[go: up one dir, main page]

JP2001342499A - Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition - Google Patents

Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition

Info

Publication number
JP2001342499A
JP2001342499A JP2000164483A JP2000164483A JP2001342499A JP 2001342499 A JP2001342499 A JP 2001342499A JP 2000164483 A JP2000164483 A JP 2000164483A JP 2000164483 A JP2000164483 A JP 2000164483A JP 2001342499 A JP2001342499 A JP 2001342499A
Authority
JP
Japan
Prior art keywords
solvent
cleaning
boiling point
imidazolidinone
dimethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000164483A
Other languages
Japanese (ja)
Inventor
Tatsuro Amano
達郎 天野
Toshiyoshi Tojun
敏孔 戸潤
Hiroshi Wada
寛 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Neos Co Ltd
Mitsui and Co Ltd
Tokyo Electric Power Co Holdings Inc
Original Assignee
Tokyo Electric Power Co Inc
Neos Co Ltd
Mitsui and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electric Power Co Inc, Neos Co Ltd, Mitsui and Co Ltd filed Critical Tokyo Electric Power Co Inc
Priority to JP2000164483A priority Critical patent/JP2001342499A/en
Publication of JP2001342499A publication Critical patent/JP2001342499A/en
Pending legal-status Critical Current

Links

Landscapes

  • Fire-Extinguishing Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)

Abstract

(57)【要約】 【課題】ポリ塩化ビフェニール等のハロゲン化芳香族化
合物が付着した部材の洗浄において、洗浄性に優れ、且
つ該化合物の分解処理に影響の少ない洗浄剤組成物及び
洗浄処理方法の提供を目的とする。 【解決手段】沸点が、非プロトン性極性溶剤の沸点より
5℃以上離れ、且つ化学抽出分解法の反応温度より高い
沸点を有する飽和炭化水素系溶剤を含有することを特徴
とする、ハロゲン化芳香族化合物が付着した部材用の洗
浄剤組成物及び洗浄処理方法。
(57) [PROBLEMS] To provide a cleaning composition and a cleaning method which are excellent in cleaning performance and have little influence on decomposition treatment of a compound to which a halogenated aromatic compound such as polychlorinated biphenyl is adhered. The purpose is to provide. A halogenated fragrance characterized by containing a saturated hydrocarbon solvent having a boiling point separated from an aprotic polar solvent by 5 ° C. or more and having a boiling point higher than the reaction temperature of the chemical extraction decomposition method. CLEANING COMPOSITION FOR MEMBERS WITH GROUP COMPOUNDS AFFECTED AND CLEANING METHOD

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ポリ塩化ビフェニ
ール(以降、PCBと略す)等のハロゲン化芳香族化合
物が付着したトランス,コンデンサ等の部材用の洗浄剤
組成物及び処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning composition for a member such as a transformer and a capacitor to which a halogenated aromatic compound such as polychlorinated biphenyl (hereinafter abbreviated as "PCB") is adhered and a treatment method.

【0002】[0002]

【従来の技術】PCB等のハロゲン化芳香族化合物は、
優れた電気絶縁特性を有するものであるため、過去にお
いてトランス、コンデンサ等の電気絶縁体として広く利
用されていた。また、熱媒体、感圧紙(登録商標)など
としても広く利用されていた。しかしながら、PCB等
のハロゲン化芳香族化合物はその強い毒性のため、現
在、法律によりその製造、輸入、使用が厳しく規制され
ている。
2. Description of the Related Art Halogenated aromatic compounds such as PCBs are:
Since it has excellent electrical insulation properties, it has been widely used in the past as an electrical insulator such as a transformer and a capacitor. Further, it was widely used as a heat medium, pressure-sensitive paper (registered trademark), and the like. However, due to its high toxicity, halogenated aromatic compounds such as PCBs are currently strictly regulated by law in their production, import and use.

【0003】このようなPCB等のハロゲン化芳香族化
合物の処理については、PCBの処分基準に関する通知
(昭和51・3・17環水企38・環整18)による
と、PCB等の有機ハロゲン化芳香族化合物が付着した
トランス、コンデンサの部材、例えば鋼、銅、アルミ、
紙、木等の洗浄処理において、トリクロルエチレン、テ
トラクロルエチレン又はこれらと同等以上の洗浄力を有
する洗浄液で処理することを定めている。しかしなが
ら、トリクロルエチレンやテトラクロルエチレン等の塩
素系有機溶剤は、発ガン性等の疑いがあるとする第2種
特定化学物質であり、かつ地下水汚染の問題等も発生し
ており、完全密閉系による使用以外は取り扱いが困難な
状況となってきている。また、オゾン層への影響を及ぼ
すため環境的にも問題がある。
Regarding the treatment of halogenated aromatic compounds such as PCBs, according to the notice on disposal standards for PCBs (Showa 51.3.17 Ring Water Company 38, ring arrangement 18), organic halogenated PCBs and the like are treated. Transformers with aromatic compounds attached, capacitor components, such as steel, copper, aluminum,
In the cleaning treatment of paper, wood, etc., it is specified that the treatment is performed with trichloroethylene, tetrachloroethylene or a cleaning liquid having a detergency equivalent to or higher than these. However, chlorinated organic solvents such as trichloroethylene and tetrachloroethylene are Class 2 specified chemical substances that are suspected to be carcinogenic, and have caused problems such as groundwater contamination. It is becoming difficult to handle except for the use by In addition, there is an environmental problem because it affects the ozone layer.

【0004】また、n−ヘキサンは、塩素等を含有しな
い、ハロゲン化芳香族化合物汚染物の洗浄剤として知ら
れているが、引火点が−26℃と非常に低く発火性の危
険が大であり、実験室規模の用途以外においては使用が
困難であるという問題がある。
[0004] Also, n-hexane is known as a cleaner for halogenated aromatic compound contaminants which does not contain chlorine and the like, but has a very low flash point of -26 ° C and a high risk of ignition. There is a problem that it is difficult to use it for purposes other than laboratory-scale applications.

