JP2001235758A - Liquid crystal display panel and method of manufacturing the same - Google Patents
Liquid crystal display panel and method of manufacturing the sameInfo
- Publication number
- JP2001235758A JP2001235758A JP2000045591A JP2000045591A JP2001235758A JP 2001235758 A JP2001235758 A JP 2001235758A JP 2000045591 A JP2000045591 A JP 2000045591A JP 2000045591 A JP2000045591 A JP 2000045591A JP 2001235758 A JP2001235758 A JP 2001235758A
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- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal display
- display panel
- sealing material
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
(57)【要約】
【課題】 液晶表示パネルに液晶注入後、注入用の開口
部を封止する際に、封止材が液晶表示領域にまで侵入し
て表示不良が発生するという課題を解消し、液晶表示装
置の表示品質の向上を図る。
【解決手段】液晶表示パネル10の対向する2枚の基板
の少なくとも一方の基板上の液晶注入用の開口部3と液
晶表示領域8との間に、金属膜9を設けるよう構成す
る。
(57) [Summary] [PROBLEMS] To solve the problem that when a liquid crystal display panel is filled with a liquid crystal, a sealing material penetrates into the liquid crystal display area and a display defect occurs when the filling opening is sealed. In addition, the display quality of the liquid crystal display device is improved. A metal film is provided between a liquid crystal display area and an opening for injecting liquid crystal on at least one of two opposing substrates of a liquid crystal display panel.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、液晶表示パネルお
よびその製造方法に関し、特に液晶表示パネル内にディ
ップ注入法で液晶を注入する液晶表示パネルに関する。The present invention relates to a liquid crystal display panel and a method of manufacturing the same, and more particularly, to a liquid crystal display panel in which liquid crystal is injected into a liquid crystal display panel by a dip injection method.
【0002】[0002]
【従来の技術】近年、液晶表示装置は、薄型軽量、低電
圧駆動、低消費電力等の長所を生かしパーソナルコンピ
ュータ、テレビ、デジタルカメラ等の表示デバイスとし
て広く使用されるようになった。液晶表示装置を構成す
る液晶表示パネルは、一般にガラス等の2枚の透明基板
間に液晶を封入した構造であり、一方の基板(CF基
板)にはブラックマトリックス、カラーフィルタ、共通
電極および配向膜等が形成され、他方の基板(TFT基
板)には薄膜トランジスタ(以下、TFTという)、ゲ
ートバスライン、ドレインバスライン、画素電極および
配向膜等が形成されている。2. Description of the Related Art In recent years, liquid crystal display devices have been widely used as display devices for personal computers, televisions, digital cameras, etc., taking advantage of their advantages such as thinness and lightness, low voltage driving, and low power consumption. A liquid crystal display panel constituting a liquid crystal display device generally has a structure in which liquid crystal is sealed between two transparent substrates such as glass, and one substrate (CF substrate) has a black matrix, a color filter, a common electrode, and an alignment film. On the other substrate (TFT substrate), a thin film transistor (hereinafter, referred to as TFT), a gate bus line, a drain bus line, a pixel electrode, an alignment film, and the like are formed.
【0003】2枚の透明基板間に液晶を注入する方法の
一つとしてディップ注入法がある。One method of injecting liquid crystal between two transparent substrates is a dip injection method.
【0004】これは、2枚の透明基板の何れか一方の基
板に液晶の注入用の開口部を残して表示領域を囲むよう
にシール材を塗布し、球や円柱状のスペーサを散布して
このシール材で2枚の基板間を固着する。その後真空中
でこの液晶注入用の開口部を液晶中に漬けた状態で大気
圧に戻すと、圧力差により液晶が基板間に注入される。
次に、開口部に熱硬化性または紫外線硬化性樹脂(封
止材)を塗布し、開口部を封止することにより液晶表示
パネルが完成する。In this method, a sealing material is applied to one of two transparent substrates so as to surround a display region while leaving an opening for injecting liquid crystal, and spheres or columnar spacers are scattered. The two substrates are fixed with this sealing material. Thereafter, when the pressure is returned to the atmospheric pressure in a state in which the liquid crystal injection opening is immersed in the liquid crystal in a vacuum, the liquid crystal is injected between the substrates due to the pressure difference.
