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JP2002069392A - Thermal conductive adhesive film, method for producing the same, and electronic component - Google Patents

Thermal conductive adhesive film, method for producing the same, and electronic component

Info

Publication number
JP2002069392A
JP2002069392A JP2000264439A JP2000264439A JP2002069392A JP 2002069392 A JP2002069392 A JP 2002069392A JP 2000264439 A JP2000264439 A JP 2000264439A JP 2000264439 A JP2000264439 A JP 2000264439A JP 2002069392 A JP2002069392 A JP 2002069392A
Authority
JP
Japan
Prior art keywords
conductive adhesive
adhesive film
boron nitride
nitride powder
heat conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2000264439A
Other languages
Japanese (ja)
Inventor
Masayuki Hida
雅之 飛田
Shinya Tateda
伸哉 舘田
Tsunehisa Kimura
恒久 木村
Masabumi Yamato
正文 山登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polymatech Co Ltd
Original Assignee
Polymatech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polymatech Co Ltd filed Critical Polymatech Co Ltd
Priority to JP2000264439A priority Critical patent/JP2002069392A/en
Priority to EP01306469A priority patent/EP1184899A3/en
Priority to US09/921,427 priority patent/US6663969B2/en
Publication of JP2002069392A publication Critical patent/JP2002069392A/en
Ceased legal-status Critical Current

Links

Classifications

    • H10W40/251
    • H10W72/0113
    • H10W72/073
    • H10W72/075
    • H10W72/325
    • H10W72/351
    • H10W72/353
    • H10W72/354
    • H10W72/877
    • H10W72/884
    • H10W74/00
    • H10W90/736
    • H10W90/756
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • Y10T428/31515As intermediate layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Die Bonding (AREA)

Abstract

(57)【要約】 【課題】熱伝導率が大きく放熱性にすぐれ、かつ電気絶
縁性で引剥がし強度も良好である窒化ホウ素粉末が一定
方向に配向した熱伝導性接着フィルムで接着した電子部
品 【解決手段】 窒化ホウ素粉末を含むフィルム組成物に
磁場を印加させて組成物中の窒化ホウ素粉末を一定方向
に配向させて固化させた熱伝導性接着フィルム、その製
造方法、ならびに発熱する素子と伝熱部材間を、窒化ホ
ウ素粉末が一定方向に配向した熱伝導性接着フィルムで
接着したことを特徴とする電子部品
[PROBLEMS] An electronic component bonded with a thermally conductive adhesive film in which boron nitride powder having high thermal conductivity, excellent heat dissipation, good electrical insulation and good peeling strength is oriented in a certain direction. SOLUTION: A heat conductive adhesive film obtained by applying a magnetic field to a film composition containing boron nitride powder to orient and solidify the boron nitride powder in the composition in a certain direction, a method for producing the same, and an element that generates heat An electronic component characterized in that the heat transfer members are bonded with a heat conductive adhesive film in which boron nitride powder is oriented in a certain direction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高い熱伝導性が要求
される熱伝導性接着フィルムおよびその製造方法ならび
に電子部品に関する。さらに詳しくは、電気製品に使用
される半導体素子や電源、光源などの部品から発生する
熱を効果的に放散させることができる電気絶縁性の熱伝
導性接着フィルムおよびその製造方法ならびに放熱性に
すぐれる電子部品に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat conductive adhesive film requiring high heat conductivity, a method for producing the same, and an electronic component. More specifically, an electrically insulating heat conductive adhesive film capable of effectively dissipating heat generated from components such as a semiconductor element, a power source, and a light source used in an electric product, a method of manufacturing the same, and a heat radiation property. Electronic components.

【0002】[0002]

【従来の技術】従来より、発熱する半導体素子などと放
熱させる伝熱部材あるいは絶縁性基板と金属箔や電極な
どとを接合させる目的で各種の熱伝導性接着フィルムが
使用されている。これらの熱伝導性接着フィルムには、
熱伝導性を高めるために、銀、銅、金、アルミニウムな
どの熱伝導率の大きい金属や合金、化合物、あるいは酸
化アルミニウム、酸化マグネシウム、酸化ケイ素、窒化
ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素な
どの電気絶縁性セラミックス、カーボンブラック、グラ
ファイト、ダイヤモンドなどの粉粒体形状や繊維形状の
熱伝導性充填材が配合されている。なかでも、熱伝導性
と電気絶縁性にすぐれている窒化ホウ素粉末や酸化アル
ミニウム粉末、窒化アルミニウム粉末などを充填した電
気絶縁性の熱伝導性接着フィルムが広く実用化されてい
る。
2. Description of the Related Art Conventionally, various heat conductive adhesive films have been used for the purpose of bonding a semiconductor element or the like that generates heat to a heat transfer member or an insulating substrate that dissipates heat and a metal foil or an electrode. These thermally conductive adhesive films include:
In order to increase thermal conductivity, metals, alloys and compounds with high thermal conductivity such as silver, copper, gold and aluminum, or aluminum oxide, magnesium oxide, silicon oxide, boron nitride, aluminum nitride, silicon nitride, silicon carbide, etc. A powdered or fibrous heat conductive filler such as electrically insulating ceramics, carbon black, graphite, diamond, etc. is blended. Above all, an electrically insulating heat conductive adhesive film filled with a boron nitride powder, an aluminum oxide powder, an aluminum nitride powder, or the like, which is excellent in heat conductivity and electric insulation, has been widely used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、六方晶
の窒化ホウ素粉末は鱗片形状(薄片)であり、その厚さ
方向(面に垂直方向)の熱伝導率の方が面方向(面に平
行な方向)の熱伝導率よりも小さいために、窒化ホウ素
粉末を固体状接着剤に単純に配合して塗り伸ばした接着
フィルムの場合は、鱗片状の窒化ホウ素粉末の面方向が
接着フィルム中に面方向と平行に充填されてしまうため
にこの単純な方法では十分な熱伝導性を有する接着フィ
ルムが得られなかった。
However, the hexagonal boron nitride powder is in the form of scales (flakes), and the thermal conductivity in the thickness direction (perpendicular to the plane) is greater in the plane direction (parallel to the plane). Direction) is smaller than the thermal conductivity in the case of an adhesive film obtained by simply blending boron nitride powder with a solid adhesive and spreading it, the plane direction of the scale-like boron nitride powder is This simple method did not provide an adhesive film having sufficient thermal conductivity because the film was filled parallel to the direction.

