JP2001007461A - Optical / electrical wiring board and mounting board - Google Patents
Optical / electrical wiring board and mounting boardInfo
- Publication number
- JP2001007461A JP2001007461A JP17869999A JP17869999A JP2001007461A JP 2001007461 A JP2001007461 A JP 2001007461A JP 17869999 A JP17869999 A JP 17869999A JP 17869999 A JP17869999 A JP 17869999A JP 2001007461 A JP2001007461 A JP 2001007461A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- board
- wiring board
- substrate
- electrical wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Optical Integrated Circuits (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
- Structure Of Printed Boards (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光配線と電気配線
とが混在する光・電気配線基板、並びにその基板上に光
部品と電気部品を実装する実装基板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical / electrical wiring board in which optical wiring and electric wiring are mixed, and a mounting board for mounting an optical component and an electric component on the substrate.
【0002】[0002]
【従来の技術】より速く演算処理が行えるコンピュータ
を作るために、CPUのクロック周波数は益々増大する
傾向にあり、現在では1GHz程度のものが出現するに
至っている。この結果、コンピュータの中のプリント基
板上の銅による電気配線には高周波信号が流れる部分が
存在することになるので、ノイズの発生により誤動作が
生じたり、また、電磁波が発生して周囲の電子機器に影
響を与えることにもなる。2. Description of the Related Art In order to produce a computer capable of performing arithmetic processing faster, the clock frequency of a CPU tends to increase more and more, and a clock frequency of about 1 GHz has recently appeared. As a result, there is a portion where high-frequency signals flow in the electric wiring made of copper on the printed circuit board in the computer, so that malfunctions occur due to generation of noise, and electromagnetic waves are generated and surrounding electronic devices are generated. Will also be affected.
【0003】このような問題を解決するために、プリン
ト基板上の銅による電気配線の一部を光ファイバ又は光
導波路による光配線に置き換え、電気信号の代わりに光
信号を利用することが行われている。というのは、光信
号の場合は、ノイズ及び電磁波の発生を抑えられるから
である。In order to solve such a problem, a part of copper electric wiring on a printed circuit board is replaced by an optical fiber or an optical waveguide, and an optical signal is used instead of an electric signal. ing. This is because in the case of an optical signal, generation of noise and electromagnetic waves can be suppressed.
【0004】高密度実装又は小型化の観点からは、電気
配線と光配線とが同一の基板上で積層されている光・電
気配線基板を作製することが望ましいが、従来の光・電
気配線基板は、レーザ発光素子や受光素子などの光部品
を実装するとき、光部品の光軸と光配線用部材の光軸と
を光学的に一致させることが難しく、一般に熟練労働者
に頼らなければ一致させられなかった。従って、リフロ
ー炉などで自動的にハンダ付けできる電気部品と比較し
て、光部品を光・電気配線基板に実装することは、非常
に高価なものになるという欠点があった。From the viewpoint of high-density mounting or miniaturization, it is desirable to manufacture an optical / electrical wiring board in which electric wiring and optical wiring are laminated on the same substrate. Is difficult to optically align the optical axis of the optical component with the optical axis of the optical wiring member when mounting optical components such as laser light emitting elements and light receiving elements. I wasn't allowed to. Therefore, there is a disadvantage that mounting an optical component on an optical / electrical wiring board is extremely expensive compared to an electrical component that can be automatically soldered in a reflow furnace or the like.
【0005】[0005]
【発明が解決しようとする課題】本発明は、係る従来技
術の欠点に鑑みてなされたもので、高密度実装又は小型
化が可能で、しかも光部品の実装が電気部品の実装と同
じ方法で行える光・電気配線基板の構造を提供すること
である。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned drawbacks of the related art, and enables high-density mounting or miniaturization, and furthermore, mounting of optical components in the same manner as mounting of electrical components. An object of the present invention is to provide a structure of an optical / electrical wiring board which can be performed.
【0006】[0006]
【課題を解決するための手段】本発明において上記の課
題を達成するために、まず請求項1記載の発明は、電気
配線が埋設された電気配線基板に、光信号伝搬用の光導
波路が埋設された光基板を積層する光・電気配線基板に
おいて、前記光基板が、該光基板表面から突き出る複数
の支柱を有することを特徴とする光・電気配線基板であ
る。In order to attain the above object, the present invention is directed to an optical wiring board having an electric wiring embedded therein, wherein an optical waveguide for transmitting an optical signal is embedded in the electric wiring board. An optical / electrical wiring board for laminating formed optical substrates, wherein the optical substrate has a plurality of columns protruding from the surface of the optical substrate.
