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JP2001038367A - Method of processing waste liquid of photosensitive resin plate - Google Patents

Method of processing waste liquid of photosensitive resin plate

Info

Publication number
JP2001038367A
JP2001038367A JP11217619A JP21761999A JP2001038367A JP 2001038367 A JP2001038367 A JP 2001038367A JP 11217619 A JP11217619 A JP 11217619A JP 21761999 A JP21761999 A JP 21761999A JP 2001038367 A JP2001038367 A JP 2001038367A
Authority
JP
Japan
Prior art keywords
waste liquid
resin
photosensitive resin
cationic
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11217619A
Other languages
Japanese (ja)
Inventor
Shigenori Nagahara
重徳 永原
Satoshi Imahashi
聰 今橋
Kosaku Onodera
幸作 小野寺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP11217619A priority Critical patent/JP2001038367A/en
Publication of JP2001038367A publication Critical patent/JP2001038367A/en
Pending legal-status Critical Current

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  • Separation Of Suspended Particles By Flocculating Agents (AREA)

Abstract

PROBLEM TO BE SOLVED: To flocculate, separate and filter a resin waste liquid in an simple device in a short time by blending a cationic flocculant having several hundreds to several millions molecular weight into the resin waste liquid in the process of treating the resin waste liquid which is produced by removing an unhardened resin of a photosensitive resin plate containing a specified ionic hydrophilic groups with a developer. SOLUTION: In the process of treating a resin waste liquid produced by removing an unhardened resin from a photosensitive resin plate containing ionic hydrophilic groups expressed by the formulae of -COOM, -SO3M, -SO4M, -nPO(OM)n and (O)3-nPO(OM)n with a developer, a cationic flocculant having several hundreds to several millions molecular weight is blended into the resin waste liquid. In the formulae, M is a hydrogen atom, I to III group element in the periodic table, amine or the like, and n is 1 or 2. As for the cationic flocculant to be used, for example, a cationically modified polyacrylamide prepared by modifying a polyacrylamide with formalin and amines, cationic vinyl lactam-acrylamide copolymer or the like can be used.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は感光性樹脂版の未硬
化樹脂を現像液にて処理された樹脂廃液(未硬化樹脂と
現像液を含む)を簡単な処理で凝集分離し、粘着性の小
さいスラッジを得る感光性樹脂版の簡易廃液処理に関す
る。更に詳しくは水系現像が可能なフレキソ印刷用の感
光性樹脂版を主としてアニオン系現像液にて未硬化樹脂
を除去した樹脂廃液を簡単な処理で凝集分離処理する簡
易廃液処理方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for coagulating and separating a resin waste liquid (including an uncured resin and a developing solution) obtained by treating an uncured resin of a photosensitive resin plate with a developer by a simple treatment. The present invention relates to a simple waste liquid treatment of a photosensitive resin plate for obtaining small sludge. More specifically, the present invention relates to a simple waste liquid treatment method for aggregating and separating a resin waste liquid obtained by removing an uncured resin with an anionic developer mainly using a photosensitive resin plate for flexographic printing capable of aqueous development.

【0002】[0002]

【従来技術】近年、作業環境や地域環境面から水、界面
活性剤水溶液、アルカリ性水溶液、酸性水溶液などの現
像液で現像できる水系現像型感光性樹脂版が多く用いら
れるようになってきている。また感光性フレキソ版にお
いても同様に水系現像液にて現像可能なものが、例えば
特開昭63−28551号公報、特開平7−11418
0号公報、特開平6−289610号公報、特開平10
−339951号公報等に開示されている。
2. Description of the Related Art In recent years, aqueous development type photosensitive resin plates which can be developed with a developing solution such as water, an aqueous solution of a surfactant, an aqueous solution of an alkaline solution, an aqueous solution of an acidic solution, and the like have come to be widely used in view of working environment and local environment. Similarly, photosensitive flexographic plates which can be developed with an aqueous developer are disclosed in, for example, JP-A-63-28551 and JP-A-7-11418.
No. 0, JP-A-6-289610, JP-A-6-289610
No. 3,399,951.

【0003】一方、これ等水系現像型感光性樹脂版を用
いて露光後、未露光部を現像液で処理された樹脂廃液も
前記載同様に環境面、取扱い性等からその処理が重要に
なってきており、例えば、特開昭51−121959号
公報、特開昭49−100842号公報、特開平8−2
99965号公報、特開平6−194824号公報、特
開平7−333860号公報、特開平8−006258
号公報、特開平7−328620号公報、特開平10−
34147号公報等に廃液処理システム及び処理方法が
開示されている。しかしながら、これらの方法では設備
が大掛かりになるとか、処理時間が長い、凝集分離効果
が劣る、得られたスラッジの粘着性が大きく作業性が悪
い、濾過性が劣る等の欠点を有しており、簡単な方法で
満足する凝集分離方法が望まれていた。
[0003] On the other hand, after exposure using these aqueous development type photosensitive resin plates, the resin waste liquid whose unexposed portion has been treated with a developing solution is also important in terms of environmental aspects, handling properties, etc., as described above. For example, Japanese Patent Application Laid-Open Nos. 51-121959, 49-100842, and 8-2
No. 99965, JP-A-6-194824, JP-A-7-333860, JP-A-8-006258
JP, JP-A-7-328620, JP-A-10-108
No. 34147 discloses a waste liquid treatment system and treatment method. However, these methods have drawbacks such as large-scale equipment, long processing time, poor coagulation / separation effect, poor adhesiveness of the obtained sludge, poor workability, and poor filterability. Therefore, a coagulation separation method that satisfies a simple method has been desired.

【0004】[0004]

【発明が解決しようとする課題】本発明は、水系現像可
能な感光性樹脂版の樹脂廃液を処理するに当たり、簡単
な装置で短時間に凝集分離濾過ができ、粘着性の小さい
スラッジを得ることができると共に、濾過廃液も下水道
への排水ができる方法を見いだすことを課題とするもの
である。
DISCLOSURE OF THE INVENTION The present invention is to provide a sludge having low tackiness, which can be subjected to coagulation separation filtration with a simple apparatus in a short time in treating a resin waste liquid of a photosensitive resin plate which can be developed with an aqueous system. It is an object of the present invention to find a method capable of draining filtration waste liquid to a sewer as well as wastewater.

