JP2001323354A - Rolled copper foil and manufacturing method thereof - Google Patents
Rolled copper foil and manufacturing method thereofInfo
- Publication number
- JP2001323354A JP2001323354A JP2000090579A JP2000090579A JP2001323354A JP 2001323354 A JP2001323354 A JP 2001323354A JP 2000090579 A JP2000090579 A JP 2000090579A JP 2000090579 A JP2000090579 A JP 2000090579A JP 2001323354 A JP2001323354 A JP 2001323354A
- Authority
- JP
- Japan
- Prior art keywords
- rolled
- copper foil
- annealing
- rolling
- ray diffraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 71
- 239000011889 copper foil Substances 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 238000000137 annealing Methods 0.000 claims abstract description 51
- 238000005096 rolling process Methods 0.000 claims abstract description 44
- 229910052802 copper Inorganic materials 0.000 claims abstract description 23
- 239000010949 copper Substances 0.000 claims abstract description 23
- 238000001953 recrystallisation Methods 0.000 claims abstract description 22
- 238000002441 X-ray diffraction Methods 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000005097 cold rolling Methods 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000011161 development Methods 0.000 description 11
- 230000018109 developmental process Effects 0.000 description 11
- 238000005452 bending Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000005275 alloying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 102220253765 rs141230910 Human genes 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000025366 tissue development Effects 0.000 description 1
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Metal Rolling (AREA)
Abstract
(57)【要約】
【課題】本発明の課題は,再結晶焼鈍を行った際に,立
方体集合組織が著しく発達する圧延銅箔の製造方法を提
供すること。
【解決手段】タフピッチ銅または無酸素銅のインゴット
を熱間圧延した後,冷間圧延と焼鈍とを繰り返し,最後
に冷間圧延で所定の厚さに仕上げる銅箔の製造プロセス
において,(1)最終冷間圧延の直前の焼鈍を,この
焼鈍で得られる再結晶粒の平均粒径が30μm以下とな
り,さらにこの焼鈍後の材料の圧延面においてX線回
折で測定した(200),(220),(311)および(111)面の回折
強度が,
3≦ I (200) /I0 (200) ≦10, I (220)/I0 (220) ≦
1,I (311)/I0 (311) ≦1, I (111)/I0 (111) ≦1
(I(hkl):圧延面で測定した(hkl)面のX線回折積分強
度,I0 (hkl): 微粉末銅で測定した(hkl)面のX線回折
積分強度 )の関係を満たす条件で行ない,次いで,
(2)次の最終冷間圧延での圧延加工度を93 %以上とす
ることを特徴とする再結晶焼鈍後に立方体集合組織が著
しく発達する圧延銅箔の製造方法。
(57) [Summary] An object of the present invention is to provide a method for producing a rolled copper foil in which a cubic texture is remarkably developed when recrystallization annealing is performed. In a process for producing a copper foil, a tough pitch copper or oxygen-free copper ingot is hot-rolled, then cold-rolled and annealed repeatedly, and finally cold-rolled to a predetermined thickness. The annealing immediately before the final cold rolling was measured by X-ray diffraction on the rolled surface of the material after the annealing, when the average grain size of the recrystallized grains obtained by this annealing was 30 μm or less (200), (220) , (311) and the diffraction intensity of the (111) plane, 3 ≦ I (200) / I 0 (200) ≦ 10, I (220) / I 0 (220) ≦
1, I (311) / I 0 (311) ≦ 1, I (111) / I 0 (111) ≦ 1 (I (hkl): X -ray diffraction integrated intensity of the measured rolling surface (hkl) plane, I 0 (hkl) : X-ray diffraction integrated intensity of the (hkl) plane measured with fine powdered copper).
(2) A method for producing a rolled copper foil in which a cubic texture is remarkably developed after recrystallization annealing, wherein a rolling degree in the next final cold rolling is 93% or more.
Description
【0001】[0001]
【産業上の利用分野】本発明は,再結晶焼鈍を行った際
に,立方体集合組織が著しく発達する圧延銅箔の製造方
法に関する。この銅箔は,高い屈曲性が要求されるフレ
キシブルプリント回路基板(Flexible printed circui
t)等の可撓性配線部材の用途として好適である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a rolled copper foil in which a cubic texture is remarkably developed when recrystallization annealing is performed. This copper foil is used for flexible printed circuit boards (Flexible printed circuit boards) that require high flexibility.
It is suitable for use in flexible wiring members such as t).