【0007】請求項2記載の発明は、請求項1記載の光
・電気配線基板において、前記支柱が導電性金属からな
り、前記電気配線基板と導通していることを特徴とす
る。According to a second aspect of the present invention, in the optical / electrical wiring board according to the first aspect, the support is made of a conductive metal, and is electrically connected to the electric wiring board.
【0008】請求項3記載の発明は、請求項1又は請求
項2記載の光・電気配線基板において、前記支柱の径が
50〜500ミクロンで、基板表面からの高さが20〜
200ミクロンであることを特徴とする。According to a third aspect of the present invention, in the optical / electrical wiring board according to the first or second aspect, the diameter of the column is 50 to 500 microns and the height from the substrate surface is 20 to 500 microns.
It is characterized by being 200 microns.
【0009】請求項4記載の発明は、請求項1乃至請求
項3の何れか1項に記載の光・電気配線基板の光・電気
配線基板上に形成した支柱を、光部品又は/及び電気部
品側に設けた凹部に挿入して光部品又は/及び電気部品
を実装したことを特徴とする実装基板である。According to a fourth aspect of the present invention, a support formed on the optical / electrical wiring board of the optical / electrical wiring board according to any one of the first to third aspects comprises an optical component and / or an electric component. An optical component and / or an electrical component is inserted into a concave portion provided on the component side to mount the component.
【0010】[0010]
【発明の実施の形態】本発明の実施の形態について図に
基づいて以下に詳細に説明する。 1.光・電気配線基板 本発明の光・電気配線基板において、光部品を実装する
部分の平面図を図1(a)に、光配線であるコアパター
ン2に沿って切断する断面図を図1(b)に示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to the drawings. 1. Optical / Electrical Wiring Board In the optical / electrical wiring board of the present invention, FIG. 1A is a plan view of a portion where an optical component is mounted, and FIG. 1A is a sectional view taken along a core pattern 2 which is an optical wiring. Shown in b).
【0011】本発明の光・電気配線板は電気配線10、
11、12、13を備えた基板8上に、光基板9が積層
されている構造をとる。この基板8は単層の絶縁基板で
も、電気配線と絶縁層が交互に積層された多層配線基板
でも良い。また、構成材料として、ガラス布に樹脂を含
浸させた絶縁基板でも、ポリイミドフィルムでも、セラ
ミック基板でも良い。The optical / electrical wiring board according to the present invention comprises an electric wiring 10,
A structure in which an optical substrate 9 is laminated on a substrate 8 provided with 11, 12, and 13 is adopted. The substrate 8 may be a single-layer insulating substrate or a multilayer wiring substrate in which electric wiring and insulating layers are alternately laminated. As a constituent material, an insulating substrate in which a glass cloth is impregnated with a resin, a polyimide film, or a ceramic substrate may be used.
【0012】光基板9には、光信号を伝搬される光配線
としてコアパターン2が、コア材料より低い屈折率を有
するクラッド層1に埋設されている。このコアパターン
はフォトリソグラフィ技術で形成されるため、その位置
は支持基板上に形成したアライメントマーク(図示せ
ず)によって決めることができる。In an optical substrate 9, a core pattern 2 is embedded in a cladding layer 1 having a lower refractive index than the core material as an optical wiring for transmitting an optical signal. Since this core pattern is formed by a photolithography technique, its position can be determined by an alignment mark (not shown) formed on the supporting substrate.
【0013】光基板9には光信号であるレーザ光を反射
させ90°に伝搬方向を変えるミラー3が形成される。
このミラーは、本発明の光・電気配線板上に搭載したレ
ーザ発光素子から基板に向かって垂直方向に発した光信
号を、基板面と並行に配置した光配線へ挿入したり、逆
に、光配線を伝搬してきた光信号を、本発明の光・電気
配線基板上に設置した受光素子へ向かって、垂直に光信
号の伝搬方向を変える役割を果たし、光配線の一部に、
基板に対し45°をなす面を形成する。このミラーは光
基板上にフォトリソグラフィ技術により形成したメタル
マスクをもとにエッチング法を用いた穿孔による加工、
またはレーザによる穿孔による加工により形成できるの
で、その位置は基板8上に形成したアライメントマーク
(図示せず)によって決めることができる。On the optical substrate 9, there is formed a mirror 3 which reflects laser light as an optical signal and changes the propagation direction to 90 °.
