JP2001121558A - Production of polymeric sheet and optical polymeric sheet - Google Patents
Production of polymeric sheet and optical polymeric sheetInfo
- Publication number
- JP2001121558A JP2001121558A JP30209299A JP30209299A JP2001121558A JP 2001121558 A JP2001121558 A JP 2001121558A JP 30209299 A JP30209299 A JP 30209299A JP 30209299 A JP30209299 A JP 30209299A JP 2001121558 A JP2001121558 A JP 2001121558A
- Authority
- JP
- Japan
- Prior art keywords
- polymer sheet
- curable resin
- ultraviolet
- resin composition
- laminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000011342 resin composition Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000002994 raw material Substances 0.000 claims abstract description 11
- 230000003746 surface roughness Effects 0.000 claims abstract description 8
- 229920000642 polymer Polymers 0.000 claims description 57
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 239000004695 Polyether sulfone Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 229920006393 polyether sulfone Polymers 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 27
- 239000000758 substrate Substances 0.000 description 18
- 239000011521 glass Substances 0.000 description 9
- 238000001035 drying Methods 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- 229910052753 mercury Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010030 laminating Methods 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 239000002648 laminated material Substances 0.000 description 3
- -1 acrylate compound Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Moulding By Coating Moulds (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、高分子シートの製
造方法において、平面平滑性に優れ、リタデーションの
小さい高分子シートを効率良く製造する方法、及びこれ
を用いて製造した光学用シートに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for efficiently producing a polymer sheet having excellent planar smoothness and small retardation, and an optical sheet produced by using the same. It is.
【０００２】[0002]
【従来の技術】従来、液晶表示素子用透明電極基板には
ガラス基板が採用されてきたが、ガラス基板を用いた液
晶表示素子においては、ガラス基板自体が厚いため液晶
表示素子自体の薄型化が困難であると共に、軽量化しに
くいという欠点があり、更に耐衝撃性の点で問題があっ
た。このガラス基板液晶表示素子のもつ欠点を改善する
方法として、光学用高分子シートを用いて液晶表示素子
を作製することにより、軽量化、耐衝撃性の向上が検討
されている。例えば、特開昭５３−６８０９９号公報及
び特開昭５４−１２６５５９号公報には、ガラス基板の
代わりに導電性酸化金属物質を蒸着した長尺のポリエス
テルフィルムを用いて液晶表示素子を連続して製造する
ことが示されているが、研磨により極めて良好な平滑性
が得られるガラス基板と異なり、高分子シートの場合に
は表面の平滑性に優れているとは言い難いものであっ
た。特に、高精細な表示を得るためにＳＴＮ（Super Tw
isted Nematic）型液晶表示素子とした場合には、間隔
を0.1μm単位で制御された基板間の液晶の複屈折性を利
用して表示を行うために前記の高分子シートの表面平滑
性が極めて重大になっている。2. Description of the Related Art Conventionally, a glass substrate has been adopted as a transparent electrode substrate for a liquid crystal display element. However, in a liquid crystal display element using a glass substrate, the thickness of the liquid crystal display element itself is reduced because the glass substrate itself is thick. It is difficult and it is difficult to reduce the weight, and there is a problem in terms of impact resistance. As a method for improving the disadvantages of the glass substrate liquid crystal display device, reduction in weight and improvement in impact resistance by manufacturing a liquid crystal display device using an optical polymer sheet have been studied. For example, JP-A-53-68099 and JP-A-54-126559 disclose liquid crystal display elements using a long polyester film on which a conductive metal oxide material is deposited instead of a glass substrate. Although production is shown, unlike a glass substrate which can obtain extremely good smoothness by polishing, it is hard to say that a polymer sheet has excellent surface smoothness. In particular, STN (Super Twist)
In the case of an isted Nematic) type liquid crystal display element, the surface smoothness of the polymer sheet is extremely high in order to perform display using the birefringence of the liquid crystal between the substrates, the spacing of which is controlled in units of 0.1 μm. It is getting serious.
【０００３】表面平滑性を解決する方法として、液状の
紫外線硬化性樹脂組成物または熱硬化性樹脂組成物を研
磨ガラス面上等に流し込み、これを硬化してシートを得
る方法が提案されている。しかし、本方法では、得られ
るシートが脆く取り扱い時に割れたり欠けるという問題
が起こっており、ガラス基板に対して高分子シートを用
いる優位性が十分発揮されていない。さらに、該方法は
生産性が低く、結果として基板が高価になってしまう。As a method for solving the surface smoothness, there has been proposed a method in which a liquid ultraviolet curable resin composition or a thermosetting resin composition is poured onto a polished glass surface or the like and cured to obtain a sheet. . However, in this method, there is a problem that the obtained sheet is brittle and breaks or chipes during handling, and the advantage of using a polymer sheet over a glass substrate is not sufficiently exhibited. Furthermore, the method has low productivity, resulting in expensive substrates.
