JP2001059904A - Light scattering film forming composition and light scattering film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form a light scattering film in a liquid crystal display, which efficiently scatters reflected light, realizes uniform and high-brightness surface illumination, and also has basic physical properties as a protective film. Provided are a composition and a light-scattering film obtained therefrom. The object of the present invention is to provide [A] (a1) an unsaturated carboxylic acid and / or an unsaturated carboxylic anhydride,
(A2) an epoxy group-containing unsaturated compound, (a3) a copolymer of an olefinic unsaturated compound other than the monomers (a1) and (a2), and [B] a light-scattering substance. Is achieved by the composition for forming a light-scattering film. The light scattering film is formed from the above composition.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a curable composition for a light-scattering film used for a liquid crystal display or the like, and a light-scattering film formed therefrom.

[0002]

2. Description of the Related Art Conventionally, a liquid crystal display having a backlight unit has been mainly used because a surface illumination which is uniform and has high front luminance is required. However, in recent years, due to the spread of portable terminals and the like, transflective and reflective liquid crystal displays have been increasingly used from the viewpoint of power saving.
In transflective and reflective liquid crystal displays, a reflective plate such as an aluminum plate is provided below the liquid crystal panel, and brightness is obtained by reflecting light from the upper part of the panel. However, according to this method, since the reflecting plate is flat, if the incident direction of the incident light from the upper part of the panel is oblique, the direction of the reflected light is shifted from the front direction of the panel, and sufficient front luminance cannot be obtained.

[0003] In order to improve the above-mentioned drawbacks in the reflection type liquid crystal display, a technique using a so-called light diffusion plate has been proposed. This method diffuses the direction of reflected light by giving a fine uneven shape to the surface of the reflector,
This is for obtaining front luminance. However, in this method, it is necessary to complicate the shape of the light diffusing plate, so that the steps are complicated and the process and cost are disadvantageous.

In order to solve the above problem, Japanese Patent Laid-Open No. 7-2
JP-A-61164, JP-A-7-98452 and the like propose a technique using a light-scattering film. These publications disclose that a film obtained from a composition in which a light-scattering substance such as calcium fluoride, titanium oxide, polytetrafluoroethylene, or the like is dispersed is placed above a color filter to scatter incident light and reflected light. At least, it is disclosed that a high front luminance can be realized thereby. However, in the film obtained from the above composition, the functions that should be originally provided as a protective film, that is, planarization, heat resistance, chemical resistance,
Physical properties such as adhesion to a transparent electrode (ITO film) are impaired by the presence of a light-scattering substance, and have not yet reached a practical level.

[0005]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has as its object to efficiently scatter reflected light in a transflective or reflective liquid crystal display to achieve uniformity. To provide a curable composition for realizing surface illumination with high front luminance, having excellent flatness, heat resistance and chemical resistance, and forming a light-scattering film having high adhesion to an ITO film. is there. Still another object of the present invention is to provide a light-scattering film formed from the curable composition.

[0006]

The present invention firstly provides:
[A] (a1) unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, (a2) unsaturated compound containing an epoxy group, (a3) olefinic unsaturated other than the monomers (a1) and (a2) It comprises a light-scattering film-forming composition (hereinafter, referred to as "first invention") containing a copolymer of a compound and [B] a light-scattering substance. The present invention secondly provides the composition for forming a light-scattering film of the first invention,
It further comprises a composition for forming a light-scattering film (hereinafter, referred to as "second invention"), which further comprises [C] a polyfunctional monomer and [D] a heat-sensitive polymerization initiator. Thirdly, the light-scattering film forming composition of the first invention further comprises an epoxy compound other than the components [E] and [A] and an acid generator [F]. The composition comprises a composition for forming a conductive film (hereinafter, referred to as “third invention”). Fourth, the present invention relates to a light-scattering film formed from the light-scattering film-forming composition of the first to third inventions (hereinafter referred to as a "fourth invention").
That. ). Hereinafter, the resin composition for a light-scattering film of the present invention will be described in detail.

The resin composition for a light-scattering film according to the first invention comprises:
[A] (a1) unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, (a2) unsaturated compound containing an epoxy group, (a3) olefinic unsaturated other than the monomers (a1) and (a2) It is characterized by containing a compound copolymer and [B] a light-scattering substance. Hereinafter, each component of the resin composition for a light-scattering film of the first invention will be described.

Copolymer [A] Copolymer [A] is obtained by copolymerizing compounds (a1), (a2) and (a3). Examples of the compound (a1) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; unsaturated dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; An anhydride of dicarboxylic acid may be mentioned. Among them, acrylic acid, methacrylic acid, maleic anhydride and the like are preferably used in view of copolymerization reactivity, solubility in an aqueous alkali solution, and easy availability. These components (a1) may be used alone or in combination of two or more.

The copolymer [A] contains a structural unit derived from the compound (a1) preferably in an amount of 1 to 50% by weight, particularly preferably 5 to 40% by weight. In the use in this range, the copolymer [A] has flattening property, adhesiveness,
Optimum performance will be exhibited in application properties and heat resistance.

The compound (a2) includes glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, α-ethylglycidyl acrylate, α-n-
Glycidyl (meth) acrylates and derivatives thereof, such as glycidyl propyl acrylate and glycidyl α-n-butyl acrylate; (meth) acrylic acid-3,4
Unsaturated epoxy compounds such as epoxybutyl, 4,5-epoxypentyl (meth) acrylate, 6,7-epoxyheptyl (meth) acrylate, and 6,7-epoxyheptyl α-ethylacrylate; Can be mentioned. Of these, glycidyl (meth) acrylate,
2-Methylglycidyl (meth) acrylate is preferably used from the viewpoints of copolymerization reactivity, flatness and the like. These components (a2) may be used alone or in combination of two or more.

