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JP2001021281A - Heat equalizer - Google Patents

Heat equalizer

Info

Publication number
JP2001021281A
JP2001021281A JP19522799A JP19522799A JP2001021281A JP 2001021281 A JP2001021281 A JP 2001021281A JP 19522799 A JP19522799 A JP 19522799A JP 19522799 A JP19522799 A JP 19522799A JP 2001021281 A JP2001021281 A JP 2001021281A
Authority
JP
Japan
Prior art keywords
plate
groove
grooves
annular
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19522799A
Other languages
Japanese (ja)
Inventor
Hisaaki Yamakage
久明 山蔭
Isao Yoshinaga
功夫 好永
Shinji Miyazaki
真二 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19522799A priority Critical patent/JP2001021281A/en
Publication of JP2001021281A publication Critical patent/JP2001021281A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To contrive applications to a work require ing a strict temperature distribution and improvement of working accuracy by allowing heat from a heat source to be supplied on the surface of a surface plate equally and maintaining the surface temperature of the surface plate uniformly. SOLUTION: In this device, a surface plate 12 comprises a first plate-like member 8 having a plurality of first annular grooves 9 concentrically formed in the underside and a plurality of second radial grooves 10 crossing the first grooves 9, for example approximately perpendicularly, and a second plate-like member joined to the underside of the first plate-like member 8 is such a manner as to cover the first grooves 9 and the second grooves 10. Moreover, the arrangement is made in such a manner that the density of the second radial grooves 10 formed in the first plate-like member 8 becomes high in the outer periphery side.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、例えば樹脂成型
品、半導体ウエハ、液晶パネル等の被加工物を加工され
る定盤上で均一に加熱あるいは冷却する均熱装置に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat equalizing apparatus for uniformly heating or cooling a workpiece such as a resin molded product, a semiconductor wafer, a liquid crystal panel or the like on a platen to be processed.

【0002】[0002]

【従来の技術】従来の均熱装置としては、例えば特開平
9−327827号公報に開示されたものがあり、その
概要を図7に示す。図7において、1は下面に同心状に
配置される複数の環状の溝で構成される流通路2が形成
された第1の板状部材であり、上面には複数の被加工物
(図示せず)が載置される。3は各流通路2を覆うよう
に第1の板状部材1の下面に例えばろう付け等で接合さ
れる第2の板状部材であり、第1の板状部材1と共に定
盤よ4を構成している。5は第2の板状部材3から下方
に突出して形成され、第1の板状部材1内の流通路2と
流通する複数の液溜め部であり、箱状部材を溶接等によ
り接合するか、第2の板状部材3を深絞り加工する等し
て形成されている。6は液溜め部5内に貯留される作動
液、7は液溜め部5内の作動液6中に浸漬され、端子部
が液溜め部5の側壁を貫通して外部に突出する例えばヒ
ータ等の熱源である。
2. Description of the Related Art A conventional heat equalizer is disclosed, for example, in Japanese Patent Application Laid-Open No. 9-327827, and its outline is shown in FIG. In FIG. 7, reference numeral 1 denotes a first plate-like member having a flow path 2 formed of a plurality of annular grooves arranged concentrically on a lower surface, and a plurality of workpieces (shown in FIG. Is placed. Reference numeral 3 denotes a second plate-like member which is joined to the lower surface of the first plate-like member 1 by, for example, brazing so as to cover each of the flow passages 2, and a platen 4 together with the first plate-like member 1. Make up. Reference numeral 5 denotes a plurality of liquid reservoirs which are formed so as to protrude downward from the second plate-shaped member 3 and flow through the flow passage 2 in the first plate-shaped member 1. The second plate member 3 is formed by deep drawing. Reference numeral 6 denotes a hydraulic fluid stored in the liquid reservoir 5, reference numeral 7 denotes a heater immersed in the hydraulic liquid 6 in the liquid reservoir 5, and a terminal portion protrudes outside through a side wall of the liquid reservoir 5, for example, a heater or the like. Heat source.

