JP2002069038A - Trifluoromethyl group-bearing benzoylformic alkyls, method of producing the same and method of trifluoromethyl group-bearing phenylacetic acid - Google Patents
Trifluoromethyl group-bearing benzoylformic alkyls, method of producing the same and method of trifluoromethyl group-bearing phenylacetic acidInfo
- Publication number
- JP2002069038A JP2002069038A JP2000258725A JP2000258725A JP2002069038A JP 2002069038 A JP2002069038 A JP 2002069038A JP 2000258725 A JP2000258725 A JP 2000258725A JP 2000258725 A JP2000258725 A JP 2000258725A JP 2002069038 A JP2002069038 A JP 2002069038A
- Authority
- JP
- Japan
- Prior art keywords
- trifluoromethyl group
- bearing
- trifluoromethyl
- producing
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 title claims abstract description 44
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 13
- 229960003424 phenylacetic acid Drugs 0.000 title claims abstract description 10
- 239000003279 phenylacetic acid Substances 0.000 title claims abstract description 10
- 125000000217 alkyl group Chemical group 0.000 title claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 4
- -1 alkyl benzoylformate Chemical compound 0.000 claims description 29
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 12
- 239000000243 solution Substances 0.000 claims description 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 3
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical compound OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 claims 3
- 239000003513 alkali Substances 0.000 claims 1
- 125000005907 alkyl ester group Chemical group 0.000 abstract 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000543 intermediate Substances 0.000 description 7
- SHAKXLPGFQFNJG-UHFFFAOYSA-M magnesium;1,3-bis(trifluoromethyl)benzene-5-ide;bromide Chemical compound [Mg+2].[Br-].FC(F)(F)C1=C[C-]=CC(C(F)(F)F)=C1 SHAKXLPGFQFNJG-UHFFFAOYSA-M 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- 229940125904 compound 1 Drugs 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- CSVCVIHEBDJTCJ-UHFFFAOYSA-N 1-bromo-3,5-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(Br)=CC(C(F)(F)F)=C1 CSVCVIHEBDJTCJ-UHFFFAOYSA-N 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 150000005171 halobenzenes Chemical class 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- PAWSKKHEEYTXSA-UHFFFAOYSA-N 2-[3,5-bis(trifluoromethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 PAWSKKHEEYTXSA-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- JKRZOJADNVOXPM-UHFFFAOYSA-N Oxalic acid dibutyl ester Chemical compound CCCCOC(=O)C(=O)OCCCC JKRZOJADNVOXPM-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- HQRSIMQXCAWAJB-UHFFFAOYSA-N 3,3,3-trifluoro-2-phenylpropanoic acid Chemical compound OC(=O)C(C(F)(F)F)C1=CC=CC=C1 HQRSIMQXCAWAJB-UHFFFAOYSA-N 0.000 description 1
- 101710192523 30S ribosomal protein S9 Proteins 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- LOMVENUNSWAXEN-UHFFFAOYSA-N Methyl oxalate Chemical compound COC(=O)C(=O)OC LOMVENUNSWAXEN-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- HZHMMLIMOUNKCK-UHFFFAOYSA-N dipropyl oxalate Chemical compound CCCOC(=O)C(=O)OCCC HZHMMLIMOUNKCK-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000002330 electrospray ionisation mass spectrometry Methods 0.000 description 1
- CHDFNIZLAAFFPX-UHFFFAOYSA-N ethoxyethane;oxolane Chemical compound CCOCC.C1CCOC1 CHDFNIZLAAFFPX-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- 239000012450 pharmaceutical intermediate Substances 0.000 description 1
- SUSQOBVLVYHIEX-UHFFFAOYSA-N phenylacetonitrile Chemical compound N#CCC1=CC=CC=C1 SUSQOBVLVYHIEX-UHFFFAOYSA-N 0.000 description 1
- ANRQGKOBLBYXFM-UHFFFAOYSA-M phenylmagnesium bromide Chemical compound Br[Mg]C1=CC=CC=C1 ANRQGKOBLBYXFM-UHFFFAOYSA-M 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、新規なトリフルオ
ロメチル基含有ベンゾイルギ酸アルキル類およびその製
造方法、ならびにそのトリフルオロメチル基含有ベンゾ
イルギ酸アルキル類を経由するトリフルオロメチル基含
有フェニル酢酸類の製造方法に関する。TECHNICAL FIELD The present invention relates to a novel alkyl benzoylformate containing a trifluoromethyl group and a method for producing the same, and a process for producing a phenylacetic acid containing a trifluoromethyl group via the alkyl benzoylformate containing a trifluoromethyl group. It relates to a manufacturing method.