The copolymer [A] contains the structural unit derived from the compound (a2) preferably in an amount of 5 to 80% by weight, particularly preferably 7 to 70% by weight. When used in this range, the copolymer [A] exhibits optimal performance in flatness, heat resistance and adhesion.

As the compound (a3), methyl (meth) acrylate, ethyl (meth) acrylate, (meth)
Butyl acrylate, 2-ethylhexyl (meth) acrylate, phenyl (meth) acrylate, cyclohexyl (meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decane-8- (meth) acrylate (Meth) acrylates such as yl (commonly known in the art as dicyclopentanyl (meth) acrylate), dicyclopentanyloxyethyl (meth) acrylate, and isobornyl (meth) acrylate And vinyl aromatic compounds such as styrene, α-methylstyrene, p-methylstyrene and vinylnaphthalene; indene derivatives such as indene and 1-methylindene; phenylmaleimide, benzylmaleimide, cyclohexylmaleimide, and N-succinimidyl 3-maleimidobenzoate, N-succinimidyl-4-male Dicarbonylimide derivatives such as imidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3-maleimidopropionate, N- (9-acridyl) maleimide;
Examples thereof include conjugated dienes such as butadiene and isoprene. Among these, (meth) acrylates, dicarbonylimide derivatives, and the like are preferably used from the viewpoint of adhesion, flatness, and the like. These components (a3) may be used alone or in combination of two or more.

The copolymer [A] preferably contains 1 to 40% by weight, particularly preferably 2 to 35% by weight of a structural unit derived from the compound (a3). In the use in this range, the copolymer [A] exhibits optimum performance in terms of adhesion, flatness, and the like.

The weight average molecular weight (Mw) of the copolymer [A] in terms of polystyrene is usually from 3,000 to 300,000.
0, preferably 3,000 to 100,000, more preferably 3,000 to 50,000. By employing Mw in this range for the copolymer [A], an excellent balance can be achieved in various properties such as flatness, transparency, storage stability, adhesion, and light scattering ability of the cured film. Show.

[B] Light-Scattering Substance [B] The light-scattering substance is a substance that has the function of scattering reflected light and increasing the front luminance of the liquid crystal display panel. [B] Examples of the light scattering substance include metal oxide particles such as silica, titania, and alumina; organic fine particles such as benzoguanamine and styrene / divinylbenzene copolymer; minerals such as mica; aluminum, tin, and gold. Among them, metal oxide particles are preferable, and among these, metal oxide particles are preferable because of a large difference in refractive index from the component [A] and a large light scattering effect, and silica is particularly preferably used.

[B] The light-scattering substance may be in any shape as long as it has light-scattering properties, but is preferably spherical or substantially spherical. The particle size is preferably from 0.01 to 20 μm, and particularly preferably from 0.3 to 10 μm. By using a light-scattering substance having such a shape and size, the front luminance of the panel can be effectively improved.

Commercial products of the light scattering material [B] include nip seals SS-10, SS-15, SS-10A and SS as metal oxide particles such as silica.
S-20, SS-30S, SS-30P, SS-
30A, SS-40, SS-50, SS-70,
SS-72F, SS-115, SS-170X,
E-75, E-150, E-200A, E-2
20A, K-300 (Nippon Silica Industry Co., Ltd.)
Manufactured), Sylysia 250, 250N, 256, 2
56N, 310, 320, 350, 358, 430, 431, 440, 450, 470, 435, 445, 436, 446, 456, 530, 540, 550, 730, 740, and 770 (all manufactured by Fuji Silysia Chemical Ltd.), Micropearl (manufactured by Sekisui Fine Chemical Co., Ltd.), Tospearl 1
05, 120, 130, 145, 3120, 240 (all manufactured by Toshiba Silicon Corp.), Aeros
IL130, 200, 200V, 200CF, 200FAD, 300, 300CF, 380, R972, R974, RX200, RY200,
R202, R805, R812, OX50, TT600, MOX170, COK84 (all manufactured by Nippon Aerosil Co., Ltd.); Epocolor, EP series, MA series, Eposter L15, MS, M30, S12, S6, S, Eposter MA1001, 1002, 100
4, 1006, 1010, 1013, Eposter GP-H series, Seahoster KE-E series, and KE-P (all manufactured by Nippon Shokubai Co., Ltd.); As minerals such as mica, natural mica and synthetic Mica pearl pigment, Artmica SA-100, SB-100, YB-100,
BB-100 (all manufactured by Nippon Koken Kogyo KK) and the like.

The amount of the light-scattering substance [B] is usually 1 to 80 parts by weight, preferably 3 to 60 parts by weight, per 100 parts by weight of the copolymer [A]. By using this range, a light scattering plate having an excellent balance between transparency and light scattering can be provided.

[B] The light-scattering material is a copolymer [A]
A dispersant can be used in combination in order to effectively disperse therein. Examples of such dispersants include silane coupling agents, urethane-based dispersants, polyethyleneimine-based dispersants, polyoxyethylene ethers, and polyethylene glycol esters, among which silane coupling agents, Urethane-based dispersants are preferably used.

Examples of the silane coupling agent include silane coupling agents having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, and an epoxy group. Specific examples include trimethoxysilylbenzoic acid, γ Methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltris (2
-Methoxyethoxy) silane, N- (2-aminoethyl) 3-aminopropylmethyldimethoxysilane, N-
(2-aminoethyl) 3-aminopropylmethyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ
-Glycidoxypropylmethyldimethoxysilane, γ-
Chloropropylmethyldimethoxysilane, γ-chloropropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, vinyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, γ-glycidoxy Propyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane and the like.

