JP2001052640A - Electron microscope and sample heating method - Google Patents
Electron microscope and sample heating methodInfo
- Publication number
- JP2001052640A JP2001052640A JP11221781A JP22178199A JP2001052640A JP 2001052640 A JP2001052640 A JP 2001052640A JP 11221781 A JP11221781 A JP 11221781A JP 22178199 A JP22178199 A JP 22178199A JP 2001052640 A JP2001052640 A JP 2001052640A
- Authority
- JP
- Japan
- Prior art keywords
- heating
- electron beam
- electron
- sample
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 124
- 238000000034 method Methods 0.000 title claims description 13
- 238000010894 electron beam technology Methods 0.000 claims abstract description 114
- 230000003287 optical effect Effects 0.000 claims abstract description 22
- 230000001133 acceleration Effects 0.000 claims abstract description 18
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000000463 material Substances 0.000 description 8
- 230000006399 behavior Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 2
- 101100096719 Arabidopsis thaliana SSL2 gene Proteins 0.000 description 1
- 101100366560 Panax ginseng SS10 gene Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
(57)【要約】
【目的】 電子顕微鏡の中で試料を従来よりも高い温度
まで加熱可能とする。
【構成】 観察対象となる試料2を観察時のレンズ条件
を変えずに加熱可能とした電子顕微鏡において、観察用
電子ビーム6よりも低い加速電圧の加熱用電子ビーム5
を観察用電子ビーム6の光路上の試料2を包含する電子
レンズたる対物レンズ3に向かって照射し、電子レンズ
3のレンズ作用部分を経由させて試料2を加熱する加熱
用電子ビーム源1を備え、観察用電子ビーム6のための
対物レンズ3の作用磁場を加熱用電子ビーム5の集束に
利用して試料2を加熱するようにしている。
(57) [Summary] [Objective] To enable a sample to be heated to a higher temperature than before in an electron microscope. [Constitution] In an electron microscope capable of heating a sample 2 to be observed without changing lens conditions at the time of observation, a heating electron beam 5 having an acceleration voltage lower than that of the observation electron beam 6
Is irradiated toward the objective lens 3 which is an electron lens including the sample 2 on the optical path of the observation electron beam 6, and the heating electron beam source 1 which heats the sample 2 via the lens working portion of the electron lens 3 is used. The sample 2 is heated by utilizing the operating magnetic field of the objective lens 3 for the observation electron beam 6 for focusing the heating electron beam 5.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子顕微鏡および
試料の加熱方法に関する。さらに詳述すると、本発明は
電子顕微鏡内で試料観察時に試料を加熱する装置及びそ
の方法の改良に関する。The present invention relates to an electron microscope and a method for heating a sample. More specifically, the present invention relates to an apparatus and a method for heating a sample during observation of the sample in an electron microscope.
【0002】[0002]
【従来の技術】従来から、加熱や引っ張りによる物理的
変化を与えたときの試料の微細構造の挙動を追跡し、多
元的情報を得て物性を解明する研究が行われている。2. Description of the Related Art Hitherto, research has been conducted to trace the behavior of a microstructure of a sample when a physical change is caused by heating or pulling, and obtain multidimensional information to elucidate physical properties.
【0003】このような研究では、電子顕微鏡で試料を
観察する時に、例えば図3に示すように電子顕微鏡内の
試料ホルダ(図示省略)の周囲に設置された加熱装置で
試料を加熱しながら試料101の挙動をミクロ的に捉え
るようにしている。加熱装置は、リング状に形成した発
熱体(抵抗線)105を熱源として、試料101全体を
周囲から加熱するようにした電気抵抗加熱方式である。
このような試料加熱装置では、周りに設置されている対
物レンズ104などの内部構造物を熱から保護するた
め、発熱体105を炉に収容すると共に更にその周りを
遮熱材106で覆うようにしている。尚、図中の符号1
02は電子銃、103は電子ビームである。In such research, when observing a sample with an electron microscope, for example, as shown in FIG. 3, the sample is heated by a heating device installed around a sample holder (not shown) in the electron microscope. The behavior of 101 is microscopically grasped. The heating device is an electric resistance heating system in which the entire sample 101 is heated from the surroundings using a ring-shaped heating element (resistance wire) 105 as a heat source.