【0003】次に動作について説明する。被加工物の加
熱が必要な場合は、定盤4の液溜め部5の作動液6中に
浸漬された熱源7で作動液6を加熱する。定盤4の内部
は真空排気された後、作動液6が充てんされているの
で、加熱された作動液6はすみやかに蒸発気化し流通路
2を経て定盤4内全体に広がり、環状溝2壁面で凝縮液
化して作動液6の凝縮潜熱として熱を放出し、定盤4上
に載置された複数の被加工物の加熱を行う。流通路2壁
面で凝縮液化した作動液6は再度液溜め部5内に還流す
る。このような一連の動作を繰り返し行うことにより、
定盤4表面において被加工物の均一な加熱を行うように
している。
Next, the operation will be described. When the workpiece needs to be heated, the working fluid 6 is heated by the heat source 7 immersed in the working fluid 6 of the liquid reservoir 5 of the surface plate 4. After the inside of the platen 4 is evacuated and filled with the working fluid 6, the heated working fluid 6 evaporates and evaporates immediately through the flow passage 2 and spreads over the entire inside of the platen 4, so that the annular groove 2 is formed. The condensed liquid is condensed and liquefied on the wall surface to release heat as latent heat of condensation of the working fluid 6, thereby heating a plurality of workpieces placed on the surface plate 4. The working fluid 6 condensed and liquefied on the wall of the flow passage 2 is returned to the liquid reservoir 5 again. By repeating such a series of operations,
The workpiece is uniformly heated on the surface of the platen 4.

【0004】[0004]

【発明が解決しようとする課題】従来の均熱装置は以上
のように構成され、真空減圧の後に封入された作動液6
の潜熱によって熱源7からの熱を均一に定盤4表面に伝
熱する構造のものであるが、図8に示すように、一般に
は定盤4の外周に至るにつれて放熱面積が増大するとと
もに外周端面からの放熱の影響が現れることにより、外
径側の放熱量が大きくなるため、図9に示すように、定
盤4の外周側の温度が内径側に比べて低下し、定盤4表
面の均熱特性が十分に得られないという問題点があっ
た。
The conventional heat equalizer is constructed as described above, and the working fluid 6 sealed after vacuum decompression is filled.
The heat from the heat source 7 is uniformly transferred to the surface of the surface plate 4 by the latent heat of the surface plate 4, but as shown in FIG. Since the effect of heat radiation from the end face appears, the amount of heat radiation on the outer diameter side increases, so that the temperature on the outer peripheral side of the platen 4 decreases as compared with the inner diameter side as shown in FIG. However, there was a problem that the heat equalizing characteristic of the above was not sufficiently obtained.

【0005】この発明は上記のような問題点を解消する
ためになされたもので、熱源の熱が定盤の表面に均等に
供給され、定盤の表面温度を均一に保持することによ
り、厳しい温度分布を要求される被加工物への適用、お
よび加工精度の向上を図ることが可能な均熱装置を提供
することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and the heat of the heat source is uniformly supplied to the surface of the surface plate, and the surface temperature of the surface plate is maintained uniformly. It is an object of the present invention to provide a heat equalizer that can be applied to a workpiece requiring a temperature distribution and that can improve processing accuracy.

【0006】[0006]

【課題を解決するための手段】この発明の請求項1に係
る均熱装置は、同心状に配置される複数の環状の第1溝
が形成されるとともに第1溝と交差する放射状の第2溝
が複数形成された第1の板状部材および第1溝と第2溝
を覆うように第1の板状部材に接合される第2の板状部
材で定盤を構成し、第1の板状部材に形成された放射状
の第2溝の配置密度が外周側が密になるように配置した
ものである。
According to a first aspect of the present invention, there is provided a heat equalizer in which a plurality of concentrically arranged annular first grooves are formed and radial second intersecting first grooves are formed. A first plate-shaped member having a plurality of grooves formed thereon and a second plate-shaped member joined to the first plate-shaped member so as to cover the first groove and the second groove; The radial second grooves formed in the plate-like member are arranged such that the arrangement density is high on the outer peripheral side.

【0007】また、この発明の請求項2における均熱装
置は、第1の板状部材に形成された複数の環状の第1溝
の配置間隔が、外周側が小さくなるように配置したもの
である。
In the heat equalizing apparatus according to a second aspect of the present invention, a plurality of annular first grooves formed in the first plate-like member are arranged such that an interval between the first grooves is smaller on an outer peripheral side. .

