JP2001075295A - Method of regenerating electrophotographic photoreceptor and regenerated electrophotographic photoreceptor - Google Patents
Method of regenerating electrophotographic photoreceptor and regenerated electrophotographic photoreceptorInfo
- Publication number
- JP2001075295A JP2001075295A JP25219399A JP25219399A JP2001075295A JP 2001075295 A JP2001075295 A JP 2001075295A JP 25219399 A JP25219399 A JP 25219399A JP 25219399 A JP25219399 A JP 25219399A JP 2001075295 A JP2001075295 A JP 2001075295A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrophotographic photoreceptor
- photosensitive member
- charge transport
- electrophotographic photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 108091008695 photoreceptors Proteins 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims abstract description 53
- 230000001172 regenerating effect Effects 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 179
- 239000002344 surface layer Substances 0.000 claims abstract description 78
- 238000005498 polishing Methods 0.000 claims description 65
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 abstract description 39
- 239000002699 waste material Substances 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 description 58
- 239000010408 film Substances 0.000 description 52
- 238000000576 coating method Methods 0.000 description 42
- 239000011248 coating agent Substances 0.000 description 40
- 229920005989 resin Polymers 0.000 description 40
- 239000011347 resin Substances 0.000 description 40
- -1 resinoid Polymers 0.000 description 37
- 125000004432 carbon atom Chemical group C* 0.000 description 30
- 239000000243 solution Substances 0.000 description 27
- 125000000217 alkyl group Chemical group 0.000 description 25
- 239000011230 binding agent Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000012948 isocyanate Substances 0.000 description 18
- 239000011241 protective layer Substances 0.000 description 18
- 238000004132 cross linking Methods 0.000 description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 17
- 229910052739 hydrogen Inorganic materials 0.000 description 16
- 239000001257 hydrogen Substances 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 125000003545 alkoxy group Chemical group 0.000 description 12
- 238000001035 drying Methods 0.000 description 11
- 239000000945 filler Substances 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 8
- 150000002513 isocyanates Chemical class 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 150000002367 halogens Chemical class 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000012153 distilled water Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 238000003618 dip coating Methods 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 5
- 239000004431 polycarbonate resin Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 4
- 235000010724 Wisteria floribunda Nutrition 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005370 alkoxysilyl group Chemical group 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000008213 purified water Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000008107 starch Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000004665 trialkylsilyl group Chemical group 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 2
- 239000004472 Lysine Substances 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 229910009257 Y—Si Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000011354 acetal resin Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical class O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920000548 poly(silane) polymer Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920005990 polystyrene resin Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone powder Natural products C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 description 1
- LWHDQPLUIFIFFT-UHFFFAOYSA-N 2,3,5,6-tetrabromocyclohexa-2,5-diene-1,4-dione Chemical group BrC1=C(Br)C(=O)C(Br)=C(Br)C1=O LWHDQPLUIFIFFT-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- AZUMUTUFZXKLQI-UHFFFAOYSA-N CO[SiH3].C[Si](C)(C)C Chemical compound CO[SiH3].C[Si](C)(C)C AZUMUTUFZXKLQI-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004420 Iupilon Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 108010020346 Polyglutamic Acid Proteins 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 229910001215 Te alloy Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- QLNFINLXAKOTJB-UHFFFAOYSA-N [As].[Se] Chemical compound [As].[Se] QLNFINLXAKOTJB-UHFFFAOYSA-N 0.000 description 1
- JJLKTTCRRLHVGL-UHFFFAOYSA-L [acetyloxy(dibutyl)stannyl] acetate Chemical compound CC([O-])=O.CC([O-])=O.CCCC[Sn+2]CCCC JJLKTTCRRLHVGL-UHFFFAOYSA-L 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- NBJODVYWAQLZOC-UHFFFAOYSA-L [dibutyl(octanoyloxy)stannyl] octanoate Chemical compound CCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCC NBJODVYWAQLZOC-UHFFFAOYSA-L 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000004122 cyclic group Chemical class 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920002643 polyglutamic acid Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229940065287 selenium compound Drugs 0.000 description 1
- 150000003343 selenium compounds Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 229920005792 styrene-acrylic resin Polymers 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical class N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical group CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- AVWRKZWQTYIKIY-UHFFFAOYSA-N urea-1-carboxylic acid Chemical compound NC(=O)NC(O)=O AVWRKZWQTYIKIY-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、画像形成に用いら
れた使用済の電子写真感光体を使用可能な状態に再生す
る電子写真感光体の再生方法、および、その再生方法に
より再生された再生電子写真感光体に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of reproducing a used electrophotographic photosensitive member used for forming an image in a usable state, and a reproduction reproduced by the reproducing method. It relates to an electrophotographic photosensitive member.
【0002】[0002]
【従来の技術】複写機やレーザープリンター等の電子写
真装置に使用されている有機光導電体を含む感光層を有
する電子写真感光体は、消耗品として取り扱われてい
る。ところが、電子写真感光体で、複写画像の形成に使
用されて寿命が尽きるのは、主に最表面層の電荷輸送層
の摩耗や、トナー、放電生成物の付着等によるものであ
り、それよりも下層の機能層および導電性基体は再生さ
せることによって省資源化および製造経費の節減を図る
ことが可能である。2. Description of the Related Art An electrophotographic photosensitive member having a photosensitive layer containing an organic photoconductor used in an electrophotographic device such as a copying machine or a laser printer is treated as a consumable item. However, the life of an electrophotographic photoreceptor used for forming a copy image is mainly due to abrasion of a charge transport layer on an outermost surface layer, adhesion of toner and discharge products, and the like. By regenerating the lower functional layer and the conductive substrate, it is possible to save resources and reduce production costs.
【0003】その例として、特開平2−248957号
公報には、使用済みの電子写真感光体の電荷輸送層を溶
剤または切削により除去し、再び新規な電荷輸送層を塗
布する方法が開示されている。As an example, Japanese Patent Application Laid-Open No. 2-248957 discloses a method in which a used charge transport layer of an electrophotographic photosensitive member is removed by a solvent or cutting, and a new charge transport layer is applied again. I have.
【0004】しかしながら、電荷輸送層を除去する方法
において、電荷輸送層を溶解するような有機溶剤では下
層の電荷発生層も溶解または膨潤され、局所的な電荷発
生材料および結着樹脂の溶解、脱離を引き起こしてしま
う。また切削により電荷輸送層のみを除去しようとして
も、電荷発生層の機械的強度が低いため、電荷発生層に
もダメージを与えてしまう。そのため再度電荷輸送層を
その上に塗布しても、黒点などの画質欠陥の発生や感度
低下などの電気特性を悪化させてしまう。However, in the method of removing the charge transport layer, an organic solvent that dissolves the charge transport layer also dissolves or swells the underlying charge generation layer, and dissolves and removes the local charge generation material and the binder resin locally. Cause separation. Further, even if the charge transport layer alone is removed by cutting, the charge generation layer is damaged because the mechanical strength of the charge generation layer is low. Therefore, even if the charge transport layer is applied thereon again, the electrical characteristics such as the occurrence of image quality defects such as black spots and the decrease in sensitivity will be deteriorated.
【0005】また特開平8−220779号公報、特開
平8−286394号公報には、電子写真感光体の感光
層全体を溶解または膨潤可能な有機溶剤に浸漬した後、
熱水および冷水に順次浸漬することにより感光層全体を
剥離させて、導電性基体を再利用する方法が開示されて
いる。Japanese Patent Application Laid-Open Nos. 8-220779 and 8-286394 disclose that an entire photosensitive layer of an electrophotographic photosensitive member is immersed in an organic solvent capable of dissolving or swelling.
A method of reusing a conductive substrate by sequentially immersing the photosensitive layer in hot water and cold water to peel off the entire photosensitive layer is disclosed.
【0006】しかしながら、有機溶剤を用いて感光層全
体を剥離する方法では、導電性基体の再使用が可能な程
度にまで完全に感光層を除去することは困難であり、ま
た除去できるとしても、その処理法には多量の溶剤と処
理時間とを必要とするために、その使用溶剤による安全
性、廃液の処理および環境に及ぼす悪影響、製造コスト
への影響等の問題を有していた。However, in the method of stripping the entire photosensitive layer using an organic solvent, it is difficult to completely remove the photosensitive layer to such an extent that the conductive substrate can be reused. The processing method requires a large amount of solvent and processing time, and thus has problems such as safety due to the used solvent, adverse effects on waste liquid treatment and the environment, and effects on manufacturing costs.
【0007】またいずれの再生・再利用方法でも、再生
・再利用処理に際し、予め使用済のドラム状の電子写真
感光体から、ドラムフランジ、および電子写真感光体の
ドラム内部の充填材を取り外す必要があるが、これらの
部材は接着剤等で電子写真感光体に固着されているのが
一般であり、容易に除去することはできず、機械的に破
壊して除去する方法では、その工数も多くなり、電子写
真感光体の導電性基体が変形して再使用不能となってし
まう可能性が非常に高い。[0007] In any of the recycling / reusing methods, it is necessary to remove the drum flange and the filler inside the drum of the electrophotographic photosensitive member from the used drum-shaped electrophotographic photosensitive member in the recycling / reusing process. However, these members are generally fixed to the electrophotographic photoreceptor with an adhesive or the like, and cannot be easily removed. It is very likely that the conductive substrate of the electrophotographic photosensitive member will be deformed and cannot be reused.
【0008】[0008]
【発明が解決しようとする課題】したがって本発明は、
従来の技術における上記のような問題点を解消すること
を目的とする。すなわち、本発明の目的は、使用済の電
子写真感光体について、簡単かつ容易な方法により再使
用可能とし得る電子写真感光体の再生方法、および、そ
の再生方法により再生された再生電子写真感光体を提供
することにある。Accordingly, the present invention provides
It is an object of the present invention to solve the above-described problems in the related art. That is, an object of the present invention is to provide a method for reproducing an electrophotographic photosensitive member that can be reused by a simple and easy method with respect to a used electrophotographic photosensitive member, and a reproduced electrophotographic photosensitive member reproduced by the reproducing method. Is to provide.
【0009】また、本発明の他の目的は、材料の節約
し、廃棄物を減少させて資源の保護を図ると共に、低コ
ストで使用済の電子写真感光体を再生し得る電子写真感
光体の再生方法、および、その再生方法により再生され
た再生電子写真感光体を提供することにある。Another object of the present invention is to provide an electrophotographic photoreceptor capable of regenerating a used electrophotographic photoreceptor at low cost while saving materials, reducing waste and conserving resources. An object of the present invention is to provide a reproducing method and a reproduced electrophotographic photosensitive member reproduced by the reproducing method.
【0010】[0010]
【課題を解決するための手段】本発明者は、鋭意検討を
重ねた結果、導電性基体表面に、少なくとも感光層を有
してなる電子写真感光体が、使用限界に達し、使用不能
になる主たる要因が、感光層の摩耗或いは局所的な偏摩
耗による帯電性の低下や、感光体の表面近傍への放電生
成物付着による化学的劣化、トナーおよびその添加剤の
感光体の表面への固着(汚染)等による感度低下や画質
欠陥であることが分かった。As a result of intensive studies, the present inventor has found that an electrophotographic photoreceptor having at least a photosensitive layer on the surface of a conductive substrate reaches a limit of use and becomes unusable. The main factors are deterioration of chargeability due to abrasion of the photosensitive layer or local uneven wear, chemical degradation due to adhesion of discharge products near the surface of the photoconductor, and adhesion of toner and its additives to the surface of the photoconductor. It was found that the sensitivity was lowered due to (contamination) or the like, and the image quality was defective.
【0011】そこで該感光層の摩耗(および偏摩耗)部
分、劣化・汚染部分のみを除去して、新しい感光層を形
成して電子写真感光体を再生することにより上記目的が
達成されることを見出し、本発明を完成するに至った。
すなわち、本発明は、導電性基体表面に、少なくとも感
光層を有してなる使用済の電子写真感光体から、精密研
磨により、研磨後の膜厚変動が±1μm以下の範囲とな
るように一定の膜厚を残して感光層を除去し、次いで、
新しい表面層を形成させることを特徴とする電子写真感
光体の再生方法である。Therefore, the above object can be achieved by removing a worn (and unevenly worn) portion, a deteriorated and contaminated portion of the photosensitive layer, forming a new photosensitive layer and regenerating the electrophotographic photosensitive member. As a result, the present invention has been completed.
That is, the present invention provides a method in which a used electrophotographic photosensitive member having at least a photosensitive layer on the surface of a conductive substrate is subjected to precision polishing so that a variation in film thickness after polishing is within a range of ± 1 μm or less. The photosensitive layer is removed while leaving the film thickness of
A method for reproducing an electrophotographic photosensitive member, characterized in that a new surface layer is formed.
【0012】本発明によれば、使用済の電子写真感光体
(本発明において、「使用済の電子写真感光体」とは、
長期間の使用により、電荷輸送層等の感光層の、摩耗
(偏摩耗を含む)、劣化、あるいは汚染により、電気特
性および画像特性の低下した電子写真感光体のことをい
う。)を、簡単かつ容易な方法により再使用可能な電子
写真感光体を再生することができる。According to the present invention, a used electrophotographic photosensitive member (in the present invention, a "used electrophotographic photosensitive member"
It refers to an electrophotographic photoreceptor in which the electrical characteristics and image characteristics have deteriorated due to abrasion (including uneven abrasion), deterioration, or contamination of a photosensitive layer such as a charge transport layer due to long-term use. ), A reusable electrophotographic photoreceptor can be reproduced by a simple and easy method.
【0013】本発明において、精密研磨による感光層の
除去は、従来技術のように切削や溶剤により電荷輸送層
全体、あるいは、感光層全体を除去するものではなく、
感光層を一定膜厚残して研磨するものである。すなわち
感光層を一皮剥いて電荷発生層、および電荷輸送層(の
一部)、を残すものであり、電荷発生層にダメージを与
えることが無く、また感光層の完全除去不良による問題
も発生し得ない。さらに使用可能な電荷発生層を残すこ
とで、省資源化をも図ることができる。なお、精密研磨
により除す感光層は、当初から表面保護層を有する電子
写真感光体については、当該表面保護層のみでも、該表
面保護層と電荷輸送層の双方であっても構わない。In the present invention, the removal of the photosensitive layer by precision polishing does not remove the entire charge transport layer or the entire photosensitive layer by cutting or a solvent as in the prior art.
The photosensitive layer is polished leaving a constant film thickness. That is, the photosensitive layer is peeled off to leave the charge generation layer and the charge transport layer (part of it), without damaging the charge generation layer, and also causing a problem due to a failure to completely remove the photosensitive layer. I can't get it. Further, by leaving a usable charge generation layer, resource saving can be achieved. The photosensitive layer to be removed by precision polishing may be either the surface protective layer alone or both the surface protective layer and the charge transport layer for an electrophotographic photosensitive member having a surface protective layer from the beginning.
【0014】研磨後の表面には、新しい表面層が形成さ
れるが、該新しい表面層としては、電荷輸送層であって
も、電荷輸送層および表面保護層であってもよい。最表
面層として、表面保護層を設けることで、当初の電子写
真感光体よりも機械的強度の高いものとなる。A new surface layer is formed on the polished surface. The new surface layer may be a charge transport layer or a charge transport layer and a surface protective layer. By providing a surface protective layer as the outermost surface layer, it becomes higher in mechanical strength than the original electrophotographic photosensitive member.
