JP2002050280A - Glass paste composition for forming barrier ribs of plasma display panel, back substrate of plasma display panel and method of manufacturing the same, plasma display panel and method of manufacturing the same - Google Patents

Abstract

(57) Abstract: Provided is a glass paste composition for forming a partition, the composition of which is adjusted so as to prevent the shape of the partition after firing, which is generated when the shape of the partition of the plasma display panel is complicated, to be prevented. And a back substrate of a plasma display panel prepared using the glass paste composition for forming a partition wall. Kind Code: A1 A glass paste for forming a partition containing two or more types of glass frit having different softening points as an inorganic powder of a glass paste composition for forming a partition of a plasma display panel, and at least one of which is a crystalline glass frit. The present invention further provides a composition, and further provides a back substrate of a plasma display panel prepared using the glass paste composition for forming a partition wall.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rear substrate of a plasma display panel and an entire plasma display panel comprising a rear substrate and a front substrate. In particular, it relates to a partition wall material.

[0002]

2. Description of the Related Art Conventionally, CRTs have been widely used as image display devices. However, CRTs have drawbacks such as a large external volume, a large weight, a high voltage, and the like. Diode (LED), liquid crystal display (LCD), plasma display panel (PDP),
Alternatively, flat image display devices such as plasma-addressed liquid crystal (PALC) have been developed, and their use ranges are expanding.

[0003] Above all, with the spread of multimedia, PDPs used for large-screen color display devices and the like as information interfaces have a simple structure using plasma emission, and have a large screen, high image quality, light weight and thinness. The future is attracting attention as an image display device which is not restricted by such restrictions.

In such a PDP, a small space surrounded by two flat insulating substrates and a partition partitioning the space is used as a discharge display cell, and a pair of discharge electrodes and a bottom portion are formed in each discharge display cell. An address electrode that performs light emission switching of the discharge display cell is provided, and has an airtight structure in which a dischargeable gas such as a rare gas is sealed in the space, and a voltage is selectively applied between the opposing electrodes. Plasma is generated by discharge, and the phosphor formed in the discharge display cell emits light by vacuum ultraviolet rays emitted from the plasma, and is used as a light emitting element of an image display device.

Here, the partition for forming the discharge display cell is made of an insulating material, and generally has a low melting point glass frit which is sintered at a desired firing temperature, the shape of the partition is maintained, and the coefficient of thermal expansion is maintained. It is composed of an aggregate (low expansion filler) made of an inorganic oxide or the like for adjustment, and an inorganic pigment for defining the color of the partition walls.

Various methods have been proposed for producing the partition walls, such as a screen printing method, a sand blast method, a photosensitive paste method, an embedding method, and a transfer method. In any of these methods, the composition used to form the partition is all in paste form, and is composed of an inorganic material and an organic material such as a resin or a solvent that imparts a function of forming the partition. Have been.

Here, the organic component is a component that is necessary for forming the partition walls and is burned off by firing. The low melting point glass frit in the inorganic component flows so as to fill the space generated by the burning out of the organic component, and a dense partition wall is obtained. Depending on the low-melting glass frit used, the amount of aggregate added, etc., the shape after firing can be less dense, but the sparse partition walls have insufficient strength, due to the open pores of the partition walls. At present, dense partition walls are used because of drawbacks such as the fact that it takes time to evacuate the panel.

[0008] Recently, improvement of luminous efficiency has become a major issue with the aim of improving the luminance of PDPs and reducing the power consumption, and various proposals have been made. Among them, attempts have been made to improve the shape of the partition walls to improve the effective light emitting area. Until now, stripe-shaped partition walls (FIG. 1), which are relatively easy to manufacture, have been generally used.
No. 768 discloses a meandering partition (FIG. 3) having a belt-like structure that meanders regularly.

As described above, when the partition walls become thinner or more complicated, a change in shape due to firing becomes a problem. Due to this change in shape, the partition walls are greatly distorted, and defects such as cracks and cuts are generated. The partition changes its structure by firing so as to fill in the burned-out organic components as described above. In order to prevent this shape change, a high melting point inorganic powder called an aggregate is added to the inorganic powder of the partition wall forming composition generally used at present. If the content of the aggregate is increased in order to enhance the shape retention, the shape retention is maintained, but there is a problem that the tightness after firing is lost. On the other hand, when the amount of the aggregate is small, there is a problem that the compactness is obtained but the shape retention is lost. In the case of a simple shape such as a conventional stripe-shaped partition wall, it is possible to achieve both tightness and shape retention by optimizing the content of the aggregate and the thermal characteristics of the glass frit to be used. However, when the partition structure is complicated, there is a problem that it is difficult to achieve both.