【0005】[0005]

【課題を解決するための手段】前記課題を解決するた
め、本発明者らは簡易廃液処理方法について鋭意、研
究、検討した結果、遂に本発明を完成するに至った。す
なわち本発明は、下記式(a)、(b)、(c)、
(d)、(e)で示される少なくとも一つのイオン性親
水基を含有する感光性樹脂版を現像液にて未硬化樹脂を
除去した樹脂廃液を処理するに際し、該樹脂廃液に分子
量数百〜数百万のカチオン性フロック剤を配合すること
を特徴とする感光性樹脂版の廃液処理方法、及びカチ
オン性フロック剤及び助剤として弱アニオン又はノニオ
ン性フロック剤を添加する前記記載の感光性樹脂版の
廃液処理方法である。 (a)−COOM (b)−SO3M (c)−SO4M (d)−nPO(OM)n (e)(O)3−nPO(OM)n (Mは水素原子、周期表第I、II、III族元素、アミン又
はアンモニウム基を示し、nは1または2である。)
Means for Solving the Problems In order to solve the above-mentioned problems, the present inventors have earnestly studied, studied, and studied a simple wastewater treatment method, and have finally completed the present invention. That is, the present invention provides the following formulas (a), (b), (c),
(D) When the photosensitive resin plate containing at least one ionic hydrophilic group shown in (e) is treated with a developer to remove the uncured resin from the resin waste liquid, the resin waste liquid has a molecular weight of several hundreds to several hundreds. A method for treating a waste liquid of a photosensitive resin plate, which comprises adding millions of cationic flocculants, and the photosensitive resin according to the above, wherein a weak anionic or nonionic flocculant is added as a cationic flocculant and an auxiliary agent. This is a method for treating wastewater from a plate. (A) -COOM (b) -SO 3 M (c) -SO 4 M (d) -nPO (OM) n (e) (O) 3 -nPO (OM) n (M is a hydrogen atom, a periodic table It represents a group I, II, or III element, an amine or an ammonium group, and n is 1 or 2.)

【0006】本発明で用いられる感光性樹脂版として
は、少なくとも支持体および感光性樹脂組成物層を有す
るものであり、水系の現像液に対して現像性を持つため
に、感光性樹脂組成物に、イオン性親水基を含有する親
水性成分が含まれ、さらに光重合性不飽和単量体、光増
感剤その他が配合されることによって光感光性を付与し
ている。本発明において用いられる感光性樹脂組成物と
しては、前記公報等に記載している組成物が挙げられる
が、特に疎水性成分に親水性または水膨潤成分を付与す
るために、疎水性ポリマ−をイオン性親水性基で変性し
た樹脂を主成分とするもの、疎水性ポリマ−を主成分と
した疎水性成分とイオン性親水基を含有する親水性また
は水膨潤性ポリマ−を主成分とした親水性または水膨潤
性成分の混合体を主成分とするもの、疎水性ポリマ−と
イオン性親水基を含有する親水性または水膨潤性ポリマ
−を化学的に結合させたものを主成分とするもの、疎水
性ポリマ−の原料となる疎水性モノマ−と親水性ポリマ
−の原料となる親水性モノマ−をブロック共重合体させ
たポリマ−を主成分とするもの等に挙げられるように、
疎水性成分に何らかの形で親水性または水膨潤性成分を
組み合わせて、水系現像液に分散型の感光性フレキソ版
としたタイプとしたものが好ましい例として挙げられ
る。
The photosensitive resin plate used in the present invention has at least a support and a photosensitive resin composition layer, and has a developing property with respect to an aqueous developing solution. Contains a hydrophilic component containing an ionic hydrophilic group, and is further provided with photosensitivity by blending a photopolymerizable unsaturated monomer, a photosensitizer and the like. Examples of the photosensitive resin composition used in the present invention include the compositions described in the above-mentioned publications. Particularly, in order to impart a hydrophilic or water-swelling component to a hydrophobic component, a hydrophobic polymer is used. A resin mainly composed of a resin modified with an ionic hydrophilic group, a hydrophobic component mainly composed of a hydrophobic polymer and a hydrophilic substance mainly composed of a hydrophilic or water-swellable polymer containing an ionic hydrophilic group. Based on a mixture of hydrophilic or water-swellable components, or based on a chemical combination of a hydrophobic polymer and a hydrophilic or water-swellable polymer containing an ionic hydrophilic group As mentioned above, as a main component, a polymer obtained by block copolymerizing a hydrophobic monomer serving as a raw material of a hydrophobic polymer and a hydrophilic monomer serving as a raw material of a hydrophilic polymer,
A preferable example is a type in which a hydrophilic or water-swellable component is combined with a hydrophobic component in some form to form a photosensitive flexographic plate of a dispersion type in an aqueous developer.

【0007】ここで挙げた疎水性ポリマ−としては例え
ば、1,4−ポリブタジエン、1,2−ポリブタジエ
ン、アクリロニトリルゴム、ブタジエンアクリロニトリ
ルゴム、クロロプレンゴム、ポリウレタンゴム、ブタジ
エンスチレンコポリマ−、スチレン−ブタジエン−スチ
レンブロックコポリマ−、スチレン−イソプレン−スチ
レンブロックコポリマ−、ポリアミド樹脂、不飽和ポリ
エステル樹脂、(メタ)アクリル酸コポリマ−、ブタジ
エン−(メタ)アクリル酸−アクリルエステルコポリマ
−、シリコンゴム、ポリオキシプロピレングリコ−ル、
イソプレンゴム、ブタジエンゴム、スチレン−ブタジエ
ンゴム、ブチルゴム、エチレン−プロピレンゴム、エピ
クロルヒドリンゴム等のような版にゴム弾性を与えるポ
リマ−や硬度や安定性を与えるアクリル樹脂やポリウレ
タン樹脂、ポリエステル樹脂等のポリマ−を挙げること
ができ、これらは単独または必要に応じて複数組み合わ
せて用いられる。またこれら樹脂類は、モノマ−や架橋
剤と、またはポリマ−同士で反応できるように変性する
ことも可能である。
Examples of the hydrophobic polymer mentioned here include 1,4-polybutadiene, 1,2-polybutadiene, acrylonitrile rubber, butadiene acrylonitrile rubber, chloroprene rubber, polyurethane rubber, butadiene styrene copolymer, styrene-butadiene-styrene. Block copolymer, styrene-isoprene-styrene block copolymer, polyamide resin, unsaturated polyester resin, (meth) acrylic acid copolymer, butadiene- (meth) acrylic acid-acrylic ester copolymer, silicon rubber, polyoxypropylene glyco- ,
Polymers that impart rubber elasticity to plates such as isoprene rubber, butadiene rubber, styrene-butadiene rubber, butyl rubber, ethylene-propylene rubber, epichlorohydrin rubber, and acrylic resins, polyurethane resins, and polyester resins that impart hardness and stability. And these may be used alone or in combination as necessary. These resins can also be modified so that they can react with monomers or cross-linking agents or between polymers.