【0008】また、この発明の請求項3における均熱装
置は、請求項1または請求項2において、第1の板状部
材に形成された複数の環状の第1溝の最外周側溝内壁に
細溝を形成したものである。
According to a third aspect of the present invention, in the heat equalizer according to the first or second aspect, the plurality of annular first grooves formed in the first plate-like member are formed on the inner wall of the outermost circumferential groove. A groove is formed.

【0009】また、この発明の請求項4における均熱装
置は、請求項1または請求項2において、第1の板状部
材に形成された複数の環状の第1溝の最外周側溝内壁に
細溝を形成するとともに、第2の板状部材の環状の第1
溝の最外周側溝に位置する部分に細溝を形成したもので
ある。
According to a fourth aspect of the present invention, there is provided the heat equalizer according to the first or second aspect, wherein the plurality of annular first grooves formed in the first plate-like member are formed on the inner wall of the outermost peripheral groove. A groove is formed, and an annular first plate-like member is formed.
A narrow groove is formed in a portion located at the outermost peripheral groove of the groove.

【0010】[0010]

【発明の実施の形態】実施の形態1.以下、この発明の
実施の形態1を図に基づいて説明する。図1および図2
はこの発明の実施の形態1における均熱装置を示す平面
図および断面図である。これら各図において、8は下面
に同心状に配置される複数の環状の第1溝9が形成され
るとともに第1溝9と交差、例えばほぼ直角に交差する
放射状の第2溝10が複数形成された第1の板状部材で
あり、上面には複数の被加工物が載置される。11は第
1溝9と第2溝10を覆うように第1の板状部材8の下
面に、例えばろう付け等で接合される第2の板状部材で
あり、第1の板状部材8と共に定盤12を構成してい
る。また、第1の板状部材8に形成された放射状の第2
溝10の配置密度が外周側が密に、例えば外周側に向か
うにしたがって配置密度が高くなるように配置されてい
る。以上のように、第1の板状部材8に形成された第1
溝9と第2溝10により互いに交差して連通する流通路
が構成され、それら内部にはそれぞれ真空排気された
後、所定の量の作動液が充填されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. 1 and 2
FIG. 1 is a plan view and a cross-sectional view illustrating a heat equalizer according to Embodiment 1 of the present invention. In each of these figures, reference numeral 8 denotes a plurality of annular first grooves 9 formed concentrically on the lower surface and a plurality of radial second grooves 10 intersecting with the first grooves 9, for example, intersecting at substantially right angles. A plurality of workpieces are placed on the upper surface of the first plate-shaped member. Reference numeral 11 denotes a second plate member joined to the lower surface of the first plate member 8 by, for example, brazing so as to cover the first groove 9 and the second groove 10. Together, they constitute a surface plate 12. Also, the second radial plate formed on the first plate-shaped member 8 is formed.
The grooves 10 are arranged such that the arrangement density is dense on the outer peripheral side, for example, higher toward the outer peripheral side. As described above, the first plate-like member 8 formed on the first
The grooves 9 and the second grooves 10 form flow passages that communicate with each other so as to intersect each other. The insides thereof are each evacuated and then filled with a predetermined amount of hydraulic fluid.

【0011】上記のように構成された実施の形態1にお
ける均熱装置において、定盤12の下面、すなわち第2
の板状部材11側から、例えばヒータ等の加熱源(図示
せず)により加熱されると、第1の板状部材8に形成さ
れた第1溝9と第2溝10により互いに交差して連通す
る流通路内の作動液も加熱され、蒸気となって密閉され
た流通路内にある空間に拡散し、この蒸気は流通路内の
温度の低い上面側あるいは最外周の側面側で凝縮液化
し、凝縮潜熱として熱を放出し液化する。そして、この
液化した作動液は流通路の内部で下面側に重力により落
下して還流し、この動作が順次繰り返されることによ
り、加熱源から定盤12の上面に熱輸送され、定盤12
の上面に載置される被加工物は加熱される。
In the heat equalizer in the first embodiment configured as described above, the lower surface of the platen 12, ie, the second
When heated from the plate member 11 side by a heating source (not shown) such as a heater, for example, the first groove 9 and the second groove 10 formed in the first plate member 8 intersect each other. The working fluid in the communicating flow passage is also heated and diffuses as steam into the space in the closed flow passage, and this vapor condenses and liquefies on the lower temperature upper surface side or the outermost side surface side of the flow passage. Then, heat is released as latent heat of condensation to liquefy. Then, the liquefied working fluid falls by gravity and returns to the lower surface side inside the flow passage, and by repeating this operation sequentially, heat is transported from the heating source to the upper surface of the platen 12,
The workpiece placed on the upper surface of the substrate is heated.