【0002】[0002]
【従来の技術】圧延加工で製造した銅板あるいは銅箔を
再結晶焼鈍すると,立方体集合組織((100)[001]方
位)が発達する。立方体集合組織は,銅の諸特性に様々
な影響を及ぼす。立方体集合組織が発達した場合の利点
として,低歪み/高サイクルの疲労特性(疲労寿命が10
4回以上)が向上することがあげられる。この観点か
ら,特許第3009383号では,立方体集合組織を発達させ
た銅箔を,屈曲疲労特性が要求されるフレキシブルプリ
ント回路基板(Flexible printed circuit,以下FPCと
する)の素材に適用している。また,立方体集合組織を
発達させる方策として,最終圧延での加工度を90 %以
上とし,最終圧延前の焼鈍で得られる再結晶粒径を5
〜20μmに調整することを提唱している。2. Description of the Related Art When a copper plate or copper foil manufactured by rolling is recrystallized and annealed, a cubic texture ((100) [001] orientation) is developed. Cubic texture has various effects on the properties of copper. The advantages of the cubic texture development include low strain / high cycle fatigue properties (10% fatigue life).
4 times or more). From this point of view, Patent No. 3009383 uses a copper foil having a developed cubic texture as a material for a flexible printed circuit (FPC), which requires bending fatigue characteristics. As a measure to develop the cubic texture, the workability in the final rolling should be 90% or more, and the recrystallized grain size obtained by annealing before the final rolling should be 5%.
It is proposed to adjust to ~ 20 μm.
【0003】ところが昨今,立方体集合組織を従来以上
に発達させることができる製造プロセスが望まれるよう
になった。例えば,FPC用の銅箔に関していえば,装
置の小型化に伴い,FPCに与えられる屈曲変形がより厳
しくなり,銅箔により優れた屈曲寿命が要求されるよう
になったこと,FPCに用いられる銅箔の厚みは,従来3
5μmが主流であったが,近年18μm,12μm,9μmと薄い
ものが用いられるようになった。銅箔が薄くなると,銅
箔を同じプロセスで製造しても,立方体集合組織の発達
度が低下すること,等がその背景としてあげられる。However, recently, there has been a demand for a manufacturing process capable of further developing a cubic texture. For example, in the case of copper foil for FPC, with the miniaturization of the equipment, the bending deformation given to the FPC became more severe, and a superior flex life was required for the copper foil. The thickness of copper foil is 3
The mainstream was 5 μm, but recently thinner ones of 18 μm, 12 μm, and 9 μm have been used. As the copper foil becomes thinner, even if the copper foil is manufactured by the same process, the development degree of the cubic texture is reduced.
【0004】[0004]
【発明が解決しようとする課題】本発明は,再結晶焼鈍
を行った際に,立方体集合組織が著しく発達する圧延銅
箔の製造方法を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a rolled copper foil in which a cubic texture is remarkably developed when recrystallization annealing is performed.
【0005】[0005]
【課題を改善するための手段】本発明者は,極度に発達
した立方体集合組織が安定して得られる製造プロセスに
ついて鋭意研究を行った。この研究では,最終圧延加工
度を93%以上とし,最終圧延前の組織(最終圧延前の焼
鈍で得られる再結晶組織)が立方体集合組織の発達に及
ぼす影響を検討した。その結果,最終圧延前の再結晶組
織において立方体集合組織を発達させた方が,その後圧
延し再結晶焼鈍したときに,より発達した立方体集合組
織が得られることを見出した。The present inventor has conducted intensive studies on a manufacturing process capable of stably obtaining an extremely developed cubic texture. In this study, the final rolling degree was set to 93% or more, and the effect of the structure before final rolling (recrystallized structure obtained by annealing before final rolling) on the development of cubic texture was examined. As a result, it was found that developing a cubic texture in the recrystallized structure before the final rolling resulted in a more developed cubic texture when rolling and annealing for recrystallization.