【0004】すなわち、電気絶縁性が良好で高い熱伝導
特性を有する接着フィルムが開発されないために、半導
体素子などの電子部品からの多大な発熱によって、電気
化学的なマイグレーションが加速されたり、配線やパッ
ド部の腐食が促進されたり、発生する熱応力によって構
成材料にクラックが生じたり、破壊したり、構成材料の
接合部の界面が剥離して電子部品の寿命を損なう様々な
トラブルが発生していた。一方、本出願人による特願平
11−87482号公報の熱伝導性接着フィルムでは、
熱伝導率が20W/m・K以上の反磁性充填材を、固体
状接着剤中に一定方向に配向させているけれども、反磁
性充填材として窒化ホウ素粉末は対象として考えられて
いなかった。
[0004] That is, since an adhesive film having good electric insulation and high thermal conductivity has not been developed, electrochemical migration is accelerated due to a large amount of heat generated from electronic parts such as semiconductor elements, or wiring and wiring. Corrosion of the pad part is promoted, cracks and breaks occur in the constituent materials due to the generated thermal stress, and various troubles that shorten the life of electronic components due to separation of the interface of the joints of the constituent materials have occurred. Was. On the other hand, in the heat conductive adhesive film of Japanese Patent Application No. 11-87482 by the present applicant,
Although a diamagnetic filler having a thermal conductivity of 20 W / m · K or more is oriented in a certain direction in a solid adhesive, boron nitride powder has not been considered as a diamagnetic filler.

【0005】[0005]

【課題を解決するための手段】上述の課題を解決する目
的で鋭意検討した結果、窒化ホウ素粉末が、固体状接着
剤中に一定方向に配向された熱伝導性接着フィルムが電
気絶縁性と熱伝導性にすぐれること、および、窒化ホウ
素粉末が磁場中で磁力線に沿って配向する性質を応用し
た熱伝導性接着フィルムの製造方法ならびにそれを用い
た放熱特性にすぐれる電子部品を供給するものである。
Means for Solving the Problems As a result of diligent studies for solving the above-mentioned problems, a heat conductive adhesive film in which boron nitride powder is oriented in a fixed direction in a solid adhesive has an electrical insulating property and a thermal conductivity. A method for producing a thermally conductive adhesive film utilizing the property of being excellent in conductivity and the property that boron nitride powder is oriented along a magnetic field line in a magnetic field, and providing an electronic component having excellent heat dissipation characteristics using the same. It is.

【0006】すなわち、本発明は、窒化ホウ素粉末が固
体状接着剤中に一定方向に配向されていることを特徴と
する熱伝導性接着フィルムである。さらに本発明は、窒
化ホウ素粉末を含むフィルム組成物に磁場を印加させて
組成物中の窒化ホウ素粉末を一定方向に配向させて固化
させることを特徴とする熱伝導性接着フィルムの製造方
法、ならびに、発熱する素子と伝熱部材間を、窒化ホウ
素粉末が一定方向に配向した熱伝導性接着フィルムで接
着したことを特徴とする電子部品である。
That is, the present invention is a heat conductive adhesive film characterized in that boron nitride powder is oriented in a fixed direction in a solid adhesive. Further, the present invention provides a method for producing a thermally conductive adhesive film, which comprises applying a magnetic field to a film composition containing boron nitride powder to orient and solidify the boron nitride powder in the composition in a certain direction, and An electronic component characterized in that the heat-generating element and the heat transfer member are bonded with a heat conductive adhesive film in which boron nitride powder is oriented in a certain direction.

【0007】本発明で使用する窒化ホウ素粉末について
は、結晶系の種類、粉末粒子の形状や大きさ、粉末粒子
の凝集度合い、およびこれらの分布などについて特定す
るものではない。結晶系としては、六方晶、立方晶、ウ
ルツ鉱型立方晶、菱面体晶、その他のいずれの構造の窒
化ホウ素粉末でも使用できる。なかでも、熱伝導率が数
10〜100W/m・K程度であるが容易に入手可能な
六方晶構造あるいは熱伝導率が最大で1300W/m・
Kと非常に大きい立方晶構造の窒化ホウ素粉末が好まし
い。
The boron nitride powder used in the present invention does not specify the type of crystal system, the shape and size of the powder particles, the degree of aggregation of the powder particles, and their distribution. As the crystal system, hexagonal, cubic, wurtzite cubic, rhombohedral, and any other boron nitride powder can be used. Above all, the thermal conductivity is about several tens to 100 W / m · K, but the hexagonal structure that can be easily obtained or the thermal conductivity is 1300 W / m · K at the maximum.
Boron nitride powder having a cubic structure very large as K is preferable.

【0008】窒化ホウ素粉末の粒子形状については、鱗
片状、偏平状に限定することなく、顆粒状、塊状、球
状、繊維状、ウィスカー状、あるいはこれらの粉砕品な
ど様々な粒子形状の窒化ホウ素粉末を使用できる。窒化
ホウ素粉末の粒子径についても特定するものではないけ
れども、個々の平均一次粒子径は0.01〜100μm
の範囲、さらに好ましくは0.1〜20μmの範囲のも
のが使用できる。0.01μmよりも細かいと熱伝導性
接着フィルム中に多量に充填することが困難になり、1
00μmよりも大きい窒化ホウ素粉末は製造しにくく価
格的にも不利になる。また、薄い接着フィルム層を要求
されると対応することができなくなる。鱗片状の窒化ホ
ウ素粉末の場合には、最大径として0.5〜50μmの
範囲がフィルムに配合して磁場配向させやすいので実用
的である。さらに、一次粒子が凝集した構造の窒化ホウ
素粉末が用いられる。
[0008] The particle shape of the boron nitride powder is not limited to scaly or flat, but may be various, such as granular, massive, spherical, fibrous, whisker-like, or a crushed product thereof. Can be used. Although the particle size of the boron nitride powder is not specified, the average primary particle size of each is 0.01 to 100 μm.
And more preferably in the range of 0.1 to 20 μm. If it is smaller than 0.01 μm, it becomes difficult to fill a large amount into the heat conductive adhesive film, and
Boron nitride powder larger than 00 μm is difficult to produce and disadvantageous in price. Further, when a thin adhesive film layer is required, it cannot be handled. In the case of scaly boron nitride powder, the range of 0.5 to 50 μm as the maximum diameter is practical because it is easy to mix the film with the film to orient the magnetic field. Further, a boron nitride powder having a structure in which primary particles are aggregated is used.

【0009】熱伝導性接着フィルム中の窒化ホウ素粉末
の濃度は、2〜80体積%であることが好ましい。2体
積%よりも少ないと熱伝導性の向上効果が小さく、80
体積%を越えて含有させると組成物の粘度が増大して流
動性が損なわれて取扱い性が困難になり、かつ気泡の混
入が避けられず、所望の熱伝導性接着フィルムが製造で
きないので不適である。さらに好ましい熱伝導性接着フ
ィルム中の窒化ホウ素粉末の濃度は、5〜50体積%、
さらに好ましくは10〜40体積%である。なお、異な
る粉末粒子径の窒化ホウ素粉末を併用したり、表面処理
することによって高濃度化させることも可能である。
The concentration of the boron nitride powder in the heat conductive adhesive film is preferably 2 to 80% by volume. If it is less than 2% by volume, the effect of improving thermal conductivity is small, and
If the content exceeds 10% by volume, the viscosity of the composition increases, the fluidity is impaired, the handling becomes difficult, and the incorporation of air bubbles is unavoidable, and the desired heat conductive adhesive film cannot be produced. It is. More preferably, the concentration of the boron nitride powder in the heat conductive adhesive film is 5 to 50% by volume,
More preferably, the content is 10 to 40% by volume. It is also possible to increase the concentration by using a combination of boron nitride powders having different powder particle diameters or by performing a surface treatment.