【0015】以上の如き本発明の電子写真感光体の再生
方法により、使用済みの電子写真感光体を初期の状態と
同様またはより以上の状態の再生電子写真感光体(本発
明において、「再生電子写真感光体」とは、使用済みの
電子写真感光体を一連の操作により使用可能な状態に再
生した後の電子写真感光体のことをいう。)を得ること
ができる。このとき本発明の電子写真感光体の再生方法
では、感光層の除去を精密研磨により、研磨後の膜厚変
動が±1μm以下の範囲となるように一定の膜厚を残し
て行っているため、精密研磨後の表面の基準線平均粗さ
(Ra)を0.1μm以下とすることができ、再生電子
写真感光体の表面も、従来の切削等による場合と比べ極
めて平滑な状態となり、再生電子写真感光体の特性が良
好である。特に、感光層表面の基準線平均粗さ(Ra)
を0.01μm以下とすることも容易であり、かかる表
面状態であれば、新品の状態と比べても全く遜色無く、
極めて特性の良好な再生電子写真感光体とすることがで
きる。According to the method for reproducing an electrophotographic photoreceptor of the present invention as described above, a used electrophotographic photoreceptor is regenerated in a state similar to or higher than the initial state. The term "photoconductor" refers to an electrophotographic photoconductor obtained by regenerating a used electrophotographic photoconductor in a usable state by a series of operations.) At this time, in the method of reproducing the electrophotographic photoreceptor of the present invention, the photosensitive layer is removed by precision polishing while leaving a constant film thickness so that the film thickness variation after polishing is within a range of ± 1 μm or less. In addition, the reference line average roughness (Ra) of the surface after precision polishing can be set to 0.1 μm or less, and the surface of the regenerated electrophotographic photosensitive member also becomes extremely smooth as compared with the conventional cutting and the like. The characteristics of the electrophotographic photosensitive member are good. In particular, the reference line average roughness (Ra) of the photosensitive layer surface
Can be easily adjusted to 0.01 μm or less, and in such a surface state, there is no inferiority to a new state.
A reproduced electrophotographic photosensitive member having extremely good characteristics can be obtained.
【0016】[0016]
【発明の実施の形態】以下、本発明を詳細に説明する。
本発明の電子写真感光体の再生方法は、導電性基体表面
に、少なくとも感光層を有してなる使用済の電子写真感
光体から、精密研磨により、研磨後の膜厚変動が±1μ
m以下の範囲となるように一定の膜厚を残して感光層を
除去し、次いで、新しい表面層を形成させることを特徴
とする。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
In the method for reproducing an electrophotographic photoreceptor of the present invention, the used electrophotographic photoreceptor having at least a photosensitive layer on the surface of a conductive substrate is subjected to precision polishing to change the film thickness after polishing by ± 1 μm.
m, the photosensitive layer is removed while leaving a constant film thickness so as to be within a range of m or less, and then a new surface layer is formed.
【0017】除去する感光層は、少なくとも、電荷発生
層および電荷輸送層を順次積層してなり、必要に応じて
さらに表面保護層が形成されてなるものである。勿論表
面保護層が形成された電子写真感光体は、その感光層の
機械的強度の高いものであるが、それでも長期間のうち
に表面保護層の摩耗、劣化および汚染が進む。したがっ
て、本発明により再生しようとする電子写真感光体に、
表面保護層が形成されたものである場合には、精密研磨
による感光層の除去は、当該表面保護層を含めて行われ
る。また、感光層の下層には、下引き層が形成されてい
てもよい。The photosensitive layer to be removed is formed by sequentially laminating at least a charge generation layer and a charge transport layer, and further forming a surface protective layer as necessary. Of course, an electrophotographic photoreceptor having a surface protective layer formed thereon has a high mechanical strength of the photosensitive layer, but the abrasion, deterioration, and contamination of the surface protective layer progress over a long period of time. Therefore, in the electrophotographic photosensitive member to be reproduced according to the present invention,
When the surface protective layer is formed, removal of the photosensitive layer by precision polishing is performed including the surface protective layer. Further, an undercoat layer may be formed below the photosensitive layer.
【0018】本発明において、使用済の電子写真感光体
は、精密研磨により、研磨後の膜厚変動が±1μm以下
の範囲となるように一定の膜厚を残して感光層が除去さ
れる。このように、研磨後の感光層の膜厚を均一にする
ことで、最終的に得られる再生電子写真感光体の表面を
平滑にすることができ、高い特性の再生電子写真感光体
となる。In the present invention, the used electrophotographic photoreceptor is subjected to precision polishing to remove the photosensitive layer while leaving a constant film thickness such that the film thickness after polishing is within a range of ± 1 μm or less. As described above, by making the thickness of the photosensitive layer after polishing uniform, the surface of the finally obtained reproduced electrophotographic photosensitive member can be smoothed, and a reproduced electrophotographic photosensitive member having high characteristics can be obtained.
【0019】ここで「研磨後の膜厚変動」とは、精密研
磨による研磨後の、導電性基体表面に形成された感光層
全体の膜厚の、電子写真感光体全表面における部位によ
る差異のことで、より詳しくは、当該膜厚の中心値から
の隔たりのことを言う。例えば、感光層の残存膜厚を1
0μmと設定して精密研磨した場合には、前記膜厚の中
心値が大方10μmとなり、その場合には研磨後の膜厚
が9μm〜11μmの範囲になるように調整される。Here, "fluctuation in film thickness after polishing" refers to the difference in the film thickness of the entire photosensitive layer formed on the surface of the conductive substrate after polishing by precision polishing depending on the portion on the entire surface of the electrophotographic photosensitive member. More specifically, it refers to the distance from the center value of the film thickness. For example, if the remaining thickness of the photosensitive layer is 1
When precision polishing is performed at 0 μm, the center value of the film thickness is approximately 10 μm. In this case, the film thickness after polishing is adjusted to be in the range of 9 μm to 11 μm.
【0020】なお、本発明においては、「研磨後の膜厚
変動」の測定は、研磨後の電子写真感光体全表面の感光
層膜厚を30点測定し、その平均を中心値とし、これと
最高値、最低値との隔たりを求めることにより測定し
た。In the present invention, the "film thickness variation after polishing" is measured by measuring the thickness of the photosensitive layer on the entire surface of the electrophotographic photosensitive member after polishing at 30 points, and taking the average thereof as a central value. It was measured by determining the distance between the maximum and minimum values.
【0021】前記研磨後の膜厚変動が±1μm以下の範
囲を超えると、研磨後残存する感光層の表面平滑性が十
分でなく、電子写真感光体の特性に影響を与えてしまう
場合がある。前記研磨後の膜厚変動としては、±0.5
μm以下の範囲とすることが好ましい。研磨後の感光層
の膜厚は、渦電流を用いた膜厚計や、干渉光を用いた膜
厚計等従来公知の測定装置、測定方法により測定するこ
とができる。If the variation in the film thickness after the polishing exceeds the range of ± 1 μm or less, the surface smoothness of the photosensitive layer remaining after the polishing is not sufficient, which may affect the characteristics of the electrophotographic photosensitive member. . The variation in film thickness after polishing is ± 0.5
It is preferable that the thickness be not more than μm. The film thickness of the photosensitive layer after polishing can be measured by a conventionally known measuring device or measuring method such as a film thickness meter using eddy current or a film thickness meter using interference light.
【0022】本発明において精密研磨、すなわち感光層
を除去する研磨手段としては、上記研磨後の膜厚変動の
範囲を満足する精度を有するものであれば、いかなる手
段を用いてもよい。精密研磨が可能な研磨装置として
は、具体的には、ナイロン、レーヨン、テフロン、ポリ
エステル等からなるブラシを有するブラシ研磨機;フェ
ルト、ゴム、レジノイド、ポリビニルアルコール等から
なるバフ部材を有するバフ研磨機;圧力によって研磨剤
を吹き付けるサンドブラスト装置;液体ホーニング装置
などが挙げられる。これら研磨装置と組み合わせて用い
られる研磨剤としては、酸化アルミ、酸化ケイ素、炭化
ケイ素、ホウ化ケイ素、酸化クロム、酸化鉄などの粉末
が用いられ、研磨剤の粒径は20〜500μmのものが
用いられる。In the present invention, any means may be used as precision polishing, that is, a polishing means for removing the photosensitive layer as long as it has an accuracy satisfying the range of the film thickness variation after the above polishing. Specific examples of the polishing apparatus capable of precision polishing include a brush polishing machine having a brush made of nylon, rayon, Teflon, polyester or the like; a buff polishing machine having a buff member made of felt, rubber, resinoid, polyvinyl alcohol, or the like. A sand blast device for spraying an abrasive with pressure; a liquid honing device. As the polishing agent used in combination with these polishing apparatuses, powders of aluminum oxide, silicon oxide, silicon carbide, silicon boride, chromium oxide, iron oxide, etc. are used, and the particle size of the polishing agent is 20 to 500 μm. Used.
【0023】ドラム状の電子写真感光体の場合、いずれ
の研磨装置においても、感光層を均一に研磨するために
は、使用済みの電子写真感光体を回転させることが有効
であり、複写機およびプリンタ内で駆動するために電子
写真感光体のフランジに設けられているギアを、そのま
ま研磨時の電子写真感光体の回転に使用可能な回転機構
を使用する研磨装置に設けることで、研磨対象となる電
子写真感光体を回転させることができる。In the case of a drum-shaped electrophotographic photosensitive member, in order to uniformly polish the photosensitive layer in any of the polishing apparatuses, it is effective to rotate the used electrophotographic photosensitive member. The gear provided on the flange of the electrophotographic photoreceptor for driving in the printer is provided on a polishing apparatus using a rotating mechanism that can be used for rotating the electrophotographic photoreceptor during polishing as it is, so that it can be polished. The electrophotographic photosensitive member can be rotated.
【0024】精密研磨の条件は、使用する装置、電子写
真感光体の感光層の種類、使用済みの感光層の状態、導
電性基体の材質・形状等により、適宜調整すべきもので
はあるが、以下に、バフ研磨機を用いた場合の研磨条件
の例を示す。精密研磨にバフ研磨機を用いた場合には、
前記研磨剤の粒径を、所望とする膜厚変動および表面粗
さに応じて適宜設定する。また、前記研磨剤は、濃度1
0〜500g/lの分散液として、公知の方法により調
製される。さらに他の研磨条件である、バフへの荷重、
回転数(バフ部材、研磨される感光体)、バフの移動速
度、回転数については、所望とする膜厚変動および表面
粗さに応じて適宜設定する。ただし、かかる条件は絶対
的なものではなく、さらに他の条件との兼ね合いで適宜
最適な条件を選択すればよい。The conditions for precision polishing should be appropriately adjusted according to the equipment used, the type of photosensitive layer of the electrophotographic photosensitive member, the state of the used photosensitive layer, the material and shape of the conductive substrate, and the like. The following shows an example of polishing conditions when a buffing machine is used. When using a buffing machine for precision polishing,
The particle size of the abrasive is appropriately set according to the desired film thickness variation and surface roughness. The abrasive has a concentration of 1%.
It is prepared by a known method as a dispersion of 0 to 500 g / l. The load on the buff, which is another polishing condition,
The number of rotations (buff member, photoreceptor to be polished), the moving speed of the buff, and the number of rotations are appropriately set according to the desired film thickness variation and surface roughness. However, such conditions are not absolute, and optimal conditions may be appropriately selected in consideration of other conditions.
【0025】精密研磨を終えた電子写真感光体は、イオ
ン交換水、蒸留水等の精製した水(精製水)を用い、超
音波洗浄、ブラシ洗浄、リンス洗浄等で研磨粉、付着物
等を除去することが望ましい。これらの洗浄処理で使用
された精製水は、濾過、イオン交換、蒸留等の処理の後
再使用することができる。そして、例えば50℃〜12
0℃程度の温度で乾燥した後、後述の新しい表面層が形
成される。The electrophotographic photosensitive member that has been subjected to precision polishing uses purified water (purified water) such as ion-exchanged water or distilled water, and removes abrasive powder, deposits, and the like by ultrasonic cleaning, brush cleaning, and rinsing. It is desirable to remove it. The purified water used in these washing processes can be reused after processes such as filtration, ion exchange, and distillation. And, for example, 50 ° C. to 12
After drying at a temperature of about 0 ° C., a new surface layer, described below, is formed.
【0026】新しい表面層が形成された後の電子写真感
光体の感光層表面の基準線平均粗さ(Ra)としては、
0.01μm以下であることが好ましい。従来の切削等
による再生方法に比べ、本発明の再生方法によれば、前
記感光層表面は極めて平滑な状態となりやすく、研磨後
の感光体表面の基準線平均粗さ(Ra)を0.1μm以
下にすることで、再生後の感光体表面を上記範囲の基準
線平均粗さ(Ra)とすることも容易であり、Raが
0.01μm以下の表面状態とすれば、良好な特性の再
生電子写真感光体とすることができる。The reference line average roughness (Ra) of the photosensitive layer surface of the electrophotographic photosensitive member after the formation of a new surface layer is as follows:
It is preferably 0.01 μm or less. According to the reproducing method of the present invention, the surface of the photosensitive layer tends to be extremely smooth compared with the conventional reproducing method using cutting or the like, and the reference line average roughness (Ra) of the polished photosensitive member surface is 0.1 μm. By setting the average particle diameter to the following range, the surface of the photoreceptor after reproduction can easily have the reference line average roughness (Ra) within the above range, and if the surface state of Ra is 0.01 μm or less, good characteristics can be reproduced. It can be an electrophotographic photosensitive member.
【0027】なお、研磨後の感光体表面の基準線平均粗
さ(Ra)を、0.1μm以下とすることで、再生電子
写真感光体の表面粗さを新品と同様の表面状態とするこ
とができる。研磨後の感光体表面の基準線平均粗さ(R
a)が0.1μmより大きな場合であっても、それを再
生した(新しい表面層を設けた)後の電子写真感光体
は、使用の初期段階では使用可能なものであるが、画質
に影響を与える表面粗さになるまでの期間が短くなる場
合があり、寿命の短縮化につながる可能性がある。By setting the average roughness (Ra) of the reference line on the surface of the photoreceptor after polishing to 0.1 μm or less, the surface roughness of the regenerated electrophotographic photoreceptor is brought to the same surface condition as a new one. Can be. The reference line average roughness (R
Even when a) is larger than 0.1 μm, the electrophotographic photoreceptor after reproducing it (providing a new surface layer) can be used in the initial stage of use, but has an effect on image quality. In some cases, the time required for the surface roughness to be reduced becomes shorter, which may lead to a shorter life.
【0028】本発明で再生対象となる使用済みの電子写
真感光体は、ドラム状の場合、電子写真感光体と、ドラ
ムフランジ、および電子写真感光体のドラム内部の充填
材と、の接触部分が、容易に離脱可能な構造を有するも
のであっても、接着剤や嵌合により離脱不可能な構造を
有するものであってもよい。When the used electrophotographic photosensitive member to be reproduced in the present invention is in the form of a drum, the contact portion between the electrophotographic photosensitive member, the drum flange, and the filling material inside the drum of the electrophotographic photosensitive member is reduced. It may have a structure that can be easily detached or a structure that cannot be detached by an adhesive or fitting.
【0029】前者の場合、例えば電子写真感光体とドラ
ムフランジおよびドラム内部充填材との接触部分は、複
写機およびプリンタ内での駆動時は固定され、使用済み
電子写真感光体の再生時には容易に離脱可能とするた
め、電子写真感光体の端部と、ドラムフランジおよび
充填材と、にネジを切って固定する、電子写真感光体
の端部と、ドラムフランジおよび充填材と、にピンを通
して固定する、電子写真感光体の端部に矩形の切り欠
きを設け、一方、ドラムフランジおよび充填材に矩形の
凸部を設け、これら双方を嵌合させ固定する、などの方
法が用いられている。In the former case, for example, the contact portions between the electrophotographic photosensitive member and the drum flange and the filling material inside the drum are fixed when driven in a copying machine and a printer, and easily used when the used electrophotographic photosensitive member is reproduced. To be detachable, fix the end of the electrophotographic photosensitive member, the drum flange and the filler by screwing, and fix the end of the electrophotographic photosensitive member, the drum flange and the filler through a pin For example, a rectangular notch is provided at the end of the electrophotographic photosensitive member, while a rectangular convex portion is provided on the drum flange and the filler, and both are fitted and fixed.
