JP2001170872A - Sponge puff - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a sponge puff of a novel skeleton structure which solves problems of conventional devices such as being fragile, bad drainage, easiness to be heated, too large thickness, and difficulty in setting a pad to the center of the puff, and which is suitable to polishing by hand as well as polishing by machine. SOLUTION: The whole thickness is compressed by heating and pressing polyurethane foam of a continuous bubble structure comprising a cellular bubble structure from which cell membranes are eliminated. By thus compressing this, bent parts are provided is skeletons forming cells for newly providing touch, elasticity, polishing ability, etc., so this sponge puff of the continuous bubble structure while conventionally has been taken to be unsuitable to polishing skin as a sole body because of its non-elasticity can be provided for a series of polishing processes from regulation of skin to finishing. A face B 10 of a Hook-and-Loop fastener having plural dents 13 in a circumferential edge part is installed on an installation surface 9, so a pad of a different diameter can be installed at a center at a single operation.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sponge buff for imparting smoothness or specular gloss to a metal or nonmetal resin-coated surface.

[0002]

2. Description of the Related Art Conventionally, for example, in the automobile repair industry,
When repairing a part damaged by a car accident or the like, the painted skin spray-painted on the outer plate of the vehicle body with a spray gun becomes a rough coating called so-called yuzu skin. This is the spray gun nozzle diameter, air pressure and flow rate,
The distance between the painted surface and the spray gun, painting speed, paint viscosity,
Alternatively, it is caused by the temperature or the like, but it hardly matches the old coating film in the uncoated state. Therefore, in order to approximate the old paint film on the periphery, the so-called wool buff using a polisher on the resin-painted surface is used for fine and ultra-fine compounding, which is called polishing, but in recent years even natural drying is on par with baking paint Paints with a hardness of 5% are widely used, and coatings coated with such coatings become hard after complete curing, making it difficult to adjust the skin. Work was being done. However, when a wool buff is used for a soft coating surface before curing, although the polishing power is excellent, the so-called sharpness is too good and a deep scratch called a polisher mark is likely to be made. Therefore, a sponge buff made of a polyurethane foam having a softer contact feeling than a wool buff is used. However, conventional sponge buffs have not been satisfactory due to various problems as described below. For example, sponge buffs used in such polishing are described in, for example,
Japanese Patent Application No. 173384 discloses a technique in which the apparent specific gravity of the foam and the number of foam cells maintain the polishing force to prevent scratches and clogging.

[0003] Japanese Patent Application Laid-Open No. 10-244470 discloses a polishing tool for mirror polishing in which a foam has a two-layer structure.

[0004] Conventionally, in sponge buffs, polyester-based polyurethane foam has been mainly used.
The cells have a closed cell structure in which the cellular cell structure has a cell membrane independent of the skeletal structure, a mixed cell structure in which a partially independent cell membrane and a skeleton with a broken cell membrane are mixed, and a skeletal structure in which the cell membrane is removed Are roughly divided into three types. In these foams, the presence of a cell membrane is regarded as important in applications. Specifically, foams with a closed cell structure or a mixed cell structure having a cell membrane have a sponge buff suitable for adjusting the skin with fine and ultra-fine compounds, as the resistance due to rebound resilience generated when the cell membrane is compressed improves polishing power. Has been used as On the other hand, foam with an open-cell structure without a cell membrane without rebound resilience is used as a sponge buff for finishing to wipe off ultra-fine compound and wax applied to shine the resin-coated surface after skin conditioning. Have been. In addition to mechanical polishing with a polisher, it has also been used as a sponge buff for hand polishing.

However, the following points have been pointed out by those who work on a sponge buff for skin adjustment having a closed cell structure or a mixed cell structure having a cell membrane. I. When it comes into contact with the corners of the workpiece, it is easily torn and the material is brittle. B. Scrap worn during use splatters around, and if a buff cleaner is used, the amount will decrease quickly and cannot be used for a long time. C. When worn, the repulsive force is extremely reduced, and the cushion effect is greatly changed. D. Drainage is poor and cannot be washed. E. Polishing heat is too much to make it white or blurred. F. Due to the thickness, the center of gravity is high when mounted on a polisher, making it unstable. G. When compressed, it has a strong rebound and is easy to get tired.

A polyurethane foam having an open cell structure without a cell membrane has an open cell structure as shown in FIG. 2, and the number of foam cells is about 10 to 1 per cm.
The simple substance having six pieces had poor rebound resilience and was therefore unsuitable for polishing for skin conditioning and was not used. The only thing that had about 20 foam cells per cm was used as a buff for finishing with an ultrafine compound, but it was still a material with extremely good wiping properties and absorbency, so it was applied to the processed surface. The compound that has been wiped off cannot be polished. In addition, the compound was consumed more than necessary and was uneconomical. Further, even if elasticity was imparted by bonding a cushion material, the compound was too sticky and clogged because the density was too small, so that it could not be used for polishing for skin conditioning.