【0006】これは,立方体集合組織が発達した銅を圧
延すると,圧延後の加工組織のなかに立方体方位の帯状
組織が高い頻度で形成され,その後焼鈍したときにこの
帯状組織を起点として先鋭化した立方体集合組織が形成
されるためであると推測した(福富洋志, 上城太一: 軽
金属,Vol.47,No.2,pp.123-130)。なお,銅箔の立方
体集合組織を発達させるためには,最終圧延前の結晶粒
径が小さい方が好ましいということは従来より知られて
いたが(特許第3009383号),最終圧延前の立方体集合
組織の発達度が重要な影響を及ぼすことは新たな知見で
あった。[0006] This is because, when copper having a developed cubic texture is rolled, a band structure having a cubic orientation is formed at a high frequency in the worked structure after rolling, and when the copper is annealed, the band structure is sharpened starting from the band structure. It was speculated that this was due to the formation of a cubic texture (Yoshi Fukutomi, Taichi Kamishiro: Light Metal, Vol. 47, No. 2, pp. 123-130). It has been known that the crystal grain size before the final rolling is preferably smaller in order to develop the cube texture of the copper foil (Japanese Patent No. 3009383). It is a new finding that the degree of tissue development has a significant effect.
【0007】本発明は上記知見を基にして完成されたも
ので,再結晶焼鈍を行った際に立方体集合組織が著しく
発達する圧延銅箔の製造方法を最適化した。即ち,発明
1として,タフピッチ銅または無酸素銅のインゴットを
熱間圧延した後,冷間圧延と焼鈍とを繰り返し,最後に
冷間圧延で所定の厚さに仕上げる圧延銅箔の製造プロセ
スにおいて,(1)最終冷間圧延の直前の焼鈍を,こ
の焼鈍で得られる再結晶粒の平均粒径が30μm以下とな
り,さらにこの焼鈍後の材料の圧延面においてX線回
折で測定した(200),(220),(311)および(111)面の回折
強度が, 3≦ I (200) /I0 (200) ≦10, I (220)/I0 (220) ≦
1,I (311)/I0 (311) ≦1, I (111)/I0 (111) ≦1 (I(hkl):圧延面で測定した(hkl)面のX線回折積分強
度,I0 (hkl): 微粉末銅で測定した(hkl)面のX線回折
積分強度)の関係を満たす条件で行ない,次いで,
(2)次の最終冷間圧延での圧延加工度を93 %以上とす
ることを特徴とする再結晶焼鈍後に立方体集合組織が著
しく発達する圧延銅箔の製造方法。The present invention has been completed based on the above findings, and has optimized a method for producing a rolled copper foil in which a cubic texture is remarkably developed when recrystallization annealing is performed. That is, as a first invention, in a manufacturing process of a rolled copper foil in which tough pitch copper or oxygen-free copper ingot is hot-rolled, then cold rolling and annealing are repeated, and finally finished to a predetermined thickness by cold rolling. (1) The annealing immediately before the final cold rolling was measured by X-ray diffraction on the rolled surface of the material after the annealing when the average grain size of the recrystallized grains obtained by this annealing was 30 μm or less (200), (220), (311) and the diffraction intensity of the (111) plane, 3 ≦ I (200) / I 0 (200) ≦ 10, I (220) / I 0 (220) ≦
1, I (311) / I 0 (311) ≦ 1, I (111) / I 0 (111) ≦ 1 (I (hkl): X -ray diffraction integrated intensity of the measured rolling surface (hkl) plane, I 0 (hkl) : X-ray diffraction integrated intensity of the (hkl) plane measured with fine powdered copper).
(2) A method for producing a rolled copper foil in which a cubic texture is remarkably developed after recrystallization annealing, wherein a rolling degree in the next final cold rolling is 93% or more.
【0008】発明2として,最終冷間圧延後に施される
再結晶焼鈍の後に圧延面でのX線回折で求めた200面の積
分強度(I (200) )が,微粉末銅のX線回折で求めた200
面の積分強度(I0 (200) )に対し,I (200) /I0
(200) ≧40となることを特徴とする発明1の方法で製造
された,厚みが18μm以下の圧延銅箔。発明3として,
フレキシブルプリント回路基板用素材であることを特徴
とする発明1の方法で製造された圧延銅箔。According to a second aspect of the present invention, the integrated intensity (I (200) ) of 200 planes determined by X-ray diffraction on the rolled surface after recrystallization annealing performed after the final cold rolling is determined by the X-ray diffraction of fine copper powder. Determined by 200
For the integrated intensity of the surface (I 0 (200) ), I (200) / I 0
(200) A rolled copper foil having a thickness of 18 μm or less, produced by the method of Invention 1, wherein ≧ 40. As invention 3,
A rolled copper foil manufactured by the method of Invention 1, which is a material for a flexible printed circuit board.