The urethane-based dispersant is preferably a reaction product of an aromatic diisocyanate and a polylactone having a hydroxyl group at one end and / or a polylactone having a hydroxyl group at both ends, and particularly preferred is tolylene diisocyanate. A reaction product of the compound and a polycaprolactone having a hydroxyl group at one end and / or a polycaprolactone having a hydroxyl group at both ends is preferred. Specific examples of these urethane-based dispersants include trade names such as EFKA (manufactured by EFKA Chemicals, Inc., EFKA), Disperbyk (manufactured by BYK (BYK)), and Dispalon (manufactured by Kusumoto Kasei Co., Ltd.). be able to.

When the above dispersant is used, the amount used is
[B] 100 parts by weight of the light-scattering substance is usually 100 parts
It is not more than 5 parts by weight, preferably 5 to 70 parts by weight. In the use amount in this range, the [B] light-scattering substance is effectively dispersed in the [A] component, and the physical properties such as the transparency, heat resistance, and flatness of the formed light-scattering film are impaired. There is no.

In the second invention, the composition for forming a light-scattering film according to the first invention further comprises a polyfunctional monomer [C] and a heat-sensitive polymerization initiator [D]. And a composition suitable for a method utilizing radical polymerization. Hereinafter, the component [C] and the component [D] in the second invention will be described in detail.

The polyfunctional monomer as the component (C) has two or more polymerizable ethylenically unsaturated bonds,
It is a monomer that can be polymerized by radical species generated when the below-mentioned [D] heat-sensitive polymerization initiator is heated. Such polyfunctional monomers include, for example, diacrylates or dimethacrylates of alkylene glycols such as ethylene glycol and propylene glycol; diacrylates or dimethacrylates of polyalkylene glycols such as polyethylene glycol and polypropylene glycol; glycerin , Trimethylolpropane, pentaerythritol, polyacrylates or polymethacrylates of trihydric or higher polyhydric alcohols such as dipentaerythritol, and modified dicarboxylic acids thereof; polyesters, urethane resins, alkyd resins, silicone resins,
Oligoacrylates or oligomethacrylates such as spirane resins; diacrylates or dimethacrylates of hydroxyl-terminated polymers such as hydroxy-poly-1,3-butadiene at both ends, hydroxy-polyisoprene at both ends and hydroxy-polycaprolactone at both ends ,
Trisacryloyloxyethyl phosphate, trismethacryloyloxyethyl phosphate and the like can be mentioned.

Of these polyfunctional monomers, polyacrylates or polymethacrylates of trihydric or higher polyhydric alcohols are preferred. Specifically, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol Triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, succinic acid-modified pentaerythritol triacrylate, Examples include succinic acid-modified pentaerythritol trimethacrylate. , In particular, trimethylol propane triacrylate, pentaerythritol triacrylate, bisphenol A dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate are preferable. In addition to the above, commercially available products such as Aronix TO-1450 (manufactured by Toagosei Co., Ltd.) can also be suitably used. First
In the present invention, the polyfunctional monomer [C] can be used alone or in combination of two or more.

The amount of the component [C] used is 100 parts of the component [A].
It is usually 10 to 200 parts by weight, preferably 20 to 150 parts by weight, per part by weight. When used in this range, a light-scattering film having excellent heat resistance, high flatness, high light transmittance, adhesion and chemical resistance is provided.

The component [D] is a compound capable of generating a radical by heating and initiating the polymerization of the component [C]. Examples of such compounds include biimidazole compounds, benzoin compounds, triazine compounds, acetophenone compounds, benzophenone compounds, α-diketone compounds, polynuclear quinone compounds, xanthone compounds, and azo compounds. Of these, biimidazole compounds, triazine compounds, acetophenone compounds, and azo compounds are preferred.

The biimidazole compounds include 2,2
2'-bis (2-chlorophenyl) -4,4 ', 5
5'-tetrakis (4-ethoxycarbonylphenyl)
-1,2'-biimidazole, 2,2'-bis (2-bromophenyl) -4,4 ', 5,5'-tetrakis (4
-Ethoxycarbonylphenyl) -1,2'-biimidazole, 2,2'-bis (2-chlorophenyl) -4,
4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4-dichlorophenyl)
-4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4,6-trichlorophenyl) -4,4', 5,5'-tetra Phenyl-
1,2′-biimidazole, 2,2′-bis (2-bromophenyl) -4,4 ′, 5,5′-tetraphenyl-
1,2′-biimidazole, 2,2′-bis (2,4-
Dibromophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4,6-tribromophenyl) -4,4 ′, 5
5′-tetraphenyl-1,2′-biimidazole and the like can be mentioned.

Of these biimidazole compounds,
Preferred compounds are 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'
-Biimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-
1,2′-biimidazole, 2,2′-bis (2,4,
6-trichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, and particularly preferred compounds are 2,2′-bis (2,4-dichlorophenyl) -4, 4 ', 5,5'-tetraphenyl-
1,2'-biimidazole.

Specific examples of the above triazine compounds include 2,4,6-tris (trichloromethyl) -s
-Triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s -Triazine, 2- [2- (furan-2
-Yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s- Triazine, 2- [2-
(3,4-dimethoxyphenyl) ethenyl] -4,6-
Bis (trichloromethyl) -s-triazine, 2- (4
-Methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl)
Triazine compounds having a halomethyl group such as -4,6-bis (trichloromethyl) -s-triazine and 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine are exemplified. be able to.

Of these triazine compounds, 2-
[2- (3,4-dimethoxyphenyl) ethenyl]-
4,6-bis (trichloromethyl) -s-triazine is preferred. These triazine compounds can be used alone or in combination of two or more.

