JP2001264776A - Liquid crystal display device and method of manufacturing the same - Google Patents

Abstract

(57) [Summary] [Problem] When a spacer for defining a substrate interval is formed by photolithography, an exposure process can be formed by self-alignment, and deterioration of display quality due to residue on a pixel can be prevented. Provided are a liquid crystal display device and a method of manufacturing the liquid crystal display device, which can arbitrarily design a cell thickness for defining optical characteristics. A liquid crystal layer, a pair of insulating substrates sandwiching the liquid crystal layer, and a pair of insulating substrates.
, The spacer has a two-layer structure of a photosensitive transparent resin layer 41 and a photosensitive black resin layer 42.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the same, and more particularly to a liquid crystal display device characterized by a spacer for defining a distance between a pair of insulating substrates and a method of manufacturing the same.

[0002]

2. Description of the Related Art Conventionally, an active matrix liquid crystal display device is known as one of the liquid crystal display devices, and as shown in FIG. 9, an active matrix substrate having an alignment film 18 'formed on a pixel electrode 17'. 1 ′ is opposed to a color filter substrate 2 ′ on which a counter electrode 23 ′ and an alignment film 25 ′ are formed, and a liquid crystal 3 ′ is sealed between the two substrates.
In order to keep the distance between the insulating substrates constant, spacers 4 'such as plastic beads having a uniform particle size are scattered between the two substrates. The periphery of the substrate is fixed by a sealant 5 '.

However, when plastic beads or the like are scattered to form spacers, if the spacers scattered between two insulating substrates are positioned on display pixels, there is a problem that light leaks from the periphery of the spacers. Further, if the spacers are scattered non-uniformly on the substrate, there is a problem that display irregularities or the like may occur.

[0004] For this reason, as disclosed in Japanese Patent Application Laid-Open No. 9-120075, a method of laminating a coloring layer of a color filter outside a pixel region to form a columnar spacer,
A method using a light-shielding layer formed of a photosensitive black resin as a spacer has been proposed in Japanese Patent Application Laid-Open No. H11-21849.

However, in the method disclosed in Japanese Patent Application Laid-Open No. 9-120075, the thickness of each colored layer of a color filter to be laminated is predetermined in order to reproduce required color characteristics. There is a problem that the total thickness of the colored layers does not always match the desired thickness (cell thickness). In addition, when realignment of each colored layer of the color filter by photolithography, if an alignment shift occurs in the exposure step, the colored layers are not stacked at the same position and cannot be formed at a desired height. Was.

According to the method disclosed in Japanese Patent Application Laid-Open No. H11-218779, a photosensitive black resin is applied to an insulating substrate having a colored layer formed thereon, and the photosensitive black resin is patterned by photolithography. And also functions as a spacer. The thickness of the black resin is increased in order to provide the function of the spacer, and the exposure is performed from both the front surface and the rear surface in order to sufficiently cure the resin.

When the above method is performed only by back exposure, self-alignment can be performed using the colored layer as a mask. However, in back exposure, the exposure amount necessary for curing is not irradiated on the surface side of the black resin. Since the resin is dissolved and the film thickness of the resin is reduced as a result, it is difficult to arbitrarily set the film thickness (cell thickness). In addition, if the irradiation time is increased to irradiate a necessary exposure amount, the throughput decreases. In addition, in the case of back exposure using the colored layer as a mask, if the irradiation time is lengthened, the black resin applied on the colored layer, which is not originally irradiated, is exposed, and the black resin adheres to the colored layer, thereby deteriorating the display quality. Happens.

[0008]

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an exposure process by self-alignment when a spacer for defining a substrate interval is formed by photolithography, and display by a residue on a pixel. It is an object of the present invention to provide a liquid crystal display device capable of preventing deterioration of quality and allowing an arbitrary design of a cell thickness for defining optical characteristics, and a method of manufacturing the same.

[0009]

The present invention relates to a liquid crystal display device comprising a liquid crystal layer, a pair of insulating substrates sandwiching the liquid crystal layer, and a spacer for defining a distance between the pair of insulating substrates. The spacer is a liquid crystal display device having a two-layer structure of a photosensitive transparent resin layer and a photosensitive black resin layer.