【0002】[0002]
【従来の技術】従来、トリフルオロメチル基を分子内に
複数個有するフェニル酢酸類の製造方法としては、相当
するベンジルハライドをアルコール中、シアン化ナトリ
ウムと反応させてベンジルシアナイドとし、これを加水
分解する方法(Olah,G.A.etal.,J.O
rg.Chem.22,879(1957))や、相当
するアセトフェノンにイオウと第二級アミンをWill
gerodt反応(Organic Reaction
s 3 p.83)させてチオアセトアミドとし、これ
を加水分解する方法(Novotny,J.eta
l.,Pharm.Sci.,62,910(197
3))が知られている。2. Description of the Related Art Conventionally, as a method for producing a phenylacetic acid having a plurality of trifluoromethyl groups in a molecule, a corresponding benzyl halide is reacted with sodium cyanide in alcohol to form benzyl cyanide, which is then hydrolyzed. Decomposition method (Olah, GA et al., JO
rg. Chem. 22,879 (1957)) and Will and sulfur and secondary amine in the corresponding acetophenone.
Gerodt reaction (Organic Reaction)
s 3 p. 83) to give thioacetamide, which is then hydrolyzed (Novotny, J. eta).
l. , Pharm. Sci. , 62, 910 (197
3)) is known.
【0003】しかし、従来法では、取り扱いや廃水処理
の難しいシアン化ナトリウムを使用しなければならず、
また、工程が長く工業的に効率よく製造できない等の問
題があった。However, in the conventional method, it is necessary to use sodium cyanide which is difficult to handle and treat wastewater.
In addition, there is a problem in that the process is long and it is not possible to efficiently manufacture industrially.
【0004】[0004]
【発明が解決しようとする課題】本発明の第1の目的
は、トリフルオロメチル基含有フェニル酢酸類の中間体
として有用な新規のトリフルオロメチル基含有ベンゾイ
ルギ酸アルキル類を提供することにある。SUMMARY OF THE INVENTION It is a first object of the present invention to provide novel trifluoromethyl-containing alkyl benzoylformates useful as intermediates of trifluoromethyl-containing phenylacetic acids.
【0005】本発明の第2の目的は、そのトリフルオロ
メチル基含有ベンゾイルギ酸アルキル類を製造する方法
を提供することにある。[0005] A second object of the present invention is to provide a method for producing the trifluoromethyl group-containing alkyl benzoylformate.
【0006】本発明の第3の目的は、トリフルオロメチ
ル基含有ハロベンゼンを出発原料として、前記トリフル
オロメチル基含有ベンゾイルギ酸アルキル類を経由し
て、トリフルオロメチル基含有フェニル酢酸類を、工業
的に効率よく安全かつ容易に製造できる製造方法を提供
することにある。A third object of the present invention is to industrially convert trifluoromethyl group-containing phenylacetic acids from a trifluoromethyl group-containing halobenzene via the above-mentioned trifluoromethyl group-containing alkyl benzoylformate. Another object of the present invention is to provide a manufacturing method that can efficiently, safely, and easily manufacture.
【0007】[0007]
【課題を解決するための手段】本発明者らは、トリフル
オロメチル基を分子内に複数個有するフェニル酢酸類を
工業的に安全に容易に製造できる方法について鋭意検討
した。その結果、トリフルオロメチル基含有ハロベンゼ
ンから得られるトリフルオロメチル基含有フェニルマグ
ネシウムハライドは、蓚酸ジアルキルと容易に反応し、
新規化合物であるトリフルオロメチル基含有ベンゾイル
ギ酸アルキルを与え、これをアルカリ水溶液中で、加水
分解後、ヒドラジンと反応させ、分解させることによ
り、トリフルオロメチル基含有フェニル酢酸類が高収率
で得られることを見出した。Means for Solving the Problems The present inventors have intensively studied a method for industrially and safely producing a phenylacetic acid having a plurality of trifluoromethyl groups in a molecule. As a result, trifluoromethyl group-containing phenylmagnesium halide obtained from trifluoromethyl group-containing halobenzene easily reacts with dialkyl oxalate,
A novel compound, a trifluoromethyl group-containing alkyl benzoylformate, is hydrolyzed in an aqueous alkaline solution, then reacted with hydrazine and decomposed to obtain trifluoromethyl group-containing phenylacetic acids in high yield. Was found to be.
【0008】本発明は、下式(1)で示されるトリフル
オロメチル基含有ベンゾイルギ酸アルキル類(以下、
「化合物1」ともいう)を提供する。The present invention provides a trifluoromethyl group-containing alkyl benzoylformate represented by the following formula (1):
"Compound 1" is provided.