【0010】本発明で使用する固体状接着剤としては、
常温で固体状、あるいは加熱などによって半硬化状態で
固体状になるエポキシ系、ポリイミド系、アクリル系、
ポリ酢酸ビニルなどのビニル系、ウレタン系、シリコー
ン系、オレフィン系、ポリアミド系、ポリアミドイミド
系、フェノール系、アミノ系、ビスマレイミド系、ポリ
イミドシリコーン系、飽和および不飽和ポリエステル
系、ジアリルフタレート系、尿素系、メラミン系、アル
キッド系、ベンゾシクロブテン系、ポリブタジエンやク
ロロプレンゴム、ニトリルゴムなどの合成ゴム系、天然
ゴム系、スチレン系熱可塑性エラストマーなどの公知の
樹脂やゴムからなる材料が好ましい。
The solid adhesive used in the present invention includes:
Epoxy-based, polyimide-based, acrylic-based, which becomes solid at room temperature or becomes semi-cured by heating etc.
Vinyl-based such as polyvinyl acetate, urethane-based, silicone-based, olefin-based, polyamide-based, polyamide-imide-based, phenol-based, amino-based, bismaleimide-based, polyimide silicone-based, saturated and unsaturated polyester-based, diallyl phthalate-based, urea Materials made of known resins and rubbers such as styrene, melamine, alkyd, benzocyclobutene, synthetic rubber such as polybutadiene, chloroprene rubber, and nitrile rubber, natural rubber, and styrene thermoplastic elastomer are preferable.

【0011】硬化形態については、熱硬化性、紫外線や
可視光硬化性、常温硬化性、湿気硬化性など公知のあら
ゆる硬化形態の接着性高分子を使用できる。なかでも、
電子部品を構成する材料の各種金属やセラミックス、プ
ラスチックやゴム、エラストマーとの接着性が良好なエ
ポキシ系、ポリイミド系、アクリル系、ウレタン系、シ
リコーン系より選ばれる少なくとも1種の熱硬化性の固
体状接着剤が好適である。
As for the curing mode, any of known adhesive curing polymers such as thermosetting property, ultraviolet ray / visible light curing property, room temperature curing property, and moisture curing property can be used. Above all,
At least one thermosetting solid selected from epoxy, polyimide, acrylic, urethane, and silicone, which has good adhesion to various metals, ceramics, plastics, rubbers, and elastomers of materials that make up electronic components Shaped adhesives are preferred.

【0012】さらに、固体状接着剤が熱硬化性の場合に
は、窒化ホウ素粉末を配合して一定方向に配向させてか
らBステージなどの半硬化状態にした熱伝導性接着フィ
ルムが接着強度や信頼性の点で好ましい。また、窒化ホ
ウ素粉末の表面処理を目的として、窒化ホウ素粉末の表
面を公知のカップリング剤で処理することによって固体
状接着剤との濡れ性を向上させたり充填性を改良した熱
伝導性接着フィルムを得ることが可能である。
Further, when the solid adhesive is thermosetting, a heat conductive adhesive film in which a boron nitride powder is blended and orientated in a certain direction and then semi-cured such as a B stage is used. It is preferable in terms of reliability. In addition, for the purpose of surface treatment of boron nitride powder, a heat conductive adhesive film in which the surface of boron nitride powder is treated with a known coupling agent to improve wettability with a solid adhesive or to improve filling properties. It is possible to obtain

【0013】本発明の熱伝導性接着フィルムには、溶
剤、チキソトロピー性付与剤、分散剤、硬化剤、硬化促
進剤、遅延剤、粘着付与剤、可塑剤、難燃剤、酸化防止
剤、安定剤、着色剤など公知の添加剤を配合することが
できる。特に固体状接着剤と窒化ホウ素粉末を配合した
際の組成物の粘度が大きい場合には、溶剤を添加して組
成物の粘度を低減させることによって、窒化ホウ素粉末
の磁場配向を促進させることができる。
The heat-conductive adhesive film of the present invention contains a solvent, a thixotropic agent, a dispersant, a curing agent, a curing accelerator, a retarder, a tackifier, a plasticizer, a flame retardant, an antioxidant, and a stabilizer. A known additive such as a colorant can be blended. Particularly when the viscosity of the composition when the solid adhesive and the boron nitride powder are blended is large, the magnetic field orientation of the boron nitride powder can be promoted by adding a solvent to reduce the viscosity of the composition. it can.

【0014】さらに、粉末形状や繊維形状の金属やセラ
ミックス、具体的には、銀、銅、金、酸化アルミニウ
ム、酸化マグネシウム、窒化アルミニウム、窒化ケイ
素、炭化ケイ素などや金属被覆樹脂などの従来の熱伝導
性フィルムに使用されている充填剤などを適宜併用する
ことも可能である。しかしながら、本発明の熱伝導性接
着フィルムは電気絶縁性にすぐれることも特徴のひとつ
であり、導電性の高い金属などの充填剤はなるべく混在
させない方が好ましい。
[0014] Further, conventional heats such as powdered or fibrous metals and ceramics, such as silver, copper, gold, aluminum oxide, magnesium oxide, aluminum nitride, silicon nitride, silicon carbide, and metal-coated resins. It is also possible to appropriately use a filler or the like used for the conductive film in combination. However, one of the features of the heat conductive adhesive film of the present invention is that it has excellent electrical insulation properties, and it is preferable that a filler such as a metal having high conductivity be mixed as little as possible.

【0015】フィルムの膜厚については特定するもので
はないけれども、10μm〜2mmの範囲が好ましい。
配合する窒化ホウ素粉末を厚み方向に配向させる場合に
は、膜厚は用いる窒化ホウ素粉末の配向した最大長さよ
りも厚くした方が熱伝導性接着フィルムが平坦になりや
すく好適である。
The thickness of the film is not specified, but is preferably in the range of 10 μm to 2 mm.
When the boron nitride powder to be blended is oriented in the thickness direction, it is preferable that the film thickness be larger than the oriented maximum length of the boron nitride powder to be used because the heat conductive adhesive film tends to be flat.

【0016】[0016]

【発明の実施の形態】固体状接着剤中に窒化ホウ素粉末
を一定方向に配向させる方法としては、流動場あるいは
せん断場を利用する方法、磁場を利用する方法、電場を
利用する方法などが挙げられる。いずれの方法によって
も窒化ホウ素粉末を固体状接着剤中で一定方向に配向さ
せることができ、本発明の熱伝導性接着フィルムを得る
ことができる。
BEST MODE FOR CARRYING OUT THE INVENTION As a method for orienting boron nitride powder in a solid adhesive in a certain direction, a method using a flow field or a shear field, a method using a magnetic field, a method using an electric field, and the like are mentioned. Can be In any case, the boron nitride powder can be oriented in a fixed direction in the solid adhesive, and the heat conductive adhesive film of the present invention can be obtained.