【０００４】[0004]
【発明が解決しようとする課題】本発明の目的とすると
ころは、高分子シートの表面平滑性が優れ、液晶表示素
子用基板等の光学用高分子シートとして優れた特性を持
つ高分子シートを効率よく連続生産可能である製造方
法、および本方法に適した樹脂を用いることにより前記
特性の良好な光学用高分子シートを提供することにあ
る。SUMMARY OF THE INVENTION An object of the present invention is to provide a polymer sheet having excellent surface smoothness and excellent properties as an optical polymer sheet such as a substrate for a liquid crystal display device. An object of the present invention is to provide a production method capable of efficient continuous production, and to provide a polymer sheet for optics having good characteristics by using a resin suitable for the method.
【０００５】[0005]
【課題を解決するための手段】本発明は、（１）高分子
シート原反上に紫外線硬化性樹脂組成物を塗布またはラ
ミネートし、該紫外線硬化性樹脂組成物が軟化した状態
で表面粗さの最大（Ｒｍａｘ）がＲｍａｘ≦０．１μｍ
の平滑面を有するラミネート原反に密着させて紫外線を
照射し、ラミネート原反の平滑面を転写、成形する高分
子シートの製造方法、（２）該平滑面を有するラミネー
ト原反は、紫外線硬化樹脂に紫外線を照射した後に、剥
離することが可能である第（１）項記載の高分子シート
の製造方法、（３）該ラミネート原反の平滑面の裏面
に、易滑性処理が施されている第（１）又は（２）項記
載の高分子シートの製造方法（４）第（１）〜（３）項
記載の高分子シートの製造方法を用いて製造した光学用
高分子シートを提供するものである。更に、本発明の好
ましい実施形態として、（５）高分子がポリエーテルサ
ルホンである第（４）項記載の光学用高分子シート、を
挙げることができる。According to the present invention, there is provided (1) a method of coating or laminating an ultraviolet-curable resin composition on a raw polymer sheet, and forming a surface roughness in a state where the ultraviolet-curable resin composition is softened. (Rmax) is Rmax ≦ 0.1 μm
A method for producing a polymer sheet for transferring and molding a smooth surface of the raw laminate by irradiating ultraviolet rays while being in close contact with the raw laminate having the smooth surface, (2) the raw laminate having the smooth surface is cured by ultraviolet light (1) The method for producing a polymer sheet according to (1), wherein the resin sheet can be peeled off after being irradiated with ultraviolet rays, and (3) the smooth back surface of the raw laminate is subjected to a lubricity treatment. (4) The method for producing a polymer sheet according to (1) or (2), wherein the polymer sheet for optics produced by the method for producing a polymer sheet according to (1) to (3) is used. To provide. Furthermore, as a preferred embodiment of the present invention, (5) the polymer sheet for optics according to (4), wherein the polymer is polyethersulfone.
【０００６】[0006]
【発明の実施の形態】本発明中の高分子シート原反とし
て使用される高分子の例を挙げると、ポリエステル、ポ
リサルホン、ポリエーテルサルホン、ポリエーテルケト
ン、ポリエーテルエーテルケトン、ポリイミド、ポリア
ミドイミド、ポリカーボネート、エポキシ樹脂、アクリ
ル樹脂、ノルボルネン系高分子及びこれをブレンドした
樹脂等をあげることができるがこれらに限定されるもの
ではない。中でも液晶表示素子製造上、透明性、耐熱
性、加工性、耐衝撃性のバランスの良いポリエーテルサ
ルホンが特に好ましい。高分子シート原反の厚みは、１
０μｍ以上５００μｍ以下が好ましく、更に好ましくは
５０μｍ以上４００μｍ以下である。高分子シートの厚
みが１０μｍ未満であると切れやすく取り扱いが困難で
あり、又、液晶表示素子の基板間隔の保持が難しく、５
００μｍを越えると、基板を屈曲したときに割れやすく
なる。BEST MODE FOR CARRYING OUT THE INVENTION Examples of polymers used as a raw material of a polymer sheet in the present invention include polyester, polysulfone, polyethersulfone, polyetherketone, polyetheretherketone, polyimide, and polyamideimide. , A polycarbonate, an epoxy resin, an acrylic resin, a norbornene-based polymer and a resin blended with the same, but are not limited thereto. Among them, polyethersulfone having a good balance of transparency, heat resistance, workability, and impact resistance is particularly preferable in the production of liquid crystal display elements. The thickness of the raw polymer sheet is 1
The thickness is preferably from 0 μm to 500 μm, and more preferably from 50 μm to 400 μm. If the thickness of the polymer sheet is less than 10 μm, it is easily cut and difficult to handle, and it is difficult to maintain the distance between the substrates of the liquid crystal display element.