【0009】[0009]
【化7】 ただし、式中の記号は本明細書を通じて下記の意味を示
す。 R1 :炭素数1〜5のアルキル基 n:2または3Embedded image However, the symbols in the formula have the following meanings throughout this specification. R 1 : alkyl group having 1 to 5 carbon atoms n: 2 or 3
【0010】また、本発明は、化合物1を経由すること
を特徴とする下式(3)で示されるトリフルオロメチル
基含有フェニル酢酸(以下、「化合物3」ともいう)の
製造方法を提供する。The present invention also provides a process for producing a trifluoromethyl group-containing phenylacetic acid represented by the following formula (3) (hereinafter also referred to as “compound 3”), which is via compound 1. .
【0011】[0011]
【化8】 Embedded image
【0012】また、本発明は、下式(4)で示されるト
リフルオロメチル基含有フェニルマグネシウムハライド
類(以下、「化合物4」ともいう)と蓚酸ジアルキルと
を反応させる工程 (以下、「工程A」という)を含む化
合物1の製造方法を提供する。Further, the present invention provides a step of reacting a trifluoromethyl group-containing phenylmagnesium halide represented by the following formula (4) (hereinafter also referred to as “compound 4”) with a dialkyl oxalate (hereinafter referred to as “step A”). ") Is provided.
【0013】[0013]
【化9】 ただし、式中の記号は本明細書を通じて下記の意味を示
す。 X:Cl、BrまたはIEmbedded image However, the symbols in the formula have the following meanings throughout this specification. X: Cl, Br or I
【0014】また、本発明は、化合物1をアルカリ水溶
液中でヒドラジンと反応させ、分解させる工程(以下、
「工程B」という)を含む化合物3の製造方法を提供す
る。The present invention also relates to a step of reacting compound 1 with hydrazine in an aqueous alkaline solution to decompose the compound (hereinafter referred to as “hydrazine”).
A process for preparing compound 3 (hereinafter referred to as "Step B").
【0015】さらに、本発明は、前記工程Aと、前記工
程Bとを含む化合物3の製造方法を提供する。Further, the present invention provides a method for producing compound 3, comprising the above-mentioned step A and step B.
【0016】本発明の化合物1の代表例として、下記式
で表される化合物が挙げられる。A typical example of the compound 1 of the present invention is a compound represented by the following formula.
【化10】 Embedded image
【0017】これらの化合物の中でも、特に、下式
(2)で示される新規の3,5−ビス(トリフルオロメ
チル)ベンゾイルギ酸アルキル類(以下「化合物2」と
もいう)は、医薬中間体として重要な化合物である3,
5−ビス(トリフルオロメチル)フェニル酢酸の製造に
おける中間体として有用である。Among these compounds, novel alkyl 3,5-bis (trifluoromethyl) benzoylformates (hereinafter, also referred to as “compound 2”) represented by the following formula (2) are particularly useful as pharmaceutical intermediates. Important compounds 3,
Useful as an intermediate in the production of 5-bis (trifluoromethyl) phenylacetic acid.
【0018】[0018]
【化11】 本発明におけるXはCl、Brが好ましく、特にBrが
好ましい。Embedded image X in the present invention is preferably Cl or Br, and particularly preferably Br.
【0019】本発明の工程Aで用いられる化合物4は、
目的の化合物1に対応するトリフルオロメチル基含有フ
ェニルマグネシウムハライド類を用いて、一般的なグリ
ニャール反応によって得ることができる。例えば、3,
5−ビス(トリフルオロメチル)フェニルマグネシウム
ブロミドは、3,5−ビス(トリフルオロメチル)ブロ
モベンゼンをジエチルエーテル中、金属マグネシウムと
反応して得ることができる(米国特許3625971号
明細書、英国特許1223945号公報等)。このと
き、反応温度、反応溶媒等の反応条件は、置換基の位
置、置換基の数等により適宜選択することができる。反
応溶媒としては、例えば、ジエチルエーテルテトラヒド
ロフラン(THF)等が代表的である。Compound 4 used in step A of the present invention is
It can be obtained by a general Grignard reaction using a trifluoromethyl group-containing phenylmagnesium halide corresponding to the target compound 1. For example, 3,
5-bis (trifluoromethyl) phenylmagnesium bromide can be obtained by reacting 3,5-bis (trifluoromethyl) bromobenzene with metallic magnesium in diethyl ether (US Pat. No. 3,625,971; British Patent No. 1223945). At this time, reaction conditions such as a reaction temperature and a reaction solvent can be appropriately selected depending on the position of the substituent, the number of the substituents, and the like. As a reaction solvent, for example, diethyl ether tetrahydrofuran (THF) and the like are representative.