【0017】けれども、本発明では窒化ホウ素粉末の反
磁性磁化率の異方性を利用し、磁場を印加して窒化ホウ
素粉末を配向させる方法が特に任意の方向に窒化ホウ素
粉末を効果的に配向させることができ、熱伝導性がすぐ
れる熱伝導性接着フィルムを簡便に製造する方法として
適している。すなわち、窒化ホウ素粉末を含むフィルム
組成物に磁場を印加させて組成物中の窒化ホウ素粉末を
一定方向に配向させて固化させることが本発明の熱伝導
性接着フィルムの製造方法の特徴である。
However, in the present invention, the method of applying the magnetic field to orient the boron nitride powder by utilizing the anisotropy of the diamagnetic susceptibility of the boron nitride powder is particularly effective in orienting the boron nitride powder in an arbitrary direction. This is suitable as a method for easily producing a heat conductive adhesive film having excellent heat conductivity. That is, a feature of the method for producing a thermally conductive adhesive film of the present invention is to apply a magnetic field to a film composition containing boron nitride powder to orient and solidify the boron nitride powder in the composition in a certain direction.

【0018】外部から磁場を印加してフィルム組成物中
の窒化ホウ素粉末を磁力線に沿って一定方向に配向さ
せ、配向した窒化ホウ素粉末の高熱伝導性を生かし、一
定方向の熱伝導率を著しく向上させた熱伝導性接着フィ
ルムを得ることができる。例えば、熱伝導性接着フィル
ムの厚み方向(面に直交する方向)に窒化ホウ素粉末を
揃えて配向させるには、厚み方向に永久磁石や電磁石の
N極とS極を対向させ磁力線の向きが所望の窒化ホウ素
粉末の配向方向に対応するように設置する。
An external magnetic field is applied to orient the boron nitride powder in the film composition in a certain direction along the lines of magnetic force, making use of the high thermal conductivity of the oriented boron nitride powder to significantly improve the thermal conductivity in a certain direction. Thus, a thermally conductive adhesive film can be obtained. For example, in order to align and orient the boron nitride powder in the thickness direction (direction perpendicular to the plane) of the thermally conductive adhesive film, the N pole and the S pole of a permanent magnet or an electromagnet are opposed in the thickness direction, and the direction of the lines of magnetic force is desired. Is provided so as to correspond to the orientation direction of the boron nitride powder.

【0019】一方、熱伝導性接着フィルムの面内の面と
直交する縦方向と面と平行な横方向あるいは縦横の面と
平行方向に一定方向の熱伝導性を向上させる場合には、
面に直交する方向に磁石のN極とS極を対向させれば窒
化ホウ素粉末を面内の面と平行方向に揃えて配向させる
ことができる。あるいは、磁石のN極とN極、またはS
極とS極を厚み方向に対向させても窒化ホウ素粉末を面
内の面と平行方向に揃えることができる。また、磁力線
は必ずしも直線状でなくても良く、曲線状や矩形、ある
いは2方向以上であってもかまわない。すなわち、任意
の一定方向に窒化ホウ素粉末を配向させて熱伝導性の異
方性を付与させることが可能である。また、磁石につい
ては必ずしも両側に対向させる必要はなく、片側のみに
配置した磁石によってもフィルム組成物中の窒化ホウ素
粉末を配向させることが可能である。
On the other hand, in the case where the thermal conductivity in a certain direction is improved in a vertical direction perpendicular to the plane in the plane of the heat conductive adhesive film and in a horizontal direction parallel to the plane or in a direction parallel to the vertical and horizontal planes,
If the N and S poles of the magnet are opposed to each other in a direction perpendicular to the plane, the boron nitride powder can be oriented in a direction parallel to the plane in the plane. Alternatively, the N and N poles of the magnet or S
Even when the pole and the S pole are opposed to each other in the thickness direction, the boron nitride powder can be aligned in a direction parallel to the in-plane plane. Further, the lines of magnetic force need not necessarily be linear, but may be curved, rectangular, or two or more directions. That is, it is possible to impart anisotropy of thermal conductivity by orienting the boron nitride powder in any given direction. Further, it is not always necessary to oppose both sides of the magnet, and it is possible to orient the boron nitride powder in the film composition by using a magnet arranged only on one side.

【0020】外部磁場として使用する磁場発生手段とし
ては永久磁石でも電磁石でもコイルでも差し支えないけ
れども、磁束密度としては0.05テスラ〜30テスラ
の範囲が実用的な窒化ホウ素粉末の配向が達成できる。
また、本発明は窒化ホウ素粉末の非常に弱い反磁性の異
方性磁化率を利用するので、より強い磁場雰囲気で、窒
化ホウ素粉末を十分に配向させてから、熱硬化反応や冷
却させることによってマトリックスを固化させる必要が
ある。配向しやすい好ましい磁束密度は0.5テスラ以
上、さらに好ましくは1テスラ以上である。
The magnetic field generating means used as the external magnetic field may be a permanent magnet, an electromagnet, or a coil, but the magnetic flux density in the range of 0.05 to 30 Tesla can achieve a practical orientation of the boron nitride powder.
Further, the present invention utilizes the very weak diamagnetic anisotropic susceptibility of boron nitride powder, so that in a stronger magnetic field atmosphere, the boron nitride powder is sufficiently oriented and then subjected to a thermosetting reaction or cooling. The matrix needs to be solidified. A preferred magnetic flux density for easy orientation is 0.5 Tesla or more, more preferably 1 Tesla or more.

【0021】窒化ホウ素粉末と固体状接着剤との濡れ性
や接着性を向上させるために、窒化ホウ素粉末の表面を
あらかじめ脱脂や洗浄処理したり、シラン系やチタン
系、アルミニウム系などのカップリング剤で表面処理す
ることによって、さらに多量の窒化ホウ素粉末を容易に
分散混合しやすくなり、得られる熱伝導性接着フィルム
の一層の高熱伝導率化が達成できる。
In order to improve the wettability and adhesion between the boron nitride powder and the solid adhesive, the surface of the boron nitride powder is previously degreased or washed, or a silane, titanium or aluminum coupling is used. By performing the surface treatment with the agent, a larger amount of boron nitride powder can be easily dispersed and mixed, and the thermal conductivity of the resulting thermally conductive adhesive film can be further increased.

【0022】発熱する素子と伝熱部材間を、本発明の熱
伝導性接着フィルムで接着することによって本発明の電
子部品を製造することができる。伝熱部材としては、通
常の放熱器や冷却器、ヒートシンク、ヒートスプレッダ
ー、リードフレーム、ダイパッド、プリント基板、冷却
ファン、ヒートパイプ、筐体などが挙げられる。また、
銅箔などのプリント配線基板用の金属箔や電極などを接
着させる目的にも使用することができる。
The electronic component of the present invention can be manufactured by bonding the heat generating element and the heat transfer member with the heat conductive adhesive film of the present invention. Examples of the heat transfer member include ordinary radiators and coolers, heat sinks, heat spreaders, lead frames, die pads, printed boards, cooling fans, heat pipes, housings, and the like. Also,
It can also be used for the purpose of bonding metal foil for printed wiring boards such as copper foil and electrodes.