【0030】これらの場合は、精密研磨および必要に応
じて洗浄の後、再度新しい表面層を塗布する前に、電子
写真感光体からドラムフランジおよび充填材を除去す
る。新しい表面層を形成する手段としては、ブレードコ
ーティング、スプレーコーティング、浸漬コーティング
等の従来公知のあらゆる方法が採用可能である。In these cases, the drum flange and filler are removed from the electrophotographic photoreceptor after precision polishing and, if necessary, cleaning, before applying a new surface layer again. As a means for forming a new surface layer, any conventionally known method such as blade coating, spray coating, dip coating and the like can be adopted.
【0031】後者の場合、電子写真感光体とドラムフラ
ンジおよびドラム内部充填材との接触部分が離脱できな
いため、電子写真感光体にドラムフランジおよびドラム
内部の充填材を残したまま塗布できる方法を採用する必
要がある。このような方法であれば、新しい表面層を形
成する手段としては、いかなる手段を用いてもよいが、
具体的には以下に示すフロー塗布が挙げられる。In the latter case, since the contact portion between the electrophotographic photosensitive member and the drum flange and the filling material inside the drum cannot be separated, a method is adopted in which the electrophotographic photosensitive member can be coated while the drum flange and the filling material inside the drum remain. There is a need to. With such a method, any means may be used as a means for forming a new surface layer,
Specific examples include the flow coating shown below.
【0032】前記電子写真感光体の軸を中心に前記電
子写真感光体を回転させ、液吐出ノズルを前記軸の方向
に相対的に移動させつつ、該液吐出ノズルから塗布液を
吐出することにより、前記電子写真感光体に塗布液を螺
旋状に塗布し、連続状の塗布膜を形成させる塗布方法。By rotating the electrophotographic photosensitive member about the axis of the electrophotographic photosensitive member and moving the liquid discharge nozzle relatively in the direction of the axis, the coating liquid is discharged from the liquid discharge nozzle. A coating method in which a coating solution is spirally applied to the electrophotographic photosensitive member to form a continuous coating film.
【0033】前記電子写真感光体の軸を中心に前記電
子写真感光体を回転させ、液吐出ノズルから吐出された
塗布液を、ブレード、ロール、パッド等で受け、前記電
子写真感光体に押圧させて該ノズルとともに前記軸の方
向に相対的に移動しつつ、塗布液を螺旋状に塗布し、連
続状の塗布膜を形成させる塗布方法。The electrophotographic photosensitive member is rotated around the axis of the electrophotographic photosensitive member, and the coating liquid discharged from the liquid discharge nozzle is received by a blade, a roll, a pad, or the like, and pressed against the electrophotographic photosensitive member. And applying the application liquid spirally while relatively moving in the axial direction together with the nozzle to form a continuous application film.
【0034】いずれの方法においても、均一に塗布する
ために前記電子写真感光体を回転させることが有効であ
り、前記研磨時と同様な方法をとることで前記電子写真
感光体を回転させることができる。新しく形成される表
面層としては、その使用目的に応じて電荷輸送層または
表面保護層、またはその両方が形成される。In any of the methods, it is effective to rotate the electrophotographic photosensitive member for uniform application, and it is possible to rotate the electrophotographic photosensitive member by using the same method as in the polishing. it can. As the newly formed surface layer, a charge transport layer and / or a surface protective layer, or both, are formed according to the purpose of use.
【0035】新しく形成される電荷輸送層は、既存の電
荷輸送層と同種の材料からなる電荷輸送層、または異種
の材料からなる電荷輸送層を形成してもよく、公知の材
料によって形成される。表面保護層としては、金属酸化
物等の導電性粒子を熱可塑性または熱硬化性の結着樹脂
中に分散した表面保護層、電荷輸送材料を熱硬化性の結
着樹脂中に分子分散した表面保護層、電荷輸送材料に反
応性の官能基を導入して、熱硬化性の結着樹脂と架橋構
造を形成するようにした表面保護層などいずれを形成し
ても良く、公知の材料によって形成される。また、後述
の電荷輸送性を有する熱架橋型表面層を表面保護層とし
てもよい。The newly formed charge transport layer may be a charge transport layer made of the same material as the existing charge transport layer, or a charge transport layer made of a different material, and is formed by a known material. . As the surface protective layer, a surface protective layer in which conductive particles such as a metal oxide are dispersed in a thermoplastic or thermosetting binder resin, and a surface in which a charge transport material is molecularly dispersed in a thermosetting binder resin. Any of a protective layer, a surface protective layer in which a reactive functional group is introduced into the charge transporting material to form a crosslinked structure with a thermosetting binder resin, and the like may be formed. Is done. Further, a thermal cross-linkable surface layer having a charge transporting property described later may be used as the surface protective layer.
【0036】以下、本発明で再生される電子写真感光体
について詳細に説明する。本発明で再生される電子写真
感光体において、導電性基体としては、アルミニウム、
ニッケル、クロム、ステンレス鋼等の金属類からなるド
ラム;アルミニウム、チタニウム、ニッケル、クロム、
ステンレス、金、バナジウム、酸化錫、酸化インジウ
ム、ITO等の薄膜を設けたプラスチックドラム;が使
用されるが、これらに限定されるものではない。さらに
必要に応じて導電性基体の表面は、画質に影響のない範
囲で各種の処理を行うことができる。例えば、表面の陽
極酸化被膜処理、熱水酸化処理や薬品処理、および、着
色処理等または、砂目立てなどの乱反射処理等を行うこ
とができる。Hereinafter, the electrophotographic photosensitive member reproduced in the present invention will be described in detail. In the electrophotographic photosensitive member reproduced in the present invention, as the conductive substrate, aluminum,
Drums made of metals such as nickel, chromium, and stainless steel; aluminum, titanium, nickel, chromium,
A plastic drum provided with a thin film of stainless steel, gold, vanadium, tin oxide, indium oxide, ITO or the like is used, but is not limited thereto. Further, if necessary, the surface of the conductive substrate can be subjected to various treatments within a range that does not affect the image quality. For example, anodic oxide film treatment, thermal hydroxylation treatment or chemical treatment of the surface, coloring treatment, or irregular reflection treatment such as graining can be performed.
【0037】本発明において必要に応じて形成される下
引き層としては、公知の技術によって形成されたものを
使用できる。下引き層は、結着樹脂と、必要に応じて添
加される微粒子等のその他の材料とから構成される。下
引き層に用いる結着樹脂としては、ポリアミド樹脂、塩
化ビニル樹脂、酢酸ビニル樹脂、フェノール樹脂、ポリ
ウレタン樹脂、メラミン樹脂、ベンゾグアナミン樹脂、
ポリイミド樹脂、ポリエチレン樹脂、ポリプロピレン樹
脂、ポリカーボネート樹脂、アクリル樹脂、メタクリル
樹脂、塩化ビニリデン樹脂、ポリビニルアセタール樹
脂、塩化ビニル−酢酸ビニル共重合体、ポリビニルアル
コール樹脂、水溶性ポリエステル樹脂、ニトロセルロー
ス、カゼイン、ゼラチン、ポリグルタミン酸、澱粉、ス
ターチアセテート、アミノ澱粉、ポリアクリル酸、ポリ
アクリルアミド、ジルコニウムキレート化合物、チタニ
ルキレート化合物、チタニルアルコキシド化合物、有機
チタニル化合物、シランカップリング剤等の公知の材料
を挙げることができる。これらの材料は、単独であるい
は2種以上混合して用いることができる。As the undercoat layer formed as required in the present invention, a layer formed by a known technique can be used. The undercoat layer is composed of a binder resin and other materials such as fine particles added as needed. As the binder resin used for the undercoat layer, polyamide resin, vinyl chloride resin, vinyl acetate resin, phenol resin, polyurethane resin, melamine resin, benzoguanamine resin,
Polyimide resin, polyethylene resin, polypropylene resin, polycarbonate resin, acrylic resin, methacrylic resin, vinylidene chloride resin, polyvinyl acetal resin, vinyl chloride-vinyl acetate copolymer, polyvinyl alcohol resin, water-soluble polyester resin, nitrocellulose, casein, gelatin And known materials such as polyglutamic acid, starch, starch thiacetate, amino starch, polyacrylic acid, polyacrylamide, zirconium chelate compound, titanyl chelate compound, titanyl alkoxide compound, organic titanyl compound, and silane coupling agent. These materials can be used alone or in combination of two or more.
【0038】さらに下引き層には、酸化チタン、酸化ア
ルミニウム、酸化珪素、酸化ジルコニウム、チタン酸バ
リウム、シリコーン樹脂等の微粒子と混合することがで
きる。下引き層は、結着樹脂と必要に応じて添加される
微粒子等のその他の材料と、を適当な溶剤に溶解、分散
した塗布液を調製し、該塗布液を導電性基体表面に塗布
した後、加熱乾燥することにより形成することができ
る。Further, the undercoat layer can be mixed with fine particles of titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, barium titanate, silicone resin and the like. The undercoat layer was prepared by dissolving and dispersing a binder resin and other materials such as fine particles added as necessary in an appropriate solvent to prepare a coating liquid, and applying the coating liquid to the conductive substrate surface. Thereafter, it can be formed by heating and drying.
【0039】下引き層を形成する際の塗布方法としては
ブレードコーティング、スプレーコーティング、浸漬コ
ーティング等の公知の方法が採用される。下引き層の厚
みとしては、0.01〜10μm程度が好ましく、より
好ましくは0.05〜2μm程度である。As a coating method for forming the undercoat layer, known methods such as blade coating, spray coating, and dip coating are employed. The thickness of the undercoat layer is preferably about 0.01 to 10 μm, and more preferably about 0.05 to 2 μm.
【0040】本発明で再生される電子写真感光体におい
て、電荷発生層としては、公知の技術によって形成され
たものを使用できる。それらの電荷発生層は、結着樹脂
中に電荷発生材料が含有されて形成される。電荷発生材
料としては、非晶質セレン、結晶性セレン−テルル合
金、セレン−ヒ素合金、その他セレン化合物およびセレ
ン合金、酸化亜鉛、酸化チタン等の無機系光導電性材
料、フタロシアニン系、スクアリリウム系、アントアン
トロン系、ペリレン系、アゾ系、アントラキノン系、ピ
レン系、ピリリウム塩、チアピリリウム塩等の有機顔料
および染料が用いられる。なかでもフタロシアニン系化
合物は光感度や安定性の面で望ましく、無金属フタロシ
アニン、オキシチタニウムフタロシアニン、ハロゲン化
ガリウムフタロシアニン、ヒドロキシガリウムフタロシ
アニン、ハロゲン化錫フタロシアニンが特に好ましい。In the electrophotographic photosensitive member reproduced according to the present invention, as the charge generation layer, those formed by a known technique can be used. These charge generation layers are formed by including a charge generation material in a binder resin. As the charge generating material, amorphous selenium, crystalline selenium-tellurium alloy, selenium-arsenic alloy, other selenium compounds and selenium alloys, zinc oxide, inorganic photoconductive materials such as titanium oxide, phthalocyanine, squarylium, Organic pigments and dyes such as an anthrone-based, perylene-based, azo-based, anthraquinone-based, pyrene-based, pyrylium salt, and thiapyrylium salt are used. Of these, phthalocyanine compounds are desirable in terms of photosensitivity and stability, and particularly preferred are metal-free phthalocyanines, oxytitanium phthalocyanines, gallium phthalocyanines, hydroxygallium phthalocyanines, and tin phthalocyanines.
【0041】電荷発生層の結着樹脂としては、ポリビニ
ルブチラール樹脂、ポリビニルホルマール樹脂、部分変
性ポリビニルアセタール樹脂、ポリカーボネート樹脂、
ポリエステル樹脂、アクリル樹脂、ポリ塩化ビニル樹
脂、ポリスチレン樹脂、ポリビニルアセテート樹脂、塩
化ビニル−酢酸ビニル共重合体、シリコン樹脂、フェノ
ール樹脂、ポリ−N−ビニルカルバゾール樹脂等が挙げ
られるが、こららに限定されるものではない。これらの
結着樹脂は、単独あるいは2種以上混合して用いること
ができる。Examples of the binder resin for the charge generation layer include polyvinyl butyral resin, polyvinyl formal resin, partially modified polyvinyl acetal resin, polycarbonate resin,
Polyester resin, acrylic resin, polyvinyl chloride resin, polystyrene resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate copolymer, silicone resin, phenol resin, poly-N-vinyl carbazole resin, etc., but are not limited thereto. It is not something to be done. These binder resins can be used alone or in combination of two or more.
【0042】電荷発生層は、電荷発生材料と結着樹脂と
を適当な溶剤に溶解、分散した塗布液を調製し、該塗布
液を導電性基体表面、あるいは、導電性基体表面に形成
された下塗り層の上に塗布した後、加熱乾燥することに
より形成することができる。電荷発生層形成用の塗布液
を調製する際に用いる溶剤としては、メタノール、エタ
ノール、n−プロパノール、n−ブタノール、ベンジル
アルコール、メチルセロソルブ、エチルセロソルブ、ア
セトン、メチルエチルケトン、シクロヘキサノン、酢酸
メチル、酢酸n−ブチル、ジオキサン、テトラヒドロフ
ラン、メチレンクロライド、クロロホルム等の通常の有
機溶剤を単独あるいは2種以上混合して用いることがで
きる。The charge generation layer was prepared by dissolving and dispersing a charge generation material and a binder resin in an appropriate solvent to prepare a coating solution, and forming the coating solution on the surface of the conductive substrate or on the surface of the conductive substrate. After being applied on the undercoat layer, it can be formed by heating and drying. Solvents used when preparing a coating solution for forming a charge generation layer include methanol, ethanol, n-propanol, n-butanol, benzyl alcohol, methyl cellosolve, ethyl cellosolve, acetone, methyl ethyl ketone, cyclohexanone, methyl acetate, and n-acetic acid. -Ordinary organic solvents such as -butyl, dioxane, tetrahydrofuran, methylene chloride, chloroform and the like can be used alone or in combination of two or more.
【0043】電荷発生層形成用の塗布液の塗布方法とし
ては、下引き層で挙げたものと同じ公知の方法を適用す
ることができる。電荷発生材料と結着樹脂との配合比
(重量比)は、10:1〜1:10の範囲が好ましく、
電荷発生層の膜厚は一般的には、0.1〜5μm、好ま
しくは0.2〜2.0μmである。As a method for applying the coating solution for forming the charge generation layer, the same known methods as those described for the undercoat layer can be applied. The compounding ratio (weight ratio) of the charge generating material and the binder resin is preferably in the range of 10: 1 to 1:10,
The thickness of the charge generation layer is generally 0.1 to 5 μm, preferably 0.2 to 2.0 μm.
【0044】本発明で再生される電子写真感光体におい
て、当初から形成されている電荷輸送層、および、再生
により新たに形成される新しい表面層たる電荷輸送層と
しては、公知の技術によって形成されたものを使用でき
る。それらの電荷輸送層は、電荷輸送材料と結着樹脂を
含有して形成されるか、あるいは高分子電荷輸送材を含
有して形成される。In the electrophotographic photosensitive member reproduced according to the present invention, the charge transport layer formed from the beginning and the charge transport layer as a new surface layer newly formed by reproduction are formed by known techniques. Can be used. These charge transport layers are formed containing a charge transport material and a binder resin, or are formed containing a polymer charge transport material.
【0045】電荷輸送材料としては、p−ベンゾキノ
ン、クロラニル、ブロマニル、アントラキノン等のキノ
ン系化合物;テトラシアノキノジメタン系化合物;2,
4,7−トリニトロフルオレノン等のフルオレノン化合
物;キサントン系化合物;ベンゾフェノン系化合物;シ
アノビニル系化合物;エチレン系化合物;等の電子輸送
性化合物、トリアリールアミン系化合物、ベンジジン系
化合物、アリールアルカン系化合物、アリール置換エチ
レン系化合物、スチルベン系化合物、アントラセン系化
合物、ヒドラゾン系化合物などの正孔輸送性化合物が挙
げられる。これらの電荷輸送材料は単独または2種以上
混合して用いることができる。特に、トリフェニルアミ
ン系化合物、およびベンジジン系化合物は、高い電荷
(正孔)輸送能と優れた安定性を有しているため、特に
好ましく用いることができる。これらは、単独または2
種以上混合して用いることができる。Examples of the charge transport material include quinone compounds such as p-benzoquinone, chloranil, bromanyl, and anthraquinone; tetracyanoquinodimethane compounds;
A fluorenone compound such as 4,7-trinitrofluorenone; a xanthone compound; a benzophenone compound; a cyanovinyl compound; an ethylene compound; an electron transporting compound such as a triarylamine compound, a benzidine compound, an arylalkane compound; Hole-transporting compounds such as aryl-substituted ethylene compounds, stilbene compounds, anthracene compounds, and hydrazone compounds. These charge transport materials can be used alone or in combination of two or more. In particular, a triphenylamine-based compound and a benzidine-based compound can be particularly preferably used because they have high charge (hole) transporting ability and excellent stability. These can be used alone or
A mixture of more than one species can be used.
