JP2001035391A - Metal barrier rib for gas discharge type display panel - Google Patents
Metal barrier rib for gas discharge type display panelInfo
- Publication number
- JP2001035391A JP2001035391A JP21148899A JP21148899A JP2001035391A JP 2001035391 A JP2001035391 A JP 2001035391A JP 21148899 A JP21148899 A JP 21148899A JP 21148899 A JP21148899 A JP 21148899A JP 2001035391 A JP2001035391 A JP 2001035391A
- Authority
- JP
- Japan
- Prior art keywords
- rib
- insulating layer
- inorganic insulating
- display panel
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 title claims abstract description 53
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 53
- 230000004888 barrier function Effects 0.000 title claims abstract description 7
- 238000005192 partition Methods 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 16
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 16
- 239000011521 glass Substances 0.000 abstract description 13
- 239000000463 material Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 10
- 238000000638 solvent extraction Methods 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000007598 dipping method Methods 0.000 abstract description 2
- 238000004070 electrodeposition Methods 0.000 abstract description 2
- 239000012535 impurity Substances 0.000 abstract description 2
- 238000010422 painting Methods 0.000 abstract 1
- 239000007921 spray Substances 0.000 abstract 1
- 239000011800 void material Substances 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- 229910018557 Si O Inorganic materials 0.000 description 3
- 238000007610 electrostatic coating method Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はガス放電型表示パネ
ル用金属隔壁に関する。The present invention relates to a metal partition for a gas discharge type display panel.
【0002】[0002]
【従来の技術】一般にガス放電型表示パネルにおいて
は、放電空間を形成及び仕切るための絶縁性の隔壁が必
要とされ、この隔壁の構造は一般に略格子状(ストライ
プセル形状)を呈するものとなっている。従来、ガス放
電型表示パネルのうち、例えばプラズマディスプレイパ
ネルでは、この隔壁は酸化鉛を含むガラスを使用し、ガ
ラスペーストの多層印刷或いは更にサンドブラスト法に
より製造されているが、このような隔壁の作製法は工程
が煩雑であることから、コストが高くなってしまう。ま
た、製造された隔壁及びサンドブラスト法によって除去
されたガラスには有害な鉛が多く含まれるため、環境上
好ましくない。2. Description of the Related Art In general, a gas discharge type display panel requires an insulating partition for forming and partitioning a discharge space, and the structure of the partition generally has a substantially lattice shape (stripe cell shape). ing. Conventionally, among gas discharge type display panels, for example, in a plasma display panel, this partition is made of glass containing lead oxide and is manufactured by multilayer printing of a glass paste or further by sandblasting. Since the method is complicated, the cost increases. In addition, the manufactured partition walls and the glass removed by the sandblasting method contain a lot of harmful lead, and are not environmentally preferable.
【0003】更にプラズマディスプレイパネルの輝度向
上のため、隔壁の幅を小さくし、開口率を高める必要が
あるが、従来のガラス隔壁はもろく、幅を小さくするこ
とが難しいと言った問題や、プラズマディスプレイパネ
ルの高精細化のため、隔壁構造をストライプセル構造か
ら単独セル形状としたいが、上記同様にガラス隔壁の加
工が難しく、実用的ではないといった問題を抱えてい
る。そこで、上述の問題を解決するため、特開平3−2
05738号には、隔壁としてガラスを含む誘電体を表
面に形成した金属隔壁を適用することが開示されている
が、現在のところプラズマディスプレイなどのガス放電
型表示パネルに実用化されていない。Further, in order to improve the brightness of the plasma display panel, it is necessary to reduce the width of the partition wall and increase the aperture ratio. However, the conventional glass partition wall is fragile and difficult to reduce the width. In order to increase the definition of the display panel, it is desired to change the partition structure from a stripe cell structure to a single cell shape. However, similarly to the above, there is a problem that the processing of the glass partition is difficult and not practical. In order to solve the above-mentioned problem, Japanese Patent Laid-Open No.
Japanese Patent Application No. 05738 discloses that a metal partition having a dielectric containing glass formed on the surface is used as a partition, but has not been put to practical use in a gas discharge display panel such as a plasma display at present.
