JP2001118852A - Electric furnace - Google Patents
Electric furnaceInfo
- Publication number
- JP2001118852A JP2001118852A JP29343499A JP29343499A JP2001118852A JP 2001118852 A JP2001118852 A JP 2001118852A JP 29343499 A JP29343499 A JP 29343499A JP 29343499 A JP29343499 A JP 29343499A JP 2001118852 A JP2001118852 A JP 2001118852A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- heated
- electric furnace
- space
- insulating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 15
- 239000011810 insulating material Substances 0.000 claims description 17
- 238000003780 insertion Methods 0.000 claims description 5
- 230000037431 insertion Effects 0.000 claims description 5
- 125000006850 spacer group Chemical group 0.000 abstract description 4
- 239000012774 insulation material Substances 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 description 11
- 238000000137 annealing Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 101100366710 Arabidopsis thaliana SSL12 gene Proteins 0.000 description 1
- 101100321669 Fagopyrum esculentum FA02 gene Proteins 0.000 description 1
- 101100366563 Panax ginseng SS13 gene Proteins 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Resistance Heating (AREA)
- Furnace Details (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は電気炉、特に、半導
体製造のウェーハ処理工程におけるアニール装置に用い
る電気炉に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric furnace, and more particularly to an electric furnace used for an annealing apparatus in a wafer processing step of semiconductor manufacturing.
【０００２】[0002]
【従来の技術】従来、アニール装置としては縦型炉或い
は横型炉と呼ばれる円筒状の電気炉が用いられており、
一度に複数枚のウェーハを処理する「バッチ式」が主流
であった。しかし、近年はウェーハを大径化して１枚の
ウェーハから多量のチップを切り出す「枚葉式」が効率
が良いとされ、ウェーハを１枚ずつ熱処理するアニール
装置が主流となっている。2. Description of the Related Art Conventionally, a cylindrical electric furnace called a vertical furnace or a horizontal furnace has been used as an annealing apparatus.
The "batch type", in which a plurality of wafers are processed at one time, was mainly used. However, in recent years, the “single-wafer” method of cutting a large number of chips from a single wafer by increasing the diameter of the wafer is considered to be efficient, and an annealing apparatus that heat-treats the wafers one by one has become mainstream.
【０００３】[0003]
【発明が解決しようとする課題】然しながら、上記従来
のアニール装置に用いる電気炉は、ウェーハの大径化に
つれて大型化する傾向にあり、特に発熱線からウェーハ
までの距離を小さくするとウェーハに温度むらが生じる
ので、小型化できず、電気炉の重量が増えるなどの欠点
があった。However, the electric furnace used in the above-mentioned conventional annealing apparatus tends to increase in size as the diameter of the wafer increases. In particular, when the distance from the heating wire to the wafer is reduced, the temperature of the wafer becomes uneven. As a result, the size of the electric furnace cannot be reduced and the weight of the electric furnace increases.
【０００４】本発明は上記の欠点を除くようにしたもの
である。The present invention has been made to eliminate the above disadvantages.
【０００５】本発明の電気炉は、互に離間して対向配置
した２枚の均熱板と、この２枚の均熱板間に形成した被
加熱空間と、上記均熱板間の間隔を一定に定める手段
と、この各均熱板の外側に夫々設けた発熱体と、上記均
熱板及び発熱体を介して上記被加熱空間を囲む断熱材
と、この断熱材の外周を囲む金属ケースと、被加熱物を
上記被加熱空間に挿入するため上記断熱材と上記金属ケ
ースとに設けた被加熱物挿入口とよりなることを特徴と
する。[0005] The electric furnace according to the present invention comprises two heat equalizing plates spaced apart from each other and facing each other, a heated space formed between the two heat equalizing plates, and a space between the heat equalizing plates. Fixed means, a heating element provided outside each of the heat equalizing plates, a heat insulating material surrounding the heated space via the heat equalizing plate and the heat generating element, and a metal case surrounding the outer periphery of the heat insulating material. And a heated object insertion port provided in the heat insulating material and the metal case for inserting the heated object into the heated space.