[0007] A sponge buff for mechanical polishing has been fixed to a drive shaft of a polisher with a screw or mounted on a pad holding the surface A of a surface fastener. When a buff is attached to a pad, a concave portion into which the diameter of the pad fits is formed on a mounting surface of the pad in order to prevent a center runout of rotation, but the cost has been increased. Also, only specific pads could be used for such buffs, and pads of different diameters were useless. In addition, even if I drew a circle on the mounting surface, it disappeared as soon as I washed it with a pad or washed it.

[0008]

A conventional sponge buff having a cell membrane has a large thickness, probably because of abrasion, so that when pressed, the cell membrane and the compressed air in the cell membrane exert a repulsive force. Therefore, it requires a force to strongly press against the painted surface and is easily fatigued. In addition, since the center of gravity increases when attached to a polisher, there is a problem that the robot is swung if it is not firmly gripped when rotated.

Furthermore, when a sponge buff having a cell membrane is washed with water in order to remove polishing debris and a dried compound adhered to the polished surface, water accumulates in the cell membrane, and it takes a long time to dry and cannot be washed with water. Therefore, if the polished surface is cleaned with a buff cleaner without cleaning,
There was a problem that the sponge was brittle and was scraped off sharply, resulting in a rapid decrease.

A sponge buff having a cell membrane has poor heat radiation because heat generated during polishing is trapped in the cell membrane, and entanglement occurs on the surface to be polished. In addition, there is also a problem that the surface must be polished twice because gloss is caused by heat.

In the industry, the pad outer diameter is 150 mmφ and 16 mm.
Since two types of 0 mmφ are frequently used, the appearance of a buff that can be easily attached to the center of both pads has been desired.

As a sponge buff for hand polishing, portions which cannot be polished with a polisher are usually polished with a cotton or flannel rag, but scratches occur. Although there was a polyurethane foam, it was made of the same material as the conventional sponge buff. Those having no cell membrane were not used much because they wiped off the compound and wax as described above.

In view of the above, an object of the present invention is to eliminate various problems caused by cell membranes and to provide a sponge buff having a completely new skeletal structure suitable for not only mechanical polishing but also hand polishing. It is assumed that.

Another object of the present invention is to provide a sponge buff which does not require much time for drying even after washing.

Still another object of the present invention is to provide a tough sponge buff which is hard to break and wear.

Still another object of the present invention is to provide a sponge buff which is less likely to generate polishing heat.

It is still another object of the present invention to provide a sponge buff with improved polishing power.

Still another object of the present invention is to provide a sponge buff that can be easily attached to the center even with pads having different diameters.

[0019]

In order to solve the above-mentioned problems, a sponge buff according to the present invention comprises heating and pressing a polyurethane foam having an open-cell structure in which a cellular membrane has been removed from a cell membrane by pressing and heating the entire foam. Is compressed.
Then, since the bent portion 2 is provided in the skeleton 3 forming the cell 1 by the compression as described above, an unprecedented feeling, elasticity, abrasive power, etc. can be obtained. Sponge buffs with an open-cell structure, which were not suitable for polishing, can be used to polish the skin. It is considered that the polyurethane foam is desirably a polyester system having chemical resistance, but may be a polyether system. Since the polyether type has water resistance and thermal aging resistance, it is preferably used for polishing using water or an aqueous abrasive.

The present invention also provides a polishing surface 7 on one surface of a sponge buff formed entirely in a disk shape.
B surface 10 of a surface fastener in which a mounting surface 9 to be mounted on the pad 12 of the polisher 11 is provided on a surface opposite to the surface of the polisher 11, and a plurality of recesses 13 are formed in the mounting surface 9 at the peripheral edge.
Is also attached.

Further, the sponge buff of the present invention does not limit the density, the number of cells, the compression ratio to the original thickness, the shape, etc. of the original material.
It can be selected according to the application.

Further, the sponge buff of the present invention may be used alone, or if necessary, a cushioning material, a reinforcing material, etc.
It can be used in combination with other materials. Of course, it can also be used for hand polishing.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. FIG. 1 is an enlarged view showing a bubble structure of a sponge buff as one embodiment of the present invention, and FIG. 2 is an enlarged view of a bubble structure of a conventional sponge buff having a continuous cell type structure without a cell membrane. It is shown.
In FIG. 1, reference numeral 1 denotes a cell composed of a skeleton 3 provided with a bent portion 2, and the sponge buff of the present invention is formed by connecting the cells 1 in series. Cell 1 having such skeleton 3
Can be easily manufactured by a heater press or the like. As an example, a raw material of 1 m ² of a polyester-based polyurethane foam having an open-cell type structure in which a cellular cell structure similar to that shown in FIG.
When compressing to a thickness of 195 to 195-2 on both sides with a hot press
It can be obtained by heating at 05 ° C. and compressing with a pressure of 120 kgf / cm ² and a pressing time of about 13 minutes.