【0020】工程Aで用いられる蓚酸ジアルキルの代表
例としては、蓚酸ジメチル、蓚酸ジエチル、蓚酸ジプロ
ピル、および蓚酸ジブチル等が好ましく挙げられるが、
工業的には蓚酸ジエチルが安価で取り扱いが容易である
ことから特に好ましい。Representative examples of the dialkyl oxalate used in the step A include dimethyl oxalate, diethyl oxalate, dipropyl oxalate, and dibutyl oxalate.
Industrially, diethyl oxalate is particularly preferred because it is inexpensive and easy to handle.
【0021】工程Aにおいて、トリフルオロメチル基含
有フェニルマグネシウムハライド類/蓚酸ジアルキルの
使用割合は、モル比で0.2〜1.0が好ましく、さら
に0.4〜0.7の割合が好ましい。In step A, the ratio of the trifluoromethyl group-containing phenylmagnesium halides / dialkyl oxalate to be used is preferably from 0.2 to 1.0 in terms of molar ratio, more preferably from 0.4 to 0.7.
【0022】本発明における工程Aの具体例は以下のよ
うに挙げられる。3,5−ビス(トリフルオロメチル)
フェニルマグネシウムブロミド1molに対し、1.0
〜4.0mol、好ましくは1.5〜2.5molの蓚
酸ジエチル中に−10〜10℃で滴下し、反応させ、酸
分解、抽出、水洗、蒸留等により目的とする新規化合物
である3,5−ビス(トリフルオロメチル)ベンゾイル
ギ酸アルキルが得られる。3,5−ビス(トリフルオロ
メチル)フェニルマグネシウムブロミド溶液の濃度は
0.3〜1.5mol/Lが好ましく、特に0.5〜
1.2mol/Lが好ましい。A specific example of the step A in the present invention is as follows. 3,5-bis (trifluoromethyl)
1.0 mol per 1 mol of phenylmagnesium bromide
To 4.0 mol, preferably 1.5 to 2.5 mol of diethyl oxalate at −10 to 10 ° C., and the reaction is carried out. The desired novel compound is obtained by acid decomposition, extraction, washing with water, distillation or the like. An alkyl 5-bis (trifluoromethyl) benzoylformate is obtained. The concentration of the 3,5-bis (trifluoromethyl) phenylmagnesium bromide solution is preferably from 0.3 to 1.5 mol / L, particularly preferably from 0.5 to 1.5 mol / L.
1.2 mol / L is preferred.
【0023】本発明における工程Bで用いられるアルカ
リ水溶液としては、反応性、取り扱いの容易さから水酸
化カリウム水溶液、水酸化ナトリウム水溶液が好ましく
用いられる。As the alkaline aqueous solution used in the step B in the present invention, an aqueous potassium hydroxide solution and an aqueous sodium hydroxide solution are preferably used from the viewpoint of reactivity and ease of handling.
【0024】また、この工程Bにおいて、反応温度は0
〜200℃が好ましく、さらに室温〜100℃が好まし
い。圧力は、反応を早く進行させるためには加圧還流下
とするのがよいが、作業性の観点からは、常圧が好まし
い。特に、工程Bは、常圧において加熱還流下に行うの
が好ましい。In this step B, the reaction temperature is 0
To 200 ° C, more preferably room temperature to 100 ° C. The pressure is preferably under reflux under pressure in order to make the reaction proceed quickly, but from the viewpoint of workability, normal pressure is preferable. In particular, step B is preferably performed under heating and reflux at normal pressure.
【0025】また、工程Bの具体例は以下のように挙げ
られる。3,5−ビス(トリフルオロメチル)ベンゾイ
ルギ酸エチルをKOH水溶液に懸濁させ、加水分解を行
った後、KOH水溶液およびヒドラジン1水和物を滴下
し、室温で反応させヒドラゾン体とする。次に加熱還流
させ、冷却後、塩酸を加えると3,5−ビス(トリフル
オロメチル)フェニル酢酸が結晶として得られる。必要
に応じて再結晶等の精製を行う。Further, a specific example of the step B is as follows. Ethyl 3,5-bis (trifluoromethyl) benzoylformate is suspended in an aqueous KOH solution and hydrolyzed. Then, an aqueous KOH solution and hydrazine monohydrate are added dropwise to react at room temperature to obtain a hydrazone compound. Next, the mixture is heated under reflux and cooled, and hydrochloric acid is added to obtain 3,5-bis (trifluoromethyl) phenylacetic acid as crystals. Purification such as recrystallization is performed as necessary.