【０００６】また、本発明の電気炉は、上記金属ケース
の上記発熱体に対向する面に形成した、その中央部で交
差する複数の切り込み溝を有することを特徴とする。Further, the electric furnace of the present invention is characterized in that the metal case has a plurality of cut grooves formed on a surface of the metal case facing the heating element and intersecting at a central portion thereof.
【０００７】[0007]
【発明の実施の形態】以下図面によって本発明の実施例
を説明する。Embodiments of the present invention will be described below with reference to the drawings.
【０００８】本発明の電気炉は図１〜図３に示すよう
に、シリコンウェーハ又はシリコンウェーハを納めた石
英反応管などの被加熱物の大きさに対応する容積の箱状
の被加熱空間１と、この被加熱空間１の上下に所定距離
互に離間して対向配置した２枚の四角形状の、使用温度
で劣化しない熱伝導性の良いＳｉＣやＡｌ2 Ｏ3 等の均
熱板２，２と、上記上下の均熱板２，２の外表面２a ，
２a から夫々所定距離離間して上記被加熱空間１の周り
を囲むようにした箱状の断熱材３と、上記断熱材３の内
部四隅に夫々設けた上記均熱板２，２間の離間距離を一
定に定めるためのスペーサ４と、上記均熱板２の外表面
２a と上記断熱材３の内面間に介挿した発熱体５と、上
記断熱材３の外周を囲む金属ケース６と、上記断熱材３
及び金属ケース６の一方の側面に設けた上記被加熱物の
挿入口７とにより構成する。As shown in FIGS. 1 to 3, the electric furnace of the present invention has a box-shaped heated space 1 having a volume corresponding to the size of an object to be heated such as a silicon wafer or a quartz reaction tube containing the silicon wafer. And two rectangular heat-dissipating plates 2 such as SiC or Al 2 O 3 having good thermal conductivity which are not degraded at a use temperature and are disposed opposite each other at a predetermined distance above and below the heated space 1. 2 and outer surfaces 2a of the upper and lower heat equalizing plates 2, 2;
A box-shaped heat insulating material 3 which is respectively spaced apart from the space 2 to be heated by a predetermined distance from the space 2a, and a distance between the heat equalizing plates 2, 2 provided at four inner corners of the heat insulating material 3, respectively. A heat generating element 5 interposed between the outer surface 2a of the heat equalizing plate 2 and the inner surface of the heat insulating material 3, a metal case 6 surrounding the outer periphery of the heat insulating material 3, Insulation material 3
And an insertion port 7 for the object to be heated provided on one side surface of the metal case 6.
【０００９】上記発熱体５は、上記断熱材３の前後壁内
面に夫々その端部を固定して、略水平面内で夫々平行に
横架した複数のセラミックス製の発熱線支持棒８と、こ
の各発熱線支持棒８にスパイラル状にまきつけた発熱線
９により構成し、炉中心部の上記発熱線９の巻線ピッチ
は炉端部の発熱体５のそれより粗とし、従って、その部
分の電力密度を小さくして中心部の温度が高まるのを防
ぐようにする。また、上記発熱線９は発熱線支持棒８よ
り下方にたわむため、このたわみ分を考慮して上記均熱
板２の上側に位置する発熱体５については上記発熱線支
持棒８と上記均熱板２との間の間隔を上記均熱板の下側
に位置するものの間隔より大きくなるようにする。The heating element 5 has a plurality of ceramic heating wire support rods 8 which are fixed to the inner surfaces of the front and rear walls of the heat insulating material 3, respectively, and which extend in parallel in a substantially horizontal plane. The heating wire 9 is spirally wound around each heating wire support rod 8, and the winding pitch of the heating wire 9 at the center of the furnace is coarser than that of the heating element 5 at the furnace end. Reduce the density to prevent the temperature in the center from increasing. In addition, since the heating wire 9 bends below the heating wire support rod 8, the heating element 5 positioned above the heat equalizing plate 2 in consideration of the deflection is connected to the heating wire support rod 8 and the heat equalizing soot. The distance between the heat equalizing plate and the plate 2 is set to be larger than that of the plate located below the heat equalizing plate.