In FIG. 2, the skeleton 5 constituting the cell 4 does not have the bent portion 2 as shown in FIG. 1, and a foam having about 10 to 16 foam cells per cm is used for skin conditioning. However, since there is no rebound resilience to compression during use, it cannot be used alone. However, the provision of the bent portion 2 in the skeleton 3 as shown in FIG. 1 generates a restoring force against a force not only in the vertical direction but also in the lateral direction. And elasticity will be obtained. Further, the cells 1 become flatter and smaller in volume as they are crushed, so that the suction of the abrasive is reduced.

FIG. 3 is a perspective view showing a disc-shaped sponge buff, and FIG. 4 is a sectional view taken along line AA shown in FIG. FIG. 5 is a perspective view in which the sponge buff of the present invention is mounted on a pad of a polisher. In FIG.
Is a sponge buff provided with a polishing surface 7 below, and in order to follow a curved surface when polishing the resin-coated surface, the peripheral portion of the polishing surface 7 is rounded as shown in FIG. A curved surface portion 8 is formed. Then, a mounting surface 9 is provided on the surface opposite to the polishing surface 7 so that the surface fastener B
Surface 10 is attached. As shown in FIG. 5, the sponge buff 6 has the B-side surface 10 of the surface fastener attached to the A-side surface fastener (not shown) provided on the circular pad 12 of the polisher 11. Further, since pads having different diameters are also mounted on the mounting surface 9, the B surface 10 of the surface fastener is used.
Are provided with a plurality of recessed portions 13 (FIG. 3) in the peripheral portion of. For example, if the inner diameter is 150 mmφa and the outer diameter is 160 mmφb, the outer diameter is 150 mmφ and 160 m
mφ pads can be supported. In other words, the pads can be mounted on the center instantaneously even with pads of different diameters by merely adjusting the periphery of the pad to the edge of the same diameter of the surface B of the hook-and-loop fastener. Such recesses 13 may be provided in any number of stages with different diameters from the center depending on the type of pad, and the intervals and shapes of the recesses 13 are not limited.

[0026]

The sponge buff of the present invention has a structure in which the entire thickness is compressed by heating and pressing a polyurethane foam having an open-cell structure in which only the skeleton from which the cell membrane has been removed is connected. Effect.

The overall thickness can be reduced, and when mounted on a polisher, the center of gravity is low and stable. Therefore, the lateral movement can be smoothly performed without swinging.

Since there is no cell membrane, the pressing force and the force for maintaining the compression are alleviated, and even if the work is performed for a long time, the tire is not tired as compared with the related art.

Since the drainage is good even after washing, the drying time is shortened and the efficiency is improved. In addition, since it can be easily washed, scratches can be prevented.

Since there is no cell membrane, heat dissipation is good. Therefore, it is possible to prevent heat from being entangled with the surface to be polished. In addition, since there is no gloss, there is no need for repolishing.

Since the bent portion 2 is added to the aggregate having only the skeleton, it is hard to be damaged or worn due to high stickiness and strength.

Since the bent portion 2 absorbs not only vertical reaction but also side reaction, the polishing power is improved.

Since the skeleton is crushed and the cells become dense, it is possible to prevent the compound from being sucked. Therefore,
A series of polishing steps from skin conditioning to finishing can be performed with one buff.

Since the material for skin adjustment to finishing can be unified, overproduction is eliminated, which is beneficial.

The buff mounting surface 9 has a recess 13 at the periphery.
When the B surface 10 of the hook-and-loop fastener formed with
Pads with different diameters can be easily attached to the center.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing a bubble structure of a sponge buff as one embodiment of the present invention.

FIG. 2 is an explanatory view showing a bubble structure of a conventional sponge buff.

FIG. 3 is a perspective view showing the embodiment in FIG.

FIG. 4 is a sectional view taken along line AA in FIG. 3;

FIG. 5 is a perspective view showing the embodiment in FIG. 3;

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Cell 2 Bending part 3 Skeleton 4 Cell 5 Skeleton 6 Sponge buff 7 Polished surface 8 Curved surface 9 Mounting surface 10 Surface B of fastener 11 Polisher 12 Pad 13 Depressed part a 150 mm
φ b 160mmφ

Claims (3)

[Claims] 1. A sponge buff characterized in that a cellular foam structure is obtained by heating and pressing a polyurethane foam having an open cell structure from which a cell membrane has been removed to compress the entire thickness thereof. 2. Cells of the polyurethane foam (1)
The sponge buff according to claim 1, characterized in that the skeleton (3) forming the (1) is provided with a bent portion (2). 3. The whole surface is a disk shape and one surface has a polished surface (7).
A mounting surface (9) mounted on a pad (12) of a polisher (11) on a surface opposite to the polishing surface (7).
And a surface fastener (B) (10) having a plurality of recesses (13) formed in a peripheral portion on the mounting surface (9).