JP2001219163A - Treatment method of boron-containing water - Google Patents
Treatment method of boron-containing waterInfo
- Publication number
- JP2001219163A JP2001219163A JP2000034355A JP2000034355A JP2001219163A JP 2001219163 A JP2001219163 A JP 2001219163A JP 2000034355 A JP2000034355 A JP 2000034355A JP 2000034355 A JP2000034355 A JP 2000034355A JP 2001219163 A JP2001219163 A JP 2001219163A
- Authority
- JP
- Japan
- Prior art keywords
- boron
- water
- anion exchange
- ion exchange
- exchange resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
- Removal Of Specific Substances (AREA)
Abstract
(57)【要約】
【課題】 一般的なアニオン交換樹脂を単独で用いてホ
ウ素の除去が可能であり、しかも再生工程も簡単で低コ
ストで処理することが可能なホウ素含有水の処理方法を
得る。
【解決手段】 ホウ素含有水11を前処理装置1で前処
理してイオン交換装置3に導入し、アニオン交換樹脂4
を通過させてホウ素を交換吸着させるイオン交換工程の
終了後、純水21を40〜60℃に加温してイオン交換
装置3に導入してアニオン交換樹脂層4の前洗浄を行
い、その後アルカリ水溶液23を40〜60℃に加温し
てイオン交換装置に導入し、アニオン交換樹脂層4を再
生する。
PROBLEM TO BE SOLVED: To provide a method for treating boron-containing water, which is capable of removing boron by using a general anion exchange resin alone, and in which the regeneration step is simple and can be performed at low cost. obtain. SOLUTION: Boron-containing water 11 is pretreated in a pretreatment device 1 and introduced into an ion exchange device 3, and an anion exchange resin 4 is introduced.
After the ion exchange step of exchanging and adsorbing boron by passing through, the pure water 21 is heated to 40 to 60 ° C. and introduced into the ion exchange device 3 to perform pre-cleaning of the anion exchange resin layer 4, and then alkali The aqueous solution 23 is heated to 40 to 60 ° C. and introduced into the ion exchange device to regenerate the anion exchange resin layer 4.
Description
【0001】[0001]
【発明の属する技術分野】本発明はホウ素含有水をイオ
ン交換により処理するホウ素含有水の処理方法に関する
ものである。The present invention relates to a method for treating boron-containing water by treating boron-containing water by ion exchange.
【0002】[0002]
【従来の技術】ホウ素化合物は種々の分野で使用されて
おり、これらの分野から発生する排水、あるいは他の分
野で発生する排水にはホウ素化合物を含むものがある。
このような化合物は有害とされているため、ホウ素含有
水からホウ素を除去するための処理が行われている。2. Description of the Related Art Boron compounds are used in various fields, and some wastewaters generated from these fields and those discharged from other fields contain those containing boron compounds.
Since such compounds are considered harmful, treatments have been performed to remove boron from boron-containing water.
【0003】ホウ素含有水の処理方法として、イオン交
換による処理方法がある(特開昭57−81881
号)。この方法はホウ素含有水をアニオン交換樹脂と接
触させることによりホウ素を吸着させ、アニオン交換樹
脂を再生剤により再生してホウ素の除去を繰り返す方法
である。このような方法に用いられるアニオン交換樹脂
としては、広くイオン交換に用いられる一般的なアニオ
ン交換樹脂のほかに、ホウ素吸着に対する選択性を高め
たキレート樹脂であるホウ素選択性吸着樹脂が用いられ
ている。As a method for treating boron-containing water, there is a treatment method by ion exchange (JP-A-57-81881).
issue). In this method, boron is adsorbed by bringing boron-containing water into contact with an anion exchange resin, the anion exchange resin is regenerated with a regenerant, and the removal of boron is repeated. As the anion exchange resin used in such a method, besides a general anion exchange resin widely used for ion exchange, a boron selective adsorption resin which is a chelate resin having enhanced selectivity for boron adsorption is used. I have.
【0004】このうち一般的なアニオン交換樹脂を用い
る処理法では、吸着済のアニオン交換樹脂を再生する
際、再生剤としてアルカリ水溶液を用いると、樹脂中の
硬度成分が水酸化マグネシウム等の不溶性物質となって
析出するため、次のイオン交換工程における通水抵抗が
大きくなり、通水不能になるという問題点がある。この
ためアニオン交換樹脂による処理の前にカチオン交換樹
脂により硬度成分を除去する必要があり、アニオン交換
樹脂単独でホウ素を除去することはできないという問題
点がある。In a general treatment method using an anion exchange resin, when an adsorbed anion exchange resin is regenerated, when an aqueous alkali solution is used as a regenerant, the hardness component in the resin becomes insoluble material such as magnesium hydroxide. Therefore, there is a problem that water flow resistance in the next ion exchange step is increased, and water flow is impossible. For this reason, it is necessary to remove the hardness component with a cation exchange resin before the treatment with the anion exchange resin, and there is a problem that boron cannot be removed by the anion exchange resin alone.
