JP2001240968A - Sliding part and manufacturing method thereof - Google Patents
Sliding part and manufacturing method thereofInfo
- Publication number
- JP2001240968A JP2001240968A JP2000053975A JP2000053975A JP2001240968A JP 2001240968 A JP2001240968 A JP 2001240968A JP 2000053975 A JP2000053975 A JP 2000053975A JP 2000053975 A JP2000053975 A JP 2000053975A JP 2001240968 A JP2001240968 A JP 2001240968A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- diamond thin
- diamond
- sliding
- sliding portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 41
- 239000010432 diamond Substances 0.000 claims abstract description 41
- 239000010409 thin film Substances 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 20
- 239000000919 ceramic Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 13
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 238000004050 hot filament vapor deposition Methods 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 9
- 239000006061 abrasive grain Substances 0.000 abstract description 3
- 238000005299 abrasion Methods 0.000 abstract description 2
- 238000009499 grossing Methods 0.000 abstract description 2
- 238000005498 polishing Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100321669 Fagopyrum esculentum FA02 gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 102100032704 Keratin, type I cytoskeletal 24 Human genes 0.000 description 1
- 229910000914 Mn alloy Inorganic materials 0.000 description 1
- UWTVDIWVFAQDFS-UHFFFAOYSA-N [Mn].[Cr].[C] Chemical compound [Mn].[Cr].[C] UWTVDIWVFAQDFS-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 102220057728 rs151235720 Human genes 0.000 description 1
Landscapes
- Sliding-Contact Bearings (AREA)
- Ceramic Products (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
(57)【要約】
【課題】 硬度や耐摩耗性に優れると共に、ダイヤモン
ド薄膜が基材から剥離し難い摺動部材と、このような摺
動部材を簡易かつ低コストで作製できる製造方法とを提
供する。
【解決手段】 セラミック製の基材表面にダイヤモンド
薄膜を有する第一摺動部材と第二摺動部材とを用意する
工程と、第一摺動部と第二摺動部のダイヤモンド薄膜同
士を擦り合わせることでダイヤモンド薄膜表面を平滑に
する工程とを具える。この方法により、高価なダイヤモ
ンド砥粒を用いることなくダイヤモンド薄膜表面を精度
良く研磨することができる。PROBLEM TO BE SOLVED: To provide a sliding member which is excellent in hardness and abrasion resistance and in which a diamond thin film is hardly peeled off from a substrate, and a manufacturing method which can produce such a sliding member easily and at low cost. provide. SOLUTION: A step of preparing a first sliding member and a second sliding member having a diamond thin film on the surface of a ceramic base material, and rubbing the diamond thin films of the first sliding portion and the second sliding portion. A step of smoothing the surface of the diamond thin film by combining them. According to this method, the surface of the diamond thin film can be accurately polished without using expensive diamond abrasive grains.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、軸受けや耐摩工具
等に好適な摺動部とその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sliding portion suitable for a bearing, a wear-resistant tool, and the like, and a method of manufacturing the sliding portion.
【０００２】[0002]
【従来の技術】一般に、摺動部材は、第一摺動部と、そ
の相手材となる第二摺動部とを具えている。従来、これ
ら摺動部には、炭素-クロム-マンガン系合金鋼やクロム
-マンガン-バナジウム-モリブデン系鋼などの硬質合金
鋼を使用するのが一般的である。2. Description of the Related Art Generally, a sliding member has a first sliding portion and a second sliding portion which is a mating member thereof. Conventionally, these sliding parts are made of carbon-chromium-manganese alloy steel or chromium
It is common to use hard alloy steels such as -manganese-vanadium-molybdenum steels.
【０００３】しかし、いずれの構成材料も硬度や耐摩耗
性が不十分なため長期の使用には耐えられない。この問
題点を解決するために、例えば特開昭62-72921号公報で
は合金鋼などの金属基材の上にダイヤモンドを被覆した
回転軸や軸受けが開示されている。However, none of the constituent materials has sufficient hardness and wear resistance and cannot be used for a long time. In order to solve this problem, for example, Japanese Patent Application Laid-Open No. 62-72921 discloses a rotating shaft or a bearing in which diamond is coated on a metal base such as alloy steel.
