claims abstract description 24
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 46
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 8
- 238000013461 design Methods 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 4
- 239000005345 chemically strengthened glass Substances 0.000 claims description 3
- 238000005728 strengthening Methods 0.000 claims description 3
- 238000011068 loading method Methods 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 10
- 230000008569 process Effects 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 4
- 230000002787 reinforcement Effects 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 1
- 230000003014 reinforcing effect Effects 0.000 abstract 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 27
- 239000010410 layer Substances 0.000 description 27
- 238000005498 polishing Methods 0.000 description 23
- 239000010408 film Substances 0.000 description 16
- 239000002923 metal particle Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000011241 protective layer Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 6
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 239000003599 detergent Substances 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 230000001050 lubricating effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910001149 41xx steel Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000010702 perfluoropolyether Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000004323 potassium nitrate Substances 0.000 description 3
- 235000010333 potassium nitrate Nutrition 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- 235000010344 sodium nitrate Nutrition 0.000 description 3
- 239000004317 sodium nitrate Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000010365 information processing Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910018862 CoN Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- 241000511976 Hoya Species 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- -1 M g Substances 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- 229910000943 NiAl Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- FWFGVMYFCODZRD-UHFFFAOYSA-N oxidanium;hydrogen sulfate Chemical compound O.OS(O)(=O)=O FWFGVMYFCODZRD-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は情報処理機器の記録
媒体として使用される情報記録媒体に用いられる情報記
録媒体用ガラス基板の製造方法及び情報記録媒体用ガラ
ス基板並びに情報記録媒体の製造方法及び情報記録媒体
に関する。The present invention relates to a method of manufacturing a glass substrate for an information recording medium used for an information recording medium used as a recording medium of an information processing device, a glass substrate for an information recording medium, and a method of manufacturing an information recording medium. The present invention relates to an information recording medium.
【０００２】[0002]
【従来の技術】情報処理機器の記録媒体として使用され
る情報記録媒体の一つとして磁気ディスクがある。磁気
ディスクは、基板上に磁性層等の薄膜を形成して構成さ
れたものであり、その基板としてはアルミやガラス基板
が用いられてきた。最近では、高記録密度化の追求に呼
応して、アルミと較べて磁気ヘッドと磁気記録媒体との
間隔をより狭くすることが可能なガラス基板の占める比
率が次第に高くなってきている。2. Description of the Related Art There is a magnetic disk as one of information recording media used as a recording medium of information processing equipment. A magnetic disk is formed by forming a thin film such as a magnetic layer on a substrate, and an aluminum or glass substrate has been used as the substrate. In recent years, in response to the pursuit of higher recording densities, the proportion of glass substrates capable of making the distance between a magnetic head and a magnetic recording medium smaller than that of aluminum has been gradually increasing.
【０００３】このように増加の傾向にあるガラス基板
は、磁気ディスクドライバーに装着された際の衝撃に耐
えるように一般的に強度を増すために化学強化されて製
造されている。又、ガラス基板表面は磁気ヘッドの浮上
高さを極力下げることができるように、高精度に研磨し
て高記録密度化を実現している。他方、ガラス基板だけ
ではなく、磁気ヘッドも薄膜ヘッドから磁気抵抗（ＭＲ
ヘッド）に推移し、高記録密度化に対応できるようにな
ってきている。[0003] The glass substrate which tends to increase in this manner is generally manufactured by chemically strengthening it to increase the strength so as to withstand an impact when mounted on a magnetic disk driver. In addition, the glass substrate surface is polished with high precision to achieve a high recording density so that the flying height of the magnetic head can be reduced as much as possible. On the other hand, not only the glass substrate but also the magnetic head can be moved from the thin film head to the magnetic resistance (MR).
Head), and it is becoming possible to cope with higher recording density.
【０００４】[0004]
【発明が解決しようとする課題】上述したように高記録
密度化にとって必要な低フライングハイト化のために磁
気ディスク表面の高い平坦性は必要不可欠である。加え
て、ＭＲヘッドを用いた場合，ＴＡ（サーマル・アスペ
リティー）の問題からも磁気記録媒体の表面には高い平
坦性が必要となる。このサーマル・アスペリティーは、
磁気ディスクの表面上に突起があると、この突起にＭＲ
ヘッドが影響をうけてＭＲヘッドに熱が発生し、この熱
によってヘッドの抵抗値が変動し電磁変換に誤動作を引
き起こす現象である。As described above, high flatness of the surface of a magnetic disk is indispensable for a low flying height required for a high recording density. In addition, when an MR head is used, high flatness is required on the surface of the magnetic recording medium due to the problem of TA (thermal asperity). This thermal asperity
If there is a protrusion on the surface of the magnetic disk, the protrusion
This is a phenomenon in which the head is affected and heat is generated in the MR head, and this heat causes the resistance value of the head to fluctuate, causing a malfunction in electromagnetic conversion.
【０００５】このように、低フライングハイト化にとっ
ても、サーマル・アスペリティーの発生防止のためにも
磁気ディスク表面の高い平坦性の要請は日増に高まって
きている。このような、磁気ディスク表面の高い平坦性
を得るためには結局高い平坦性の基板表面が求められる
ことになるが、もはや、高精度に基板表面を研磨するだ
けでは、磁気ディスクの高記録密度化を実現できない段
階まで来ている。つまり、いくら、高精度に研磨しても
基板上に異物が付着していては高い平坦性は得られな
い。勿論、従来から異物の除去はなされていたが、従来
では許容されていた基板上の異物が、今日の高密度化の
レベルでは問題視される状況にある。As described above, the demand for high flatness of the magnetic disk surface has been increasing day by day to reduce the flying height and to prevent the occurrence of thermal asperity. In order to obtain such high flatness of the magnetic disk surface, a substrate surface with high flatness is ultimately required. However, if the substrate surface is no longer polished with high precision, the high recording density of the magnetic disk can no longer be obtained. We have reached the stage where we cannot realize the realization. In other words, no matter how high the polishing accuracy, high flatness cannot be obtained if foreign matter adheres to the substrate. Of course, foreign matter has been conventionally removed, but foreign matter on the substrate, which has been conventionally allowed, is considered to be a problem at today's high-density level.
【０００６】この種の異物としては、例えば、通常の洗
浄では除去できない極めて微小な鉄粉、ステンレス片、
ガラスチップ等が挙げられる。これらの鉄粉等のパーテ
ィクルがガラス基板上に付着した状態で磁性膜等の薄膜
を積層すると、磁気ディスク表面に突部が形成され、低
フライング・ハイト化や、サーマル・アスペリティーの
防止の阻害要因になる。このような問題を解決するため
に、化学強化処理液に存在する微小なパーティクルを、
循環する化学強化処理液を濾過するフィルターや磁石に
よって捕捉する化学強化処理方法が提案されている（特
開平１０−１９４７８６）。しかし、フィルターのメッ
シュを通過するパーティクルは捕捉できずにガラス基板
に付着したり、磁石によって捕捉することができないパ
ーティクルについてもガラス基板に付着することがあ
り、低フライング・ハイトや、サーマル・アスペリティ
ーの防止の阻害要因であった。[0006] Such foreign matter includes, for example, extremely fine iron powder, stainless steel pieces, which cannot be removed by ordinary washing.