【0004】[0004]
【発明が解決しようとする課題】本発明者等は前述の特
開平3−205738号に記載された具体的な金属隔壁
の絶縁処理方法について鋭意検討を行なった結果、金属
基材に形成された無機絶縁層に含まれるガラス中には多
くの空隙があることを確認した。そこで、本発明者等
は、空隙率と絶縁破壊電圧の関係を検討した結果、ある
特定の空隙率以下では良好な絶縁性が得られることを知
見した。また更に、特に、5μmを超えるような大きな
空隙が存在する、空隙率が大きい無機絶縁層では、絶縁
性が極度に劣化することも突き止めた。SUMMARY OF THE INVENTION The present inventors have conducted intensive studies on the concrete method of insulating metal partition walls described in the above-mentioned Japanese Patent Application Laid-Open No. Hei 3-205538, and as a result, it has been found that the method for forming the metal partition walls has been developed. It was confirmed that there were many voids in the glass contained in the inorganic insulating layer. Then, the present inventors have studied the relationship between the porosity and the dielectric breakdown voltage, and as a result, have found that a good insulating property can be obtained below a certain porosity. Furthermore, it was also found out that the insulating properties of the inorganic insulating layer having a large void ratio exceeding 5 μm and having a large porosity were extremely deteriorated.
【0005】また更には、このような空隙率が大きい場
合や、それに加えて更に大きな空隙が存在する場合、絶
縁性を満足させるためには、無機絶縁層の厚みを厚くし
なければならないので、開口率を低下させるばかりでな
く、空隙が多くある場合、金属基材と無機絶縁層との密
着性をも低下させることになる。このため、空隙率の低
下と、更に望ましくは5μm以上の大きな空隙を無くす
ことが金属隔壁を用いたガス放電型表示パネルを現実の
ものにするためには、最低限度必要なものである。本発
明の目的は、高性能で、信頼性の高いガス放電型表示パ
ネルを提供するために、十分な絶縁性を備え、且つ開口
率の高いガス放電型表示パネル用金属隔壁を提供するこ
とにある。[0005] Furthermore, when the porosity is large, or when there is an even larger void, the thickness of the inorganic insulating layer must be increased in order to satisfy the insulating property. In addition to lowering the aperture ratio, if there are many voids, the adhesion between the metal substrate and the inorganic insulating layer will also be reduced. For this reason, it is necessary to reduce the porosity and more desirably eliminate large voids of 5 μm or more in order to make a gas discharge type display panel using a metal partition wall a practical minimum. An object of the present invention is to provide a metal partition wall for a gas discharge type display panel having sufficient insulation and a high aperture ratio in order to provide a high performance, highly reliable gas discharge type display panel. is there.
【0006】[0006]
【問題を解決するための手段】本発明は上述した問題に
鑑みてなされたものであって、無機絶縁層中に存在する
空隙の空隙率と、絶縁性との関係を鋭意検討した結果、
本発明に到達した。即ち本発明は、多数の貫通孔が形成
され、略格子状にリブが形成された金属基材の表面に無
機絶縁層が形成されたガス放電型表示パネル用金属隔壁
であって、該ガス放電型表示パネル用金属隔壁の略格子
状のリブを垂直断面で見た時、前記リブを覆う無機絶縁
層の空隙率が3%以下であるガス放電型表示パネル用金
属隔壁である。好ましくは、金属基材が重量%でNi:
33〜56%を含有するFe−Ni系合金薄板でなるガ
ス放電型表示パネル用金属隔壁である。Means for Solving the Problems The present invention has been made in view of the above-mentioned problems, and as a result of earnestly examining the relationship between the porosity of voids present in an inorganic insulating layer and the insulating property,
The present invention has been reached. That is, the present invention is a metal partition wall for a gas discharge type display panel in which an inorganic insulating layer is formed on a surface of a metal base material in which a large number of through holes are formed and ribs are formed in a substantially lattice shape. A metal partition wall for a gas discharge type display panel, wherein a porosity of an inorganic insulating layer covering the rib is 3% or less when a substantially lattice-shaped rib of the metal partition wall for a type display panel is viewed in a vertical cross section. Preferably, the metal substrate is Ni:
This is a metal partition wall for a gas discharge type display panel made of an Fe-Ni-based alloy thin plate containing 33 to 56%.