【０００４】[0004]
【発明が解決しようとする課題】確かに金属基材の上に
ダイヤモンドを被覆した回転軸や軸受けは、硬度や耐摩
耗性の観点からは好ましい。しかし、使用中にダイヤモ
ンド薄膜が基材から剥離し長時間の使用に耐えられない
という問題が発生した。また、このようなダイヤモンド
被覆摺動材の場合、基材に被覆したダイヤモンド表面を
平滑にする必要があり、そのためには製造コストが高い
ダイヤモンド砥粒を用いた研磨が必須であるなどの問題
点があった。特に、摺動部の形状が複雑な曲面形状であ
れば、このような研磨加工は極めて難しい。A rotating shaft or a bearing in which diamond is coated on a metal substrate is preferable from the viewpoint of hardness and wear resistance. However, there has been a problem that the diamond thin film peels off from the base material during use and cannot be used for a long time. In addition, in the case of such a diamond-coated sliding material, it is necessary to smooth the surface of the diamond coated on the base material, and for that purpose, polishing using diamond abrasive grains having high manufacturing costs is indispensable. was there. In particular, if the shape of the sliding portion is a complicated curved surface, such polishing is extremely difficult.
【０００５】従って、本発明の主目的は、耐摩耗性に優
れると共にダイヤモンド薄膜が基材から剥離し難い摺動
部と、このような摺動部を簡易かつ低コストで作製でき
る製造方法とを提供することにある。Accordingly, a main object of the present invention is to provide a sliding portion which is excellent in abrasion resistance and in which a diamond thin film is hard to peel off from a substrate, and a manufacturing method which can produce such a sliding portion easily and at low cost. To provide.
【０００６】[0006]
【課題を解決するための手段】本発明は、基材をセラミ
ックス材料とすることで上記の目的を達成する。すなわ
ち、本発明摺動部は、セラミック製の基材と、基材表面
の少なくとも一部に形成されたダイヤモンド薄膜とを具
えることを特徴とする。According to the present invention, the above object is achieved by using a base material made of a ceramic material. That is, the sliding portion of the present invention is characterized by comprising a ceramic base material and a diamond thin film formed on at least a part of the base material surface.
【０００７】このような摺動部は、耐摩耗性が要求され
るあらゆる用途に利用可能であるが、特に軸受けまたは
軸としての利用が好適である。[0007] Such a sliding portion can be used for all applications requiring wear resistance, but is particularly suitable for use as a bearing or a shaft.
【０００８】基材にセラミックスを用いることにより、
基材とダイヤモンド薄膜の密着性を向上させて摺動時の
剥離を抑制し、長期間使用することが可能となる。基材
にセラミックを用いるとダイヤモンド薄膜の密着性が向
上する理由は明らかではないが、ダイヤモンドとセラミ
ックスとの熱膨張率差がダイヤモンドと金属とのそれに
比べて小さく、膜中に生じる応力が小さいためだと考え
られる。また、セラミックスの中では、特に窒化ケイ素
の熱膨張率がダイヤモンドの熱膨張率に近く、窒化ケイ
素を主成分とする材料を基材に用いることが望ましい。[0008] By using ceramics for the substrate,
By improving the adhesion between the substrate and the diamond thin film, the peeling at the time of sliding can be suppressed, and it can be used for a long time. It is not clear why the use of ceramic as the base material improves the adhesion of the diamond thin film, but the difference in thermal expansion coefficient between diamond and ceramic is smaller than that between diamond and metal, and the stress generated in the film is small. It is thought that. Further, among ceramics, the thermal expansion coefficient of silicon nitride is particularly close to that of diamond, and it is desirable to use a material containing silicon nitride as a main component for the base material.
【０００９】ダイヤモンド薄膜の厚みは必要に応じて変
更できるが、一般に1μm〜20μm程度が好ましい。薄膜
の厚みが1μm未満であると摺動時に基材から剥離する可
能性が高まる。逆に、厚みが20μmを超えると研磨して
も研磨後の表面荒さが大きく、摺動時の摩擦が激しいた
めである。特に、5〜12μm程度の厚みが好適である。Although the thickness of the diamond thin film can be changed as required, it is generally preferably about 1 μm to 20 μm. If the thickness of the thin film is less than 1 μm, the possibility of peeling from the substrate during sliding increases. Conversely, if the thickness exceeds 20 μm, even after polishing, the surface roughness after polishing is large, and the friction during sliding is severe. In particular, a thickness of about 5 to 12 μm is preferable.