Glass chips and the like can be mentioned. When a thin film such as a magnetic film is laminated with these particles such as iron powder adhered on a glass substrate, protrusions are formed on the surface of the magnetic disk, which prevents flying height and prevents thermal asperity. Become a factor. In order to solve such a problem, fine particles existing in the chemical
There has been proposed a chemical strengthening treatment method in which a circulating chemical strengthening treatment liquid is captured by a filter or a magnet for filtering (Japanese Patent Laid-Open No. Hei 10-194786). However, particles that pass through the mesh of the filter cannot be captured and adhere to the glass substrate.Particles that cannot be captured by the magnet may also adhere to the glass substrate, resulting in low flying height and thermal asperity. Was an obstacle to the prevention of
【０００７】本発明は、上述の背景の元でなされたもの
であり、化学強化工程において、微小な鉄粉等がパーテ
ィクルのガラス基板に付着することを、より簡便な方法
で確実に防止する情報記録媒体用ガラス基板の製造方法
及び情報記録媒体用ガラス基板並びに情報記録媒体の製
造方法及び情報記録媒体を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made under the above-mentioned background, and information for reliably preventing fine iron powder or the like from adhering to a glass substrate of particles in a chemical strengthening step by a simpler method. An object of the present invention is to provide a method for manufacturing a glass substrate for a recording medium, a glass substrate for an information recording medium, a method for manufacturing an information recording medium, and an information recording medium.
【０００８】[0008]
【課題を解決するための手段】上述の課題を解決するた
めの手段として、第１の手段は、精密研磨したガラス基
板を化学強化処理液に接触させることにより、ガラス基
板の中に含まれる一部のイオンを、そのイオンより大き
なイオン径の処理液中のイオンに置換することによりガ
ラス基板を強化する化学強化工程を含む情報記録媒体用
ガラス基板の製造方法において、前記化学強化工程を行
う前に、化学強化処理液中に存在する微小なパーティク
ルを捕捉するためのダミーガラス部材を投入することを
特徴とする情報記録媒体用ガラス基板の製造方法であ
る。第２の手段は、前記パーティクルは、金属を含むも
のであることを特徴とする第１の手段にかかる情報記録
媒体用ガラス基板の製造方法である。第３の手段は、前
記ダミーガラス部材の投入は、化学強化工程を経た後の
化学強化ガラス基板表面に存在する金属を含む凸部の大
きさが、設計基準値以下となるまで行うことを特徴とす
る第１または第２の手段にかかる情報記録媒体用ガラス
基板の製造方法である。第４の手段は、前記ダミーガラ
ス部材の投入は、複数回行うことを特徴とする第３の手
段にかかる情報記録媒体用ガラス基板の製造方法であ
る。第５の手段は、前記ダミーガラス部材は、シート状
のガラス基板、円形のガラス基板、円盤状のガラス基板
の何れかであることを特徴とする第１乃至第４のいずれ
かの手段にかかる情報記録媒体用ガラス基板の製造方法
である。第６の手段は、情報記録媒体用ガラス基板が磁
気ディスク用ガラス基板であることを特徴とする第１乃
至５のいずれかの手段にかかる情報記録媒体用ガラス基
板の製造方法である。第７の手段は、磁気ディスク用ガ
ラスが、磁気抵抗型ヘッドに使用される磁気ディスク用
ガラス基板であることを特徴とする第６の手段にかかる
情報記録媒体用ガラス基板の製造方法である。第８の手
段は、第１乃至第７のいずれかの手段の製造方法で製造
されたことを特徴とする情報記録媒体用ガラス基板であ
る。第９の手段は、第１乃至第７の何れかの手段にかか
る情報記録媒体用ガラス基板の製造方法によって得られ
たガラス基板上に少なくとも記録層を形成することを特
徴とする情報記録媒体の製造方法である。第１０手段
は、記録層が磁性層であることを特徴とする第８の手段
にかかる情報記録媒体の製造方法である。第１１の手段
は、第９又は第１０の手段にかかる情報記録媒体の製造
方法によって製造されたことを特徴とする情報記録媒体
である。Means for Solving the Problems As a means for solving the above-mentioned problems, a first means is to contact a precision polished glass substrate with a chemical strengthening treatment solution to reduce the content of the glass substrate contained in the glass substrate. In the method for manufacturing a glass substrate for an information recording medium, the method further comprises a chemical strengthening step of strengthening the glass substrate by replacing the ions of the part with ions in a processing solution having an ion diameter larger than the ions, before performing the chemical strengthening step. A dummy glass member for capturing minute particles existing in the chemical strengthening treatment liquid is supplied to the glass substrate for an information recording medium. A second means is the method for manufacturing a glass substrate for an information recording medium according to the first means, wherein the particles include a metal. A third means is that the dummy glass member is charged until the size of the convex portion including the metal present on the surface of the chemically strengthened glass substrate after the chemical strengthening step becomes equal to or smaller than a design reference value. This is a method for producing a glass substrate for an information recording medium according to the first or second means. A fourth means is a method for manufacturing a glass substrate for an information recording medium according to the third means, wherein the dummy glass member is charged a plurality of times. The fifth means is according to any one of the first to fourth means, wherein the dummy glass member is any one of a sheet-like glass substrate, a circular glass substrate, and a disk-like glass substrate. This is a method for manufacturing a glass substrate for an information recording medium. A sixth means is the method for manufacturing a glass substrate for an information recording medium according to any one of the first to fifth means, wherein the glass substrate for the information recording medium is a glass substrate for a magnetic disk. A seventh means is the method for manufacturing a glass substrate for an information recording medium according to the sixth means, wherein the glass for a magnetic disk is a glass substrate for a magnetic disk used in a magnetoresistive head. An eighth means is a glass substrate for an information recording medium, which is manufactured by the manufacturing method of any one of the first to seventh means. A ninth means is a method for forming an information recording medium, characterized in that at least a recording layer is formed on a glass substrate obtained by the method for manufacturing a glass substrate for an information recording medium according to any one of the first to seventh means. It is a manufacturing method. A tenth means is a method for manufacturing an information recording medium according to the eighth means, wherein the recording layer is a magnetic layer. An eleventh means is an information recording medium manufactured by the method for manufacturing an information recording medium according to the ninth or tenth means.
【０００９】上述の手段において、化学強化方法として
は、ガラス転移温度を超えない領域でイオン交換を行う
低温型化学強化が好ましい。化学強化処理溶液として用
いるアルカリ溶融塩としては、硝酸カリウム、硝酸ナト
リウム、あるいはそれらを混合した硝酸塩、Ｎａ２ＳＯ
４、Ｋ２ＳＯ４、ＮａＢｒ、ＫＢｒなどが使用できる。
又、ガラス基板としてはアルミノシリケートガラス、ソ
ーダライムガラス、ホウケイ酸ガラス、鉛ガラスが使用
できる。In the above-mentioned means, as the chemical strengthening method, low-temperature chemical strengthening in which ion exchange is performed in a region not exceeding the glass transition temperature is preferable. As the alkali molten salt used as the chemical strengthening treatment solution, potassium nitrate, sodium nitrate, a nitrate mixed with them, Na2SO4
4, K2SO4, NaBr, KBr and the like can be used.