Specific examples of the acetophenone compound include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone. -1, 2
-Benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1,1-hydroxy-cyclohexyl-phenyl-ketone, 2,2-dimethoxy-
1,2-diphenylethan-1-one and the like can be mentioned.

Of these acetophenone compounds,
In particular, 2-benzyl-2-dimethylamino-1- (4-
Morpholinophenyl) butanone-1 is preferred. The acetophenone-based compounds can be used alone or in combination of two or more.

Specific examples of the azo compound include 2,2
2'-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis (4-dimethylvaleronitrile), 2,2'-azobis (2-methylpropionitrile), 2,2 ' -Azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1
-Carbonitrile), 4,4'-azobis (4-cyanovaleric acid), 1,1'-azobis (1-acetoxy-1-phenylethane) and the like. Among these azo compounds, in particular, 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2′-azobis (4-dimethylvaleronitrile), 2,2′-azobis (2 -Methylpropionitrile), 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile) and the like can be preferably used.

[D] The amount of the heat-sensitive polymerization initiator used is
[C] Usually, based on 100 parts by weight of the polyfunctional monomer,
It is 0.01 to 40 parts by weight, preferably 0.5 to 30 parts by weight, more preferably 1 to 20 parts by weight.

According to a third invention, the composition for forming a light-scattering film of the first invention further comprises an epoxy compound other than the components [E] and [A] and an acid generator [F]. An object of the present invention is to provide a composition suitable for a method utilizing a curing reaction of an epoxy compound with an acid in a film forming step.
Hereinafter, the component [E] and the component [F] in the second invention will be described in detail.

[E] The epoxy compound other than the component [A] is reacted with an acid generated from an acid generator [F] to be described later to form an epoxy compound.
It is a component that causes a polymerization or cross-linking reaction and has an effect of performing a curing reaction of the composition coating film. Examples of the epoxy compound other than the above components [E] and [A] include bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, bisphenol F epoxy resin, and hydrogenated bisphenol F
Epoxy resin, bisphenol S epoxy resin, hydrogenated bisphenol S epoxy resin, bisphenol AD epoxy resin, hydrogenated bisphenol AD epoxy resin, novolak epoxy resin, cycloaliphatic epoxy resin, heterocyclic epoxy resin Epoxy resins such as glycidyl ester resins, glycidylamine resins, epoxidized oils, epoxy novolak resins, and bromides thereof;

Bisphenol A diglycidyl ether,
Bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, bisphenol AD diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, hydrogenated bisphenol S diglycidyl ether, hydrogenated bisphenol AD diglycidyl ether, Brominated bisphenol A diglycidyl ether, brominated bisphenol F diglycidyl ether, brominated bisphenol S diglycidyl ether, brominated bisphenol AD
Examples thereof include aromatic epoxy compounds such as diglycidyl ether.

Among these epoxy compounds, epoxy resins are preferred because the hardness of the light-scattering film after curing is high and there is little adverse effect on other film properties. In particular, bisphenol A epoxy resins, novolak epoxy resins, An epoxy resin having 2 to 100 epoxy groups, such as a cycloaliphatic epoxy resin, is preferably used.

Commercial products of these epoxy resins include Epicoat 82 as bisphenol A type epoxy resin.
8, 834, 1001, 1002, 1003,
1004, 1007, 1009, 1010, 157SS65 (all manufactured by Yuka Shell Epoxy Co., Ltd.)
And the like as Epiphenols 806, 806L, and 807 as bisphenol F-type epoxy resins (all manufactured by Yuka Shell Epoxy Co., Ltd.), and Epicoat 152 and 154 as the novolak type epoxy resins (both manufactured by Yuka Shell Epoxy Co., Ltd.) ), EPPN201 and EPPN201 (all manufactured by Nippon Kayaku Co., Ltd.), EOCN-102, EOCN-103
S, EOCN-104S, EOCN-1020, EOC
N-1025, EOCN-1027 (manufactured by Nippon Kayaku Co., Ltd.), Epicoat 180S75 (manufactured by Yuka Shell Epoxy Co., Ltd.), etc., and Epicoat 1032H60 (manufactured by Yuka Shell Epoxy Co., Ltd.) as a polyfunctional epoxy resin. ),
CY175, CY17 as cyclic aliphatic epoxy resin
7, CY179 (above, CIBA-GEIGY AG)
ERL-4234, ERL-4299, ERL-
4221, ERL-4206 (manufactured by UCC), Shodyne 509 (manufactured by Showa Denko KK), Araldite CY-182, CY-192, and CY-18
4 (manufactured by CIBA-GEIGY AG), Epicron 200, 400 (manufactured by Dainippon Ink Industries, Ltd.)
Epicoat 871, 872 (manufactured by Yuka Shell Epoxy Co., Ltd.), ED-5661, ED-5662.
(Above, manufactured by Celanese Coatings Co., Ltd.) and the like.

The amount of the component [E] is usually 1 to 250 parts by weight, preferably 3 to 200 parts by weight, per 100 parts by weight of the component [A]. A light scattering film forming composition excellent in flattening property, adhesion, coating property and heat resistance can be obtained in the use amount in this range. The component [A] can also be called an “epoxy compound”, but the component [A] is different from the component [E] in that it has alkali solubility and is required to have a relatively high molecular weight.

The component [F] is a heat-sensitive acid generator which generates an acid upon heating, and is a compound which performs a curing reaction of the component [E], and includes diaryliodonium salts, triarylsulfonium salts, and sulfonium salts ( Excluding the aforementioned triarylsulfonium salts), benzothiazonium salts, ammonium salts, phosphonium salts and the like,
Of these, sulfonium salts (excluding the above-mentioned triarylsulfonium salts) and benzothiazonium salts are preferably used.