【0009】本発明は厚みが18μm以下の銅箔に対して
有効である。これは,上述したように銅箔が薄くなると
立方体集合組織の発達度が低下し,特に厚みが18μm以
下となると,従来のプロセス(特許第3009383号)では
立方体集合組織を所望のレベルまで発達させることが困
難になるためである。上記方法を採用すると,厚さが18
μm以下の銅箔においても,再結晶焼鈍後に,I (200)/
I0 (200) ≧40のレベルの立方体集合組織を安定して得
ることができる。また,再結晶焼鈍後に立方体集合組織
が著しく発達する圧延銅箔は,フレキシブルプリント回
路基板用素材として特に好適である。The present invention is effective for a copper foil having a thickness of 18 μm or less. This is because, as described above, when the copper foil becomes thinner, the degree of development of the cubic texture decreases, and particularly when the thickness becomes 18 μm or less, the conventional process (Patent No. 3009383) develops the cubic texture to a desired level. This is because it becomes difficult. If the above method is adopted, the thickness becomes 18
Even for copper foils of μm or less, after recrystallization annealing, I (200) /
A cubic texture of I 0 (200) ≧ 40 can be stably obtained. A rolled copper foil in which a cubic texture is remarkably developed after recrystallization annealing is particularly suitable as a material for a flexible printed circuit board.
【0010】[0010]
【発明の実施の形態】次に本発明において圧延銅箔の製
造工程を規定した理由を以下に述べる。 (1)銅箔の素材:本発明は焼鈍の際に立方体集合組織
を発達させることを主旨とするため,再結晶集合組織が
立方体方位となる銅,すなわちタフピッチ銅(酸素濃度
100〜500 wt ppm)および無酸素銅(酸素濃度10 wt ppm
以下)が素材の対象となる。一方,多量の合金元素を含
有する銅は,合金元素の作用により立方体方位の発達が
阻害されるため,素材として適当ではない。ただし,DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the reason for defining the production process of rolled copper foil in the present invention will be described below. (1) Copper foil material : Since the present invention aims to develop a cubic texture during annealing, copper whose recrystallization texture has a cubic orientation, that is, tough pitch copper (oxygen concentration
100-500 wt ppm) and oxygen-free copper (oxygen concentration 10 wt ppm)
Below) is the target of the material. On the other hand, copper containing a large amount of alloying elements is not suitable as a raw material because the action of alloying elements hinders the development of cubic orientation. However,
【0011】常温保管時の軟化を防止するため,微量
のAg等を添加して軟化温度を適度な範囲に調整したタフ
ピッチ銅(特願平11−9437) 軟化温度を低下させることを目的とし,少量の合金元
素を添加した無酸素銅(特許第1582981号,特開昭60-17
040,特公昭62−47936,特許第1849316号,特開昭63−1
40052,特開昭63-45339,特開平1−319640,特許第2737
954号) 不純物量を調整することにより軟化温度を適度な範囲
に調整した無酸素銅(特開平1−319641,特開平1−1193
2,特願平11−9332) などの素材であれば用いることができる。これは,合金
元素を含有しても,微量な濃度範囲(トータルで0.1 wt
%以下)であれば,立方体集合組織の発達を阻害しない
ためである。[0011] To prevent softening during storage at room temperature, tough pitch copper (Japanese Patent Application No. 11-9437) in which a small amount of Ag or the like is added to adjust the softening temperature to an appropriate range. Oxygen-free copper containing a small amount of alloying elements (Japanese Patent No. 1582981,
040, Japanese Patent Publication No. 62-47936, Patent No. 1849316, JP-A-63-1
40052, JP-A-63-45339, JP-A-1-319640, Patent No. 2737
954) Oxygen-free copper whose softening temperature is adjusted to an appropriate range by adjusting the amount of impurities (JP-A-1-319641, JP-A-1-19393)
2, materials such as Japanese Patent Application No. 11-9332) can be used. This means that even if the alloy element is contained, it is in a very small concentration range (0.1 wt.
% Or less) does not hinder the development of cubic texture.