【0005】一方、ホウ素選択性吸着樹脂による処理に
はこのような問題はなく、高除去率でホウ素を除去する
ことができるが、特殊な樹脂であるため高価な樹脂を使
用する必要がある。そのうえ再生は硫酸による再生と、
アルカリによる再生の2段再生が必要であり、工程が複
雑であるとともに、薬剤費その他の費用も高くなるなど
の問題点がある。[0005] On the other hand, treatment with a boron selective adsorption resin does not have such a problem and can remove boron at a high removal rate. However, since it is a special resin, it is necessary to use an expensive resin. In addition, regeneration is regeneration with sulfuric acid,
The two-stage regeneration of the alkali is required, and the process is complicated, and there are problems such as a high chemical and other costs.
【0006】[0006]
【発明が解決しようとする課題】本発明の課題は、上記
の問題点を解決するため、一般的なアニオン交換樹脂を
単独で用いてホウ素の除去が可能であり、しかも再生工
程も簡単で低コストで処理することが可能なホウ素含有
水の処理方法を得ることである。SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems by removing boron by using a general anion exchange resin alone, and by a simple and low-regeneration process. An object of the present invention is to provide a method for treating boron-containing water that can be treated at a low cost.
【0007】[0007]
【課題を解決するための手段】本発明は次のホウ素含有
水の処理方法である。 (1)ホウ素含有水をアニオン交換樹脂と接触させてホ
ウ素を交換吸着させるイオン交換工程と、ホウ素を交換
吸着したアニオン交換樹脂を純水と接触させて前洗浄す
る前洗浄工程と、前洗浄を行ったアニオン交換樹脂をア
ルカリ水溶液と接触させて再生する再生工程とを含むホ
ウ素含有水の処理方法。 (2) 前洗浄工程における純水が40〜60℃である
上記(1)記載の方法。 (3) 再生工程におけるアルカリ水溶液が40〜60
℃である上記(1)または(2)記載の方法。The present invention relates to the following method for treating boron-containing water. (1) an ion exchange step of exchanging and adsorbing boron by bringing boron-containing water into contact with an anion exchange resin, a precleaning step of precontacting the anion exchange resin having exchanged and adsorbed boron with pure water, and a precleaning step. A regeneration step of regenerating the anion exchange resin by bringing the anion exchange resin into contact with an aqueous alkali solution. (2) The method according to the above (1), wherein the pure water in the pre-cleaning step is 40 to 60 ° C. (3) The aqueous alkali solution in the regeneration step is 40 to 60.
(1) or (2) above.
【0008】本発明において処理の対象となるホウ素含
有水は通常オルトホウ酸(H3BO3)の形でホウ素を含
有する水であるが、ホウ酸塩その他の形でホウ素を含む
ものでもよい。このようなホウ素含有水としては、医
薬、化粧品、石けん、金属、半導体、その他のホウ素化
合物を使用する製造工程排水、メッキ排水、原子力発電
所から発生する放射性排水、石炭火力発電所の排煙脱硫
排水、地熱発電排水、ゴミ焼却場の洗煙排水などがあげ
られる。[0008] In the present invention, the boron-containing water to be treated is usually water containing boron in the form of orthoboric acid (H 3 BO 3 ), but may be borate or other forms containing boron. Examples of such boron-containing water include pharmaceutical, cosmetic, soap, metal, semiconductor, and other wastewater from manufacturing processes, plating wastewater, radioactive wastewater from nuclear power plants, and flue gas desulfurization from coal-fired power plants. Drainage, geothermal power generation drainage, smoke incineration drainage, etc.
【0009】これらのホウ素含有水は発生源あるいは発
生時期等によりホウ素含有量が異なる場合がある。例え
ばホウ酸を用いる金属や半導体の表面処理工程では表面
処理時に高濃度ホウ素含有水が生じ、その後の水洗工程
では低濃度ホウ素含有水が生じる。このほか別の発生源
から異なる濃度のホウ素含有水が生じる。これらのホウ
素含有水は異種のものを混合して処理することもでき、
また別々に処理することもできる。These boron-containing waters may have different boron contents depending on the generation source, generation time, and the like. For example, in a surface treatment step of a metal or semiconductor using boric acid, high-concentration boron-containing water is generated during the surface treatment, and low-concentration boron-containing water is generated in a subsequent washing step. In addition, different sources produce different concentrations of boron-containing water. These boron-containing water can also be treated by mixing different kinds of water,
It can also be processed separately.
【0010】これらのホウ素含有水は他の成分を含有し
ていてもよい。ホウ素含有水が他の成分を含む場合に
は、凝集分離、濾過、膜分離等の前処理により、濁質そ
の他の成分を除去することにより、イオン交換工程にお
ける樹脂の汚染を防止することができるので好ましい。[0010] These boron-containing waters may contain other components. When the boron-containing water contains other components, the contamination of the resin in the ion exchange step can be prevented by removing turbidity and other components by pretreatment such as coagulation separation, filtration, and membrane separation. It is preferred.
【0011】本発明ではこのようなホウ素含有水をイオ
ン交換工程においてアニオン交換樹脂と接触させて、樹
脂にホウ素を交換吸着させる。アニオン交換樹脂として
は一般のイオン交換に使用される強塩基性アニオン交換
樹脂が好ましい。このようなアニオン交換樹脂はOH形
で用いるのが好ましい。In the present invention, such boron-containing water is brought into contact with an anion exchange resin in an ion exchange step to exchange and adsorb boron to the resin. As the anion exchange resin, a strongly basic anion exchange resin used for general ion exchange is preferable. Such anion exchange resins are preferably used in the OH form.