If it exceeds 00 μm, the substrate is easily broken when bent.
【０００７】本発明で用いられる紫外線硬化性樹脂組成
物の例を挙げるとアクリレート化合物等を主成分とした
液状の紫外線硬化性樹脂組成物やエポキシ樹脂や不飽和
ポリエステル樹脂を主成分としたシート状の紫外線硬化
性樹脂組成物等である。前者の場合は塗布装置により高
分子シート原反上に塗布し、溶剤を含む場合には乾燥装
置により溶剤を揮発させ、後者の場合には高分子シート
原反上にラミネートする。Examples of the UV-curable resin composition used in the present invention include a liquid UV-curable resin composition containing an acrylate compound or the like as a main component and a sheet-like material containing an epoxy resin or an unsaturated polyester resin as a main component. UV curable resin composition. In the former case, the polymer sheet is coated on the raw polymer sheet by a coating device. When a solvent is contained, the solvent is volatilized by a drying device. In the latter case, the polymer sheet is laminated on the raw polymer sheet.
【０００８】本発明において表面に紫外線硬化性樹脂組
成物を有した高分子シートをＲｍａｘ≦０．１μｍの平
滑面を有するラミネート原反に密着させる際には、その
平滑面が十分に紫外線硬化性樹脂組成物表面に転写され
るよう、紫外線硬化性樹脂組成物は軟化または液化して
いなければならない。紫外線硬化性樹脂組成物には、溶
剤を含まなくても室温で軟化しているものや液状のもの
も有るが、そうでない場合は密着する前にヒーター等に
より加熱を行うか、貼り合わせ時の温度を上げて密着と
同時に軟化させることが必要である。密着させる方法と
しては、ニップロールや帯電固定等の方法が挙げられる
がこれらに限定されるものではない。In the present invention, when a polymer sheet having an ultraviolet-curable resin composition on its surface is brought into close contact with an original laminate having a smooth surface having a Rmax ≦ 0.1 μm, the smooth surface has a sufficient ultraviolet-curing property. The UV-curable resin composition must be softened or liquefied so that it can be transferred to the surface of the resin composition. UV-curable resin compositions include those that are softened at room temperature or liquid even without a solvent, but if they are not, they are heated by a heater or the like before they adhere, It is necessary to raise the temperature and soften at the same time as the adhesion. Examples of a method for bringing the adhesive into close contact include a method such as a nip roll and a charge fixing, but are not limited thereto.
【０００９】本発明において表面に紫外線硬化性樹脂組
成物を有した高分子シートを密着させるラミネート原反
は、表面粗さの最大（Ｒｍａｘ）がＲｍａｘ≦０．１μ
ｍであることが必要である。Ｒｍａｘが０．１μｍを越
えると、表示性が良好な液晶表示素子を製造することが
できない。Ｒｍａｘ≦０．１μｍであるフィルムとして
は、ポリエチレンテレフタレート（以下ＰＥＴと記載）
や、キャスティング法で製造したフィルム、表面研磨し
たフィルムなどが挙げられる。またこれらの平滑面に離
型処理を施しても良い。[0009] In the present invention, the raw material for laminating a polymer sheet having an ultraviolet curable resin composition on its surface has a maximum surface roughness (Rmax) of Rmax ≤ 0.1 µm.
m. When Rmax exceeds 0.1 μm, it is not possible to manufacture a liquid crystal display element having good display properties. As the film satisfying Rmax ≦ 0.1 μm, polyethylene terephthalate (hereinafter referred to as PET)
And a film produced by a casting method, a film having a polished surface, and the like. Also, a release treatment may be performed on these smooth surfaces.