【0008】本発明で使用される親水性または水膨潤性
ポリマ−としては、例えば(メタ)アクリル酸またはそ
の塩類の重合体、(メタ)アクリル酸またはその塩類−
アルキル(メタ)アクリレ−ト共重合体、(メタ)アク
リル酸またはその塩類−スチレン共重合体、(メタ)ア
クリル酸またはその塩類−酢酸ビニル共重合体、(メ
タ)アクリル酸またはその塩類−アクリロニトリル共重
合体、−COOM基や−SO3M基や−SO4M基や−n
PO(OM)nや(O)3−nPO(OM)n(nは1
または2)基を含有するポリアクリレ−ト、ポリビニル
化合物、ポリウレタン、ポリウレアウレタン、ポリエス
テル、エポキシ化合物、ポリアミドおよびこれらの塩類
や誘導体が挙げられる(なお前記Mは周期表I、II、II
I族元素、アミンまたはアンモニウム基を示す)。また
親水性成分も同様に複数組み合わせて用いることが可能
であり、必要に応じて変性しても良い。
The hydrophilic or water-swellable polymer used in the present invention includes, for example, a polymer of (meth) acrylic acid or a salt thereof, and a polymer of (meth) acrylic acid or a salt thereof.
Alkyl (meth) acrylate copolymer, (meth) acrylic acid or salts thereof-styrene copolymer, (meth) acrylic acid or salts thereof-vinyl acetate copolymer, (meth) acrylic acid or salts thereof-acrylonitrile copolymers, -COOM group or -SO 3 M group and -SO 4 M group or -n
PO (OM) n or (O) 3- nPO (OM) n (n is 1
Or 2) group-containing polyacrylates, polyvinyl compounds, polyurethanes, polyureaurethanes, polyesters, epoxy compounds, polyamides, and salts and derivatives thereof (where M is the periodic table I, II, II)
Indicate group I element, amine or ammonium group). Similarly, a plurality of hydrophilic components can be used in combination, and may be modified as needed.

【0009】感光性樹脂組成物としては、前記ポリマー
以外に、架橋剤、酸化防止剤、重合禁止剤、可塑剤等が
前記のポリマ−に任意に添加・配合される。
As the photosensitive resin composition, in addition to the polymer, a crosslinking agent, an antioxidant, a polymerization inhibitor, a plasticizer and the like are optionally added to and blended with the polymer.

【0010】架橋剤として具体的には、エチレングリコ
ールジ(メタ)アクリレート、ジエチレングリコールジ
(メタ)アクリレート、1,4−ブタンジオールジ(メ
タ)アクリレート、1,6−ヘキサンジオールジ(メ
タ)アクリレート、トリメチロールプロパントリ(メ
タ)アクリレート、グリセリンジ(メタ)アクリレー
ト、トリエチレングリコールジ(メタ)アクリレート、
PEG #200ジ(メタ)アクリレート、PEG #400ジ(メタ)
アクリレート、1,3−ブタンジオールジメタクリレー
ト、ネオペンチルグリコールジ(メタ)アクリレート、
1,10−デカンジオールジメタクリレート、ビスフェ
ノールAのエチレンオキサイド付加物ジ(メタ)アクリ
レート、エチレンオキサイド変性トリメチロールプロパ
ントリアクリレート、ペンタエリスリトールトリアクリ
レート、ペンタエリスリトールテトラアクリレート、ジ
ペンタエリスリトールヘキサアクリレート、1,9−ノ
ナンジオールジ(メタ)アクリレート、ライトエステル
P−2M[共栄社化学(株)製]、ペンタエリスリトー
ルの3モルエチレンオキサイド付加物のトリアクリレー
ト、オリゴプロピレングリコールジ(メタ)アクリレー
ト、ポリテトラメチレングリコールジ(メタ)アクリレ
ート等が挙げられ、特にアルキレングリコール系及びア
ルキレンエーテル系の架橋剤が好ましい。
Specific examples of the crosslinking agent include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, Trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate, triethylene glycol di (meth) acrylate,
PEG # 200 di (meth) acrylate, PEG # 400 di (meth)
Acrylate, 1,3-butanediol dimethacrylate, neopentyl glycol di (meth) acrylate,
1,10-decanediol dimethacrylate, bisphenol A ethylene oxide adduct di (meth) acrylate, ethylene oxide modified trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, 1,9 -Nonanediol di (meth) acrylate, light ester P-2M (manufactured by Kyoeisha Chemical Co., Ltd.), triacrylate of 3-mol ethylene oxide adduct of pentaerythritol, oligopropylene glycol di (meth) acrylate, polytetramethylene glycol di (Meth) acrylates and the like are preferred, and alkylene glycol-based and alkylene ether-based crosslinking agents are particularly preferred.

【0011】感光性樹脂版の製造方法としては、前記の
疎水性ポリマ−、親水性または水膨潤性ポリマ−、架橋
剤、酸化防止剤等の原料をニ−ダ−や押し出し機等で混
練りすることによって感光性樹脂が製造され、さらに感
光性樹脂層を中心に支持体上に接着層がコ−ティングさ
れた支持体と粘着防止層がコ−ティングされたカバ−フ
ィルムを用いて挟み、熱プレス、カレンダ−成形等の方
法で順に積層することによって感光性樹脂原版を得るこ
とができる。
As a method for producing a photosensitive resin plate, the raw materials such as the above-mentioned hydrophobic polymer, hydrophilic or water-swellable polymer, crosslinking agent and antioxidant are kneaded with a kneader or an extruder. A photosensitive resin is produced by doing so, and further sandwiched between a support having an adhesive layer coated on a support and a cover film having an anti-adhesion layer coated thereon, with the photosensitive resin layer as a center, An original photosensitive resin plate can be obtained by sequentially laminating by a method such as hot pressing or calendar molding.

【0012】得られた感光性樹脂原版を硬化させる方法
としては、150〜500nm、特に300〜400n
mの波長を有する紫外線の照射により硬化する。その光
源としては、低圧水銀灯、高圧水銀灯、超高圧水銀灯、
メタハライドランプ、キセノンランプ、ジルコニウムラ
ンプ、カ−ボンア−ク灯、紫外線用蛍光灯等が好ましく
使用される。
As a method for curing the obtained photosensitive resin master, 150 to 500 nm, especially 300 to 400 n
Cured by irradiation with ultraviolet light having a wavelength of m. Its light sources include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps,
Metahalide lamps, xenon lamps, zirconium lamps, carbon arc lamps, ultraviolet fluorescent lamps and the like are preferably used.