【0023】以下、実施例に基づき本発明をさらに詳し
く説明する。なお、実施例、比較例中の熱伝導率はレー
ザーフラッシュ法で測定した。銅箔の90度引き剥がし
強度は、JISC6471に準じて厚さ35μmの銅箔
と厚さ1.5mmのアルミニウム板との間に挟み、圧力
2MPa、170℃、30分間加圧加熱して接着した試
料で測定した。体積抵抗率は、JIS−K6911に準
拠して測定した。
Hereinafter, the present invention will be described in more detail with reference to Examples. In addition, the thermal conductivity in an Example and a comparative example was measured by the laser flash method. The 90-degree peel strength of the copper foil was sandwiched between a 35-μm-thick copper foil and a 1.5-mm-thick aluminum plate according to JIS C6471 and bonded by pressure heating at 170 ° C. for 30 minutes at a pressure of 2 MPa. Measured on samples. The volume resistivity was measured according to JIS-K6911.

【0024】[0024]

【実施例1】ビスフェノールA型エポキシ樹脂(油化シ
ェルエポキシ株式会社製:エピコート828)45重量
部、クレゾールノボラック型エポキシ樹脂(住友化学工
業株式会社製:ESCN001)15重量部、硬化剤と
してビスフェノールA型ノボラック樹脂(大日本インキ
化学工業株式会社製:LF2882)40重量部、硬化
促進剤として1−シアノエチル−2−メチルイミダゾー
ル(四国化成工業株式会社製:キュアゾール2PN−C
N)1重量部の配合からなるエポキシ系の固体状接着剤
の組成物100重量部に同一重量部のメチルエチルケト
ンを添加し、次いで最終の熱伝導性接着フィルム中の窒
化ホウ素粉末の濃度が13体積%になるように窒化ホウ
素粉末(昭和電工株式会社製 UHP−S1:平均粒径
1〜2μm)を混合し3本ロールで混練してから真空脱
泡した。
Example 1 45 parts by weight of a bisphenol A type epoxy resin (Epicoat 828 manufactured by Yuka Shell Epoxy Co., Ltd.), 15 parts by weight of a cresol novolak type epoxy resin (ESCN001 manufactured by Sumitomo Chemical Co., Ltd.), and bisphenol A as a curing agent 40 parts by weight of a novolak resin (manufactured by Dainippon Ink and Chemicals, Inc .: LF2882), and 1-cyanoethyl-2-methylimidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd .: Cureazole 2PN-C) as a curing accelerator
N) 100 parts by weight of an epoxy-based solid adhesive composition comprising 1 part by weight of the same amount of methyl ethyl ketone was added to 100 parts by weight, and then the concentration of boron nitride powder in the final heat conductive adhesive film was 13 vol. %, A boron nitride powder (UHP-S1: manufactured by Showa Denko KK) having an average particle diameter of 1 to 2 μm was mixed and kneaded with three rolls, followed by vacuum defoaming.

【0025】得られたエポキシ系熱伝導性接着フィルム
組成物を厚さ100μmの片面離型処理したポリエチレ
ンテレフタレートシート11上にドクターブレード法で
塗布し、図5(1)〜図5(3)のように厚み方向に磁
束密度6テスラのN極とS極が対向する磁場雰囲気で1
10℃で15分間加熱乾燥し、厚みが120μmのBス
テージ状態の熱伝導性接着フィルム3を作製した。熱伝
導性接着フィルム単独の厚み方向の熱伝導率は、1.8
W/m・K、90度引き剥がし強度は、1.4kN/m、
体積抵抗率は、1012Ω・cmであった。この熱伝導
性接着フィルム3にてボールグリッドアレイ型半導体パ
ッケージ2と放熱器4を接着した電子部品の例を図1に
示す。図2にはチップサイズ型半導体パッケージ2とプ
リント基板1を、図3にはピングリッドアレイ型半導体
パッケージ2とヒートシンク5を接着した電子部品の例
を示す。
The obtained epoxy-based thermally conductive adhesive film composition was applied to a 100 μm-thick single-sided release-treated polyethylene terephthalate sheet 11 by a doctor blade method, and was subjected to the method shown in FIGS. 5 (1) to 5 (3). In a magnetic field atmosphere where the N and S poles with a magnetic flux density of 6 Tesla
The resultant was dried by heating at 10 ° C. for 15 minutes to prepare a heat conductive adhesive film 3 in a B-stage state having a thickness of 120 μm. The thermal conductivity of the heat conductive adhesive film alone in the thickness direction is 1.8.
W / mK, 90 degree peel strength is 1.4kN / m,
The volume resistivity was 10 12 Ω · cm. FIG. 1 shows an example of an electronic component in which the ball grid array type semiconductor package 2 and the radiator 4 are bonded by the heat conductive adhesive film 3. FIG. 2 shows an example of an electronic component in which the chip size type semiconductor package 2 and the printed board 1 are bonded, and FIG. 3 shows an example of an electronic component in which the pin grid array type semiconductor package 2 and the heat sink 5 are bonded.

【0026】[0026]

【実施例2】メチルメタクリレート30重量部、2−ヒ
ドロキシエチルメタクリレート40重量部、スチレン系
熱可塑性エラストマー(シェル化学株式会社製:クレイ
トンG1650)30重量部、硬化剤としてパーヘキサ
3M(日本油脂株式会社製)3重量部からなるアクリル
系の固体状接着剤の組成物100重量部に同一重量部の
トルエンとメチルエチルケトンの混合溶媒を添加し、次
いで最終の熱伝導性接着フィルム中の窒化ホウ素粉末の
濃度が13体積%になるように窒化ホウ素粉末(昭和電
工株式会社製 UHP−S1:平均粒径1〜2μm)を
混合し3本ロールで混練し真空脱泡した。
Example 2 30 parts by weight of methyl methacrylate, 40 parts by weight of 2-hydroxyethyl methacrylate, 30 parts by weight of a styrene-based thermoplastic elastomer (Clayton G1650, manufactured by Shell Chemical Co., Ltd.), and Perhexa 3M (manufactured by NOF Corporation) as a curing agent ) To 100 parts by weight of the acrylic solid adhesive composition consisting of 3 parts by weight, add the same part by weight of a mixed solvent of toluene and methyl ethyl ketone, and then reduce the concentration of boron nitride powder in the final heat conductive adhesive film. Boron nitride powder (UHP-S1: average particle size: 1 to 2 μm, manufactured by Showa Denko KK) was mixed so as to have a volume of 13% by volume, kneaded with three rolls, and vacuum defoamed.