【0012】イオン交換工程におけるホウ素含有水と、
アニオン交換樹脂の接触方法は特に限定されず、浸漬等
の方法でもよいが、樹脂をカラムに充填して樹脂層を形
成し、この樹脂層にホウ素含有水を通水してホウ素を交
換吸着させるカラム通水法が好ましい。この場合通水方
向は上向流でも下向流でもよい。通水の条件はSV0〜
120hr-1、好ましくは5〜20hr-1とすることが
できる。ホウ素含有水をアニオン交換樹脂と接触させる
ことによりホウ素含有水中のホウ素がアニオン交換樹脂
に交換吸着されて除去される。ホウ素含有水中のホウ素
はpH8以下ではBO3 3-となっているが、pH9以上
ではB(OH)4 -となっているものと推測され、いずれ
もアニオン交換樹脂の交換基(OH-)と交換される。The boron-containing water in the ion exchange step;
The method of contacting the anion exchange resin is not particularly limited, and may be a method such as immersion. However, the resin is packed in a column to form a resin layer, and boron-containing water is passed through the resin layer to exchange and adsorb boron. A column water flow method is preferred. In this case, the flow direction may be an upward flow or a downward flow. The conditions for passing water are SV0
It can be 120 hr -1 , preferably 5 to 20 hr -1 . By bringing the boron-containing water into contact with the anion exchange resin, the boron in the boron-containing water is exchange-adsorbed and removed by the anion exchange resin. Although boron in the boron-containing water has a BO 3 3- in pH8 less, at pH9 or B (OH) 4 - is assumed that a, both exchange groups anion exchange resin - and (OH) Be exchanged.
【0013】イオン交換工程では流出水をそのイオン交
換工程に戻さないのが好ましい。ホウ素含有水はホウ素
を除去すると、あとは脱塩等の簡単な処理により処理水
を回収水として洗浄などさまざまな用途に使用できる。
このとき回収水の使用が中断される場合に、その都度た
とえば樹脂層への通水を中断すると、通水の再開が困難
であるため、処理水を原水槽に戻して樹脂層への通水を
継続することが考えられるが、このように処理水を原水
槽へ戻しながら通水を継続すると、ホウ素の除去効率が
低下するので好ましくない。その理由はイオン交換によ
りアニオンが除去され、OH-イオン濃度が高まった水
が、再度樹脂層に通水されると、一旦、樹脂に捕促され
たホウ素の一部が溶離するためであると推測される。す
なわち、処理水を原水槽へ戻しながら樹脂層へ通水を行
うことは、ホウ素の除去と、樹脂の再生(ホウ素の脱
着)を同時に行うことに相当すると推測される。It is preferred that the effluent is not returned to the ion exchange step in the ion exchange step. After removing boron, the boron-containing water can be used for various purposes such as washing by using the treated water as recovered water by simple treatment such as desalination.
At this time, if the use of the recovered water is interrupted, for example, if the flow of water through the resin layer is interrupted each time, it is difficult to restart the flow of water. However, it is not preferable to continue passing water while returning the treated water to the raw water tank, because the efficiency of removing boron decreases. The reason is that, when the anion is removed by ion exchange and the water having an increased OH - ion concentration is passed through the resin layer again, a part of the boron trapped by the resin is eluted. Guessed. In other words, it is presumed that passing water through the resin layer while returning the treated water to the raw water tank is equivalent to simultaneously removing boron and regenerating the resin (desorption of boron).
【0014】イオン交換工程の終了後、再生工程に移る
前に前洗浄工程を行う。この場合、イオン交換の進行に
よりアニオン交換樹脂がホウ素を交換吸着して飽和に達
した段階でイオン交換を停止して前洗浄工程に移る。イ
オン交換工程の終了時点は処理水中のホウ素濃度が設定
値を越える時点であり、この時点を検出して前洗浄工程
に入ることができる。After the completion of the ion exchange step, a pre-cleaning step is performed before moving to the regeneration step. In this case, the ion exchange is stopped at the stage where the anion exchange resin exchanges and adsorbs boron with the progress of ion exchange and reaches saturation, and the process proceeds to the pre-cleaning step. The end point of the ion exchange step is the point in time when the boron concentration in the treated water exceeds the set value, and this point can be detected to start the pre-cleaning step.