【0013】次に本発明において感光性樹脂版は前記光
源下で透明画像を有するネガフィルムをあてて紫外線を
照射し画像露光させ露光されない非画像部を現像液を用
いて除去することによってレリ−フ画像が得られ、一方
溶解除去された未硬化の感光性樹脂は乳濁液あるいは懸
濁液状溶液となって現像槽中に残る。
Next, in the present invention, the photosensitive resin plate is formed by applying a negative film having a transparent image under the above-mentioned light source, irradiating ultraviolet rays to expose the image, and removing a non-image portion which is not exposed using a developing solution. An image is obtained, while the uncured photosensitive resin dissolved and removed remains in the developing tank as an emulsion or a suspension.

【0014】本発明において使用される現像液として
は、水だけでもよいが、さらに以下に示す化合物を配合
してもよい、例えば、ラウリン酸ソ−ダ、ステアリン酸
ソ−ダ、オレイン酸ソ−ダなどの脂肪酸カルボン酸塩
類、アビエチン酸ソ−ダ、ロジン酸ソ−ダなどの樹脂石
鹸類、ラウリル硫酸ソ−ダ、ラウリル硫酸トリエタノ−
ルアミンなどの1級および2級のアルキル硫酸塩類、ポ
リオキシエチレンラウリルエ−テル硫酸ソ−ダ、ポリオ
キシエチレンラウリルエ−テル硫酸トリエタノ−ルアミ
ンなどの1級および2級のポリオキシエチレンラウリル
エ−テル硫酸塩類、ラウリルベンゼンスルホン酸ソ−
ダ、ステアリルベンゼンスルホン酸ソ−ダなどのアルキ
ルベンゼンスルホン酸塩類、プロピルナフタレンスルホ
ン酸ソ−ダ、ブチルナフタレンスルホン酸ソ−ダなどの
アルキルナフタレンスルホン酸塩類、ポリオキシエチレ
ンラウリルフェニルエ−テルスルホン酸ソ−ダなどのポ
リオキシエチレンラウリルフェニルエ−テルスルホン酸
塩類、硫酸化ひまし油、硫酸化牛油などの硫酸化油類、
硫酸化オレイン酸ブチルなどの硫酸化脂肪酸エステル
類、ジオクチルスルホ虎珀酸ソ−ダを代表とするアルキ
ルスルホ虎珀酸塩類、a−オレフィンスルホン酸塩類、
ヒドロキシアルカンスルホン酸塩類、N−メチル−N−
アルキルタウリン塩類、N−アルキルスルホ虎珀酸モノ
アミド塩類、脂肪酸モノグリセライド硫酸エステル塩
類、アルキルジフェニルエ−テルジスルホン酸塩類、ラ
ウルルアルコ−ル燐酸モノエステルジソ−ダ塩やラウリ
ルアルコ−ル燐酸ジエステルソ−ダ塩などのアルキルホ
スフェ−トの塩類、ポリオキシエチレンラウリルエ−テ
ル燐酸モノエステルジソ−ダ塩やポリオキシエチレンラ
ウリルエ−テル燐酸ジエステルソ−ダ塩などのポリオキ
シエチレンアルキルホスフェ−トの塩類、ナフタレンス
ルホン酸塩ホルマリン縮合物類、スチレン−無水マレイ
ン酸共重合体部分鹸化物の塩類、オレフィン−無水マレ
イン酸共重合体部分鹸化物の塩類などのアニオン系界面
活性剤が好ましく使用できる。なお、具体例としては主
にナトリウム塩を挙げるが、カリウム塩、アンモニウム
塩、なども可能で特に限定されるものでない。これ等ア
ニオン系界面活性剤以外に5%以下のノニオン系活性剤
を含有した現像液でも構わない。
The developer used in the present invention may be water alone or may further contain the following compounds, for example, sodium laurate, sodium stearate, sodium oleate. Fatty acid carboxylate salts such as sodium bicarbonate, resin soaps such as sodium abietic acid and sodium rosin acid, sodium lauryl sulfate, and triethano lauryl sulfate.
And primary and secondary polyoxyethylene lauryl ethers such as polyoxyethylene lauryl ether soda sulfate and polyoxyethylene lauryl ether triethanol sulfate. Tersulfates, sodium laurylbenzenesulfonate
And alkyl benzene sulfonates such as sodium stearylbenzenesulfonate; alkyl naphthalene sulfonates such as sodium propylnaphthalenesulfonate and sodium butylnaphthalenesulfonate; Polyoxyethylene lauryl phenyl ether sulfonates, sulfated castor oil, sulfated beef oil and other sulfated oils,
Sulfated fatty acid esters such as sulfated butyl oleate, alkyl sulfo laurates represented by dioctyl sulfo succinate soda, a-olefin sulfonates,
Hydroxyalkanesulfonates, N-methyl-N-
Alkyl tauric acid salts, N-alkylsulfo phthalic acid monoamide salts, fatty acid monoglyceride sulfate salts, alkyl diphenyl ether disulfonic acid salts, rauryl alcohol phosphoric acid monoester disodium salt, lauryl alcohol phosphoric acid diester soda salt, etc. Salts of polyoxyethylene alkyl phosphates such as polyoxyethylene lauryl ether phosphate monoester disodium salt and polyoxyethylene lauryl ether phosphate diester soda salt; naphthalene Anionic surfactants such as sulfonate formalin condensates, styrene-maleic anhydride copolymer partially saponified salts, and olefin-maleic anhydride copolymer partially saponified salts are preferably used. Specific examples are mainly sodium salts, but potassium salts and ammonium salts are also possible and are not particularly limited. A developer containing 5% or less of a nonionic surfactant in addition to these anionic surfactants may be used.

【0015】次に、これ等の現像液で露光されない未硬
化の非画像部の樹脂は、溶解除去され現像槽中に樹脂含
有の状態で繰り返し現像液として使用されるが、使用者
の都合あるいは樹脂濃度の上昇に伴う現像性能の低下や
現像液の変色、PHの変動等の劣化が著しくなり、この
ため劣化した現像液を廃液処理し、現像液を更新するこ
とが必要である。廃液処理される樹脂濃度は6〜7%程
度になった時とかPHが10以下になった時とかを目安
に液交換される。この使用済み現像廃液は、感光性樹
脂、界面活性剤、消泡剤等が含まれている。これ等樹脂
廃液を簡易な廃液処理槽に移し高分子カチオン系フロッ
ク剤を添加、攪拌し現像廃液中の樹脂分を現像液から凝
集分離し、粘着性の小さいスラッジを得ると共に同処理
浴槽中で酸中和処理することにより下水道への排水処理
ができる。
Next, the uncured non-image area resin which is not exposed to the developer is dissolved and removed, and is repeatedly used as a developer while the resin is contained in the developing tank. The deterioration of the developing performance, the discoloration of the developing solution, the fluctuation of the pH, and the like due to the increase in the resin concentration become remarkable. Therefore, it is necessary to treat the deteriorated developing solution with a waste liquid and renew the developing solution. The liquid is exchanged when the concentration of the resin subjected to the waste liquid treatment becomes about 6 to 7% or when the PH becomes 10 or less. This used developing waste liquid contains a photosensitive resin, a surfactant, an antifoaming agent and the like. Transfer these resin waste liquids to a simple waste liquid treatment tank, add a polymeric cationic flocculant, stir and agglutinate and separate the resin component in the development waste liquid from the developer to obtain a small-adhesive sludge, and in the same treatment bath. Drainage treatment to the sewer can be performed by acid neutralization treatment.