【0046】結着樹脂としては、ポリカーボネート樹
脂、ポリエステル樹脂、メタクリル樹脂、アクリル樹
脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、ポ
リスチレン樹脂、ポリビニルアセテート樹脂、スチレン
−ブタジエン共重合体、塩化ビニリデン−アクリロニト
リル共重合体、塩化ビニル−酢酸ビニル共重合体、塩化
ビニル−酢酸ビニル−無水マレイン酸共重合体、シリコ
ーン樹脂、シリコーン−アルキッド樹脂、フェノール−
ホルムアルデヒド樹脂、スチレン−アクリル樹脂、スチ
レン−アルキッド樹脂、ポリ−N−ビニルカルバゾー
ル、ポリシランなどの公知の樹脂を用いることができ
る。これらのなかで、ポリカーボネート樹脂、ポリアリ
レート樹脂、ポリエステル樹脂よりなる群から選ばれた
少なくとも1種を含有することが好ましい。Examples of the binder resin include polycarbonate resin, polyester resin, methacrylic resin, acrylic resin, polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, polyvinyl acetate resin, styrene-butadiene copolymer, and vinylidene chloride-acrylonitrile copolymer. Polymer, vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-maleic anhydride copolymer, silicone resin, silicone-alkyd resin, phenol-
Known resins such as formaldehyde resin, styrene-acrylic resin, styrene-alkyd resin, poly-N-vinylcarbazole and polysilane can be used. Among these, it is preferable to contain at least one selected from the group consisting of a polycarbonate resin, a polyarylate resin, and a polyester resin.
【0047】高分子電荷輸送材としては、ポリ−N−ビ
ニルカルバゾール、ポリシランなどの電荷輸送性を有す
る公知のものを用いることができる。特に、特開平8−
176293号公報や特開平8−208820号公報に
示されているポリエステル系高分子電荷輸送材は、高い
電荷輸送性を有しており、特に好ましいものである。高
分子電荷輸送材はそれだけでも成膜可能であるが、上記
結着樹脂と混合して成膜してもよい。As the polymer charge transporting material, known materials having charge transporting properties such as poly-N-vinylcarbazole and polysilane can be used. In particular, JP-A-8-
The polyester-based polymer charge transporting materials disclosed in 176293 and JP-A-8-208820 have high charge transporting properties and are particularly preferable. The polymer charge transport material alone can form a film, but may be mixed with the binder resin to form a film.
【0048】電荷輸送層は、電荷輸送材料と結着樹脂
と、あるいは高分子電荷輸送材と必要に応じて結着樹脂
と、を適当な溶剤に溶解、分散した塗布液を調製し、該
塗布液を導電性基体表面に形成された電荷発生層の上に
塗布した後、加熱乾燥することにより形成することがで
きる。The charge transporting layer is prepared by dissolving and dispersing a charge transporting material and a binder resin or a polymer charge transporting material and, if necessary, a binder resin in an appropriate solvent to prepare a coating solution. The liquid can be formed by applying the liquid on the charge generation layer formed on the surface of the conductive substrate and then drying by heating.
【0049】電荷輸送層を設ける際に用いる溶剤として
は、ベンゼン、トルエン、キシレン、クロロベンゼン等
の芳香族炭化水素類;アセトン、2−ブタノン等のケト
ン類;塩化メチレン、クロロホルム、塩化エチレン等の
ハロゲン化脂肪族炭化水素類;テトラヒドロフラン、エ
チルエーテル、ジオキサン等の環状もしくは直鎖状のエ
ーテル類;等の通常の有機溶剤を単独あるいは2種以上
混合して用いることができる。Solvents used for forming the charge transport layer include aromatic hydrocarbons such as benzene, toluene, xylene and chlorobenzene; ketones such as acetone and 2-butanone; halogens such as methylene chloride, chloroform and ethylene chloride. Ordinary organic solvents such as fluorinated aliphatic hydrocarbons; cyclic or linear ethers such as tetrahydrofuran, ethyl ether and dioxane; can be used alone or in combination of two or more.
【0050】電荷輸送層を形成する際の塗布液の塗布方
法は、下引き層や電荷発生層で挙げたものと同じ公知の
方法を用いることができる。特に使用済みの電子写真感
光体を再生するために塗布する際には、前記新しい表面
層の形成のところで述べた手段が採用される。電荷輸送
層の好ましい膜厚は15〜50μmであり、さらに好ま
しくは20〜40μmである。As the method of applying the coating solution when forming the charge transport layer, the same known methods as those described for the undercoat layer and the charge generation layer can be used. In particular, when applying the used electrophotographic photoreceptor to regenerate it, the means described for the formation of the new surface layer is employed. The preferred thickness of the charge transport layer is from 15 to 50 μm, more preferably from 20 to 40 μm.
【0051】新しい表面層として形成される電荷輸送層
としては、優れた機械的強度を達成すべく、特に電荷輸
送性を有する熱架橋型表面層とすることが望ましい。ま
た、電荷輸送性を有する熱架橋型表面層は、上述した電
荷輸送層を形成した上で、表面保護層として形成しても
構わない。電荷輸送性を有する熱架橋型表面層(以下、
単に「熱架橋型表面層」という場合がある。)は、以下
に示す熱架橋型表面層Aおよび熱架橋型表面層Bの態様
が挙げられる。The charge transport layer formed as a new surface layer is preferably a thermal cross-linkable surface layer having a charge transport property, in order to achieve excellent mechanical strength. In addition, the thermal crosslinking type surface layer having charge transportability may be formed as a surface protective layer after forming the above-described charge transport layer. Thermal crosslinkable surface layer having charge transportability (hereinafter, referred to as
It may be simply referred to as “thermally crosslinked surface layer”. The examples of the heat-crosslinkable surface layer A and the heat-crosslinkable surface layer B include the following.
【0052】(熱架橋型表面層A)熱架橋型表面層A
は、下記構造式(1)〜(3)で示される電荷輸送物質
を少なくとも1種以上、および官能基数が3以上のイソ
シアネート化合物とを3次元的に架橋重合させたもので
構成される。(Thermal Crosslinkable Surface Layer A) Thermally Crosslinkable Surface Layer A
Is formed by three-dimensionally cross-linking and polymerizing at least one kind of the charge transporting substances represented by the following structural formulas (1) to (3) and an isocyanate compound having three or more functional groups.
【0053】・構造式(1)Structural formula (1)
【化1】 Embedded image
【0054】(式中、R1、R2およびR3は、水素原
子、ハロゲン原子、炭素数1〜5のアルキル基、炭素数
1〜5のアルコキシ基、または、炭素数1〜2のアルキ
ル基で置換されたアミノ基を表し、Tは炭素数1〜10
の枝別れしてもよい2価の炭化水素基を表し、nは0ま
たは1を表す。)(Wherein R 1 , R 2 and R 3 are a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an alkyl group having 1 to 2 carbon atoms) Represents an amino group substituted with a group, and T is a group having 1 to 10 carbon atoms.
Represents a divalent hydrocarbon group which may be branched, and n represents 0 or 1. )
【0055】・構造式(2)Structural formula (2)
【化2】 Embedded image
【0056】(式中、Yは水素原子、ハロゲン原子、炭
素数1〜5の範囲のアルキル基、炭素数1〜5の範囲の
アルコキシ基、フェニル基、または、置換基としてハロ
ゲン原子、炭素数1〜5の範囲のアルキル基もしくはハ
ロゲン原子で置換されたアルキル基、および、炭素数1
〜5の範囲のアルコキシ基の内の何れかを有するフェニ
ル基を表し、Tは炭素数1〜10の枝別れしてもよい2
価の炭化水素基を表し、nは0または1を表す。)Wherein Y is a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a phenyl group, or a halogen atom, An alkyl group having 1 to 5 alkyl groups or an alkyl group substituted with a halogen atom, and 1 carbon atom
Represents a phenyl group having any one of the alkoxy groups in the range of from 5 to 5, and T is a branched phenyl group having 1 to 10 carbon atoms.
Represents a monovalent hydrocarbon group, and n represents 0 or 1. )
【0057】・構造式(3)Structural formula (3)
【化3】 Embedded image
【0058】(式中、R4、R5は水素、または、炭素数
1〜5の範囲のアルキル基を表し、Xは水素、炭素数1
〜5の範囲のアルキル基、または、フェニル基を表し、
Tは脂肪族部分の炭素数1〜10の枝分かれしてもよい
2価の炭化水素基を表し、nは0または1を表し、Ar
1、Ar2、Ar3はフェニル基、ナフチル基、またはア
ントラセン基を表し、複数個のハロゲン原子、炭素数1
〜5の範囲の複数個のアルキル基、炭素数1〜5の範囲
の複数個のアルコキシ基で置換されてもよい。)(Wherein R 4 and R 5 represent hydrogen or an alkyl group having 1 to 5 carbon atoms; X represents hydrogen and 1 carbon atom;
Represents an alkyl group or a phenyl group ranging from 5 to 5,
T represents a divalent hydrocarbon group having 1 to 10 carbon atoms in the aliphatic portion which may be branched; n represents 0 or 1;
1 , Ar 2 and Ar 3 represent a phenyl group, a naphthyl group or an anthracene group, and include a plurality of halogen atoms,
It may be substituted with a plurality of alkyl groups ranging from 1 to 5 and a plurality of alkoxy groups ranging from 1 to 5 carbon atoms. )
【0059】構造式(3)におけるAr1の具体例を下
記表1および表2に、Ar2およびAr3の具体例を下記
表3および表4にそれぞれ示す。Specific examples of Ar 1 in the structural formula (3) are shown in Tables 1 and 2 below, and specific examples of Ar 2 and Ar 3 are shown in Tables 3 and 4 below.
【0060】表1Table 1
【表1】 [Table 1]
【0061】表2Table 2
【表2】 [Table 2]
【0062】表3Table 3
【表3】 [Table 3]
【0063】表4Table 4
【表4】 [Table 4]
【0064】次に、前記構造式(1)〜構造式(3)に
おけるTで表される2価の炭化水素基の具体例を下記表
5に示す。Next, specific examples of the divalent hydrocarbon group represented by T in the structural formulas (1) to (3) are shown in Table 5 below.
【0065】表5Table 5
【表5】 [Table 5]
【0066】熱架橋型表面層Aの構成成分として、さら
に必要に応じてグリコール化合物や、ビスフェノール化
合物を加えたものも用いられる。これらのヒドロキシ基
を有する化合物は、構造式(1)〜(3)の化合物の一
部を置き換える形で架橋構造を形成する。As a component of the heat-crosslinkable surface layer A, a compound further added with a glycol compound or a bisphenol compound, if necessary, may be used. These compounds having a hydroxy group form a crosslinked structure by replacing a part of the compounds of the structural formulas (1) to (3).
【0067】これらのヒドロキシ基を有するグリコール
化合物としては、分子内に2個以上のヒドロキシ基を有
し、イソシアネートと重合可能なものの中から自由に選
択でき、例えば、エチレングリコール、プロピレングリ
コール、ブタンジオール、ポリエチレングリコールなど
がある。These glycol compounds having a hydroxy group can be freely selected from those having two or more hydroxy groups in the molecule and capable of polymerizing with isocyanate. Examples thereof include ethylene glycol, propylene glycol, and butanediol. And polyethylene glycol.
【0068】ヒドロキシ基を有する他のグリコール化合
物の例として、アクリルポリオールおよびそのオリゴマ
ー、ポリエステルポリオールおよびそのオリゴマーなど
の反応性ヒドロキシ基を有する各種ポリマーおよびオリ
ゴマーを用いることもできる。Examples of other glycol compounds having a hydroxy group include various polymers and oligomers having a reactive hydroxy group such as acrylic polyols and oligomers thereof, and polyester polyols and oligomers thereof.
【0069】架橋して三次元網目構造を形成するために
は、イソシアネート化合物として3官能以上、すなわち
反応可能なイソシアネート基を3個以上有するものを用
いることが必要である。これにより熱架橋型表面層Aは
高密度の架橋構造をとることができる。In order to form a three-dimensional network structure by crosslinking, it is necessary to use an isocyanate compound having three or more functional groups, that is, a compound having three or more reactive isocyanate groups. Thereby, the thermal crosslinking type surface layer A can have a high-density crosslinking structure.
【0070】3個以上のイソシアネート基を有するイソ
シアネート化合物としては、イソシアネート単量体から
得られる誘導体やプレポリマーなどのポリイソシアネー
ト変性体を用いることがより望ましい。これらの例とし
ては、官能基数3以上のポリオールにイソシアネートを
付加したアダクト変性体、ウレア結合を有する化合物を
イソシアネート化合物で変性したビュレット変性体、ウ
レタン基にイソシアネートが付加したアロファネート変
性体、イソシアヌレート変性体、などが特に好ましく、
他にもカルボジイミド変性体などが用いられる。As the isocyanate compound having three or more isocyanate groups, it is more preferable to use a derivative obtained from an isocyanate monomer or a modified polyisocyanate such as a prepolymer. Examples thereof include an adduct modified product obtained by adding an isocyanate to a polyol having 3 or more functional groups, a buret modified product obtained by modifying a compound having a urea bond with an isocyanate compound, an allophanate modified product obtained by adding an isocyanate to a urethane group, and an isocyanurate modified product Body, etc. are particularly preferred,
In addition, modified carbodiimides are used.
【0071】特に、下記構造式(4)または構造式
(5)で表されるものに代表される、ヘキサメチレンジ
イソシアネートのビュレット変性体またはイソシアヌレ
ート変性体は、出来上がった熱架橋型表面層Aの機械的
強度、電気特性の面で特に優れている。In particular, the buret-modified or isocyanurate-modified hexamethylene diisocyanate represented by the following structural formula (4) or (5) can be used as the heat-crosslinkable surface layer A. Particularly excellent in mechanical strength and electrical properties.
【0072】[0072]
【化4】 Embedded image
【0073】また、上記イソシアネートと共に補助的に
用いることができるイソシアネート化合物として、トリ
レンジイソシアネート、ジフェニルメタンジイソシアネ
ート、1,5−ナフチレンジイソシアネート、トリジン
ジイソシアネート、1,6−ヘキサメチレンジイソシア
ネート、キシレンジイソシアネート、リジンイソシアネ
ート、テトラメチルキシレンジイソシアネート、1,
3,6−ヘキサメチレントリイソシアネート、リジンエ
ステルトリイソシアネート、1,6,11−ウンデカン
トリイソシアネート、1,8−ジイソシアネート−4−
イソシアネートメチルオクタン、トリフェニルメタント
リイソシアネート、トリス(イソシアネートフェニル)
チオフォスフェート、などの一般的なイソシアネート単
量体が挙げられる。The isocyanate compound which can be used together with the above isocyanate is tolylene diisocyanate, diphenylmethane diisocyanate, 1,5-naphthylene diisocyanate, tolidine diisocyanate, 1,6-hexamethylene diisocyanate, xylene diisocyanate, lysine isocyanate. , Tetramethyl xylene diisocyanate, 1,
3,6-hexamethylene triisocyanate, lysine ester triisocyanate, 1,6,11-undecane triisocyanate, 1,8-diisocyanate-4-
Isocyanate methyl octane, triphenylmethane triisocyanate, tris (isocyanate phenyl)
General isocyanate monomers such as thiophosphate.