Examples of the above diaryliodonium salts include diphenyliodonium tetrafluoroborate, diphenyliodonium hexafluorophosphonate, diphenyliodonium hexafluoroarsenate, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium trifluoroacetate, diphenyliodonium-p-toluenesulfonate. Nate, 4-methoxyphenylphenyliodonium tetrafluoroborate, 4-methoxyphenylphenyliodonium hexafluorophosphonate, 4-methoxyphenylphenyliodonium hexafluoroarsenate, 4-methoxyphenylphenyliodonium trifluoromethanesulfonate, 4-methoxyphenylphenyliodonium Li trifluoroacetate, 4-methoxyphenyl phenyl iodonium -p- toluenesulfonate, bis (4-tert- butylphenyl) iodonium tetrafluoroborate, bis (4-tert
-Butylphenyl) iodonium hexafluoroarsenate, bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate, bis (4-t
tert-butylphenyl) iodonium trifluoroacetate, bis (4-tert-butylphenyl) iodonium-p-toluenesulfonate and the like.
Among these, diphenyliodonium hexafluorophosphonate is preferably used.

The above triarylsulfonium salts include, for example, triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluorophosphonate, triphenylsulfonium hexafluoroarsenate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium trifluoroacetate, Phenylsulfonium-p-toluenesulfonate, 4-methoxyphenyldiphenylsulfonium tetrafluoroborate, 4-methoxyphenyldiphenylsulfonium hexafluorophosphonate, 4-methoxyphenyldiphenylsulfonium hexafluoroarsenate, 4-methoxyphenyldiphenylsulfonium trifluoromethanesulfonate , 4
-Methoxyphenyldiphenylsulfonium trifluoroacetate, 4-methoxyphenyldiphenylsulfonium-p-toluenesulfonate, 4-phenylthiophenyldiphenyltetrafluoroborate, 4-phenylthiophenyldiphenylhexafluorophosphonate, 4-phenylthiophenyldiphenylhexafluoro Arsenate, 4-phenylthiophenyldiphenyltrifluoromethanesulfonate, 4-phenylthiophenyldiphenyltrifluoroacetate, 4-phenylthiophenyldiphenyl-p-toluenesulfonate and the like can be mentioned. Among these, triphenylsulfonium trifluoromethanesulfonate is preferably used.

Specific examples of the above sulfonium salt (excluding the above triarylsulfonium salt) include 4-acetophenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, dimethyl-4- (benzyl) Oxycarbonyloxy) phenylsulfonium hexafluoroantimonate, dimethyl-4- (benzoyloxy) phenylsulfonium hexafluoroantimonate, dimethyl-4- (benzoyloxy) phenylsulfonium hexafluoroarsenate, dimethyl-3-chloro-4-acetoxy Alkylsulfonium salts such as phenylsulfonium hexafluoroantimonate; benzyl-4-hydroxyphenylmethylsulfonium hexa Fluoroantimonate, benzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimonate, benzyl-4-methoxyphenylmethylsulfonium hexafluoroantimonate, benzyl-2-methyl-4-hydroxy Phenylmethylsulfonium hexafluoroantimonate, benzyl-3
Benzylsulfonium salts such as -chloro-4-hydroxyphenylmethylsulfonium hexafluoroarsenate, 4-methoxybenzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate;

Dibenzyl-4-hydroxyphenylsulfonium hexafluoroantimonate, dibenzyl-4-hydroxyphenylsulfonium hexafluorophosphate, 4-acetoxyphenyldibenzylsulfonium hexafluoroantimonate, dibenzyl-4-methoxyphenylsulfonium hexafluoroantimonate, Dibenzyl-3-chloro-4-hydroxyphenylsulfonium hexafluoroarsenate, dibenzyl-3-methyl-4-hydroxy-5-
tert-butylphenylsulfonium hexafluoroantimonate, benzyl-4-methoxybenzyl-
Dibenzylsulfonium salts such as 4-hydroxyphenylsulfonium hexafluorophosphate; p-chlorobenzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, p-nitrobenzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, p-chloro Benzyl-4
-Hydroxyphenylmethylsulfonium hexafluorophosphate, p-nitrobenzyl-3-methyl-
4-hydroxyphenylmethylsulfonium hexafluoroantimonate, 3,5-dichlorobenzyl-4
And substituted benzylsulfonium salts such as -hydroxyphenylmethylsulfonium hexafluoroantimonate and o-chlorobenzyl-3-chloro-4-hydroxyphenylmethylsulfonium hexafluoroantimonate. Among them, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, benzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimonate, dibenzyl-4-hydroxyphenylsulfonium hexafluoroantimonate Nate, 4
-Acetoxyphenylbenzylsulfonium hexafluoroantimonate and the like are preferably used.

The benzothiazonium salts include 3-
Benzylbenzothiazonium hexafluoroantimonate, 3-benzylbenzothiazonium hexafluorophosphate, 3-benzylbenzothiazonium
Tetrafluoroborate, 3- (p-methoxybenzyl) benzothiazonium hexafluoroantimonate, 3-benzyl-2-methylthiobenzothiazonium hexafluoroantimonate, 3-benzyl-5-
Benzylbenzothiazonium salts such as chlorobenzothiazonium hexafluoroantimonate. Of these, 3-benzylbenzothiazonium
Hexafluoroantimonate and the like are preferably used. The amount of the component [F] used is usually 1 to 40 per 100 parts by weight of the epoxy compound other than the components [E] and [A].
Parts by weight, preferably 5 to 30 parts by weight. When used in this range, good curing characteristics are obtained, and the physical properties of the light-scattering film after curing are not impaired.

Other Additives The light-scattering film forming compositions of the first and second inventions may contain additives other than those described above, if necessary. For example, a surfactant can be blended in order to improve the coating properties and the like of the composition. As the surfactant, for example, a fluorine-based surfactant and a silicone-based surfactant can be suitably used.