[0010]

SUMMARY OF THE INVENTION The present invention has been made to solve such problems, and an object of the present invention is to provide a partition having a thinner or more complex shape than a conventional stripe shape. Provided are a back substrate of a plasma display panel having dense and small deformation of the shape after firing, and a whole plasma display panel including the back substrate and the front substrate, and a glass paste composition for forming a partition that can cope with the problem. It is in.

[0011]

According to a first aspect of the present invention, there is provided a glass paste composition for forming partition walls of a plasma display panel, wherein the glass paste composition contains both a crystalline glass frit and an amorphous glass frit. A glass paste composition for forming partition walls of a plasma display panel, wherein a softening point of a crystalline glass frit is lower than a softening point of the amorphous glass frit.

The invention according to claim 2 is characterized in that the crystallization temperature of the crystalline glass frit is lower than the softening point of the amorphous glass frit. It is a glass paste composition for formation.

According to a third aspect of the present invention, the content of the crystalline glass frit is 0.3 to 4 times the content of the amorphous glass frit. A glass paste composition for forming a partition wall of a plasma display panel according to any one of the above.

According to a fourth aspect of the present invention, a glass paste composition for forming a partition wall of a plasma display panel contains at least two or more types of crystalline glass frit, and one of them has a softening point. And the softening point of another crystalline glass frit differs from the softening point of another crystalline glass frit by 20 ° C. or more, or the crystallization temperature of one crystalline glass frit and the other crystalline glass frit are different And a crystallization temperature of 20 ° C. or more.

According to a fifth aspect of the present invention, there is provided a glass paste composition for forming a partition wall of a plasma display panel, wherein the glass paste composition contains at least two or more types of crystalline glass frits, and one of the crystalline glass frits is used. A glass paste composition for forming partition walls of a plasma display panel, wherein another type of crystalline glass frit has a higher softening point than a crystallization temperature.

According to a sixth aspect of the present invention, in the rear substrate of the plasma display, the partition walls are formed of at least both a crystalline glass frit and an amorphous glass frit, and the crystalline glass frit is provided. A rear substrate of a plasma display panel, wherein a softening point of the frit is lower than a softening point of the amorphous glass frit.

According to a seventh aspect of the present invention, the partition wall is formed from at least both a crystalline glass frit and an amorphous glass frit, and the crystallization temperature of the crystalline glass frit is reduced. The rear substrate of a plasma display panel according to claim 6, wherein the lower substrate has a softening point lower than that of the amorphous glass frit.

The invention according to claim 8 is characterized in that the content of the crystalline glass frit is 0.3 to 4 times the weight of the amorphous glass frit.
Or a back substrate of the plasma display panel according to any one of 7.

According to a ninth aspect of the present invention, in the rear substrate of the plasma display panel, the partition is formed of at least two or more types of crystalline glass frit, and one of the types of crystalline glass frit is used. The softening point of another crystallized glass is 20 or less.
Or a difference of at least 20 ° C. between the crystallization temperature of one kind of crystalline glass frit and the crystallization temperature of another kind of crystalline glass frit. It is a back substrate of a plasma display panel.

According to a tenth aspect of the present invention, in the rear substrate of the plasma display panel, the partition walls are formed of at least two types of crystalline glass frit, and one of the types of crystalline glass frit is provided. A rear substrate of a plasma display panel, wherein another type of crystalline glass frit has a softening point higher than a crystallization temperature of the frit.

According to an eleventh aspect of the present invention, the partition wall is
The back substrate of the plasma display panel according to any one of claims 6 to 10, wherein the back substrate is a lattice type or a meander type.

According to a twelfth aspect of the present invention, there is provided a method for manufacturing a rear substrate of a plasma display panel, wherein the glass paste composition for forming partition walls of the plasma display panel according to any one of the first to fifth aspects is filled in an intaglio. ,
A method for manufacturing a rear substrate of a plasma display panel, wherein a partition is formed by transferring.

The invention according to claim 13 is the method for manufacturing a rear substrate of a plasma display panel according to claim 12, wherein the partition walls are of a lattice type or a meander type.