【0074】前記ポリイソシアネート変性体に含まれる
が、イソシアネート基の活性を一時的にマスクするため
のブロッキング剤を反応させたブロック化イソシアネー
トも好ましく用いることができる。これは、熱架橋型表
面層A形成用の塗布液のポットライフを延長させる点か
らも好ましいものである。A blocked isocyanate which is included in the modified polyisocyanate and reacted with a blocking agent for temporarily masking the activity of the isocyanate group can also be preferably used. This is preferable from the viewpoint of extending the pot life of the coating solution for forming the thermal crosslinking type surface layer A.
【0075】熱架橋型表面層Aにおいて架橋硬化膜を形
成するためには、前記構造式(1)〜(3)で表される
ヒドロキシ基を有する電荷輸送物質を少なくとも1種以
上含有し、イソシアネート化合物、必要に応じて他のヒ
ドロキシ基を有する化合物、後述の各種添加剤、溶剤等
を加えたものを混合して熱架橋型表面層A形成用の塗布
液を調製し、これを使用済みの電子写真感光体の前記精
密研磨後に残存する電荷輸送層の上に塗工した後、架橋
重合させることにより成膜して熱架橋型表面層Aを得
る。In order to form a crosslinked cured film in the thermally crosslinked type surface layer A, at least one kind of the charge transporting material having a hydroxy group represented by the above structural formulas (1) to (3) is contained. Compound, a compound having another hydroxy group as needed, various additives described below, and a mixture containing a solvent and the like were mixed to prepare a coating solution for forming the thermal cross-linkable surface layer A, and this was used. After coating on the charge transport layer remaining after the precision polishing of the electrophotographic photoreceptor, a film is formed by cross-linking polymerization to obtain a thermo-crosslinkable surface layer A.
【0076】熱架橋型表面層A形成用の塗布液におけ
る、前記構造式(1)〜(3)で表されるヒドロキシ基
を有する電荷輸送物質と、イソシアネート化合物と、の
混合比は、(反応するヒドロキシ基の数):(反応する
イソシアネート基の数)が1.5:1〜1:1.5の範
囲となるように調合することが好ましく、1.2:1〜
1:1.2とすることがさらに望ましい。この混合比を
越えて過剰のヒドロキシ基が残ってしまうと熱架橋型表
面層Aの表面の親水性が増し、高温高湿下での画像特性
が低下してしまうという問題が起こる場合があるため、
反応条件等を含めて注意する必要がある。また、イソシ
アネート化合物は、空気中の水分等で失活して、反応す
るイソシアネート数が減少している場合があるので注意
を要する。その場合、イソシアネート基が若干過剰にな
るように調合することが効果的である。The mixing ratio of the charge transporting substance having a hydroxy group represented by the above structural formulas (1) to (3) and the isocyanate compound in the coating solution for forming the thermal crosslinking type surface layer A is as follows: The number of hydroxy groups to be reacted): (the number of reacting isocyanate groups) is preferably in the range of 1.5: 1 to 1: 1.5, and 1.2: 1 to 1.2: 1.
More preferably, it is set to 1: 1.2. Excessive hydroxyl groups remaining beyond this mixing ratio may increase the hydrophilicity of the surface of the thermo-crosslinkable surface layer A, causing a problem that the image characteristics under high temperature and high humidity may deteriorate. ,
Care must be taken including reaction conditions. Care must be taken because the isocyanate compound is deactivated by moisture in the air and the like, and the number of reacting isocyanates may decrease. In that case, it is effective to prepare the isocyanate group so that it is slightly excessive.
【0077】熱架橋型表面層Aにおける電荷輸送物質部
分(層中における電荷輸送能を有する構造部分)の含有
量は、ヒドロキシ基含有化合物の分子量と、イソシアネ
ート化合物の分子量と、によって決まる。電子写真感光
体の電気特性を維持しつつ機械強度をも持たせるために
は、熱架橋型表面層A全体における電荷輸送物質部分の
含有量が、5重量%以上90重量%以下とする必要があ
り、25重量%以上75重量%以下とすることが望まし
い。熱架橋型表面層Aは、電荷輸送物質部分を網目構造
の中に結合で取り込んでいるため、通常の低分子量の電
荷輸送物質を分散させた電荷輸送層よりも多くの電荷輸
送物質(部分)を導入することが可能である。The content of the charge transport material portion (the structural portion having charge transport ability in the layer) in the thermally crosslinked type surface layer A is determined by the molecular weight of the hydroxy group-containing compound and the molecular weight of the isocyanate compound. In order to maintain the electrical properties of the electrophotographic photoreceptor and also have mechanical strength, the content of the charge transporting substance portion in the entire thermally crosslinked surface layer A needs to be 5% by weight or more and 90% by weight or less. Therefore, it is desirable that the content be 25% by weight or more and 75% by weight or less. In the thermal cross-linking type surface layer A, the charge transport material portion is incorporated in the network structure by bonding, so that the charge transport material (portion) is larger than the charge transport layer in which the ordinary low molecular weight charge transport material is dispersed. It is possible to introduce
【0078】熱架橋型表面層Aは、その成膜性や可とう
性を向上させるため、各種のバインダー樹脂を添加して
も良い。かかるバインダー樹脂としては、架橋重合後の
膜との相溶性のあるものを用いることができ、例えば、
ポリカーボネート、ポリエステル、アクリル、ポリビニ
ルアルコール、ポリアミドなどの各種ポリマーを用いる
ことができる。しかし、機械的強度、光電特性を維持す
るためには、熱架橋型表面層Aにおけるこれらバインダ
ー樹脂の含有量は60重量%以下とするのが望ましい。The thermal cross-linkable surface layer A may be added with various binder resins in order to improve its film formability and flexibility. As such a binder resin, those having compatibility with the film after cross-linking polymerization can be used, for example,
Various polymers such as polycarbonate, polyester, acrylic, polyvinyl alcohol, and polyamide can be used. However, in order to maintain the mechanical strength and the photoelectric characteristics, it is desirable that the content of these binder resins in the thermo-crosslinkable surface layer A be 60% by weight or less.
【0079】熱架橋型表面層Aを架橋重合するために
は、使用済みの電子写真感光体の前記精密研磨後に残存
する電荷輸送層の上に塗工した後、加熱すればよい。ヒ
ドロキシ基とイソシアネート基の付加反応は、用いる化
合物間の反応性によもよるが、一般には触媒等は必要な
く、加熱するだけでよい。前記塗工時に溶剤を用いてい
る場合には、乾燥工程と同時、あるいはそれに引き続い
て加熱処理を行うことができる。In order to carry out the cross-linking polymerization of the thermal cross-linkable surface layer A, it is sufficient to coat the used electrophotographic photosensitive member on the charge transport layer remaining after the precision polishing, and then heat it. The addition reaction between the hydroxy group and the isocyanate group depends on the reactivity between the compounds used, but generally does not require a catalyst or the like, and only requires heating. When a solvent is used at the time of the coating, a heat treatment can be performed simultaneously with or subsequent to the drying step.
【0080】架橋反応を促進したい場合には、ジブチル
チンジラウレート等の有機金属化合物類、無機金属化合
物類、モノアミン類、ジアミン類、トリアミン類、環状
アミン類、アルコールアミン類、エーテルアミン類など
の触媒を、常法に準じて添加してもよい。熱架橋型表面
層Aには、公知の塗膜形成に用いられるその他の添加剤
を添加することも可能であり、例えば、酸化防止剤、レ
ベリング剤、紫外線吸収剤、光安定化剤、界面活性剤等
公知のものを用いることができる。When it is desired to accelerate the cross-linking reaction, catalysts such as organic metal compounds such as dibutyltin dilaurate, inorganic metal compounds, monoamines, diamines, triamines, cyclic amines, alcohol amines, ether amines, etc. May be added according to a conventional method. It is also possible to add other known additives used for forming a coating film to the heat-crosslinkable surface layer A, for example, an antioxidant, a leveling agent, an ultraviolet absorber, a light stabilizer, and a surfactant. Known agents such as agents can be used.
【0081】(熱架橋型表面層B)熱架橋型表面層B
は、下記一般式(I)で表される化合物を含んで形成さ
れる架橋硬化膜である。(Thermal Crosslinkable Surface Layer B) Thermally Crosslinkable Surface Layer B
Is a crosslinked cured film formed containing the compound represented by the following general formula (I).
【0082】一般式(I) F−[D−A]b (式中、Fは光機能性化合物から誘導される有機基、D
は可とう性サブユニット、Aは−Si(R1)(3-a)(O
R2)aで示される加水分解性基を有する置換ケイ素基、
bは1〜4の整数を表す。ここで、R1は水素、アルキ
ル基、置換あるいは未置換のアリール基、R2は水素、
アルキル基、トリアルキルシリル基を表し、aは1〜3
の整数を表す。)Formula (I) F- [DA] b (wherein F is an organic group derived from a photofunctional compound,
Is a flexible subunit, and A is —Si (R 1 ) (3-a) (O
R 2 ) a substituted silicon group having a hydrolyzable group represented by a,
b represents an integer of 1 to 4. Here, R 1 is hydrogen, an alkyl group, a substituted or unsubstituted aryl group, R 2 is hydrogen,
Represents an alkyl group or a trialkylsilyl group;
Represents an integer. )
【0083】一般式(I)におけるFで表される光機能
性化合物から誘導される有機基は、光電特性、具体的に
は特に光キャリア輸送特性を有するユニットであり、従
来、電荷輸送物質として知られている構造をそのまま用
いることができる。Fとしては、具体的には、トリアリ
ールアミン系化合物、ベンジジン系化合物、アリールア
ルカン系化合物、アリール置換エチレン系化合物、スチ
ルベン系化合物、アントラセン系化合物、ヒドラゾン系
化合物、などの正孔輸送性を有する化合物骨格、および
キノン系化合物、フルオレノン化合物、キサントン系化
合物、ベンゾフェノン系化合物、シアノビニル系化合
物、エチレン系化合物、などの電子輸送性を有する化合
物骨格を用いることができる。The organic group derived from the photofunctional compound represented by F in the general formula (I) is a unit having a photoelectric property, specifically, a photocarrier transport property. Known structures can be used as they are. As F, specifically, it has a hole transporting property such as a triarylamine-based compound, a benzidine-based compound, an arylalkane-based compound, an aryl-substituted ethylene-based compound, a stilbene-based compound, an anthracene-based compound, and a hydrazone-based compound. A compound skeleton and a compound skeleton having an electron transporting property such as a quinone compound, a fluorenone compound, a xanthone compound, a benzophenone compound, a cyanovinyl compound, an ethylene compound, or the like can be used.
【0084】一般式(I)におけるDで表される可とう
性サブユニットは、光電特性を付与するためのFで表さ
れる有機基と、3次元的な無機ガラス質ネットワークに
直接結合で結びつくAで表される置換ケイ素基と、を結
びつけるものである。また、堅さの反面もろさも有する
無機ガラス質ネットワークに、適度な可とう性を付与
し、膜としての強靱さを向上させるという働きもある。
Dの具体的な構造としては、−CxH2x−(xは1〜1
5の整数)、−Cx'H(2x'-2)−(x'は2〜15の整
数)、−Cx"H(2x"-4)−(x”は2〜15の整数)で
表される2価の炭化水素基、2価のアリール基、−CO
O−、−S−、−O−、−CH2−C6H4−、−N=C
H−、−(C6H4)−(C6H4)−、あるいはこれらの
組み合わせや、さらに置換基を導入したもの等を挙げる
ことができる。The flexible subunit represented by D in the general formula (I) is directly bonded to an organic group represented by F for imparting photoelectric properties to a three-dimensional inorganic glassy network. And a substituted silicon group represented by A. Further, it also has a function of imparting appropriate flexibility to an inorganic vitreous network having fragility on the other hand, and improving toughness as a film.
As a specific structure of D, -C x H 2x- (x is 1 to 1
5 integer), - C x 'H ( 2x'-2) - (x' is an integer of 2~15), - C x "H (2x" -4) - (x " is an integer of 2 to 15) A divalent hydrocarbon group, a divalent aryl group, -CO
O -, - S -, - O -, - CH 2 -C 6 H 4 -, - N = C
Examples thereof include H-,-(C 6 H 4 )-(C 6 H 4 )-, a combination thereof, and those further having a substituent introduced.
【0085】上記一般式(I)で表される化合物の中で
も、下記一般式(II)で表される化合物は、優れた光電
特性、機械特性および酸化耐性の点で、特に望ましい。Among the compounds represented by the general formula (I), the compounds represented by the following general formula (II) are particularly desirable in terms of excellent photoelectric properties, mechanical properties and oxidation resistance.
【0086】[0086]
【化5】 Embedded image
【0087】(式中、Ar1〜Ar4はそれぞれ独立に置
換あるいは未置換のアリール基を示し、Ar5は置換あ
るいは未置換のアリール基あるいはアリーレン基を示
し、かつAr1〜Ar5のうち1〜4個は、−Y−Si
(R5)(3-c)(OR6)cで示される置換基を有し、R5
は水素、アルキル基、置換あるいは未置換のアリール基
を表し、R6は水素、アルキル基、トリアルキルシリル
基を表し、cは1〜3の整数を示し、kは0または1を
示す。またYは、−CxH2x−(xは1〜15の整
数)、−Cx'H(2x'-2)−(x'は2〜15の整数)、−
Cx"H(2x"-4)−(x"は2〜15の整数)で表される炭
化水素基、置換あるいは未置換の2価のアリール基、−
CH=N−、−O−、−COO−からなる群より選ばれ
る少なくとも1種以上を有する2価の基を表す。)[0087] (wherein, Ar 1 to Ar 4 each independently represent a substituted or unsubstituted aryl group, Ar 5 represents a substituted or unsubstituted aryl group or arylene group, and among Ar 1 to Ar 5 1-4 are -Y-Si
(R 5) (3-c ) having a substituent represented by (OR 6) c, R 5
Represents a hydrogen, an alkyl group, a substituted or unsubstituted aryl group, R 6 represents a hydrogen, an alkyl group, or a trialkylsilyl group, c represents an integer of 1 to 3, and k represents 0 or 1. The Y is, -C x H 2x - (x is 1 to 15 integer), - C x 'H ( 2x'-2) - (x' is from 2 to 15 integer), -
A hydrocarbon group represented by Cx " H (2x" -4) -(x "is an integer of 2 to 15), a substituted or unsubstituted divalent aryl group,
CH = represents a divalent group having at least one or more selected from the group consisting of -O- and -COO-. )
【0088】上記一般式(II)において、Ar1〜Ar4
は、それぞれ独立に置換または未置換のアリール基を示
し、具体的には、以下に示す構造が挙げられる。In the above general formula (II), Ar 1 to Ar 4
Each independently represents a substituted or unsubstituted aryl group, and specific examples include the structures shown below.
【0089】[0089]
【化6】 Embedded image
【0090】ここで、Xは、−Y−Si(R5)
(3-c)(OR6)cで示される置換基を表し、R3は、水
素、炭素数1〜4のアルキル基、未置換の、または炭素
数1〜4のアルキル基もしくは炭素数1〜4のアルコキ
シ基で置換されたフェニル基、炭素数7〜10のアラル
キル基から選択される。R4は、水素、炭素数1〜4の
アルキル基、炭素数1〜4のアルコキシ基、ハロゲンか
ら選択される。mおよびsは0または1を表し、tは1
から3の整数を示し、Arは下記から選択される。Here, X is —Y—Si (R 5 )
(3-c) (OR 6 ) represents a substituent represented by c , wherein R 3 is hydrogen, an alkyl group having 1 to 4 carbon atoms, an unsubstituted alkyl group having 1 to 4 carbon atoms or 1 carbon atom. Phenyl group substituted by an alkoxy group having 4 to 4 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms. R 4 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and halogen. m and s represent 0 or 1, and t is 1
To 3 and Ar is selected from the following.