In such a sample heating apparatus, in order to protect the internal structure such as the objective lens 104 installed around the heat source from heat, the heating element 105 is housed in a furnace and the surrounding area is further covered with a heat shield 106. ing. In addition, the code | symbol 1 in a figure
02 is an electron gun and 103 is an electron beam.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、このよ
うな電気抵抗加熱方式による加熱方法の場合、例えば発
熱体や炉の材質上の問題から、あるいは容積の大きい炉
体からの伝導熱や輻射熱が高精度の電子顕微鏡の内部構
造物特に対物レンズ104に与える影響が大きくなるこ
とから、加熱温度に自ずと限界があるという問題があ
る。具体的には、一般的な試料サイズ(1〜3mm径)
を保持し、かつ必要な高温を保つため試料を内包する炉
体は3mm以上の径を必要とし、対物レンズポールピー
ス内の数mm〜数10mmの限られた空間などに、この
高温かつ発生総熱量の大きい炉を設置するには困難があ
る。また、発熱体105を遮熱材106で覆っていて
も、遮熱材106や炉はその材質によって遮熱能力に限
界があるし、電子顕微鏡の内部構成からすればこれらの
設置スペースにも限界があるため、試料101を所定温
度以上加熱したときにその周囲へ熱が伝わるのを十分に
防止する断熱構造をとることができない。そのため、従
来の電子顕微鏡では試料101の加熱はその到達最高温
度が1000℃前後となる程度でしか行えないものであ
る。However, in the case of such a heating method using the electric resistance heating method, conduction or radiant heat from a furnace having a large volume is high due to, for example, a problem in the material of a heating element or a furnace. Since the influence on the internal structure of the electron microscope with high precision, particularly on the objective lens 104, becomes large, there is a problem that the heating temperature is naturally limited. Specifically, general sample size (1-3 mm diameter)
In order to maintain the required temperature and maintain the required high temperature, the furnace body containing the sample must have a diameter of 3 mm or more, and this high temperature and total generated It is difficult to install a furnace with a large amount of heat. Even if the heating element 105 is covered with the heat shielding material 106, the heat shielding material 106 and the furnace have a limited heat shielding ability depending on the material, and the installation space is limited according to the internal configuration of the electron microscope. Therefore, when the sample 101 is heated to a predetermined temperature or higher, a heat insulating structure for sufficiently preventing heat from being transmitted to the surroundings cannot be provided. For this reason, in the conventional electron microscope, the sample 101 can be heated only when the maximum temperature thereof reaches about 1000 ° C.
【0005】一方、試料をより高温に、場合によっては
約2000℃前後に加熱できる電子顕微鏡や試料加熱方
法が望まれている。例えば、セラミックスのような試料
では高温にしないとその挙動を追跡することができない
ことがある。しかし、従来の加熱方法では局所的に加熱
できないため、高温に加熱することができなかった。On the other hand, there is a demand for an electron microscope and a sample heating method capable of heating a sample to a higher temperature, in some cases, about 2000 ° C. For example, the behavior of a sample such as ceramics may not be traced unless the temperature is high. However, since the conventional heating method cannot locally heat, it cannot be heated to a high temperature.
【0006】そこで、本発明は、試料観察時にその試料
を従来よりも高い温度まで加熱することを可能にした電
子顕微鏡および試料の加熱方法を提供することを目的と
する。Accordingly, an object of the present invention is to provide an electron microscope and a method for heating a sample, which can heat the sample to a higher temperature than in the past when observing the sample.
【0007】[0007]
【課題を解決するための手段】かかる目的を達成するた
め、請求項1記載の発明は、観察対象となる試料を観察
時のレンズ条件を変えずに加熱可能とした電子顕微鏡に
おいて、観察用電子ビームよりも低い加速電圧の加熱用
電子ビームを観察用電子ビームの光路上の試料を包含す
る電子レンズに向かって照射し、電子レンズのレンズ作
用部分を経由させて試料を加熱する加熱用電子ビーム源
を備えるようにしている。これによって、請求項8に記
載の試料の加熱方法のように、観察用電子ビームよりも
低い加速電圧で照射される加熱用電子ビームを観察用電
子ビームの光路上の試料を包含する電子レンズに照射
し、電子レンズを加熱用電子ビームの集束に利用して試
料を加熱することができる。In order to achieve the above object, the present invention is directed to an electron microscope in which a sample to be observed can be heated without changing lens conditions at the time of observation. A heating electron beam that irradiates a heating electron beam with an acceleration voltage lower than that of the beam toward an electron lens that includes the sample on the optical path of the observation electron beam, and heats the sample via the lens working portion of the electron lens. Source. Thus, as in the method for heating a sample according to claim 8, the heating electron beam irradiated at an acceleration voltage lower than the observation electron beam is applied to the electron lens including the sample on the optical path of the observation electron beam. Irradiation can be used to heat the sample using the electron lens to focus the electron beam for heating.
【0008】したがって、観察用電子ビームよりも低い
加速電圧で発せられる加熱用電子ビームは、観察用電子
ビームの光路上にある電子レンズを集束に利用して極め
て小さくかつ高い電子密度となるように集束されて試料
の限定された局所を加熱する。即ち、試料を透過する観
察用電子を集束するために設計された電子レンズは、観
察用電子ビームに比べてかなり低い加速電圧で発せられ
る加熱用電子ビームに対しては、極めて短焦点のレンズ
が多重に存在するように働き何度も屈折・集束作用を繰
り返す。この結果、加熱用電子ビームはそのビーム径を
きわめて小さくして電子密度を極めて高くすることとな
る。即ち、試料の微小な局所を高密度電子ビームで加熱
することとなる。依って、加熱部位の総発生熱量は少な
く周りに与える熱の影響が少なく、試料を高温とした場
合にも、その周囲は高温とならずに済み、対物レンズを
はじめとする電子レンズなどの内部構造物への熱的影響
を少なくすることができる。Therefore, the heating electron beam emitted at an acceleration voltage lower than that of the observation electron beam uses an electron lens on the optical path of the observation electron beam for focusing so as to have an extremely small and high electron density. It is focused and heats a localized area of the sample. That is, an electron lens designed to focus observation electrons transmitted through a sample has a very short focus lens for a heating electron beam emitted at an acceleration voltage much lower than the observation electron beam. It works so as to exist in multiple ways and repeats refraction and focusing action many times. As a result, the electron beam for heating has a very small beam diameter and an extremely high electron density. That is, a minute local portion of the sample is heated by the high-density electron beam. Therefore, the total amount of heat generated in the heated area is small and the influence of heat on the surroundings is small. Thermal effects on the structure can be reduced.