Next, a liquid crystal display panel is completed by applying a thermosetting or ultraviolet curable resin (sealing material) to the opening and sealing the opening.
【0005】図4は、このような従来の液晶表示パネル
組立工程の例を説明するものである。図4(A)に示す
ように、液晶注入用の開口部3を残してシール材2を塗
布した基板1をスクライブラインXおよびYに沿って切
断した一方の基板11と、端部にゲートバスラインと接
続されたゲート端子4およびドレインバスラインと接続
されたドレイン端子5が形成された他方の基板12とを
固着し、開口部3から液晶を注入した後、開口部3を封
止材7で封止して図4(B)に示す液晶表示パネル10
となる。FIG. 4 illustrates an example of such a conventional liquid crystal display panel assembling process. As shown in FIG. 4A, one substrate 11 obtained by cutting the substrate 1 on which the sealing material 2 is applied while leaving the liquid crystal injection opening 3 along the scribe lines X and Y, and a gate bus at the end. The other substrate 12 on which the gate terminal 4 connected to the line and the drain terminal 5 connected to the drain bus line are formed is fixed, and liquid crystal is injected through the opening 3. The liquid crystal display panel 10 shown in FIG.
Becomes
【0006】[0006]
【発明が解決しようとする課題】液晶注入用の開口部3
から液晶を注入した後、この開口部3に封止材7を塗布
するが、開口部3を完全に塞ぐためには、封止材7が表
示領域に達しない程度に少しだけ開口部3の内部に侵入
させておく必要がある。そのため封止材7である樹脂を
塗布してから数秒から数十秒そのまま放置して樹脂が侵
入してから熱または紫外線を照射して封止材7を硬化し
ていた。An opening 3 for injecting a liquid crystal.
After the liquid crystal is injected from the opening 3, a sealing material 7 is applied to the opening 3. To completely cover the opening 3, the inside of the opening 3 is so small that the sealing material 7 does not reach the display area. Must be infiltrated. For this reason, the sealing material 7 is hardened by applying heat or ultraviolet rays after the resin has penetrated and left for several seconds to several tens of seconds after applying the resin as the sealing material 7.
【0007】しかしながら、封止材7の粘度、開口部3
の幅のばらつき、温度、湿度等の環境条件、基板がガラ
スの場合ガラス面の処理状態等により内部への封止材7
の浸入速度が大きく変動し、開口部3の部分拡大平面図
である図3に示すように封止材7が表示領域8にまで侵
入してしまい表示不良が発生する問題がある。また近年
の液晶表示パネルの狭額縁化(表示領域以外の部分が狭
くなること)や、これら封止材7の混入に対する影響を
受け易い低電圧駆動用液晶材料の採用により、封止材7
の混入による表示不良も問題として浮上している。However, the viscosity of the sealing material 7 and the opening 3
Of the sealing material 7 depending on environmental conditions such as variations in width, temperature, humidity, etc., and the processing state of the glass surface when the substrate is glass.
There is a problem that the sealing material 7 penetrates into the display area 8 as shown in FIG. 3 which is a partially enlarged plan view of the opening 3 and a display defect occurs. In addition, the encapsulant 7 has been developed by narrowing the frame of the liquid crystal display panel in recent years (the area other than the display area has become narrower) and adopting a low-voltage driving liquid crystal material that is easily affected by the incorporation of the encapsulant 7.
The display failure due to the mixing of is also emerging as a problem.