Thus, the thickness of the resin serving as the spacer can be controlled by changing the thickness of the photosensitive transparent resin, so that the irradiation amount of the ultraviolet rays at the time of exposure is smaller than when the thickness of the black resin is increased. It is not necessary to be large, and an arbitrary film thickness can be formed. In addition, when unnecessary resin on the pixel is removed at the time of development, the transparent resin is positioned below the black resin, so that it is possible to prevent the black resin from remaining as a development residue (residue) on the pixel. .

Further, according to the present invention, one of the pair of insulating substrates includes a switching element formed in a matrix and a gate wiring for supplying a control voltage to the switching element.
A source wiring that is formed so as to be orthogonal to the gate wiring and supplies a data signal to the switching element, and an interlayer insulating film is formed on the switching element, the gate wiring, and the source wiring; Further, the present invention is a liquid crystal display device in which a switching element and a pixel electrode on the interlayer insulating film are connected via a contact hole penetrating the interlayer insulating film.

Thus, since the pixel electrode is formed on the interlayer insulating film, the pixel electrode can be formed so as to cover the gate wiring and the source wiring. For this reason, the colored layers formed on the second insulating substrate are adjacent to each other or in contact with each other, or the portions formed by overlapping are formed on the source wiring formed on the opposing first insulating substrate. Therefore, there is no concern that display quality may be degraded due to disturbance of liquid crystal alignment due to a step in the overlapping portion.

The present invention is the liquid crystal display device, wherein the spacer is located on the switching element.

Thus, since the spacer also has a function of shielding the switching element from light, it is possible to prevent the occurrence of light leakage current of the switching element.

Further, the present invention is the liquid crystal display device, wherein the spacer is formed in a peripheral portion of a display area.

Thus, the spacer defines the cell thickness in the peripheral portion of the display area and also functions as the peripheral light shielding portion.

Further, the present invention relates to a method of manufacturing a liquid crystal display device comprising a liquid crystal layer, a pair of insulating substrates sandwiching the liquid crystal layer, and a spacer for defining a distance between the pair of insulating substrates. Forming a photosensitive transparent resin layer on at least one of the pair of insulating substrates, and then forming a photosensitive black resin layer thereon to form a two-layer structure, and a pair of insulating substrates sandwiching a liquid crystal layer. Is a method of manufacturing a liquid crystal display device including a step of forming a spacer for defining a distance between the liquid crystal display devices.

Thus, the thickness of the resin serving as the spacer can be adjusted by changing the thickness of the photosensitive transparent resin, so that the irradiation amount of the ultraviolet rays at the time of exposure is smaller than when the thickness of the black resin is increased. There is no need to increase the size, so there is no decrease in throughput. In addition, when unnecessary resin on the pixel is removed during development, the transparent resin is positioned under the black resin, thereby preventing the black resin from adhering to the pixel and reducing defects due to residue on the pixel. . In addition, the spraying step using the conventional spacer spraying device is not required, and when manufacturing a liquid crystal display device having a different cell thickness, conventionally, it is necessary to change the type of the spacer to be sprayed. ,
This can be dealt with by changing the application conditions of the resin serving as the spacer.

According to the present invention, on one of the pair of insulating substrates, a switching element formed in a matrix, a gate wiring for controlling the switching element, and a gate wiring are formed so as to be orthogonal to the gate wiring. Forming a source line for supplying a data signal to the switching element; and forming an interlayer insulating layer with the switching element via a contact hole penetrating an interlayer insulating film formed on the switching element, the gate line, and the source line. Connecting a pixel electrode formed on the film to the liquid crystal display device.

As a result, the pixel electrode is formed on the interlayer insulating film, and the pixel electrode is formed so as to cover the gate wiring and the source wiring, so that the adjacent colored layers are in contact with or overlap with each other. However, since it is formed so as to be completely hidden on the source wiring formed on the opposing insulating substrate, even if there is some deviation in the bonding in the bonding process, display due to disorder in the liquid crystal alignment due to the step in the overlapping portion There is no concern about quality degradation.