This mirror inserts an optical signal emitted vertically from the laser light emitting element mounted on the optical / electrical wiring board of the present invention toward the substrate, into an optical wiring arranged parallel to the substrate surface, or conversely, The optical signal that has propagated through the optical wiring is directed toward the light receiving element installed on the optical / electrical wiring board of the present invention, and plays a role of vertically changing the propagation direction of the optical signal.
A surface forming 45 ° with respect to the substrate is formed. This mirror is processed by drilling using an etching method based on a metal mask formed on the optical substrate by photolithography technology,
Alternatively, the position can be determined by an alignment mark (not shown) formed on the substrate 8 because it can be formed by processing by laser drilling.
【0014】ミラー3の周辺部には、レーザ発光素子や
受光素子などの光部品と電気接続を取るための支柱4、
5、6、7が光基板を貫通するか、もしくは光基板上に
形成されることで光基板表面から見て一定の高さまで突
き出ている。これらの支柱は銅等の金属が好ましく、こ
の場合基板9に形成された電気配線10、11、12、
13と導通することが出来るが、必ずしも導通している
必要はない。単なる支柱でも構わない。On the periphery of the mirror 3, there are columns 4 for making electrical connection with optical components such as a laser light emitting element and a light receiving element.
5, 6, and 7 penetrate the optical substrate or are formed on the optical substrate to protrude to a certain height when viewed from the optical substrate surface. These pillars are preferably made of a metal such as copper, and in this case, electric wirings 10, 11, 12,
13, but does not necessarily have to be conductive. It may be just a support.
【0015】光基板上部から突き出た支柱4、5、6、
7は光部品側に設けられた凹部に無理なく収容されて、
支柱頂部と光部品凹部周辺とハンダ付けされる。光部品
凹部の形と支柱の形状を相似にして、くい込むようにす
ると光部品の移動できる範囲は限定される。従って、発
光レーザーの光軸と幅が数ミクロンのミラー(光導波
路)3の光軸とを精度良く一致させ、且つ強固に固定で
き、必要であれば電気配線と電気的に導通することが可
能である。また、光部品凹部はバンプ形成等定法により
メッキにて精度良く形成できる。The columns 4, 5, 6,
7 is comfortably accommodated in a concave portion provided on the optical component side,
The top of the support and the periphery of the optical component recess are soldered. If the shape of the concave part of the optical component and the shape of the support column are made similar to each other so as to be engaged, the movable range of the optical component is limited. Therefore, the optical axis of the light emitting laser and the optical axis of the mirror (optical waveguide) 3 having a width of several microns can be accurately matched and firmly fixed, and if necessary, can be electrically connected to the electric wiring. It is. Further, the optical component concave portion can be formed with high precision by plating by a constant method such as bump formation.
【0016】柱状頂部にはNi/Auメッキ等の表面処
理を施すのが望ましい形態である。一方、IC等の電気
部品も同様に基板8上の電気配線と導電性の金属支柱を
介して電気接続される。支柱はフォトリソグラフィ技術
とメッキ技術にて形成するので、その位置は基板8上に
形成したアライメントマーク(図示せず)によって決め
ることができる。It is desirable that the columnar top be subjected to a surface treatment such as Ni / Au plating. On the other hand, electric components such as ICs are similarly electrically connected to electric wiring on the substrate 8 via conductive metal columns. Since the columns are formed by photolithography and plating, their positions can be determined by alignment marks (not shown) formed on the substrate 8.
【0017】2.光・電気配線基板の製造方法 本発明になる光・電気配線基板の構成を図面を用いて詳
しく説明する。 (1) 光基板の製造方法 フィルム状の光基板を以下の手順で形成した(図2参
照)。シリコンウエハー30上に樹脂31(光を導波す
る光基板の支持媒体でクラッド層の役割を果たすもの
で、フッ素化ポリイミド系樹脂の前駆体であるフッ素化
ポリアミック酸またはフッ素化エポキシ系樹脂等から選
択する)を厚さ20〜100ミクロン程度塗布する(工
程(a) )。ポリアッミク酸溶液の場合であればイミド化
するために350度で1〜2時間焼成する。エポキシ系
樹脂であればUV硬化もしくは100〜200度でポリ
マー化する。2. Manufacturing Method of Optical / Electrical Wiring Board The configuration of the optical / electrical wiring board according to the present invention will be described in detail with reference to the drawings. (1) Manufacturing method of optical substrate A film-shaped optical substrate was formed by the following procedure (see FIG. 2). Resin 31 (which serves as a cladding layer as a supporting medium for an optical substrate that guides light) and is made of fluorinated polyamic acid or fluorinated epoxy resin which is a precursor of fluorinated polyimide resin (Selection) is applied to a thickness of about 20 to 100 microns (step (a)). In the case of a polyamic acid solution, it is baked at 350 degrees for 1 to 2 hours to imidize. If it is an epoxy resin, it is cured by UV or polymerized at 100 to 200 degrees.