【0008】なお、封止材が液晶表示パネル内部に侵入
するのを規制するため、流路規制バーを開口部近傍に設
けることが特開平2─055333号公報で提案されて
いるが、これは実質的に液晶注入用の開口部の幅を狭め
ることになり液晶注入時間を大幅に増大させてしまう問
題がある。In order to prevent the sealing material from entering the inside of the liquid crystal display panel, it has been proposed in Japanese Patent Application Laid-Open No. 05305333 to provide a flow path regulating bar near the opening. There is a problem that the width of the opening for injecting liquid crystal is substantially reduced, and the time for injecting liquid crystal is significantly increased.
【0009】[0009]
【課題を解決するための手段】上記課題を解決するため
請求項1の発明では、2枚の基板の少なくとも一方の基
板に液晶注入用の開口部を残して液晶表示領域を囲むよ
うにシール材を枠状に塗布し、対向して配置された2枚
の基板間をシール材で固着した液晶表示パネルにおい
て、この2枚の基板の少なくとも一方の基板上の開口部
と液晶表示領域との間に、金属膜を設けたことを特徴と
する。また請求項2の発明は、この金属膜の材質は、ア
ルミニウム、チタン、クロム、シリコンの何れかである
ことを特徴とする。請求項3の発明は、2枚の基板の一
方に少なくとも薄膜トランジスタ、ゲートバスラインお
よびドレインバスラインが形成され、この2枚の基板の
少なくとも一方の基板に液晶注入用の開口部を残して液
晶表示領域を囲むようにシール材を枠状に塗布し、対向
して配置された2枚の基板間をシール材で固着する液晶
表示パネルの製造方法において、この基板上の開口部と
液晶表示領域との間に、金属膜をゲートバスラインと同
一工程で形成することを特徴とする。According to a first aspect of the present invention, there is provided a sealing material which surrounds a liquid crystal display region while leaving an opening for injecting liquid crystal in at least one of two substrates. Is applied in a frame shape, and a liquid crystal display panel in which two substrates disposed opposite to each other are fixed with a sealing material, between the opening on at least one of the two substrates and the liquid crystal display region. Wherein a metal film is provided. The invention according to claim 2 is characterized in that the material of the metal film is any one of aluminum, titanium, chromium, and silicon. According to a third aspect of the present invention, at least a thin film transistor, a gate bus line, and a drain bus line are formed on one of the two substrates, and a liquid crystal display is formed by leaving an opening for injecting liquid crystal on at least one of the two substrates. In a method of manufacturing a liquid crystal display panel in which a sealing material is applied in a frame shape so as to surround an area and two substrates disposed opposite to each other are fixed with the sealing material, an opening on the substrate, the liquid crystal display area, In the method, a metal film is formed in the same step as the gate bus line.
【0010】すなわち、本発明は液晶注入用の開口部と
液晶表示領域の間の基板上に、金属膜を設けることによ
り、液晶表示パネルに液晶注入後に開口部を封止する
際、封止材との間のぬれ性が変化することにより封止材
が液晶表示領域まで侵入してしまうことがなくなり表示
不良が発生しない。また金属膜は極めて薄いため液晶注
入の際に妨げとならない。さらに金属膜の材質として、
液晶表示パネルを構成する電極、配線の材質と同じもの
を使用することにより、従来の液晶表示パネルの電極、
配線と同一工程で形成することができるので製造工数が
増えることもない。That is, according to the present invention, when a metal film is provided on a substrate between an opening for liquid crystal injection and a liquid crystal display area, the opening is sealed after the liquid crystal is injected into the liquid crystal display panel. As a result, the sealing material does not enter the liquid crystal display area due to the change in wettability between the liquid crystal display region and the display defect does not occur. Further, since the metal film is extremely thin, it does not hinder the liquid crystal injection. Furthermore, as the material of the metal film,
By using the same materials as the electrodes and wiring that make up the liquid crystal display panel, the electrodes of the conventional liquid crystal display panel,
Since it can be formed in the same process as the wiring, the number of manufacturing steps does not increase.
