[go: up one dir, main page]

JP2001216841A - Conductive partiulates and conductive connecting fabric - Google Patents

Conductive partiulates and conductive connecting fabric

Info

Publication number
JP2001216841A
JP2001216841A JP2000230889A JP2000230889A JP2001216841A JP 2001216841 A JP2001216841 A JP 2001216841A JP 2000230889 A JP2000230889 A JP 2000230889A JP 2000230889 A JP2000230889 A JP 2000230889A JP 2001216841 A JP2001216841 A JP 2001216841A
Authority
JP
Japan
Prior art keywords
fine particles
conductive fine
conductive
weight
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000230889A
Other languages
Japanese (ja)
Other versions
JP2001216841A5 (en
Inventor
Yasuhiko Nagai
康彦 永井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP2000230889A priority Critical patent/JP2001216841A/en
Publication of JP2001216841A publication Critical patent/JP2001216841A/en
Publication of JP2001216841A5 publication Critical patent/JP2001216841A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide soft conductive particulates used as a conductive material for conductive adhesive, anisotropic conductive adhesive and anisotropic conductive sheet that have softness, without damaging the board on which micro devices are mounted and its wiring, and an conductive connecting fabric composed of them. SOLUTION: The conductive particulates are formed an conductive layer on surface of base-material particles, and when the electroconductive corpuscles were deformed 10% at the loading rate of 0.28 mN/sec in a compression test, 10%K value is less than E Mpa expressed by the following formula 1, where in the formula, D denotes particle diameter of the conductive particulates.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、マイクロ素子実装
用の導電接着剤、異方性導電接着剤、又は、異方性導電
シート等の導電材料として用いられる導電性微粒子及び
それを用いてなる導電接続構造体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to conductive fine particles used as a conductive material such as a conductive adhesive for mounting a micro element, an anisotropic conductive adhesive, or an anisotropic conductive sheet. The present invention relates to a conductive connection structure.

【0002】[0002]

【従来の技術】エレクトロニクス実装分野では、一対の
微細電極を接続するために、金、銀、ニッケル等の金属
粒子とバインダー樹脂とを混合して導電性ペーストを調
製し、このペーストを相対する微細電極間に充填するこ
とにより微細電極間を接続させることが行われている。
しかし、このような金属粒子は形状が不均一であり、か
つ、バインダー樹脂に比べて比重が大きいためにバイン
ダー樹脂中に均一に分散させることが困難であった。
2. Description of the Related Art In the field of electronic packaging, in order to connect a pair of fine electrodes, a conductive paste is prepared by mixing metal particles such as gold, silver and nickel and a binder resin. The connection between fine electrodes is performed by filling between the electrodes.
However, such metal particles have a non-uniform shape and a specific gravity greater than that of the binder resin, so that it has been difficult to uniformly disperse them in the binder resin.

【0003】導電性微粒子としては、粒子径が比較的揃
ったガラスビーズ、シリカビーズ等の無機粒子の表面
に、金属メッキ層を設けて導電性微粒子を形成すること
が知られている。しかしながら、上記無機粒子を基材と
する導電性微粒子は硬すぎるので、圧縮変形させること
が困難である。そのため、このような導電性微粒子を使
用して電極間を接続しようとすると導電性微粒子と電極
表面との接触面積が広がらず、接触抵抗を低減させるこ
とが困難である。
It is known that conductive fine particles are formed by providing a metal plating layer on the surface of inorganic particles such as glass beads and silica beads having a relatively uniform particle diameter. However, since the conductive fine particles based on the inorganic particles are too hard, they are difficult to compressively deform. Therefore, if an attempt is made to connect the electrodes using such conductive fine particles, the contact area between the conductive fine particles and the electrode surface does not increase, and it is difficult to reduce the contact resistance.

【0004】特開昭59−2815号公報には、粒子径
が比較的揃ったガラスビーズ、シリカビーズ、グラスフ
ァイバー等の粒子の表面に、金属メッキ層を設けて導電
性微粒子を形成することが開示されている。しかしなが
ら、上記の公報に開示された導電性微粒子は硬すぎるの
で、圧縮変形させることが困難である。そのため、この
導電性微粒子を使用して電極間を接続しようとすると導
電性微粒子と電極表面との接触面積が広がらず、接触抵
抗を低減させることが困難である。
Japanese Patent Application Laid-Open No. 59-2815 discloses that conductive particles are formed by providing a metal plating layer on the surface of particles such as glass beads, silica beads and glass fibers having a relatively uniform particle diameter. It has been disclosed. However, since the conductive fine particles disclosed in the above publication are too hard, they are difficult to compressively deform. Therefore, if an attempt is made to connect the electrodes using the conductive fine particles, the contact area between the conductive fine particles and the electrode surface does not increase, and it is difficult to reduce the contact resistance.

【0005】特開昭62−185749号公報及び特開
平1−225776号公報には、基材粒子としてポリフ
ェニレンスルフィド粒子やフェノール樹脂粒子等の有機
微粒子を用いた導電性微粒子が開示されている。しかし
ながら、このような合成樹脂粒子を基材粒子として用い
た導電性微粒子は、上記のガラスビーズ、シリカビー
ズ、グラスファイバー等に比べれば柔らかいものの、接
合する対象が有機フィルムである場合は、その基材を傷
つけてITO層にひびが入ることがあるという問題があ
った。また、電子材料へのダメージを低減するために、
より低荷重、低温度で電極間を圧着することができる接
合材料が要求されつつある。
JP-A-62-185749 and JP-A-1-225776 disclose conductive fine particles using organic fine particles such as polyphenylene sulfide particles and phenol resin particles as base particles. However, the conductive fine particles using such synthetic resin particles as the base particles are softer than the above-mentioned glass beads, silica beads, glass fibers, and the like. There is a problem that the material may be damaged and the ITO layer may be cracked. Also, to reduce damage to electronic materials,
There is a demand for a bonding material that can press-bond electrodes at a lower load and lower temperature.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上記に鑑
み、マイクロ素子実装の基板及びその配線を傷つけない
柔軟性を有し、かつ、優れた電気的接合、接続抵抗及び
接続信頼性を有する導電接着剤、異方性導電接着剤、異
方性導電シートの導電材料として用いられる柔軟な導電
性微粒子及びそれを用いてなる導電接続構造体を提供す
ることを目的とする。
SUMMARY OF THE INVENTION In view of the above, the present invention has the flexibility of not damaging a substrate on which a microelement is mounted and its wiring, and has excellent electrical bonding, connection resistance and connection reliability. It is an object of the present invention to provide flexible conductive fine particles used as a conductive material for a conductive adhesive, an anisotropic conductive adhesive, and an anisotropic conductive sheet, and a conductive connection structure using the same.

【0007】[0007]

【課題を解決するための手段】本発明は、基材粒子の表
面に導電層が形成されてなる導電性微粒子であって、圧
縮試験において、荷重負荷速度0.28mN/secに
より上記導電性微粒子が10%変形した際、10%K値
が下記式(1)で表されるE MPa以下である導電性
微粒子である。 E=90D2 −1500D+7000(MPa) (1) 式中、Dは上記導電性微粒子の粒子径(μm)を表す。
なお、本明細書において、圧縮試験とは、特表平6−5
03180号公報記載の圧縮試験方法に準拠して行われ
るものである。以下に本発明を詳述する。
The present invention relates to conductive fine particles comprising a conductive layer formed on the surface of substrate particles, wherein the conductive fine particles are subjected to a load test at a load rate of 0.28 mN / sec in a compression test. Are conductive fine particles whose 10% K value is equal to or less than E MPa represented by the following formula (1) when deformed by 10%. E = 90D 2 -1500D + 7000 (MPa) (1) In the formula, D represents the particle diameter (μm) of the conductive fine particles.
In this specification, the compression test is defined as Table 6-5.
The test is performed in accordance with the compression test method described in JP-A-03180. Hereinafter, the present invention will be described in detail.

【0008】本発明の導電性微粒子は、圧縮試験におい
て、荷重負荷速度0.28mN/secにより導電性微
粒子が10%変形した際、10%K値が下記式(1)で
表されるE MPa以下であるものである。 E=90D2 −1500D+7000(MPa) (1) 式中、Dは導電性微粒子の粒子径(μm)を表す。本明
細書において、10%K値とは、下記式(2)で表され
る値である。 10%K値=(3/√2)・F・S-3/2・R-1/2(MPa) (2) 式中、Fは20℃、10%圧縮変形時における荷重値
(MPa×mm2 )を表し、Sは圧縮変形(mm)を表
し、Rは半径(mm)を表す。10%K値が小さい程、
変形が容易である。
In the compression test, when the conductive fine particles are deformed by 10% at a load rate of 0.28 mN / sec, the 10% K value of the conductive fine particles of the present invention is expressed by the following formula (1). It is the following. E = 90D 2 -1500D + 7000 (MPa) (1) In the formula, D represents the particle diameter (μm) of the conductive fine particles. In the present specification, the 10% K value is a value represented by the following formula (2). 10% K value = (3 / √2) · FS -3 / 2 · R -1/2 (MPa) (2) In the formula, F is a load value at 20 ° C. and 10% compressive deformation (MPa × mm 2 ), S represents compressive deformation (mm), and R represents radius (mm). The smaller the 10% K value,
Easy to deform.