【0015】前洗浄工程は純水と接触させて行う。前洗
浄の目的は樹脂の周囲に存在する原水を純水で置換する
ことである。原水中に含まれているマグネシウム等の硬
度成分がアルカリとの反応により不溶性物質を生成する
ので、前洗浄工程では再生に先立って、樹脂の周囲に存
在する。このような硬度成分を除去するために純水で置
換を行う。カラム通水の場合は1BV以上、好ましくは
1〜5BVの純水を通水して洗浄を行う。前洗浄におけ
る純水の流速はSV0〜50hr-1、好ましくは5〜1
0hr-1とすることができる。この場合水抜を行った後
純水を導入して前洗浄を行ってもよく、またそのまま純
水を導入して前洗浄を行ってもよい。次の再生工程で加
温再生を行う場合は40〜60℃、好ましくは45〜5
5℃に加温した純水で前洗浄を行うことにより樹脂を加
温するのが好ましい。The pre-cleaning step is performed by contacting with pure water. The purpose of the prewash is to replace the raw water present around the resin with pure water. Since a hard component such as magnesium contained in the raw water reacts with the alkali to produce an insoluble substance, it is present around the resin in the pre-cleaning step prior to the regeneration. In order to remove such a hardness component, replacement is performed with pure water. In the case of passing water through the column, washing is performed by passing pure water of 1 BV or more, preferably 1 to 5 BV. The flow rate of the pure water in the pre-cleaning is SV 0 to 50 hr -1 , preferably 5 to 1 hr.
0 hr -1 . In this case, after draining, pure water may be introduced and pre-cleaning may be performed, or pure water may be directly introduced and pre-cleaning may be performed. When heating regeneration is performed in the next regeneration step, 40 to 60 ° C, preferably 45 to 5
It is preferable to heat the resin by performing pre-washing with pure water heated to 5 ° C.
【0016】前洗浄工程の終了後、再生工程に移り、ア
ニオン交換樹脂をアルカリ水溶液と接触させて再生を行
う。アルカリ水溶液としては、従来よりアニオン交換樹
脂の再生剤として用いられている7〜10重量%の水酸
化ナトリウム、水酸化カリウム等の水酸化アルカリ水溶
液が好ましいが、他のアルカリ水溶液でもよい。再生の
条件も従来より行われているアニオン交換樹脂の再生と
同様とされる。カラム通水の場合はアルカリ水溶液によ
る薬注の後、同量の純水による押出を行い、さらに純水
による洗浄を行う。アルカリ水溶液の使用量はNaOH
換算で樹脂1リットル当り10〜200g、好ましくは
40〜80gとするのが好ましい。薬注および押出時の
流速はSV0〜50hr-1、好ましくは3〜10h
r-1、洗浄時の流速は0〜50hr-1、好ましくは3〜
10hr-1とすることができる。After completion of the pre-cleaning step, the process proceeds to a regeneration step, in which the anion exchange resin is brought into contact with an aqueous alkali solution to perform regeneration. As the alkaline aqueous solution, an aqueous solution of an alkali hydroxide such as sodium hydroxide or potassium hydroxide of 7 to 10% by weight which has been conventionally used as a regenerant for an anion exchange resin is preferable, but another alkaline aqueous solution may be used. The conditions for the regeneration are the same as in the conventional regeneration of the anion exchange resin. In the case of column water flow, after chemical injection with an alkaline aqueous solution, extrusion with the same amount of pure water is performed, and further washing with pure water is performed. The amount of alkaline aqueous solution used is NaOH
It is preferably 10 to 200 g, preferably 40 to 80 g, per liter of resin in conversion. The flow rate during chemical injection and extrusion is SV 0 to 50 hr -1 , preferably 3 to 10 h.
r -1 , the flow rate during washing is 0 to 50 hr -1 , preferably 3 to 50 hr -1 .
It can be 10 hr -1 .
【0017】再生は40〜60℃、好ましくは45〜5
5℃に加温したアルカリ水溶液により行うのが好まし
い。ホウ素の溶離は常温での再生で十分に行われるが、
ホウ素とともにアニオン交換樹脂に交換吸着するシリカ
(SiO2)の溶離は加温下で効率よく進行する。再生
によりホウ素が完全に溶離してもシリカが樹脂中に残留
すると、アニオン交換樹脂のイオン交換能力は完全に回
復しないから、次のイオン交換工程におけるホウ素除去
率は低下する。これを防止するために上記のように加温
したアルカリ水溶液で、再生することによりシリカを効
率よく溶離させて再生効率を高くして、樹脂のイオン交
換能力を高くすることができる。Regeneration is carried out at 40-60 ° C., preferably 45-5 ° C.
It is preferable to use an alkaline aqueous solution heated to 5 ° C. Elution of boron is sufficiently performed by regeneration at room temperature,
Elution of silica (SiO 2 ), which is exchange-adsorbed to an anion exchange resin together with boron, proceeds efficiently under heating. If silica remains in the resin even when boron is completely eluted by regeneration, the ion exchange capacity of the anion exchange resin will not be completely restored, and the boron removal rate in the next ion exchange step will decrease. In order to prevent this, silica is efficiently eluted by regenerating with the alkaline aqueous solution heated as described above, whereby the regenerating efficiency is increased and the ion exchange capacity of the resin can be increased.