As the glass substrate, aluminosilicate glass, soda lime glass, borosilicate glass, or lead glass can be used.
【００１０】パーティクルとしては、Ｆｅ、Ｎａ、Ｍ
ｇ、Ｓｉ、Ｃｒ、Ｎｉ、Ｋ、Ａｌ、Ｋｒ等の金属、鉄
粉、ステンレス等の金属片や金属酸化物、ガラスチップ
がある。詳細なメカニズムはわからないが、ダミーガラ
ス部材を投入することによって、化学強化処理液中に存
在する微小なパーティクルがダミーガラスに吸着し、捕
捉することができる。投入する部材の材料をガラスとし
ているので、特に化学強化の際にガラスに悪影響を及ぼ
すパーティクルを効果的に取り除くことができるものと
考えられる。但し、ガラス部材は、化学強化処理液の高
熱に耐え得る耐熱性のあるガラスが好ましい。好ましく
は、実際化学強化するガラスの硝種を同じものが望まし
い。As the particles, Fe, Na, M
g, metals such as Si, Cr, Ni, K, Al, and Kr, iron powder, metal pieces such as stainless steel, metal oxides, and glass chips. Although the detailed mechanism is unknown, by introducing the dummy glass member, minute particles existing in the chemical strengthening treatment liquid can be adsorbed and captured by the dummy glass. Since glass is used as the material of the member to be charged, it is considered that particles that adversely affect the glass, particularly during chemical strengthening, can be effectively removed. However, the glass member is preferably a glass having heat resistance that can withstand the high heat of the chemical strengthening treatment liquid. Preferably, the same glass type is actually used for chemical strengthening.
【００１１】ダミーガラス部材の投入は、化学強化工程
によって得られる化学強化ガラス基板に、ガラス基板に
金属を含む凸部がある設計基準値以下となる程度まで行
うことが好ましい。ここで設計基準値以下とは、凸部が
ヘッドクラッシュや、サーマルアスペリティーを起こさ
ない程度の高さとなる値や、ヘッドクラッシュや、サー
マルアスペリティーを引き起こす不良品がある一定の確
率となる値などをいう。It is preferable that the dummy glass member is charged to the extent that the projections containing metal on the chemically strengthened glass substrate obtained by the chemical strengthening step are less than a design standard value. Here, the value below the design standard value means a value at which the protrusion has a height that does not cause a head crash or thermal asperity, a value at which there is a certain probability of a defective product causing a head crash or thermal asperity, etc. Say.
【００１２】また、ダミーガラス部材の投入は、１回で
も、複数回行ってもよい。複数回行うことで、化学強化
処理液中に存在するパーティクルを確実に行うことがで
きるので好ましい。また、ダミーガラス部材の投入時期
は、生産量に応じて数バッチ毎に定期的に行っても良い
し、製造する毎に行ってもよい。The dummy glass member may be charged once or a plurality of times. It is preferable to perform the treatment a plurality of times because particles existing in the chemical strengthening treatment liquid can be reliably carried out. Further, the dummy glass member may be charged at regular intervals of several batches according to the production volume, or at each time of manufacture.
【００１３】また、ダミーガラス部材の投入時の時間
や、化学強化処理液の温度は特に制限はない。例えば、
投入の時間は、数十分から数十時間、温度は、３００〜
４５０℃の範囲内で適宜選択することができる。There is no particular limitation on the time when the dummy glass member is charged or the temperature of the chemical strengthening treatment liquid. For example,
The charging time is from tens of minutes to tens of hours, and the temperature is from 300 to
It can be appropriately selected within the range of 450 ° C.
【００１４】ダミーガラス部材は、微小なパーティクル
を効果的に捕捉することができるように表面積が大きい
ものが望ましい。具体的な形状としては、例えばシート
状のガラス基板、円形のガラス基板、円板状のガラス基
板が挙げられる。化学強化を行う際のガラス基板を保持
する保持部材（基板カセット）を使うためには、円形の
ガラス基板、円板状のガラス基板が好ましい。The dummy glass member desirably has a large surface area so that minute particles can be effectively captured. Specific shapes include, for example, a sheet-shaped glass substrate, a circular glass substrate, and a disk-shaped glass substrate. In order to use a holding member (substrate cassette) for holding a glass substrate during chemical strengthening, a circular glass substrate or a disk-shaped glass substrate is preferable.
【００１５】情報記録媒体用ガラス基板には、磁気記録
媒体用ガラス基板、光記録媒体用ガラス基板、光磁気記
録媒体用ガラス基板等がある。特に磁気抵抗型ヘッド用
磁気ディスク及びその基板の製造方法に顕著な効果を奏
する。The glass substrate for an information recording medium includes a glass substrate for a magnetic recording medium, a glass substrate for an optical recording medium, a glass substrate for a magneto-optical recording medium, and the like. In particular, the present invention has a remarkable effect on the method of manufacturing a magnetic disk for a magnetoresistive head and its substrate.
【００１６】本発明の磁気記録媒体は、上記本発明の磁
気記録媒体用ガラス基板上に、少なくとも磁性層を形成
したものである。本発明では、サーマル・アスペリティ
ーあるいはヘッドクラッシュの原因となるパーティクル
が付着することがないので、ガラス基板上に磁性層等を
形成して磁気記録媒体を製造する際にガラス基板の主表
面にサーマル・アスペリティーの原因となるパーティク
ルによって形成される凸部が発生せず、より高いレベル
でヘッドクラッシュを防止できる。特に、磁気抵抗型ヘ
ッドによって再生を行う磁気記録媒体にとって、磁気抵
抗型ヘッドの機能を十分に引き出すことができる。ま
た、磁気抵抗型ヘッドに好適に使用することができるＣ
ｏＰｔ系等の磁気記録媒体としてもその性能を十分に引
き出すことができる。The magnetic recording medium of the present invention is obtained by forming at least a magnetic layer on the above-mentioned glass substrate for a magnetic recording medium of the present invention. In the present invention, since particles that cause thermal asperity or head crash do not adhere, when a magnetic layer or the like is formed on a glass substrate to manufacture a magnetic recording medium, the thermal surface is applied to the main surface of the glass substrate. A projection formed by particles that cause asperity does not occur, and a higher level of head crash can be prevented. In particular, the function of the magnetoresistive head can be fully exploited for a magnetic recording medium that performs reproduction with the magnetoresistive head. Further, C which can be suitably used for a magnetoresistive head can be used.
The performance of a magnetic recording medium such as an oPt system can be sufficiently brought out.
【００１７】同様に、磁気記録媒体の記録・再生面にお
いてもサーマル・アスペリティーの原因となるパーティ
クルによって形成される凸部が発生せず、より高いレベ
ルでヘッドクラッシュを防止できる。また、サーマル・
アスペリティーの原因となるパーティクルによって、磁
性層等の膜に欠陥が発生しエラーの原因となるというこ
ともない。Similarly, on the recording / reproducing surface of the magnetic recording medium, no convex portion formed by particles causing thermal asperity does not occur, and a higher level of head crash can be prevented. In addition, thermal
The particles that cause asperity do not cause defects in films such as the magnetic layer to cause errors.