According to a fourteenth aspect of the present invention, there is provided a plasma display panel comprising a front substrate and a rear substrate, wherein the rear substrate and the front substrate of the plasma display panel according to any one of the sixth to eleventh aspects are bonded. It is a plasma display panel characterized by being made together.

According to a fifteenth aspect of the present invention, in a method of manufacturing a plasma display panel comprising a front substrate and a rear substrate, a method of manufacturing a rear substrate of the plasma display panel according to any one of the twelfth and thirteenth aspects And manufacturing the plasma display panel by bonding together a front substrate.

[0026]

Embodiments of the present invention will be described below. First, an embodiment of a glass paste composition for forming a partition wall of a plasma display panel of the present invention will be described.

The glass paste composition for forming barrier ribs is composed of an inorganic material as a basic material constituting the barrier ribs and an organic component having a function of forming the barrier ribs. Hereinafter, each component will be described in detail.

The inorganic powder of a glass paste composition for forming a partition wall of a general plasma display is composed of a low melting point glass frit, a low expansion filler for imparting shape retention and adjusting a thermal expansion coefficient, and a coloring pigment.

As the low melting point glass frit in the present invention, a crystalline glass frit and an amorphous glass frit are used.

The “crystallization temperature” and “softening point” in the present invention are values measured from the inflection point of DTA.
(Measurement conditions are a temperature rising rate of 10 ° C./min.)

The composition of the crystalline glass frit in the present invention is a PbO—B ₂ O ₃ —SiO ₂ —BaO system, PbO—
TiO ₂ —SiO ₂ system, SiO ₂ —ZnO—BaO—Al ₂
O ₃ system, TiO ₂ —SiO ₂ —ZnO—CaO—Al ₂ O _{3
System, PbO-SiO 2 -Al 2 O} 3 system, PbO-ZnO-
B ₂ O ₃ based, P ₂ O ₅ -ZnO-SnO-based, P ₂ O ₅ -ZnO
And the like are preferably used _{-Li 2 O-Na 2 O-} K 2 O system, but is not limited to this. The softening point of the crystalline glass frit is preferably from 350C to 600C. If the softening point is 350 ° C. or lower, the glass frit may be softened before the organic components in the paste are burned off. In such a case, defects such as generation of bubbles and cracks in the partition after firing are caused. Not preferred. On the other hand, the softening point is 600 ° C
If it is above, it is necessary to increase the maximum firing temperature, and if this temperature is increased, the glass substrate used for the plasma display panel may be greatly deformed, which is not preferable. The crystalline glass frit according to the present invention may be a system in which a trace amount of a nucleating substance of about 1 to 10000 ppm is added, or a form in which the surface of a glass powder is used as a nucleus.

A method for controlling the crystallization temperature of the crystalline glass frit will be described. The crystallization temperature is almost determined by the ratio of the main components, but can also be controlled by the type and amount of a small amount of additive or nucleating substance. For example, in general, in the case of a crystalline glass frit based on SiO ₂ —B ₂ O ₃ —PbO, the temperature is about 580 ° C. to 600 ° C., and P ₂ O ₅ —ZnO
-In the case of SnO-based crystalline glass frit, 460 to 50
There is a crystallization temperature around 0 ° C. However, a value outside the above range can be adopted as long as the effect of the present invention is satisfied. In order to allow crystallization to proceed sufficiently, it is necessary to set the temperature around the crystallization temperature for 10 minutes to 120 during firing.
It is preferred to keep the temperature low for a period of minutes.

The non-crystalline glass frit according to the present invention includes PbO—B ₂ O ₃ —SiO ₂ system, PbO—ZnO
-B ₂ O _{3 system, PbO-ZnO-B 2 O} 3 -SiO 2, Zn
It is preferable to use an OB ₂ O ₃ —SiO ₂ system, but it is not limited to this. The softening point of the amorphous glass frit is preferably about 400C to 600C. If the softening point is 400 ° C. or less, the glass frit becomes fluid before the crystalline glass frit precipitates crystals, and the crystalline glass frit does not function as an aggregate that retains its shape, which is not preferable. On the other hand, the softening point is 6
When the temperature is higher than 00 ° C., it is necessary to increase the maximum firing temperature. If this temperature is increased, the glass substrate used for the plasma display panel may be greatly deformed, which is not preferable.