【００１０】本発明においてＲｍａｘ≦０．１μｍの平
滑面を有するラミネート原反としてＰＥＴ等のように紫
外線を透過する透明なラミネート原反を用いることによ
り、ラミネート原反側から高圧水銀灯等の紫外線を照射
することにより紫外線硬化性樹脂組成物を硬化させるこ
とができ、これによりラミネート原反平滑面を転写した
状態で高分子シート原反上に紫外線硬化樹脂層を形成し
て表面が平滑な高分子シートを製造することができる。
また、紫外線照射後に剥離することが可能な為、工程中
で傷付きや異物の付着を防止する保護フィルムとしての
機能がある。In the present invention, by using a transparent laminate material such as PET or the like that transmits ultraviolet light as a laminate material having a smooth surface of Rmax ≦ 0.1 μm, ultraviolet rays from a high-pressure mercury lamp or the like can be applied from the laminate material side. Irradiation can cure the UV-curable resin composition, thereby forming a UV-curable resin layer on the raw polymer sheet in a state where the smooth surface of the laminated raw material has been transferred to form a polymer having a smooth surface. Sheets can be manufactured.
In addition, since it can be peeled off after irradiation with ultraviolet rays, it has a function as a protective film for preventing scratches and adhesion of foreign substances during the process.
【００１１】本発明においてＲｍａｘ≦０．１μｍの平
滑面を有するラミネート原反の平滑面の裏面は易滑性処
理が施されていることが好ましい。これによりラミネー
ト原反を貼り合わせた後に、そのまま工程中を搬送させ
るとき、搬送速度の向上、摩擦帯電による異物の付着防
止の効果があるために、著しく生産性を向上させる事が
できる。以上のようにして製造される光学用高分子シー
トは、液晶表示素子用透明基板用や光学ミラー用基板等
として有用なものである。In the present invention, it is preferable that the smooth back surface of the raw laminate having a smooth surface of Rmax ≦ 0.1 μm is subjected to a lubricity treatment. This allows the productivity to be remarkably improved when the sheet is conveyed as it is during the process after laminating the original laminate, because it has an effect of improving the conveying speed and preventing adhesion of foreign matter due to frictional electrification. The optical polymer sheet manufactured as described above is useful as a transparent substrate for a liquid crystal display device, a substrate for an optical mirror, or the like.
【００１２】[0012]
【実施例】以下本発明を実施例によって説明するが、本
発明は実施例により何ら限定されるものではない。シー
トの光学的物性は次の方法により測定した。 （１）シート厚み 接触式ダイヤルゲージで高分子シートの幅方向に２０ｍ
ｍ間隔で測定した平均値。 （２）高分子シートの表面粗さの最大（Ｒｍａｘ） 接触式の精密段差計（TENCOR INSTRUMENTS製、AlPHA-ST
EP200）により、高分子シートの幅方向に２ｍｍのスキ
ャン幅にて全幅を測定した凹凸の最大値。 （３）ラミネート原反面の表面粗さの最大（Ｒｍａｘ） （株）ミツトヨ製接触式表面粗さ計により、ラミネート
原反の幅方向にカットオフ長さ０．８ｍｍにて全幅を測
定したときの凹凸の最大値。EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to the examples. The optical properties of the sheet were measured by the following methods. (1) Sheet thickness 20 m in the width direction of the polymer sheet with a contact type dial gauge
Average value measured at m intervals. (2) Maximum surface roughness of polymer sheet (Rmax) Contact type precision step meter (manufactured by TENCOR INSTRUMENTS, AlPHA-ST)
EP200) is the maximum value of the concavities and convexities measured over the entire width of the polymer sheet at a scan width of 2 mm in the width direction. (3) Maximum surface roughness of the raw laminate surface (Rmax) When the total width was measured at a cutoff length of 0.8 mm in the width direction of the raw laminate using a contact type surface roughness meter manufactured by Mitutoyo Corporation. The maximum value of unevenness.