【0012】(2)最終圧延加工度:加工度を93 %以上
とした理由は,加工度が93 %未満であると,圧延前の焼
鈍条件を調整しても,圧延後の焼鈍において立方体集合
組織が所望のレベルまで発達しないためである。 (3)最終圧延前の焼鈍で得られる結晶粒径:再結晶粒
の平均粒径が30μm以下とした理由は,結晶粒径が30μm
を超えると,圧延前の結晶方位を制御し最終圧延加工度
を93%以上としても,圧延後の焼鈍において立方体集合
組織が所望のレベルまで発達しないためである。なお,
同様の観点から特許第3009383号では再結晶粒の平均粒
径を20μm以下に規定しているが,下記に述べるように
立方体集合組織の発達度を調整すれば30μmの平均粒径
まで許容できた。(2) Final rolling work ratio: The reason for setting the work ratio to 93% or more is that if the work ratio is less than 93%, even if the annealing conditions before rolling are adjusted, cubic aggregates will not be formed even after annealing. This is because the tissue does not develop to the desired level. (3) Grain size obtained by annealing before final rolling : The reason that the average grain size of recrystallized grains is 30 μm or less is that the crystal grain size is 30 μm.
Is exceeded, the cubic texture does not develop to the desired level in annealing after rolling, even if the crystal orientation before rolling is controlled and the final rolling degree is 93% or more. In addition,
From the same point of view, Patent No. 3009383 specifies the average grain size of recrystallized grains to be 20 μm or less, but if the degree of development of cubic texture is adjusted as described below, an average grain size of 30 μm can be tolerated .
【0013】(4)最終圧延前の焼鈍で得られる立方体
集合組織の発達度:I (200)/I0 (2 00)値を3以上に規定
した理由は,この値が3以上になると圧延後の焼鈍にお
いて立方体集合組織が顕著に発達するためである。一
方,I (200)/I0 (200)値が10を超えると,再結晶粒が
異常成長して平均粒径が30μmを超え,圧延後の焼鈍に
おける立方体集合組織の発達度が却って低下するためで
ある。 I (220)/I0 (22 0),I (311)/I0 (311) および
I (111)/I0 (111) の各値を,1以下に規定した理由
は,これら値が1を超えると,圧延後の焼鈍における立
方体集合組織が発達度が低下するためである。以上のよ
うなI/I0値は,その前の圧延加工度ならびにその前の
焼鈍条件を調整することによって得ることができる。す
なわち,圧延加工度を大きくし焼鈍での結晶粒径を小さ
くすることで,I (200)/I0 (200)を上げ,I (220)/I0
(220),I (311)/I0 (311) およびI (111)/I0 (111)
を下げることができる。また,(3)(4)で規定した
再結晶焼鈍を,熱間圧延で兼ねることも可能である。(4) Cube obtained by annealing before final rolling
Development of the texture: I (200) / I 0 (2 00) The reason for defining a value to 3 or more, cubic texture in annealing after rolling and the value reaches 3 or higher is to develop significantly . On the other hand, if the value of I (200) / I0 (200) exceeds 10, the recrystallized grains grow abnormally and the average grain size exceeds 30μm, and the development of cubic texture during annealing after rolling decreases rather That's why. I (220) / I 0 ( 22 0), I (311) / I 0 (311) and
The reason that each value of I (111) / I 0 (111) is specified to be 1 or less is that when these values exceed 1, the cubic texture in annealing after rolling decreases in the degree of development. The I / I 0 value as described above can be obtained by adjusting the previous rolling degree and the preceding annealing conditions. That is, I (200) / I 0 (200) is increased by increasing the rolling degree and reducing the crystal grain size during annealing, and I (220) / I 0
(220) , I (311) / I 0 (311) and I (111) / I 0 (111)
Can be lowered. In addition, the recrystallization annealing specified in (3) and (4) can also be performed by hot rolling.
【0014】[0014]
【実施例】以下に本発明を実施例に基づき説明する。実
験の素材として,種々の結晶粒径および結晶方位を有す
る,厚さt0 mm,幅600 mmの再結晶焼鈍後のタフピッチ
銅板(酸素含有量250 ppm)または無酸素銅板(酸素含
有量2 ppm)を用いた。この銅板を厚さt mmまで冷間圧
延した後,焼鈍して再結晶させた。ここで,冷間圧延で
の加工度dは, d = (t0−t) / t0 × 100 (%) (ここでt0は冷間圧延前
の厚さ) で与えられる。なお,圧延後の銅箔を再結晶させるため
の焼鈍は,試料を半軟化温度より70℃高い温度で30分間
加熱することによって実施した。ここで,半軟化温度と
は,焼鈍後の引張り強さが,圧延上がりの引張り強さと
完全に軟化した後の引張り強さとの中間の値になるとき
の焼鈍温度であり,焼鈍時間を30分間としてこの温度を
最初に測定した。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments. The tough pitch copper plate (oxygen content 250 ppm) or oxygen-free copper plate (oxygen content 2 ppm) after recrystallization annealing with a thickness of t 0 mm and a width of 600 mm and having various crystal grain sizes and crystal orientations was used as a test material. ) Was used. After cold rolling this copper plate to a thickness of t mm, it was annealed and recrystallized. Here, the working ratio d in the cold rolling, is given by d = (t 0 -t) / t 0 × 100 (%) ( where t 0 is the thickness of the before cold rolling). The annealing for recrystallizing the rolled copper foil was performed by heating the sample at a temperature 70 ° C. higher than the half-softening temperature for 30 minutes. Here, the semi-softening temperature is the annealing temperature at which the tensile strength after annealing has an intermediate value between the tensile strength after rolling and the tensile strength after complete softening, and the annealing time is 30 minutes. This temperature was measured first.