【0009】ここで、加熱用電子ビームを入射する電子
レンズとしては対物レンズで、その極間あるいはその近
傍に試料が設置されていることが好ましい。この場合、
試料を包含する電子レンズは高加速電子ビームを結像さ
せるための強いレンズ磁場を持つため、加熱用電子ビー
ムに対しては強い集束効果があり、微小な局所を高密度
電子ビームで加熱することとなり、周りに与える熱の影
響がより少なくなる。また、加熱用電子ビーム源は、観
察用電子ビームと同時に照射し得る部位、例えば観察用
電子ビームの光軸と同軸上または近い角度から電子レン
ズに向けて照射し得る位置に配置されることが好まし
い。Here, it is preferable that the electron lens to which the heating electron beam is incident be an objective lens, and the sample be placed between the electrodes or in the vicinity thereof. in this case,
Since the electron lens containing the sample has a strong lens magnetic field to form a high-acceleration electron beam, it has a strong focusing effect on the heating electron beam. And the influence of heat on the surroundings is reduced. Further, the heating electron beam source may be disposed at a position that can be irradiated simultaneously with the observation electron beam, for example, at a position that can be irradiated toward the electron lens from an angle coaxial with or close to the optical axis of the observation electron beam. preferable.
【0010】また、請求項5記載の発明は、請求項1か
ら4のいずれかに記載の電子顕微鏡において加熱用電子
ビーム源の加速電圧を可変とするようにしている。この
場合、加速電圧を変えることによって出射角度・広がり
が変わるので加熱用電子ビームの焦点が照射軸方向にず
れて加熱範囲を広げたり狭めたりして加熱の態様を変化
させることができる。According to a fifth aspect of the present invention, in the electron microscope according to any one of the first to fourth aspects, the acceleration voltage of the heating electron beam source is made variable. In this case, since the emission angle and spread are changed by changing the acceleration voltage, the focus of the heating electron beam shifts in the irradiation axis direction, and the heating range can be changed by widening or narrowing the heating range.
【0011】また、請求項6記載の発明は、請求項1か
ら3あるいは5記載の電子顕微鏡において、加熱用電子
ビーム源は前記電子レンズへの電子ビームの入射角ある
いは入射位置を可変とするようにしている。この場合、
例えば電子ビームの集束する位置を試料表面上でずらす
ことができる。According to a sixth aspect of the present invention, in the electron microscope according to the first to third or fifth aspects, the heating electron beam source changes an incident angle or an incident position of the electron beam to the electron lens. I have to. in this case,
For example, the focusing position of the electron beam can be shifted on the sample surface.
【0012】更に、請求項7記載の発明は、請求項1か
ら6のいずれかに記載の電子顕微鏡において、加熱用電
子源を間欠照射可能とするようにしている。この場合、
試料を断続的に加熱してその温度を適宜調整することが
可能である。Further, according to a seventh aspect of the present invention, in the electron microscope according to any one of the first to sixth aspects, the heating electron source can be intermittently irradiated. in this case,
The temperature can be adjusted appropriately by intermittently heating the sample.
【0013】[0013]
【発明の実施の形態】以下、本発明の構成を図面に示す
実施の形態の一例に基づいて詳細に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The configuration of the present invention will be described below in detail based on an example of an embodiment shown in the drawings.
【0014】図1および図2に、本発明にかかる電子顕
微鏡の一実施形態を示す。この電子顕微鏡は、観察用電
子ビーム6よりも低い加速電圧の加熱用電子ビーム5を
観察用電子ビーム6の光路上の試料2を包含する電子レ
ンズ(本実施形態では、以下図に示す「対物レンズ」を
指す)3に向かって照射し、電子レンズ3のレンズ作用
部分を経由させて試料2を加熱する加熱用電子ビーム源
例えば電子銃1を備えている。なお、図2には加熱用電
子銃1を中心に、試料2や対物レンズ3、コンデンサー
レンズ4などの概略を示しているが、その他の電子顕微
鏡構成部品の図示は省略している。FIG. 1 and FIG. 2 show an embodiment of an electron microscope according to the present invention. The electron microscope includes an electron lens (in the present embodiment, an “object” shown in the figure below) that includes a heating electron beam 5 having an acceleration voltage lower than that of the observation electron beam 6 and the sample 2 on the optical path of the observation electron beam 6. A heating electron beam source, for example, an electron gun 1 for irradiating the sample 2 through the lens working portion of the electron lens 3 and irradiating it toward the lens 3). FIG. 2 schematically shows the sample 2, the objective lens 3, the condenser lens 4, etc. with the heating electron gun 1 at the center, but does not show other components of the electron microscope.
【0015】加熱用電子銃1は、加熱用として好適な電
子を得るために、観察用電子ビームよりも低い加速電圧
例えば数kvの加速電圧で電子を出射する。この加熱用
電子銃1は、本実施形態では、対物レンズ3の外部であ
って電子顕微鏡の光軸即ち観察用電子ビーム6の光軸9
に近い位置に観察用電子ビーム6から退避させて設置
し、対物レンズ3の中心部に向かって加熱用電子ビーム
5を照射できるように設置されている。The heating electron gun 1 emits electrons at an acceleration voltage lower than that of the observation electron beam, for example, several kV, in order to obtain electrons suitable for heating. In the present embodiment, the heating electron gun 1 is provided outside the objective lens 3 and at the optical axis of the electron microscope, that is, the optical axis 9 of the observation electron beam 6.