【0009】導電性微粒子は通常、接続抵抗値を低減さ
せるために、圧縮した状態で使われるが、この時に低圧
力で変形し、かつ、上下の基板、素材を傷つけない柔ら
かさを有することが必要とされ、導電性微粒子の選択に
あたっては、その粒子強度が重要な因子となる。導電性
微粒子を歪めるのに必要な荷重が大きすぎると基材のフ
ィルム等に傷が付くことがある。
The conductive fine particles are usually used in a compressed state in order to reduce the connection resistance value. At this time, the conductive fine particles may be deformed by low pressure and have a softness that does not damage the upper and lower substrates and the material. When selecting conductive fine particles, the particle strength is an important factor. If the load required to distort the conductive fine particles is too large, the base film or the like may be damaged.

【0010】本発明の導電性微粒子の圧縮弾性率、及
び、破壊荷重は、特表平6−503180号公報記載の
圧縮試験方法に準拠して求められる。即ち、平滑表面を
有する鋼板の上に導電性微粒子を散布し、これを微少圧
縮試験器(島津製作所社製、PCT−200)の試料台
に乗せて、顕微鏡により1個の粒子を選ぶ。次に、室温
において、負荷荷重速度が0.28mN/sec、最大
試験荷重が20mNで、ダイヤモンド製の直径50μm
の円柱の平滑端面で導電性微粒子を圧縮した際の、10
%歪み時の圧縮弾性率(10%K値)、及び、導電性微
粒子が破壊したときの荷重を求める。
The compression elastic modulus and the breaking load of the conductive fine particles of the present invention can be determined in accordance with the compression test method described in Japanese Patent Publication No. 6-503180. That is, conductive fine particles are scattered on a steel plate having a smooth surface, and placed on a sample table of a micro compression tester (PCT-200, manufactured by Shimadzu Corporation), and one particle is selected by a microscope. Next, at room temperature, the applied load rate was 0.28 mN / sec, the maximum test load was 20 mN, and the diamond diameter was 50 μm.
When the conductive fine particles are compressed on the smooth end face of
The compression modulus (% K value) at the time of% strain and the load when the conductive fine particles are broken are obtained.

【0011】本発明において、更に、10%K値が下記
式(4)で表されるE’MPa以下であることが好まし
い。 E’=90D2 −1500D+6700(MPa) (4)
In the present invention, the 10% K value is preferably not more than E'MPa represented by the following formula (4). E ′ = 90D 2 −1500D + 6700 (MPa) (4)

【0012】なかでも、本発明の導電性微粒子が、粒子
径が10μmである場合は、10%K値が700MPa
以下であることが好ましい。圧縮変形率が10%のK値
が700MPaを超えると、低圧力では変形し難く、か
つ、上下の基板を傷つけてしまう。変形率10%のK値
の下限値は、基板の損傷という観点では特に制限されな
いが、実際の粒子の基材を考えると49MPa以下の導
電性微粒子を得ることは困難である。
In particular, when the conductive fine particles of the present invention have a particle diameter of 10 μm, the 10% K value is 700 MPa.
The following is preferred. If the K value at which the compressive deformation rate is 10% exceeds 700 MPa, it is difficult to deform under low pressure, and the upper and lower substrates are damaged. The lower limit of the K value at a deformation rate of 10% is not particularly limited from the viewpoint of damage to the substrate, but it is difficult to obtain conductive fine particles of 49 MPa or less in consideration of the actual base material of the particles.

【0013】本発明の導電性微粒子が、粒子径が10μ
mである場合は、更に、圧縮試験において、荷重負荷速
度0.28mN/secにより導電性微粒子を圧縮した
際、破壊歪みが30%以上であることが好ましい。本明
細書において、破壊歪みとは、上記微小圧縮試験器によ
る圧縮試験を行い、導電性微粒子が破壊した時点での導
電性微粒子の変形量に相関する値であり、下記式(3)
で示されるものである。 破壊歪み(%)=破壊時の変形量(L)/粒子径(D)×100 (3)
The conductive fine particles of the present invention have a particle diameter of 10 μm.
In the case of m, the breaking strain is preferably 30% or more when the conductive fine particles are compressed at a load applying speed of 0.28 mN / sec in a compression test. In the present specification, the breaking strain is a value correlated with the amount of deformation of the conductive fine particles at the time when the conductive fine particles are broken by performing a compression test using the above-mentioned micro-compression tester.
It is shown by. Breaking strain (%) = Amount of deformation at break (L) / particle diameter (D) × 100 (3)

【0014】導電性微粒子は、上下導通のために粒子径
の30%以上圧縮した状態で使われる場合が多く、この
際に導電性微粒子が破壊すると端子間の導通性能が低下
するので、導電性微粒子の破壊歪みは30%以上である
ことが好ましい。
The conductive fine particles are often used in a state of being compressed by 30% or more of the particle diameter for vertical conduction. At this time, if the conductive fine particles are broken, the conduction performance between terminals is reduced. The breaking strain of the fine particles is preferably 30% or more.

【0015】本発明の導電性微粒子は、Cv値が8以下
であることが好ましい。本明細書において、Cv値と
は、下記式(5)で表される値である。 Cv値=(σ/Dn)×100 (5) 式中、σは粒子径の標準偏差を表し、Dnは数平均粒子
径を表す。上記標準偏差及び数平均粒子径は、任意の導
電性微粒子300個を電子顕微鏡で観察・測定すること
により得られる値である。Cv値が8を超えると、粒子
径のばらつきが大きくなるので、導電性微粒子を介して
電極間を接続させる際に、接続に関与しない導電性微粒
子が多くなり、電極間でリーク現象が起こることがあ
る。より好ましくは5以下である。
The conductive fine particles of the present invention preferably have a Cv value of 8 or less. In the present specification, the Cv value is a value represented by the following equation (5). Cv value = (σ / Dn) × 100 (5) In the formula, σ represents the standard deviation of the particle diameter, and Dn represents the number average particle diameter. The standard deviation and the number average particle diameter are values obtained by observing and measuring 300 arbitrary conductive fine particles with an electron microscope. When the Cv value exceeds 8, the dispersion of the particle diameter becomes large, so that when connecting the electrodes via the conductive fine particles, the number of the conductive fine particles not involved in the connection increases, and a leak phenomenon occurs between the electrodes. There is. More preferably, it is 5 or less.

【0016】本発明の導電性微粒子は、上記の力学物性
を満足するものであれば特に限定されないが、物性的な
観点や製造の簡便さから、基材粒子の表面に導電層が形
成されてなる導電性微粒子であって、基材粒子は、有機
系重合体からなるものが好ましい。
The conductive fine particles of the present invention are not particularly limited as long as they satisfy the above-mentioned mechanical properties. However, from the viewpoint of physical properties and simplicity of production, a conductive layer is formed on the surface of the base particles. Preferably, the base particles are made of an organic polymer.

【0017】上記有機系重合体を構成する単量体として
は特に限定されず、例えば、エチレングリコールジ(メ
タ)アクリレート等のポリエチレングリコールジ(メ
タ)アクリレート、プロピレングリコールジ(メタ)ア
クリレート等のポリプロピレングリコールジ(メタ)ア
クリレート、ポリテトラメチレングリコールジ(メタ)
アクリレート、ネオペンチレングリコールジ(メタ)ア
クリレート、1,3−ブチレングリコールジ(メタ)ア
クリレート、2,2−ビス[4−(メタクリロキシエト
キシ)フェニル]プロパンジ(メタ)アクリレート等の
2,2−ビス[4−(メタクリロキシポリエトキシ)フ
ェニル]プロパンジ(メタ)アクリレート、2,2−水
添ビス[4−(アクリロキシポリエトキシ)フェニル]
プロパンジ(メタ)アクリレート、2,2−ビス[4−
(アクリロキシエトキシポリプロポキシ)フェニル]プ
ロパンジ(メタ)アクリレート;スチレン;α−メチル
スチレン、p−メチルスチレン、p−クロロスチレン、
クロロメチルスチレン等のスチレン誘導体;塩化ビニ
ル;酢酸ビニル、プロピオン酸ビニル等のビニルエステ
ル類;アクリロニトリル等の不飽和ニトリル類;(メ
タ)アクリル酸メチル、(メタ)アクリル酸エチル、
(メタ)アクリル酸ブチル、(メタ)アクリル酸2−エ
チルヘキシル、(メタ)アクリル酸ステアリル、エチレ
ングリコール(メタ)アクリレート、トリフルオロエチ
ル(メタ)アクリレート、ペンタフルオロプロピル(メ
タ)アクリレート、シクロヘキシル(メタ)アクリレー
ト等の(メタ)アクリル酸エステル誘導体;ブタジエ
ン、イソプレン等の共役ジエン類;ジビニルベンゼン、
1,6−ヘキサンジオールジ(メタ)アクリレート、ト
リメチロールプロパントリ(メタ)アクリレート、テト
ラメチロールメタントリ(メタ)アクリレート、テトラ
メチロールプロパンテトラ(メタ)アクリレート、ジア
リルフタレート及びその異性体、トリアリルイソシアヌ
レート及びその誘導体、トリメチロールプロパントリ
(メタ)アクリレート及びその誘導体、ペンタエリスリ
トールトリ(メタ)アクリレート、ペンタエリスリトー
ルテトラ(メタ)アクリレート、ジペンタエリスリトー
ルヘキサ(メタ)アクリレート、イソオクチル(メタ)
アクリレート、イソアミル(メタ)アクリレート等が挙
げられる。これら単量体は、単独で用いられてもよく、
2種以上が併用されてもよい。
The monomer constituting the organic polymer is not particularly restricted but includes, for example, polyethylene glycol di (meth) acrylate such as ethylene glycol di (meth) acrylate and polypropylene such as propylene glycol di (meth) acrylate. Glycol di (meth) acrylate, polytetramethylene glycol di (meth)
2,2- such as acrylate, neopentylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 2,2-bis [4- (methacryloxyethoxy) phenyl] propane di (meth) acrylate Bis [4- (methacryloxypolyethoxy) phenyl] propanedi (meth) acrylate, 2,2-hydrogenated bis [4- (acryloxypolyethoxy) phenyl]
Propanedi (meth) acrylate, 2,2-bis [4-
(Acryloxyethoxypolypropoxy) phenyl] propanedi (meth) acrylate; styrene; α-methylstyrene, p-methylstyrene, p-chlorostyrene,
Styrene derivatives such as chloromethylstyrene; vinyl chloride; vinyl esters such as vinyl acetate and vinyl propionate; unsaturated nitriles such as acrylonitrile; methyl (meth) acrylate, ethyl (meth) acrylate;
Butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, stearyl (meth) acrylate, ethylene glycol (meth) acrylate, trifluoroethyl (meth) acrylate, pentafluoropropyl (meth) acrylate, cyclohexyl (meth) (Meth) acrylate derivatives such as acrylates; conjugated dienes such as butadiene and isoprene; divinylbenzene;
1,6-hexanediol di (meth) acrylate, trimethylolpropanetri (meth) acrylate, tetramethylolmethanetri (meth) acrylate, tetramethylolpropanetetra (meth) acrylate, diallyl phthalate and its isomer, triallyl isocyanurate And its derivatives, trimethylolpropane tri (meth) acrylate and its derivatives, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, isooctyl (meth)
Acrylate, isoamyl (meth) acrylate and the like can be mentioned. These monomers may be used alone,
Two or more kinds may be used in combination.