【0027】得られたアクリル系熱伝導性接着フィルム
組成物を厚さ100μmの片面離型処理したポリエチレ
ンテレフタレートシート上にバーコーター法で塗布し、
厚み方向に磁束密度6テスラのN極とS極が対向する磁
場雰囲気で120℃で20分間加熱乾燥し、厚みが12
0μmのBステージ状態の熱伝導性接着フィルムを作製
した。得られた熱伝導性接着フィルムの熱伝導率および
90度引き剥がし強度を測定して結果を表1に記した。
熱伝導率、90度引き剥がし強度、体積抵抗率は実施例
1と同様に評価し、結果を表1に記した。
The resulting acrylic heat conductive adhesive film composition was applied on a 100 μm-thick single-sided release-treated polyethylene terephthalate sheet by a bar coater method.
Heat and dry at 120 ° C for 20 minutes in a magnetic field atmosphere where the N and S poles with a magnetic flux density of 6 Tesla face each other in the thickness direction.
A heat conductive adhesive film in a B-stage state of 0 μm was produced. The heat conductivity and peel strength of the obtained heat conductive adhesive film were measured, and the results are shown in Table 1.
The thermal conductivity, 90 degree peel strength, and volume resistivity were evaluated in the same manner as in Example 1, and the results are shown in Table 1.

【0028】[0028]

【実施例3〜12】実施例1と同様に、表1に記す濃度
の実施例1と同様のエポキシ系熱伝導性接着フィルムあ
るいは実施例2と同様のアクリル系熱伝導性接着フィル
ムで、表1に記載の窒化ホウ素粉末濃度からなる組成物
を使用し、表中の磁束密度条件下で熱伝導性接着フィル
ムを作製した。なお、表1に記載した熱伝導性接着フィ
ルムの固体状接着剤の種類としては、ポリイミドは加熱
硬化型のポリイミド、ウレタン系は加熱硬化型の2液性
ウレタン、シリコーンは付加型の液状シリコーンゴムを
使用した。熱伝導率、90度引き剥がし強度、体積抵抗
率は実施例1と同様に評価し、結果を表1に記した。
Examples 3 to 12 In the same manner as in Example 1, the same epoxy-based thermally conductive adhesive film as in Example 1 or the same acrylic-based thermally conductive adhesive film as in Example 2 having the concentrations shown in Table 1 was used. A composition having the boron nitride powder concentration described in 1 was used, and a heat conductive adhesive film was produced under the magnetic flux density conditions shown in the table. In addition, as the kind of the solid adhesive of the heat conductive adhesive film shown in Table 1, polyimide is a heat-curable polyimide, urethane is a heat-curable two-component urethane, and silicone is an addition-type liquid silicone rubber. It was used. The thermal conductivity, 90 degree peel strength, and volume resistivity were evaluated in the same manner as in Example 1, and the results are shown in Table 1.

【0029】[0029]

【比較例1】ビスフェノールA型エポキシ樹脂(油化シ
ェルエポキシ株式会社製:エピコート828)45重量
部、クレゾールノボラック型エポキシ樹脂(住友化学工
業株式会社製:ESCN001)15重量部、硬化剤と
してビスフェノールA型ノボラック樹脂(大日本インキ
化学工業株式会社製:LF2882)40重量部、硬化
促進剤として1−シアノエチル−2−メチルイミダゾー
ル(四国化成工業株式会社製:キュアゾール2PN−C
N)1重量部からなるエポキシ系の固体状接着剤の組成
物100重量部に同一重量部のメチルエチルケトンを添
加し、次いで最終の熱伝導性接着フィルム中の窒化ホウ
素粉末の濃度が13体積%になるように窒化ホウ素粉末
(昭和電工株式会社製 UHP−S1:平均粒径1〜2
μm)を混合し3本ロールで混練してから真空脱泡し
た。
Comparative Example 1 45 parts by weight of a bisphenol A type epoxy resin (Epicoat 828 manufactured by Yuka Shell Epoxy Co., Ltd.), 15 parts by weight of a cresol novolak type epoxy resin (ESCN001 manufactured by Sumitomo Chemical Co., Ltd.), and bisphenol A as a curing agent 40 parts by weight of a novolak resin (manufactured by Dainippon Ink and Chemicals, Inc .: LF2882), and 1-cyanoethyl-2-methylimidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd .: Cureazole 2PN-C) as a curing accelerator
N) To 100 parts by weight of the epoxy-based solid adhesive composition consisting of 1 part by weight, the same part by weight of methyl ethyl ketone is added, and then the concentration of the boron nitride powder in the final heat conductive adhesive film is reduced to 13% by volume. Boron nitride powder (UHP-S1: Showa Denko KK)
μm) and kneaded with three rolls, followed by vacuum defoaming.

【0030】得られた組成物を厚さ100μmの片面離
型処理したポリエチレンテレフタレートシート上にドク
ターブレード法で塗布し、磁場を印加しないで110℃
で15分間加熱乾燥し、厚みが120μmのBステージ
状態の熱伝導性接着フィルムを作製した。熱伝導率、9
0度引き剥がし強度、体積抵抗率は実施例1と同様に評
価し、結果を表1に記した。
The obtained composition was applied on a 100 μm-thick single-sided release-treated polyethylene terephthalate sheet by a doctor blade method, and was applied at 110 ° C. without applying a magnetic field.
For 15 minutes to produce a B-staged thermally conductive adhesive film having a thickness of 120 μm. Thermal conductivity, 9
The 0-degree peel strength and the volume resistivity were evaluated in the same manner as in Example 1, and the results are shown in Table 1.

【0031】[0031]

【比較例2】熱伝導性接着フィルム中の窒化ホウ素粉末
の濃度が13体積%になるように窒化ホウ素粉末(昭和
電工株式会社製 UHP−S1:平均粒径1〜2μm)
を配合したエポキシ系の固体状接着剤の組成物を使用
し、実施例1と同様に厚み方向に磁束密度0.2テスラ
のN極とS極が対向する磁場雰囲気で110℃で15分
間加熱乾燥し、厚みが120μmのBステージ状態の熱
伝導性接着フィルムを作製した。熱伝導率、90度引き
剥がし強度、体積抵抗率は実施例1と同様に評価し、結
果を表1に記した。
[Comparative Example 2] Boron nitride powder (UHP-S manufactured by Showa Denko KK: average particle size: 1 to 2 µm) so that the concentration of boron nitride powder in the heat conductive adhesive film becomes 13% by volume.
Is heated at 110 ° C. for 15 minutes in a magnetic field atmosphere in which the N-pole and the S-pole have a magnetic flux density of 0.2 Tesla in the thickness direction in the same manner as in Example 1 using an epoxy-based solid adhesive composition containing It dried and produced the 120-micrometer-thick heat conductive adhesive film of the B stage state. The thermal conductivity, 90 degree peel strength, and volume resistivity were evaluated in the same manner as in Example 1, and the results are shown in Table 1.

【0032】[0032]

【比較例3、4】比較例1と同様に、表1に記す濃度の
固体状接着剤と窒化ホウ素粉末からなるフィルム組成物
を調製し、比較例1と同様に磁場を与えずに熱伝導性接
着フィルムを作製した。熱伝導率、90度引き剥がし強
度、体積抵抗率は実施例1と同様に評価し、結果を表1
に記した。
Comparative Examples 3 and 4 In the same manner as in Comparative Example 1, a film composition comprising the solid adhesive and the boron nitride powder at the concentrations shown in Table 1 was prepared. An adhesive film was prepared. The thermal conductivity, 90 degree peel strength, and volume resistivity were evaluated in the same manner as in Example 1, and the results are shown in Table 1.
It was noted in.