【0018】次いで、光導波路となる樹脂32、例えば
フッ素系ポリアミック酸溶液あるいはポリメチルメタク
リレート樹脂溶液など導波すべき波長に好適な屈折率を
有する樹脂を選択して適切な方法で均一に8ミクロン塗
布する(工程(b) )。感光性があれば定法のフォトリソ
法でパタニングして光導波路33を形成し、その後材料
に応じた硬化反応を行う。感光性がなければ硬化させた
後に所定パタンの金属マスクを形成してRIEドライエ
ッチングにより導波路パタンを形成する(工程(c) )。
さらに、先に形成したクラッド層と同じ材料を同様に厚
さ20〜100ミクロン程度塗布する。Next, a resin having a refractive index suitable for the wavelength to be guided, such as a resin 32 serving as an optical waveguide, for example, a fluorine-based polyamic acid solution or a polymethyl methacrylate resin solution, is selected, and is uniformly 8 μm in an appropriate method. Apply (step (b)). If there is photosensitivity, patterning is performed by a standard photolithography method to form an optical waveguide 33, and then a curing reaction according to the material is performed. If there is no photosensitivity, after curing, a metal mask of a predetermined pattern is formed, and a waveguide pattern is formed by RIE dry etching (step (c)).
Further, the same material as that of the previously formed clad layer is similarly applied to a thickness of about 20 to 100 microns.
【0019】次いで、光基板の所望の位置に貫通孔34
を形成した(工程(d) )。所定のパターンを有するマス
クを介し、エキシマレーザを照射して孔を形成する。次
に、シリコンウエハーからフィルムを剥離すると貫通孔
を含むフィルム状の光基板35を形成で出来る(工程
(e) )。この方法では完全な貫通孔が形成できカスは全
く残らなかった。Next, a through hole 34 is formed at a desired position on the optical substrate.
Was formed (step (d)). Excimer laser is irradiated through a mask having a predetermined pattern to form holes. Next, when the film is peeled off from the silicon wafer, a film-shaped optical substrate 35 including a through hole can be formed.
(e)). In this method, a complete through-hole was formed, and no residue was left.
【0020】(2) 電気配線基板の製造方法 次いで、電気配線基板の製造方法について述べる(図3
参照)。ガラスエポキシ基板等適切な絶縁基板上40に
メッキ法あるいはスパッタあるいは蒸着法等により20
ミクロン程度の銅薄膜を形成する。定法のフォトリソ法
により所望の金属配線41を形成する。複数の支柱を形
成するため、金属薄膜42をスパッタにて形成し(工程
(f) )、その上からドライフィルムレジスト43を張り
付け、定法の露光現像を行い開口部44を形成する(工
程(g) )。次に、金属薄膜42を陰極として銅メッキを
行い開口部内部を出来るだけ銅で埋設する(工程(h)
)。レジストを剥離し(工程(i) )、金属薄膜をエッ
チング除去すると銅支柱45が金属配線上に形成できる
(工程(j) )。支柱の形状は円支柱型、4角支柱型等光
部品の端子開口部に見合った形状のマスクを用いる。高
さはレジストの膜厚あるいはメッキにかける時間で制御
する。概ね径は30〜200ミクロン、高さも100〜
200ミクロン程度が望ましい。(2) Manufacturing Method of Electric Wiring Board Next, a manufacturing method of the electric wiring board will be described (FIG. 3).
reference). On a suitable insulating substrate 40 such as a glass epoxy substrate, a plating method, a sputtering method, a vapor deposition method, etc.
A copper thin film of about a micron is formed. A desired metal wiring 41 is formed by a conventional photolithography method. In order to form a plurality of columns, a metal thin film 42 is formed by sputtering (step
(f)), a dry film resist 43 is adhered thereon, and exposure and development are performed by a standard method to form an opening 44 (step (g)). Next, copper plating is performed using the metal thin film 42 as a cathode, and the inside of the opening is buried with copper as much as possible (step (h)).