【0007】[0007]
【発明の実施の形態】上述のように本発明の重要な特徴
は、ガス放電型表示パネル用金属隔壁の略格子状のリブ
を垂直断面で見た時、前記リブを覆う無機絶縁層の空隙
率が特定の割合以下であることにある。先ず、ガス放電
型表示パネル用金属隔壁の形状としては、例えば図1に
示されるように多数の貫通孔(2)が形成された略格子状
となっている。なお、略格子状とは、図1に示した形状
に限定されるものではなく、貫通孔(2)の位置や寸法が
意図的に変えてあるような構造でも良い。図1で見れ
ば、放電空間となる貫通孔(2)と貫通孔間には、放電空
間を形成及び仕切るためのリブ(1)が形成され、金属隔
壁基板(3)となっている。この金属隔壁基板に、無機絶
縁層(4)が形成され、図2に示すように金属隔壁(6)とな
る。この金属隔壁の略格子状のリブの垂直断面は、図2
に示すように、リブ(1)を覆うように、リブ(1)の表面に
無機絶縁層(4)が形成されるが、この無機絶縁層内に
は、空隙(5)が存在する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As described above, an important feature of the present invention is that when a substantially grid-like rib of a metal partition wall for a gas discharge type display panel is viewed in a vertical cross section, a gap of an inorganic insulating layer covering the rib is provided. The rate is below a certain rate. First, the shape of a metal partition wall for a gas discharge type display panel is, for example, a substantially lattice shape in which a large number of through holes (2) are formed as shown in FIG. The substantially lattice shape is not limited to the shape shown in FIG. 1, but may be a structure in which the position and the size of the through hole (2) are intentionally changed. In FIG. 1, a rib (1) for forming and partitioning a discharge space is formed between the through-hole (2) serving as a discharge space and the through-hole, and serves as a metal partition board substrate (3). An inorganic insulating layer (4) is formed on the metal partition substrate, and becomes a metal partition (6) as shown in FIG. The vertical cross section of the substantially lattice-shaped rib of the metal partition is shown in FIG.
As shown in (1), an inorganic insulating layer (4) is formed on the surface of the rib (1) so as to cover the rib (1), and a void (5) exists in the inorganic insulating layer.
【0008】この空隙の存在が、略格子状のリブの垂直
断面で見た時、リブを覆う無機絶縁層の3%を超えて存
在すれば、上述の如く、開口率を低下や、金属基材と無
機絶縁層との密着性をも低下させるため、本発明におい
ては無機絶縁層の空隙率は3%以下に抑えることが必要
である。好ましい空隙率は2.5%、更に好ましくは2
%以下である。また本発明で言う空隙率は、金属隔壁の
略格子状のリブの垂直断面を例えば電子顕微鏡により20
00倍程度の倍率で観察し、画像解析装置を用いて認識で
きる空隙に関して、視野中の無機絶縁層に対する空隙の
割合を百分率で表したものである。この時、観察の視野
は金属隔壁に放電が集中するエッジ部や絶縁破壊しやす
い膜厚の最も薄い部分を含むように選ぶのが好ましい。When the presence of the voids exceeds 3% of the inorganic insulating layer covering the ribs when viewed in a vertical cross section of the substantially lattice-shaped ribs, as described above, the aperture ratio is reduced and the metal base is reduced. In order to reduce the adhesion between the material and the inorganic insulating layer, the porosity of the inorganic insulating layer needs to be suppressed to 3% or less in the present invention. The preferred porosity is 2.5%, more preferably 2%.
% Or less. Further, the porosity referred to in the present invention is obtained by measuring the vertical cross section of the substantially lattice-shaped rib of the metal partition wall by, for example, an electron microscope.
With respect to the voids that can be observed at a magnification of about 00 and can be recognized using an image analyzer, the ratio of the voids to the inorganic insulating layer in the visual field is expressed as a percentage. At this time, it is preferable that the visual field of observation is selected so as to include an edge portion where the discharge is concentrated on the metal partition wall and a thinnest portion where the dielectric breakdown easily occurs.
【0009】空隙率の低い無機絶縁層を得るには、電着
法、ディッピング法、スプレー法、静電塗装法を利用す
ると良いが、この時、空隙率の増加の一因に、無機絶縁
層を形成するガラスと金属基材表面の不純物との反応に
よるガス発生が考えられるため、金属基材表面を清浄化
しておくと空隙率を抑えることができる。そして更に
は、不活性ガス雰囲気で焼成するのも有効である。In order to obtain an inorganic insulating layer having a low porosity, an electrodeposition method, a dipping method, a spraying method, or an electrostatic coating method may be used. Since gas generation due to the reaction between the glass forming the glass and impurities on the surface of the metal base material can be considered, the porosity can be suppressed by cleaning the surface of the metal base material. Furthermore, firing in an inert gas atmosphere is also effective.