【００１８】磁気記録媒体は、通常、所定の平坦度、表
面粗さを有し、必要に応じ表面の化学強化処理を施した
磁気ディスク用ガラス基板上に、下地層、磁性層、保護
層、潤滑層を順次積層して製造する。The magnetic recording medium usually has a predetermined flatness and surface roughness, and has an underlayer, a magnetic layer, a protective layer, It is manufactured by sequentially laminating a lubricating layer.
【００１９】本発明の磁気記録媒体における下地層は、
磁性層に応じて選択される。下地層としては、例えば、
Ｃｒ、Ｍｏ、Ｔａ、Ｔｉ、Ｗ、Ｖ、Ｂ、Ｎｉ、Ａｌなど
の非磁性金属から選ばれる少なくとも一種以上の材料か
らなる下地層等が挙げられる。Ｃｏを主成分とする磁性
層の場合には、磁気特性向上等の観点からＣｒ単体やＣ
ｒ合金であることが好ましい。また、下地層は単層とは
限らず、同一又は異種の層を積層した複数層構造とする
こともできる。例えば、Ｃｒ／Ｃｒ、Ｃｒ／ＣｒＭｏ、
Ｃｒ／ＣｒＶ、ＣｒＶ／ＣｒＶ、Ａｌ／Ｃｒ／ＣｒＭ
ｏ、Ａｌ／Ｃｒ／Ｃｒ、Ａｌ／Ｃｒ／ＣｒＶ、Ａｌ／Ｃ
ｒＶ／ＣｒＶ等の多層下地層等が挙げられる。The underlayer in the magnetic recording medium of the present invention comprises:
It is selected according to the magnetic layer. As the underlayer, for example,
Examples include an underlayer made of at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Ni, and Al. In the case of a magnetic layer containing Co as a main component, Cr alone or C
It is preferably an r alloy. The underlayer is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked. For example, Cr / Cr, Cr / CrMo,
Cr / CrV, CrV / CrV, Al / Cr / CrM
o, Al / Cr / Cr, Al / Cr / CrV, Al / C
Examples include a multi-layer underlayer such as rV / CrV.
【００２０】本発明の磁気記録媒体における磁性層の材
料は特に制限されない。磁性層としては、例えば、Ｃｏ
を主成分とするＣｏＰｔ、ＣｏＣｒ、ＣｏＮｉ、ＣｏＮ
ｉＣｒ、ＣｏＣｒＴａ、ＣｏＰｔＣｒ、ＣｏＮｉＰｔ
や、ＣｏＮｉＣｒＰｔ、ＣｏＮｉＣｒＴａ、ＣｏＣｒＴ
ａＰｔ、ＣｏＣｒＰｔＢ、ＣｏＣｒＰｔＳｉＯなどの磁
性薄膜が挙げられる。磁性層は、磁性膜を非磁性膜（例
えば、Ｃｒ、ＣｒＭｏ、ＣｒＶなど）で分割してノイズ
の低減を図った多層構成（例えば、ＣｏＰｔＣｒ／Ｃｒ
Ｍｏ／ＣｏＰｔＣｒ、ＣｏＣｒＴａＰｔ／ＣｒＭｏ／Ｃ
ｏＣｒＴａＰｔなど）としてもよい。The material of the magnetic layer in the magnetic recording medium of the present invention is not particularly limited. As the magnetic layer, for example, Co
, CoPt, CoCr, CoNi, CoN containing
iCr, CoCrTa, CoPtCr, CoNiPt
Or CoNiCrPt, CoNiCrTa, CoCrT
Magnetic thin films such as aPt, CoCrPtB, and CoCrPtSiO can be used. The magnetic layer has a multilayer structure (for example, CoPtCr / Cr) in which a magnetic film is divided by a non-magnetic film (for example, Cr, CrMo, CrV, etc.) to reduce noise.
Mo / CoPtCr, CoCrTaPt / CrMo / C
oCrTaPt).
【００２１】磁気抵抗型ヘッド（ＭＲヘッド）又は巨大
磁気抵抗型ヘッド（ＧＭＲヘッド）対応の磁性層として
は、Ｃｏ系合金に、Ｙ、Ｓｉ、希土類元素、Ｈｆ、Ｇ
ｅ、Ｓｎ、Ｚｎから選択される不純物元素、又はこれら
の不純物元素の酸化物を含有させたものなども含まれ
る。As a magnetic layer corresponding to a magnetoresistive head (MR head) or a giant magnetoresistive head (GMR head), Co, Y, Si, rare earth elements, Hf, G
An impurity element selected from e, Sn, and Zn, or an element containing an oxide of these impurity elements is also included.
【００２２】また、磁性層としては、上記の他、フェラ
イト系、鉄−希土類系や、ＳｉＯ2、ＢＮなどからなる
非磁性膜中にＦｅ、Ｃｏ、ＦｅＣｏ、ＣｏＮｉＰｔ等の
磁性粒子が分散された構造のグラニュラーなどであって
もよい。また、磁性層は、内面型、垂直型のいずれの記
録形式であってもよい。As the magnetic layer, in addition to the above, magnetic particles such as Fe, Co, FeCo, and CoNiPt are dispersed in a nonmagnetic film made of ferrite, iron-rare earth, SiO 2 , BN, or the like. It may be a granular structure or the like. Further, the magnetic layer may have any of an inner surface type and a perpendicular type recording format.
【００２３】本発明の磁気記録媒体における保護層は特
に制限されない。保護層としては、例えば、Ｃｒ膜、Ｃ
ｒ合金膜、カーボン膜、ジルコニア膜、シリカ膜等が挙
げられる。これらの保護膜は、下地層、磁性層等ととも
にインライン型スパッタ装置で連続して形成できる。ま
た、これらの保護膜は、単層としてもよく、あるいは、
同一又は異種の膜からなる多層構成としてもよい。The protective layer in the magnetic recording medium of the present invention is not particularly limited. As the protective layer, for example, a Cr film, C
r alloy films, carbon films, zirconia films, silica films, and the like. These protective films can be continuously formed with an underlayer, a magnetic layer, and the like by an in-line type sputtering apparatus. Further, these protective films may be a single layer, or
It may have a multilayer structure composed of the same or different films.
【００２４】本発明では、上記保護層上に、あるいは上
記保護層に替えて、他の保護層を形成してもよい。例え
ば、上記保護層に替えて、Ｃｒ膜の上にテトラアルコキ
シランをアルコール系の溶媒で希釈した中に、コロイダ
ルシリカ微粒子を分散して塗布し、さらに焼成して酸化
ケイ素（ＳｉＯ2）膜を形成してもよい。In the present invention, another protective layer may be formed on the above protective layer or in place of the above protective layer. For example, instead of the above-mentioned protective layer, colloidal silica fine particles are dispersed and applied to a Cr film after diluting tetraalkoxylan with an alcohol-based solvent, and then fired to form a silicon oxide (SiO 2 ) film. It may be formed.