). When the resist is stripped (step (i)) and the metal thin film is removed by etching, copper pillars 45 can be formed on the metal wiring (step (j)). The shape of the column is a circular column type, a square column type, or a mask having a shape corresponding to the terminal opening of the optical component. The height is controlled by the thickness of the resist or the time taken for plating. Approximately 30-200 microns in diameter and 100-high
About 200 microns is desirable.
【0021】(3) 光・電気配線基板の製造方法 電気基板上の複数の支柱45を光基板35と電気基板4
0をアライメントをとって積層するためのガイドをして
使う(図4参照)。即ち、光基板フィルムに形成した貫
通孔を導電性の金属等からなる支柱が貫通して突き出る
ように積層する(工程(k) )。光基板の電気基板と接触
する側に接着剤14を塗布して、光基板と電気基板を完
全に接着固定するのが望ましい形態である。(3) Method of Manufacturing Optical / Electrical Wiring Board A plurality of columns 45 on the electrical board are
0 is used as a guide for alignment and stacking (see FIG. 4). That is, the through holes formed in the optical substrate film are laminated so that the pillar made of a conductive metal or the like penetrates and protrudes (step (k)). It is desirable that the adhesive 14 is applied to the side of the optical substrate that comes into contact with the electric substrate, so that the optical substrate and the electric substrate are completely bonded and fixed.
【0022】さらに、積層した基板の表面に金属薄膜4
6をスパッタにて形成し(工程(l))、フォトレジスト
47を塗布する。露光・現像処理を行い、ミラー形成の
ためのフォトレジスト開口部48を形成する(工程(m)
)。Further, a metal thin film 4 is formed on the surface of the laminated substrate.
6 is formed by sputtering (step (l)), and a photoresist 47 is applied. Exposure and development are performed to form a photoresist opening 48 for mirror formation (step (m))
).
【0023】エッチングにより金属薄膜46に開口部4
9を形成し、ミラー形成のためのメタルマスクを形成す
る。さらに、基板を45°に傾斜させ、RIEドライエ
ッチングによりミラー50を形成し(工程(n) )、メタ
ルマスクを溶解除去することにより本発明の光・電気配
線基板を完成させた(工程(o) )。The opening 4 is formed in the metal thin film 46 by etching.
9 is formed, and a metal mask for mirror formation is formed. Further, the substrate is inclined at 45 °, a mirror 50 is formed by RIE dry etching (step (n)), and the metal mask is dissolved and removed to complete the optical / electrical wiring substrate of the present invention (step (o)). )).
【0024】光・電気配線基板の別の製法として、ビル
ドアップ工法がある。これは光基板と電気基板を別々に
製造してから積層するのではなく、電気基板の上に直接
に光基板素材をパタニングしながら積層する。支柱は光
基板をビルドアップする前に電気基板に形成してもよい
し、光基板を積層してからビアホール形成、メッキ埋め
込みをして形成してもよい。As another manufacturing method of the optical / electrical wiring board, there is a build-up method. In this method, the optical substrate and the electric substrate are not separately manufactured and then laminated, but the optical substrate material is laminated while being directly patterned on the electric substrate. The columns may be formed on the electric substrate before the optical substrate is built up, or may be formed by laminating the optical substrates and then forming via holes and embedding plating.
【0025】3.実装基板の製造方法 図5に、一例として発光用レーザを内包する光部品(レ
ーザ、フォトダイオード)22の導通用端子側凹部24
に光基板上から突き出た金属支柱を収容してハンダ付け
した様子を模式的に示した。凹部24に薄くハンダ付け
をした後、金属支柱5、7を光部品の端子凹部に軽く差
し込んだ。凹部の形状は半径80ミクロンの円形で深さ
は50ミクロンとした。金属支柱の数は4ヶで形状は半
径75ミクロンの円形であった。電気部品(CPU、メ
モリ)用の端子は薄くハンダ付けされた金属パッド上に
置いた。3. FIG. 5 shows a conductive terminal side recess 24 of an optical component (laser, photodiode) 22 containing a light emitting laser as an example.