【0091】[0091]
【化7】 Embedded image
【0092】ここで、R8は、水素、炭素数1〜4のア
ルキル基、炭素数1〜4のアルコキシ基、ハロゲンから
選択される。また、tは0〜3の整数を示す。Here, R 8 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and halogen. T represents an integer of 0 to 3.
【0093】また、Z’は以下に示す構造から選択され
る。Further, Z ′ is selected from the following structures.
【0094】[0094]
【化8】 Embedded image
【0095】上記一般式(II)において、Yとしては、
以下に示すNo.1〜11の構造が例示される。In the above general formula (II), Y is
No. shown below. Structures 1 to 11 are exemplified.
【0096】[0096]
【化9】 Embedded image
【0097】ここで、R4は、水素、炭素数1〜4のア
ルキル基、炭素数1〜4のアルコキシ基、ハロゲンから
選択される。xは1〜10の整数、x’およびx”はそ
れぞれ2〜15の整数、yおよびzはそれぞれ1〜5の
整数、tは1〜3の整数をそれぞれ示す。上記構造の中
でも、特にNo.1〜7に示した構造が好ましい。Here, R 4 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and halogen. x is an integer of 1 to 10, x 'and x "are each an integer of 2 to 15, y and z are each an integer of 1 to 5, and t is an integer of 1 to 3. Among the above structures, No. .1 to 7 are preferred.
【0098】一方、前記一般式(II)におけるAr
5は、置換もしくは未置換のアリール基または、アリー
レン基を示し、具体的には以下に示す構造が挙げられ
る。On the other hand, Ar in the general formula (II)
5 represents a substituted or unsubstituted aryl group or an arylene group, and specific examples include the following structures.
【0099】一般式(II)におけるkが0の時、Ar5の
具体例としては、When k in the general formula (II) is 0, specific examples of Ar 5 include:
【0100】[0100]
【化10】 Embedded image
【0101】一般式(II)におけるkが1の時、Ar5の
具体例としては、When k in the general formula (II) is 1, specific examples of Ar 5 include:
【0102】[0102]
【化11】 Embedded image
【0103】をそれぞれ挙げることができる。ここで、
R3は、水素、炭素数1〜4のアルキル基、未置換の、
または炭素数1〜4のアルキル基もしくは炭素数1〜4
のアルコキシ基で置換されたフェニル基、炭素数7〜1
0のアラルキル基から選択される。R4は、水素、炭素
数1〜4のアルキル基、炭素数1〜4のアルコキシ基、
ハロゲンから選択される。sは0または1を表し、tは
1から3の整数を示す。Arは以下に示す構造から選択
される。Each of them can be mentioned. here,
R 3 is hydrogen, an alkyl group having 1 to 4 carbon atoms, unsubstituted
Or an alkyl group having 1 to 4 carbon atoms or 1 to 4 carbon atoms
A phenyl group substituted with an alkoxy group, having 7 to 1 carbon atoms
It is selected from 0 aralkyl groups. R 4 is hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms,
Selected from halogen. s represents 0 or 1, and t represents an integer of 1 to 3. Ar is selected from the structures shown below.
【0104】[0104]
【化12】 Embedded image
【0105】ここで、R4は、水素、炭素数1〜4のア
ルキル基、炭素数1〜4のアルコキシ基、ハロゲンから
選択される。また、tは1から3の整数を示す。さら
に、Zは以下に示す構造から選択される。Here, R 4 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and halogen. T represents an integer of 1 to 3. Further, Z is selected from the structures shown below.
【0106】[0106]
【化13】 Embedded image
【0107】ここで、R5は、水素、炭素数1〜4のア
ルキル基、炭素数1〜4のアルコキシ基、ハロゲンから
選択される。また、qおよびrはそれぞれ1〜10の整
数、t’は1または2の整数を示し、Wは以下に示す基
から選択される。Here, R 5 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and halogen. Further, q and r each represent an integer of 1 to 10, t 'represents an integer of 1 or 2, and W is selected from the following groups.
【0108】[0108]
【化14】 Embedded image
【0109】ここで、s’は0〜3の整数を示す。Here, s' represents an integer of 0 to 3.
【0110】熱架橋型表面層B中の上記一般式(I)で
表される化合物の含有量は、熱架橋型表面層Bの全固形
分中の5〜50重量%の範囲であり、好ましくは10〜
40重量%である。The content of the compound represented by the general formula (I) in the thermally crosslinked surface layer B is in the range of 5 to 50% by weight based on the total solid content of the thermally crosslinked surface layer B. Is 10
40% by weight.
【0111】一般式(I)(特に一般式(II))で表さ
れる化合物と同時に用いて架橋硬化膜を形成しうる化合
物として、下記一般式(III)で表わされる化合物が好ま
しく用いられる。As a compound which can form a crosslinked cured film when used simultaneously with the compound represented by the general formula (I) (particularly, the general formula (II)), a compound represented by the following general formula (III) is preferably used.
【0112】[0112]
【化15】 Embedded image
【0113】(式中、Aは−Si(R3)(3-b)(O
R4)bで表される置換基を示し、Bは枝分かれを含んで
も良いn価の炭化水素基、n価のアリール基、−NH
−、の少なくとも1つ、あるいはそれらを組み合わせて
構成され、nは2以上の整数を表す。また、R3は水
素、アルキル基、置換あるいは未置換のアリール基を表
し、R4は水素、アルキル基、トリアルキルシリル基を
表し、bは1〜3の整数を表す。)(Where A is —Si (R 3 ) (3-b) (O
R 4 ) represents a substituent represented by b , and B represents an n-valent hydrocarbon group which may contain a branch, an n-valent aryl group, -NH
, Or a combination thereof, and n represents an integer of 2 or more. R 3 represents a hydrogen, an alkyl group, a substituted or unsubstituted aryl group, R 4 represents a hydrogen, an alkyl group, or a trialkylsilyl group, and b represents an integer of 1 to 3. )
【0114】上記一般式(III)で表される化合物は、末
端にアルコキシシリル基(構造式のA)を2個以上有し
ている化合物であり、一般式(I)(特に一般式(I
I))で表される化合物におけるアルコキシシリル基と
互いに反応し、Si−O−Si結合となって3次元的な
架橋硬化膜を形成する。The compound represented by the general formula (III) is a compound having two or more alkoxysilyl groups (A in the structural formula) at the terminal, and is represented by the general formula (I) (particularly the general formula (I)
It reacts with the alkoxysilyl group in the compound represented by I)) to form a Si—O—Si bond to form a three-dimensional crosslinked cured film.
【0115】一般式(I)(特に一般式(II))で表さ
れる化合物は、単独で架橋硬化膜を形成することも可能
であるが、一般式(III)で表される化合物は分子構造の
両端にアルコキシシリル基を有しているので、当該化合
物を同時に用いると架橋硬化膜の架橋構造が3次元的に
なりやすく、より強い機械的強度を有するようになると
考えられる。また、一般式(I)で表される化合物にお
けるDで表される可とう性サブユニットの部分と同様、
架橋硬化膜に適度な可とう性を与える役割もある。特
に、一般式(III)で表される化合物としては、下記一般
式のいずれかで表される化合物であることが望ましい。The compound represented by the general formula (I) (especially the general formula (II)) can form a crosslinked cured film by itself, but the compound represented by the general formula (III) Since the structure has alkoxysilyl groups at both ends, it is considered that when the compound is used at the same time, the crosslinked structure of the crosslinked cured film tends to be three-dimensional and has higher mechanical strength. Further, similar to the flexible subunit represented by D in the compound represented by formula (I),
It also has a role of imparting appropriate flexibility to the crosslinked cured film. In particular, the compound represented by the general formula (III) is preferably a compound represented by any of the following general formulas.
【0116】[0116]
【化16】 Embedded image
【0117】(式中、T1、T2は枝分かれしていてもよ
い2価あるいは3価の炭化水素基を表し、Aは一般式(I
II)におけるAで表される置換基と同一であり、h、
i、jは1〜3の整数であり、かつ、分子内のAの数が
2以上となるように選ばれる。)(Wherein T 1 and T 2 represent a divalent or trivalent hydrocarbon group which may be branched, and A represents a group represented by the general formula (I)
H) is the same as the substituent represented by A in II),
i and j are integers of 1 to 3, and are selected so that the number of A in the molecule is 2 or more. )
【0118】熱架橋型表面層B中の上記一般式(III)
で表される化合物の含有量は、熱架橋型表面層Bの全固
形分中の20〜80重量%の範囲であり、好ましくは3
0〜70重量%の範囲である。The above-mentioned general formula (III) in the thermally crosslinked type surface layer B
Is in the range of 20 to 80% by weight based on the total solid content of the thermally crosslinkable surface layer B, and is preferably 3% by weight.
It is in the range of 0 to 70% by weight.
【0119】熱架橋型表面層Bは、既述の如く上記一般
式(I)で表される化合物、および必要に応じて上記一
般式(III)で表される化合物から形成されるが、さら
に目的に応じてその他種々の成分を添加してもよい。熱
架橋型表面層Bを形成する際、膜の成膜性、可撓性を調
整するなどの目的から、一般式(I)(特に一般式(I
I))で表される化合物と架橋反応可能な他の化合物を
さらに添加してもよい。このような化合物として、各種
シランカップリング剤、および市販のシリコン系ハード
コート剤を用いることができる。The heat-crosslinkable surface layer B is formed from the compound represented by the above general formula (I) and, if necessary, the compound represented by the above general formula (III). Various other components may be added according to the purpose. When forming the thermo-crosslinkable surface layer B, the general formula (I) (particularly the general formula (I)
Other compounds capable of undergoing a crosslinking reaction with the compound represented by I)) may be further added. As such a compound, various silane coupling agents and commercially available silicon-based hard coat agents can be used.
【0120】シランカップリング剤としては、ビニルト
リクロロシラン、ビニルトリメトキシシラン、ビニルト
リエトキシシラン、γ−グリシドキシプロピルメチルジ
エトキシシラン、γ−グリシドキシプロピルトリメトキ
シシラン、γ−グリシドキシプロピルトリメトキシシラ
ン、γ−アミノプロピルトリエトキシシラン、γ−アミ
ノプロピルトリメトキシシラン、γ−アミノプロピルメ
チルジメトキシシラン、N−β(アミノエチル)γ−ア
ミノプロピルトリエトキシシラン、テトラメトキシシラ
ン、メチルトリメトキシシラン、ジメチルジメトキシシ
ラン、等を用いることができる。Examples of the silane coupling agent include vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxysilane. Propyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropylmethyldimethoxysilane, N-β (aminoethyl) γ-aminopropyltriethoxysilane, tetramethoxysilane, methyltrimethylsilane Methoxysilane, dimethyldimethoxysilane, and the like can be used.
【0121】市販のハードコート剤としては、KP−8
5、CR−39、X−12−2208、X−40−97
40、X−41−1007、KNS−5300、X−4
0−2239(以上、信越シリコーン社製)、およびA
Y42−440、AY42−441、AY49−208
(以上、東レダウコーニング社製)、などを用いること
ができる。Commercially available hard coat agents include KP-8
5, CR-39, X-12-2208, X-40-97
40, X-41-1007, KNS-5300, X-4
0-2239 (all manufactured by Shin-Etsu Silicone Co., Ltd.) and A
Y42-440, AY42-441, AY49-208
(Above, manufactured by Toray Dow Corning Co., Ltd.).
【0122】熱架橋型表面層Bには、公知の塗膜形成に
用いられるその他の添加剤を添加することも可能であ
り、例えば、酸化防止剤、レベリング剤、紫外線吸収
剤、光安定化剤、界面活性剤等公知のものを用いること
ができる。熱架橋型表面層Bの架橋硬化膜を形成するた
めには、一般式(I)で表される化合物および各種添加
剤を混合して得た塗布液を、使用済みの電子写真感光体
の前記精密研磨後に残存する電荷輸送層の上に塗工した
後、加熱すればよい。これにより、それぞれのSi基同
士が3次元的に架橋硬化反応を起こし、強固な硬化膜を
形成する。It is also possible to add other known additives used for forming a coating film to the heat-crosslinkable surface layer B, for example, an antioxidant, a leveling agent, an ultraviolet absorber, and a light stabilizer. Known surfactants such as a surfactant and a surfactant can be used. In order to form a crosslinked cured film of the thermal crosslinking type surface layer B, a coating liquid obtained by mixing the compound represented by the general formula (I) and various additives is used in the above-mentioned electrophotographic photoreceptor. What is necessary is just to heat after apply | coating on the charge transport layer which remains after precision polishing. Thereby, the respective Si groups cause a three-dimensional cross-linking and curing reaction to form a strong cured film.
【0123】架橋硬化反応を行う際には無触媒で行って
もよいが、適切な触媒を用いてもよい。触媒としては、
塩酸、硫酸、蟻酸、酢酸、トリフルオロ酢酸等の酸触
媒;アンモニア、トリエチルアミン等の塩基;ジブチル
錫ジアセテート、ジブチル錫ジオクトエート、オクエ酸
第一錫等の有機錫化合物;テトラ−n−ブチルチタネー
ト、テトライソプロピルチタネート等の有機チタン化合
物;有機カルボン酸の鉄塩、マンガン塩、コバルト塩、
亜鉛塩、ジルコニウム塩;等が挙げられる。また、架橋
硬化反応の際の温度は、下地感光層(電荷発生層および
残存する電荷輸送層)に影響しない温度であれば特に制
限はないが、室温〜150℃の範囲に設定するのが好ま
しい。The cross-linking curing reaction may be carried out without a catalyst, but an appropriate catalyst may be used. As a catalyst,
Acid catalysts such as hydrochloric acid, sulfuric acid, formic acid, acetic acid and trifluoroacetic acid; bases such as ammonia and triethylamine; organic tin compounds such as dibutyltin diacetate, dibutyltin dioctoate and stannous octoate; tetra-n-butyl titanate; Organic titanium compounds such as tetraisopropyl titanate; iron salts, manganese salts, and cobalt salts of organic carboxylic acids;
Zinc salts, zirconium salts; and the like. The temperature at the time of the crosslinking and curing reaction is not particularly limited as long as it does not affect the underlying photosensitive layer (the charge generation layer and the remaining charge transport layer), but is preferably set in the range of room temperature to 150 ° C. .
【0124】[0124]
【実施例】以下、実施例を挙げて本発明をさらに具体的
に説明するが、本発明はこれらに限定されるものではな
い。なお、実施例および比較例における「部」は「重量
部」を意味する。EXAMPLES The present invention will now be described more specifically with reference to examples, but the present invention is not limited thereto. In the examples and comparative examples, “parts” means “parts by weight”.
【0125】[実施例1] 1.供試電子写真感光体の製造 (下引き層の形成)共重合ナイロン樹脂(アミランCM
8000、東レ製)10部をメタノール60部とブタノ
ール40部の混合液に溶解した塗布液を、導電性基体
(アルミニウムドラム、長さ340mm、外径30m
m)表面に浸漬塗布し、100℃で10分間加熱乾燥す
ることにより、膜厚0.5μmの下引き層を形成した。[Example 1] 1. Production of test electrophotographic photoreceptor (Formation of undercoat layer) Copolymer nylon resin (Amilan CM
A coating solution prepared by dissolving 10 parts of 8000, manufactured by Toray Co., Ltd. in a mixture of 60 parts of methanol and 40 parts of butanol was applied to a conductive substrate (aluminum drum, length 340 mm, outer diameter 30 m).
m) An undercoat layer having a thickness of 0.5 μm was formed by dip coating on the surface and drying by heating at 100 ° C. for 10 minutes.
【0126】(電荷発生層の形成)オキシチタニウムア
タロシアニン顔料4部、塩化ビニル−酢酸ビニル共重合
体樹脂(VMCH、ユニオンカーバイド製)2部、キシ
レン10部、および、酢酸n−ブチル24部からなる溶
液をサンドミルで10時間分散した後、テトラヒドロフ
ラン60部を加えて電荷発生層形成用の塗布液を調製し
た。この塗布液を前記下引き層の上に浸漬塗布し、10
0℃で10分間加熱乾燥することにより、電荷発生層を
形成した。電荷発生層の膜厚は0.15μmであった。(Formation of Charge Generation Layer) From 4 parts of oxytitanium atalocyanine pigment, 2 parts of vinyl chloride-vinyl acetate copolymer resin (VMCH, manufactured by Union Carbide), 10 parts of xylene, and 24 parts of n-butyl acetate The resulting solution was dispersed in a sand mill for 10 hours, and 60 parts of tetrahydrofuran was added to prepare a coating solution for forming a charge generation layer. This coating solution is dip-coated on the undercoat layer,
By heating and drying at 0 ° C. for 10 minutes, a charge generation layer was formed. The thickness of the charge generation layer was 0.15 μm.