【００１３】《実施例１》厚さ２００μｍ、表面粗さの
最大（Ｒｍａｘ）が０．３μｍのポリエーテルサルホン
を高分子シート原反として用い、巻出装置、コーター
部、加熱乾燥ゾーン、ラミネートロール、高圧水銀灯、
巻取装置を有する製造装置を用いて次の加工を行った。
まず、紫外線硬化性樹脂組成物として分子量１５４０融
点７０℃のエポキシアクリレートプレポリマー（昭和高
分子製、ＶＲ−６０）１００重量部、酢酸ブチル３００
重量部，セロソルブアセテート１００重量部，ベンゾイ
ンエチルエーテル２重量部を５０℃にて撹拌、溶解して
均一な溶液としたものをコーター部のグラビヤロールコ
ーターで乾燥前膜厚５μｍで塗布し、加熱乾燥ゾーン中
１００℃で５分間加熱して溶媒を除去した。溶媒除去後
の紫外線硬化性樹脂組成物はペースト状の軟化状態であ
った。続いてニップロールを用いて、Ｒｍａｘ＝０．０
６μｍであるラミネート原反に密着させて８０ｗ／ｃｍ
の紫外線を照射して紫外線硬化性樹脂組成物を硬化さ
せ、巻取装置で巻き取って高分子シートを連続的に得
た。紫外線の照射時間は１０秒間であった。得られた高
分子シートのラミネート原反面に接した面のＲｍａｘを
測定したところ０．０６μｍであった。次に、このラミ
ネート原反を剥離した後、高分子シート上に、ＤＣマグ
ネトロン法により、初期真空度３×１０-4Ｐａの状態か
ら酸素／アルゴンガス９％の混合ガスを導入して３×１
０-1Ｐａの条件下においてスパッタリングを行い５００
Å厚のＳｉＯ2を得た。続いて、透明導電膜として、同
じくＤＣマグネトロン法により初期真空度３×１０-4Ｐ
ａの状態から酸素／アルゴンガス４％の混合ガスを導入
して１×１０-1Ｐａの条件下においてスパッタリングを
行いＩｎ／Ｉｎ＋Ｓｎの原子比が０．９８である酸化イ
ンジウム錫（ＩＴＯ）からなる透明導電膜を得た。測定
の結果、膜厚は１６００Å、比抵抗は４×１０-4Ω−ｃ
ｍであった。ＩＴＯを成膜後、レジストを塗布して現像
し、エッチング液として１０ｖｏｌ％ＨＣｌ、液温４０
℃中でパターンエッチングし、対角長さ３インチ、Ｌ／
Ｓ＝１５０／５０μｍの表示パターンを形成した。パタ
ーン形成後、ＳＴＮ用配向膜を塗布し、１５０℃２ｈｒ
の焼成処理を行った後、２４０度ツイストの配向となる
ようラビング処理を行った。ラビング処理後、スペーサ
ーを散布し、シール剤を塗布し、１３０℃でシール硬化
させてセル化し、ＳＴＮ用液晶組成物を注入した。偏光
板をコントラストの最大となる位置に貼り合わせて液晶
表示素子を作製した。この液晶表示素子を駆動電圧０Ｖ
から±５Ｖで点灯試験を行ったところ、液晶のセルギャ
ップ異常による表示ムラは見られず良好な表示を示し
た。Example 1 An unwinder, a coater, a heating and drying zone, and a laminate were used, using a polyether sulfone having a thickness of 200 μm and a maximum surface roughness (Rmax) of 0.3 μm as a raw material of a polymer sheet. Roll, high pressure mercury lamp,
The following processing was performed using a manufacturing apparatus having a winding device.
First, 100 parts by weight of an epoxy acrylate prepolymer (VR-60, manufactured by Showa Polymer) having a molecular weight of 1540 and a melting point of 70 ° C. as a UV-curable resin composition, and butyl acetate 300
Parts by weight, 100 parts by weight of cellosolve acetate, and 2 parts by weight of benzoin ethyl ether were stirred at 50 ° C. and dissolved to form a uniform solution. The solution was coated with a gravure roll coater in a coater part to a thickness of 5 μm before drying, and dried by heating. The solvent was removed by heating in a zone at 100 ° C. for 5 minutes. After removing the solvent, the ultraviolet-curable resin composition was in a paste-like softened state. Subsequently, using a nip roll, Rmax = 0.0
80 w / cm by being in close contact with a 6 μm laminate web
The UV curable resin composition was cured by irradiating with UV light, and wound up by a winder to continuously obtain a polymer sheet. The irradiation time of the ultraviolet rays was 10 seconds. The measured Rmax of the surface of the obtained polymer sheet in contact with the original laminate surface was 0.06 μm. Next, after the laminate raw material was peeled, a mixed gas of 9% oxygen / argon gas was introduced onto the polymer sheet from a state of an initial vacuum degree of 3 × 10 −4 Pa by a DC magnetron method to 3 × 1
Sputtering is performed under the conditions of 0 -1 Pa and 500
ＳｉＯThick SiO 2 was obtained. Subsequently, as a transparent conductive film, an initial degree of vacuum of 3 × 10 -4 P was also obtained by the DC magnetron method.