2 schematically shows a state in which a metal column protruding from above the optical substrate is accommodated and soldered. After thinly soldering the recess 24, the metal posts 5, 7 were lightly inserted into the terminal recess of the optical component. The shape of the concave portion was a circle with a radius of 80 microns and the depth was 50 microns. The number of metal pillars was four and the shape was a circle with a radius of 75 microns. Terminals for electrical components (CPU, memory) were placed on thin soldered metal pads.
【0026】温度250度のリフロー炉に10秒静置し
た後冷却すると、光部品の端子は凹部の形状と溶融ハン
ダの表面張力で決まる平衡位置に固定され、レーザーの
光軸はミラーの中心位置±3ミクロンに収まっているこ
とが確認された。電気部品と同じように凹部がない平坦
な金属端子と導通用支柱間でハンダを介して接着した場
合は、光部品の固定位置が安定せず±50ミクロン程度
の誤差が生じた。凹部は電気的導通と光配線用のミラー
との精度の高いアライメントを確保するだけでなく、支
柱頂部が直接パッドとしてハンダにより光部品側の金属
端子と導通しているので接続の信頼性も向上した。After cooling in a reflow oven at a temperature of 250 ° C. for 10 seconds, the terminal of the optical component is fixed at an equilibrium position determined by the shape of the concave portion and the surface tension of the molten solder, and the optical axis of the laser is positioned at the center of the mirror. It was confirmed that it was within ± 3 microns. In the case where the flat metal terminal having no concave portion and the supporting column are bonded via solder as in the case of the electric component, the fixing position of the optical component is not stabilized, and an error of about ± 50 μm occurs. The recess not only ensures electrical continuity and high-precision alignment with the mirror for optical wiring, but also improves the reliability of connection because the top of the support is directly connected to the metal terminal on the optical component side by solder as a pad. did.
【0027】[0027]
【発明の効果】本発明は、次のような効果を奏する。第
1に、電気配線を有する基板の上に光配線層を設けるの
で、高密度実装又は小型化が可能である。The present invention has the following effects. First, since an optical wiring layer is provided on a substrate having electric wiring, high-density mounting or miniaturization is possible.
【0028】第2に、光基板のミラーを含むコアパター
ンと光部品搭載用の支柱の相互の位置関係が意図された
ものに極めて高精度で一致する。Second, the mutual positional relationship between the core pattern including the mirror of the optical substrate and the support for mounting the optical component coincides with the intended one with extremely high accuracy.
【0029】第3に、光部品の端子が光基板上の凹部に
精度良く収容されるので、光部品の光軸と光配線の光軸
とを光学的に一致させることが容易であり、それゆえ光
部品と電気部品とを同時に自動的実装できる。Third, since the terminals of the optical component are accurately accommodated in the recesses on the optical substrate, it is easy to optically match the optical axis of the optical component with the optical axis of the optical wiring. Therefore, the optical component and the electrical component can be automatically mounted at the same time.
【0030】第4に、光部品、あるいは、電気部品をハ
ンダ付けする際、めっきで形成された導電性支柱に直に
接続すれば、ハンダ溶融熱の影響を受けず、接続の信頼
性が向上する。同時に、基板上の電気配線との接続の信
頼性も向上する。Fourth, when soldering an optical component or an electrical component, if it is directly connected to a conductive support formed by plating, it is not affected by the heat of solder melting and the reliability of the connection is improved. I do. At the same time, the reliability of connection with the electric wiring on the substrate is improved.
【図1】(a)本発明に係わる光・電気配線基板におけ
る光部品を実装する部分の平面図。 (b)本発明に係わる光・電気配線基板における光部品
を実装する部分において、光導波路に平行に切断した場
合の断面図。FIG. 1A is a plan view of a portion on which an optical component is mounted on an optical / electrical wiring board according to the present invention. (B) A cross-sectional view of a portion of the optical / electrical wiring board according to the present invention, in which an optical component is mounted, cut parallel to the optical waveguide.
【図2】本発明に係る光基板の製造プロセスの一例を示
す説明図。FIG. 2 is an explanatory view showing one example of a manufacturing process of the optical substrate according to the present invention.
【図3】本発明に係る電気配線基板の製造プロセスの一
例を示す説明図。FIG. 3 is an explanatory view showing one example of a manufacturing process of the electric wiring board according to the present invention.
【図4】本発明に係わる光基板と電気配線基板を支柱を
使って積層する一例を示す説明図。FIG. 4 is an explanatory view showing an example in which an optical board and an electric wiring board according to the present invention are stacked using columns.