【0012】このように上記実施の形態1によれば、第
1の板状部材8に形成された放射状の第2溝10の配置
密度が外周側が密に、例えば外周側に向かうにしたがっ
て配置密度が高くなるように配置したことにより、定盤
12の外周側に蒸気が多く流通して凝縮液化することに
なり、外周に至るまで定盤12表面を均一に加熱するこ
とができるとともに、ヒータ等の加熱源を定盤12の下
面に満遍なく配置する必要もなくなるので、外形寸法精
度の悪い板状のヒータでも十分に適用できるようにな
る。
As described above, according to the first embodiment, the arrangement density of the radial second grooves 10 formed in the first plate-shaped member 8 is increased on the outer peripheral side, for example, as the arrangement density increases toward the outer peripheral side. Is arranged to be higher, a large amount of steam flows on the outer peripheral side of the surface plate 12 and condensed and liquefied, so that the surface of the surface plate 12 can be uniformly heated up to the outer periphery and a heater or the like can be used. It is not necessary to dispose the heating source uniformly on the lower surface of the surface plate 12, so that a plate-shaped heater having poor external dimension accuracy can be sufficiently applied.

【0013】実施の形態2.図3はこの発明の実施の形
態2における均熱装置を示す平面図である。図におい
て、8は第1の板状部材、10は第2溝、12は定盤で
ある。13は第1の板状部材8の下面に形成され、同心
状に配置された複数の環状の第1溝であり、それらの配
置間隔が外周側が小さくなるように配置、すなわち環状
の第1溝13の間隔を外周側が密になるように配置した
ものである。その結果、上述した実施の形態1に比べ
て、定盤12の外周側に蒸気が多く流通して凝縮液化す
ることになり、外周に至るまで定盤12表面をさらに均
一に加熱することができる。
Embodiment 2 FIG. FIG. 3 is a plan view showing a heat equalizer according to Embodiment 2 of the present invention. In the drawing, reference numeral 8 denotes a first plate-like member, 10 denotes a second groove, and 12 denotes a surface plate. Reference numeral 13 denotes a plurality of annular first grooves formed on the lower surface of the first plate-shaped member 8 and arranged concentrically. The annular first grooves are arranged so that the interval between them is smaller on the outer peripheral side, that is, the annular first groove. 13 are arranged such that the outer peripheral side is dense. As a result, a larger amount of steam flows on the outer peripheral side of the surface plate 12 to condense and liquefy as compared with the above-described first embodiment, so that the surface of the surface plate 12 can be more uniformly heated to the outer periphery. .

【0014】実施の形態3.図4および図5はこの発明
の実施の形態3における均熱装置を示す平面図および断
面図である。これら各図において、8は第1の板状部
材、9は第1の板状部材8の下面に形成され、同心状に
配置された複数の環状の第1溝、9aは複数の環状の第
1溝9の最外周側溝であり、図は一例として溝幅が他の
溝幅より広く形成されている。10は第2溝、11は第
2の板状部材、12は定盤である。14は複数の環状の
第1溝9の最外周側溝9a内壁に形成された細溝であ
る。このように複数の環状の第1溝9の最外周側溝9a
内壁に細溝14を形成したことにより、環状の第1溝9
の最外周側溝9aでの蒸気の凝縮面積が増大し、外周部
における蒸気の凝縮量が増大し、外周に至るまで定盤1
2表面をより一層均一に加熱することができる。
Embodiment 3 4 and 5 are a plan view and a sectional view showing a heat equalizer according to Embodiment 3 of the present invention. In each of these drawings, reference numeral 8 denotes a first plate-like member, 9 denotes a plurality of annular first grooves formed on the lower surface of the first plate-like member 8 and is concentrically arranged, and 9a denotes a plurality of annular first grooves. In the figure, the groove width is formed to be wider than the other groove widths as an example. Reference numeral 10 denotes a second groove, 11 denotes a second plate-like member, and 12 denotes a surface plate. Reference numeral 14 denotes a narrow groove formed on the inner wall of the outermost peripheral groove 9a of the plurality of annular first grooves 9. As described above, the outermost peripheral groove 9a of the plurality of annular first grooves 9
By forming the narrow groove 14 on the inner wall, the annular first groove 9 is formed.
The condensed area of the steam in the outermost peripheral side groove 9a increases, the amount of condensed steam in the outer peripheral portion increases, and the surface plate 1 reaches the outer periphery.
The two surfaces can be more uniformly heated.