【0026】本発明の化合物1は、上記のように医薬品
等の原料として有用なトリフルオロメチル基含有フェニ
ル酢酸の中間体として有用である他、他の新しい有機合
成中間体としても用いることができる。例えば、液晶化
合物、有機電子材料等の製造中間体として有用である。The compound 1 of the present invention is useful as an intermediate of a trifluoromethyl group-containing phenylacetic acid, which is useful as a raw material for pharmaceuticals and the like, as described above, and can also be used as another new organic synthetic intermediate. . For example, it is useful as a production intermediate for liquid crystal compounds, organic electronic materials, and the like.
【0027】[0027]
【実施例】以下に、本発明の実施例を説明するが、これ
らに限定されるものではない。EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples.
【0028】[例1]攪拌機、温度計、滴下ロート、お
よび冷却器を取り付けた内容積200mlの4つ口フラ
スコ中に、窒素気流下、マグネシウム切片2.43g
(0.10mol)を入れ、無水ジメチルエーテル3m
lで表面を覆った。次に、3,5−ビス(トリフルオロ
メチル)ブロモベンゼン29.3g(0.10mol)
のジエチルエーテル117ml溶液を少し加え、発熱反
応が確認された後、緩やかな還流下に、残りを1時間か
けて滴下した。30分熟成後、冷却し、3,5−ビス
(トリフルオロメチル)フェニルマグネシウムブロミド
のジエチルエーテル溶液を調製した。Example 1 2.43 g of magnesium slices in a 200-ml four-necked flask equipped with a stirrer, thermometer, dropping funnel, and condenser under a nitrogen stream.
(0.10 mol), and dry dimethyl ether 3m
l covered the surface. Next, 29.3 g (0.10 mol) of 3,5-bis (trifluoromethyl) bromobenzene
117 ml of diethyl ether solution was added a little, and after the exothermic reaction was confirmed, the remainder was added dropwise over 1 hour under gentle reflux. After aging for 30 minutes, the mixture was cooled to prepare a solution of 3,5-bis (trifluoromethyl) phenylmagnesium bromide in diethyl ether.
【0029】次に、攪拌機、温度計、滴下ロート、およ
び冷却器を取り付けた内容積300mlの4つ口フラス
コ中に、ジエチルエーテル18mlおよび蓚酸ジエチル
36.8g(0.25mol)を加えた後、窒素気流
下、−5℃以下で上記で得られた3,5−ビス(トリフ
ルオロメチル)フェニルマグネシウムブロミドのジエチ
ルエーテル溶液を90分かけて滴下した。Next, 18 ml of diethyl ether and 36.8 g (0.25 mol) of diethyl oxalate were added to a 300-ml four-necked flask equipped with a stirrer, a thermometer, a dropping funnel, and a condenser. Under a nitrogen stream, a diethyl ether solution of 3,5-bis (trifluoromethyl) phenylmagnesium bromide obtained above was added dropwise at -5 ° C or lower over 90 minutes.
【0030】30分熟成後、反応混合物を塩酸(15m
l)および氷水(150ml)中に注ぎ、有機相を分離
した。有機相は5%食塩水50mlで2回洗浄後、Mg
SO 4 で乾燥した。ジエチルエーテル留去後、残留液を
蒸留すると3,5−ビス(トリフルオロメチル)ベンゾ
イルギ酸エチルが25.8g(収率82%)得られた。After aging for 30 minutes, the reaction mixture was treated with hydrochloric acid (15 m
1) and pour into ice water (150 ml) and separate the organic phase
did. The organic phase was washed twice with 50 ml of 5% saline, and then washed with Mg.
SO FourAnd dried. After distilling off diethyl ether, the remaining liquid was
Distilled to 3,5-bis (trifluoromethyl) benzo
25.8 g (82% yield) of ethyl ilmate was obtained.