【0018】上記基材粒子の表面に形成される導電層
は、導電性材料からなるものである。上記導電性材料と
しては特に限定されず、例えば、ニッケル、金、銀、
銅、コバルト、錫、インジウム、ITO、これらを主成
分とする合金等が挙げられる。これらは、単独で用いら
れてもよく、2種以上が併用されてもよい。
The conductive layer formed on the surface of the base particles is made of a conductive material. The conductive material is not particularly limited, for example, nickel, gold, silver,
Examples include copper, cobalt, tin, indium, ITO, and alloys containing these as main components. These may be used alone or in combination of two or more.

【0019】本発明の導電性微粒子の表面に導電層を形
成する方法としては特に限定されず、例えば、無電解メ
ッキによる方法、金属微粉を単独又はバインダーに混ぜ
合わせて得られるペーストを基材粒子にコーティングす
る方法;真空蒸着、イオンプレーティング、イオンスパ
ッタリング等の物理的蒸着方法等が挙げられる。
The method for forming a conductive layer on the surface of the conductive fine particles of the present invention is not particularly limited. For example, a method by electroless plating, a method in which a paste obtained by mixing metal fine powder alone or in a binder with a base particle is used. A physical vapor deposition method such as vacuum vapor deposition, ion plating, and ion sputtering.

【0020】上記無電解メッキ法による導電層の形成方
法を、金置換メッキの場合を例に挙げて、以下に説明す
る。金置換メッキは、エッチング工程、アクチベーショ
ン工程、化学ニッケルメッキ工程及び金置換メッキ工程
に分けられる。上記エッチング工程は、基材粒子の表面
に凹凸を形成させることによりメッキ層の基材粒子に対
する密着性を向上させるための前処理工程であり、エッ
チング液としては、例えば、カセイソーダ水溶液、濃塩
酸、濃硫酸又は無水クロム酸等が挙げられる。
A method for forming a conductive layer by the above electroless plating method will be described below with reference to the case of gold displacement plating as an example. Gold displacement plating is divided into an etching process, an activation process, a chemical nickel plating process, and a gold displacement plating process. The etching step is a pretreatment step for improving the adhesion of the plating layer to the base particles by forming irregularities on the surface of the base particles, and as an etching solution, for example, an aqueous solution of sodium hydroxide, concentrated hydrochloric acid, Examples thereof include concentrated sulfuric acid and chromic anhydride.

【0021】上記アクチベーション工程は、エッチング
された基材粒子の表面に触媒層を形成させると共に、こ
の触媒層を活性化させるための工程である。触媒層の活
性化により後述の化学ニッケルメッキ工程における金属
ニッケルの析出が促進される。基材粒子を触媒液に分散
させることにより、基材粒子表面のPd2+及びSn2+
含む触媒層が濃硫酸又は濃塩酸で処理され、Pd2+が金
属化され基材粒子表面に析出する。金属化されたパラジ
ウムは、カセイソーダ濃厚溶液等のパラジウム活性剤に
より活性化されて増感される。
The activation step is a step for forming a catalyst layer on the surface of the etched base particles and activating the catalyst layer. The activation of the catalyst layer promotes the deposition of metallic nickel in a chemical nickel plating step described below. By dispersing the base particles in the catalyst solution, the catalyst layer containing Pd 2+ and Sn 2+ on the surface of the base particles is treated with concentrated sulfuric acid or concentrated hydrochloric acid, and Pd 2+ is metallized to the surface of the base particles. Precipitates. The metallized palladium is activated and sensitized by a palladium activator such as a concentrated solution of sodium hydroxide.

【0022】上記化学ニッケルメッキ工程は、触媒層が
形成された基材粒子の表面に、更に金属ニッケル層を形
成させる工程であり、例えば、塩化ニッケルを次亜リン
酸ナトリウムによって還元し、ニッケルを基材粒子の表
面に析出させる。
The chemical nickel plating step is a step in which a metal nickel layer is further formed on the surface of the base particles on which the catalyst layer has been formed. For example, nickel chloride is reduced with sodium hypophosphite and nickel is reduced. Precipitates on the surface of the substrate particles.

【0023】上記金置換メッキ工程では、以上のように
してニッケルが被覆された基材粒子を金シアン化カリウ
ム溶液に入れ、昇温させながらニッケルを溶出させ、金
を基材粒子表面に析出させる。
In the gold displacement plating step, the base particles coated with nickel as described above are placed in a potassium gold cyanide solution, and while the temperature is raised, nickel is eluted to deposit gold on the surface of the base particles.

【0024】上記導電層の厚み(導電層が複数層からな
る場合は、それらを合わせた厚み)は0.02〜5μm
であるのが好ましい。導電層の厚みが0.02μm未満
であると、所望の導電性が得られ難く、5μmを超える
と製造時に導電性微粒子同士の凝集が起こりやすくなる
と共に、導電性微粒子を相対する電極間に挟んで両電極
を加圧する際に、導電性微粒子の柔軟性が有効に発現さ
れ難くなってしまう。
The thickness of the conductive layer (when the conductive layer is composed of a plurality of layers, the combined thickness) is 0.02 to 5 μm.
It is preferred that When the thickness of the conductive layer is less than 0.02 μm, desired conductivity is hardly obtained. When the thickness exceeds 5 μm, aggregation of the conductive fine particles easily occurs at the time of production, and the conductive fine particles are sandwiched between the opposing electrodes. Therefore, when both electrodes are pressurized, the flexibility of the conductive fine particles is hardly effectively exhibited.

【0025】上記基材粒子は、平均粒子径が1〜20μ
mであることが好ましい。平均粒子径が1μm未満であ
ると、得られる導電性微粒子の粒子径が小さすぎて、電
極間を接続する際に、良好な接続が得られず導通不良を
起こしやすくなり、20μmを超えると、得られる導電
性微粒子の粒子径が大きすぎて、隣接する電極間でリー
クが起こったり、バインダーに混ぜる場合に、沈降しや
すく、均一な導電接着剤が作りにくいという問題が発生
しやすくなる。
The base particles have an average particle diameter of 1 to 20 μm.
m is preferable. When the average particle diameter is less than 1 μm, the particle diameter of the obtained conductive fine particles is too small, and when connecting between the electrodes, good connection is not easily obtained and poor conduction is likely to occur. When the particle diameter of the obtained conductive fine particles is too large, when a leak occurs between adjacent electrodes or when the conductive fine particles are mixed with a binder, the problem is liable to settle, and it is difficult to form a uniform conductive adhesive.

【0026】本発明の導電性微粒子は、回復率が30%
以上であることが好ましい。本明細書において、回復率
とは、上記の圧縮弾性率(10%K値)等を測定する際
に用いるのと同様の微小圧縮試験器(島津製作所社製、
PCT−200)を用い、荷重負荷速度0.28mN/
sec、原点荷重値1.0mN、反転荷重値10mNの
条件下で、ダイヤモンド製の直径50μmの円柱の平滑
端面で、得られた導電性微粒子を圧縮した際の復元率で
ある。回復率が30%未満であると、基材粒子が重合体
微粒子である場合、得られた導電性微粒子が変形等する
ことにより接続不良が起きる場合がある。より好ましく
は40%以下である。
The conductive fine particles of the present invention have a recovery rate of 30%
It is preferable that it is above. In the present specification, the recovery rate refers to a micro-compression tester (manufactured by Shimadzu Corporation) similar to that used for measuring the above-mentioned compression modulus (10% K value) and the like.
PCT-200) and a load speed of 0.28 mN /
sec, the restoration rate when the obtained conductive fine particles were compressed on the smooth end face of a diamond-made cylinder having a diameter of 50 μm under the conditions of an origin load value of 1.0 mN and a reversal load value of 10 mN. When the recovery rate is less than 30%, when the base particles are polymer fine particles, the obtained conductive fine particles may be deformed or the like, resulting in poor connection. It is more preferably at most 40%.