【００２５】本発明の磁気記録媒体における潤滑層は特
に制限されない。潤滑層は、例えば、液体潤滑剤である
パーフロロポリエーテル（ＰＦＰＥ）をフレオン系など
の溶媒で希釈し、媒体表面にディッピング法、スピンコ
ート法、スプレイ法によって塗布し、必要に応じ加熱処
理を行って形成する。The lubricating layer in the magnetic recording medium of the present invention is not particularly limited. The lubricating layer is prepared by, for example, diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as freon, and applying it to the medium surface by dipping, spin coating, or spraying. Go to form.
【００２６】[0026]
【発明の実施の形態】以下、実施例に基づき本発明をさ
らに具体的に説明する。この実施例にかかる情報記録媒
体用ガラス基板の製造法及び情報記録媒体の製造方法
は、（１）粗ラッピング・形状加工工程、（２）端面加
工工程、（３）精ラッピング工程、（４）第一研磨工
程、（５）第二研磨工程、（６）ダミーガラス投入工
程、（７）化学強化工程、（８）洗浄工程、（９）磁気
ディスク製造工程、からなる。以下、これらの工程を詳
細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described more specifically based on examples. The method for manufacturing a glass substrate for an information recording medium and the method for manufacturing an information recording medium according to this embodiment include (1) a rough lapping / shape processing step, (2) an end face processing step, (3) a fine lapping step, and (4) It comprises a first polishing step, (5) a second polishing step, (6) a dummy glass charging step, (7) a chemical strengthening step, (8) a cleaning step, and (9) a magnetic disk manufacturing step. Hereinafter, these steps will be described in detail.
【００２７】（１）粗ラッピング工程・形状加工工程 まず、溶融ガラスを、上型、下型、胴型を用いたダイレ
クトプレスして、直径９６ｍｍφ、厚さ１．５ｍｍの円
盤状のアルミノシリケイトガラスからなるガラス基板を
得た。この場合、ダイレクトプレス法の代わりに、ダウ
ンドロー法やフロート法で形成したシートガラスから研
削砥石で切り出して円盤状のガラス基板を得ても良い。(1) Rough lapping step / shape processing step First, a molten glass is directly pressed using an upper mold, a lower mold, and a body mold to form a disc-shaped aluminosilicate glass having a diameter of 96 mmφ and a thickness of 1.5 mm. Was obtained. In this case, instead of the direct press method, a disk-shaped glass substrate may be obtained by cutting out a sheet glass formed by a down-draw method or a float method with a grinding wheel.
【００２８】なお、アルミノシリケイトガラスとして
は、モル％表示で、ＳｉＯ2を５７〜７４％、ＺｒＯ2を
０〜２．８％、Ａｌ2Ｏ3を３〜１５％、ＬｉＯ2を７〜
１６％、Ｎａ2Ｏを４〜１４％、を主成分として含有す
る化学強化用ガラス（例えば、モル％表示で、Ｓｉ
Ｏ2：６７．０％、ＺｒＯ2：１．０％、Ａｌ2Ｏ3：９．
０％、ＬｉＯ2：１２．０％、Ｎａ2Ｏ：１０．０％を主
成分として含有する化学強化用ガラス）を使用した。As the aluminosilicate glass, in terms of mol%, SiO 2 is 57 to 74%, ZrO 2 is 0 to 2.8%, Al 2 O 3 is 3 to 15%, and LiO 2 is 7 to 74%.
Glass for chemical strengthening containing 16% and 4 to 14% of Na 2 O as main components (for example, Si
O 2 : 67.0%, ZrO 2 : 1.0%, Al 2 O 3 : 9.
Glass for chemical strengthening containing 0%, LiO 2 : 12.0%, and Na 2 O: 10.0% as main components) was used.
【００２９】次いで、ガラス基板にラッピング工程を施
した。このラッピング工程は、寸法精度及び形状精度の
向上を目的としている。ラッピング工程は、両面ラッピ
ング装置を用いて行い、砥粒の粒度を＃４００で行っ
た。詳しくは、はじめに粒度＃４００のアルミナ砥粒を
用い、サンギアとインターナルギアを回転させることに
よって、キャリア内に収納したガラス基板の両面を面精
度０〜１μｍ、表面粗さ（Ｒｍａｘ）６μｍ（ＪＩＳ
Ｂ ０６０１で測定）程度にラッピングした。Next, a lapping step was performed on the glass substrate. This lapping step aims at improving dimensional accuracy and shape accuracy. The lapping process was performed using a double-sided lapping apparatus, and the grain size of the abrasive grains was performed at # 400. More specifically, first, by using an alumina abrasive having a grain size of # 400 and rotating a sun gear and an internal gear, both surfaces of a glass substrate housed in a carrier are surface accuracy of 0 to 1 μm and surface roughness (Rmax) is 6 μm (JIS).
B 0601).
【００３０】次に、円筒状の砥石を用いてガラス基板の
中央部分に孔を開けるとともに、外周端面も研削して直
径を９５ｍｍφとした後、外周端面及び内周面に所定の
面取り加工を施した。このときのガラス基板端面の表面
粗さは、Ｒｍａｘで４μｍ程度であった。Next, a hole is formed in the center of the glass substrate using a cylindrical grindstone, and the outer peripheral end surface is also ground to a diameter of 95 mmφ. Then, the outer peripheral end surface and the inner peripheral surface are subjected to predetermined chamfering. did. At this time, the surface roughness of the end face of the glass substrate was about 4 μm in Rmax.
【００３１】（２）端面鏡面加工工程 次いで、ブラシ研磨により、ガラス基板を回転させなが
らガラス基板の端面の表面粗さを、Ｒｍａｘで１μｍ、
Ｒａで０．３μｍ程度に研磨した。上記端面鏡面加工を
終えたガラス基板の表面を水洗浄した。(2) Mirror Processing of End Surface Next, the surface roughness of the end surface of the glass substrate is set to 1 μm in Rmax while rotating the glass substrate by brush polishing.
Polished to about 0.3 μm with Ra. The surface of the glass substrate that had been subjected to the end surface mirror finishing was washed with water.
【００３２】（３）精ラッピング工程 次に、砥粒の粒度を＃１０００に変え、ガラス基板の表
面をラッピングすることにより、表面粗さをＲｍａｘで
２μｍ程度、Ｒａで０．２μｍ程度とした。上記ラッピ
ング工程を終えたガラス基板を、中性洗剤、水の各洗浄
槽（超音波印加）に順次浸漬して、洗浄した。(3) Fine Lapping Step Next, the particle size of the abrasive grains was changed to # 1000, and the surface of the glass substrate was wrapped to make the surface roughness about 2 μm in Rmax and about 0.2 μm in Ra. The glass substrate after the lapping step was washed by sequentially immersing the glass substrate in a neutral detergent and water in washing tanks (by applying ultrasonic waves).
【００３３】（４）第一研磨工程 次に、第一研磨工程を施した。この第一研磨工程は、上
述した砂掛け工程で残留したキズや歪みの除去を目的と
するもので、研磨装置を用いて行った。詳しくは、ポリ
シャ（研磨粉）として硬質ポリシャ（セリウムパッドＭ
ＨＣ１５：ローデルニッタ製）を用い、以下の研磨条件
で第一研磨工程を実施した。 研磨液：酸化セリウム＋水 荷重：１４０ｇ／ｃｍ2 研磨時間：１５分 除去量：３０μｍ(4) First Polishing Step Next, a first polishing step was performed. This first polishing step is intended to remove scratches and distortion remaining in the above sanding step, and was performed using a polishing apparatus. For details, use a hard polisher (cerium pad M) as polisher (polishing powder).