As the fluorinated surfactant, a compound having at least one fluoroalkyl or fluoroalkylene group can be used, and specific examples thereof include 1,2,2,2-tetrafluorooctyl (1,1)
1,2,2-tetrafluoropropyl) ether, 1,
2,2,2-tetrafluorohexyl ether, octaethylene glycol di (1,1,2,2-tetrafluorobutyl) ether, hexaethylene glycol di (1,1,2,2,3,3-hexafluoropentyl) )
Ether, octapropylene glycol di (1,1,
2,2-tetrafluorobutyl) ether, hexapropylene glycol di (1,1,2,2,3,3-hexafluoropentyl) ether, sodium perfluorododecylsulfonate, 1,1,2,2,8, 8, 9,
9,10,10-decafluorododecane, 1,1,2,2
2,3,3-hexafluorodecane and the like can be mentioned. In addition, sodium fluoroalkylbenzene sulfonates, fluoroalkyloxyethylene ethers, diglycerin tetrakisfluoroalkylpolyoxyethylene ethers, perfluoroalkylpolyoxyethanols, perfluoroalkylalkoxylates, and fluorine-based alkyl esters Can also be suitably used.

Commercial products of these fluorine-based surfactants include BM-1000 and BM-1100 (above, BMC C)
Hemie), F-top EF301, 303
352 (all manufactured by Shin-Akita Kasei Co., Ltd.), MegaFac F142D, F171, 172, 173, and F1
83, F178, F191, and F471 (all manufactured by Dainippon Ink Co., Ltd.), Florad FC430, and 43
1, 170C, FC171, FC430, FC
431 (all manufactured by Sumitomo 3M Limited), Asahi Guard AG710, Surflon S-382, SC-101,
102, 103, 104, 105, and 106 (all manufactured by Asahi Glass Co., Ltd.).

Examples of the silicone surfactant include organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), acrylic acid-based or methacrylic acid-based (co)
Polymer polyflow Nos. 57 and 95 (all manufactured by Kyoeisha Chemical Co., Ltd.), Toray Silicone DC3PA, DC7P
A, SH11PA, SH21PA, SH28P
A, SH29PA, SH30PA, FS-126
5-300 (from Toray Dow Corning Silicone Co., Ltd.), TSF-4440, TSF-4300, T
SF-4445, TSF-4446, TSF-446
0, TSF-4452 (Toshiba Silicone Co., Ltd.)
Commercially available products.

In addition to the above-mentioned fluorine-based surfactants and silicone-based surfactants, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, and polyoxyethylene oleyl ether; Octyl phenyl ether, polyoxyethylene aryl ethers such as polyoxyethylene nonyl phenyl ether,
Polyethylene glycol dialkyl esters such as polyethylene glycol dilaurate and polyethylene glycol distearate can also be suitably used.
These surfactants can be used alone or in combination of two or more. The usage ratio of these surfactants varies depending on the type and the ratio of each component constituting the curing agent composition, but preferably, the component (A)
0 to 10 parts by weight, more preferably 0.1 to 100 parts by weight, per 100 parts.
It is used in the range of 0001 to 5 parts by weight.

The compositions of the first to third inventions may also contain an adhesion aid for improving the adhesion to the substrate or the lower layer. The compositions of the first to third aspects of the present invention may further contain, if necessary, a storage stabilizer, an antifoaming agent, and the like.

Solvent The curable compositions for light-scattering films of the first to third inventions are prepared in a state of being uniformly dispersed in a solvent so that the solid concentration is preferably 10 to 40% by weight. Examples of the solvent used in this case include alcohols such as diacetone alcohol and propylene glycol; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetate such as methyl cellosolve acetate and ethyl cellosolve acetate. Diethylene glycol alkyl ethers such as diethylene glycol monomethyl ether and diethylene glycol monoethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate and propylene glycol monopropyl ether acetate; toluene, xylene and the like Aromatic hydrocarbons; Ketones such as ethyl ketone, cyclohexanone, 2-heptanone and methyl isobutyl ketone, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2-methylpropionic acid ethyl,
Ethyl ethoxyacetate, ethyl oxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, 3-methyl-3-methoxybutyl butyrate And esters such as ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate and butyl 3-methoxypropionate. These solvents can be used alone or as a mixture.

Further, if necessary, benzyl ethyl ether, dihexyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, acetonylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl High boiling solvents such as alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, carbitol acetate and the like can also be added. The composition solution prepared as described above can be used after being filtered through a polyflon filter having a pore size of about 10 μm.

Method for Forming Light-Scattering Film Next, a method for forming the light-scattering film of the fourth invention using the composition for forming a light-scattering film of the first to third inventions will be described. The light-scattering film of the fourth invention may be formed as a second film on the flattening film formed on the substrate, or the light-scattering film of the first to third inventions may be added to the composition for forming a flattening film. The flattening film may be provided with a light scattering function using the composition for forming a conductive film.

In order to form the light-scattering film of the fourth invention, first, the composition for forming a light-scattering film of the first to third inventions is applied to the surface of a substrate, and the solvent is removed by pre-firing. Removal forms a coating of the curable composition. Thereafter, by performing the main baking, the light-scattering film of the fourth invention can be obtained.

In the above, the method of applying the composition for forming a light-scattering film of the first to third inventions is not particularly limited, and an appropriate method such as a spray method, a roll coating method, a spin coating method and the like is employed. it can. The conditions of the pre-baking vary depending on the type of each component of the composition solution, the usage ratio, and the like,
Usually, it is about 30 seconds to 20 minutes at 60 to 120 ° C.
The conditions for the main firing are usually at 150 to 250 ° C. for about 30 minutes to 2 hours. In addition, each of the preliminary firing and the main firing can be performed in one step or in a combination of two or more steps.