The thermal expansion coefficients of the crystalline glass frit and the amorphous glass frit are preferably matched with the substrate, and soda lime glass (thermal expansion coefficient: 80 to 90 × 10 ⁻⁷ / ° C.) is used as the substrate. In case 5
It is desirable to set the temperature to be 0 to 100 × 10 ⁻⁷ / ° C. Further, the softening points of the crystalline glass frit and the amorphous glass frit are almost determined by the ratio of the main components, but can be changed by a small amount of additive. For example, in the case of a PbO—SiO ₂ —B ₂ O ₃ system, B ₂
As the amount of O ₃ is larger and the amount of SiO ₂ is smaller, the softening point tends to be lower. The softening point can also be lowered by adding a small amount of an alkaline earth metal oxide.

The process of forming the partition walls by raising the firing temperature will be described. As the temperature rises, the crystalline glass frit first softens and becomes fluid. At the point when the crystalline glass frit has fluidity,
Amorphous glass frit has no fluidity. Therefore, at the point in time when the crystalline glass frit has fluidity, the amorphous glass frit functions as an aggregate for maintaining the shape of the partition wall, and the shape change is unlikely to occur. Thereafter, when the temperature further rises, the crystalline glass frit precipitates fine crystals. In this state, the temperature is further increased, and then the amorphous glass frit is softened to have fluidity. This time, even if the precipitated crystal becomes an aggregate (skeleton) and the amorphous glass frit is softened, the denseness is maintained while maintaining the shape. By following the above-described process, it is possible to form a dense partition having excellent shape stability.

The crystallization temperature is preferably lower than the softening point of the amorphous glass frit, but even if it is higher than that, the softening point of the crystalline glass frit may be lower than that of the amorphous glass frit. If the crystallization rate is higher or the crystallization rate is higher than the temperature rise rate and the crystallization rate is higher, the shape retention and the denseness due to the combination of the fluidization of the glass frit and the crystallization, which are the effects of the present invention. The effect of improvement can be exhibited.

If the weight of the crystalline glass frit is less than 0.3 times the weight of the amorphous glass frit, the amorphous glass frit functions as an aggregate when it becomes fluid. And the change in shape becomes large. On the other hand, when the content of the crystalline glass frit is four times or more the weight of the amorphous glass frit, the crystalline glass frit softens and lacks shape stability at the time when it has fluidity. Also in this case, the shape change becomes large. From the above, the content of the crystalline glass frit is 0.3 to the content weight of the amorphous glass frit
It is preferably four times.

Further, in the invention of claim 4, the difference in softening point or crystallization temperature between two crystalline glass frits is preferably 20 ° C. or more. This difference is 20
When the temperature is lower than or equal to ° C., the difference in fluidity due to temperature is small, and the effect of the present invention of improving the shape retention characteristics and the denseness by the combination of fluidization and crystallization of glass frit cannot be sufficiently exhibited.

In the present invention, it is preferable to add a low-expansion filler and a coloring pigment for adjusting the thermal expansion coefficient in addition to the crystalline glass frit and the amorphous glass frit.

As the low expansion filler, alumina, zirconia, lead titanate, silica, cordierite, β-
Eucryptite, β-spodumene, β-quartz solid solution and the like can be used, but are not limited thereto.
The addition amount of the low expansion filler is preferably 0 to 20% by weight based on the glass frit component. If the amount of the low expansion filler is reduced, the cost increases, but the fired product becomes denser.

As the coloring pigment, the material to be added differs depending on the color of the partition walls. The color of the partition is generally white or black. Examples of the white pigment include titania, alumina, and zirconia, and at least one selected from these is added. As a black pigment, as a black coloring pigment, Cr, Fe, Co, Mn, Cu, Ni
These are added. The addition amount of the coloring pigment is 0 to 2 with respect to the glass frit component.
0% by weight is preferred.

A glass paste composition for forming a partition can be prepared by kneading an inorganic powder of such a glass paste composition for forming a partition of a plasma display panel with an appropriate organic component. The components are shown. The organic component to be kneaded differs depending on the partition wall forming method, and an organic component suitable for the partition wall forming method is selected.

As the method for forming the partition walls, a sand blast method (see JP-A-10-283938), a screen printing method (see JP-A-5-101776), a photosensitive paste method (see JP-A-6-295676), an embedding method (See JP-A-11-7126), the press method (JP-A-2000-2000).
-98352), a transfer method (JP-A-2000-299).
No. 067) and the like, and the paste composition for forming a partition wall of the present invention can be applied to each of these partition wall forming methods by adjusting its components.