From the state of a, a mixed gas of oxygen / argon gas 4% is introduced, and sputtering is performed under the condition of 1 × 10 −1 Pa, and made of indium tin oxide (ITO) having an atomic ratio of In / In + Sn of 0.98. A transparent conductive film was obtained. As a result of the measurement, the film thickness was 1600 ° and the specific resistance was 4 × 10 −4 Ω-c.
m. After forming the ITO film, a resist is applied and developed, and 10 vol% HCl is used as an etchant at a liquid temperature of 40 vol.
Pattern etching in 3 ° C, diagonal length 3 inches, L /
A display pattern of S = 150/50 μm was formed. After forming the pattern, an alignment film for STN is applied, and 150 ° C. for 2 hours.
After the baking treatment, a rubbing treatment was performed so as to obtain a 240 ° twist orientation. After the rubbing treatment, a spacer was sprayed, a sealant was applied, the seal was cured at 130 ° C. to form a cell, and a liquid crystal composition for STN was injected. A polarizing plate was attached to a position where the contrast was maximized to produce a liquid crystal display device. This liquid crystal display element is driven at a driving voltage of 0 V.
When a lighting test was performed at ± 5 V from the above, no display unevenness due to an abnormal cell gap of the liquid crystal was observed, and good display was shown.
【００１４】《実施例２》Ｒｍａｘが０．２μｍのポリ
カーボネートを用い、巻出装置、コーター部、加熱乾燥
ゾーン、一方の面がＲｍａｘ０．０６μｍで、その裏面
に易滑性処理を施したラミネート原反であるＰＥＴと高
圧水銀灯、巻取装置を有する製造装置を用いて次の加工
を行った。まず、実施例１と同様にして紫外線硬化性樹
脂組成物の塗布〜乾燥を行った。続いてニップロールを
用いて温度を８０℃に制御したＲｍａｘ０．０６μｍの
ＰＥＴに密着させて８０ｗ／ｃｍの出力の高圧水銀灯で
紫外線硬化性樹脂組成物の塗布面と逆の面から紫外線を
照射して紫外線硬化性樹脂組成物を硬化させ、巻取装置
で巻き取って図１に示した断面概略図のような構成の高
分子シートを連続的に得た。紫外線の照射時間は３０秒
間であった。得られた高分子シートのラミネート原反面
に接した面のＲｍａｘを測定したところ０．０６μｍで
あった。また摩擦帯電による異物の付着数が減少した。
以下実施例１と同様にして液晶表示素子を作成した。こ
の液晶表示素子を駆動電圧０Ｖから±５Ｖで点灯試験を
行ったところ、液晶のセルギャップ異常による表示ムラ
は見られず良好な表示を示した。Example 2 An unwinder, a coater, a heating and drying zone using polycarbonate having an Rmax of 0.2 μm, an Rmax of 0.06 μm on one side, and a laminating base subjected to a slippery treatment on the back side The following processing was performed using a manufacturing apparatus having PET, a high-pressure mercury lamp, and a winding device. First, coating and drying of the ultraviolet-curable resin composition were performed in the same manner as in Example 1. Subsequently, the substrate was brought into close contact with PET having an Rmax of 0.06 μm controlled at a temperature of 80 ° C. using a nip roll, and irradiated with ultraviolet light from a surface opposite to the surface on which the ultraviolet-curable resin composition was applied by a high-pressure mercury lamp having an output of 80 w / cm. The ultraviolet curable resin composition was cured and wound up by a winding device to continuously obtain a polymer sheet having a configuration as shown in the schematic cross-sectional view of FIG. The irradiation time of the ultraviolet rays was 30 seconds. The measured Rmax of the surface of the obtained polymer sheet in contact with the original laminate surface was 0.06 μm. In addition, the number of adhered foreign substances due to triboelectric charging decreased.
Thereafter, a liquid crystal display device was prepared in the same manner as in Example 1. When a lighting test was performed on the liquid crystal display element at a driving voltage of 0 V to ± 5 V, good display was exhibited without any display unevenness due to an abnormal cell gap of the liquid crystal.