【0015】実施の形態4.図6はこの発明の実施の形
態4における均熱装置を示す断面図である。図6におい
て、8は第1の板状部材、9は複数の環状の第1溝、9
aは複数の環状の第1溝9の最外周側溝、11は第2の
板状部材、12は定盤である。14は複数の環状の第1
溝9の最外周側溝9a内壁に形成された細溝である。1
5は第2の板状部材11の環状の第1溝9の最外周側溝
9aに位置する部分に形成された細溝である。このよう
に複数の環状の第1溝9の最外周側溝9a内壁に細溝1
4を形成するとともに、第2の板状部材11の環状の第
1溝9の最外周側溝9aに位置する部分に細溝15を形
成したことにより、環状の第1溝9の最外周側溝9aで
の蒸気の凝縮面積をさらに増大でき、外周部における蒸
気の凝縮量がさらに増大し、外周に至るまで定盤12表
面の温度均一性をより一層向上させることができる。
Embodiment 4 FIG. 6 is a sectional view showing a heat equalizer according to Embodiment 4 of the present invention. In FIG. 6, 8 is a first plate-like member, 9 is a plurality of annular first grooves, 9
a is the outermost peripheral groove of the plurality of annular first grooves 9, 11 is a second plate-like member, and 12 is a surface plate. 14 is a plurality of annular first
It is a narrow groove formed on the inner wall of the outermost groove 9a of the groove 9. 1
Reference numeral 5 denotes a narrow groove formed in a portion of the second plate-shaped member 11 located at the outermost peripheral groove 9a of the annular first groove 9. Thus, the narrow groove 1 is formed on the inner wall of the outermost peripheral groove 9a of the plurality of annular first grooves 9.
4 and the narrow groove 15 is formed in the portion of the second plate-shaped member 11 located at the outermost peripheral groove 9a of the annular first groove 9, so that the outermost peripheral groove 9a of the annular first groove 9 is formed. The condensed area of the steam at the surface can be further increased, the amount of steam condensed at the outer peripheral portion can be further increased, and the temperature uniformity of the surface of the surface plate 12 can be further improved up to the outer periphery.

【0016】なお、上述した実施の形態3,4におい
て、細溝14,15は溝断面が三角形状の場合について
述べたが、この溝断面に限定されるものではなく、作動
液の凝縮液の排出が速やかに行えるよう溝の山の先端を
尖らせた形状の溝であってもよい。
In the above-described third and fourth embodiments, the narrow grooves 14 and 15 have been described as having a triangular cross section. However, the present invention is not limited to this groove cross section. The groove may have a shape in which the tip of the groove is sharpened so that the discharge can be performed quickly.

【0017】[0017]

【発明の効果】以上のように、この発明の請求項1にお
ける均熱装置は、同心状に配置される複数の環状の第1
溝が形成されるとともに第1溝と交差する放射状の第2
溝が複数形成された第1の板状部材および第1溝と第2
溝を覆うように第1の板状部材に接合される第2の板状
部材で定盤を構成し、第1の板状部材に形成された放射
状の第2溝の配置密度が外周側が密になるように配置し
たので、外周に至るまで定盤表面を均一に加熱すること
ができる。
As described above, the heat equalizer according to the first aspect of the present invention comprises a plurality of annular first heat equalizers.
A second radial groove is formed and intersects the first groove.
A first plate-like member having a plurality of grooves, a first groove and a second groove;
A platen is formed by a second plate member joined to the first plate member so as to cover the groove, and the arrangement density of the radial second grooves formed in the first plate member is high on the outer peripheral side. , So that the surface of the surface plate can be uniformly heated up to the outer periphery.