For example, in a screen printing method or a sand blasting method, a binder resin, a solvent and the like are selected as organic components. In the case of a photosensitive paste, a photosensitive monomer, a photopolymerization initiator, a solvent, a binder resin, and the like are selected as organic components. In addition to these organic components, various additives are also suitably added. In the case of the transfer method, the components to be selected differ depending on the curing method of the paste. For example,
In the case of thermosetting, binder resin and solvent are the main components,
Other additives are appropriately selected. In the case of ultraviolet curing, a photosensitive monomer, a photopolymerization initiator, a solvent, a binder resin, and other additives are appropriately selected.

As the binder resin, for example, nitrocellulose, acetylcellulose, ethylcellulose,
Cellulosic polymers such as carboxymethylcellulose and methylcellulose, natural polymers such as natural rubber, polybutadiene rubber, chloroprene rubber, acrylic rubber, isoprene-based synthetic rubber, and cyclized rubber, polyethylene, polypropylene, polymethyl acrylate, polymethyl methacrylate And synthetic polymers such as polystyrene, polyvinyl alcohol, polyvinyl butyral, polyvinyl acetate, polyester, polycarbonate, polyacrylonitrile, polyvinyl chloride, polyamide, and polyurethane. These resins are used alone, as a mixture or as a copolymer.

Examples of the solvent include hydrocarbon solvents such as toluene and xylene tetralin, alcohols such as methanol and ethanol, ketones such as acetone and methyl ethyl ketone, esters such as methyl acetate and ethyl acetate, ethylene glycol solvents, and diethylene glycol solvents. Etc. can be used.

Examples of the photosensitive monomer include methoxy polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethylhexyl carbitol (meth) acrylate, and phenoxyethyl (meth) acrylate. Such as ether, 2-hydroxyethyl (meth) acrylate, hydroxy such as 2-hydroxy-3-phenoxypropyl (meth) acrylate, t-butyl (meth) acrylate, isosterial (meth) acrylate, and isoamyl (meth). Acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, 1,4-butadiol di (meth) acrylate, 1,3-butadiol di (meth) acrylate, 1,6-hex Diol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate,
Neopentyl glycol di (meth) acrylate, 1,
10-Decambudiol di (meth) acrylate epoxy acrylate, urethane acrylate, polyester acrylate, ethylene glycol di (meth) acrylate, propylene (meth) acrylate, bisphenol (meth) acrylate, trimethylolpropane tri (meth) acrylate And (meth) acrylates such as amine-based, halogen-based and silicone-based, and pentaerythritol (meth) acrylate-based and dipentaerythritol (meth) acrylate-based. These can be used alone or in combination of two or more.

As the photopolymerization initiator, acetophenone,
2,2′-dioxyacetophenone, benzyldimethyl ketal, benzophenone, methyl o-benzoylbenzoate, benzoin-n-butyl ether, benzoin isobutyl ether, 2-hydroxy-2-methyl-propiophenone, 2-methylthioxanthone, -Chlorothioxanthone or the like can be used. These can be used alone or in combination of two or more.

Other additives include dispersants such as isobitane fatty acid ester and benzenesulfonic acid, plasticizers such as butyl cetearate, butyl benzyl phthalate, dibutyl phthalate and diisodecyl phthalate, wetting agents, dispersants and polymerization inhibitors. Etc. may be added as needed.

A roll mill, a bead mill,
A paste is prepared using a mixing device such as an automatic mortar.

Next, an embodiment of a method for forming a partition will be described. A partition is formed using the prepared paste. As described above, the method of forming the partition wall includes a screen printing method, a sand blast method, a photosensitive paste method, a method using a transfer method using an intaglio or a release film, and the like.
Any method may be used. A paste suitable for each method is prepared, and a partition pattern is formed on the substrate by the method described above or the like. After forming the partition pattern, 500
By firing at a high temperature of not less than ° C., it is possible to form a back substrate of a plasma display having a desired shape and a dense partition wall having excellent shape stability.

The transfer method using an intaglio will be described below in detail.

The intaglio has the reverse shape of the partition,
A metal intaglio, a resin intaglio, or the like can be used. As a typical example of the metal intaglio, there is engraved or corroded copper plate as used in intaglio printing. As the resin intaglio, there are a method in which the metal intaglio serving as a master of the intaglio is filled with resin to copy the intaglio, and a method in which the photosensitive resin is cured and developed through a photomask to form the intaglio.