It is installed so as to be retracted from the observation electron beam 6 at a position close to, and can be irradiated with the heating electron beam 5 toward the center of the objective lens 3.
【0016】また、この加熱用電子銃1は、図示してい
ない調整機構により、光軸9と平行に移動して高さを変
えたり、あるいは傾きを変えて電子レンズ3への入射角
を変えることによって試料2上での焦点を結ぶ位置を調
整できるように設けられることが好ましい。この場合、
試料2を移動させずに加熱の位置や態様などを変えて種
々の挙動を観察することも可能となる。The heating electron gun 1 is moved in parallel with the optical axis 9 to change the height or change the inclination to change the angle of incidence on the electron lens 3 by an adjustment mechanism (not shown). Thus, it is preferable that the position for focusing on the sample 2 is adjusted so as to be adjusted. in this case,
It is also possible to observe various behaviors by changing the heating position and mode without moving the sample 2.
【0017】この加熱用電子銃1は、試料2に照射され
る観察用電子ビーム6を遮らないよう設けられる。例え
ば本実施形態では、図2に示すように観察用電子ビーム
6の経路から退避した位置に設置するようにしている。
この場合、対物レンズ3に対し加熱用電子ビーム5をで
きるだけ対物レンズ3の光軸9に近い角度で照射し得る
よう、この加熱用電子銃1の設置位置は電子顕微鏡の光
軸9つまり観察用電子ビーム6の経路に近いことが好ま
しい。The heating electron gun 1 is provided so as not to block the observation electron beam 6 applied to the sample 2. For example, in the present embodiment, as shown in FIG. 2, it is set at a position retracted from the path of the observation electron beam 6.
In this case, the heating electron gun 1 is installed at the optical axis 9 of the electron microscope, that is, for observation so that the objective electron beam 3 can be irradiated with the heating electron beam 5 as close as possible to the optical axis 9 of the objective lens 3. Preferably, it is close to the path of the electron beam 6.
【0018】なお、ここで用いられる加熱用電子銃1は
加速電圧が観察用電子銃8に比べて十分に低い電圧を用
いるものである点を除いて電子顕微鏡などで一般的に使
用される電子銃と格別異なる構造が要求されるものでは
なく、一般的な公知の電子銃の使用が可能である。加速
電圧は、観察用電子ビーム6よりも十分に低い電圧、例
えば観察用電子ビームの約1/100程度の数kvが用
いられる。The heating electron gun 1 used here is an electron generally used in an electron microscope or the like, except that the acceleration voltage uses a voltage sufficiently lower than that of the observation electron gun 8. No special structure is required for the gun, and a general known electron gun can be used. As the accelerating voltage, a voltage sufficiently lower than the electron beam 6 for observation, for example, several kv of about 1/100 of the electron beam for observation is used.
【0019】また、加熱用電子銃1はこの加速電圧の調
整が可能であり、例えば試料2の材質や形状に対して加
熱用電子ビーム5のエネルギーを変えて加熱することが
できるように設けられている。さらに、この加熱用電子
ビーム5は連続的に照射するほか間欠的に照射するよう
にしてもよく、この場合は試料2の温度を適宜調整する
ことも可能となる。本実施形態では、このような間欠照
射が可能な加熱用電子銃1を用いることとしている。The heating electron gun 1 is capable of adjusting the accelerating voltage. For example, the heating electron gun 1 is provided so that the material and the shape of the sample 2 can be heated by changing the energy of the heating electron beam 5. ing. Further, the heating electron beam 5 may be irradiated continuously or intermittently. In this case, the temperature of the sample 2 can be appropriately adjusted. In the present embodiment, the heating electron gun 1 capable of performing such intermittent irradiation is used.
【0020】一方、観察用電子ビーム6としては、分解
能を左右するため一般に高い加速電圧が使われる。例え
ば本実施形態では、100kV〜300kV程度の加速
電圧を印加することにより観察用電子銃8から観察用電
子ビーム6として好適な電子ビームを得るようにしてい
る。なお、ここで用いられる観察用電子銃8も加熱用電
子銃1と同様に公知のもので構わない。On the other hand, a high accelerating voltage is generally used as the observation electron beam 6 to affect the resolution. For example, in the present embodiment, an electron beam suitable as the observation electron beam 6 is obtained from the observation electron gun 8 by applying an acceleration voltage of about 100 kV to 300 kV. Note that the observation electron gun 8 used here may be a known electron gun similarly to the heating electron gun 1.
【0021】以上のように構成された電子顕微鏡による
と、次のようにして観察中の試料2の限定された局所を
加熱しながら高温時における試料2の挙動を追跡するこ
とが可能となる。According to the electron microscope configured as described above, it is possible to trace the behavior of the sample 2 at a high temperature while heating a limited portion of the sample 2 under observation as follows.
【0022】即ち、観察対象となる試料2の加熱が必要
となる場合、加熱用電子銃1に数kv程度の加速電圧を
印加して低速の加熱用電子ビーム5を観察用電子ビーム
6の光路上の試料2を包含する電子レンズたる対物レン
ズ3へ向けて照射する。That is, when it is necessary to heat the sample 2 to be observed, an acceleration voltage of about several kv is applied to the heating electron gun 1 so that the low-speed heating electron beam 5 is irradiated with the light of the observation electron beam 6. Irradiation is performed toward an objective lens 3 which is an electron lens including a sample 2 on a road.