【0011】[0011]
【発明の実施の形態】以下、本発明の実施の形態につい
て説明する。図1(A)および図1(A)における開口
部3の部分拡大図である図1(B)に示す如く、本発明
では液晶表示パネル10の開口部3と液晶表示領域8と
の間であって基板12の面に金属膜9が形成されてい
る。金属膜9の材質としては、実際には液晶表示パネル
の製造工数を増やさないため、基板上に電極や配線を形
成する工程で使用する材質を使用することが望ましい。
例えば、TFTを使用する液晶表示パネルではアルミニ
ウム(Al)、チタン(Ti)、クローム(Cr)、シ
リコン(Si)等が挙げられる。封止材7の液晶表示パ
ネル10内への侵入速度は、封止材7の粘度および開口
部3の大きさが一定ならば、ガラスと比較して金属膜の
方が侵入速度は遅くなる。Embodiments of the present invention will be described below. As shown in FIG. 1 (A) and FIG. 1 (B) which is a partially enlarged view of the opening 3 in FIG. 1 (A), in the present invention, between the opening 3 of the liquid crystal display panel 10 and the liquid crystal display area 8. The metal film 9 is formed on the surface of the substrate 12. As a material of the metal film 9, it is preferable to use a material used in a process of forming electrodes and wirings on a substrate in order not to actually increase the number of manufacturing steps of the liquid crystal display panel.
For example, in a liquid crystal display panel using a TFT, aluminum (Al), titanium (Ti), chrome (Cr), silicon (Si), and the like are given. The penetration speed of the sealing material 7 into the liquid crystal display panel 10 is lower in the metal film than in the glass, as long as the viscosity of the sealing material 7 and the size of the opening 3 are constant.
【0012】従来の液晶表示パネルの開口部3近傍の基
板表面はガラスが剥き出しになっており、ガラスの場合
は封止材7が素早く侵入してしまい、封止材7の粘度、
開口部3の大きさに対するマージンが狭かった。従来で
は封止材7の侵入速度はガラスに対して200μm/分
程度であり、開口部3からの距離aが700μm程度の
侵入位置を設計中心値としているが、封止材7の粘度や
開口部3の幅のばらつきにより3割程度侵入速度がばら
つくと、210μm程度侵入距離が変動し、最大侵入距
離は910μmとなってしまう。The surface of the substrate in the vicinity of the opening 3 of the conventional liquid crystal display panel has exposed glass, and in the case of glass, the sealing material 7 penetrates quickly, and the viscosity of the sealing material 7 is reduced.
The margin for the size of the opening 3 was narrow. Conventionally, the penetration speed of the sealing material 7 is about 200 μm / min with respect to the glass, and the penetration position where the distance a from the opening 3 is about 700 μm is set as the design center value. If the penetration speed varies by about 30% due to the variation in the width of the part 3, the penetration distance changes by about 210 μm, and the maximum penetration distance becomes 910 μm.
【0013】これに対し、本発明における金属膜9の場
合、封止材7の侵入速度は50μm/分程度と遅くな
る。これはガラスおよび金属膜と封止材との間のぬれ性
に関係して侵入速度が変化していると考えられる。金属
膜9を開口部3から内側に向かっての距離bが650μ
mから幅cが150μmの幅に形成した場合、封止材7
の侵入速度が3割ばらついても最大侵入距離は750μ
m程度になり、図1(B)に示すように設計値700μ
mの近くに収まる。このため封止材7が液晶表示パネル
10の液晶表示領域8まで侵入することがなくなり、表
示不良が生じない。 ガラス剥き出しの部分は、封止材
7が素早く侵入するが、金属膜9の部分は侵入速度が遅
くなるので基板上に形成する金属膜9の大きさ、位置つ
まり図1(B)における距離b,幅cを種々変えること
により封止材7の侵入距離を設計的に微妙に制御するこ
とが可能となる。なお、金属膜9を基板12の上に形成
する形態について述べたが金属膜9は基板11の上また
は基板11、12の両方に形成してもよい。On the other hand, in the case of the metal film 9 according to the present invention, the penetration speed of the sealing material 7 is as low as about 50 μm / min. This is thought to be due to a change in the penetration rate due to the wettability between the glass and metal film and the sealing material. The distance b from the opening 3 to the inside of the metal film 9 is 650 μm.