【００１０】また、上記スペーサ４は図４に示すよう
に、上記上下の均熱板２，２の端部を夫々嵌合せしめる
溝１０，１０を有する耐熱性のセラミックチューブによ
り構成し、その上端を上記断熱材３の天井壁に当接し、
下端を断熱材３の下面に固定する。Further, as shown in FIG. 4, the spacer 4 is formed of a heat-resistant ceramic tube having grooves 10, 10 for fitting the ends of the upper and lower heat equalizing plates 2, 2, respectively. Abuts against the ceiling wall of the heat insulating material 3,
The lower end is fixed to the lower surface of the heat insulating material 3.
【００１１】また、上記発熱体５に対応する上記金属ケ
ース６の上面及び下面にはその中央部で互に交差する複
数の切り込み溝１１を設ける。The metal case 6 corresponding to the heating element 5 is provided with a plurality of cut grooves 11 on the upper and lower surfaces thereof, which cross each other at the center.
【００１２】また 電気炉温度制御のためにセンサー
（図示せず）を設ける。A sensor (not shown) is provided for controlling the temperature of the electric furnace.
【００１３】本発明の電気炉は上記のような構成である
から、被加熱物を上記挿入口７から上記断熱材３内の均
熱板２，２間の被加熱空間１内に挿入せしめ、発熱線９
に通電せしめれば、発熱線９からの熱は均熱板２に伝わ
り、この均熱板２は熱伝導が良いので被加熱物をむらな
く加熱されるようになる。Since the electric furnace of the present invention has the above configuration, the object to be heated is inserted from the insertion port 7 into the space 1 to be heated between the heat equalizing plates 2 and 2 in the heat insulating material 3. Heating wire 9
, The heat from the heat generating wire 9 is transmitted to the heat equalizing plate 2, and the heat equalizing plate 2 has good heat conduction, so that the object to be heated is evenly heated.
【００１４】また、金属ケース６は上記熱により膨張，
変形するが、変形によって生ずる応力は切り込み溝１１
によって吸収される。The metal case 6 expands due to the heat.
Although it is deformed, the stress generated by the deformation
Is absorbed by
【００１５】[0015]
【発明の効果】上記のように本発明の電気炉によれば、
均熱板を設けたため、発熱線と被加熱物との距離を小さ
くできるので枚葉式のアニール装置に用いる電気炉を小
型化することができ、これにより、省スペースで軽量な
アニール装置を得ることができる。According to the electric furnace of the present invention as described above,
Since the heat equalizing plate is provided, the distance between the heating wire and the object to be heated can be reduced, so that the electric furnace used for the single-wafer annealing apparatus can be reduced in size, thereby obtaining a space-saving and lightweight annealing apparatus. be able to.
【００１６】また、均熱板２，２間の間隔をスペーサ４
を用いて一定に固定したので、ウェーハ等の被加熱物温
度を均一にすることができ、被加熱物の均熱特性を良く
することができる。The distance between the heat equalizing plates 2 and 2 is
The temperature of the object to be heated such as a wafer can be made uniform, and the uniform heating characteristics of the object to be heated can be improved.
【００１７】また、金属ケースに切り込み溝を設けたの
で、高温で使用しても金属ケースが熱変形によって断熱
材を破損することがない等大きな利益がある。Further, since the metal case is provided with the cut groove, there is a great advantage that the metal case does not damage the heat insulating material due to thermal deformation even when used at a high temperature.
【図１】本発明の電気炉の平面図である。FIG. 1 is a plan view of an electric furnace of the present invention.
【図２】本発明の電気炉の縦断正面図である。FIG. 2 is a vertical sectional front view of the electric furnace of the present invention.
【図３】本発明の電気炉の側面図である。FIG. 3 is a side view of the electric furnace of the present invention.
【図４】図１に示すスペーサー部分のＡ−Ａ線断面図で
ある。FIG. 4 is a sectional view taken along line AA of the spacer portion shown in FIG.