Further, the present invention is a method for manufacturing a liquid crystal display device, comprising the step of forming the spacer so as to be located on the switching element.

Thus, the light-shielding portion of the TFT can be formed by self-alignment by backside exposure, thereby simplifying the production process.

Further, the present invention is a method for manufacturing a liquid crystal display device, comprising a step of forming the above-mentioned spacer at a peripheral portion of a display area.

Thus, the process can be simplified since the spacers can be simultaneously manufactured as the peripheral light shielding portions.

[0025]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described. A liquid crystal display device of the present embodiment will be described with reference to FIGS. FIG. 1 is an explanatory cross-sectional view of a liquid crystal display device according to an embodiment. FIG. 2 is an explanatory diagram of an active matrix substrate in the liquid crystal display device according to the embodiment. FIG.
FIG. 3 is a sectional view taken along the line AA ′ in FIG. 2. FIG.
FIG. 4 is an explanatory diagram of a color filter substrate in the liquid crystal display device of the example. FIG. 5 is a sectional view taken along the line BB ′ in FIG. FIG. 6 is a sectional view taken along the line CC ′ in FIG. FIG. 7 is an explanatory diagram of a color filter substrate in the liquid crystal display device according to the second embodiment. FIG. 8 is a sectional view taken along the line DD ′ in FIG.

Embodiment 1 will be described. As shown in FIG. 1, the liquid crystal display device of this embodiment includes a first insulating substrate 11 and a second insulating substrate 21 and a pair of insulating substrates 11 and 21.
Liquid crystal layer 3 sandwiched between a pair of insulating substrates 11 and 21
And a spacer for defining the interval between the two. As shown in FIGS. 2 and 3, the first insulating substrate 11 includes a TFT (switching element) 12, a gate wiring 13, a source wiring 14,
Interlayer insulating film 15, first pixel electrode 17, first alignment film 1
8, etc. The TFTs 12 are formed in a matrix as shown in FIG. Gate wiring 13
Supplies a control voltage to the TFT 12. Source wiring 14
Are formed so as to be orthogonal to the gate wiring 13,
A data signal is supplied to the TFT 12. Interlayer insulating film 15
Is formed on the TFT 12, the gate wiring 13, and the source wiring 14, and has a contact hole 16 which is a penetrating hole.
And are connected. The second insulating substrate 21 is shown in FIGS.
As shown in the figure, the colored layer (red) 22r, the colored layer (green) 22g,
A color filter layer made of the same (blue) 22b, a second pixel electrode 23, and the like. The spacer has a two-layer structure of a photosensitive transparent resin 41 and a photosensitive black resin 42, as shown in FIG. Then, the first and second pixel electrodes 17,
By applying a voltage to the liquid crystal layer 3 between the layers 23, the passage of light from a light source or the like (not shown) through the color filter layer 22 can be controlled, and color display can be performed.

According to the first embodiment, since the spacer has a two-layer structure of the photosensitive transparent resin 41 and the photosensitive black resin 42, the thickness of the spacer can be changed by changing the thickness of the photosensitive transparent resin 41. This makes it possible to form an arbitrary film thickness without the necessity of increasing the irradiation amount of the ultraviolet ray at the time of exposure as compared with the case where the film thickness of the photosensitive black resin 42 is increased. Further, when unnecessary resin on the pixel is removed during development, the photosensitive black resin 4 is removed.
Positioning the photosensitive transparent resin 41 below the second layer 2 makes it possible to prevent the photosensitive black resin 42 from being left undeveloped (residue) on the pixel.