【0015】圧延前の銅箔の結晶粒径を,圧延方向に直
角な断面において切断法(JISH0501)で測定した。ま
た,圧延前の銅箔および圧延後に再結晶焼鈍した後の銅
箔について,X線回折を行なった。さらに,本発明の銅
箔がFPC用素材として用いられることを想定し屈曲寿命
を評価した。X線回折および屈曲試験の方法の詳細を以
下に示す。The grain size of the copper foil before rolling was measured by a cutting method (JISH0501) at a cross section perpendicular to the rolling direction. X-ray diffraction was performed on the copper foil before rolling and the copper foil after recrystallization annealing after rolling. Furthermore, the bending life was evaluated on the assumption that the copper foil of the present invention was used as a material for FPC. The details of the X-ray diffraction and bending test methods are shown below.
【0016】(1)X線回折 X線回折により圧延面における(200),(220),(311)お
よび(111)の各面のX線強度を求めた。この値をあらかじ
め測定しておいた微粉末銅での各面の積分強度で割り,
I (200)/I0 (200),I (220)/I0 (220),I (311)/I0
(311) およびI (111)/I0 (111) の値を求めた。X線回折
はCo管球を用いて行い,ピーク強度の積分値は,(20
0):2θ=57〜63°,(220):2θ=86〜91°,(311):2
θ=107〜113°,(111):2θ=47〜55°(θは回折角
度)の範囲で測定した。(1) X-ray diffraction By X-ray diffraction, (200), (220), (311) and
The X-ray intensity of each surface of (111) and (111) was determined. This value must be
Divided by the integrated intensity of each surface of fine copper powder
I(200)/ I0 (200), I(220)/ I0 (220), I(311)/ I0
(311) And I (111)/ I0 (111)Was determined. X-ray diffraction
Was performed using a Co tube, and the integrated value of the peak intensity was (20
0): 2θ = 57-63 °, (220): 2θ = 86-91 °, (311): 2
θ = 107-113 °, (111): 2θ = 47-55 ° (θ is the diffraction angle
Degree).
【0017】(2)屈曲試験 FPC用の銅箔として用いられることを想定し,上記条件
で試料を再結晶焼鈍した後,図1に示す装置により,屈
曲疲労寿命の測定を行った。この装置は,発振駆動体4
に振動伝達部材3を結合した構造になっており,被試験
銅箔1は,矢印で示したねじ2の部分と3の先端部の計
4点で装置に固定される。振動部3が上下に駆動する
と,銅箔1の中間部は,所定の曲率半径rでヘアピン状
に屈曲される。本試験では,以下の条件下で屈曲を繰り
返した時の破断までの回数を求めた。測定は同じ材料に
ついて5回行い,その平均値を求めた。試験片幅12.7 m
m,試験片長さ:200 mm,試験片採取方向:試験片の長
さ方向が圧延方向と平行になるように採取,曲率半径
r:2.5 mm,振動ストローク:25mm,振動速度:1500回
/分(2) Bending test Assuming that the sample was used as a copper foil for FPC, the sample was recrystallized and annealed under the above conditions, and then the bending fatigue life was measured by the apparatus shown in FIG. This device has an oscillation driver 4
The copper foil under test 1 is fixed to the apparatus at a total of four points: the screw 2 indicated by the arrow and the tip of the screw 3. When the vibrating part 3 is driven up and down, the middle part of the copper foil 1 is bent into a hairpin shape with a predetermined radius of curvature r. In this test, the number of times to break when bending was repeated under the following conditions was determined. The measurement was performed five times for the same material, and the average value was obtained. Specimen width 12.7 m
m, Specimen length: 200 mm, Specimen sampling direction: Sampling so that the longitudinal direction of the specimen is parallel to the rolling direction, radius of curvature
r: 2.5 mm, vibration stroke: 25 mm, vibration speed: 1500 times / minute
【0018】表1に評価した試料の加工履歴と特性を示
す。Table 1 shows the processing history and characteristics of the evaluated samples.