【0127】(電荷輸送層の形成)下記構造式(a)で
示されるトリアリールアミン化合物50重量部と、ポリ
カーボネート樹脂(ユーピロンZ−300、三菱瓦斯化
学製)50重量部と、をモノクロルベンゼン400重量
部に溶解し、電荷輸送層形成用の塗布液を調製した。か
かる塗布液を、前記電荷発生層の上に浸漬塗布し、11
5℃で1時間加熱乾燥することにより、層厚25μmの
電荷輸送層を形成した。(Formation of Charge Transporting Layer) 50 parts by weight of a triarylamine compound represented by the following structural formula (a) and 50 parts by weight of a polycarbonate resin (Iupilon Z-300, manufactured by Mitsubishi Gas Chemical) are combined with monochlorobenzene 400 The solution was dissolved in parts by weight to prepare a coating solution for forming a charge transport layer. Such a coating solution is dip-coated on the charge generation layer,
By heating and drying at 5 ° C. for 1 hour, a charge transport layer having a thickness of 25 μm was formed.
【0128】[0128]
【化17】 Embedded image
【0129】以上のようにして、供試電子写真感光体を
製造した。As described above, the test electrophotographic photosensitive member was manufactured.
【0130】2.走行試験 このようにして得られた供試電子写真感光体を、富士ゼ
ロックス社製LP4161IIプリンターに装着し(ドラ
ムフランジおよび内部充填材は、取り外し可能となって
いる)、テストチャートを用いてA4用紙横送り(富士
ゼロックス社製L紙を使用)に対し、プリント走行試験
を20℃40%の環境で100,000枚まで実施し
た。走行試験後の感光層の膜厚は平均で15μm、基準
線平均表面粗さ(Ra)は0.15μmであった。[0130] 2. Running test The test electrophotographic photoreceptor thus obtained was mounted on an LP4161II printer manufactured by Fuji Xerox Co., Ltd. (the drum flange and the internal filler were removable), and the test chart was used for A4 paper. A print running test was performed up to 100,000 sheets in an environment of 20 ° C. and 40% for lateral feeding (using L paper manufactured by Fuji Xerox Co., Ltd.). The average thickness of the photosensitive layer after the running test was 15 μm, and the average surface roughness (Ra) of the reference line was 0.15 μm.
【0131】3.再生電子写真感光体の製造 (精密研磨)走行試験後の電子写真感光体を、バフ研磨
機(バフ部材としてフェルト、研磨粉として粒径20μ
mの酸化アルミニウムを使用)により、研磨後の感光層
の膜厚が14μm、膜厚変動が±0.5μm、基準線平
均表面粗さ(Ra)が0.08μmになるように精密研
磨した。研磨後、電子写真感光体の感光層表面に残存す
る電荷輸送層(以下、「残存電荷輸送層」という場合が
ある。)表面を、蒸留水を用いてブラシ洗浄し、100
℃で10分間乾燥した。[0131] 3. Production of Reproduced Electrophotographic Photoreceptor (Precision Polishing) The electrophotographic photoreceptor after the running test is subjected to a buffing machine (felt as a buffing member, particle size 20 μm as a polishing powder).
m using aluminum oxide), the photosensitive layer was precisely polished so that the film thickness of the polished photosensitive layer was 14 μm, the film thickness variation was ± 0.5 μm, and the reference line average surface roughness (Ra) was 0.08 μm. After polishing, the surface of the charge transport layer remaining on the surface of the photosensitive layer of the electrophotographic photosensitive member (hereinafter, sometimes referred to as “residual charge transport layer”) is brush-cleaned with distilled water, and
Dry at 10 ° C. for 10 minutes.
【0132】(新しい表面層の形成)精密研磨およびそ
の後の洗浄を終えた電子写真感光体について、ドラムフ
ランジおよび内部充填材を取り外し、前記「1.供試電
子写真感光体の製造」の項で述べたと同様の電荷輸送層
形成用の塗布液を用いて、残存電荷輸送層の上に浸漬塗
布により塗工し、115℃で1時間加熱乾燥することに
より、再び、残存電荷輸送層を含む感光層全体の膜厚が
25μmとなるように電荷輸送層(新しい表面層)を形
成した。以上のようにして、実施例1の再生電子写真感
光体を製造した。(Formation of New Surface Layer) For the electrophotographic photosensitive member that has been subjected to precision polishing and subsequent cleaning, the drum flange and the internal filler are removed, and the electrophotographic photosensitive member is subjected to the procedure described in “1. Using the same coating liquid for forming the charge transport layer as described above, the remaining charge transport layer is coated by dip coating, and then heated and dried at 115 ° C. for 1 hour, so that the photosensitive layer containing the remaining charge transport layer is again exposed. A charge transport layer (new surface layer) was formed so that the film thickness of the entire layer was 25 μm. As described above, the reproduced electrophotographic photosensitive member of Example 1 was manufactured.
【0133】4.再生電子写真感光体の走行試験 得られた再生電子写真感光体を用い、前記「2.走行試
験」と同様にして、プリント走行試験を実施した。該プ
リント走行試験においては、その中途で画像状態を目視
にて適宜確認した。また、該プリント走行試験は、最低
限2万枚まで続け、さらに画像状態が問題の無い場合に
は、問題が生じるまで続けた。結果を下記表6にまとめ
て示す。4. Running Test of Reproduced Electrophotographic Photoreceptor Using the obtained regenerated electrophotographic photoreceptor, a print running test was performed in the same manner as in “2. Running Test”. In the print running test, the state of the image was appropriately visually checked halfway. The print running test was continued up to a minimum of 20,000 sheets, and further, when there was no problem in the image state, until a problem occurred. The results are summarized in Table 6 below.
【0134】[実施例2]実施例1において、「3.再
生電子写真感光体の製造」の(新しい表面層の形成)の
項を下記工程に代えたことを除き、実施例1と同様にし
て、実施例2の再生電子写真感光体を製造した。さらに
実施例1と同様にして再生電子写真感光体の走行試験を
行った。結果を下記表6にまとめて示す。Example 2 The procedure of Example 1 was repeated, except that the section of (3. Production of Reproduced Electrophotographic Photoreceptor) (Formation of New Surface Layer) was changed to the following steps. Thus, a reproduced electrophotographic photosensitive member of Example 2 was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 1. The results are summarized in Table 6 below.
【0135】(新しい表面層の形成)下記構造式(c)
で表される化合物3部、前記構造式(4)で表されるビ
ュレット変性ポリイソシアネートの溶液(固形分67重
量%)4部、をシクロヘキサノン50部に溶解し、新し
い表面層形成用の塗布液を調製した。精密研磨およびそ
の後の洗浄を終えた電子写真感光体について、ドラムフ
ランジおよび内部充填材はそのままに、前記新しい表面
層形成用の塗布液を、前記残存電荷輸送層の上にフロー
塗布により塗工し、常温で10分間乾燥させた後150
℃で60分加熱し、膜厚9μm(残存電荷輸送層を含む
感光層の14μmは含まず)の電荷輸送層(新しい表面
層)を形成した。(Formation of New Surface Layer) The following structural formula (c)
Is dissolved in 50 parts of cyclohexanone, and 3 parts of a solution of the burette-modified polyisocyanate represented by the above structural formula (4) (solid content: 67% by weight) is dissolved in 50 parts of cyclohexanone. Was prepared. With respect to the electrophotographic photoreceptor that has been subjected to precision polishing and subsequent cleaning, the coating solution for forming a new surface layer is coated on the remaining charge transport layer by flow coating while the drum flange and the internal filler are kept as they are. 150 minutes after drying at room temperature for 10 minutes.
Heating was performed at 60 ° C. for 60 minutes to form a charge transport layer (new surface layer) having a thickness of 9 μm (excluding the photosensitive layer including the residual charge transport layer of 14 μm).
【0136】[0136]
【化18】 Embedded image
【0137】なおここで、上記構造式(c)で表される
化合物と、前記構造式(4)で表されるビュレット変性
ポリイソシアネートと、の混合比は、[上記構造式
(c)で表される化合物におけるOH基の総モル数]:
[前記構造式(4)で表されるビュレット変性ポリイソ
シアネートにおけるイソシアネート基の総モル数]が、
およそ45:55となっている。Here, the mixing ratio of the compound represented by the structural formula (c) and the burette-modified polyisocyanate represented by the structural formula (4) is represented by the following formula: Total number of moles of OH groups in the compound to be obtained]:
[Total number of moles of isocyanate groups in the buret-modified polyisocyanate represented by the structural formula (4)]
It is approximately 45:55.
【0138】[実施例3]実施例1において、「3.再
生電子写真感光体の製造」の(新しい表面層の形成)の
項を下記工程に代えたことを除き、実施例1と同様にし
て、実施例3の再生電子写真感光体を製造した。さらに
実施例1と同様にして再生電子写真感光体の走行試験を
行った。結果を下記表6にまとめて示す。[Example 3] In Example 1, the procedure of Example 3 was repeated except that the section of (3. Production of regenerated electrophotographic photosensitive member) (formation of new surface layer) was changed to the following steps. Thus, a reproduced electrophotographic photosensitive member of Example 3 was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 1. The results are summarized in Table 6 below.
【0139】(新しい表面層の形成)下記構造式(d)
で表される化合物18部、硬化性シロキサン樹脂(信越
シリコーン社製、X−40−2239)18部、酢酸7
部、1N塩酸0.001部を混合して溶解し、新しい表
面層形成用の塗布液を調製した。精密研磨およびその後
の洗浄を終えた電子写真感光体について、ドラムフラン
ジおよび内部充填材はそのままに、前記新しい表面層形
成用の塗布液を、前記残存電荷輸送層の上にフロー塗布
により塗工し、30分の指触乾燥の後、120℃で2時
間の加熱処理を行い、膜厚10μm(残存電荷輸送層を
含む感光層の14μmは含まず)の電荷輸送層(新しい
表面層)を形成した。(Formation of New Surface Layer) The following structural formula (d)
18 parts of a compound represented by the formula, 18 parts of a curable siloxane resin (X-40-2239, manufactured by Shin-Etsu Silicone Co., Ltd.), and acetic acid 7
And a solution of 0.001 part of 1N hydrochloric acid were mixed and dissolved to prepare a new coating solution for forming a surface layer. With respect to the electrophotographic photoreceptor that has been subjected to precision polishing and subsequent cleaning, the coating solution for forming a new surface layer is coated on the remaining charge transport layer by flow coating while the drum flange and the internal filler are kept as they are. After 30 minutes of touch drying, heat treatment is performed at 120 ° C. for 2 hours to form a charge transport layer (new surface layer) having a film thickness of 10 μm (excluding the photosensitive layer including the residual charge transport layer of 14 μm). did.
【0140】[0140]
【化19】 Embedded image
【0141】[比較例1]実施例1において、「3.再
生電子写真感光体の製造」の(精密研磨)の項を下記
(洗浄)の工程に代えたことを除き、実施例1と同様に
して、比較例1の再生電子写真感光体を製造した。さら
に実施例1と同様にして再生電子写真感光体の走行試験
を行った。結果を下記表6にまとめて示す。Comparative Example 1 In the same manner as in Example 1, except that the section of (Precision Polishing) in “3. Production of Reproduced Electrophotographic Photoreceptor” was changed to the following (Washing) step. Thus, a reproduced electrophotographic photosensitive member of Comparative Example 1 was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 1. The results are summarized in Table 6 below.
【0142】(洗浄)走行試験後の電子写真感光体を、
蒸留水を用いてブラシ洗浄し、100℃10分間乾燥し
た。(Washing) The electrophotographic photosensitive member after the running test was
It was brush-washed with distilled water and dried at 100 ° C. for 10 minutes.
【0143】[比較例2]実施例1において、「3.再
生電子写真感光体の製造」の(精密研磨)の項を下記
(電荷輸送層の溶解除去)の工程に代えたことを除き、
実施例1と同様にして、比較例2の再生電子写真感光体
を製造した。さらに実施例1と同様にして再生電子写真
感光体の走行試験を行った。結果を下記表6にまとめて
示す。[Comparative Example 2] In Example 1, except that the section of (Precision Polishing) in “3. Production of Reproduced Electrophotographic Photoreceptor” was changed to the following step (Dissolution and Removal of Charge Transport Layer).
In the same manner as in Example 1, a reproduced electrophotographic photosensitive member of Comparative Example 2 was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 1. The results are summarized in Table 6 below.
【0144】(電荷輸送層の溶解除去)走行試験後の電
子写真感光体について、モノクロロベンゼン中で超音波
洗浄を10分間行い、電荷輸送層をすべて溶解除去し、
80℃で10分間乾燥した。(Dissolution and Removal of Charge Transport Layer) The electrophotographic photosensitive member after the running test was subjected to ultrasonic cleaning in monochlorobenzene for 10 minutes to dissolve and remove the entire charge transport layer.
Dry at 80 ° C. for 10 minutes.
【0145】[比較例3]実施例1において、「3.再
生電子写真感光体の製造」の項を下記の工程に代えたこ
とを除き、実施例1と同様にして、比較例3の再生電子
写真感光体を製造した。さらに実施例1と同様にして再
生電子写真感光体の走行試験を行った。結果を下記表6
にまとめて示す。Comparative Example 3 The reproduction of Comparative Example 3 was carried out in the same manner as in Example 1 except that the section of “3. Production of reproduced electrophotographic photosensitive member” was replaced with the following steps. An electrophotographic photoreceptor was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 1. The results are shown in Table 6 below.
Are shown together.
【0146】3.再生電子写真感光体の製造 走行試験後の電子写真感光体について、メチルアルコー
ル50部およびN,N−ジメチルホルムアミド40部の
混合液中で超音波洗浄を5分間行い、その後80℃の熱
水中に5分間浸漬し、さらに10℃の冷水に5分間浸漬
し、感光層を下引き層から剥離除去した。感光層の剥離
除去後の電子写真感光体の表面を、蒸留水を用いてブラ
シ洗浄し、100℃で10分間乾燥し、実施例1におけ
る「1.供試電子写真感光体の製造」と同様にして下引
き層、電荷発生層、および電荷輸送層を順に積層形成し
た。[0146] 3. Production of Reproduced Electrophotographic Photoreceptor The electrophotographic photoreceptor after the running test was subjected to ultrasonic cleaning for 5 minutes in a mixed solution of 50 parts of methyl alcohol and 40 parts of N, N-dimethylformamide, and then heated at 80 ° C. in hot water. For 5 minutes, and further immersed in cold water at 10 ° C. for 5 minutes to remove the photosensitive layer from the undercoat layer. After removing the photosensitive layer, the surface of the electrophotographic photoreceptor is brush-washed with distilled water, dried at 100 ° C. for 10 minutes, and similar to “1. Production of test electrophotographic photoreceptor” in Example 1. Then, an undercoat layer, a charge generation layer, and a charge transport layer were sequentially laminated.
【0147】[実施例4] 1.供試電子写真感光体の製造 実施例1において、「1.供試電子写真感光体の製造」
の導電性基体をアルミニウムドラム、長さ340mm、
外径84mmとし、(電荷発生層の形成)の項を下記工
程に代えたことを除き、実施例1と同様にして、供試電
子写真感光体を製造した。[Embodiment 4] 1. Production of Test Electrophotographic Photoreceptor In Example 1, "1. Production of Test Electrophotographic Photoreceptor"
An aluminum drum, a length of 340 mm,
A test electrophotographic photoreceptor was manufactured in the same manner as in Example 1 except that the outer diameter was 84 mm, and the section of (formation of charge generation layer) was changed to the following step.