【0010】次に、無機絶縁層で被覆された金属隔壁は
前面板と背面板の間に挟まれて使用される。これらの構
成部材はパネルの組立て工程で熱サイクルを受けるた
め、熱膨張差が大きい場合、熱応力が発生し、パネルが
破損して画像表示装置として機能できなくなる。それを
防ぐためには、隔壁は前面板及び背面板と熱膨張係数を
近似させる必要がある。現状では、ガス放電パネルのう
ち、例えばプラズマディスプレイパネルの前面板・背面
板ガラスには熱膨張係数8.3×10−6/℃のソーダ
石灰ガラスが用いられているため、金属基材にはNiを
33〜56%の範囲で含むFe−Ni系合金を用いると
良い。Fe−Ni系合金は熱膨張係数をソーダ石灰ガラ
スに近似させることができ、且つエッチング法により精
細なパターンを容易に形成できるため、金属隔壁に適し
ている。Next, the metal partition covered with the inorganic insulating layer is used by being sandwiched between the front plate and the back plate. Since these components undergo a thermal cycle in the panel assembly process, if the thermal expansion difference is large, thermal stress is generated, and the panel is damaged and cannot function as an image display device. In order to prevent this, it is necessary for the partition to approximate the thermal expansion coefficient of the front plate and the rear plate. At present, among gas discharge panels, for example, soda-lime glass having a thermal expansion coefficient of 8.3 × 10 −6 / ° C. is used for front and back glass of a plasma display panel. Is preferably used in the range of 33 to 56%. Fe-Ni alloys are suitable for metal barriers because their thermal expansion coefficients can be approximated to soda-lime glass and fine patterns can be easily formed by etching.
【0011】特に望ましくは、本発明者の提案による特
願平10−72242号に開示するように、重量%でN
i:43〜56%とし、C≦0.015%、Mn≦0.
60%、Si≦0.20%、P≦0.004%、S≦
0.004%、B≦0.003%、O≦0.005%、
N≦0.005%の成分を含有するものや、重量%でN
i:43〜56%とし、(200)結晶方位の配向度が
60%以上のものを、素材として選ぶのが良い。また、
金属基材を被覆する無機絶縁層も、熱膨張係数が近似し
ており、600℃以下で軟化するガラス等を用いること
が好ましい。例えば、Bi−B−Si−O系またはZn
−B−Si−O系の低軟化点ガラスがある。It is particularly desirable that, as disclosed in Japanese Patent Application No. 10-72242 proposed by the present inventor, N by weight%.
i: 43 to 56%, C ≦ 0.015%, Mn ≦ 0.
60%, Si ≦ 0.20%, P ≦ 0.004%, S ≦
0.004%, B ≦ 0.003%, O ≦ 0.005%,
One containing a component of N ≦ 0.005% or N
i: 43 to 56%, and a material having a (200) crystal orientation degree of 60% or more is preferably selected as a material. Also,
The inorganic insulating layer covering the metal substrate also has a similar thermal expansion coefficient, and it is preferable to use glass or the like that softens at 600 ° C. or lower. For example, Bi-B-Si-O-based or Zn
There is a -B-Si-O-based low softening point glass.
【0012】[0012]
【実施例】以下に本発明を更に詳細に実施例を用いて説
明する。金属基材には熱膨張係数8.3×10−6/℃
のFe−48%Ni合金を用い、画像表示装置の一つで
あるプラズマディスプレイ用隔壁の形状にエッチング法
で加工し図1にような形状に形成し、金属隔壁基板を得
た。次に、金属隔壁基板を、表1に示す条件で静電塗装
法により無機絶縁層の被覆処理を行い、図2に示すよう
な金属隔壁とした。静電塗装法は粉体に帯電させ、金属
隔壁基板に塗布した後、焼成して無機絶縁層を形成し
た。粉体には熱膨張係数8.3×10−6/℃、軟化点
585℃のZn−B−Si−O系低軟化ガラスとフィラ
ーとしてAl2O3を用いた。無機絶縁層の厚みは10
μmとなるようにした。また、金属隔壁基板の前処理と
しては脱脂、酸洗処理を行った。The present invention will be described in more detail with reference to the following examples. The thermal expansion coefficient of the metal substrate is 8.3 × 10 −6 / ° C.