【0005】本発明者等は、長年ハロゲン化芳香族化合
物の化学抽出分解法を研究し、ハロゲン化芳香族化合物
を、1,3−ジメチル−2−イミダゾリジノンまたはス
ルフォラン等の非プロトン性極性溶剤中で、アルカリ処
理することにより、ハロゲン化芳香族化合物を分解する
知見を報告している(特開平6−25691号公報、特
開平7−8572号公報、特開平7−289656号公
報、特開平9−253602号公報)。しかしながら、
ハロゲン化芳香族化合物を電気絶縁体として含有するト
ランス等を洗浄する場合には、洗浄剤が前記アルカリ処
理に悪影響を与えるという問題があった。例えば、特開
平11−106792号公報にはβ−オキシエチルメチ
ルエーテルと酢酸n−ブチルを混合した洗浄剤が提案さ
れているが、洗浄後の洗浄液を前記の化学抽出分解法に
よる分解処理に供した場合には、該洗浄剤自身が反応
し、アルカリ処理を阻害する結果となる。
[0005] The present inventors have studied chemical extraction and decomposition of halogenated aromatic compounds for many years, and have found that halogenated aromatic compounds can be converted to aprotic polar compounds such as 1,3-dimethyl-2-imidazolidinone or sulfolane. It has been reported that a halogenated aromatic compound is decomposed by alkali treatment in a solvent (JP-A-6-25691, JP-A-7-8572, JP-A-7-289656, JP-A-9-253602). However,
In the case of cleaning a transformer or the like containing a halogenated aromatic compound as an electric insulator, there is a problem that the cleaning agent adversely affects the alkali treatment. For example, Japanese Patent Application Laid-Open No. H11-106792 proposes a detergent in which β-oxyethyl methyl ether and n-butyl acetate are mixed, and the washing solution after washing is subjected to a decomposition treatment by the chemical extraction decomposition method described above. In this case, the cleaning agent itself reacts, resulting in inhibition of the alkali treatment.

【0006】また、ハロゲン化芳香族化合物の分解処理
後の廃液については、ハロゲン化芳香族化合物の濃度を
測定し、法令等に従った管理が必要となる。その際、ハ
ロゲン化芳香族化合物の分析には、簡易測定方法として
GC−ECD(電子捕獲型検出器ガスクロマトグラフ)
が有効であることが知られている。化学抽出分解法にて
処理された廃液に洗浄剤が含まれることは当然想定され
るが、GC−ECD測定に際しても測定に悪影響のない
洗浄剤の登場が望まれる。
Further, with respect to the waste liquid after the decomposition treatment of the halogenated aromatic compound, it is necessary to measure the concentration of the halogenated aromatic compound and manage it in accordance with laws and regulations. At this time, GC-ECD (Electron Capture Detector Gas Chromatograph) is used as a simple measurement method for the analysis of halogenated aromatic compounds.
Is known to be effective. It is naturally assumed that the waste liquid treated by the chemical extraction decomposition method contains a detergent, but it is desired to introduce a detergent that does not adversely affect the measurement at the time of GC-ECD measurement.

【0007】[0007]

【発明が解決しようとする課題】本発明は、PCB等の
ハロゲン化芳香族化合物が付着した部材の洗浄におい
て、洗浄性に優れ、且つ該化合物の分解処理に影響の少
ない洗浄剤組成物及び洗浄処理方法の提供を目的とす
る。
DISCLOSURE OF THE INVENTION The present invention relates to a cleaning composition and a cleaning composition which are excellent in cleaning performance and have little influence on the decomposition treatment of a compound to which a halogenated aromatic compound such as PCB is attached. The purpose is to provide a processing method.

【0008】[0008]

【課題を解決するための手段】本発明者らは、本発明の
洗浄剤組成物を用いることにより、PCB等のハロゲン
化芳香族化合物が付着した部材等の洗浄性に優れ、かつ
化学抽出分解法による分解処理に影響が少ない洗浄液が
得られることを見出し、本発明を完成するに至った。
Means for Solving the Problems By using the cleaning composition of the present invention, the present inventors have found that a member having a halogenated aromatic compound, such as PCB, having excellent cleaning properties and a chemical extraction decomposition can be obtained. The present inventors have found that a cleaning solution having little influence on the decomposition treatment by the method can be obtained, and have completed the present invention.

【0009】即ち、本発明は、下記の洗浄剤組成物及び
洗浄方法を提供するものである。 項1.沸点が、非プロトン性極性溶剤の沸点より5℃以
上離れ、且つ化学抽出分解法の反応温度より高い沸点を
有する飽和炭化水素系溶剤を含有することを特徴とす
る、ハロゲン化芳香族化合物が付着した部材用の洗浄剤
組成物。 項2.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤が205℃以
上且つ1,3−ジメチル−2−イミダゾリジノンの沸点
より5℃以上低い沸点を有するパラフィン系溶剤又はナ
フテン系溶剤である項1に記載の洗浄剤組成物。 項3.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤がn−ドデカ
ン又はC12〜C13のイソパラフィンである項1に記載の洗
浄剤組成物。 項4.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤が213℃以
上215℃以下の沸点を有するナフテン系溶剤である項
1に記載の洗浄剤組成物。 項5.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤が1,3−ジ
メチル−2−イミダゾリジノンの沸点より5℃以上高く
且つ270℃未満の沸点を有するパラフィン系溶剤又は
ナフテン系溶剤である項1に記載の洗浄剤組成物。 項6.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤がn−テトラ
デカン又はC14〜C15のイソパラフィンである項1に記載
の洗浄剤組成物。 項7.非プロトン性極性溶剤が1,3−ジメチル−2−
イミダゾリジノンで、飽和炭化水素系溶剤が240℃以
上250℃以下の沸点を有するナフテン系溶剤である項
1に記載の洗浄剤組成物。 項8.項1〜7に記載の洗浄剤組成物を用いて、部材に
付着したハロゲン化芳香族化合物を溶解させた後、化学
抽出分解法によるハロゲン化芳香族化合物の分解処理を
行うハロゲン化芳香族化合物が付着した部材の洗浄処理
方法。
That is, the present invention provides the following cleaning composition and cleaning method. Item 1. Characterized in that it contains a saturated hydrocarbon-based solvent having a boiling point separated from the aprotic polar solvent by 5 ° C. or more and having a boiling point higher than the reaction temperature of the chemical extraction / decomposition method. A cleaning composition for a member. Item 2. The aprotic polar solvent is 1,3-dimethyl-2-
Item 1. The imidazolidinone, wherein the saturated hydrocarbon solvent is a paraffinic solvent or a naphthenic solvent having a boiling point of at least 205 ° C. and a boiling point of at least 5 ° C. lower than the boiling point of 1,3-dimethyl-2-imidazolidinone. Detergent composition. Item 3. The aprotic polar solvent is 1,3-dimethyl-2-
In imidazolidinone, detergent composition according to claim 1 saturated hydrocarbon solvent is isoparaffin n- dodecane or C 12 -C 13. Item 4. The aprotic polar solvent is 1,3-dimethyl-2-
Item 2. The cleaning composition according to Item 1, wherein the saturated hydrocarbon-based solvent is a naphthene-based solvent having a boiling point of 213 ° C or higher and 215 ° C or lower, which is an imidazolidinone. Item 5. The aprotic polar solvent is 1,3-dimethyl-2-
Item 1. The imidazolidinone, wherein the saturated hydrocarbon solvent is a paraffinic solvent or a naphthenic solvent having a boiling point higher than that of 1,3-dimethyl-2-imidazolidinone by 5 ° C. or more and lower than 270 ° C. Cleaning composition. Item 6. The aprotic polar solvent is 1,3-dimethyl-2-
In imidazolidinone, detergent composition according to claim 1 saturated hydrocarbon solvent is isoparaffin n- tetradecane or C 14 -C 15. Item 7. The aprotic polar solvent is 1,3-dimethyl-2-
Item 2. The cleaning composition according to Item 1, wherein the saturated hydrocarbon-based solvent is a naphthene-based solvent having a boiling point of 240 ° C. or higher and 250 ° C. or lower, which is imidazolidinone. Item 8. The halogenated aromatic compound which dissolves the halogenated aromatic compound attached to the member using the cleaning composition according to any one of Items 1 to 7, and then decomposes the halogenated aromatic compound by a chemical extraction decomposition method. Cleaning method for a member to which is adhered.