【0033】[0033]

【実施例13】図6(1)に記すプリント基板1に実装
したボールグリッドアレイ型の半導体パッケージ2上に
本発明の実施例5のシリコーン系熱伝導性接着フィルム
3を使用し(図6(2)、図6(3))のように上部に
放熱器4を配置して加圧加熱して電子部品(図6
(4))を作製した。この電子部品に通電し10分後の
熱抵抗値を測定したところ、0.27℃/Wであった。
Embodiment 13 The silicone-based heat conductive adhesive film 3 of Embodiment 5 of the present invention is used on a ball grid array type semiconductor package 2 mounted on a printed circuit board 1 shown in FIG. 2), the radiator 4 is arranged on the upper part as shown in FIG.
(4)) was prepared. The electronic component was energized, and the thermal resistance after 10 minutes was measured to be 0.27 ° C./W.

【0034】[0034]

【比較例5】実施例13と同様に、プリント基板に実装
したボールグリッドアレイ型の半導体パッケージ上に表
1の比較例3のシリコーン系熱伝導性接着フィルム3を
使用し上部に放熱器4を配置して加圧加熱して電子部品
(図7)を作製した。実施例13と同様に、この電子部
品に通電して10分後の熱抵抗値を測定したところ、
0.38℃/Wであった。
COMPARATIVE EXAMPLE 5 In the same manner as in Example 13, a silicone-based heat conductive adhesive film 3 of Comparative Example 3 in Table 1 was used on a ball grid array type semiconductor package mounted on a printed circuit board, and a radiator 4 was provided on the upper part. An electronic component (FIG. 7) was prepared by placing and heating under pressure. As in Example 13, when the electronic component was energized and the thermal resistance after 10 minutes was measured,
0.38 ° C / W.

【0035】[0035]

【実施例14】図8(1)、図8(2)に示すようにリ
ードフレーム6のダイパッド7と半導体チップ8の間に
本発明の実施例1のエポキシ系熱伝導性接着フィルム3
を挟み図8(3)に記すように配置した磁石12で厚み
方向に磁束密度6テスラの磁場を与えながら加熱硬化さ
せた。さらにボンディングワイヤー9で半導体チップ8
の電極部とリードフレーム11のリード部を電気的に接
続し(図8(4))、エポキシ系封止剤10でトランス
ファーモールドして電子部品(図4)を製造した。図8
(5)は熱伝導性接着フィルム中の窒素ホウ素粉末が配
向した状態を示す。この電子部品に通電し10分後の熱
抵抗値を測定したところ、0.28℃/Wであった。
Embodiment 14 As shown in FIGS. 8 (1) and 8 (2), between the die pad 7 of the lead frame 6 and the semiconductor chip 8, the epoxy-based heat conductive adhesive film 3 of Embodiment 1 of the present invention is provided.
8 (3), and heat-cured while applying a magnetic field having a magnetic flux density of 6 Tesla in the thickness direction with the magnet 12 arranged as shown in FIG. 8 (3). Further, the semiconductor chip 8 is connected with the bonding wire 9.
The electrode part was electrically connected to the lead part of the lead frame 11 (FIG. 8 (4)), and transfer-molded with the epoxy-based sealant 10 to manufacture an electronic component (FIG. 4). FIG.
(5) shows a state where the nitrogen boron powder in the heat conductive adhesive film is oriented. The electronic component was energized, and the thermal resistance after 10 minutes was measured to be 0.28 ° C./W.

【0036】[0036]

【比較例6】実施例14と同様に、リードフレーム6の
ダイパッド7と半導体チップ8を、比較例1のエポキシ
系熱伝導性接着フィルム3で加熱硬化させた。さらにボ
ンディングワイヤー9で半導体チップ8の電極部とリー
ドフレーム11のリード部を電気的に接続し、エポキシ
系封止剤10でトランスファーモールドして図4と同じ
電子部品を製造した。実施例14と同様に、この電子部
品に通電して10分後の熱抵抗値を測定したところ、
0.42℃/Wであった。
Comparative Example 6 As in Example 14, the die pad 7 of the lead frame 6 and the semiconductor chip 8 were cured by heating with the epoxy-based heat conductive adhesive film 3 of Comparative Example 1. Further, the electrode part of the semiconductor chip 8 and the lead part of the lead frame 11 were electrically connected with the bonding wire 9, and transfer-molded with the epoxy-based sealant 10, thereby producing the same electronic component as that of FIG. As in Example 14, when the electronic component was energized and the thermal resistance value was measured after 10 minutes,
0.42 ° C / W.

【0037】[0037]

【表1】 [Table 1]

【0038】[0038]

【発明の効果】比較例4は窒化ホウ素粉末を配合してい
ない例で熱伝導率が小さい。比較例1、比較例3は窒化
ホウ素粉末を配合した熱伝導性接着フィルムの例である
けれども、磁場を印加せず一定方向に窒化ホウ素粉末が
配向していないので熱伝導率が小さくて放熱性が劣る。
比較例2は磁場を印加しているけれども窒化ホウ素粉末
の配向が不十分なので熱伝導率が小さい。
Comparative Example 4 is an example in which boron nitride powder is not blended and has a low thermal conductivity. Comparative Examples 1 and 3 are examples of a thermally conductive adhesive film in which boron nitride powder is blended. However, since the boron nitride powder is not oriented in a certain direction without applying a magnetic field, the thermal conductivity is small and the heat dissipation property is low. Is inferior.
In Comparative Example 2, although the magnetic field was applied, the thermal conductivity was small because the orientation of the boron nitride powder was insufficient.

【0039】実施例1〜12のように、本発明の熱伝導
性接着フィルムは磁場を印加させて窒化ホウ素粉末を厚
み方向の一定方向に配向したものであり、熱伝導率が大
きく放熱性にすぐれ、かつ電気絶縁性で引剥がし強度も
良好である。また、実施例13、14で明らかなよう
に、本発明の窒化ホウ素粉末が一定方向に配向した熱伝
導性接着フィルムで接着した電子部品は、発熱量が大き
い半導体パッケージとヒートシンクなどの放熱器との接
着、あるいは半導体チップとダイパッド部との接着に応
用し熱抵抗が小さくて放熱特性にすぐれる有用な電子部
品を提供することができる。
As in Examples 1 to 12, the heat conductive adhesive film of the present invention is obtained by orienting boron nitride powder in a constant thickness direction by applying a magnetic field. It has excellent electrical insulation and good peel strength. Further, as is apparent from Examples 13 and 14, the electronic component in which the boron nitride powder of the present invention is bonded with a thermally conductive adhesive film oriented in a certain direction is a semiconductor package having a large calorific value and a radiator such as a heat sink. It is possible to provide a useful electronic component having a low thermal resistance and excellent heat radiation characteristics by applying the bonding to a semiconductor chip or a die pad portion.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の熱伝導性接着フィルムを使用した電子
部品の例(ボールグリッドアレイ型半導体パッケージ2
と放熱器4の接着に使用)
FIG. 1 shows an example of an electronic component (a ball grid array type semiconductor package 2) using a heat conductive adhesive film of the present invention.
(Used to bond the radiator 4 to the radiator 4)

【図2】本発明の熱伝導性接着フィルムを使用した電子
部品の例(チップサイズ型半導体パッケージ2とプリン
ト基板1の接着に使用)
FIG. 2 shows an example of an electronic component using the heat conductive adhesive film of the present invention (used for bonding a chip size semiconductor package 2 and a printed circuit board 1).