【0023】このとき、対物レンズ3は加熱用電子ビー
ム5にとっては強いレンズとして作用し、あたかも図1
に示すような極めて短焦点のレンズが多重に存在する仮
想レンズ7として働くため、レンズ磁場を通過する加熱
用電子ビーム5に対して何度も屈折・集束作用を繰り返
させて、ビーム径を極めて小さく電子密度の高いものと
する。また、観察用電子ビーム6に比べて十分に低い加
速電圧の加熱用電子ビーム5は試料2を透過し難くなる
ため、試料2の中でのエネルギー吸収効率を高めて高温
化し易い。更に、加熱されて高温となる領域が局所で小
容積であるため、発生総熱量は従来の電気抵抗加熱方式
に比べて極めて小さくなる。また、試料2は熱伝導によ
る温度の散逸はあるとしても、観察用電子ビームが透過
可能な程度の薄膜であれば、大きな散逸熱量とはならず
局所高温を保持し得る。したがって、試料2は限定され
た極めて局所を高温、例えば必要であれば2000℃あ
るいはそれ以上の高温を得る可能性がある。At this time, the objective lens 3 acts as a strong lens for the heating electron beam 5, and it is as if FIG.
Since a very short focus lens as shown in (1) acts as a virtual lens 7 that exists in multiples, the heating electron beam 5 passing through the lens magnetic field is repeatedly refracted and focused many times to make the beam diameter extremely large. Small and high electron density. Further, since the heating electron beam 5 having an acceleration voltage sufficiently lower than that of the observation electron beam 6 does not easily pass through the sample 2, the energy absorption efficiency in the sample 2 is increased and the temperature is easily raised. Furthermore, since the region that is heated to a high temperature has a small volume locally, the total amount of generated heat is extremely small as compared with the conventional electric resistance heating system. Even if the sample 2 dissipates the temperature due to heat conduction, it can maintain a local high temperature without a large amount of dissipated heat if it is a thin film that can transmit the observation electron beam. Thus, sample 2 may have a limited, very localized high temperature, for example, 2000 ° C. or more if necessary.
【0024】しかもこの場合、到達温度は加熱用電子ビ
ーム5の密度と量に依存することから、試料2を加熱し
ても微小な局所が高温とされるだけで発生総熱量は小さ
く周囲温度を低く保つことができる。そこで、対物レン
ズ3の周辺には軽度の遮蔽を配慮すれば足り断熱構造や
材質を簡単にすることができる。Further, in this case, since the reached temperature depends on the density and the amount of the heating electron beam 5, even if the sample 2 is heated, only a minute local portion is heated to a high temperature, so that the generated total heat amount is small and the ambient temperature is reduced. Can be kept low. Therefore, if light shielding is considered around the objective lens 3, the heat insulation structure and material can be simplified.
【0025】一方、加熱領域が小さすぎるような場合は
加速電圧を変えたり加熱用電子銃1を移動させるなどし
てビーム焦点を軸方向にずらして照射する範囲を広げた
り、加熱位置を試料2上でずらす場合には加熱用電子ビ
ーム5の対物レンズ3への入射角度や入射位置を変える
など、加熱の態様を変化させることが容易である。この
場合でも、加熱用電子ビーム5は、図1に示すように、
仮想レンズ7の中心位置に斜めに入射されるが、集束と
屈折を繰り返し集束される間に軌道が修正され、最終的
に観察用電子ビーム6のビーム経路とほぼ一致した状態
で試料2を照射することとなる。更に、加熱の態様は常
に連続してビーム照射するものに限らず、例えば間欠照
射するようにして温度調節しても構わない。On the other hand, when the heating area is too small, the irradiation range is widened by shifting the beam focus in the axial direction by changing the acceleration voltage or moving the heating electron gun 1 or the heating position is changed to the sample 2. When it is shifted upward, it is easy to change the heating mode, for example, by changing the incident angle or the incident position of the heating electron beam 5 on the objective lens 3. Also in this case, as shown in FIG.
Although the light is obliquely incident on the center position of the virtual lens 7, the trajectory is corrected while the light is repeatedly focused and refracted, and finally the sample 2 is irradiated in a state substantially coincident with the beam path of the observation electron beam 6. Will be done. Further, the mode of heating is not limited to the method of always continuously irradiating the beam, and the temperature may be adjusted by, for example, intermittent irradiation.
【0026】なお、上述の実施形態は本発明の好適な実
施の一例ではあるがこれに限定されるものではなく本発
明の要旨を逸脱しない範囲において種々変形実施可能で
ある。例えば、本実施形態では加熱用電子ビーム銃1を
観察用電子ビーム6の光路から僅かに退避した位置に配
置して、加熱用電子ビーム5が観察用電子ビーム6の光
軸9に対して角度を以て照射されるようにしているがこ
れに特に限定されるものではなく、観察用電子ビームの
光軸9を中心にリング状の加熱用電子ビーム源(図示省
略)を設け、互いの光軸がほぼ同一となるように照射す
るようにしても良い。いずれの場合においても、加熱用
電子ビーム5と観察用電子ビーム6とは必要に応じて同
時に照射され、あるいはずらして照射され、加熱状態に
ある試料を観察することができる。また、試料を加熱し
て観察する場合、加熱しながら試料を観察しても加熱後
に観察しても良ければ、更には観察部位とはずれた部位
を加熱するようにしても良く、観察時の条件には何ら拘
束されない。The above embodiment is an example of a preferred embodiment of the present invention, but the present invention is not limited to this, and various modifications can be made without departing from the spirit of the present invention. For example, in the present embodiment, the heating electron beam gun 1 is disposed at a position slightly retracted from the optical path of the observation electron beam 6, and the heating electron beam 5 is angled with respect to the optical axis 9 of the observation electron beam 6. However, the present invention is not particularly limited to this, and a ring-shaped heating electron beam source (not shown) is provided around the optical axis 9 of the observation electron beam, and the optical axes of the heating electron beam are mutually aligned. Irradiation may be performed so as to be almost the same. In any case, the heating electron beam 5 and the observation electron beam 6 are irradiated simultaneously or as required, if necessary, so that the heated sample can be observed. In addition, when heating and observing the sample, if it is acceptable to observe the sample while heating or to observe after heating, it is also possible to heat a part that is not the observed part and to observe the condition. Is not bound at all.