【図5】本発明に係わる光・電気配線基板に一例として
レーザ発光素子を実装した場合のレーザ光の伝搬を説明
する説明図。FIG. 5 is an explanatory diagram illustrating propagation of laser light when a laser light emitting element is mounted as an example on the optical / electrical wiring board according to the present invention.
1 クラッド層 2 光導波路(コア層) 3 ミラー 4 支柱 4aパッド 5 支柱 5aパッド 6 支柱 6aパッド 7 支柱 7aパッド 8 基板 9 光基板 10 電気配線 11 電気配線 12 電気配線 13 電気配線 14 接着剤 21 レーザ光 22 レーザ発光素子 23 レーザ発光面 24 導通用端子凹部 25 ハンダ 30 シリコン基板 31 クラッド層 32 コア層 33 導波路 34 貫通孔 35 光基板 40 絶縁基板 41 電気配線 42 金属薄膜 43 フォトレジスト 44 フォトレジスト開口部 45 支柱 46 金属薄膜 47 フォトレジスト 48 フォトレジスト開口部 49 金属薄膜開口部 50 ミラー REFERENCE SIGNS LIST 1 clad layer 2 optical waveguide (core layer) 3 mirror 4 support 4 a pad 5 support 5 a pad 6 support 6 a pad 7 support 7 a pad 8 substrate 9 optical substrate 10 electrical wiring 11 electrical wiring 12 electrical wiring 13 electrical wiring 14 adhesive 21 laser Light 22 Laser light emitting element 23 Laser light emitting surface 24 Conducting terminal recess 25 Solder 30 Silicon substrate 31 Cladding layer 32 Core layer 33 Waveguide 34 Through hole 35 Optical substrate 40 Insulating substrate 41 Electrical wiring 42 Metal thin film 43 Photoresist opening Photoresist opening Part 45 support 46 metal thin film 47 photoresist 48 photoresist opening 49 metal thin film opening 50 mirror
フロントページの続き (72)発明者 井ノ口 大輔 東京都台東区台東1丁目5番1号 凸版印 刷株式会社内 (72)発明者 四井 健太 東京都台東区台東1丁目5番1号 凸版印 刷株式会社内 Fターム(参考) 2H047 KA04 KB09 MA07 PA02 PA03 PA04 PA24 PA28 QA05 TA05 TA44 TA47 5E317 AA04 AA24 BB03 BB04 BB12 BB13 BB15 CC31 CC33 CC44 CC52 CD15 CD32 CD34 GG14 GG16 5E319 AA03 AB05 AC16 AC17 AC18 CC33 CD04 GG01 GG20 5E336 AA04 AA09 BB03 BB16 BC25 BC28 BC34 BC40 CC32 CC36 CC43 CC57 EE01 GG09 5E338 AA00 BB61 BB75 CC01 CC10 CD01 CD32 EE22 Continuing from the front page (72) Inventor Daisuke Inokuchi 1-5-1, Taito, Taito-ku, Tokyo Letterpress Printing Co., Ltd. (72) Inventor Kenta Yotsui 5-1-1 Taito, Taito-ku, Tokyo Letterpress printing In-house F-term (reference) 2H047 KA04 KB09 MA07 PA02 PA03 PA04 PA24 PA28 QA05 TA05 TA44 TA47 5E317 AA04 AA24 BB03 BB04 BB12 BB13 BB15 CC31 CC33 CC44 CC52 CD15 CD32 CD34 GG14 GG16 5E319 AA03 AB05 AC16 GG01 AC18 AA09 BB03 BB16 BC25 BC28 BC34 BC40 CC32 CC36 CC43 CC57 EE01 GG09 5E338 AA00 BB61 BB75 CC01 CC10 CD01 CD32 EE22
Claims (4)
信号伝搬用の光導波路が埋設された光基板を積層する光
・電気配線基板において、 前記光基板が、該光基板表面から突き出る複数の支柱を
有することを特徴とする光・電気配線基板。1. An optical / electrical wiring board in which an optical board in which an optical waveguide for optical signal propagation is embedded is laminated on an electrical wiring board in which electric wiring is embedded, wherein the optical board protrudes from the surface of the optical board. An optical / electrical wiring board having a plurality of columns.
配線基板と導通していることを特徴とする請求項1記載
の光・電気配線基板。2. The optical / electrical wiring board according to claim 1, wherein said support pillar is made of a conductive metal and is electrically connected to said electric wiring board.