【0016】本発明で使用されるカチオン性フロック剤
としては例えば、ポリアクリルアミドにホルマリンとア
ミン類で変成したポリアクリルアミドのカチオン化変成
物、カチオン性ビニルラクタム−アクリルアミド共重合
体、ジアリルアンモニウムハロゲン化物のかん化重合
物、イソブチレンと無水マレイン酸との共重合物にジア
ミンを反応させた共重合体、ビニルイミダゾリン重合
体、ジアルキルアミノエチルアクリレ−トの重合体、ポ
リエチレンイミン、アルキレンジクロライドとアルキレ
ンポリアミンとの重縮合物、ジシアンジアミドとホルマ
リンとの重縮合物、アニリンとホルマリンとの重縮合
物、アミン類とエピクロヒドリンとの共重合体、アンモ
ニアとエピクロヒドリンとの共重合体、アミン類とアス
パラギン酸との共重合体、第4級アンモニウム塩を側鎖
に有するアクリルポリマ−等が挙げられ、好ましくはア
ミン類とエピクロヒドリンとの共重合体が挙げられる。
Examples of the cationic flocculant used in the present invention include cationized modified polyacrylamide obtained by modifying polyacrylamide with formalin and amines, cationic vinyl lactam-acrylamide copolymer, and diallyl ammonium halide. A saponified polymer, a copolymer obtained by reacting a diamine with a copolymer of isobutylene and maleic anhydride, a vinyl imidazoline polymer, a polymer of dialkylaminoethyl acrylate, polyethylene imine, an alkylene dichloride and an alkylene polyamine. Polycondensate of dicyandiamide and formalin; polycondensate of aniline and formalin; copolymer of amines and epichlorohydrin; copolymer of ammonia and epichlorohydrin; copolymer of amines and aspartic acid Polymer Acrylic polymers having a quaternary ammonium salt in the side chain - and the like, with preference given to a copolymer of an amine and epichlorohydrin.

【0017】ここでのアミン類としては例えば、メチル
アミン、エチルアミン、n−プロピルアミン、イソプロ
ピルアミン、メトキシプロピルアミン、ブツルアミン、
アミルアミン、アリルアミン、ヘキシルアミン、カプリ
ルアミン、ラウリルアミン、ステアリルアミン、オレイ
ルアミン、モノメチルアミノプロピルアミン、ベンジル
アミン、ピペリジン、ピロリジン等のアルキル及び環状
アミン類、ポリエチレンポリアミン類、アミノプロピル
エタノ−ルアミン、メチルイミノビスプロピルアミン、
モノメチルアミノプロピルアミン、ジアルキルアミノプ
ロピルアミン、ヒドロキシエチルアミノプロピルアミ
ン、ジエチルアミノエチルアミン、テトラメチレンジア
ミン、ヘキサメチレンジアミン等が挙げられる。
The amines used herein include, for example, methylamine, ethylamine, n-propylamine, isopropylamine, methoxypropylamine, butyramine,
Amylamine, allylamine, hexylamine, caprylamine, laurylamine, stearylamine, oleylamine, monomethylaminopropylamine, benzylamine, piperidine, alkyl and cyclic amines such as pyrrolidine, polyethylenepolyamines, aminopropylethanolamine, methyliminobis Propylamine,
Monomethylaminopropylamine, dialkylaminopropylamine, hydroxyethylaminopropylamine, diethylaminoethylamine, tetramethylenediamine, hexamethylenediamine and the like can be mentioned.

【0018】本発明におけるカチオン系フロック剤の作
用としては、アニオン系現像液(負の電荷)によって現
像されたアニオン系樹脂の浮遊粒子にカチオン系フロッ
ク剤(正の電荷)が吸着し(又はその反対)その粒子表
面の電荷を中和する働きにより各々の粒子が凝集してく
るものと考えられる。
The action of the cationic flocculant in the present invention is as follows. The cationic flocculant (positive charge) is adsorbed on the suspended particles of the anionic resin developed by the anionic developer (negative charge) (or the cationic flocculant is adsorbed). Conversely, it is considered that each particle aggregates due to the action of neutralizing the charge on the particle surface.

【0019】本発明において、前記カチオン系フロック
剤以外にさらに助剤として添加される弱アニオン性又は
ノニオン性フロック剤としては、ポリアクリルアミド
系、アニオン性ポリアクリルアミド系、ポリアクリルア
ミドの部分加水分解物等の弱アニオン性フロック剤、ポ
リアクリルアミド系、ポリエチレンオキサイド系、ポリ
アルカノ−ルアミン等のノニオン性フロック剤が使用で
き、分子量数十万〜数千万の高分子が好ましい。これ等
の助剤はカチオン性フロック剤と同等量又はそれ以下の
添加量で使用される。
In the present invention, the weakly anionic or nonionic flocculant which is further added as an auxiliary agent in addition to the above-mentioned cationic flocculant includes polyacrylamides, anionic polyacrylamides, partially hydrolyzed polyacrylamides and the like. Nonionic floc agents such as weak anionic floc agents, polyacrylamides, polyethylene oxides, and polyalkanolamines can be used, and polymers having a molecular weight of hundreds of thousands to tens of millions are preferred. These auxiliaries are used in an amount equal to or less than the cationic flocculant.

【0020】なお、本発明において、固形分を除いた廃
液を下水道への排水処理するには、さらに酸性化合物を
添加してPH5.0〜9.0にしておいた方が好まし
い。この酸性化合物としては、蟻酸、塩酸、硫酸、酢
酸、燐酸、蓚酸、クエン酸、硝酸、モノクロロ酢酸等の
PH3前後の酸性化合物が挙げられる。
In the present invention, in order to treat the waste liquid from which the solids have been removed to the sewer, it is preferable to further add an acidic compound to adjust the pH to 5.0 to 9.0. Examples of the acidic compound include acidic compounds having a pH of about 3 such as formic acid, hydrochloric acid, sulfuric acid, acetic acid, phosphoric acid, oxalic acid, citric acid, nitric acid, and monochloroacetic acid.