【００１５】《比較例１》実施例１において、巻出装
置、コーター部、加熱乾燥ゾーン、ラミネートロール、
高圧水銀灯、巻取装置を有する製造装置の代わりに、巻
出装置、コーター部、加熱乾燥ゾーン、塗布を行う側の
面に紫外線を照射する高圧水銀灯、巻取装置を有する製
造装置を用い、ラミネート原反に密着させずに紫外線硬
化性樹脂組成物の塗布面側から８０ｗ／ｃｍの高圧水銀
灯で４０秒間紫外線を照射した以外は実施例１と同様に
加工を行い高分子シートを連続的に得た。得られた高分
子シートの紫外線硬化性樹脂組成物塗布面のＲｍａｘを
測定したところ０．２μｍであった。以下実施例１と同
様にして液晶表示素子を作成した。この液晶表示素子を
駆動電圧０Ｖから±５Ｖで点灯試験を行ったところ、Ｒ
ｍａｘの部分に対応した場所に液晶のセルギャップ異常
による表示ムラが見られた。Comparative Example 1 In Example 1, an unwinder, a coater, a heating and drying zone, a laminating roll,
Instead of a manufacturing device having a high-pressure mercury lamp and a winding device, a manufacturing device having an unwinding device, a coater section, a heating / drying zone, a high-pressure mercury lamp that irradiates ultraviolet rays to the surface on which coating is performed, and a winding device is used. Processing was carried out in the same manner as in Example 1 except that ultraviolet rays were irradiated for 40 seconds with a high-pressure mercury lamp of 80 w / cm from the coated surface side of the ultraviolet-curable resin composition without bringing the polymer sheet into close contact with the raw material to continuously obtain a polymer sheet. Was. When the Rmax of the obtained polymer sheet on the surface to which the ultraviolet curable resin composition was applied was measured, it was 0.2 μm. Thereafter, a liquid crystal display device was prepared in the same manner as in Example 1. When a lighting test was performed on this liquid crystal display element at a drive voltage of 0 V to ± 5 V, R
Display unevenness due to an abnormal cell gap of the liquid crystal was observed at a position corresponding to the max portion.
【００１６】実施例１および２で製造した高分子シート
を用いて作製した液晶表示素子はいずれも良好な表示を
示した。即ち、実施例１および２では平滑性の良好な光
学用高分子シートを得ることができた。これに対して比
較例ではＲｍａｘ≦０．１μｍの平滑面を有するラミネ
ート原反に密着させずに紫外線を照射して紫外線硬化性
樹脂を硬化したために良好な平滑性を持つ高分子シート
が得られず、液晶表示素子を作製した場合には表示ムラ
を発生した。Each of the liquid crystal display devices manufactured using the polymer sheets manufactured in Examples 1 and 2 showed good display. That is, in Examples 1 and 2, an optical polymer sheet having good smoothness could be obtained. On the other hand, in the comparative example, a polymer sheet having good smoothness was obtained because the ultraviolet curable resin was cured by irradiating ultraviolet rays without adhering to the raw laminate having a smooth surface of Rmax ≦ 0.1 μm. However, when a liquid crystal display element was manufactured, display unevenness occurred.
【００１７】[0017]
【発明の効果】本発明の製造方法を用いることにより、
表面平滑性が良好な高分子シートを安定して、効率よく
連続製造することができる。また、本発明により得られ
たシートは光学用高分子シートとして最適で、液晶表示
素子用透明電極基板として液晶表示素子を作製した場
合、ガラス基板に比べて軽く割れにくいだけでなく、表
示ムラのない良好な表示を示した。By using the production method of the present invention,
A polymer sheet having good surface smoothness can be stably and efficiently produced continuously. Further, the sheet obtained according to the present invention is most suitable as a polymer sheet for optics, and when a liquid crystal display element is manufactured as a transparent electrode substrate for a liquid crystal display element, it is not only lighter and harder to break than a glass substrate, but also has uneven display. Showed no good display.
【図１】本発明の製造方法による実施例２で得られる層
構成の断面概略図FIG. 1 is a schematic cross-sectional view of a layer structure obtained in Example 2 according to a manufacturing method of the present invention.