The intaglio plate is filled with a glass paste for forming a partition wall so that an electrode protective layer (dielectric layer) can be simultaneously formed. Specifically, not only is the glass paste for partition wall formation filled in the grooves of the intaglio 11 by doctor blade coating, roll pressing, flat pressing, screen printing, roll coating, etc., but also a layer of uniform thickness is formed on the plate. To do. Thereby, an electrode protection layer is simultaneously formed on the top of the intaglio.

If the thickness of the electrode protection layer is too small, the electrode portion is exposed, and the role of the electrode protection layer is not fulfilled. If the thickness is too large, cracks or cracks are caused during firing of the substrate.

Further, in order to obtain a sufficient reflectance, the thickness of the electrode protective layer needs to be 5 μm or more. On the other hand, when the thickness is 50 μm or more, there is a possibility that an address voltage may be increased or an accurate address may not be obtained. For the above reasons, the thickness of the electrode protective layer is preferably 5 to 50 μm. However, considering the lowering of the address voltage, the operating voltage of the drive circuit as much as possible, and the reduction in the cost of the dielectric, the thickness is preferably 20 μm or less. More preferred.

Next, after the intaglio plate is filled with the glass paste for forming partition walls, it is positioned and transferred to a glass substrate on which an electrode pattern has been previously formed. At this time, there is a method of transferring the glass paste for forming the partition wall to the glass substrate after curing the paste, and a method of contacting the glass paste with the glass substrate being uncured, and curing the glass paste for forming the partition wall in that state. Can be selected. In the former transfer method, an adhesive or a pressure-sensitive adhesive is required between the glass paste for forming the partition walls and the glass substrate. In the latter transfer method, an adhesive or a pressure-sensitive adhesive is not required for curing on a glass substrate, but an adhesive or a pressure-sensitive adhesive may be used to improve the strength.

Then, the glass substrate to which the partition walls have been transferred is baked, the organic components are eliminated, and the glass components are baked and hardened, thereby forming the back plate of the plasma display panel having the inorganic partition walls and the electrode protection layer.

Next, an embodiment of the whole plasma display panel including both the rear substrate and the front substrate will be described.

As the front substrate of the plasma display panel, a known front substrate as the front substrate of the plasma display panel at present can be employed. Further, as a method of manufacturing a plasma display of the present invention,
At present, a known method (sealing the front substrate and the rear substrate to form a discharge space, exhausting the gas, and then sealing the discharge gas) can be used.

[0061]

The present invention will be described below with reference to specific examples. Note that the present invention is not limited to the embodiments described below.

<Examples 1 to 4> Four types of two types of crystalline glass frit and two types of non-crystalline glass frit used in this example are shown below. (1) Low softening point type crystalline glass frit PbO-ZnO-B ₂ O ₃ system, softening point 380 ° C, crystallization temperature 430 ° C (2) High softening point type crystalline glass frit PbO-ZnO-SiO ₂ -B ₂ O ₃ system, softening point 500
° C, crystallization temperature 570 ° C (3) Low softening point type amorphous glass frit PbO-B ₂ O ₃ -SiO ₂ system, softening point 450 ° C (4) High softening point type amorphous glass frit PbO-B ₂ O ₃ —SiO ₂ system, softening point 520 ° C. The softening point and crystallization temperature were measured by DTA.

Next, the glass frit, the low expansion filler, the coloring pigment, and the organic component were kneaded with a three-roll mill to form a paste. In this embodiment, the partition wall is formed by a screen printing method and a transfer method. Therefore,
Two types of pastes for screen printing and transfer were prepared. Using these pastes, two types of substrates having a lattice partition pattern or meander partition walls on a 10 cm square soda lime glass substrate were prepared. The shape of the lattice type partition pattern is such that the partition width is 60 μm, the pitch is 270 μm in the stripe direction, and the pitch in the vertical direction is 810 μm. On the other hand, the meander partition has a partition width of 70 μm and a sub-pixel pitch of 360 μm.

The method of forming the partition walls by the screen printing method is described below. The paste composition for screen printing is as shown below. The four types of glass frit (1) to (4) are used, and the compounding ratio is
It is shown in Table 1.