【0021】[0021]

【発明の実施の形態】以上、カチオン性フロック剤を用
いて樹脂廃液を処理する本発明操作方法としては、例え
ば、50l(50リットル)の樹脂廃液が入る簡易な廃
液処理浴槽を準備し、樹脂濃度が約3%以上の廃液を投
入し攪拌を開始する。次に、ジメチルアミンとエピクロ
ヒドリンとの共重合体からなるカチオン性フロック剤を
5〜10ml/l、好ましくは6〜8ml/lを加えて約2
〜3分間攪拌し凝集物を発生させる。更に完全に処理剤
を反応させるため、2分程度攪拌を続けると粘着性の小
さいスラッジが浮遊してくる。廃液樹脂濃度が約3%以
下の場合は凝集粒子が小さくやや濾過性が落ちるで廃液
処理樹脂濃度は6〜7%程度の時に処理するのが好まし
い。又、カチオン性フロック剤が5ml/l以下の添加量
の場合、凝集粒子が得にくく粘着性が強く、10ml/l
以上添加の場合は凝集粒子が小さくになり濾過性が低下
し好ましくない。更に攪拌を続けながら酸を2〜3ml/
l加え、2〜3分間続けると廃液は下水道排水規制値
(PH5.0〜9.0、BOD1200mg/l以下)
を満足し下水道へ排水することができる。更に、攪拌を
止め静置後、ろ布を用いて濾過しスラッジを取り出すこ
とができ、その作業は容易である。
DETAILED DESCRIPTION OF THE INVENTION As described above, the operation method of the present invention for treating a resin waste liquid by using a cationic flocculant includes, for example, preparing a simple waste liquid treatment bath containing 50 l (50 liters) of resin waste liquid, A waste liquid having a concentration of about 3% or more is charged and stirring is started. Next, 5 to 10 ml / l, preferably 6 to 8 ml / l, of a cationic flocculant composed of a copolymer of dimethylamine and epichlorohydrin is added to the mixture to obtain about 2 ml.
Stir for ~ 3 minutes to generate aggregates. In order to further react the treating agent completely, if the stirring is continued for about 2 minutes, sludge having low adhesiveness floats. When the concentration of the waste liquid resin is about 3% or less, the aggregated particles are small and the filterability is slightly lowered. On the other hand, when the amount of the cationic flocculant is less than 5 ml / l, it is difficult to obtain agglomerated particles and the adhesiveness is strong, so
In the case of the above addition, the aggregated particles become small and the filterability is lowered, which is not preferable. While continuing stirring, acid was added to 2-3 ml /
Addition and continued for 2 to 3 minutes, the waste liquid will be regulated by sewer drainage (PH 5.0 to 9.0, BOD 1200 mg / l or less)
And can be drained to the sewer. Further, after the stirring is stopped and the mixture is allowed to stand, the mixture is filtered using a filter cloth to remove sludge, and the operation is easy.

【0022】[0022]

【実施例】以下、本発明を実施例を用いて本発明を具体
的に説明するが、本発明はこれらの実施例に限定される
ものではない。なお実施例中、部とあるのは重量部を意
味する。 実施例1 感光性樹脂原版(東洋紡績(株)製コスモライト)を用
いて、ニッサン粉石鹸(ニッサン石鹸(株)製)1%から
なる現像液で40℃、15分間、ネガフィルムを用いて
パタ−ン露光し露光されない未露光部分をブラシ現像し
た。現像液の樹脂濃度が約5%になったところで50l
(50リットル)の樹脂廃液処理浴槽に移し攪拌機で攪
拌を開始した。次に、カチオン性フロック剤(ジメチル
アミンとエピクロルヒドリンとの共重合体(分子量約3
00,000):プロセディム4525)を6ml/l
加え攪拌を続行した。約2〜3分攪拌すると大粒な凝集
物が発生しそのものは粘着性が小さく取り扱いが容易で
あった。次に、そのままの攪拌下で蟻酸を2〜3ml/
l添加し約2〜3分攪拌したのち攪拌を停止し静置し
た。静置後、濾布を敷いた濾過槽で濾過を行い容易にス
ラッジを取り出すことができた。又、処理廃液のPHを
測定したところ、PH6.8、SS191mg/l,B
OD134mg/l,COD850mg/lで下水道へ
排水できる値のものであった。
EXAMPLES Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited to these Examples. In the examples, “parts” means “parts by weight”. Example 1 A photosensitive resin master plate (Cosmolite manufactured by Toyobo Co., Ltd.) was used, and a negative film was used at 40 ° C. for 15 minutes in a developer containing 1% of Nissan powder soap (manufactured by Nissan Soap Co., Ltd.). The unexposed portions which were not exposed after the pattern exposure were brush-developed. When the resin concentration of the developer reaches about 5%, 50 l
(50 liters) was transferred to a resin waste liquid treatment bath, and stirring was started with a stirrer. Next, a cationic flocculant (copolymer of dimethylamine and epichlorohydrin (molecular weight of about 3
00,000): 6 ml / l of Procedim 4525)
The stirring was continued. When the mixture was stirred for about 2 to 3 minutes, large aggregates were generated, and the cohesion itself was small and easy to handle. Next, formic acid was added under agitation with 2-3 ml /
After stirring for about 2 to 3 minutes, stirring was stopped and the mixture was allowed to stand. After standing, filtration was performed in a filtration tank covered with a filter cloth, and sludge was easily taken out. Further, when the pH of the treated waste liquid was measured, the pH was 6.8, SS 191 mg / l, B
The OD was 134 mg / l and the COD was 850 mg / l, which was a value that could be drained to the sewer.

【0023】実施例2 実施例1において、カチオン性フロック剤としてプロセ
ディム4525の代わりに、クリフロックLC−551
(分子量約10,000栗田工業(株)製)を用いた以
外は全て実施例1と同様に処理したところ大粒凝集粒子
が得られ、粘着性も小さく更に濾過性も良好であった。
処理廃液のPHも6.8であった。
Example 2 In Example 1, Cliffloc LC-551 was used instead of Procedim 4525 as a cationic flocculant.
Except for using a molecular weight of about 10,000 (produced by Kurita Kogyo Co., Ltd.), all treatments were carried out in the same manner as in Example 1 to obtain large agglomerated particles, small adhesiveness and good filterability.
The pH of the treatment waste liquid was 6.8.