【0027】本発明の導電性微粒子は、接続抵抗値を低
減させるために導電性微粒子を変形させるのに必要な荷
重値を一定の値以下に制御することにより、マイクロ素
子実装のフィルム基板及びその配線を傷つけない柔軟性
を有し、かつ、優れた電気的接合、接続抵抗及び接続信
頼性を有する。
The conductive fine particles of the present invention provide a film substrate on which a micro element is mounted by controlling a load value required for deforming the conductive fine particles to reduce the connection resistance value to a certain value or less. It has flexibility not to damage wiring, and has excellent electrical connection, connection resistance and connection reliability.

【0028】本発明の導電性微粒子は、マイクロ素子実
装用の導電接着剤、異方性導電接着剤、異方性導電シー
ト等の導電材料として用いられ、基板又は部品の接合に
用いられる。
The conductive fine particles of the present invention are used as a conductive material such as a conductive adhesive for mounting microelements, an anisotropic conductive adhesive, and an anisotropic conductive sheet, and are used for bonding substrates or parts.

【0029】上記基板又は部品の接合方法としては、導
電性微粒子を用いて接合する方法であれば特に限定され
ず、例えば、以下のような方法等が挙げられる。 (1)表面に電極が形成された基板又は部品の上に、異
方性導電シートを載せた後、もう一方の電極面を有する
基板又は部品を置き、加熱、加圧して接合する方法。 (2)異方性導電シートを用いる代わりに、スクリーン
印刷やディスペンサー等の手段で異方性導電接着剤を供
給し接合する方法。 (3)導電性微粒子を介して張り合わせた二つの電極部
の間隙に液状のバインダーを供給した後で硬化させて接
合する方法。
The method of joining the above-mentioned substrate or component is not particularly limited as long as it is a method of joining using conductive fine particles, and examples thereof include the following methods. (1) A method in which an anisotropic conductive sheet is placed on a substrate or component having an electrode formed on its surface, and then a substrate or component having the other electrode surface is placed and heated and pressed for joining. (2) A method in which anisotropic conductive adhesive is supplied and joined by means such as screen printing or a dispenser instead of using an anisotropic conductive sheet. (3) A method in which a liquid binder is supplied to a gap between two electrode portions bonded together via conductive fine particles, followed by curing and bonding.

【0030】上記のようにして基板又は部品の接合体、
即ち、導電接続構造体を得ることができる。本発明の導
電性微粒子を用いてなる導電接続構造体もまた、本発明
の1つである。
As described above, a joined body of substrates or parts,
That is, a conductive connection structure can be obtained. A conductive connection structure using the conductive fine particles of the present invention is also one of the present invention.

【0031】[0031]

【実施例】以下に実施例を掲げて本発明を更に詳しく説
明するが、本発明はこれら実施例のみに限定されるもの
ではない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

【0032】〔実施例1〜8及び比較例1〜4〕 (実施例1)セパラブルフラスコ反応器に、ポリテトラ
メチレングリコールジアクリレート10重量部、イソオ
クチルアクリレート10重量部、重合開始剤として過酸
化ベンゾイル1.3重量部を入れ均一に混合した。次
に、ポリビニルアルコール(クラレ社製)の3%水溶液
20重量部、ドデシル硫酸ナトリウム0.5重量部を加
えよく攪拌した後、イオン交換水140重量部を添加し
た。得られた溶液を攪拌しながら窒素気流下、80℃で
15時間反応を行った。得られた微粒子を熱水及びアセ
トンにて洗浄後、分級操作を行い、平均粒子径10μm
の基材粒子を得た。この基材粒子にメッキ処理を行い、
ニッケル層850Å、金層400Åの導電性微粒子を得
た。得られた導電性微粒子の任意の400個の粒子径を
電子顕微鏡にて測定し、平均粒子径及び粒子径分布を求
めた。得られた値を表1に示した。
Examples 1 to 8 and Comparative Examples 1 to 4 Example 1 In a separable flask reactor, 10 parts by weight of polytetramethylene glycol diacrylate, 10 parts by weight of isooctyl acrylate, and a polymerization initiator were used. 1.3 parts by weight of benzoyl oxide was added and mixed uniformly. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were added, and after stirring well, 140 parts by weight of ion-exchanged water was added. The resulting solution was reacted at 80 ° C. for 15 hours under a nitrogen stream while stirring. After the obtained fine particles were washed with hot water and acetone, a classification operation was performed, and the average particle diameter was 10 μm.
Was obtained. Perform plating on the substrate particles,
Conductive fine particles of nickel layer 850% and gold layer 400% were obtained. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0033】(実施例2)実施例1と同様の組成により
重合を行い、分級操作により平均粒子径5μmの基材粒
子を得た。この基材粒子にメッキ処理を行い、ニッケル
層680Å、金層400Åの導電性微粒子を得た。得ら
れた導電性微粒子の任意の400個の粒子径を電子顕微
鏡にて測定し、平均粒子径及び粒子径分布を求めた。得
られた値を表1に示した。
(Example 2) Polymerization was carried out in the same composition as in Example 1, and base particles having an average particle diameter of 5 µm were obtained by a classification operation. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 680% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0034】(実施例3)実施例1と同様の組成により
重合を行い、分級操作により平均粒子径3μmの基材粒
子を得た。この基材粒子にメッキ処理を行い、ニッケル
層770Å、金層300Åの導電性微粒子を得た。得ら
れた導電性微粒子の任意の400個の粒子径を電子顕微
鏡にて測定し、平均粒子径及び粒子径分布を求めた。得
られた値を表1に示した。
Example 3 Polymerization was carried out in the same composition as in Example 1, and base particles having an average particle diameter of 3 μm were obtained by a classification operation. The base particles were plated to obtain conductive fine particles of a nickel layer 770% and a gold layer 300%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0035】(実施例4) [種粒子の合成]ポリビニルピロリドン(重量平均分子
量3万、和光純薬社製:K−30)18重量部、エアロ
ゾルOT(和光純薬社製)2.9重量部、及び、アゾビ
スメチルバレロニトリル(和光純薬社製)20重量部
を、メタノール350重量部と水50重量部との混合液
に溶解させた後、攪拌しながら窒素気流下でスチレン9
0重量部、α−メチルスチレン10重量部を加えた。こ
の後60℃に昇温して24時間重合を行い種粒子を得
た。この種粒子の平均粒子径は2.5μmであった。
Example 4 [Synthesis of Seed Particles] 18 parts by weight of polyvinylpyrrolidone (weight average molecular weight 30,000, manufactured by Wako Pure Chemical Industries, Ltd .: K-30), 2.9 parts by weight of Aerosol OT (manufactured by Wako Pure Chemical Industries, Ltd.) And 20 parts by weight of azobismethylvaleronitrile (manufactured by Wako Pure Chemical Industries, Ltd.) are dissolved in a mixture of 350 parts by weight of methanol and 50 parts by weight of water.
0 parts by weight and 10 parts by weight of α-methylstyrene were added. Thereafter, the temperature was raised to 60 ° C. and polymerization was performed for 24 hours to obtain seed particles. The average particle size of the seed particles was 2.5 μm.