Using the prepared paste, screen printing and thermal drying at 120 ° C. for 15 minutes were repeated 8 to 12 times to form a 170 μm-high partition wall.
This was fired at a maximum firing temperature of 580 ° C. to form a partition.

Next, a method of forming a partition by the transfer method will be described below. The paste composition by the transfer method is as follows. This paste has photosensitivity and has a function of curing the paste by ultraviolet rays. The four types of glass frit (1) to (4) are used, and the mixing ratio is shown in Table 1. Glass frit 62 parts by weight Lead titanate 11 parts by weight Titania 7 parts by weight Diethylene glycol dimethacrylate 9 parts by weight 2-hydroxypropyl acrylate 6 parts by weight Benzophenone 1 part by weight Butyl carbitol acetate 4 parts by weight

The prepared paste was embedded in a silicone rubber intaglio having a depth of 170 μm by blade coating, and irradiated with ultraviolet rays at 2000 mJ / cm ² . Next, an intaglio filled with a partition wall forming material was positioned and applied to a glass substrate coated entirely with an acrylic resin-based pressure-sensitive adhesive with a thickness of 5 μm as a pressure-sensitive adhesive, and flat-pressed at a pressure of 0.5 MPa. . Thereafter, the intaglio plate was peeled off and baked at a maximum baking temperature of 580 ° C. to obtain a substrate having partition walls.

With respect to the substrate having the partition walls thus produced, the tightness and the shape stability were evaluated. The tightness was evaluated by observing a cross-sectional image of the partition, processing the image, and measuring the porosity. Here, when the porosity was 20% or less, the denseness was evaluated as good (○). In the case of the lattice type structure shown in FIG. 2, the shape stability was evaluated by confirming the occurrence of cuts and cracks (X when there was a cut or crack, and ○ when there was no cut or crack). With respect to the meander partition shown in FIG. 3, the evaluation of cuts and cracks and the increase in the width of the portion where the interval between the partitions is closest (b in FIG. 3)
(Portion indicated by) was measured to evaluate the shape stability. When the spread of this portion was within 20% before firing, the shape stability was evaluated as good.

Table 1 shows the mixing ratio of the glass frit used in Examples 1 to 4 and Comparative Examples 1 to 8 and the method of preparing the partition walls.
And its evaluation results. As is clear from Table 1, in the examples of the substrate of the present invention, both compactness and shape stability are excellent.

<Embodiment 5> An example in which the back substrate (meander partition) of the plasma display panel manufactured in Embodiment 1 and the front substrate are integrated to form the entire panel will be described. A display electrode is formed as a first electrode on the front glass substrate by using a screen printing method. Next, a dielectric glass layer is formed on the display electrode by screen printing.
Magnesium oxide is formed as a protective layer on this dielectric glass layer by sputtering to a thickness of 0.5 μm to form a front substrate.

Next, the back substrate prepared in Example 1 was prepared, and phosphor layers of three colors R, G, and B were formed between adjacent ribs. After discharging, a discharge space was formed and exhausted, a discharge gas was sealed to complete the panel as a whole (FIG. 4). Since there was no distortion of the partition walls, the adhesion at the time of sealing was good.

[0072]

[Table 1]

[0073]

According to the present invention, the rear substrate of the plasma display panel can improve the shape of the partition walls, such as cuts, cracks, twists, and edge breaks, which are generated when the partition walls are complicated in shape. be able to. Further, since the produced partition walls are dense, it is possible to perform gas replacement in a short time in the vacuum evacuation step of the plasma display panel. As described above, it is possible to provide a back substrate of a plasma display panel having partition walls having both shape stability and tightness. Further, it is possible to provide the entire plasma display panel in which the above-mentioned rear substrate and front substrate are bonded. Further, it is possible to provide a glass paste composition for forming a partition of a plasma display, which is necessary for forming a partition having the above characteristics. In addition, the present invention can be applied to not only a plasma display panel but also a plasma liquid crystal display (PALC), which requires a partition.

[Brief description of the drawings]

FIG. 1 is an example of forming a partition having a stripe structure.

FIG. 2 is an example of formation of a partition having a lattice structure.

FIG. 3 is an example of the formation of meandering partitions.

FIG. 4 is a sectional view of a plasma display panel including a front substrate and a rear substrate.