【0024】実施例3 実施例1において、カチオン性フロック剤としてプロセ
ディム4525の代わりに、サンフロック700(分子
量約数百〜数千三洋化成工業(株)製)を用いた以外は
全て実施例1と同様に処理したところ大粒凝集粒子が得
られ、粘着性も小さく更に濾過性も良好であった。処理
廃液のPHも6.8であった。
Example 3 In Example 1, except that Procedim 4525 was used as the cationic floc agent instead of Sunfloc 700 (molecular weight of about several hundred to several thousand manufactured by Sanyo Kasei Kogyo Co., Ltd.), all examples were used. When treated in the same manner as in Example 1, large aggregated particles were obtained, the adhesiveness was small, and the filterability was good. The pH of the treatment waste liquid was 6.8.

【0025】実施例4 実施例1と同様な方法で、現像液をエコバー(エコバ−
(株)製)を用いた以外同じ操作で現像処理し樹脂廃液を
作成し、カチオン性フロック剤(プロセディム452
5)を用いて実施例1と同様な方法で処理したところ大
粒凝集粒子が得られ、粘着性も小さく更に濾過性も良好
であった。処理廃液のPHも6.8であった。
Example 4 In the same manner as in Example 1, the developer was supplied with an eco-bar (eco-bar).
Developing resin waste liquid by the same operation except using the above method, a cationic floc (Procedim 452)
When treated in the same manner as in Example 1 using 5), large aggregated particles were obtained, the adhesion was small, and the filterability was good. The pH of the treatment waste liquid was 6.8.

【0026】実施例5 実施例1と同様な方法で、現像液をフェイリ−((株)P
&G製)を用いた以外同じ操作で現像処理し樹脂廃液を
作成し、カチオン性フロック剤(プロセディム452
5)を用いて実施例1と同様な方法で処理したところ大
粒凝集粒子が得られ、粘着性も小さく更に濾過性も良好
であった。処理廃液のPHも7.0であった。
Example 5 In the same manner as in Example 1, a developing solution was added to Feyley (P Co., Ltd.).
& G) to produce a resin waste liquid, using a cationic floc (Procedim 452).
When treated in the same manner as in Example 1 using 5), large aggregated particles were obtained, the adhesion was small, and the filterability was good. The pH of the treatment waste liquid was also 7.0.

【0027】実施例6 実施例1と同様な方法で、現像液をカスケ−ド((株)P
&G製)を用いた以外同じ操作で現像処理し樹脂廃液を
作成し、カチオン性フロック剤(プロセディム452
5)を用いて実施例1と同様な方法で処理したところ大
粒凝集粒子が得られ、粘着性も小さく更に濾過性も良好
であった。処理廃液のPHも6.9であった。
Example 6 In the same manner as in Example 1, the developer was cascaded (P Co., Ltd.).
& G) to produce a resin waste liquid, using a cationic floc (Procedim 452).
When treated in the same manner as in Example 1 using 5), large aggregated particles were obtained, the adhesion was small, and the filterability was good. The pH of the treatment waste liquid was 6.9.

【0028】実施例7 実施例1と同様な方法で、現像液をサン((株)P&G
製)を用いた以外同じ操作で現像処理し樹脂廃液を作成
し、カチオン性フロック剤(プロセディム4525)を
用いて実施例1と同様な方法で処理したところ粗大凝集
粒子が得られ、粘着性も小さく更に濾過性も良好であっ
た。処理廃液のPHも6.9であった。
Example 7 In the same manner as in Example 1, the developing solution was purified by Sun (P & G Co., Ltd.).
The resin was developed by the same operation except that the above method was used to prepare a resin waste liquid, and treated with a cationic floc (Procedim 4525) in the same manner as in Example 1 to obtain coarse agglomerated particles. It was small and the filterability was good. The pH of the treatment waste liquid was 6.9.

【0029】実施例8 実施例1と同様な操作で現像処理し樹脂廃液を作成し
た。次にカチオン性フロック剤(プロセディム452
5)を10ml/l添加し攪拌し、更に高分子ノニオン
系フロック剤(サンフロック520P,分子量数百万、
三洋化成(株)製)を4ml/l添加し約1時間攪拌し
たところ大粒な凝集物が得られ、粘着性も小さく更に濾
過性も良好であった。PHは9.4で実施例1と同様な
方法でPH調整し処理廃液とした。
Example 8 A developing treatment was carried out in the same manner as in Example 1 to prepare a resin waste liquid. Next, a cationic flocculant (Procedim 452)
5) was added and stirred at 10 ml / l, and a polymer nonionic floc agent (Sanfloc 520P, molecular weight several million,
When 4 ml / l of Sanyo Kasei Co., Ltd.) was added and the mixture was stirred for about 1 hour, large aggregates were obtained, the adhesiveness was small, and the filterability was good. The pH was adjusted to 9.4 in the same manner as in Example 1 to obtain a treated waste liquid.

【0030】実施例9 実施例1と同様な操作で現像処理し樹脂廃液を作成し
た。次に高分子カチオン性フロック剤(プロセディム4
525)を10ml/l添加し攪拌し、更に高分子弱ア
ニオン系フロック剤サンフロックAS−110P(分子
量数百万、三洋化成(株)製)を4ml/l添加し約1
時間攪拌したところ大粒な凝集物が得られ、粘着性も小
さく更に濾過性も良好であった。
Example 9 A developing treatment was performed in the same manner as in Example 1 to prepare a resin waste liquid. Next, a polymeric cationic floc (Procedim 4
525) was added at 10 ml / l and the mixture was stirred. Further, 4 ml / l of a high-molecular weak anionic flocculant, Sanfloc AS-110P (molecular weight: several million, manufactured by Sanyo Chemical Co., Ltd.) was added, and the mixture was added to about 1 ml.
When the mixture was stirred for a long time, a large aggregate was obtained, the adhesiveness was small, and the filterability was good.

【0031】実施例10 実施例1で用いた感光性樹脂原版に変わって、水系現像
型フレキソ原版AQS(デュポン(株)製)を用いた以
外、実施例1と同様な方法で現像、廃液処理を行ったと
ころ実施例1と同様な良好な結果が得られた。
Example 10 Development and waste liquid treatment were carried out in the same manner as in Example 1 except that the photosensitive resin original used in Example 1 was replaced with an aqueous development type flexographic original AQS (manufactured by DuPont). Was performed, the same good results as in Example 1 were obtained.