【0036】[基材粒子の合成]上記種粒子4重量部
に、イオン交換水200重量部とラウリル硫酸ナトリウ
ム0.2重量部とを加え均一に分散させた後、ポリテト
ラメチレングリコールジアクリレート110重量部、イ
ソオクチルアクリレート110重量部及び過酸化ベンゾ
イル12重量部を混合してホモジナイザーで分散させて
微分散乳化した。得られた乳化液を種粒子の分散液に加
え、25℃、100rpmの回転数で12時間攪拌して
種粒子に吸収させた。この分散液にポリビニルアルコー
ルの5重量%の水溶液を200重量部加えた後、窒素気
流下、80℃で12時間重合を行った。得られた分散液
から遠心分離により微粒子を取り出し、熱水及びアセト
ンで分散剤を完全に洗浄した後乾燥し、基材粒子を得
た。得られた基材粒子は平均粒子径10μmであった。
この基材粒子にメッキ処理を行い、ニッケル層850
Å、金層400Åの導電性微粒子を得た。得られた導電
性微粒子の任意の400個の粒子径を電子顕微鏡にて測
定し、平均粒子径及び粒子径分布を求めた。得られた値
を表1に示した。
[Synthesis of Base Particles] To 4 parts by weight of the above seed particles, 200 parts by weight of ion-exchanged water and 0.2 parts by weight of sodium lauryl sulfate were added and uniformly dispersed, and then polytetramethylene glycol diacrylate 110 was added. Parts by weight, 110 parts by weight of isooctyl acrylate and 12 parts by weight of benzoyl peroxide were mixed and dispersed with a homogenizer to finely disperse and emulsify. The obtained emulsion was added to the dispersion of the seed particles, and the mixture was stirred at 25 ° C. and a rotation speed of 100 rpm for 12 hours to be absorbed by the seed particles. After 200 parts by weight of a 5% by weight aqueous solution of polyvinyl alcohol was added to this dispersion, polymerization was carried out at 80 ° C. for 12 hours under a nitrogen stream. Fine particles were taken out from the obtained dispersion by centrifugation, and the dispersant was completely washed with hot water and acetone and then dried to obtain base particles. The obtained base particles had an average particle size of 10 μm.
The base particles are subjected to a plating treatment to form a nickel layer 850.
{, Conductive fine particles of gold layer 400} were obtained. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0037】(実施例5)セパラブルフラスコ反応器
に、ポリテトラメチレングリコールジアクリレート20
重量部、重合開始剤として過酸化ベンゾイル1.3重量
部を入れ均一に混合した。次に、ポリビニルアルコール
(クラレ社製)の3%水溶液20重量部、ドデシル硫酸
ナトリウム0.5重量部を加えよく攪拌した後、イオン
交換水140重量部を添加した。得られた溶液を攪拌し
ながら窒素気流下、80℃で15時間反応を行った。得
られた微粒子を熱水及びアセトンにて洗浄後、分級操作
を行い、平均粒子径10μmの基材粒子を得た。この基
材粒子にメッキ処理を行い、ニッケル層850Å、金層
400Åの導電性微粒子を得た。得られた導電性微粒子
の任意の400個の粒子径を電子顕微鏡にて測定し、平
均粒子径及び粒子径分布を求めた。得られた値を表1に
示した。
Example 5 A polytetramethylene glycol diacrylate 20 was placed in a separable flask reactor.
Parts by weight and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were added and uniformly mixed. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were added, and after stirring well, 140 parts by weight of ion-exchanged water was added. The resulting solution was reacted at 80 ° C. for 15 hours under a nitrogen stream while stirring. After the obtained fine particles were washed with hot water and acetone, classification operation was performed to obtain base particles having an average particle diameter of 10 μm. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 850% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0038】(実施例6)実施例5と同様の組成により
重合を行い、分級操作により平均粒子径5μmの基材粒
子を得た。この基材粒子にメッキ処理を行い、ニッケル
層680Å、金層400Åの導電性微粒子を得た。得ら
れた導電性微粒子の任意の400個の粒子径を電子顕微
鏡にて測定し、平均粒子径及び粒子径分布を求めた。得
られた値を表1に示した。
Example 6 Polymerization was carried out in the same composition as in Example 5, and base particles having an average particle diameter of 5 μm were obtained by a classification operation. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 680% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0039】(実施例7)セパラブルフラスコ反応器
に、NKエステルAPG700(新中村化学工業社製)
10重量部、イソオクチルアクリレート10重量部、重
合開始剤として過酸化ベンゾイル1.3重量部を入れ均
一に混合した。次に、ポリビニルアルコール(クラレ社
製)の3%水溶液20重量部、ドデシル硫酸ナトリウム
0.5重量部を加えよく攪拌した後、イオン交換水14
0重量部を添加した。得られた溶液を攪拌しながら窒素
気流下、80℃で15時間反応を行った。得られた微粒
子を熱水及びアセトンにて洗浄後、分級操作を行い、平
均粒子径10μmの粒子を得た。この粒子にメッキ処理
を行い、ニッケル層850Å、金層400Åの導電性微
粒子を得た。得られた導電性微粒子の任意の400個の
粒子径を電子顕微鏡にて測定し、平均粒子径及び粒子径
分布を求めた。得られた値を表1に示した。
(Example 7) NK ester APG700 (manufactured by Shin-Nakamura Chemical Co., Ltd.) was placed in a separable flask reactor.
10 parts by weight, 10 parts by weight of isooctyl acrylate, and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were uniformly mixed. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 parts by weight of sodium dodecyl sulfate were added and stirred well.
0 parts by weight were added. The resulting solution was reacted at 80 ° C. for 15 hours under a nitrogen stream while stirring. After the obtained fine particles were washed with hot water and acetone, classification operation was performed to obtain particles having an average particle diameter of 10 μm. The particles were plated to obtain conductive fine particles of a nickel layer 850% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0040】(実施例8)セパラブルフラスコ反応器
に、イソオクチルアクリレート20重量部、重合開始剤
として過酸化ベンゾイル1.3重量部を入れ均一に混合
した。次に、ポリビニルアルコール(クラレ社製)の3
%水溶液20重量部、ドデシル硫酸ナトリウム0.5重
量部を加えよく攪拌した後、イオン交換水140重量部
を添加した。得られた溶液を攪拌しながら窒素気流下、
80℃で15時間反応を行った。得られた微粒子を熱水
及びアセトンにて洗浄後、分級操作を行い、平均粒子径
5μmの基材粒子を得た。この基材粒子にメッキ処理を
行い、ニッケル層680Å、金層400Åの導電性微粒
子を得た。得られた導電性微粒子の任意の400個の粒
子径を電子顕微鏡にて測定し、平均粒子径及び粒子径分
布を求めた。得られた値を表1に示した。
Example 8 In a separable flask reactor, 20 parts by weight of isooctyl acrylate and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were charged and uniformly mixed. Next, polyvinyl alcohol (Kuraray Co., Ltd.)
% Aqueous solution and 0.5 parts by weight of sodium dodecyl sulfate were added and stirred well, and then 140 parts by weight of ion exchanged water was added. While stirring the obtained solution under a nitrogen stream,
The reaction was performed at 80 ° C. for 15 hours. After the obtained fine particles were washed with hot water and acetone, a classification operation was performed to obtain base particles having an average particle diameter of 5 μm. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 680% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0041】(比較例1)セパラブルフラスコ反応器
に、ジビニルベンゼン20重量部、重合開始剤として過
酸化ベンゾイル1.3重量部を入れ均一に混合した。次
に、ポリビニルアルコール(クラレ社製)の3%水溶液
20重量部、ドデシル硫酸ナトリウム0.5重量部を加
えよく攪拌した後、イオン交換水140重量部を添加し
た。得られた溶液を攪拌しながら窒素気流下、80℃で
15時間反応を行った。得られた微粒子を熱水及びアセ
トンにて洗浄後、分級操作を行い、平均粒子径5μmの
基材粒子を得た。この基材粒子にメッキ処理を行い、ニ
ッケル層850Å、金層400Åの導電性微粒子を得
た。得られた導電性微粒子の任意の400個の粒子径を
電子顕微鏡にて測定し、平均粒子径及び粒子径分布を求
めた。得られた値を表1に示した。
Comparative Example 1 In a separable flask reactor, 20 parts by weight of divinylbenzene and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were uniformly mixed. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were added, and after stirring well, 140 parts by weight of ion-exchanged water was added. The resulting solution was reacted at 80 ° C. for 15 hours under a nitrogen stream while stirring. After the obtained fine particles were washed with hot water and acetone, a classification operation was performed to obtain base particles having an average particle diameter of 5 μm. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 850% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0042】(比較例2)セパラブルフラスコ反応器
に、ポリテトラメチレングリコールジアクリレート16
重量部、ジビニルベンゼン4重量部、重合開始剤として
過酸化ベンゾイル1.3重量部を入れ均一に混合した。
次に、ポリビニルアルコール(クラレ社製)の3%水溶
液20重量部、ドデシル硫酸ナトリウム0.5重量部を
加えよく攪拌した後、イオン交換水140重量部を添加
した。得られた溶液を攪拌しながら窒素気流下、80℃
で15時間反応を行った。得られた微粒子を熱水及びア
セトンにて洗浄後、分級操作を行い、平均粒子径10μ
mの基材粒子を得た。この基材粒子にメッキ処理を行
い、ニッケル層850Å、金層400Åの導電性微粒子
を得た。得られた導電性微粒子の任意の400個の粒子
径を電子顕微鏡にて測定し、平均粒子径及び粒子径分布
を求めた。得られた値を表1に示した。
Comparative Example 2 Polytetramethylene glycol diacrylate 16 was placed in a separable flask reactor.
Parts by weight, 4 parts by weight of divinylbenzene, and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were uniformly mixed.
Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were added, and after stirring well, 140 parts by weight of ion-exchanged water was added. 80 ° C. under a nitrogen stream while stirring the obtained solution.
For 15 hours. After the obtained fine particles were washed with hot water and acetone, a classification operation was performed, and the average particle diameter was 10 μm.
m of base particles were obtained. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 850% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0043】(比較例3)比較例2と同様の組成により
重合を行い、分級操作により平均粒子径5μmの基材粒
子を得た。この基材粒子にメッキ処理を行い、ニッケル
層680Å、金層400Åの導電性微粒子を得た。得ら
れた導電性微粒子の任意の400個の粒子径を電子顕微
鏡にて測定し、平均粒子径及び粒子径分布を求めた。得
られた値を表1に示した。
(Comparative Example 3) Polymerization was carried out in the same composition as in Comparative Example 2, and base particles having an average particle diameter of 5 µm were obtained by a classification operation. The base particles were subjected to plating to obtain conductive fine particles of a nickel layer 680% and a gold layer 400%. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0044】(比較例4)セパラブルフラスコ反応器
に、メチルメタクリレート16重量部、エチレングリコ
ールジメタクリレート4重量部、重合開始剤として過酸
化ベンゾイル1.3重量部を入れ均一に混合した。次
に、ポリビニルアルコール(クラレ社製)の3%水溶液
20重量部、ドデシル硫酸ナトリウム0.5重量部を加
えよく攪拌した後、イオン交換水140重量部を添加し
た。得られた溶液を攪拌しながら窒素気流下、80℃で
15時間反応を行った。得られた微粒子を熱水及びアセ
トンにて洗浄後、分級操作を行い、平均粒子径10μm
の基材粒子を得た。この基材粒子にメッキ処理を行い、
ニッケル層850Å、金層400Åの導電性微粒子を得
た。得られた導電性微粒子の任意の400個の粒子径を
電子顕微鏡にて測定し、平均粒子径及び粒子径分布を求
めた。得られた値を表1に示した。
Comparative Example 4 In a separable flask reactor, 16 parts by weight of methyl methacrylate, 4 parts by weight of ethylene glycol dimethacrylate, and 1.3 parts by weight of benzoyl peroxide as a polymerization initiator were uniformly mixed. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were added, and after stirring well, 140 parts by weight of ion-exchanged water was added. The resulting solution was reacted at 80 ° C. for 15 hours under a nitrogen stream while stirring. After the obtained fine particles were washed with hot water and acetone, a classification operation was performed, and the average particle diameter was 10 μm.
Was obtained. Perform plating on the substrate particles,
Conductive fine particles of nickel layer 850% and gold layer 400% were obtained. The particle diameters of arbitrary 400 particles of the obtained conductive fine particles were measured with an electron microscope, and the average particle diameter and the particle diameter distribution were determined. The obtained values are shown in Table 1.