１．易滑性処理層 ２．ラミネート原反（３と接する面が平滑面） ３．紫外線硬化樹脂層 ４．高分子シート 1. Slippery treatment layer 2. 2. Raw laminate (the surface in contact with 3 is a smooth surface) UV curable resin layer 4. Polymer sheet
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） // Ｂ２９Ｋ 63:00 Ｂ２９Ｋ 63:00 (72)発明者 武中 剛志 東京都品川区東品川２丁目５番８号 住友 ベークライト株式会社内 Ｆターム(参考） 2H090 HA04 HB13X HC05 HC15 HC16 HC18 HC19 HD03 JA02 JA06 JA13 JB03 JC07 JD14 KA08 LA02 LA04 MB02 4F006 AA40 AB34 BA00 CA05 DA04 EA03 4F205 AA44 AF14 AG01 AH33 AJ03 GA06 GA07 GA17 GB01 GC06 GF24 GN28 GN29 5C094 AA43 BA43 EB02 EB10 FB01 FB15 GB01 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // B29K 63:00 B29K 63:00 (72) Inventor Takeshi Takenaka 2-5 Higashishinagawa, Shinagawa-ku, Tokyo No. 8 Sumitomo Bakelite Co., Ltd. F-term (reference) 2H090 HA04 HB13X HC05 HC15 HC16 HC18 HC19 HD03 JA02 JA06 JA13 JB03 JC07 JD14 KA08 LA02 LA04 MB04 4F006 AA40 AB34 BA00 CA05 DA04 EA03 4F205 AA44 AF14 AG01 GA03 GB03 GF24 GN28 GN29 5C094 AA43 BA43 EB02 EB10 FB01 FB15 GB01
Claims (5)
成物を塗布またはラミネートし、該紫外線硬化性樹脂組
成物が軟化した状態で表面粗さの最大（Ｒｍａｘ）がＲ
ｍａｘ≦０．１μｍの平滑面を有するラミネート原反に
密着させて紫外線を照射し、ラミネート原反の平滑面を
転写、成形することを特徴とする高分子シートの製造方
法An ultraviolet-curable resin composition is applied or laminated on a raw polymer sheet, and the maximum surface roughness (Rmax) of the ultraviolet-curable resin composition is R when the ultraviolet-curable resin composition is softened.
A method for producing a polymer sheet, comprising irradiating ultraviolet rays while being in close contact with a raw laminate having a smooth surface of max ≦ 0.1 μm, and transferring and molding the smooth surface of the raw laminate.
波長の紫外線を透過し、紫外線硬化樹脂に紫外線を照射
した後に、剥離することが可能である請求項１記載の高
分子シートの製造方法。2. The process for producing a polymer sheet according to claim 1, wherein the raw material laminate having a smooth surface transmits ultraviolet light of a specific wavelength and can be peeled off after irradiating the ultraviolet curable resin with ultraviolet light. Method.
性処理が施されている請求項１又は２記載の高分子シー
トの製造方法。3. The method for producing a polymer sheet according to claim 1, wherein the smooth back surface of the raw laminate is subjected to a lubricity treatment.
法を用いて製造した光学用高分子シート。4. An optical polymer sheet produced by using the method for producing a polymer sheet according to claim 1.
項４記載の光学用高分子シート。5. The optical polymer sheet according to claim 4, wherein the polymer is polyether sulfone.
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30209299A JP2001121558A (en) | 1999-10-25 | 1999-10-25 | Production of polymeric sheet and optical polymeric sheet |
| KR1020027004496A KR100647938B1 (en) | 1999-10-08 | 2000-10-05 | Manufacturing Method of Polymer Sheet and Optical Polymer Sheet |
| CNB008139172A CN1176796C (en) | 1999-10-08 | 2000-10-05 | Method for producing polymer sheet and optical polymer sheet |
| US10/089,216 US6592802B1 (en) | 1999-10-08 | 2000-10-05 | Process for production of polymer sheet and optical polymer sheet |
| EP00964687A EP1218158B1 (en) | 1999-10-08 | 2000-10-05 | Process and apparatus for production of polymer sheet |
| DE60007535T DE60007535T2 (en) | 1999-10-08 | 2000-10-05 | METHOD AND DEVICE FOR PRODUCING A POLYMER FILM |
| PCT/JP2000/006948 WO2001026876A1 (en) | 1999-10-08 | 2000-10-05 | Process for production of polymer sheet and optical polymer sheet |
| MYPI20004686A MY123035A (en) | 1999-10-08 | 2000-10-06 | Process and apparatus for production of polymer sheet |
| TW089121035A TWI230117B (en) | 1999-10-08 | 2000-10-07 | Process for production of polymer sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30209299A JP2001121558A (en) | 1999-10-25 | 1999-10-25 | Production of polymeric sheet and optical polymeric sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001121558A true JP2001121558A (en) | 2001-05-08 |
Family
ID=17904841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30209299A Pending JP2001121558A (en) | 1999-10-08 | 1999-10-25 | Production of polymeric sheet and optical polymeric sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001121558A (en) |
-
1999
- 1999-10-25 JP JP30209299A patent/JP2001121558A/en active Pending
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