【0032】実施例11 実施例1で用いた感光性樹脂原版に変わって、水系現像
型フレキソ原版フレキシドSGX(日本ペイント(株)
製)た以外、実施例1と同様な方法で現像、廃液処理を
行ったところ実施例1と同様な良好な結果が得られた。
Example 11 In place of the photosensitive resin master used in Example 1, an aqueous development type flexographic master Flexide SGX (Nippon Paint Co., Ltd.)
Developing and waste liquid treatment were carried out in the same manner as in Example 1 except that the same good results as in Example 1 were obtained.

【0033】比較例1 カチオン性フロック剤(プロセディム4525)を用い
ない以外、実施例1と同様な方法で現像、廃液処理を行
ったところ粗大凝集粒子が得られず、粘着性も大きく作
業性が劣り濾過も充分できなかった。
Comparative Example 1 Development and waste liquid treatment were performed in the same manner as in Example 1 except that the cationic floc agent (Procedim 4525) was not used. As a result, coarse aggregated particles were not obtained, the tackiness was large, and the workability was high. Inferior filtration was not enough.

【0034】比較例2 カチオン性フロック剤(プロセディム4525)に変え
てカチオ−ゲンL(第1工業製薬(株)製)を用いた以
外、実施例1と同様な方法で現像、廃液処理を行ったと
ころ粗大凝集粒子が得られず、粘着性も大きく作業性が
劣り濾過も充分できなかった。
Comparative Example 2 Development and waste liquid treatment were carried out in the same manner as in Example 1 except that Catiogen L (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) was used instead of the cationic floc agent (Procedim 4525). As a result, coarse aggregated particles were not obtained, the tackiness was large, the workability was poor, and the filtration was not sufficient.

【0035】比較例3 カチオン性フロック剤(プロセディム4525)に変え
て塩化アルミニウムを用いた以外、実施例1と同様な方
法で現像、廃液処理を行ったところ粗大凝集粒子が得ら
れず、粘着性も大きく作業性が劣った。
Comparative Example 3 Development and waste liquid treatment were performed in the same manner as in Example 1 except that aluminum chloride was used instead of the cationic floc agent (Procedim 4525). And the workability was poor.

【0036】実施例1〜11、比較例1〜3の結果を表
1に示す。
Table 1 shows the results of Examples 1 to 11 and Comparative Examples 1 to 3.

【0037】[0037]

【表1】 [Table 1]

【0038】[0038]

【発明の効果】以上、表1からも明らかなように、本発
明のカチオン性フロック剤を現像処理樹脂廃液の凝集分
離剤として用いることにより、簡易な廃液処理浴槽で充
分に満足する処理が可能となり、処理されたスラッジも
粘着性が小さくその作業性を向上させるものである。
又、本発明のカチオン性フロック剤を主に更に弱アニオ
ン性及びノニオン性フロック剤を助剤として添加するこ
とによりより濾過性が向上し一方、処理廃液も同浴槽中
で中和させることで下水道への排水処理も可能となり、
安価な設備でその処理能力も満足する大きな利点があ
り、産業界に寄与すること大である。
As is clear from Table 1, by using the cationic flocculant of the present invention as an aggregating / separating agent for developing resin waste liquid, it is possible to perform a satisfactory treatment in a simple waste liquid treating bath. Thus, the treated sludge also has low tackiness and improves its workability.
Further, by adding the cationic floc agent of the present invention mainly as a weak anionic and nonionic floc agent as an auxiliary, the filterability is further improved. Wastewater treatment is also possible,
There is a great advantage that the processing capacity can be satisfied with inexpensive equipment, which greatly contributes to the industry.

フロントページの続き Fターム(参考) 4D062 BA09 BA19 BB05 CA08 DB03 DB08 DB19 DB23 DB25 DB46 DC06 DC07 DC08 EA06 EA35Continuation of the front page F term (reference) 4D062 BA09 BA19 BB05 CA08 DB03 DB08 DB19 DB23 DB25 DB46 DC06 DC07 DC08 EA06 EA35

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】下記式(a)、(b)、(c)、(d)、
(e)で示される少なくとも一つのイオン性親水基を含
有する感光性樹脂版を現像液にて未硬化樹脂を除去した
樹脂廃液を処理するに際し、該樹脂廃液に分子量数百〜
数百万のカチオン性フロック剤を配合することを特徴と
する感光性樹脂版の廃液処理方法。 (a)−COOM (b)−SO3M (c)−SO4M (d)−nPO(OM)n (e)(O)3−nPO(OM)n (Mは水素原子、周期表第I、II、III族元素、アミン又
はアンモニウム基を示し、nは1または2である。)
1. The following formulas (a), (b), (c), (d),
In treating the resin waste liquid obtained by removing the uncured resin from the photosensitive resin plate containing at least one ionic hydrophilic group shown in (e) with a developer, the resin waste liquid has a molecular weight of several hundreds to several hundreds.
A method for treating a waste liquid of a photosensitive resin plate, comprising adding millions of cationic flocculants. (A) -COOM (b) -SO 3 M (c) -SO 4 M (d) -nPO (OM) n (e) (O) 3 -nPO (OM) n (M is a hydrogen atom, a periodic table It represents a group I, II, or III element, an amine or an ammonium group, and n is 1 or 2.)
【請求項2】カチオン性フロック剤及び助剤として弱ア
ニオン又はノニオン性フロック剤を添加する請求項1記
載の感光性樹脂版の廃液処理方法。
2. The method according to claim 1, wherein a weakly anionic or nonionic flocculant is added as a cationic flocculant and an auxiliary agent.
JP11217619A 1999-07-30 1999-07-30 Method of processing waste liquid of photosensitive resin plate Pending JP2001038367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11217619A JP2001038367A (en) 1999-07-30 1999-07-30 Method of processing waste liquid of photosensitive resin plate

Publications (1)

Publication Number Publication Date
JP2001038367A true JP2001038367A (en) 2001-02-13

Family

ID=16707141

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP2001038367A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008075587A1 (en) * 2006-12-18 2008-06-26 Eastman Kodak Company Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
CN120398356A (en) * 2025-07-03 2025-08-01 陕西高科环保科技股份有限公司 A purification process for waste developer liquid in liquid crystal panel factories

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008075587A1 (en) * 2006-12-18 2008-06-26 Eastman Kodak Company Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
JP2008152048A (en) * 2006-12-18 2008-07-03 Eastman Kodak Co Method for processing waste cleaning water of developing device for photosensitive planographic printing forme, developing method, and developing device
US8178283B2 (en) 2006-12-18 2012-05-15 Eastman Kodak Company Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
CN120398356A (en) * 2025-07-03 2025-08-01 陕西高科环保科技股份有限公司 A purification process for waste developer liquid in liquid crystal panel factories

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