【0045】〔評価〕実施例1〜8及び比較例1〜4で
得られた導電性微粒子について、下記評価を行った。 (微少圧縮試験)導電性微粒子の力学強度は微小圧縮試
験器(島津製作所社製、PCT−200)を用いて測定
し、得られた導電性微粒子を荷重負荷速度0.28mN
/sec、最大試験過重20mNで圧縮し、10%K値
を測定した。
[Evaluation] The conductive fine particles obtained in Examples 1 to 8 and Comparative Examples 1 to 4 were evaluated as follows. (Micro compression test) The mechanical strength of the conductive fine particles was measured using a micro compression tester (PCT-200, manufactured by Shimadzu Corporation), and the obtained conductive fine particles were subjected to a load applying speed of 0.28 mN.
/ Sec, the maximum test load was 20 mN, and the 10% K value was measured.

【0046】(回復率評価)微小圧縮試験器(島津製作
所社製、PCT−200)を用い、荷重負荷速度0.2
8mN/sec、原点荷重値1.0mN、反転荷重値1
0mNの条件下で、ダイヤモンド製の直径50μmの円
柱の平滑端面で、得られた導電性微粒子を圧縮して、回
復率を求めた。
(Evaluation of recovery rate) Using a micro-compression tester (PCT-200, manufactured by Shimadzu Corporation), a load application speed of 0.2
8 mN / sec, origin load value 1.0 mN, reversal load value 1
Under a condition of 0 mN, the obtained conductive fine particles were compressed on a smooth end face of a diamond-made cylinder having a diameter of 50 μm to determine a recovery rate.

【0047】(圧着状態観察)得られた導電性微粒子
を、エポキシ樹脂及びアクリル樹脂の混合物をトルエン
に溶解させたバインダー溶液に混合、分散させた。得ら
れた分散液を離型フィルム上に塗布した後、トルエンを
蒸発させて、膜厚が30μmの異方性導電性膜を作製し
た。厚さ1.5mmのガラス板に、得られた異方性導電
性膜、厚さ100μmのポリカーボネートフィルム基板
を重ね合わせ、150℃で2分間加熱圧着し導電接合体
を作製した。得られた導電接合体中の導電性微粒子の状
態を光学顕微鏡で観察した。結果を表1に示した。な
お、各粒子径に対応するE値及びE’値を表2に示し
た。
(Observation of pressed state) The obtained conductive fine particles were mixed and dispersed in a binder solution obtained by dissolving a mixture of an epoxy resin and an acrylic resin in toluene. After the obtained dispersion was applied onto a release film, toluene was evaporated to produce an anisotropic conductive film having a thickness of 30 μm. The obtained anisotropic conductive film and a 100-μm-thick polycarbonate film substrate were superimposed on a 1.5-mm-thick glass plate, and heated and pressed at 150 ° C. for 2 minutes to produce a conductive joined body. The state of the conductive fine particles in the obtained conductive joined body was observed with an optical microscope. The results are shown in Table 1. Table 2 shows E values and E 'values corresponding to the respective particle diameters.

【0048】[0048]

【表1】 [Table 1]

【0049】[0049]

【表2】 [Table 2]

【0050】〔実施例9〜13及び比較例5〜6〕 (実施例9)セパラブルフラスコ反応器に、ポリテトラ
メチレングリコールジアクリレート20重量部、過酸化
ベンゾイル1.3重量部を投入し均一に溶解させた。次
に、ポリビニルアルコール(クラレ社製)の3%水溶液
20重量部、ドデシル硫酸ナトリウム0.5重量部を投
入しよく攪拌した後、イオン交換水140重量部を添加
した。1〜2時間攪拌し、モノマー液滴の粒子径が5〜
15μm程度になるように調整した後に、窒素気流下、
80℃で15時間反応を行い重合体微粒子を得た。得ら
れた微粒子を熱水及びアセトンにて洗浄後、分級操作を
行い、平均粒子径10μmの粒子を得た。この粒子にメ
ッキ処理を行い、ニッケル層880Å、金層400Åの
導電性微粒子を得た。
[Examples 9 to 13 and Comparative Examples 5 to 6] (Example 9) 20 parts by weight of polytetramethylene glycol diacrylate and 1.3 parts by weight of benzoyl peroxide were charged into a separable flask reactor and homogenized. Was dissolved. Next, 20 parts by weight of a 3% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd.) and 0.5 part by weight of sodium dodecyl sulfate were charged and stirred well, and then 140 parts by weight of ion-exchanged water were added. After stirring for 1 to 2 hours, the particle diameter of the monomer droplet is 5 to 5.
After adjusting to about 15 μm, under a nitrogen stream,
The reaction was carried out at 80 ° C. for 15 hours to obtain polymer fine particles. After the obtained fine particles were washed with hot water and acetone, classification operation was performed to obtain particles having an average particle diameter of 10 μm. The particles were subjected to plating to obtain conductive fine particles of a nickel layer 880% and a gold layer 400%.

【0051】(実施例10)実施例9において、ポリテ
トラメチレングリコールジアクリレート20重量部の代
わりに、ポリテトラメチレングリコールジアクリレート
10重量部、イソオクチルアクリレート10重量部を使
用した以外は、実施例9と同様に行った。基材粒子の平
均粒子径は10μmであり、ニッケル層820Å、金層
440Åの導電性微粒子を得た。
Example 10 Example 10 was repeated except that 10 parts by weight of polytetramethylene glycol diacrylate and 10 parts by weight of isooctyl acrylate were used instead of 20 parts by weight of polytetramethylene glycol diacrylate. Performed similarly to 9. The average particle diameter of the base particles was 10 μm, and conductive fine particles of a nickel layer 820 # and a gold layer 440 # were obtained.

【0052】(実施例11)実施例10において、ポリ
テトラメチレングリコールジアクリレート10重量部、
イソオクチルアクリレート10重量部を使用する代わり
に、ポリテトラメチレングリコールジアクリレート6重
量部、イソオクチルアクリレート14重量部を使用した
以外は実施例10と同様に行った。基材粒子の平均粒子
径は10μmであり、ニッケル層830Å、金層410
Åの導電性微粒子を得た。
(Example 11) In Example 10, 10 parts by weight of polytetramethylene glycol diacrylate was used.
Example 10 was repeated except that 6 parts by weight of polytetramethylene glycol diacrylate and 14 parts by weight of isooctyl acrylate were used instead of 10 parts by weight of isooctyl acrylate. The average particle diameter of the base particles is 10 μm, and the nickel layer 830 #, the gold layer 410
導電 of conductive fine particles were obtained.

【0053】(実施例12)実施例9において、ポリテ
トラメチレングリコールジアクリレート20重量部の代
わりに、ポリプロピレングリコールジアクリレート(新
中村化学工業社製:NKエステルAPG700)10重
量部、イソオクチルアクリレート10重量部を使用した
以外は実施例9と同様に行った。基材粒子の平均粒子径
は10μmであり、ニッケル層840Å、金層400Å
の導電性微粒子を得た。
(Example 12) In Example 9, instead of 20 parts by weight of polytetramethylene glycol diacrylate, 10 parts by weight of polypropylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd .: NK ester APG700), 10 parts by weight of isooctyl acrylate Example 9 was repeated except that parts by weight were used. The average particle diameter of the base particles is 10 μm, and the nickel layer 840 # and the gold layer 400 #
Was obtained.

【0054】(実施例13) [種粒子の合成]ポリビニルピロリドン(重量平均分子
量3万、和光純薬社製:K−30)18重量部、エアロ
ゾルOT(和光純薬社製)2.9重量部、及び2,2−
アゾビス−2、4−ジメチルバレロニトリル(和光純薬
社製:V−65)20重量部を、メタノール350重量
部と水50重量部の混合液に溶解させた後、攪拌しなが
ら窒素気流下でスチレン90重量部、α−メチルスチレ
ン10重量部を投入した。60℃に昇温して24時間重
合を行い種粒子を得た。この種粒子の平均粒子径は2.
5μmであった。
(Example 13) [Synthesis of seed particles] 18 parts by weight of polyvinylpyrrolidone (weight average molecular weight 30,000, manufactured by Wako Pure Chemical Industries, Ltd .: K-30), 2.9 parts by weight of aerosol OT (manufactured by Wako Pure Chemical Industries, Ltd.) Part, and 2,2-
After dissolving 20 parts by weight of azobis-2,4-dimethylvaleronitrile (V-65, manufactured by Wako Pure Chemical Industries, Ltd.) in a mixed solution of 350 parts by weight of methanol and 50 parts by weight of water, the mixture was stirred under a nitrogen stream. 90 parts by weight of styrene and 10 parts by weight of α-methylstyrene were charged. The temperature was raised to 60 ° C. and polymerization was performed for 24 hours to obtain seed particles. The average particle size of the seed particles is 2.
It was 5 μm.