基板表面からの高さが20〜200ミクロンであること
を特徴とする請求項1又は請求項2記載の光・電気配線
基板。3. The method according to claim 1, wherein the diameter of the column is 50 to 500 microns.
3. The optical / electrical wiring board according to claim 1, wherein the height from the substrate surface is 20 to 200 microns.
の光・電気配線基板の前記支柱を、光部品又は/及び電
気部品側に設けた凹部に挿入して光部品又は/及び電気
部品を実装したことを特徴とする実装基板。4. The optical / electrical wiring board according to claim 1, wherein the support is inserted into a concave portion provided on an optical component and / or an electric component side to insert the support into the optical component or / and the optical component. And a mounting board on which electric components are mounted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17869999A JP4320850B2 (en) | 1999-06-24 | 1999-06-24 | Optical / electrical wiring board, mounting board, and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17869999A JP4320850B2 (en) | 1999-06-24 | 1999-06-24 | Optical / electrical wiring board, mounting board, and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001007461A true JP2001007461A (en) | 2001-01-12 |
| JP4320850B2 JP4320850B2 (en) | 2009-08-26 |
Family
ID=16053018
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17869999A Expired - Fee Related JP4320850B2 (en) | 1999-06-24 | 1999-06-24 | Optical / electrical wiring board, mounting board, and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4320850B2 (en) |
Cited By (5)
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|---|---|---|---|---|
| JP2006258835A (en) * | 2005-03-15 | 2006-09-28 | Sony Corp | Optical waveguide module, photoelectric conversion device, and optical waveguide member |
| WO2007102431A1 (en) * | 2006-03-06 | 2007-09-13 | Hitachi Chemical Company, Ltd. | Flexible optical waveguide, method for manufacturing such flexible optical waveguide, and optical module |
| WO2008136285A1 (en) * | 2007-04-27 | 2008-11-13 | Hitachi Chemical Company, Ltd. | Method for producing photoelectric composite substrate, photoelectric composite substrate produced by the method, and photoelectric composite module using the substrate |
| JP2009058923A (en) * | 2007-04-27 | 2009-03-19 | Hitachi Chem Co Ltd | Method for producing photoelectric composite substrate, photoelectric composite substrate produced by the method, and photoelectric composite module using the same |
| US7801396B2 (en) | 2004-02-26 | 2010-09-21 | Shinko Electric Industries Co., Ltd. | Optoelectric composite substrate and method of manufacturing the same |
-
1999
- 1999-06-24 JP JP17869999A patent/JP4320850B2/en not_active Expired - Fee Related
Cited By (9)
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| US7801396B2 (en) | 2004-02-26 | 2010-09-21 | Shinko Electric Industries Co., Ltd. | Optoelectric composite substrate and method of manufacturing the same |
| US7873245B2 (en) | 2004-02-26 | 2011-01-18 | Shinko Electric Industries Co., Ltd. | Optoelectric composite substrate and method of manufacturing the same |
| JP2006258835A (en) * | 2005-03-15 | 2006-09-28 | Sony Corp | Optical waveguide module, photoelectric conversion device, and optical waveguide member |
| WO2007102431A1 (en) * | 2006-03-06 | 2007-09-13 | Hitachi Chemical Company, Ltd. | Flexible optical waveguide, method for manufacturing such flexible optical waveguide, and optical module |
| KR101016871B1 (en) | 2006-03-06 | 2011-02-22 | 히다치 가세고교 가부시끼가이샤 | Flexible optical waveguide and manufacturing method thereof, and optical module |
| US8351752B2 (en) | 2006-03-06 | 2013-01-08 | Hitachi Chemical Company, Ltd. | Flexible optical waveguide, method for manufacturing such flexible optical waveguide, and optical module |
| WO2008136285A1 (en) * | 2007-04-27 | 2008-11-13 | Hitachi Chemical Company, Ltd. | Method for producing photoelectric composite substrate, photoelectric composite substrate produced by the method, and photoelectric composite module using the substrate |
| JP2009058923A (en) * | 2007-04-27 | 2009-03-19 | Hitachi Chem Co Ltd | Method for producing photoelectric composite substrate, photoelectric composite substrate produced by the method, and photoelectric composite module using the same |
| US8244080B2 (en) | 2007-04-27 | 2012-08-14 | Hitachi Chemical Company, Ltd. | Method for producing photoelectric composite substrate, photoelectric composite substrate produced by the method, and photoelectric composite module using the substrate |
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