【0031】b.p. 101〜105℃/2mmHg nD 25 1.427 IR(neat):1738cm-1(C=O)、170
7cm-1(C=O)、1618cm-1(ベンゼン環)、
1281cm-1(C−F)1 H−NMR(CDCl3 )δ(ppm):1.46
(3H,t,J=7,1Hz)、4.50(2H,q,
J=7,1Hz)、8.15(1H,s)、8.54
(2H,s) MS(EI)m/e(%):296(2%)、295
(12%)、241(100%)、225(30%)、
214(10%)、163(6%)、144(2%)、
75(4%)B. p. 101 to 105 ° C./2 mmHg n D 25 1.427 IR (neat): 1738 cm −1 (C = O), 170
7cm -1 (C = O), 1618cm -1 ( benzene ring),
1281 cm -1 (CF) 1 H-NMR (CDCl 3 ) δ (ppm): 1.46
(3H, t, J = 7, 1 Hz), 4.50 (2H, q,
J = 7.1 Hz), 8.15 (1H, s), 8.54
(2H, s) MS (EI) m / e (%): 296 (2%), 295
(12%), 241 (100%), 225 (30%),
214 (10%), 163 (6%), 144 (2%),
75 (4%)
【0032】[例2]例1と同様にして、マグネシウム
2.74g(0.113mol)および無水THF12
0ml中に、窒素気流下30〜35℃で、発熱を確認し
ながら3,5−ビス(トリフルオロメチル)ブロモベン
ゼン29.3g(0.10mol)を1時間滴下し、3
0分間熟成後冷却し、3,5−ビス(トリフルオロメチ
ル)フェニルマグネシウムブロミドのTHF溶液を調製
した。Example 2 In the same manner as in Example 1, 2.74 g (0.113 mol) of magnesium and anhydrous THF12
In 0 ml, 29.3 g (0.10 mol) of 3,5-bis (trifluoromethyl) bromobenzene was added dropwise at 30 to 35 ° C. for 1 hour under a nitrogen stream while confirming heat generation.
After aging for 0 minutes, the mixture was cooled to prepare a THF solution of 3,5-bis (trifluoromethyl) phenylmagnesium bromide.
【0033】次に、攪拌機、温度計、滴下ロート、およ
び冷却器をつけた300ml4つ口フラスコ中に、TH
F18mlおよび蓚酸ジエチル36.8g(0.25m
ol)を加え、窒素気流下に−5℃以下で上記で得られ
た3,5−ビス(トリフルオロメチル)フェニルマグネ
シウムブロミドのTHF溶液を90分かけて滴下し、3
0分間熟成した。Next, TH was placed in a 300 ml four-necked flask equipped with a stirrer, a thermometer, a dropping funnel, and a condenser.
F18 ml and diethyl oxalate 36.8 g (0.25 m
ol), and a THF solution of 3,5-bis (trifluoromethyl) phenylmagnesium bromide obtained above was added dropwise at 90 ° C. or lower over 90 minutes under a nitrogen stream, and 3
Aged for 0 minutes.
【0034】熟成後、反応混合物に塩酸(9.6ml)
および水(44ml)を滴下し、分解後、有機相を分離
した。水相を酢酸エチル50mlで抽出し、有機相を前
に得られた有機相とあわせ、5%食塩水50mlで2回
洗浄後、MgSO4 で乾燥した。THF留去後、残留液
を蒸留すると3,5−ビス(トリフルオロメチル)ベン
ゾイルギ酸エチルが26.4g(収率84%)得られ
た。After aging, hydrochloric acid (9.6 ml) was added to the reaction mixture.
And water (44 ml) were added dropwise, and after decomposition, the organic phase was separated. The aqueous phase was extracted with 50 ml of ethyl acetate, and the organic phase was combined with the previously obtained organic phase, washed twice with 50 ml of 5% brine, and dried over MgSO 4 . After THF was distilled off, the remaining liquid was distilled, whereby 26.4 g (yield 84%) of ethyl 3,5-bis (trifluoromethyl) benzoylformate was obtained.
【0035】[例3]例1と同様にして、窒素気流下、
1MエチルマグネシウムブロミドのTHF溶液105m
l(0.105mol)中に、20〜30℃で、3,5
−ビス(トリフルオロメチル)ブロモベンゼン29.3
g(0.10mol)のTHF(10ml)溶液を1時
間かけて滴下し、30分間熟成後冷却し、3,5−ビス
(トリフルオロメチル)フェニルマグネシウムブロミド
のTHF溶液を調製した。以下、例2と同様に反応さ
せ、処理すると3,5−ビス(トリフルオロメチル)ベ
ンゾイルギ酸エチルが24.3g(収率77.5%)得
られた。Example 3 In the same manner as in Example 1, under a nitrogen stream,
105m of 1M ethylmagnesium bromide in THF
1 (0.105 mol) at 20-30 ° C, 3,5
-Bis (trifluoromethyl) bromobenzene 29.3
g (0.10 mol) in THF (10 ml) was added dropwise over 1 hour, aged for 30 minutes, and cooled to prepare a THF solution of 3,5-bis (trifluoromethyl) phenylmagnesium bromide. Thereafter, the reaction and treatment were carried out in the same manner as in Example 2 to obtain 24.3 g (yield 77.5%) of ethyl 3,5-bis (trifluoromethyl) benzoylformate.