【００１０】また、本発明摺動部の製造方法は、摺動部
のダイヤモンド薄膜同士を擦り合わせて表面を平滑にす
ることで上記の目的を達成する。すなわち、セラミック
製の基材表面にダイヤモンド薄膜を有する第一摺動部と
第二摺動部とを用意する工程と、第一摺動部と第二摺動
部のダイヤモンド薄膜同士を擦り合わせることでダイヤ
モンド薄膜表面を平滑にする工程とを具えることを特徴
とする。Further, the method of the present invention for producing a sliding portion achieves the above object by rubbing the diamond thin films of the sliding portion with each other to smooth the surface. That is, a step of preparing a first sliding portion and a second sliding portion having a diamond thin film on the surface of a ceramic substrate, and rubbing the diamond thin films of the first sliding portion and the second sliding portion. And smoothing the surface of the diamond thin film.
【００１１】この製造方法においても、基材は特に窒化
ケイ素が好ましく、ダイヤモンド薄膜の成膜時の厚みは
1μm〜20μm程度が好ましい。Also in this manufacturing method, the substrate is particularly preferably silicon nitride, and the thickness of the diamond thin film at the time of film formation is
About 1 μm to 20 μm is preferable.
【００１２】ダイヤモンド薄膜を形成する手段として
は、ダイヤモンド成膜に用いる一般的な製造技術が使用
可能である。特に低コストで成膜が可能なマイクロ波CV
D法もしくは熱フィラメントCVD法が望ましい。より具体
的な成膜条件としては、マイクロ波CVD法では、マイク
ロ波電源の周波数：0.1〜10GHz程度（一例としては2.45
GHz）、基材温度：700〜1000℃程度、雰囲気：メタンと
水素の混合気体とし、熱フィラメントCVD法では、熱フ
ィラメント温度：2000℃以上、基材温度：700〜1000℃
程度、雰囲気：メタンと水素の混合気体として成膜する
ことが挙げられる。As a means for forming a diamond thin film, a general manufacturing technique used for forming a diamond film can be used. In particular, microwave CVs that can be deposited at low cost
D method or hot filament CVD method is desirable. As a more specific film formation condition, in the microwave CVD method, the frequency of the microwave power supply is about 0.1 to 10 GHz (for example, 2.45 GHz).
GHz), base material temperature: about 700 to 1000 ° C, atmosphere: a mixed gas of methane and hydrogen, hot filament CVD method: hot filament temperature: 2000 ° C or higher, base material temperature: 700 to 1000 ° C
Degree and atmosphere: forming a film as a mixed gas of methane and hydrogen.
【００１３】本発明方法によれば、高価なダイヤモンド
砥粒等の使用が抑えられ、しかも互いの摺動面を精度良
く研磨することができるため、低コストで高精度の摺動
部を作製することが可能となる。According to the method of the present invention, the use of expensive diamond abrasive grains and the like can be suppressed, and the sliding surfaces of each other can be polished with high precision. It becomes possible.
【００１４】[0014]
【発明の実施の形態】以下、本発明の実施の形態を説明
する。直径：7.6mm、長さ：30mmの窒化ケイ素の内軸お
よび内径：8mm、外径：20mm、長さ20mmの窒化ケイ素製
外輪を用意し、内軸の外面および外輪の内面に熱フィラ
メントCVD法でそれぞれ厚さ0.5、2、10、15、30μmのダ
イヤモンド薄膜を成膜した。成膜条件は、雰囲気：H2-1
％CH4、圧力：13332.2Pa（100Torr）、基材温度：850
℃、保持時間：30分〜30時間程度である。Embodiments of the present invention will be described below. Prepare a silicon nitride outer ring of diameter: 7.6mm, length: 30mm, inner diameter of silicon nitride of 30mm, inner diameter: 8mm, outer diameter: 20mm, length of 20mm. Hot filament CVD method on the outer surface of inner shaft and inner surface of outer ring Thus, diamond thin films having thicknesses of 0.5, 2, 10, 15, and 30 μm were formed. The film formation conditions are as follows: atmosphere: H 2 -1
% CH 4 , pressure: 13332.2 Pa (100 Torr), substrate temperature: 850
° C, retention time: about 30 minutes to 30 hours.