Using an Fe-48% Ni alloy of the above, the shape of a partition for a plasma display, which is one of the image display devices, was processed by an etching method to form a shape as shown in FIG. 1 to obtain a metal partition substrate. Next, the metal partition wall substrate was coated with an inorganic insulating layer by an electrostatic coating method under the conditions shown in Table 1 to obtain a metal partition wall as shown in FIG. In the electrostatic coating method, a powder was charged, applied to a metal partition wall substrate, and then fired to form an inorganic insulating layer. As the powder, a Zn-B-Si-O-based low softening glass having a thermal expansion coefficient of 8.3 × 10 −6 / ° C. and a softening point of 585 ° C. and Al 2 O 3 as a filler were used. The thickness of the inorganic insulating layer is 10
μm. In addition, as a pretreatment of the metal partition wall substrate, a degreasing and pickling treatment was performed.
【0013】次に、評価方法について説明する。空隙率
はリブ断面についてエッジ部を視野に含むように電子顕
微鏡を用いて2000倍で観察し、視野中の無機絶縁層に対
する空隙の割合の百分率とした。この時、観察した視野
数は合計で10視野であり、その平均を表1に示す。ま
た、絶縁性は絶縁破壊電圧をJIS-C2110に従い測定して
いる。Next, an evaluation method will be described. The porosity of the rib cross section was observed at 2000 times using an electron microscope so that the edge portion was included in the visual field, and was defined as the percentage of the ratio of the void to the inorganic insulating layer in the visual field. At this time, the number of visual fields observed was 10 in total, and the average is shown in Table 1. The insulation property is measured by measuring the dielectric breakdown voltage according to JIS-C2110.
【0014】[0014]
【表1】 [Table 1]
【0015】表1の結果より、比較材No.4では金属基
材の前処理を行ってなく、また、焼成温度が軟化点直上
であり、焼成時間も短いこともあって、発泡による空隙
が非常に多く、しかも、空隙部の空隙サイズも5μm以
上と大きいものが観察された。そのため、絶縁破壊電圧
も著しく低い。また、比較材No.5では金属基材の著し
い酸化により気泡が発生し、空隙率が8%となってお
り、絶縁性が低い。According to the results shown in Table 1, in Comparative Material No. 4, the pretreatment of the metal substrate was not performed, and the firing temperature was just above the softening point and the firing time was short. It was observed that the number was very large and the void size of the void portion was as large as 5 μm or more. Therefore, the dielectric breakdown voltage is also extremely low. In Comparative Material No. 5, bubbles were generated due to remarkable oxidation of the metal base material, the porosity was 8%, and the insulation was low.
【0016】一方、本発明のNo.1〜No.3では、空隙率
が3%以下であり、2000V以上の絶縁破壊電圧が得
られており、十分な絶縁性が確保できている。なお、本
発明のNo.1〜No.3には5μmを超えるような大きな空
隙を観察することはできなかった。この本発明のNo.1
〜No.3の金属隔壁を用いれば、膜厚を10μm以下に
することが可能となり、開口率の向上にも有効である。
以上、無機絶縁層の空隙率が3%以下の場合、良好な絶
縁性を有することが確認できた。On the other hand, in Nos. 1 to 3 of the present invention, the porosity is 3% or less, a dielectric breakdown voltage of 2000 V or more is obtained, and sufficient insulation is secured. In addition, in No. 1 to No. 3 of the present invention, a large void exceeding 5 μm could not be observed. No. 1 of this invention
The use of the No. 3 to No. 3 metal barrier makes it possible to reduce the film thickness to 10 μm or less, which is also effective in improving the aperture ratio.
As described above, when the porosity of the inorganic insulating layer was 3% or less, it was confirmed that the inorganic insulating layer had good insulating properties.
【0017】[0017]
【発明の効果】本発明によれば、十分な絶縁性を備え、
且つ開口率の高い金属隔壁を得ることができ、高性能
で、信頼性の高い画像表示装置を提供することが可能と
なる。According to the present invention, sufficient insulation is provided,
In addition, a metal partition having a high aperture ratio can be obtained, and a high-performance and highly reliable image display device can be provided.
【図1】ガス放電型表示パネルに用いる金属隔壁基板の
模式図である。FIG. 1 is a schematic view of a metal partition substrate used for a gas discharge type display panel.
【図2】金属隔壁の略格子状のリブの垂直断面の模式図
である。FIG. 2 is a schematic diagram of a vertical cross section of a substantially lattice-shaped rib of a metal partition.