Next, a method of manufacturing the liquid crystal display device according to the first embodiment will be described. As shown in FIG. 3, a TFT (thin film transistor) 12 and a TFT 1 are formed on a first insulating substrate 11.
2 and a source line 1 electrically connected to
4 is formed. In this embodiment, the line width of the gate wiring 13 is set to 1
5 μm, and the line width of the source wiring 14 was 10 μm. Subsequently, a photosensitive interlayer insulating film 15 made of an acrylic resin is applied to the entire surface of the substrate 11 by a spinner. Then, the interlayer insulating film 15 is exposed to ultraviolet light through a mask by a photolithography method to be exposed to light, and is etched to form a contact hole 16 on the drain electrode of the TFT 12. Next, an ITO (indium tin oxide) layer 17 is formed as a transparent electrode by a sputtering method, and patterning is performed so that an edge overlaps each wiring around the pixel to form a first pixel electrode 17. In this way,
A first alignment film 18 made of polyimide is formed on an insulating substrate 11 on which a TFT 12, a gate wiring 13, a source wiring 14, and a first pixel electrode 17 are formed, and a second alignment film 18 is formed to enable alignment of liquid crystal molecules. An alignment process is performed on the surface of the first alignment film 18 by rubbing or the like.

Next, on the second insulating substrate 21, red,
The green and blue colored layers 22r, 22g, and 22b are formed of a photosensitive resin of each color, for example, color resists CR-2000, CG-2000, and CB-2000 manufactured by Fuji Hunt Technology.
It is formed using. That is, a colored photoresist is applied on the substrate 21 by a spinner and baked at 80 ° C. for 10 minutes. Thereafter, exposure is performed using a predetermined mask, development is performed with an alkali developing solution, washing is performed with pure water, and baking treatment is performed at 220 ° C. for 60 minutes. This process was repeated for three colors to form a colored layer 22. The thickness of each colored layer 22 is 1.2 μm, and the colored layer 22 is not formed in a portion where a spacer is to be formed in a later step, facing the TFT 12 formed on the first insulating substrate 11. Further, the edge of each colored layer 22 is formed so as to be in contact with the edge of the adjacent colored layer or to form a partially overlapping portion 24. In this embodiment, 3 μm
They are formed so as to overlap by m. As shown in FIG. 1, the overlapping portion 24 is located at a position facing the source wiring 14 of the first insulating substrate 11. Since the source wiring 14 is formed with a line width of 10 μm, even if the alignment of the liquid crystal is disturbed due to the step of the overlapping portion 24, the light is completely shielded by the source wiring 14, so that the display quality is not degraded. Even if there is some deviation in the bonding in the bonding step, the overlapping portion 24 does not protrude from the width of the source wiring 14, so that it becomes a margin in the bonding step.

Next, an ITO electrode is formed as a second pixel electrode 23 on the second substrate 21 by a sputtering method. Subsequently, a photosensitive transparent resin 41 is provided on the substrate 21.
For example, V259-PA manufactured by Nippon Steel Chemical Co., Ltd.
Baked at 10 ° C. for 10 minutes.
2. For example, V259-BKO manufactured by Nippon Steel Chemical Co., Ltd. is applied and baked at 80 ° C. for 10 minutes to form a two-layer structure. Next, back exposure is performed using the previously formed colored layer 22 as a mask, and both the photosensitive transparent resin 41 and the photosensitive black resin 42 are developed with an alkali developing solution, washed with pure water, and further at 220 ° C. A baking treatment was performed for 60 minutes to form a columnar spacer having a thickness of the photosensitive transparent resin 41 of 4 μm and a thickness of the photosensitive black resin 42 of 1.5 μm. In this embodiment,
Although the thickness of the photosensitive transparent resin 41 is set to 4.0 μm, this thickness can be arbitrarily set according to the application conditions of the spinner. In addition, since the transparent resin is used, even if the film thickness becomes large, the irradiation light is not blocked, so that the irradiation light reaches the photosensitive black resin 42 applied on the upper portion and is sufficiently cured.

Thus, the colored layer 22 and the overlapping portion 2
4. A second electrode made of polyimide is formed on the second insulating substrate 21 on which the transparent electrode 23 and the columnar spacers 41 and 42 are formed.
Is formed, and an alignment process is performed on the surface of the alignment film 25 by rubbing or the like in order to enable alignment of liquid crystal molecules.

Finally, the first insulating substrate 11 on which the TFT 12, the gate wiring 13, the source wiring 14, and the first pixel electrode 17 are formed, and the first insulating substrate 11 on which the color filter layer 22 and the columnar spacers 41 and 42 are formed. And the second insulating substrate 21. Substrate 2 on which color filter layer 22 is formed
Since the spacers 41 and 42 are already formed on 1, a step of dispersing the spacers before the bonding step is not required. Then, the liquid crystal is injected and sealed to obtain a liquid crystal display device.