【0055】[基材粒子の合成]ポリテトラメチレング
リコールジアクリレート110重量部、イソアミルアク
リレート110重量部、過酸化ベンゾイル12重量部及
びイオン交換水2000重量部を混合してホモジナイザ
ーで微分散させて単量体乳化液を得た。冷却管、攪拌羽
根、窒素導入管を備えたセパラブルフラスコ反応器に上
記で得られた種粒子4重量部、イオン交換水200重量
部、ラウリル硫酸ナトリウム0.2重量部を投入し種粒
子分散液を調製した。ついで、単量体乳化液を種粒子分
散液に添加し、25℃、100rpmで24時間撹拌し
て単量体を種粒子に吸収させた。この分散液にポリビニ
ルアルコールの5重量%水溶液を200重量部加えた
後、窒素気流下、80℃で12時間重合を行った。重合
終了後、遠心分離により微粒子を分離し、熱水及びアセ
トンで分散剤を完全に洗浄した後乾燥し、重合体微粒子
(基材粒子)を得た。得られた基材粒子の平均粒子径は
10μmであった。この基材粒子にメッキ処理を行い、
ニッケル層850Å、金層400Åの導電性微粒子を得
た。
[Synthesis of Base Particles] Polytetramethylene glycol diacrylate (110 parts by weight), isoamyl acrylate (110 parts by weight), benzoyl peroxide (12 parts by weight) and ion-exchanged water (2,000 parts by weight) were mixed, finely dispersed by a homogenizer, and singly mixed. A monomer emulsion was obtained. 4 parts by weight of the seed particles obtained above, 200 parts by weight of ion-exchanged water, and 0.2 parts by weight of sodium lauryl sulfate were put into a separable flask reactor equipped with a cooling tube, a stirring blade, and a nitrogen inlet tube, and seed particles were dispersed. A liquid was prepared. Subsequently, the monomer emulsion was added to the seed particle dispersion, and the mixture was stirred at 25 ° C. and 100 rpm for 24 hours to allow the seed particles to absorb the monomer. After 200 parts by weight of a 5% by weight aqueous solution of polyvinyl alcohol was added to this dispersion, polymerization was carried out at 80 ° C. for 12 hours under a nitrogen stream. After the completion of the polymerization, the fine particles were separated by centrifugation, the dispersant was completely washed with hot water and acetone, and then dried to obtain polymer fine particles (base particles). The average particle diameter of the obtained base particles was 10 μm. Perform plating on the substrate particles,
Conductive fine particles of nickel layer 850% and gold layer 400% were obtained.

【0056】(比較例5)実施例9において、ポリテト
ラメチレングリコールジアクリレート20重量部の代わ
りに、ジビニルベンゼン20重量部を使用した以外は実
施例9と同様に行った。基材粒子の平均粒子径は10μ
mであり、ニッケル層850Å、金層420Åの導電性
微粒子を得た。
Comparative Example 5 The procedure of Example 9 was repeated, except that 20 parts by weight of divinylbenzene was used instead of 20 parts by weight of polytetramethylene glycol diacrylate. The average particle size of the base particles is 10μ
m, and conductive fine particles of a nickel layer 850 ° and a gold layer 420 ° were obtained.

【0057】(比較例6)実施例9において、ポリテト
ラメチレングリコールジアクリレート20重量部の代わ
りに、ポリテトラメチレングリコールジアクリレート1
6重量部、ジビニルベンゼン4重量部を使用した以外
は、実施例9と同様に行った。基材粒子の平均粒径は1
0μm、ニッケル層830Å、金層410Åの導電性微
粒子を得た。
Comparative Example 6 In Example 9, polytetramethylene glycol diacrylate 1 was replaced with 20 parts by weight of polytetramethylene glycol diacrylate.
Example 9 was repeated except that 6 parts by weight and 4 parts by weight of divinylbenzene were used. The average particle size of the base particles is 1
Conductive fine particles of 0 μm, a nickel layer 830 #, and a gold layer 410 # were obtained.

【0058】〔評価〕上記実施例9〜13及び比較例5
〜6で得られた導電性微粒子について、下記評価を行っ
た。結果を表3に示した。 (微少圧縮試験)実施例1と同様にして10%K値及び
破壊歪みを求めた。 (圧着状態観察)実施例1と同様にして行った。
[Evaluation] The above Examples 9 to 13 and Comparative Example 5
The following evaluation was performed on the conductive fine particles obtained in Nos. 6 to 6. The results are shown in Table 3. (Micro compression test) The 10% K value and the breaking strain were determined in the same manner as in Example 1. (Observation of crimping state) The same procedure as in Example 1 was performed.

【0059】[0059]

【表3】 [Table 3]

【0060】[0060]

【発明の効果】本発明は、上述の構成よりなるので、プ
ラスチックのような柔軟な基板であっても、マイクロ素
子実装の基板及びその配線を傷つけることのない柔軟性
を有し、優れた電気的接合及び接続信頼性を有する導電
接着剤、異方性導電接着剤又は異方性導電シートの導電
材料として用いることができる導電性微粒子及びそれを
用いてなる導電接続構造体を提供することができる。
Since the present invention has the above-described structure, even if the substrate is a flexible substrate such as plastic, it has excellent flexibility without damaging the substrate on which the micro-element is mounted and its wiring. The present invention provides conductive fine particles that can be used as a conductive adhesive, anisotropic conductive adhesive, or a conductive material of an anisotropic conductive sheet having electrical bonding and connection reliability, and a conductive connection structure using the same. it can.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 基材粒子の表面に導電層が形成されてな
る導電性微粒子であって、圧縮試験において、荷重負荷
速度0.28mN/secにより前記導電性微粒子が1
0%変形した際、10%K値が下記式(1)で表される
E MPa以下であることを特徴とする導電性微粒子。 E=90D2 −1500D+7000(MPa) (1) 式中、Dは前記導電性微粒子の粒子径(μm)を表す。
1. A conductive fine particle comprising a base particle and a conductive layer formed on the surface thereof, wherein the conductive fine particle has a load of 0.28 mN / sec in a compression test.
Conductive fine particles having a 10% K value of not more than E MPa represented by the following formula (1) when deformed by 0%. E = 90D 2 -1500D + 7000 (MPa) (1) In the formula, D represents the particle diameter (μm) of the conductive fine particles.
【請求項2】 10%K値が下記式(4)で表される
E’MPa以下であることを特徴とする請求項1記載の
導電性微粒子。 E’=90D2 −1500D+6700(MPa) (4)
2. The conductive fine particles according to claim 1, wherein the 10% K value is equal to or less than E ′ MPa represented by the following formula (4). E ′ = 90D 2 −1500D + 6700 (MPa) (4)
【請求項3】 粒子径が10μmであり、かつ、10%
K値が700MPa以下であることを特徴とする請求項
1又は2記載の導電性微粒子。
3. The particle size is 10 μm and 10%
3. The conductive fine particles according to claim 1, wherein the K value is 700 MPa or less.
【請求項4】 圧縮試験において、荷重負荷速度0.2
8mN/secにより導電性微粒子を圧縮した際、破壊
歪みが30%以上であることを特徴とする請求項3記載
の導電性微粒子。
4. In a compression test, a load application speed of 0.2
The conductive fine particles according to claim 3, wherein when the conductive fine particles are compressed at 8 mN / sec, the breaking strain is 30% or more.
【請求項5】 Cv値が8以下であることを特徴とする
請求項1、2、3又は4記載の導電性微粒子。
5. The conductive fine particles according to claim 1, wherein the Cv value is 8 or less.
【請求項6】 基材粒子が、有機系重合体からなること
を特徴とする請求項1、2、3、4又は5記載の導電性
微粒子。
6. The conductive fine particles according to claim 1, wherein the base particles are made of an organic polymer.
【請求項7】 基材粒子は、平均粒子径が1〜20μm
であることを特徴とする請求項1、2、3、4、5又は
6記載の導電性微粒子。
7. The base particles have an average particle diameter of 1 to 20 μm.
The conductive fine particles according to claim 1, 2, 3, 4, 5, or 6, wherein
【請求項8】 回復率が30%以上であることを特徴と
する請求項1、2、3、4、5、6又は7記載の導電性
微粒子。
8. The conductive fine particles according to claim 1, wherein the recovery rate is 30% or more.
【請求項9】 請求項1、2、3、4、5、6、7又は
8記載の導電性微粒子を用いてなることを特徴とする導
電接続構造体。
9. A conductive connection structure comprising the conductive fine particles according to claim 1, 2, 3, 4, 5, 6, 7, or 8.
JP2000230889A 1999-11-26 2000-07-31 Conductive partiulates and conductive connecting fabric Pending JP2001216841A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000230889A JP2001216841A (en) 1999-11-26 2000-07-31 Conductive partiulates and conductive connecting fabric

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-336497 1999-11-26
JP33649799 1999-11-26
JP2000230889A JP2001216841A (en) 1999-11-26 2000-07-31 Conductive partiulates and conductive connecting fabric

Publications (2)

Publication Number Publication Date
JP2001216841A true JP2001216841A (en) 2001-08-10
JP2001216841A5 JP2001216841A5 (en) 2007-06-07

Family

ID=26575493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000230889A Pending JP2001216841A (en) 1999-11-26 2000-07-31 Conductive partiulates and conductive connecting fabric

Country Status (1)