【0010】[0010]

【発明の実施の形態】化学抽出分解法は、例えば特開平
7−8572号公報及び特開平6−25691号公報に
開示されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Chemical extraction and decomposition methods are disclosed in, for example, JP-A-7-8572 and JP-A-6-25691.

【0011】反応温度は、処理される飽和炭化水素系溶
剤、非プロトン性極性溶剤、ハロゲン化芳香族化合物の
沸点等によって適宜選択され、PCB等のハロゲン化芳
香族化合物、飽和炭化水素系溶剤及び非プロトン性極性
溶剤の沸点のいずれか一番小さい温度未満である。通
常、PCB等のハロゲン化芳香族化合物の沸点(約30
0℃)は、飽和炭化水素系溶剤又は非プロトン性極性溶
剤の沸点より高いため、反応温度の上限は、飽和炭化水
素系溶剤又は非プロトン性極性溶剤の沸点のどちらか低
い方の温度未満である。反応温度の下限は、反応を阻害
しない限り特に制限されないが、反応性を考慮すると1
00℃以上であることが好ましい。
The reaction temperature is appropriately selected depending on the saturated hydrocarbon solvent to be treated, the aprotic polar solvent, the boiling point of the halogenated aromatic compound, etc., and the halogenated aromatic compound such as PCB, the saturated hydrocarbon solvent, and the like. It is less than the lowest temperature of any of the boiling points of the aprotic polar solvent. Usually, the boiling point of a halogenated aromatic compound such as PCB (about 30
0 ° C.) is higher than the boiling point of the saturated hydrocarbon solvent or the aprotic polar solvent, so the upper limit of the reaction temperature is less than the lower temperature of the boiling point of the saturated hydrocarbon solvent or the aprotic polar solvent. is there. The lower limit of the reaction temperature is not particularly limited as long as the reaction is not hindered.
It is preferably at least 00 ° C.

【0012】通常、飽和炭化水素に比べ、化学抽出分解
法に用いられる非プロトン性極性溶剤の方が高価である
ため、連続してハロゲン化芳香族化合物の分解処理を行
う場合に、分解処理後の反応液から非プロトン性極性溶
剤を回収し再利用することは、経済的に有利である。反
応液から非プロトン性極性溶剤の回収する方法として
は、特に制限されないが、一般的には蒸留処理が用いら
れる。
Usually, an aprotic polar solvent used in a chemical extraction decomposition method is more expensive than a saturated hydrocarbon, and therefore, when the halogenated aromatic compound is continuously decomposed, the aprotic polar solvent is used after the decomposition. It is economically advantageous to recover and reuse the aprotic polar solvent from the reaction solution of the above. The method for recovering the aprotic polar solvent from the reaction solution is not particularly limited, but generally a distillation treatment is used.

【0013】反応液中の非プロトン性極性溶剤を蒸留に
より回収する場合に、非プロトン性極性溶剤とともに反
応液中に存在する飽和炭化水素系溶剤の沸点が、非プロ
トン性極性溶剤の沸点近傍であると、蒸留による非プロ
トン性極性溶剤の回収率が低下するため望ましくない。
回収率を考慮すると、飽和炭化水素系溶剤の沸点は、非
プロトン性極性溶剤の沸点から5℃以上離れていること
が望ましい。
When the aprotic polar solvent in the reaction solution is recovered by distillation, the boiling point of the saturated hydrocarbon solvent present in the reaction solution together with the aprotic polar solvent is close to the boiling point of the aprotic polar solvent. If so, the recovery rate of the aprotic polar solvent by distillation decreases, which is not desirable.
In consideration of the recovery, it is desirable that the boiling point of the saturated hydrocarbon-based solvent is separated from the boiling point of the aprotic polar solvent by 5 ° C. or more.

【0014】例えば、非プロトン性極性溶剤として、
1,3−ジメチル−2−イミダゾリジノンを使用した場
合には、1,3−ジメチル−2−イミダゾリジノンの沸
点より5℃以上高い沸点を有する飽和炭化水素系溶剤と
して、n−テトラデカン、C14〜C15のイソパラフィ
ン、沸点が1,3−ジメチル−2−イミダゾリジノンの
沸点より5℃以上高く且つ270℃未満であるナフテン
系溶剤(特に沸点が240〜250℃のナフテン系溶
剤)等が好ましく使用される。また、1,3−ジメチル
−2−イミダゾリジノンの沸点より5℃以上低い沸点を
有する飽和炭化水素系溶剤として、n−ドデカン、C12
〜C13のイソパラフィン、沸点が205℃以上且つ1,
3−ジメチル−2−イミダゾリジノンの沸点より5℃以
上低いナフテン系溶剤(特に沸点が213〜215℃の
ナフテン系溶剤)、等が好ましく使用される。
For example, as an aprotic polar solvent,
When 1,3-dimethyl-2-imidazolidinone is used, n-tetradecane, as a saturated hydrocarbon solvent having a boiling point higher than that of 1,3-dimethyl-2-imidazolidinone by 5 ° C. or more, C 14 -C 15 isoparaffins, naphthenic solvent having a boiling point of 1,3-dimethyl-2-imidazolidinone higher and lower than 270 ° C. 5 ° C. or higher than the boiling point (in particular naphthenic solvent having a boiling point of 240 to 250 ° C.) Are preferably used. Examples of saturated hydrocarbon solvents having a boiling point lower than that of 1,3-dimethyl-2-imidazolidinone by 5 ° C. or more include n-dodecane and C 12.
~ C 13 isoparaffin, having a boiling point of at least 205 ° C and 1,
A naphthenic solvent having a boiling point of at least 5 ° C. lower than the boiling point of 3-dimethyl-2-imidazolidinone (particularly a naphthenic solvent having a boiling point of 213 to 215 ° C.) is preferably used.