【0027】更に、本実施形態では、試料2を対物レン
ズ3のレンズポールピースの間(極間)に配置し、加熱
用電子ビーム5を試料2の(図1において)対物レンズ
3の上側へ入射させるようにしているが、これに特に限
定されるものではなく、対物レンズのポールピースの近
傍に試料を配置するようにしても良い。Further, in the present embodiment, the sample 2 is disposed between the lens pole pieces of the objective lens 3 (between the poles), and the heating electron beam 5 is directed upward of the objective lens 3 of the sample 2 (in FIG. 1). Although the light is made incident, the present invention is not particularly limited to this, and the sample may be arranged near the pole piece of the objective lens.
【0028】また、本実施形態の電子顕微鏡は当初から
加熱用電子銃1を備えているものとして説明している
が、既設の電子顕微鏡に加熱用電子銃1を追加して設置
することでも本発明の加熱方法を実現でき、試料2を比
較的簡単な構成で高温加熱することができる。更に、本
実施形態では透過型電子顕微鏡に適用した例を主に説明
しているがこれに特に限定されるものではなく、走査電
子顕微鏡(SEM)や走査型電子顕微鏡(STEM)に
適用することも可能である。いずれにしても、加熱用電
子ビーム5は、少なくとも観察用電子ビーム6の光路上
の試料2を包含する電子レンズのレンズ作用部分(レン
ズ磁場)を経由して試料2上に集束されれば足りる。ま
た、本実施形態では、観察用電子ビーム6と加熱用電子
ビーム5とを試料2に対して同じ面側から照射するよう
にしているが、場合によっては観察用電子ビーム6と加
熱用電子ビーム5とを互いに逆方向から対物レンズ3へ
向けて照射するようにしても良い。Although the electron microscope of the present embodiment has been described as being provided with the heating electron gun 1 from the beginning, it is also possible to additionally install the heating electron gun 1 on an existing electron microscope. The heating method of the present invention can be realized, and the sample 2 can be heated at a high temperature with a relatively simple configuration. Furthermore, in the present embodiment, an example in which the present invention is applied to a transmission electron microscope is mainly described, but the present invention is not particularly limited to this, and the present invention is applied to a scanning electron microscope (SEM) or a scanning electron microscope (STEM). Is also possible. In any case, it suffices that the heating electron beam 5 is focused on the sample 2 via at least the lens action portion (lens magnetic field) of the electron lens including the sample 2 on the optical path of the observation electron beam 6. . In this embodiment, the sample 2 is irradiated with the observation electron beam 6 and the heating electron beam 5 from the same surface side. However, in some cases, the observation electron beam 6 and the heating electron beam 5 are irradiated. 5 may be directed toward the objective lens 3 from opposite directions.
【0029】[0029]
【発明の効果】以上の説明より明らかなように、請求項
1並びに8記載の発明によると、観察用電子ビームの光
路上の試料を包含する電子レンズの作用磁場を加熱用電
子ビームの集束に利用し、そのビーム径を極めて小さく
して電子密度を高めてから試料の局所を加熱するように
しているので、極めて高温に加熱したとしても発生熱量
が電気抵抗加熱方式に比べて極めて小さくなると共に熱
伝導による熱の散逸も少なく、周囲に熱的影響を与えず
に局所高温を維持できる。したがって、従来においては
観察し得なかった高温下における試料の挙動などを観察
することができる。As is apparent from the above description, according to the first and eighth aspects of the present invention, the action magnetic field of the electron lens including the sample on the optical path of the observation electron beam is focused on the heating electron beam. Because the beam diameter is extremely small and the electron density is increased to locally heat the sample, even if it is heated to an extremely high temperature, the amount of heat generated is extremely small compared to the electric resistance heating method. Dissipation of heat due to heat conduction is small, and a local high temperature can be maintained without thermally affecting the surroundings. Therefore, it is possible to observe the behavior of the sample at a high temperature which could not be observed conventionally.
【0030】しかも、到達温度は加熱用電子ビームの密
度と量に依存し、従来の熱源例えば抵抗加熱の発熱体の
材質等の問題は存在していないため、専ら試料との関係
だけで加熱温度を決定できる。更に、この電子顕微鏡で
は、試料を加熱しても微小な局所が高温とされるだけで
発生総熱量は小さく周囲温度を低く保つことができるた
め、試料の周辺の構造を簡単にすることができると共に
試料ホルダについても、電子ビーム加熱により到達する
局所の最高温度に耐える材質は必要とせず、試料との熱
絶縁と輻射熱の軽度の遮蔽を配慮すれば足りる。Moreover, the ultimate temperature depends on the density and amount of the heating electron beam, and there is no problem with the conventional heat source such as the material of the heating element for resistance heating. Can be determined. Further, in this electron microscope, even if the sample is heated, only the minute local portion is heated to a high temperature, so that the total heat generated is small and the ambient temperature can be kept low, so that the structure around the sample can be simplified. At the same time, the sample holder does not need to be made of a material that can withstand the local maximum temperature reached by electron beam heating, and it suffices to consider thermal insulation with the sample and mild shielding of radiant heat.