【0019】[0019]
【表1】 [Table 1]
【0020】本発明に関わる圧延銅箔は,圧延後の再結
晶焼鈍で,I (200)/I0 (200)≧40という著しく発達し
た立方体集合組織が得られている。一方,比較例のNo.1
は圧延前の焼鈍で得られるI (200)/I0 (200)値が3を下
回るため,また比較例のNo.2は圧延前の焼鈍で得られる
I (200)/I0 (200)値が10を超えたことにより再結晶粒
が異常成長して,その粒径が30μmを超えているため,
圧延後の再結晶焼鈍で得られるI (200)/I0 (200)値が
低下している。比較例のNo.3およびNo.4は,圧延前の焼
鈍で得られるI (220)/I0 (220)またはI (31 1)/I
0 (311)が1を超えているため,圧延後の再結晶焼鈍で得
られるI (200)/I0 (200)値が低下している。比較例のN
o.5は圧延加工度が93%を下回るため,また,比較例のN
o.6は圧延前の焼鈍で得られる結晶粒径が30μmを超える
ため,圧延後の再結晶焼鈍で得られるI (200)/I
0 (200)値が低下している。In the rolled copper foil according to the present invention, a remarkably developed cubic texture of I (200) / I0 (200) ≧ 40 is obtained by recrystallization annealing after rolling. On the other hand, No. 1 of the comparative example
Is because the I (200) / I 0 (200) value obtained by annealing before rolling is less than 3, and No. 2 of the comparative example is obtained by annealing before rolling.
When the value of I (200) / I0 (200) exceeds 10, recrystallized grains grow abnormally, and the grain size exceeds 30 μm.
The value of I (200) / I 0 (200) obtained by recrystallization annealing after rolling is reduced. No. 3 and No. 4 of the comparative examples were obtained from I (220) / I 0 (220) or I (31 1) / I obtained by annealing before rolling.
Since 0 (311) exceeds 1, the value of I (200) / I 0 (200) obtained by recrystallization annealing after rolling decreases. N in Comparative Example
In o.5, since the rolling degree is less than 93%,
In o.6, since the grain size obtained by annealing before rolling exceeds 30 μm, I (200) / I obtained by recrystallization annealing after rolling
0 (200) The value has dropped.
【0021】図2にI (200)/I0 (200)値と屈曲寿命との
関係を,データを銅箔の厚みで層別して示す。I (200)
/I0 (200)値が高くなると,屈曲寿命が長くなることが
わかる。なお,銅箔の厚みが薄くなると屈曲寿命が延び
ているが,曲げ部表面に与えられる歪みが小さくなるた
めである。FIG. 2 shows the relationship between the I (200) / I0 (200) value and the flex life, with the data stratified by the thickness of the copper foil. I (200)
It can be seen that the higher the / I 0 (200) value, the longer the flex life. Note that the thinner the copper foil, the longer the flex life, but the less the strain applied to the surface of the bent portion.
【0022】[0022]
【発明の効果】圧延銅箔が薄くなると立方体集合組織の
発達度が低下し,特に厚みが18μm以下となると,従来
のプロセスでは立方体集合組織を所望のレベルまで発達
させることが困難になるが本発明方法を採用すると,厚
さが18μm以下の銅箔においても,再結晶焼鈍後に,I
(200)/I0 (200) ≧40のレベルの立方体集合組織を安定
して得ることができる。また,再結晶焼鈍後に立方体集
合組織が著しく発達する圧延銅箔は,フレキシブルプリ
ント回路基板用素材として特に好適である。As the rolled copper foil becomes thinner, the degree of development of the cubic texture decreases. In particular, when the thickness becomes 18 μm or less, it becomes difficult to develop the cubic texture to a desired level by the conventional process. According to the method of the present invention, even when the thickness of the copper foil is 18 μm or less, the
(200) / I 0 (200) Cubic texture at a level of ≧ 40 can be stably obtained. A rolled copper foil in which a cubic texture is remarkably developed after recrystallization annealing is particularly suitable as a material for a flexible printed circuit board.