【0018】また、この発明の請求項2における均熱装
置は、第1の板状部材に形成された複数の環状の第1溝
の配置間隔が、外周側が小さくなるように配置したの
で、外周に至るまで定盤表面をさらに均一に加熱するこ
とができる。
Further, in the heat equalizing apparatus according to claim 2 of the present invention, since the arrangement interval of the plurality of annular first grooves formed in the first plate-like member is smaller on the outer peripheral side, the outer peripheral side is smaller. , The surface of the platen can be more uniformly heated.

【0019】また、この発明の請求項3における均熱装
置は、請求項1または請求項2において、第1の板状部
材に形成された複数の環状の第1溝の最外周側溝内壁に
細溝を形成したので、外周に至るまで定盤表面をより一
層均一に加熱することができる。
According to a third aspect of the present invention, there is provided the heat equalizing apparatus according to the first or second aspect, wherein the plurality of annular first grooves formed in the first plate-like member are provided on the inner wall of the outermost circumferential groove. Since the grooves are formed, the surface of the surface plate can be more uniformly heated up to the outer periphery.

【0020】また、この発明の請求項4における均熱装
置は、請求項1または請求項2において、第1の板状部
材に形成された複数の環状の第1溝の最外周側溝内壁に
細溝を形成するとともに、第2の板状部材の環状の第1
溝の最外周側溝に位置する部分に細溝を形成したので、
外周に至るまで定盤表面の温度均一性をより一層向上さ
せることができる。
According to a fourth aspect of the present invention, in the heat equalizer according to the first or second aspect, the plurality of annular first grooves formed in the first plate-like member are provided on the inner wall of the outermost circumferential groove. A groove is formed, and an annular first plate-like member is formed.
Since a narrow groove was formed in the part located on the outermost peripheral groove of the groove,
The temperature uniformity of the surface of the surface plate up to the outer periphery can be further improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 この発明の実施の形態1を示す平面図であ
る。
FIG. 1 is a plan view showing a first embodiment of the present invention.

【図2】 この発明の実施の形態1を示す断面図であ
る。
FIG. 2 is a sectional view showing Embodiment 1 of the present invention.

【図3】 この発明の実施の形態2を示す平面図であ
る。
FIG. 3 is a plan view showing Embodiment 2 of the present invention.

【図4】 この発明の実施の形態3を示す平面図であ
る。
FIG. 4 is a plan view showing a third embodiment of the present invention.

【図5】 この発明の実施の形態3を示す断面図であ
る。
FIG. 5 is a sectional view showing Embodiment 3 of the present invention.

【図6】 この発明の実施の形態4を示す断面図であ
る。
FIG. 6 is a sectional view showing a fourth embodiment of the present invention.

【図7】 従来の均熱装置を一部断面で示す正面断面図
である。
FIG. 7 is a front sectional view showing a partial cross section of a conventional heat equalizer.

【図8】 従来の均熱装置の放熱特性を示す特性図であ
る。
FIG. 8 is a characteristic diagram showing heat radiation characteristics of a conventional heat equalizer.

【図9】 従来の均熱装置の温度特性を示す特性図であ
る。
FIG. 9 is a characteristic diagram showing temperature characteristics of a conventional heat equalizer.

【符号の説明】[Explanation of symbols]

8 第1の板状部材、9 第1溝、10 第2溝、11
第2の板状部材、12 定盤、13 第1溝、14,
15 細溝。
8 1st plate-like member, 9 1st groove, 10 2nd groove, 11
2nd plate-like member, 12 surface plate, 13 1st groove, 14,
15 Narrow grooves.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮崎 真二 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 Fターム(参考) 5F031 HA08 HA37  ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Shinji Miyazaki 2-3-2 Marunouchi, Chiyoda-ku, Tokyo F-term (reference) 5F031 HA08 HA37 in Mitsubishi Electric Corporation