Country Link
JP (1) JP2001216841A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003313304A (en) * 2002-04-22 2003-11-06 Sekisui Chem Co Ltd Conductive fine particle, its manufacturing method and bonding material for electronic component
JP2003323813A (en) * 2002-02-28 2003-11-14 Hitachi Chem Co Ltd Circuit connecting material and connection structure of circuit terminal using the same
JP2004014409A (en) * 2002-06-10 2004-01-15 Sekisui Chem Co Ltd Conductive fine particles, method for producing conductive fine particles, and anisotropic conductive material
JP2004165123A (en) * 2002-09-24 2004-06-10 Sekisui Chem Co Ltd Conductive particulate, its manufacturing method, and conductive material
JP2007305583A (en) * 2002-02-28 2007-11-22 Hitachi Chem Co Ltd Circuit connection material and circuit terminal connection structure using the same
JP2008231438A (en) * 2002-06-06 2008-10-02 Sony Chemical & Information Device Corp Resin particle, conductive particle and anisotropic conductive adhesive containing the same
WO2012102199A1 (en) * 2011-01-25 2012-08-02 株式会社日本触媒 Conductive microparticle, resin particle, and anisotropic conductive material using same
TWI420539B (en) * 2006-09-29 2013-12-21 Nippon Chemical Ind Conductive particles and method of preparing the same
WO2014007334A1 (en) * 2012-07-05 2014-01-09 積水化学工業株式会社 Conductive particle, resin particle, conductive material, and connection structure
JP2014089849A (en) * 2012-10-29 2014-05-15 Nippon Shokubai Co Ltd Conductive fine particle and anisotropic conductive material using the same
JP2014096329A (en) * 2012-11-12 2014-05-22 Nippon Shokubai Co Ltd Conductive fine particle and anisotropic conductive material
WO2020071271A1 (en) * 2018-10-03 2020-04-09 デクセリアルズ株式会社 Anisotropic conductive film, connection structure, and method for manufacturing connection structure
JP2020095941A (en) * 2018-10-03 2020-06-18 デクセリアルズ株式会社 Anisotropic conductive film, connection structure, and method for manufacturing connection structure
US20210363322A1 (en) * 2018-02-06 2021-11-25 Mitsubishi Materials Corporation Silver-coated resin particle
JPWO2022131359A1 (en) * 2020-12-17 2022-06-23

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08188760A (en) * 1995-01-10 1996-07-23 Sony Chem Corp Anisotropic electroconductive adhesive and anisotropic electroconductive adhesive sheet using the same
JPH10259253A (en) * 1997-03-21 1998-09-29 Hayakawa Rubber Co Ltd Metal-coated particle and conductive material
JPH11209714A (en) * 1998-01-22 1999-08-03 Shin Etsu Polymer Co Ltd Anisotropically electroconductive adhesive

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08188760A (en) * 1995-01-10 1996-07-23 Sony Chem Corp Anisotropic electroconductive adhesive and anisotropic electroconductive adhesive sheet using the same
JPH10259253A (en) * 1997-03-21 1998-09-29 Hayakawa Rubber Co Ltd Metal-coated particle and conductive material
JPH11209714A (en) * 1998-01-22 1999-08-03 Shin Etsu Polymer Co Ltd Anisotropically electroconductive adhesive

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003323813A (en) * 2002-02-28 2003-11-14 Hitachi Chem Co Ltd Circuit connecting material and connection structure of circuit terminal using the same
JP2007305583A (en) * 2002-02-28 2007-11-22 Hitachi Chem Co Ltd Circuit connection material and circuit terminal connection structure using the same
JP2003313304A (en) * 2002-04-22 2003-11-06 Sekisui Chem Co Ltd Conductive fine particle, its manufacturing method and bonding material for electronic component
JP2008231438A (en) * 2002-06-06 2008-10-02 Sony Chemical & Information Device Corp Resin particle, conductive particle and anisotropic conductive adhesive containing the same
JP2004014409A (en) * 2002-06-10 2004-01-15 Sekisui Chem Co Ltd Conductive fine particles, method for producing conductive fine particles, and anisotropic conductive material
JP2004165123A (en) * 2002-09-24 2004-06-10 Sekisui Chem Co Ltd Conductive particulate, its manufacturing method, and conductive material
TWI420539B (en) * 2006-09-29 2013-12-21 Nippon Chemical Ind Conductive particles and method of preparing the same
US9093196B2 (en) 2006-09-29 2015-07-28 Nisshinbo Holdings, Inc. Conductive particles and method of preparing the same
JPWO2012102199A1 (en) * 2011-01-25 2014-06-30 株式会社日本触媒 Conductive fine particles, resin particles and anisotropic conductive material using the same
KR101454194B1 (en) * 2011-01-25 2014-10-27 가부시기가이샤 닛뽕쇼꾸바이 Conductive microparticle, resinparticle, and anisotropic conductive material using same
CN103329217B (en) * 2011-01-25 2016-06-29 株式会社日本触媒 Conductive fine particles, resin particles, and anisotropic conductive materials using them
WO2012102199A1 (en) * 2011-01-25 2012-08-02 株式会社日本触媒 Conductive microparticle, resin particle, and anisotropic conductive material using same
CN103329217A (en) * 2011-01-25 2013-09-25 株式会社日本触媒 Conductive microparticle, resin particle, and anisotropic conductive material using same
JPWO2014007334A1 (en) * 2012-07-05 2016-06-02 積水化学工業株式会社 Conductive particles, resin particles, conductive materials, and connection structures
KR102093270B1 (en) * 2012-07-05 2020-03-25 세키스이가가쿠 고교가부시키가이샤 Conductive particle, resin particle, conductive material, and connection structure
KR20150035531A (en) * 2012-07-05 2015-04-06 세키스이가가쿠 고교가부시키가이샤 Conductive particle, resin particle, conductive material, and connection structure
CN104380393A (en) * 2012-07-05 2015-02-25 积水化学工业株式会社 Conductive particle, resin particle, conductive material, and connection structure
WO2014007334A1 (en) * 2012-07-05 2014-01-09 積水化学工業株式会社 Conductive particle, resin particle, conductive material, and connection structure
CN104380393B (en) * 2012-07-05 2017-11-28 积水化学工业株式会社 Conductive particle, resin particle, conductive material and bonded structure
JP2014089849A (en) * 2012-10-29 2014-05-15 Nippon Shokubai Co Ltd Conductive fine particle and anisotropic conductive material using the same
JP2014096329A (en) * 2012-11-12 2014-05-22 Nippon Shokubai Co Ltd Conductive fine particle and anisotropic conductive material
US20210363322A1 (en) * 2018-02-06 2021-11-25 Mitsubishi Materials Corporation Silver-coated resin particle
US11542381B2 (en) * 2018-02-06 2023-01-03 Mitsubishi Materials Corporation Silver-coated resin particle
WO2020071271A1 (en) * 2018-10-03 2020-04-09 デクセリアルズ株式会社 Anisotropic conductive film, connection structure, and method for manufacturing connection structure
JP2020095941A (en) * 2018-10-03 2020-06-18 デクセリアルズ株式会社 Anisotropic conductive film, connection structure, and method for manufacturing connection structure
JPWO2022131359A1 (en) * 2020-12-17 2022-06-23
JP7733583B2 (en) 2020-12-17 2025-09-03 積水化学工業株式会社 Conductive particles, sockets, conductive materials and connection structures

Similar Documents

Publication Publication Date Title
US8129023B2 (en) Polymer particles, conductive particles, and an anisotropic conductive packaging materials containing the same
US7851063B2 (en) Polymer particles and conductive particles having enhanced conducting properties, and anisotropic conductive packaging materials containing the same
JP4920698B2 (en) Conductive particles for anisotropic conductive connection
JP3739232B2 (en) Polymer fine particles and manufacturing method thereof, spacer for liquid crystal display element, conductive fine particles
JP2001216841A (en) Conductive partiulates and conductive connecting fabric
JP2002033022A (en) Conductive multilayer structure resin particles and anisotropic conductive adhesive using the same
JP3587398B2 (en) Conductive particles and anisotropic conductive adhesive
JP2003313304A (en) Conductive fine particle, its manufacturing method and bonding material for electronic component
JP2014192051A (en) Electroconductive particulates and anisotropic electroconductive material using the same
JP4662748B2 (en) Conductive fine particles and anisotropic conductive materials
JP2001216840A (en) Conductive particulates and conductive connecting fabric
JP6014438B2 (en) Conductive fine particles and anisotropic conductive material using the same
JP5583714B2 (en) Conductive fine particles and anisotropic conductive material using the same
JP5583654B2 (en) Conductive fine particles and anisotropic conductive material using the same
KR100667376B1 (en) Polymer resin fine particles and conductive fine particles for anisotropically conductive connection members and anisotropic conductive connection materials including the same
JP2005327509A (en) Conductive fine particle and anisotropic conductive material
JP2000309715A (en) Polymer fine particles and conductive fine particles
JP7743169B2 (en) Resin particles for conductive fine particles
KR100667375B1 (en) Polymer resin fine particles and conductive fine particles for anisotropically conductive connection members and anisotropic conductive connection materials including the same
JP2008059914A (en) Resin fine particle, and conductive particulate
JP6397552B2 (en) Conductive fine particles and anisotropic conductive material using the same
JP2005327510A (en) Conductive fine particle and anisotropic conductive material
JP2002093240A (en) Conductive fine particle and conductive connecting structure
JP2006196411A (en) Conductive fine particle and anisotropic conductive material
JP4203301B2 (en) Anisotropic conductive film

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070412

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070412

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100129

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100203

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100602