As described above, the composition for forming a light-scattering film of the present invention can form a light-scattering film by a simple process. In addition, the light-scattering film of the present invention has high transparency and has a property of efficiently scattering light, as is apparent from the following examples, and furthermore, a flattening film or a protective film is very various. It has excellent physical properties.

[0060]

The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

Synthesis Example 1 (Synthesis of Copolymer [A1] ) As the component (a1), 20 parts by weight of acrylic acid and (a2)
45 parts by weight of glycidyl methacrylate as a component, (a
3) As components, 20 parts by weight of styrene and 15 parts by weight of dicyclopentanyl methacrylate are added and mixed in 200 parts by weight of diethylene glycol ethyl methyl ether, and 4 parts by weight of azobisvaleronitrile (ADVN) is added.
Polymerization was carried out at 70 ° C. for 5 hours to obtain a polymer solution having a copolymer [A1] concentration of 33% by weight. The polystyrene equivalent weight average molecular weight (Mw) of the copolymer [A1] was 6,000.

Synthesis Example 2 (Synthesis of Copolymer [A2] ) As a component (a1), 20 parts by weight of methacrylic acid,
2) 4-methyl glycidyl methacrylate as a component
5 parts by weight, 20 parts by weight of styrene as a component (a3) and 15 parts by weight of phenylmaleimide were added and mixed in 200 parts by weight of diethylene glycol ethyl methyl ether, and 4 parts by weight of azobisvaleronitrile (ADVN) was added. For 5 hours, and the copolymer [A1] concentration is 3
A polymer solution of 3% by weight was obtained. The polystyrene equivalent weight average molecular weight (Mw) of the copolymer [A1] is 8,000.
Met.

Example 1 Preparation of a composition for forming a light-scattering film (a group corresponding to the second invention)
Preparation of Product) A solution containing the copolymer [A1] synthesized in Synthesis Example 1 described above (corresponding to 100 parts by weight (solid content) of the copolymer [A1]) was treated with propylene glycol monomethyl ether acetate 2
After dilution with 50 parts by weight, 10 parts by weight of γ-glycidoxypropyldiethoxysilane as a silane coupling agent, 20 parts by weight of Tospearl 120 (manufactured by Toshiba Silicone Co., Ltd.) as component [B], and as component [C] Dipentaerythritol hexaacrylate (Toagosei Co., Ltd.)
60 parts by weight, 1,1′-azobis (cyclohexane-1-carbonitrile) (thermal radical generator, manufactured by Wako Pure Chemical Industries, Ltd.) as component [D], Toray Silicone SH28PA
After adding 0.04 parts by weight (manufactured by Toray Dow Corning Silicone Co., Ltd.) and sufficiently stirring, the mixture was filtered using a polyflon filter (manufactured by Advantech Toyo Co., Ltd.) having a pore size of 10 μm to obtain a curable composition [S1 ] Was obtained.

Formation of Light-Scattering Film The above-mentioned composition for forming a light-scattering film [S
[1] was applied using a spin coater so as to have a film thickness of 6 μm, and preliminarily baked on a hot plate at 80 ° C. for 3 minutes to form a coating film. Thereafter, the substrate on which the coating film was formed was baked in a clean oven at 230 ° C. for 1 hour to obtain a light scattering film.

Evaluation of Light-Scattering Film Adhesion In the adhesion test according to JIS K-5400 (1900) 8.5, the light-scattering film formed in accordance with 8.5. One hundred grids were formed with a cutter knife and an adhesion test was performed. Table 1 shows the number of grids remaining at that time.

Transparency and Haze Measurement The light-scattering film formed above was measured for a Haze gard plate apparatus (Model No. Cat. No. 4725) (BYK Gardner Co., Ltd.).
) Was measured for transparency (integrated transmittance) and Haze.
Table 1 shows the results.

Flatness The surface of the light-scattering film formed above was measured for its surface smoothness using a contact-type film thickness measuring device α-step (manufactured by Tencor Japan KK). Table 1 shows the difference between the maximum value and the minimum value when the film thickness was measured at a measurement length of 2 mm.

Heat resistance: The light-scattering film formed above was measured for thickness by a contact type film thickness measuring device α-step (manufactured by Tencor Japan Co., Ltd.) and then heated at 250 ° C. for 60 minutes in a clean oven. An additional bake was performed. After the additional baking, the film thickness was measured again, and the film remaining ratio before and after the additional baking was calculated. Table 1 shows the results.

Formation of ITO Film On the light scattering film formed in the same manner as above, an ITO film of about 3,000 ° was formed by a sputtering device.
(The thus formed substrate having a light scattering film on a glass substrate and further having an ITO film thereon is hereinafter referred to as an ITO sputter substrate.)

Evaluation of Chemical Resistance of ITO Film Alkali Resistance The ITO sputtered substrate formed as described above was treated with 5% NaO
The substrate was immersed in an aqueous H solution at 60 ° C. for 30 minutes, and the substrate after immersion was evaluated for the adhesion of the ITO film according to the adhesion test of the light-scattering film. Table 1 shows the results.

Acid resistance The ITO sputtered substrate formed as described above is
In eCl ₂ .6H ₂ O / H ₂ O = 2: 2: 1 (weight ratio),
The substrate after immersion at 45 ° C. for 15 minutes was evaluated for the adhesion of the ITO film on the immersed substrate according to the adhesion test of the light-scattering film. Table 1 shows the results.

N-Methylpyrrolidone (NMP) Resistance The ITO sputtered substrate formed as described above was immersed in N-methylpyrrolidone (NMP) at 40 ° C. for 30 minutes. Evaluation was made according to the adhesion test of the light-scattering film. Table 1 shows the results.