HC15: manufactured by Rodelnita), and the first polishing step was performed under the following polishing conditions. Polishing liquid: cerium oxide + water Load: 140 g / cm 2 Polishing time: 15 minutes Removal amount: 30 μm
【００３４】上記第一研磨工程を終えたガラス基板を、
中性洗剤、純水、純水、ＩＰＡ（イソプロピルアルコー
ル）、ＩＰＡ（蒸気乾燥）の各洗浄槽（超音波印加）に
順次浸漬して、洗浄した。After the first polishing step, the glass substrate is
Washing was performed by sequentially immersing in a washing tank (ultrasonic application) of a neutral detergent, pure water, pure water, IPA (isopropyl alcohol), and IPA (steam drying).
【００３５】（５）第二研磨工程 次に、第一研磨工程で使用した研磨装置を用い、ポリシ
ャを硬質ポリシャから軟質ポリシャ（ポリテックス：ス
ピードファム社製）に替えて、第二研磨工程を実施し
た。研磨条件は、荷重を１００ｇ／ｃｍ2、研磨時間を
５分、除去量を５μｍとしたこと以外は、第一研磨工程
と同様とした。(5) Second Polishing Step Next, using the polishing apparatus used in the first polishing step, the polisher is changed from a hard polisher to a soft polisher (Polytex: manufactured by Speed Fam), and the second polishing step is performed. Carried out. The polishing conditions were the same as in the first polishing step, except that the load was 100 g / cm 2 , the polishing time was 5 minutes, and the removal amount was 5 μm.
【００３６】上記第二研磨工程を終えたガラス基板を、
熱硫酸、中性洗剤、中性洗剤、純水、純水、ＩＰＡ（イ
ソプロピルアルコール）、ＩＰＡ（蒸気乾燥）の各洗浄
槽に順次浸漬して、洗浄した。なお、各洗浄槽には超音
波を印加した。The glass substrate after the second polishing step is
Washing was performed by sequentially immersing in hot water sulfuric acid, a neutral detergent, a neutral detergent, pure water, pure water, IPA (isopropyl alcohol), and IPA (steam drying). In addition, ultrasonic waves were applied to each cleaning tank.
【００３７】（６）化学強化処理液にダミーガラス部材
の投入 耐食性を有するステンレス合金からなる複数の基板カセ
ットに円板状のガラス基板を１００００枚セットした
後、化学強化装置に硝酸カリウム（６０％）と硝酸ナト
リウム（４０％）を投入し、３８０〜４００℃で１２時
間加熱させた化学強化処理液に、１時間浸漬する。(6) Loading of dummy glass member into chemical strengthening treatment liquid After 10,000 disk-shaped glass substrates are set in a plurality of substrate cassettes made of a corrosion-resistant stainless steel alloy, potassium nitrate (60%) is placed in a chemical strengthening device. And sodium nitrate (40%), and immersed in a chemically strengthened treatment solution heated at 380 to 400 ° C. for 12 hours for 1 hour.
【００３８】ダミーガラス部材を化学強化処理液から引
き上げたダミーガラス部材の表面を電子顕微鏡で観察し
たところ、ダミーガラス部材の表面の一面に凸部が点在
していることが確認された。また、ダミーガラス部材の
表面に付着した凸部を分析したところ、Ｆｅ、Ｃｒ等の
金属を含むものであった。ダミーガラス部材を新たなも
のに変え、同様に化学強化処理液に浸漬し、引き上げる
工程を、７回繰り返した（延べ７００００枚の投入）。
ダミーガラス部材の投入を繰り返す毎にダミーガラス部
材の表面を観察したが、回数を重ねるに従って、付着す
る凸部が減少していることが確認された。When the surface of the dummy glass member pulled up from the chemical strengthening treatment liquid was observed with an electron microscope, it was confirmed that projections were dotted on one surface of the surface of the dummy glass member. The analysis of the projections attached to the surface of the dummy glass member revealed that the projections contained metals such as Fe and Cr. The process of changing the dummy glass member to a new one, immersing it in a chemical strengthening treatment solution and pulling it up was repeated seven times (total of 70,000 sheets).
Each time the dummy glass member was repeatedly charged, the surface of the dummy glass member was observed. As the number of times increased, however, it was confirmed that the number of convex portions to be attached decreased.
【００３９】（７）化学強化工程 次に、上記研削、研磨、洗浄工程を終えたガラス基板に
以下のように化学強化を施した。上述の硝酸カリウム
（６０％）と硝酸ナトリウム（４０％）を混合した化学
強化溶液を化学強化処理装置で４００℃に加熱し、３０
０℃に予熱された洗浄済みのガラス基板を約３時間浸漬
した。この浸漬の際に、ガラス基板の表面全体が化学強
化されるようにするため、複数のガラス基板が端面で保
持されるようにホルダーに収納した状態で行った。(7) Chemical Strengthening Step Next, the glass substrate after the above-mentioned grinding, polishing and cleaning steps was chemically strengthened as follows. The above-mentioned chemical strengthening solution obtained by mixing potassium nitrate (60%) and sodium nitrate (40%) is heated to 400 ° C.
The cleaned glass substrate preheated to 0 ° C. was immersed for about 3 hours. In this immersion, in order to chemically strengthen the entire surface of the glass substrate, the immersion was performed in a state where a plurality of glass substrates were housed in a holder so as to be held at end faces.
【００４０】このように、化学強化溶液に浸漬処理する
ことによって、ガラス基板表層のリチウムイオン、ナト
リウムイオンは、化学強化溶液中のナトリウムイオン、
カリウムイオンにそれぞれ置換されガラス基板は強化さ
れる。化学強化の結果、ガラス基板の表層に形成された
圧縮応力層の厚さは、約１００〜２００μｍであった。As described above, by performing the immersion treatment in the chemical strengthening solution, the lithium ions and the sodium ions on the surface layer of the glass substrate become the sodium ions and the sodium ions in the chemical strengthening solution.
The glass substrate is strengthened by being respectively substituted by potassium ions. As a result of the chemical strengthening, the thickness of the compressive stress layer formed on the surface layer of the glass substrate was about 100 to 200 μm.
【００４１】（８）洗浄工程 上記化学強化を終えたガラス基板を、２０℃の水槽に浸
漬して急冷し約１０分間維持した。上記急冷を終えたガ
ラス基板を、約４０℃に加熱した硫酸に浸漬し、超音波
をかけながら洗浄を行った。さらに、中性洗剤、純水、
純水、ＩＰＡ（イソプロピルアルコール）、ＩＰＡ（蒸
気乾燥）の各洗浄槽（超音波印加）に順次浸漬して、洗
浄した。上記の工程を経て得られたガラス基板の表面粗
さＲａは０．５〜１ｎｍであった。さらに、ガラス表面
を精密検査したところサーマル・アスペリティーの原因
となるパーティクルは認められなかった。特に、３〜５
ミクロン以上の鉄粉は全く認められなかった。(8) Cleaning Step The glass substrate that had been subjected to the chemical strengthening was immersed in a water bath at 20 ° C., rapidly cooled, and maintained for about 10 minutes. The quenched glass substrate was immersed in sulfuric acid heated to about 40 ° C., and washed while applying ultrasonic waves. In addition, neutral detergent, pure water,
The substrate was sequentially immersed in each of cleaning tanks (ultrasonic application) of pure water, IPA (isopropyl alcohol), and IPA (steam drying) for cleaning. The surface roughness Ra of the glass substrate obtained through the above steps was 0.5 to 1 nm. Further, upon close inspection of the glass surface, no particles causing thermal asperity were found. In particular, 3-5
No iron powder of more than micron was observed.