【0015】本発明において、非プロトン性極性溶剤と
しては、ハロゲン化芳香族化合物を非芳香族炭化水素か
ら抽出できるものであれば特に限定されない。好ましく
は、1,3−ジメチル−2−イミダゾリジノン、スルフ
ォラン、エチレングリコール、ジエチレングリコール、
トリエチレングリコール、ポリエチレングリコール、ト
リメチレングリコール、ブチレングリコール及びこれら
の低級アルキルエーテルからなる群から選択される少な
くとも1種である。より好ましくは、1,3−ジメチル
−2−イミダゾリジノン、スルフォラン及びこれらの混
合物である。さらに好ましくは、1,3−ジメチル−2
−イミダゾリジノンである。なお、低級とは、炭素数1
〜5をいう。
In the present invention, the aprotic polar solvent is not particularly limited as long as the halogenated aromatic compound can be extracted from the non-aromatic hydrocarbon. Preferably, 1,3-dimethyl-2-imidazolidinone, sulfolane, ethylene glycol, diethylene glycol,
It is at least one selected from the group consisting of triethylene glycol, polyethylene glycol, trimethylene glycol, butylene glycol, and lower alkyl ethers thereof. More preferred are 1,3-dimethyl-2-imidazolidinone, sulfolane, and mixtures thereof. More preferably, 1,3-dimethyl-2
-Imidazolidinone. In addition, a low grade has 1 carbon atoms.
~ 5.

【0016】アルカリ物質は、反応に悪影響を及ぼさな
い限り特に制限されない。好ましくは、苛性ソーダ、苛
性カリ、ナトリウムアルコキシド、カリウムアルコキシ
ド及び水酸化カルシウムからなる群から選択された少な
くとも1種である。
The alkaline substance is not particularly limited as long as it does not adversely affect the reaction. Preferably, it is at least one selected from the group consisting of caustic soda, caustic potash, sodium alkoxide, potassium alkoxide and calcium hydroxide.

【0017】反応時間は、溶剤の種類、反応温度、ハロ
ゲン化芳香族化合物の種類・濃度、アルカリ物質の種類
・濃度等に応じて適宜選択される。例えば、PCBの場
合には、処理条件にもよるが、数分〜6時間程度で、法
律に定められた定量検出限界(0.5ppm)以下に分
解することが可能である。
The reaction time is appropriately selected according to the type of solvent, the reaction temperature, the type and concentration of the halogenated aromatic compound, the type and concentration of the alkaline substance, and the like. For example, in the case of a PCB, it can be decomposed below a quantitative detection limit (0.5 ppm) stipulated by law in several minutes to 6 hours, depending on the processing conditions.

【0018】本発明の洗浄剤組成物は、PCB等のハロ
ゲン化芳香族化合物が付着した部材の洗浄に適してい
る。特に、PCB等のハロゲン化芳香族化合物が付着し
たトランス、コンデンサ等の洗浄に適している。
The cleaning composition of the present invention is suitable for cleaning a member to which a halogenated aromatic compound such as PCB is attached. In particular, it is suitable for cleaning transformers, condensers and the like to which halogenated aromatic compounds such as PCB are attached.

【0019】ハロゲン化芳香族化合物としては、特に制
限されないが、トランス、コンデンサ等に付着したもの
が挙げられる。好ましいのはPCBである。
The halogenated aromatic compound is not particularly limited, but includes those attached to a transformer, a capacitor, and the like. Preferred is a PCB.

【0020】本発明の洗浄処理方法は、本発明の洗浄剤
組成物にハロゲン化芳香族化合物が付着したトランス、
コンデンサ等を接触させハロゲン化芳香族化合物を抽出
することによって洗浄し、抽出液を非プロトン性極性溶
剤に、アルカリ物質の存在下で接触させることによっ
て、ハロゲン化芳香族化合物を分解する。
[0020] The cleaning treatment method of the present invention comprises the steps of:
The halogenated aromatic compound is washed by contacting a condenser or the like to extract the halogenated aromatic compound, and the extract is brought into contact with an aprotic polar solvent in the presence of an alkaline substance to decompose the halogenated aromatic compound.

【0021】本発明の洗浄剤組成物によるトランス、コ
ンデンサ等の洗浄方法としては、浸漬、撹拌、循環、揺
動、超音波、シャワー等の洗浄方法が可能である。好ま
しい洗浄方法は、洗浄対象物の素材(材質)、大きさ、
形状、汚染物の性状等に応じて適宜選択される。トラン
ス等の洗浄では、大きさや形状もまちまちであり、洗浄
対象物の素材も多岐にわたっている。このため、そのま
ま洗浄できる場合もあるし、適時、状況に応じて、解
体、破砕、分別等の処理を行った後、洗浄できる場合も
ある。
As a method for cleaning transformers, condensers and the like using the cleaning composition of the present invention, washing methods such as immersion, stirring, circulation, rocking, ultrasonic waves, and showers are possible. The preferred cleaning method is the material (material), size,
It is appropriately selected according to the shape, the properties of the contaminants, and the like. In the cleaning of transformers and the like, the size and shape are various, and the materials to be cleaned are also diverse. For this reason, there are cases where the washing can be carried out as it is, and cases where the washing can be carried out after performing processes such as disassembly, crushing, and separation according to the situation.

【0022】ハロゲン化芳香族化合物を抽出した本発明
の処理剤組成物に、アルカリ条件下で非プロトン性極性
溶剤に接触させる方法としては、特に限定されないが、
混合等が使用される。反応時間、温度等は前記の通りで
あり、使用されるアルカリ物質は前記の通りである。
The method of bringing the treating agent composition of the present invention from which the halogenated aromatic compound has been extracted into contact with an aprotic polar solvent under alkaline conditions is not particularly limited.
Mixing or the like is used. The reaction time, temperature and the like are as described above, and the alkaline substance used is as described above.