【0036】[例4]攪拌機、温度計、滴下ロートおよ
び冷却器をつけた100ml4つ口フラスコ中に3,5
−ビス(トリフルオロメチル)ベンゾイルギ酸エチル1
0g(31.8mmol)および水23.3mlを仕込
み、室温で47%KOH水溶液4.37g(36.6m
mol)を滴下した。懸濁液は室温で1時間反応させ、
加水分解を行った。次に、47%KOH水溶液4.18
g(35.0mmol)およびヒドラジン1水和物3.
34g(66.8mmol)を滴下し、室温で1時間反
応させヒドラゾン体とした。低沸点物を留出させながら
99〜103℃で8時間還流させた。冷却後、塩酸1
4.8gを加えると結晶が析出した。結晶を濾別後、氷
水20mlで2回洗浄し、減圧下に乾燥させると淡黄色
の結晶が8.17g得られた。これをトルエンから再結
晶すると3,5−ビス(トリフルオロメチル)フェニル
酢酸が白色結晶として6.47g(収率74.7%)得
られた。 mp:121〜123℃1 H−NMR(CDCl3 )σ(ppm):3.81
(2H,s)、7.75(2H,s)、7.82(1
H,s)Example 4 3,5 was placed in a 100 ml four-necked flask equipped with a stirrer, a thermometer, a dropping funnel and a condenser.
-Ethyl bis (trifluoromethyl) benzoylformate 1
0 g (31.8 mmol) and 23.3 ml of water were charged, and 4.37 g (36.6 m) of a 47% aqueous KOH solution was added at room temperature.
mol) was added dropwise. The suspension was allowed to react for 1 hour at room temperature,
Hydrolysis was performed. Then, a 47% KOH aqueous solution 4.18
g (35.0 mmol) and hydrazine monohydrate3.
34 g (66.8 mmol) was added dropwise and reacted at room temperature for 1 hour to obtain a hydrazone compound. The mixture was refluxed at 99 to 103 ° C. for 8 hours while distilling off low boiling point substances. After cooling, add hydrochloric acid 1
When 4.8 g was added, crystals precipitated. The crystals were separated by filtration, washed twice with 20 ml of ice water, and dried under reduced pressure to obtain 8.17 g of pale yellow crystals. When this was recrystallized from toluene, 6.47 g (yield: 74.7%) of 3,5-bis (trifluoromethyl) phenylacetic acid was obtained as white crystals. mp: 121-123 ° C 1 H-NMR (CDCl 3 ) σ (ppm): 3.81
(2H, s), 7.75 (2H, s), 7.82 (1
H, s)
【0037】[0037]
【発明の効果】本発明の化合物1は、トリフルオロメチ
ル基含有フェニル酢酸の中間体として有用な新規の化合
物である。The compound 1 of the present invention is a novel compound useful as an intermediate of phenylacetic acid having a trifluoromethyl group.
【0038】本発明の方法によれば、その新規なトリフ
ルオロメチル基含有ベンゾイルギ酸アルキル類を製造で
きる。According to the method of the present invention, the novel alkyl benzoylformate containing a trifluoromethyl group can be produced.
【0039】さらに、本発明の方法によれば、トリフル
オロメチル基含有ハロベンゼンを出発原料として、前記
トリフルオロメチル基含有ベンゾイルギ酸アルキル類を
中間体として用いることにより、トリフルオロメチル基
を分子内に複数有するフェニル酢酸類を、高純度で安定
した品質で、かつ工業的に効率よく安全かつ容易に製造
することができる。Further, according to the method of the present invention, a trifluoromethyl group is used in a molecule by using a trifluoromethyl group-containing halobenzene as a starting material and the trifluoromethyl group-containing alkyl benzoylformate as an intermediate. A plurality of phenylacetic acids having high purity and stable quality can be produced industrially efficiently, safely and easily.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 徳田 純子 神奈川県茅ヶ崎市茅ヶ崎三丁目2番10号 セイミケミカル株式会社内 Fターム(参考) 4H006 AA01 AB84 AC44 BA02 BA06 BA29 BA32 BB31 BB45 BE10 BE11 BE12 BE13 BE27 BJ50 BM10 BM71 BR30 BS10 KA31 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Junko Tokuda 3-2-1-10 Chigasaki, Chigasaki-shi, Kanagawa F-term in Seimi Chemical Co., Ltd. 4H006 AA01 AB84 AC44 BA02 BA06 BA29 BA32 BB31 BB45 BE10 BE11 BE12 BE13 BE27 BJ50 BM10 BM71 BR30 BS10 KA31
Claims (6)
基含有ベンゾイルギ酸アルキル類。 【化1】 ただし、式中の記号は下記の意味を示す。 R1 :炭素数1〜5のアルキル基 n:2または31. A trifluoromethyl group-containing alkyl benzoylformate represented by the following formula (1). Embedded image However, the symbols in the formula have the following meanings. R 1 : alkyl group having 1 to 5 carbon atoms n: 2 or 3