Embodiment 2 will be described. The present embodiment is a method for manufacturing a liquid crystal display device of another embodiment, which will be described with reference to FIGS. 2, 3, 7, and 8. FIG.

On the first insulating substrate 11, a TFT 12, a gate wiring 13,
The source wiring 14 and the pixel electrode 17 are formed, an alignment film 18 made of polyimide is formed, and an alignment process is performed on the surface of the alignment film 18 by rubbing or the like to enable alignment of liquid crystal molecules.

Next, red, green, and blue colored layers 22r, 22g, and 22 are formed on the second insulating substrate 21 in the same manner as in the first embodiment.
b is a photosensitive resin of each color, for example, color resist CR-2000, CG-200 manufactured by Fuji Hunt Technology Co., Ltd.
0, CB-2000. That is, a colored photoresist is applied on the substrate 21 by a spinner,
A baking treatment is performed at 0 ° C. for 10 minutes. Thereafter, exposure is performed using a predetermined mask, development with an alkali developing solution, washing with pure water, and baking treatment at 220 ° C. for 60 minutes. This step is repeated for three colors to form the colored layer 22. Also, a colored layer 22 is formed on a portion to be a liquid crystal injection port 26, as shown in FIGS. In this embodiment, the blue colored layer 22b is formed.

Next, an ITO electrode is formed as a pixel electrode 23 on the substrate 21 by a sputtering method. Continued
A photosensitive transparent resin 41, for example, V259-PA manufactured by Nippon Steel Chemical Co., Ltd. is applied on the substrate 21 and baked at 80 ° C. for 10 minutes, and a photosensitive black resin 42, for example, Nippon Steel Chemical Co., Ltd. V259-BKO manufactured at 80 ° C.
A baking process is performed for two minutes to form a two-layer structure. Next, back exposure is performed using a mask formed so that light is transmitted to the peripheral light-shielding portion and the display region. After developing both the photosensitive transparent resin 41 and the photosensitive black resin 42 with an alkali developing solution, pure water is applied. Then, a baking treatment is performed at 220 ° C. for 60 minutes, and the photosensitive transparent resin 41 has a thickness of 4.0 μm and a photosensitive black resin 42.
A peripheral light-shielding portion having a thickness of 1.5 μm was formed. Inlet 2
As shown in FIG. 8, the colored layer 22b is formed in advance in the portion 4 and no photosensitive resin layer is formed in this portion, so that liquid crystal can be injected in a later step. . In this embodiment, only the blue coloring layer 22b is formed at the injection port. However, the gate wiring 13 or the source wiring 14 may be further overlapped with the red coloring layer 22r, or may be provided at a portion facing the injection port 26 on the active matrix substrate 11 side. By disposing the metal film used to form the
The light-shielding properties of the six portions can be improved.

As described above, the coloring layer 22 and the pixel electrode 2
3. An alignment film 25 made of polyimide is formed on the insulating substrate 21 on which the peripheral light-shielding portion is formed, and an alignment process is performed on the surface of the alignment film 25 by rubbing or the like to enable alignment of liquid crystal molecules.

Finally, the insulating substrate 1 on which the TFT 12, the gate wiring 13, the source wiring 14, and the pixel electrode 17 are formed
1 and the color filter 22 and the insulating substrate 21 on which the sealing material 5 is printed around the peripheral light-shielding portion, and the liquid crystal is injected and sealed to obtain a liquid crystal display device.

As described above, in a liquid crystal display device having a liquid crystal layer sandwiched between two insulating substrates, a spacer for defining a distance between the first insulating substrate and the second insulating substrate is: By having a two-layer structure of a photosensitive transparent resin and a photosensitive black resin, the thickness of the resin serving as a spacer can be adjusted by changing the thickness of the photosensitive transparent resin. It is not necessary to increase the irradiation amount of the ultraviolet ray at the time of exposure as compared with the case where the thickness is increased, and an arbitrary thickness can be formed. In addition, when unnecessary resin on the pixel is removed at the time of development, the transparent resin is positioned below the black resin, so that it is possible to prevent the black resin from remaining as a development residue (residue) on the pixel. .