【0023】[0023]

【発明の効果】本発明の洗浄剤組成物及び処理方法によ
れば、ハロゲン化芳香族化合物が付着した部材を洗浄性
に優れ、ハロゲン化芳香族化合物の分解が可能であり、
非プロトン性極性溶剤の再利用が可能である。また、ハ
ロゲン化芳香族化合物の含有量を測定に使用されるGC
−ECD(電子捕獲形検出器ガスクロマトグラフ)等に
悪影響を及ぼさない。従って、本発明の洗浄剤組成物
は、PCB等のハロゲン化芳香族化合物が付着したトラ
ンス,コンデンサ等の容器及び部材等の洗浄性に優れ、
かつ化学抽出分解法による分解処理に影響の少ない洗浄
剤である。該洗浄剤組成物を用いることにより、環境に
影響のあるトリクロルエチレンやテトラクロルエチレン
等の塩素系有機溶剤を使用する必要がなくなり、かつ化
学抽出分解法による分解処理と組み合わせることによ
り、ハロゲン化芳香族化合物及びそれにより汚染された
部材全てを処理することが可能となる。
According to the cleaning composition and the treatment method of the present invention, a member to which a halogenated aromatic compound has adhered has excellent cleaning properties, and can decompose the halogenated aromatic compound.
Reuse of aprotic polar solvents is possible. GC used for measuring the content of halogenated aromatic compound
-Does not adversely affect ECD (Electron Capture Detector Gas Chromatograph) and the like. Therefore, the cleaning composition of the present invention is excellent in cleaning properties of containers and members such as transformers and capacitors to which halogenated aromatic compounds such as PCBs are attached,
It is a cleaning agent that has little effect on the decomposition treatment by the chemical extraction decomposition method. By using the detergent composition, there is no need to use a chlorinated organic solvent such as trichloroethylene or tetrachloroethylene which has an effect on the environment, and by combining with a decomposition treatment by a chemical extraction decomposition method, a halogenated aromatic compound can be obtained. It is possible to treat all group III compounds and components contaminated thereby.

【0024】[0024]

【実施例】以下に、実施例を挙げて本発明をさらに詳細
に説明するが、本発明はこれらの実施例によりなんら限
定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the present invention.

【0025】PCB含有絶縁油付着部材洗浄試験(洗浄
試験1) 実施例1 n−ドデカンを主成分とする炭化水素系混合溶剤を洗浄
溶剤として、PCB含有絶縁油(PCB含有量約1,0
00ppm)を用いて超音波洗浄試験を実施した。テス
トピースとしては、トランス中に含まれる接着絶縁紙
(50mm×50mm)を2枚ずつ使用し、PCB含有
絶縁油に一昼夜浸漬後、浸漬超音波洗浄試験を実施し
た。洗浄は、室温で最大20分とした。洗浄液中及び部
材に含まれるPCB含有量の測定には、GC−ECDを
用い、初期PCB付着量から超音波洗浄時間に対する洗
浄除去率を算出した。試験結果を図1に示す。
[0025] PCB-containing insulating oil adhered member cleaning test (cleaning
Test 1) Example 1 A PCB-containing insulating oil (PCB content of about 1,0) was used as a cleaning solvent with a hydrocarbon-based mixed solvent containing n-dodecane as a main component.
(00 ppm). As a test piece, two pieces of adhesive insulating paper (50 mm × 50 mm) contained in a transformer were used, and each piece was immersed in PCB-containing insulating oil for 24 hours, and then subjected to an immersion ultrasonic cleaning test. Washing was for a maximum of 20 minutes at room temperature. For the measurement of the PCB content contained in the cleaning liquid and in the member, GC-ECD was used, and the cleaning removal rate with respect to the ultrasonic cleaning time was calculated from the initial PCB adhesion amount. The test results are shown in FIG.

【0026】実施例2 n−ドデカンを主成分とする炭化水素系混合溶剤に代え
て、沸点が213〜215℃であるナフテン系溶剤を使
用した以外は実施例1と同様に算出した。試験結果を図
1に示す。
Example 2 Calculated in the same manner as in Example 1 except that a naphthenic solvent having a boiling point of 213 to 215 ° C. was used instead of the hydrocarbon-based mixed solvent containing n-dodecane as a main component. The test results are shown in FIG.

【0027】実施例3 n−ドデカンを主成分とする炭化水素系混合溶剤に代え
て、n−テトラデカンを主成分とする炭化水素系混合溶
剤を使用した以外は実施例1と同様に算出した。試験結
果を図2に示す。
Example 3 Calculated in the same manner as in Example 1 except that a hydrocarbon-based mixed solvent mainly containing n-tetradecane was used instead of the hydrocarbon-based mixed solvent mainly containing n-dodecane. The test results are shown in FIG.

【0028】実施例4 n−ドデカンを主成分とする炭化水素系混合溶液に代え
て、沸点が240〜250℃であるナフテン系溶剤を使
用した以外は実施例1と同様に算出した。試験結果を図
2に示す。
Example 4 Calculated in the same manner as in Example 1 except that a naphthenic solvent having a boiling point of 240 to 250 ° C. was used instead of the hydrocarbon-based mixed solution containing n-dodecane as a main component. The test results are shown in FIG.

【0029】比較例1 n−ドデカンを主成分とする炭化水素系混合溶剤に代え
て、トリクロロエチレン(特級)を使用した以外は実施
例1と同様に算出した。試験結果を図1及び2に示す。
Comparative Example 1 Calculation was performed in the same manner as in Example 1 except that trichloroethylene (special grade) was used in place of the hydrocarbon-based mixed solvent containing n-dodecane as a main component. The test results are shown in FIGS.

【0030】比較例2 n−ドデカンを主成分とする炭化水素系混合溶剤に代え
て、テトラクロロエチレン(特級)を使用した以外は実
施例1と同様に算出した。試験結果を図1及び2に示
す。
Comparative Example 2 Calculated in the same manner as in Example 1 except that tetrachloroethylene (special grade) was used in place of the hydrocarbon-based mixed solvent containing n-dodecane as a main component. The test results are shown in FIGS.