【図1】屈曲疲労寿命の測定を行うために使用した屈曲
試験の説明図である。FIG. 1 is an explanatory diagram of a bending test used for measuring a bending fatigue life.
【図2】圧延後再結晶した後のI(200)/Io(200)と屈
曲寿命の関係を示す図である。FIG. 2 is a diagram showing the relationship between I (200) / Io (200) after rolling and recrystallization and flex life.
1.銅箔 2.ねじ 3.振動伝達部材 4.発振駆動体 1. Copper foil 2. Screw 3. Vibration transmitting member 4. Oscillation driver
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22F 1/00 661 C22F 1/00 661A 685 685Z 694 694A ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C22F 1/00 661 C22F 1/00 661A 685 685Z 694 694A
Claims (3)
を熱間圧延した後,冷間圧延と焼鈍とを繰り返し,最後
に冷間圧延で所定の厚さに仕上げる銅箔の製造プロセス
において,(1)最終冷間圧延の直前の焼鈍を,この
焼鈍で得られる再結晶粒の平均粒径が30μm以下とな
り,さらにこの焼鈍後の材料の圧延面においてX線回
折で測定した(200),(220),(311)および(111)面の回折
強度が, 3≦ I (200) /I0 (200) ≦10, I (220)/I0 (220) ≦
1,I (311)/I0 (311) ≦1, I (111)/I0 (111) ≦1 (I(hkl):圧延面で測定した(hkl)面のX線回折積分強
度,I0(hkl) : 微粉末銅で測定した(hkl)面のX線回折
積分強度)の関係を満たす条件で行ない,次いで,
(2)次の最終冷間圧延での圧延加工度を93 %以上とす
ることを特徴とする再結晶焼鈍後に立方体集合組織が著
しく発達する圧延銅箔の製造方法。In a process for producing a copper foil, a tough pitch copper or oxygen-free copper ingot is hot-rolled, cold-rolled and annealed repeatedly, and finally cold-rolled to a predetermined thickness. ) The annealing immediately before the final cold rolling was measured by X-ray diffraction on the rolled surface of the material after this annealing, when the average grain size of the recrystallized grains obtained by this annealing was 30 μm or less (200), (220) ), (311) and (diffraction intensity of 111) plane is, 3 ≦ I (200) / I 0 (200) ≦ 10, I (220) / I 0 (220) ≦
1, I (311) / I 0 (311) ≦ 1, I (111) / I 0 (111) ≦ 1 (I (hkl): X -ray diffraction integrated intensity of the measured rolling surface (hkl) plane, I 0 (hkl) : X-ray diffraction integrated intensity of the (hkl) plane measured with fine powdered copper).
(2) A method for producing a rolled copper foil in which a cubic texture is remarkably developed after recrystallization annealing, wherein a rolling degree in the next final cold rolling is 93% or more.
に圧延面でのX線回折で求めた200面の積分強度(I
(200) )が,微粉末銅のX線回折で求めた200面の積分強
度(I0 (200) )に対し,I (200) /I0 (200) ≧40とな
ることを特徴とする,請求項1の方法で製造された,厚
みが18μm以下の圧延銅箔。2. An integrated intensity (I) of 200 planes determined by X-ray diffraction on a rolled surface after recrystallization annealing performed after final cold rolling.
(200) ) is characterized by I (200) / I 0 (200) ≧ 40 with respect to the integrated intensity (I 0 (200) ) of 200 planes obtained by X-ray diffraction of fine copper powder. A rolled copper foil having a thickness of 18 μm or less, produced by the method of claim 1.
ることを特徴とする,請求項1の方法で製造された圧延
銅箔。3. A rolled copper foil manufactured by the method of claim 1, wherein the rolled copper foil is a material for a flexible printed circuit board.
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|---|---|---|---|
| JP2000090579A JP3856616B2 (en) | 2000-03-06 | 2000-03-29 | Rolled copper foil and method for producing the same |
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|---|---|---|---|
| JP2000060973 | 2000-03-06 | ||
| JP2000-60973 | 2000-03-06 | ||
| JP2000090579A JP3856616B2 (en) | 2000-03-06 | 2000-03-29 | Rolled copper foil and method for producing the same |
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| Publication Number | Publication Date |
|---|---|
| JP2001323354A true JP2001323354A (en) | 2001-11-22 |
| JP3856616B2 JP3856616B2 (en) | 2006-12-13 |
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|---|---|---|---|
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