【0018】このような加温再生は再生の初期から行う
のが好ましいが、このためには前工程における前洗浄を
加温した純水で行うことにより樹脂を加温しておくこと
が好ましい。薬注液の押出は薬注の継続の性格が強いか
ら、同様に加温した純水で押出を行うのが好ましいが、
それに続く洗浄は溶離成分の洗浄除去の性格が強いか
ら、加温は不要である。洗浄排水中のホウ素その他の成
分が設定値以下となった時点で洗浄水の通水を停止して
再生工程を終了し、再びイオン交換工程に移ってホウ素
含有水を処理し、これを繰り返す。It is preferable that the heating and regeneration be performed from the beginning of the regeneration. For this purpose, it is preferable to heat the resin by performing the pre-cleaning in the previous step with heated pure water. Since the extrusion of the chemical injection liquid has a strong nature of the continuation of the chemical injection, it is preferable to perform the extrusion with similarly heated pure water,
Subsequent washing does not require heating because of the strong nature of washing away the eluted components. When the amount of boron and other components in the washing wastewater becomes equal to or less than the set value, the flow of the washing water is stopped, the regeneration step is terminated, and the process returns to the ion exchange step to treat the boron-containing water, and this is repeated.
【0019】上記のように再生に先立ってアニオン交換
樹脂を純水で前洗浄することにより、樹脂の周囲に存在
する原水を純水で置換することができる。これにより硬
度成分が排除されるため、高濃度のアルカリ水溶液を通
液して樹脂を再生しても樹脂層内での水酸化マグネシウ
ム等の不溶性物質の析出はない。このため次のイオン交
換工程における圧力損失の上昇はなく、長期にわたって
ホウ素含有水の処理を継続することができる。By pre-washing the anion exchange resin with pure water prior to regeneration as described above, the raw water present around the resin can be replaced with pure water. This eliminates the hardness component, so that even if a high-concentration aqueous alkaline solution is passed through to regenerate the resin, no insoluble substances such as magnesium hydroxide are precipitated in the resin layer. Therefore, the pressure loss does not increase in the next ion exchange step, and the treatment of the boron-containing water can be continued for a long time.
【0020】このように水酸化マグネシウム等の析出が
ないため、アニオン交換樹脂による処理に先立ってカチ
オン交換樹脂により硬度成分を除去する必要がないた
め、アニオン交換樹脂単独でホウ素を除去することがで
き、処理が簡単になる。しかもアニオン交換樹脂として
高価なホウ素選択性吸着樹脂を用いる必要がなく、汎用
のアニオン交換樹脂を用いることができ、また再生もア
ルカリ水溶液による1段再生が可能であるため低コスト
で処理することができる。As described above, since there is no precipitation of magnesium hydroxide or the like, it is not necessary to remove the hardness component with the cation exchange resin prior to the treatment with the anion exchange resin. Therefore, boron can be removed with the anion exchange resin alone. , Makes the process easier. Moreover, there is no need to use an expensive boron-selective adsorption resin as the anion exchange resin, a general-purpose anion exchange resin can be used, and the regeneration can be performed at a low cost because the single-stage regeneration with an alkaline aqueous solution is possible. it can.
【0021】さらにアニオン交換樹脂の再生を加温下で
行うことにより、シリカの溶離を効率よく行って再生効
率を高めることができ、前洗浄を加温下で行うことによ
り、さらに再生効率を高め、次のイオン交換工程におけ
るホウ素除去率を高くすることができる。またイオン交
換工程において流出水をそのイオン交換工程に戻さない
でホウ素除去を行うことによりホウ素除去率を高くする
ことができる。Further, by performing regeneration of the anion exchange resin under heating, the silica can be efficiently eluted and the regeneration efficiency can be increased. By performing pre-washing under heating, the regeneration efficiency can be further improved. In addition, the boron removal rate in the next ion exchange step can be increased. Further, by removing boron in the ion exchange step without returning the effluent to the ion exchange step, the boron removal rate can be increased.
【0022】[0022]
【発明の効果】以上の通り本発明によれば、再生工程の
前に純水による前洗浄工程を設けたので、一般的なアニ
オン交換樹脂を単独で用いてホウ素の除去が可能であ
り、しかも再生工程も簡単で低コストで処理することが
可能である。As described above, according to the present invention, a pre-cleaning step with pure water is provided before the regeneration step, so that boron can be removed by using a general anion exchange resin alone. The regeneration step is simple and can be performed at low cost.
【0023】[0023]
【発明の実施の形態】以下、本発明の実施の形態を図面
により説明する。図1は実施形態のホウ素含有水の除去
方法を示すフロー図である。図1において、1は前処理
装置であって、MF膜分離装置またはUF膜分離装置が
用いられている。2は前処理水槽、3はイオン交換装置
であってアニオン交換樹脂層4が形成されている。5は
処理水槽、6は脱塩装置であって、逆浸透膜分離装置が
用いられている。8、9は加熱器である。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a flowchart showing a method for removing boron-containing water according to the embodiment. In FIG. 1, reference numeral 1 denotes a pretreatment device, which uses an MF membrane separation device or a UF membrane separation device. Reference numeral 2 denotes a pretreatment water tank, and reference numeral 3 denotes an ion exchange device on which an anion exchange resin layer 4 is formed. 5 is a treated water tank, 6 is a desalination device, and a reverse osmosis membrane separation device is used. 8 and 9 are heaters.