【0031】高濃度PCB付着部材の洗浄試験(洗浄試
験2) 実施例5 実施例1又は2の洗浄溶剤を用い、PCB含有絶縁油に
代えて、カネクロールKC−300(鐘淵化学工業株式
会社製:コンデンサ等に広く用いられた3塩素化物を中
心としたPCB)又はカネクロールKC−1000(鐘
淵化学工業株式会社製:大型トランス等に広く用いられ
た5塩素化物を中心としたPCBであるカネクロールK
C−500と3塩素化ベンゼンとの混合物であり、PC
B含有量は約70重量%)を用い、超音波洗浄時間を最
大60分とした以外は、洗浄試験1と同様とした。実施
例1及び2で使用された洗浄溶剤は、高濃度PCBであ
るKC−300及びKC−1000に対しても優れた洗
浄能力を有することが確認された。KC−300の試験
結果を図3に、KC−1000の試験結果を図4に示
す。
A cleaning test (a cleaning test)
Experiment 2) Example 5 Using the washing solvent of Example 1 or 2, instead of PCB-containing insulating oil, Kaneklor KC-300 (manufactured by Kaneka Chemical Co., Ltd .: a trichlorinated product widely used for capacitors and the like) Kaneklor KC-1000 (manufactured by Kanegafuchi Chemical Industry Co., Ltd .: Kaneklor K, which is a 5-chlorinated PCB widely used in large transformers and the like)
A mixture of C-500 and 3-chlorinated benzene, PC
B content was about 70% by weight) and the cleaning test was the same as the cleaning test 1 except that the ultrasonic cleaning time was set to a maximum of 60 minutes. It was confirmed that the cleaning solvents used in Examples 1 and 2 had excellent cleaning ability even for high concentration PCBs KC-300 and KC-1000. FIG. 3 shows the test results of KC-300, and FIG. 4 shows the test results of KC-1000.

【0032】実施例6 実施例1又は2の洗浄溶剤に代えて実施例3又は4の洗
浄溶剤を用いた以外は、実施例5と同様に試験した。K
C−300の試験結果を図5に、KC−1000の試験
結果を図6に示す。
Example 6 A test was conducted in the same manner as in Example 5 except that the cleaning solvent of Example 3 or 4 was used instead of the cleaning solvent of Example 1 or 2. K
FIG. 5 shows the test results of C-300, and FIG. 6 shows the test results of KC-1000.

【0033】化学抽出分解法への影響確認 実施例7 KC−300の化学抽出分解処理において、実施例1、
2、3又は4の洗浄溶剤が混入した場合を想定して影響
確認試験を行った。分解処理条件は、KC−300を1
0g、1,3−ジメチル−2−イミダゾリジノンを90
g、KOHを38g、洗浄溶剤(実施例1、2、3又は
4)を10g混合した反応系で、処理温度200℃,処
理時間6時間で行なった。分解処理後の残存総PCB濃
度の測定には、高分解能GC−MSを用いて行なった。
その結果、実施例1、2、3又は4で使用された洗浄溶
剤が混入しても、残存総PCB濃度は高分解能GC−M
Sの検出限界以下(50ppb以下)となり、該洗浄溶
剤がハロゲン化芳香族化合物の分解処理に悪影響を与え
ないことが確認された。
Example 7 Confirmation of Influence on Chemical Extraction and Decomposition Method 7 In the chemical extraction and decomposition treatment of KC-300, Example 1,
The effect confirmation test was performed on the assumption that 2, 3, or 4 cleaning solvents were mixed. The decomposition conditions were KC-300 1
0 g, 1,3-dimethyl-2-imidazolidinone in 90
g, 38 g of KOH and 10 g of a washing solvent (Examples 1, 2, 3 or 4) were carried out at a treatment temperature of 200 ° C. and a treatment time of 6 hours. The residual total PCB concentration after the decomposition treatment was measured using high-resolution GC-MS.
As a result, even if the washing solvent used in Example 1, 2, 3 or 4 was mixed, the total PCB concentration remaining was high-resolution GC-M
It was below the detection limit of S (50 ppb or less), and it was confirmed that the cleaning solvent did not adversely affect the decomposition treatment of the halogenated aromatic compound.

【0034】実施例8 KC−300をKC−1000に代えた以外は実施例7
と同様にした。その結果、実施例1、2、3又は4で使
用された洗浄溶剤が混入しても、残存総PCB濃度は高
分解能GC−MSの検出限界以下(50ppb以下)と
なり、該洗浄溶剤がハロゲン化芳香族化合物の分解処理
に悪影響を与えないことが確認された。
Example 8 Example 7 except that KC-300 was replaced with KC-1000.
Same as. As a result, even if the cleaning solvent used in Examples 1, 2, 3, or 4 was mixed, the remaining total PCB concentration was lower than the detection limit of high-resolution GC-MS (50 ppb or lower), and the cleaning solvent was halogenated. It was confirmed that the decomposition treatment of the aromatic compound was not adversely affected.

【0035】GC−ECD測定への阻害性 PCB等のハロゲン化芳香族化合物を定量する分析手法
(前処理として発煙硫酸を用いる方法、参考文献;「絶
縁油中低塩素化PCB迅速分析手法の確立」,環境と測
定技術,Vol.25, No.7 (1998))を用いて、実施例1、
2、3又は4のGC−ECD測定を行なった。その結
果、特異的なピークは検出されず、PCBの微量分析を
行う際に阻害のないことが確認された。なお、分析条件
は次のとおりである。 ガスクロマトグラフィー:日立263−30 カラム:OV−17(2m) 温度条件:220℃(3塩素化物定量時)及び180℃
(1又は2塩素化物定量時) 前処理:上記参考文献に記載されている発煙硫酸を用い
る方法
Analysis method for quantifying halogenated aromatic compounds such as PCBs inhibiting GC-ECD measurement (method using fuming sulfuric acid as pretreatment, reference; "Establishment of rapid analysis method for low chlorinated PCB in insulating oil" Example 1, using environment and measurement technology, Vol.25, No.7 (1998)).
2, 3, or 4 GC-ECD measurements were made. As a result, no specific peak was detected, and it was confirmed that there was no inhibition when performing trace analysis of PCB. The analysis conditions are as follows. Gas chromatography: Hitachi 263-30 Column: OV-17 (2 m) Temperature conditions: 220 ° C (when quantifying 3 chlorinated compounds) and 180 ° C
(When quantifying 1 or 2 chlorinated substances) Pretreatment: The method using fuming sulfuric acid described in the above reference

【0036】[0036]