Humidity Resistance The ITO sputtered substrate formed as described above was allowed to stand in a thermo-hygrostat at 60 ° C. and 90% humidity for 24 hours, and the adhesion of the ITO film to the substrate after standing was measured by the light scattering property. The evaluation was made according to the film adhesion test. Table 1 shows the results.

Example 2 Preparation of a composition for forming a light-scattering film (a group corresponding to the second invention)
Preparation of Product) In Example 1, a solution containing the copolymer [A2] synthesized in Synthesis Example 2 instead of the solution containing the copolymer [A1] (100 parts by weight of the copolymer [A2] (solid Minutes)
And Alonix TO-1450 in place of dipentaerythritol hexaacrylate as the component [C].
Was carried out in the same manner as in Example 1 except that the composition [S2] for forming a light-scattering film was obtained. [S2] instead of [S1]
And a light-scattering film in the same manner as in Example 1.
An O-sputtered substrate was formed and evaluated. Table 1 shows the results.

Example 3 Preparation of a composition for forming a light-scattering film (a group corresponding to the third invention)
Preparation of Product) A solution containing the copolymer [A1] synthesized in Synthesis Example 1 described above (corresponding to 100 parts by weight (solid content) of the copolymer [A1]) was treated with propylene glycol monomethyl ether acetate 2
After dilution with 50 parts by weight, 10 parts by weight of γ-glycidoxypropyldiethoxysilane as a silane coupling agent, 20 parts by weight of Nipsil SS-20 (manufactured by Nippon Silica Industry Co., Ltd.) as a component [B], and a component [ E] as Epicoat 1032H60 (bisphenol A-based polyfunctional epoxy resin, manufactured by Yuka Shell Epoxy Co., Ltd.), component [F]
After adding 100 L of Sun Aid (sulfonium salt type acid generator, manufactured by Sanshin Chemical Co., Ltd.) and stirring sufficiently,
The mixture was filtered using a polyflon filter (Advantech Toyo Co., Ltd.) having a pore size of 10 μm to obtain a curable composition [S
3] was obtained. A light-scattering film and an ITO sputtered substrate were formed and evaluated in the same manner as in Example 1, except that [S3] was used instead of [S1]. Table 1 shows the results.

Example 4 Preparation of a composition for forming a light-scattering film (a group corresponding to the third invention)
Preparation of product) In Example 3, a solution containing the copolymer [A2] synthesized in Synthesis Example 2 instead of the solution containing the copolymer [A1] (100 parts by weight of the copolymer [A2] (solid Minutes)
And a light scattering film forming composition [S4] was obtained in the same manner as in Example 3 except that Tospearl 120 was used as the component [B] instead of the nip seal SS-20. [S
A light-scattering film and an ITO sputtered substrate were formed and evaluated in the same manner as in Example 1 using [S4] instead of [1]. Table 1 shows the results.

Example 5 Preparation of a composition for forming a light-scattering film (a group corresponding to the second invention)
Preparation of Product) A solution containing the copolymer [A1] synthesized in the above Synthesis Example 1 (corresponding to 100 parts by weight (solid content) of the copolymer [A1]) was added with propylene glycol monomethyl ether acetate, and the total amount was 250 parts by weight. Parts of a solution, 10 parts by weight of γ-glycidoxypropyldiethoxysilane as a silane coupling agent, and Tospearl 120 as a component [B].
20 parts by weight (manufactured by Toshiba Silicone Co., Ltd.), 60 parts by weight of dipentaerythritol hexaacrylate (manufactured by Toagosei Co., Ltd.) as component [C], and 1,1 ′ as component [D]
-Azobis (cyclohexane-1-carbonitrile)
(Thermal radical generator, manufactured by Wako Pure Chemical Industries, Ltd.) and 0.04 parts by weight of Toray Silicone SH28PA (manufactured by Toray Dow Corning Silicone Co., Ltd.)
The mixture was filtered using a polyflon filter (Advantech Toyo Co., Ltd.) having a pore size of 10 μm to obtain a curable composition [S
5]. A light-scattering film and an ITO sputtered substrate were formed and evaluated in the same manner as in Example 1 except that [S5] was used instead of [S1]. Table 1 shows the results.

[0078]

[Table 1]

As is clear from the above examples, the light-scattering film of the present invention has high transparency and high haze.
It shows suitable performance as a light scattering film provided in a cell of a transflective and reflective liquid crystal display, and a flattening film,
It can be seen that it also has the performance as a protective film.

[0080]

According to the present invention, the curability of a light-scattering film which can efficiently scatter reflected light in a transflective or reflective liquid crystal display and provide uniform and high-intensity surface illumination by a simple method. A composition is provided. Further, an efficient light-scattering film is formed from the composition.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification code FI Theme coat ゛ (Reference) C08K 3/36 C08K 3/36 5/00 5/00 5/103 5/103 C08L 63/00 C08L 63 / 00 C G02F 1/1335 520 G02F 1/1335 520

Claims (4)

[Claims] 1. (A) (a1) an unsaturated carboxylic acid and / or an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) other than the monomers (a1) and (a2) A copolymer of an olefinically unsaturated compound of
[B] A composition for forming a light-scattering film, comprising a light-scattering substance. 2. The composition for forming a light-scattering film according to claim 1, further comprising [C] a polyfunctional monomer and [D] a heat-sensitive polymerization initiator. Composition. 3. The light-scattering film forming composition according to claim 1, further comprising an epoxy compound other than the components [E] and [A] and an acid generator [F]. Composition for forming a conductive film. 4. A light-scattering film formed from the composition for forming a light-scattering film according to claim 1.