In the above liquid crystal display device, an interlayer insulating film is formed on the switching element, the gate wiring, and the source wiring, and the switching element and the pixel electrode are connected via a contact hole penetrating the interlayer insulating film. Therefore, the pixel electrode can be formed to cover the gate wiring and the source wiring. Therefore, the aperture ratio can be increased. Also,
Since the portion formed by overlapping the adjacent colored layers can be formed so as to be completely hidden on the wiring formed on the opposing insulating substrate, there is a concern that the display quality may be degraded due to disorder of the liquid crystal alignment due to the step of the overlapping portion. There is no.

In the liquid crystal display, since the switching element is shielded from light by forming the spacer on the switching element, it is possible to prevent light leakage current from being generated in the switching element.

Further, in the liquid crystal display device, since the spacer is formed in the peripheral portion of the display region, the spacer defines the cell thickness in the peripheral portion of the display region and also functions as the peripheral light shielding portion.

In the method of manufacturing a liquid crystal display device,
A spacer having a liquid crystal layer sandwiched between two insulating substrates, and defining a space between the first insulating substrate and the second insulating substrate, has a two-layer structure of a photosensitive transparent resin and a photosensitive black resin. The thickness of the resin serving as the spacer can be adjusted by changing the thickness of the photosensitive transparent resin by providing a process of forming the spacer so that the thickness of the black resin is increased as compared with the case where the thickness of the black resin is increased. Since it is not necessary to increase the irradiation amount of ultraviolet rays at the time of exposure, the throughput is not reduced. In addition, when removing unnecessary resin on the pixel during development, the transparent resin is located under the black resin, preventing the black resin from adhering to the pixel and reducing defects due to residue on the pixel. I do. Further, a spraying step using a conventional spacer spraying device is not required, and when manufacturing a liquid crystal display device having a different cell thickness,
Conventionally, it is necessary to change the type of the spacer to be sprayed. However, this configuration can cope with this by changing the application condition of the resin serving as the spacer.

In the above-mentioned method for manufacturing a liquid crystal display device, the first insulating substrate includes a switching element formed in a matrix, a gate wiring for controlling the switching element, and a data signal applied to the switching element. Supplying and forming a source wiring formed so as to be orthogonal to the preceding gate wiring, and further, an interlayer insulating film is formed on the switching element, the gate wiring, and the source wiring;
Since the method includes a step of connecting the switching element and a pixel electrode on the interlayer insulating film via a contact hole penetrating the interlayer insulating film, the pixel electrode is formed on the interlayer insulating film, and the pixel electrode is connected to a gate wiring, Since it is formed so as to cover the area of the source wiring, adjacent colored layers are in contact with each other, or a portion formed by overlapping can be formed so as to be completely hidden on the source wiring formed on the opposing insulating substrate,
Even if the bonding in the bonding step is displaced to some extent, there is no concern that the display quality will be degraded due to the disorder of the liquid crystal alignment due to the step of the overlapping portion.

Further, in the above-mentioned method of manufacturing a liquid crystal display device, there is provided a step of forming the spacer so as to be located on the switching element, and the light shielding portion of the TFT can be formed by self-alignment by backside exposure. Is simplified.

Further, in the above-mentioned method for manufacturing a liquid crystal display device, the method further comprises a step of forming the spacer around a display area. According to the above configuration, since the spacers can be simultaneously manufactured as the peripheral light-shielding portions, the process is simplified.

[0047]

According to the present invention, when a spacer for defining a substrate interval is formed by photolithography, the exposure step can be formed by self-alignment.
It is possible to obtain a liquid crystal display device capable of preventing deterioration of display quality due to residue on a pixel and enabling an arbitrary design of a cell thickness for defining optical characteristics.

[Brief description of the drawings]

FIG. 1 is an explanatory cross-sectional view of a liquid crystal display device according to an embodiment.