【発明の効果】本発明の洗浄剤組成物は、PCB等のハ
ロゲン化芳香族化合物が付着したトランス、コンデンサ
等の容器及び部材等の洗浄性に優れ、かつ化学抽出分解
法による分解処理に影響の少ない洗浄剤である。該洗浄
剤組成物を用いることにより、環境に影響のあるトリク
ロルエチレンやテトラクロルエチレン等の塩素系有機溶
剤を使用する必要がなくなり、かつ化学抽出分解法によ
る分解処理と組み合わせることにより、ハロゲン化芳香
族化合物及びそれにより汚染された部材全てを処理する
ことが可能となる。
The cleaning composition of the present invention is excellent in cleaning properties of containers and members such as transformers and condensers to which halogenated aromatic compounds such as PCBs are adhered, and has an effect on the decomposition treatment by the chemical extraction decomposition method. It is a low-cleaning agent. By using the detergent composition, there is no need to use a chlorinated organic solvent such as trichloroethylene or tetrachloroethylene which has an effect on the environment, and by combining with a decomposition treatment by a chemical extraction decomposition method, a halogenated aromatic compound can be obtained. It is possible to treat all group III compounds and components contaminated thereby.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1、2及び比較例1、2のPCB含有絶
縁油付着部材洗浄試験の結果を示すグラフである。
FIG. 1 is a graph showing the results of cleaning tests of Examples 1 and 2 and Comparative Examples 1 and 2 with a PCB-containing insulating oil adhered member.

【図2】実施例3、4及び比較例1、2のPCB含有絶
縁油付着部材洗浄試験の結果を示すグラフである。
FIG. 2 is a graph showing the results of cleaning tests of Examples 3 and 4 and Comparative Examples 1 and 2 with a PCB-containing insulating oil adhered member.

【図3】実施例1又は2で使用された洗浄溶剤のKC−
300に対する洗浄効果を示すグラフである。
FIG. 3 shows KC- of the cleaning solvent used in Example 1 or 2.
3 is a graph showing a cleaning effect on 300.

【図4】実施例1又は2で使用された洗浄溶剤のKC−
1000に対する洗浄効果を示すグラフである。
FIG. 4 shows KC- of the cleaning solvent used in Example 1 or 2.
9 is a graph showing a cleaning effect for 1000.

【図5】実施例3又は4で使用された洗浄溶剤のKC−
300に対する洗浄効果を示すグラフである。
FIG. 5 shows KC- of the cleaning solvent used in Example 3 or 4.
3 is a graph showing a cleaning effect on 300.

【図6】実施例3又は4で使用された洗浄溶剤のKC−
1000に対する洗浄効果を示すグラフである。
FIG. 6 shows KC- of a cleaning solvent used in Example 3 or 4.
9 is a graph showing a cleaning effect for 1000.

フロントページの続き (72)発明者 天野 達郎 東京都千代田区大手町1丁目2番1号 三 井物産株式会社内 (72)発明者 戸潤 敏孔 神奈川県横浜市鶴見区江ケ崎町4番1号 東京電力株式会社エネルギー・環境研究所 内 (72)発明者 和田 寛 滋賀県甲賀郡甲西町大池町1番1 株式会 社ネオス内 Fターム(参考) 2E191 BA13 BC05 BD11 3B201 AA46 AB01 BB01 BB95 CD22 4H003 DA15 DB01 DC04 ED03 FA45Continued on the front page (72) Inventor Tatsuro Amano 1-2-1, Otemachi, Chiyoda-ku, Tokyo Mitsui & Co., Ltd. (72) Inventor Toshiro Tojun 4-1 Egasakicho, Tsurumi-ku, Yokohama-shi, Kanagawa (72) Inventor Hiroshi Wada 1-1, Oike-cho, Kosai-cho, Koga-gun, Shiga Prefecture F-term in NEOS Corporation (reference) 2E191 BA13 BC05 BD11 3B201 AA46 AB01 BB01 BB95 CD22 4H003 DA15 DB01 DC04 ED03 FA45

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】沸点が、非プロトン性極性溶剤の沸点より
5℃以上離れ、且つ化学抽出分解法の反応温度より高い
沸点を有する飽和炭化水素系溶剤を含有することを特徴
とする、ハロゲン化芳香族化合物が付着した部材用の洗
浄剤組成物。
1. A halogenated solvent characterized by containing a saturated hydrocarbon solvent having a boiling point separated from the aprotic polar solvent by 5 ° C. or more and having a boiling point higher than the reaction temperature of the chemical extraction decomposition method. A cleaning composition for a member to which an aromatic compound has adhered.
【請求項2】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤が20
5℃以上且つ1,3−ジメチル−2−イミダゾリジノン
の沸点より5℃以上低い沸点を有するパラフィン系溶剤
又はナフテン系溶剤である請求項1に記載の洗浄剤組成
物。
2. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone and the saturated hydrocarbon solvent is 20.
The cleaning composition according to claim 1, which is a paraffin-based solvent or a naphthene-based solvent having a boiling point of 5 ° C or more and 5 ° C or more lower than the boiling point of 1,3-dimethyl-2-imidazolidinone.
【請求項3】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤がn−
ドデカン又はC12〜C13のイソパラフィンである請求項1
に記載の洗浄剤組成物。
3. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone, and the saturated hydrocarbon solvent is n-
Claim isoparaffins dodecane or C 12 -C 13 1
9. The cleaning composition according to item 1.
【請求項4】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤が21
3℃以上215℃以下の沸点を有するナフテン系溶剤で
ある請求項1に記載の洗浄剤組成物。
4. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone and the saturated hydrocarbon solvent is 21.
The cleaning composition according to claim 1, which is a naphthenic solvent having a boiling point of 3 ° C or more and 215 ° C or less.
【請求項5】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤が1,
3−ジメチル−2−イミダゾリジノンの沸点より5℃以
上高く且つ270℃未満の沸点を有するパラフィン系溶
剤又はナフテン系溶剤である請求項1に記載の洗浄剤組
成物。
5. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone, and the saturated hydrocarbon solvent is 1,3-dimethyl-2-imidazolidinone.
The cleaning composition according to claim 1, which is a paraffin-based solvent or a naphthene-based solvent having a boiling point of 5 ° C or higher and lower than 270 ° C than the boiling point of 3-dimethyl-2-imidazolidinone.
【請求項6】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤がn−
テトラデカン又はC14〜C15のイソパラフィンである請求
項1に記載の洗浄剤組成物。
6. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone, and the saturated hydrocarbon solvent is n-type.
Detergent composition according to claim 1 which is isoparaffin tetradecane or C 14 -C 15.
【請求項7】非プロトン性極性溶剤が1,3−ジメチル
−2−イミダゾリジノンで、飽和炭化水素系溶剤が24
0℃以上250℃以下の沸点を有するナフテン系溶剤で
ある請求項1に記載の洗浄剤組成物。
7. The aprotic polar solvent is 1,3-dimethyl-2-imidazolidinone and the saturated hydrocarbon solvent is 24.
The cleaning composition according to claim 1, which is a naphthenic solvent having a boiling point of 0 ° C or more and 250 ° C or less.
【請求項8】請求項1〜7に記載の洗浄剤組成物を用い
て、部材に付着したハロゲン化芳香族化合物を溶解させ
た後、化学抽出分解法によるハロゲン化芳香族化合物の
分解処理を行うハロゲン化芳香族化合物が付着した部材
の洗浄処理方法。
8. After the halogenated aromatic compound attached to the member is dissolved using the cleaning composition according to claim 1, the halogenated aromatic compound is subjected to a decomposition treatment by a chemical extraction decomposition method. A method for cleaning a member to which a halogenated aromatic compound has adhered.
JP2000164483A 2000-06-01 2000-06-01 Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition Pending JP2001342499A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000164483A JP2001342499A (en) 2000-06-01 2000-06-01 Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000164483A JP2001342499A (en) 2000-06-01 2000-06-01 Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition

Publications (1)

Publication Number Publication Date
JP2001342499A true JP2001342499A (en) 2001-12-14

Family

ID=18668095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000164483A Pending JP2001342499A (en) 2000-06-01 2000-06-01 Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition

Country Status (1)

Country Link
JP (1) JP2001342499A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0625691A (en) * 1992-06-05 1994-02-01 Res Inst For Prod Dev Removal of halogenated aromatic compound from hydrocarbon oil
JPH07222826A (en) * 1994-02-15 1995-08-22 Ebara Corp Method for decomposing organic halide compound
JPH08269496A (en) * 1995-03-29 1996-10-15 Matsushita Electric Ind Co Ltd Cleaning method
JPH1036893A (en) * 1996-07-24 1998-02-10 Japan Energy Corp Detergent composition and regeneration method thereof
JP2000021649A (en) * 1998-07-07 2000-01-21 Ebara Corp Cleaning method of transformer or capacitor using pcb
JP2000044994A (en) * 1998-07-29 2000-02-15 Showa Denko Kk Resist removing solvent
JP2000082618A (en) * 1998-09-04 2000-03-21 Daihen Corp Method for cleaning transformer case on pillar to which insulating oil is adhered

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0625691A (en) * 1992-06-05 1994-02-01 Res Inst For Prod Dev Removal of halogenated aromatic compound from hydrocarbon oil
JPH07222826A (en) * 1994-02-15 1995-08-22 Ebara Corp Method for decomposing organic halide compound
JPH08269496A (en) * 1995-03-29 1996-10-15 Matsushita Electric Ind Co Ltd Cleaning method
JPH1036893A (en) * 1996-07-24 1998-02-10 Japan Energy Corp Detergent composition and regeneration method thereof
JP2000021649A (en) * 1998-07-07 2000-01-21 Ebara Corp Cleaning method of transformer or capacitor using pcb
JP2000044994A (en) * 1998-07-29 2000-02-15 Showa Denko Kk Resist removing solvent
JP2000082618A (en) * 1998-09-04 2000-03-21 Daihen Corp Method for cleaning transformer case on pillar to which insulating oil is adhered

Similar Documents

Publication Publication Date Title
US4430208A (en) Method for the solvent extraction of polychlorinated biphenyls
Liao et al. Identification of persulfate oxidation products of polycyclic aromatic hydrocarbon during remediation of contaminated soil
Tsou et al. Improved total oxidizable precursor assay for quantifying polyfluorinated compounds amenable to oxidative conversion to perfluoroalkyl carboxylic acids
WO1993025635A1 (en) Method of removing halogenated aromatic compound from hydrocarbon oil
JP2001342499A (en) Detergent composition for a member to which a halogenated aromatic compound has adhered, and a cleaning method using the detergent composition
CN109706008B (en) Halogenated hydrocarbon combined solvent containing octafluoropentyl olefin ether and application thereof
JP2003055695A (en) Cleaning agent for members to which halogenated aromatic compound adheres and cleaning method using the cleaning agent
JP2009220015A (en) Method for treating washing wastewater containing chlorine-containing organic compound
JP2003300058A (en) Soil treatment method
JP3246694B2 (en) How to wash goods
JP3247543B2 (en) Alkali decomposition method for halogenated aromatic compounds
JP4159165B2 (en) Purification method and apparatus for solid substances contaminated with organic halogen compounds
KR100373083B1 (en) Removal of rust-inhibiting organic chlorine compounds
JP3935758B2 (en) Detoxification treatment method and detoxification treatment system for organic halogen compounds
JP3933484B2 (en) Detoxification treatment method and detoxification treatment system for organic halogen compound contaminated oil
WO1983004259A1 (en) Improved method for the solvent extraction of polychlorinated biphenyls
JP2001137792A (en) Cleaning method
JP2952749B2 (en) Recycling and reuse of water-soluble detergent deterioration liquid
JP3955494B2 (en) Decontamination method and decontamination system for organic halogen contaminants
JP4286517B2 (en) Methods for recovering and recycling boron trifluoride or its complexes
JP5377414B2 (en) Oil purification equipment and detoxification treatment facility for PCB mixed insulating oil
KR100462705B1 (en) Method of reducing a toxicity of PCB with Pd-Al2O3 and Ultrasonic
JP5383582B2 (en) Detoxification method for PCB mixed insulating oil
JPH0810352A (en) Treatment of polychlorinated aromatic compound
Trifan et al. Microwave assisted catalytic dechlorination of PCB

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070529

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20070529

RD03 Notification of appointment of power of attorney

Effective date: 20070529

Free format text: JAPANESE INTERMEDIATE CODE: A7423

A521 Written amendment

Effective date: 20070529

Free format text: JAPANESE INTERMEDIATE CODE: A821

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100129

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100310

A521 Written amendment

Effective date: 20100426

Free format text: JAPANESE INTERMEDIATE CODE: A523

A02 Decision of refusal

Effective date: 20100811

Free format text: JAPANESE INTERMEDIATE CODE: A02