１ 被加熱空間 ２ 均熱板 ２ａ 外表面 ３ 断熱材 ４ スペーサ ５ 発熱体 ６ 金属ケース ７ 挿入口 ８ 発熱線支持棒 ９ 発熱線 １０ 溝 １１ 切り込み溝 DESCRIPTION OF SYMBOLS 1 Heated space 2 Heat equalizing plate 2a Outer surface 3 Heat insulating material 4 Spacer 5 Heating element 6 Metal case 7 Insertion opening 8 Heating wire support rod 9 Heating wire 10 Groove 11 Groove
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 3K092 PP09 QA05 RF03 RF17 RF22 SS05 SS13 SS14 SS24 SS30 UA01 VV31 4K063 AA05 AA12 BA12 CA04 CA06 FA02 FA19 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3K092 PP09 QA05 RF03 RF17 RF22 SS05 SS13 SS14 SS24 SS30 UA01 VV31 4K063 AA05 AA12 BA12 CA04 CA06 FA02 FA19
Claims (2)
と、この２枚の均熱板間に形成した被加熱空間と、上記
均熱板間の間隔を一定に定める手段と、この各均熱板の
外側に夫々設けた発熱体と、上記均熱板及び発熱体を介
して上記被加熱空間を囲む断熱材と、この断熱材の外周
を囲む金属ケースと、被加熱物を上記被加熱空間に挿入
するため上記断熱材と上記金属ケースとに設けた被加熱
物挿入口とよりなることを特徴とする電気炉。A heating space formed between the two heat equalizing plates, a space to be heated formed between the two heat equalizing plates, and a means for keeping a constant distance between the heat equalizing plates. A heating element provided outside each of the heat equalizing plates, a heat insulating material surrounding the space to be heated via the heat equalizing plate and the heat generating element, a metal case surrounding the outer periphery of the heat insulating material, An electric furnace comprising: a heat-insulating material; and a heat-receiving object insertion port provided in the metal case for inserting the heat-insulating material into the space to be heated.
面に形成した、その中央部で交差する複数の切り込み溝
を有することを特徴とする電気炉。2. An electric furnace having a plurality of cut grooves formed on a surface of the metal case facing the heating element and intersecting at a central portion thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29343499A JP2001118852A (en) | 1999-10-15 | 1999-10-15 | Electric furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29343499A JP2001118852A (en) | 1999-10-15 | 1999-10-15 | Electric furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001118852A true JP2001118852A (en) | 2001-04-27 |
Family
ID=17794720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29343499A Pending JP2001118852A (en) | 1999-10-15 | 1999-10-15 | Electric furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001118852A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012182489A (en) * | 2012-05-28 | 2012-09-20 | Hitachi Kokusai Electric Inc | Substrate processing apparatus, semiconductor device manufacturing method, ceiling heat insulator, and heater |
| WO2019117250A1 (en) * | 2017-12-15 | 2019-06-20 | 芝浦メカトロニクス株式会社 | Organic film formation device |
-
1999
- 1999-10-15 JP JP29343499A patent/JP2001118852A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012182489A (en) * | 2012-05-28 | 2012-09-20 | Hitachi Kokusai Electric Inc | Substrate processing apparatus, semiconductor device manufacturing method, ceiling heat insulator, and heater |
| WO2019117250A1 (en) * | 2017-12-15 | 2019-06-20 | 芝浦メカトロニクス株式会社 | Organic film formation device |
| KR20200058493A (en) * | 2017-12-15 | 2020-05-27 | 시바우라 메카트로닉스 가부시끼가이샤 | Organic film forming device |
| TWI696500B (en) * | 2017-12-15 | 2020-06-21 | 日商芝浦機械電子裝置股份有限公司 | Organic film forming device |
| CN111566428A (en) * | 2017-12-15 | 2020-08-21 | 芝浦机械电子株式会社 | organic film forming apparatus |
| US20200310183A1 (en) * | 2017-12-15 | 2020-10-01 | Shibaura Mechatronics Corporation | Organic film forming apparatus |
| JPWO2019117250A1 (en) * | 2017-12-15 | 2020-12-24 | 芝浦メカトロニクス株式会社 | Organic film forming device |
| JP7008727B2 (en) | 2017-12-15 | 2022-01-25 | 芝浦メカトロニクス株式会社 | Organic film forming device |
| CN111566428B (en) * | 2017-12-15 | 2022-03-29 | 芝浦机械电子株式会社 | Organic film forming apparatus |
| KR102391759B1 (en) * | 2017-12-15 | 2022-04-28 | 시바우라 메카트로닉스 가부시끼가이샤 | organic film forming device |
| US11906246B2 (en) | 2017-12-15 | 2024-02-20 | Shibaura Mechatronics Corporation | Organic film forming apparatus |
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