【００４２】（９）磁気ディスク製造工程 上述した工程を経て得られた磁気ディスク用ガラス基板
の両面に、インライン式のスパッタリング装置を用い
て、ＮｉＡｌシード層、Ｃｒ下地層、ＣｒＶ下地層、Ｃ
ｏＰｔＣｒＢ磁性層、Ｃ保護層を順次成膜し、ディップ
法によりパーフルオロポリエーテル潤滑層を成膜して磁
気ディスクを得た。(9) Magnetic Disk Manufacturing Process A NiAl seed layer, a Cr underlayer, a CrV underlayer, and a CV underlayer are formed on both surfaces of the magnetic disk glass substrate obtained through the above-described processes by using an in-line sputtering apparatus.
An oPtCrB magnetic layer and a C protective layer were sequentially formed, and a perfluoropolyether lubricating layer was formed by dipping to obtain a magnetic disk.
【００４３】得られた磁気ディスク（１０００枚）につ
いてグライドテストを実施したところ、ヒット（ヘッド
が磁気ディスク表面の突起にかすること）やクラッシュ
（ヘッドが磁気ディスク表面の突起に衝突すること）は
認められなかった。また、サーマル・アスぺリティーの
原因となるパーティクルによって、磁性層等の膜に欠陥
が発生していないことも確認できた。When a glide test was performed on the obtained magnetic disks (1000), hits (the head hits the protrusions on the magnetic disk surface) and crashes (the head hits the protrusions on the magnetic disk surface) I was not able to admit. Also, it was confirmed that no defect was generated in the film such as the magnetic layer due to the particles causing the thermal asperity.
【００４４】（比較例）上述の実施例において、ダミー
ガラス部材を投入しないでガラス基板を化学強化した以
外は実施例１と同様にして磁気ディスク用ガラス基板、
および磁気ディスクを作製した。得られた磁気ディスク
（１０００枚）についてグライドテスト、磁気抵抗型ヘ
ッドで再生試験を実施したところ、４５０枚がグライド
不良、再生の誤動作が確認された。Comparative Example A glass substrate for a magnetic disk was prepared in the same manner as in Example 1 except that the glass substrate was chemically strengthened without introducing a dummy glass member.
And a magnetic disk was produced. When a glide test and a reproduction test were performed on the obtained magnetic disks (1000 sheets) using a magnetoresistive head, 450 sheets were found to have poor glide and malfunction in reproduction.
【００４５】次に、上述の実施例において、ダミーガラ
ス部材の投入枚数を、１１８００、２３６００、３５４
００、４７２００、５９０００、７０８００、８２６０
０、９４４００にして、それぞれの場合の金属パーティ
クルが付着したガラス基板の発見率を調べた。図１はダ
ミーガラス部材の投入枚数と金属パーティクル発見率と
の関係を示すグラフである。金属パーティクル発見率
は、ガラス基板の表面を目視観察し、ガラス基板表面に
１つでも金属パーティクルが発見された場合１つとして
数え、［金属パーティクルが発見された基板の枚数］／
［ダミープレート積算枚数］で計算した値である。Next, in the above-described embodiment, the number of dummy glass members to be charged is 11800, 23600, 354.
00, 47200, 59000, 70800, 8260
In each case, the discovery rate of the glass substrate to which the metal particles were attached was examined. FIG. 1 is a graph showing the relationship between the number of dummy glass members charged and the metal particle discovery rate. The metal particle discovery rate is determined by visually observing the surface of the glass substrate and counting one metal particle when one is found on the surface of the glass substrate.
This is a value calculated by [Dummy plate integrated number].
【００４６】なお、これらの金属パーティクルが発見さ
れたガラス基板を使って磁気ディスクを作製した場合、
金属パーティクルの箇所でヒットやクラッシュ、又は、
サーマルアスペリティーによる再生の誤動作が発生す
る。図１のように、ダミーガラス部材の投入枚数が増え
るにしたがって、金属パーティクル発見率が減少し、７
００００枚を超えると、ほぼ０％になることがわかっ
た。７００００枚を超えるとダミーガラス部材をいくら
投入しても金属パーティクル発見率は横ばいとなった。
このように予めダミーガラス部材の投入枚数と金属パー
ティクル発見率との関係を把握することによって、金属
パーティクルによるグライド試験において、ヘッドのヒ
ットやクラッシュ、サーマルアスペリティーの発生率を
予測することができ、製造歩留まりを向上維持させるこ
とができる。When a magnetic disk is manufactured using a glass substrate on which these metal particles are found,
Hits or crashes at metal particles, or
Malfunction of reproduction due to thermal asperity occurs. As shown in FIG. 1, as the number of dummy glass members supplied increases, the metal particle discovery rate decreases, and
It was found that when the number of sheets exceeded 0000, it became almost 0%. When the number of dummy glass members exceeded 70,000, the detection rate of metal particles was flat, no matter how much the dummy glass member was inserted.
By grasping in advance the relationship between the number of dummy glass members charged and the metal particle discovery rate, in a glide test using metal particles, it is possible to predict the hit rate, crash, and thermal asperity rate of the head, The production yield can be improved and maintained.
【００４７】また、上述の実施例において、円板状のガ
ラス基板のダミーガラス部材の代わりに、化学強化処理
装置の深さに相当するシート状のガラス基板を複数枚投
入するようにし（変形例１）、あるいは、アルミノシリ
ケートガラスの代わりにソーダライムガラスにした（変
形例２）以外は上記実施例と同様にして磁気ディスク用
ガラス基板及び磁気ディスクを作製した。その結果、い
ずれの場合も上述の実施例とほぼ同様の結果の得られる
ことが確認された。In the above-described embodiment, a plurality of sheet-like glass substrates corresponding to the depth of the chemical strengthening apparatus are introduced instead of the dummy glass members of the disk-like glass substrate (variation example). 1) Alternatively, a glass substrate for a magnetic disk and a magnetic disk were produced in the same manner as in the above example except that soda lime glass was used instead of the aluminosilicate glass (Modification 2). As a result, it was confirmed that in each case, substantially the same results as in the above-described example were obtained.
【００４８】以上好ましい実施例を挙げて本発明を説明
したが、本発明は必ずしも上記実施例に限定されるもの
ではない。例えば、ダミーガラス部材の投入枚数は、化
学強化処理装置の容量によって変化することは勿論であ
る。Although the present invention has been described with reference to the preferred embodiments, the present invention is not necessarily limited to the above embodiments. For example, it goes without saying that the number of dummy glass members to be charged varies depending on the capacity of the chemical strengthening apparatus.