【図3】本発明の熱伝導性接着フィルムを使用した電子
部品の例(ピングリッドアレイ型半導体パッケージ2と
ヒートシンク5の接着に使用)
FIG. 3 shows an example of an electronic component using the heat conductive adhesive film of the present invention (used for bonding the pin grid array type semiconductor package 2 and the heat sink 5).

【図4】本発明の熱伝導性接着フィルムを使用した電子
部品の例(半導体チップ8とダイパッド7の接着に使
用)
FIG. 4 shows an example of an electronic component using the heat conductive adhesive film of the present invention (used for bonding a semiconductor chip 8 and a die pad 7).

【図5】(1)〜(3)は本発明の熱伝導性接着フィル
ムを製造する方法を示す概念図
FIGS. 5 (1) to (3) are conceptual diagrams showing a method for producing the heat conductive adhesive film of the present invention.

【図6】(1)〜(4)は図1の本発明の電子部品を製
造する方法、(5)は(4)の熱伝導性接着フィルム中
の窒化ホウ素粉末の配向状態を示す概念図
FIGS. 6 (1) to (4) are conceptual diagrams showing a method for manufacturing the electronic component of the present invention of FIG. 1, and (5) is a conceptual diagram showing an orientation state of boron nitride powder in the heat conductive adhesive film of (4).

【図7】従来の充填材を含む熱伝導性接着フィルムを使
用した電子部品の例
FIG. 7 shows an example of an electronic component using a conventional heat conductive adhesive film containing a filler.

【図8】図4の本発明の電子部品を製造する方法8 is a method for manufacturing the electronic component of the present invention shown in FIG. 4;

【符号の説明】[Explanation of symbols]

1 プリント基板 2 半導体パッケージ 3 熱伝導性接着フィルム 4 放熱器 5 ヒートシンク 6 リードフレーム 7 ダイパッド 8 半導体チップ 9 ボンディングワイヤー 10 封止剤 11 ポリエチレンテレフタレートシート 12 磁石 13 配向している窒化ホウ素粉末 DESCRIPTION OF SYMBOLS 1 Printed board 2 Semiconductor package 3 Heat conductive adhesive film 4 Heat sink 5 Heat sink 6 Lead frame 7 Die pad 8 Semiconductor chip 9 Bonding wire 10 Sealant 11 Polyethylene terephthalate sheet 12 Magnet 13 Oriented boron nitride powder

───────────────────────────────────────────────────── フロントページの続き (72)発明者 木村 恒久 東京都調布市柴崎2丁目18番2号エクセル ハイツ301号 (72)発明者 山登 正文 東京都八王子市南大沢5丁目7番10−302 号 Fターム(参考) 4J004 AA05 AA06 AA07 AA08 AA09 AA10 AA11 AA12 AA13 AA14 AA15 AA16 AA18 AB03 BA02 FA05 FA10 4J040 CA001 DA001 DB001 DE001 DF001 DG001 EB021 EC001 ED001 EF001 EG001 EH031 EK001 HA326 JA09 JB02 LA08 LA09 MA02 MA04 MA10 MB09 NA19 NA20 5F036 AA01 BA23 BB21 BD21 5F047 BA21 BA33 BA54 BB03  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tsunehisa Kimura 2-18-2 Shibasaki, Chofu-shi, Tokyo Excel Heights 301 (72) Inventor Masafumi Yamato 5-7-13-302 Minami-Osawa, Hachioji-shi, Tokyo F term (for reference) 4J004 AA05 AA06 AA07 AA08 AA09 AA10 AA11 AA12 AA13 AA14 AA15 AA16 AA18 AB03 BA02 FA05 FA10 4J040 CA001 DA001 DB001 DE001 DF001 DG001 EB021 EC001 ED001 EF001 EG001 E0403A02 MA03 HA031A02 BA23 BB21 BD21 5F047 BA21 BA33 BA54 BB03

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】窒化ホウ素粉末が、固体状接着剤中に一定
方向に配向されていることを特徴とする熱伝導性接着フ
ィルム
1. A thermally conductive adhesive film, wherein boron nitride powder is oriented in a fixed direction in a solid adhesive.
【請求項2】熱伝導性接着フィルム中の窒化ホウ素粉末
の濃度が、2〜80体積%である請求項1に記載の熱伝
導性接着フィルム
2. The heat conductive adhesive film according to claim 1, wherein the concentration of the boron nitride powder in the heat conductive adhesive film is 2 to 80% by volume.
【請求項3】固体状接着剤が、エポキシ系、ポリイミド
系、アクリル系、ウレタン系、ビニル系、シリコーン系
あるいは熱可塑性エラストマー系より選ばれる少なくと
も1種である請求項1あるいは請求項2に記載の熱伝導
性接着フィルム
3. The solid adhesive according to claim 1 or 2, wherein the solid adhesive is at least one selected from epoxy, polyimide, acrylic, urethane, vinyl, silicone and thermoplastic elastomers. Heat conductive adhesive film
【請求項4】固体状接着剤が、熱硬化性であり、かつ半
硬化状態である請求項1、2あるいは3に記載の熱伝導
性接着フィルム
4. The heat conductive adhesive film according to claim 1, wherein the solid adhesive is thermosetting and is in a semi-cured state.
【請求項5】窒化ホウ素粉末を含むフィルム組成物に磁
場を印加させて組成物中の窒化ホウ素粉末を一定方向に
配向させて固化させることを特徴とする熱伝導性接着フ
ィルムの製造方法
5. A method for producing a thermally conductive adhesive film, comprising applying a magnetic field to a film composition containing boron nitride powder to orient and solidify the boron nitride powder in the composition in a certain direction.
【請求項6】発熱する素子と伝熱部材間を、窒化ホウ素
粉末が一定方向に配向された熱伝導性接着フィルムで接
着したことを特徴とする電子部品
6. An electronic component wherein the heat-generating element and the heat transfer member are bonded with a heat conductive adhesive film in which boron nitride powder is oriented in a predetermined direction.
JP2000264439A 2000-08-31 2000-08-31 Thermal conductive adhesive film, method for producing the same, and electronic component Ceased JP2002069392A (en)

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EP01306469A EP1184899A3 (en) 2000-08-31 2001-07-27 Heat conductive adhesive film and manufacturing method thereof and electronic component
US09/921,427 US6663969B2 (en) 2000-08-31 2001-08-02 Heat conductive adhesive film and manufacturing method thereof and electronic component

Applications Claiming Priority (1)

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