 ──────────────────────────────────────────────────続 き Continuation of front page (72) Inventor Naoto Ohno 1-5-1, Taito, Taito-ku, Tokyo Letterpress Printing Co., Ltd. F-term (reference) 2H025 AA03 AA10 AB14 AB17 AC01 AD01 BC13 BC42 CA00 CB04 CC08 FA29 4G062 AA09 BB01 DA02 DB02 DC02 DD02 DE02 DF02 EA02 EB01 EC01 ED01 EE02 EF01 EG02 FA01 FB02 FC01 FD01 FE02 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HHH HH HH HH HH HH HH HH HH HH HH HH HH KK07 KK10 MM08 MM27 NN33 NN40 PP01 PP02 PP03 PP05 PP06 PP09 PP11 5C027 AA09 5C040 FA10 GF18 JA19 JA20 KA08 KB08

Claims (15)

[Claims] 1. A glass paste composition for forming a partition wall of a plasma display panel, wherein the glass paste composition contains both a crystalline glass frit and an amorphous glass frit, and the softening point of the crystalline glass frit is the amorphous glass frit. A glass paste composition for forming partition walls of a plasma display panel, which is lower than a softening point of a frit. 2. The glass paste composition according to claim 1, wherein a crystallization temperature of the crystalline glass frit is lower than a softening point of the amorphous glass frit. 3. The plasma display according to claim 1, wherein the content by weight of the crystalline glass frit is 0.3 to 4 times the content by weight of the non-crystalline glass frit. A glass paste composition for forming a partition wall of a panel. 4. A glass paste composition for forming a partition wall of a plasma display panel, comprising at least two types of crystalline glass frit, wherein one of the crystalline glass frit has a softening point and another has a softening point. The softening point of the crystallized glass has a difference of 20 ° C. or more, or the crystallization temperature of one kind of crystalline glass frit and the crystallization temperature of another kind of crystalline glass frit are 20 ° C. A paste composition for forming a partition wall of a plasma display panel, characterized by having the above difference. 5. A glass paste composition for forming partition walls of a plasma display panel, wherein at least two or more types of crystalline glass frit are contained, and one of them is used.
A glass paste composition for forming partition walls of a plasma display panel, wherein another type of crystalline glass frit has a higher softening point than the crystallization temperature of another type of crystalline glass frit. 6. A rear substrate of a plasma display, wherein the partition walls are formed from at least both a crystalline glass frit and an amorphous glass frit,
A back substrate for a plasma display panel, wherein the softening point of the crystalline glass frit is lower than the softening point of the amorphous glass frit. 7. The rear substrate of a plasma display panel according to claim 6, wherein a crystallization temperature of the crystalline glass frit is lower than a softening point of the amorphous glass frit. 8. The plasma display according to claim 6, wherein the content of the crystalline glass frit is 0.3 to 4 times the weight of the amorphous glass frit. The back substrate of the panel. 9. The rear substrate of a plasma display panel, wherein the partition walls are formed of at least two types of crystalline glass frit, one of which has a softening point and another has a softening point. The softening point of one type of crystallized glass has a difference of 20 ° C. or more, or the crystallization temperature of one type of crystalline glass frit and the crystallization temperature of another type of crystalline glass frit are different. A back substrate for a plasma display panel, characterized by a difference of 20 ° C. or more. 10. A back substrate of a plasma display panel, wherein the partition walls are formed of at least two types of crystalline glass frit, and the crystallization temperature of one of the types of crystalline glass frit is determined by the following formula. A rear substrate of a plasma display panel, wherein another type of crystalline glass frit has a high softening point. 11. The rear substrate of a plasma display panel according to claim 6, wherein said partition is of a lattice type or meander type. 12. A method of manufacturing a rear substrate of a plasma display panel, wherein the glass paste composition for forming a partition of a plasma display panel according to any one of claims 1 to 5 is filled in an intaglio plate and transferred to form a partition. A method for manufacturing a rear substrate of a plasma display panel, comprising: 13. The method according to claim 12, wherein the partition is a lattice type or a meander type. 14. A plasma display panel comprising a front substrate and a rear substrate.
A plasma display panel characterized by being produced by bonding a back substrate and a front substrate of the plasma display panel according to any one of the above. 15. A method for manufacturing a plasma display panel comprising a front substrate and a rear substrate, wherein the rear substrate is manufactured by the method for manufacturing a rear substrate of a plasma display panel according to claim 12. A method for manufacturing a plasma display panel, which is manufactured by bonding a front substrate.