【００１５】次に、外輪を固定して内軸を60000rpmで回
転させながら外輪内面に10分間接触させたところ、内軸
外面のダイヤモンドと外輪内面のダイヤモンドがお互い
に研磨され、両者は平滑な表面となった。面粗度は、研
磨前のRmax＝10μｍから研磨後のRmax＝0.2μmに大幅に
改善した。また、真円度は20μmから5μmに改善した。Next, the outer ring was fixed and brought into contact with the inner surface of the outer ring for 10 minutes while rotating the inner shaft at 60,000 rpm. It became. The surface roughness was greatly improved from Rmax = 10 μm before polishing to Rmax = 0.2 μm after polishing. The roundness was improved from 20 μm to 5 μm.
【００１６】上記によって作製した回転軸及び軸受けに
て回転試験装置を作り回転数5000rpm、3000時間無給油
にて回転試行後、ダイヤモンド被覆面をSEM（Scanning
Electron Microscope）で観察した結果は何等の損傷
も認められなかった。A rotation test device was prepared using the rotating shaft and the bearing prepared as described above, and after a rotation trial at 5000 rpm for 3000 hours without lubrication, the diamond-coated surface was subjected to SEM (Scanning).
No damage was observed as a result of observation with an Electron Microscope).
【００１７】比較例として、上記軸受けの基材をCr-Mo
合金鋼製材料に変更して同様な条件で、内軸と外輪に成
膜した。このようにして作製した回転軸及び軸受けにて
回転試験装置を作り回転数5000rpmで回転試行を行い、1
00時間の時点でダイヤモンド被覆面をSEM観察した結
果、表面が大きく損傷していることが明らかとなった。As a comparative example, the base material of the bearing was Cr-Mo
The film was formed on the inner shaft and the outer ring under the same conditions by changing to the alloy steel material. A rotation test device was made with the rotating shaft and the bearing thus manufactured, and a rotation trial was performed at a rotation speed of 5000 rpm.
SEM observation of the diamond-coated surface at the time of 00 hours revealed that the surface was significantly damaged.
【００１８】また、上記外輪内面をダイヤモンド電着砥
石を用いて円筒研削盤で研磨したところ、外輪の面粗度
はRmax＝1μm、真円度は10μmでありダイヤモンド被覆
内軸を用いて加工を行った場合より加工精度が著しく劣
った。When the inner surface of the outer ring was polished by a cylindrical grinder using a diamond electrodeposition grindstone, the surface roughness of the outer ring was Rmax = 1 μm, and the roundness was 10 μm. Processing precision was remarkably inferior to the case where it was performed.
【００１９】上記実施例と同様な手法で、内軸と外輪に
膜厚：1.3μm、2μｍ、10μｍ、15μｍ、30μmの成膜を
行い、内軸と外輪の加工（60000rpm×10分）ならびにダ
イヤモンド薄膜が剥離するまでの回転試行（5000rpm、
無給油）を行った。その結果を表１に示す。In the same manner as in the above embodiment, a film having a thickness of 1.3 μm, 2 μm, 10 μm, 15 μm, and 30 μm is formed on the inner shaft and the outer ring, and the inner shaft and the outer ring are processed (60000 rpm × 10 minutes) and diamond is formed. Rotation trial until the thin film peels (5000rpm,
(No lubrication). Table 1 shows the results.
【００２０】[0020]
【表１】 [Table 1]
【００２１】成膜時の膜厚が薄い場合は剥離するまでの
回転試行時間が短く、成膜時の膜厚が厚い場合は、加工
後のRmaxが大きくいずれも剥離するまでの回転試行時間
が短い。When the film thickness at the time of film formation is small, the rotation trial time until peeling is short, and when the film thickness at the time of film formation is large, the Rmax after processing is large and the rotation trial time until peeling is large. short.
【００２２】尚、本発明の摺動部およびその製造方法
は、上述の具体例にのみ限定されるものではなく、本発
明の要旨を逸脱しない範囲内において種々変更を加え得
ることは勿論である。It should be noted that the sliding portion of the present invention and the method of manufacturing the sliding portion are not limited to the specific examples described above, and it is a matter of course that various changes can be made without departing from the gist of the present invention. .