When the width c is formed to a width of 150 μm from m, the sealing material 7
The maximum penetration distance is 750μ even if the penetration speed varies by 30%
m, and the design value is 700 μm as shown in FIG.
m. For this reason, the sealing material 7 does not enter the liquid crystal display area 8 of the liquid crystal display panel 10, and display defects do not occur. Although the sealing material 7 quickly penetrates into the exposed portion of the glass, the penetration speed of the portion of the metal film 9 is reduced, so the size and position of the metal film 9 formed on the substrate, that is, the distance b in FIG. , The width c of the sealing material 7 can be delicately controlled by design. Although the embodiment in which the metal film 9 is formed on the substrate 12 has been described, the metal film 9 may be formed on the substrate 11 or on both the substrates 11 and 12.
【0014】次に本発明における金属膜の形成をTFT
基板のゲート電極、ゲートバスライン形成と同一製造工
程(以下、ゲート工程という)で行う場合の例を図2の
本発明の実施態様による液晶表示パネルの製造工程を示
す図により説明する。Next, the formation of the metal film according to the present invention is performed by using a TFT.
An example in which the formation of a gate electrode and a gate bus line on a substrate is performed in the same manufacturing process (hereinafter, referred to as a gate process) will be described with reference to FIG. 2 showing a manufacturing process of a liquid crystal display panel according to an embodiment of the present invention.
【0015】まず、ステップS1においてガラス基板上
の塵埃や、アルカリ分等を除くため基板の洗浄を行う。
次にステップ2として基板上にゲート膜となる金属をス
パッタリングやプラズマCVDにより成膜するが、本発
明の実施態様ではアルミニウムをゲート電極、ゲートバ
スラインと同じ約1000オングストロームの厚さに成
膜する。次にその上にステップ3で紫外線に反応するレ
ジストをスピンコーテングにより塗布する。次にステッ
プ4で露光マスク6を介して紫外線露光を行うが、この
露光マスク6にはゲート電極、ゲートバスライン以外
に、本発明の特徴である金属膜を液晶注入用の開口部3
近傍に形成するためのパターンが設けられていてゲート
電極、ゲートバスラインのパターンと同時に露光され
る。次にステップ5で紫外線が照射された部分のレジス
トを現像液に浸たして取り去る。次にステップ6でレジ
ストに覆われてない部分のアルミニウム膜をエッチング
液に浸たして取り去る。次にステップ7で残っているレ
ジストをレジスト剥離剤で剥離した後洗浄する。次にス
テップ8で所望のゲート電極、ゲートバスライン、金属
膜等が形成されているか否か検査する。First, in step S1, the substrate is cleaned to remove dust, alkali, and the like on the glass substrate.
Next, as a step 2, a metal to be a gate film is formed on the substrate by sputtering or plasma CVD. In the embodiment of the present invention, aluminum is formed to a thickness of about 1000 angstroms, which is the same as the gate electrode and the gate bus line. . Next, a resist which reacts to ultraviolet rays is applied thereon by spin coating in step 3. Next, in step 4, ultraviolet light exposure is performed through an exposure mask 6. In addition to the gate electrode and the gate bus line, a metal film, which is a feature of the present invention, is formed on the opening 3 for liquid crystal injection.