【0148】(電荷発生層の形成)電荷発生物質として
の下記構造式(b)で表されるビスアゾ化合物4部を、
シクロヘキサン40部と酢酸n−ブチル40部との混合
溶媒中でボールミルにより粉砕し、電荷発生層形成用の
塗布液を調製した。この塗布液を前記下引き層の上に浸
漬塗布し、指触乾燥して0.4μmの電荷発生層を形成
した。(Formation of Charge Generation Layer) 4 parts of a bisazo compound represented by the following structural formula (b) as a charge generation material was
The mixture was pulverized with a ball mill in a mixed solvent of 40 parts of cyclohexane and 40 parts of n-butyl acetate to prepare a coating solution for forming a charge generation layer. This coating solution was applied onto the undercoating layer by dip coating, and dried by touch to form a 0.4 μm charge generating layer.
【0149】[0149]
【化20】 Embedded image
【0150】2.走行試験 このようにして得られた供試電子写真感光体を、富士ゼ
ロックス社製Vivace550複写機に装着し(ドラ
ムフランジおよび内部充填材は、取り外し可能となって
いる)、テストチャートを用いてA4用紙横送り(富士
ゼロックス社製L紙を使用)に対し、プリント走行試験
を20℃40%の環境で100,000枚まで実施し
た。走行試験後の感光層の膜厚は平均で15μm、基準
線平均表面粗さ(Ra)は0.12μmであった。2. Running test The test electrophotographic photoreceptor thus obtained was mounted on a Fuji Xerox Co., Ltd., Vision 550 copier (the drum flange and the internal filler were removable), and the test chart was used. A print running test was carried out for up to 100,000 sheets in an environment of 20 ° C. and 40% with respect to the paper lateral feeding (using L paper manufactured by Fuji Xerox Co., Ltd.). The average thickness of the photosensitive layer after the running test was 15 μm, and the average surface roughness (Ra) of the reference line was 0.12 μm.
【0151】3.再生電子写真感光体の製造 (精密研磨)走行試験後の電子写真感光体を、ナイロン
ブラシによるブラシ研磨機(ナイロンブラシとして、パ
イル長30mm、太さ10デニール、密度150本/c
m2のものを使用し、研磨剤として、粒径30μmの酸
化ケイ素を蒸留水に50g/lで分散したものを使用)
により、研磨後の感光層の膜厚が14μm、膜厚変動が
±0.8μm、基準線平均表面粗さ(Ra)が0.05
μmになるように精密研磨した。研磨後、電子写真感光
体の残存電荷輸送層表面を、蒸留水を用いてブラシ洗浄
し、100℃で10分間乾燥した。[0151] 3. Manufacture of Recycled Electrophotographic Photoreceptor (Precision Polishing) The electrophotographic photoreceptor after the running test is brushed with a nylon brush (a nylon brush, pile length 30 mm, thickness 10 denier, density 150 pcs / c).
m 2 , and silicon oxide having a particle size of 30 μm dispersed in distilled water at 50 g / l is used as an abrasive)
The film thickness of the photosensitive layer after polishing was 14 μm, the film thickness variation was ± 0.8 μm, and the reference line average surface roughness (Ra) was 0.05.
Precision polishing was performed to a thickness of μm. After polishing, the surface of the remaining charge transport layer of the electrophotographic photoreceptor was brush-washed with distilled water and dried at 100 ° C. for 10 minutes.
【0152】(新しい表面層の形成)精密研磨およびそ
の後の洗浄を終えた電子写真感光体について、実施例1
と同様にして、再び、残存電荷輸送層を含む感光層全体
の膜厚が25μmとなるように電荷輸送層(新しい表面
層)を形成した。以上のようにして、実施例4の再生電
子写真感光体を製造した。(Formation of New Surface Layer) An electrophotographic photosensitive member which had been subjected to precision polishing and subsequent cleaning was used in Example 1.
In the same manner as described above, a charge transport layer (new surface layer) was formed again so that the film thickness of the entire photosensitive layer including the residual charge transport layer was 25 μm. As described above, the reproduced electrophotographic photosensitive member of Example 4 was manufactured.
【0153】4.再生電子写真感光体の走行試験 得られた再生電子写真感光体を用い、実施例1の「4.
再生電子写真感光体の走行試験」と同様にして、プリン
ト走行試験を実施した。このようにして得られた感光体
ドラムで、10万枚のプリント走行試験を実施した。結
果を下記表6にまとめて示す。4. Running Test of Reproduced Electrophotographic Photoreceptor The obtained regenerated electrophotographic photoreceptor was used and “4.
A print running test was performed in the same manner as in "Running Test of Reproduced Electrophotographic Photoconductor". A printing running test of 100,000 sheets was performed on the photosensitive drums thus obtained. The results are summarized in Table 6 below.
【0154】[実施例5]実施例4において、「3.再
生電子写真感光体の製造」の(新しい表面層の形成)の
項を下記工程に代えたことを除き、実施例4と同様にし
て、実施例5の再生電子写真感光体を製造した。さらに
実施例4と同様にして再生電子写真感光体の走行試験を
行った。結果を下記表6にまとめて示す。Example 5 The procedure of Example 4 was repeated, except that the section of (3. Production of Reproduced Electrophotographic Photoreceptor) (Formation of New Surface Layer) was changed to the following step. Thus, a reproduced electrophotographic photosensitive member of Example 5 was manufactured. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 4. The results are summarized in Table 6 below.
【0155】(新しい表面層の形成)下記構造式(e)
で表される化合物1部、前記構造式(4)で表されるビ
ュレット変性体溶液(固形分67重量%)2部、をシク
ロヘキサノン50部に溶解し、新しい表面層形成用の塗
布液を調製した。精密研磨およびその後の洗浄を終えた
電子写真感光体について、ドラムフランジおよび内部充
填材はそのままに、前記新しい表面層形成用の塗布液
を、前記残存電荷輸送層の上にフロー塗布により塗工
し、常温で10分間乾燥させた後150℃で60分加熱
し、膜厚10μm(残存電荷輸送層を含む感光層の14
μmは含まず)の電荷輸送層(新しい表面層)の電荷輸
送層(新しい表面層)を形成した。(Formation of New Surface Layer) The following structural formula (e)
Is dissolved in 50 parts of cyclohexanone to prepare a coating solution for forming a new surface layer, wherein 1 part of the compound represented by the formula and 2 parts of the modified buret solution (solid content 67% by weight) represented by the structural formula (4) are dissolved. did. With respect to the electrophotographic photoreceptor that has been subjected to precision polishing and subsequent cleaning, the coating solution for forming a new surface layer is coated on the remaining charge transport layer by flow coating while the drum flange and the internal filler are kept as they are. After drying at room temperature for 10 minutes, the film was heated at 150 ° C. for 60 minutes to form a film having a thickness of 10 μm (14 μm of the photosensitive layer including the residual charge transporting layer).
(excluding μm) of the charge transport layer (new surface layer).
【0156】[0156]
【化21】 Embedded image
【0157】なおここで、上記構造式(e)で表される
化合物と、前記構造式(4)で表されるビュレット変性
ポリイソシアネートと、の混合比は、[上記構造式
(e)で表される化合物におけるOH基の総モル数]:
[前記構造式(4)で表されるビュレット変性ポリイソ
シアネートにおけるイソシアネート基の総モル数]が、
およそ45:55となっている。Here, the mixing ratio of the compound represented by the structural formula (e) and the burette-modified polyisocyanate represented by the structural formula (4) is represented by the following formula: Total number of moles of OH groups in the compound to be obtained]:
[Total number of moles of isocyanate groups in the buret-modified polyisocyanate represented by the structural formula (4)]
It is approximately 45:55.
【0158】[実施例6]実施例4において、「3.再
生電子写真感光体の製造」の(新しい表面層の形成)の
項を下記工程に代えたことを除き、実施例4と同様にし
て、実施例6の再生電子写真感光体を製造した。さらに
実施例4と同様にして再生電子写真感光体の走行試験を
行った。結果を下記表6にまとめて示す。Example 6 The procedure of Example 4 was repeated, except that the section of (3. Production of Reproduced Electrophotographic Photoreceptor) (Formation of New Surface Layer) was changed to the following step. Thus, a regenerated electrophotographic photosensitive member of Example 6 was produced. Further, a running test of the reproduced electrophotographic photosensitive member was performed in the same manner as in Example 4. The results are summarized in Table 6 below.
【0159】(新しい表面層の形成)実施例3におい
て、前記構造式(d)で表される化合物の代わりに、下
記構造式(f)で表される化合物を用い、形成される電
荷輸送層(新しい表面層)の膜厚が8μm(残存電荷輸
送層を含む感光層の14μmは含まず)であることを除
き、実施例3と同様にして、電荷輸送層を形成した。(Formation of New Surface Layer) In Example 3, a compound represented by the following structural formula (f) was used in place of the compound represented by the above structural formula (d), and a charge transporting layer was formed. A charge transport layer was formed in the same manner as in Example 3, except that the thickness of the (new surface layer) was 8 μm (excluding 14 μm of the photosensitive layer including the residual charge transport layer).
【0160】[0160]
【化22】 Embedded image
【0161】表6Table 6
【表6】 [Table 6]
【0162】上記表6に示すように、実施例によれば新
品と同様もしくはそれ以上の画質および耐久性を有する
再生電子写真感光体を製造することができる事がわか
る。特に、機械的強度の高い電荷輸送層(新しい表面
層)を形成した実施例2,3,5および6では、良好な
画質の画像を極めて長期間に渡って形成することができ
る再生電子写真感光体を製造することができる事がわか
る。As shown in Table 6, according to the examples, it is found that a reproduced electrophotographic photosensitive member having image quality and durability equal to or better than that of a new article can be manufactured. In particular, in Examples 2, 3, 5, and 6 in which a charge transport layer (new surface layer) having high mechanical strength was formed, a reproduced electrophotographic photosensitive member capable of forming an image of good image quality for an extremely long period of time. You can see that the body can be manufactured.
【0163】これに対し、比較例1の再生電子写真感光
体では、電荷輸送層形成前の表面に洗浄により除去しき
れないトナー等の付着物による汚れが残存した状態で、
その上に電荷輸送層(新しい表面層)を形成しているた
め、そこに電荷が注入され黒点が生ずるものと考えられ
る。On the other hand, in the reproduced electrophotographic photosensitive member of Comparative Example 1, the surface of the surface before the formation of the charge transporting layer was contaminated with extraneous matter such as toner which could not be removed by washing.
Since the charge transport layer (new surface layer) is formed thereon, it is considered that charges are injected into the charge transport layer and black spots are generated.
【0164】また、比較例2の再生電子写真感光体で
は、溶剤により元の電荷輸送層を除去しているため、溶
解ムラが発生し、これによる電位ムラが発生して画像ム
ラを引き起こしていると考えられる。In the reproduced electrophotographic photoreceptor of Comparative Example 2, since the original charge transport layer was removed by the solvent, dissolution unevenness was generated, resulting in potential unevenness and image unevenness. it is conceivable that.
【0165】さらに、比較例3の再生電子写真感光体で
は、溶剤により元の感光層全体を除去しようとしている
が、溶剤では結局感光層の完全除去は困難であり、除去
し切れなかった感光層がディフェクトの原因になってい
るものと考えられる。Further, in the regenerated electrophotographic photoreceptor of Comparative Example 3, the solvent was intended to remove the entire original photosensitive layer. However, it was difficult to completely remove the photosensitive layer with the solvent. Is considered to be the cause of the defect.
【0166】[0166]
【発明の効果】以上のように、本発明の電子写真感光体
の再生方法によれば、使用済の電子写真感光体を、電荷
輸送層(またはさらに表面保護層)のみを再形成するだ
けで、使用可能な再生電子写真感光体を得ることができ
るため、再生が簡単かつ容易であり、材料の節約、工程
の短縮によるコストダウンを図ることができる。As described above, according to the method for reproducing an electrophotographic photoreceptor of the present invention, a used electrophotographic photoreceptor can be formed by simply re-forming only a charge transport layer (or a surface protective layer). In addition, since a usable reproduction electrophotographic photosensitive member can be obtained, the reproduction is simple and easy, and the cost can be reduced by saving materials and shortening the steps.
Claims (5)
有してなる使用済の電子写真感光体から、精密研磨によ
り、研磨後の膜厚変動が±1μm以下の範囲となるよう
に一定の膜厚を残して感光層を除去し、次いで、新しい
表面層を形成させることを特徴とする電子写真感光体の
再生方法。An electrophotographic photosensitive member having at least a photosensitive layer on the surface of a conductive substrate is subjected to precision polishing so that a thickness variation after polishing is within a range of ± 1 μm or less. A method for reproducing an electrophotographic photoreceptor, comprising removing a photosensitive layer while keeping a film thickness, and then forming a new surface layer.
ことを特徴とする請求項1に記載の電子写真感光体の再
生方法。2. The method according to claim 1, wherein the new surface layer is a charge transport layer.
表面保護層であることを特徴とする請求項1に記載の電
子写真感光体の再生方法。3. The method according to claim 1, wherein the new surface layer is a charge transport layer and a surface protection layer.
電子写真感光体の再生方法により再生されたことを特徴
とする再生電子写真感光体。4. A reproduced electrophotographic photosensitive member reproduced by the method for reproducing an electrophotographic photosensitive member according to claim 1.
a)が、0.1μm以下であることを特徴とする請求項
4に記載の再生電子写真感光体。5. The reference line average roughness (R) of the surface after precision polishing
The reproduction electrophotographic photoreceptor according to claim 4, wherein a) is 0.1 μm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25219399A JP2001075295A (en) | 1999-09-06 | 1999-09-06 | Method of regenerating electrophotographic photoreceptor and regenerated electrophotographic photoreceptor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25219399A JP2001075295A (en) | 1999-09-06 | 1999-09-06 | Method of regenerating electrophotographic photoreceptor and regenerated electrophotographic photoreceptor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001075295A true JP2001075295A (en) | 2001-03-23 |
Family
ID=17233806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25219399A Pending JP2001075295A (en) | 1999-09-06 | 1999-09-06 | Method of regenerating electrophotographic photoreceptor and regenerated electrophotographic photoreceptor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001075295A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007225761A (en) * | 2006-02-22 | 2007-09-06 | Ricoh Co Ltd | Electrophotographic photosensitive member and reproducing method thereof, process cartridge, image forming apparatus, and image forming method |
| JP2008040466A (en) * | 2006-03-13 | 2008-02-21 | Ricoh Co Ltd | Photoreceptor and method for manufacturing the same |
| JP2013176829A (en) * | 2012-02-29 | 2013-09-09 | Ricoh Co Ltd | Polishing method, polishing device and method for manufacturing photoreceptor |
| KR102014531B1 (en) * | 2019-04-23 | 2019-08-26 | 해성태프론 주식회사 | Cartridges with re-coated OPC drums |
| KR102014532B1 (en) * | 2019-04-23 | 2019-08-26 | 해성태프론 주식회사 | Cartridges with re-coated OPC drums with surface modifying type |
-
1999
- 1999-09-06 JP JP25219399A patent/JP2001075295A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007225761A (en) * | 2006-02-22 | 2007-09-06 | Ricoh Co Ltd | Electrophotographic photosensitive member and reproducing method thereof, process cartridge, image forming apparatus, and image forming method |
| JP2008040466A (en) * | 2006-03-13 | 2008-02-21 | Ricoh Co Ltd | Photoreceptor and method for manufacturing the same |
| JP2013176829A (en) * | 2012-02-29 | 2013-09-09 | Ricoh Co Ltd | Polishing method, polishing device and method for manufacturing photoreceptor |
| KR102014531B1 (en) * | 2019-04-23 | 2019-08-26 | 해성태프론 주식회사 | Cartridges with re-coated OPC drums |
| KR102014532B1 (en) * | 2019-04-23 | 2019-08-26 | 해성태프론 주식회사 | Cartridges with re-coated OPC drums with surface modifying type |
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