【0031】また、請求項2記載の発明によると、対物
レンズの極間あるいはその近傍に試料が設置されている
ので、試料を包含するレンズ作用磁場が極めて強い部分
であるため、加熱用電子ビームに対しては強い集束効果
があり、微小な局所を高密度電子ビームで加熱すること
となり、周りに与える熱の影響がより少なくなる。According to the second aspect of the present invention, since the sample is set between the poles of the objective lens or in the vicinity thereof, the magnetic field acting on the lens including the sample is extremely strong. Has a strong focusing effect, and heats a minute local area with a high-density electron beam, thereby reducing the influence of heat on the surroundings.
【0032】また、請求項3及び4記載の発明による
と、加熱用電子ビームが観察用電子ビームの光軸と同軸
または近い角度から必要に応じて同時あるいはずらして
任意の部位を加熱しながら若しくは加熱した後に観察で
きるため、観察条件に拘束されることがない。According to the third and fourth aspects of the present invention, the heating electron beam is heated simultaneously or shifted from the coaxial or close angle to the optical axis of the observation electron beam as needed, or while heating an arbitrary portion. Since observation is possible after heating, there is no restriction on observation conditions.
【0033】また、請求項5記載の電子顕微鏡による
と、加速電圧の調整により、加熱用電子ビームの焦点を
ずらしたりエネルギーを変化させたりして加熱態様を変
化させることができる。したがって、様々な加熱条件下
における試料の種々の挙動を観察することができる。According to the electron microscope of the fifth aspect, by adjusting the acceleration voltage, the heating mode can be changed by shifting the focus or changing the energy of the heating electron beam. Therefore, various behaviors of the sample under various heating conditions can be observed.
【0034】また請求項6記載の電子顕微鏡によれば、
加熱用電子ビームの入射角や入射位置を変えることによ
り、試料上の加熱位置を変化させ、様々な加熱条件・観
察条件をつくり出すことが容易に可能である。According to the electron microscope of the sixth aspect,
By changing the incident angle and incident position of the heating electron beam, it is possible to easily change the heating position on the sample and create various heating conditions and observation conditions.
【0035】さらに請求項7記載の電子顕微鏡によれ
ば、加熱用電子ビームの間欠照射により試料の温度を適
宜調整することが可能である。Further, according to the electron microscope of the seventh aspect, the temperature of the sample can be appropriately adjusted by intermittent irradiation of the heating electron beam.
【図1】本発明にかかる電子ビームによる局所加熱の原
理を示す図であり、電子顕微鏡内部の試料に入射する2
つの電子ビームの経路を示す。FIG. 1 is a view showing the principle of local heating by an electron beam according to the present invention, and shows a case where a sample is incident on a sample inside an electron microscope.
2 shows the paths of two electron beams.
【図2】対物レンズ近傍の構造の一例と加熱用電子銃の
位置関係を示す電子顕微鏡の部分縦断面図である。FIG. 2 is a partial longitudinal sectional view of an electron microscope showing an example of a structure near an objective lens and a positional relationship of a heating electron gun.
【図3】従来の電子顕微鏡の一例を示す電子顕微鏡内部
の部分縦断面図である。FIG. 3 is a partial longitudinal sectional view of the inside of an electron microscope showing an example of a conventional electron microscope.
1 加熱用電子銃 2 試料 3 対物レンズ(観察用電子ビームの光路上の試料を包
含する電子レンズ) 5 加熱用電子ビーム 6 観察用電子ビーム 7 加熱用電子ビームに対する仮想レンズ 9 観察用電子ビームの光軸DESCRIPTION OF SYMBOLS 1 Heating electron gun 2 Sample 3 Objective lens (Electronic lens containing the sample on the optical path of the observation electron beam) 5 Heating electron beam 6 Observation electron beam 7 Virtual lens for heating electron beam 9 Observation electron beam optical axis
フロントページの続き (72)発明者 草薙 秀雄 東京都狛江市岩戸北2−11−1 財団法人 電力中央研究所 狛江研究所内 Fターム(参考) 2G001 AA03 BA07 BA11 CA03 RA03 RA20 5C001 BB01 CC01 5C033 SS01 SS02 SS10 Continued on the front page (72) Inventor Hideo Kusanagi 2-1-1-1, Iwatokita, Komae-shi, Tokyo F-term in the Komae Research Center, Central Research Institute of Electric Power Industry 2G001 AA03 BA07 BA11 CA03 RA03 RA20 5C001 BB01 CC01 5C033 SS01 SS02 SS10
Claims (8)
件を変えずに加熱可能とした電子顕微鏡において、観察
用電子ビームよりも低い加速電圧の加熱用電子ビームを
前記観察用電子ビームの光路上の前記試料を包含する電
子レンズに向かって照射し、前記電子レンズのレンズ作
用部分を経由させて前記試料を加熱する加熱用電子ビー
ム源を備えることを特徴とする電子顕微鏡。In an electron microscope capable of heating a sample to be observed without changing lens conditions during observation, a heating electron beam having an acceleration voltage lower than that of the observation electron beam is irradiated with light of the observation electron beam. An electron microscope, comprising: a heating electron beam source that irradiates an electron lens on a road including the sample and heats the sample via a lens working portion of the electron lens.