FIG. 2 is an explanatory diagram of an active matrix substrate in the liquid crystal display device according to the embodiment.

FIG. 3 is a sectional view taken along the line AA ′ in FIG. 2;

FIG. 4 is an explanatory diagram of a color filter substrate in the liquid crystal display device according to the embodiment.

FIG. 5 is a sectional view taken along the line BB ′ in FIG. 4;

FIG. 6 is a sectional view taken along the line CC ′ in FIG. 4;

FIG. 7 is an explanatory diagram of a color filter substrate in the liquid crystal display device according to the second embodiment.

FIG. 8 is a sectional view taken along the line DD ′ in FIG. 7;

FIG. 9 is an explanatory diagram of a conventional liquid crystal display device.

[Explanation of symbols]

 Reference Signs List 11 first insulating substrate 12 TFT 13 gate wiring 14 source wiring 15 interlayer insulating film 16 contact hole 17 first pixel electrode 18 alignment film 21 second insulating substrate 22r colored layer (red) 22g colored layer (line 22b Colored layer (blue) 23 Second pixel electrode 24 Overlapping portion of colored layer 25 Alignment film 26 Injection port 3 Liquid crystal 41 Photosensitive transparent resin 42 Photosensitive black resin 5 Sealant

Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat II (reference) G09F 9/30 349 G02F 1/136 500 F term (reference) 2H089 LA02 LA07 LA12 MA03X NA14 QA05 QA14 TA09 TA12 2H092 GA29 JA37 JA41 JA47 JB52 JB56 KB25 MA05 MA13 MA17 MA41 PA03 PA08 5C094 AA03 AA16 AA43 AA48 AA55 BA03 BA43 CA19 CA24 DA13 DB01 DB04 EA04 EB02 EC03 EC04 ED03 ED15 FA01 FA02 FB01 FB15 GB10

Claims (8)

[Claims] 1. A liquid crystal display device comprising: a liquid crystal layer; a pair of insulating substrates sandwiching the liquid crystal layer; and a spacer for defining a distance between the pair of insulating substrates. A liquid crystal display device having a two-layer structure of a resin layer and a photosensitive black resin layer. 2. The liquid crystal display device according to claim 1, wherein one of the pair of insulating substrates includes a switching element formed in a matrix, a gate wiring for supplying a control voltage to the switching element, and the gate. A source wiring formed to be orthogonal to the wiring, and supplying a data signal to the switching element, and an interlayer insulating film is formed on the switching element, the gate wiring, and the source wiring, and A liquid crystal display device, wherein a switching element and a pixel electrode on the interlayer insulating film are connected via a contact hole penetrating the interlayer insulating film. 3. The liquid crystal display device according to claim 2, wherein the spacer is located on a switching element. 4. The liquid crystal display device according to claim 2, wherein the spacer is formed at a peripheral portion of a display area. 5. A method for manufacturing a liquid crystal display device comprising: a liquid crystal layer; a pair of insulating substrates sandwiching the liquid crystal layer; and a spacer for defining a distance between the pair of insulating substrates. A photosensitive transparent resin layer is formed on at least one of the insulating substrates, and then a photosensitive black resin layer is formed thereon to form a two-layer structure, defining a distance between a pair of insulating substrates sandwiching the liquid crystal layer. A method for manufacturing a liquid crystal display device, comprising a step of forming a spacer to be used. 6. The method for manufacturing a liquid crystal display device according to claim 5, wherein a switching element formed in a matrix on one of the pair of insulating substrates, a gate wiring for controlling the switching element, and the gate. Forming a source line formed to be orthogonal to the wiring and supplying a data signal to the switching element; and a contact hole penetrating an interlayer insulating film formed on the switching element, the gate wiring, and the source wiring. Connecting the switching element and a pixel electrode formed on an interlayer insulating film via a semiconductor device. 7. The method for manufacturing a liquid crystal display device according to claim 6, further comprising the step of forming the spacer so as to be located on the switching element. 8. The method for manufacturing a liquid crystal display device according to claim 6, further comprising the step of forming the spacer at a peripheral portion of a display area.