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 被加工物が載置される定盤および上記定
盤を介して上記被加工物を加熱または冷却する熱源を備
えた均熱装置において、同心状に配置される複数の環状
の第1溝が形成されるとともに上記第1溝と交差する放
射状の第2溝が複数形成された第1の板状部材および上
記第1溝と第2溝を覆うように上記第1の板状部材に接
合される第2の板状部材で上記定盤を構成し、上記第1
の板状部材に形成された上記放射状の第2溝の配置密度
が外周側が密になるように配置されたことを特徴とする
均熱装置。
1. A heat equalizer having a platen on which a workpiece is placed and a heat source for heating or cooling the workpiece via the platen, wherein a plurality of annular concentrically arranged heat equalizers are provided. A first plate-shaped member in which a first groove is formed and a plurality of radial second grooves intersecting with the first groove are formed; and the first plate-shaped member is formed so as to cover the first groove and the second groove. The platen is constituted by a second plate-like member joined to the member,
Wherein the radial second grooves formed in the plate-like member are arranged such that the arrangement density of the radial second grooves is higher on the outer peripheral side.
【請求項2】 請求項1において、第1の板状部材に形
成された複数の環状の第1溝の配置間隔が外周側が小さ
くなるように配置されたことを特徴とする均熱装置。
2. The heat equalizer according to claim 1, wherein a plurality of annular first grooves formed in the first plate-like member are arranged such that an interval between the first annular grooves becomes smaller on an outer peripheral side.
【請求項3】 請求項1または請求項2において、第1
の板状部材に形成された複数の環状の第1溝の最外周側
溝内壁に細溝が形成されたことを特徴とする均熱装置。
3. The method according to claim 1, wherein
Wherein the plurality of annular first grooves formed in the plate-shaped member have narrow grooves formed on the innermost wall of the outermost groove.
【請求項4】 請求項1または請求項2において、第1
の板状部材に形成された複数の環状の第1溝の最外周側
溝内壁に細溝が形成されるとともに、上記第2の板状部
材の上記環状の第1溝の最外周側に位置する部分に細溝
が形成されたことを特徴とする均熱装置。
4. The method according to claim 1, wherein
A thin groove is formed on the innermost wall of the outermost peripheral groove of the plurality of annular first grooves formed on the plate-shaped member, and is located on the outermost peripheral side of the annular first groove of the second plate-shaped member. A heat equalizer, wherein a narrow groove is formed in a portion.
JP19522799A 1999-07-09 1999-07-09 Heat equalizer Pending JP2001021281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19522799A JP2001021281A (en) 1999-07-09 1999-07-09 Heat equalizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19522799A JP2001021281A (en) 1999-07-09 1999-07-09 Heat equalizer

Publications (1)

Publication Number Publication Date
JP2001021281A true JP2001021281A (en) 2001-01-26

Family

ID=16337597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19522799A Pending JP2001021281A (en) 1999-07-09 1999-07-09 Heat equalizer

Country Status (1)

Country Link
JP (1) JP2001021281A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007198967A (en) * 2006-01-27 2007-08-09 Orion Mach Co Ltd Plate temperature control environment test equipment
JP2011069608A (en) * 2009-09-28 2011-04-07 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method
WO2012042664A1 (en) * 2010-10-01 2012-04-05 東芝三菱電機産業システム株式会社 Soaking apparatus
US8705009B2 (en) 2009-09-28 2014-04-22 Asml Netherlands B.V. Heat pipe, lithographic apparatus and device manufacturing method
CN103843128A (en) * 2011-09-30 2014-06-04 应用材料公司 Electrostatic fixture
JP2014534614A (en) * 2011-09-30 2014-12-18 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Electrostatic chuck with temperature control

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007198967A (en) * 2006-01-27 2007-08-09 Orion Mach Co Ltd Plate temperature control environment test equipment
JP2011069608A (en) * 2009-09-28 2011-04-07 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method
US8705009B2 (en) 2009-09-28 2014-04-22 Asml Netherlands B.V. Heat pipe, lithographic apparatus and device manufacturing method
WO2012042664A1 (en) * 2010-10-01 2012-04-05 東芝三菱電機産業システム株式会社 Soaking apparatus
KR101404319B1 (en) * 2010-10-01 2014-06-05 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 Soaking apparatus
CN103843128A (en) * 2011-09-30 2014-06-04 应用材料公司 Electrostatic fixture
JP2014534614A (en) * 2011-09-30 2014-12-18 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Electrostatic chuck with temperature control
US9608549B2 (en) 2011-09-30 2017-03-28 Applied Materials, Inc. Electrostatic chuck

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