フルオロメチル基含有ベンゾイルギ酸アルキル類。 【化2】 ただし、式中の記号は下記の意味を示す。 R1 :炭素数1〜5のアルキル基2. The trifluoromethyl group-containing alkyl benzoylformate according to claim 1, which is represented by the following formula (2). Embedded image However, the symbols in the formula have the following meanings. R 1 : alkyl group having 1 to 5 carbon atoms
チル基含有ベンゾイルギ酸アルキル類を経由することを
特徴とする下式(3)で示されるトリフルオロメチル基
含有フェニル酢酸の製造方法。 【化3】 ただし、式中の記号は下記の意味を示す。 n:2または33. A process for producing a trifluoromethyl group-containing phenylacetic acid represented by the following formula (3), which comprises passing through the trifluoromethyl group-containing alkyl benzoylformate according to claim 1 or 2. Embedded image However, the symbols in the formula have the following meanings. n: 2 or 3
基含有フェニルマグネシウムハライド類と蓚酸ジアルキ
ルとを反応させる工程を含む請求項1または2に記載の
トリフルオロメチル基含有ベンゾイルギ酸アルキル類の
製造方法。 【化4】 ただし、式中の記号は下記の意味を示す。 X:Cl、BrまたはI n:2または34. The method of claim 1 or 2, further comprising the step of reacting a trifluoromethyl group-containing phenylmagnesium halide represented by the following formula (4) with a dialkyl oxalate. Production method. Embedded image However, the symbols in the formula have the following meanings. X: Cl, Br or In: 2 or 3
チル基含有ベンゾイルギ酸アルキル類をアルカリ水溶液
中でヒドラジンと反応させ、分解させる工程を含む下式
(3)で示されるトリフルオロメチル基含有フェニル酢
酸の製造方法。 【化5】 ただし、式中の記号は下記の意味を示す。 n:2または35. A trifluoromethyl group-containing benzoyl formate according to claim 1 or 2, which is reacted with hydrazine in an aqueous alkaline solution to decompose the benzoyl formate. A method for producing phenylacetic acid. Embedded image However, the symbols in the formula have the following meanings. n: 2 or 3
基含有フェニルマグネシウムハライド類と蓚酸ジアルキ
ルとを反応させてトリフルオロメチル基含有ベンゾイル
ギ酸アルキル類を得る工程と、該トリフルオロメチル基
含有ベンゾイルギ酸アルキル類をアルカリ水溶液中でヒ
ドラジンと反応させ、分解させる工程とを含む下式
(3)で示されるトリフルオロメチル基含有フェニル酢
酸の製造方法。 【化6】 6. A step of reacting a trifluoromethyl group-containing phenylmagnesium halide represented by the following formula (4) with a dialkyl oxalate to obtain a trifluoromethyl group-containing alkyl benzoylformate; Reacting an alkyl benzoylformate with hydrazine in an aqueous alkali solution to decompose the benzoyl formate, and producing the trifluoromethyl group-containing phenylacetic acid represented by the following formula (3). Embedded image
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000258725A JP2002069038A (en) | 2000-08-29 | 2000-08-29 | Trifluoromethyl group-bearing benzoylformic alkyls, method of producing the same and method of trifluoromethyl group-bearing phenylacetic acid |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105503569A (en) * | 2016-01-11 | 2016-04-20 | 苏州汇和药业有限公司 | Synthetic method for Netupitant intermediate 2-(3,5-bi-trifluoromethyl-phenyl)-2-methyl-propionic acid |
| CN114853674A (en) * | 2022-04-26 | 2022-08-05 | 浙江安贝特药业有限公司 | Production method of medical intermediate 1,4,5, 6-tetrahydro-3-cyclopentapyrazole formonitrile |
-
2000
- 2000-08-29 JP JP2000258725A patent/JP2002069038A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105503569A (en) * | 2016-01-11 | 2016-04-20 | 苏州汇和药业有限公司 | Synthetic method for Netupitant intermediate 2-(3,5-bi-trifluoromethyl-phenyl)-2-methyl-propionic acid |
| CN114853674A (en) * | 2022-04-26 | 2022-08-05 | 浙江安贝特药业有限公司 | Production method of medical intermediate 1,4,5, 6-tetrahydro-3-cyclopentapyrazole formonitrile |
| CN114853674B (en) * | 2022-04-26 | 2024-02-02 | 浙江安贝特药业有限公司 | Production method of medical intermediate 1,4,5, 6-tetrahydro-3-cyclopentapyrazole carbonitrile |
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