【0024】実施形態のホウ素含有水の処理方法は以下
のように行われる。まずホウ素含有水からなる原水11
を前処理装置1に導入してMF膜またはUF膜による膜
分離を行い、濁質、高分子有機物等の不純物を濃縮液1
2側に濃縮して排出し、透過液13を前処理水槽2に貯
留する。イオン交換工程において前処理水槽2の前処理
水14をイオン交換装置3に導入し、アニオン交換樹脂
層4を通過させてホウ素を交換吸着し、処理水15を処
理水槽5に貯留する。処理水槽5の処理水16は脱塩装
置6に導入して逆浸透膜による膜分離を行って脱塩し、
塩分その他の不純物を含む濃縮液17を排出する。脱塩
装置6で脱塩した脱塩水18は純水として純水槽7に貯
留する。純水槽7の純水19は回収水としてユースポイ
ントに送られる。The method for treating boron-containing water according to the embodiment is performed as follows. First, raw water 11 consisting of boron-containing water
Is introduced into the pretreatment device 1 to perform membrane separation using an MF membrane or a UF membrane to remove impurities such as turbidity and high molecular organic matter into the concentrated solution 1.
After being concentrated to the second side and discharged, the permeated liquid 13 is stored in the pretreatment water tank 2. In the ion exchange step, the pretreated water 14 in the pretreated water tank 2 is introduced into the ion exchange device 3, passed through the anion exchange resin layer 4 to exchange and adsorb boron, and the treated water 15 is stored in the treated water tank 5. The treated water 16 in the treated water tank 5 is introduced into the desalination device 6 and subjected to membrane separation by a reverse osmosis membrane to be desalted.
The concentrate 17 containing salt and other impurities is discharged. The desalinated water 18 desalinated by the desalination device 6 is stored in the pure water tank 7 as pure water. The pure water 19 in the pure water tank 7 is sent to the use point as recovered water.
【0025】アニオン交換樹脂層4がホウ素で飽和した
段階で前処理水14の送液を停止してイオン交換工程を
終了し、前洗浄工程に移る。この間原水11は停止して
もよいが、送液を継続して前処理水を前処理水槽2に貯
留してもよい。また処理水槽5の処理水を脱塩装置6に
送って脱塩を継続してもよい。前洗浄工程はイオン交換
装置3の水抜を行ったのち、または行うことなく純水槽
7の純水21を前洗浄水として送り、必要により加熱器
8で40〜60℃に加温してイオン交換装置3に導入
し、イオン交換装置3内の原水を前洗浄水である純水で
置換し、アニオン交換樹脂層4を前洗浄し、排液22を
排出する。加熱器8による加温を行った場合はアニオン
交換樹脂層4も加温される。When the anion exchange resin layer 4 is saturated with boron, the supply of the pretreatment water 14 is stopped, the ion exchange step is completed, and the process proceeds to the precleaning step. During this time, the raw water 11 may be stopped, or the pretreatment water may be stored in the pretreatment water tank 2 by continuing the liquid supply. Further, the treated water in the treated water tank 5 may be sent to the desalination device 6 to continue the desalination. In the pre-cleaning step, after draining the ion exchange device 3, or without performing it, pure water 21 in the pure water tank 7 is sent as pre-cleaning water, and if necessary, heated to 40 to 60 ° C. by the heater 8 to perform ion exchange. The raw water in the ion exchange device 3 is introduced into the device 3, and the raw water in the ion exchange device 3 is replaced with pure water, which is pre-cleaning water. When heating is performed by the heater 8, the anion exchange resin layer 4 is also heated.
【0026】前洗浄水の供給を停止して前洗浄工程を終
了したのち、再生工程に移る。再生工程はアルカリ水溶
液23を供給し、必要により加熱器9で40〜60℃に
加温してイオン交換装置3に導入し、アニオン交換樹脂
層4を通過させて、交換吸着したホウ素その他のアニオ
ンを溶離させ、排液22を排出する。これによりアニオ
ン交換樹脂層4はOH形に再生される。加熱器9により
加温を行った場合には、シリカの溶離も効率よく行わ
れ、再生効率が高くなる。アルカリ水溶液23による薬
注を行った後、純水21を薬注の場合と同流量送って押
出を行い、その後流速を上げて洗浄を行う。After stopping the supply of the pre-cleaning water and completing the pre-cleaning step, the process proceeds to the regeneration step. In the regeneration step, an alkaline aqueous solution 23 is supplied, and if necessary, the mixture is heated to 40 to 60 ° C. by the heater 9 and introduced into the ion exchange device 3, passed through the anion exchange resin layer 4, and exchange-adsorbed boron and other anions. And the drainage liquid 22 is discharged. Thereby, the anion exchange resin layer 4 is regenerated to the OH form. When heating is performed by the heater 9, the silica is eluted efficiently and the regeneration efficiency is increased. After the chemical injection with the alkaline aqueous solution 23, the extruding is performed by feeding the pure water 21 at the same flow rate as in the case of the chemical injection, and then the cleaning is performed by increasing the flow rate.