【００４９】また、化学強化処理液中のパーティクルを
捕捉する手段を化学強化処理装置に設けても良い。例え
ば、マイクローシーブ（エッチングで孔を空けた金網）
のフィルターや、磁石を使用することができる。フィル
ターを使用する場合は、化学強化処理装置内の処理えき
はポンプによって循環させ、その循環経路の途中に１ミ
クロン程度のメッシュのステンレス網によって濾過して
さらに清浄な化学強化処理としても良い。Further, means for trapping particles in the chemical strengthening treatment liquid may be provided in the chemical strengthening treatment apparatus. For example, micro sheave (wire mesh with holes formed by etching)
Filters and magnets can be used. In the case of using a filter, the treated air in the chemical strengthening treatment apparatus may be circulated by a pump, and may be filtered through a stainless steel mesh of about 1 micron in the middle of the circulation path to obtain a further clean chemical strengthening treatment.
【００５０】[0050]
【発明の効果】以上説明したように本発明は、化学強化
工程を行う前に、化学強化処理液中に存在する微小なパ
ーティクルを捕捉するためのダミーガラス部材を投入す
ることを特徴とするもので、これにより、化学強化中に
ガラス基板に鉄粉等の金属片又は金属酸化物片が付着す
ることを極めて効果的に防止することを可能にし、その
結果、ヘッドクラッシュや、サーマル・アスペリティー
の原因となるパーティクルの発生の防止、サーマル・ア
スペリティーによる再生機能の低下防止、サーマル・ア
スペリティーの原因となるパーティクルに起因する不良
の回避を可能にしてより高品質の磁気記録媒体が高歩留
まりで得ることを可能にしている。As described above, the present invention is characterized in that before performing the chemical strengthening step, a dummy glass member for capturing fine particles existing in the chemical strengthening treatment liquid is introduced. Thus, it is possible to extremely effectively prevent metal pieces such as iron powder or metal oxide pieces from adhering to the glass substrate during chemical strengthening, and as a result, a head crash or thermal asperity can be prevented. Prevents the occurrence of particles that cause thermal asperity, prevents the deterioration of the reproduction function due to thermal asperity, and avoids the defects caused by the particles that cause thermal asperity, resulting in a higher yield of higher quality magnetic recording media. It is possible to get in.
【図１】 ダミーガラス部材の投入枚数と金属パーティ
クル発見率との関係を示すグラフである。FIG. 1 is a graph showing the relationship between the number of dummy glass members charged and the metal particle discovery rate.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 神谷 尚宏 東京都新宿区中落合２丁目７番５号 ホー ヤ株式会社内 Ｆターム(参考） 4G059 AA01 AB03 AB09 AB11 AC16 HB02 HB13 HB14 5D006 CB04 CB07 5D112 AA02 BA03 BA09 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Naohiro Kamiya 2-7-5 Nakaochiai, Shinjuku-ku, Tokyo F-term in Hoya Corporation (reference) 4G059 AA01 AB03 AB09 AB11 AC16 HB02 HB13 HB14 5D006 CB04 CB07 5D112 AA02 BA03 BA09
Claims (11)
液に接触させることにより、ガラス基板の中に含まれる
一部のイオンを、そのイオンより大きなイオン径の処理
液中のイオンに置換することによりガラス基板を強化す
る化学強化工程を含む情報記録媒体用ガラス基板の製造
方法において、 前記化学強化工程を行う前に、化学強化処理液中に存在
する微小なパーティクルを捕捉するためのダミーガラス
部材を投入することを特徴とする情報記録媒体用ガラス
基板の製造方法。1. A method in which a precision polished glass substrate is brought into contact with a chemical strengthening treatment liquid to replace some of the ions contained in the glass substrate with ions in a treatment liquid having an ion diameter larger than the ions. A method for manufacturing a glass substrate for an information recording medium, comprising a chemical strengthening step of strengthening a glass substrate by: A dummy glass member for capturing fine particles present in a chemical strengthening treatment liquid before performing the chemical strengthening step A method for producing a glass substrate for an information recording medium, comprising:
あることを特徴とする請求項１記載の情報記録媒体用ガ
ラス基板の製造方法。2. The method for manufacturing a glass substrate for an information recording medium according to claim 1, wherein the particles include a metal.
化工程を経た後の化学強化ガラス基板表面に存在する金
属を含む凸部の大きさが、設計基準値以下となるまで行
うことを特徴とする請求項１又は２記載の情報記録媒体
用ガラス基板の製造方法。3. The method according to claim 1, wherein the dummy glass member is charged until the size of the convex portion including the metal present on the surface of the chemically strengthened glass substrate after the chemical strengthening step becomes equal to or smaller than a design reference value. The method for producing a glass substrate for an information recording medium according to claim 1.
行うことを特徴とする請求項３記載の情報記録媒体用ガ
ラス基板の製造方法。4. The method for manufacturing a glass substrate for an information recording medium according to claim 3, wherein the loading of the dummy glass member is performed a plurality of times.
ラス基板、円形のガラス基板、円盤状のガラス基板の何
れかであることを特徴とする請求項１乃至４のいずれか
に記載の情報記録媒体用ガラス基板の製造方法。5. The information recording apparatus according to claim 1, wherein the dummy glass member is any one of a sheet-shaped glass substrate, a circular glass substrate, and a disk-shaped glass substrate. A method for manufacturing a glass substrate for a medium.
ク用ガラス基板であることを特徴とする請求項１乃至５
のいずれかに記載の情報記録媒体用ガラス基板の製造方
法。6. The glass substrate for an information recording medium is a glass substrate for a magnetic disk.
The method for producing a glass substrate for an information recording medium according to any one of the above.
ッドに使用される磁気ディスク用ガラス基板であること
を特徴とする請求項６記載の情報記録媒体用ガラス基板
の製造方法。7. The method for manufacturing a glass substrate for an information recording medium according to claim 6, wherein the glass for a magnetic disk is a glass substrate for a magnetic disk used in a magnetoresistive head.
製造されたことを特徴とする情報記録媒体用ガラス基
板。8. A glass substrate for an information recording medium manufactured by the manufacturing method according to claim 1.
記録媒体用ガラス基板の製造方法によって得られたガラ
ス基板上に少なくとも記録層を形成することを特徴とす
る情報記録媒体の製造方法。9. A method for manufacturing an information recording medium, comprising forming at least a recording layer on a glass substrate obtained by the method for manufacturing a glass substrate for an information recording medium according to claim 1. .
る請求項８記載の情報記録媒体の製造方法。10. The method according to claim 8, wherein the recording layer is a magnetic layer.
体の製造方法によって製造されたことを特徴とする情報
記録媒体。11. An information recording medium manufactured by the method for manufacturing an information recording medium according to claim 9. Description:
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|---|---|---|---|
| JP2000253991A JP3511002B2 (en) | 2000-08-24 | 2000-08-24 | Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium |
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Cited By (1)
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| JP2016071907A (en) * | 2014-09-29 | 2016-05-09 | Hoya株式会社 | Manufacturing method of magnetic disk substrate |
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| JP2016071907A (en) * | 2014-09-29 | 2016-05-09 | Hoya株式会社 | Manufacturing method of magnetic disk substrate |
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