A pattern to be formed in the vicinity is provided, and is exposed simultaneously with the pattern of the gate electrode and the gate bus line. Next, in step 5, the resist irradiated with the ultraviolet rays is immersed in a developing solution and removed. Next, in step 6, a portion of the aluminum film not covered with the resist is immersed in an etching solution and removed. Next, in step 7, the remaining resist is removed with a resist remover and then washed. Next, in step 8, it is checked whether or not a desired gate electrode, gate bus line, metal film, and the like are formed.
【0016】本発明の実施態様では金属膜9として、液
晶注入用の開口部3のガラス基板エッジからの距離b=
650μmに短手方向の幅150μm、長手方向の幅1
5mmの長方形のパターンを形成する。In the embodiment of the present invention, as the metal film 9, the distance b = the distance from the edge of the glass substrate of the opening 3 for injecting liquid crystal.
650 μm width 150 μm in the transverse direction, width 1 in the longitudinal direction
A 5 mm rectangular pattern is formed.
【0017】以上でTFT基板のゲート工程が終了する
が、TFT基板の製造には、この後公知のTFT基板の
製造方法により、ゲート絶縁膜、TFT、ドレイン電
極、ドレインバスライン、画素電極、配向膜等が形成さ
れる。一方TFT基板と対向するCF基板にはブラック
マトリックス、カラーフィルタ、共通電極、配向膜等が
形成される。そしてCF基板にエポキシ樹脂等のシール
材を塗布し、スペーサを散布した後、2枚の基板を貼り
合わせる。なおシール材2を塗布する際に液晶注入用の
開口部3を20mmだけ開けておき、液晶を注入する。
液晶を注入した後スリーボンド製の紫外線硬化封止材
(30Y−228)を使用し、封止材7を塗布してから
250秒経った時に紫外線を照射して封止材7を硬化す
る。この結果、封止材7の流れは設計値700μmの近
くに収まり、このため封止材7が液晶表示パネル10の
液晶表示領域8まで侵入することがなくなり、表示不良
は生じない。The gate process of the TFT substrate is completed as described above. To manufacture the TFT substrate, a gate insulating film, a TFT, a drain electrode, a drain bus line, a pixel electrode, an alignment A film or the like is formed. On the other hand, a black matrix, a color filter, a common electrode, an alignment film and the like are formed on a CF substrate facing the TFT substrate. Then, a sealing material such as an epoxy resin is applied to the CF substrate, and spacers are scattered, and then the two substrates are bonded. When the sealing material 2 is applied, the liquid crystal injection opening 3 is opened by 20 mm, and the liquid crystal is injected.
After injecting the liquid crystal, using a three-bond ultraviolet-curing sealing material (30Y-228), the sealing material 7 is cured by irradiating ultraviolet rays 250 seconds after the application of the sealing material 7. As a result, the flow of the sealing material 7 is kept close to the design value of 700 μm, so that the sealing material 7 does not enter the liquid crystal display area 8 of the liquid crystal display panel 10 and no display failure occurs.
【0018】[0018]
【発明の効果】以上説明したように、本発明は液晶表示
パネルへ液晶注入したあとの開口部を封止する際に、封
止材が液晶表示領域まで侵入することが阻止され、表示
不良が発生する問題が解消する。またこのための製造工
数の増加もなく、液晶表示装置の表示品質の向上に寄与
するところが大きい。As described above, according to the present invention, when sealing the opening after injecting liquid crystal into the liquid crystal display panel, the sealing material is prevented from invading the liquid crystal display area, and display defects are reduced. The problems that occur are eliminated. In addition, there is no increase in the number of manufacturing steps for this, and this greatly contributes to improvement in display quality of the liquid crystal display device.
【図1】 本発明の実施態様の液晶表示パネルの平面図
である。FIG. 1 is a plan view of a liquid crystal display panel according to an embodiment of the present invention.
【図2】 本発明の実施態様による液晶表示パネルの製
造工程を示す図である。FIG. 2 is a diagram showing a manufacturing process of the liquid crystal display panel according to the embodiment of the present invention.