【0027】再生工程の終了後、イオン交換装置3のイ
オン交換工程を再開する。この場合、前洗浄工程によ
り、アニオン交換樹脂層4の樹脂の周囲に存在する原水
が純水で置換されて硬度成分が存在しないため、アルカ
リ水溶液による再生を行っても水酸化マグネシウム等の
不溶性物質の析出はなく、圧力損失の上昇はない。この
ため再開後のイオン交換も効率よく行われ、ホウ素が高
除去率で除去される。また洗浄および再生工程において
加温を行った場合にはシリカが溶離して再生効率が高く
なっているためホウ素除去率は高くなる。イオン交換工
程ではイオン交換装置3の処理水15または16を前処
理水槽2に戻さないで処理を行うことにより、ホウ素除
去率を高く維持することができる。After the end of the regeneration step, the ion exchange step of the ion exchange device 3 is restarted. In this case, since the pre-washing step replaces the raw water present around the resin of the anion exchange resin layer 4 with pure water and has no hardness component, even if the regeneration is performed with an aqueous alkali solution, an insoluble substance such as magnesium hydroxide is used. No precipitation and no increase in pressure loss. For this reason, ion exchange after restart is also performed efficiently, and boron is removed at a high removal rate. Further, when heating is performed in the washing and regeneration steps, silica is eluted and the regeneration efficiency is high, so that the boron removal rate is high. In the ion exchange step, by performing the treatment without returning the treated water 15 or 16 of the ion exchange device 3 to the pretreatment water tank 2, the boron removal rate can be maintained high.
【0028】上記の方法において、前処理装置1として
は膜分離装置に代えて凝集分離装置、濾過装置などの不
純物除去手段を採用することができる。また脱塩装置6
についてもイオン交換装置その他の脱塩手段を採用する
ことができる。In the above method, as the pretreatment device 1, an impurity removing means such as a coagulation separation device or a filtration device can be adopted instead of the membrane separation device. Desalination device 6
Also, an ion exchange device and other desalting means can be employed.
【0029】[0029]
【実施例】以下、本発明の実施例および比較例について
説明する。以下の実施例および比較例では表1の水質の
ホウ素含有水を用いて処理を行った。EXAMPLES Examples of the present invention and comparative examples will be described below. In the following Examples and Comparative Examples, treatment was performed using the water-containing boron-containing water shown in Table 1.
【0030】[0030]
【表1】 [Table 1]
【0031】実施例1 イオン交換工程として表1に示す水質の原水(ホウ素含
有水)をOH形のアニオン交換樹脂層にSV7.5hr
-1で通水してホウ素を交換吸着させた。アニオン交換樹
脂がホウ素で飽和した段階でイオン交換工程を終了して
洗浄工程に移り、50℃の純水をSV7.5hr-1で2
0分間通水して洗浄を行った。その後再生工程に移り、
50℃の4%水酸化ナトリウム水溶液をSV3hr-1で
20分間通液して薬注を行い、次に50℃の純水をSV
3hr-1で20分間通水して押出を行い、さらに常温の
純水をSV6hr-1で20分間通水して洗浄を行い再生
工程を終了した。その後イオン交換工程を再開して上記
原水を供給してホウ素の除去を行った。このときの処理
水の圧力損失(Δp)の変化を図2に示し、ホウ素濃度
の変化を図3に示した。Example 1 In the ion exchange step, raw water having a quality shown in Table 1 (boron-containing water) was applied to the OH type anion exchange resin layer by SV7.5 hr.
Water was passed at -1 to exchange and adsorb boron. At the stage when the anion exchange resin is saturated with boron, the ion exchange process is completed and the process is shifted to the washing process, and pure water at 50 ° C. is added at SV 7.5 hr −1 for 2 hours.
Washing was performed by passing water for 0 minutes. Then move on to the regeneration process,
A 4% aqueous solution of sodium hydroxide at 50 ° C. was passed through the system at SV 3 hr −1 for 20 minutes to perform chemical injection, and then pure water at 50 ° C. was added to the SV.
Perform extrusion was 20 minutes through the water at 3 hr -1, to complete the regeneration process was washed further with pure water at room temperature for 20 minutes through the water at SV6hr -1. Thereafter, the ion exchange step was restarted and the raw water was supplied to remove boron. FIG. 2 shows a change in the pressure loss (Δp) of the treated water at this time, and FIG. 3 shows a change in the boron concentration.
【0032】比較例1 実施例1において前洗浄を行わないで再生を行った場合
の圧力損失(Δp)の変化を図2に示す。Comparative Example 1 FIG. 2 shows changes in pressure loss (Δp) when regeneration was performed without performing pre-cleaning in Example 1.
【0033】実施例2 実施例1において、処理水の全部をイオン交換装置に循
環してイオン交換を行った場合の処理水ホウ素濃度の変
化を図3に示す。Example 2 FIG. 3 shows a change in the concentration of boron in treated water when ion-exchange is performed by circulating all of the treated water in the ion exchange device in Example 1.
【0034】実施例3 実施例2において前洗浄水の加温を行わなかった場合の
処理水ホウ素濃度の変化を図3に示す。Example 3 FIG. 3 shows the change in the concentration of treated water boron when the pre-cleaning water was not heated in Example 2.