1.リブ、2.貫通孔、3.金属隔壁基板、4.無機絶
縁層、5.空隙、6.金属隔壁1. Rib, 2. 2. through-hole; 3. metal partition substrate; 4. inorganic insulating layer; 5. voids; Metal bulkhead
Claims (2)
ブが形成された金属基材の表面に無機絶縁層が形成され
たガス放電型表示パネル用金属隔壁であって、該ガス放
電型表示パネル用金属隔壁の略格子状のリブを垂直断面
で見た時、前記リブを覆う無機絶縁層の空隙率が3%以
下であることを特徴とするガス放電型表示パネル用金属
隔壁。1. A metal partition wall for a gas discharge type display panel, comprising a metal substrate having a large number of through holes formed therein and a substantially lattice-shaped rib formed on a surface of a metal substrate, wherein the gas discharge type display panel has a gas barrier. A metal partition wall for a gas discharge type display panel, wherein a porosity of an inorganic insulating layer covering the rib is 3% or less when a substantially lattice-shaped rib of the metal partition wall for a display panel is viewed in a vertical cross section.
を含有するFe−Ni系合金薄板でなることを特徴とす
る請求項1に記載のガス放電型表示パネル用金属隔壁。2. Ni: 33 to 56% by weight of a metal substrate.
The metal partition wall for a gas discharge display panel according to claim 1, wherein the metal partition wall is made of an Fe-Ni-based alloy thin plate containing:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21148899A JP2001035391A (en) | 1999-07-27 | 1999-07-27 | Metal barrier rib for gas discharge type display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21148899A JP2001035391A (en) | 1999-07-27 | 1999-07-27 | Metal barrier rib for gas discharge type display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001035391A true JP2001035391A (en) | 2001-02-09 |
Family
ID=16606793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21148899A Pending JP2001035391A (en) | 1999-07-27 | 1999-07-27 | Metal barrier rib for gas discharge type display panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001035391A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7215076B2 (en) * | 2003-06-27 | 2007-05-08 | Chunghwa Picture Tubes, Ltd. | Plasma display panel and the manufacturing method thereof |
-
1999
- 1999-07-27 JP JP21148899A patent/JP2001035391A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7215076B2 (en) * | 2003-06-27 | 2007-05-08 | Chunghwa Picture Tubes, Ltd. | Plasma display panel and the manufacturing method thereof |
| US7597604B2 (en) | 2003-06-27 | 2009-10-06 | Chunghwa Picture Tubes, Ltd. | Method of manufacturing barrier ribs for a plasma display panel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5990617A (en) | Plasma display panel and method of forming barrier ribs for the same | |
| JP3778223B2 (en) | Plasma display panel | |
| US20030030376A1 (en) | Method for producing plasma display panel and plasma display panel | |
| KR100894064B1 (en) | Electron emission promoting substance-containing MgO protective film, a method of manufacturing the same, and a plasma display panel having the protective film | |
| KR100285760B1 (en) | Bulkhead manufacturing method for plasma display panel and plasma display panel device using same | |
| US5730637A (en) | Image display apparatus and method for fabricating the same | |
| JP2001035391A (en) | Metal barrier rib for gas discharge type display panel | |
| JP3299888B2 (en) | Plasma display panel and method of manufacturing the same | |
| US20050206316A1 (en) | Plasma display panel and method of manufacturing the same | |
| JP2001052615A (en) | Metal barrier rib for gas electric discharge type display panel | |
| KR100755331B1 (en) | Faceplate provided with electrodes made of conductive material | |
| KR100335463B1 (en) | method of Fabricating Fine Wire Protecting Layer for Plasma Display Panel Device | |
| JP4590931B2 (en) | Metal etching product and manufacturing method thereof | |
| JP3325522B2 (en) | Method of forming metal film and method of forming electrode | |
| KR100728207B1 (en) | Plasma display panel | |
| JP2003342733A (en) | Method for manufacturing metal partition for image display device | |
| JP2000100336A (en) | Barrier rib substrate for image display device and its manufacture | |
| TWI634825B (en) | Circuit board manufacturing method and circuit board | |
| JP2004022404A (en) | Manufacturing method of metal barrier for picture display device | |
| JP2000164144A (en) | Metallic partition wall for image display device and manufacture therefor and image display device using metallic partition wall for image display device | |
| JP2006092765A (en) | Manufacturing method of metallic member for image display device | |
| JP2000277021A (en) | Barrier for gas discharge type display panel and manufacture thereof | |
| JP3846636B2 (en) | Plasma display panel and manufacturing method thereof | |
| JP2001006559A (en) | Barrier rib for gas discharge display panel and its manufacture | |
| JP4501519B2 (en) | Manufacturing method of metal partition for PDP |