【図3】 従来の液晶表示パネルの課題を説明する図で
ある。FIG. 3 is a diagram illustrating a problem of a conventional liquid crystal display panel.
【図4】 従来の液晶表示パネルの平面図である。FIG. 4 is a plan view of a conventional liquid crystal display panel.
2 シール材 3 液晶注入用の開口部 7 封止材 8 液晶表示領域 9 金属膜 10 液晶表示パネル 2 Sealing material 3 Opening for liquid crystal injection 7 Sealing material 8 Liquid crystal display area 9 Metal film 10 Liquid crystal display panel
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H089 JA11 LA22 LA32 LA48 NA19 NA24 NA55 NA60 PA13 QA12 QA13 TA06 TA09 2H092 JA26 JA39 JB27 KA16 KA18 MA05 MA14 MA15 MA16 MA17 MA35 MA37 NA25 NA29 PA04 5G435 AA14 AA17 EE06 EE09 EE12 KK02 KK05 LL04 LL08 LL14 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H089 JA11 LA22 LA32 LA48 NA19 NA24 NA55 NA60 PA13 QA12 QA13 TA06 TA09 2H092 JA26 JA39 JB27 KA16 KA18 MA05 MA14 MA15 MA16 MA17 MA35 MA37 NA25 NA29 PA04 5G435 AA14 AA17 EE06 KK LL04 LL08 LL14
Claims (3)
晶注入用の開口部を残して液晶表示領域を囲むようにシ
ール材を枠状に塗布し、対向して配置された該2枚の基
板間を該シール材で固着した液晶表示パネルにおいて、 該2枚の基板の少なくとも一方の基板上の前記開口部と
前記液晶表示領域との間に、金属膜を設けたことを特徴
とする液晶表示パネル。1. A sealing material is applied in a frame shape on at least one of two substrates so as to surround a liquid crystal display region while leaving an opening for injecting liquid crystal, and the two substrates disposed opposite to each other. A liquid crystal display panel in which substrates are fixed with the sealant, wherein a metal film is provided between the opening on at least one of the two substrates and the liquid crystal display region. Display panel.
タン、クロム、シリコンの何れかであることを特徴とす
る請求項1に記載の液晶表示パネル。2. The liquid crystal display panel according to claim 1, wherein a material of the metal film is any one of aluminum, titanium, chromium, and silicon.
ンジスタ、ゲートバスラインおよびドレインバスライン
が形成され、該2枚の基板の少なくとも一方の基板に液
晶注入用の開口部を残して液晶表示領域を囲むようにシ
ール材を枠状に塗布し、対向して配置された該2枚の基
板間を該シール材で固着する液晶表示パネルの製造方法
において、 該基板上の前記開口部と前記液晶表示領域との間に、金
属膜を前記ゲートバスラインと同一工程で形成すること
を特徴とする液晶表示パネルの製造方法。3. A liquid crystal display area having at least one of a thin film transistor, a gate bus line, and a drain bus line formed on one of two substrates and leaving an opening for injecting liquid crystal on at least one of the two substrates. A method of manufacturing a liquid crystal display panel, in which a sealing material is applied in a frame shape so as to surround the liquid crystal display panel, and the two substrates disposed opposite to each other are fixed with the sealing material. A method for manufacturing a liquid crystal display panel, wherein a metal film is formed between the gate bus line and the region in the same step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000045591A JP2001235758A (en) | 2000-02-23 | 2000-02-23 | Liquid crystal display panel and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000045591A JP2001235758A (en) | 2000-02-23 | 2000-02-23 | Liquid crystal display panel and method of manufacturing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001235758A true JP2001235758A (en) | 2001-08-31 |
Family
ID=18568147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000045591A Withdrawn JP2001235758A (en) | 2000-02-23 | 2000-02-23 | Liquid crystal display panel and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001235758A (en) |
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