【００２３】[0023]
【発明の効果】以上説明したように、本発明の摺動部は
従来のものに比べてダイヤモンド薄膜が剥離し難く、耐
久性が著しく優れている。また、本発明摺動部の製造方
法は、低コストで非常に表面粗さが高精度の摺動部を得
ることができる。As described above, the sliding portion of the present invention is less likely to peel off the diamond thin film than the conventional sliding portion, and has extremely excellent durability. In addition, according to the method for manufacturing a sliding portion of the present invention, a sliding portion having very high surface roughness and high precision can be obtained at low cost.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｆ１６Ｃ 33/24 Ｃ０４Ｂ 35/58 １０２Ｙ Ｆターム(参考） 3J011 AA20 DA01 DA02 LA04 MA02 QA04 SD03 SE01 4G001 BA32 BA60 BB32 BB60 BC72 BD12 4K030 AA09 AA17 BA28 CA05 DA08 FA02 FA10 KA24 KA30 LA23──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) F16C 33/24 C04B 35/58 102Y F-term (Reference) 3J011 AA20 DA01 DA02 LA04 MA02 QA04 SD03 SE01 4G001 BA32 BA60 BB32 BB60 BC72 BD12 4K030 AA09 AA17 BA28 CA05 DA08 FA02 FA10 KA24 KA30 LA23
Claims (8)
くとも一部に形成されたダイヤモンド薄膜とを具えるこ
とを特徴とする摺動部。1. A sliding part comprising a ceramic base material and a diamond thin film formed on at least a part of the surface of the base material.
特徴とする請求項1記載の摺動部。2. The sliding part according to claim 1, wherein the sliding part is used as a bearing or a shaft.
成分とすることを特徴とする請求項1または2記載の摺動
部。3. The sliding part according to claim 1, wherein the ceramic base material contains silicon nitride as a main component.
ることを特徴とする請求項1〜3のいずれかに記載の摺動
部。4. The sliding part according to claim 1, wherein the thickness of the diamond thin film is 1 to 20 μm.
薄膜を有する第一摺動部と第二摺動部とを用意する工程
と、 第一摺動部と第二摺動部のダイヤモンド薄膜同士を擦り
合わせることでダイヤモンド薄膜表面を平滑にする工程
とを具えることを特徴とする摺動部の製造方法。5. A step of preparing a first sliding portion and a second sliding portion having a diamond thin film on the surface of a ceramic base material, and forming a diamond thin film between the first sliding portion and the second sliding portion. Grinding the diamond thin film surface by rubbing.
成分とすることを特徴とする請求項5記載の摺動部の製
造方法。6. The method for producing a sliding portion according to claim 5, wherein the ceramic base material contains silicon nitride as a main component.
法またはマイクロ波CVD法によって形成されることを特
徴とする請求項5または6記載の摺動部の製造方法。7. A thin film of diamond is formed by hot filament CVD.
7. The method for producing a sliding part according to claim 5, wherein the sliding part is formed by a method or a microwave CVD method.
0μmであることを特徴とする請求項5〜7のいずれかに記
載の摺動部材の製造方法。8. The thickness of the diamond thin film during film formation is 1 to 2
8. The method for manufacturing a sliding member according to claim 5, wherein the thickness is 0 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000053975A JP2001240968A (en) | 2000-02-29 | 2000-02-29 | Sliding part and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000053975A JP2001240968A (en) | 2000-02-29 | 2000-02-29 | Sliding part and manufacturing method thereof |
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| JP2001240968A true JP2001240968A (en) | 2001-09-04 |
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| JP2000053975A Pending JP2001240968A (en) | 2000-02-29 | 2000-02-29 | Sliding part and manufacturing method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005524801A (en) * | 2002-04-24 | 2005-08-18 | ディアッコン ゲーエムベーハー | Sliding member and method for manufacturing the sliding member |
| CN103732932A (en) * | 2012-08-10 | 2014-04-16 | 大同金属工业株式会社 | Sliding member, split sliding bearing using the same, and method of manufacturing split sliding bearing |
| WO2014123233A1 (en) * | 2013-02-07 | 2014-08-14 | 株式会社タンケンシールセーコウ | Mechanical seal and manufacturing method thereof |
-
2000
- 2000-02-29 JP JP2000053975A patent/JP2001240968A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005524801A (en) * | 2002-04-24 | 2005-08-18 | ディアッコン ゲーエムベーハー | Sliding member and method for manufacturing the sliding member |
| CN103732932A (en) * | 2012-08-10 | 2014-04-16 | 大同金属工业株式会社 | Sliding member, split sliding bearing using the same, and method of manufacturing split sliding bearing |
| WO2014123233A1 (en) * | 2013-02-07 | 2014-08-14 | 株式会社タンケンシールセーコウ | Mechanical seal and manufacturing method thereof |
| JPWO2014123233A1 (en) * | 2013-02-07 | 2017-02-02 | 株式会社タンケンシールセーコウ | Mechanical seal and manufacturing method thereof |
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