【0035】図2の結果より、前洗浄を行わないで再生
した場合(比較例1)は圧力損失の上昇が大きくてイオ
ン交換の続行が困難になるが、前洗浄した後に再生した
場合(実施例1)は圧力損失の上昇はなく、イオン交換
の継続が可能であることがわかる。また図3の結果よ
り、イオン交換工程における処理水をそのイオン交換工
程に戻す場合(実施例2、3)に比べて処理水を戻さな
い場合(実施例1)の方がホウ素濃度の上昇は少なく、
また前洗浄における加温を行わない場合(実施例3)に
比べて加温を行う場合(実施例2)の方がホウ素濃度の
上昇が少ないことがわかる。From the results shown in FIG. 2, it can be seen that in the case of regenerating without pre-cleaning (Comparative Example 1), the increase in pressure loss is so great that it is difficult to continue ion exchange. Example 1) shows no increase in pressure loss, indicating that ion exchange can be continued. Further, from the results of FIG. 3, the increase in the boron concentration is higher in the case where the treated water is not returned (Example 1) than in the case where the treated water in the ion exchange step is returned to the ion exchange step (Examples 2 and 3). Less,
Also, it can be seen that the increase in the boron concentration is smaller when heating is performed (Example 2) than when heating is not performed in the pre-cleaning (Example 3).
【図1】実施形態の処理方法のフロー図である。FIG. 1 is a flowchart of a processing method according to an embodiment.
【図2】実施例と比較例におけるΔpの変化を示すグラ
フである。FIG. 2 is a graph showing a change in Δp in an example and a comparative example.
【図3】実施例におけるホウ素濃度の変化を示すグラフ
である。FIG. 3 is a graph showing a change in boron concentration in an example.
1 前処理装置 2 前処理水槽 3 イオン交換装置 4 アニオン交換樹脂層 5 処理水槽 6 脱塩装置 7 純水槽 8、9 加熱器 REFERENCE SIGNS LIST 1 pretreatment device 2 pretreatment water tank 3 ion exchange device 4 anion exchange resin layer 5 treatment water tank 6 desalination device 7 pure water tank 8, 9 heater
Claims (3)
させてホウ素を交換吸着させるイオン交換工程と、 ホウ素を交換吸着したアニオン交換樹脂を純水と接触さ
せて前洗浄する前洗浄工程と、 前洗浄を行ったアニオン交換樹脂をアルカリ水溶液と接
触させて再生する再生工程とを含むホウ素含有水の処理
方法。An ion exchange step of exchanging and adsorbing boron by bringing boron-containing water into contact with an anion exchange resin; a pre-washing step of pre-washing the anion exchange resin having adsorbed and adsorbed boron with pure water; A regenerating step of regenerating the washed anion exchange resin by bringing the anion exchange resin into contact with an aqueous alkali solution, the method comprising the steps of:
である請求項1記載の方法。2. The temperature of pure water in the pre-cleaning step is 40 to 60 ° C.
The method of claim 1, wherein
〜60℃である請求項1または2記載の方法。3. The method according to claim 1, wherein the alkaline aqueous solution in the regeneration step
The method according to claim 1 or 2, wherein the temperature is -60 ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000034355A JP2001219163A (en) | 2000-02-07 | 2000-02-07 | Treatment method of boron-containing water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000034355A JP2001219163A (en) | 2000-02-07 | 2000-02-07 | Treatment method of boron-containing water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001219163A true JP2001219163A (en) | 2001-08-14 |
Family
ID=18558713
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000034355A Pending JP2001219163A (en) | 2000-02-07 | 2000-02-07 | Treatment method of boron-containing water |
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| Country | Link |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009240891A (en) * | 2008-03-31 | 2009-10-22 | Japan Organo Co Ltd | Method for producing ultrapure water |
| JP2010234297A (en) * | 2009-03-31 | 2010-10-21 | Kurita Water Ind Ltd | Ion exchange resin regeneration method and ultrapure water production apparatus |
| JP2011218311A (en) * | 2010-04-12 | 2011-11-04 | Toshiba Corp | Water supply device for ion exchange apparatus and steam turbine plant with the same, and method for supplying water of ion exchange apparatus |
| US11180386B1 (en) * | 2016-06-09 | 2021-11-23 | Paul Charles Wegner | Process for regenerating resin in an ion exchange vessel |
| JP2023009492A (en) * | 2021-07-07 | 2023-01-20 | オルガノ株式会社 | Adjustment method of anion exchange resin |
-
2000
- 2000-02-07 JP JP2000034355A patent/JP2001219163A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009240891A (en) * | 2008-03-31 | 2009-10-22 | Japan Organo Co Ltd | Method for producing ultrapure water |
| JP2010234297A (en) * | 2009-03-31 | 2010-10-21 | Kurita Water Ind Ltd | Ion exchange resin regeneration method and ultrapure water production apparatus |
| JP2011218311A (en) * | 2010-04-12 | 2011-11-04 | Toshiba Corp | Water supply device for ion exchange apparatus and steam turbine plant with the same, and method for supplying water of ion exchange apparatus |
| US11180386B1 (en) * | 2016-06-09 | 2021-11-23 | Paul Charles Wegner | Process for regenerating resin in an ion exchange vessel |
| JP2023009492A (en) * | 2021-07-07 | 2023-01-20 | オルガノ株式会社 | Adjustment method of anion exchange resin |
| JP7662436B2 (en) | 2021-07-07 | 2025-04-15 | オルガノ株式会社 | How to prepare anion exchange resin |
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