の極間あるいはその近傍に前記試料が設置されているこ
とを特徴とする請求項1記載の電子顕微鏡。2. The electron microscope according to claim 1, wherein the electron lens is an objective lens, and the sample is placed between or near the poles.
ームと同時に照射しうる部位に配置されていることを特
徴とする請求項1または2記載の電子顕微鏡。3. The electron microscope according to claim 1, wherein the heating electron beam source is disposed at a portion that can be irradiated simultaneously with the observation electron beam.
ームの光軸と同軸または近い角度から前記電子レンズに
向けて照射し得る位置に配置されていることを特徴とす
る請求項3記載の電子顕微鏡。4. The heating electron beam source according to claim 3, wherein the heating electron beam source is arranged at a position where the electron beam can be irradiated toward the electron lens from an angle coaxial with or close to the optical axis of the observation electron beam. electronic microscope.
変としたことを特徴とする請求項1から4のいずれかに
記載の電子顕微鏡。5. The electron microscope according to claim 1, wherein the heating electron beam source has a variable acceleration voltage.
ズへの電子ビームの入射角あるいは入射位置を可変とし
たことを特徴とする請求項1から3あるいは5記載の電
子顕微鏡。6. The electron microscope according to claim 1, wherein the heating electron beam source changes an incident angle or an incident position of the electron beam on the electron lens.
間欠照射可能としたことを特徴とする請求項1から6の
いずれかに記載の電子顕微鏡。7. The electron microscope according to claim 1, wherein said heating electron beam source is capable of intermittently irradiating an electron beam.
熱する加熱方法において、観察用電子ビームよりも低い
加速電圧で照射される加熱用電子ビームを前記観察用電
子ビームの光路上の前記試料を包含する電子レンズに照
射し、前記電子レンズを前記加熱用電子ビームの集束に
利用して前記試料を加熱することを特徴とする試料の加
熱方法。8. A heating method for heating a sample to be observed in an electron microscope, wherein the heating electron beam irradiated at an acceleration voltage lower than the observation electron beam is provided on the optical path of the observation electron beam. Irradiating an electron lens including: and heating the sample using the electron lens for focusing of the heating electron beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22178199A JP3705962B2 (en) | 1999-08-04 | 1999-08-04 | Electron microscope and sample heating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22178199A JP3705962B2 (en) | 1999-08-04 | 1999-08-04 | Electron microscope and sample heating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001052640A true JP2001052640A (en) | 2001-02-23 |
| JP3705962B2 JP3705962B2 (en) | 2005-10-12 |
Family
ID=16772112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22178199A Expired - Fee Related JP3705962B2 (en) | 1999-08-04 | 1999-08-04 | Electron microscope and sample heating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3705962B2 (en) |
-
1999
- 1999-08-04 JP JP22178199A patent/JP3705962B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3705962B2 (en) | 2005-10-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4693884B2 (en) | Multi X-ray imaging apparatus and control method thereof | |
| US6661876B2 (en) | Mobile miniature X-ray source | |
| EP1120809B1 (en) | Objective lens for a charged particle beam device | |
| US7428298B2 (en) | Magnetic head for X-ray source | |
| KR101239765B1 (en) | X-ray generating apparatus and x-ray imaging system having the same | |
| US20070076849A1 (en) | X-ray tube cathode with reduced unintended electrical field emission | |
| JP6043476B2 (en) | Ion source and ion beam apparatus using the same | |
| ATE394708T1 (en) | DEVICE FOR GENERATING EXTREME UV LIGHT AND APPLICATION TO A LITHOGRAPHY SOURCE WITH EXTREME UV RADIATION | |
| JP2012094531A (en) | X-ray source | |
| CN104037042A (en) | X-ray Generation Tube, X-ray Generation Device, And X-ray Imaging System | |
| KR20180109686A (en) | Charged particle beam apparatus | |
| JP2010147017A (en) | X-ray tube | |
| US6852985B2 (en) | Method and apparatus for nanometer-scale focusing and patterning of ultra-low emittance, multi-MeV proton and ion beams from a laser ion diode | |
| JP5276682B2 (en) | Multi X-ray imaging apparatus and control method thereof | |
| TWI609405B (en) | An electronic beam machining system | |
| CN103187223B (en) | Drift control in charged particle beam system | |
| US7864924B2 (en) | Scanning X-ray radiation | |
| JP2001052640A (en) | Electron microscope and sample heating method | |
| TWI609404B (en) | A photolithography method based on electronic beam | |
| JP6282030B2 (en) | Ion beam equipment | |
| JP2007263961A (en) | Method and system for a multifocal X-ray system | |
| Zastrau et al. | A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution | |
| JP2003518252A (en) | X-ray microscope with soft X-ray X-ray source | |
| WO2000049637A1 (en) | Spot-type high-intensity x-ray source | |
| JPS59501138A (en) | X-ray source device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20040616 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040714 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040913 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20041027 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041227 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041227 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20050217 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050615 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050617 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20050713 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20050727 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080805 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090805 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100805 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100805 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110805 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120805 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120805 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130805 Year of fee payment: 8 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |